TWM596459U - Flexible circuit board having rough solder resist layer and manufacturing method thereof - Google Patents

Flexible circuit board having rough solder resist layer and manufacturing method thereof Download PDF

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Publication number
TWM596459U
TWM596459U TW108209543U TW108209543U TWM596459U TW M596459 U TWM596459 U TW M596459U TW 108209543 U TW108209543 U TW 108209543U TW 108209543 U TW108209543 U TW 108209543U TW M596459 U TWM596459 U TW M596459U
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Taiwan
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layer
tin layer
tin
flexible circuit
solder mask
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TW108209543U
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Chinese (zh)
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魏兆璟
龐規浩
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頎邦科技股份有限公司
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Publication of TWM596459U publication Critical patent/TWM596459U/en

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Abstract

The invention provides a flexible circuit board for carrying a chip. The flexible circuit board comprises: a conductive copper layer having a wiring pattern on an insulating substrate; a first tin layer on the conductive copper layer; a first solder resist layer covering the conductive copper layer not covered by the first tin layer and the second tin layer, and the first solder resist layer partially covering the second tin layer; and a second solder resist layer partially covering the second tin later and at least partially covering the first solder resist layer, wherein the second solder resist layer is formed with a rough surface.

Description

具有粗化防焊層的軟質線路基板 Soft circuit board with rough solder mask

本創作係有關於軟質線路基板,特別關於可承載半導體晶片的軟質線路基版。 This creation is about soft circuit substrates, especially about soft circuit substrates that can carry semiconductor chips.

承載晶片用的軟質線路基板多為捲軸狀薄膜。在業界軟質線路基板與晶片的結合依不同裝配模式有各種稱呼,例如TCP(Tape Carrier Package捲帶式載體封裝)或COF(Chip On Film薄膜覆晶封裝)。TCP及COF都是運用軟質線路基板作為封裝晶片的載體,透過熱壓合將晶片上的金凸塊(Gold Bump)與位在軟性基板電路上之銅配線圖案的內引腳(Inner Lead)接合。 Most of the flexible circuit substrates for carrying wafers are reel-shaped films. The combination of flexible circuit substrates and wafers in the industry has various names according to different assembly modes, such as TCP (Tape Carrier Package) or COF (Chip On Film). Both TCP and COF use a flexible circuit substrate as a carrier for packaging the chip, and the gold bump on the chip is bonded to the inner lead of the copper wiring pattern on the flexible substrate circuit by thermocompression bonding .

為了使軟性基板電路與晶片之金凸塊連接,必須要有金錫共晶物的存在,其中金由晶片之金凸塊提供,錫就由形成在內引腳表面的錫供應,因此,內引腳的表面鍍有錫層。除了內引腳外,銅配線圖案還有外引腳等與其他電子元件連接的導電端子,這些端子也有鍍錫層。銅配線圖案上沒有鍍錫層的部分會另以防焊油墨覆蓋來加以保護。 In order to connect the flexible substrate circuit to the gold bumps of the chip, there must be the presence of gold-tin eutectics, where gold is provided by the gold bumps of the chip, and tin is supplied by the tin formed on the surface of the inner pin. The surface of the pin is plated with tin. In addition to the inner leads, the copper wiring pattern also has conductive terminals such as outer leads connected to other electronic components, and these terminals also have a tinned layer. The part of the copper wiring pattern that does not have a tinned layer will be covered with solder resist ink to protect it.

習知之軟性基板電路易產生以下問題,其一為鍍錫層表面形成晶鬚,導致相鄰線路短路;其二為防焊油墨及鍍錫層的界面產生凹洞,導致線路斷裂。專利文獻1(日本專利JP3061613)揭示的方案是在銅配線圖案 上先全面地形成薄鍍錫層(a),然後於配線圖案之非引腳區塗佈防焊油墨,之後再於引腳區形成厚鍍錫層(b)。專利文獻1認為銅配線圖案全面形成的薄鍍錫層(a)可防止凹洞產生,厚鍍錫層(b)可防止產生晶鬚。專利文獻2(台灣專利TW531864)揭示另一種方法,係依序形成第一防焊油墨於非引腳區、形成薄鍍錫層於引腳區、再形成第二防焊油墨覆蓋第一防焊油墨及薄錫層之交界處、及最後形成厚鍍錫層於薄錫層上。 The conventional flexible substrate circuit is susceptible to the following problems. One is the formation of whiskers on the surface of the tinned layer, which leads to short circuit of the adjacent circuit; the other is that the interface between the solder resist ink and the tinned layer creates a hole, which causes the circuit to break. Patent Document 1 (Japanese Patent JP3061613) discloses a scheme in which copper wiring patterns First, a thin tin plating layer (a) is formed in an all-round way, and then solder resist ink is coated on the non-lead area of the wiring pattern, and then a thick tin plating layer (b) is formed on the lead area. Patent Document 1 considers that a thin tin-plated layer (a) formed with copper wiring patterns all over can prevent the occurrence of pits, and a thick tin-plated layer (b) can prevent the generation of whiskers. Patent Document 2 (Taiwan Patent TW531864) discloses another method of sequentially forming a first solder resist ink in the non-lead area, forming a thin tinned layer on the lead area, and then forming a second solder resist ink to cover the first solder resist The junction of ink and thin tin layer, and finally a thick tin plating layer is formed on the thin tin layer.

