US10336917B2 - Pressure-sensitive adhesive film and method of manufacturing organic electronic device using the same - Google Patents
Pressure-sensitive adhesive film and method of manufacturing organic electronic device using the same Download PDFInfo
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- US10336917B2 US10336917B2 US14/764,119 US201414764119A US10336917B2 US 10336917 B2 US10336917 B2 US 10336917B2 US 201414764119 A US201414764119 A US 201414764119A US 10336917 B2 US10336917 B2 US 10336917B2
- Authority
- US
- United States
- Prior art keywords
- pressure
- sensitive adhesive
- adhesive film
- film
- organic electronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims abstract description 196
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 229920005989 resin Polymers 0.000 claims description 79
- 239000011347 resin Substances 0.000 claims description 79
- 239000000203 mixture Substances 0.000 claims description 71
- 239000010410 layer Substances 0.000 claims description 56
- 239000000806 elastomer Substances 0.000 claims description 48
- 150000001875 compounds Chemical class 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 25
- 239000002250 absorbent Substances 0.000 claims description 21
- 230000002745 absorbent Effects 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 229920006223 adhesive resin Polymers 0.000 claims description 11
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 8
- 150000001336 alkenes Chemical class 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 239000003999 initiator Substances 0.000 claims description 7
- 238000002834 transmittance Methods 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 5
- 239000004840 adhesive resin Substances 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 4
- 230000008859 change Effects 0.000 claims description 4
- 150000001993 dienes Chemical class 0.000 claims description 4
- 229920006124 polyolefin elastomer Polymers 0.000 claims description 4
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 3
- 229920005672 polyolefin resin Polymers 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000001301 oxygen Substances 0.000 abstract description 5
- 229920001971 elastomer Polymers 0.000 description 46
- 238000004132 cross linking Methods 0.000 description 35
- -1 polyoxymethylene Polymers 0.000 description 34
- 238000000034 method Methods 0.000 description 22
- 230000004888 barrier function Effects 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 15
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 239000003822 epoxy resin Substances 0.000 description 13
- 229920000647 polyepoxide Polymers 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 238000001723 curing Methods 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 229910000077 silane Inorganic materials 0.000 description 9
- 238000005538 encapsulation Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 230000000149 penetrating effect Effects 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 229920001400 block copolymer Polymers 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000011368 organic material Substances 0.000 description 5
- 230000035515 penetration Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000003760 tallow Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 229920002367 Polyisobutene Polymers 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 0 [1*]C(=C)C(=O)OC Chemical compound [1*]C(=C)C(=O)OC 0.000 description 3
- VEBCLRKUSAGCDF-UHFFFAOYSA-N ac1mi23b Chemical compound C1C2C3C(COC(=O)C=C)CCC3C1C(COC(=O)C=C)C2 VEBCLRKUSAGCDF-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 229920005549 butyl rubber Polymers 0.000 description 3
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical class C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 2
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 description 2
- CXMYWOCYTPKBPP-UHFFFAOYSA-N 3-(3-hydroxypropylamino)propan-1-ol Chemical compound OCCCNCCCO CXMYWOCYTPKBPP-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229920000800 acrylic rubber Polymers 0.000 description 2
- 229920002877 acrylic styrene acrylonitrile Polymers 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- LBDSXVIYZYSRII-IGMARMGPSA-N alpha-particle Chemical compound [4He+2] LBDSXVIYZYSRII-IGMARMGPSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 2
- FACXGONDLDSNOE-UHFFFAOYSA-N buta-1,3-diene;styrene Chemical compound C=CC=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 FACXGONDLDSNOE-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- GHLKSLMMWAKNBM-UHFFFAOYSA-N dodecane-1,12-diol Chemical compound OCCCCCCCCCCCCO GHLKSLMMWAKNBM-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 230000005251 gamma ray Effects 0.000 description 2
- YDLYQMBWCWFRAI-UHFFFAOYSA-N hexatriacontane Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC YDLYQMBWCWFRAI-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 229940117969 neopentyl glycol Drugs 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910001631 strontium chloride Inorganic materials 0.000 description 2
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 2
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 2
- 229920001935 styrene-ethylene-butadiene-styrene Polymers 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920002725 thermoplastic elastomer Polymers 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- RLUFBDIRFJGKLY-UHFFFAOYSA-N (2,3-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1Cl RLUFBDIRFJGKLY-UHFFFAOYSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- XAQKJHHFZXELKJ-UHFFFAOYSA-N 1-[ethoxy(dimethyl)silyl]oxyethyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(C)OC(C)OC(=O)C(C)=C XAQKJHHFZXELKJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- UMLWXYJZDNNBTD-UHFFFAOYSA-N 2-(dimethylamino)-1-phenylethanone Chemical compound CN(C)CC(=O)C1=CC=CC=C1 UMLWXYJZDNNBTD-UHFFFAOYSA-N 0.000 description 1
- XOGPDSATLSAZEK-UHFFFAOYSA-N 2-Aminoanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(N)=CC=C3C(=O)C2=C1 XOGPDSATLSAZEK-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- YJQMXVDKXSQCDI-UHFFFAOYSA-N 2-ethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3SC2=C1 YJQMXVDKXSQCDI-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J123/00—Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
- C09J123/02—Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers not modified by chemical after-treatment
- C09J123/18—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms
- C09J123/20—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms having four to nine carbon atoms
- C09J123/22—Copolymers of isobutene; Butyl rubber ; Homo- or copolymers of other iso-olefines
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J109/00—Adhesives based on homopolymers or copolymers of conjugated diene hydrocarbons
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F255/00—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00
- C08F255/08—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00 on to polymers of olefins having four or more carbon atoms
- C08F255/10—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00 on to polymers of olefins having four or more carbon atoms on to butene polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/04—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to rubbers
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- C09J123/00—Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
- C09J123/02—Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers not modified by chemical after-treatment
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- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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- C09J133/08—Homopolymers or copolymers of acrylic acid esters
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- C09J145/00—Adhesives based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic system; Adhesives based on derivatives of such polymers
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- C09J151/00—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
- C09J151/04—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to rubbers
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- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- C09J7/10—Adhesives in the form of films or foils without carriers
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
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- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H10K50/80—Constructional details
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- H10K50/841—Self-supporting sealing arrangements
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
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- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
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- H10K50/00—Organic light-emitting devices
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- H10K50/844—Encapsulations
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
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- C09J2201/36—
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- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C09J2205/114—
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/20—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
- C09J2301/208—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive layer being constituted by at least two or more adjacent or superposed adhesive layers, e.g. multilayer adhesive
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/414—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
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- C09J2409/00—Presence of diene rubber
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- C09J2415/00—Presence of rubber derivatives
- C09J2415/003—Presence of rubber derivatives in the primer coating
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- C09J2423/00—Presence of polyolefin
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- C09J2423/00—Presence of polyolefin
- C09J2423/003—Presence of polyolefin in the primer coating
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- C09J2433/00—Presence of (meth)acrylic polymer
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- C09J2433/00—Presence of (meth)acrylic polymer
- C09J2433/003—Presence of (meth)acrylic polymer in the primer coating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
- Y10T428/2878—Adhesive compositions including addition polymer from unsaturated monomer
- Y10T428/2883—Adhesive compositions including addition polymer from unsaturated monomer including addition polymer of diene monomer [e.g., SBR, SIS, etc.]
