TWM637276U - Photomask with pellicle, exposure system, and panel manufacturing system of flat panel displays - Google Patents

Abstract

The invention provides a pellicle, at least one side of the pellicle has a side length of more than 1000 mm, and when the pellicle installed on the photomask moves at a high speed, the swaying amount of the pellicle diaphragm is small. The pellicle of the present invention comprises at least one pellicle frame with a side length of more than 1000 mm, and a pellicle film bonded to one of its frame-shaped surfaces, and the pellicle is characterized in that, for the pellicle film , a tensile strain of not less than 1% and not more than 2.5% is imparted in a direction parallel to a pair of pellicle frame sides that are parallel to each other and are line-symmetrical.

Description

Photomask with pellicle, exposure system, and panel manufacturing system for flat panel displays

This new creation relates to a pellicle, which is used as a cover for garbage when manufacturing semiconductor devices, printed substrates or flat panels, etc. This new creation is especially related to a flat panel display for liquid crystals, etc. (Flat Panel Display, FPD) For device manufacturing purposes, at least one side length exceeds 1000 mm in size.

In the manufacture of screens for flat panel displays used in large scale integrated circuits (Large Scale Integration, LSI), super LSI and other semiconductors or liquid crystal displays, organic electroluminescence (Electroluminescence, EL) displays, etc., the coated photoresist ( Photo resist) semiconductor wafers or liquid crystal glass plates are irradiated with ultraviolet light to make patterns, but if there is dust attached to the photomask used at this time, the dust will block or reflect the ultraviolet light, thus causing the transfer. Problems such as pattern deformation, short circuit, etc. and quality damage.

Therefore, these operations are usually performed in a clean room, but even then it is difficult to keep the photomask clean all the time. Therefore, exposure is performed after attaching a pellicle to the surface of the photomask as a dust cover. At this time, the foreign matter does not directly adhere to the surface of the photomask but adheres to the pellicle. Therefore, if the focus is on the pattern of the photomask during lithography, the foreign matter on the pellicle and the transfer film will be separated. India has nothing to do.

In the usual pellicle, a transparent pellicle film containing nitrocellulose, cellulose propionate, or fluorine-based resin that allows ultraviolet light to pass through is bonded to aluminum alloy, stainless steel, engineering plastics (engineering plastics), etc. ) and so on the frame-like surface of the protective film frame. Furthermore, on the frame-shaped surface on the opposite side of the pellicle film, an adhesive layer including polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, etc. for mounting on a photomask is provided, and if necessary, There is a release layer (release film) to protect the adhesive layer.

As mentioned above, the pellicle sheet is usually made of thin resin, so it is stretched on the pellicle frame with an appropriate amount of tension to avoid wrinkling. However, the pellicle diaphragm also has its own weight. Although it is extremely small, no matter what kind of pellicle it is, the pellicle diaphragm will sag downward.

FIG. 9 is a cross-sectional view showing a state where a pellicle is attached to the photomask. Usually, in an exposure machine, the photomask 91 is set so that the surface on which the exposure pattern 92 is drawn faces downward. In addition, the pellicle 99 is attached to the lower surface of the photomask 91 via the mask adhesive layer 96 so as to cover the exposure pattern 92 .

When the self-weight sag x of the pellicle sheet 98 is large, the apex y (usually the center of the pellicle) of the pellicle sheet 98 protrudes below the photomask 91, and there is a problem in an exposure machine or a foreign object inspection machine ( not shown) the danger of interfering with device parts. In the case of a general exposure machine, considering the installation tolerance of the pellicle itself or each part, the allowable protrusion amount of the pellicle film is at least 0.8 mm or less, more preferably 0.6 mm or less. As for the allowable value, almost the same numerical value is required even if the pellicle is larger in an exposure machine and a foreign object inspection machine using the same optical system.

