TWM647715U - Clamp-type transfer molding equipment - Google Patents

Clamp-type transfer molding equipment Download PDF

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Publication number
TWM647715U
TWM647715U TW112203492U TW112203492U TWM647715U TW M647715 U TWM647715 U TW M647715U TW 112203492 U TW112203492 U TW 112203492U TW 112203492 U TW112203492 U TW 112203492U TW M647715 U TWM647715 U TW M647715U
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Taiwan
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clamp
transfer molding
molding equipment
type transfer
photoresist
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TW112203492U
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Chinese (zh)
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林劉恭
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光群雷射科技股份有限公司
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Priority to TW112203492U priority Critical patent/TWM647715U/en
Publication of TWM647715U publication Critical patent/TWM647715U/en

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Abstract

本創作公開一種夾取式轉印模製設備,其包括一滾輪固定裝置以及間隔地設置於滾輪固定裝置的一夾具。滾輪固定裝置用來固定一金屬滾輪,並且金屬滾輪表面包覆有一基板,而夾具能用來可拆卸地夾持於基板的對應兩側,使基板穩固地設置於金屬滾輪。基板呈正方形,並且基板的邊長介於1.0米~1.5米之間,而金屬滾輪的長度介於1.6米~1.8米之間。The invention discloses a clamping type transfer molding equipment, which includes a roller fixing device and a clamp spaced apart from the roller fixing device. The roller fixing device is used to fix a metal roller, and the surface of the metal roller is covered with a base plate, and the clamp can be used to detachably clamp the corresponding two sides of the base plate so that the base plate is firmly placed on the metal roller. The base plate is square, and the side length of the base plate is between 1.0 meters and 1.5 meters, while the length of the metal roller is between 1.6 meters and 1.8 meters.

Description

夾取式轉印模製設備Clamp-on transfer molding equipment

本創作涉及一種轉印模製設備,特別是涉及一種夾取式轉印模製設備。The invention relates to a transfer molding device, in particular to a clamping transfer molding device.

現有的轉印基板在進行光刻曝光時,若是要形成有交錯的光刻圖案,則通常會將轉印基板進行轉向而後再次曝光。舉例來說,轉印基板將先沿一X軸方向曝光,而後再沿與X軸垂直的一Y軸方向進行曝光,以形成交錯的曝光圖案。When the existing transfer substrate is subjected to photolithography exposure, if a staggered photolithography pattern is to be formed, the transfer substrate is usually turned and then exposed again. For example, the transfer substrate will be exposed along an X-axis direction first, and then exposed along a Y-axis direction perpendicular to the X-axis to form a staggered exposure pattern.

然,由於現有的轉印基板在轉向後仍須再次定位,因而導致時常有定位錯誤所造成的後續曝光良率不佳的問題。故,如何通過結構設計的改良,來克服上述的缺陷,已成為該項事業所欲解決的重要課題之一。However, since the existing transfer substrate still needs to be positioned again after turning, there is often a problem of poor subsequent exposure yield caused by positioning errors. Therefore, how to overcome the above-mentioned defects through structural design improvements has become one of the important issues to be solved in this project.

本創作實施例針對現有技術的不足提供一種夾取式轉印模製設備,其能有效地改善現有的轉印基板所可能產生的缺陷。The embodiment of this invention provides a clamp-type transfer molding device to address the shortcomings of the existing technology, which can effectively improve the possible defects of the existing transfer substrate.

本創作實施例公開一種夾取式轉印模製設備,其包括:一滾輪固定裝置,用來固定一金屬滾輪,並且所述金屬滾輪表面包覆有一基板,而所述金屬滾輪是一鉻金屬滾輪;其中,所述基板呈正方形,並且所述基板的邊長介於1.0米~1.5米之間,而所述金屬滾輪的長度介於1.6米~1.8米之間;以及一夾具,間隔地設置於所述滾輪固定裝置,並且所述夾具能用來可拆卸地夾持於所述基板的對應兩側,使所述基板穩固地設置於所述金屬滾輪。This creative embodiment discloses a clamping transfer molding equipment, which includes: a roller fixing device used to fix a metal roller, and the surface of the metal roller is covered with a substrate, and the metal roller is a chromium metal Roller; wherein, the base plate is square, and the side length of the base plate is between 1.0 meters and 1.5 meters, and the length of the metal roller is between 1.6 meters and 1.8 meters; and a clamp is arranged at intervals. On the roller fixing device, the clamp can be used to detachably clamp the corresponding two sides of the base plate, so that the base plate is stably placed on the metal roller.

