TWM571105U - Circuit board structure with laser windowing area - Google Patents

Circuit board structure with laser windowing area

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Publication number
TWM571105U
TWM571105U TWM571105U TW M571105 U TWM571105 U TW M571105U TW M571105 U TWM571105 U TW M571105U
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TW
Taiwan
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solder resist
layer
circuit board
board structure
circuit
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Chinese (zh)
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Abstract

一種電路板結構,包括載板、電路層及防焊層,電路層係設置於載板 上;防焊層設置於電路層及載板上,且防焊層具有至少一雷射開窗區以暴露至少一部分電路層。 A circuit board structure includes a carrier board, a circuit layer and a solder resist layer, and the circuit layer is disposed on the carrier board The solder resist layer is disposed on the circuit layer and the carrier, and the solder resist layer has at least one laser window opening to expose at least a portion of the circuit layer.

Description

具有雷射開窗區的電路板結構Circuit board structure with laser windowing area

本新型是關於一種電路板結構,尤指一種具有雷射開窗區的電路板結構。The present invention relates to a circuit board structure, and more particularly to a circuit board structure having a laser window opening.

傳統的電路板結構通常會在金屬電路層上形成一防焊層,將不需焊接的電路及金屬表面都覆蓋住,藉以防止焊接時造成短路及節省焊錫之用量;另一方面,防焊層可防止水氣及電解質進入電路板中,以避免電路層氧化而危害電氣性質,亦可防止器械損害電路層;再一方面,由於電路板上的電路層之線寬越來越窄,因此防焊層也提供相鄰電路之間的絕緣功效。Conventional circuit board structures usually form a solder mask on the metal circuit layer, covering the circuit and metal surface that are not to be soldered, thereby preventing short circuit during soldering and saving soldering amount; on the other hand, solder resist layer It can prevent moisture and electrolyte from entering the circuit board, avoiding oxidation of the circuit layer and damaging electrical properties, and preventing the device from damaging the circuit layer. On the other hand, since the line width of the circuit layer on the circuit board is narrower and narrower, The solder layer also provides insulation between adjacent circuits.

接著,利用顯影蝕刻製程,移除在電路層的指定焊接點上的防焊層,使該焊接點的電路層暴露出來,以便於進行後續的焊接製程。顯影蝕刻製程係利用照射特定波段的UV光或可見光於該防焊層上,以使該防焊層固化;接著利用特殊化學溶劑將未固化的防焊層材料移除,以使該焊接點的電路層暴露出來。然而,當防焊層照光固化時,因為防焊層本身反射率及厚度影響UV光或可見光的穿透度,致使位於防焊層底部的防焊材料未完全固化,且被特殊化學溶劑移除。如此,應由防焊層保護的電路層會被裸露出來,當進行後續的焊接製程,很可能會造成短路,甚或毀損電路板。Next, using a development etch process, the solder resist layer on the designated solder joint of the circuit layer is removed, exposing the circuit layer of the solder joint for subsequent soldering processes. The development etching process utilizes irradiation of a specific wavelength band of UV light or visible light onto the solder resist layer to cure the solder resist layer; then removing the uncured solder resist layer material with a special chemical solvent to make the solder joint The circuit layer is exposed. However, when the solder resist layer is cured by light, since the reflectance and thickness of the solder resist layer affect the transmittance of UV light or visible light, the solder resist material at the bottom of the solder resist layer is not completely cured and is removed by a special chemical solvent. . In this way, the circuit layer that should be protected by the solder resist layer will be exposed, and when the subsequent soldering process is performed, it is likely to cause a short circuit or even damage the circuit board.

是以,如何提供一種可準確於焊接點開窗的電路板結構,為亟需解決的技術課題。Therefore, how to provide a circuit board structure that can accurately open a window at a solder joint is an urgent technical problem to be solved.

有鑑於此,本新型之主要目的在於提供一種電路板結構,其防焊層具有雷射開窗區,可準確地暴露預定暴露的電路層。In view of this, the main object of the present invention is to provide a circuit board structure in which the solder resist layer has a laser window opening area for accurately exposing a predetermined exposed circuit layer.