However, in recent years, the movement speed of the photomask in the exposure machine has gradually become higher, so the wind pressure on the pellicle diaphragm during movement or the air in the pellicle caused by inertia when the movement starts and stops Bias becomes larger. As a result, in addition to the sagging amount x due to its own weight, the swaying of the pellicle membrane accompanying the operation increases, and the risk of the pellicle membrane contacting the device particularly increases. As a result, the self-weight sag x of the film is required to be a smaller value. In recent years, it is generally required to be 0.35 mm, and it may be required to be 0.2 mm or less depending on the situation. Moreover, the required value of the amount of film shaking depends on the applicable device or operating conditions, so it cannot be generalized. However, as an example, it is preferable that under any conditions, for a protective film with a side length exceeding 1 m, at least 4 mm or less, and at least 5 mm for membranes with sides longer than 1.5 m.

For said problem, the creators of the present invention once proposed the novel creation of the following pellicle, which is characterized in that, between the parallel both sides of the pellicle frame, a 100-degree thick film comprising a material different from the pellicle diaphragm is stretched. The thin wire-shaped reinforcement body is less than μm, and the thin wire-shaped reinforcement body is in contact with the outer side of the pellicle membrane (Patent Document 1). [Prior art literature] [Patent Document]

[Patent Document 1] Japanese Patent No. 5618888

[Problems to be solved by new creations]

In the new creation, the reinforcing body is used to suppress the self-weight sagging of the pellicle membrane, but the reinforcing body is defocused, so the exposure quality is not affected in any way. In the method of the above-mentioned novel creation, even for a large protective film with a length of one side exceeding 2000 mm, it is possible to suppress the amount of self-weight deflection to 0.3 mm, which is a very effective method for suppressing self-weight sagging. On the other hand, however, there are problems such as being extremely poor in productivity and not suitable for mass production.

Furthermore, the essential purpose of suppressing the self-weight deflection x of the pellicle membrane is to prevent contact between the pellicle membranes in the device as described above, but in the case of simply reducing the self-weight deflection x of the pellicle membrane , it is not sufficient to suppress the amount of shaking of the pellicle sheet due to the external force when the pellicle attached to the photomask is moved, and the risk of contact of the pellicle sheet is not necessarily reduced.

Moreover, as also described in detail in Patent Document 1, the flow of air through the air hole 94 and the filter 95 is extremely slow, and the amount of deflection by weight x depends on air pressure or temperature changes, and the material of the pellicle diaphragm is different, and also varies due to humidity. Constantly fluctuating due to expansion or contraction, it is not suitable as an indicator of safety.

The present invention is made in view of the problems described above, and its purpose is to provide a pellicle that has at least one side with a length of more than 1000 mm, and when the pellicle installed on the photomask moves at high speed, the pellicle The vibration of the membrane diaphragm is small. [Technical means to solve the problem]

The inventors of the present invention have conducted diligent research and found that, in order to reduce the amount of vibration of the pellicle film when the pellicle film attached to the photomask moves, it is important to apply tensile strain to the pellicle film and bond it to the pellicle film. Film frame and its direction, thus completing the new creation.

The solution of this new creation is a pellicle, comprising at least one pellicle frame with a side length of more than 1000 mm, and a pellicle diaphragm bonded to one of its frame-shaped surfaces, and the pellicle is characterized in that, The pellicle sheet is provided with a tensile strain of not less than 1% and not more than 2.5% in a direction (major axis direction) parallel to a pair of pellicle frame sides parallel to each other and line-symmetrical. Furthermore, the pellicle sheet is adhesively fixed to the pellicle frame by applying a tensile strain of 0.5% to 2% in the direction (short axis direction) perpendicular to the pair of pellicle frame edges, thereby preventing Wrinkles of the pellicle membrane.

Furthermore, if the material of the pellicle diaphragm is an amorphous fluorine-based resin, the amount of vibration of the pellicle diaphragm can be kept small without being affected by environmental changes.