Definitions
- the present invention relates to a pressure-sensitive adhesive film, and a method of manufacturing an organic electronic device using the same.
- An organic electronic device refers to a device including an organic material layer generating alternation of charges using holes and electrons, and may include, for example, a photovoltaic device, a rectifier, a transmitter, and an organic light emitting diode (OLED).
- a representative OED which is an OLED, has less power consumption and a higher response speed, and forms a thinner display device or light than a conventional light source.
- the OLED has excellent space utilization, and is expected to be applied in various fields including all types of portable devices, monitors, notebook computers, and TVs.
- OLED organic light-emitting diode
- a major problem is durability.
- Organic materials and metal electrodes included in the OLED are very easily oxidized by external factors such as water. Accordingly, a product including the OLED is very sensitive to environmental factors. Therefore, various methods for preventing penetration of oxygen or water from an external environment with respect to an organic electronic device such as the OLED have been suggested.
- an adhesive capsulated composition film and an organic electroluminescence light emitting device are provided, and have poor processability as a pressure-sensitive adhesive based on polyisobutylene (PIB) and low reliability at high temperature and high humidity.
- PIB polyisobutylene
- an organic electronic device it is required to develop an encapsulant ensuring a required life span, effectively preventing penetration of moisture, maintaining reliability at high temperature and high humidity, and having excellent optical characteristics.
- the present invention is directed to providing a pressure-sensitive adhesive film which can have a structure effectively preventing moisture or oxygen from penetrating into an organic electronic device from an external environment, and excellent mechanical characteristics such as handleability and processability and excellent transparency, and a method of manufacturing an organic electronic device using the same.
- the present invention provides a pressure-sensitive adhesive film.
- the pressure-sensitive adhesive film may be applied to, for example, encapsulation or capsulation of an organic electronic device such as an OLED.
- organic electronic device refers to a product or device having a structure including an organic material layer generating alternation of charges using holes and electrons between a pair of electrodes facing each other, and may include, but is not limited to, for example, a photovoltaic device, a rectifier, a transmitter, and an organic light emitting diode (OLED).
- the organic electronic device may be an OLED.
- Equation 1 The pressure-sensitive adhesive film of the present invention satisfies Equation 1: ⁇ X ⁇ 0.3 mm [Equation 1]
- ⁇ X is a change in a creeping distance of the pressure-sensitive adhesive layer between 50 to 200 seconds when a base film in which a pressure-sensitive adhesive layer including the pressure-sensitive adhesive after curing and having a thickness of 50 ⁇ m is formed on one surface thereof is adhered to a glass plate having an adhesive area of 1 cm 2 and aged for 24 hours, and then an 1 kg load is applied thereto at 80° C. for 1000 seconds.
- the base film may be, but is not particularly limited to, for example, a polyethyleneterephthalate (PET) film.
- 1000 seconds may refer to the time when a time for applying a weight of 1 kg is 0 second.
- ⁇ X may be expressed as X 200 ⁇ X 50 , and X 200 may refer to a creeping distance at the time of 200 seconds, and X 50 may refer to a creeping distance at the time of 50 seconds.
- a high temperature and high humidity test is performed.
- a method of determining reliability of a pressure-sensitive adhesive at a high temperature a retention test may be used, and a creeping distance measured using a creep test may represent crosslinking properties, and thus a long-term high temperature and high humidity test result may be expected.
- the creeping distance represented by Equation 1 may be 0.3 mm or less, for example, 0.01 to 0.3, 0.015 to 0.35, or 0.02 to 0.3 mm.
- the creeping distance is a value of high temperature retention of a pressure-sensitive adhesive layer including the pressure-sensitive adhesive at a high temperature of 80° C., which may be an index for desired reliability and optical characteristic realized by a pressure-sensitive adhesive. That is, in the present invention, a crosslinking structure and a degree of crosslinking may be ensured in a suitable range, thereby controlling the creeping distance to 0.3 mm or less, and particularly, when the pressure-sensitive adhesive film is applied to an organic electronic device, excellent moisture barrier characteristic, reliability, and optical characteristic may be realized.
- the pressure-sensitive adhesive film may have a loss factor (tan ⁇ ) of 0.25 to 0.45, 0.27 to 0.43, or 0.30 to 0.40 at 25° C. and a frequency of 1 Hz.
- the pressure-sensitive adhesive film may have a loss factor (tan ⁇ ) of 0.05 to 0.25, 0.07 to 0.23, or 0.1 to 0.2 at 80° C. and a frequency of 1 Hz. That is, since the tan ⁇ has a value of loss modulus G′′/storage modulus G′, a high temperature retention of the pressure-sensitive adhesive composition of the present invention may be realized by controlling the loss factor in a specific range according to the suitable ranges of the crosslinking structure and crosslinking degree.
- the storage modulus and loss modulus may be measured by a viscoelasticity test according to a specified test method such as JIS.
- the pressure-sensitive adhesive film according to the present invention may have a water vapor transmission rate (WVTR) measured in a thickness direction of the film at 100° F. and a relative humidity of 100% of 50, 40, 30, 20, or 10 g/m 2 ⁇ day or less.
- WVTR water vapor transmission rate
- an encapsulation or capsulation structure that can stably protect an element by effectively blocking moisture or oxygen from penetrating from an external environment may be realized when being applied to the encapsulation or capsulation structure of the electronic device.
- the WVTR is decreased, an excellent moisture barrier ability may be exhibited, and thus the lower limit may be, but is not particularly limited to, for example, 0 g/m 2 ⁇ day.
- the pressure-sensitive adhesive film may have an excellent light transmittance with respect to the visible-ray region.
- the pressure-sensitive adhesive film of the present invention may have a light transmittance of 85% or more with respect to the visible-ray region.
- the pressure-sensitive adhesive film may have a light transmittance of 85, 87, or 90% or more with respect to the visible-ray region.
- the pressure-sensitive adhesive film may have excellent light transmittance and a low haze.
- the pressure-sensitive adhesive film may have a haze of 3, 2, 1, 0.8, 0.5, or 0.3% or less.
- the light transmittance of the pressure-sensitive adhesive film is measured at 550 nm using a UV-Vis spectrometer, and the haze of the pressure-sensitive adhesive film is measured using a haze meter according to a JIS K7105 standard test method.
- the pressure-sensitive adhesive film of the present invention may have excellent reliability at high temperature and high humidity and excellent optical characteristics due to satisfying the creeping distance according to Equation 1 as described above.
- the pressure-sensitive adhesive film of the present invention may include a pressure-sensitive adhesive, which may be layered.
