TWM612607U - Scribing apparatus - Google Patents

Scribing apparatus Download PDF

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Publication number
TWM612607U
TWM612607U TW109216886U TW109216886U TWM612607U TW M612607 U TWM612607 U TW M612607U TW 109216886 U TW109216886 U TW 109216886U TW 109216886 U TW109216886 U TW 109216886U TW M612607 U TWM612607 U TW M612607U
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Taiwan
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substrate
scribing
unit
operating table
axis direction
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TW109216886U
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Chinese (zh)
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方圭龍
金賢正
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韓商塔工程有限公司
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Publication of TWM612607U publication Critical patent/TWM612607U/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/03Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/037Controlling or regulating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Abstract

本新型的實施例的劃片裝置可包括:操作台,用於支撐基板;基板整列單元,用於對裝載於操作台的基板進行整列;以及劃片單元,具有用於在裝載於操作台的基板上形成劃片線的劃片輪,基板整列單元可包括:操作台傾斜單元,以使操作台的一端向下方傾斜的方式使操作台傾斜;以及止擋模組,與操作台的一端相鄰,基板順著在操作台傾斜單元的作用下傾斜的操作台進行移動而與止擋模組相接觸而整列,從而劃片輪要與基板相接觸的初始工作位置與要形成於基板上的劃片線的起始點相一致。The scribing device of the embodiment of the present invention may include: an operating table for supporting the substrate; a substrate aligning unit for aligning the substrates loaded on the operating table; and the dicing unit having a device for loading on the operating table A scribing wheel with a scribing line is formed on the substrate. The substrate aligning unit may include: an operating table tilting unit to tilt the operating table in such a way that one end of the operating table is tilted downward; and a stop module, which is opposite to one end of the operating table Next, the substrate moves along the operating table tilted under the action of the operating table tilt unit to contact the stop module and align, so that the initial working position of the scribing wheel to contact the substrate and the position to be formed on the substrate The starting points of the scribing lines coincide.

Description

劃片裝置Dicing device

本新型涉及為了切割基板而在基板上形成劃片線的劃片裝置。The invention relates to a scribing device for forming a scribing line on a substrate for cutting the substrate.

通常,在平板顯示器中使用液晶顯示面板、有機電致發光顯示面板、無機電致發光顯示面板、透射式投影儀基板以及反射式投影儀基板。平板顯示器使用從如玻璃的脆性的母體玻璃面板(基板)以規定的尺寸切割的單元玻璃面板(單元基板)。Generally, liquid crystal display panels, organic electroluminescence display panels, inorganic electroluminescence display panels, transmissive projector substrates, and reflective projector substrates are used in flat panel displays. The flat panel display uses a unit glass panel (unit substrate) cut from a brittle mother glass panel (substrate) such as glass to a predetermined size.

基板切割工序包括劃片工序。在劃片工序中,在基板上沿著虛擬的預定線按壓劃片輪的同時使其移動,從而形成劃片線。The substrate cutting process includes a dicing process. In the scribing process, the scribing wheel is moved while pressing along a virtual predetermined line on the substrate to form a scribing line.

另一方面,在基板上形成劃片線的工序之前,需要使基板整列的工序。在現有技術中,為了整列基板,需要在把持或吸附基板後使基板進行水平移動的結構。尤其是,需要在把持或吸附基板後使基板以相對於操作台的垂直軸為中心進行旋轉的結構。這種結構被設計為僅對一種類型的基板進行整列,因此存在難以對尺寸不同的多種基板進行整列的問題。On the other hand, before the step of forming the scribing line on the substrate, a step of aligning the substrate is required. In the prior art, in order to arrange the substrates, it is necessary to move the substrates horizontally after holding or adsorbing the substrates. In particular, a structure is required to rotate the substrate around the vertical axis with respect to the operating table after the substrate is gripped or sucked. This structure is designed to align only one type of substrate, so there is a problem that it is difficult to align multiple substrates of different sizes.

本新型的目的在於,提供如下的劃片裝置,即,即使在操作台裝載尺寸不同的多種基板,也可以使劃片輪的初始工作位置與相應基板上的預設的劃片線起始點相一致。The purpose of the present invention is to provide the following scribing device, that is, even if multiple substrates of different sizes are loaded on the operating table, the initial working position of the scribing wheel can be adjusted to the preset starting point of the scribing line on the corresponding substrate. Consistent.

用於實現上述目的之本新型的實施例的劃片裝置可包括:操作台,用於支撐基板;基板整列單元,用於對裝載於操作台的基板進行整列;以及劃片單元,具有用於在裝載於操作台的基板上形成劃片線的劃片輪,基板整列單元可包括:操作台傾斜單元,以使操作 的一端向下方傾斜的方式使操作 傾斜;以及止擋模 ,與操作 的一端相鄰,基板順著在操作 傾斜單元的作用下傾斜的操作 進行移動而與止擋模 相接觸而整列,從而劃片輪要與基板相接觸的初始工作位置與要形成於基板上的劃片線的起始點相一致。 The scribing device of the embodiment of the present invention for achieving the above-mentioned objects may include: an operation table for supporting the substrate; a substrate aligning unit for aligning the substrates loaded on the operation table; and a dicing unit having a scribing wheel scribe lines formed on the substrate mounted on the console, the substrate may comprise the entire column of cells: console tilting unit, so that one end of the operating table allows the operator station is inclined downward inclined manner; and a stopper mold group, adjacent one end of the operating table, the substrate table is tilted along the tilting operation action of the operation unit in a station to move into contact with the stopper mold set and aligned so that the scribing wheel to be in contact with the substrate and an initial operative position The starting points of the scribe lines to be formed on the substrate coincide.

止擋模組可包括:止擋部件,與基板的一端相接觸;以及移動機構,使止擋部件沿著移送基板的方向或與移送基板的方向正交的方向進行移動。The stop module may include: a stop member that is in contact with one end of the substrate; and a moving mechanism that moves the stop member along a direction in which the substrate is transferred or a direction orthogonal to the direction in which the substrate is transferred.

基板整列單元可包括:操作台傾斜單元,用於使操作台傾斜;以及第一止擋模組及第二止擋模組,以操作台的一個角部為中心配置於兩側。The substrate aligning unit may include: an operating table tilting unit for tilting the operating table; and a first stop module and a second stop module, which are arranged on both sides with a corner of the operating table as a center.

第一止擋模組及上述第二止擋模組可分別包括:止擋部件,與基板的一端相接觸;以及移動機構,使止擋部件沿著移送基板的方向或與移送基板的方向正交的方向進行移動。The first stop module and the second stop module may respectively include: a stop member that is in contact with one end of the substrate; and a moving mechanism to make the stop member follow the direction of the substrate transfer or be in line with the direction of the substrate transfer. Move in the direction of the intersection.

基板搬運單元可以在操作台傾斜的狀態下將基板裝載於上述操作台。The substrate transport unit can load the substrate on the above-mentioned operation table in a state where the operation table is inclined.

根據本新型的實施例的劃片裝置,即使在操作台上裝載尺寸不同的多種基板,也可以使劃片輪的初始工作位置與相應基板上的預設的劃片線起始點相一致。According to the scribing device of the embodiment of the present invention, even if multiple substrates with different sizes are loaded on the operating table, the initial working position of the scribing wheel can be consistent with the preset scribing line starting point on the corresponding substrate.

以下,參照附圖,對本新型的實施例的劃片裝置進行說明。Hereinafter, the dicing device according to the embodiment of the present invention will be described with reference to the drawings.