Furthermore, a novel creation obtained by adding the features of the patent document 1 provided by the creator of the present invention to the above-mentioned features of the present invention can be an effective embodiment even in the case of a super-large pellicle. That is, it is a form in which at least one linear reinforcing body with a thickness of at most 100 μm is stretched on opposite sides of the pellicle frame so as to be bonded to the pellicle sheet provided with tensile strain according to the present invention. formed between the two sides. Or it can be in the following form: stretching two linear reinforcements with a maximum thickness of 100 μm along the diagonal of the protective film frame in a way that is bonded to the protective film sheet with tensile strain created by the present invention. set up. The specific content of these is disclosed in patent document 1. Furthermore, the present invention is: a photomask with a protective film, which is formed by installing the protective film on the photomask; an exposure method, which is characterized in that the photomask with a protective film is used for exposure; and A method for manufacturing a screen for a flat panel display, comprising the step of exposing using the photomask with protective film. [Effect of new creation]

According to this new creation, a tensile strain of 1% to 2.5% is given in the direction parallel to the long side (major axis direction) of the pellicle diaphragm and bonded to the pellicle frame, so even if the side length exceeds 1000 mm The large pellicle can also suppress the vibration of the pellicle diaphragm to a small amount when moving at high speed. As a result, the risk that the pellicle film comes into contact with device parts in an exposure machine or a foreign matter inspection machine is reduced.

Hereinafter, preferred embodiments of the present invention will be described, but the present invention is not limited thereto.

One embodiment of the present invention is shown in Fig. 1 and Fig. 2 . FIG. 1 is a plan view, and FIG. 2 is a cross-sectional view along A-A of FIG. 1 . A pellicle membrane adhesive layer 12 is provided on the upper frame-shaped surface of the pellicle frame 11 , and a pellicle membrane 13 is bonded thereto. Furthermore, a mask adhesive layer 14 is provided on the opposite frame-shaped surface. In this embodiment, the outer shape of the pellicle frame 11 is a rectangle, but it may also be in other similar shapes, such as a square, an octagon, and the like. The pellicle sheet 13 is bonded to the pellicle frame 11 via the pellicle sheet adhesive layer 12 in a state where a predetermined ratio of tensile strain is applied in the long-axis direction (arrow a direction). The tensile strain is preferably set at 1% or more and 2.5% or less. Here, the tensile strain is a value represented by the following formula. Tensile strain (%) = strain number (stretching amount) (mm) / outer dimension of the film in the stretching direction before strain (mm) × 100

A normal pellicle sheet has some tension applied to it to adhere to the pellicle frame without wrinkles, but the amount is about 0.5% in terms of strain. Moreover, in the prior art, as shown in FIG. 10 , the center of the support frame 100 holding the pellicle membrane is stretched or squeezed to adjust the tension, so its position, size, and direction cannot be considered.

The pellicle sheet 13 of the resin is stretchable, and the resistance to external force can be improved by imparting tensile strain within the elastic range. The effect of reducing the amount of film shaking becomes greater when the tensile strain is 0.5% or more, and from this point of view, the higher the better. When stretching a material with a yield point, the tensile strain can be imparted to the vicinity of the yield point. For example, in the case of fluorine-based resins, the elongation at the yield point is about 10%, so the tensile strain can be imparted to a maximum of 9 %about.

But on the other hand, the higher the tensile strain, the lower the resistance to trauma. Even if the trauma caused by contact or the like is very small, depending on the direction, the resulting cracks may spread all at once, resulting in complete damage to the pellicle membrane. Furthermore, a large shear stress is always applied to the adhesive layer of the pellicle, and there is concern from the viewpoint of the reliability of the adhesion. Considering the balance between the reduction effect of film shaking, the adhesive force of the adhesive, and the resistance to trauma, the most suitable range of tensile strain is 1% or more and 2.5% or less. Moreover, the tensile strain can also be appropriately adjusted according to the position on the frame. For example, it is also possible to particularly increase the tensile strain in the vicinity of the central axis in the longitudinal direction where the swaying amount of the pellicle sheet becomes large.

