TWM491548U - Automatic feeding device of grinding equipment - Google Patents

Automatic feeding device of grinding equipment Download PDF

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Publication number
TWM491548U
TWM491548U TW103214318U TW103214318U TWM491548U TW M491548 U TWM491548 U TW M491548U TW 103214318 U TW103214318 U TW 103214318U TW 103214318 U TW103214318 U TW 103214318U TW M491548 U TWM491548 U TW M491548U
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TW
Taiwan
Prior art keywords
carrier
lifting
cylinder
unit
feeding device
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TW103214318U
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Chinese (zh)
Inventor
Pei-Feng Huang
Jia-Bin Yang
dao-xin Lin
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Gillion Applic Technology Co Ltd
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Priority to TW103214318U priority Critical patent/TWM491548U/en
Publication of TWM491548U publication Critical patent/TWM491548U/en

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Description

研磨設備之自動進料裝置Automatic feeding device for grinding equipment

本新型是關於一種自動進料裝置,特別是指一種以自動化方式將晶圓送到研磨裝置進行研磨加工之研磨設備的自動進料裝置。The present invention relates to an automatic feeding device, and more particularly to an automatic feeding device for a grinding device that automatically sends a wafer to a grinding device for grinding.

一般晶圓在製造的過程中,需要藉由研磨、拋光來提高表面的平整度,而晶圓研磨裝置就是一種專門用來研磨晶圓表面的加工機器。為了方便進行前述加工步驟,一般晶圓都是數個一組擺放在一個載盤,所述晶圓並圍繞該載盤的一個旋轉中心。當該研磨裝置之一旋轉機具帶動該載盤旋轉時,就可以針對該載盤上的每個晶圓進行研磨加工。Generally, in the manufacturing process, the surface of the wafer needs to be polished and polished to improve the flatness of the surface, and the wafer grinding device is a processing machine specially used for grinding the surface of the wafer. In order to facilitate the aforementioned processing steps, the wafers are typically placed in groups on a carrier that surrounds a center of rotation of the carrier. When one of the polishing devices rotates the carrier to rotate the carrier, it is possible to perform grinding processing for each wafer on the carrier.

惟有鑒於一般晶圓在進行研磨加工時,其進料及出料的步驟都是以人工搬運,不僅製程無法一貫化,在研磨操作時也需要較高的人力成本。However, in view of the fact that the general wafer is subjected to the grinding process, the steps of feeding and discharging are manually carried out, and not only the process cannot be consistent, but also a high labor cost is required in the grinding operation.

本新型之目的即在提供一種可自動化進料,以降低人力成本的研磨設備之自動進料裝置。The purpose of the present invention is to provide an automatic feeding device for a grinding apparatus that can automatically feed to reduce labor costs.

本新型之自動進料裝置用來移送一個晶圓載裝 單元,該晶圓載裝單元包括一個載箱,以及數個裝設在該載箱內並具有至少一個晶圓的加工組件,而該進料裝置可將該等加工組件移送到一個研磨裝置進行研磨加工,並包含:一個機架,以及安裝在該機架上的一個角度調整機構、一個托移機構、一個進料機構、一個移送機構。該角度調整機構包括一個用來承接該加工組件的承載座、一個帶動該承載座升降的升降壓缸、一個旋轉盤,以及一個帶動該旋轉盤旋轉的調整旋轉件,該承載座具有一個供該旋轉盤伸出以頂撐該加工物件的穿孔,而該托移機構包括一個可將存放在該載箱內的加工組件移送到該旋轉盤及該承載座上的托架,該進料機構可將位於該承載座上之加工組件移送到該研磨裝置,所述移送機構用來移送該晶圓載裝單元,使其鄰近該托移機構以方便該托架托移該等加工組件。The novel automatic feeding device is used to transfer a wafer carrier Unit, the wafer carrier unit includes a carrier, and a plurality of processing components mounted in the carrier and having at least one wafer, and the feeding device can transfer the processing components to a grinding device for grinding Processing, and comprising: a frame, and an angle adjustment mechanism mounted on the frame, a loading mechanism, a feeding mechanism, and a transfer mechanism. The angle adjusting mechanism includes a carrier for receiving the processing assembly, a lifting cylinder for driving the carrier to lift, a rotating disk, and an adjusting rotating member for driving the rotating disk, the bearing has a a rotating disk extending to support the perforation of the workpiece, and the loading mechanism includes a bracket for transferring the processing component stored in the carrier to the rotating disk and the carrier, the feeding mechanism The processing assembly located on the carrier is transferred to the polishing apparatus, and the transfer mechanism is configured to transfer the wafer carrier unit adjacent to the carrier mechanism to facilitate the carrier to transfer the processing components.

本新型有益的效果在於:前述機構的配合,可以將預備接受研磨加工之晶圓先移送到該角度調整機構進行角度調整後,再一貫化的移送到該研磨裝置進行研磨加工,藉此達到自動化進料及出料,以及降低研磨加工時的人力成本等功效。The beneficial effect of the present invention is that the cooperation of the above-mentioned mechanism can transfer the wafer which is ready to be polished to the angle adjustment mechanism for angle adjustment, and then consistently transfer it to the grinding device for grinding processing, thereby achieving automation. Feeding and discharging, as well as reducing labor costs during grinding.

