CN107577375A - Touch-screen and its manufacture method - Google Patents
Touch-screen and its manufacture method Download PDFInfo
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- CN107577375A CN107577375A CN201711001081.7A CN201711001081A CN107577375A CN 107577375 A CN107577375 A CN 107577375A CN 201711001081 A CN201711001081 A CN 201711001081A CN 107577375 A CN107577375 A CN 107577375A
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- electrode
- contact site
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- screen
- minimum widith
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Abstract
A kind of touch-screen includes first electrode and the second electrode overlapping with first electrode insulation,The first electrode includes multiple first electrode portions and the metal bridging structure being connected between two adjacent first electrode portions,The second electrode and metal bridging structure insulation are overlapping,The metal bridging structure includes the first contact site,Second contact site and first connecting portion,The touch-screen also includes substrate and insulating barrier,The metal bridging structure is arranged on the substrate,The insulating barrier is arranged on the metal bridging structure and the substrate,The insulating barrier includes first through hole and the second through hole,The second electrode and the multiple first electrode portion are arranged on the insulating barrier,Two adjacent first electrode portions are connected first contact site and second contact site by the first through hole with second through hole respectively,The minimum widith of the minimum widith of first contact site and second contact site is all higher than the minimum widith of the first connecting portion.
Description
Technical field
The present invention relates to a kind of touch-screen and its manufacture method.
Background technology
At present, touch-screen has been widely used in the display device of various electronic products, is touched in order to which user utilizes
Prosecutor formula manipulates the start of the electronic product.Touch-screen is in order that the electrode of its touch area is not easy by depending on recognizing, generally use oxygen
Change indium tin (Indi μm of Tin Oxides, ITO) to form transparent touch electrode, touch-screen, which generally comprises, to be extended in a first direction
First electrode and extension and the second electrode overlapping with first electrode insulation in a second direction.
In a kind of touch-screen of single conductive layer (Single ITO, also referred to as SITO) framework, the first electrode and institute
State second electrode and be arranged on same layer, but insulated in intersection by insulating barrier, wherein the second electrode is located at described first
Two parts of electrode both sides can be connected by insulating barrier through hole or be overlapped by metal bridge, however, no matter insulating barrier leads to
Hole connection or metal bridge overlap joint, are typically necessary and carry out contraposition exposure (as formed the once right of insulating barrier by mask twice
Position exposure exposes with the once contraposition of metal bridge) processing procedure, to realize the electrical connection of the two of the second electrode parts, but two
Secondary contraposition exposure causes cumulative limit larger or contraposition skew, so as to easily cause the connection of the two of the second electrode parts
It is bad, reduce the yield of the touch-screen.
The content of the invention
In view of this, it is necessary to which a kind of touch-screen for improving above-mentioned bad connection and yield issues and its manufacturer are provided
Method.
A kind of touch-screen, it includes the first electrode extended in a first direction and along being different from the of the first direction
Two directions extend and the second electrode overlapping with first electrode insulation, the first electrode include multiple first electrode portions and
The metal bridging structure being connected between two adjacent first electrode portions, the second electrode and the metal bridging structure are exhausted
Edge overlaps, and the metal bridging structure includes the first contact site, the second contact site and is connected to the first contact site and described second
First connecting portion between contact site, the touch-screen also include substrate and insulating barrier, and the metal bridging structure is arranged at institute
State on substrate, the insulating barrier is arranged on the metal bridging structure and the substrate, and the insulating barrier is included described in correspondence
Second through hole of the first through hole of the first contact site and corresponding second contact site, the second electrode and the multiple first
Electrode portion is arranged on the insulating barrier, and a first electrode portion in two adjacent first electrode portions corresponds to described first
Through hole and first contact site is connected by the first through hole, two adjacent first electrode portions another second
Electrode portion corresponds to second through hole and connects second contact site, the minimum of first contact site by second through hole
The minimum widith of width and second contact site is all higher than the minimum widith of the first connecting portion.
In one embodiment, the insulating barrier is minus photoresist.
In one embodiment, the minimum widith of the minimum widith of first contact site and second contact site is equal
More than or equal to twice of the minimum widith of the first connecting portion.
