KR20220141754A - Pellicle - Google Patents

Abstract

The present invention provides a pellicle in which the side length of at least one side exceeds 1000 mm, and the amount of shaking of the pellicle film is small when the pellicle mounted on a photomask moves at high speed. The present invention is a pellicle composed of a pellicle frame having at least one side length exceeding 1000 mm, and a pellicle film bonded to one frame-like surface thereof, wherein a tensile strain of 1 % or more and 2.5 % or less is applied to the pellicle film in a direction parallel to a pair of mutually parallel and line-symmetrical pellicle frame sides.

Description

pellicle {PELLICLE}

The present invention relates to a pellicle used as a dust shield for manufacturing semiconductor devices, printed circuit boards or flat panels, and in particular, a pellicle having at least one side length exceeding 1000 mm used for manufacturing FPD devices such as liquid crystals. it's about

In the manufacture of flat panel display panels used for semiconductors such as LSI and super LSI, liquid crystal displays, organic EL displays, etc., a pattern is produced by irradiating ultraviolet light to a semiconductor wafer or liquid crystal glass plate coated with photoresist. However, if dust is attached to the photomask used at this time, since the dust blocks or reflects ultraviolet light, deformation of the transferred pattern, short circuit, etc. occur, and there is a problem that the quality is damaged. .

For this reason, although these operations are normally performed in a clean room, it is still difficult to always keep the photomask clean. Then, after affixing a pellicle as a dust barrier on the surface of a photomask, exposure is performed. In this case, since the foreign material does not directly adhere to the surface of the photomask but adheres to the pellicle, if the focus is set on the pattern of the photomask during lithography, the foreign material on the pellicle becomes independent of the transfer.

In a general pellicle, a transparent pellicle film made of nitrocellulose, cellulose propionate, or fluorine-based resin that transmits ultraviolet light well is adhered to the frame surface of a pellicle frame made of aluminum alloy, stainless steel, engineering plastic, etc. have. In addition, an adhesive layer made of polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, etc. for mounting on a photomask is provided on the frame surface on the opposite side of the pellicle film, and if necessary, the adhesive layer is protected. A target release layer (separator) is attached.

As described above, since the pellicle film is generally made of a thin resin, a tension of an appropriate size is applied to the pellicle frame to prevent wrinkles from forming. However, the pellicle film also has its own weight, and although there is very little, the pellicle film deflects downward in any pellicle.

Fig. 9 shows a cross-sectional view of a state in which a pellicle is affixed to a photomask. Usually, in the exposure machine, the photomask 91 is provided so that the surface on which the exposure pattern 92 is drawn may become downward. Then, the pellicle 99 is attached to the lower surface of the photomask 91 via a mask adhesive layer 96 so as to cover the exposure pattern 92 .

When the weight deflection (deflection amount) x of the pellicle film 98 is large, the apex (y) (normally the center of the pellicle) of the pellicle film 98 protrudes downward of the photomask 91 . and there is a risk of interfering with device parts in an exposure machine or a foreign material inspection machine (not shown). In the case of a general exposure machine, the allowable amount of protrusion of the pellicle film is at least 0.8 mm or less, more preferably 0.6 mm or less, in consideration of the pellicle itself and the attachment tolerance of each component. If the tolerance value is an exposure machine and a foreign material inspection machine employing the same optical system, substantially the same numerical value is required even if the pellicle becomes large.

However, in recent years, since the moving speed of the photomask in the exposure machine has become higher, the bias of the air in the pellicle due to the wind pressure received by the pellicle film during movement and inertia at the start and stop of the movement has increased. Thereby, in addition to the deflection amount x due to its own weight, the shaking of the pellicle film accompanying the operation increases, and the risk of the pellicle film coming into contact with the device is significantly increased. As a result, the self-weight deflection amount (x) of the film is required to be smaller, and in recent years, generally 0.35 mm and in some cases 0.2 mm or less are required. In addition, the required value for the amount of membrane shake cannot be uniformly stated because the requirements are different even in the applied equipment and operating conditions. , in the case of a pellicle having a side length exceeding 1.5 m, it is preferably at least 5 mm or less.

In the past, the present inventors have addressed this problem by installing, between two parallel sides of a pellicle frame, a thin reinforcing body with a thickness of 100 μm or less made of a material different from that of the pellicle film, and at the same time reinforcing the thin reinforcing body. The invention of a pellicle characterized in that the sieve is in contact with the outer side of a pellicle film|membrane was proposed (patent document 1).

