TWM611349U - Process waste gas washing device - Google Patents

Process waste gas washing device Download PDF

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TWM611349U
TWM611349U TW109217138U TW109217138U TWM611349U TW M611349 U TWM611349 U TW M611349U TW 109217138 U TW109217138 U TW 109217138U TW 109217138 U TW109217138 U TW 109217138U TW M611349 U TWM611349 U TW M611349U
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liquid
gas
filter
air inlet
filter device
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柯安
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奇鼎科技股份有限公司
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Abstract

本創作係為一種製程廢氣洗滌裝置,其係利用改變吸收液的供液方式,如此可在相同的用水量下使用較乾淨的洗滌液來吸附廢氣中的污染物,有效提昇廢氣中污染物的去除效率。This creation is a process waste gas scrubbing device, which uses the change of the liquid supply method of the absorption liquid, so that a cleaner scrubbing liquid can be used to adsorb the pollutants in the exhaust gas under the same water consumption, and effectively improve the pollutants in the exhaust gas. Removal efficiency.

Description

製程廢氣洗滌裝置Process waste gas washing device

本創作係關於一種裝置,特別是一種用於製程廢氣洗滌裝置,提供第一液體或/及第三液體噴灑至該第一過濾裝置或/及該第二過濾裝置,利用吸附原理的最佳化方式,有效提昇廢氣中污染物的去除效率。This creation is about a device, especially a device for scrubbing process exhaust gas, which provides the first liquid or/and the third liquid to be sprayed to the first filter device or/and the second filter device, optimized by the principle of adsorption In this way, the removal efficiency of pollutants in the exhaust gas is effectively improved.

因應工廠製程提升以及製造速度等考量,目前許多半導體清洗機台逐漸採用單晶圓清洗機(Single wafer cleaner)來取代傳統的濕式工作台(Wet Bench),但單晶圓清洗機伴隨而來的問題是混合廢氣(酸氣、鹼氣、有機氣體…)難以分離的問題,此混合廢氣的問題不僅產生於半導體業,在其它產業亦有同樣的混合廢氣問題。In response to the improvement of the factory process and manufacturing speed, many semiconductor cleaning machines have gradually adopted single wafer cleaners to replace the traditional wet benches, but single wafer cleaners have come along. The problem is that the mixed waste gas (acid gas, alkali gas, organic gas...) is difficult to separate. The mixed waste gas problem not only arises in the semiconductor industry, but also has the same mixed waste gas problem in other industries.

而揮發性有機氣體污染物或稱揮發性有機物(Volatile Organic Compounds, VOCs),係指在一大氣壓下,沸點在250℃以下之有機化合物之空氣污染物總稱,其所造成的環境污染問題,廣泛地存在於各類型工業中。Volatile organic gas pollutants or Volatile Organic Compounds (VOCs) refer to the general term for air pollutants of organic compounds with a boiling point below 250°C under one atmosphere. The environmental pollution problems caused by them are extensive. Land exists in all types of industries.

在高科技產業中,尤其是半導體製造業及光電業中,因產品製造所產生之揮發性有機物主要來源為光阻劑、顯影液與清洗液,而主要有機物種以丙酮(Acetone)、異丙酮(IPA)、丙二醇單甲基醚(PGME)、乙酸丙二醇單甲基醚酯(PGMEA)、二甲基亞碸(DMSO)、乙醇胺(MEA)、氮-甲基2-四氫吡咯酮(NMP)、二乙二醇單丁醚(BDG)、四甲基氫氧化銨(TMAH)等成份為多數,其有機廢氣通常具有中低濃度(<500ppm)、中高風量之特性。In the high-tech industry, especially in the semiconductor manufacturing and optoelectronic industries, the main sources of volatile organic compounds produced by product manufacturing are photoresist, developer and cleaning solution, and the main organic species are acetone and isoacetone. (IPA), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), dimethyl sulfoxide (DMSO), ethanolamine (MEA), nitrogen-methyl 2-tetrahydropyrrolidone (NMP ), Diethylene Glycol Monobutyl Ether (BDG), Tetramethylammonium Hydroxide (TMAH) and other ingredients are the majority, and its organic waste gas usually has the characteristics of low-medium concentration (<500ppm) and medium-high air volume.

傳統的移除 VOCs 的技術主要分為冷凝法、吸附法、洗滌法、焚燒法以及生物處理技術等五種方法,其中:The traditional technologies for removing VOCs are mainly divided into five methods: condensation method, adsorption method, washing method, incineration method and biological treatment technology, among which:

冷凝法多用於高濃度、成分單純且具回收價值之 VOCs廢棄處理,冷凝法的優點為處理成本較低,缺點為需於高濃度(濃度需高於5,000ppm)時操作方具一定之效益,且設置及操作成本偏高,因此一般僅應用於高濃度且具回收價值之揮發性有機物,應用較為侷限。Condensation method is mostly used for waste treatment of VOCs with high concentration, simple composition and recycling value. The advantage of condensation method is that the treatment cost is lower, but the disadvantage is that it needs to be operated at high concentration (concentration must be higher than 5,000ppm) to have certain benefits. In addition, the cost of installation and operation is relatively high, so it is generally only used for high-concentration volatile organic compounds with recycling value, and the application is relatively limited.

吸附法主要利用高孔隙率、高比表面積之吸附劑,藉由物理性吸附(可逆反應)或化學性鍵結(不可逆反應)作用,將VOCs氣體分子自廢氣中分離,以達成淨化廢氣之目的,吸附法的優點為可創造極高的去除效率,缺點是需時常更換或添加吸收劑或材料,維護成本高且有二次污染問題,且隨著氣體污染物濃度越高,所花費的成本也會不斷升高。The adsorption method mainly uses adsorbents with high porosity and high specific surface area to separate VOCs gas molecules from the exhaust gas through physical adsorption (reversible reaction) or chemical bonding (irreversible reaction) to achieve the purpose of purifying exhaust gas. The advantage of the adsorption method is that it can create extremely high removal efficiency. The disadvantage is that it requires frequent replacement or addition of absorbents or materials, high maintenance costs and secondary pollution problems, and as the concentration of gas pollutants increases, the cost is Will continue to rise.

洗滌法利用污染物在水中之溶解度特性,將VOCs 自廢氣中分離去除之技術,洗滌法可分為化學洗滌(化學反應)與物理洗滌(溶解度)二類,VOCs種類極多,不同成份的VOC於水中的溶解度皆不相同,對於較不具溶解度之VOCs,通常採用化學洗滌法,於水中須添加過錳酸鉀、次氯酸或過氧化氫等氧化劑,以增加去除效率,然後化學洗滌法則需時常添加化學藥劑,並有二次污染物之問題,而對於溶解度較佳之VOCs,即可使用物理吸收法,以不添加化學藥劑之水溶液做為去除有機污染物之方法,使物理吸收法為成本相對較低之有機污染物去除法。The washing method uses the solubility characteristics of pollutants in water to separate and remove VOCs from the exhaust gas. The washing method can be divided into chemical washing (chemical reaction) and physical washing (solubility). There are many types of VOCs and VOCs of different components. The solubility in water is not the same. For VOCs with less solubility, chemical washing is usually used. Oxidizing agents such as potassium permanganate, hypochlorous acid or hydrogen peroxide must be added to the water to increase the removal efficiency. Then chemical washing is required Chemical agents are often added, and secondary pollutants are problematic. For VOCs with better solubility, physical absorption can be used. An aqueous solution without chemical agents is used as a method to remove organic pollutants, and physical absorption is the cost Relatively low organic pollutant removal method.

焚化法係利用氧化過程將VOCs廢氣轉換成無害之CO 2與H 2O,然後卻是各方法中運轉成本最高之方法,考量規模、熱值與廢熱回收設備等需謹慎評估成本與設計。 The incineration method uses an oxidation process to convert VOCs waste gas into harmless CO 2 and H 2 O, but it is the most expensive method of all methods. Considering the scale, calorific value and waste heat recovery equipment, it is necessary to carefully evaluate the cost and design.

生物處理技術,是藉由微生物的分解、氧化、轉化等機制,將汙染物分解成無害之無機物,優點為二次污染問題較少且運轉成本較低,但缺點為佔地面積最大且初設成本昂貴,在國內電子產業因佔地面積等問題而較少採用。Biological treatment technology decomposes pollutants into harmless inorganic substances through the decomposition, oxidation, transformation and other mechanisms of microorganisms. The advantage is that there are fewer secondary pollution problems and lower operating costs, but the disadvantage is that the area is the largest and the initial design The cost is expensive, and it is rarely used in the domestic electronics industry due to issues such as floor space.

如前所述之主要高科技產業使用之有機物種,如丙酮(Acetone)、異丙酮(IPA)、丙二醇單甲基醚(PGME)、乙酸丙二醇單甲基醚酯(PGMEA)、二甲基亞碸(DMSO)、乙醇胺(MEA)、氮-甲基2-四氫吡咯酮(NMP)、二乙二醇單丁醚(BDG)、四甲基氫氧化銨(TMAH)等成份,皆具備一定程度之水溶性,可使用洗滌法加以去除,因此於處理這類特定且大量的揮發性有機污染物使用時,洗滌法可成為適合的廢氣去除手段。As mentioned above, the organic species used in major high-tech industries, such as acetone (Acetone), isoacetone (IPA), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), dimethyl ethylene Dust (DMSO), ethanolamine (MEA), nitrogen-methyl 2-tetrahydropyrrolidone (NMP), diethylene glycol monobutyl ether (BDG), tetramethylammonium hydroxide (TMAH) and other ingredients, all have certain The degree of water solubility can be removed by washing method. Therefore, washing method can be a suitable exhaust gas removal method when treating such specific and large amounts of volatile organic pollutants.