為了達成上述的目的,本新型提供一種電路板結構,包括載板、電路層及防焊層。電路層設置於載板上;防焊層設置於電路層及載板上,且防焊層具有至少一雷射開窗區以暴露至少一部分電路層。In order to achieve the above object, the present invention provides a circuit board structure including a carrier board, a circuit layer and a solder resist layer. The circuit layer is disposed on the carrier board; the solder resist layer is disposed on the circuit layer and the carrier board, and the solder resist layer has at least one laser window opening area to expose at least a portion of the circuit layer.

在本新型實施例中,防焊層的厚度為10-200 µm。In the present embodiment, the solder resist layer has a thickness of 10 to 200 μm.

在本新型實施例中,防焊層的厚度為10-50 µm。In the present embodiment, the solder resist layer has a thickness of 10 to 50 μm.

在本新型實施例中,防焊層對可見光波長範圍中至少一部份波長的光反射率大於80%。In the novel embodiment, the solder resist has a light reflectance of at least a portion of the wavelength in the visible wavelength range of greater than 80%.

在本新型實施例中,防焊層對波長介於625-740 nm範圍中至少一部份波長的可見光的光反射率大於80%。In the present invention, the solder resist has a light reflectance of greater than 80% for visible light having a wavelength of at least a portion of the wavelength in the range of 625-740 nm.

在本新型實施例中,防焊層對波長介於500-565 nm範圍中至少一部份波長的可見光的光反射率大於80%。In the novel embodiment, the solder resist has a light reflectance of greater than 80% for visible light having a wavelength of at least a portion of the wavelength in the range of 500-565 nm.

在本新型實施例中,防焊層對波長介於485-500 nm範圍中至少一部份波長的可見光的光反射率大於80%。In the novel embodiment, the solder resist has a light reflectance of greater than 80% for visible light having a wavelength of at least a portion of the wavelength in the range of 485-500 nm.

基於上述設計,本新型的電路板結構因具有雷射開窗區可準確移除指定焊接點上的防焊層,並且不會移除雷射開窗區以外的防焊層材料,以達到防止後續的焊接製程發生短路的問題。Based on the above design, the circuit board structure of the present invention can accurately remove the solder resist layer on the specified solder joint due to the laser window opening area, and does not remove the solder resist material outside the laser window opening area to prevent The subsequent soldering process has a short circuit problem.

為能更清楚地說明本新型,茲與較佳實施例並配合圖式詳細說明如後。請參第1A圖及第1B圖所示,本新型實施例的電路板結構10包括載板12、電路層14及防焊層16。在本實施例中,載板12可為單層板結構或多層複合板結構,且載板12可為軟性電路板(Flexible Printed Circuit, FPC)之載板或硬式電路板(Printed Circuit Board, PCB)之載板;載板12可為聚乙烯對苯二甲酸酯(PET)或其他聚酯薄膜、聚醯亞胺薄膜、聚醯胺醯亞胺薄膜、聚丙烯薄膜、聚苯乙烯薄膜等。In order to explain the present invention more clearly, it will be described in detail with reference to the preferred embodiments and drawings. Referring to FIGS. 1A and 1B, the circuit board structure 10 of the present embodiment includes a carrier 12, a circuit layer 14, and a solder resist layer 16. In this embodiment, the carrier 12 can be a single-layer board structure or a multi-layer composite board structure, and the carrier board 12 can be a flexible printed circuit (FPC) carrier board or a printed circuit board (PCB). The carrier board 12 may be polyethylene terephthalate (PET) or other polyester film, polyimine film, polyamidimide film, polypropylene film, polystyrene film, etc. .