10‧‧‧自動進料裝置10‧‧‧Automatic feeding device

11‧‧‧晶圓載裝單元11‧‧‧ wafer carrier unit

111‧‧‧載箱111‧‧‧ carrying case

112‧‧‧加工組件112‧‧‧Processing components

113‧‧‧箱底壁113‧‧‧ box bottom wall

114‧‧‧底溝槽114‧‧‧ bottom groove

115‧‧‧載盤115‧‧‧Package

116‧‧‧晶圓116‧‧‧ wafer

12‧‧‧研磨裝置12‧‧‧ grinding device

13‧‧‧第一方向13‧‧‧First direction

14‧‧‧第二方向14‧‧‧second direction

2‧‧‧機架2‧‧‧Rack

21‧‧‧機箱21‧‧‧Chassis

211‧‧‧開口側211‧‧‧Open side

212‧‧‧進料側212‧‧‧feed side

213‧‧‧進料口213‧‧‧ Feed inlet

22‧‧‧上基板22‧‧‧Upper substrate

221‧‧‧導槽221‧‧ ‧ guide slot

222‧‧‧開槽222‧‧‧ slotting

23‧‧‧下基板23‧‧‧ Lower substrate

24‧‧‧第一立板24‧‧‧First Board

25‧‧‧第二立板25‧‧‧Second board

26‧‧‧進料板26‧‧‧ Feeding plate

3‧‧‧移送機構3‧‧‧Transfer organization

31‧‧‧第一升降單元31‧‧‧First lifting unit

31’‧‧‧第二升降單元31’‧‧‧Second Lifting Unit

311‧‧‧升降軌道311‧‧‧ lifting track

312‧‧‧升降座312‧‧‧ Lifting seat

313‧‧‧升降動力源313‧‧‧ Lifting power source

314‧‧‧座底壁314‧‧‧ bottom wall

315‧‧‧缺槽315‧‧‧ Missing slot

33‧‧‧第一平移單元33‧‧‧First translation unit

332‧‧‧第一平移壓缸332‧‧‧First translation cylinder

333‧‧‧移動架333‧‧‧Mobile rack

334‧‧‧第一拉移件334‧‧‧First pull piece

336‧‧‧傾斜面336‧‧‧ sloped surface

337‧‧‧擋推面337‧‧‧Pushing surface

34‧‧‧第二平移單元34‧‧‧Second translation unit

341‧‧‧第一吊架341‧‧‧First hanger

342‧‧‧進料推架342‧‧‧Feed push frame

343‧‧‧第二平移壓缸343‧‧‧Second translation cylinder

35‧‧‧第三平移單元35‧‧‧ third translation unit

351‧‧‧第二吊架351‧‧‧Second hanger

352‧‧‧出料推架352‧‧‧Feeding push frame

353‧‧‧第三平移壓缸353‧‧‧third translation cylinder

36‧‧‧第四平移單元36‧‧‧4th translation unit

361‧‧‧第四平移壓缸361‧‧‧4th translation cylinder

362‧‧‧拉動架362‧‧‧ Pulling frame

363‧‧‧第二拉移件363‧‧‧Second pull piece

364‧‧‧傾斜面364‧‧‧Sloping surface

365‧‧‧擋推面365‧‧‧Pushing surface

4‧‧‧角度調整機構4‧‧‧ Angle adjustment mechanism

41‧‧‧固定吊架41‧‧‧Fixed hanger

42‧‧‧升降壓缸42‧‧‧lifting cylinder

43‧‧‧升降吊架43‧‧‧ lifting hanger

44‧‧‧承載座44‧‧‧ bearing seat

441‧‧‧穿孔441‧‧‧Perforation

45‧‧‧調整旋轉件45‧‧‧Adjust rotating parts

451‧‧‧軸桿451‧‧‧ shaft

46‧‧‧旋轉盤46‧‧‧ rotating disk

5‧‧‧托移機構5‧‧‧Transfer agency

51‧‧‧托持壓缸51‧‧‧ holding cylinder

52‧‧‧托架52‧‧‧ bracket

521‧‧‧托叉521‧‧‧ fork

6‧‧‧進料機構6‧‧‧Feeding agency

61‧‧‧懸空基架61‧‧‧ suspended pedestal

62‧‧‧突伸台62‧‧‧ protruding station

63‧‧‧進料動力源63‧‧‧ Feed power source

64‧‧‧升降載台64‧‧‧lifting platform

65‧‧‧進料壓缸65‧‧‧feeding cylinder

66‧‧‧夾持件66‧‧‧Clamping parts

661‧‧‧夾持壓缸661‧‧‧Clamping cylinder

662‧‧‧夾爪662‧‧‧claw

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是本新型進料裝置之一實施例的前視使用參考圖,說明該進料裝置與一研磨裝置、數個晶圓載裝單元的相對關係; 圖2是該實施例的一個前視立體圖,省略該進料裝置之一機箱;圖3是該實施例之一後視立體圖,亦省略該機箱;圖4是該實施例之一局部立體圖,主要說明該進料裝置之一第一平移單元及一第二平移單元;圖5是該實施例之一局部仰視立體圖,主要說明該進料裝置之一第三平移單元及一第四平移單元;圖6是該實施例之一局部剖視圖,說明該第四平移單元;圖7是該實施例之又一局部立體圖,說明該進料裝置之一角度調整機構及一托移機構;圖8是該實施例之另一局部剖視圖,亦說明該角度調整機構及該托移機構的相對關係;圖9是該較佳實施例之一局部後視圖,單獨說明該進料裝置之一進料機構,圖中該進料機構位在一個起始位置;及圖10是一個類似圖9的視圖,圖中該進料機構位在一進料位置。Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: Figure 1 is a front view of an embodiment of the present invention, illustrating the feeding device and The relative relationship between the grinding device and the plurality of wafer loading units; Figure 2 is a front perspective view of the embodiment, omitting one of the feeding devices; Figure 3 is a rear perspective view of the embodiment, and the chassis is omitted; Figure 4 is a partial perspective view of the embodiment, mainly One of the first translation unit and the second translation unit of the feeding device is illustrated; FIG. 5 is a partial bottom perspective view of the embodiment, mainly illustrating a third translation unit and a fourth translation unit of the feeding