TWM511121U - Passive component with the terminal electrode - Google Patents

Passive component with the terminal electrode Download PDF

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Publication number
TWM511121U
TWM511121U TW104210229U TW104210229U TWM511121U TW M511121 U TWM511121 U TW M511121U TW 104210229 U TW104210229 U TW 104210229U TW 104210229 U TW104210229 U TW 104210229U TW M511121 U TWM511121 U TW M511121U
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Taiwan
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region
face region
electrode
layer
electrodes
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TW104210229U
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Chinese (zh)
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Min-Ho Hsiao
Pang-Yen Lee
Yen-Hao Tseng
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Wafer Mems Co Ltd
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Priority to TW104210229U priority Critical patent/TWM511121U/en
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Description

具有端電極之被動元件Passive component with terminal electrodes

本新型是有關於一種被動元件,特別是指一種具有端電極之被動元件。The present invention relates to a passive component, and more particularly to a passive component having a terminal electrode.

以目前市面上之被動元件的電感器舉例來說,其主要可分為薄膜式(thin film)、積層式(multilayer)及繞線式(wire wound)。如台灣第TW 201440090 A早期公開號發明專利案(以下稱前案1)所公開的一種積層式電感器1(見圖1)及其製造方法(見圖2至圖7)。For example, an inductor of a passive component currently on the market can be mainly classified into a thin film, a multilayer, and a wire wound. A laminated inductor 1 (see FIG. 1) and a method of manufacturing the same (see FIGS. 2 to 7) disclosed in Taiwan Patent Publication No. TW 201440090 A (hereinafter referred to as the first example).

該積層式電感器1的製造方法,包含以下步驟:(A)由下而上依序積層壓接一第一電路陶瓷母片110、一第二電路陶瓷母片120、一第三電路陶瓷母片130,及一第四電路陶瓷母片140(如圖2所示);(B)令一表面塗佈有一焊墊電極(bonding pad)1501陣列的載膜150,面向該第一電路陶瓷母片110的一第一預定電路圖案1120陣列設置(如圖3所示);(C)將該焊墊電極1501陣列轉印至該第一電路陶瓷母片110上的第一預定電路圖案1120陣列從而構成一第一電路圖案112陣列(如圖4所示);(D)剝離該載膜150(如圖5所示);(E)燒結該等電路陶瓷母片110、120、130、 140以構成一集合基板100(如圖6所示),且該集合基板100的厚度是控制在0.6mm以下;及(F)以一刻劃具160對該集合基板100施予刻劃,令該集合基板100被分割成多數個條狀積層體10及,且令集合基板100內的第一電路圖案112陣列被分割成多數個第一電路圖案112並構成如圖1所示的積層式電感器1。The manufacturing method of the laminated inductor 1 includes the following steps: (A) sequentially laminating a first circuit ceramic mother substrate 110, a second circuit ceramic mother substrate 120, and a third circuit ceramic mother from bottom to top. a chip 130, and a fourth circuit ceramic mother chip 140 (shown in FIG. 2); (B) a surface coated with a carrier film 150 of an array of bonding pads 1501 facing the first circuit ceramic mother A first predetermined circuit pattern 1120 of the chip 110 is arranged in an array (as shown in FIG. 3); (C) an array of the pad electrode 1501 is transferred to the first predetermined circuit pattern 1120 on the first circuit ceramic mother substrate 110. Thereby forming an array of first circuit patterns 112 (as shown in FIG. 4); (D) stripping the carrier film 150 (as shown in FIG. 5); (E) sintering the circuit ceramic mother chips 110, 120, 130, 140 to form a collective substrate 100 (shown in FIG. 6), and the thickness of the collective substrate 100 is controlled to be less than 0.6 mm; and (F) to scribe the collective substrate 100 with a scribing tool 160, The collective substrate 100 is divided into a plurality of strip-shaped laminated bodies 10 and the first circuit pattern 112 array in the collective substrate 100 is divided into a plurality of first circuit patterns 112 and constitutes a laminated inductor as shown in FIG. Device 1.

如圖1所示,經該步驟(F)所刻劃出的該積層式電感器1由下而上依序包含:一第一電路陶瓷片11、一第二電路陶瓷片12、一第三電路陶瓷片13,及一第四電路陶瓷片14。該第一電路陶瓷片11具有一非磁性體111,及該配置於該第一電路陶瓷片11之非磁性體111中的第一電路圖案112。該第二電路陶瓷片12與該第三電路陶瓷片13分別具有一磁性體121、131,及一分別配置於其磁性體121、131中的第二電路圖案122與第三電路圖案132。該第四電路陶瓷片14具有一非磁性體141,及一配置於該第四電路陶瓷片14之非磁性體141中的第四電路圖案142。As shown in FIG. 1 , the laminated inductor 1 delineated by the step (F) is sequentially included from bottom to top: a first circuit ceramic piece 11, a second circuit ceramic piece 12, and a third. The circuit ceramic piece 13, and a fourth circuit ceramic piece 14. The first circuit ceramic piece 11 has a non-magnetic body 111 and a first circuit pattern 112 disposed in the non-magnetic body 111 of the first circuit ceramic piece 11. The second circuit ceramic piece 12 and the third circuit ceramic piece 13 respectively have a magnetic body 121, 131, and a second circuit pattern 122 and a third circuit pattern 132 respectively disposed in the magnetic bodies 121, 131 thereof. The fourth circuit ceramic piece 14 has a non-magnetic body 141 and a fourth circuit pattern 142 disposed in the non-magnetic body 141 of the fourth circuit ceramic piece 14.

該積層式電感器1是利用該等電路陶瓷片11、12、13、14的電路圖案112、122、132、142以共同構成一內繞式的線圈。然而,詳細地來說,於執行該步驟(A)之前,是分別依序對多數陶瓷母片(圖未示)貫孔以於各陶瓷母片形成多數通孔、於各通孔內填置導電糊以形成多數導通導體,以及在各陶瓷母片上塗置導電糊以形成各電路圖案112、122、132、142等多道程序,才可製得各電路陶瓷母片110、120、130、140。此外,在執行完該步驟(E)的燒結處 理與該步驟(F)之刻畫後才可取得各積層式電感器1之積層體10的外觀面。The laminated inductor 1 is formed by using the circuit patterns 112, 122, 132, and 142 of the circuit ceramic sheets 11, 12, 13, and 14 to form an inner winding type coil. However, in detail, before performing this step (A), a plurality of ceramic mother sheets (not shown) are sequentially formed to form a plurality of through holes for each ceramic mother sheet, and are filled in the respective through holes. The conductive paste is used to form a plurality of conductive conductors, and a conductive paste is applied on each of the ceramic mother sheets to form a plurality of circuits such as circuit patterns 112, 122, 132, and 142, so that the circuit ceramic mother sheets 110, 120, and 130 can be obtained. 140. In addition, after performing the sintering of this step (E) The appearance of the layered body 10 of each laminated inductor 1 can be obtained only after the characterization of the step (F).

就製程面來說,構成該內繞式的線圈需經過四道的貫孔程序、四道的填置導電糊程序、四道的塗佈導電糊以形成各電路圖案112、122、132、142程序,與一道步驟(E)之燒結處理等十三道程序。因此,前案1的製作程序相當繁瑣,導致製造時所需耗費的時間成本提升。再者,因為積層體10是經堆疊燒結該等電路陶瓷母片110、120、130、140並施予刻劃後所取得,使該積層式電感器1體積(最大厚度達0.6mm)也隨之提高,而不利於安排至該電路板上的布局。除此之外,由於該內繞式線圈是由各電路陶瓷片11、12、13、14的電路圖案112、122、132、142所構成,各電路圖案112、122、132、142間之非連續的界面易產生非歐姆式接觸(non-ohmic contact)或增加阻抗而產生額外的電熱效應(Joule-heating),皆不利於電感器的運作。In the case of the process surface, the coils constituting the inner winding type are subjected to four through-hole programs, four-way filling conductive paste programs, and four coated conductive pastes to form respective circuit patterns 112, 122, 132, and 142. The program, with a step (E) of the sintering process and other 13 procedures. Therefore, the production procedure of the first case 1 is rather cumbersome, resulting in an increase in the time and cost required for manufacturing. Furthermore, since the laminated body 10 is obtained by stacking and sintering the circuit ceramic mother sheets 110, 120, 130, and 140, the volume of the laminated inductor 1 (maximum thickness of 0.6 mm) is also The improvement is not conducive to the layout to the board. In addition, since the inner wound coil is composed of circuit patterns 112, 122, 132, and 142 of the circuit ceramic sheets 11, 12, 13, and 14, the circuit patterns 112, 122, 132, and 142 are different. Continuous interfaces tend to produce non-ohmic contacts or increase impedance to create additional Joule-heating, which is detrimental to the operation of the inductor.

以一薄膜式電感器的製作方法來說,其通常是經過一下層線圈形成步驟、一中間層形成步驟、一頂電極形成步驟、一底電極形成步驟,與一保護層形成步驟等五道步驟,以初步地完成一薄膜式電感器陣列。詳細地來說,前述下層線圈形成步驟、頂電極形成步驟與底電極形成步驟則分別需要經過十道、六道與六道等次程序,製程相當繁瑣。In the manufacturing method of a thin film inductor, it is usually a five-step process such as a lower layer coil forming step, an intermediate layer forming step, a top electrode forming step, a bottom electrode forming step, and a protective layer forming step. To initially complete a thin film inductor array. In detail, the lower layer coil forming step, the top electrode forming step, and the bottom electrode forming step respectively require ten, six, and six passes, and the process is rather cumbersome.

