TWM637276U - Photomask with pellicle, exposure system, and panel manufacturing system of flat panel displays - Google Patents
Photomask with pellicle, exposure system, and panel manufacturing system of flat panel displays Download PDFInfo
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- TWM637276U TWM637276U TW111203664U TW111203664U TWM637276U TW M637276 U TWM637276 U TW M637276U TW 111203664 U TW111203664 U TW 111203664U TW 111203664 U TW111203664 U TW 111203664U TW M637276 U TWM637276 U TW M637276U
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Packaging Frangible Articles (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
本新型創作提供一種護膜,此護膜的至少一條邊的邊長超過1000 mm,且當安裝於光掩模的護膜高速移動時,護膜膜片的搖晃量小。本新型創作的護膜包含至少一條邊長超過1000 mm的護膜框、及黏接於其一個框狀面的護膜膜片而構成,且所述護膜的特徵在於,對於護膜膜片,在與相互平行且為線對稱的一對護膜框邊平行的方向賦予有1%以上且2.5%以下的拉伸應變。The invention provides a pellicle, at least one side of the pellicle has a side length of more than 1000 mm, and when the pellicle installed on the photomask moves at a high speed, the swaying amount of the pellicle diaphragm is small. The pellicle of the present invention comprises at least one pellicle frame with a side length of more than 1000 mm, and a pellicle film bonded to one of its frame-shaped surfaces, and the pellicle is characterized in that, for the pellicle film , a tensile strain of not less than 1% and not more than 2.5% is imparted in a direction parallel to a pair of pellicle frame sides that are parallel to each other and are line-symmetrical.
Description
本新型創作是有關於一種護膜(pellicle),被用作製造半導體器件、印刷基板或平板(flat panel)等時的垃圾遮擋物,本新型創作尤其是有關於一種用於液晶等的平板顯示器(Flat Panel Display,FPD)器件製造用途的、至少一條邊長超過1000 mm的大小的護膜。This new creation relates to a pellicle, which is used as a cover for garbage when manufacturing semiconductor devices, printed substrates or flat panels, etc. This new creation is especially related to a flat panel display for liquid crystals, etc. (Flat Panel Display, FPD) For device manufacturing purposes, at least one side length exceeds 1000 mm in size.
在大型積體電路(Large Scale Integration,LSI)、超LSI等半導體或液晶顯示器、有機電致發光(Electroluminescence,EL)顯示器等所使用的平板顯示器用屏的製造中,對塗布有光阻劑(photo resist)的半導體晶片或液晶用玻璃板照射紫外光而製作圖案,但若此時所用的光掩模上附著有垃圾,則所述垃圾將紫外光遮蔽或反射,因而有產生所轉印的圖案的變形、短路等而品質受損等問題。In the manufacture of screens for flat panel displays used in large scale integrated circuits (Large Scale Integration, LSI), super LSI and other semiconductors or liquid crystal displays, organic electroluminescence (Electroluminescence, EL) displays, etc., the coated photoresist ( Photo resist) semiconductor wafers or liquid crystal glass plates are irradiated with ultraviolet light to make patterns, but if there is dust attached to the photomask used at this time, the dust will block or reflect the ultraviolet light, thus causing the transfer. Problems such as pattern deformation, short circuit, etc. and quality damage.
因此,這些作業通常在潔淨室(clean room)中進行,但即便如此也難以一直保持光掩模清潔。因此,在光掩模表面貼附護膜作為垃圾遮擋物後進行曝光。此時,異物不直接附著於光掩模的表面而是附著於護膜上,因而若在光刻(lithography)時將焦點對準於光掩模的圖案上,則護膜上的異物與轉印無關。Therefore, these operations are usually performed in a clean room, but even then it is difficult to keep the photomask clean all the time. Therefore, exposure is performed after attaching a pellicle to the surface of the photomask as a dust cover. At this time, the foreign matter does not directly adhere to the surface of the photomask but adheres to the pellicle. Therefore, if the focus is on the pattern of the photomask during lithography, the foreign matter on the pellicle and the transfer film will be separated. India has nothing to do.
通常的護膜中,將使紫外光良好地透過的包含硝基纖維素、丙酸纖維素或氟系樹脂等的透明的護膜膜片黏接於包含鋁合金、不銹鋼、工程塑料(engineering plastics)等的護膜框的框狀面。進而,在護膜膜片的相反側的框狀面,設有用於安裝於光掩模的包含聚丁烯樹脂、聚乙酸乙烯酯樹脂、丙烯酸樹脂、矽酮樹脂等的黏著層,視需要安裝有用於保護黏著層的脫模層(隔離膜)。In the usual pellicle, a transparent pellicle film containing nitrocellulose, cellulose propionate, or fluorine-based resin that allows ultraviolet light to pass through is bonded to aluminum alloy, stainless steel, engineering plastics (engineering plastics), etc. ) and so on the frame-like surface of the protective film frame. Furthermore, on the frame-shaped surface on the opposite side of the pellicle film, an adhesive layer including polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, etc. for mounting on a photomask is provided, and if necessary, There is a release layer (release film) to protect the adhesive layer.