In one embodiment, first contact site and second contact site are shaped as rectangle, circle, ellipse
Shape, rhombus, polygon or irregular shape.
In one embodiment, the first connecting portion includes at least one shape portion, at least one shape portion connection
Between first contact site and second contact site.
In one embodiment, the first connecting portion includes multiple bar shaped portions, and the multiple bar shaped portion is staggered to form
Grid circuit.
In one embodiment, at least one shape portion is vertical bar shaped, wave bar shaped or sawtooth bar shaped.
In one embodiment, the width in the bar shaped portion is less than or equal to 20um, first contact site and described the
The minimum widith of two contact sites is less than or equal to 50um.
In one embodiment, the touch-screen also includes the peripheral wiring being arranged on the substrate, the periphery
Cabling is formed with the metal bridging structure in same mask processing procedure, corresponding connection one first electrode or one of each peripheral wiring
Second electrode, each peripheral wiring include engagement pad and cabling portion, and the engagement pad passes through the 3rd in the insulating barrier
First electrode or second electrode corresponding to through hole connection is described, the cabling portion are used to connect external circuit, the engagement pad
Minimum widith is all higher than the first connecting portion minimum widith and the minimum widith in the cabling portion.
In one embodiment, the minimum widith of the minimum widith of the engagement pad is all higher than the first connecting portion most
Twice of small width and the minimum widith in the cabling portion.
In one embodiment, the first through hole and the overlapping area of first contact site are more than or equal to 90%,
The overlapping area of second through hole and second contact site is more than or equal to 90%, the third through-hole and the engagement pad
Overlapping area is more than or equal to 90%.
A kind of manufacture method of above-mentioned touch-screen, it comprises the following steps：
The substrate is provided；
The metal bridging structure is formed on the substrate；
The insulating barrier is formed on the substrate and the metal bridging structure, the insulating barrier is minus photoresistance material
Material；
Side of the substrate away from the metal bridging structure using the metal bridging structure be mask to it is described absolutely
Edge layer is exposed and developed, so as to form the first through hole and second through hole in the insulating barrier；And
The multiple first electrode portion and the second electrode are formed on the insulating barrier.
Compared to prior art, in touch-screen of the invention and manufacture method, the first contact of the metal bridging structure
The minimum widith of portion and the second contact site is all higher than the minimum widith of its first connecting portion, can use minus photoresist with institute
State metal bridging structure the insulating barrier is exposed and developed for mask, utilize first contact site and the second contact site
Minimum widith be all higher than the minimum widith of the first connecting portion, can retain the insulating barrier of the first connecting portion position,
But first contact site and the insulating barrier of the second contact site position are removed, so as to form described first in the insulating barrier
Through hole and second through hole, the manufacturer of the connection of two parts of electrode is realized compared to existing generally use twice mask
For method, the manufacture method of touch-screen of the invention can reduce by one of mask processing procedure, not only simplify manufacture method, can be with
Caused by improving contraposition exposure twice phenomena such as the yield of bad connection and the reduction touch-screen.
Brief description of the drawings
Fig. 1 is the planar structure schematic diagram of the touch-screen of a better embodiment of the invention.
Fig. 2 is the diagrammatic cross-section of II-II along Fig. 1.
Fig. 3 is the structural representation of the metal bridging structure shown in Fig. 1.
Fig. 4, Fig. 5 and Fig. 6 are the structural representations of the metal bridging structure of several change embodiments.
Fig. 7 is the flow chart of the manufacture method of inventive touch screen.
Fig. 8 be electrode and the peripheral wiring junction for the touch-screen that the manufacture method of inventive touch screen obtains structure with
A kind of comparison schematic diagram of known structure.
Fig. 9 is feature sizes that peripheral wiring and metal bridging structure are designed using the manufacture method of inventive touch screen etc.
Parameter value and corresponding experiment test value.
Main element symbol description
Touch-screen 10
Substrate 11
First electrode 12
Second electrode 13
Peripheral wiring 14
Insulating barrier 15
First electrode portion 121
Metal bridging structure 122
First direction X
Second direction Y
Second electrode portion 131
Second connecting portion 132
First contact site 123
Second contact site 124
First connecting portion 125
Engagement pad 141
Cabling portion 142
First through hole 151
Second through hole 152
Third through-hole 153
Step S1-S5
Following embodiment will combine above-mentioned accompanying drawing and further illustrate the present invention.