本創作的其中一有益效果在於,本創作所提供的所述夾取式轉印模製設備,其能通過“所述夾具間隔地設置於所述滾輪固定裝置,並且所述夾具能用來可拆卸地夾持於所述基板的對應兩側,使所述基板穩固地設置於所述金屬滾輪”的技術方案,以減少定位錯誤所造成的後續曝光良率不佳的問題。One of the beneficial effects of this invention is that the clamp-type transfer molding equipment provided by this invention can be arranged on the roller fixing device at intervals through "the clamps, and the clamps can be used to The technical solution is to detachably clamp the corresponding two sides of the substrate so that the substrate is firmly placed on the metal roller, so as to reduce the problem of poor subsequent exposure yield caused by positioning errors.

為使能更進一步瞭解本創作的特徵及技術內容,請參閱以下有關本創作的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本創作加以限制。In order to further understand the characteristics and technical content of this creation, please refer to the following detailed description and diagrams about this creation. However, the diagrams provided are only for reference and illustration and are not used to limit this creation.

以下是通過特定的具體實施例來說明本創作所公開有關“夾取式轉印模製設備”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本創作的優點與效果。本創作可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本創作的構思下進行各種修改與變更。另外,本創作的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。此外,以下如有指出請參閱特定圖式或是如特定圖式所示,其僅是用以強調於後續說明中,所述及的相關內容大部份出現於該特定圖式中,但不限制該後續說明中僅可參考所述特定圖式。以下的實施方式將進一步詳細說明本創作的相關技術內容,但所公開的內容並非用以限制本創作的保護範圍。The following is a specific embodiment to illustrate the implementation of the "clip-type transfer molding equipment" disclosed in this invention. Those skilled in the art can understand the advantages and effects of this invention from the content disclosed in this specification. This invention can be implemented or applied through other different specific embodiments, and various details in this description can also be modified and changed based on different viewpoints and applications without departing from the concept of this invention. In addition, the accompanying drawings of this creation are only simple illustrations and are not depictions based on actual size, as stated in advance. In addition, if it is pointed out below that please refer to a specific diagram or as shown in a specific diagram, it is only used to emphasize the subsequent description. Most of the relevant content mentioned appears in the specific diagram, but does not Reference in this subsequent description is limited to the specific drawings described. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the scope of protection of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as “first”, “second” and “third” may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are primarily used to distinguish one component from another component or one signal from another signal. In addition, the term "or" used in this article shall include any one or combination of more of the associated listed items depending on the actual situation.

請參閱圖1至圖3所示,其為本創作的實施例,需先說明的是,本實施例所對應到的附圖及其所提及的相關數量與外形,僅用來具體地說明本創作的實施方式,以便於了解本創作的內容,而非用來侷限本創作的保護範圍。Please refer to Figures 1 to 3, which are embodiments of the present invention. It should be noted that the drawings corresponding to this embodiment and the related quantities and shapes mentioned in this embodiment are only used for specific explanation. The implementation method of this creation is to facilitate understanding of the content of this creation, but is not used to limit the scope of protection of this creation.

如圖1所示,本創作實施例提供一種夾取式轉印模製設備100,其包括:一滾輪固定裝置1、一夾具2、一光阻噴塗裝置3、一移動裝置4、一軟烤裝置5、一光刻裝置6以及一無塵腔體7,但本創作不限於此。舉例來說,於本創作未繪示的其他實施例中,所述夾取式轉印模製設備100也可以不包含有所述軟烤裝置5以及所述無塵腔體7。As shown in Figure 1, this creative embodiment provides a clamping transfer molding equipment 100, which includes: a roller fixing device 1, a clamp 2, a photoresist spraying device 3, a moving device 4, and a soft bake Device 5, a photolithography device 6 and a dust-free chamber 7, but the invention is not limited to this. For example, in other embodiments not shown in the present invention, the clamping transfer molding equipment 100 may not include the soft baking device 5 and the dust-free cavity 7 .

以下為方便說明與理解,將依序說明所述滾輪固定裝置1、所述夾具2、所述光阻噴塗裝置3、所述移動裝置4、所述軟烤裝置5、所述光刻裝置6以及所述無塵腔體7的具體結構,並適時地說明上述各裝置之間的相對位置及作動關係。For the convenience of explanation and understanding, the roller fixing device 1, the clamp 2, the photoresist spraying device 3, the moving device 4, the soft baking device 5, and the photolithography device 6 will be described in order. And the specific structure of the dust-free chamber 7, and the relative position and operating relationship between the above-mentioned devices will be explained in a timely manner.