此外,該薄膜式電感器陣列仍需經過一雷射切 割程序,以於該薄膜式電感器陣列上形成多數條彼此交錯的縱向切槽與橫向切槽後,再沿著各縱向切槽折斷該薄膜式電感器陣列以成多數條狀電感器陣列(稱為條狀剝離程序;stick breaking)。於實施完條狀剝離程序後,繼續於各條狀電感器陣列之相反兩長邊的端面上進行端面著膜程序以形成兩縱向端電極。接著,沿著各條狀電感器陣列上的各橫向切槽折斷以令各條狀電感器陣列成為多數粒狀體(稱為粒狀剝離程序,chip breaking),且原位處於各條狀電感器陣列之縱向端電極經粒狀剝離後則成為各粒狀體之兩縱向端電極區。最後,於各粒狀體之剩餘兩端面進行電鍍程序以於各粒狀體之剩餘兩端面上形成一橫向電極區,令各粒狀體之該兩縱向端電極區與該兩橫向電極區共同構成一薄膜式電感器之一對端電極。如此,各薄膜式電感器才可透過表面接著黏著技術(surface mounting technology,SMT),以分別接合至一電路板上的複數接點供下游廠商應用。In addition, the thin film inductor array still needs to undergo a laser cut Cutting the program to form a plurality of longitudinal slits and lateral slots which are staggered with each other on the thin film inductor array, and then break the thin film inductor array along each longitudinal slit to form a plurality of strip inductor arrays ( Called strip stripping procedure; stick breaking). After the strip stripping process is performed, the end face filming process is continued on the end faces of the opposite two long sides of each strip inductor array to form two longitudinal end electrodes. Then, each transverse slot on each strip of inductor array is broken so that each strip of inductor array becomes a majority of granular bodies (called chip breaking), and the strip inductors are in situ. After the longitudinal end electrodes of the array are detached by granularity, they become the two longitudinal end electrode regions of each granule. Finally, a plating process is performed on the remaining two end faces of each granule to form a lateral electrode region on the remaining two end faces of each granule, so that the two longitudinal end electrode regions of each granule are common to the two lateral electrode regions. One of the opposite ends of the thin film inductor is formed. In this way, each of the thin film inductors can be passed through a surface mounting technology (SMT) to be bonded to a plurality of contacts on a circuit board for downstream manufacturers.

根據上述薄膜式電感器之製做方法的詳細說明可知,形成該薄膜式電感器陣列至少需要多達二十二道步驟以上。特別是該等薄膜式電感器之各對端電極難以在同一道程序中完成,其尚需經過雷射切割程序、條狀剝離程序、端面著膜程序、粒裝剝離程序,與電鍍程序等五道程序,對於量產化的效益較低。According to the detailed description of the manufacturing method of the above-mentioned thin film inductor, it is known that the formation of the thin film inductor array requires at least twenty-two steps or more. In particular, it is difficult for the opposite electrodes of the thin film inductors to be completed in the same process, which still requires a laser cutting process, a strip peeling process, a face filming process, a grain stripping process, and a plating process. The procedure is less effective for mass production.

經上述說明可知,簡化被動元件及其端電極的製作方法以降低製作成本,是此技術領域的相關技術人員 所待突破的難題。It can be seen from the above description that simplifying the manufacturing method of the passive component and its terminal electrode to reduce the manufacturing cost is a related technical person in the technical field. The problem to be solved.

因此,本新型之目的,即在提供一種具有端電極之被動元件。Therefore, it is an object of the present invention to provide a passive component having a terminal electrode.

於是,本新型具有端電極之被動元件,包含:一個主體、一個元件層,及一對端電極。該主體是經蝕刻或沖壓一基板所成形取得並包括一輪廓面。該輪廓面具有相反設置的一頂面區與一底面區、相反設置的一第一端面區與一第二端面區,及相反設置的一前面區與一背面區。該第一端面區是銜接於該前面區、該頂面區、該背面區與該底面區,且該第二端面區是銜接於該前面區、該頂面區、該背面區與該底面區以令該主體為一體(unity)者。該元件層設置於該主體。該對端電極彼此互不接觸且分別電連接於該元件層,並分別具有至少兩個區塊。該對端電極之其中一者的該兩區塊,是位於該主體之該第一端面區,且位於鄰近該第一端區之該頂面區及鄰近該第一端面區之該底面區兩者的其中一者,該對端電極之其中另一者的該兩區塊,是位於該主體之該第二端面區,且位於鄰近該第二端面區之該頂面區及鄰近該第二端面區之該底面區兩者的其中一者。該等端電極之該兩區塊皆在同一道步驟中鍍製而成。Thus, the novel passive component having a terminal electrode comprises: a body, a component layer, and a pair of terminal electrodes. The body is formed by etching or stamping a substrate and includes a contoured surface. The contour surface has a top surface area and a bottom surface area disposed oppositely, a first end surface area and a second end surface area disposed oppositely, and a front area and a back side area disposed oppositely. The first end face region is coupled to the front face region, the top face region, the back face region and the bottom face region, and the second end face region is coupled to the front face region, the top face region, the back face region and the bottom face region To make the subject unity. The component layer is disposed on the body. The pair of opposite electrodes are not in contact with each other and are electrically connected to the element layer, respectively, and have at least two blocks, respectively. The two blocks of one of the opposite end electrodes are located in the first end face region of the main body, and are located in the top end region adjacent to the first end region and the bottom surface region adjacent to the first end face region Or one of the two opposite ends of the opposite end electrode is located in the second end face region of the main body and located adjacent to the top end region of the second end face region and adjacent to the second block One of the bottom regions of the end face region. The two blocks of the terminal electrodes are plated in the same step.

本新型之功效在於,呈一體結構之主體,可在同一道步驟中於該主體之呈立體態的輪廓面上鍍出該對端電極的該兩區塊,就被動元件的結構強度面來看,結構強 度高。The effect of the novel is that the main body of the unitary structure can be plated on the three-dimensional contour surface of the main body in the same step, and the two parts of the opposite end electrode are plated. Strong structure High degree.