為解決混合廢氣的問題,目前多導入洗滌裝置來處理廢氣中污染物(酸、鹼、有機物質),而先前技術對於酸氣、鹼氣污染物已有不錯的去除效率,但對於有機氣體的去除效率卻一直未能達到良好之效果,在單晶圓清洗機上,尤其以異丙醇(IPA)的去除為主要的有機物標的,但其去除效率卻一直未能達到良好之效果。In order to solve the problem of mixed waste gas, at present, more washing devices are introduced to treat the pollutants (acid, alkali, organic matter) in the waste gas. The prior art has good removal efficiency for acid gas and alkali gas pollutants, but for organic gas However, the removal efficiency has not been able to achieve good results. In the single wafer cleaning machine, the removal of isopropyl alcohol (IPA) is the main organic target, but its removal efficiency has not been able to achieve good results.

為此,為了改善異丙醇(IPA)等有機物之去除效率,如何製作出一種高效率之廢氣洗滌裝置,以達於廢氣中污染物更佳去除效率,為本領域技術人員所欲解決的問題。Therefore, in order to improve the removal efficiency of organic matter such as isopropyl alcohol (IPA), how to make a high-efficiency waste gas scrubber to achieve better removal efficiency of pollutants in the waste gas is a problem that those skilled in the art want to solve .

本創作之一目的,在於提供一種製程廢氣洗滌裝置,其係利用一第一過濾裝置或者使用第一過濾裝置與第二過濾裝置設置於腔體內以過濾氣體,透過噴灑裝置提供第一液體或/及第三液體連續洗滌製程廢氣中之污染物質,,可有效達到提升去除汙染物質效率之功效,其中,該第一液體係指本裝置外部提供之洗滌水源,亦即尚未使用於污染去除使用之水源,該第一液體係為純水、自來水、回收水等不同水質之液體,該第一液體之水質越乾淨,即代表水中原本所含之污染物越少,可去除廢氣中之污染物吸收量即越多,但為成本考量,使用者可選擇適當之水質做為該第一液體,本實施例係使用自來水進行說明,自來水之運輸方式係為習知技藝,故不於此進行贅述。第二液體系指於本裝置中經由一次空氣污染物過濾使用後之液體,亦即已吸收過一次廢氣污染物成份之液體,第三液體係指由第一液體及第二液體組成之液體為第三液體,其混合之比例非特定,當100%由第一液體所供應時,此供應液為第一液體,同理,當100%由第二液體供應時,此供應液為第二液體,除上述由單一液體所提供之狀況外,只要有第一液體及第二液體混合之液體,即視為第三液體。其中,第一液體為三種液體中所含污染物最少之液體,亦即有最佳的去除效率,第二液體為污染物濃最高之液體,第三液體由第一液體與第二液體所組成,所以其污染物濃度視第一液體加入比例而定,第一液體加入量越多,則第三液體之污染物濃度越低。One purpose of this creation is to provide a process waste gas scrubbing device, which uses a first filter device or uses a first filter device and a second filter device to be installed in a cavity to filter gas, and to provide the first liquid or/ And the third liquid continuous washing process for pollutants in the exhaust gas, which can effectively improve the efficiency of removing pollutants. Among them, the first liquid system refers to the washing water source provided outside the device, that is, it has not been used for pollution removal. Water source, the first liquid system is pure water, tap water, recycled water and other liquids of different water quality. The cleaner the water quality of the first liquid, the less pollutants originally contained in the water, which can remove the pollutants in the exhaust gas. The more the amount is, but for cost considerations, the user can choose an appropriate water quality as the first liquid. This embodiment uses tap water for description. The transportation method of tap water is a known technique, so it will not be repeated here. The second liquid system refers to the liquid that has been used after primary air pollutant filtration in this device, that is, the liquid that has absorbed the primary exhaust gas pollutant components. The third liquid system refers to the liquid composed of the first liquid and the second liquid. The third liquid has a non-specific mixing ratio. When 100% is supplied by the first liquid, the supply liquid is the first liquid. Similarly, when 100% is supplied by the second liquid, the supply liquid is the second liquid. In addition to the above-mentioned conditions provided by a single liquid, as long as there is a mixed liquid of the first liquid and the second liquid, it is regarded as the third liquid. Among them, the first liquid is the liquid with the least pollutants among the three liquids, that is, it has the best removal efficiency, the second liquid is the liquid with the highest pollutant concentration, and the third liquid is composed of the first liquid and the second liquid. Therefore, the pollutant concentration depends on the proportion of the first liquid added. The more the first liquid is added, the lower the pollutant concentration of the third liquid.

針對上述之目的,本創作提供一種製程廢氣洗滌裝置,其係設置於腔體內,進氣通道兩端分別連通進氣口及過濾進氣口,氣體經由該進氣口進入該進氣通道,並且該氣體通過該過濾進氣口後進入第一過濾裝置,並依序流經第一多孔元件、離子吸附元件及出氣口,再者,該第一液體連續進入該出氣口並通過該離子吸附元件及該第一多孔元件,該氣體經該第一液體洗滌後,由過濾出氣口流出並經由該出氣口排出該腔體。In view of the above-mentioned purpose, the present invention provides a process exhaust gas scrubbing device, which is arranged in a cavity, the two ends of the air inlet channel are respectively connected with an air inlet and a filter air inlet, and gas enters the air inlet channel through the air inlet, and The gas enters the first filter device after passing through the filter air inlet, and then flows through the first porous element, the ion adsorption element, and the air outlet in sequence. Furthermore, the first liquid continuously enters the air outlet and passes through the ion adsorption After the element and the first porous element are washed by the first liquid, the gas flows out from the filtered air outlet and exits the cavity through the air outlet.

本創作提供一實施例,其中該第一過濾裝置係包含一殼體、一第一過濾裝置,該第一過濾裝置係設置於該過濾入氣口與該過濾出氣口之間,該第一過濾裝置可為廢氣與洗滌液體之氣液交換空間,習知之裝置為採噴霧型式之洗滌液體噴灑,在一定空間內讓氣體與液體之接觸,達到去除污染物之目的,此交換空間在無填充物情況下,亦視為第一過濾裝置;為增加污染物去除率,亦可在第一過濾裝置內加入離子吸附元件,增加液體停留在空氣中的時間,如此即可增加氣體的接觸時間,該離子吸附元件可為塑膠、玻璃纖維、金屬板或是陶瓷填充材料或單一或複合材料製成,凡是可增加液體停留時間之裝置皆屬之。The present invention provides an embodiment, wherein the first filter device includes a housing and a first filter device, the first filter device is disposed between the filter air inlet and the filter air outlet, and the first filter device It can be a gas-liquid exchange space for waste gas and washing liquid. The conventional device uses spray-type washing liquid spraying, which allows gas and liquid to contact in a certain space to achieve the purpose of removing pollutants. This exchange space is in the absence of fillers. In order to increase the pollutant removal rate, an ion adsorption element can also be added to the first filter device to increase the time the liquid stays in the air, so that the contact time of the gas can be increased. The adsorption element can be made of plastic, glass fiber, metal plate, ceramic filling material, or single or composite material, and it belongs to any device that can increase the liquid residence time.

本創作提供一實施例,其中該第一過濾裝置更包含一第二多孔元件,其設置於該離子吸附元件與該過濾出氣口之間,該第二多孔元件上設置有一第二觸媒材料。The present invention provides an embodiment, wherein the first filter device further includes a second porous element disposed between the ion adsorption element and the filtering air outlet, and a second catalyst is disposed on the second porous element material.

本創作提供一實施例,更包含一液體儲存槽,該液體儲存槽係設置於該第一過濾裝置之下方,該進氣通道位於該液體儲存槽及該第一過濾裝置之間,進一步,該液體儲存槽下方設置一排水裝置,該排水裝置係用以排出該廢棄之液體。The present invention provides an embodiment that further includes a liquid storage tank, the liquid storage tank is arranged below the first filter device, the air inlet channel is located between the liquid storage tank and the first filter device, and further, the A drainage device is arranged under the liquid storage tank, and the drainage device is used to discharge the waste liquid.

本創作提供一實施例,更包含一抽取裝置,其係設置於該第一噴灑裝置及該液體儲存槽之間,並位於該液體運輸管路上。The present invention provides an embodiment, which further includes an extraction device, which is arranged between the first spray device and the liquid storage tank, and is located on the liquid transportation pipeline.

本創作提供一實施例,更包含一液體輸送管路,該液體輸送管路一端連通該第一管路或該第二管路,該液體輸送管路係用以運輸一第二液體經由該第一管路及/或第二管路進入該第一噴灑裝置。The present invention provides an embodiment that further includes a liquid conveying pipe, one end of the liquid conveying pipe is connected to the first pipe or the second pipe, and the liquid conveying pipe is used to transport a second liquid through the first pipe. A pipeline and/or a second pipeline enter the first spraying device.

本創作提供一實施例,其中於第一噴灑裝置及該液體輸送管路之間更進一步設有至少一液體切換閥,其係用以切換該第一液體及/或該第二液體進入該第一噴灑裝置內。The present invention provides an embodiment, in which at least one liquid switching valve is further provided between the first spray device and the liquid conveying pipe, which is used to switch the first liquid and/or the second liquid to enter the first liquid Inside a spraying device.