參照圖1至圖3,將要形成劃片線的基板S的移送方向定義為Y軸方向。並且,將與移送基板S的方向(Y軸方向)垂直的方向定義為X軸方向。並且,將與放置基板的X-Y平面垂直的方向定義為Z軸方向。此外,術語“劃片線”是指,在基板S的表面沿著規定方向延伸而形成的槽和/或狹縫。1 to 3, the transfer direction of the substrate S where the scribe line is to be formed is defined as the Y-axis direction. In addition, the direction perpendicular to the direction in which the substrate S is transferred (the Y-axis direction) is defined as the X-axis direction. In addition, the direction perpendicular to the X-Y plane on which the substrate is placed is defined as the Z-axis direction. In addition, the term “scribing line” refers to grooves and/or slits formed on the surface of the substrate S to extend in a predetermined direction.

如圖1至圖3所示,本新型的實施例的劃片裝置可包括基座B、操作台10、劃片單元20、基板搬運單元30、基板移送單元40、基板整列單元50、控制單元(未圖示)。As shown in FIGS. 1 to 3, the scribing device of the embodiment of the present invention may include a base B, a console 10, a scribing unit 20, a substrate handling unit 30, a substrate transfer unit 40, a substrate aligning unit 50, and a control unit (Not shown).

基座B用於支撐構成劃片裝置的各種結構部件。The base B is used to support various structural components constituting the dicing device.

控制單元用於控制劃片裝置的結構部件的動作。The control unit is used to control the actions of the structural components of the dicing device.

操作台10用於支撐基板S。The console 10 is used to support the substrate S.

在操作台10形成有多個孔101。操作台10的多個孔101與供氣器11相連接。從供氣器11供給的氣體朝多個孔101噴出,由此,基板S可以在操作台10上上浮。A plurality of holes 101 are formed in the console 10. The multiple holes 101 of the console 10 are connected to the air supply 11. The gas supplied from the gas supplier 11 is sprayed toward the plurality of holes 101, whereby the substrate S can float on the operating table 10.

此外,操作台10的多個孔101與如真空發生器那樣的負壓源12相連接。可在負壓源12的作用下在多個孔101形成負壓。因此,基板S可附著並固定於操作台10。In addition, the plurality of holes 101 of the console 10 are connected to a negative pressure source 12 such as a vacuum generator. A negative pressure can be formed in the plurality of holes 101 under the action of the negative pressure source 12. Therefore, the substrate S can be attached and fixed to the console 10.

在基板S在操作台10上移動的過程中,基板S可以從操作台10上浮。在基板S上形成劃片線的過程中,基板S可以附著於操作台10。During the movement of the substrate S on the operating table 10, the substrate S may float up from the operating table 10. In the process of forming the scribing line on the substrate S, the substrate S may be attached to the operation table 10.

劃片單元20在基板S的第一面(圖2中基板S的上部面)及第二面(圖2中基板S的下部面)形成劃片線。但是本新型並不限定於此。例如,劃片單元20可僅在基板S的第一面與第二面中的一個上形成劃片線。The scribing unit 20 forms scribing lines on the first surface (the upper surface of the substrate S in FIG. 2) and the second surface (the lower surface of the substrate S in FIG. 2) of the substrate S. However, the present invention is not limited to this. For example, the scribing unit 20 may form a scribing line on only one of the first surface and the second surface of the substrate S.

劃片單元20可包括:第一支架21、第一劃片頭22、第二支架23、第二劃片頭24。The scribing unit 20 may include: a first support 21, a first scribing head 22, a second support 23, and a second scribing head 24.

第一支架21沿X軸方向延伸。The first bracket 21 extends in the X-axis direction.

第一劃片頭22以能夠沿X軸方向移動的方式設置於第一支架21。The first dicing head 22 is provided on the first holder 21 so as to be movable in the X-axis direction.

第二支架23在第一支架21的下方以與第一支架21平行的方式沿X軸方向延伸。The second bracket 23 extends in the X-axis direction in parallel with the first bracket 21 below the first bracket 21.

第二劃片頭24以能夠沿X軸方向移動的方式設置於第二支架23。The second dicing head 24 is provided on the second holder 23 so as to be movable in the X-axis direction.

第一支架21與第二支架23之間可形成用於使基板S通過的空間。第一支架21及第二支架23可作為單獨的部件製作組裝,或者可製作為一體。A space for the substrate S to pass through may be formed between the first bracket 21 and the second bracket 23. The first bracket 21 and the second bracket 23 can be fabricated and assembled as separate parts, or can be fabricated as a whole.

可在第一劃片頭22與第一支架21之間設置線性移動機構。線性移動機構與第一劃片頭22相連接,使第一劃片頭22沿X軸方向進行移動。例如,線性移動機構可配置為使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達或滾珠螺桿機構。A linear moving mechanism may be provided between the first dicing head 22 and the first support 21. The linear moving mechanism is connected with the first scribing head 22 to move the first scribing head 22 in the X-axis direction. For example, the linear moving mechanism may be configured as an actuator using pneumatic or hydraulic pressure, a linear motor working under electromagnetic interaction, or a ball screw mechanism.

可在第二劃片頭24與第二支架23之間設置線性移動機構。線性移動機構與第二劃片頭24相連接,使第二劃片頭24沿X軸方向進行移動。例如,線性移動機構可配置為使用氣動或液壓的致動器、通過電磁相互作用工作的線性馬達、或滾珠螺桿機構。A linear moving mechanism can be provided between the second dicing head 24 and the second bracket 23. The linear moving mechanism is connected with the second scribing head 24 to move the second scribing head 24 in the X-axis direction. For example, the linear movement mechanism may be configured as a pneumatic or hydraulic actuator, a linear motor working through electromagnetic interaction, or a ball screw mechanism.

第一劃片頭22與第二劃片頭24可在Z軸方向上以對置的方式配置。The first dicing head 22 and the second dicing head 24 may be arranged to face each other in the Z-axis direction.

在第一劃片頭22設置有輪架25,輪架25可用於支撐劃片輪251。在第二劃片頭24設置有輪架25,輪架25可用於支撐劃片輪251。安裝於第一劃片頭22的劃片輪251與安裝於第二劃片頭24的劃片輪251可在Z軸方向上以對置的方式配置。The first scribing head 22 is provided with a wheel frame 25, and the wheel frame 25 can be used to support the scribing wheel 251. The second scribing head 24 is provided with a wheel frame 25, and the wheel frame 25 can be used to support the scribing wheel 251. The scribing wheel 251 attached to the first scribing head 22 and the scribing wheel 251 attached to the second scribing head 24 may be arranged to face each other in the Z-axis direction.

一對劃片輪251可分別向基板S的第一面及第二面施加壓力。在一對劃片輪251分別向基板S的第一面及第二面施加壓力的狀態下,第一劃片頭22及第二劃片頭24可相對於基板S沿X軸方向進行移動。由此,可在基板S的第一面及第二面上沿X軸方向形成劃片線。A pair of dicing wheels 251 can apply pressure to the first surface and the second surface of the substrate S, respectively. In a state where the pair of scribing wheels 251 respectively apply pressure to the first surface and the second surface of the substrate S, the first scribing head 22 and the second scribing head 24 can move relative to the substrate S in the X-axis direction. As a result, scribing lines can be formed in the X-axis direction on the first surface and the second surface of the substrate S.

另一方面,第一劃片頭22可相對於第一支架21沿Z軸方向進行移動。第二劃片頭24可相對於第二支架23沿Z軸方向進行移動。On the other hand, the first dicing head 22 can move in the Z-axis direction relative to the first support 21. The second dicing head 24 can move in the Z-axis direction relative to the second bracket 23.