2‧‧‧具有端電極之被動元件2‧‧‧ Passive components with terminal electrodes

20‧‧‧基板20‧‧‧Substrate

200‧‧‧基座200‧‧‧Base

201‧‧‧上表面201‧‧‧ upper surface

202‧‧‧下表面202‧‧‧lower surface

203‧‧‧輪廓面203‧‧‧ contour surface

204‧‧‧第一側緣204‧‧‧First side edge

205‧‧‧第二側緣205‧‧‧second side edge

21‧‧‧主體21‧‧‧ Subject

210‧‧‧輪廓面210‧‧‧ contour surface

211‧‧‧頂面區211‧‧‧Top area

212‧‧‧底面區212‧‧‧ bottom area

213‧‧‧第一端面區213‧‧‧First end zone

214‧‧‧第二端面區214‧‧‧second end zone

215‧‧‧前面區215‧‧‧ front area

216‧‧‧背面區216‧‧‧Back area

22‧‧‧連接部22‧‧‧Connecting Department

220‧‧‧輪廓面220‧‧‧ contour surface

221‧‧‧第一端221‧‧‧ first end

222‧‧‧第二端222‧‧‧ second end

2221‧‧‧凹槽2221‧‧‧ Groove

23‧‧‧元件層23‧‧‧Component layer

231‧‧‧底電極231‧‧‧ bottom electrode

232‧‧‧介電層232‧‧‧Dielectric layer

233‧‧‧頂電極233‧‧‧ top electrode

24‧‧‧端電極24‧‧‧ terminal electrode

241‧‧‧區塊241‧‧‧ Block

25‧‧‧預形體25‧‧‧Preform

31‧‧‧上光阻層31‧‧‧Upper photoresist layer

310‧‧‧外觀形狀310‧‧‧ appearance shape

32‧‧‧下光阻層32‧‧‧ lower photoresist layer

320‧‧‧外觀形狀320‧‧‧ appearance shape

41‧‧‧線路用前驅物層41‧‧‧Precursor layer for line

411‧‧‧局部區域411‧‧‧Local area

42‧‧‧端電極用前驅物層42‧‧‧Precursor layer for terminal electrodes

421‧‧‧局部區域421‧‧‧Local area

51‧‧‧線路用光阻層51‧‧‧Circuit photoresist layer

511‧‧‧線路圖案區511‧‧‧Line pattern area

52‧‧‧端電極用光阻層52‧‧‧Photoresist layer for terminal electrodes

521‧‧‧端電極圖案區521‧‧‧End electrode pattern area

7‧‧‧電路板7‧‧‧ boards

71‧‧‧接點71‧‧‧Contacts

72‧‧‧焊料72‧‧‧ solder

X‧‧‧第一方向X‧‧‧ first direction

Y‧‧‧第二方向Y‧‧‧second direction

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是一立體分解圖,說明由台灣第TW 201440090 A早期公開號發明專利案所公開的一種積層式電感器;圖2是一截面圖,說明該積層式電感器的製造方法的一步驟(A);圖3是一截面圖,說明該積層式電感器的製造方法的一步驟(B);圖4是一截面圖,說明該積層式電感器的製造方法的一步驟(C);圖5是一截面圖,說明該積層式電感器的製造方法的一步驟(D);圖6是一截面圖,說明該積層式電感器的製造方法的一步驟(E);圖7是一截面圖,說明該積層式電感器的製造方法的一步驟(F);圖8是一立體示意圖,說明本新型具有端電極之被動元件的一第一實施例;圖9是一立體示意圖,說明本新型具有端電極之被動元件的一第二實施例;圖10是一俯視示意圖,說明本新型該第一實施例之具有端電極之被動元件的量產方法之一步驟(a); 圖11是一立體示意圖,說明本新型該第一實施例之量產方法之步驟(a)所成形出的一預形體;圖12是一俯視示意圖,說明本新型該第一實施例之量產方法於實施該步驟(a)時的一細部動做;圖13是由圖12之直線XIII-XIII所取得的一截面圖;圖14是一俯視示意圖,說明本新型該第一實施例之量產方法以濕式蝕刻手段(wet etching)來實施該步驟(a);圖15是由圖14之直線XV-XV所取得的一截面圖;圖16是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(b)之一次步驟(b11);圖17是一立體示意圖,說明本新型該第一實施例之量產方法之該步驟(b)之一次步驟(b12);圖18是一立體示意圖,說明本新型該第一實施例之量產方法之該步驟(b)之一次步驟(b13);圖19是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(b’);圖20是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(c);圖21是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(d);圖22是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(e);圖23是一立體示意圖,說明本新型該第一實施例之量產方法之一步驟(e’); 圖24是一俯視示意圖,說明本新型該第一實施例之量產方法之一步驟(f);圖25是一正視示意圖,說明本新型該第一實施例經由表面黏著技術(SMT)接合至一電路板上的實施態樣;圖26是一立體示意圖,說明本新型該第二實施例之量產方法之一步驟(d);圖27是一立體示意圖,說明本新型該第二實施例之量產方法之一步驟(e);圖28是一立體示意圖,說明本新型該第二實施例之量產方法的一步驟(e’);圖29是一截面圖,說明本新型具有端電極之被動元件的一第三實施例;圖30是一立體示意圖,說明本新型該第三實施例之量產方法之一步驟(b)的一次步驟(b21);圖31是一立體示意圖,說明本新型該第三實施例之量產方法之該步驟(b)的一次步驟(b22);圖32是一立體示意圖,說明本新型該第三實施例之量產方法之該步驟(b)的一次步驟(b23)。Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: FIG. 1 is an exploded perspective view showing a layer disclosed by the Taiwan Patent Publication No. TW 201440090 A. Figure 2 is a cross-sectional view showing a step (A) of the method of manufacturing the laminated inductor; Figure 3 is a cross-sectional view showing a step (B) of the method of manufacturing the laminated inductor; 4 is a cross-sectional view showing a step (C) of the method of manufacturing the laminated inductor; FIG. 5 is a cross-sectional view showing a step (D) of the method of manufacturing the laminated inductor; FIG. 7 is a cross-sectional view showing a step (F) of the manufacturing method of the laminated inductor; FIG. 8 is a perspective view showing a step (F) of the manufacturing method of the laminated inductor; A first embodiment of a passive component having a terminal electrode; FIG. 9 is a perspective view showing a second embodiment of the passive component having a terminal electrode; FIG. 10 is a top plan view showing the novel An embodiment having a terminal electrode Step (a) of one of the mass production methods of passive components; Figure 11 is a perspective view showing a preform formed by the step (a) of the mass production method of the first embodiment of the present invention; and Figure 12 is a top plan view showing the mass production of the first embodiment of the present invention The method is a detailed operation of the step (a); FIG. 13 is a cross-sectional view taken from the line XIII-XIII of FIG. 12; and FIG. 14 is a top plan view showing the amount of the first embodiment of the present invention. The production method is carried out by wet etching (a); FIG. 15 is a cross-sectional view taken from the line XV-XV of FIG. 14; FIG. 16 is a perspective view showing the first One step (b11) of step (b) of the mass production method of the embodiment; FIG. 17 is a perspective view showing a step (b12) of the step (b) of the mass production method of the first embodiment of the present invention. Figure 18 is a perspective view showing the first step (b13) of the step (b) of the mass production method of the first embodiment of the present invention; Figure 19 is a perspective view showing the amount of the first embodiment of the present invention One step (b') of the production method; FIG. 20 is a perspective view showing the first embodiment of the present invention One step (c) of the mass production method; FIG. 21 is a perspective view showing one step (d) of the mass production method of the first embodiment of the present invention; FIG. 22 is a perspective view showing the first embodiment of the present invention One step (e) of the mass production method; FIG. 23 is a perspective view showing one step (e') of the mass production method of the first embodiment of the present invention; Figure 24 is a top plan view showing one step (f) of the mass production method of the first embodiment of the present invention; Figure 25 is a front elevational view showing the first embodiment of the present invention bonded to the surface by adhesion technique (SMT) FIG. 26 is a perspective view showing one step (d) of the mass production method of the second embodiment of the present invention; FIG. 27 is a perspective view showing the second embodiment of the present invention. One step (e) of the mass production method; FIG. 28 is a perspective view showing a step (e') of the mass production method of the second embodiment of the present invention; FIG. 29 is a cross-sectional view showing the novel end A third embodiment of the passive component of the electrode; FIG. 30 is a perspective view showing a first step (b21) of step (b) of one of the mass production methods of the third embodiment of the present invention; FIG. 31 is a perspective view of A first step (b22) of the step (b) of the mass production method of the third embodiment of the present invention; FIG. 32 is a perspective view showing the step (b) of the mass production method of the third embodiment of the present invention. One step (b23).

在本新型被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

參閱圖8,本新型具有端電極之被動元件2的一第一實施例,包含:一個主體21、一個元件層23,及一對端電極24。Referring to FIG. 8, a first embodiment of the passive component 2 having a terminal electrode includes a body 21, a component layer 23, and a pair of terminal electrodes 24.

該主體21是經蝕刻或沖壓一基板(圖未示)所成形取得,並包括一輪廓面210。該輪廓面210具有相反設置的一頂面區211與一底面區212、相反設置的一第一端面區213與一第二端面區214,及相反設置的一前面區215與一背面區216。該第一端面區213是銜接於該前面區215、該頂面區211、該背面區216與該底面區212,且該第二端面區214是銜接於該前面區215、該頂面區211、該背面區216與該底面區215,以令該主體21為一體者。The body 21 is formed by etching or stamping a substrate (not shown) and includes a contoured surface 210. The contour surface 210 has a top surface area 211 and a bottom surface area 212 disposed oppositely, a first end surface area 213 and a second end surface area 214 disposed opposite thereto, and a front surface area 215 and a back surface area 216 disposed opposite thereto. The first end face region 213 is coupled to the front face region 215, the top face region 211, the back face region 216 and the bottom face region 212, and the second end face region 214 is coupled to the front face region 215, the top face region 211 The back surface area 216 and the bottom surface area 215 are such that the main body 21 is integrated.

此處需補充說明的是,本新型具有端電極之被動元件2主要是透過微機電系統(MEMS)的製程來量產化。因此,上述一體者是被定義為一體結構。此外,所謂的一體結構,是指該主體21是經由蝕或沖壓一塊材(bulk matter)所成形取得,以致於該主體21結構強度高,且內部不存在有層間剝離的問題。該塊材可以是一板狀的塊材,如,石英基板(quartz wafer)。關於本新型具有端電極之被動元件2的相關量產方法,則容後說明。It should be additionally noted here that the passive component 2 having the terminal electrode is mainly mass-produced through a microelectromechanical system (MEMS) process. Therefore, the above-mentioned one is defined as a unitary structure. Further, the so-called integral structure means that the main body 21 is formed by etching or stamping a bulk matter, so that the main body 21 has a high structural strength and there is no problem of interlayer peeling inside. The block may be a plate-like block such as a quartz wafer. A related mass production method of the passive component 2 having the terminal electrode of the present invention will be described later.

該元件層23設置於該主體21。在本新型該第一實施例中,該元件層23是以如圖8所示之一線圈為例做說明,但並不限於此。該元件層(也就是該線圈)23是圍繞於該主體21之該前面區215、該頂面區211、該背面區216與該底面區212,且該元件層23之相反兩端是分別連接於該對端電極24。換句話說,本新型該第一實施例之被動元件2可為一電感器或一電阻器。在本新型該第一實施例中,該具有端電極之被動元件2是以電感器為例做說明。The element layer 23 is disposed on the body 21. In the first embodiment of the present invention, the element layer 23 is exemplified by a coil as shown in FIG. 8, but is not limited thereto. The element layer (that is, the coil) 23 is surrounded by the front area 215 of the main body 21, the top surface area 211, the back surface area 216 and the bottom surface area 212, and the opposite ends of the element layer 23 are respectively connected At the opposite end electrode 24. In other words, the passive component 2 of the first embodiment of the present invention can be an inductor or a resistor. In the first embodiment of the present invention, the passive component 2 having the terminal electrode is exemplified by an inductor.

該對端電極24彼此互不接觸且分別電連接於該元件層23,並分別具有至少兩個彼此連接的區塊241。該對端電極24之其中一者的該兩區塊241,是位於該主體21之該第一端面區213,且位於鄰近該第一端區213之該頂面區211,及鄰近該第一端區213之該底面區212兩者的其中一者,該對端電極24之其中另一者的該等區塊241,是位於該主體21之該第二端面區214,且位於鄰近該第二端區214之該頂面區211,及鄰近該第二端區214之該底面區212兩者的其中一者。在本新型該第一實施例中,該對端電極24之其中一者(見顯示於圖8左側的端電極24)的該兩區塊241,是分別位於該主體21之該第一端面區213及鄰近該第一端區213之該底面區212,且該對端電極24之其中另一者(見顯示於圖8右側的端電極24)的該等區塊241,是分別位於該主體21之該第二端面區214及鄰近該第二端區214之該底面區212,且該等端電極24之該兩區塊241皆在同一道步驟中鍍製而成。The opposite end electrodes 24 are not in contact with each other and are electrically connected to the element layer 23, respectively, and have at least two blocks 241 connected to each other. The two blocks 241 of the one of the pair of end electrodes 24 are located in the first end face region 213 of the main body 21, and are located adjacent to the top end region 211 of the first end region 213, and adjacent to the first One of the bottom regions 212 of the end regions 213, the other of the pair of electrodes 24, the second block 214, located in the second end face region 214 of the body 21, and adjacent to the first The top surface region 211 of the two end region 214 and one of the bottom surface regions 212 adjacent the second end region 214. In the first embodiment of the present invention, the two blocks 241 of one of the pair of terminal electrodes 24 (see the terminal electrode 24 shown on the left side of FIG. 8) are respectively located in the first end face region of the body 21. 213 and the bottom surface region 212 adjacent to the first end region 213, and the other of the opposite end electrodes 24 (see the terminal electrode 24 shown on the right side of FIG. 8) are located in the main body The second end face region 214 of the second end region 214 is adjacent to the bottom end region 212 of the second end region 214, and the two blocks 241 of the end electrodes 24 are plated in the same step.