本案發明人經研究後發現上述習知技術在實務上仍存在許多問題。舉例而言,專利文獻1於銅配線圖案全面形成的薄鍍錫層,此對需要彎折的產品是不利的,因為鍍錫層的硬度通常偏高。再者,不論是專利文獻1或專利文獻2皆教示在最後塗佈防焊油墨之後形成厚鍍錫層,因此頂層的防焊油墨仍會浸泡在鍍錫槽中一段時間,特別是鍍厚錫的時間又較長,這使得頂層防焊油墨與厚鍍錫層的界面產生凹洞的機會增加。此外,專利文獻2有兩次施作防焊油墨後才進錫槽的製程,造成清洗被防焊油墨汙染錫槽的高成本。又,專利文獻2所教示兩次防焊油墨兩次鍍錫交錯實施製程,其實務上易混淆,造成生產動線安排的困擾。此外,本案發明人更發現,習知塗佈兩次防焊油墨的作法,在實務上容易造成防焊油墨產生肥厚的邊緣。當COF的外引腳要與顯示器導電玻璃基板壓接時,容易受到防焊油墨肥厚邊緣的影響而產生壓接不良。 After investigation, the inventor of the present case found that the above-mentioned conventional technology still has many problems in practice. For example, Patent Document 1 has a thin tin plating layer formed on the entire copper wiring pattern, which is unfavorable for products that need to be bent, because the hardness of the tin plating layer is usually high. Furthermore, both Patent Document 1 and Patent Document 2 teach that a thick tinned layer is formed after the last application of solder resist ink, so the solder resist ink on the top layer will still be immersed in the tin plating tank for a period of time, especially thick tin plating The time is longer, which increases the chance that the interface between the top solder resist ink and the thick tin plating layer will have pits. In addition, Patent Document 2 has two processes of applying solder resist ink before entering the tin bath, resulting in a high cost of cleaning the tin bath contaminated with solder resist ink. In addition, Patent Document 2 teaches that two solder resist inks and two tin plating are staggered to implement the process, which is actually confusing in practice and causes troubles in the production line arrangement. In addition, the inventor of the present invention has further found that the practice of applying the solder resist ink twice in practice is prone to cause the solder resist ink to have thick edges in practice. When the outer leads of the COF are to be crimped with the conductive glass substrate of the display, they are easily affected by the thick edges of the solder resist ink and cause poor crimping.

有鑑於上述,於一方面,本創作提出一種新穎的軟質線路基板之製造方法,無兩次防焊油墨兩次鍍錫交錯實施製程。本創作也在最後錫層完成後塗佈頂層防焊油墨,以免頂層防焊油墨浸泡在鍍錫槽中。同時本創作也進一步粗化防焊層以降低外引腳與防焊層的高度差,改善壓接不良的現象。 In view of the above, on the one hand, this creation proposes a novel method for manufacturing a flexible circuit substrate, without two solder resist inks and two tin plating staggered implementation processes. This creation also applies the top solder resist ink after the final tin layer is completed, so as not to immerse the top solder resist ink in the tin plating bath. At the same time, this creation also further coarsened the solder mask to reduce the height difference between the outer leads and the solder mask, and improved the phenomenon of poor crimping.

依據一實施例,本創作提供一種用於承載晶片之軟質線路基 板的製造方法,依序包含以下步驟:(a)提供具有配線圖案的一導電銅層於一絕緣基材上;(b)形成一第一防焊層部分地覆蓋該配線圖案;(c)以該第一防焊層為遮罩形成一第一錫層於該導電銅層上;(d)以該第一防焊層為遮罩形成一第二錫層於該第一錫層上;及(e)形成一第二防焊層部分地覆蓋該第二錫層及至少部分地覆蓋該第一防焊層;及(f)粗化該第二防焊層以使該第二防焊層具有一粗化表面。 According to an embodiment, the present invention provides a flexible circuit base for carrying chips The manufacturing method of the board includes the following steps in sequence: (a) providing a conductive copper layer with a wiring pattern on an insulating substrate; (b) forming a first solder mask to partially cover the wiring pattern; (c) Forming a first tin layer on the conductive copper layer using the first solder mask as a mask; (d) forming a second tin layer on the first tin layer using the first solder mask as a mask; And (e) forming a second solder mask to partially cover the second tin layer and at least partially covering the first solder mask; and (f) roughening the second solder mask to make the second solder mask The layer has a roughened surface.

依據一實施例,本創作提供如前述之製造方法,其中該步驟(c)及該步驟(d)之間沒有形成防焊層的步驟。 According to an embodiment, the present invention provides the manufacturing method as described above, wherein there is no step of forming a solder mask layer between step (c) and step (d).

依據一實施例,本創作提供如前述之製造方法,其中經由該步驟(d)使得該第一防焊層至少部分地覆蓋該第二錫層。 According to an embodiment, the present invention provides the manufacturing method as described above, wherein the first solder mask layer is at least partially covered with the second tin layer through the step (d).

依據一實施例,本創作提供如前述之製造方法,其中經由該步驟(d)使得該第一錫層與該第二錫層之界面共形於該第一錫層與該導電銅層的界面。 According to an embodiment, the present invention provides the manufacturing method as described above, wherein through the step (d), the interface between the first tin layer and the second tin layer is conformal to the interface between the first tin layer and the conductive copper layer .

依據一實施例,本創作提供如前述之製造方法,其中該第二防焊層未與鍍錫液接觸。 According to an embodiment, the present invention provides the manufacturing method as described above, wherein the second solder resist layer is not in contact with the tin plating solution.

於另一方面,本創作提供一種軟質線路基板的製造方法,係縮小第一防焊層或第二防焊層的塗佈面積以降低防焊油墨對錫槽的污染量。舉例而言,第一防焊層可選擇性地只塗佈軟質線路基板於產品應用端時會彎折的區域;或第二防焊層可選擇性地覆蓋住第一防焊層的外緣,而不需要將第一防焊層完全覆蓋。 On the other hand, the present invention provides a method for manufacturing a flexible circuit board, which reduces the coating area of the first solder mask layer or the second solder mask layer to reduce the amount of solder mask contamination on the tin bath. For example, the first solder mask layer can selectively coat only the areas where the flexible circuit substrate bends at the product application end; or the second solder mask layer can selectively cover the outer edge of the first solder mask layer Without completely covering the first solder mask.