Usually, when a photomask is rectangular, the movement direction of the photomask in an exposure machine is a long-axis direction. FIG. 3 shows how the pellicle sheet shakes when the pellicle-coated photomask is moved and suddenly stopped. This figure is a cross-section of the central axis of the long side, the arrow indicates the moving direction of the photomask with the pellicle, and the chain line of two dots indicates the behavior of the pellicle diaphragm when the shake is maximum.

The wobble of the pellicle diaphragm is produced with the movement of the photomask. Although there is also the influence of the wind pressure received from the outside due to passing through the narrow space, the biggest shaking is caused by the air in the membrane deflecting in one direction due to inertia when the movement starts or stops. In the example shown in FIG. 3 , the air in the pellicle moves to the right due to the sudden stop to the right, thereby denting the B portion of the pellicle membrane and protruding from the C portion. These correspond to regions B and C surrounded by dotted lines in the plan view of FIG. 1 . In the present invention, by applying a large tensile strain in the direction of the long axis, the resistance to deflection of the air in that direction is increased, thereby effectively suppressing the swaying amount of the film.

A plan view of another embodiment of the novel creation is shown in FIG. 4 . In addition to the long axis direction (arrow a) of the embodiment of FIG. Box 41. The tensile strain in the minor axis direction is preferably set at 0.5% or more and 2% or less. When tensile strain is applied to the long-axis direction of the pellicle sheet, shrinkage occurs in the short-axis direction due to the Poisson effect, so the purpose is to prevent wrinkles. Furthermore, from the viewpoint of preventing a decrease in resistance to trauma, it is not necessary to increase the tensile strain applied in the short-axis direction.

Moreover, well-known materials can be used for the material of the pellicle film, for example, cellulose-based resins such as nitrocellulose and cellulose propionate, amorphous fluorine-based resins, and the like. Among them, amorphous fluorine-based resins are particularly preferably used. Amorphous fluorine-based resins have no dimensional change due to moisture absorption, and even when short-wavelength ultraviolet light with a wavelength of 300 nm or less is used, there is no decrease in film thickness due to etching, so it can stably maintain the same over a long period of time. The tensile strain value provided does not cause fluctuations in the amount of film shaking. Furthermore, since it is amorphous, cracks are relatively less likely to propagate, and there are advantages such as strong resistance to trauma even when a large tensile strain is applied.

Next, the manufacturing method of the protective film of the present invention will be described in detail. Utilize well-known coating methods such as spin coating method, slit coating method to coat the solution of pellicle diaphragm material on the substrate that comprises quartz, low-expansion glass etc. through smooth grinding, utilizes oven, heating plate, infrared (Infrared, IR) lamps and other heating mechanisms to completely evaporate the solvent and obtain a layer of dried pellicle film on the substrate.

After cooling, the pellicle sheet was peeled off from the film-forming substrate. The peeling is preferably as shown in the cross-sectional view of FIG. 5 , where the membrane support 52 of the support frame 50 is bonded to the end of the pellicle film 54 on the substrate 55 and slowly lifted from the corner for peeling. A plan view of the pellicle membrane supported by the support frame 50 is shown in FIG. 6 . The support frame 50 includes an outer frame 51 , a membrane support 52 and a stretching mechanism 53 . In the above-described embodiment, the support frame 50 is bonded and the pellicle film 54 on the substrate 55 is peeled off, but the pellicle film can also be peeled off by other methods, and then the support frame 50 is installed.

The outer frame 51 is preferably made of a rigid material and structure so as not to bend when tensile strain is applied to the pellicle sheet 54 . The film support body 52 divides and supports the periphery of the pellicle diaphragm with a width of 20 mm to 100 mm, and adheres the pellicle film by adhesives coated on the surface, double-sided tape and other bonding mechanisms (not shown). Diaphragm 54. The narrower the width of the film support 52, the finer the tensile strain can be adjusted. On the other hand, if the width is narrow, the complexity of the work will also increase sharply. Therefore, it is necessary to comprehensively consider the size of the film, productivity, and the possibility of wrinkling. degree to determine the support width.