較佳地,該主體21是由一磁性材料或一非磁性材料所構成;該磁性材料是選自一磁性金屬或一磁性陶磁,該非磁性材料是選自一以矽為主的材料或一金屬材料。Preferably, the main body 21 is made of a magnetic material or a non-magnetic material; the magnetic material is selected from a magnetic metal or a magnetic ceramic material, and the non-magnetic material is selected from a bismuth-based material or a metal. material.

適用於本新型該第一實施例之磁性金屬可以是鐵(Fe)、鈷(Co)或鎳(Ni)。適用於本新型該第一實施例之磁性陶磁可以是具有反尖晶石結構(inverses spinel structure)的鐵氧磁體(ferrite;Fe3 O4 )。舉例來說,當構成本新型該第一實施例之被動元件之電感器的本體21之磁性材料是選 自鐵氧磁體時,則本新型該第一實施例之電感器是一磁芯電感器(magnetic-core inductor)。又,適用於本新型該第一實施例之該以矽為主的材料可以是石英、矽晶圓(Si wafer)、氮化矽(Si3 N4 )或碳化矽(SiC);適用於本新型該第一實施例之金屬材料可以是銅(Cu)。舉例來說,當構成本新型該第一實施例之被動元件之電感器的本體21的非磁性材料是選自石英時;那麼,本新型該第一實施例之電感器則為一空芯電感器(air-core inductor)。The magnetic metal suitable for the first embodiment of the present invention may be iron (Fe), cobalt (Co) or nickel (Ni). The magnetic ceramic which is suitable for the first embodiment of the present invention may be a ferrite magnet (Fe 3 O 4 ) having an inverse spinel structure. For example, when the magnetic material of the body 21 constituting the inductor of the passive component of the first embodiment of the present invention is selected from a ferrite magnet, the inductor of the first embodiment of the present invention is a magnetic core inductor. (magnetic-core inductor). Moreover, the material based on the first embodiment of the present invention may be quartz, germanium wafer (Si wafer), tantalum nitride (Si 3 N 4 ) or tantalum carbide (SiC); The metal material of the new first embodiment may be copper (Cu). For example, when the non-magnetic material of the body 21 constituting the inductor of the passive component of the first embodiment of the present invention is selected from quartz; then, the inductor of the first embodiment of the present invention is a hollow core inductor. (air-core inductor).

經上述兩段的詳細說明可知,適用於本新型該第一實施例之主體21的材料,可以是磁性金屬或磁性陶瓷等磁性材料,也可以是以矽為主的材料或金屬材料等非磁性材料。但有條件的是,當該磁性材料是選自該磁性金屬或該非磁性材料是選自該金屬材料時,該主體21的輪廓面210上是覆蓋有一絕緣層(圖未示),以防止該元件層(也就是線圈)23因直接接觸該磁性金屬或該金屬材料而產生短路問題。As can be seen from the detailed description of the above two paragraphs, the material applicable to the main body 21 of the first embodiment of the present invention may be a magnetic material such as a magnetic metal or a magnetic ceramic, or a non-magnetic material such as a bismuth-based material or a metal material. material. However, it is a condition that when the magnetic material is selected from the magnetic metal or the non-magnetic material is selected from the metal material, the contour surface 210 of the main body 21 is covered with an insulating layer (not shown) to prevent the magnetic material from being selected from the metal material. The element layer (i.e., the coil) 23 causes a short circuit problem due to direct contact with the magnetic metal or the metal material.

參閱圖9,本新型具有端電極之被動元件2的第二實施例,大致上是相同於該第一實施例,其不同處是在於,本新型該第二實施例之各端電極24之區塊241的數量是三個。該對端電極24之其中一者(見顯示於圖9左側的端電極24)的該等區塊241,是分別位於該主體21之該第一端面區213、鄰近該第一端區213之該頂面區211及鄰近該第一端區213之該底面區212,且該對端電極24之其中另一者(見顯示於圖9右側的端電極24)的該等區塊241,是 分別位於該主體21之該第二端面區214、鄰近該第二端區214之該頂面區211及鄰近該第二端區214之該底面區212。Referring to FIG. 9, a second embodiment of the passive component 2 having a terminal electrode is substantially the same as the first embodiment, and the difference lies in the region of each terminal electrode 24 of the second embodiment of the present invention. The number of blocks 241 is three. The blocks 241 of one of the pair of electrodes 24 (see the terminal electrode 24 shown on the left side of FIG. 9) are respectively located in the first end face region 213 of the main body 21 adjacent to the first end region 213. The top surface region 211 and the bottom surface region 212 adjacent to the first end region 213, and the other of the pair of terminal electrodes 24 (see the terminal electrode 24 shown on the right side of FIG. 9) are The second end face region 214 of the main body 21, the top end region 211 adjacent to the second end region 214, and the bottom surface region 212 adjacent to the second end region 214 are respectively located.

本新型具有端電極之被動元件2的該第一實施例的量產方法,是以微機電系統(MEMS)製程來量產出如圖8所示之具有端電極之被動元件2。本新型該第一實施例之量產方法依序包含:一步驟(a)、一步驟(b)、一步驟(b’)、一步驟(c)、一步驟(d)、一步驟(e)、一步驟(e’),及一步驟(f)。The mass production method of the first embodiment of the novel passive element 2 having a terminal electrode is a passive electromechanical system (MEMS) process for producing a passive component 2 having a terminal electrode as shown in FIG. The mass production method of the first embodiment of the present invention comprises: a step (a), a step (b), a step (b'), a step (c), a step (d), and a step (e). ), one step (e'), and one step (f).

參閱圖10與圖11,該步驟(a)是以一蝕刻法或一沖壓法使該基板20成形出一預形體25陣列。各預形體25沿一第一方向X具有彼此連接的一基座200、至少一連接部22及一如上所述的主體21。該預形體25陣列中之該等主體21是沿該第一方向X或沿一與該第一方向X夾一預定角度的第二方向Y彼此間隔排列。各基座200與各連接部22分別具有一輪廓面203、220。各基座200之輪廓面203包括相反設置的一第一側緣204及一第二側緣205,且各連接部22的輪廓面220包括相反設置的一第一端221與一第二端222。各連接部22的第一端221與第二端222是分別對應連接於各基座200的第二側緣205與各主體21的第一端面區213,以令各連接部22的輪廓面220是對應銜接於各主體21的輪廓面210與各基座200的輪廓面203。Referring to Figures 10 and 11, the step (a) is to form the substrate 20 into an array of preforms 25 by an etching method or a stamping method. Each of the preforms 25 has a base 200, at least one connecting portion 22, and a body 21 as described above, which are connected to each other along a first direction X. The bodies 21 in the array of preforms 25 are spaced apart from each other along the first direction X or along a second direction Y that is at a predetermined angle to the first direction X. Each of the susceptor 200 and each of the connecting portions 22 has a contoured surface 203, 220. The contoured surface 203 of each of the pedestals 200 includes a first side edge 204 and a second side edge 205 which are oppositely disposed, and the contoured surface 220 of each connecting portion 22 includes a first end 221 and a second end 222 which are oppositely disposed. . The first end 221 and the second end 222 of each connecting portion 22 are respectively connected to the second side edge 205 of each base 200 and the first end surface region 213 of each main body 21, so that the contour surface 220 of each connecting portion 22 is It is corresponding to the contour surface 210 of each main body 21 and the contour surface 203 of each susceptor 200.

在本新型該第一實施例之量產方法中,該基板20所適用的材料是相同於上述主體21,於此不再多加贅述 ;該預定角度是以90度為例作說明,但不以此為限;該預形體25陣列中的該等預形體25是如圖10所示,沿該第一方向X彼此間隔排列,且該預形體25陣列中的該等預形體25之主體21是沿該第二方向Y彼此間隔排列,該等基座200是沿該第二方向Y彼此連接;各預形體25之連接部22的數量是兩個,各預形體25之該等連接部22是沿該第二方向Y彼此間隔排列,各連接部22的一寬度是沿該第一方向X遞減。In the mass production method of the first embodiment of the present invention, the material to which the substrate 20 is applied is the same as the main body 21, and no further description is provided herein. The predetermined angle is exemplified by 90 degrees, but is not limited thereto; the preforms 25 in the array of the preforms 25 are arranged along the first direction X as shown in FIG. 10, and The main bodies 21 of the preforms 25 in the array of the preforms 25 are spaced apart from each other along the second direction Y, and the susceptors 200 are connected to each other along the second direction Y; the connecting portions 22 of the pre-forms 25 are The number is two, and the connecting portions 22 of the preforms 25 are spaced apart from each other along the second direction Y, and a width of each connecting portion 22 is decreased along the first direction X.

