TWM563659U - Chip on film package structure - Google Patents

Chip on film package structure Download PDF

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Publication number
TWM563659U
TWM563659U TW107201292U TW107201292U TWM563659U TW M563659 U TWM563659 U TW M563659U TW 107201292 U TW107201292 U TW 107201292U TW 107201292 U TW107201292 U TW 107201292U TW M563659 U TWM563659 U TW M563659U
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TW
Taiwan
Prior art keywords
chip
layer
packaging structure
film flip
circuit
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Application number
TW107201292U
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Chinese (zh)
Inventor
盧智宏
楊毓儒
楊正彬
Original Assignee
奕力科技股份有限公司
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Application filed by 奕力科技股份有限公司 filed Critical 奕力科技股份有限公司
Priority to TW107201292U priority Critical patent/TWM563659U/en
Priority to CN201820579106.5U priority patent/CN208538837U/en
Publication of TWM563659U publication Critical patent/TWM563659U/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9212Sequential connecting processes
    • H01L2224/92122Sequential connecting processes the first connecting process involving a bump connector
    • H01L2224/92125Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip

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  • Wire Bonding (AREA)

Abstract

A chip on film package structure including a flexible circuit carrier, a chip, and a solder mask is provided. The flexible circuit carrier includes a flexible substrate and a circuit layer. The flexible substrate has a chip bonding area. The circuit layer is disposed on the flexible substrate. The circuit layer includes a plurality of inner leads, a plurality of circuits, and a plurality of outer leads. The inner leads are disposed corresponding to the chip bonding area. The circuits surround the inner leads. The circuits are disposed between the inner leads and the outer leads. The maximum thickness of the inner leads is smaller than the maximum thickness of the circuits. The chip is disposed on the flexible circuit carrier in the chip bonding area and electrically connected to the inner leads. The solder mask is disposed on the circuit layer and exposes the inner leads and outer leads.

Description

薄膜覆晶封裝結構Thin film flip chip packaging structure

本新型創作是有關於一種封裝結構,且特別是有關於一種薄膜覆晶封裝結構。This new creation is about a packaging structure, and particularly about a thin film flip chip packaging structure.

隨著電子科技的不斷演進,所生產的積體電路元件更加輕薄短小、功能複雜、高接點數(high I/O count)、高頻化以及多元化。在此發展趨勢下,薄膜覆晶(chip on film;COF)封裝滿足了其封裝需求。薄膜覆晶封裝是一種藉由導電凸塊將晶片與可撓性線路載板上的引腳接合的封裝技術。相較於傳統使用的印刷電路板,薄膜覆晶封裝是將導電電路及其電子零件直接安裝於可撓性基板上,以使封裝結構可達到更輕薄短小及可撓的目的。With the continuous evolution of electronic technology, the integrated circuit components produced are lighter, thinner, shorter, and more complex in function, high I / O count, high frequency, and diversified. Under this development trend, thin film on chip (COF) packaging meets its packaging needs. Thin film flip-chip packaging is a packaging technology that uses conductive bumps to join the chip to the pins on the flexible circuit carrier board. Compared with the traditional printed circuit board, the thin film flip chip package directly installs the conductive circuit and its electronic components on the flexible substrate, so that the package structure can achieve the purpose of lighter, thinner, shorter and flexible.

在現行的可撓性線路載板的線路結構中,可撓性基板與導電電路之間可能會由於應力的關係而導致剝離(peeling),特別是導電電路的內引腳與可撓性基板的接合處。因此,如何降低可撓性基板與導電電路剝離的可能,以進一步提升薄膜覆晶封裝結構的良率及產品可靠度,實已成目前亟欲解決的課題。In the current circuit structure of a flexible circuit carrier board, peeling may occur between the flexible substrate and the conductive circuit due to stress, especially between the inner leads of the conductive circuit and the flexible substrate Junction. Therefore, how to reduce the possibility of peeling of the flexible substrate and the conductive circuit to further improve the yield and product reliability of the thin-film flip-chip packaging structure has become a problem that is urgently to be solved.

本新型創作提供一種薄膜覆晶封裝結構,其具有較佳的良率及可靠度。The novel creation provides a thin film flip chip packaging structure, which has better yield and reliability.