本創作提供一實施例,其中該腔體內更包含一第二過濾裝置,第一過濾裝置一氣體通道一端連通該第一過濾裝置之該過濾出氣口,該氣體通道另一端連通第二過濾裝置之一過濾進氣口,該氣體通道係用以使該氣體由該第一過濾裝置流入該第二過濾裝置第一過濾裝置。The present invention provides an embodiment, wherein the cavity further contains a second filter device, one end of the first filter device and a gas channel is connected to the filter outlet of the first filter device, and the other end of the gas channel is connected to the second filter device A filter air inlet, and the gas channel is used to flow the gas from the first filter device into the first filter device of the second filter device.

本創作提供一實施例,更包含一第三管路,其兩端分別連接於該第一過濾裝置及第二過濾裝置,該第三管路兩端各設有該第一液體切換閥,其係用於切換該第一液體及該第二液體,亦用於混合該第一液體及該第二液體進行洗滌。The present invention provides an embodiment, which further includes a third pipeline, the two ends of which are respectively connected to the first filter device and the second filter device, and the first liquid switching valve is provided at both ends of the third pipeline. It is used to switch the first liquid and the second liquid, and is also used to mix the first liquid and the second liquid for washing.

為使 貴審查委員對本創作之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以較佳之實施例及配合詳細之說明,說明如後:In order to enable your review committee to have a better understanding and understanding of the features of this creation and the effects achieved, I would like to provide a better embodiment and detailed explanations. The explanations are as follows:

習知工廠多導入洗滌裝置來處理廢氣中污染物(酸、鹼、有機物質),而先前技術對於酸氣、鹼氣污染物已有不錯的去除效率,但對於有機氣體的去除效率卻一直未能達到良好的效果,請參考第1A圖,其為本創作之習知之裝置示意圖,如圖所示,目前業界習知之洗滌方式,一氣體透過一進氣口12A進入一進氣通道120A後,由下而上的進入一第一過濾裝置20A之一過濾進氣口222A後流出一過濾出氣口224A,再經由一出氣口14A排出,其中,透過一第一管路T1將一第一液體W1輸入至一液體儲存槽40A內,該第一液體W1係為一純水、自來水或無汙染物質之液體,並與該液體儲存槽40A內之一第二液體W2混合後形成一第三液體W3,其中該第二液體W2係為已吸附過汙染源之液體,而該第三液體W3係為該第一液體W1混合該第二液體W2後形成,經由一第二管路T2將該液體儲存槽40A中之該第三液體W3運送到一第一噴灑裝置30A,該第一噴灑裝置30A由上而下將該第三液體W3噴灑至該第一過濾裝置20A上,並吸附流經該第一過濾裝置20A之該氣體後,形成新的該第二液體W2後落入該液體儲存槽40A內,通過如此循環運用之下,該液體儲存槽40A中之該第二液體W2吸附氣體中之汙染物之效率會越來越低,即使加入了該第一液體W1,亦無法使吸附力提升。Conventional factories often introduce scrubbers to treat pollutants (acids, alkalis, organic substances) in exhaust gas. The prior art has good removal efficiency for acid gas and alkali gas pollutants, but the removal efficiency of organic gas has not been To achieve good results, please refer to Figure 1A, which is a schematic diagram of a conventional device created in the creation. As shown in the figure, the current washing method known in the industry is that after a gas enters an air inlet channel 120A through an air inlet 12A, From bottom to top, it enters into a filtering air inlet 222A of a first filter device 20A, and then flows out of a filtered air outlet 224A, and then is discharged through an air outlet 14A. A first liquid W1 is discharged through a first pipe T1. Input into a liquid storage tank 40A, the first liquid W1 is a pure water, tap water or a liquid without pollutants, and mixed with a second liquid W2 in the liquid storage tank 40A to form a third liquid W3 , Wherein the second liquid W2 is a liquid that has absorbed the pollution source, and the third liquid W3 is formed by mixing the first liquid W1 with the second liquid W2, and the liquid storage tank is passed through a second pipeline T2 The third liquid W3 in 40A is transported to a first spraying device 30A, and the first spraying device 30A sprays the third liquid W3 onto the first filter device 20A from top to bottom, and adsorbs and flows through the first filter device 20A. After the gas in the filter device 20A forms a new second liquid W2 and then falls into the liquid storage tank 40A, through such recycling, the second liquid W2 in the liquid storage tank 40A absorbs pollution in the gas The efficiency of the material will become lower and lower, and even if the first liquid W1 is added, the adsorption force cannot be improved.

本創作主要藉由一第一管路、第二管路以及第三管路經由液體運輸管路所提供之第一液體或第二液體或第三液體,流經第一過濾裝置洗滌由進氣通道進入之氣體,該氣體經由進氣口進入該進氣通道,且該氣體通過該過濾進氣口後進入第一過濾裝置或/及第二過濾裝置,並依序流經第一過濾裝置及出氣口,更進一步利用第一管路、第二管路以及第三管路切換吸收液供應方式,提升進氣通道中污染物的去除效率,其主要原理為應用平衡溶解度原理在於一定的溫度、總壓下混合該氣體與第一液體接觸,溶質向液相傳遞,當液相中溶質達到飽和時,任一時間進入液相的溶質數量等於溶質以液相逸出的數量,即氣液兩相達到平衡後,第一液體即無法再吸收污染物,再者,根據質傳原理,第一液體中的污染物濃度,亦會影響吸收的速率與效能,因此,本實施例改變傳統習知直接將第一液體混合於第二液體以形成第三液體的做法,藉由改變第一管路、第二管路以及第三管路切換吸收液供應方式,使第一液體可最直接供應於噴灑裝置,如此可將污染物最少的第三液體用來吸收廢氣中的污染物,可有效達到提升去除效率的功效。This creation mainly uses the first liquid or the second liquid or the third liquid provided by a first pipeline, a second pipeline, and a third pipeline through a liquid transportation pipeline, which flows through the first filter device and is washed by the intake air. The gas enters the channel, the gas enters the air inlet channel through the air inlet, and the gas enters the first filter device or/and the second filter device after passing through the filter air inlet, and then flows through the first filter device and the second filter device in sequence. At the air outlet, the first pipeline, the second pipeline, and the third pipeline are further used to switch the absorption liquid supply mode to improve the removal efficiency of pollutants in the intake channel. The main principle is to apply the principle of equilibrium solubility to a certain temperature, Under the total pressure, the mixed gas contacts the first liquid, and the solute is transferred to the liquid phase. When the solute in the liquid phase reaches saturation, the amount of solute entering the liquid phase at any time is equal to the amount of solute that escapes in the liquid phase, that is, the gas and liquid two After the phases reach equilibrium, the first liquid can no longer absorb pollutants. Furthermore, according to the principle of mass transfer, the concentration of pollutants in the first liquid will also affect the absorption rate and efficiency. Therefore, this embodiment changes the traditional conventional wisdom. The method of directly mixing the first liquid with the second liquid to form the third liquid. By changing the first pipeline, the second pipeline and the third pipeline to switch the supply mode of the absorption liquid, the first liquid can be most directly supplied to The spray device can use the third liquid with the least pollutants to absorb the pollutants in the exhaust gas, which can effectively achieve the effect of improving the removal efficiency.

在下文中,將藉由圖式來說明本創作之各種實施例來詳細描述本創作。然而本創作之概念可能以許多不同型式來體現,且不應解釋為限於本文中所闡述之例示性實施例。In the following, various embodiments of the present creation will be described in detail by illustrating various embodiments of the present creation through drawings. However, the concept of this creation may be embodied in many different forms, and should not be construed as being limited to the exemplary embodiments described herein.

首先,請參閱第1B圖,其為本創作之一實施例之裝置示意圖。First of all, please refer to Figure 1B, which is a schematic diagram of the device according to an embodiment of the creation.

如第1B圖所示,本創作之實施例中揭示一種製程廢氣洗滌裝置,其係設置於一腔體10內,該腔體10兩側分別設有一進氣口12及一出氣口14,該製程廢氣洗滌裝置包含一第一過濾裝置20,其係設置於該腔體10內,並位於該進氣口12之一側,該第一過濾裝置20係包含一殼體22、一第一多孔元件24及一離子吸附元件26,該殼體22係上方及下方分別設有一過濾進氣口222及一過濾出氣口224,該第一多孔元件24係設置於該殼體22內,位於該過濾進氣口222之一側,該第一多孔元件24上設置一第一觸媒材料241,該離子吸附元件26係設置於該第一多孔元件24與該過濾出氣口224之間,其中,該第一過濾裝置20更包含一第二多孔元件28,其設置於該離子吸附元件26與該過濾出氣口224之間,該第二多孔元件28上設置有一第二觸媒材料281。As shown in Figure 1B, the embodiment of the present invention discloses a process exhaust gas scrubbing device, which is disposed in a cavity 10, and both sides of the cavity 10 are provided with an air inlet 12 and an air outlet 14, respectively. The process waste gas washing device includes a first filter device 20, which is arranged in the cavity 10 and located on one side of the air inlet 12. The first filter device 20 includes a housing 22, a first filter device Porous element 24 and an ion adsorbing element 26. The housing 22 is provided with a filtering air inlet 222 and a filtering air outlet 224 respectively above and below the housing 22. The first porous element 24 is arranged in the housing 22 and is located in the housing 22. On one side of the filtered air inlet 222, a first catalyst material 241 is arranged on the first porous element 24, and the ion adsorbing element 26 is arranged between the first porous element 24 and the filtered air outlet 224 , Wherein, the first filter device 20 further includes a second porous element 28 disposed between the ion adsorbing element 26 and the filtering air outlet 224, and a second catalyst is disposed on the second porous element 28 Material 281.

且於該腔體10內位於該第一過濾裝置20上設置有一第一噴灑裝置30,該第一噴灑裝置30其係用以由上而下噴灑一第一液體W1、一第二液體W2或一第三液體W3於該第一過濾裝置20。In addition, a first spraying device 30 is provided on the first filter device 20 in the cavity 10, and the first spraying device 30 is used to spray a first liquid W1, a second liquid W2, or a liquid from top to bottom. A third liquid W3 is in the first filter device 20.