- a pressure-sensitive adhesive composition constituting the pressure-sensitive adhesive may be formed using various known materials as long as satisfying the above-describe physical properties.
- the pressure-sensitive adhesive composition may include an encapsulating resin and a multifunctional active energy ray-polymerizable compound that can be polymerized by irradiation with an active energy ray.
- the encapsulating resin may have a glass transition temperature of less than 0, ⁇ 10, ⁇ 30, ⁇ 50, or ⁇ 60° C.
- the glass transition temperature may refer to a glass transition temperature after a UV ray is irradiated at a dose of approximately 1 J/cm 2 or more, or a glass transition temperature after thermal curing is additionally performed after UV irradiation.
- the encapsulating resin may include a styrene-based resin or elastomer, a polyolefin-based resin or elastomer, other elastomers, a polyoxyalkylene-based resin or elastomer, a polyester-based resin or elastomer, a polyvinylchloride-based resin or elastomer, a polycarbonate-based resin or elastomer, a polyphenylenesulfide-based resin or elastomer, a mixture of hydrocarbon, a polyamide-based resin or elastomer, an acrylate-based resin or elastomer, an epoxy-based resin or elastomer, a silicon-based resin or elastomer, a fluorine-based resin or elastomer, or a mixture thereof.
- the styrene-based resin or elastomer may be, for example, a styrene-ethylene-butadiene-styrene (SEBS) block copolymer, a styrene-isoprene-styrene (SIS) block copolymer, an acrylonitrile-butadiene-styrene (ABS) block copolymer, an acrylonitrile-styrene-acrylate (ASA) block copolymer, a styrene-butadiene-styrene (SBS) block copolymer, a styrene-based homopolymer, or a mixture thereof.
- SEBS styrene-ethylene-butadiene-styrene
- SIS styrene-isoprene-styrene
- ABS acrylonitrile-butadiene-styrene
- ASA acrylon
- the olefin-based resin or elastomer may be, for example, a high density polyethylene-based resin or elastomer, a low density polyethylene-based resin or elastomer, a polypropylene-based resin or elastomer, or a mixture thereof.
- the elastomer may be, for example, an ester-based thermoplastic elastomer, an olefin-based elastomer, a silicon-based elastomer, an acrylic elastomer, or a mixture thereof.
- the olefin-based thermoplastic elastomer may be a polybutadiene resin or elastomer or a polyisobutylene resin or elastomer.
- the polyoxyalkylene-based resin or elastomer may be, for example, a polyoxymethylene-based resin or elastomer, a polyoxyethylene-based resin or elastomer, or a mixture thereof.
- the polyester-based resin or elastomer may be, for example, a polyethylene terephthalate-based resin or elastomer, a polybutylene terephthalate-based resin or elastomer, or a mixture thereof.
- the polyvinylchloride-based resin or elastomer may be, for example, polyvinylidene chloride.
- the mixture of hydrocarbon may be, for example, hexatriacontane or paraffin.
- the polyamide-based resin or elastomer may be, for example, nylon.
- the acrylate-based resin or elastomer may be, for example, polybutyl(meth)acrylate.
- the epoxy-based resin or elastomer may be, for example, a bisphenol-type such as a bisphenol A-type, a bisphenol F-type, a bisphenol S-type, and a hydrogenated product thereof; a novolac-type such as a phenolnovolac-type or a cresolnovolac-type; a nitrogen-containing ring-type such as a triglycidylisocyanurate-type or a hydantoin-type; an alicyclic-type; an aliphatic-type; an aromatic-type such as a naphthalene-type or a biphenyl-type; a glycidyl-type such as a glycidylether-type, a glycidylamine
- the silicon-based resin or elastomer may be, for example, polydimethylsiloxane.
- the fluorine-based resin or elastomer may be a polytrifluoroethylene resin or elastomer, a polytetrafluoroethylene resin or elastomer, a polychlorotrifluoroethylene resin or elastomer, a polyhexafluoropropylene resin or elastomer, polyvinylidene fluoride, polyvinyl fluoride, polyethylenepropylene fluoride, or a mixture thereof.
- the above-listed resins or elastomers may be grafted to, for example, maleic anhydride, copolymerized with another one of the listed resins or elastomers or a monomer for preparing the resin or elastomer, or modified by a compound, other than the above-used resins or elastomers.
- the compound may be a carboxyl-terminated butadiene-acrylonitrile copolymer.
- the pressure-sensitive adhesive composition is an encapsulating resin, which may include an olefin-based elastomer, a silicon-based elastomer, or an acrylic elastomer of the above-described types, but the present invention is not limited thereto.
- the encapsulating resin may be a copolymer of a diene and an olefin-based compound having one carbon-carbon double bond.
- the olefin-based compound may include isobutylene, propylene, or ethylene
- the diene may be a monomer capable of being polymerized with the olefin-based compound, for example, 1-butene, 2-butene, isoprene, or butadiene.
- the encapsulating resin of the present invention may be, for example, a homopolymer of an isobutylene monomer; a copolymer prepared by copolymerizing an isobutylene monomer with a monomer capable of being polymerized therewith; or a mixture thereof.
- the copolymer of the diene and the olefin-based compound having one carbon-carbon double bond may be a butyl rubber.
- the resin or elastomer component may have a weight average molecular weight (Mw) to an extent that the pressure-sensitive adhesive composition can be plasticized in a film shape.
- the resin or elastomer may have a weight average molecular weight (Mw) of approximately 100,000 to 2,000,000, 100,000 to 1,500,000, or 100,000 to 1,000,000.
- the term “weight average molecular weight” used herein refers to a converted value with respect to standard polystyrene measured by gel penetration chromatography (GPC).
- GPC gel penetration chromatography
- the resin or elastomer component does not necessarily have the above-mentioned weight average molecular weight.
- a separate binder resin may be blended into the pressure-sensitive adhesive composition.
- the pressure-sensitive adhesive composition of the present invention may have a high compatibility with an encapsulating resin, and include an active energy ray-polymerizable compound that can form a specific crosslinking structure with the encapsulating resin.
- the crosslinking structure may be a crosslinking structure formed by application of heat, a crosslinking structure formed by irradiation of an active energy ray, or a crosslinking structure formed by aging at room temperature.
- a microwave an infrared (IR) ray, an ultraviolet (UV) ray, an X ray, and a gamma ray
- a particle beam such as an alpha-particle beam, a proton beam, a neutron beam, or an electron beam
- an UV ray and an electron beam may be included.
- the pressure-sensitive adhesive composition of the present invention may include a multifunctional active-energy ray-polymerizable compound that can be polymerized by irradiation of an active energy ray with the encapsulating resin.
- the active energy ray-polymerizable compound may refer to, for example, a compound including at least two of functional groups that can participate in a polymerization reaction by irradiation of an active energy ray, for example, a functional group including an ethylene-like unsaturated double bond such as an acryloyl group or a methacryloyl group, and a functional group such as an epoxy group or an oxetane group.