本新型創作的薄膜覆晶封裝結構包括可撓性線路載板、晶片以及防焊層。可撓性線路載板包括可撓性基板以及線路層。可撓性基板具有晶片接合區。線路層配置於可撓性基板上。線路層包括多個內引腳、多個線路以及多個外引腳。多個內引腳對應於晶片接合區配置。多個線路圍繞多個內引腳。多個線路位於多個外引腳與多個內引腳之間,且內引腳的最大厚度小於線路的最大厚度。晶片配置於可撓性線路載板上且位於晶片接合區內,且晶片電性連接於多個內引腳。防焊層位於線路層上,且暴露出多個內引腳與多個外引腳。The thin-film flip-chip packaging structure created by the novel includes a flexible circuit carrier board, a chip and a solder mask. The flexible circuit carrier includes a flexible substrate and a circuit layer. The flexible substrate has a wafer bonding area. The circuit layer is disposed on the flexible substrate. The circuit layer includes multiple inner pins, multiple lines, and multiple outer pins. The multiple inner pins correspond to the wafer bonding area configuration. Multiple lines surround multiple inner pins. Multiple lines are located between multiple outer pins and multiple inner pins, and the maximum thickness of the inner pins is less than the maximum thickness of the line. The chip is disposed on the flexible circuit carrier board and is located in the chip bonding area, and the chip is electrically connected to a plurality of inner pins. The solder mask layer is located on the circuit layer and exposes multiple inner pins and multiple outer pins.

在本新型創作的一實施例中,上述的線路結構的楊氏模量大於可撓性基板的楊氏模量。In an embodiment of the present invention, the above-mentioned circuit structure has a Young's modulus greater than that of the flexible substrate.

在本新型創作的一實施例中,上述的內引腳的最大厚度與線路的最大厚度的比值介於20%至90%。In an embodiment of the invention, the ratio of the maximum thickness of the inner lead to the maximum thickness of the circuit is between 20% and 90%.

在本新型創作的一實施例中,上述的線路層為單一模層。In an embodiment of the invention, the circuit layer is a single mold layer.

在本新型創作的一實施例中,上述的薄膜覆晶封裝結構更包括助焊層。助焊層覆蓋於線路層上,且助焊層的材質不同於線路層的材質。In an embodiment of the invention, the above-mentioned thin-film flip-chip packaging structure further includes a soldering layer. The soldering layer covers the circuit layer, and the material of the soldering layer is different from the material of the circuit layer.

在本新型創作的一實施例中,上述的薄膜覆晶封裝結構更包括多個連接端子。連接端子位於晶片與可撓性線路載板之間,且晶片藉由多個連接端子電性連接至線路層。In an embodiment of the invention, the above-mentioned thin-film flip-chip packaging structure further includes a plurality of connection terminals. The connection terminal is located between the chip and the flexible circuit carrier board, and the chip is electrically connected to the circuit layer through a plurality of connection terminals.

在本新型創作的一實施例中,上述的線路具有第一上表面,內引腳具有第二上表面,且第一上表面與第二上表面不共面。In an embodiment of the invention, the circuit described above has a first upper surface, the inner pin has a second upper surface, and the first upper surface and the second upper surface are not coplanar.

在本新型創作的一實施例中,上述的外引腳的最大厚度小於線路的最大厚度。In an embodiment of the present invention, the maximum thickness of the external pin is smaller than the maximum thickness of the circuit.

在本新型創作的一實施例中,上述的薄膜覆晶封裝結構更包括封裝層。封裝層至少位於可撓性線路載板與晶片之間,且包覆內引腳。In an embodiment of the present invention, the above-mentioned thin film flip chip packaging structure further includes a packaging layer. The packaging layer is at least located between the flexible circuit carrier and the chip, and covers the inner leads.

在本新型創作的一實施例中,上述的封裝層更包覆晶片。In an embodiment of the invention, the above-mentioned encapsulation layer further covers the chip.

基於上述,在本新型創作的薄膜覆晶封裝結構中,晶片與線路層的內引腳電性連接,且內引腳的最大厚度小於線路的最大厚度。因此,在薄膜覆晶封裝結構的製造過程或是成品中,可以降低線路層與可撓性基板剝離的可能。如此一來,薄膜覆晶封裝結構可以具有較佳的良率及可靠度。Based on the above, in the thin-film flip-chip packaging structure created by the present invention, the chip is electrically connected to the inner pins of the circuit layer, and the maximum thickness of the inner pins is less than the maximum thickness of the circuit. Therefore, in the manufacturing process or finished product of the thin film flip chip packaging structure, the possibility of peeling of the circuit layer and the flexible substrate can be reduced. In this way, the thin film flip chip packaging structure can have better yield and reliability.

為讓本新型創作的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the creation of the new model more obvious and understandable, the embodiments are specifically described below and described in detail in conjunction with the attached drawings.