如上文所述,通常護膜膜片是由薄的樹脂構成,因而對其施加適當大小的張力而張設於護膜框,以避免起皺。但是,護膜膜片也有自重,雖然極小,但無論為哪種護膜,護膜膜片均產生向下方的下垂。As mentioned above, the pellicle sheet is usually made of thin resin, so it is stretched on the pellicle frame with an appropriate amount of tension to avoid wrinkling. However, the pellicle diaphragm also has its own weight. Although it is extremely small, no matter what kind of pellicle it is, the pellicle diaphragm will sag downward.
圖9中表示對光掩模貼附有護膜的狀態的截面圖。通常在曝光機內,光掩模91是以描畫有曝光圖案92的面朝下的方式設置。另外,護膜99以覆蓋所述曝光圖案92的方式,經由掩模黏著層96安裝於光掩模91的下表面。FIG. 9 is a cross-sectional view showing a state where a pellicle is attached to the photomask. Usually, in an exposure machine, the
在護膜膜片98的自重下垂量x大的情況下,護膜膜片98的頂點y(通常為護膜的中央)向光掩模91的下方突出,有在曝光機或異物檢查機(未圖示)內干擾裝置零件的危險。通常的曝光機的情況下,若考慮護膜自身或各零件的安裝公差,則容許的護膜膜片的突出量至少為0.8 mm以下,更優選為0.6 mm以下。關於所述容許值,若為採用相同光學系統的曝光機、異物檢查機,則即便護膜變大也要求幾乎相同的數值。When the self-weight sag x of the
但是,近年來曝光機內光掩模的移動速度逐漸變得更為高速,因而移動時護膜膜片承受的風壓或移動開始時、停止時的由慣性所致的護膜內的空氣的偏向變大。由此,除了由自重所致的下垂量x以外,伴隨動作的護膜膜片的搖晃變大,護膜膜片接觸裝置的危險性特別提高。其結果為,膜的自重下垂量x要求更少的值,近年來通常要求0.35 mm,視情況不同有時要求0.2 mm以下。而且,關於膜搖晃量的要求值,視適用的裝置或運轉條件而要求不同,因而不可一概而論,但若舉例,則優選為在任何條件下,對於邊長超過1 m的護膜來說至少為4 mm以下,對於邊長超過1.5 m的護膜來說至少為5 mm以下。However, in recent years, the movement speed of the photomask in the exposure machine has gradually become higher, so the wind pressure on the pellicle diaphragm during movement or the air in the pellicle caused by inertia when the movement starts and stops Bias becomes larger. As a result, in addition to the sagging amount x due to its own weight, the swaying of the pellicle membrane accompanying the operation increases, and the risk of the pellicle membrane contacting the device particularly increases. As a result, the self-weight sag x of the film is required to be a smaller value. In recent years, it is generally required to be 0.35 mm, and it may be required to be 0.2 mm or less depending on the situation. Moreover, the required value of the amount of film shaking depends on the applicable device or operating conditions, so it cannot be generalized. However, as an example, it is preferable that under any conditions, for a protective film with a side length exceeding 1 m, at least 4 mm or less, and at least 5 mm for membranes with sides longer than 1.5 m.
針對所述課題,本新型創作人等曾提出了下述護膜的新型創作,其特徵在於,在護膜框的平行的兩邊間張設包含與護膜膜片不同的材質的、粗細度100 μm以下的細線狀補強體,並且此細線狀補強體接觸護膜膜片的外側(專利文獻1)。 [現有技術文獻] [專利文獻] For said problem, the creators of the present invention once proposed the novel creation of the following pellicle, which is characterized in that, between the parallel both sides of the pellicle frame, a 100-degree thick film comprising a material different from the pellicle diaphragm is stretched. The thin wire-shaped reinforcement body is less than μm, and the thin wire-shaped reinforcement body is in contact with the outer side of the pellicle membrane (Patent Document 1). [Prior art literature] [Patent Document]
[專利文獻1]日本專利第5618888號公報[Patent Document 1] Japanese Patent No. 5618888
[新型創作所要解決的問題][Problems to be solved by new creations]
所述新型創作中,利用補強體的作用來抑制護膜膜片的自重下垂,但補強體經散焦(defocus),因而不對曝光品質造成任何影響。所述新型創作的方法中,即便為一邊的長度超過2000 mm的大的護膜,也可將自重撓曲量抑制為0.3 mm,為對於抑制自重下垂非常有效的方法。但是另一方面,有生產性極差而不適於量產等問題。In the new creation, the reinforcing body is used to suppress the self-weight sagging of the pellicle membrane, but the reinforcing body is defocused, so the exposure quality is not affected in any way. In the method of the above-mentioned novel creation, even for a large protective film with a length of one side exceeding 2000 mm, it is possible to suppress the amount of self-weight deflection to 0.3 mm, which is a very effective method for suppressing self-weight sagging. On the other hand, however, there are problems such as being extremely poor in productivity and not suitable for mass production.