The film supports 52 are arranged with a gap of 5 mm or less with respect to the adjacent film supports 52 , are supported from the outer frame 51 via the stretching mechanism 53 , and the stretching amount can be individually adjusted. A perspective view of the stretching mechanism 53 is shown in FIG. 7 . The stretching mechanism 53 is mounted on a linear movement mechanism including a rail 71 and a slider 72 movable in a direction d perpendicular to the stretching direction c, and can freely move following the displacement of the film when tensile strain is applied. . As the stretching mechanism, a screw mechanism including the internal thread portion 73 and the external thread portion 74 is used in this embodiment, but it is not limited thereto. At the top end of the external thread portion 74, the film support body 52 having a film adhesive layer 75 containing an adhesive or double-sided tape on the surface is installed in a free state with respect to the rotation of the external thread portion 74. By rotating the external thread portion 74, operation while the membrane support 52 moves along the stretching direction c.

From the state where the pellicle film 54 is supported by the support frame 50 , a desired tensile strain is given to the pellicle film 54 by operating the stretching mechanism 53 . The more the film supports 52 are retracted, the more the tensile strain to be applied is increased, but it is operated so that the movement amounts of the facing film supports 52 become equal. Regarding the operation, it is preferable to first operate in the long-axis direction to which a large tensile strain is applied, and then work in the short-axis direction. Finally, after confirming that the pellicle sheet 54 is not wrinkled, the pellicle sheet 54 is bonded to the pellicle sheet adhesive layer of the pellicle frame in the same manner as in the usual pellicle manufacturing method to complete the pellicle sheet. [Example]

Hereinafter, examples of the present invention will be described, but the present invention is not limited thereto. [Example 1]

The pellicle 80 shown in the perspective view of FIG. 8 is produced. The protective film frame 81 is a rectangle with an outer dimension of 1526 mm × 1748 mm and an inner dimension of 1493 mm × 1715 mm produced by machining A5052 aluminum alloy. The height is set to 6.0 mm. R6. Moreover, on the outer surface of the long side, two concave holes 82 with a diameter of 2.5 mm and a depth of 2 mm are provided on each side for handling, and grooves 83 with a height of 2 mm and a depth of 3 mm are provided on the outer surface of the short side. Similarly, grooves 84 with a height of 2 mm and a depth of 3 mm are provided at three places on the outer surface of the long side. In addition, eight ventilation holes 85 and filters 86 each having a diameter of 1.5 mm are provided on both long sides. Finally, after sandblasting the surface, implement black alumite treatment.

The pellicle frame 81 is carried into a clean room, thoroughly washed with a surfactant and pure water, and dried. Next, on one of the frame-like surfaces of the pellicle frame, dilute the silicone adhesive used as the pellicle membrane adhesive layer 88 with toluene and apply it to a thickness of 2 mm with an air pressurized dispenser. On the surface, a silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd.) serving as the mask adhesive layer 87 was diluted with toluene, applied to a thickness of 2 mm with an air pressure dispenser, and cured by heating.

Next, on a smooth polished quartz substrate 55 of 1620 mm x 1780 mm x thickness 17 mm, an amorphous fluororesin (trade name Cytop, manufactured by Asahi Glass Co., Ltd.) was coated with a slit die coater. Membrane membrane material solution. The coating amount at this time was set so that the film thickness after drying would be 3.9 micrometers. Next, this was heated to 180° C. in an oven to dry the solvent.