圖1A至圖1G是依照本新型創作的第一實施例的一種薄膜覆晶封裝結構的製作方法的剖面示意圖。圖1H是依照本新型創作的第一實施例的一種薄膜覆晶封裝結構的上視示意圖。FIGS. 1A to 1G are schematic cross-sectional views of a method for manufacturing a thin film flip-chip package structure according to the first embodiment of the present invention. FIG. 1H is a schematic top view of a thin-film flip-chip packaging structure according to the first embodiment of the present invention.

本實施例的薄膜覆晶封裝結構100的製作方法包括下列步驟。首先,請參照圖1A,提供一可撓性基板120。可撓性基板120的材料例如是聚亞醯胺(polyimide;PI)或其他可撓性材料,以使具有可撓性基板120的薄膜覆晶封裝結構100(繪示於圖1G或圖1H)可以在受到外力時對應地被撓曲或彎曲。The manufacturing method of the thin film flip-chip packaging structure 100 of this embodiment includes the following steps. First, referring to FIG. 1A, a flexible substrate 120 is provided. The material of the flexible substrate 120 is, for example, polyimide (PI) or other flexible materials, so that the thin film flip-chip packaging structure 100 with the flexible substrate 120 (shown in FIG. 1G or 1H) It can be correspondingly flexed or bent when subjected to external force.

接著,請繼續參照圖1A,於可撓性基板120上形成一導電層130a。一般而言,導電層130a可以藉由沉積製程及/或電鍍製程等其他適宜的製程以在可撓性基板120的表面120a上形成。此外,基於導電性的考量,導電層130a一般是使用金屬材料,但本發明不限於此。在其他實施例中,導電層130a也可以使用合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、其他適宜的導電材料、或是金屬材料與其他導材料的堆疊層。1A, a conductive layer 130a is formed on the flexible substrate 120. In general, the conductive layer 130a can be formed on the surface 120a of the flexible substrate 120 by other suitable processes such as a deposition process and / or an electroplating process. In addition, based on the consideration of conductivity, the conductive layer 130a generally uses a metal material, but the present invention is not limited thereto. In other embodiments, the conductive layer 130a may also use alloys, nitrides of metal materials, oxides of metal materials, oxynitrides of metal materials, other suitable conductive materials, or stacked layers of metal materials and other conductive materials .

接著,請參照圖1B,於可撓性基板120上形成導電層130a之後,可以藉由例如微影及蝕刻製程以對覆蓋於可撓性基板120的表面120a上的導電層130a(繪示於圖1A)進行圖案化,以形成圖案化導電層130b。圖案化導電層130b具有一開口130c,以暴露出部分的可撓性基板120。在本實施例中,圖案化導電層130b例如為條狀,但本發明不限於此。Next, referring to FIG. 1B, after the conductive layer 130a is formed on the flexible substrate 120, the conductive layer 130a covered on the surface 120a of the flexible substrate 120 (shown in FIG. FIG. 1A) is patterned to form a patterned conductive layer 130b. The patterned conductive layer 130b has an opening 130c to expose a portion of the flexible substrate 120. In the present embodiment, the patterned conductive layer 130b is, for example, strip-shaped, but the present invention is not limited thereto.

接著,請參照圖1C,在形成圖案化導電層130b之後,可以對部分的圖案化導電層130b進行薄化製程,以形成線路層130。具體而言,可以藉由蝕刻製程以移除位於開口130c附近的部分圖案化導電層130b(繪示於圖1B),以構成線路層130的內引腳131。此外,未薄化的其餘部分的圖案化導電層130b可以構成線路層130的線路132。換言之,這些線路132可以圍繞這些內引腳131,且內引腳131的最大厚度131h小於線路132的最大厚度132h。Next, referring to FIG. 1C, after forming the patterned conductive layer 130b, a portion of the patterned conductive layer 130b may be thinned to form the circuit layer 130. Specifically, a part of the patterned conductive layer 130b (shown in FIG. 1B) located near the opening 130c can be removed by an etching process to form the inner pin 131 of the circuit layer 130. In addition, the remaining portion of the patterned conductive layer 130 b that is not thinned may constitute the wiring 132 of the wiring layer 130. In other words, the lines 132 may surround the inner pins 131, and the maximum thickness 131h of the inner pins 131 is smaller than the maximum thickness 132h of the line 132.

在本實施例中,由於內引腳131是經由薄化製程之後所形成,因此,內引腳131的第一上表面131a與線路132的第二上表面132a相連但不共面(coplanar),而內引腳131的第一下表面131b與線路132的第二下表面132b相連且共面。In this embodiment, since the inner lead 131 is formed after a thinning process, the first upper surface 131a of the inner lead 131 and the second upper surface 132a of the circuit 132 are connected but not coplanar, The first lower surface 131b of the inner pin 131 is connected to the second lower surface 132b of the circuit 132 and is coplanar.