而且,抑制護膜膜片的自重撓曲量x的本質目的如上文所述,為防止裝置內的護膜膜片接觸,但僅簡單地減少護膜膜片的自重撓曲量x的情況下,對於抑制安裝於光掩模的護膜因移動時的外力所產生的護膜膜片的搖晃量來說不充分,護膜膜片接觸的危險性未必降低。Furthermore, the essential purpose of suppressing the self-weight deflection x of the pellicle membrane is to prevent contact between the pellicle membranes in the device as described above, but in the case of simply reducing the self-weight deflection x of the pellicle membrane , it is not sufficient to suppress the amount of shaking of the pellicle sheet due to the external force when the pellicle attached to the photomask is moved, and the risk of contact of the pellicle sheet is not necessarily reduced.
而且,如專利文獻1中也詳述,經由通氣孔94、過濾器95的空氣的流動極為緩慢,自重撓曲量x視氣壓或溫度變化、以及護膜膜片的材質不同,也因濕度而膨脹或收縮而一直變動,作為表示安全性的指標也不大合適。Moreover, as also described in detail in
本新型創作是鑒於所述那樣的問題而成,其目的在於提供一種護膜,此護膜為至少一條邊的邊長超過1000 mm,且當安裝於光掩模的護膜高速移動時,護膜膜片的搖晃量小。 [解決問題的技術手段] The present invention is made in view of the problems described above, and its purpose is to provide a pellicle that has at least one side with a length of more than 1000 mm, and when the pellicle installed on the photomask moves at high speed, the pellicle The vibration of the membrane diaphragm is small. [Technical means to solve the problem]
本新型創作人進行了努力研究,結果發現,為了減少安裝於光掩模的護膜移動時的護膜膜片的搖晃量,重要的是對護膜膜片給予拉伸應變而黏接於護膜框及其方向,從而完成了本新型創作。The inventors of the present invention have conducted diligent research and found that, in order to reduce the amount of vibration of the pellicle film when the pellicle film attached to the photomask moves, it is important to apply tensile strain to the pellicle film and bond it to the pellicle film. Film frame and its direction, thus completing the new creation.
本新型創作的解決手段為一種護膜,包含至少一條邊長超過1000 mm的護膜框、及黏接於其一個框狀面的護膜膜片而構成,且所述護膜的特徵在於,對於護膜膜片,在與相互平行且為線對稱的一對護膜框邊平行的方向(長軸方向)賦予有1%以上且2.5%以下的拉伸應變。進而,在護膜膜片的與所述一對護膜框邊垂直的方向(短軸方向)賦予0.5%以上且2%以下的拉伸應變而黏接固定於護膜框,由此可防止護膜膜片的皺褶。The solution of this new creation is a pellicle, comprising at least one pellicle frame with a side length of more than 1000 mm, and a pellicle diaphragm bonded to one of its frame-shaped surfaces, and the pellicle is characterized in that, The pellicle sheet is provided with a tensile strain of not less than 1% and not more than 2.5% in a direction (major axis direction) parallel to a pair of pellicle frame sides parallel to each other and line-symmetrical. Furthermore, the pellicle sheet is adhesively fixed to the pellicle frame by applying a tensile strain of 0.5% to 2% in the direction (short axis direction) perpendicular to the pair of pellicle frame edges, thereby preventing Wrinkles of the pellicle membrane.
進而,若所述護膜膜片的材質設為非晶質氟系樹脂,則可針對環境變化也不受影響地將護膜膜片的搖晃量維持得小。Furthermore, if the material of the pellicle diaphragm is an amorphous fluorine-based resin, the amount of vibration of the pellicle diaphragm can be kept small without being affected by environmental changes.