device; 6 is a partial cross-sectional view of the embodiment, illustrating the fourth translation unit; FIG. 7 is another partial perspective view of the embodiment, illustrating an angle adjustment mechanism and a movement mechanism of the feeding device; FIG. 8 is the implementation Another partial cross-sectional view of the example also illustrates the relative relationship between the angle adjusting mechanism and the loading mechanism; FIG. 9 is a partial rear view of the preferred embodiment, separately illustrating a feeding mechanism of the feeding device, in the figure The feed mechanism is in a starting position; and Figure 10 is a view similar to Figure 9 in which the feed mechanism is in a feed position.

在本新型被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

參閱圖1、2、3,本新型自動進料裝置10之一實施例可帶動數個晶圓載裝單元11移動,並和研磨設備之一研磨裝置12相鄰近,每個晶圓載裝單元11都包括一個 載箱111,以及數個上下間隔插設在該載箱111內的加工組件112,該載箱111具有一個箱底壁113,該箱底壁113具有數條間隔平行的底溝槽114,每個加工組件112都具有一個載盤115,以及數個擺放在該載盤115上並圍繞該載盤115之一旋轉中心的晶圓116,在以下的說明中,前方係指具有該進料裝置10的一側,即該研磨裝置12位於該進料裝置10的後方。Referring to Figures 1, 2, and 3, an embodiment of the present automatic feeding device 10 can drive a plurality of wafer loading units 11 to move, and is adjacent to one of the grinding devices 12, each wafer loading unit 11 Including one a carrying case 111, and a plurality of processing components 112 vertically and horizontally interposed in the carrying case 111, the carrying case 111 has a bottom wall 113 having a plurality of parallel spaced bottom grooves 114, each processing The assembly 112 has a carrier 115, and a plurality of wafers 116 disposed on the carrier 115 and surrounding a center of rotation of the carrier 115. In the following description, the front finger has the feeding device 10. One side, that is, the grinding device 12 is located behind the feeding device 10.

本實施例該自動進料裝置10可移送該等晶圓載裝單元11沿著一個進料方向及一個出料方向前進,並且將該等晶圓載裝單元11的加工組件112一一的移送到該研磨裝置12進行研磨加工,該進料裝置10包含:一個機架2,以及安裝在該機架2之一機箱21內部的一個移送機構3、一個角度調整機構4、一個托移機構5、一個進料機構6。In this embodiment, the automatic feeding device 10 can transfer the wafer loading units 11 to advance along a feeding direction and a discharging direction, and transfer the processing components 112 of the wafer loading units 11 one by one to the same. The grinding device 12 performs a grinding process, and the feeding device 10 includes: a frame 2, and a transfer mechanism 3 installed inside one of the chassis 21 of the frame 2, an angle adjusting mechanism 4, a loading mechanism 5, and a Feed mechanism 6.

該機架2還包括一片安裝在該機箱21內部且水平設置的上基板22、一片安裝在該機箱21內部且平行於該上基板22的下基板23、一片直立並鄰近該研磨裝置12的第一立板24,以及一片直立並鄰近前右側的第二立板25,該機箱21具有一個位於後方的開口側211,以及一個位於前方的進料側212,該進料側212具有一個進料口213,而該上基板22具有兩條鄰近前方的導槽221,以及一個鄰近後方的開槽222,所述導槽221沿著一個第一方向13延伸。又該機架2還包括一片與該下基板23連接並突出於該進料口213的進料板26。The rack 2 further includes a horizontally disposed upper substrate 22 mounted inside the chassis 21, a lower substrate 23 mounted inside the chassis 21 and parallel to the upper substrate 22, and a piece erected adjacent to the polishing device 12 a vertical plate 24, and a second vertical plate 25 standing upright and adjacent to the front right side, the chassis 21 having an open side 211 at the rear, and a feed side 212 at the front, the feed side 212 having a feed The upper substrate 22 has two adjacent front guiding grooves 221 and a rear adjacent opening groove 222 extending along a first direction 13. Further, the frame 2 further includes a feed plate 26 connected to the lower substrate 23 and protruding from the feed port 213.