較佳地,各連接部22於鄰近其第二端222處具有至少一凹槽2221,各凹槽2221是自其連接部22之輪廓面220的一頂面區及其一底面區兩者其中一者,朝其底面區及其頂面區兩者其中另一者延伸,且是自其連接部22之輪廓面220沿該第二方向Y凹陷。在本新型該第一實施例之量產方法中,各連接部22的凹槽2221數量是兩個,各連接部22之該兩凹槽2221其中一者(見顯示於圖11上方的凹槽2221)是自其連接部22之輪廓面220的頂面區朝其底面區延伸,且各連接部22之該兩凹槽2221其中另一者(見顯示於圖11下方的凹槽2221)是自其連接部22之輪廓面220的底面區朝其頂面區延伸。各連接部22之寬度沿該第一方向X遞減以及位處於各連接部22處之凹槽2221於本新型該第一實施例之量產方法中的目的,則容後說明。Preferably, each connecting portion 22 has at least one groove 2221 adjacent to the second end 222 thereof, and each groove 2221 is a top surface area of the contour surface 220 of the connecting portion 22 and a bottom surface area thereof. One extends toward the other of the bottom surface region and its top surface region and is recessed in the second direction Y from the contoured surface 220 of the connecting portion 22. In the mass production method of the first embodiment of the present invention, the number of the grooves 2221 of each connecting portion 22 is two, and one of the two grooves 2221 of each connecting portion 22 (see the groove shown above the FIG. 11). 2221) extending from the top surface area of the contoured surface 220 of the connecting portion 22 toward the bottom surface area thereof, and the other of the two recesses 2221 of each connecting portion 22 (see the recess 2221 shown in the lower part of FIG. 11) is The bottom surface region of the contoured surface 220 of the connecting portion 22 extends toward its top surface region. The purpose of reducing the width of each connecting portion 22 along the first direction X and the recess 2221 located at each connecting portion 22 in the mass production method of the first embodiment of the present invention will be described later.

此處需說明的是,在本新型該第一實施例之量產方法中,該步驟(a)是採用蝕刻或沖壓來成形出該等預形體25,主要是取決於該基板20的材質。It should be noted that, in the mass production method of the first embodiment of the present invention, the step (a) is to form the preforms 25 by etching or stamping, mainly depending on the material of the substrate 20.

舉例來說,當構成該基板20的該非磁性材料是選自該石英時(配合參閱圖12、圖13、圖14與圖15)時,該步驟(a)則適合在該基板20之一上表面201與一下表面202分別覆蓋上一上光阻層31與一下光阻層32;其中,該上光阻層31與該下光阻層32分別具有相同之一外觀形狀310、320陣列;於覆蓋上該上光阻層31與該下光阻層32後,採用濕式蝕刻手段令裸露於該上光阻層31之該等外觀形狀310外與裸露於該下光阻層32之該等外觀形狀320外的基板20被移除掉,從成快速地成形出如圖10所示之預形體25陣列;其中,該上光阻層31之該等外觀形狀310與該下光阻層32之該等外觀形狀320是彼此對準,且該等外觀形狀310、320之輪廓相同於如圖11所示之預形體25之立體圖的一俯視示意圖。For example, when the non-magnetic material constituting the substrate 20 is selected from the quartz (refer to FIG. 12, FIG. 13, FIG. 14 and FIG. 15 together), the step (a) is suitable for one of the substrates 20. The surface 201 and the lower surface 202 respectively cover the upper upper photoresist layer 31 and the lower photoresist layer 32; wherein the upper photoresist layer 31 and the lower photoresist layer 32 have the same array of external shapes 310 and 320; After the upper photoresist layer 31 and the lower photoresist layer 32 are covered, the external shape 310 exposed to the upper photoresist layer 31 and the bare photoresist layer 32 are exposed by wet etching. The substrate 20 outside the appearance shape 320 is removed, and an array of preforms 25 as shown in FIG. 10 is rapidly formed, wherein the outer shape 310 of the upper photoresist layer 31 and the lower photoresist layer 32 are formed. The appearance shapes 320 are aligned to each other, and the outlines of the appearance shapes 310, 320 are identical to the top view of the perspective view of the preform 25 as shown in FIG.

此外,當該基板20是選自該金屬材料或該磁性金屬時,該步驟(a)則適合透過一具有一模穴陣列(an array of cavities)之沖壓模具(punching mold;圖未示)來對該基板20施予沖壓手段。更具體地來說,使該沖壓模具之模穴陣列面向該基板20的上表面201設置,以在沖壓過程中令該沖壓模具沖斷該基板20之上表面201與下表面202,供該預形體25陣列容置於該模穴陣列中,並從而快速地成形出如圖10所示之該預形體25陣列。此處需補充說明的是,當該步驟(a)是採用沖壓來成形出該預形體25陣列時,各連接部22處的凹槽2221是在衝壓成形後,另外以蝕刻或切割(scriber)等方式形成於各連接部22上。In addition, when the substrate 20 is selected from the metal material or the magnetic metal, the step (a) is adapted to pass through a punching mold (not shown) having an array of cavities. A pressing means is applied to the substrate 20. More specifically, the cavity array of the stamping die is disposed facing the upper surface 201 of the substrate 20 to cause the stamping die to break the upper surface 201 and the lower surface 202 of the substrate 20 during the stamping process for the pre-preparation An array of bodies 25 is received in the array of cavities and thereby rapidly forms an array of preforms 25 as shown in FIG. It should be additionally noted here that when the step (a) is to form the array of the preforms 25 by stamping, the grooves 2221 at the respective connecting portions 22 are after stamping, and additionally etched or scribes. The method is formed on each of the connecting portions 22.

在本新型該第一實施例之量產方法中,該基板20是以石英基板為例做說明。但此處需補充說明的是,當該磁性材料是選自該磁性陶瓷時,該磁性陶瓷必須是一磁性陶瓷生坯(green),且該步驟(a)需選用該沖壓模具來沖壓由該磁性陶瓷生坯所構成的基板20,以成形出該預形體25陣列後,並對該預形體25陣列施予燒結(sintering)以令經沖壓後之該磁性陶瓷生坯緻密化(densification),並提升該預形體25陣列之結構強度。In the mass production method of the first embodiment of the present invention, the substrate 20 is exemplified by a quartz substrate. However, it should be additionally noted that when the magnetic material is selected from the magnetic ceramic, the magnetic ceramic must be a magnetic ceramic green, and the step (a) needs to be stamped by the stamping die. a substrate 20 made of a magnetic ceramic green body to form an array of the preforms 25, and sintering the array of the preforms 25 to densify the stamped magnetic ceramic green bodies. The structural strength of the array of preforms 25 is increased.

該步驟(b)是分別設置該元件層23於各主體21上。在本新型該第一實施例之量產方法中,該被動元件2是以該電感器為例做說明;因此,該元件層23是該線圈,且如圖16、圖17與圖18所示,該步驟(b)依序包括以下次步驟:一步驟(b11)、一步驟(b12),及一步驟(b13)。此處需進一步補充說明的是,當構成該基板20的該磁性材料是選自該磁性金屬或構成該基板20的該非磁性材料是選自該金屬材料時,於實施該步驟(b)之前,還需在各主體21的輪廓面210上覆蓋有一絕緣層(圖未示),以防止各元件層(線圈)23因直接接觸金屬而產生短路的問題。In the step (b), the element layer 23 is separately provided on each of the main bodies 21. In the mass production method of the first embodiment of the present invention, the passive component 2 is described by taking the inductor as an example; therefore, the component layer 23 is the coil, and as shown in FIG. 16, FIG. 17 and FIG. The step (b) sequentially includes the following steps: a step (b11), a step (b12), and a step (b13). It should be further noted that, when the magnetic material constituting the substrate 20 is selected from the magnetic metal or the non-magnetic material constituting the substrate 20 is selected from the metal material, before the step (b) is performed, It is also necessary to cover the contour surface 210 of each of the main bodies 21 with an insulating layer (not shown) to prevent the problem that the respective element layers (coils) 23 are short-circuited by direct contact with the metal.

參閱圖16,該步驟(b11)是於各主體21之輪廓面210上形成一線路用前驅物層41(圖16僅顯示單一主體21與單一線路用前驅物層41為例做說明)。Referring to Fig. 16, the step (b11) is to form a wiring precursor layer 41 on the contour surface 210 of each main body 21 (only a single main body 21 and a single-line precursor layer 41 are shown in Fig. 16 as an example).

參閱圖17與圖18,該步驟(b12)是於該等線路用前驅物層41上形成一線路用光阻層51。該線路用光阻層51具有複數線路圖案區511,各線路圖案區511是對應裸 露出各線路用前驅物層41的一局部區域411。該步驟(b13)是於各線路用前驅物層41的局部區域411上鍍製出該元件層23並形成一如該第一實施例所述的線圈。圖17與圖18只顯示單一線路用前驅物層41之局部區域411、該線路用光阻層51之單一線路圖案區511,與單一元件層23為例做說明。Referring to FIG. 17 and FIG. 18, the step (b12) is to form a line photoresist layer 51 on the wiring layer 41 for the lines. The line photoresist layer 51 has a plurality of line pattern regions 511, and each of the line pattern regions 511 is correspondingly bare. A partial region 411 of each of the circuit precursor layers 41 is exposed. This step (b13) is to plate the element layer 23 on the partial region 411 of each of the wiring precursor layers 41 and form a coil as described in the first embodiment. 17 and 18 show only a partial region 411 of the single-line precursor layer 41, a single line pattern region 511 of the line photoresist layer 51, and a single element layer 23 as an example.