依據一實施例,本創作提供一種用於承載晶片之軟質線路基板的製造方法,依序包含以下步驟:(a)提供具有配線圖案的一導電銅層於一絕緣基材上,其中該配線圖案具有一測試引腳區,一內引腳區及一外引腳區,; (b)形成一第一防焊層部分地覆蓋該配線圖案,該第一防焊層未覆蓋介於該測試引腳區與該內引腳區之間的配線圖案;(c)以該第一防焊層為遮罩形成一第一錫層於該導電銅層上;(d)以該第一防焊層為遮罩形成一第二錫層於該第一錫層上;(e)形成一第二防焊層部分地覆蓋該第二錫層及至少部分地覆蓋該第一防焊層;及(f)粗化該第二防焊層以使該第二防焊層具有一粗化表面。 According to an embodiment, the present invention provides a method for manufacturing a flexible circuit substrate for carrying a chip, including the following steps in sequence: (a) providing a conductive copper layer with a wiring pattern on an insulating substrate, wherein the wiring pattern It has a test pin area, an inner pin area and an outer pin area, (b) forming a first solder mask to partially cover the wiring pattern, the first solder mask does not cover the wiring pattern between the test pin area and the inner pin area; (c) with the first A solder mask is formed as a mask to form a first tin layer on the conductive copper layer; (d) A second solder layer is formed on the first tin layer using the first solder mask as a mask; (e) Forming a second solder mask to partially cover the second tin layer and at least partially to cover the first solder mask; and (f) roughening the second solder mask so that the second solder mask has a roughness化面。 Surface.

依據一實施例,本創作提供如前述之製造方法,其中於該步驟(e)該第二防焊層未完全覆蓋該第一防焊層。 According to an embodiment, the present invention provides the aforementioned manufacturing method, wherein in the step (e) the second solder mask layer does not completely cover the first solder mask layer.

於更另一方面本創作更包含藉由上述之各種方法所形成之軟質線路基板的各種結構。 On the other hand, the creation further includes various structures of the flexible circuit substrate formed by the above-mentioned methods.

10:軟質線路基板半成品 10: Semi-finished flexible circuit board

100:絕緣基材 100: insulating substrate

101:傳動孔 101: Transmission hole

110:導電銅層 110: conductive copper layer

P:配線圖案 P: Wiring pattern

1B:箭頭 1B: Arrow

Lo:外引腳區 Lo: outer pin area

Ps:非引腳區 Ps: non-pin area

Ln:內引腳區 Ln: inner pin area

Lt:測試引腳區 Lt: test pin area

121:第一防焊層 121: The first solder mask

121a:第一邊緣 121a: the first edge

131:第一錫層 131: The first tin layer

131a:第一側邊 131a: first side

131a’:第一縱向界面 131a’: the first vertical interface

Iss:界面 Iss: interface

Isc:界面 Isc: interface

132:第二錫層 132: Second tin layer

122:第二防焊層 122: Second solder mask

122’:第二防焊層 122’: Second solder mask

122a:第二邊緣 122a: second edge

132a:第二側邊 132a: second side

132a’:第二縱向界面 132a’: Second vertical interface

X:橫向距離 X: horizontal distance

Y:橫向距離 Y: horizontal distance

161:錫層 161: Tin layer

161a:縱向界面 161a: Portrait interface

162:防焊層 162: Solder mask

162a:邊緣 162a: edge

163:露出部分 163: Exposed part

Z:橫向距離 Z: lateral distance

圖1A為本創作依據一實施例之軟質線路基板半成品俯視示意圖。 FIG. 1A is a schematic top view of a semi-finished flexible circuit board according to an embodiment of the invention.

圖1B為圖1A之半成品中某特定區域之剖面示意圖。 FIG. 1B is a schematic cross-sectional view of a specific area in the semi-finished product of FIG. 1A.

圖2至圖6顯示本創作依據一實施例之軟質線路基板製造過程各步驟剖面示意圖。 2 to 6 are schematic cross-sectional views of the steps of the manufacturing process of the flexible circuit substrate according to an embodiment of the present invention.

圖7為本創作依據一實施例之軟質線路基板的結構示意圖。 FIG. 7 is a schematic structural diagram of a flexible circuit substrate created according to an embodiment.

以下將參考所附圖式示範本創作之較佳實施例。為避免模糊本創作之內容,以下說明亦省略習知之元件、相關材料、及其相關處理技術。同時,為清楚說明本創作,所附圖式中各元件未必按實際的尺寸或相對比例繪製。 The preferred embodiments of the present invention will be demonstrated below with reference to the attached drawings. In order to avoid obscuring the content of this creation, the following description also omits conventional components, related materials, and related processing technologies. At the same time, in order to clearly illustrate the creation, the elements in the drawings are not necessarily drawn according to actual size or relative proportion.

本創作軟質線路基板的製造方法Manufacturing method of original soft circuit board

依據第一實施例本創作之用於承載晶片之軟質線路基板的製造方法,依序包含:步驟(a)提供具有配線圖案的一導電銅層於一絕緣基材上;步驟(b)形成一第一防焊層部分地覆蓋該配線圖案;步驟(c)以該第一防焊層為遮罩形成一第一錫層於該導電銅層上;步驟(d)以該第一防焊層為遮罩形成一第二錫層於該第一錫層上;步驟(e)形成一第二防焊層部分地覆蓋該第二錫層及至少部分地覆蓋該第一防焊層;及步驟(f)粗化該第二防焊層以使該第二防焊層具有一粗化表面。 According to the first embodiment, the method for manufacturing a flexible circuit substrate for carrying a chip includes: step (a) providing a conductive copper layer with a wiring pattern on an insulating substrate; step (b) forming a The first solder mask layer partially covers the wiring pattern; step (c) forms a first tin layer on the conductive copper layer using the first solder mask layer as a mask; step (d) uses the first solder mask layer Forming a second tin layer on the first tin layer for the mask; step (e) forming a second solder resist layer partially covering the second tin layer and at least partially covering the first solder resist layer; and steps (f) Roughening the second solder resist layer so that the second solder resist layer has a roughened surface.

步驟(a)提供具有配線圖案的一導電銅層於一絕緣基材上。Step (a) provides a conductive copper layer with wiring patterns on an insulating substrate.