如第1B圖及第3A圖所示,電路層14係設置於載板12上。在本實施例中,電路層14係層合於載板12上,其形成有薄銅箔(圖未繪示)再鍍銅,以於載板12上形成銅導電層(圖未繪示)。接著,以線路影像轉移技術將銅導電層圖像化,以於載板12上形成電路層14(如第1B圖所示)。在本實施例中,電路層14的材料包括銅。As shown in FIGS. 1B and 3A, the circuit layer 14 is provided on the carrier 12. In this embodiment, the circuit layer 14 is laminated on the carrier 12, which is formed with a thin copper foil (not shown) and then plated with copper to form a copper conductive layer on the carrier 12 (not shown). . Next, the copper conductive layer is imaged by a line image transfer technique to form a circuit layer 14 on the carrier 12 (as shown in FIG. 1B). In the present embodiment, the material of the circuit layer 14 includes copper.

接著,如第3B圖所示,防焊層16係設置於電路層14及載板12上。在本實施例中,防焊層16材料例如可為熱硬化防焊油墨或光硬化防焊油墨類型之雙劑型防焊油墨(double liquid type solder mask ink),其成分例如包括防焊主劑、著色劑、稀釋劑及硬化劑(Hardener)。Next, as shown in FIG. 3B, the solder resist layer 16 is provided on the circuit layer 14 and the carrier 12. In this embodiment, the material of the solder resist layer 16 may be, for example, a double-layer type solder mask ink of a thermosetting solder resist ink or a photo-curable solder resist ink type, and the composition thereof includes, for example, a solder resist main agent. Colorants, thinners and hardeners (Hardener).

本實施例的防焊主劑主要包括光可成像防焊樹脂,且光可成像防焊樹脂可為:含羧基光可成像樹脂、併用環氧樹脂之含羧基光可成像樹脂或併用熱硬化性樹脂、光硬化性樹脂之含羧基光可成像樹脂。另一方面,防焊主劑除了光可成像防焊樹脂外,亦可能含有其它電子材料領域中習知的其他添加劑,例如:有機溶劑、抗氧化劑、充填劑、分散劑、可塑劑、抗靜電劑、抗老化劑、紫外線吸收劑、消泡劑、熱聚合防止劑、耦合劑、難燃劑、防黴劑、平坦劑、增黏劑、脫膜劑、表面改質劑、安定劑。在實務上,防焊主劑的材料亦可包括環氧樹脂、矽樹脂、聚醯亞胺樹脂、酚類樹脂、氟樹脂、二氧化矽或氧化鋁。The solder resist main agent of the embodiment mainly comprises a photoimageable solder resist resin, and the photoimageable solder resist resin can be: a carboxyl group-containing photoimageable resin, a carboxyl group-containing photoimageable resin combined with an epoxy resin or a combination of thermosetting properties. A carboxyl group-containing photoimageable resin of a resin or a photocurable resin. On the other hand, the solder resist main agent may contain other additives conventional in the field of electronic materials in addition to the photoimageable solder resist resin, such as organic solvents, antioxidants, fillers, dispersants, plasticizers, antistatic agents. Agent, anti-aging agent, ultraviolet absorber, antifoaming agent, thermal polymerization inhibitor, coupling agent, flame retardant, anti-fungal agent, flat agent, tackifier, release agent, surface modifier, stabilizer. In practice, the material of the solder resist main agent may also include an epoxy resin, a enamel resin, a polyimide resin, a phenol resin, a fluororesin, cerium oxide or aluminum oxide.