- multifunctional active energy ray-polymerizable compound for example, a multifunctional acrylate (MFA) may be used.
- MFA multifunctional acrylate
- the multifunctional active energy ray-polymerizable compound that can be polymerized by the irradiation of an active energy ray may satisfy Formula 1.
- the active energy ray-polymerizable compound may be included at 5 to 30, 5 to 25, 8 to 20, 10 to 18, or 12 to 18 parts by weight relative to 100 parts by weight of the encapsulating resin.
- R 1 is hydrogen or an alkyl group having 1 to 4 carbon atoms
- n is an integer of 2 or more
- X is a residue derived from a linear, branched, or cyclic alkyl group having 3 to 30 carbon atoms.
- X is a residue derived from a cyclic alkyl group
- X may be, for example, a residue derived from a cyclic alkyl group having 3 to 30, 6 to 28, 8 to 22, or 12 to 20 carbon atoms.
- X when X is a residue derived from a linear alkyl group, X may be a residue derived from a linear alkyl group having 3 to 30, 6 to 25, or 8 to 20 carbon atoms.
- X is a residue derived from a branched alkyl group
- X may be a residue derived from a branched alkyl group having 3 to 30, 5 to 25, or 6 to 20 carbon atoms.
- residue derived from an alkyl group used herein may refer to a residue of a specific compound composed of an alkyl group.
- X when n is 2, X may be an alkylene group.
- n when n is 3 or more, at least two hydrogen atoms are released from the alkyl group, and therefore X may bind to a (meth)acryloyl group of Formula 1.
- alkyl group used herein may refer to, unless particularly defined otherwise, an alkyl group having 1 to 30, 1 to 25, 1 to 20, 1 to 16, 1 to 12, 1 to 8, or 1 to 4 carbon atoms.
- the alkyl group may have a linear, branched, or cyclic structure, and may be optionally substituted by at least one substituent.
- alkylene group used herein may be, unless particularly defined otherwise, an alkylene group having 2 to 30, 2 to 25, 2 to 20, 2 to 16, 2 to 12, 2 to 10, or 2 to 8 carbon atoms.
- the alkylene group may have a linear, branched, or cyclic structure, and may be optionally substituted by at least one substituent.
- the multifunctional active energy ray-polymerizable compound that can be polymerized by the irradiation of an active energy ray may be any compound satisfying Formula 1 without limitation.
- the compound may be 1,4-butanediol di(meth)acrylate, 1,3-butylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate, 1,12-dodecanediol di(meth)acrylate, neopentylglycol di(meth)acrylate, dicyclopentanyl di(meth)acrylate, cyclohexane-1,4-dimethanol di(meth)acrylate, tricyclodecanedimethanol (meth)diacrylate, dimethylol dicyclopentane di(meth)acrylate, neopentylglycol modified trimethylpropane di(meth)acryl
- the multifunctional active energy ray-polymerizable compound for example, a compound having a molecular weight of less than 1,000 and including at least two functional groups may be used.
- the molecular weight may refer to a weight average molecular weight or a conventional molecular weight.
- a cyclic structure included in the multifunctional active energy ray-polymerizable compound may be any one of a carbocyclic structure, a heterocyclic structure, a monocyclic structure, and a polycyclic structure.
- the pressure-sensitive adhesive composition may include a silane compound satisfying Formula 2:
- R 1 is hydrogen or an alkyl group.
- R 1 may be, for example, an alkyl group having 1 to 4 or 1 to 2 carbon atoms.
- R 2 and R 3 are each independently hydrogen, or a linear, branched, or cyclic alkyl group, or R 2 is linked with R 3 , thereby forming a cyclic alkyl group.
- R 2 and R 3 may be each independently hydrogen, or a linear, branched, or cyclic alkyl group.
- the linear alkyl group may have 1 to 10, 1 to 6, or 1 to 4 carbon atoms
- the branched alkyl group may have 3 to 10, 3 to 6, or 3 to 4 carbon atoms
- the cyclic alkyl group may have 3 to 10, 3 to 8, 3 to 6, or 3 to 4 carbon atoms.
- R 2 may be linked with R 3 , thereby forming a cyclic alkyl group having 2 to 10, 3 to 10, 4 to 9, or 4 to 8 carbon atoms.
- R 4 , R 5 , and R 6 may be each independently hydrogen, an alkyl group, or an alkoxy group, at least one of R 4 , R 5 , and R 6 is an alkoxy group, and n is an integer of 1 or more.
- R 4 , R 5 , and R 6 may be each independently an alkyl group having 1 to 10, 1 to 6, 1 to 4, or 1 to 2 carbon atoms; or an alkoxy group having 1 to 10, 1 to 8, 1 to 4, or 1 to 2 carbon atoms.
- at least one of R 4 , R 5 , and R 6 may be an alkoxy group, and all of R 4 , R 5 , and R 6 may be alkoxy groups, but the present invention is not limited thereto.
- alkoxy group used herein may be, unless particularly defined otherwise, an alkoxy group having 1 to 20, 1 to 16, 1 to 12, 1 to 8, or 1 to 4 carbon atoms.
- the alkoxy group may be a linear, branched, or cyclic type.
- the alkoxy group may be optionally substituted by at least one substituent.
- the silane compound is not particularly limited, as long as it satisfies Formula 2, and may be, for example, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxy propyl triethoxysilane, 3-acryloxy propyl trimethoxysilane, 3-acryloxy propyl triethoxysilane, 3-methacryloxy methyl triethoxysilane, 3-methacryloxy methyl trimethoxysilane, 3-acryloxy propyl methyldimethoxysilane, methacryloxy methyl methyldimethoxysilane, methacryloxy methyl methyldiethoxysilane, methacryloxy propyl methyldimethoxysilane, methacryloxy propyl methyldiethoxysilane, methacryloxy propyl dimethylmethoxysilane, or methacryloxy propyl dimethylethoxysilane.
- An acryl group of the silane compound may serve to increase an interface pressure-sensitive adhesive strength by being crosslinked with the encapsulating resin or active energy ray-polymerizable compound of the pressure-sensitive adhesive composition.
- the silane compound may be included at, for example, 0.1 to 10, 0.5 to 8, 0.8 to 5, 1 to 5, 1 to 4.5, or 1 to 4 parts by weight relative to 100 parts by weight of the encapsulating resin.
- the active energy ray-polymerizable compound may form a crosslinking structure with the silane compound satisfying Formula 2, and the crosslinking structure may form a semi-interpenetrating polymer network (semi-IPN) with the encapsulating resin.
- the pressure-sensitive adhesive composition may include a semi-IPN.
- semi-IPN includes at least one polymer crosslinking structure (polymer network) and at least one linear or branched polymer, and at least a part of the linear or branched polymer has a structure penetrating into the polymer crosslinking structure.
- the semi-IPN may be distinguished from an IPN structure since the linear or branched polymer can be theoretically separated from the polymer crosslinking structure without loss of a chemical bond.