為此,可在第一劃片頭22與第一支架21之間設置頭部移動模組28。頭部移動模組28用於與第一劃片頭22相連接而使第一劃片頭22沿Z軸方向移動。此外,可在第二劃片頭24與第二支架23之間設置頭部移動模組29。頭部移動模組29用於與第二劃片頭24相連接而使第二劃片頭24沿Z軸方向移動。例如,頭部移動模組28、29可設置於如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。To this end, a head moving module 28 can be provided between the first dicing head 22 and the first bracket 21. The head moving module 28 is used to connect with the first scribing head 22 to move the first scribing head 22 along the Z-axis direction. In addition, a head moving module 29 can be provided between the second dicing head 24 and the second bracket 23. The head moving module 29 is used to connect with the second scribing head 24 to move the second scribing head 24 along the Z-axis direction. For example, the head moving modules 28 and 29 may be provided in linear moving mechanisms such as pneumatic or hydraulic actuators, linear motors working under electromagnetic interaction, or ball screw mechanisms.

第一劃片頭22及第二劃片頭24可分別相對於第一支架21及第二支架23沿Z軸方向移動,從而一對劃片輪251可向基板S施加壓力或者從基板S離開。並且,可以通過調節第一劃片頭22及第二劃片頭24沿Z軸方向移動的程度,來調節一對劃片輪251向基板S施加的壓力。此外,由於第一劃片頭22及第二劃片頭24沿Z軸方向移動,因此可調節一對劃片輪251對於基板S的切削深度(穿透深度)。The first scribing head 22 and the second scribing head 24 can move in the Z-axis direction relative to the first support 21 and the second support 23, respectively, so that the pair of scribing wheels 251 can apply pressure to the substrate S or move away from the substrate S. In addition, the pressure applied by the pair of scribing wheels 251 to the substrate S can be adjusted by adjusting the degree of movement of the first scribing head 22 and the second scribing head 24 in the Z-axis direction. In addition, since the first scribing head 22 and the second scribing head 24 move in the Z-axis direction, the cutting depth (penetration depth) of the pair of scribing wheels 251 with respect to the substrate S can be adjusted.

基板搬運單元30用於將基板S裝載到操作台10。此外,基板搬運單元30用於向劃片單元20移送操作台10上的基板S。The substrate transport unit 30 is used to load the substrate S on the console 10. In addition, the substrate transport unit 30 is used to transfer the substrate S on the operation table 10 to the dicing unit 20.

基板搬運單元30可包括:拾取器模組31、支撐框架32、拾取器移動模組33、拾取器升降模組34。The substrate transport unit 30 may include a pickup module 31, a supporting frame 32, a pickup moving module 33, and a pickup lifting module 34.

拾取器模組31用於支撐基板S。The pickup module 31 is used to support the substrate S.

支撐框架32用於支撐拾取器模組31。拾取器模組31能夠以可沿Y軸方向移動的方式設置於支撐框架32。The supporting frame 32 is used to support the pickup module 31. The pickup module 31 can be installed in the support frame 32 in a movable manner in the Y-axis direction.

拾取器移動模組33用於使拾取器模組31沿X軸方向及Y軸方向移動。作為拾取器移動模組33,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。可在拾取器移動模組33的作用下使拾取器模組31沿X軸方向及Y軸方向移動的同時,沿X軸方向及Y軸方向移送基板S。The pickup moving module 33 is used to move the pickup module 31 in the X-axis direction and the Y-axis direction. As the pickup moving module 33, a linear moving mechanism such as a pneumatic or hydraulic actuator, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used. Under the action of the pickup moving module 33, the pickup module 31 can be moved along the X-axis direction and the Y-axis direction, and the substrate S can be moved along the X-axis direction and the Y-axis direction.

拾取器升降模組34用於使拾取器模組31沿Z軸方向移動。作為拾取器升降模組34,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。可在拾取器升降模組34的作用下使拾取器模組31沿Z軸方向移動的同時,將基板S裝載於操作台10或從操作台10抬起基板S。The pickup lift module 34 is used to move the pickup module 31 along the Z-axis direction. As the pickup lifting module 34, a linear moving mechanism such as a pneumatic or hydraulic actuator, a linear motor working under electromagnetic interaction, or a ball screw mechanism can be used. The pickup module 31 can be moved in the Z-axis direction under the action of the pickup lifting module 34, and the substrate S can be loaded on the operating table 10 or lifted from the operating table 10 at the same time.

基板移送單元40用於將基板S從劃片單元20移送至後續工序。The substrate transfer unit 40 is used to transfer the substrate S from the dicing unit 20 to a subsequent process.

基板移送單元40可包括:支撐板41、移送帶42、移動裝置43。The substrate transfer unit 40 may include: a support plate 41, a transfer belt 42, and a moving device 43.

支撐板41與劃片單元20相鄰配置。支撐板41用於使基板上浮或吸附基板。The support plate 41 is arranged adjacent to the dicing unit 20. The support plate 41 is used to float the substrate or adsorb the substrate.

移送帶42與支撐板41相鄰配置。The transfer belt 42 is arranged adjacent to the support plate 41.

移動裝置43使支撐板41及移送帶42沿Y軸方向進行往復移動。移動裝置43用於使支撐板41及移送帶42順著沿Y軸方向延伸的導軌44在Y軸方向上進行往復移動。作為移動裝置43,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。The moving device 43 reciprocates the support plate 41 and the transfer belt 42 in the Y-axis direction. The moving device 43 is used to reciprocate the support plate 41 and the transfer belt 42 in the Y-axis direction along the guide rail 44 extending in the Y-axis direction. As the moving device 43, a linear moving mechanism such as an actuator using air pressure or hydraulic pressure, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used.

支撐板41及移送帶42可在移動裝置43的作用下一同在與移送基板S的方向平行的方向(Y軸方向)上進行移動。The support plate 41 and the transfer belt 42 can be moved together in a direction (Y-axis direction) parallel to the direction in which the substrate S is transferred under the action of the moving device 43.

在劃片單元20的作用下分別在基板S的第一面及第二面上形成劃片線的過程中,支撐板41可朝向操作台10移動而與操作台10相鄰。此外,第一劃片頭22及第二劃片頭24可位於操作台10與支撐板41之間。在劃片單元20的作用下分別在基板S的第一面及第二面上形成劃片線的過程中,操作台10與支撐板41相鄰。因此,操作台10及支撐板41均可穩定地支撐基板S。In the process of respectively forming scribing lines on the first surface and the second surface of the substrate S under the action of the dicing unit 20, the support plate 41 can move toward the operating table 10 to be adjacent to the operating table 10. In addition, the first dicing head 22 and the second dicing head 24 may be located between the operating table 10 and the support plate 41. In the process of respectively forming scribing lines on the first surface and the second surface of the substrate S under the action of the scribing unit 20, the operation table 10 is adjacent to the support plate 41. Therefore, both the console 10 and the support plate 41 can stably support the substrate S.

移送帶42可具有多個,多個移送帶42可在X軸方向上互相隔開。各個移送帶42被多個滑輪421支撐,多個滑輪421中的至少一個可為提供使移送帶42旋轉的驅動力的驅動滑輪。There may be a plurality of transfer belts 42, and the plurality of transfer belts 42 may be spaced apart from each other in the X-axis direction. Each transfer belt 42 is supported by a plurality of pulleys 421, and at least one of the plurality of pulleys 421 may be a driving pulley that provides a driving force for rotating the transfer belt 42.