For the pellicle film 54 on the substrate 55 , a support frame 50 is bonded as shown in FIG. 5 . Here, the stretching mechanism of the support frame 50 has the structure shown in FIG. 7 . The film adhesive layer 75 comprising silicone double-sided adhesive tape provided on the lower surface of the film support body 52 is bonded to the protective film sheet 54 at the substrate end, and then the support frame 50 is slowly lifted from the corner. Fig. 6 is a plan view showing a state after peeling.

Next, the stretching mechanism 53 is operated to move the film support body 52 toward the center of the film, and the position at which the pellicle sheet starts to relax is obtained. Using this position as a reference, the stretching mechanisms 53 facing each other arranged on the short sides are simultaneously operated to impart tensile strain in the long-axis direction to the pellicle film. At this time, a tensile strain with an elongation of 41 mm and an elongation of about 2.3% was applied, and the operation was performed sequentially from the center of the short side to the outside. Next, the stretching mechanism 53 disposed on the long side was operated in the same manner, and a tensile strain of 30 mm in strain number and about 1.9% in elongation was applied in the minor axis direction. Finally, the entire surface of the film was visually observed, and it was confirmed that no wrinkles were generated.

Move the supporting frame 50 supporting the pellicle membrane sheet 54 with tensile strain in the major axis direction and the minor axis direction, as shown in FIG. 8 , on the pellicle frame 81 made as described above The pellicle film adhesive layer 88 is bonded to the pellicle film 89 , and the surrounding redundant film is cut off by a cutting machine to complete the pellicle 80 . In Example 1, tensile strain was applied in the direction a and the direction b shown in FIG. 4 .

After the completed protective film 80 is attached to a quartz substrate of 1620 mm×1780 mm×17 mm in thickness, it is mounted on a motion mechanism including a linear motion guide and a slider, and moves along the horizontal direction as shown in Figure 3. A laser distance sensor measures the amount of film shake in motion. As a result, under the conditions of speed 1300 mm/s, acceleration 2940 mm/s ² , and deceleration 2940 mm/s ² , the maximum amount of vibration of the protruding side of the pellicle diaphragm was about 2.3 mm, which is completely unnecessary. Contact value. [Example 2]

A pellicle was fabricated in the same manner as in the above-mentioned examples, changing the strain number applied to the pellicle sheet. At this time, a tensile strain of 19 mm with an elongation of about 1.1% in the major axis direction and 10 mm with an elongation of 0.6% in the minor axis direction was imparted. The amount of film shake was evaluated on the completed pellicle under exactly the same conditions as in the above-mentioned examples. As a result, the maximum shake amount of the pellicle sheet was about 3.7 mm, which is a level at which there is no concern about film contact in practice. [comparative example]

In the same manner as in Example 1, on a smooth polished quartz substrate of 1620 mm x 1780 mm x thickness 17 mm, an amorphous fluororesin (trade name Cytop ), manufactured by Asahi Glass Co., Ltd.) of the pellicle membrane material solution, and allowed to dry. A support frame 100 as shown in FIG. 10 was bonded to the peripheral portion of the pellicle film on the substrate, and the pellicle film 101 was obtained by gradually peeling off from the corner. In Example 1 and Example 2, the pellicle membrane is peeled off and held by the support frame 50, and the tensile strain is imparted by the stretching mechanism, but the support frame 100 of this comparative example does not have a stretching mechanism. In order to prevent wrinkling, the center of each long side and each short side of the pellicle film 101 is stretched outward as shown by the arrow in the figure, and directly maintains this state and sticks it on the same surface as that of the first embodiment and the second embodiment. The pellicle film adhesive layer on the produced pellicle frame is cut off with a cutting machine to complete the pellicle. At this time, when the support frame 100 is pulled at the center of the side, the whole side bends and the film is stretched, and the stretching amounts of the long side and the short side affect each other. Therefore, the amount of stretching cannot be easily compared with the above-mentioned examples, but when the tensile strain is obtained at the center of the side as a reference, both the long side and the short side are about 0.5%.