圖1A為本創作之軟質線路基板半成品10俯視示意圖。參考圖1A,軟質線路基板半成品10之薄膜帶狀的絕緣基材100之一面上連續地形成有複數個由導電銅層110構成的配線圖案P。絕緣基材100的上下兩側具有移送用的多個傳動孔101。導電銅層110(或配線圖案P)定義一非引腳區Ps(以虛線框起來的部分),此區域將於後續由防焊層所覆蓋以保護線路。配線圖案P之非引腳區Ps以外的區域即引腳區,可再區分成內引腳區Ln、外引腳區Lo及視需要存在的測試引腳區Lt,內引腳區Ln將與晶片相接,外引腳區Lo將外接電路板或其他電子裝置,測試引腳區Lt則用於與量測儀器相接,以檢測封裝晶片的品質。圖1B為圖1A中箭頭1B所指之處(即配線圖案P其中一條線路)的剖面示意圖。參考圖1B,可清楚了解導電銅層110位於絕緣基材100上。絕緣基材100可使用軟性且具有耐藥品性及耐熱性的材料,例如聚酯、聚醯胺、聚醯亞胺等。絕緣基材100的厚度一般為12至85μm,較佳為20至50μm。在絕緣基材100上形成具配線圖案P的導電銅層110是藉由習知的微影法。導電銅層110的厚度例如2至20μm,較佳為5至12μm。 FIG. 1A is a schematic top view of a semi-finished flexible circuit board 10 created in this invention. Referring to FIG. 1A, a plurality of wiring patterns P composed of a conductive copper layer 110 are continuously formed on one surface of a thin-film strip-shaped insulating base material 100 of a semi-finished flexible circuit board 10. The insulating base material 100 has a plurality of transmission holes 101 for transfer on the upper and lower sides. The conductive copper layer 110 (or the wiring pattern P) defines a non-lead area Ps (the portion framed by the dotted line), which will be covered by the solder mask layer later to protect the circuit. The area other than the non-pin area Ps of the wiring pattern P is the pin area, which can be further divided into the inner pin area Ln, the outer pin area Lo, and the test pin area Lt as needed. The inner pin area Ln will be The chips are connected, the outer pin area Lo will be connected to a circuit board or other electronic devices, and the test pin area Lt is used to connect with a measuring instrument to detect the quality of the packaged chip. FIG. 1B is a schematic cross-sectional view of the place indicated by the arrow 1B in FIG. 1A (that is, one line of the wiring pattern P). Referring to FIG. 1B, it can be clearly understood that the conductive copper layer 110 is located on the insulating substrate 100. For the insulating base material 100, a material that is soft and has chemical resistance and heat resistance, such as polyester, polyamide, polyimide, or the like, can be used. The thickness of the insulating substrate 100 is generally 12 to 85 μm, preferably 20 to 50 μm. The formation of the conductive copper layer 110 with the wiring pattern P on the insulating substrate 100 is by a conventional lithography method. The thickness of the conductive copper layer 110 is, for example, 2 to 20 μm, preferably 5 to 12 μm.

步驟(b)形成一第一防焊層部分地覆蓋該配線圖案。Step (b): Form a first solder mask to partially cover the wiring pattern.

參考圖1A及圖2,形成一第一防焊層121使其至少部分地覆 蓋配線圖案P,例如覆蓋非引腳區Ps的一部分或全部。於較佳實施例,第一防焊層121只需施加於非引腳區Ps的某些特定區域,譬如只需施加於此軟質線路基板產品之後端應用時產生的彎折區域。此彎折區域的實際位置視後端應用產品的特性而變化,其中介於內引腳區Ln與外引腳區Lo之間的區域為現有常見的彎折區域。因此,於本創作之較佳實施例,第一防焊層121未覆蓋介於測試引腳區Lt與內引腳區Ln之間的非引腳區Ps,然本創作不以此為限。本創作也有第一防焊層121將所有非引腳區Ps完全覆蓋的實施例。可使用習知之環氧樹脂(o-Cresol Novalac/Phenol/DGEBA)類型的油墨或其他合適的油墨以網版印刷技術完成此步驟。第一防焊層121的厚度可在3至15μm的範圍。 Referring to FIGS. 1A and 2, a first solder mask 121 is formed so as to cover at least partially The cover wiring pattern P covers, for example, a part or all of the non-lead area Ps. In the preferred embodiment, the first solder resist layer 121 only needs to be applied to certain specific areas of the non-lead area Ps, for example, only to be applied to the bending area generated when the rear end of the flexible circuit board product is applied. The actual position of this bending area varies depending on the characteristics of the back-end application product, and the area between the inner lead area Ln and the outer lead area Lo is the existing common bending area. Therefore, in the preferred embodiment of the present invention, the first solder mask 121 does not cover the non-pin area Ps between the test pin area Lt and the inner pin area Ln, but the present creation is not limited to this. This creation also has an embodiment in which the first solder mask 121 completely covers all the non-lead areas Ps. This step can be accomplished using screen printing techniques using conventional epoxy (o-Cresol Novalac/Phenol/DGEBA) type inks or other suitable inks. The thickness of the first solder resist layer 121 may be in the range of 3 to 15 μm.

步驟(c)以該第一防焊層為遮罩形成一第一錫層於該導電銅層上。Step (c) forming a first tin layer on the conductive copper layer using the first solder mask as a mask.

參考圖3,以第一防焊層121為遮罩形成一第一錫層131於導電銅層110上。藉由習知無電解電鍍(即化學電鍍)技術形成第一錫層131。例如將步驟(b)所形成之半成品浸泡於含硫酸、過硫酸鉀、或氟硼化錫之鍍錫液的錫槽中一段預定時間後水洗再吹乾,之後再入烤箱進行熱處理即可。在此步驟中,第一錫層131除鍍於導電銅層110沒有被第一防焊層121覆蓋的表面外,可進一步使鍍錫液侵入第一防焊層121之第一邊緣121a底下的導電銅層110,因此形成第一防焊層121的第一邊緣121a覆蓋了第一錫層131之第一側邊131a的結構。第一錫層131的厚度可在0.02至0.16μm的範圍,較佳實施例之第一錫層131的厚度為0.10μm。 Referring to FIG. 3, a first tin layer 131 is formed on the conductive copper layer 110 using the first solder mask 121 as a mask. The first tin layer 131 is formed by conventional electroless plating (ie, electroless plating) technology. For example, the semi-finished product formed in step (b) is immersed in a tin bath containing sulfuric acid, potassium persulfate, or tin borofluoride for a predetermined period of time, washed with water, then blow dried, and then put into the oven for heat treatment. In this step, the first tin layer 131 is plated on the surface of the conductive copper layer 110 that is not covered by the first solder mask 121, and can further allow the tin plating solution to invade under the first edge 121a of the first solder mask 121 The conductive copper layer 110 thus forms a structure in which the first edge 121a of the first solder mask 121 covers the first side 131a of the first tin layer 131. The thickness of the first tin layer 131 may be in the range of 0.02 to 0.16 μm. In the preferred embodiment, the thickness of the first tin layer 131 is 0.10 μm.