支撐板41可構成為使基板S上浮或吸附基板S。例如,可在支撐板41的表面上形成與供氣源及真空源相連接的多個槽。在從供氣源向支撐板41的多個槽供給氣體的情況下,基板S可從支撐板41上浮。此外,在真空源所形成的負壓的作用下經由支撐板41的多個槽吸入氣體的情況下,基板S可吸附於支撐板41。The support plate 41 may be configured to float the substrate S or adsorb the substrate S. For example, a plurality of grooves connected to an air supply source and a vacuum source may be formed on the surface of the support plate 41. In the case where gas is supplied from the gas supply source to the plurality of grooves of the support plate 41, the substrate S can float from the support plate 41. In addition, when gas is sucked in through the multiple grooves of the support plate 41 under the action of the negative pressure formed by the vacuum source, the substrate S can be adsorbed to the support plate 41.

在向支撐板41移送基板S的過程中,向支撐板41的槽供給氣體,由此,基板S能夠以與支撐板41無摩擦的方式進行移動。In the process of transferring the substrate S to the support plate 41, gas is supplied to the groove of the support plate 41, so that the substrate S can be moved without friction with the support plate 41.

並且,在分別在基板S的第一面及第二面上形成劃片線的過程中,基板S被吸附而固定於支撐板41。In addition, in the process of forming dicing lines on the first surface and the second surface of the substrate S, respectively, the substrate S is sucked and fixed to the support plate 41.

並且,在分別在基板S的第一面及第二面上形成劃片線之後,在基板S吸附在操作台10及支撐板41的狀態下,支撐板41能夠以遠離操作台10的方式進行移動。由此,可沿著劃片線分割基板S。In addition, after scribing lines are formed on the first surface and the second surface of the substrate S, the support plate 41 can be moved away from the operation table 10 in a state where the substrate S is adsorbed on the console 10 and the support plate 41. mobile. Thus, the substrate S can be divided along the scribing line.

另一方面,在基板S通過移送帶42從支撐板41向後續工序移動的過程中,向支撐板41的槽供給氣體,由此,基板S能夠以與支撐板41無摩擦的方式進行移動。On the other hand, while the substrate S is moved from the support plate 41 to the subsequent process by the transfer belt 42, gas is supplied to the groove of the support plate 41, so that the substrate S can move without friction with the support plate 41.

基板整列單元50可包括:操作台傾斜模組51、第一止擋模組52、第二止擋模組53。The substrate aligning unit 50 may include a console tilt module 51, a first stop module 52, and a second stop module 53.

操作台傾斜模組51可設置於操作台10的下部。操作台傾斜模組51用於使操作台10朝X軸方向或Y軸方向傾斜。操作台傾斜模組51能夠以使操作台10的朝向Y軸方向的一端向下方傾斜的方式來使操作台10傾斜。此外,操作台傾斜模組51能夠以使操作台10的朝向X軸方向的一端向下方傾斜的方式來使操作台10傾斜。The console tilt module 51 can be installed at the lower part of the console 10. The console tilt module 51 is used to tilt the console 10 in the X-axis direction or the Y-axis direction. The console tilt module 51 can tilt the console 10 so that one end of the console 10 facing the Y-axis direction is tilted downward. In addition, the console tilt module 51 can tilt the console 10 so that one end of the console 10 facing the X-axis direction is tilted downward.

作為一例,如圖2及圖3所示,操作台傾斜模組51可由一端與操作台10鉸鏈連接且另一端與基座B鉸鏈連接的執行器構成。執行器可由液壓缸或氣壓缸構成。在操作台傾斜模組51由執行器構成的情況下,多個操作台傾斜模組51可設置於操作台10的下部。通過多個操作台傾斜模組51中的部分操作台傾斜模組51抬起操作台10的一部分而操作台10可以傾斜。此外,部分操作台傾斜模組51的抬起操作台10的一部分的程度與其餘操作台傾斜模組51的抬起操作台10的其餘部分的程度不同,從而操作台10可以傾斜。As an example, as shown in FIGS. 2 and 3, the operating platform tilt module 51 may be constituted by an actuator whose one end is hingedly connected to the operating platform 10 and the other end is hingedly connected to the base B. The actuator can be composed of a hydraulic cylinder or a pneumatic cylinder. In the case where the console tilt module 51 is composed of an actuator, a plurality of console tilt modules 51 may be provided at the lower part of the console 10. A part of the console 10 is lifted by a part of the console tilt module 51 among the plurality of console tilt modules 51 so that the console 10 can be tilted. In addition, the degree to which part of the console tilt module 51 lifts a part of the console 10 is different from the degree to which the rest of the console 10 is lifted by the rest of the console tilt module 51, so that the console 10 can be tilted.

作為另一例,雖未圖示,但操作台傾斜模組51可為與操作台10相連接的多軸機器人。構成操作台傾斜模組51的多軸機器人以多個軸為基準工作,從而操作台10可以傾斜。As another example, although not shown, the console tilt module 51 may be a multi-axis robot connected to the console 10. The multi-axis robot constituting the console tilt module 51 works with multiple axes as a reference, so that the console 10 can be tilted.

作為又一例,雖未圖示,但操作台傾斜模組51可以包括執行器及鉸鏈部件。執行器及鉸鏈部件可以通過與操作台10相連接來支撐操作台10。執行器提供使操作台10進行旋轉的驅動力。鉸鏈部件起到提供用於旋轉操作台10的鉸鏈軸的作用。因此,操作台10可在執行器的驅動力的作用下以鉸鏈部件的鉸鏈軸為中心進行旋轉,由此,操作台10可以傾斜。As another example, although not shown, the console tilt module 51 may include an actuator and a hinge member. The actuator and the hinge component can support the operation table 10 by being connected to the operation table 10. The actuator provides driving force for rotating the operating table 10. The hinge member functions to provide a hinge shaft for rotating the console 10. Therefore, the operating table 10 can be rotated around the hinge axis of the hinge member under the action of the driving force of the actuator, and thus, the operating table 10 can be tilted.

第一止擋模組52及第二止擋模組53能夠以操作台10的一個角部為中心配置於兩側。The first stop module 52 and the second stop module 53 can be arranged on both sides with a corner of the console 10 as a center.

第一止擋模組52用於沿X軸方向對基板S進行整列。第一止擋模組52可相鄰配置於操作台10的Y軸方向上的一端。第一止擋模組52的數量可以為兩個以上。第一止擋模組52可包括:第一止擋部件521、第一X軸移動機構522、第一Y軸移動機構523。The first stop module 52 is used for aligning the substrate S along the X-axis direction. The first stop module 52 may be adjacently arranged at one end of the console 10 in the Y-axis direction. The number of the first stop module 52 may be more than two. The first stop module 52 may include: a first stop member 521, a first X-axis moving mechanism 522, and a first Y-axis moving mechanism 523.

第一止擋部件521與基板S的朝向Y軸方向的一端相接觸。操作台10在操作台傾斜模組51的作用下傾斜,若操作台10的與第一止擋部件521相鄰的一端向下方傾斜,則操作台10上的基板S因自重而順著傾斜的操作台10移動。由此,基板S的朝向Y軸方向的一端與第一止擋部件521相接觸。因此,基板S的朝向Y軸方向的一端沿著排列多個第一止擋部件521的方向進行整列。The first stopper member 521 is in contact with one end of the substrate S facing the Y-axis direction. The operation table 10 is tilted under the action of the operation table tilt module 51. If the end of the operation table 10 adjacent to the first stop member 521 is inclined downward, the substrate S on the operation table 10 will be tilted due to its own weight. The console 10 moves. Thereby, one end of the substrate S facing the Y-axis direction is in contact with the first stopper member 521. Therefore, the end of the substrate S facing the Y-axis direction is aligned along the direction in which the plurality of first stopper members 521 are arranged.