Embodiment
Refer to Fig. 1 and Fig. 2, Fig. 1 be a better embodiment of the invention touch-screen 10 planar structure schematic diagram, figure
2 be the diagrammatic cross-section of II-II along Fig. 1.The touch-screen 10 includes substrate 11, first electrode 12, second electrode 13, periphery
Cabling 14 and insulating barrier 15.
The substrate 11 can be transparency carrier, and its material can be with glass, sapphire, transparent resin (such as PET material), thoroughly
One kind in bright ceramics, but it is not limited to above-mentioned material.
X extends the first electrode 12 in the first direction.The first electrode 12 includes multiple first electrode portions 121 and connected
The metal bridging structure 122 being connected between two adjacent first electrode portions 121.The second electrode 13 is along different from described
One direction X second direction Y extends and insulated by the insulating barrier 15 and the first electrode 12 overlapping.Specifically, it is described
Second electrode 12 and the metal bridging structure 122 insulation are overlapping.
The first electrode portion 121 and the second electrode 13 can be transparent conductive material (such as tin indium oxide material
Material), specifically, the first electrode portion 121 can be located at same layer and in the mask processing procedure with along with the second electrode 13
Middle formation.
Further, the shape in the first electrode portion 121 can be rhombus, circle etc. but be not limited to above-mentioned shape.Institute
Multiple second electrode portions 131 arranged along the second direction Y can be included and be connected to adjacent two by stating second electrode 13
Second connecting portion 132 between second electrode portion 131, the shape in the second electrode portion 131 can be rhombus, circle etc. but not
It is limited to above-mentioned shape.The second connecting portion 132 can be bar shaped, such as vertical bar shaped, and its width can be less than the second electrode
The width in portion 131.The second connecting portion 132 and the metal bridging structure 122 insulation are overlapping.
It is appreciated that the quantity of the first electrode 12 can be it is multiple, the multiple first electrode 12 be arranged at intervals and
Extend along the first direction X, the spacing for the first electrode 12 that arbitrary neighborhood is two can be equal.The second electrode 13
Quantity can be it is multiple, the multiple second electrode 13 be arranged at intervals and along the second direction Y extend and with it is described more
Individual first electrode 12 intersects in the metal bridging structure 122 with being insulated at the second connecting portion 132, arbitrary neighborhood two
The spacing of second electrode 13 can be equal.
Referring to Fig. 3, Fig. 3 is the structural representation of the metal bridging structure 122 shown in Fig. 1.The metal bridging structure
122 can be arranged on the substrate 11, and it can include first contact site 123 in one first electrode portion 121 of connection, connection
Second contact site 124 in another first electrode portion 121 and be connected to the first contact site 123 and second contact site 124 it
Between first connecting portion 125.The minimum widith of the minimum widith of first contact site 123 and second contact site 124 is equal
More than the minimum widith of the first connecting portion 125.Preferably, the minimum widith of first contact site 123 and described second
The minimum widith of contact site 124 is all higher than twice of the minimum widith equal to the first connecting portion 125.The metal bridge binding
The material of structure 122 can be lighttight metal material, such as including the relatively low metal material of silver, copper, aluminium impedance.
First contact site 123 and second contact site 124 are shaped as rectangle, circle, ellipse, rhombus, more
Side shape or irregular shape.The first connecting portion 125 includes at least one shape portion, and at least one shape portion is connected to described
Between first contact site 123 and second contact site 124.First contact site 123 and second contact site 124 can be with
Geomery is essentially identical, therefore the minimum widith phase of the minimum widith of first contact site 123 and second contact site 124
Deng.
In present embodiment, first contact site 123 is shaped as rectangle with second contact site 124, such as square
Shape, the bar shaped portion are vertical bar type, and the width in the bar shaped portion of the first connecting portion 125 can be less than or equal to 20um, described
The minimum widith (the i.e. described square length of side) of one contact site 123 and second contact site 124 can be less than or equal to 50um.