參閱圖3、4、5,本實施例該移送機構3包括一 個架設在該第一立板24上的第一升降單元31、一個安裝在該第二立板25上的第二升降單元31’、一個安裝在該上基板22上並鄰近前方的第一平移單元33、一個安裝在該上基板22上並前後向設置的第二平移單元34、一個設在該下基板23上並位於該第一平移單元33正下方的第三平移單元35,以及一個設在該下基板23上並位於該第三平移單元35正下方的第四平移單元36。Referring to Figures 3, 4 and 5, the transfer mechanism 3 of the present embodiment includes a a first lifting unit 31 mounted on the first vertical plate 24, a second lifting unit 31' mounted on the second vertical plate 25, and a first translation mounted on the upper substrate 22 adjacent to the front side a unit 33, a second translating unit 34 mounted on the upper substrate 22 and disposed in the front-rear direction, a third translating unit 35 disposed on the lower substrate 23 and directly below the first translating unit 33, and a setting A fourth translating unit 36 is located on the lower substrate 23 and directly below the third translating unit 35.

該第一升降單元31及該第二升降單元31’的構造相同,並都具有兩支直立平行的升降軌道311、一個可移動地架設在該等升降軌道311間的升降座312,以及一個驅動該升降座312升降的升降動力源313,在本實施例該升降動力源313為馬達配合鏈條的形式,由於利用該馬達及鏈條帶動升降座312升降是一般的機械設計,不再詳述。又該第一升降單元31之升降座312具有一個座底壁314,該座底壁314具有兩條沿著一個第二方向14延伸且開口朝前的缺槽315,該第二方向14平行於該第一方向13。The first lifting unit 31 and the second lifting unit 31' have the same structure, and both have two upright parallel lifting rails 311, a lifting seat 312 movably mounted between the lifting rails 311, and a driving unit. The lifting power source 313 for lifting and lowering the lifting base 312 is in the form of a motor-fit chain in the embodiment. Since the lifting and lowering of the lifting base 312 by the motor and the chain is a general mechanical design, it will not be described in detail. Further, the lifting base 312 of the first lifting unit 31 has a bottom wall 314 having two notches 315 extending along a second direction 14 and opening toward the front, the second direction 14 being parallel to The first direction is 13.

該第一平移單元33具有一個架設在該上基板22底面的第一平移壓缸332,以及一個被該第一平移壓缸332驅動沿著該第一方向13往復移動的移動架333,以及數個具彈性樞擺地安裝在該移動架333上的第一拉移件334,該等第一拉移件334都是利用彈簧頂撐分別突出於該上基板22之該等導槽221。每個第一拉移件334都具有一個傾斜面336及一個擋推面337,該擋推面337可以抵靠在該等晶圓載裝單元11的後側,以推動該等晶圓載裝單元11由該第 二升降單元31’往該第二平移單元34的一側移動。The first translation unit 33 has a first translation cylinder 332 mounted on the bottom surface of the upper substrate 22, and a moving frame 333 driven by the first translation cylinder 332 to reciprocate along the first direction 13, and The first pulling member 334 is elastically pivotally mounted on the moving frame 333. The first pulling members 334 are respectively protruded from the guiding holes 221 of the upper substrate 22 by spring struts. Each of the first pulling members 334 has an inclined surface 336 and a blocking surface 337. The blocking surface 337 can abut against the rear side of the wafer loading unit 11 to push the wafer loading units 11 By the first The second lifting unit 31' moves toward one side of the second translation unit 34.

而該第二平移單元34具有一個懸吊在該機箱21內部的第一吊架341、一個可移動地安裝在該第一吊架341下方的進料推架342,以及一個驅動該進料推架342沿著該第二方向14移動的第二平移壓缸343。該第三平移單元35的結構與該第二平移單元34類似,並具有一個懸掛在該上基板22下方的第二吊架351、一個可移動地安裝在該第二吊架351下方的出料推架352,以及一個驅動該出料推架352沿著該第一方向13移動的第三平移壓缸353。The second translating unit 34 has a first hanger 341 suspended inside the casing 21, a feeding pusher 342 movably mounted below the first hanger 341, and a drive for pushing the feed. The second translation cylinder 343 of the frame 342 moves along the second direction 14. The third translating unit 35 is similar in structure to the second translating unit 34 and has a second hanger 351 suspended below the upper substrate 22 and a discharge movably mounted below the second hanger 351. The push frame 352 and a third translation cylinder 353 that drives the discharge push frame 352 to move along the first direction 13.

參閱圖3、5、6,本實施例該第四平移單元36的結構與該第一平移單元33類似,並具有一個安裝在該下基板23底面的第四平移壓缸361、一個被該第四平移壓缸361之缸軸驅動而沿著該第二方向14往復移動的拉動架362,以及兩個可彈性復位地安裝在該拉動架362上的第二拉移件363,該等第二拉移件363分別對應該第一升降單元31之缺槽315,且分別具有一個朝向該等缺槽315的傾斜面364,以及一個擋推面365。該等第二拉移件363可以伸入該等晶圓載裝單元11之載箱111的底溝槽114內,以便在該第四平移壓缸361拉動該拉動架362移動時,藉該等第二拉移件363之擋推面365與該等晶圓載裝單元11之底溝槽114的抵靠,將位於該第一升降單元31上之晶圓載裝單元11往該第三平移單元35拉動。Referring to Figures 3, 5 and 6, the fourth translation unit 36 is similar in structure to the first translation unit 33, and has a fourth translation cylinder 361 mounted on the bottom surface of the lower substrate 23, one of which is a pulling frame 362 driven by the cylinder shaft of the four translation cylinder 361 to reciprocate along the second direction 14, and two second pulling members 363 elastically resetably mounted on the pulling frame 362, the second The pulling members 363 respectively correspond to the notches 315 of the first lifting unit 31, and respectively have an inclined surface 364 facing the missing slots 315, and a blocking surface 365. The second pulling member 363 can extend into the bottom groove 114 of the carrying case 111 of the wafer loading unit 11 to borrow the same when the fourth translation cylinder 361 pulls the pulling frame 362 to move. The blocking surface 365 of the second pulling member 363 abuts against the bottom groove 114 of the wafer loading unit 11 to pull the wafer loading unit 11 located on the first lifting unit 31 to the third translation unit 35. .