第一止擋部件521為與基板S直接接觸的部件,因此,優選地,第一止擋部件521由彈性材料形成,以能夠防止基板S受損。例如,第一止擋部件521可具有可旋轉的輥或球的形態,在此情況下,基板S的一端可與第一止擋部件521的外周面相接觸。The first stopper member 521 is a member that directly contacts the substrate S. Therefore, it is preferable that the first stopper member 521 is formed of an elastic material to be able to prevent the substrate S from being damaged. For example, the first stop member 521 may have the form of a rotatable roller or a ball. In this case, one end of the substrate S may be in contact with the outer peripheral surface of the first stop member 521.

第一X軸移動機構522用於使第一止擋部件521沿X軸方向移動。作為第一X軸移動機構522,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。在第一X軸移動機構522的作用下第一止擋部件521沿X軸方向進行移動,由此第一止擋部件521的朝向X軸方向的位置被調節。可對第一止擋部件521的朝向X軸方向的位置進行調節,以使第一止擋部件521應接觸於基板S的部分相對應。The first X-axis moving mechanism 522 is used to move the first stop member 521 in the X-axis direction. As the first X-axis moving mechanism 522, a linear moving mechanism such as an actuator using air pressure or hydraulic pressure, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used. The first stopper member 521 moves in the X-axis direction by the action of the first X-axis moving mechanism 522, whereby the position of the first stopper member 521 in the X-axis direction is adjusted. The position of the first stop member 521 facing the X-axis direction can be adjusted so that the part of the first stop member 521 that should be in contact with the substrate S corresponds to that.

在基板S被切割為多個單元基板的情況下,基板S與第一止擋部件521接觸的部分優選為多個單元基板之間的區域。其中,多個單元基板之間的區域可為不用於產品且要去除丟棄的無效區域。這種無效區域為基板的一部分,即使與外部部件接觸也不會影響產品的質量。因此,優選地,第一止擋部件521與基板S的無效區域相接觸。因此,為了使第一止擋部件521能夠與基板S的無效區域相接觸,可在第一X軸移動機構522的作用下調節第一止擋部件521的朝向X軸方向的位置。When the substrate S is cut into a plurality of unit substrates, the portion where the substrate S contacts the first stopper member 521 is preferably an area between the plurality of unit substrates. Wherein, the area between the multiple unit substrates may be an invalid area that is not used for products and needs to be removed and discarded. This ineffective area is a part of the substrate and will not affect the quality of the product even if it is in contact with external components. Therefore, preferably, the first stopper member 521 is in contact with the ineffective area of the substrate S. Therefore, in order to enable the first stop member 521 to contact the ineffective area of the substrate S, the position of the first stop member 521 in the X-axis direction can be adjusted under the action of the first X-axis moving mechanism 522.

第一Y軸移動機構523用於使第一止擋部件521沿Y軸方向移動。作為第一Y軸移動機構523,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。在第一Y軸移動機構523的作用下第一止擋部件521沿Y軸方向進行移動,由此第一止擋部件521的朝向Y軸方向的位置被調節。多個第一止擋部件521的各自的朝向Y軸方向的位置被調節,從而多個第一止擋部件521的排列方向被調節。多個第一止擋部件521的排列方向被調節,從而基板S的朝向Y軸方向的一端與多個第一止擋部件521相接觸而整列的方向被調節。基板S的朝向Y軸方向的一端與多個第一止擋部件521相接觸而整列的方向可以為X軸方向,或者可以為相對於X軸(或Y軸)傾斜規定的角度的方向。如此,在第一Y軸移動機構523的作用下第一止擋部件521的朝向Y軸方向的位置被調節,從而基板S的朝向Y軸方向的一端要整列的方向被確定。因此,在把持基板S後無需使基板S以Z軸為中心進行旋轉的額外的結構,便可相對於X軸(Y軸)以規定的角度使基板S整列。The first Y-axis moving mechanism 523 is used to move the first stop member 521 in the Y-axis direction. As the first Y-axis moving mechanism 523, a linear moving mechanism such as an actuator using air pressure or hydraulic pressure, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used. The first stop member 521 moves in the Y-axis direction under the action of the first Y-axis moving mechanism 523, and thereby the position of the first stop member 521 in the Y-axis direction is adjusted. The respective positions of the plurality of first stop members 521 toward the Y-axis direction are adjusted, so that the arrangement direction of the plurality of first stop members 521 is adjusted. The arrangement direction of the plurality of first stopper members 521 is adjusted, so that the end of the substrate S facing the Y-axis direction is in contact with the plurality of first stopper members 521 and the alignment direction is adjusted. The direction in which one end of the substrate S facing the Y-axis direction is in contact with the plurality of first stopper members 521 and aligned may be the X-axis direction, or may be a direction inclined by a predetermined angle with respect to the X-axis (or Y-axis). In this way, under the action of the first Y-axis moving mechanism 523, the position of the first stop member 521 in the Y-axis direction is adjusted, so that the direction in which the end of the substrate S facing the Y-axis direction is aligned is determined. Therefore, after holding the substrate S, there is no need for an additional structure to rotate the substrate S around the Z axis, and the substrate S can be aligned at a predetermined angle with respect to the X axis (Y axis).

第二止擋模組53用於沿Y軸方向對基板S進行整列。第二止擋模組53可相鄰配置於操作台10的X軸方向上的一端。第二止擋模組53的數量可以為兩個以上。第二止擋模組53可包括:第二止擋部件531、第二X軸移動機構532、第二Y軸移動機構533。The second stop module 53 is used for aligning the substrate S along the Y-axis direction. The second stop module 53 may be adjacently arranged at one end of the console 10 in the X-axis direction. The number of the second stop module 53 may be more than two. The second stop module 53 may include: a second stop member 531, a second X-axis moving mechanism 532, and a second Y-axis moving mechanism 533.

第二止擋部件531與基板S的朝向X軸方向的一端相接觸。操作台10在操作台傾斜模組51的作用下傾斜,若操作台10的與第二止擋部件531相鄰的一端向下方傾斜,則操作台10上的基板S因自重而順著傾斜的操作台10移動。由此,基板S的朝向X軸方向的一端與第二止擋部件531相接觸。因此,基板S的朝向X軸方向的一端沿著排列多個第二止擋部件531的方向進行整列。The second stopper 531 is in contact with one end of the substrate S facing the X-axis direction. The operation table 10 is tilted under the action of the operation table tilt module 51. If the end of the operation table 10 adjacent to the second stopper 531 is inclined downward, the substrate S on the operation table 10 will be tilted due to its own weight. The console 10 moves. Thereby, one end of the substrate S facing the X-axis direction is in contact with the second stopper member 531. Therefore, one end of the substrate S facing the X-axis direction is aligned along the direction in which the plurality of second stopper members 531 are arranged.

第二止擋部件531為與基板S直接接觸的部件,因此,優選地,第二止擋部件531由彈性材料形成,以能夠防止基板S受損。例如,第二止擋部件531可具有可旋轉的輥或球的形態,在此情況下,基板S的一端可與第二止擋部件531的外周面相接觸。The second stopper member 531 is a member that directly contacts the substrate S. Therefore, it is preferable that the second stopper member 531 is formed of an elastic material to be able to prevent the substrate S from being damaged. For example, the second stopper 531 may have a rotatable roller or ball shape. In this case, one end of the substrate S may be in contact with the outer peripheral surface of the second stopper 531.