It is appreciated that in the first change embodiment, as shown in figure 4, first contact site 123 and described second
Contact site 124 is shaped as rectangle, such as square, and the bar shaped portion of the first connecting portion 125 can be wave strip type, and described the
The width in the bar shaped portion of one connecting portion 125 can be less than or equal to 20um, first contact site 123 and second contact site
124 minimum widith (the i.e. described square length of side) can be less than or equal to 50um.
It is appreciated that in second is changed embodiment, as shown in figure 5, first contact site 123 and described second
Contact site 124 is shaped as circle, and the bar shaped portion of the first connecting portion 125 can be vertical bar type, the first connecting portion 125
The width in bar shaped portion can be less than or equal to 20um, the minimum widith of first contact site 123 and second contact site 124
(i.e. described circular diameter) can be less than or equal to 50um.
It is appreciated that in the third change embodiment, as shown in fig. 6, first contact site 123 and described second
Contact site 124 is shaped as circle, and the bar shaped portion of the first connecting portion 125 can be Saw blade shape, the first connecting portion
The quantity in 125 bar shaped portion is a plurality of, and the multiple bar shaped portion is staggered to form grid circuit.The width in each bar shaped portion can be with small
In equal to 20um, the minimum widith (i.e. described circular diameter) of first contact site 123 and second contact site 124 can
With less than or equal to 50um.
The peripheral wiring 14 is used for the first electrode 12 and 13 externally connected circuit of second electrode (such as by soft
Property circuit board connection external circuit), specifically, the peripheral wiring 14 can be arranged on the substrate, and the periphery is walked
Line 14 can be formed with the metal bridging structure 122 in same mask processing procedure, and each peripheral wiring 14 is corresponding to be connected
One first electrode 12 or a second electrode 13, each peripheral wiring 14 include engagement pad 141 and cabling portion 142, the engagement pad
141 are used to connect the corresponding first electrode or second electrode, and the cabling portion 142 is used to connect external circuit, described to connect
The minimum widith of touch pad 141 is all higher than the minimum widith of first connecting portion 125 and the minimum widith in the cabling portion 142.It is excellent
Selection of land, the minimum widith of the minimum widith of the engagement pad 141 be all higher than the minimum widith of first connecting portion 125 and it is described walk
Twice of the minimum widith in line portion 142.
Further, the minimum widith of the engagement pad 141 can be with the minimum widith phase of first contact site 123
Deng the minimum widith in the cabling portion 142 can be equal with the minimum widith of the first connecting portion 125.In a kind of embodiment
In, the width in the cabling portion 142 can be less than or equal to 20um, and the minimum widith of the engagement pad 141 can be less than or equal to
50um。
The insulating barrier 15 is arranged on the metal bridging structure 122, the peripheral wiring 14 and the substrate 11,
The insulating barrier 15 includes the first through hole 151 of corresponding first contact site 123, the of corresponding second contact site 124
The third through-hole 153 of two through holes 152 and the corresponding engagement pad 141.The insulating barrier 15 is transparent insulation material, this embodiment party
In formula, the insulating barrier 15 is minus photoresist, such as polyisoprene rubber material.
It is appreciated that the insulating barrier 15 can not cover remote described one end of engagement pad 141 of the peripheral wiring 14
Part cabling portion 142, so that the cabling portion 142 of remote described one end of engagement pad 141 of the peripheral wiring 14 be exposed, with
It is easy to connect the elements such as flexible circuit board.
The second electrode 13 and the multiple first electrode portion 121 are arranged on the insulating barrier 15, described adjacent
One first electrode portion 121 in two first electrode portions 121 corresponds to the first through hole 151 and passes through the first through hole 151
Connect first contact site 123, the corresponding institute of another second electrode portion 121 in two adjacent first electrode portions 121
State the second through hole 152 and second contact site 124 is connected by second through hole 152, the first electrode 12 and described the
One end of two electrodes 13 also connects the engagement pad 141 of a corresponding peripheral wiring 14 by the third through-hole 153.A kind of real
Apply in example, the first through hole 151 and the overlapping area of first contact site 123 can be more than or equal to 90%, described second
The overlapping area of through hole 152 and second contact site 124 greatly can be in equal to 90%, and the third through-hole 153 connects with described
The overlapping area of touch pad 141 can be more than or equal to 90%.