Japanese Patent No. 5618888 Publication

In this invention, although the self-weight sag of the pellicle film is suppressed by the action of the reinforcing body, since the reinforcing body is defocused, the exposure quality is not affected at all. The method of this invention was able to suppress the self-weight deflection amount to 0.3 mm even if the length of one side is a large pellicle more than 2000 mm, and it was a very effective method for self-weight sag suppression. However, on the other hand, there was a problem in that the productivity was extremely bad and it was not suitable for mass production.

In addition, although the essential purpose of suppressing the weight deflection amount (x) of the pellicle film is to prevent contact with the pellicle film in the apparatus as described above, simply reducing the weight deflection amount (x) of the pellicle film is applied to the photomask. It is insufficient to suppress the amount of shaking of the pellicle film caused by an external force during movement of the mounted pellicle, and the risk of contact with the pellicle film is not necessarily reduced.

In addition, as described above in Patent Document 1, the flow of air through the ventilation holes 94 and the filter 95 is extremely slow, and the deflection amount (x) of its own weight depends on the atmospheric pressure or temperature change, and the humidity depending on the material of the pellicle membrane. Therefore, it is constantly fluctuating due to swelling or shriveling, so it is slightly unsuitable as an indicator of safety.

The present invention has been made in view of the above problems, and in a pellicle having at least one side exceeding 1000 mm, it is an object of the present invention to provide a pellicle with a small amount of shaking of the pellicle film when the pellicle mounted on the photomask moves at high speed. The purpose.

As a result of intensive studies, the present inventors have found that in order to reduce the amount of shaking of the pellicle film when the pellicle mounted on the photomask moves, the pellicle film is subjected to tensile deformation and adhered to the pellicle frame, and its direction is important. found, and completed the present invention.

A solution of the present invention is a pellicle comprising a pellicle frame having at least one side length exceeding 1000 mm and a pellicle film adhered to one of the frame top surfaces thereof, wherein a pair of pellicle frame sides parallel and line symmetric to each other are provided. A pellicle characterized in that a tensile strain of 1% or more and 2.5% or less is applied to the pellicle film in a parallel direction (long-axis direction). In addition, by applying a tensile strain of 0.5% or more and 2% or less to the pellicle frame in a direction perpendicular to the side of the pair of pellicle frames of the pellicle film (short axis direction), and fixing it to the pellicle frame, wrinkles of the pellicle film can be prevented.

In addition, if the material of the pellicle film is an amorphous fluorine-based resin, it is not affected by environmental changes and the amount of shaking of the pellicle film can be kept small.

Moreover, the invention which added the characteristic of patent document 1 provided by this inventor to the said characteristic of this invention mentioned above will also become an effective embodiment in the case of a super large pellicle. That is, in order to join the pellicle film to which the tensile strain is applied according to the present invention, at least one linear reinforcing body having a maximum thickness of 100 μm is provided between two opposite sides of the pellicle frame. Alternatively, in order to bond to the pellicle membrane to which the tensile strain of the present invention is applied, it is an aspect in which two linear reinforcing bodies having a maximum thickness of 100 μm are installed along the diagonal of the pellicle frame. These specific contents are disclosed in Patent Document 1.

In addition, the present invention provides a photomask with a pellicle formed by attaching the pellicle to a photomask, an exposure method comprising exposing using the photomask with a pellicle, and a step of exposing using the photomask with a pellicle It is a manufacturing method of the panel for flat panel displays which has.

According to the present invention, by applying a tensile strain of 1 to 2.5% in the direction parallel to the long side (long axis direction) of the pellicle film and adhering it to the pellicle frame, even a large pellicle with a side length exceeding 1000 mm, high speed It is possible to suppress the amount of shaking of the pellicle film when it is moved to a small level. As a result, in an exposure machine or a foreign material inspection machine, the risk of a pellicle film|membrane coming into contact with an apparatus component is reduced.