參閱圖3、7、8,本實施例該角度調整機構4包括一個安裝在該上基板22之開槽222下方的固定吊架41、 一個安裝在該固定吊架41下方的升降壓缸42、一個被該升降壓缸42推動可升降的升降吊架43、一個架設在該升降吊架43上方並位於該上基板22上方的承載座44、一個安裝在該上基板22之開槽222內的調整旋轉件45,以及一個被該調整旋轉件45帶動可微量升降及旋轉的旋轉盤46,該承載座44具有一個供該旋轉盤46伸出的穿孔441,該調整旋轉件45並具有一支和該旋轉盤46連動地結合的軸桿451。Referring to Figures 3, 7, and 8, the angle adjusting mechanism 4 of the present embodiment includes a fixed hanger 41 mounted under the slot 222 of the upper substrate 22. a lifting and lowering cylinder 42 mounted under the fixed hanger 41, a lifting and lowering hanger 43 pushed up and down by the lifting and lowering cylinder 42 , and a carrier mounted above the lifting and lowering bracket 43 and above the upper substrate 22 44. An adjustment rotary member 45 mounted in the slot 222 of the upper substrate 22, and a rotary disk 46 driven by the adjustment rotary member 45 for micro-lifting and rotating. The carrier 44 has a rotary disk 46 for the rotary disk 46. An extended perforation 441, the adjustment rotary member 45 and a shaft 451 coupled in conjunction with the rotary disk 46.

該托移機構5安裝在該機架2之上基板22上,並可夾取位在該載箱111內的加工組件112,其包括一個沿著該第一方向13設置並架設在該上基板22上的托持壓缸51,以及一個被該托持壓缸51驅動而沿著該第一方向13往復移動的托架52,該托架52具有兩個沿著該第一方向13設置並可以往該第一升降單元31移動的托叉521,所述托叉521分別位在該承載座44相反側,並可將位於該第一升降單元31上之加工組件112托移到該角度調整機構4之承載座44及該旋轉盤46上。The loading mechanism 5 is mounted on the substrate 22 above the frame 2, and can capture the processing component 112 located in the carrier 111, and includes a device disposed along the first direction 13 and mounted on the upper substrate a holding cylinder 51 on 22, and a bracket 52 driven by the holding cylinder 51 to reciprocate along the first direction 13, the bracket 52 having two disposed along the first direction 13 and a fork 521 that can move toward the first lifting unit 31. The fork 521 is located on the opposite side of the carrier 44, and can move the processing component 112 located on the first lifting unit 31 to the angle adjustment. The carrier 44 of the mechanism 4 and the rotating disk 46.

參閱圖3、9、10,本實施例該進料機構6可將位於該承載座44上的加工組件112移送到該研磨裝置12(參見圖1)進行加工,並包括一個架設在該上基板22上方的懸空基架61、一個可移動地安裝在該懸空基架61上的突伸台62、一個帶動該突伸台62沿著該第二方向14往復移動的進料動力源63、一個位於該突伸台62下方的升降載台64、一個安裝在該突伸台62上並帶動該升降載台64升降的進料壓缸65,以及數個等角度安裝在升降載台64上的夾持件 66,每個夾持件66都具有一個安裝在該升降載台64上的夾持壓缸661,以及一個被該夾持壓缸661驅動在一夾持位置及一非夾持位置間移動的夾爪662,即前述夾爪662可以被該夾持壓缸661驅動往徑向外端移動,或者往徑向內端移動。Referring to Figures 3, 9, and 10, the feeding mechanism 6 of the present embodiment can transfer the processing assembly 112 located on the carrier 44 to the grinding device 12 (see Fig. 1) for processing, and includes a mounting on the upper substrate. a suspended base 61 above the 22, a projecting platform 62 movably mounted on the suspended base 61, a feed power source 63 for driving the projecting table 62 to reciprocate along the second direction 14, and a feed source 63 a lifting platform 64 located below the protruding table 62, a feeding cylinder 65 mounted on the protruding table 62 and driving the lifting platform 64 to rise and lower, and a plurality of angles mounted on the lifting platform 64 at equal angles Clamping piece 66. Each of the clamping members 66 has a clamping cylinder 661 mounted on the lifting platform 64, and a driving cylinder 661 is driven between a clamping position and a non-clamping position. The jaw 662, that is, the aforementioned jaw 662, can be driven by the clamping cylinder 661 to move toward the radially outer end or to the radially inner end.