Referring to Fig. 7, Fig. 7 is the flow chart of the manufacture method of inventive touch screen 10.The manufacturer of the touch-screen 10
Method comprises the following steps S1-S5.
Step S1, there is provided substrate.
Concrete structure on the substrate 11 has been described above, and here is omitted.
Step S2, metal bridging structure and peripheral wiring are formed on the substrate.
Concrete structure on the metal bridging structure 122 and peripheral wiring 14 has been described above, no longer superfluous herein
State.The step S2 may comprise steps of：
Metal material layer is formed on the substrate 11；
The first photoresist layer is formed on the metal material layer；
Predetermined mask pattern is used to be exposed first photoresist layer, develop forms to etch the metal material layer
The metal bridging structure 122；And
Remove first photoresist layer.
Step S3, insulating barrier is formed on the substrate, the metal bridging structure and peripheral wiring, the insulating barrier is
Minus photoresist.
Step S4, in side of the substrate away from the metal bridging structure and peripheral wiring with the metal bridge binding
Structure and peripheral wiring are that mask is exposed and developed to the insulating barrier, so as to formed in the insulating barrier first through hole,
Second through hole and third through-hole.
Step S5, multiple first electrode portions and second electrode are formed on the insulating barrier.
The step S5 may comprise steps of：
Formed on the insulating barrier 15, first through hole 151, second through hole 152 and the third through-hole 153 transparent
Conductive material layer；
The second photoresist layer is formed on the transparent conductive material layer；
Predetermined mask pattern is used to be exposed, develop to etch the transparent conductive material layer to second photoresist layer
So as to form the first electrode portion 121 and the second electrode 13；And
Remove second photoresist layer.
It is appreciated that on the specific structural features of the first electrode portion 121 and the second electrode 13 above
Description, here is omitted.
Compared to prior art, in touch-screen 10 of the invention and manufacture method, the first of the metal bridging structure 122
The minimum widith of the contact site 124 of contact site 123 and second is all higher than the minimum widith of its first connecting portion 125, the engagement pad
141 minimum widith is more than the minimum widith of first connecting portion 125 and the minimum widith in the cabling portion 142, can use
Minus photoresist is that mask is exposed to the insulating barrier 15 with the metal bridging structure 122, the peripheral wiring 14
With development, the first connecting portion 125 is all higher than using the minimum widith of the contact site 124 of the first contact site 123 and second
Minimum widith, the minimum widith of the engagement pad 141 be all higher than the minimum widith of first connecting portion 125 and the cabling portion
It 142 minimum widith, can retain the first connecting portion 125 and the insulating barrier 15 of the position of cabling portion 142, but described
The insulating barrier 15 of one contact site 123, the second contact site 124 and the position of the engagement pad 141 is removed, so as in the insulating barrier
The first through hole 151, second through hole 152 and the third through-hole 153 are formed in 15, compared to existing generally use two
Road mask realizes for the manufacture method of the connection of two parts of electrode that the manufacture method of touch-screen 10 of the invention can subtract
Few one of mask processing procedure, not only simplify manufacture method, can also improve bad connection and drop caused by contraposition exposure twice
Phenomena such as yield of the low touch-screen.
Further, referring to Fig. 8, the electrode for the touch-screen 10 that the manufacture method that Fig. 8 is inventive touch screen 10 obtains
12nd, 13 with the comparison schematic diagram of the structure of the junction of peripheral wiring 14 and known structure a kind of.In a kind of known structure, to make
The engagement pad 241 for obtaining peripheral wiring 24 can be connected with the first electrode 22 or second electrode 23 with accurate contraposition, the periphery
The width of the engagement pad 241 of cabling 24 need to typically design it is wider, with avoid align skew cause engagement pad 241 can not contact and even
Electrode 22 or 23 corresponding to connecing, therefore, the frame region where the peripheral wiring 24 also need wider.However, inventive touch
In screen and manufacture method, because the third through-hole 153 in the insulating barrier 15 is to be with the engagement pad 141 of the peripheral wiring 14
Mask carries out reverse side to the insulating barrier 15 of the negative shape photoresist and exposes to be formed, thus the engagement pad 141 can with it is described
First electrode 12 or the contraposition of second electrode 13 can be more accurate, can be designed as narrower so as to the width of the engagement pad 141, enter
And the frame region where the peripheral wiring 14 is narrower.