The completed pellicle was evaluated on the same conditions as in Example 1 and Example 2. As a result, the maximum wobble of the pellicle sheet was about 5.2 mm on the protruding side. Diaphragm Diaphragm contact worry level.

11, 41, 81, 93: protective film frame 12, 42, 88, 97: Adhesive layer of protective film diaphragm 13, 43, 54, 89, 98, 101: membrane diaphragm 14, 87, 96: mask adhesive layer 15, 91: Photomask 50, 100: support frame 51: Outer frame 52: Membrane support 53: stretching mechanism 55: Substrate 71: track 72: Slider 73: internal thread part 74: external thread part 75: Membrane adhesive layer 80, 99: protective film 82: concave hole 83: slot (short side) 84: slot (long side) 85, 94: ventilation holes 86:Filter 92: Exposure pattern 95: filter a: stretching direction (major axis direction) A: Center of long axis direction b: stretching direction (short axis direction) B: A region with a large amount of film shaking (concave) c: Stretch direction C: Area with large amount of membrane shaking (convex) d: Orthogonal direction relative to the stretching direction x: self-weight deflection of the membrane diaphragm y: vertex (center) of the pellicle diaphragm

Fig. 1 is a plan view showing an embodiment of the present invention. Fig. 2 is a sectional view along A-A of Fig. 1 showing an embodiment of the present invention. FIG. 3 is an explanatory view showing the behavior of the pellicle film when the photomask mounted with the pellicle is moved horizontally. Fig. 4 is a plan view showing an embodiment of the present invention. Fig. 5 is a cross-sectional view for explaining a method of peeling off a pellicle membrane using a support frame used in the invention. Fig. 6 is a schematic plan view of the used supporting frame of the present invention. Fig. 7 is the perspective view of the supporting frame stretching mechanism used in the novel creation. Fig. 8 is a schematic perspective view of a pellicle produced in an example. 9 is a schematic cross-sectional view of a state where a pellicle is attached to a photomask. Fig. 10 is a schematic plan view of a support frame used in a comparative example.

50: support frame

51: Outer frame

52: Membrane support

53: stretching mechanism

54: Protective membrane diaphragm

Claims (9)

A photomask with a pellicle, which is formed by installing the pellicle on the photomask, and the pellicle includes a pellicle frame with at least one side length exceeding 1000mm, and a pellicle diaphragm bonded to one of its frame-shaped surfaces And the photomask with a pellicle is characterized in that, for the pellicle sheet, in a direction parallel to a pair of pellicle frames parallel to each other and line-symmetrical, a layer of 1% or more and 2.5% or less the tensile strain. The photomask with a pellicle according to claim 1, wherein the pellicle sheet is stretched in a direction perpendicular to the frame sides of the pair of pellicles by 0.5% or more and 2% or less strain. The photomask with a pellicle according to claim 1, wherein the pellicle frame is rectangular, and the pair of pellicle frame sides are long sides of the rectangle. The photomask with a pellicle according to claim 3, wherein the pellicle sheet is provided with a tensile strain of 0.5% to 2% in a direction perpendicular to the long side of the rectangle. The photomask with a pellicle according to Claim 3 or Claim 4, wherein at least one linear reinforcing body with a thickness of at most 100 μm is bonded to the pellicle film and stretched over the pellicle Between the opposite sides of the protective film frame. The photomask with a pellicle according to Claim 3 or Claim 4, wherein two linear reinforcements having a thickness of at most 100 μm are bonded to the pellicle The diaphragm is stretched along the diagonal of the protective film frame. The photomask with a pellicle according to any one of claim 1 to claim 4, wherein the material of the pellicle sheet is an amorphous fluorine-based resin. An exposure system comprising a mechanism for performing exposure using the photomask with a pellicle according to any one of claims 1 to 7. A manufacturing system for a panel for a flat panel display, comprising a mechanism for performing exposure using the photomask with a pellicle according to any one of claim 1 to claim 7.

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