BRIEF DESCRIPTION OF THE DRAWINGS It is a top view which shows one Embodiment of this invention.
Fig. 2 is a cross-sectional view taken along line AA of Fig. 1 showing one embodiment of the present invention.
Fig. 3 is an explanatory diagram showing the behavior of the pellicle film when the photomask on which the pellicle is mounted is horizontally moved.
4 is a plan view showing an embodiment of the present invention.
5 is a cross-sectional view for explaining a method of peeling a pellicle film using a support frame used in the present invention.
6 is a schematic plan view of a support frame used in the present invention.
7 is a perspective view of the support frame tensioning mechanism used in the present invention.
Fig. 8 is a schematic perspective view of a pellicle manufactured according to an embodiment.
9 is a schematic cross-sectional view of a state in which a pellicle is attached to a photomask.
It is a schematic plan view of the support frame used by the comparative example.

Hereinafter, although the best form for implementing this invention is demonstrated, this invention is not limited to this.

1 and 2 show one embodiment of the present invention. 1 is a plan view, and FIG. 2 is a cross-sectional view taken along line A-A of FIG. 1 . A pellicle film adhesive layer 12 is provided on the upper frame surface of the pellicle frame 11, and the pellicle film 13 is adhered thereto. Moreover, the mask adhesive layer 14 is provided in the frame-like surface of the opposite side. In this embodiment, although the outer shape of the pellicle frame 11 is a rectangular shape, other shapes similar to this, for example, a square, an octagon, etc. may be sufficient. The pellicle film 13 is adhered to the pellicle frame 11 via the pellicle film adhesive layer 12 in a state in which a predetermined ratio of tensile strain is applied in the major axis direction (arrow a direction). It is preferable to make this tensile strain into 1 % or more and 2.5 % or less. Here, the tensile strain is a value represented by the following formula.

Tensile strain (%) = Amount of strain (tensile amount) (mm) / Outside dimension of the pellicle film in the tensile direction before deformation (mm) x 100

A typical pellicle film applies a certain amount of tension for the purpose of adhesion to the pellicle frame without wrinkles, but the amount is about 0.5% in terms of deformation. In addition, in the prior art, as shown in FIG. 10 , since the tension was adjusted by pulling or pressing the center of the side of the support frame 100 holding the pellicle film, the position, size, and direction could not be considered.

The resin pellicle film 13 can be stretched and contracted, and resistance to external force can be increased by applying a tensile strain within an elastic range. The effect of reducing the amount of film wobble becomes greater when the tensile strain is 0.5% or more, and from that point of view, the greater the better. In the case of a material having a yield point with respect to tension, tensile strain can be applied up to the yield point. For example, in the case of a fluorine-based resin, the elongation at the yield point is about 10%. can do.

However, on the other hand, the higher the tensile strain, the lower the resistance to trauma. Even if the trauma caused by contact or the like is small, depending on the direction, the generated crack may propagate at once, leading to total damage of the pellicle film. Moreover, a large shearing stress is always applied also to the pellicle film|membrane adhesive layer, and there exists a concern also in the point of the reliability of adhesion|attachment. Considering the balance between the film shake reduction effect, the adhesive strength of the adhesive, and the resistance to trauma, the most suitable range of tensile strain is 1% or more and 2.5% or less. Moreover, this tensile strain can also be suitably adjusted by the position on a frame. For example, the tensile strain in the vicinity of the central axis in the longitudinal direction where the amount of wobble of the pellicle film is increased may be particularly high.

Usually, when a photomask is rectangular, the movement direction of the photomask in an exposure machine is a long-axis direction. Fig. 3 shows the shaking form of the pellicle film when the photomask with pellicle is moved and stopped suddenly. This figure is a cross-section along the longitudinal axis, the arrow indicates the movement direction of the photomask with pellicle, and the dashed-dotted line indicates the behavior of the pellicle film when the vibration is greatest.

The shaking of the pellicle film occurs with the movement of the photomask. There is also the influence of wind pressure received from the outside by passing through a narrow space, but the biggest shake occurs when the air in the pellicle is biased in one direction due to inertia when the movement starts or stops. In the example of Fig. 3, the air in the pellicle moves to the right due to a sudden stop in the right direction, whereby the pellicle film is dented in the B portion and protrudes in the C portion. This corresponds to regions B and C surrounded by dotted lines, respectively, in the plan view of FIG. 1 . In the present invention, by applying a large tensile strain in the major axis direction, in particular, the resistance to air bias in this direction is increased, so that the amount of membrane shake can be effectively suppressed.