另外於本實施例中設有一第一管路T1,其一端連通一第一液體切換閥70,該第一管路T1係用以運輸一第一液體W1經由一液體運輸管路200進入該第一噴灑裝置30,使該第一噴灑裝置30噴灑該第一液體W1於該第一過濾裝置20。In addition, in this embodiment, a first pipeline T1 is provided, one end of which is connected to a first liquid switching valve 70, and the first pipeline T1 is used to transport a first liquid W1 into the first liquid through a liquid transportation pipeline 200. A spraying device 30 enables the first spraying device 30 to spray the first liquid W1 on the first filtering device 20.

再者,該第一液體切換閥70係為球閥或球向閥之結構(包含二通閥或三通閥或四通閥等),本實施例中係以三通球閥進行說明,但不以此為限。Furthermore, the first liquid switching valve 70 is a structure of a ball valve or a ball valve (including a two-way valve, a three-way valve, a four-way valve, etc.). In this embodiment, a three-way ball valve is used for description, but not This is limited.

其中,該第一多孔元件24及該第二多孔元件28之材質係為不鏽鋼、鈦、鉑或鋁,進一步,該第一觸媒材料241及該第二觸媒材料281係為二氧化鈦、氧化矽、氧化鋁或鉑。Wherein, the material of the first porous element 24 and the second porous element 28 is stainless steel, titanium, platinum or aluminum. Furthermore, the first catalyst material 241 and the second catalyst material 281 are titanium dioxide, Silica, alumina or platinum.

接著,請復參閱第1B圖,本實施例中更包含一液體儲存槽40,該液體儲存槽40係設置於該第一過濾裝置20之下方,進一步,一進氣通道120位於該液體儲存槽40及該第一過濾裝置20之間,該進氣通道12設置於該第一過濾裝置20之一側,且自該進氣口12向下延伸並連通至該過濾進氣口222,該氣體經由該進氣口12進入該進氣通道120,並且該氣體通過該過濾進氣口222後進入該第一過濾裝置20。Next, please refer to FIG. 1B again. In this embodiment, a liquid storage tank 40 is further included. The liquid storage tank 40 is disposed under the first filter device 20. Further, an air inlet channel 120 is located in the liquid storage tank. 40 and the first filter device 20, the air inlet passage 12 is arranged on one side of the first filter device 20, extends downward from the air inlet 12 and communicates with the filter air inlet 222, the gas The air enters the air inlet passage 120 through the air inlet 12, and the gas enters the first filter device 20 after passing through the filtered air inlet 222.

更進一步,該液體儲存槽40之下方設有一排水裝置,其係用以排除該液體儲存槽40中之液體。Furthermore, a drainage device is provided under the liquid storage tank 40 to drain the liquid in the liquid storage tank 40.

再者,本實施例中更包含一抽取裝置50,其係設置於該第一噴灑裝置30及該液體儲存槽40之間,並位於該液體運輸管路200上,該抽取裝置50係為水泵、抽水馬達、加壓馬達或抽水機,本實施例係使用抽水馬達,但不以此為限。Furthermore, this embodiment further includes an extraction device 50, which is arranged between the first spray device 30 and the liquid storage tank 40 and is located on the liquid transport pipeline 200. The extraction device 50 is a water pump , Pumping motor, pressurizing motor or pumping machine. In this embodiment, a pumping motor is used, but it is not limited to this.

故,如上所述,本實施例之一進氣通道120連通該進氣口12及該過濾進氣口222,一氣體100經由該進氣通道120進入該第一過濾裝置20並依序流經該第一多孔元件24、該離子吸附元件26及該出氣口224,再者,該第一液體W1連續進入該出氣口14並通過該離子吸附元件26及該第一多孔元件24,該氣體100經該液體洗滌後,由該過濾出氣口224流出並經由該出氣口14排出該腔體10。Therefore, as described above, an intake passage 120 of the present embodiment communicates with the intake port 12 and the filter intake port 222, and a gas 100 enters the first filter device 20 through the intake passage 120 and flows through the first filter device 20 in sequence. The first porous element 24, the ion adsorbing element 26 and the air outlet 224, and further, the first liquid W1 continuously enters the air outlet 14 and passes through the ion adsorbing element 26 and the first porous element 24, the After the gas 100 is washed by the liquid, it flows out from the filtered air outlet 224 and exits the cavity 10 through the air outlet 14.

接著請參閱第2圖,其為本創作之一實施例之離子吸附元件之結構放大示意圖,如圖所示,本實施例之該離子吸附元件26中更包含了複數個氣體通道262,且該些個氣體通道262採取斜向配置採連續轉彎方向,向左或向右傾斜,如此對於已溶解後再次逸散之該氣體100可達再次補集之功效,可有效提高汙染物質去除率,減少二次逸散之機率。Next, please refer to Figure 2, which is an enlarged schematic diagram of the structure of the ion adsorption element of an embodiment of the creation. As shown in the figure, the ion adsorption element 26 of this embodiment further includes a plurality of gas channels 262, and the The gas channels 262 are arranged in an oblique direction with continuous turning directions, inclined to the left or right, so that the gas 100 that has been dissolved and escaping again can be re-collected, which can effectively improve the removal rate of pollutants and reduce The probability of a second escape.

再者,本實施例中將該離子吸附元件26設計為該些個氣體通道262,使吸收液體可由上往下順著該離子吸附元件26表面往下流,與該氣體100方向相反,且角度可相衝突,可使有機氣體分子污染物(該氣體100)更易被吸收液體所吸附,更可確保已溶解於吸收液體之有機污染物不易再次被釋出於空氣中,以達高效率去除之功效。Furthermore, in this embodiment, the ion adsorption element 26 is designed as the gas passages 262, so that the absorption liquid can flow down the surface of the ion adsorption element 26 from top to bottom, opposite to the direction of the gas 100, and the angle can be adjusted. Conflict, the organic gas molecular pollutants (the gas 100) are more easily absorbed by the absorption liquid, and the organic pollutants that have been dissolved in the absorption liquid are not easily released into the air again, so as to achieve high-efficiency removal. .

其中,該離子吸附元件26係為塑膠、玻璃纖維、金屬板或是陶瓷填充材料或單一或複合材料製成板式波浪狀之平板構造,使板與板之間形成該些個氣體通道262,由上方流下之吸收液在平板表面流動,以吸附空氣中之氣態分子污染物。Wherein, the ion adsorbing element 26 is made of plastic, glass fiber, metal plate or ceramic filling material or a single or composite material made of a wave-like plate structure, so that the gas channels 262 are formed between the plate and the plate. The absorbing liquid flowing from above flows on the surface of the plate to absorb gaseous molecular pollutants in the air.

同時,本實施例中,該些個氣體通道262相互具有一間距P,該間距P係為3mm至30mm之間,可使汙染之該氣體100(如揮發性有機物)易於被吸收液體所吸附,同時不易造成氣體壓損過大之問題,更進一步,透過該些個氣體通道262,使該氣體100經由該些個氣體通道262往上通過(如第2圖中虛線所示),而吸收液體則由該些個氣體通道262之通道往下澆淋,更進一步,該些個氣體通道262與該第一多孔元件24形成一角度θ,該角度θ係介於30∘至90∘之間,可使該氣體100在通過該些個氣體通道262時,更易直接衝擊吸收液體,使而被吸收液體所吸收。At the same time, in this embodiment, the gas channels 262 have a distance P between each other, and the distance P is between 3 mm and 30 mm, so that the contaminated gas 100 (such as volatile organic compounds) can be easily absorbed by the absorption liquid. At the same time, it is not easy to cause the problem of excessive gas pressure loss. Furthermore, through the gas passages 262, the gas 100 passes upward through the gas passages 262 (as shown by the dashed line in Figure 2), while absorbing liquid Pouring down from the channels of the gas channels 262, and further, the gas channels 262 and the first porous element 24 form an angle θ, and the angle θ is between 30∘ and 90∘, When the gas 100 passes through the gas channels 262, it is easier to directly impact the absorbing liquid, so that it is absorbed by the absorbing liquid.

接著,請復參閱第1B圖,如圖所示,本創作係可透過單一該第一過濾裝置20進行該氣體100之過濾,如第1B圖所示,可將該第二液體W2經由該抽取裝置50運輸至該第一噴灑裝置30並於該第一過濾裝置20上方噴灑,或是藉由該第一管路T1運輸該第一液體W1,經由該抽取裝置50抽取至該第一噴灑裝置30並於該第一過濾裝置20上方噴灑,亦可切換該第一液體切換閥70使該第一液體W1中加入該第二液體W2後,再由該抽取裝置50運輸至該第一噴灑裝置30,並於該第一過濾裝置20上方噴灑。Next, please refer to Figure 1B again. As shown in the figure, this creation system can filter the gas 100 through a single first filter device 20. As shown in Figure 1B, the second liquid W2 can be extracted through the The device 50 is transported to the first spray device 30 and sprayed above the first filter device 20, or the first liquid W1 is transported through the first pipeline T1, and is extracted to the first spray device through the extraction device 50 30 and spray above the first filter device 20, or switch the first liquid switching valve 70 so that the first liquid W1 is added to the second liquid W2, and then transported by the extraction device 50 to the first spray device 30, and spray on the first filter device 20.