步驟(d):以該第一防焊層為遮罩形成一第二錫層於該第一錫層上。Step (d): forming a second tin layer on the first tin layer using the first solder mask as a mask.

參考圖4,以第一防焊層121為遮罩形成第二錫層132於第一錫層131上。較佳而言,步驟(c)及步驟(d)之間沒有額外形成防焊層的步驟。可如步驟(c),藉由習知無電解電鍍(即化學電鍍)技術形成第二錫層132。例 如將步驟(c)所形成之半成品浸泡於含硫酸、過硫酸鉀、或氟硼化錫之鍍錫液的錫槽中一段預定時間後水洗再吹乾,之後再入烤箱進行熱處理即可。步驟(c)第一次鍍錫所獲得之錫銅合金層透過熱處理高溫會生成Cu3Sn,此可減緩步驟(d)第二次鍍錫所產生的錫層之Cu6Sn5的生成擴散速率,進而減緩純錫層減損速率,提高線路與晶片間共晶接合良率,並避免產生錫鬚。在此步驟中,可進一步使鍍錫液侵入第一防焊層121之第一邊緣121a底下,形成第一防焊層121的第一邊緣121a覆蓋了第二錫層132之第二側邊132a的結構。第二錫層132的厚度可在0.12至0.5μm的範圍,較佳實施例之第二錫層132的厚度為0.28μm。因為步驟(c)與(d)都使用無電解電鍍(即化學電鍍)技術,且都以第一防焊層121為遮罩,因此在步驟(d)第一錫層131會被第二錫層132往銅密度高的區域推進,使得第一錫層131與第二錫層132之界面Iss與第一錫層131與導電銅層110的界面Isc共形(conformal)。 Referring to FIG. 4, a second tin layer 132 is formed on the first tin layer 131 using the first solder mask 121 as a mask. Preferably, there is no additional step of forming a solder mask between step (c) and step (d). As in step (c), the second tin layer 132 can be formed by a conventional electroless plating (ie, electroless plating) technique. For example, the semi-finished product formed in step (c) is immersed in a tin bath containing sulfuric acid, potassium persulfate, or tin fluoroboride for a predetermined period of time, washed with water, then blow dried, and then put into the oven for heat treatment. Step (c) The tin-copper alloy layer obtained by the first tin plating will generate Cu 3 Sn through heat treatment at high temperature, which can slow down the formation and diffusion of Cu 6 Sn 5 of the tin layer produced by the second tin plating in step (d) Rate, which in turn slows down the pure tin layer loss rate, improves the eutectic bonding yield between the circuit and the wafer, and avoids tin whiskers. In this step, the tin plating solution can further invade under the first edge 121a of the first solder mask 121, forming the first edge 121a of the first solder mask 121 to cover the second side 132a of the second tin layer 132 Structure. The thickness of the second tin layer 132 may be in the range of 0.12 to 0.5 μm. In the preferred embodiment, the thickness of the second tin layer 132 is 0.28 μm. Because both steps (c) and (d) use electroless plating (ie, electroless plating) technology, and both use the first solder mask 121 as a mask, the first tin layer 131 will be covered by the second tin in step (d) The layer 132 advances toward a region with a high copper density, so that the interface Iss between the first tin layer 131 and the second tin layer 132 and the interface Isc between the first tin layer 131 and the conductive copper layer 110 are conformal.

步驟(e)形成一第二防焊層部分地覆蓋該第二錫層及至少部分地覆蓋該第一防焊層。Step (e) forming a second solder resist layer partially covering the second tin layer and at least partially covering the first solder resist layer.

參考圖5,形成一第二防焊層122部分地覆蓋第二錫層132及至少部分地覆蓋第一防焊層121。較佳而言,此步驟形成第二防焊層122至少覆蓋於步驟(d)第二錫層132與第一防焊層121所形成之接觸面。在步驟(d),第一防焊層121浸泡在錫槽中,可能因此弱化第一防焊層121與第二錫層132的接觸面,因此利用第二防焊層122將此接觸面覆蓋可避免防焊層從錫層剝離。可使用習知之環氧樹脂(o-Cresol Novalac/Phenol/DGEBA型)類型油墨或其他合適的油墨以網版印刷技術完成此步驟。第二防焊層122的厚度可在3至20μm的範圍。在此實施例,第二防焊層122是對非引腳區Ps全區印刷因此完全覆蓋住第一防焊層121,然本創作不以此為限。本創作也包含第二防焊層122只部分地覆蓋住第一防焊層121(只覆蓋其外緣)及部分地覆蓋住第二錫層132的實施例。 Referring to FIG. 5, a second solder resist layer 122 is formed to partially cover the second tin layer 132 and at least partially cover the first solder resist layer 121. Preferably, the second solder resist layer 122 formed in this step at least covers the contact surface formed by the second tin layer 132 and the first solder resist layer 121 in step (d). In step (d), the first solder mask 121 is immersed in the tin bath, which may weaken the contact surface of the first solder mask 121 and the second tin layer 132, so the contact surface is covered by the second solder mask 122 It can prevent the solder mask from peeling off from the tin layer. Screen printing technology can be used to complete this step using conventional epoxy resin (o-Cresol Novalac/Phenol/DGEBA type) ink or other suitable inks. The thickness of the second solder resist layer 122 may be in the range of 3 to 20 μm. In this embodiment, the second solder mask layer 122 is printed on the entire area of the non-lead area Ps and thus completely covers the first solder mask layer 121, but the original creation is not limited to this. This composition also includes an embodiment in which the second solder resist layer 122 only partially covers the first solder resist layer 121 (only the outer edge thereof) and partially covers the second tin layer 132.