進而,對本新型創作的所述特徵附加所述本新型創作人提供的專利文獻1的特徵而得的新型創作也在超大型護膜的情況下,可成為有效的實施方式。即,為下述形態:以接合于本新型創作的賦予有拉伸應變的護膜膜片的方式,將粗細度最大為100 μm的至少一條線狀補強體張設於護膜框的相互相向的兩邊間而成。或者為下述形態:以接合于本新型創作的賦予有拉伸應變的護膜膜片的方式,將粗細度最大為100 μm的兩條線狀補強體沿著護膜框的對角線張設而成。這些的具體內容公開於專利文獻1。
進而,本新型創作為:一種帶護膜的光掩模,將所述護膜安裝於光掩模而成;一種曝光方法,其特徵在於使用所述帶護膜的光掩模進行曝光;以及一種平板顯示器用屏的製造方法,包括使用所述帶護膜的光掩模進行曝光的步驟。
[新型創作的效果]
Furthermore, a novel creation obtained by adding the features of the
根據本新型創作,在與護膜膜片的長邊平行的方向(長軸方向)賦予1%~2.5%的拉伸應變而黏接於護膜框,由此即便為邊長超過1000 mm那樣的大型的護膜,也可將高速移動時的護膜膜片的搖晃量抑制得小。其結果為,降低在曝光機或異物檢查機內護膜膜片接觸裝置零件的危險性。According to this new creation, a tensile strain of 1% to 2.5% is given in the direction parallel to the long side (major axis direction) of the pellicle diaphragm and bonded to the pellicle frame, so even if the side length exceeds 1000 mm The large pellicle can also suppress the vibration of the pellicle diaphragm to a small amount when moving at high speed. As a result, the risk that the pellicle film comes into contact with device parts in an exposure machine or a foreign matter inspection machine is reduced.
以下,對本新型創作的最優實施方式進行說明,但本新型創作不限定於此。Hereinafter, preferred embodiments of the present invention will be described, but the present invention is not limited thereto.
圖1、圖2中表示本新型創作的一實施方式。圖1為平面圖,圖2為圖1的A-A截面圖。在護膜框11的上側框狀面設有護膜膜片黏接層12,黏接有護膜膜片13。而且,在其相反側的框狀面設有掩模黏著層14。本實施方式中,護膜框11的外形成為長方形狀,但也可為與其類似的其他形狀,例如正方形、八角形等。護膜膜片13以在長軸方向(箭頭a方向)施加有規定比率的拉伸應變的狀態經由護膜膜片黏接層12黏接於護膜框11。所述拉伸應變優選設為1%以上且2.5%以下。此處,所謂拉伸應變,為由下式表示的值。
拉伸應變(%)=應變數(拉伸量)(mm)/應變前的拉伸方向的護膜膜片的外尺寸(mm)×100
One embodiment of the present invention is shown in Fig. 1 and Fig. 2 . FIG. 1 is a plan view, and FIG. 2 is a cross-sectional view along A-A of FIG. 1 . A pellicle membrane
通常的護膜膜片為了無皺褶地黏接於護膜框而施加有若干張力,但其量若換算為應變則為0.5%左右。而且,現有技術中如圖10所示那樣,將保持有護膜膜片的支撐框100的邊中央拉伸或擠壓而調節張力,因而無法考慮其位置或大小、方向。A normal pellicle sheet has some tension applied to it to adhere to the pellicle frame without wrinkles, but the amount is about 0.5% in terms of strain. Moreover, in the prior art, as shown in FIG. 10 , the center of the
樹脂的護膜膜片13可伸縮,通過在彈性範圍內賦予拉伸應變從而可提高對外力的阻力。減少膜搖晃量的效果在拉伸應變0.5%以上時變大,從所述觀點來看,越高越好。針對拉伸具有降伏點的材料的情況下,可賦予拉伸應變至降伏點附近,例如氟系樹脂的情況下,降伏點時的伸長量為約10%,因而可賦予拉伸應變至最大9%左右。The
但是另一方面,拉伸應變越高,對外傷的耐受性越降低。即便因接觸等而產生的外傷極小,視其方向不同,也有可能所產生的龜裂一下子傳播而導致護膜膜片的全面破損。而且,對護膜膜片黏接層也一直施加大的剪切應力,從黏接的可靠性的方面來看也有擔憂。若考慮膜搖晃的減少效果與黏接劑的黏接力、對外傷的耐受性的平衡,則最合適的拉伸應變的範圍為1%以上至2.5%以下。而且,也可根據框上的位置來適當調節所述拉伸應變。例如,也可特別提高護膜膜片的搖晃量變大的、長邊方向中心軸上附近的拉伸應變。But on the other hand, the higher the tensile strain, the lower the resistance to trauma. Even if the trauma caused by contact or the like is very small, depending on the direction, the resulting cracks may spread all at once, resulting in complete damage to the pellicle membrane. Furthermore, a large shear stress is always applied to the adhesive layer of the pellicle, and there is concern from the viewpoint of the reliability of the adhesion. Considering the balance between the reduction effect of film shaking, the adhesive force of the adhesive, and the resistance to trauma, the most suitable range of tensile strain is 1% or more and 2.5% or less. Moreover, the tensile strain can also be appropriately adjusted according to the position on the frame. For example, it is also possible to particularly increase the tensile strain in the vicinity of the central axis in the longitudinal direction where the swaying amount of the pellicle sheet becomes large.