在本實施例中,可以對位於可撓性基板120側邊120b附近的部分圖案化導電層130b進行薄化製程,以構成線路層130的外引腳133。換言之,這些線路132可以位於這些外引腳133與這些內引腳131之間,且外引腳133的最大厚度133h小於線路132的最大厚度132h。在本實施例中,外引腳133的最大厚度133h與內引腳131的最大厚度131h大致上相同,但本發明不限於此。除此之外,由於外引腳133是經由薄化製程之後所形成,因此,外引腳133的第三上表面133a與線路132的第二上表面132a相連但不共面,而外引腳133的第三下表面133b與線路132的第二下表面132b相連且共面。In this embodiment, a part of the patterned conductive layer 130 b located near the side 120 b of the flexible substrate 120 may be thinned to form the outer pin 133 of the circuit layer 130. In other words, the lines 132 may be located between the outer pins 133 and the inner pins 131, and the maximum thickness 133h of the outer pins 133 is smaller than the maximum thickness 132h of the line 132. In this embodiment, the maximum thickness 133h of the outer lead 133 is substantially the same as the maximum thickness 131h of the inner lead 131, but the invention is not limited thereto. In addition, since the outer pin 133 is formed after a thinning process, the third upper surface 133a of the outer pin 133 and the second upper surface 132a of the circuit 132 are connected but not coplanar, while The third lower surface 133b of 133 is connected to the second lower surface 132b of the circuit 132 and is coplanar.

在其他實施例中,外引腳133也可以不進行薄化製程。換言之,可以使外引腳133的最大厚度133h與線路132的最大厚度132h可以大致上相同。In other embodiments, the external pin 133 may not be thinned. In other words, the maximum thickness 133h of the outer lead 133 and the maximum thickness 132h of the line 132 may be substantially the same.

在本實施例中,線路層130的楊氏模量(Young's modulus)大於可撓性基板120的楊氏模量,且線路層130的最大厚度132h(於本實施例中即為線路132的最大厚度132h)小於可撓性基板120的厚度120h。如此一來,可以使由可撓性基板120與線路層130所構成的薄膜覆晶封裝結構100(繪示於圖1G或圖1H)具有較佳的可撓性。In this embodiment, the Young's modulus of the circuit layer 130 is greater than the Young's modulus of the flexible substrate 120, and the maximum thickness of the circuit layer 130 is 132h (in this embodiment, it is the maximum of the circuit 132) Thickness 132h) is smaller than the thickness 120h of the flexible substrate 120. In this way, the thin-film flip-chip packaging structure 100 (shown in FIG. 1G or FIG. 1H) composed of the flexible substrate 120 and the circuit layer 130 can have better flexibility.

接著,請參照圖1D。在本實施例中,在形成線路層130的內引腳131、線路132及外引腳133之後,可以於線路層130上形成助焊層140。助焊層140可以藉由電鍍製程形成。也就是說,助焊層140可以共形(conformal)覆蓋於線路層130上。一般而言,助焊層140的材質不同於線路層130的材質,並且,相較於線路層130的材質,助焊層140的材質可以使後續形成的焊料貼覆於其上。舉例而言,線路層130的材質可以為包括銅,而助焊層140的材質可以包括錫,但本發明不限於此。Next, please refer to FIG. 1D. In this embodiment, after the inner pin 131, the circuit 132 and the outer pin 133 of the circuit layer 130 are formed, the soldering layer 140 may be formed on the circuit layer 130. The soldering layer 140 can be formed by an electroplating process. That is to say, the soldering layer 140 may conformally cover the circuit layer 130. Generally speaking, the material of the soldering layer 140 is different from the material of the circuit layer 130, and compared with the material of the circuit layer 130, the material of the soldering layer 140 can be applied to the solder formed later. For example, the material of the circuit layer 130 may include copper, and the material of the soldering layer 140 may include tin, but the invention is not limited thereto.

在其他實施例中,也可以不具有類似於圖1D的助焊層140。In other embodiments, the soldering layer 140 similar to FIG. 1D may not be provided.