如圖1所示,所述滾輪固定裝置1用來固定包覆有一基板300的一金屬滾輪200,並且所述滾輪固定裝置1包含一轉動機構11及安裝於所述轉動機構11的一夾持機構12。其中,所述轉動機構11能用來安裝於所述金屬滾輪200,並且所述夾持機構12用來夾持所述金屬滾輪200,而所述金屬滾輪是一鉻金屬滾輪。進一步地說,當所述轉動機構11運作時,所述轉動機構11會轉動所述夾持機構12,使所述金屬滾輪200被所述夾持機構12轉動。As shown in Figure 1, the roller fixing device 1 is used to fix a metal roller 200 covered with a base plate 300, and the roller fixing device 1 includes a rotating mechanism 11 and a clamping device installed on the rotating mechanism 11. Institutions12. Wherein, the rotating mechanism 11 can be used to be installed on the metal roller 200, and the clamping mechanism 12 is used to clamp the metal roller 200, and the metal roller is a chromium metal roller. Furthermore, when the rotating mechanism 11 operates, the rotating mechanism 11 will rotate the clamping mechanism 12 so that the metal roller 200 is rotated by the clamping mechanism 12 .

進一步地說,所述夾持機構12包含一圓形彈性筒夾(圖未繪),並且所述夾持機構12是透過油壓驅動的方式,使所述圓形彈性筒夾可以夾持所述金屬滾輪200,但本創作並不限於此。舉例來說,所述圓形彈性筒夾也可以是車床夾頭等其他夾具,並且所述夾持機構12也可以透過氣壓驅動或手動的方式,使所述圓形彈性筒夾能夾持所述金屬滾輪200。Furthermore, the clamping mechanism 12 includes a circular elastic collet (not shown), and the clamping mechanism 12 is driven by hydraulic pressure, so that the circular elastic collet can clamp all The metal roller 200 is described, but the invention is not limited thereto. For example, the circular elastic collet can also be a lathe chuck or other clamps, and the clamping mechanism 12 can also be driven by air pressure or manually, so that the circular elastic collet can clamp all the objects. The metal roller 200 is described.

需要說明的是,所述轉動機構11還進一步包含有一速度控制器(圖未繪),其能用來使所述金屬滾輪200以介於2900轉/分鐘(RPM)至4500轉/分鐘的一甩乾速度轉動,但本創作不限於此。舉例來說,於本創作未繪示的其他實施例中,所述速度控制器也能用來使所述金屬滾輪200以介於1轉/分鐘(RPM)至25轉/分鐘的一浸潤速度轉動。It should be noted that the rotating mechanism 11 further includes a speed controller (not shown), which can be used to rotate the metal roller 200 at a speed between 2900 rpm and 4500 rpm. The spin-drying speed rotates, but this creation is not limited to this. For example, in other embodiments not shown in the present invention, the speed controller can also be used to make the metal roller 200 operate at a wetting speed ranging from 1 revolution per minute (RPM) to 25 revolutions per minute. Turn.

需要補充說明的是,於本實施例中,所述基板300主要由聚對苯二甲酸乙二酯(Polyethylene terephthalate, PET)製成,並且所述基板300的呈正方形,並且所述基板300的邊長介於1.0米~1.5米之間,但本創作並不限於此。舉例來說,於本創作的其他實施例中,所述基板300也可以是由具有透明特性的任一樹脂製成。此外,於本實施例中,所述金屬滾輪200的長度介於1.6米~1.8米之間,並且所述金屬滾輪200較佳鉻金屬滾輪。It should be supplemented that in this embodiment, the substrate 300 is mainly made of polyethylene terephthalate (PET), and the substrate 300 is square, and the substrate 300 is The side length is between 1.0 meters and 1.5 meters, but this creation is not limited to this. For example, in other embodiments of the present invention, the substrate 300 can also be made of any resin with transparent characteristics. In addition, in this embodiment, the length of the metal roller 200 is between 1.6 meters and 1.8 meters, and the metal roller 200 is preferably a chromium metal roller.

