UA121864C2 - Спосіб автоматичної корекції астигматизму - Google Patents

Спосіб автоматичної корекції астигматизму Download PDF

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Publication number
UA121864C2
UA121864C2 UAA201613146A UAA201613146A UA121864C2 UA 121864 C2 UA121864 C2 UA 121864C2 UA A201613146 A UAA201613146 A UA A201613146A UA A201613146 A UAA201613146 A UA A201613146A UA 121864 C2 UA121864 C2 UA 121864C2
Authority
UA
Ukraine
Prior art keywords
image
vector
stigmator
setting
fourier spectrum
Prior art date
Application number
UAA201613146A
Other languages
English (en)
Ukrainian (uk)
Inventor
Іда-Марія Сінторн
Ида-Мария СИНТОРН
Ріккард Нордстрьом
Риккард Нордстрём
Густаф Кюльберг
Original Assignee
Інтелліджент Вайрес Іміджінг Інк.
Интеллиджент Вайрес Имиджинг Инк.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Інтелліджент Вайрес Іміджінг Інк., Интеллиджент Вайрес Имиджинг Инк. filed Critical Інтелліджент Вайрес Іміджінг Інк.
Publication of UA121864C2 publication Critical patent/UA121864C2/uk

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153Correcting image defects, e.g. stigmators
    • H01J2237/1532Astigmatism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22Treatment of data
    • H01J2237/221Image processing
    • H01J2237/223Fourier techniques

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Image Analysis (AREA)
  • Optical Head (AREA)
  • Automatic Focus Adjustment (AREA)
  • Image Processing (AREA)
UAA201613146A 2014-07-22 2015-06-17 Спосіб автоматичної корекції астигматизму UA121864C2 (uk)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462027505P 2014-07-22 2014-07-22
PCT/US2015/036117 WO2016014177A1 (en) 2014-07-22 2015-06-17 Method for automatic correction of astigmatism

Publications (1)

Publication Number Publication Date
UA121864C2 true UA121864C2 (uk) 2020-08-10

Family

ID=55163506

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA201613146A UA121864C2 (uk) 2014-07-22 2015-06-17 Спосіб автоматичної корекції астигматизму

Country Status (24)