如上所述,本實施中係透過並經由該第一液體切換閥70控制該第一液體W1與第二液體W2進行切換,藉以吸附該氣體100中該污染物質101,而當該第二液體W2使用多次後,已具有一定污染物濃度的吸收液混合,對於該第二液體W2之吸收新的污染物之能力會降低,造成去除效率下降,故本實施例增加該第一液體W1的使用方式,將該第一液體W1直接供應於該抽取裝置50前端,並經由該第一液體切換閥70的控制,可讓使用者選擇使用該第一液體W1及/或該第二液體W2或是第三液體W3(該第一液體W1混合第二液體W2)供應至該第一噴灑裝置30,達到有效提升去除效率的功效。As mentioned above, in this embodiment, the first liquid W1 and the second liquid W2 are controlled to switch through and through the first liquid switching valve 70, so as to adsorb the pollutant 101 in the gas 100, and when the second liquid W2 After being used for many times, the absorption liquid with a certain concentration of pollutants is mixed, and the ability of the second liquid W2 to absorb new pollutants will be reduced, resulting in a decrease in removal efficiency. Therefore, this embodiment increases the use of the first liquid W1 In this way, the first liquid W1 is directly supplied to the front end of the extraction device 50, and through the control of the first liquid switching valve 70, the user can choose to use the first liquid W1 and/or the second liquid W2 or The third liquid W3 (the first liquid W1 is mixed with the second liquid W2) is supplied to the first spraying device 30 to achieve the effect of effectively improving the removal efficiency.

再者,為達更高效去除的目的,習知之業界做法係參考第3A圖,其為本創作之習知之裝置示意圖,如圖所示,目前業界習知之洗滌方式亦可使用兩個或以上的洗滌裝置,一氣體透過一進氣口12A進入一進氣通道120A,由下而上的進入該第一過濾裝置20A之一過濾進氣口222A後,流出一過濾出氣口224A進入一氣體通道130A後,經由一過濾進氣口222A’流入一第二過濾裝置20A’,再經由一過濾出氣口224A’流出後,透過一出氣口14A排出外界環境。Furthermore, in order to achieve a more efficient removal, the conventional industry practice refers to Figure 3A, which is a schematic diagram of the conventional device created. As shown in the figure, the current industry-known washing method can also use two or more In the scrubbing device, a gas enters an air inlet passage 120A through an air inlet 12A, enters a filtered air inlet 222A of the first filter device 20A from bottom to top, and then flows out of a filtered air outlet 224A into a gas channel 130A Then, it flows into a second filter device 20A' through a filtered air inlet 222A', and then flows out through a filtered air outlet 224A', and then exhausts the external environment through an air outlet 14A.

其中,透過一第一管路T1將一第一液體W1輸入至一液體儲存槽40A及40A’內,該第一液體W1係為一純水、自來水或無汙染物質之液體,並與該液體儲存槽40A及40A’內之一第二液體W2混合後分別形成一第三液體W3,其中該第二液體W2係為已吸附過汙染源之液體,而該第三液體W3係為該第一液體W1混合該第二液體W2後形成,經由一第二管路T2及T2’將該液體儲存槽40A及40A’中之該第三液體W3運送到一第一噴灑裝置30A及30A’,該第一噴灑裝置30A及30A’由上而下將該第三液體W3噴灑至該第一過濾裝置20A及該第二過濾裝置20A’上,並吸附流經該第一過濾裝置20A及該第二過濾裝置20A’之該氣體後,形成新的該第二液體W2後落入該液體儲存槽40A及40A’內,通過如此循環運用之下,該液體儲存槽40A及40A’中之該第二液體W2吸附該氣體100中之該汙染物質101A之效率會越來越低,透過此裝置即使加入了該第一液體W1,亦無法使吸附力提升。Wherein, a first liquid W1 is input into a liquid storage tank 40A and 40A' through a first pipe T1. The first liquid W1 is a pure water, tap water or a liquid without pollutants, and is combined with the liquid A second liquid W2 in the storage tanks 40A and 40A' is mixed to form a third liquid W3, wherein the second liquid W2 is the liquid that has adsorbed the pollution source, and the third liquid W3 is the first liquid W1 is formed by mixing the second liquid W2, and transports the third liquid W3 in the liquid storage tanks 40A and 40A' to a first spray device 30A and 30A' through a second pipeline T2 and T2'. A spraying device 30A and 30A' sprays the third liquid W3 on the first filter device 20A and the second filter device 20A' from top to bottom, and adsorbs and flows through the first filter device 20A and the second filter device 20A. After the gas of the device 20A' forms a new second liquid W2 and then falls into the liquid storage tanks 40A and 40A', the second liquid in the liquid storage tanks 40A and 40A' is recycled in this way The efficiency of W2 adsorbing the pollutant 101A in the gas 100 will become lower and lower. Even if the first liquid W1 is added through this device, the adsorption force cannot be improved.

再者,為達更高效去除的目的,本創作亦可採用前後串聯的方式提昇該污染物質101之去除效率,請參考第3B圖,其為本創作之一另一實施例之結構示意圖,如圖所示,於該腔體10內設置前者(左側)稱之製程廢氣洗滌裝置A,後者(右側)稱之製程廢氣洗滌裝置B,當採用兩個以上之製程廢氣洗滌裝置於該腔體10內,以上述前後串聯配置為例,會同時使用到該第一過濾裝置20及一第二過濾裝置20’,其中,該第一過濾裝置20及一第二過濾裝置20’之元件配置如前一實施例所述,故不在此進行贅述。Furthermore, in order to achieve more efficient removal, this creation can also adopt a series connection method to improve the removal efficiency of the pollutant 101. Please refer to Figure 3B, which is a schematic structural diagram of another embodiment of the creation, such as As shown in the figure, the former (left side) is called process waste gas scrubbing device A, and the latter (right side) is called process waste gas scrubbing device B. When two or more process waste gas scrubbing devices are used in the cavity 10 Inside, taking the above-mentioned serial configuration as an example, the first filter device 20 and a second filter device 20' will be used at the same time, wherein the components of the first filter device 20 and the second filter device 20' are configured as before It is described in an embodiment, so it will not be repeated here.

進一步,一氣體通道130一端連通製程廢氣洗滌裝置A之該第一過濾裝置20之該過濾出氣口224,該氣體通道130另一端連通製程廢氣洗滌裝置B之該第二過濾裝置20’之該過濾進氣口222’,該氣體通道130係用以使該氣體100由該第一過濾裝置20運輸至該第二過濾裝置20’過濾後由製程廢氣洗滌裝置B之該過濾出氣口224’通過後,再經由該出氣口14排出外部環境。Further, one end of a gas channel 130 is connected to the filter outlet 224 of the first filter device 20 of the process waste gas washing device A, and the other end of the gas channel 130 is connected to the filter of the second filter device 20' of the process waste gas washing device B The gas inlet 222', the gas channel 130 is used to transport the gas 100 from the first filter device 20 to the second filter device 20' and then pass through the filtered gas outlet 224' of the process waste gas scrubbing device B , And then exhaust the external environment through the air outlet 14.

上述之製程廢氣洗滌裝置B包含該第二過濾裝置20’,並設有一第二噴灑裝置30’,復參閱第3C圖,製程廢氣洗滌裝置B係可直接使用一抽取裝置50’加壓抽取,使該第一液體W1透過該第一管路T1流經一液體輸送管路200後,經由該第二噴灑裝置30’噴灑出該第一液體W1,且本實施例中於製程廢氣洗滌裝置A之該第一管路T1及製程廢氣洗滌裝置B之該第一管路T1’之間設有一第三管路T3,該第三管路T3兩端分別設置製程廢氣洗滌裝置A之一第一液體切換閥70A及液體儲存槽40’之間,如此一來,製程廢氣洗滌裝置A及製程廢氣洗滌裝置B即可於該第一液體及該第二液體之間進行切換,洗滌由進氣口12進入該進氣通道130之該氣體100,使該氣體100中之該汙染物質101濃度減少,另外,該液體儲存槽40’除了可透過該第一液體切換閥70A及70B切換後將該第二液體W2傳輸至該第一噴灑裝置30之外,該液體儲存槽40及40’之下方設有一排水裝置90及90’,其係用以排除該液體儲存槽40及40’中之該第二液體W2。The above-mentioned process waste gas washing device B includes the second filter device 20', and is provided with a second spraying device 30'. Referring back to Figure 3C, the process waste gas washing device B can directly use an extraction device 50' for pressure extraction. After the first liquid W1 flows through the first pipe T1 through a liquid conveying pipe 200, the first liquid W1 is sprayed out through the second spray device 30', and in this embodiment, the process waste gas washing device A A third pipe T3 is provided between the first pipe T1 and the first pipe T1' of the process waste gas washing device B. Both ends of the third pipe T3 are respectively provided with one of the first process waste gas washing devices A. Between the liquid switching valve 70A and the liquid storage tank 40', in this way, the process waste gas washing device A and the process waste gas washing device B can switch between the first liquid and the second liquid, and the washing is performed by the air inlet 12 The gas 100 entering the gas inlet channel 130 reduces the concentration of the pollutant 101 in the gas 100. In addition, the liquid storage tank 40' can be switched through the first liquid switching valves 70A and 70B after the first liquid switching valve 70A and 70B are switched. The two liquids W2 are transmitted to the outside of the first spraying device 30. Below the liquid storage tanks 40 and 40' are provided a drainage device 90 and 90', which is used to drain the first spraying device in the liquid storage tanks 40 and 40'. Two liquid W2.