第二X軸移動機構532用於使第二止擋部件531沿X軸方向移動。作為第二X軸移動機構532,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。在第二X軸移動機構532的作用下第二止擋部件531沿X軸方向進行移動,由此第二止擋部件531的朝向X軸方向的位置被調節。多個第二止擋部件531的各自的朝向X軸方向的位置被調節,從而多個第二止擋部件531的排列方向被調節。多個第二止擋部件531的排列方向被調節,從而基板S的朝向X軸方向的一端與多個第二止擋部件531相接觸而整列的方向被調節。基板S的朝向X軸方向的一端與多個第二止擋部件531相接觸而整列的方向可以為Y軸方向,或者可以為相對於Y軸(或X軸)傾斜規定的角度的方向。如此,在第二X軸移動機構532的作用下第二止擋部件531的朝向X軸方向的位置被調節,從而基板S的朝向X軸方向的一端要整列的方向被確定。因此,在把持基板S後無需使基板S以Z軸為中心進行旋轉的額外的結構,便可相對於Y軸(X軸)以規定的角度使基板S整列。The second X-axis moving mechanism 532 is used to move the second stopper 531 in the X-axis direction. As the second X-axis moving mechanism 532, a linear moving mechanism such as an actuator using air pressure or hydraulic pressure, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used. The second stopper 531 moves in the X-axis direction under the action of the second X-axis moving mechanism 532, whereby the position of the second stopper 531 in the X-axis direction is adjusted. The respective positions of the plurality of second stop members 531 toward the X-axis direction are adjusted, so that the arrangement direction of the plurality of second stop members 531 is adjusted. The arrangement direction of the plurality of second stopper members 531 is adjusted, so that the one end of the substrate S facing the X-axis direction is in contact with the plurality of second stopper members 531 and the alignment direction is adjusted. The direction in which one end of the substrate S facing the X-axis direction is in contact with the plurality of second stopper members 531 and aligned may be the Y-axis direction, or may be a direction inclined by a predetermined angle with respect to the Y-axis (or X-axis). In this way, under the action of the second X-axis moving mechanism 532, the position of the second stopper 531 in the X-axis direction is adjusted, so that the direction in which the end of the substrate S facing the X-axis direction is aligned is determined. Therefore, after holding the substrate S, there is no need for an additional structure to rotate the substrate S around the Z axis, and the substrate S can be aligned at a predetermined angle with respect to the Y axis (X axis).

第二Y軸移動機構533用於使第二止擋部件531沿Y軸方向移動。作為第二Y軸移動機構533,可採用如使用空壓或液壓的致動器、在電磁相互作用下工作的線性馬達、或滾珠螺桿機構等的線性移動機構。在第二Y軸移動機構533的作用下第二止擋部件531沿Y軸方向進行移動,由此第二止擋部件531的朝向Y軸方向的位置被調節。可對第二止擋部件531的朝向Y軸方向的位置進行調節,以使第二止擋部件531應接觸於基板S的部分相對應。The second Y-axis moving mechanism 533 is used to move the second stopper 531 in the Y-axis direction. As the second Y-axis moving mechanism 533, a linear moving mechanism such as an actuator using air pressure or hydraulic pressure, a linear motor operating under electromagnetic interaction, or a ball screw mechanism can be used. Under the action of the second Y-axis moving mechanism 533, the second stop member 531 moves in the Y-axis direction, whereby the position of the second stop member 531 in the Y-axis direction is adjusted. The position of the second stopper 531 facing the Y-axis direction can be adjusted so that the part of the second stopper 531 that should contact the substrate S corresponds to the part of the second stopper 531 that should contact the substrate S.

在基板S被切割為多個單元基板的情況下,基板S與第二止擋部件531接觸的部分優選為多個單元基板之間的區域。其中,多個單元基板之間的區域可為不用於產品且要去除丟棄的無效區域。這種無效區域為基板的一部分,即使與外部部件接觸也不會影響產品的質量。因此,優選地,第二止擋部件531與基板S的無效區域相接觸。因此,為了使第二止擋部件531能夠與基板S的無效區域相接觸,可在第二Y軸移動機構533的作用下調節第二止擋部件531的朝向Y軸方向的位置。In the case where the substrate S is cut into a plurality of unit substrates, the portion where the substrate S contacts the second stopper member 531 is preferably an area between the plurality of unit substrates. Wherein, the area between the multiple unit substrates may be an invalid area that is not used for products and needs to be removed and discarded. This ineffective area is a part of the substrate and will not affect the quality of the product even if it is in contact with external components. Therefore, preferably, the second stopper 531 is in contact with the ineffective area of the substrate S. Therefore, in order to enable the second stopper 531 to contact the ineffective area of the substrate S, the position of the second stopper 531 in the Y-axis direction can be adjusted under the action of the second Y-axis moving mechanism 533.

以下,參照圖4及圖12,對本新型的實施例的劃片裝置的工作過程進行說明。Hereinafter, referring to FIGS. 4 and 12, the working process of the dicing device according to the embodiment of the present invention will be described.

首先,如圖4及圖5所示,利用基板搬運單元30而將基板S裝載於操作台10上。在此情況下,向操作台10的多個孔101供給空氣而使基板S從操作台10上上浮。First, as shown in FIGS. 4 and 5, the substrate S is loaded on the console 10 by the substrate transport unit 30. In this case, air is supplied to the plurality of holes 101 of the console 10 to float the substrate S from the console 10.

在此狀態下,如圖6及圖7所示,操作台10在操作台傾斜模組51的作用下傾斜。由此,若操作台10與第一止擋部件521相鄰的一端向下方傾斜,則操作台10上的基板S因自重而順著傾斜的操作台10移動。因此,基板S的朝向Y軸方向的一端與多個第一止擋部件521相接觸而在多個第一止擋部件521所排列的方向上整列。In this state, as shown in FIGS. 6 and 7, the console 10 is tilted under the action of the console tilt module 51. Thus, when the end adjacent to the first stopper member 521 of the operation table 10 is inclined downward, the substrate S on the operation table 10 moves along the inclined operation table 10 due to its own weight. Therefore, one end of the substrate S facing the Y-axis direction is in contact with the plurality of first stopper members 521 and is aligned in the direction in which the plurality of first stopper members 521 are arranged.

並且,如圖8所示,操作台10在操作台傾斜模組51的作用下恢復到初始的水平狀態(與X-Y平面平行的狀態)。In addition, as shown in FIG. 8, the console 10 is restored to the initial horizontal state (a state parallel to the X-Y plane) under the action of the console tilt module 51.

然後,如圖9及圖10所示,操作台10在操作台傾斜模組51作用下傾斜。由此,若操作台10與第二止擋部件531相鄰的一端向下方傾斜,則操作台10上的基板S因自重而順著傾斜的操作台10移動。因此,基板S的朝向X軸方向的一端與多個第二止擋部件531相接觸而在多個第二止擋部件531所排列的方向上整列。Then, as shown in FIGS. 9 and 10, the console 10 is tilted under the action of the console tilt module 51. Thus, when the end adjacent to the second stopper 531 of the operation table 10 is inclined downward, the substrate S on the operation table 10 moves along the inclined operation table 10 due to its own weight. Therefore, one end of the substrate S facing the X-axis direction is in contact with the plurality of second stopper members 531 and is aligned in the direction in which the plurality of second stopper members 531 are arranged.

根據本新型的實施例的劃片裝置,可通過使操作台10傾斜來在操作台10上對基板S進行整列。因此,不使用結構或控制方法複雜的光學裝置,便可有效地使基板S整列。According to the dicing device of the embodiment of the present invention, the substrate S can be aligned on the operation table 10 by tilting the operation table 10. Therefore, it is possible to effectively align the substrates S without using an optical device with a complicated structure or control method.