通常在光掩模為長方形的情況下,曝光機內的光掩模的移動方向為長軸方向。圖3中表示使帶護膜的光掩模移動並急停時的、護膜膜片的搖晃形態。此圖為長邊中心軸的截面,箭頭表示帶護膜的光掩模的移動方向,二點鏈線表示搖晃最大時的護膜膜片的行為。Usually, when a photomask is rectangular, the movement direction of the photomask in an exposure machine is a long-axis direction. FIG. 3 shows how the pellicle sheet shakes when the pellicle-coated photomask is moved and suddenly stopped. This figure is a cross-section of the central axis of the long side, the arrow indicates the moving direction of the photomask with the pellicle, and the chain line of two dots indicates the behavior of the pellicle diaphragm when the shake is maximum.
護膜膜片的搖晃伴隨光掩模的移動而產生。雖也有因通過狹窄空間而從外部承受的風壓的影響,但最大的搖晃是由於在移動開始時或停止時,護膜內的空氣因慣性偏向一個方向而產生。圖3的示例中,因向右方的急停而護膜內的空氣向右方移動,由此在護膜膜片的B部凹陷,在C部產生突出。這在圖1的平面圖中,分別相當於由點線包圍的B及C的區域。本新型創作中通過在長軸方向施加大的拉伸應變,從而特別對所述方向的空氣的偏向提高阻力,因而可有效地抑制膜搖晃量。The wobble of the pellicle diaphragm is produced with the movement of the photomask. Although there is also the influence of the wind pressure received from the outside due to passing through the narrow space, the biggest shaking is caused by the air in the membrane deflecting in one direction due to inertia when the movement starts or stops. In the example shown in FIG. 3 , the air in the pellicle moves to the right due to the sudden stop to the right, thereby denting the B portion of the pellicle membrane and protruding from the C portion. These correspond to regions B and C surrounded by dotted lines in the plan view of FIG. 1 . In the present invention, by applying a large tensile strain in the direction of the long axis, the resistance to deflection of the air in that direction is increased, thereby effectively suppressing the swaying amount of the film.
圖4中表示本新型創作的另一實施方式的平面圖。護膜膜片43除了圖1的實施方式的長軸方向(箭頭a)以外,在短軸方向(箭頭b)也施加拉伸應變,並經由護膜膜片黏接層42黏接於護膜框41。所述短軸方向的拉伸應變優選為設為0.5%以上且2%以下。若在護膜膜片的長軸方向賦予拉伸應變,則因泊松效應(Poisson effect)而在短軸方向產生收縮,因而其目的為防止皺褶產生。而且,從防止對外傷的耐受性降低的觀點來看,也無需增大對短軸方向賦予的拉伸應變。A plan view of another embodiment of the novel creation is shown in FIG. 4 . In addition to the long axis direction (arrow a) of the embodiment of FIG.
而且,護膜膜片的材質可使用眾所周知的材質,例如硝基纖維素、丙酸纖維素等纖維素系樹脂、非晶質氟系樹脂等。其中,特別宜使用非晶質氟系樹脂。非晶質氟系樹脂並無由吸濕所致的尺寸變化,而且即便使用波長300 nm以下的短波長紫外光,也不存在由蝕刻所致的膜厚減少,因而可長期間穩定地維持所賦予的拉伸應變數,不產生膜搖晃量的變動。而且,由於為非晶質,因而龜裂相對較不易傳播,有即便賦予大的拉伸應變數也對外傷的耐受性強等優點。Moreover, well-known materials can be used for the material of the pellicle film, for example, cellulose-based resins such as nitrocellulose and cellulose propionate, amorphous fluorine-based resins, and the like. Among them, amorphous fluorine-based resins are particularly preferably used. Amorphous fluorine-based resins have no dimensional change due to moisture absorption, and even when short-wavelength ultraviolet light with a wavelength of 300 nm or less is used, there is no decrease in film thickness due to etching, so it can stably maintain the same over a long period of time. The tensile strain value provided does not cause fluctuations in the amount of film shaking. Furthermore, since it is amorphous, cracks are relatively less likely to propagate, and there are advantages such as strong resistance to trauma even when a large tensile strain is applied.
接下來,對本新型創作的護膜的製造方法進行詳述。 在經平滑地研磨的包含石英、低膨脹玻璃等的基板上利用旋塗法、狹縫塗布法等眾所周知的塗敷方法塗布護膜膜片材料的溶液,利用烘箱、加熱板、紅外線(Infrared,IR)燈等加熱機構使溶劑完全蒸發,在基板上獲得經乾燥的護膜膜片的層。 Next, the manufacturing method of the protective film of the present invention will be described in detail. Utilize well-known coating methods such as spin coating method, slit coating method to coat the solution of pellicle diaphragm material on the substrate that comprises quartz, low-expansion glass etc. through smooth grinding, utilizes oven, heating plate, infrared (Infrared, IR) lamps and other heating mechanisms to completely evaporate the solvent and obtain a layer of dried pellicle film on the substrate.