接著,請參照圖1E,於線路層130上形成防焊層150。防焊層150覆蓋線路層130的線路132,且暴露出線路層130的內引腳131與外引腳133。防焊層150具有開口,且開口暴露出線路層130的內引腳131以及部分的可撓性基板120,以定義出晶片接合區121。Next, referring to FIG. 1E, a solder resist layer 150 is formed on the circuit layer 130. The solder resist layer 150 covers the circuit 132 of the circuit layer 130 and exposes the inner pin 131 and the outer pin 133 of the circuit layer 130. The solder resist layer 150 has an opening, and the opening exposes the inner pins 131 of the circuit layer 130 and a portion of the flexible substrate 120 to define the wafer bonding area 121.

接著,請參照圖1F,於線路層130上配置晶片170。晶片170藉由覆晶(flip-chip)接合的方式配置於晶片接合區121內,且晶片170與內引腳131電性連接。詳細而言,在本實施例中,可以先在內引腳131上形成多個連接端子160。連接端子160例如為焊球,但本發明不限於此。接著,以將晶片170的主動面171面向線路層130的方式,將晶片170置於連接端子160上,並藉由加壓及加熱的方式使連接端子160融熔且與晶片170的主動面171相連接。Next, referring to FIG. 1F, a wafer 170 is disposed on the circuit layer 130. The chip 170 is disposed in the chip bonding area 121 by flip-chip bonding, and the chip 170 is electrically connected to the inner pins 131. In detail, in this embodiment, a plurality of connection terminals 160 may be formed on the inner pins 131 first. The connection terminal 160 is, for example, a solder ball, but the invention is not limited thereto. Next, the wafer 170 is placed on the connection terminal 160 in such a manner that the active surface 171 of the wafer 170 faces the circuit layer 130, and the connection terminal 160 is melted and connected to the active surface 171 of the wafer 170 by pressing and heating Connected.

一般而言,在複合材料上具有應力時,容易使材料的介面(interface)之間產生裂面。而上述的應力可以是外部所施加的壓力所產生的外應力,或是內部因撓曲、膨脹係數不同或其他可能的原因所產生的內應力。也就是說,當藉由加壓及加熱的方式而使晶片170與線路層130電性連接時,可能會由於應力的關係,而使可撓性基板120與線路層130之間或是線路層130內,產生斷裂而導致剝離。在本實施例中,由於內引腳131是經由薄化製程之後所形成,因此,相較於未經由薄化製程的內引腳,本實施例的內引腳131具有較佳的應力承受度。如此一來,當將晶片170配置於內引腳131上時,可以降低可撓性基板120與線路層130之間的剝離,或是內引腳131內部的斷裂,而使薄膜覆晶封裝結構100具有較佳的良率及可靠度。Generally speaking, when there is stress on the composite material, it is easy to cause cracks between the interfaces of the materials. The above-mentioned stresses may be external stresses generated by externally applied pressure, or internal stresses generated internally due to deflection, different expansion coefficients, or other possible reasons. That is to say, when the chip 170 and the circuit layer 130 are electrically connected by means of pressure and heating, the flexible substrate 120 and the circuit layer 130 or the circuit layer may be caused due to stress Within 130, cracks occurred and peeling occurred. In this embodiment, since the inner pin 131 is formed after the thinning process, the inner pin 131 of this embodiment has better stress tolerance than the inner pin without the thinning process . In this way, when the chip 170 is disposed on the inner pins 131, the peeling between the flexible substrate 120 and the circuit layer 130, or the internal breakage of the inner pins 131 can be reduced to make the thin film flip chip package structure 100 has better yield and reliability.

接著,請參照圖1G,在配置晶片170之後,可以於可撓性基板120上形成封裝層180。封裝層180至少位於可撓性線路載板110與晶片170之間,以包覆內引腳131、連接端子160以及晶片170的主動面171。Next, referring to FIG. 1G, after the wafer 170 is disposed, the encapsulation layer 180 may be formed on the flexible substrate 120. The packaging layer 180 is located at least between the flexible circuit carrier 110 and the chip 170 to cover the inner lead 131, the connection terminal 160 and the active surface 171 of the chip 170.