參閱圖1、2、3,本實施例該進料裝置在使用時,裝載有該等晶圓116之晶圓載裝單元11擺放在該機架2之進料板26處,並推送到該第二升降單元31’之升降座312上,受到該第二升降單元31’之升降動力源313的驅動,該晶圓載裝單元11將上升與該上基板22等高,之後將該晶圓載裝單元11推送到該上基板22上,緊接著,該第一平移單元33之該等第一拉移件334會將該該晶圓載裝單元11往該第二平移單元34的方向移送,當該晶圓載裝單元11對應該第二平移單元34之進料推架342時,受到該第二平移單元34的帶動,該晶圓載裝單元11會沿著該第二方向14往後移送到該第一升降單元31的升降座312上,此時,該第一升降單元31的升降座312會受到該升降動力源313的驅動逐格下降,使該晶圓載裝單元11上的每個加工組件112逐步的對應該托移機構5之托架52。Referring to Figures 1, 2, and 3, in the present embodiment, when the feeding device is in use, the wafer loading unit 11 loaded with the wafers 116 is placed at the feeding plate 26 of the frame 2 and pushed to the feeding plate. The lifting base 312 of the second lifting unit 31' is driven by the lifting power source 313 of the second lifting unit 31', and the wafer loading unit 11 is raised to be equal to the upper substrate 22, and then the wafer is loaded. The unit 11 is pushed onto the upper substrate 22, and then the first pulling member 334 of the first translation unit 33 transfers the wafer carrier unit 11 to the second translation unit 34. When the wafer loading unit 11 corresponds to the feeding push frame 342 of the second translation unit 34, the wafer loading unit 11 is driven by the second translation unit 34, and the wafer loading unit 11 is moved backward along the second direction 14 to the first On the lifting base 312 of the lifting unit 31, at this time, the lifting base 312 of the first lifting unit 31 is gradually lowered by the driving of the lifting power source 313, so that each processing component 112 on the wafer loading unit 11 Gradually, the bracket 52 of the mechanism 5 is to be moved.

參閱圖3、7、8,當該托移機構5之托架52要由該載箱111中托出該等加工組件112的其中之一時,該旋轉盤46及該承載座44會如圖8實線所示略為下降,而該托架52會被驅動沿著該第一方向13往該第一升降單元31移進,並由該載箱111內托出該等加工組件112的其中 之一後回到該上基板22的開槽222附近。接著,原本下降之該旋轉盤46及該承載座44會上升托住該加工組件112,在托持後該旋轉盤46略高於該承載座44。此時,藉由設在該加工組件112及該旋轉盤46上之感測元件(圖未示)的感測,可以感測該加工組件112之擺放角度是否正確,並藉由該調整旋轉件45帶動該旋轉盤46轉動,以微調該加工組件112的角度,並方便後續的加工。Referring to Figures 3, 7, and 8, when the carrier 52 of the carrier mechanism 5 is to be loaded out of the processing module 112 by the carrier 111, the rotating disk 46 and the carrier 44 will be as shown in FIG. The solid line is slightly lowered, and the bracket 52 is driven to move along the first direction 13 toward the first lifting unit 31, and the processing assembly 112 is carried by the carrier 111. One of them is returned to the vicinity of the opening 222 of the upper substrate 22. Then, the rotating disk 46 and the carrier 44 which are originally lowered will support the processing assembly 112, and the rotating disk 46 is slightly higher than the carrier 44 after being held. At this time, by sensing the sensing component (not shown) provided on the processing component 112 and the rotating disk 46, it can be sensed whether the positioning angle of the processing component 112 is correct, and rotated by the adjustment. The member 45 drives the rotating disk 46 to rotate to finely adjust the angle of the processing assembly 112 and facilitate subsequent processing.

參閱圖3、9、10,當該加工組件112的角度正確後,該進料機構6之進料壓缸65就會帶動該升降載台64下降,且該等夾爪662會因為該等夾持壓缸661的帶動往徑向外端移動,並位在該非夾持位置,當該等夾爪662之底緣越過該加工組件112之底緣時,該等夾持壓缸661會內縮,使該等夾爪662轉換到該夾持位置,並因此夾持該加工組件112。而當該進料壓缸65帶動該升降載台64上升,同時該進料機構6之進料動力源63帶動該突伸台62往該研磨裝置12(參見圖1)的方向移入,就可進行研磨加工。Referring to Figures 3, 9, and 10, when the angle of the processing assembly 112 is correct, the feeding cylinder 65 of the feeding mechanism 6 will drive the lifting platform 64 to descend, and the jaws 662 will be the same. The driving cylinder 661 is moved toward the radially outer end and is located at the non-clamping position. When the bottom edge of the clamping jaws 662 passes over the bottom edge of the processing assembly 112, the clamping cylinders 661 are retracted. The jaws 662 are translated to the gripping position and thus the processing assembly 112 is clamped. When the feeding cylinder 65 drives the lifting platform 64 to rise, and the feeding power source 63 of the feeding mechanism 6 drives the protruding table 62 to move in the direction of the grinding device 12 (see FIG. 1), Grinding is performed.