如上所述,本實施例主要目的是為節省該第一液體之使用量,且兼具高效率去除該汙染物質101之特性,由質傳原理可知,吸收液(如上述之該第一液體或該第二液體或第三液體)中的該汙染物質101濃度,會影響吸收的速率與效能,因此本實施例之主要目的為充份應用吸收液中污染物濃度與空氣中濃度的梯度差,以吸收液使用方向來看,當新鮮吸收液(該第一液體W1)進入製程廢氣洗滌裝置B時所包含之污染物是最少之狀態,因此,透過製程廢氣洗滌裝置B洗滌該氣體100後之第二液體W2,再透過第三管路T3上之該第一液體切換閥70A切換後,將洗滌過之廢水(該第二液體W2)運送至製程廢氣洗滌裝置A,此時由於流經製程廢氣洗滌裝置A之該氣體依然具有高濃度之該汙染物質101,因此洗滌過之第二液體W2具有一定的去除該汙染物質101之效率,此經過一次使用之第二液體W2可透過該液體切換閥70A切換供給製程廢氣洗滌裝置A之洗滌液使用可節省新鮮吸收液(該第一液體)之使用量,並且兼具高效去除該汙染物質101之作用。As mentioned above, the main purpose of this embodiment is to save the amount of the first liquid used and have the characteristics of high-efficiency removal of the pollutant 101. According to the principle of mass transfer, the absorption liquid (such as the above-mentioned first liquid or The concentration of the pollutant 101 in the second liquid or the third liquid will affect the rate and efficiency of absorption. Therefore, the main purpose of this embodiment is to make full use of the gradient difference between the concentration of pollutants in the absorption liquid and the concentration in the air. From the perspective of the direction of use of the absorption liquid, when the fresh absorption liquid (the first liquid W1) enters the process waste gas scrubbing device B, the pollutants contained are the least. Therefore, after the process waste gas scrubbing device B washes the gas 100 After the second liquid W2 is switched through the first liquid switching valve 70A on the third pipe T3, the washed waste water (the second liquid W2) is transported to the process waste gas washing device A. At this time, due to the flow through the process The gas of the exhaust gas washing device A still has a high concentration of the pollutant 101, so the washed second liquid W2 has a certain efficiency of removing the pollutant 101, and the once-used second liquid W2 can be switched through the liquid The valve 70A switches the use of the washing liquid supplied to the process waste gas washing device A to save the consumption of fresh absorption liquid (the first liquid), and also has the effect of efficiently removing the pollutant 101.

另外,請參閱第3C圖,其為本創作之又一實施例之結構示意圖,如圖所示,本實施例之氣體流動方向同於上述實施例,故不在此進行贅述;另外元件設置方式同於上述之實施例,故亦不在此進行贅述。In addition, please refer to Figure 3C, which is a schematic structural diagram of another embodiment of the creation. As shown in the figure, the gas flow direction of this embodiment is the same as that of the above embodiment, so it will not be repeated here; in addition, the component setting method is the same In the above-mentioned embodiment, it will not be repeated here.

本實施例中,透過該第一管路T1將該第一液體W1經由該液體輸送管路200’傳輸至該第一噴灑裝置30’,使該第一液體W1由上而下流經該第二過濾裝置20’,形成該第二液體W2後落入該液體儲存槽40’內,接著,再經由該第三管路T3透過該液體輸送管路200運輸至該第一噴灑裝置30,使該第二液體W2噴灑至該第一過濾裝置20進行再次利用,本實施例改良製程洗滌裝置將新鮮吸收液(該第一液體W1)供應直接導入於淋水出口(該第一噴灑裝置30’),以增加該氣體100之該污染物質101之去除效率,並且透過使用過之液體(該第二液體W2)作為洗滌該氣體之第一道之過濾過濾洗滌,有效提升去除該氣體100中該汙染物質101之效用。In this embodiment, the first liquid W1 is transferred to the first spraying device 30' through the liquid delivery pipeline 200' through the first pipeline T1, so that the first liquid W1 flows through the second spray device 30' from top to bottom. The filter device 20' forms the second liquid W2 and then falls into the liquid storage tank 40', and then is transported to the first spraying device 30 through the liquid delivery pipeline 200 through the third pipeline T3, so that the The second liquid W2 is sprayed to the first filter device 20 for reuse. The improved process washing device of this embodiment supplies fresh absorption liquid (the first liquid W1) directly into the spray outlet (the first spray device 30') , In order to increase the removal efficiency of the pollutants 101 of the gas 100, and by using the used liquid (the second liquid W2) as the first way of filtering and washing the gas, it can effectively improve the removal of the pollution in the gas 100 The utility of substance 101.

而以單一製程廢氣洗滌裝置為例(本創作之一實施例),在實驗中,環境只導入異丙酮(IPA)為主要VOC污染物,因此水中VOC可視為完全由IPA所組成,本實驗係量測該第一管路T1入水口及該第一噴灑裝置30之VOC濃度,本實驗中輸入之水量與噴灑之水量均為8.5(Liter/min)。Taking a single-process exhaust gas scrubbing device as an example (an embodiment of this creation), in the experiment, only isoacetone (IPA) was introduced as the main VOC pollutant in the environment. Therefore, the VOC in the water can be regarded as composed entirely of IPA. Measure the VOC concentration of the water inlet of the first pipeline T1 and the first spraying device 30. In this experiment, the input water volume and the sprayed water volume are both 8.5 (Liter/min).

實驗組:100%之第一液體直供該液體儲存槽去除VOC汙染物質之裝置,該第一管路T1直接提供100%之該第一液體W1進入該液體儲存槽40(內含該第二液體W2),該第一噴灑裝置30噴灑該第三液體W3(其係為該第一液體W1混合該第二液體W2形成)。Experimental group: 100% of the first liquid is directly supplied to the liquid storage tank to remove VOC pollutants. The first pipeline T1 directly supplies 100% of the first liquid W1 into the liquid storage tank 40 (containing the second Liquid W2), the first spray device 30 sprays the third liquid W3 (which is formed by mixing the first liquid W1 with the second liquid W2).

對照組:100%之第一液體直供該第一噴灑裝置去除VOC汙染物質之裝置,該第一管路T1直接提供100%之該第一液體W1於該第一噴灑裝置30,該第一噴灑裝置30噴灑該第一液體W1。Control group: 100% of the first liquid is directly supplied to the first spraying device to remove VOC pollutants, the first pipeline T1 directly provides 100% of the first liquid W1 to the first spraying device 30, the first The spray device 30 sprays the first liquid W1.

實驗組實驗結果如表1: 表1  100%之第一液體直供該液體儲存槽去除VOC汙染物質 第一管路(W1) 第一管路(W1) 第一噴灑裝置(W3) 第一噴灑裝置(W3) IPA IPA IPA 風量(m 3/min) 供水量(Liter/min) 水中TOC濃度(mg/L) 供水量(Liter/min) 水中VOC濃度(mg/L) 入口濃度(ppb) 出口濃度(ppb) 去除率(%) 38.5 8.5 0.3 8.5 2,665 8840 2450 72.3% 38.5 8.5 0.3 8.5 2,439 8210 2232 72.8% 38.5 8.5 0.3 8.5 2,854 7740 2350 69.6% The experimental results of the experimental group are shown in Table 1: Table 1 100% of the first liquid is directly supplied to the liquid storage tank to remove VOC pollutants The first line (W1) The first line (W1) The first spray device (W3) The first spray device (W3) IPA IPA IPA Air volume (m 3 /min) Water supply (Liter/min) TOC concentration in water (mg/L) Water supply (Liter/min) VOC concentration in water (mg/L) Inlet concentration (ppb) Export concentration (ppb) Removal rate (%) 38.5 8.5 0.3 8.5 2,665 8840 2450 72.3% 38.5 8.5 0.3 8.5 2,439 8210 2232 72.8% 38.5 8.5 0.3 8.5 2,854 7740 2350 69.6%

對照組實驗結果如表2: 表2  100%之第一液體直供該第一噴灑裝置去除VOC汙染物質 第一管路(W1) 第一管路(W1) 第一噴灑裝置(W1) 第一噴灑裝置(W1) IPA IPA IPA 風量(m3/min) 供水量(Liter/min) 水中TOC濃度(mg/L) 供水量(Liter/min) 水中VOC濃度(mg/L) 入口濃度(ppb) 出口濃度(ppb) 去除率(%) 38.5 8.5 0.3 8.5 0.3 8650 824 90.5% 38.5 8.5 0.3 8.5 0.4 7940 742 90.7% 38.5 8.5 0.3 8.5 0.4 8800 742 91.6% The experimental results of the control group are shown in Table 2: Table 2 100% of the first liquid is directly supplied to the first spray device to remove VOC pollutants The first line (W1) The first line (W1) The first spray device (W1) The first spray device (W1) IPA IPA IPA Air volume (m3/min) Water supply (Liter/min) TOC concentration in water (mg/L) Water supply (Liter/min) VOC concentration in water (mg/L) Inlet concentration (ppb) Export concentration (ppb) Removal rate (%) 38.5 8.5 0.3 8.5 0.3 8650 824 90.5% 38.5 8.5 0.3 8.5 0.4 7940 742 90.7% 38.5 8.5 0.3 8.5 0.4 8800 742 91.6%

由上述表1及表2之結果顯示,表1中100%之第一液體直供該液體儲存槽去除VOC汙染物質之平均去除率為71.6%,而表2中100%之第一液體直供該第一噴灑裝置去除VOC汙染物質之去除率之平均去除率為90.9%,因此在同等之該第一噴灑裝置之噴灑量下,因該第一液體W1中之既有污染物濃度較低,故可達更高之去除效率。The results in Table 1 and Table 2 above show that 100% of the first liquid in Table 1 is directly supplied to the liquid storage tank to remove VOC pollutants with an average removal rate of 71.6%, while 100% of the first liquid in Table 2 is directly supplied. The average removal rate of the first spraying device to remove VOC pollutants is 90.9%. Therefore, under the same spraying amount of the first spraying device, because the concentration of existing pollutants in the first liquid W1 is relatively low, Therefore, a higher removal efficiency can be achieved.