所述滾輪固定裝置1介紹至此,以下將開始介紹所述夾具2。如圖1至圖3所示,所述夾具2間隔地設置於所述滾輪固定裝置1,並且所述夾具2能用來可拆卸地夾持於所述基板300的對應兩側,使所述基板300穩固地設置於所述金屬滾輪200。The roller fixing device 1 has been introduced so far, and the clamp 2 will be introduced below. As shown in FIGS. 1 to 3 , the clamps 2 are arranged at intervals on the roller fixing device 1 , and the clamps 2 can be used to detachably clamp the corresponding two sides of the base plate 300 so that the The base plate 300 is firmly mounted on the metal roller 200 .

進一步地說,於本實施例中,所述夾具2呈長條狀,並且所述夾具2的長度略大於所述基板300的邊長,而所述夾具2的長度小於所述金屬滾輪200的長度。此外,於本創作未繪示的其他實施例中,所述夾具2也可以由雙面膠帶或普通膠帶取代,但本創作不限於此。Furthermore, in this embodiment, the clamp 2 is in the shape of a long strip, and the length of the clamp 2 is slightly longer than the side length of the substrate 300 , and the length of the clamp 2 is shorter than the length of the metal roller 200 . length. In addition, in other embodiments not shown in the present invention, the clamp 2 can also be replaced by double-sided tape or ordinary tape, but the present invention is not limited thereto.

所述夾具2介紹至此,以下將開始介紹所述光阻噴塗裝置3。如圖1所示,所述光阻噴塗裝置3間隔地設置於所述滾輪固定裝置1,並且所述光阻噴塗裝置3能用來對所述基板300噴塗一光阻液(圖未繪)以對應形成一光阻層(圖未繪)。其中,於本實施例中,所述光阻液由正光阻劑形成,並且所述光阻液主要是由酚醛樹脂(Phenol-formaldehyde resin)製成,但本創作並不限於此。舉例來說,所述光阻液也可以由環氧樹脂(Epoxy resin)等正光阻劑材料製成。The fixture 2 has been introduced to this point, and the photoresist spraying device 3 will be introduced below. As shown in Figure 1, the photoresist spraying device 3 is disposed at intervals on the roller fixing device 1, and the photoresist spraying device 3 can be used to spray a photoresist liquid on the substrate 300 (not shown in the figure) A photoresist layer is formed accordingly (not shown). In this embodiment, the photoresist liquid is formed of a positive photoresist, and the photoresist liquid is mainly made of phenol-formaldehyde resin, but the invention is not limited thereto. For example, the photoresist liquid can also be made of positive photoresist materials such as epoxy resin.

具體來說,所述光阻噴塗裝置3包含間隔地設置於所述滾輪固定裝置1的一光阻槽31及一噴嘴32,並且所述噴嘴32連接於所述光阻槽31,而所述噴嘴32能用來噴塗所述光阻液。其中,所述光阻槽31內儲存有所述光阻液,而所述噴嘴32能自所述光阻槽31抽取所述光阻液,並將所述光阻液噴塗於包覆在所述金屬滾輪200上的所述基板300。Specifically, the photoresist spraying device 3 includes a photoresist groove 31 and a nozzle 32 that are spaced apart from the roller fixing device 1, and the nozzle 32 is connected to the photoresist groove 31, and the The nozzle 32 can be used to spray the photoresist liquid. The photoresist liquid is stored in the photoresist groove 31 , and the nozzle 32 can extract the photoresist liquid from the photoresist groove 31 and spray the photoresist liquid on the coating. The substrate 300 is on the metal roller 200.

需要說明的是,於本實施例中,所述噴嘴32為壓電式噴嘴,但本創作並不限於此。舉例來說,於其他實施例中,所述噴嘴32也可以為連續式噴嘴。更詳細地說,相比於現有的塗佈噴嘴,當所述噴嘴32為壓電式噴嘴時,所述光阻液形成液滴時的形狀更為規則,並且所述光阻液被噴塗時能被更加精準地設置於所述基板300。It should be noted that in this embodiment, the nozzle 32 is a piezoelectric nozzle, but the invention is not limited thereto. For example, in other embodiments, the nozzle 32 may also be a continuous nozzle. In more detail, compared with the existing coating nozzle, when the nozzle 32 is a piezoelectric nozzle, the shape of the photoresist liquid when forming droplets is more regular, and when the photoresist liquid is sprayed, the shape of the droplets is more regular. can be disposed on the substrate 300 more accurately.