研磨後的加工組件112再度回到圖3的位置,並且重新擺放到該角度調整機構4之承載座44上,然後藉由該托移機構5之托架52上,重新送回到該晶圓載裝單元11的載箱111內,以此類推,就可自動化將位於該載箱111內的加工組件112一一的移送到該研磨裝置12內進行研磨。The ground processing assembly 112 is again returned to the position of FIG. 3 and repositioned onto the carrier 44 of the angle adjustment mechanism 4, and then returned to the crystal by the carrier 52 of the loading mechanism 5. In the carrier 111 of the circular loading unit 11, by analogy, the processing components 112 located in the carrier 111 can be automatically transferred to the polishing apparatus 12 for polishing.

參閱圖2、3、5,當該晶圓載裝單元11內的加 工組件112都加工完成後,該第一升降單元31之升降座312會移動到最低的位置,並且對應該移送機構3之第四平移單元36,藉由該第四平移單元36及該第三平移單元35的作動,可以將加工完成之晶圓載裝單元11往該進料板26的方向移送,並因此達到自動進料及出料一貫化的目的。Referring to Figures 2, 3, and 5, when the wafer carrier unit 11 is added After the processing of the assembly 112 is completed, the lifting seat 312 of the first lifting unit 31 is moved to the lowest position, and the fourth translation unit 36 corresponding to the transfer mechanism 3, by the fourth translation unit 36 and the third The operation of the translating unit 35 can transfer the processed wafer loading unit 11 to the feeding plate 26, and thus achieve the purpose of automatic feeding and discharging consistency.

由以上說明可知,本新型該自動進料裝置10可以源源不斷地將該等晶圓載裝單元11之加工組件112一一的移送到該角度調整機構4之旋轉盤46上,在等待校正角度值後,藉由該進料機構6送到該研磨裝置12內進行研磨之後,之後送回到該自動進料裝置10,藉由該第三平移單元35及該第四平移單元36的移送,完成一貫化進料及出料作業,故本新型該自動進料裝置10不僅結構新穎,亦可達到自動化進料及出料的目的,同時降低研磨加工的人力成本。As can be seen from the above description, the automatic feeding device 10 of the present invention can continuously transfer the processing components 112 of the wafer loading units 11 one by one to the rotating disk 46 of the angle adjusting mechanism 4, waiting for the correction angle value. After being sent to the grinding device 12 for grinding by the feeding mechanism 6, and then returned to the automatic feeding device 10, the transfer of the third translation unit 35 and the fourth translation unit 36 is completed. Consistent feeding and discharging operations, the novel automatic feeding device 10 of the present invention not only has a novel structure, but also achieves the purpose of automatic feeding and discharging, and at the same time reduces the labor cost of the grinding process.

惟以上所述者,僅為本新型之較佳實施例而已,當不能以此限定本新型實施之範圍,即大凡依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, that is, the simple equivalent changes and modifications made in accordance with the scope of the present patent application and the contents of the patent specification, All remain within the scope of this new patent.

10‧‧‧自動進料裝置10‧‧‧Automatic feeding device

11‧‧‧晶圓載裝單元11‧‧‧ wafer carrier unit

111‧‧‧載箱111‧‧‧ carrying case

112‧‧‧加工組件112‧‧‧Processing components

113‧‧‧箱底壁113‧‧‧ box bottom wall

114‧‧‧底溝槽114‧‧‧ bottom groove

115‧‧‧載盤115‧‧‧Package

116‧‧‧晶圓116‧‧‧ wafer

13‧‧‧第一方向13‧‧‧First direction

14‧‧‧第二方向14‧‧‧second direction

2‧‧‧機架2‧‧‧Rack

22‧‧‧上基板22‧‧‧Upper substrate

222‧‧‧開槽222‧‧‧ slotting

23‧‧‧下基板23‧‧‧ Lower substrate

24‧‧‧第一立板24‧‧‧First Board

25‧‧‧第二立板25‧‧‧Second board

3‧‧‧移送機構3‧‧‧Transfer organization

31‧‧‧第一升降單元31‧‧‧First lifting unit

31’‧‧‧第二升降單元31’‧‧‧Second Lifting Unit

311‧‧‧升降軌道311‧‧‧ lifting track

312‧‧‧升降座312‧‧‧ Lifting seat

313‧‧‧升降動力源313‧‧‧ Lifting power source

314‧‧‧座底壁314‧‧‧ bottom wall

315‧‧‧缺槽315‧‧‧ Missing slot

34‧‧‧第二平移單元34‧‧‧Second translation unit

4‧‧‧角度調整機構4‧‧‧ Angle adjustment mechanism

41‧‧‧固定吊架41‧‧‧Fixed hanger

42‧‧‧升降壓缸42‧‧‧lifting cylinder

43‧‧‧升降吊架43‧‧‧ lifting hanger

5‧‧‧托移機構5‧‧‧Transfer agency

51‧‧‧托持壓缸51‧‧‧ holding cylinder

52‧‧‧托架52‧‧‧ bracket

6‧‧‧進料機構6‧‧‧Feeding agency

61‧‧‧懸空基架61‧‧‧ suspended pedestal

62‧‧‧突伸台62‧‧‧ protruding station

63‧‧‧進料動力源63‧‧‧ Feed power source

64‧‧‧升降載台64‧‧‧lifting platform

65‧‧‧進料壓缸65‧‧‧feeding cylinder

66‧‧‧夾持件66‧‧‧Clamping parts

Claims (6)