較佳地,該步驟(b11)之各線路用前驅物層41是一含有鉑(Pt)、鈀(Pd)、金(Au)、銀(Ag)或銅等催化性金屬元的活性材料層(active layer),或一導電性晶種層(conductive seed layer)。此處須補充說明的是,當該步驟(b11)之各線路用前驅物層41是該活性材料層時,該步驟(b13)之各元件層23是以化學鍍法(electroless plating)鍍製於各線路用前驅物層41的該等局部區域411上;當該步驟(b11)之各線路用前驅物層41是該導電性晶種層時,該步驟(b13)之各元件層23是以電鍍法鍍製於各線路用前驅物層41的該局部區域411上。在本新型該第一實施例之量產方法中,該步驟(b11)之各線路用前驅物層41是該導電性晶種層時,且該步驟(b13)之各元件層23是以電鍍法鍍製於各線路用前驅物層41的該局部區域411上。Preferably, the precursor layer 41 for each of the steps (b11) is an active material layer containing a catalytic metal element such as platinum (Pt), palladium (Pd), gold (Au), silver (Ag) or copper. (active layer), or a conductive seed layer. It should be noted here that when the precursor layer 41 for each line of the step (b11) is the active material layer, the element layers 23 of the step (b13) are plated by electroless plating. On the partial regions 411 of the precursor layers 41 of the respective lines; when the precursor layers 41 for the respective lines of the step (b11) are the conductive seed layers, the component layers 23 of the step (b13) are This partial region 411 of each of the wiring precursor layers 41 is plated by electroplating. In the mass production method of the first embodiment of the present invention, when the precursor layer 41 for each of the steps (b11) is the conductive seed layer, and the component layers 23 of the step (b13) are plated. The method is plated on the partial region 411 of each of the wiring precursor layers 41.

同時參閱圖17、圖18與圖19,該步驟(b,)是移除該線路用光阻層51及各線路用前驅物層41之被該線路用光阻層51之線路圖案區511所覆蓋的一剩餘區域。Referring to FIG. 17, FIG. 18 and FIG. 19, the step (b) is to remove the photoresist layer 51 for the line and the line pattern region 511 of the photoresist layer 51 for each of the circuit precursor layers 41. A remaining area covered.

參閱圖20,該步驟(c)是於各主體21之輪廓面210上形成一端電極用前驅物層42(圖20僅顯示單一主體 21與單一端電極用前驅物層42為例做說明)。Referring to FIG. 20, the step (c) is to form the precursor layer 42 for the one end electrode on the contour surface 210 of each body 21 (FIG. 20 shows only a single body). 21 and the single-end electrode precursor layer 42 are taken as an example for explanation).

參閱圖21,該步驟(d)是於該等端電極用前驅物層42上形成一端電極用光阻層52,該端電極用光阻層52具有複數對的端電極圖案區521。各對端電極圖案區521是分別裸露出各端電極用前驅物層42的兩局部區域421。各端電極用前驅物層42的該兩局部區域421的其中一者(見顯示於圖21之左側的局部區域421),是對應位於各主體21之該第一端面區213,且至少對應位於各主體21之鄰近其第一端面區213之頂面區211與鄰近其第一端面區213之底面區212兩者其中一者,各端電極用前驅物層42的該兩局部區域421的其中另一者(見顯示於圖21之右側的局部區域421),是對應位於各主體21之該第二端面區214,且至少對應位於各主體21之鄰近其第二端面區214之頂面區211與鄰近其第二端面區214之底面區212兩者其中一者。同樣地,圖21也僅顯示單一端電極用前驅物層42的局部區域421,及端電極用光阻層52的單一對端電極圖案區521為例做說明。Referring to FIG. 21, the step (d) is to form a photoresist layer 52 for an end electrode on the precursor layer 42 for the terminal electrodes, and the photoresist layer 52 for the terminal electrode has a plurality of pairs of terminal electrode pattern regions 521. Each of the pair of electrode pattern regions 521 is a two-part region 421 in which the precursor layers 42 for the respective end electrodes are exposed. One of the two partial regions 421 of the precursor electrode layer 42 (see the partial region 421 shown on the left side of FIG. 21) corresponds to the first end face region 213 of each body 21, and at least corresponds to The top surface region 211 of each of the main bodies 21 adjacent to the first end face region 213 and the bottom surface region 212 adjacent to the first end face region 213 thereof are each of the two partial regions 421 of the precursor electrode layer 42 for each end electrode. The other (see the partial area 421 shown on the right side of FIG. 21) corresponds to the second end face region 214 of each main body 21, and at least corresponds to the top surface area of each main body 21 adjacent to the second end face region 214 thereof. 211 is adjacent to one of the bottom surface regions 212 of the second end face region 214. Similarly, FIG. 21 also shows only a partial region 421 of the single-end electrode precursor layer 42 and a single-end electrode pattern region 521 of the terminal electrode photoresist layer 52 as an example.

在本新型第一實施例的量產方法中,各端電極用前驅物層42的該兩局部區域421的其中一者(見顯示於圖21之左側的局部區域421),是對應位於各主體21之該第一端面區213與鄰近其第一端面區213之底面區212,且各端電極用前驅物層42的該兩局部區域421的其中另一者(見顯示於圖21之右側的局部區域421),是對應位於各主體21之該第二端面區214與鄰近其第二端面區214之底面 區212。In the mass production method of the first embodiment of the present invention, one of the two partial regions 421 of each of the end electrode precursor layers 42 (see the partial region 421 shown on the left side of FIG. 21) is correspondingly located in each body. The first end face region 213 of 21 is adjacent to the bottom face region 212 of the first end face region 213, and the other of the two partial regions 421 of the precursor layer 42 for each end electrode (see the right side shown in FIG. 21) The partial area 421) corresponds to the bottom surface of the second end surface region 214 of each main body 21 and the bottom surface of the second end surface area 214. Area 212.

再參閱圖21並配合參閱圖22,該步驟(e)是於各端電極用前驅物層42上的該兩局部區域421上,鍍製一對如圖8所示之該對端電極24。Referring again to FIG. 21 and referring to FIG. 22, the step (e) is to apply a pair of the pair of terminal electrodes 24 as shown in FIG. 8 to the two partial regions 421 on the precursor layer 42 for each terminal electrode.

該步驟(c)之各端電極用前驅物42所適用的材質大致上是相同於該步驟(b11),且該步驟(e)所適用的手段大致上亦相同於該步驟(b13)。在本新型該第一實施例之量產方法中,該步驟(c)之各端電極用前驅物層42是該活性材料層,且該步驟(e)是以化學鍍法鍍製於各端電極用前驅物層42的該兩第二局部區域421上。The material to which each of the terminal electrode precursors 42 of the step (c) is applied is substantially the same as the step (b11), and the means to which the step (e) is applied is substantially the same as the step (b13). In the mass production method of the first embodiment of the present invention, the precursor layer 42 for each end electrode of the step (c) is the active material layer, and the step (e) is plated at each end by electroless plating. The two second partial regions 421 of the precursor layer 42 for the electrodes.

再參閱圖21、圖22並配合參閱圖23,該步驟(e’)是移除該端電極用光阻層52與各端電極用前驅物層42之被該端電極用光阻層42之該等端電極圖案區521所覆蓋的一剩餘區域,從而在各主體21上留下各對端電極24,且各元件層23之相反兩端是對應連接於各對端電極24(圖23也只顯示出單一主體21、單一元件層23與單一對端電極24為例做說明)。較佳地,該步驟(e)之各對端電極24含有鎳(Ni)及一選自下列所構成之群組的金屬:金與錫(Sn)。Referring to FIG. 21 and FIG. 22 together with FIG. 23, the step (e') is to remove the photoresist layer 52 for the terminal electrode and the photoresist layer 42 for the terminal electrode 42 for each of the terminal electrodes. A remaining area covered by the end electrode pattern regions 521, thereby leaving a pair of end electrodes 24 on each of the main bodies 21, and opposite ends of the respective element layers 23 are correspondingly connected to the opposite end electrodes 24 (Fig. 23 also Only a single body 21, a single element layer 23 and a single counter electrode 24 are shown as an example. Preferably, each of the opposite electrode 24 of the step (e) contains nickel (Ni) and a metal selected from the group consisting of gold and tin (Sn).

經該步驟(d)與該步驟(e)的詳細說明可知,本新型該第一實施例之量產方法可在步驟(e)單一道步驟中直接同時鍍製出各對端電極24的該兩區塊241,無須如同薄膜式電感器之端電極般,難以在同一道製程完成。According to the detailed description of the step (d) and the step (e), the mass production method of the first embodiment of the present invention can simultaneously directly plate the pair of end electrodes 24 in the single step of the step (e). The two blocks 241 do not need to be completed in the same process as the terminal electrodes of the thin film inductor.

參閱圖24,該步驟(f)是於該等連接部22處由上而下或由下而上地分別施予一外力,使各連接部22的第 二端222自各主體21的第一端面區213斷裂,從而令各主體21自各連接部22脫離以量產出如圖8所示之具有端電極之被動元件2。Referring to FIG. 24, the step (f) is to apply an external force from the top to the bottom or from the bottom to the top of the connecting portion 22, so that the connecting portions 22 are respectively The two ends 222 are broken from the first end face regions 213 of the respective bodies 21, thereby detaching the main bodies 21 from the respective connecting portions 22 to produce the passive elements 2 having the terminal electrodes as shown in FIG.