- the crosslinking structure may be a crosslinking structure formed by application of heat, a crosslinking structure formed by irradiation of an active energy ray, or a crosslinking structure formed by aging at room temperature.
- a microwave, an infrared (IR) ray, an ultraviolet (UV) ray, an X ray, and a gamma ray, and a particle beam such as an alpha-particle beam, a proton beam, a neutron beam, or an electron beam and conventionally, an UV ray and an electron beam may be included.
- a mechanical property such as processability of the pressure-sensitive adhesive composition may be increased, a humidity-resistant adhesive performance is improved, transparency is realized, and previously unattainable high moisture barrier performance and an excellent panel life span may be realized.
- the active energy ray-polymerizable compound may form a crosslinking structure with the silane compound satisfying Formula 2
- the encapsulating resin may form a crosslinking structure with the active energy ray-polymerizable compound or the silane compound satisfying Formula 2, thereby forming an interpenetrating polymer network (IPN) structure.
- IPN structure refers to a state in which at least two crosslinking structures are present in a pressure-sensitive adhesive.
- the IPN structure may refer to a structure including at least two crosslinking structures in an intertwining, entanglement, or penetrating state.
- the composition of the present invention may include a crosslinking structure of an encapsulating resin (hereinafter, referred to as a “first crosslinking structure”) and a crosslinking structure formed by a reaction of an active energy ray-polymerizable compound and the silane compound satisfying Formula 2 (hereinafter, referred to as a “second crosslinking structure”), and the first and second crosslinking structures may be in a penetrating state or an entanglement state.
- first crosslinking structure an encapsulating resin
- second crosslinking structure formed by a reaction of an active energy ray-polymerizable compound and the silane compound satisfying Formula 2
- the pressure-sensitive adhesive composition includes a semi-IPN or IPN structure in a crosslinked state
- excellent durability and reliability of a pressure-sensitive adhesive may be realized under harsh conditions such as high temperature and high humidity by increasing a pressure-sensitive adhesive strength of a pressure-sensitive adhesive at high temperature and high humidity and preventing a decrease in an interface pressure-sensitive adhesive strength due to moisture penetration.
- the pressure-sensitive adhesive composition may further include a radical initiator that can induce a polymerization reaction of the above-described active energy ray-polymerizable compound.
- the radical initiator may be a photoinitiator or a thermal initiator.
- a specific type of the photoinitiator may be suitably selected in consideration of a curing rate and possibility of yellowing.
- a benzoin-, hydroxy ketone-, amino ketone-, or phosphine oxide-based photoinitiator and specifically, benzoin, benzoin methylether, benzoin ethylether, benzoin isopropylether, benzoin n-butylether, benzoin isobutylether, acetophenone, dimethylamino acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propane-1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl)ketone, benzophenone, p-phenylbenzophenone, 4,4′-diethyla
- the radical initiator may be included at 0.2 to 20 parts by weight relative to 100 parts by weight of the active energy ray-polymerizable compound. Accordingly, the reaction of the active energy ray-polymerizable compound is effectively induced, and degradation of physical properties of the pressure-sensitive adhesive composition due to remaining components after curing may be prevented.
- the pressure-sensitive adhesive composition may further include a tackifier.
- the tackifier may be a hydrogenated cyclic olefin-based polymer.
- a hydrogenated petroleum resin obtained by hydrogenating a petroleum resin may be used.
- the hydrogenated petroleum resin may be partially or completely hydrogenated, and may be a mixture of such resins.
- Such a tackifier may have a high compatibility with the pressure-sensitive adhesive composition, excellent moisture barrier ability, and a small content of an organic volatile component.
- a specific example of the hydrogenated petroleum resin may be a hydrogenated terpene-based resin, a hydrogenated ester-based resin, or a hydrogenated dicyclopentadiene-based resin.
- the tackifier may have a weight average molecular weight of approximately 200 to 5,000.
- a content of the tackifier may be suitably controlled as needed.
- the content of the tackifier may be selected in consideration of a gel content that will be described below.
- the tackifier may be included at 5 to 100 parts by weight relative to 100 parts by weight of a solid content of the pressure-sensitive adhesive composition.
- the pressure-sensitive adhesive composition may further include a moisture absorbent when needed.
- moisture absorbent may refer to a material that can remove moisture or vapor penetrating into a pressure-sensitive adhesive film to be described below through a chemical reaction.
- a moisture absorbent may not be satisfied in the formation in a film, but instead, an excellent moisture barrier ability may be realized.
- the pressure-sensitive adhesive composition may be formed in a film to be applied to encapsulation of an organic electronic device.
- the pressure-sensitive adhesive composition when it does not include a moisture absorbent and exhibits excellent transparency, it may be applied to encapsulation of a top-emissive organic electronic device, or when the pressure-sensitive adhesive composition includes a moisture absorbent and exhibits excellent moisture barrier ability, it may be applied to encapsulation of a bottom-emissive organic electronic device.
- the present invention is not limited thereto. That is, when the pressure-sensitive adhesive composition does not include a moisture absorbent and exhibits excellent transparency, it may be applied to encapsulation of a bottom-emissive organic electronic device.
- the moisture absorbent may be present while being uniformly dispersed in the pressure-sensitive adhesive composition or pressure-sensitive adhesive film to be described below.
- the uniformly dispersed state may mean a state in which the moisture absorbent is present even in any part of the pressure-sensitive adhesive composition or the pressure-sensitive adhesive film at the same or substantially the same density.
- a metal oxide, a sulfate, or an organic metal oxide may be used.
- the sulfate may be magnesium sulfate, sodium sulfate, or nickel sulfate
- the organic metal oxide may be aluminum oxide octylate.
- the metal oxide may be phosphorus pentoxide (P 2 O 5 ), lithium oxide (Li 2 O), sodium oxide (Na 2 O), barium oxide (BaO), calcium oxide (CaO), or magnesium oxide (MgO), and the metal salt may be a sulfate such as lithium sulfate (Li 2 SO 4 ), sodium sulfate (Na 2 SO 4 ), calcium sulfate (CaSO 4 ), magnesium sulfate (MgSO 4 ), cobalt sulfate (CoSO 4 ), gallium sulfate (Ga 2 (SO 4 ) 3 ), titanium sulfate (Ti(SO 4 ) 2 ), or nickel sulfate (NiSO 4 ); a metal halide such as calcium chloride (CaCl 2 ), magnesium chloride (MgCl 2 ), strontium chloride (SrCl 2 ), yttrium chloride (YCl 3 ), copper chloride (Cu
- Such a moisture absorbent may be controlled in a suitable size according to its use.
- an average diameter of the moisture absorbent may be controlled to approximately 10 to 15000 nm.
- a moisture absorbent having the above range of the average diameter may be easily stored due to a not too high reaction speed with moisture, and may effectively remove moisture without damage to an element to be encapsulated.