Fig. 4 shows a plan view of another embodiment of the present invention. The pellicle film 43 is attached to the pellicle frame 41 through the pellicle film adhesive layer 42 by applying a tensile strain in the minor axis direction (arrow b) in addition to the major axis direction (arrow a) of the embodiment of FIG. 1 . are doing The tensile strain in the uniaxial direction is preferably set to 0.5% or more and 2% or less. When tensile strain is applied in the long-axis direction of the pellicle film, shrinkage occurs in the short-axis direction due to the Poisson effect, so the purpose of this is to prevent the occurrence of wrinkles. Further, it is not necessary to increase the tensile strain applied in the uniaxial direction also from the viewpoint of preventing a decrease in resistance to trauma.

Moreover, the material of a pellicle film|membrane can use a well-known thing, for example, cellulose-type resin, such as nitrocellulose and cellulose propionate, an amorphous|non-crystalline fluorine-type resin, etc. can be used. Among these, it is particularly preferable to use an amorphous fluorine-based resin. The amorphous fluorine-based resin has no dimensional change due to moisture absorption, and no film thickness reduction due to etching even when short-wavelength ultraviolet light with a wavelength of 300 nm or less is used. no change occurs in Moreover, since it is amorphous, cracks are comparatively hard to propagate, and there exists an advantage that it is strong with respect to trauma even if a large amount of tensile deformation is given.

Next, the method for manufacturing the pellicle of the present invention will be described in detail.

A solution of the pellicle film material is applied on a substrate made of smooth polished quartz or low-expansion glass, etc. by a known coating method such as a spin coating method or a slit coating method, followed by an oven, a hot plate, or an IR lamp. The solvent is completely evaporated by heating means, such as, and a dry pellicle film|membrane layer is obtained on a board|substrate.

After cooling, the pellicle film is peeled from the deposition substrate. For peeling, as shown in the cross-sectional view of FIG. 5, it is preferable to attach the membrane support 52 of the support frame 50 to the end of the pellicle film 54 on the substrate 55, and slowly lift it from the corner to peel it. . A plan view of the pellicle membrane supported by the support frame 50 is shown in FIG. 6 . The support frame 50 is composed of an outer frame 51 , a membrane support 52 , and a tensioning mechanism 53 . In this embodiment, the support mold 50 is adhered to peel the pellicle film 54 on the substrate 55. However, the pellicle film may be peeled off by other means, and then the support mold 50 may be attached.

The outer frame 51 is preferably made of a rigid material and structure so as not to warp when tensile deformation is applied to the pellicle film 54 . The membrane support 52 divides and supports the periphery of the pellicle membrane with a width of about 20 to 100 mm, respectively. do. As the width of the membrane support 52 is narrower, the tensile strain can be finely adjusted. On the other hand, if the width is narrow, the complexity of the operation also increases. It is better to decide

The membrane supports 52 are arranged with a gap of 5 mm or less with respect to the adjacent ones, and each is supported from the outer frame 51 via a tensioning mechanism 53, so that the amount of tension can be individually adjusted. A perspective view of the tensioning mechanism 53 is shown in FIG. 7 . The tensioning mechanism 53 is mounted on a linear movement means comprising a rail 71 and a slider 72 movable in a direction d orthogonal to the tensioning direction c, and prevents tensile deformation. It can move freely by following the displacement of the film|membrane when it is applied. As a tensioning means, although this embodiment uses the screw mechanism comprised by the female thread part 73 and the male thread part 74, it is not limited to this. At the tip of the male screw portion 74, a membrane support 52 having a film adhesive layer 75 made of an adhesive or double-sided tape on its surface is attached in a free state to rotation of the male screw portion 74, and the male screw portion ( 74), the membrane support 52 moves in the tensile direction c.

In a state in which the pellicle film 54 is supported by the support frame 50 , a desired tensile strain is applied to the pellicle film 54 by operation of the tension mechanism 53 . As the membrane supports 52 are retracted, the amount of tensile strain applied increases, but the amount of movement is operated so that the opposing membrane supports 52 become the same amount. It is preferable to operate the major axis direction with a large amount of tensile strain applied first, and then operate the minor axis direction. Finally, it is confirmed that no wrinkles have occurred in the pellicle film 54, and thereafter, in the same manner as in the normal pellicle manufacturing method, the pellicle film 54 is adhered to the pellicle film adhesive layer of the pellicle frame to complete the pellicle. .

Example

Hereinafter, although the Example of this invention is described, this invention is not limited to this.