冷卻後,將所述護膜膜片從成膜基板剝離。剝離優選為如圖5的截面圖所示,在基板55上的護膜膜片54的端部黏接支撐框50的膜支撐體52,從角部緩緩提起而剝離。將支撐於支撐框50的護膜膜片的平面圖示於圖6。支撐框50包含外框51、膜支撐體52及拉伸機構53。所述實施方式中,黏接支撐框50而剝離基板55上的護膜膜片54,但護膜膜片的剝離也可利用其他方法進行,然後安裝支撐框50。After cooling, the pellicle sheet was peeled off from the film-forming substrate. The peeling is preferably as shown in the cross-sectional view of FIG. 5 , where the
外框51優選為設為具有剛性的材質、結構,以在對護膜膜片54賦予拉伸應變時不撓曲。膜支撐體52對護膜膜片的周緣分別以20 mm~100 mm的寬度進行分割支撐,通過塗布於表面的黏接劑、雙面膠帶等黏接機構(未圖示)而黏接護膜膜片54。膜支撐體52的寬度越窄,越可細緻地調整拉伸應變,但另一方面,若寬度窄則作業的煩雜程度也激增,因而宜綜合考慮膜的大小、生產性、容易出現皺褶的程度來決定支撐寬度。The
膜支撐體52相對於鄰接的膜支撐體52具有5 mm以下的間隙而配置,分別從外框51經由拉伸機構53進行支撐,可個別地調整其拉伸量。將拉伸機構53的立體圖示於圖7。拉伸機構53搭載於包含可在相對於拉伸方向c正交的方向d移動的軌道71、滑塊72的直動移動機構上,可追隨賦予拉伸應變時的膜的移位而自由移動。作為拉伸機構,本實施方式中利用包含內螺紋部73、外螺紋部74的螺紋機構,但不限定於此。在外螺紋部74的頂端,相對於外螺紋部74的旋轉以自由狀態安裝有在表面具有包含黏接劑或雙面膠帶的膜黏接層75的膜支撐體52,通過外螺紋部74的旋轉操作而膜支撐體52沿拉伸方向c移動。The film supports 52 are arranged with a gap of 5 mm or less with respect to the adjacent film supports 52 , are supported from the
從由支撐框50支撐護膜膜片54的狀態起,通過操作拉伸機構53從而對護膜膜片54給予所需的拉伸應變數。越使膜支撐體52後退,所賦予的拉伸應變數越增加,但以相向的膜支撐體52彼此的移動量成為等量的方式操作。關於操作,宜最初對賦予的拉伸應變數大的長軸方向進行操作,接著對短軸方向進行操作。最後確認護膜膜片54未產生皺褶,然後與通常的護膜製造方法同樣地,在護膜框的護膜膜片黏接層黏接護膜膜片54而完成護膜。
[實施例]
From the state where the
以下,對本新型創作的實施例進行說明,但本新型創作不限定於此。 [實施例1] Hereinafter, examples of the present invention will be described, but the present invention is not limited thereto. [Example 1]
制作圖8的立體圖所示的護膜80。護膜框81為使用A5052鋁合金通過機械加工所製作的外尺寸1526 mm×1748 mm、內尺寸1493 mm×1715 mm的長方形,高度設為6.0 mm,各角部的形狀設為內側R2、外側R6。而且,在長邊外表面,各邊設有兩處操作(handling)用的直徑2.5 mm、深度2 mm的凹孔82,在短邊外表面設有高度2 mm、深度3 mm的槽83,同樣地在長邊外表面的三處設有高度2 mm、深度3 mm的槽84。而且,在兩長邊各設有8處直徑1.5 mm的通氣孔85、過濾器86。最後對表面進行噴砂處理後,實施黑色耐酸鋁(alumite)處理。The
將所述護膜框81搬入至潔淨室,以表面活性劑及純水充分清洗,進行乾燥。接著,在護膜框的其中一個框狀面,以甲苯將作為護膜膜片黏接層88的矽酮黏著劑稀釋並利用空氣加壓式分注器塗布為厚度2 mm,在另一個框狀面,以甲苯將作為掩模黏著層87的矽酮黏著劑(信越化學工業(股)製造)稀釋並利用空氣加壓式分注器塗布為厚度2 mm,通過加熱進行固化。The
接下來,在1620 mm×1780 mm×厚度17 mm的經平滑地研磨的石英基板55上,利用狹縫模塗布機塗布溶解有非晶質氟樹脂(商品名Cytop,旭硝子(股)製造)的護膜膜片材料溶液。此時的塗布量是以乾燥後膜厚成為3.9 μm的方式設定。接下來,利用烘箱將其加熱至180℃,使溶劑乾燥。Next, on a smooth
對於所述基板55上的護膜膜片54,如圖5所示那樣黏接支撐框50。此處,支撐框50的拉伸機構成為圖7所示的結構。將設於膜支撐體52的下表面的包含矽酮雙面膠帶的膜黏接層75黏接於基板端的護膜膜片54,接下來將所述支撐框50從角部緩緩提起。圖6為表示剝離後的狀態的平面圖。For the
接下來,操作拉伸機構53使膜支撐體52向膜中央方向移動,求出護膜膜片開始鬆弛的位置。以所述位置為基準,同時操作配置于短邊上的相向的拉伸機構53而對護膜膜片給予長軸方向的拉伸應變。此時賦予伸長量為41 mm、伸長率為約2.3%的拉伸應變,操作是從短邊的中心向外側依次進行。接下來,同樣地操作配置于長邊的拉伸機構53,在短軸方向賦予應變數為30 mm、伸長率為約1.9%的拉伸應變。最後對膜全面進行目測觀察,確認未產生皺褶。Next, the stretching