一種研磨設備之自動進料裝置,用來移送一個晶圓載裝單元,該晶圓載裝單元包括一個載箱,以及數個裝設在該載箱內並具有至少一晶圓的加工組件,而該進料裝置可將該等加工組件移送到一個研磨裝置進行研磨加工,並包含:一個機架;一角度調整機構,安裝在該機架上,並包括一個用來承接該加工組件的承載座、一個帶動該承載座升降的升降壓缸、一個旋轉盤,以及一個帶動該旋轉盤旋轉的調整旋轉件,該承載座具有一個供該旋轉盤伸出以頂撐該加工組件的穿孔;一個托移機構,安裝在該機架上,包括一個可由該載箱內取出該加工組件並將該加工組件移送到該旋轉盤及該承載座上方的托架;一個進料機構,安裝在該機架上,並將位於該承載座上之加工組件移送到該研磨裝置;及一個移送機構,安裝在該機架上,並將該晶圓載裝單元移送到鄰近該托移機構,以方便該托移機構之該托架由該載箱取出該加工組件。An automatic feeding device for a grinding device for transferring a wafer carrier unit, the wafer carrier unit comprising a carrier, and a plurality of processing components mounted in the carrier and having at least one wafer, and the processing component The feeding device can transfer the processing components to a grinding device for grinding, and comprises: a frame; an angle adjusting mechanism mounted on the frame and including a carrier for receiving the processing component, a lifting cylinder for driving the carrier to lift, a rotating disk, and an adjusting rotating member for driving the rotating disk, the bearing seat has a through hole for the rotating disk to protrude to support the processing component; a mechanism mounted on the frame, including a bracket from which the processing assembly can be removed from the carrier and the processing assembly is transferred to the rotating disk and the carrier; a feeding mechanism mounted on the frame And transferring the processing component located on the carrier to the grinding device; and a transfer mechanism mounted on the frame and transferring the wafer carrier unit to the vicinity Torr shift mechanism to facilitate the shifting mechanism of the carriage of the tray assembly taken out from the processing of the ballast tank. 如請求項1所述的研磨設備之自動進料裝置,其中,機架包括一個上基板,該上基板具有一個供該調整旋轉件架設的開槽,而該角度調整機構還包括一個懸吊在該上基板下方並供該升降壓缸架設的固定吊 架,以及一個被該升降壓缸驅動升降的升降吊架,而該承載座位於該上基板的上方並架設在該升降吊架上。The automatic feeding device of the grinding apparatus according to claim 1, wherein the frame comprises an upper substrate having a slot for the adjusting rotating member, and the angle adjusting mechanism further comprises a hanging a fixed crane below the upper substrate and provided for the lifting and lowering cylinder And a lifting hanger driven by the lifting and lowering cylinder, wherein the carrier is located above the upper substrate and is mounted on the lifting hanger. 如請求項2所述的研磨設備之自動進料裝置,其中,該托移機構還包括一個帶動該托架沿著一個第一方向往復移動的托持壓缸,該托架具有兩支分別位在該承載座相反側的托叉。The automatic feeding device of the grinding apparatus of claim 2, wherein the loading mechanism further comprises a holding cylinder that drives the carrier to reciprocate along a first direction, the bracket having two separate positions a fork on the opposite side of the carrier. 如請求項3所述的研磨設備之自動進料裝置,其中,該進料機構包括一個架設在該上基板上的懸空基架、一個突伸台、一個將該突伸台架設於該懸空基架上並可往該研磨裝置突伸的進料動力源、一個升降載台、一個將該升降載台架設在該突伸台下方的進料壓缸,以及數個安裝在該升降載台上並可夾持該加工組件的夾持件。The automatic feeding device of the grinding apparatus of claim 3, wherein the feeding mechanism comprises a suspended base frame mounted on the upper substrate, a protruding platform, and a protruding platform is mounted on the hanging base a feed power source protruding from the grinding device, a lifting platform, a feeding cylinder for arranging the lifting platform below the protruding table, and a plurality of loading cylinders mounted on the lifting platform The clamping member of the processing assembly can be clamped. 如請求項4所述的研磨設備之自動進料裝置,其中,該等夾持件都具有一個安裝在該升降載台上的夾持壓缸,以及一個被該夾持壓缸控制而可在一夾移位置及一非夾持位置間轉換的夾爪。The automatic feeding device of the grinding apparatus according to claim 4, wherein the clamping members each have a clamping cylinder mounted on the lifting platform, and a control cylinder is controlled by the clamping cylinder a clamping position between a pinch position and a non-clamping position. 如請求項4所述的研磨設備之自動進料裝置,其中,該機架還包括一個位於該上基板下方的下基板,以及兩個間隔設置的立板,而該移送機構包括兩個分別安裝在該等立板上並可帶動該晶圓載裝單元升降的升降單元,以及數個帶動該晶圓載裝單元平移的平移單元。An automatic feeding device for a grinding apparatus according to claim 4, wherein the frame further comprises a lower substrate located below the upper substrate, and two spaced apart vertical plates, and the transfer mechanism comprises two separate mountings A lifting unit that can lift and lower the wafer carrier unit on the vertical board, and a plurality of translation units that drive the wafer carrier unit to translate.
TW103214318U 2014-08-12 2014-08-12 Automatic feeding device of grinding equipment TWM491548U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI749915B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Lift apparatus of automatic processing machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI749915B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Lift apparatus of automatic processing machine

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