經過上述製程後即可大致上完成本實施例的薄膜覆晶封裝結構100的製作。請同時參照圖1G與圖1H,上述的薄膜覆晶封裝結構100包括可撓性線路載板110、晶片170以及防焊層150。可撓性線路載板110包括可撓性基板120以及線路層130。可撓性基板120具有晶片接合區121。線路層130配置於可撓性基板120上。線路層130包括多個內引腳131、多個線路132以及多個外引腳133。多個內引腳131對應於晶片接合區121配置。多個線路132圍繞多個內引腳131。多個線路132位於多個外引腳133與多個內引腳131之間,且內引腳131的最大厚度131h小於線路132的最大厚度132h。晶片170配置於可撓性線路載板110上且位於晶片接合區121內,且晶片170電性連接於多個內引腳131。防焊層150位於線路層130上,且暴露出多個內引腳131與多個外引腳133。After the above process, the fabrication of the thin film flip-chip packaging structure 100 of this embodiment can be substantially completed. Please refer to FIG. 1G and FIG. 1H at the same time. The above-mentioned thin film flip-chip packaging structure 100 includes a flexible circuit carrier 110, a chip 170, and a solder mask 150. The flexible circuit carrier 110 includes a flexible substrate 120 and a circuit layer 130. The flexible substrate 120 has a wafer bonding area 121. The circuit layer 130 is disposed on the flexible substrate 120. The circuit layer 130 includes a plurality of inner pins 131, a plurality of lines 132, and a plurality of outer pins 133. The plurality of inner pins 131 are arranged corresponding to the wafer bonding area 121. A plurality of lines 132 surround a plurality of inner pins 131. The multiple wires 132 are located between the multiple outer pins 133 and the multiple inner pins 131, and the maximum thickness 131h of the inner pins 131 is smaller than the maximum thickness 132h of the line 132. The chip 170 is disposed on the flexible circuit carrier 110 and is located in the chip bonding area 121, and the chip 170 is electrically connected to the plurality of inner pins 131. The solder resist layer 150 is located on the circuit layer 130 and exposes a plurality of inner pins 131 and a plurality of outer pins 133.

在本實施例中,內引腳131的最大厚度131h與線路132的最大厚度132h的比值介於20%至90%。如此一來,內引腳131可以具有較佳的導電性及應力承受度。In this embodiment, the ratio of the maximum thickness 131h of the inner lead 131 to the maximum thickness 132h of the line 132 is between 20% and 90%. In this way, the inner pin 131 can have better conductivity and stress tolerance.

在本實施例中,封裝層180暴露出晶片170的晶片背面172,但本發明不限於此。In this embodiment, the encapsulation layer 180 exposes the wafer back 172 of the wafer 170, but the invention is not limited thereto.

圖2A至圖2B是依照本新型創作的第二實施例的一種薄膜覆晶封裝結構的部分製作方法的剖面示意圖。本實施例的薄膜覆晶封裝結構與前述實施例的薄膜覆晶封裝結構100在結構上相似,主要差別在於製作方法的不同。2A-2B are schematic cross-sectional views of a part of a method for manufacturing a thin film flip chip package structure according to a second embodiment of the present invention. The thin-film flip-chip package structure of this embodiment is similar in structure to the thin-film flip-chip package structure 100 of the foregoing embodiment, and the main difference lies in the manufacturing method.

請參照圖2A,在本實施例中,可以在可撓性基板120形成圖案化的第一導電層230a。Referring to FIG. 2A, in this embodiment, a patterned first conductive layer 230a may be formed on the flexible substrate 120.

接著,請參照圖2B,在形成圖案化的第一導電層230a之後,可以藉由電鍍、沉積或其他適宜的方法,以於部分的第一導電層230a上形成與第一導電層230a相接觸的第二導電層230b。如此一來,第一導電層230a與第二導電層230b可以構成線路層130的線路132,而未與第二導電層230b相接觸的其餘第一導電層230a可以構成線路層130的內引腳131與外引腳133。Next, referring to FIG. 2B, after forming the patterned first conductive layer 230a, plating, deposition, or other suitable methods may be used to form contact with the first conductive layer 230a on a portion of the first conductive layer 230a的 second conductive layer 230b. In this way, the first conductive layer 230a and the second conductive layer 230b may constitute the circuit 132 of the circuit layer 130, and the remaining first conductive layer 230a not in contact with the second conductive layer 230b may constitute the inner pin of the circuit layer 130 131 与 外 针 133.

接著,可以接續類似於圖1D至圖1F所繪示的製作方法,以完成本實施例的薄膜覆晶封裝結構。Then, a manufacturing method similar to that shown in FIGS. 1D to 1F can be continued to complete the thin film flip-chip package structure of this embodiment.

圖3是依照本新型創作的第三實施例的一種薄膜覆晶封裝結構的剖面示意圖。本實施例的薄膜覆晶封裝結構300與前述實施例的薄膜覆晶封裝結構100相似,主要差別在於:封裝層380位於可撓性線路載板110與晶片170之間,以包覆內引腳131、連接端子160以及晶片170的主動面171,且更包覆晶片170的晶片背面172。FIG. 3 is a schematic cross-sectional view of a thin-film flip-chip packaging structure according to a third embodiment of the invention. The thin-film flip-chip packaging structure 300 of this embodiment is similar to the thin-film flip-chip packaging structure 100 of the previous embodiment, the main difference is that the packaging layer 380 is located between the flexible circuit carrier 110 and the chip 170 to cover the inner leads 131, the connection terminal 160 and the active surface 171 of the wafer 170, and further covers the back surface 172 of the wafer 170.