Further, referring to Fig. 9, Fig. 9 is the manufacture method design peripheral wiring 14 using inventive touch screen 10
And the parameter value such as feature sizes of metal bridging structure 122 and corresponding experiment test value.Specifically, the peripheral wiring 14
The minimum widith of cabling portion 142 and the first connecting portion 125 can sequentially be designed as 10-80um (shown in such as Fig. 9 (a)), such as
It is sequentially 10- to form the cabling portion 142 and the width of the corresponding pattern of first of mask of the first connecting portion 125
80um.Further, the width of the cabling portion 142 and the first connecting portion 125 is made such as by first of mask processing procedure
Shown in form secondary series shown in Fig. 9 (b), it is too narrow that wherein N/A represents line width, can not form or measure effective width, leads to
Cross reverse side exposure manufacture process to obtain shown in the row of form the 3rd of the width of the third through-hole 153 as shown in Fig. 9 (b), described first
Shown in the row of form the 4th of the developed width of contact site 123 and second contact site 124 as shown in Fig. 9 (b), described first is logical
Shown in the row of form the 5th of the developed width of hole 152 and second through hole 153 as shown in Fig. 9 (b).
Understood according to the form shown in Fig. 9 (b), the cabling portion 142 of the peripheral wiring 14 and the first connecting portion 125
Minimum widith design load should be not less than 40um, so as to ensure by above-mentioned manufacture method, first contact site 123,
Two contact sites 124, the first through hole 151, the second through hole 152 and third through-hole 153 can form or measure effective
Width.
Furthermore, it is to be understood that because different minus photoresists, different reverse side exposure intensities or exposure angle are formed
The first through hole 151, the second through hole 152 and third through-hole 153 minimum widith may be different, in actual application,
The engagement pad 141, cabling can be designed according to different minus photoresists, different reverse side exposure intensities or exposure angle
Portion 142, first contact site 123, the second contact site 124, the minimum widith of the first connecting portion 125, to obtain this hair
Bright touch-screen 10, is just repeated no more herein.
Certainly, the invention is not limited in embodiment disclosed above, the present invention can also be to be carried out to above-described embodiment
Various changes.As long as those skilled in the art is appreciated that within the spirit of the present invention, to above example institute
The appropriate change and change made all fall within the scope of protection of present invention.
Claims (12)
- A kind of 1. touch-screen, it is characterised in that：The touch-screen includes the first electrode extended in a first direction and edge is different from The second direction of the first direction extends and the second electrode overlapping with first electrode insulation, the first electrode include Multiple first electrode portions and the metal bridging structure being connected between two adjacent first electrode portions, the second electrode and institute It is overlapping to state the insulation of metal bridging structure, the metal bridging structure includes the first contact site, the second contact site and is connected to first First connecting portion between contact site and second contact site,The touch-screen also includes substrate and insulating barrier, and the metal bridging structure is arranged on the substrate, the insulating barrier It is arranged on the metal bridging structure and the substrate, the insulating barrier includes the first through hole of corresponding first contact site And the second through hole of corresponding second contact site, the second electrode and the multiple first electrode portion are arranged at the insulation On layer, a first electrode portion in two adjacent first electrode portions corresponds to the first through hole and led to by described first Hole connects first contact site, and another second electrode portion in two adjacent first electrode portions corresponds to described second and led to Hole connects second contact site, the minimum widith of first contact site and second contact site by second through hole Minimum widith be all higher than the minimum widith of the first connecting portion.
- 2. touch-screen as claimed in claim 1, it is characterised in that：The insulating barrier is minus photoresist.
- 3. touch-screen as claimed in claim 1, it is characterised in that：The minimum widith of first contact site connects with described second The minimum widith of contact portion is all higher than twice of the minimum widith equal to the first connecting portion.