經前述該第一實施例之量產方法的詳細說明可知,各預形體22之寬度沿該第一方向X遞減以及位處於各預形體25之連接部22處的凹槽2221之目的是在於,令該量產方法於執行該步驟(f)時,有利於受該外力所折斷以達量產化的效用。此處需補充說明的是,在本新型該第一實施例的量產方法中,該步驟(f)是於執行完該步驟(e’)後為例作說明;然而,該步驟(f)亦可是於該步驟(e’)之前執行,並不以本實施例為限。According to the detailed description of the mass production method of the first embodiment, the purpose of the width of each preform 22 decreasing along the first direction X and the groove 2221 located at the connecting portion 22 of each preform 25 is that When the mass production method is performed, the utility of the step (f) is facilitated by being broken by the external force to achieve mass production. It should be noted that, in the mass production method of the first embodiment of the present invention, the step (f) is exemplified after the step (e') is performed; however, the step (f) It may be performed before the step (e'), and is not limited to the embodiment.

此外,此處值得一提的是(配合參閱圖25),本新型該第一實施例之具有端電極之被動元件2,其在實施表面黏著技術(SMT)以接合至一電路板7上之兩個接點71的過程中,可在各接點71尚未預先形成有一焊料72的前提下,直接使該對端電極24分別對準該兩接點71,以令該兩接點71局部裸露於外且接觸到該對端電極24後,並進一步地透過該兩焊料72將該對端電極24的該兩區塊241精準地接合至於該電路板7上的該兩接點71。In addition, it is worth mentioning here (with reference to FIG. 25) that the passive element 2 having the terminal electrode of the first embodiment of the present invention is implemented by surface mount technology (SMT) for bonding to a circuit board 7. In the process of the two contacts 71, the opposite ends of the contacts 71 can be directly aligned with the two contacts 71 so that the two contacts 71 are partially exposed. After the contact and the contact with the opposite electrode 24, the two blocks 241 of the opposite electrode 24 are precisely bonded to the two contacts 71 on the circuit board 7 through the two solders 72.

參閱圖26、圖27與圖28,本新型具有端電極之被動元件2的該第二實施例之量產方法,是以MEMS製程來量產出如圖9所示之具有端電極之被動元件2。本新型該第二實施例之量產方法大致上是相同於該第一實施例,其不同處是在於,如圖26所示,該步驟(d)所述之各端電極 用前驅物層42的該兩局部區域421的其中一者(見顯示於圖26左側之局部區域421),是對應位於各主體21之該第一端面區213、鄰近其第一端面區213之頂面區211與鄰近其第一端面區213之底面區212,且各端電極用前驅物42之該兩局部區域421的其中另一者(見顯示於圖26右側之局部區域421),是對應位於各主體21之該第二端面區214、鄰近其第二端面214之頂面區211與鄰近其第二端面214之底面區212,以致於該步驟(e)所鍍製之各端電極24(見圖27)在執行完該步驟(e’)後(見圖28),是如圖9所示的該對端電極24。Referring to FIG. 26, FIG. 27 and FIG. 28, the mass production method of the second embodiment of the passive component 2 having a terminal electrode is a passive component having a terminal electrode as shown in FIG. 9 by a MEMS process. 2. The mass production method of the second embodiment of the present invention is substantially the same as the first embodiment, and the difference is that, as shown in FIG. 26, the terminal electrodes of the step (d) are as shown in FIG. One of the two partial regions 421 of the precursor layer 42 (see the partial region 421 shown on the left side of FIG. 26) corresponds to the first end face region 213 of each body 21 adjacent to the first end face region 213 thereof. The top surface area 211 is adjacent to the bottom surface area 212 of the first end surface area 213, and the other of the two partial areas 421 of the front electrode precursors 42 (see the partial area 421 shown on the right side of FIG. 26) is Corresponding to the second end face region 214 of each main body 21, the top surface area 211 adjacent to the second end surface 214 and the bottom surface area 212 adjacent to the second end surface 214 thereof, so that the end electrodes plated in the step (e) are respectively 24 (see Fig. 27) after performing this step (e') (see Fig. 28), is the counter electrode 24 as shown in Fig. 9.

參閱圖29,本新型具有端電極之被動元件2之一第三實施例,大致上是相同於該第一實施例,其不同處是在於,該元件層23具有一形成於該主體21之頂面區211及第一端面區213的底電極231、一形成於該底電極231上的介電層232,及一形成於該介電層232上及該主體21之第二端面區214上的頂電極233。該介電層232令該底電極231與該頂電極233彼此互不接觸,且該元件層23之該底電極231與該頂電極232分別連接於該對端電極24。在本實施例中,該具有端電極之被動元件2是一電容器。Referring to FIG. 29, a third embodiment of the passive component 2 of the present invention having a terminal electrode is substantially the same as the first embodiment except that the component layer 23 has a top formed on the body 21. a bottom electrode 231 of the surface region 211 and the first end surface region 213, a dielectric layer 232 formed on the bottom electrode 231, and a dielectric layer 232 formed on the dielectric layer 232 and the second end surface region 214 of the main body 21. Top electrode 233. The bottom layer 231 and the top electrode 233 are not in contact with each other, and the bottom electrode 231 and the top electrode 232 of the element layer 23 are respectively connected to the opposite electrode 24. In this embodiment, the passive component 2 having the terminal electrode is a capacitor.

參閱圖30、圖31與圖32,本新型具有端電極之被動元件2的該第三實施例之量產方法,是以MEMS製程來量產出如圖29所示之具有端電極之被動元件2。本新型該第三實施例之量產方法大致上是相同於該第一實施例,其不同處是在於,該步驟(b)依序包括以下次步驟:一步 驟(b21)、一步驟(b22),及一步驟(b23)。Referring to FIG. 30, FIG. 31 and FIG. 32, the mass production method of the third embodiment of the passive component 2 having a terminal electrode is based on a MEMS process to produce a passive component having a terminal electrode as shown in FIG. 2. The mass production method of the third embodiment of the present invention is substantially the same as the first embodiment, and the difference is that the step (b) sequentially includes the following steps: one step Step (b21), one step (b22), and one step (b23).

如圖30所示,該步驟(b21)是於各主體21之頂面區211上與第一端面區213上形成該底電極231。如圖31所示,該步驟(b22)是於各底電極231上及各主體21之頂面區211上形成該介電層232。如圖32所示,該步驟(b23)是於各介電層232上與各主體21之第二端面區214上形成該頂電極233。此處須說明的是,圖30至圖32皆僅顯示單一個主體21、單一個底電極231、單一個介電層232及單一個頂電極233為例做說明。在本新型該第三實施例之量產方法中,各元件層23之介電層232令其底電極231及其頂電極233彼此互不接觸。此外,本新型該第三實施例之量產方法在實施完該步驟(b)後,繼續依序完成該步驟(c)至該步驟(e)後,各元件層23之該底電極231與該頂電極233分別連接於各對端電極24。As shown in FIG. 30, the step (b21) is to form the bottom electrode 231 on the top surface region 211 of each main body 21 and the first end surface region 213. As shown in FIG. 31, the step (b22) is to form the dielectric layer 232 on each of the bottom electrodes 231 and the top surface region 211 of each of the main bodies 21. As shown in FIG. 32, the step (b23) is to form the top electrode 233 on each of the dielectric layers 232 and the second end face region 214 of each of the main bodies 21. It should be noted that each of FIGS. 30 to 32 only shows a single body 21, a single bottom electrode 231, a single dielectric layer 232, and a single top electrode 233 as an example. In the mass production method of the third embodiment of the present invention, the dielectric layer 232 of each element layer 23 has its bottom electrode 231 and its top electrode 233 not in contact with each other. In addition, in the mass production method of the third embodiment of the present invention, after the step (b) is completed, the bottom electrode 231 of each component layer 23 is further completed after the steps (c) to (e) are sequentially completed. The top electrodes 233 are respectively connected to the respective pair of terminal electrodes 24.

首先,經上述本新型各實施例之量產方法的詳細說明可知,以電感器之線圈的製作程序舉例來說,本新型僅需透過該步驟(a)、該步驟(b11)、該步驟(b12)、該步驟(b13)及該步驟(e’)等五道步驟,便可製得如圖8或圖9所示之各元件層(也就是電感器之線圈)23。本新型該第一、二實施例之量產方法無須如同前案1般,尚需經過四道的貫孔程序、四道的填置導電糊程序、四道的塗佈導電糊以形成各電路圖案112、122、132、142程序,與一道步驟(E)之燒結處理等十三道程序,才可構成該內繞式的線圈,製作程序簡單。First of all, according to the detailed description of the mass production method of the various embodiments of the present invention, it can be seen that, in the example of the manufacturing process of the coil of the inductor, the present invention only needs to pass through the step (a), the step (b11), and the step ( B12), the step (b13) and the step (e'), and the like, the component layers (that is, the coils of the inductor) 23 as shown in FIG. 8 or FIG. 9 can be obtained. The mass production method of the first and second embodiments of the present invention does not need to be through the four-hole through-hole procedure, the four-way filling conductive paste program, and the four-way coating conductive paste to form each circuit. The pattern of the patterns 112, 122, 132, and 142, and the sintering process of the step (E), and the like, can constitute the inner winding type of the coil, and the manufacturing process is simple.