本實施例的著色劑例如為白色著色劑,使得防焊層16於固化後,對可見光波長範圍中至少一部份波長的光反射率大於80%,其中,所述可見光波長介於485 nm至740 nm之間、介於625 nm至740 nm之間、介於500 nm至565 nm之間或介於485 nm至500 nm之間。本實施例的稀釋劑係用以調整防焊層16材料的黏度,以使防焊層16可均勻的形成於載板12及電路層14上。本實施例的硬化劑可包括光聚合起始劑、硬化助劑、硬化觸媒中之至少一者。在本新型實施例中,防焊層的厚度為10-200 µm,較佳為10-50 µm。The coloring agent of this embodiment is, for example, a white coloring agent, so that after curing, the solder resist layer 16 has a light reflectance of at least a portion of the wavelength in the visible light wavelength range of more than 80%, wherein the visible light wavelength is between 485 nm and Between 740 nm, between 625 nm and 740 nm, between 500 nm and 565 nm, or between 485 nm and 500 nm. The diluent of this embodiment is used to adjust the viscosity of the material of the solder resist layer 16 so that the solder resist layer 16 can be uniformly formed on the carrier 12 and the circuit layer 14. The hardener of the present embodiment may include at least one of a photopolymerization initiator, a hardening aid, and a hardening catalyst. In the present embodiment, the solder resist layer has a thickness of 10 to 200 μm, preferably 10 to 50 μm.

接著,如第3B圖所示,利用雷射開窗技術,在對應於電路層14位置的防焊層16形成雷射開窗區162以暴露部分電路層14。本實施例的雷射開窗技術係利用雷射開窗設備30提供特定能量的雷射光束L,將防焊層16上指定開窗區域164內的材料防焊灰化清除,以得到預定尺寸的防焊層16開窗區162,如第1A圖及第1B圖所示。藉由雷射開窗技術,可精確控制電路板結構10上的防焊層16的開窗區162尺寸大小,並可減少過度清除防焊層16材料的風險,以降低影響電路板結構10之電氣性質。Next, as shown in FIG. 3B, a laser windowing region 16 is formed at the solder resist layer 16 corresponding to the position of the circuit layer 14 to expose a portion of the circuit layer 14 by a laser windowing technique. The laser windowing technique of the present embodiment utilizes the laser windowing device 30 to provide a laser beam L of a specific energy, and the material in the designated window opening region 164 on the solder resist layer 16 is prevented from being ashed and removed to obtain a predetermined size. The solder mask layer 16 has a window opening region 162 as shown in FIGS. 1A and 1B. By the laser windowing technology, the size of the window opening region 162 of the solder resist layer 16 on the circuit board structure 10 can be precisely controlled, and the risk of excessively removing the material of the solder resist layer 16 can be reduced to reduce the influence on the circuit board structure 10. Electrical properties.

請參第2A圖及第2B圖,其提供本新型另一實施例的電路板結構20。電路板結構20包括載板22、電路層24及防焊層26。值得注意的是,電路板結構20的各組成材料大致與電路板結構10的各組成材料類似,然此二者之差異在於防焊層的雷射開窗區的尺寸不同。在電路板結構10中,因雷射開窗區162較小,故防焊層16仍覆蓋於部分電路層16上,如第1B圖所示;而在電路板結構20中,因雷射開窗區262較大,使得在雷射開窗區262中,防焊層26未覆蓋於電路層26上,且暴露一部分的載板22。Referring to Figures 2A and 2B, a circuit board structure 20 of another embodiment of the present invention is provided. The circuit board structure 20 includes a carrier 22, a circuit layer 24, and a solder resist layer 26. It should be noted that the constituent materials of the circuit board structure 20 are substantially similar to the constituent materials of the circuit board structure 10, but the difference between the two is that the size of the laser window opening area of the solder resist layer is different. In the circuit board structure 10, since the laser window opening region 162 is small, the solder resist layer 16 still covers part of the circuit layer 16, as shown in FIG. 1B; and in the circuit board structure 20, the laser is turned on. The window region 262 is relatively large such that in the laser windowing region 262, the solder mask 26 is not overlying the circuit layer 26 and a portion of the carrier 22 is exposed.

基於上述設計,本新型的電路板結構因具有雷射開窗區可準確移除指定焊接點上的防焊層,並且不會移除雷射開窗區以外的防焊層材料,以達到防止後續的焊接製程發生短路的問題。Based on the above design, the circuit board structure of the present invention can accurately remove the solder resist layer on the specified solder joint due to the laser window opening area, and does not remove the solder resist material outside the laser window opening area to prevent The subsequent soldering process has a short circuit problem.