此外,根據本新型的實施例的劃片裝置,可通過使操作台10傾斜來在操作台10上對基板S進行整列。因此,在把持基板S後無需使基板S以Z軸為中心進行旋轉的額外的結構,便可相對於Y軸(X軸)以規定的角度使基板S整列。In addition, according to the dicing device of the embodiment of the present invention, the substrate S can be aligned on the operation table 10 by tilting the operation table 10. Therefore, after holding the substrate S, there is no need for an additional structure to rotate the substrate S around the Z axis, and the substrate S can be aligned at a predetermined angle with respect to the Y axis (X axis).

因此,如圖11所示,即使在操作台10上裝載尺寸不同的多種基板S1、S2,也可以使需與劃片輪251接觸的基板S1、S2上的初始工作位置W與形成在相應基板S1、S2上的預設的劃片線起始點P1、P2相一致。Therefore, as shown in FIG. 11, even if multiple types of substrates S1, S2 with different sizes are loaded on the console 10, the initial working positions W on the substrates S1, S2 that need to be in contact with the scribing wheel 251 can be made to be the same as those formed on the corresponding substrates. The preset starting points P1 and P2 of the scribing line on S1 and S2 are consistent.

另一方面,若完成了對基板S進行整列的過程,則在基板S被基板搬運單元30移送到劃片單元20之後,在基板S上形成劃片線。On the other hand, when the process of aligning the substrate S is completed, after the substrate S is transferred to the dicing unit 20 by the substrate conveying unit 30, a scribing line is formed on the substrate S.

作為一例,在劃片單元20在基板S上形成劃片線的過程中,向操作台10的多個孔101供給的空氣被中斷。因此,在基板S穩定地附著在操作台10的上部面的狀態下,劃片單元20可在基板S上形成劃片線。As an example, when the dicing unit 20 forms a scribing line on the substrate S, the air supply to the plurality of holes 101 of the console 10 is interrupted. Therefore, the scribing unit 20 can form a scribing line on the substrate S in a state where the substrate S is stably attached to the upper surface of the operation table 10.

作為另一例,在劃片單元20在基板S上形成劃片線的過程中,基板S可被吸附在操作台10。因此,在基板S穩定地吸附在操作台10的上部面的狀態下,劃片單元20可在基板S上形成劃片線。As another example, in the process of forming the scribing line on the substrate S by the dicing unit 20, the substrate S may be adsorbed on the operating table 10. Therefore, the scribing unit 20 can form a scribing line on the substrate S in a state where the substrate S is stably sucked on the upper surface of the operation table 10.

作為又一例,如圖12所示,在劃片單元20在基板S上形成劃片線的過程中,基板搬運單元30可支撐基板S。因此,在基板S穩定地被基板搬運單元30支撐的狀態下,劃片單元20可在基板S上形成劃片線。As another example, as shown in FIG. 12, the substrate transport unit 30 may support the substrate S during the process of forming the scribe line on the substrate S by the dicing unit 20. Therefore, in a state where the substrate S is stably supported by the substrate conveying unit 30, the scribing unit 20 can form a scribing line on the substrate S.

如上所述,在劃片單元20在基板S上形成劃片線的過程中,基板S可以被穩定地支撐。因此,劃片線可更精密地形成於基板S上。因此,可提高沿劃片線切割的單元基板的質量及可靠性。As described above, during the process in which the dicing unit 20 forms the scribing line on the substrate S, the substrate S can be stably supported. Therefore, the scribing line can be formed on the substrate S more precisely. Therefore, the quality and reliability of the unit substrate cut along the dicing line can be improved.

另一方面,如圖13至圖16所示,在操作台10在操作台傾斜模組51的作用下傾斜的狀態下,基板搬運單元30可將基板S裝載於操作台10。On the other hand, as shown in FIGS. 13 to 16, in a state where the operation table 10 is tilted by the operation table tilt module 51, the substrate transport unit 30 can load the substrate S on the operation table 10.

在上述情況下,在將基板S裝載於操作台10的同時,基板S順著傾斜的操作台10進行移動,從而與第一止擋部件521接觸而被整列。因此,可快速地執行裝載基板S的過程及整列基板S的過程。In the above case, while the substrate S is loaded on the operating table 10, the substrate S moves along the inclined operating table 10 so as to come into contact with the first stopper member 521 and be aligned. Therefore, the process of loading the substrate S and the process of aligning the substrate S can be quickly performed.

此外,如圖14所示,在將基板S裝載於操作台10的過程中,基板S的下部面依次與操作台10的上部面相鄰。即,與操作台10的上部面相鄰的基板S的下部面的面積依次增加。因此,存在於操作台10的上部面與基板S的下部面之間的靜電可向基板S的一側(基板S的與第一止擋部件521相鄰的一側)釋放。因此,可以防止因基板S與操作台10之間的靜電導致的基板S的平整度下降或基板S未被順利地裝載於操作台10的問題。In addition, as shown in FIG. 14, in the process of loading the substrate S on the console 10, the lower surface of the substrate S is sequentially adjacent to the upper surface of the console 10. That is, the area of the lower surface of the substrate S adjacent to the upper surface of the operation table 10 sequentially increases. Therefore, static electricity existing between the upper surface of the console 10 and the lower surface of the substrate S can be discharged to the side of the substrate S (the side of the substrate S adjacent to the first stopper 521 ). Therefore, it is possible to prevent the problem that the flatness of the substrate S is decreased due to static electricity between the substrate S and the console 10 or that the substrate S is not smoothly loaded on the console 10.

另一方面,在本新型的實施例中,說明了在基板S與第一止擋部件521相接觸而整列之後與第二止擋部件531相接觸而進行整列的過程。但是,本新型並不限定於此。例如,基板S可以與第二止擋部件531相接觸而進行整列之後與第一止擋部件521相接觸而進行整列。On the other hand, in the embodiment of the present invention, the process of aligning the substrate S after contacting the first stopper 521 and then contacting the second stopper 531 to perform alignment is described. However, the present invention is not limited to this. For example, the substrate S may be in contact with the second stopper 531 to be aligned, and then in contact with the first stopper 521 to be aligned.

此外,圖13至圖16示出如下的過程,即,在操作台10與第一止擋部件521相鄰的一端向下傾斜的狀態下,基板S裝載於操作台10,並順著操作台10進行移動,從而與第一止擋部件521相接觸而進行整列。但是,本新型並不限定於此。例如,在操作台10的與第二止擋部件531相鄰的一端向下傾斜的狀態下,基板S裝載於操作台10,並順著操作台10而進行移動,從而可與第二止擋部件531相接觸而進行整列。In addition, FIGS. 13 to 16 show the following process, that is, in a state where the end of the operation table 10 adjacent to the first stopper 521 is inclined downward, the substrate S is loaded on the operation table 10 and follows the operation table 10 moves so as to come into contact with the first stopper 521 to make alignment. However, the present invention is not limited to this. For example, in a state where the end adjacent to the second stopper 531 of the operation table 10 is inclined downward, the substrate S is loaded on the operation table 10 and moves along the operation table 10 so as to be able to stop with the second stop. The parts 531 are in contact and aligned.

雖然已經例示性地對本新型的優選實施例進行了說明,但本新型的範圍並不限定於上述特定的實施例,並且可以在本新型的申請專利範圍中所記載的範圍內進行適當的變更。Although the preferred embodiments of the present invention have been described exemplarily, the scope of the present invention is not limited to the specific embodiments described above, and appropriate changes can be made within the scope described in the scope of the present invention.