Example 1

The pellicle 80 shown in the perspective view of FIG. 8 was produced. The pellicle frame 81 is a rectangle with an outer dimension of 1526 x 1748 and an inner dimension of 1493 x 1715 mm produced by machining using A5052 aluminum alloy, the height is 6.0 mm, and the shape of each corner is R2 inside and R6 outside. did. In addition, two recessed holes 82 having a diameter of 2.5 mm and a depth of 2 mm are provided on the outer surface of the long side at two places for handling, and a groove 83 having a height of 2 mm and a depth of 3 mm on the outer surface of the short side is similarly high at three places on the outer surface of the long side. A groove 84 having a depth of 2 mm and a depth of 3 mm was provided. In addition, eight vent holes 85 and filters 86 each having a diameter of 1.5 mm were provided on both long sides. Finally, the surface was subjected to a black alumite treatment after sandblasting.

This pellicle frame 81 was brought into a clean room, washed well with a surfactant and pure water, and dried. Then, a silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd.) as a pellicle film adhesive layer 88 on one mold surface of the pellicle frame and a silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd.) as a mask adhesive layer 87 on the other mold surface was diluted with toluene. Then, it was applied to a thickness of 2 mm with an air pressure dispenser, and cured by heating.

Next, a pellicle film material solution in which an amorphous fluororesin (trade name: Cytop, manufactured by Asahi Glass Co., Ltd.) was dissolved by a slit die coater on a smooth polished quartz substrate 55 of 1620 × 1780 × thickness of 17 mm was applied it was spread The application amount at this time was set so that the film thickness after drying might be set to 3.9 micrometers. Then, it was heated in an oven to 180° C. to dry the solvent.

A support frame 50 was adhered to the pellicle film 54 on the substrate 55 as shown in FIG. 5 . Here, the tensioning mechanism of the support frame 50 has the structure shown in FIG. A film adhesive layer 75 made of a silicone double-sided tape provided on the lower surface of the film support 52 was adhered to the pellicle film 54 at the end of the substrate, and then the support frame 50 was slowly lifted from the corner. . 6 is a plan view showing a state after peeling.

Next, the tension mechanism 53 was operated to move the membrane support 52 toward the membrane center, and a position at which the pellicle membrane started to loosen was found. Based on this position, the opposite tensioning mechanisms 53 disposed on the short sides were simultaneously operated to give the pellicle film a tensile strain in the long axis direction. At this time, the applied elongation amount was 41 mm, and the tensile strain was about 2.3% as the elongation rate, and the operation was performed sequentially from the center of the short side to the outside. Next, the tension mechanism 53 arranged on the long side was similarly operated, and a tensile strain of about 1.9% was applied in the short axis direction as a deformation amount of 30 mm and an elongation rate. Finally, the entire film was visually observed and it was confirmed that wrinkles were not generated.

By moving the support frame 50 supporting the pellicle film 54 to which tensile strain has been applied in the major axis direction and the minor axis direction, as shown in FIG. 8 , the pellicle film adhesive layer on the pellicle frame 81 produced as described above. The pellicle film 89 was adhered to the 88, and the surrounding surplus film was cut with a cutter to complete the pellicle 80. In Example 1, tensile strain is applied to the directions a and b shown in FIG. 4 .

The completed pellicle 80 is affixed to a quartz substrate of 1620×1780×thickness 17 mm, then mounted on an exercise mechanism comprising a linear guide and a slider, and is moved in the horizontal direction as shown in FIG.距) The amount of membrane shake during movement was measured by the sensor. As a result, under the conditions of a speed of 1300 mm/s, an acceleration of 2940 mm/s ² , and a deceleration of 2940 mm/s ² , the maximum amount of wobble on the protruding side of the pellicle film was about 2.3 mm, which was a value that did not cause any concern about film contact.