- a content of the moisture absorbent may be suitably selected without particular limitation in consideration of a desired barrier characteristic.
- the pressure-sensitive adhesive composition may further include a moisture blocker when needed.
- moisture blocker used herein may refer to a material that can block or prevent migration of moisture or vapor in a film while having little or no reactivity with moisture.
- As the moisture blocker one or at least two of clay, talc, a pin-type silica, a planar silica, a porous silica, zeolite, titania, and zirconia may be used.
- a surface of the water blocker may be treated with an organic modifier to facilitate penetration of an organic material.
- organic modifier for example, dimethyl benzyl hydrogenated tallow quaternary ammonium, dimethyl hydrogenated tallow quaternary ammonium, methyl tallow bis-2-hydroxyethyl quaternary ammonium, dimethyl hydrogenated tallow 2-ethylhexyl quaternary ammonium, dimethyl dehydrogenated tallow quaternary ammonium, or a mixture thereof may be used.
- a content of the moisture blocker may be suitably selected without particular limitation in consideration of a desired blocking characteristic.
- the pressure-sensitive adhesive composition may include a curable material, a crosslinking agent, or a filler at a suitable range of content according to a desired physical property.
- the pressure-sensitive adhesive film including a pressure-sensitive adhesive of the present invention may have a gel content represented by Equation 2 of 50% or more.
- Gel content (wt %) B/A ⁇ 100 [Equation 2]
- Equation 2 A is a mass of the pressure-sensitive adhesive, and B is a dry mass of an insoluble content of the pressure-sensitive adhesive remaining after being dipped in toluene at 60° C. for 24 hours and filtered through a 200-mesh sieve (pore size of 200 ⁇ m).
- the gel content represented by Equation 2 may be 50 to 99%, 50 to 90%, 50 to 80%, or 50 to 70%. That is, in the present invention, a pressure-sensitive adhesive composition having an excellent moisture barrier characteristic, reliability, and optical characteristic may be realized by determining a crosslinking structure and the degree of crosslinking in a suitable range of the pressure-sensitive adhesive composition through a gel content.
- the pressure-sensitive adhesive film may be formed in a monolayer structure as described above, or may be formed of at least two layers that will be described below.
- the pressure-sensitive adhesive film may include a first layer including the above-described pressure-sensitive adhesive and a second layer including a pressure-sensitive adhesive resin or an adhesive resin.
- the pressure-sensitive adhesive resin or adhesive resin included in the second layer may be the same as or different from the above-described encapsulating resin, and may be suitably selected by one of ordinary skill in the art according to a purpose.
- each of the first and second layers may or may not include a moisture absorbent.
- the adhesive resin included in the second layer may exhibit an adhesive property by curing, and include a curable resin including at least one heat-curable functional group such as a glycidyl group, an isocyanate group, a hydroxyl group, a carboxyl group or an amide group, or at least one electromagnetic wave-curable functional group such as an epoxide group, a cyclic ether group, a sulfide group, an acetal group, or a lactone group.
- a specific type of such a resin may be, but is not limited to, an acryl resin, a polyester resin, an isocyanate resin, or an epoxy resin.
- an aromatic or aliphatic, or linear or branched epoxy resin may be used as the curable resin.
- an epoxy resin containing at least two functional groups and having an epoxy equivalent of 180 to 1,000 g/eq may be used as the curable resin.
- characteristics of the cured product such as adhesive performance and a glass transition temperature may be effectively maintained.
- Such an epoxy resin may be one or a mixture of at least two of a cresol novolac epoxy resin, a bisphenol A-type epoxy resin, a bisphenol A-type novolac epoxy resin, a phenol novolac epoxy resin, a tetrafunctional epoxy resin, a biphenyl-type epoxy resin, a triphenol methane-type epoxy resin, an alkyl-modified triphenol methane epoxy resin, a naphthalene-type epoxy resin, a dicyclopentadiene-type epoxy resin, and a dicyclopentadiene modified phenol-type epoxy resin.
- the second layer may include another component such as the above-described active energy ray-polymerizable compound, radical initiator, tackifier, moisture absorbent, moisture blocker, dispersing agent, or silane compound, which may be the same as or different from that of the first layer, in addition to the above-described resin.
- the second layer may include a curable material, a curing agent, or a filler in a suitable range of content according to a desired physical property.
- a sequence of laminating the first and second layers is not particularly limited, and thus the second layer may be formed on the first layer, or the first layer may be formed on the second layer.
- the pressure-sensitive adhesive film may be formed of at least three layers, and for example, the first layer may include at least two layers, or the second layer may include at least two layers.
- the pressure-sensitive adhesive film may include a barrier film formed on one surface of a pressure-sensitive adhesive.
- the barrier film may be formed of any material generally used in the art without limitation.
- the barrier film may include a base layer, an organic undercoating layer, an inorganic deposition layer, and an organic top-coating layer, and the organic top-coating layer may be in contact with the pressure-sensitive adhesive.
- the pressure-sensitive adhesive film may further include a base film or release film (hereinafter, can be referred to as a “first film”), and the pressure-sensitive adhesive may be formed on the base or release film.
- the structure may further include a base or release film formed on the pressure-sensitive adhesive (hereinafter, can be referred to as a “second film”).
- FIGS. 1 and 2 are cross-sectional views of exemplary pressure-sensitive adhesive films.
- a pressure-sensitive adhesive film 1 may include a pressure-sensitive adhesive 11 formed on a base or release film 12 .
- Another exemplary pressure-sensitive adhesive film 2 may further include a base or release film 21 formed on a pressure-sensitive adhesive layer 11 .
- the pressure-sensitive adhesive film may also have the pressure-sensitive adhesive composition without a supporting base such as a base or release film, and therefore have a structure only including a pressure-sensitive adhesive formed in a film or sheet maintaining a solid phase or a semi-solid phase at room temperature, or a structure in which a pressure-sensitive adhesive is formed on both surfaces of one base or release film.
- the first film is not particularly limited.
- a plastic film may be used as the first film.
- the first film may be a polyethyleneterephthalate film, a polytetrafluoroethylene film, a polyethylene film, a polypropylene film, a polybutene film, a polybutadiene film, a vinyl chloride copolymer film, a polyurethane film, an ethylene-vinyl acetate film, an ethylene-propylene copolymer film, an ethylene-ethyl acrylate copolymer film, an ethylene-methyl acrylate copolymer film, or a polyimide film.
- suitable release treatment may be performed on one or both surfaces of such a plastic film.
- a releasing agent used for release treatment an alkyd-based releasing agent, a silicon-based releasing agent, a fluorine-based releasing agent, an unsaturated ester-based releasing agent, a polyolefin-based releasing agent, or a wax-based releasing agent may be used.
- an alkyd-based releasing agent, a silicon-based releasing agent, or a fluorine-based releasing agent among the above examples is conventionally used, but the present invention is not limited thereto.
- a plastic film in which a gas barrier layer is formed on a top or side surface of a base may be used.