10、20‧‧‧電路板結構10, 20‧‧‧ circuit board structure

12、22‧‧‧載板12, 22‧‧‧ carrier board

14、24‧‧‧電路層14, 24‧‧‧ circuit layer

16、26‧‧‧防焊層16, 26‧‧‧ solder mask

162、262‧‧‧雷射開窗區162, 262‧ ‧ laser window opening area

164‧‧‧指定開窗區域164‧‧‧Designated window area

30‧‧‧雷射開窗設備30‧‧‧Laser window opening equipment

L‧‧‧雷射光束L‧‧‧Laser beam

第1A圖為本新型第一實施例之電路板結構的俯視圖。Fig. 1A is a plan view showing the structure of the circuit board of the first embodiment of the present invention.

第1B圖為第1A圖之剖面圖。Fig. 1B is a cross-sectional view of Fig. 1A.

第2A圖為本新型第二實施例之電路板結構的俯視圖。Fig. 2A is a plan view showing the structure of the circuit board of the second embodiment of the present invention.

第2B圖為第2A圖之剖面圖。Figure 2B is a cross-sectional view of Figure 2A.

第3A圖、第3B圖及第3C圖為本新型第一實施例之電路板結構的製程步驟剖面圖。3A, 3B, and 3C are cross-sectional views showing process steps of the circuit board structure of the first embodiment of the present invention.

Claims (7)

一種具有雷射開窗區的電路板結構,包括: 一載板; 一電路層,設置於該載板上;以及 一防焊層,設置於該電路層及該載板上,且該防焊層具有至少一雷射開窗區以暴露至少一部分該電路層。A circuit board structure having a laser window opening region, comprising: a carrier board; a circuit layer disposed on the carrier board; and a solder resist layer disposed on the circuit layer and the carrier board, and the solder resist The layer has at least one laser windowing region to expose at least a portion of the circuit layer. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層的厚度為10-200 µm。A circuit board structure having a laser window opening region as claimed in claim 1, wherein the solder resist layer has a thickness of 10 to 200 μm. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層的厚度為10-50 µm。A circuit board structure having a laser window opening region as claimed in claim 1, wherein the solder resist layer has a thickness of 10 to 50 μm. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層對可見光波長範圍中至少一部份波長的光反射率大於80%。A circuit board structure having a laser windowing region according to claim 1, wherein the solder resist layer has a light reflectance of at least a portion of the wavelength in the visible light wavelength range of greater than 80%. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層對波長介於625-740 nm範圍中至少一部份波長的可見光的光反射率大於80%。A circuit board structure having a laser windowing region according to claim 1, wherein the solder resist layer has a light reflectance of greater than 80% for visible light having a wavelength of at least a portion of a wavelength in the range of 625-740 nm. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層對波長介於500-565 nm範圍中至少一部份波長的可見光的光反射率大於80%。A circuit board structure having a laser windowing region according to claim 1, wherein the solder resist layer has a light reflectance of at least 80% for visible light having a wavelength of at least a portion of a wavelength in the range of 500-565 nm. 如請求項1所述的具有雷射開窗區的電路板結構,其中該防焊層對波長介於485-500 nm範圍中至少一部份波長的可見光的光反射率大於80%。A circuit board structure having a laser windowing region according to claim 1, wherein the solder resist layer has a light reflectance of greater than 80% for visible light having a wavelength of at least a portion of the wavelength in the range of 485-500 nm.

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114531787A (en) * 2020-11-23 2022-05-24 碁鼎科技秦皇岛有限公司 Preparation method of circuit board solder mask layer
TWI784175B (en) * 2019-06-14 2022-11-21 培英半導體有限公司 Method for forming optical wall by laser engraving an opening and optical wall structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI784175B (en) * 2019-06-14 2022-11-21 培英半導體有限公司 Method for forming optical wall by laser engraving an opening and optical wall structure
CN114531787A (en) * 2020-11-23 2022-05-24 碁鼎科技秦皇岛有限公司 Preparation method of circuit board solder mask layer

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