10:操作台 101:孔 11:供氣器 12:負壓源 20:劃片單元 21:第一支架 22:第一劃片頭 23:第二支架 24:第二劃片頭 25:輪架 251:劃片輪 28:頭部移動模組 29:頭部移動模組 30:基板搬運單元 31:拾取器模組 32:支撐框架 33:拾取器移動模組 34:拾取器升降模組 40:基板移送單元 41:支撐板 42:移送帶 421:滑輪 43:移動裝置 44:導軌 50:基板整列單元 51:操作台傾斜模組 52:第一止擋模組 521:第一止擋部件 522:第一X軸移動機構 523:第一Y軸移動機構 53:第二止擋模組 531:第二止擋部件 532:第二X軸移動機構 533:第二Y軸移動機構 B:基座 P1、P2:起始點 S、S1、S2:基板 W:初始工作位置 10: console 101: Hole 11: Air supply 12: Negative pressure source 20: Dicing unit 21: The first bracket 22: The first scribing head 23: second bracket 24: second scribing head 25: Wheel frame 251: Scribing Wheel 28: Head movement module 29: Head movement module 30: Board handling unit 31: Picker module 32: support frame 33: Picker mobile module 34: Picker lift module 40: Substrate transfer unit 41: Support plate 42: transfer belt 421: Pulley 43: mobile device 44: Rail 50: Substrate array unit 51: Console tilt module 52: The first stop module 521: The first stop component 522: The first X-axis moving mechanism 523: The first Y-axis moving mechanism 53: The second stop module 531: second stop component 532: Second X-axis moving mechanism 533: Second Y-axis moving mechanism B: Pedestal P1, P2: starting point S, S1, S2: substrate W: initial working position

圖1為簡要示出本新型的實施例的劃片裝置的俯視圖。 圖2為簡要示出本新型的實施例的劃片裝置的側視圖。 圖3為簡要示出本新型的實施例的劃片裝置的側視圖。 圖4至圖7為依次示出本新型的實施例的劃片裝置中的基板相對於X軸進行整列的過程的圖。 圖8至圖10為依次示出本新型的實施例的劃片裝置中的基板相對於Y軸進行整列的過程的圖。 圖11為簡要示出在本新型的實施例的劃片裝置中在操作台上將基板整列後的狀態的圖。 圖12為簡要示出在本新型的實施例的劃片裝置中在基板形成劃片線的過程的圖。 圖13至圖16為示出在本新型的實施例的劃片裝置中將基板裝載於操作台上的過程的另一例的圖。 Fig. 1 is a plan view schematically showing a dicing device according to an embodiment of the present invention. Fig. 2 is a side view schematically showing the dicing device according to the embodiment of the present invention. Fig. 3 is a side view schematically showing the dicing device according to the embodiment of the present invention. 4 to 7 are diagrams sequentially showing the process of aligning the substrate with respect to the X axis in the dicing device according to the embodiment of the present invention. 8 to 10 are diagrams sequentially showing the process of aligning the substrates with respect to the Y axis in the dicing device according to the embodiment of the present invention. FIG. 11 is a diagram schematically showing a state after the substrates are aligned on the workbench in the dicing device according to the embodiment of the present invention. Fig. 12 is a diagram schematically showing a process of forming a scribing line on a substrate in the scribing device of the embodiment of the present invention. 13 to 16 are diagrams showing another example of the process of loading the substrate on the console in the dicing device according to the embodiment of the present invention.

10:操作台 10: console

20:劃片單元 20: Dicing unit

21:第一支架 21: The first bracket

22:第一劃片頭 22: The first scribing head

23:第二支架 23: second bracket

24:第二劃片頭 24: second scribing head

25:輪架 25: Wheel frame

251:劃片輪 251: Scribing Wheel

28:頭部移動模組 28: Head movement module

29:頭部移動模組 29: Head movement module

30:基板搬運單元 30: Board handling unit

31:拾取器模組 31: Picker module

32:支撐框架 32: support frame

33:拾取器移動模組 33: Picker mobile module

34:拾取器升降模組 34: Picker lift module

40:基板移送單元 40: Substrate transfer unit

41:支撐板 41: Support plate

42:移送帶 42: transfer belt

421:滑輪 421: Pulley

43:移動裝置 43: mobile device

44:導軌 44: Rail

50:基板整列單元 50: Substrate array unit

51:操作台傾斜模組 51: Console tilt module

52:第一止擋模組 52: The first stop module

521:第一止擋部件 521: The first stop component

522:第一X軸移動機構 522: The first X-axis moving mechanism

523:第一Y軸移動機構 523: The first Y-axis moving mechanism

53:第二止擋模組 53: The second stop module

531:第二止擋部件 531: second stop component

532:第二X軸移動機構 532: Second X-axis moving mechanism

533:第二Y軸移動機構 533: Second Y-axis moving mechanism

B:基座 B: Pedestal

S:基板 S: substrate

Claims (5)

一種劃片裝置,包括:操作台,用於支撐基板;基板整列單元,用於對裝載於該操作台的該基板進行整列;以及劃片單元,具有用於在裝載在該操作台的該基板上形成劃片線的劃片輪,該基板整列單元包括:操作台傾斜單元,以使該操作台的一端向下方傾斜的方式使該操作台傾斜;以及止擋模組,與該操作台的一端相鄰,該基板順著在該操作台傾斜單元的作用下傾斜的該操作台進行移動而與該止擋模組相接觸而整列,從而該劃片輪要與該基板相接觸的初始工作位置與要形成於該基板上的劃片線的起始點相一致。 A dicing device includes: an operation table for supporting a substrate; a substrate aligning unit for aligning the substrates loaded on the operation table; and a scribing unit for loading the substrate on the operation table A scribing wheel on which a scribing line is formed, the substrate aligning unit includes: an operating table tilting unit to tilt the operating table in such a way that one end of the operating table is tilted downward; and a stop module, which is connected to the operating table One end is adjacent, and the substrate moves along the operating platform tilted under the action of the operating platform tilting unit, and is in contact with the stop module to be aligned, so that the scribing wheel is in contact with the substrate. The position coincides with the starting point of the scribe line to be formed on the substrate. 根據請求項1所述的劃片裝置,其中該止擋模組包括:止擋部件,與該基板的一端相接觸;以及移動機構,使該止擋部件沿著移送該基板的方向或與移送該基板的方向正交的方向進行移動。 The dicing device according to claim 1, wherein the stop module includes: a stop member that is in contact with one end of the substrate; and a moving mechanism that causes the stop member to move along the direction in which the substrate is transferred or in conjunction with the transfer The direction of the substrate moves in a direction orthogonal to the direction. 根據請求項1所述的劃片裝置,其中該基板整列單元包括:操作台傾斜單元,用於使該操作台傾斜;以及第一止擋模組及第二止擋模組,以該操作台的一個角部為中心配置於兩側。 The dicing device according to claim 1, wherein the substrate aligning unit includes: an operating table tilting unit for tilting the operating table; and a first stop module and a second stop module to use the operating table One of the corners is centered on both sides. 根據請求項3所述的劃片裝置,其中該第一止擋模組及該第二止擋模組分別包括:止擋部件,與該基板的一端相接觸;以及 移動機構,使該止擋部件沿著移送該基板的方向或與移送該基板的方向正交的方向進行移動。 The dicing device according to claim 3, wherein the first stop module and the second stop module respectively include: a stop member that is in contact with one end of the substrate; and The moving mechanism moves the stopper along the direction in which the substrate is transferred or a direction orthogonal to the direction in which the substrate is transferred. 根據請求項1至4中任一項所述的劃片裝置,還包含基板搬運單元,該基板搬運單元在該操作台傾斜的狀態下將該基板裝載於該操作台。 The dicing device according to any one of claims 1 to 4, further including a substrate transport unit that loads the substrate on the operation table in a state where the operation table is inclined.
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