- Such a film may directly constitute, for example, a substrate of an organic electronic device to be used for realizing a flexible element.
- a type of the second film is not particularly limited, either.
- the second film one that is the same as or different from the first film illustrated in the category of the first film described above may be used.
- a thickness of the first or second film is not particularly limited.
- the thickness of the first film may be approximately 50 to 500 or 100 to 200 ⁇ m. In such a range, a process of preparing or manufacturing a pressure-sensitive adhesive or an organic electronic device may be effectively automated, and advantageous effects in economic feasibility may be achieved.
- the thickness of the second film is not particularly limited, either.
- the thickness of the second film may be the same as, or relatively smaller or larger than that of the first film.
- the pressure-sensitive adhesive of the pressure-sensitive adhesive film includes the pressure-sensitive adhesive composition, and is formed in a film or sheet.
- the pressure-sensitive adhesive composition in the pressure-sensitive adhesive may be in a crosslinked or non-crosslinked state.
- the pressure-sensitive adhesive may be in a solid or semi-solid phase at room temperature.
- a curable pressure-sensitive adhesive resin included in the solid or semi-solid pressure-sensitive adhesive may not be crosslinked.
- Such a pressure-sensitive resin may form a crosslinking structure in an encapsulation structure of an organic electronic element which will be described below.
- a thickness of the pressure-sensitive adhesive is not particularly limited, and may be suitably selected in consideration of its uses.
- the pressure-sensitive adhesive may have a thickness of approximately 5 to 200 ⁇ m.
- the thickness of the pressure-sensitive adhesive may be controlled in consideration of, for example, embeddability when being used as an encapsulant of an organic electronic element and processability or economic feasibility.
- the present invention provides a method of manufacturing a pressure-sensitive adhesive film.
- the exemplary pressure-sensitive adhesive film may be manufactured by plasticizing the pressure-sensitive adhesive composition in a film or sheet.
- the method may include applying a coating solution including the pressure-sensitive adhesive composition on a base or release film in the form of a sheet or film, and drying the applied coating solution.
- the method may further include adhering an additional base or release film to the dried coating solution.
- the coating solution including the pressure-sensitive adhesive composition may be prepared by, for example, dissolving or dispersing components of the pressure-sensitive adhesive composition described above in a suitable solvent.
- the pressure-sensitive adhesive composition may be prepared by dissolving or dispersing the moisture absorbent, blocker, or filler in a solvent when needed, grinding the resulting product, and mixing the moisture absorbent, blocker, or filler with an encapsulating resin.
- a type of a solvent used in preparation of the coating solution is not particularly limited.
- a solvent having a volatile temperature of 150° C. or less may be used.
- a small amount of the solvent having the above range of the volatile temperature may be used.
- the solvent may be, but is not limited to, one or at least two of methylethylketone (MEK), acetone, toluene, dimethyl formamide (DMF), methyl cellosolve (MCS), tetrahydrofuran (THF), xylene, and N-methylpyrrolidone (NMP).
- MEK methylethylketone
- DMF dimethyl formamide
- MCS methyl cellosolve
- THF tetrahydrofuran
- xylene xylene
- NMP N-methylpyrrolidone
- a method of applying the coating solution to the base or release film may be, but is not particularly limited to, a known coating method such as knife coating, roll coating, spray coating, gravure coating, curtain coating, comma coating, or lip coating.
- the applied coating solution may be dried to volatilize the solvent, thereby forming a pressure-sensitive adhesive.
- the drying may be performed, for example, at 70 to 150° C. for 1 to 10 minutes.
- the drying condition may be changed in consideration of a type of the used solvent.
- an additional base or release film may be formed on the pressure-sensitive adhesive.
- the present invention provides a product for encapsulating an organic electronic device.
- the product for encapsulating an organic electronic device may include a substrate; an organic electronic element formed on the substrate; and a pressure-sensitive adhesive film encapsulating an entire surface, for example, both top and side surfaces of the organic electronic element.
- the pressure-sensitive adhesive film may include a pressure-sensitive adhesive containing a pressure-sensitive adhesive composition in a crosslinked state.
- the product for encapsulating an organic electronic device may further include a cover substrate formed on a top surface of the pressure-sensitive adhesive.
- the organic electronic element may be, for example, an organic light emitting element, and in one example, may be a top-emissive organic light emitting element.
- the present invention provides a method of manufacturing an organic electronic device.
- the product for encapsulating an organic electronic device may be manufactured using, for example, the pressure-sensitive adhesive film.
- the pressure-sensitive adhesive may be formed as an encapsulating layer for a structure exhibiting excellent moisture barrier property and optical property in an organic electronic device and effectively fixing and supporting the substrate and cover substrate.
- the pressure-sensitive adhesive may exhibit excellent transparency, and may be stable regardless of a type of the organic electronic device, for example, a top-emissive or bottom-emissive organic electronic device.
- encapsulating layer used herein may refer to a pressure-sensitive adhesive covering both top and side surfaces of the organic electronic element.
- FIG. 3 is a schematic diagram of an exemplary organic electronic device in which an organic electronic element is an organic light emitting element.
- the organic electronic device for example, applying the above-described pressure-sensitive adhesive film to the substrate on which the organic electronic element is formed in order to cover the organic electronic element; and curing the pressure-sensitive adhesive film may be included.
- curing used herein may refer to preparing a pressure-sensitive adhesive by forming the pressure-sensitive adhesive composition of the present invention to have a crosslinking structure through heating or UV irradiation.
- an organic electronic element 32 may be formed by forming a transparent electrode on a glass or polymer film 31 used as a substrate by a method such as vacuum deposition or sputtering, forming layers of emissive organic materials, composed of, for example, a hole transport layer, an emitting layer, and an electron transport layer on the transparent electrode, and further forming an electrode layer thereon. Subsequently, a pressure-sensitive adhesive of the pressure-sensitive adhesive film is disposed to cover an entire surface of the organic electronic element 32 of the substrate 31 which has gone through the above-described process.
- an encapsulating layer may be formed by compressing the pressure-sensitive adhesive on the organic electronic element using a laminator while being heated to provide mobility as needed, and crosslinking a resin in the pressure-sensitive adhesive.
- a pressure-sensitive adhesive 33 disposed to cover an entire surface of the organic electronic element 32 may be previously transferred to a cover substrate 34 such as a glass or a polymer film.
- the transfer of the pressure-sensitive adhesive to the cover substrate 34 may be performed using a vacuum press or vacuum laminator while being heated after a first or second film is peeled off from the pressure-sensitive adhesive film and the pressure-sensitive adhesive is in contact with the cover substrate 34 .
- a pressure-sensitive adhesive includes a heat-curable pressure-sensitive adhesive resin and a curing reaction is excessively performed during the process, a cohesive strength or pressure-sensitive adhesive strength of the encapsulating layer is probably reduced. Therefore, a process temperature may be controlled to approximately 100° C. or less, and a process time may be controlled within 5 minutes.