此外,當所述噴嘴32為壓電式噴嘴時,所述光阻液不需加熱,因此所述光阻液不易發生化學變化,並且由於所述光阻液的溫度持續保持在穩定的狀態,即使所述光阻液被長時間不間斷地噴印後,所述光阻液的粘度及表面張力保持相對的穩定,從而可以使所述光阻液塗佈於所述基板300時的均勻度提升。In addition, when the nozzle 32 is a piezoelectric nozzle, the photoresist liquid does not need to be heated, so the photoresist liquid is not prone to chemical changes, and since the temperature of the photoresist liquid continues to remain in a stable state, Even after the photoresist liquid is spray-printed continuously for a long time, the viscosity and surface tension of the photoresist liquid remain relatively stable, thereby ensuring uniformity when the photoresist liquid is coated on the substrate 300 promote.

當所述噴嘴32為連續式噴嘴時,所述光阻液形成液滴的速度提升,進而使所述噴嘴32的噴塗速度增加。需要說明的是,當所述噴嘴32為壓電式噴嘴或連續式噴嘴時,所述噴嘴32同時也為溶劑型噴嘴,否則所述噴嘴32將容易被腐蝕而降低使用壽命。When the nozzle 32 is a continuous nozzle, the speed at which the photoresist liquid forms droplets increases, thereby increasing the spraying speed of the nozzle 32 . It should be noted that when the nozzle 32 is a piezoelectric nozzle or a continuous nozzle, the nozzle 32 is also a solvent-type nozzle. Otherwise, the nozzle 32 will be easily corroded and its service life will be reduced.

具體來說,當所述光阻噴塗裝置3在包覆於所述金屬滾輪200的所述基板300上噴塗所述光阻液時,所述金屬滾輪200被所述滾輪固定裝置1夾持並轉動,以使所述基板300被所述光阻液均勻地噴塗,續而形成設置於所述基板300的所述光阻層。Specifically, when the photoresist spraying device 3 sprays the photoresist liquid on the substrate 300 covered with the metal roller 200, the metal roller 200 is clamped by the roller fixing device 1 and Rotate so that the substrate 300 is evenly sprayed with the photoresist liquid, and then the photoresist layer disposed on the substrate 300 is formed.

所述光阻噴塗裝置3介紹至此,以下將開始介紹所述移動裝置4。如圖1所示,所述移動裝置4間隔地設置於所述滾輪固定裝置1,並且所述移動裝置4連接且能用來移動所述噴嘴32。其中,當所述噴嘴32對包覆於所述金屬滾輪200的所述基板300進行噴塗作業時,所述移動裝置4能用來使所述噴嘴32相對於所述金屬滾輪200移動,進而使所述基板300能被均勻地塗佈。The photoresist spraying device 3 has been introduced so far, and the moving device 4 will be introduced below. As shown in FIG. 1 , the moving device 4 is arranged at intervals on the roller fixing device 1 , and is connected and can be used to move the nozzle 32 . When the nozzle 32 sprays the substrate 300 covered with the metal roller 200, the moving device 4 can be used to move the nozzle 32 relative to the metal roller 200, thereby causing The substrate 300 can be coated uniformly.

所述移動裝置4介紹至此,以下將開始介紹所述軟烤裝置5。如圖1所示,所述軟烤裝置5間隔地設置於所述滾輪固定裝置1,所述軟烤裝置5包含多個軟烤燈51,並且每個所述軟烤燈51為一紅外線燈、一近紅外線燈、或一氙燈,而所述軟烤裝置5的每個所述軟烤燈51於本實施例中為較佳為近紅外線燈。其中,所述軟烤裝置5能用來烘烤所述光阻層,並使所述光阻層的溶劑含量降低。更詳細地說,所述軟烤裝置5能用來使所述光阻層的溶劑及過多的水分自所述光阻層中揮發出來,並使所述溶劑在所述光阻層中的含量至少降低至5%左右。The mobile device 4 has been introduced to this point, and the soft baking device 5 will be introduced below. As shown in Figure 1, the soft baking device 5 is arranged at intervals on the roller fixing device 1. The soft baking device 5 includes a plurality of soft baking lamps 51, and each of the soft baking lamps 51 is an infrared lamp. , a near-infrared lamp, or a xenon lamp, and each of the soft baking lamps 51 of the soft baking device 5 is preferably a near-infrared lamp in this embodiment. The soft baking device 5 can be used to bake the photoresist layer and reduce the solvent content of the photoresist layer. In more detail, the soft baking device 5 can be used to volatilize the solvent and excess moisture of the photoresist layer from the photoresist layer, and reduce the content of the solvent in the photoresist layer. At least reduce it to about 5%.