- 4. touch-screen as claimed in claim 1, it is characterised in that：The shape of first contact site and second contact site For rectangle, circle, ellipse, rhombus, polygon or irregular shape.
- 5. touch-screen as claimed in claim 1, it is characterised in that：The first connecting portion includes at least one shape portion, described At least one shape portion is connected between first contact site and second contact site.
- 6. touch-screen as claimed in claim 5, it is characterised in that：The first connecting portion includes multiple bar shaped portions, described more Individual bar shaped portion is staggered to form grid circuit.
- 7. touch-screen as claimed in claim 5, it is characterised in that：At least one shape portion be vertical bar shaped, wave bar shaped or Sawtooth bar shaped.
- 8. the touch-screen as described in claim 5-7 any one of item, it is characterised in that：The width in the bar shaped portion is less than or equal to 20um, the minimum widith of first contact site and second contact site are less than or equal to 50um.
- 9. touch-screen as claimed in claim 1, it is characterised in that：The touch-screen is also outer on the substrate including being arranged at Cabling is enclosed, the peripheral wiring is formed with the metal bridging structure in same mask processing procedure, and each peripheral wiring correspondingly connects A first electrode or a second electrode are connect, each peripheral wiring includes engagement pad and cabling portion, and the engagement pad passes through positioned at institute State the third through-hole connection corresponding first electrode in insulating barrier or second electrode, the cabling portion are used to connect external electrical Road, the minimum widith of the engagement pad are all higher than the first connecting portion minimum widith and the minimum widith in the cabling portion.
- 10. touch-screen as claimed in claim 9, it is characterised in that：The minimum widith of the minimum widith of the engagement pad is big In twice of the minimum widith in the first connecting portion minimum widith and the cabling portion.
- 11. touch-screen as claimed in claim 9, it is characterised in that：The first through hole is overlapping with first contact site Area is more than or equal to 90%, and the overlapping area of second through hole and second contact site is more than or equal to the 90%, the described 3rd Through hole and the overlapping area of the engagement pad are more than or equal to 90%.
- 12. a kind of manufacture method of touch-screen as claimed in claim 1, it comprises the following steps：The substrate is provided；The metal bridging structure is formed on the substrate；The insulating barrier is formed on the substrate and the metal bridging structure, the insulating barrier is minus photoresist；Using the metal bridging structure it is mask to the insulating barrier in side of the substrate away from the metal bridging structure It is exposed and develops, so as to forms the first through hole and second through hole in the insulating barrier；AndThe multiple first electrode portion and the second electrode are formed on the insulating barrier.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
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| CN201711001081.7A CN107577375A (en) | 2017-10-24 | 2017-10-24 | Touch-screen and its manufacture method |
| TW106137888A TWI650688B (en) | 2017-10-24 | 2017-11-02 | Touch panel and method for making the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711001081.7A CN107577375A (en) | 2017-10-24 | 2017-10-24 | Touch-screen and its manufacture method |
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| CN107577375A true CN107577375A (en) | 2018-01-12 |
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| CN201711001081.7A Pending CN107577375A (en) | 2017-10-24 | 2017-10-24 | Touch-screen and its manufacture method |
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| CN108491108A (en) * | 2018-03-26 | 2018-09-04 | 业成科技（成都）有限公司 | Tool improves the touch control electrode bridging structure of visual effect |
| CN108762543A (en) * | 2018-04-19 | 2018-11-06 | 业成科技（成都）有限公司 | Touch screen and apply its touch device |
| CN109002211A (en) * | 2018-07-16 | 2018-12-14 | 京东方科技集团股份有限公司 | A kind of touch screen and preparation method thereof, display panel, display device |
| CN109062431A (en) * | 2018-07-17 | 2018-12-21 | 京东方科技集团股份有限公司 | A kind of touch module, its production method and display device |
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| CN109002211B (en) * | 2018-07-16 | 2021-08-17 | 京东方科技集团股份有限公司 | Touch screen, manufacturing method thereof, display panel and display device |
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Also Published As
| Publication number | Publication date |
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| TWI650688B (en) | 2019-02-11 |
| TW201917542A (en) | 2019-05-01 |
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