更進一步,若透過前後串聯之使用多數個製程廢氣洗滌裝置為例(本創作之另一實施例及又一實施例),在實驗中,環境只導入異丙酮(IPA)為主要VOC污染物,因此水中VOC可視為完全由IPA所組成,本實驗係量測該第一管路T1入水口及該第一噴灑裝置30之VOC濃度,本實驗中輸入之水量與噴灑之水量均為8.5(Liter/min)。Furthermore, if we use multiple process waste gas scrubbing devices in series before and after as an example (another embodiment and another embodiment of this creation), in the experiment, only isopropyl acetone (IPA) is introduced as the main VOC pollutant in the environment. Therefore, the VOC in the water can be regarded as composed entirely of IPA. This experiment measures the VOC concentration of the first pipe T1 inlet and the first spraying device 30. The input water volume and the sprayed water volume in this experiment are both 8.5 (Liter /min).

對照組:50%之第一液體W1供應該液體儲存槽去除VOC汙染物質之裝置,該第一管路T1直接提供50%之該第一液體W1進入該液體儲存槽40(內含該第二液體W2),該第一噴灑裝置30噴灑該第三液體W3(其係為該第一液體W1混合該第二液體W2形成)。Control group: 50% of the first liquid W1 is supplied to the liquid storage tank to remove VOC pollutants. The first pipe T1 directly supplies 50% of the first liquid W1 into the liquid storage tank 40 (containing the second Liquid W2), the first spray device 30 sprays the third liquid W3 (which is formed by mixing the first liquid W1 with the second liquid W2).

實驗組:50%之第一液體供應該第一噴灑裝置去除VOC汙染物質之裝置,該第一管路T1直接提供供水量之50%之該第一液體W1於該第一噴灑裝置;該第一噴灑裝置30噴灑100%之該第三液體W3(該第三液體W3係為50%該第一液體W1混合50%之該第二液體W2形成)。Experimental group: 50% of the first liquid is supplied to the first spraying device to remove VOC pollutants, the first pipeline T1 directly provides 50% of the first liquid W1 to the first spraying device; A spray device 30 sprays 100% of the third liquid W3 (the third liquid W3 is formed by mixing 50% of the first liquid W1 with 50% of the second liquid W2).

實驗組實驗結果如表3: 表3  50%之第一液體直供該液體儲存槽去除VOC汙染物質 第一管路(W1) 第一管路(W1) 第一噴灑裝置(W3) 第一噴灑裝置(W3) IPA IPA IPA 風量(m 3/min) 供水量(Liter/min) 水中TOC濃度(mg/L) 供水量(Liter/min) 水中VOC濃度(mg/L) 入口濃度(ppb) 出口濃度(ppb) 去除率(%) 38.5 4.1 0.2 8.5 5,910 8260 4525 45.2% 38.5 4.1 0.2 8.5 6,210 8420 5020 40.4% 38.5 4.1 0.2 8.5 6,450 8640 5250 39.2% The experimental results of the experimental group are shown in Table 3: Table 3 50% of the first liquid is directly supplied to the liquid storage tank to remove VOC pollutants The first line (W1) The first line (W1) The first spray device (W3) The first spray device (W3) IPA IPA IPA Air volume (m 3 /min) Water supply (Liter/min) TOC concentration in water (mg/L) Water supply (Liter/min) VOC concentration in water (mg/L) Inlet concentration (ppb) Export concentration (ppb) Removal rate (%) 38.5 4.1 0.2 8.5 5,910 8260 4525 45.2% 38.5 4.1 0.2 8.5 6,210 8420 5020 40.4% 38.5 4.1 0.2 8.5 6,450 8640 5250 39.2%

對照組實驗結果如表4: 表4  50%之第一液體供應該第一噴灑裝置去除VOC汙染物質 第一管路(W1) 第一管路(W1) 第一噴灑裝置(W3) 第一噴灑裝置(W3) IPA IPA IPA 風量(m 3/min) 供水量(Liter/min) 水中TOC濃度(mg/L) 供水量(Liter/min) 水中TOC濃度(mg/L) 入口濃度(ppb) 出口濃度(ppb) 去除率(%) 38.5 4.1 0.2 8.5 2,791 8540 2560 70.0% 38.5 4.1 0.2 8.5 2,475 8290 2750 66.8% 38.5 4.1 0.2 8.5 2,770 7650 2470 67.7% The experimental results of the control group are shown in Table 4: Table 4 50% of the first liquid is supplied to the first spray device to remove VOC pollutants The first line (W1) The first line (W1) The first spray device (W3) The first spray device (W3) IPA IPA IPA Air volume (m 3 /min) Water supply (Liter/min) TOC concentration in water (mg/L) Water supply (Liter/min) TOC concentration in water (mg/L) Inlet concentration (ppb) Export concentration (ppb) Removal rate (%) 38.5 4.1 0.2 8.5 2,791 8540 2560 70.0% 38.5 4.1 0.2 8.5 2,475 8290 2750 66.8% 38.5 4.1 0.2 8.5 2,770 7650 2470 67.7%

由上述表3及表4之結果顯示,表3中50%之第一液體直供該液體儲存槽去除VOC汙染物質之平均去除率為41.6%,而表4中50%之第一液體供應該第一噴灑裝置去除VOC汙染物質之去除率之平均去除率為68.2%,因此在同等之該第一噴灑裝置之噴灑量下,可達更高之該汙染物質101之去除效率。The results in Table 3 and Table 4 above show that 50% of the first liquid in Table 3 is directly supplied to the liquid storage tank to remove VOC pollutants with an average removal rate of 41.6%, and 50% of the first liquid in Table 4 is supplied to the liquid storage tank. The average removal rate of the first spraying device to remove VOC pollutants is 68.2%. Therefore, with the same spraying amount of the first spraying device, a higher removal efficiency of the pollutant 101 can be achieved.

以上所述之實施例,本創作係為一種製程廢氣洗滌裝置,其係利用第一過濾裝置過濾氣體,並透過該第一管路、該第二管路以及該第三管路使用該第一液體切換閥切換所提供之第一液體或第三液體,使第一噴灑裝置噴灑第一液體或第三液體洗滌氣體,使氣體內之汙染物質被第一液體及或第三液體吸收,並且更進一步利用第一管路、第二管路以及第三管路切換第一液體或/及第二液體供應方式,提升進氣通道中污染物的去除效率,且透過第一液體或第二液體連續洗滌氣體中之污染物質,亦可減少已溶解於液體中之污染物質再次逸散,有效達到提升去除汙染物質效率之功效。In the above-mentioned embodiment, this creation is a process waste gas washing device, which uses a first filter device to filter the gas, and uses the first pipe through the first pipe, the second pipe, and the third pipe. The liquid switching valve switches the provided first liquid or third liquid, so that the first spray device sprays the first liquid or the third liquid scrubbing gas, so that the pollutants in the gas are absorbed by the first liquid and or the third liquid, and more Further use the first pipeline, the second pipeline, and the third pipeline to switch the first liquid or/and the second liquid supply mode to improve the removal efficiency of pollutants in the air inlet channel, and continuously pass the first liquid or the second liquid The pollutants in the scrubbing gas can also reduce the re-escaping of pollutants that have been dissolved in the liquid, effectively improving the efficiency of removing pollutants.

故本創作實為一具有新穎性、進步性及可供產業上利用者,應符合我國專利法專利申請要件無疑,爰依法提出新型專利申請,祈鈞局早日賜准專利,至感為禱。Therefore, this creation is really novel, progressive, and available for industrial use. It should meet the patent application requirements of my country's patent law. Undoubtedly, Yan filed a new patent application in accordance with the law. I pray that the Bureau will grant the patent as soon as possible.

惟以上所述者,僅為本創作之較佳實施例而已,並非用來限定本創作實施之範圍,舉凡依本創作申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本創作之申請專利範圍內。However, the above are only the preferred embodiments of this creation, and are not used to limit the scope of implementation of this creation. For example, the equivalent changes and modifications of the shape, structure, characteristics and spirit described in the scope of the patent application for this creation are made. , Should be included in the scope of patent application for this creation.

10:腔體 100:氣體 101:汙染物質 12:進氣口 120:進氣通道 120A:進氣通道 130:氣體通道 130A:氣體通道 14:出氣口 14A:出氣口 20:第一過濾裝置 20A:第一過濾裝置 20’:第二過濾裝置 20A’:第二過濾裝置 22:殼體 222:過濾進氣口 222’:過濾進氣口 222A’:過濾進氣口 222A’:過濾進氣口 224:過濾出氣口 224’:過濾出氣口 224A’:過濾出氣口 224A’:過濾出氣口 24:第一多孔元件 241:第一觸媒材料 26:離子吸附元件 262:氣體通道 28:第二多孔元件 281:第二觸媒材料 30:第一噴灑裝置 30A:第一噴灑裝置 30’:第二噴灑裝置 30A’:第二噴灑裝置 40:液體儲存槽 40A:液體儲存槽 40’:液體儲存槽 40A’:液體儲存槽 50:抽取裝置 50’:抽取裝置 70:液體切換閥 70A:液體切換閥 70B:液體切換閥 90:排水裝置 90’:排水裝置 200:液體運輸管路 200’:液體運輸管路 A:製程廢氣洗滌裝置 B:製程廢氣洗滌裝置 T1:第一管路 T2:第二管路 T2’:第二管路 T3:第三管路 W1:第一液體 W2:第二液體 W3:第三液體 P:間距 θ:角度 10: Cavity 100: gas 101: Pollutants 12: Air inlet 120: intake channel 120A: intake channel 130: gas channel 130A: Gas channel 14: air outlet 14A: Air outlet 20: The first filter device 20A: The first filter device 20’: The second filtering device 20A’: The second filtering device 22: shell 222: filter air inlet 222’: Filtered air inlet 222A’: Filtered air inlet 222A’: Filtered air inlet 224: Filter outlet 224’: Filter outlet 224A’: Filter outlet 224A’: Filter outlet 24: The first porous element 241: The first catalyst material 26: Ion adsorption element 262: Gas Channel 28: second porous element 281: The second catalyst material 30: The first spraying device 30A: The first spraying device 30’: Second spraying device 30A’: Second spraying device 40: Liquid storage tank 40A: Liquid storage tank 40’: Liquid storage tank 40A’: Liquid storage tank 50: extraction device 50’: Extraction device 70: Liquid switching valve 70A: Liquid switching valve 70B: Liquid switching valve 90: Drainage device 90’: Drainage device 200: Liquid transport pipeline 200’: Liquid transport pipeline A: Process waste gas washing device B: Process waste gas washing device T1: The first pipeline T2: second pipeline T2’: Second pipeline T3: third pipeline W1: the first liquid W2: second liquid W3: third liquid P: Pitch θ: Angle