(f)粗化該第二防焊層以使該第二防焊層具有一粗化表面。(f) Roughening the second solder resist layer so that the second solder resist layer has a roughened surface.

參考圖6,於完成第二防焊層122之印刷與熱處理固化後,進行表面粗化處理步驟以形成具有粗化表面601的第二防焊層122’。可使用任何合適的方法完成此步驟。例如採用物理粗化方式,如滾珠法、刷磨法或磨砂法。較佳為定位差刷磨法,此方法可透過氧化鋁研磨材或碳化矽研磨材來控制刷磨設備與第二防焊層122表面之間保持連續且恆定的距離範圍,藉此進行彈性刷磨與輕量切削,達到粗化效果。因第二防焊層122與第二錫層132的表面有高低差,研磨時不致磨到錫層或配線圖案。如圖6所示,經粗化後,第二錫層132與第二防焊層122’之高度差下降,可改善壓接不良的現象。而且,第二防焊層122’表面具有高粗糙度,也可增加表面積,強化其與灌封(potting)膠之間的結合程度。灌封膠通常用來包覆內引腳區Ln,其需與防焊層緊密結合以保護IC晶片與內引腳所接合的線路。在此實施例,較佳而言,第二防焊層122’之粗化表面601之表面粗度Rz範圍為:0.04~5.0μm,較佳範圍為0.16~4.5μm,更佳範圍為0.6~4.0μm。表面粗度Rz的量測係將完成粗化的樣品裁切成約為5cm×5cm大小,以非接觸式形狀測量雷射顯微鏡(KEYENCE台灣基恩斯之型號VK-X100)測定。測定時係使用雷射光點直徑約1μm,物鏡倍率設定10X,視野範圍1350μm x 1012μm、以及物鏡倍率設定20X,視野範圍675μm x 506μm,以掃描時間約10~20秒,線距pitch設定2μm作測定。 Referring to FIG. 6, after the printing and heat treatment curing of the second solder resist layer 122 is completed, a surface roughening treatment step is performed to form a second solder resist layer 122' having a roughened surface 601. This step can be accomplished using any suitable method. For example, physical roughening methods such as ball rolling, brushing, or frosting are used. The differential positioning brushing method is preferred. This method can control the brushing equipment and the surface of the second solder mask layer 122 to maintain a continuous and constant distance range through alumina abrasives or silicon carbide abrasives, thereby performing elastic brushing Grinding and lightweight cutting to achieve a roughening effect. Due to the difference in height between the surface of the second solder resist layer 122 and the second tin layer 132, the tin layer or wiring pattern is not rubbed during polishing. As shown in FIG. 6, after the roughening, the difference in height between the second tin layer 132 and the second solder resist layer 122' decreases, which can improve the phenomenon of poor crimping. Furthermore, the surface of the second solder resist layer 122' has a high roughness, which can also increase the surface area and strengthen the degree of bonding between it and potting glue. The potting compound is usually used to cover the inner lead area Ln, which needs to be tightly combined with the solder mask to protect the circuit between the IC chip and the inner lead. In this embodiment, preferably, the surface roughness Rz of the roughened surface 601 of the second solder resist layer 122' is: 0.04~5.0μm, preferably 0.16~4.5μm, more preferably 0.6~ 4.0μm. The surface roughness Rz is measured by cutting the roughened sample to a size of approximately 5 cm × 5 cm, and measuring it with a non-contact shape measurement laser microscope (KEYENCE Model VK-X100, Taiwan Keynes). During the measurement, the laser spot diameter is about 1μm, the objective magnification is set to 10X, the field of view is 1350μm x 1012μm, and the objective magnification is set to 20X, the field of view is 675μm x 506μm, the scanning time is about 10 to 20 seconds, and the line pitch is set to 2μm. .

本創作軟質線路基板的結構The structure of the original soft circuit substrate

同時參考圖1A及圖6,於第一實施例本創作用於承載晶片的軟質線路基板包含具有配線圖案P的導電銅層110於絕緣基材100上;第一錫層131位於導電銅層110上方;第二錫層132位於第一錫層131上方;第一防焊層121覆蓋未被第一錫層131及第二錫層132覆蓋的導電銅層110,且第一防焊層121部分地覆蓋第二錫層132;及第二防焊層122’部分地覆蓋第二錫層132及至少部分地覆蓋第一防焊層121,其中該第二防焊層122’具有一粗化表 面601,該粗化表面601之表面粗度Rz範圍為:0.04~5μm,較佳範圍為0.16~4.5μm,更佳範圍為0.6~4.0μm。 Referring to FIGS. 1A and 6 at the same time, in the first embodiment, the soft circuit substrate created for carrying a chip includes a conductive copper layer 110 having a wiring pattern P on an insulating substrate 100; a first tin layer 131 is located on the conductive copper layer 110 Above; the second tin layer 132 is located above the first tin layer 131; the first solder mask 121 covers the conductive copper layer 110 not covered by the first tin layer 131 and the second tin layer 132, and the first solder mask 121 is partially The second tin layer 132; and the second solder resist layer 122' partially covers the second tin layer 132 and at least partially covers the first solder resist layer 121, wherein the second solder resist layer 122' has a roughened surface In the surface 601, the surface roughness Rz of the roughened surface 601 ranges from 0.04 to 5 μm, preferably from 0.16 to 4.5 μm, and more preferably from 0.6 to 4.0 μm.

於另一實施例,可參考圖6,本創作提供用於承載晶片的軟質線路基板,其中第一防焊層121具有一第一邊緣121a接觸第二錫層132。 In another embodiment, referring to FIG. 6, the present invention provides a flexible circuit substrate for carrying a chip, wherein the first solder resist layer 121 has a first edge 121 a contacting the second tin layer 132.