Country Link
US (1) US9711323B2 (pt-PT)
EP (1) EP3172757B1 (pt-PT)
JP (1) JP6684717B2 (pt-PT)
KR (1) KR102193285B1 (pt-PT)
CN (1) CN106062917B (pt-PT)
AP (1) AP2016009363A0 (pt-PT)
AU (1) AU2015294547B2 (pt-PT)
BR (1) BR112016026681B1 (pt-PT)
CA (1) CA2934972C (pt-PT)
CL (1) CL2016002175A1 (pt-PT)
DK (1) DK3172757T3 (pt-PT)
EA (1) EA035058B1 (pt-PT)
ES (1) ES2776453T3 (pt-PT)
HK (1) HK1225856A1 (pt-PT)
HU (1) HUE048003T2 (pt-PT)
IL (1) IL247695B (pt-PT)
MA (1) MA39558B1 (pt-PT)
MX (1) MX2017000334A (pt-PT)
MY (1) MY181462A (pt-PT)
PL (1) PL3172757T3 (pt-PT)
PT (1) PT3172757T (pt-PT)
SG (1) SG11201606864WA (pt-PT)
UA (1) UA121864C2 (pt-PT)
WO (1) WO2016014177A1 (pt-PT)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7531930B2 (ja) 2019-08-09 2024-08-13 ザ ボード オブ リージェンツ オブ ザ ユニヴァーシティー オブ テキサス システム 高性能電子顕微鏡のための方法
CN111477529B (zh) * 2020-05-19 2024-05-14 桂林狮达技术股份有限公司 自动消像散电子枪及电子枪自动消像散方法
CN112924477B (zh) * 2021-01-23 2022-02-11 北京大学 电镜定量消除像散的方法
CN117612018B (zh) * 2024-01-23 2024-04-05 中国科学院长春光学精密机械与物理研究所 用于光学遥感载荷像散的智能判别方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180738A (en) * 1977-07-30 1979-12-25 National Research Development Corporation Astigmatism in electron beam probe instruments
JPS5775473U (pt-PT) * 1980-10-24 1982-05-10
US4695725A (en) * 1984-12-10 1987-09-22 Fuji Photo Film Co., Ltd. Method of detecting a focus defect of an electron microscope image
JPH07220669A (ja) * 1994-01-31 1995-08-18 Jeol Ltd 非点・入射軸補正装置を備えた電子顕微鏡
JP3340327B2 (ja) * 1996-09-30 2002-11-05 株式会社東芝 非点収差補正方法及び非点収差補正装置
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
JP4069545B2 (ja) * 1999-05-19 2008-04-02 株式会社日立製作所 電子顕微方法及びそれを用いた電子顕微鏡並び生体試料検査方法及び生体検査装置
US6552340B1 (en) * 2000-10-12 2003-04-22 Nion Co. Autoadjusting charged-particle probe-forming apparatus
JP3951590B2 (ja) * 2000-10-27 2007-08-01 株式会社日立製作所 荷電粒子線装置
JP3645198B2 (ja) * 2001-06-15 2005-05-11 独立行政法人理化学研究所 電子顕微鏡及びその焦点位置制御方法
US7817242B2 (en) * 2003-11-28 2010-10-19 Nikon Corporation Exposure method and device manufacturing method, exposure apparatus, and program
JP5220420B2 (ja) * 2005-01-19 2013-06-26 オプトポ インコーポレイテッド ディー/ビー/エイ センティス コーポレイション 静的マルチモードマルチプレックス分光法のための静的2次元符号化アパーチャ
US7619220B2 (en) * 2005-11-30 2009-11-17 Jeol Ltd. Method of measuring aberrations and correcting aberrations using Ronchigram and electron microscope
JP4790567B2 (ja) * 2005-11-30 2011-10-12 日本電子株式会社 ロンチグラムを用いた収差測定方法及び収差補正方法及び電子顕微鏡
WO2008035286A2 (en) * 2006-09-22 2008-03-27 Koninklijke Philips Electronics N.V. Advanced computer-aided diagnosis of lung nodules
EP2511936B1 (en) * 2011-04-13 2013-10-02 Fei Company Distortion free stigmation of a TEM
EP2584584A1 (en) * 2011-10-19 2013-04-24 FEI Company Method for adjusting a STEM equipped with an aberration corrector

Also Published As

Publication number Publication date
HK1225856A1 (zh) 2017-09-15
JP2017526101A (ja) 2017-09-07
MA39558B1 (fr) 2020-03-31
EA035058B1 (ru) 2020-04-22
SG11201606864WA (en) 2016-09-29
CN106062917A (zh) 2016-10-26
WO2016014177A1 (en) 2016-01-28
PL3172757T3 (pl) 2020-05-18
MY181462A (en) 2020-12-22
CA2934972C (en) 2022-03-22
ES2776453T3 (es) 2020-07-30
IL247695A0 (en) 2016-11-30
BR112016026681B1 (pt) 2023-01-17
CN106062917B (zh) 2018-11-27
KR102193285B1 (ko) 2020-12-22
DK3172757T3 (da) 2020-03-16
EP3172757A1 (en) 2017-05-31
EP3172757B1 (en) 2019-12-11
MX2017000334A (es) 2017-07-10
KR20170033264A (ko) 2017-03-24
US20170018396A1 (en) 2017-01-19
NZ721691A (en) 2020-09-25
PT3172757T (pt) 2020-03-23
HUE048003T2 (hu) 2020-05-28
CL2016002175A1 (es) 2016-12-23
US9711323B2 (en) 2017-07-18
JP6684717B2 (ja) 2020-04-22
AU2015294547A1 (en) 2016-07-21
IL247695B (en) 2020-06-30
EA201600651A1 (ru) 2017-07-31
CA2934972A1 (en) 2016-01-28
BR112016026681A2 (pt-PT) 2017-08-15
AP2016009363A0 (en) 2016-08-31
AU2015294547B2 (en) 2020-05-28
MA39558A1 (fr) 2018-09-28
EP3172757A4 (en) 2018-03-28

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