此外,以電感器之結構強度與元件性能舉例來說,本新型該第一、二實施例是透過MEMS製程直接對該基板20成形出各本體21,主體21結構強度高,不像圖1所示之積層式電感器1般,於該等電路陶瓷片11、12、13、14相鄰界面間存在有強度不足的問題。又,各元件層(也就是線圈)23是透過各主體21之呈立體態的輪廓面210上所形成之線路用前驅物層41直接電鍍/或化鍍而成,各元件層(線圈)23也為一體結構,不會有如圖1所示之積層式電感器1般,各電路圖案112、122、132、142間因不連續界面而產生非歐姆式接觸或增加阻抗而產生額外的電熱效應。In addition, in the first and second embodiments of the present invention, the first and second embodiments of the present invention directly form the respective bodies 21 through the MEMS process, and the main body 21 has high structural strength, unlike FIG. In the case of the laminated inductor 1 shown, there is a problem that the strength is insufficient between the adjacent interfaces of the circuit ceramic sheets 11, 12, 13, and 14. Further, each element layer (i.e., the coil) 23 is directly plated/polished by the wiring precursor layer 41 formed on the contour surface 210 of each of the main bodies 21, and each element layer (coil) 23 is formed. Also in an integrated structure, there is no laminated inductor 1 as shown in FIG. 1, and each circuit pattern 112, 122, 132, 142 generates non-ohmic contact or increases impedance due to a discontinuous interface to generate an additional electrothermal effect. .

最重要的是,以被動元件之端電極的形成程序舉例來說,本新型各實施例之量產方法只需要在單一道步驟(e)中,便可同時鍍製出各對端電極24之該等區塊241,不像先前技術內所提到的薄模式電感器之端電極般,無法在同一道程序完成。就製程面來說,本新型之量產方法程序簡化;就成本面來說,本新型之量產方法可因程序簡化而減少製程上所需耗費的時間成本。Most importantly, in the formation procedure of the terminal electrodes of the passive components, for example, the mass production method of the embodiments of the present invention only needs to simultaneously plate the opposite electrode 24 in a single step (e). These blocks 241, unlike the terminal electrodes of the thin mode inductors mentioned in the prior art, cannot be completed in the same procedure. In terms of the process surface, the new mass production method program is simplified; in terms of cost, the new mass production method can reduce the time cost required for the process due to the simplification of the program.

綜上所述,本新型具有端電極之被動元件,是透過MEMS製程直接令該基板20預先成形出結構強度高且呈一體結構的各主體21,以使各線路用前驅物層41與各端電極用前驅物層42能形成於各主體21之呈立體態的輪廓面210上,並進一步地分別在步驟(b13)與步驟(e)單一道步驟中,便可於該等線路用前驅物層41與該等端電極用前驅 物層42上分別電鍍/或化學鍍出各元件層(線圈)23與各對端電極24;就被動元件的性能面來看,結構強度高,就製程面與成本面來看,因製作程序簡化而降低時間成本,故確實能達成本新型之目的。In summary, the passive component having the terminal electrode directly pre-forms the substrate 20 into the main body 21 with high structural strength and integral structure through the MEMS process, so that the precursor layer 41 and each end of each line are used. The electrode precursor layer 42 can be formed on the three-dimensional contoured surface 210 of each of the main bodies 21, and further in the single step of the steps (b13) and (e), respectively, the precursors for the lines can be used. Layer 41 and precursors for the same electrode Each of the element layers (coils) 23 and the opposite end electrodes 24 are respectively electroplated/chemically plated on the object layer 42; the structural strength is high in terms of the performance of the passive elements, and the manufacturing process is based on the process surface and the cost side. Simplify and reduce the time cost, so it can achieve the purpose of this new type.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only the embodiment of the present invention, and when it is not possible to limit the scope of the present invention, all the simple equivalent changes and modifications according to the scope of the patent application and the contents of the patent specification are still This new patent covers the scope.

2‧‧‧具有端電極之被動元件2‧‧‧ Passive components with terminal electrodes

21‧‧‧主體21‧‧‧ Subject

210‧‧‧輪廓面210‧‧‧ contour surface

211‧‧‧頂面區211‧‧‧Top area

212‧‧‧底面區212‧‧‧ bottom area

213‧‧‧第一端面區213‧‧‧First end zone

214‧‧‧第二端面區214‧‧‧second end zone

215‧‧‧前面區215‧‧‧ front area

216‧‧‧背面區216‧‧‧Back area

23‧‧‧元件層23‧‧‧Component layer

24‧‧‧端電極24‧‧‧ terminal electrode

241‧‧‧區塊241‧‧‧ Block

Claims (5)

一種具有端電極之被動元件,包含:一個主體,是經蝕刻或沖壓一基板所成形取得並包括一輪廓面,該輪廓面具有相反設置的一頂面區與一底面區、相反設置的一第一端面區與一第二端面區,及相反設置的一前面區與一背面區,該第一端面區是銜接於該前面區、該頂面區、該背面區與該底面區,且該第二端面區是銜接於該前面區、該頂面區、該背面區與該底面區以令該主體為一體者;一個元件層,設置於該主體;及一對端電極,彼此互不接觸且分別電連接於該元件層並分別具有至少兩個區塊,該對端電極之其中一者的該兩區塊是位於該主體之該第一端面區,且位於鄰近該第一端區之該頂面區及鄰近該第一端區之該底面區兩者的其中一者,該對端電極之其中另一者的該兩區塊是位於該主體之該第二端面區,且位於鄰近該第二端區之該頂面區及鄰近該第二端區之該底面區兩者的其中一者,該等端電極之該兩區塊皆在同一道步驟中鍍製而成。A passive component having a terminal electrode, comprising: a body formed by etching or stamping a substrate and comprising a contoured surface having a top surface region and a bottom surface region disposed opposite to each other An end face region and a second end face region, and a front face region and a back face region disposed opposite to each other, wherein the first end face region is coupled to the front face region, the top face region, the back face region and the bottom face region, and the first end region a second end face region is connected to the front face region, the top face region, the back face region and the bottom face region to make the body integral; a component layer is disposed on the body; and a pair of end electrodes are not in contact with each other Electrically connected to the component layer and respectively having at least two blocks, the two blocks of one of the pair of electrodes being located in the first end face region of the body and located adjacent to the first end region One of the top surface region and the bottom surface region adjacent to the first end region, the two of the opposite end electrodes are located in the second end face region of the main body, and are located adjacent to the first end region The top end area of the second end zone and adjacent to the The bottom surface area of the two ends wherein one zone, the ends of these two electrodes are in the same block channel from plating step. 如請求項1所述的具有端電極之被動元件,其中,各端電極之區塊的數量是三個,該對端電極之其中一者的該等區塊是分別位於該主體之該第一端面區、鄰近該第一端區之該頂面區及鄰近該第一端區之該底面區,且該對端電極之其中另一者的該等區塊是分別位於該主體之 該第二端面區、鄰近該第二端區之該頂面區及鄰近該第二端區之該底面區。The passive component having a terminal electrode according to claim 1, wherein the number of the blocks of each terminal electrode is three, and the blocks of one of the pair of electrodes are respectively located at the first of the body An end surface region, the top surface region adjacent to the first end region, and the bottom surface region adjacent to the first end region, and the other one of the opposite end electrodes is located in the main body The second end face region, the top face region adjacent to the second end region, and the bottom face region adjacent to the second end region. 如請求項2所述的具有端電極之被動元件,其中,該對端電極含有鎳及一選自下列所構成之群組:金與錫;該主體是由一磁性材料或一非磁性材料所構成,該磁性材料是選自一磁性金屬或一磁性陶磁,該非磁性材料是選自一以矽為主的材料或一金屬材料;但有條件的是,當該磁性材料是選自該磁性金屬或該非磁性材料是選自該金屬材料時,該主體的輪廓面上是覆蓋有一絕緣層。The passive component having a terminal electrode according to claim 2, wherein the opposite electrode comprises nickel and a group selected from the group consisting of gold and tin; the body is made of a magnetic material or a non-magnetic material. The magnetic material is selected from a magnetic metal or a magnetic ceramic material, and the non-magnetic material is selected from a bismuth-based material or a metal material; but conditionally, when the magnetic material is selected from the magnetic metal Or when the non-magnetic material is selected from the metal material, the contour surface of the body is covered with an insulating layer. 如請求項3所述的具有端電極之被動元件,其中,該元件層是一線圈,該元件層是圍繞於主體之該前面區、該頂面區、該背面區與該底面區,且該元件層之相反兩端是分別連接於該對端電極。The passive component having a terminal electrode according to claim 3, wherein the component layer is a coil, and the component layer surrounds the front area, the top surface area, the back surface area and the bottom surface area of the main body, and The opposite ends of the element layer are respectively connected to the opposite end electrodes. 如請求項3所述的具有端電極之被動元件,其中,該元件層具有一形成於該主體之頂面區及第一端面區的底電極、一形成於該底電極上的介電層,及一形成於該介電層上及該主體之第二端面區上的頂電極,該介電層令該底電極與該頂電極彼此互不接觸,且該元件層之該底電極與該頂電極分別連接於該對端電極。The passive component having a terminal electrode according to claim 3, wherein the component layer has a bottom electrode formed on a top surface region and a first end surface region of the body, and a dielectric layer formed on the bottom electrode. And a top electrode formed on the dielectric layer and on the second end face region of the body, the dielectric layer is such that the bottom electrode and the top electrode do not contact each other, and the bottom electrode and the top of the component layer The electrodes are respectively connected to the opposite end electrodes.
TW104210229U 2015-06-25 2015-06-25 Passive component with the terminal electrode TWM511121U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI555044B (en) * 2015-06-25 2016-10-21 Wafer Mems Co Ltd A method for producing a passive element with a terminal electrode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI555044B (en) * 2015-06-25 2016-10-21 Wafer Mems Co Ltd A method for producing a passive element with a terminal electrode
US9806145B2 (en) 2015-06-25 2017-10-31 Wafer Mems Co., Ltd. Passive chip device and method of making the same

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