綜上所述,在本新型創作的薄膜覆晶封裝結構中,晶片是藉由覆晶接合的方式與線路層的內引腳電性連接,且內引腳的最大厚度小於線路的最大厚度。因此,在薄膜覆晶封裝結構的製造過程或是成品中,可以降低線路層與可撓性基板剝離的可能。如此一來,薄膜覆晶封裝結構可以具有較佳的良率及可靠度。In summary, in the thin-film flip-chip package structure created by the novel, the chip is electrically connected to the inner pins of the circuit layer by flip-chip bonding, and the maximum thickness of the inner pins is less than the maximum thickness of the circuit. Therefore, in the manufacturing process or finished product of the thin film flip chip packaging structure, the possibility of peeling of the circuit layer and the flexible substrate can be reduced. In this way, the thin film flip chip packaging structure can have better yield and reliability.

雖然本新型創作已以實施例揭露如上,然其並非用以限定本新型創作,任何所屬技術領域中具有通常知識者,在不脫離本新型創作的精神和範圍內,當可作些許的更動與潤飾,故本新型創作的保護範圍當視後附的申請專利範圍所界定者為準。Although the new creation has been disclosed as above with examples, it is not intended to limit the creation of the new creation. Anyone with ordinary knowledge in the technical field of the subject can make some changes and without departing from the spirit and scope of the new creation. Retouch, so the scope of protection of this new creation shall be subject to the scope defined in the appended patent application.

100、300‧‧‧薄膜覆晶封裝結構
110‧‧‧可撓性線路載板
120‧‧‧可撓性基板
120a‧‧‧表面
120b‧‧‧側邊
120h‧‧‧可撓性基板的厚度
121‧‧‧晶片接合區
130‧‧‧線路層
130a‧‧‧導電層
130b‧‧‧圖案化導電層
130c‧‧‧開口
131‧‧‧內引腳
131h‧‧‧內引腳的最大厚度
131a‧‧‧第一上表面
131b‧‧‧第一下表面
132‧‧‧線路
132h‧‧‧線路的最大厚度
132a‧‧‧第二上表面
132b‧‧‧第二下表面
133‧‧‧外引腳
133h‧‧‧外引腳的最大厚度
133a‧‧‧第三上表面
133b‧‧‧第三下表面
140‧‧‧助焊層
150‧‧‧防焊層
151‧‧‧開口
160‧‧‧連接端子
170‧‧‧晶片
171‧‧‧主動面
172‧‧‧晶片背面
180、380‧‧‧封裝層
230a‧‧‧第一導電層
230b‧‧‧第二導電層
100、300‧‧‧thin film flip chip packaging structure
110‧‧‧ Flexible circuit carrier board
120‧‧‧Flexible substrate
120a‧‧‧Surface
120b‧‧‧Side
120h‧‧‧Thickness of flexible substrate
121‧‧‧ Wafer bonding area
130‧‧‧ line layer
130a‧‧‧conductive layer
130b‧‧‧patterned conductive layer
130c‧‧‧ opening
131‧‧‧Inner pin
131h‧‧‧The maximum thickness of the inner lead
131a‧‧‧First upper surface
131b‧‧‧First lower surface
132‧‧‧ Line
132h‧‧‧Maximum thickness of the line
132a‧‧‧Second upper surface
132b‧‧‧Second lower surface
133‧‧‧External pin
133h‧‧‧Maximum thickness of external pin
133a‧‧‧third upper surface
133b‧‧‧third lower surface
140‧‧‧Welding layer
150‧‧‧Soldering layer
151‧‧‧ opening
160‧‧‧Connecting terminal
170‧‧‧chip
171‧‧‧ active surface
172‧‧‧chip back
180, 380‧‧‧ encapsulation layer
230a‧‧‧first conductive layer
230b‧‧‧Second conductive layer

圖1A至圖1G是依照本新型創作的第一實施例的一種薄膜覆晶封裝結構的製作方法的剖面示意圖。 圖1H是依照本新型創作的第一實施例的一種薄膜覆晶封裝結構的上視示意圖。 圖2A至圖2B是依照本新型創作的第二實施例的一種薄膜覆晶封裝結構的部分製作方法的剖面示意圖。 圖3是依照本新型創作的第三實施例的一種薄膜覆晶封裝結構的剖面示意圖。FIGS. 1A to 1G are schematic cross-sectional views of a method for manufacturing a thin film flip-chip package structure according to the first embodiment of the present invention. FIG. 1H is a schematic top view of a thin-film flip-chip packaging structure according to the first embodiment of the present invention. 2A-2B are schematic cross-sectional views of a part of a method for manufacturing a thin film flip chip package structure according to a second embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a thin-film flip-chip packaging structure according to a third embodiment of the invention.