Example 2

The amount of deformation applied to the pellicle film was changed, and a pellicle was produced in the same manner as in the above example. The amount applied and elongated at this time was set to a tensile strain of 19 mm in the major axis direction, about 1.1% in elongation, 10 mm in the minor axis direction, and 0.6% in elongation. When the amount of film shake of the completed pellicle was evaluated under the exact same conditions as in the above example, the maximum amount of shake of the pellicle film was about 3.7 mm, which was practically at a level where there was no concern about film contact.

comparative example

In the same manner as in Example 1, a pellicle film material in which an amorphous fluororesin (trade name: Cytop, manufactured by Asahi Glass Co., Ltd.) was dissolved on a smooth polished quartz substrate having a thickness of 1620 × 1780 × 17 mm with a slit die coater. The solution was applied and it was dried. A support frame 100 as shown in Fig. 10 was adhered to the periphery of the pellicle film on this substrate, and peeled slowly from the corner to obtain the pellicle film 101. In Examples 1 and 2, the pellicle film was peeled off and held by the support mold 50, and tensile strain was applied by a tensioning mechanism. However, the support mold 100 of this comparative example does not have a tensioning mechanism. For the purpose of preventing wrinkles, the center of each long side and each short side of the pellicle membrane 101 is stretched outward as indicated by the arrow in the drawing, and the pellicle is manufactured in the same manner as in Examples 1 and 2 while maintaining the state. It was adhered to the pellicle film adhesive layer on the frame, and the surplus film around the frame was cut with a cutter to complete the pellicle. At this time, in the support frame 100, if the center of the side is subtracted, the entire side is bent and the membrane is tensioned, and the tensile amounts of the long side and the short side influence each other. Therefore, although the tensile amount cannot simply be compared with the above example, as a reference, when the tensile strain is calculated in the central portion of the side, both the long side and the short side are about 0.5%.

When the film shake amount of the completed pellicle was evaluated under exactly the same conditions as in Examples 1 and 2, the maximum amount of shake of the pellicle film was about 5.2 mm from the protruding side, which was a level at which the pellicle film could come into contact in the device. .

11: pellicle frame 12: pellicle film adhesive layer
13: pellicle film 14: mask adhesive layer
15: photo mask 41: pellicle frame
42: pellicle film adhesive layer 43: pellicle film
50: support frame 51: outer frame
52: membrane support 53: tension mechanism
54: pellicle film 55: substrate
71: rail 72: slider
73: female thread part 74: male thread part
75: film adhesive layer 80: pellicle
81: pellicle frame 82: concave hole
83: Groove (short side) 84: Groove (long side)
85: vent hole 86: filter
87: mask adhesive layer 88: pellicle film adhesive layer
89: pellicle film 91: photomask
92: exposure pattern 93: pellicle frame
94: ventilation hole 95: filter
96: mask adhesive layer 97: pellicle film adhesive layer
98: pellicle film 99: pellicle
100: support frame 101: pellicle membrane
A: long axis center
B: Area with a large amount of membrane shake (concave)
C: Area with a large amount of membrane shake (convex)
a: tensile direction (long axis direction) b: tensile direction (short axis direction)
c: direction of tension d: direction orthogonal to direction of tension
x: Deflection amount of the pellicle film under its own weight (deflection amount)
y: vertex (center) of the pellicle membrane

Claims (10)

A pellicle comprising a pellicle frame having at least one side length exceeding 1000 mm and a pellicle film adhered to one of the frame-like surfaces thereof, wherein a pair of pellicle frame sides parallel to each other and line-symmetrical are parallel to each other. A pellicle characterized in that a tensile strain of 1% or more and 2.5% or less is applied to the pellicle film in one direction. The method of claim 1,
A pellicle characterized in that a tensile strain of 0.5% or more and 2% or less is applied to the pellicle film in a direction perpendicular to the sides of the pair of pellicle frames. The method of claim 1,
The pellicle frame is rectangular, and the pair of pellicle frame sides is a long side of the rectangle. 4. The method of claim 3,
A pellicle characterized in that a tensile strain of 0.5% or more and 2% or less is applied to the pellicle film in a direction perpendicular to the long side of the rectangle. 5. The method according to claim 3 or 4,
A pellicle, characterized in that at least one linear reinforcing member having a maximum thickness of 100 µm is joined to the pellicle membrane and is extended between two opposite sides of the pellicle frame. 5. The method according to claim 3 or 4,
A pellicle, characterized in that two linear reinforcing elements having a maximum thickness of 100 µm are joined to the pellicle membrane and are provided along a diagonal of the pellicle frame. 7. The method according to any one of claims 1 to 6,
A pellicle, characterized in that the material of the pellicle film is an amorphous fluorine-based resin. A photomask with a pellicle formed by attaching the pellicle according to any one of claims 1 to 7 to a photomask. An exposure method characterized by exposing using the photomask with a pellicle according to claim 8. The manufacturing method of the panel for flat panel displays which has the process of exposing using the photomask with a pellicle of Claim 8.

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