所述軟烤裝置5介紹至此,以下將開始介紹所述光刻裝置6。如圖1所示,所述光刻裝置6間隔地設置於所述軟烤裝置5,並且所述光刻裝置6包含多個光刻光源61及間隔地設置於多個所述光刻光源61的一光罩(圖未繪),而所述光刻裝置6能用來對所述基板300上的部分所述光阻層照射,進而對應形成一圖案化光阻層(圖未繪)。其中,多個所述光刻光源61包含多個發光二極體(圖未繪),其用來發出波長248奈米~365奈米的紫外光,並且所述圖案化光阻層形成有多個光刻圖案。The soft baking device 5 has been introduced so far, and the photolithography device 6 will be introduced below. As shown in FIG. 1 , the photolithography device 6 is spaced apart from the soft baking device 5 , and the photolithography device 6 includes a plurality of photolithography light sources 61 and a plurality of photolithography light sources 61 spaced apart from each other. A photomask (not shown in the figure), and the photolithography device 6 can be used to irradiate part of the photoresist layer on the substrate 300, thereby correspondingly forming a patterned photoresist layer (not shown in the figure). Among them, the plurality of photolithography light sources 61 include a plurality of light-emitting diodes (not shown), which are used to emit ultraviolet light with a wavelength of 248 nanometers to 365 nanometers, and the patterned photoresist layer is formed with multiple photolithography pattern.

進一步地說,所述光刻裝置6的多個所述光刻光源61所發出的紫外光能通過所述光罩並對應形成一圖案化光線,所述圖案化光線照射於部分所述光阻層時,所述金屬滾輪200被所述滾輪固定裝置1夾持並轉動,使部分所述光阻層被所述圖案化光源均勻地照射,續而於所述光阻層對應形成所述圖案化光阻層。Furthermore, the ultraviolet light emitted by the plurality of photolithography light sources 61 of the photolithography device 6 can pass through the photomask and correspondingly form a patterned light, and the patterned light irradiates part of the photoresist. When layering, the metal roller 200 is clamped and rotated by the roller fixing device 1, so that part of the photoresist layer is uniformly illuminated by the patterned light source, and then the pattern is formed correspondingly on the photoresist layer. photoresist layer.

需要說明的是,當所述基板300經由多個所述光刻光源61照射後,所述夾具2將被拆卸下來,而後所述基板300將轉向90度後再次配合所述夾具2安裝於所述金屬滾輪200,並再次通過多個所述光刻光源61照射,進而形成具有交錯的光刻圖案的所述圖案化光阻層。It should be noted that when the substrate 300 is irradiated by multiple photolithography light sources 61, the clamp 2 will be removed, and then the substrate 300 will be turned 90 degrees and then installed on the substrate 300 with the clamp 2 again. The metal roller 200 is irradiated by the plurality of photolithography light sources 61 again, thereby forming the patterned photoresist layer with interlaced photolithography patterns.

所述光刻裝置6介紹至此,以下將開始介紹所述無塵腔體7。如圖1所示,所述滾輪固定裝置1、所述夾具2、所述光阻噴塗裝置3、所述移動裝置4、所述軟烤裝置5以及所述光刻裝置6設置於所述無塵腔體7中,並且所述無塵腔體7的等級於本實施例中為美國聯邦標準分級1~美國聯邦標準分級500。其中,所述無塵腔體7用來避免所述基板300被環境中的汙染源黏附。The photolithography apparatus 6 has been introduced to this point, and the dust-free chamber 7 will be introduced below. As shown in Figure 1, the roller fixing device 1, the clamp 2, the photoresist spraying device 3, the moving device 4, the soft baking device 5 and the photolithography device 6 are arranged on the wireless In the dust-free chamber 7, the grade of the dust-free chamber 7 is US Federal Standard Class 1 to US Federal Standard Class 500 in this embodiment. The dust-free chamber 7 is used to prevent the substrate 300 from being adhered by pollution sources in the environment.

[實施例的有益效果][Beneficial effects of the embodiment]

本創作的其中一有益效果在於,本創作所提供的所述夾取式轉印模製設備100,其能通過“所述夾具2間隔地設置於所述滾輪固定裝置1,並且所述夾具2能用來可拆卸地夾持於所述基板300的對應兩側,使所述基板300穩固地設置於所述金屬滾輪200”的技術方案,以減少定位錯誤所造成的後續曝光良率不佳的問題。One of the beneficial effects of this invention is that the clamp-type transfer molding equipment 100 provided by this invention can be arranged at intervals on the roller fixing device 1 through "the clamp 2, and the clamp 2 A technical solution that can be used to detachably clamp the corresponding two sides of the substrate 300 so that the substrate 300 is firmly placed on the metal roller 200" to reduce poor subsequent exposure yields caused by positioning errors. problem.