將支撐有所述在長軸方向、短軸方向賦予有拉伸應變的護膜膜片54的支撐框50移動,如圖8所示,在如上文所述那樣製作的護膜框81上的護膜膜片黏接層88黏接護膜膜片89,利用切割機將周圍的多餘膜切斷而完成護膜80。本實施例1中,拉伸應變是在圖4所示的方向a、方向b賦予。Move the supporting
將完成的護膜80貼附於1620 mm×1780 mm×厚度17 mm的石英基板後,搭載於包含直動導件及滑塊的運動機構上,如圖3所示那樣沿水準方向移動,利用鐳射測距感測器測量移動中的膜搖晃量。其結果為,在速度1300 mm/s、加速度2940 mm/s
2、減速度2940 mm/s
2的條件下,護膜膜片的突出側最大搖晃量成為約2.3 mm,此為完全不用擔心膜接觸的值。
[實施例2]
After the completed
改變對護膜膜片賦予的應變數,與所述實施例同樣地製作護膜。此時賦予下述拉伸應變:在長軸方向伸長量為19 mm且伸長率為約1.1%,在短軸方向伸長量為10 mm且伸長率為0.6%。對所完成的護膜以與所述實施例完全相同的條件評價膜搖晃量,結果護膜膜片的最大搖晃量成為約3.7 mm,為實用上並無膜接觸的憂慮的水準。 [比較例] A pellicle was fabricated in the same manner as in the above-mentioned examples, changing the strain number applied to the pellicle sheet. At this time, a tensile strain of 19 mm with an elongation of about 1.1% in the major axis direction and 10 mm with an elongation of 0.6% in the minor axis direction was imparted. The amount of film shake was evaluated on the completed pellicle under exactly the same conditions as in the above-mentioned examples. As a result, the maximum shake amount of the pellicle sheet was about 3.7 mm, which is a level at which there is no concern about film contact in practice. [comparative example]
與實施例1同樣地,在1620 mm×1780 mm×厚度17 mm的經平滑地研磨的石英制的基板上,利用狹縫模塗布機塗布溶解有非晶質氟樹脂(商品名塞桃浦(CYTOP),旭硝子(股)製造)的護膜膜片材料溶液,使其乾燥。在所述基板上的護膜膜片的周緣部,黏接圖10所示那樣的支撐框100,從角部緩緩剝離而獲得護膜膜片101。所述實施例1、實施例2中,護膜膜片由支撐框50剝離、保持,由拉伸機構賦予拉伸應變,但本比較例的支撐框100並無拉伸機構。為了防止皺褶,將護膜膜片101的各長邊、各短邊的中央如圖中箭頭那樣向外側拉伸,直接保持此狀態黏接於與所述實施例1、實施例2同樣地製作的護膜框上的護膜膜片黏接層,利用切割機將框周圍的多餘膜切斷而完成護膜。此時,支撐框100成為若拽拉邊的中央則邊總體撓曲而將膜拉伸的形狀,而且長邊、短邊的拉伸量相互影響。因此,拉伸量無法與所述實施例簡單地比較,但若作為參考而在邊中央部求出拉伸應變,則長邊、短邊均為約0.5%。In the same manner as in Example 1, on a smooth polished quartz substrate of 1620 mm x 1780 mm x thickness 17 mm, an amorphous fluororesin (trade name Cytop ), manufactured by Asahi Glass Co., Ltd.) of the pellicle membrane material solution, and allowed to dry. A
對所完成的護膜以與所述實施例1、實施例2完全相同的條件評價膜搖晃量,結果護膜膜片的最大搖晃量在突出側成為約5.2 mm,此為在裝置內有護膜膜片接觸的憂慮的水準。The completed pellicle was evaluated on the same conditions as in Example 1 and Example 2. As a result, the maximum wobble of the pellicle sheet was about 5.2 mm on the protruding side. Diaphragm Diaphragm contact worry level.