於另一實施例,可參考圖6,本創作提供用於承載晶片的軟質線路基板,其中第一錫層131具有第一縱向界面131a’接觸導電銅層110,第一防焊層121具有第一邊緣121a接觸第二錫層132,第一縱向界面131a’與第一邊緣121a之橫向距離X大於第一錫層131的厚度。 In another embodiment, referring to FIG. 6, the present invention provides a flexible circuit substrate for carrying a wafer, wherein the first tin layer 131 has a first longitudinal interface 131 a ′ contacting the conductive copper layer 110, and the first solder mask layer 121 has a An edge 121a contacts the second tin layer 132, and the lateral distance X between the first longitudinal interface 131a' and the first edge 121a is greater than the thickness of the first tin layer 131.

於另一實施例,可參考圖6,本創作提供用於承載晶片的軟質線路基板,其中第二錫層132具有第二縱向界面132a’接觸該第一錫層131,第一防焊層121覆蓋第二縱向界面132a’。 In another embodiment, referring to FIG. 6, the present invention provides a flexible circuit substrate for carrying a chip, wherein the second tin layer 132 has a second longitudinal interface 132 a ′ contacting the first tin layer 131 and the first solder mask 121 Cover the second longitudinal interface 132a'.

於另一實施例,可參考圖6,本創作提供用於承載晶片的軟質線路基板,其中第二錫層132具有第二縱向界面132a’接觸第一錫層131,第二防焊層122’具有第二邊緣122a接觸第二錫層132,第二縱向界面132a’與第二邊緣122a之橫向距離Y大於第二錫層132的厚度。 In another embodiment, referring to FIG. 6, the present invention provides a flexible circuit substrate for carrying a chip, wherein the second tin layer 132 has a second longitudinal interface 132 a ′ contacting the first tin layer 131 and the second solder mask layer 122 ′ The second edge 122a contacts the second tin layer 132, and the lateral distance Y between the second longitudinal interface 132a' and the second edge 122a is greater than the thickness of the second tin layer 132.

於另一實施例,可參考圖6,本創作提供用於承載晶片的軟質線路基板,其中第一錫層131與第二錫層132之界面Iss共形於第一錫層131與導電銅層110的界面Isc。 In another embodiment, referring to FIG. 6, the present invention provides a flexible circuit substrate for carrying a chip, wherein the interface Iss of the first tin layer 131 and the second tin layer 132 is conformal to the first tin layer 131 and the conductive copper layer Interface of 110 Isc.

圖7顯示將上述第一錫層131及第二錫層132一起視為錫層161,將第一防焊層121及第二防焊層122’一起視為防焊層162時,本創作用於承載晶片的軟質線路基板之結構特徵為包含一導電銅層110具有配線圖案P設置於絕緣基材100上;一錫層161位於導電銅層110上方,其中導電銅層110具有不被錫層161所覆蓋的一露出部分163;及一防焊層162覆蓋露出部分且部分地覆蓋錫層161,其中錫層161具有一縱向界面161a接觸導電銅層110,防焊層162具有一邊緣162a接觸錫層161,其中縱向界面161a與邊緣162a之橫向距離Z大於防焊層162的厚度加上錫層161的厚度。於一較佳實施 例,防焊層162之厚度範圍從6μm至35μm。於一較佳實施例,錫層161之厚度範圍從0.1μm至0.6μm。 FIG. 7 shows that the first tin layer 131 and the second tin layer 132 are regarded as the tin layer 161 together, and the first solder mask 121 and the second solder resist layer 122' are regarded as the solder mask 162 together. The structural features of the flexible circuit substrate for carrying the chip include a conductive copper layer 110 with a wiring pattern P disposed on the insulating substrate 100; a tin layer 161 is located above the conductive copper layer 110, wherein the conductive copper layer 110 has a non-tin layer An exposed portion 163 covered by 161; and a solder resist layer 162 covering the exposed portion and partially covering the tin layer 161, wherein the tin layer 161 has a longitudinal interface 161a contacting the conductive copper layer 110, and the solder resist layer 162 has an edge 162a contacting The tin layer 161, wherein the lateral distance Z between the longitudinal interface 161a and the edge 162a is greater than the thickness of the solder resist layer 162 plus the thickness of the tin layer 161. In a preferred implementation For example, the thickness of the solder resist layer 162 ranges from 6 μm to 35 μm. In a preferred embodiment, the thickness of the tin layer 161 ranges from 0.1 μm to 0.6 μm.

本創作也有只執行步驟(c)而無步驟(d)之一實施例,在此實例錫層之厚度範圍從0.1μm至0.6μm。 This creation also has an embodiment that only performs step (c) without step (d). In this example, the thickness of the tin layer ranges from 0.1 μm to 0.6 μm.

以上所述僅為本創作之較佳實施例而已,並非用以限定本創作之申請專利範圍;凡其它未脫離本創作所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。 The above are only the preferred embodiments of this creation and are not intended to limit the scope of patent applications for this creation; all other equivalent changes or modifications that have been made without departing from the spirit disclosed in this creation should be included in the following Within the scope of patent application.

100:絕緣基材 100: insulating substrate

110:導電銅層 110: conductive copper layer

121:第一防焊層 121: The first solder mask

121a:第一邊緣 121a: the first edge

122’:第二防焊層 122’: Second solder mask

122a:第二邊緣 122a: second edge

131:第一錫層 131: The first tin layer

131a:第一側邊 131a: first side

131a’:第一縱向界面 131a’: the first vertical interface

132:第二錫層 132: Second tin layer

132a:第二側邊 132a: second side

132a’:第二縱向界面 132a’: Second vertical interface

Ps:非引腳區 Ps: non-pin area

Iss:界面 Iss: interface

Isc:界面 Isc: interface

X:橫向距離 X: horizontal distance

Y:橫向距離 Y: horizontal distance

Claims (15)