第1A圖:其為本創作之習知之裝置示意圖; 第1B圖:其為本創作之一實施例之裝置示意圖; 第2圖:其為本創作之一實施例之離子吸附元件之結構放大示意圖; 第3A圖:其為本創作之習知之結構示意圖; 第3B圖:其為本創作之一另一實施例之結構示意圖;以及 第3C圖:其為本創作之又一實施例之結構示意圖。 Figure 1A: It is a schematic diagram of the device of the original creation; Figure 1B: It is a schematic diagram of the device of an embodiment of the creation; Figure 2: It is an enlarged schematic diagram of the structure of the ion adsorption element of an embodiment of the creation; Figure 3A: It is a schematic diagram of the structure of the habit of this creation; Figure 3B: It is a schematic structural diagram of another embodiment of this creation; and Figure 3C: It is a schematic structural diagram of another embodiment of the creation.

10:腔體 10: Cavity

100:氣體 100: gas

101:汙染物質 101: Pollutants

12:進氣口 12: Air inlet

14:出氣口 14: air outlet

20:第一過濾裝置 20: The first filter device

22:殼體 22: shell

222:過濾進氣口 222: filter air inlet

224:過濾出氣口 224: Filter outlet

24:第一多孔元件 24: The first porous element

241:第一觸媒材料 241: The first catalyst material

26:離子吸附元件 26: Ion adsorption element

28:第二多孔元件 28: second porous element

281:第二觸媒材料 281: The second catalyst material

30:第一噴灑裝置 30: The first spraying device

40:液體儲存槽 40: Liquid storage tank

50:抽取裝置 50: extraction device

70:液體切換閥 70: Liquid switching valve

90:排水裝置 90: Drainage device

120:進氣通道 120: intake channel

200:液體運輸管路 200: Liquid transport pipeline

T1:第一管路 T1: The first pipeline

T3:第三管路 T3: third pipeline

Claims (9)

一種製程廢氣洗滌裝置,其係設置於一腔體內,該腔體兩側分別設有一進氣口及一出氣口,其包含:一第一過濾裝置,其係設置於該腔體內,並位於該進氣口之一側,該殼體係上方及下方分別設有一過濾進氣口及一過濾出氣口;以及一第一噴灑裝置,其係設置該腔體內,並位於該第一過濾裝置上;一第一管路,其一端連通一第一液體切換閥,該第一管路係用以運輸一第一液體經由一液體運輸管路進入該第一噴灑裝置,使該第一噴灑裝置噴灑該第一液體於該第一過濾裝置;其中,一進氣通道兩端分別連通該進氣口及該過濾進氣口,一氣體經由該進氣口進入該進氣通道,並且該氣體通過該過濾進氣口後進入該第一過濾裝置,再者,該第一液體連續進入該出氣口並向下流經該第一過濾裝置,該氣體經該第一液體洗滌後,由該過濾出氣口流出並經由該出氣口排出該腔體。 A process waste gas scrubbing device is arranged in a cavity. An air inlet and an air outlet are respectively provided on both sides of the cavity. The device includes: a first filter device arranged in the cavity and located in the cavity. On one side of the air inlet, a filtering air inlet and a filtering air outlet are respectively provided above and below the shell system; and a first spraying device which is arranged in the cavity and located on the first filtering device; A first pipeline, one end of which is connected to a first liquid switching valve, and the first pipeline is used to transport a first liquid into the first spraying device via a liquid transport pipeline, so that the first spraying device sprays the first spraying device A liquid is in the first filter device; wherein, both ends of an air inlet channel are respectively connected to the air inlet and the filter air inlet, a gas enters the air inlet channel through the air inlet, and the gas enters through the filter After the gas port enters the first filter device, the first liquid continuously enters the gas outlet and flows downward through the first filter device. After the gas is washed by the first liquid, it flows out from the filtered gas outlet and passes through The air outlet exits the cavity. 如請求項1所述之製程廢氣洗滌裝置,其中該第一過濾裝置係包含一殼體、一第一多孔元件及一離子吸附元件,該第一多孔元件係設置於該殼體內,位於該過濾進氣口之一側,該第一多孔元件上設置一第一觸媒材料,該離子吸附元件係設置於該第一多孔元件與該過濾出氣口之間。 The process waste gas scrubbing device according to claim 1, wherein the first filter device includes a housing, a first porous element, and an ion adsorption element, and the first porous element is disposed in the housing and is located On one side of the filtering air inlet, a first catalyst material is arranged on the first porous element, and the ion adsorbing element is arranged between the first porous element and the filtering air outlet. 如請求項2所述之製程廢氣洗滌裝置,其中該第一過濾裝置更包含一第二多孔元件,其設置於該離子吸附元件與該過濾出氣口之間,該第二多孔元件上設置有一第二觸媒材料。 The process waste gas scrubbing device according to claim 2, wherein the first filter device further includes a second porous element disposed between the ion adsorption element and the filtering air outlet, and the second porous element is disposed There is a second catalyst material. 如請求項1所述之製程廢氣洗滌裝置,更包含一液體儲存槽,該液體儲存槽係設置於該第一過濾裝置之下方,該進氣通道位於該液體儲存槽及該第一過濾裝置之間,進一步,該液體儲存槽下方設置一排水裝置,該排水裝置係用以排出該第一液體。 The process exhaust gas washing device according to claim 1, further comprising a liquid storage tank, the liquid storage tank is arranged below the first filter device, and the air inlet channel is located between the liquid storage tank and the first filter device Furthermore, a drainage device is arranged under the liquid storage tank, and the drainage device is used for draining the first liquid. 如請求項4所述之製程廢氣洗滌裝置,更包含一抽取裝置,其係設置於該第一噴灑裝置及該液體儲存槽之間,並位於該液體運輸管路上。 The process waste gas scrubbing device described in claim 4 further includes an extraction device, which is arranged between the first spray device and the liquid storage tank, and is located on the liquid transportation pipeline. 如請求項1所述之製程廢氣洗滌裝置,其中該進氣通道設於該第一過濾裝置之一側,且自該進氣口向下延伸並連通至該過濾進氣口。 The process exhaust gas washing device according to claim 1, wherein the air inlet passage is provided on one side of the first filter device, and extends downward from the air inlet and communicates with the filter air inlet. 如請求項1所述之製程廢氣洗滌裝置,其中該腔體內更包含一第二過濾裝置,該第一過濾裝置一氣體通道一端連通該第一過濾裝置之該過濾出氣口,該氣體通道另一端連通第二過濾裝置之一過濾進氣口,該氣體通道係用以使該氣體由該第一過濾裝置流入該第二過濾裝置。 The process waste gas scrubbing device according to claim 1, wherein the cavity further contains a second filter device, one end of a gas channel of the first filter device is connected to the filtered air outlet of the first filter device, and the other end of the gas channel It is connected to a filter air inlet of the second filter device, and the gas channel is used for allowing the gas to flow from the first filter device into the second filter device. 如請求項7所述之製程廢氣洗滌裝置,更包含一第三管路,其兩端分別連接於該第一過濾裝置及該第二過濾裝置,該第三管路兩端各設有該第一液體切換閥,其係用於切換該第一液體及該第二液體,亦用於混合該第一液體及該第二液體進行洗滌。 The process waste gas scrubbing device according to claim 7, further comprising a third pipeline, the two ends of which are respectively connected to the first filter device and the second filter device, and the third pipeline is provided with the second A liquid switching valve is used to switch the first liquid and the second liquid, and is also used to mix the first liquid and the second liquid for washing. 如請求項8所述之製程廢氣洗滌裝置,該第一及第二過濾裝置,設有一第一管路提供第一液體,此第一液體先經由第二噴灑裝置供應於第二過濾裝置後流入液體儲存槽,再經由第三管路供應至第一噴灑裝置,供應於第一過濾裝置,做為二次洗滌使用。 According to the process exhaust gas washing device described in claim 8, the first and second filter devices are provided with a first pipeline to supply the first liquid, and the first liquid is first supplied to the second filter device through the second spray device and then flows into The liquid storage tank is then supplied to the first spraying device through the third pipeline, and supplied to the first filtering device for secondary washing.
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TWI745201B (en) * 2020-12-25 2021-11-01 奇鼎科技股份有限公司 Process waste gas washing device

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Publication number Priority date Publication date Assignee Title
TWI745201B (en) * 2020-12-25 2021-11-01 奇鼎科技股份有限公司 Process waste gas washing device

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