以上所公開的內容僅為本創作的優選可行實施例,並非因此侷限本創作的申請專利範圍,所以凡是運用本創作說明書及圖式內容所做的等效技術變化,均包含於本創作的申請專利範圍內。The contents disclosed above are only preferred and feasible embodiments of this invention, and do not limit the scope of the patent application for this invention. Therefore, all equivalent technical changes made by using the description and drawings of this invention are included in the application for this invention. within the scope of the patent.

100:夾取式轉印模製設備 1:滾輪固定裝置 11:轉動機構 12:夾持機構 2:夾具 3:光阻噴塗裝置 31:光阻槽 32:噴嘴 4:移動裝置 5:軟烤裝置 51:軟烤燈 6:光刻裝置 61:光刻光源 7:無塵腔體 200:金屬滾輪 300:基板 100: Clamp-type transfer molding equipment 1:Roller fixing device 11:Rotating mechanism 12: Clamping mechanism 2: Fixture 3: Photoresist spraying device 31: Photoresist groove 32:Nozzle 4:Mobile device 5: Soft baking device 51:Soft baking lamp 6: Lithography device 61: Lithography light source 7: Dust-free chamber 200:Metal roller 300:Substrate

圖1為本創作實施例的夾取式轉印模製設備的立體示意圖。Figure 1 is a three-dimensional schematic diagram of a clamping transfer molding device according to an embodiment of this invention.

圖2為本創作實施例的夾具夾持基板的立體示意圖。Figure 2 is a three-dimensional schematic diagram of a clamp clamping a substrate according to an embodiment of this invention.

圖3為本創作實施例的夾具、金屬滾輪以及基板的分解示意圖。Figure 3 is an exploded schematic diagram of the clamp, metal roller and substrate according to the embodiment of the present invention.

100:夾取式轉印模製設備 100: Clamp-type transfer molding equipment

1:滾輪固定裝置 1:Roller fixing device

11:轉動機構 11:Rotating mechanism

12:夾持機構 12: Clamping mechanism

2:夾具 2: Fixture

3:光阻噴塗裝置 3: Photoresist spraying device

31:光阻槽 31: Photoresist groove

32:噴嘴 32:Nozzle

4:移動裝置 4:Mobile device

5:軟烤裝置 5: Soft baking device

51:軟烤燈 51:Soft baking lamp

6:光刻裝置 6: Lithography device

61:光刻光源 61: Lithography light source

7:無塵腔體 7: Dust-free chamber

200:金屬滾輪 200:Metal roller

300:基板 300:Substrate

Claims (10)