一種用於承載晶片的軟質線路基板,包含:具有配線圖案的一導電銅層於一絕緣基材上;一第一錫層位於該導電銅層上方;一第二錫層位於該第一錫層上方;一第一防焊層覆蓋未被該第一錫層及該第二錫層覆蓋的該導電銅層,且該第一防焊層部分地覆蓋該第二錫層;及一第二防焊層部分地覆蓋該第二錫層及至少部分地覆蓋該第一防焊層,其中該第二防焊層具有一粗化表面,該粗化表面之表面粗度Rz範圍為0.04~5μm。 A flexible circuit substrate for carrying a chip includes: a conductive copper layer with a wiring pattern on an insulating substrate; a first tin layer above the conductive copper layer; and a second tin layer on the first tin layer Above; a first solder mask layer covers the conductive copper layer not covered by the first tin layer and the second tin layer, and the first solder mask layer partially covers the second tin layer; and a second solder mask The solder layer partially covers the second tin layer and at least partially covers the first solder mask layer, wherein the second solder mask layer has a roughened surface, and the surface roughness Rz of the roughened surface ranges from 0.04 to 5 μm. 如請求項1所述之軟質線路基板,其中該表面粗度Rz範圍為0.16~4.5μm。 The flexible circuit board according to claim 1, wherein the surface roughness Rz ranges from 0.16 to 4.5 μm. 如請求項1所述之軟質線路基板,其中該表面粗度Rz範圍為0.6~4.0μm。 The flexible circuit board according to claim 1, wherein the surface roughness Rz ranges from 0.6 to 4.0 μm. 如請求項1所述之軟質線路基板,其中該第一防焊層具有一第一邊緣接觸該第二錫層。 The flexible circuit board according to claim 1, wherein the first solder resist layer has a first edge contacting the second tin layer. 如請求項1所述之軟質線路基板,其中該第一錫層具有一第一縱向界面接觸該導電銅層,該第一防焊層具有一第一邊緣接觸該第二錫層,該第一縱向界面與該第一邊緣之橫向距離大於該第一錫層的厚度。 The flexible circuit substrate of claim 1, wherein the first tin layer has a first longitudinal interface contacting the conductive copper layer, the first solder mask layer has a first edge contacting the second tin layer, the first The lateral distance between the longitudinal interface and the first edge is greater than the thickness of the first tin layer. 如請求項1所述之軟質線路基板,其中該第二錫層具有一第二縱向界面接觸該第一錫層,該第一防焊層覆蓋該第二縱向界面。 The flexible circuit substrate according to claim 1, wherein the second tin layer has a second longitudinal interface contacting the first tin layer, and the first solder mask layer covers the second longitudinal interface. 如請求項1所述之軟質線路基板,其中該第二錫層具有一第二縱向界面接觸該第一錫層,該第二防焊層具有一第二邊緣接觸該第二錫層,該第二縱向界面與該第二邊緣之橫向距離大於該第二錫層的厚度。 The flexible circuit substrate according to claim 1, wherein the second tin layer has a second longitudinal interface contacting the first tin layer, the second solder mask layer has a second edge contacting the second tin layer, the first The lateral distance between the two longitudinal interfaces and the second edge is greater than the thickness of the second tin layer. 如請求項1所述之軟質線路基板,其中該第一錫層與該第二錫層之界面共形於該第一錫層與該導電銅層的界面。 The flexible circuit substrate according to claim 1, wherein the interface between the first tin layer and the second tin layer is conformal to the interface between the first tin layer and the conductive copper layer. 如請求項1所述之軟質線路基板,其中該配線圖案具有一測試引腳區,一內引腳區及一外引腳區,該第一防焊層未覆蓋介於該測試引腳區與該內引腳區之間的該配線圖案。 The flexible circuit substrate according to claim 1, wherein the wiring pattern has a test pin area, an inner pin area and an outer pin area, and the first solder mask layer is not covered between the test pin area and The wiring pattern between the inner pin areas. 一種用於承載晶片之軟質線路基板,包含:一導電銅層具有一配線圖案設置於一絕緣基材上;一錫層位於該導電銅層上方,其中該導電銅層具有不被該錫層所覆蓋的一露出部分;及一防焊層覆蓋該露出部分且部分地覆蓋該錫層,其中該防焊層具有一粗化表面,該粗化表面之表面粗度Rz範圍為0.04~5.0μm。 A flexible circuit substrate for carrying a chip, comprising: a conductive copper layer with a wiring pattern on an insulating substrate; a tin layer on top of the conductive copper layer, wherein the conductive copper layer is not covered by the tin layer An exposed portion covered; and a solder mask covering the exposed portion and partially covering the tin layer, wherein the solder mask has a roughened surface, and the surface roughness Rz of the roughened surface ranges from 0.04 to 5.0 μm. 如請求項10所述之軟質線路基板,其中該粗化表面之表面粗度Rz範圍為0.16~4.5μm。 The flexible circuit board according to claim 10, wherein the surface roughness Rz of the roughened surface ranges from 0.16 to 4.5 μm. 如請求項10所述之軟質線路基板,其中該粗化表面之表面粗度Rz為0.6~4.0μm。 The flexible circuit board according to claim 10, wherein the roughness Rz of the roughened surface is 0.6 to 4.0 μm. 如請求項10所述之軟質線路基板,其中該錫層具有一縱向界面接觸該導 電銅層,該防焊層具有一邊緣接觸該錫層,其中該縱向界面與該邊緣之橫向距離大於該防焊層的厚度加上該錫層的厚度。 The flexible circuit substrate according to claim 10, wherein the tin layer has a longitudinal interface contacting the conductor An electrical copper layer, the solder resist layer having an edge contacting the tin layer, wherein the lateral distance between the longitudinal interface and the edge is greater than the thickness of the solder resist layer plus the thickness of the tin layer. 如請求項10所述之軟質線路基板,其中該防焊層之厚度範圍從6μm至35μm。 The flexible circuit board according to claim 10, wherein the thickness of the solder resist layer ranges from 6 μm to 35 μm. 如請求項10所述之軟質線路基板,其中該錫層之厚度範圍從0.1μm至0.6μm。 The flexible circuit substrate according to claim 10, wherein the thickness of the tin layer ranges from 0.1 μm to 0.6 μm.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI731376B (en) * 2019-07-22 2021-06-21 頎邦科技股份有限公司 Flexible circuit board having rough solder resist layer and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI731376B (en) * 2019-07-22 2021-06-21 頎邦科技股份有限公司 Flexible circuit board having rough solder resist layer and manufacturing method thereof

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