- the cover substrate 34 may be the above-described barrier film, but the present invention is not limited thereto.
- An encapsulating layer may be formed by disposing the cover substrate 34 to which the pressure-sensitive adhesive is transferred on the organic electronic element 32 , and performing the heat compression process.
- An encapsulating layer may be formed by curing the pressure-sensitive adhesive 33 .
- the curing process may be performed in a suitable heating chamber or UV chamber, for example, according to a method of curing a curable pressure-sensitive adhesive resin.
- a heating condition or a condition of irradiating an active energy ray may be suitably selected in consideration of stability of the organic electronic element and curability of the pressure-sensitive adhesive resin, and to increase compression efficiency, autoclaving may also be performed with application of heat and pressure.
- the organic electronic device may be manufactured by a different method.
- a sequence or condition of the process may be changed.
- the encapsulating layer may be formed by previously transferring the pressure-sensitive adhesive to the substrate 31 , not to the cover substrate 34 , and performing a curing process while the cover substrate 34 is laminated.
- the present invention provides a pressure-sensitive adhesive film which can effectively block moisture or oxygen from penetrating into an organic electronic device from an external environment, and have reliability under severe conditions such as high temperature and high humidity and excellent optical characteristics.
- FIGS. 1 and 2 are cross-sectional views of pressure-sensitive adhesive films according to exemplary embodiments of the present invention.
- FIG. 3 is a cross-sectional view of a product for encapsulating an organic electronic device according to an exemplary embodiment of the present invention.
- a coating solution was prepared by adding 90 g of a butyl rubber (LANXESS, BUTYL 301) as an encapsulating resin, 10 g of a hydrogenated DCPD-based tackifier resin (SU-90, Kolon) as a tackifier, 15 g of tricyclodecane dimethanol diacrylate (M262, Miwon) as an active energy ray-polymerizable compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one (Irgacure651, Ciba) as a radical initiator, and diluting the mixture in toluene to have a solid content of approximately 15 wt %.
- LANXESS LANXESS, BUTYL 301
- SU-90, Kolon hydrogenated DCPD-based tackifier resin
- M262, Miwon tricyclodecane dimethanol diacrylate
- Irgacure651, Ciba 2,2-dimethoxy-1,2-diphen
- the prepared solution was coated on a released surface of release polyethyleneterephthalate (PET), and dried in an oven at 100° C. for 15 minutes, thereby manufacturing a pressure-sensitive adhesive film including a pressure-sensitive adhesive layer having a thickness of 50 ⁇ m. Physical properties of the sample were measured after a UV ray was irradiated at 2 J/cm 2 to the manufactured film.
- PET polyethyleneterephthalate
- a pressure-sensitive adhesive film was manufactured by the same method as described in Example 1, except that CaO (Aldrich) was added as a moisture absorbent at 20 parts by weight relative to 100 parts by weight of a butyl rubber and a tackifier resin.
- CaO Aldrich
- a pressure-sensitive adhesive film was manufactured by the same method as described in Example 1, except that 15 g of tricyclodecane dimethanol diacrylate (M262, Miwon) and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one (Irgacure651, Ciba) were not added and UV curing was not performed.
- M262, Miwon tricyclodecane dimethanol diacrylate
- Irgacure651, Ciba 2,2-dimethoxy-1,2-diphenylethane-1-one
- a pressure-sensitive adhesive film was manufactured by the same method as described in Example 1, except that 15 g of fumed silica (R812, Evonik) was added instead of 15 g of tricyclodecane dimethanol diacrylate (M262, Miwon) and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one (Irgacure651, Ciba).
- a coating solution (pressure-sensitive adhesive composition) was prepared by mixing 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl methacrylate, and blending a multifunctional epoxy compound (trimethylolpropane triglycidylether), a cationic photoinitiator (triarylsulfonium hexafluoroantimonate), and ⁇ -glycidoxypropyl trimethoxy silane to an acrylic pressure-sensitive adhesive having a molecular weight (Mw) of approximately 1,800,000, and diluting the resulting mixture in a suitable concentration.
- Mw molecular weight
- the prepared coating solution was coated on a released surface of release PET film in which releasing treatment was performed on one surface thereof, dried, and irradiated with a UV ray, thereby realizing a crosslinking structure. Therefore, a pressure-sensitive adhesive layer was formed to have a thickness of approximately 50 ⁇ m.
- a resin composition was prepared by dissolving the resin used in Example or Comparative Example in a solvent.
- the resin composition was applied to a base film (release polyester film, RS-21G, SKC) having a thickness of 38 ⁇ m. Subsequently, the composition was dried at 110° C. for 10 minutes, thereby forming a film-type layer having a thickness of 100 ⁇ m.
- the base film was peeled, and then a WVTR of the film-type layer was measured in a thickness direction, while the layer was maintained at 100° F. and a relative humidity of 100%.
- the WVTR was measured according to a specification of ASTM F1249.
- Example and Comparative Example The film manufactured in Example and Comparative Example was laminated on a barrier film (serving as a cover substrate), and a polarizing plate was laminated on the barrier film.
- the laminated set was laminated on a glass, and compressed with a pressure and heat using an autoclave at 50° C. and 5 atm.
- a polarizing plate was laminated again on the barrier film, and the sample was maintained in an 80° C. chamber for approximately 500 hours to observe whether lifting or bubbles were generated at an interface between the glass substrate and the pressure-sensitive adhesive layer.
- the interface between the glass substrate and the pressure-sensitive adhesive layer if at least one lifting or bubble was generated, it was represented as X, and if neither lifting nor bubble was generated, it was represented as O.
- a pressure-sensitive adhesive layer having a thickness of 50 ⁇ m which included the pressure-sensitive adhesive composition according to Example and Comparative Example, was adhered to a base film, a pressure-sensitive adhesive surface was adhered to a glass plate to have a size of 1 cm ⁇ 1 cm, and maintained at room temperature for 24 hours, and then a change in creeping distance of the pressure-sensitive adhesive layer was measured between 50 to 200 seconds when an 1 kg/f load was applied at 80° C. for 1000 seconds.
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- Inorganic Chemistry (AREA)
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Abstract
Description
ΔX≤0.3 mm [Equation 1]
Gel content (wt %)=B/A×100 [Equation 2]
TABLE 1 | ||||
Retention | ||||
at 80° C., | ||||
WVTR | Creeping | Reliability at | ||
(g/m2 · day) | distance (mm) | 80° C. | ||
Example 1 | 4 | 0.1 | ◯ |
Example 2 | 6 | 0.1 | ◯ |
Comparative Example 1 | 5 | 10< | X |
Comparative Example 2 | 4 | 10< | X |
Comparative Example 3 | >500 | 0.1 | ◯ |
Claims (11)
ΔX≤0.3 mm [Equation 1]
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PCT/KR2014/007238 WO2015020410A1 (en) | 2013-08-05 | 2014-08-05 | Adhesive film and method for manufacturing organic electronic device using same |
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