11、41、81、93:護膜框
12、42、88、97:護膜膜片黏接層
13、43、54、89、98、101:護膜膜片
14、87、96:掩模黏著層
15、91:光掩模
50、100:支撐框
51:外框
52:膜支撐體
53:拉伸機構
55:基板
71:軌道
72:滑塊
73:內螺紋部
74:外螺紋部
75:膜黏接層
80、99:護膜
82:凹孔
83:槽(短邊)
84:槽(長邊)
85、94:通氣孔
86:過濾器
92:曝光圖案
95:過濾器
a:拉伸方向(長軸方向)
A:長軸方向中心
b:拉伸方向(短軸方向)
B:膜搖晃量大的區域(凹)
c:拉伸方向
C:膜搖晃量大的區域(凸)
d:相對於拉伸方向的正交方向
x:護膜膜片的自重撓曲量
y:護膜膜片的頂點(中心)
11, 41, 81, 93:
圖1為表示本新型創作的一實施方式的平面圖。 圖2為表示本新型創作的一實施方式的圖1的A-A截面圖。 圖3為表示使安裝有護膜的光掩模水準移動時的、護膜膜片的行為的說明圖。 圖4為表示本新型創作的一實施方式的平面圖。 圖5為用於說明使用本新型創作所用的支撐框的、護膜膜片的剝離方法的截面圖。 圖6為本新型創作所用的支撐框的概略平面圖。 圖7為本新型創作所用的支撐框拉伸機構的立體圖。 圖8為由實施例所製作的護膜的立體概略圖。 圖9為在光掩模安裝有護膜的狀態的概略截面圖。 圖10為比較例所用的支撐框的概略平面圖。 Fig. 1 is a plan view showing an embodiment of the present invention. Fig. 2 is a sectional view along A-A of Fig. 1 showing an embodiment of the present invention. FIG. 3 is an explanatory view showing the behavior of the pellicle film when the photomask mounted with the pellicle is moved horizontally. Fig. 4 is a plan view showing an embodiment of the present invention. Fig. 5 is a cross-sectional view for explaining a method of peeling off a pellicle membrane using a support frame used in the invention. Fig. 6 is a schematic plan view of the used supporting frame of the present invention. Fig. 7 is the perspective view of the supporting frame stretching mechanism used in the novel creation. Fig. 8 is a schematic perspective view of a pellicle produced in an example. 9 is a schematic cross-sectional view of a state where a pellicle is attached to a photomask. Fig. 10 is a schematic plan view of a support frame used in a comparative example.
50:支撐框 50: support frame
51:外框 51: Outer frame
52:膜支撐體 52: Membrane support
53:拉伸機構 53: stretching mechanism
54:護膜膜片 54: Protective membrane diaphragm
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2021067563A JP7553397B2 (en) | 2021-04-13 | 2021-04-13 | Pellicle |
JP2021-067563 | 2021-04-13 |
Publications (1)
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TWM637276U true TWM637276U (en) | 2023-02-11 |
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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TW111113810A TW202248748A (en) | 2021-04-13 | 2022-04-12 | Cover film, exposure method, and method for manufacturing screen for flat panel display |
TW111203664U TWM637276U (en) | 2021-04-13 | 2022-04-12 | Photomask with pellicle, exposure system, and panel manufacturing system of flat panel displays |
Family Applications Before (1)
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TW111113810A TW202248748A (en) | 2021-04-13 | 2022-04-12 | Cover film, exposure method, and method for manufacturing screen for flat panel display |
Country Status (4)
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JP (1) | JP7553397B2 (en) |
KR (1) | KR20220141754A (en) |
CN (2) | CN217787599U (en) |
TW (2) | TW202248748A (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5445186A (en) | 1977-09-16 | 1979-04-10 | Hokushin Electric Works | Pressure receiving capsule |
JP2005202011A (en) | 2004-01-14 | 2005-07-28 | Mitsui Chemicals Inc | Pellicle |
JP2011158585A (en) | 2010-01-29 | 2011-08-18 | Shin-Etsu Chemical Co Ltd | Pellicle and method for manufacturing the same |
JP5618888B2 (en) | 2011-04-04 | 2014-11-05 | 信越化学工業株式会社 | Method for producing pellicle and pellicle film |
-
2021
- 2021-04-13 JP JP2021067563A patent/JP7553397B2/en active Active
-
2022
- 2022-04-11 KR KR1020220044481A patent/KR20220141754A/en unknown
- 2022-04-12 CN CN202220827623.6U patent/CN217787599U/en active Active
- 2022-04-12 CN CN202210376691.XA patent/CN115202148A/en active Pending
- 2022-04-12 TW TW111113810A patent/TW202248748A/en unknown
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JP2022162654A (en) | 2022-10-25 |
KR20220141754A (en) | 2022-10-20 |
JP7553397B2 (en) | 2024-09-18 |
TW202248748A (en) | 2022-12-16 |
CN115202148A (en) | 2022-10-18 |
CN217787599U (en) | 2022-11-11 |
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