一種夾取式轉印模製設備,其包括: 一滾輪固定裝置,用來固定一金屬滾輪,並且所述金屬滾輪表面包覆有一基板;其中,所述基板呈正方形,並且所述基板的邊長介於1.0米~1.5米之間,而所述金屬滾輪的長度介於1.6米~1.8米之間,並且所述金屬滾輪是一鉻金屬滾輪;以及 一夾具,間隔地設置於所述滾輪固定裝置,並且所述夾具能用來可拆卸地夾持於所述基板的對應兩側,使所述基板穩固地設置於所述金屬滾輪。 A clamping type transfer molding equipment, which includes: A roller fixing device used to fix a metal roller, and the surface of the metal roller is covered with a base plate; wherein the base plate is square, and the side length of the base plate is between 1.0 meters and 1.5 meters, and the The length of the metal roller is between 1.6 meters and 1.8 meters, and the metal roller is a chromium metal roller; and A clamp is provided at intervals on the roller fixing device, and the clamp can be used to detachably clamp the corresponding two sides of the base plate so that the base plate is stably placed on the metal roller. 如請求項1所述的夾取式轉印模製設備,其中,所述夾取式轉印模製設備進一步包括一無塵腔體,並且所述滾輪固定裝置以及所述夾具設置於所述無塵腔體中。The clamp-type transfer molding equipment according to claim 1, wherein the clamp-type transfer molding equipment further includes a dust-free cavity, and the roller fixing device and the clamp are disposed in the In a dust-free chamber. 如請求項1所述的夾取式轉印模製設備,其中,所述夾取式轉印模製設備進一步包括一光阻噴塗裝置,間隔地設置於所述滾輪固定裝置,並且所述光阻噴塗裝置能用來對所述基板噴塗一光阻液。The clamp-type transfer molding equipment according to claim 1, wherein the clamp-type transfer molding equipment further includes a photoresist spraying device arranged at intervals on the roller fixing device, and the photoresist spraying device is spaced apart from the roller fixing device, and the photoresist spraying device is The spray resist coating device can be used to spray a photoresist liquid on the substrate. 如請求項3所述的夾取式轉印模製設備,其中,所述光阻噴塗裝置包含一光阻槽及連接於所述光阻槽的一噴嘴,並且所述光阻槽能用來容納所述光阻液,而所述噴嘴能用來自所述光阻槽抽取所述光阻液並將其噴塗於所述基板上。The clamp-type transfer molding equipment of claim 3, wherein the photoresist spraying device includes a photoresist groove and a nozzle connected to the photoresist groove, and the photoresist groove can be used to The photoresist liquid is accommodated, and the nozzle can be used to draw the photoresist liquid from the photoresist tank and spray it on the substrate. 如請求項4所述的夾取式轉印模製設備,其中,所述夾取式轉印模製設備進一步包括一移動裝置,連接且能用來移動所述噴嘴。The clamp-type transfer molding equipment according to claim 4, wherein the clamp-type transfer molding equipment further includes a moving device connected to and capable of moving the nozzle. 如請求項1所述的夾取式轉印模製設備,其中,所述夾取式轉印模製設備進一步包括一軟烤裝置,間隔地設置於所述滾輪固定裝置,並且所述軟烤裝置包含多個軟烤燈,並且每個所述軟烤燈為一紅外線燈、一近紅外線燈、或一氙燈。The clamp-type transfer molding equipment according to claim 1, wherein the clamp-type transfer molding equipment further includes a soft baking device, which is spaced apart from the roller fixing device, and the soft baking device The device includes a plurality of soft baking lamps, and each of the soft baking lamps is an infrared lamp, a near-infrared lamp, or a xenon lamp. 如請求項6所述的夾取式轉印模製設備,其中,所述夾取式轉印模製設備進一步包括一光刻裝置,間隔地設置於所述軟烤裝置,並且所述光刻裝置包含多個光刻光源,而所述光刻裝置能用來對所述基板照射一光刻光線。The clamp-type transfer molding equipment according to claim 6, wherein the clamp-type transfer molding equipment further includes a photolithography device, which is spaced apart from the soft baking device, and the photolithography device The device includes a plurality of photolithography light sources, and the photolithography device can be used to illuminate the substrate with a photolithography light. 如請求項1所述的夾取式轉印模製設備,其中,所述滾輪固定裝置進一步包含一轉動機構,安裝於所述金屬滾輪,並且所述轉動機構用來使所述金屬滾輪以介於2900轉/分鐘至4500轉/分鐘的一甩乾速度轉動。The clamping type transfer molding equipment according to claim 1, wherein the roller fixing device further includes a rotating mechanism installed on the metal roller, and the rotating mechanism is used to make the metal roller mediate Rotate at a drying speed of 2900 rpm to 4500 rpm. 如請求項1所述的夾取式轉印模製設備,其中,所述滾輪固定裝置進一步包含一轉動機構,安裝於所述金屬滾輪,並且所述轉動機構用來使所述金屬滾輪以介於1轉/分鐘至25轉/分鐘的一浸潤速度轉動。The clamping type transfer molding equipment according to claim 1, wherein the roller fixing device further includes a rotating mechanism installed on the metal roller, and the rotating mechanism is used to make the metal roller mediate Rotate at a soaking speed of 1 rpm to 25 rpm. 如請求項8所述的夾取式轉印模製設備,其中,所述滾輪固定裝置包含一夾持機構,所述夾持機構安裝於所述轉動機構,並且所述夾持機構用來夾持所述金屬滾輪;其中,當所述轉動機構運作時,所述轉動機構會轉動所述夾持機構,使所述金屬滾輪被所述夾持機構轉動。The clamp-type transfer molding equipment according to claim 8, wherein the roller fixing device includes a clamping mechanism, the clamping mechanism is installed on the rotating mechanism, and the clamping mechanism is used to clamp Hold the metal roller; wherein, when the rotating mechanism operates, the rotating mechanism will rotate the clamping mechanism, so that the metal roller is rotated by the clamping mechanism.
TW112203492U 2023-04-17 2023-04-17 Clamp-type transfer molding equipment TWM647715U (en)

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