Claims (10)

一種薄膜覆晶封裝結構,包括: 可撓性線路載板,包括: 可撓性基板,具有晶片接合區;以及 線路層,配置於所述可撓性基板上,其中所述線路層包括多個內引腳、多個線路及多個外引腳,所述多個內引腳對應於所述晶片接合區配置,所述多個線路圍繞所述多個內引腳,多個線路位於所述多個外引腳與所述多個內引腳之間,且所述多個內引腳的最大厚度小於所述多個線路的最大厚度; 晶片,配置於所述可撓性線路載板上且位於所述晶片接合區內,且所述晶片電性連接於所述多個內引腳;以及 防焊層,位於所述線路層上,且暴露出所述多個內引腳與所述多個外引腳。A thin film flip-chip packaging structure includes: a flexible circuit carrier board, including: a flexible substrate with a wafer bonding area; and a circuit layer disposed on the flexible substrate, wherein the circuit layer includes a plurality of An inner pin, a plurality of lines, and a plurality of outer pins, the plurality of inner pins corresponding to the die bonding area configuration, the plurality of lines surround the plurality of inner pins, and the plurality of lines are located in the Between a plurality of outer pins and the plurality of inner pins, and the maximum thickness of the plurality of inner pins is smaller than the maximum thickness of the plurality of circuits; the chip is disposed on the flexible circuit carrier board And located in the bonding area of the chip, and the chip is electrically connected to the plurality of inner pins; and a solder resist layer is positioned on the circuit layer, and exposes the plurality of inner pins and the Multiple external pins. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,其中所述線路結構的楊氏模量大於所述可撓性基板的楊氏模量。The thin film flip chip packaging structure as described in item 1 of the patent application range, wherein the Young's modulus of the circuit structure is greater than the Young's modulus of the flexible substrate. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,所述多個內引腳的最大厚度與所述多個線路的最大厚度的比值介於20%至90%。As in the thin-film flip-chip packaging structure described in item 1 of the patent application range, the ratio of the maximum thickness of the plurality of inner leads to the maximum thickness of the plurality of circuits is between 20% and 90%. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,其中所述線路層為單一模層。The thin film flip-chip packaging structure as described in item 1 of the patent scope, wherein the circuit layer is a single mold layer. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,更包括: 助焊層,覆蓋於所述線路層上,且所述助焊層的材質不同於所述線路層的材質。The thin-film flip-chip packaging structure as described in item 1 of the patent application scope further includes: a soldering layer covering the circuit layer, and the material of the soldering layer is different from the material of the circuit layer. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,更包括: 多個連接端子,位於所述晶片與所述可撓性線路載板之間,且所述晶片藉由所述多個連接端子電性連接至所述線路層。The thin-film flip-chip packaging structure as described in item 1 of the patent application scope further includes: a plurality of connection terminals between the chip and the flexible circuit carrier board, and the chip passes the plurality of The connection terminal is electrically connected to the circuit layer. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,其中所述內引腳具有第一上表面,多個線路具有第二上表面,多個所述且所述第一上表面與所述第二上表面不共面。The thin film flip-chip packaging structure as described in item 1 of the patent application scope, wherein the inner leads have a first upper surface, a plurality of wires have a second upper surface, a plurality of the first upper surface and all The second upper surface is not coplanar. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,其中所述多個外引腳的最大厚度小於所述多個線路的最大厚度。The thin film flip-chip packaging structure as described in item 1 of the patent application range, wherein the maximum thickness of the plurality of external leads is smaller than the maximum thickness of the plurality of circuits. 如申請專利範圍第1項所述的薄膜覆晶封裝結構,更包括: 封裝層,至少位於所述可撓性線路載板與所述晶片之間,且包覆所述多個內引腳。The thin film flip-chip packaging structure as described in item 1 of the scope of the patent application further includes: a packaging layer located at least between the flexible circuit carrier and the chip and covering the plurality of inner leads. 如申請專利範圍第9項所述的薄膜覆晶封裝結構,其中所述封裝層更包覆所述晶片。The thin film flip chip packaging structure as described in item 9 of the patent application range, wherein the packaging layer further covers the wafer.
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