TWM472292U - Dual port SRAM - Google Patents

Dual port SRAM Download PDF

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TWM472292U
TWM472292U TW102219054U TW102219054U TWM472292U TW M472292 U TWM472292 U TW M472292U TW 102219054 U TW102219054 U TW 102219054U TW 102219054 U TW102219054 U TW 102219054U TW M472292 U TWM472292 U TW M472292U
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Taiwan
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nmos transistor
transistor
inverter
write
drain
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TW102219054U
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Chinese (zh)
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Ming-Chuen Shiau
Jia-Yu Jhuang
Yu-Hao Luo
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Univ Hsiuping Sci & Tech
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Description

雙埠靜態隨機存取記憶體Double-click static random access memory

本創作係有關於一種雙埠靜態隨機存取記憶體(Static Random Access Memory,簡稱SRAM),尤指一種即使於高記憶容量時仍能具有高可靠性與高穩定性之寫入操作的雙埠靜態隨機存取記憶體,其不但能解決習知具單一寫入用位元線之雙埠SRAM寫入邏輯1困難之問題,並且也能藉由電荷回收(recycling charge),以避免無謂的功率耗損。The present invention relates to a double random static random access memory (SRAM), especially a double-turning operation capable of high reliability and high stability even at high memory capacity. Static random access memory, which not only solves the problem of the conventional double-SRAM write logic 1 with a single write bit line, but also can avoid unnecessary power by charge recycling. Loss.

記憶體在電腦工業中扮演著無可或缺的角色。通常,記憶體可依照其能否在電源關閉後仍能保存資料,而區分為非揮發性(non-volatile)記憶體及揮發性(volatile)記憶體,非揮發性記憶體所儲存之資料並不會因電源關閉或中斷而消失,而儲存在揮發性記憶體之資料則會隨著電源關閉或中斷而被消除。常見的揮發性記憶體有動態隨機存取記憶體(DRAM)及靜態隨機存取記憶體(SRAM)兩種。動態隨機存取記憶體(DRAM)具有面積小及價格低等優點,但操作時必須不時地更新(refresh)以防止資料因漏電流而遺失,而導致存在有高速化困難及消耗功率大等缺失。相反地,靜態隨機存取記憶體(SRAM)的操作則較為簡易且毋須更新操作,因此具有高速化及消耗功率低等優點。Memory plays an indispensable role in the computer industry. Generally, the memory can be classified into non-volatile memory and volatile memory, non-volatile memory, and stored according to whether it can save data after the power is turned off. It will not disappear due to power off or interruption, and the data stored in volatile memory will be eliminated as the power is turned off or interrupted. Common volatile memory types are dynamic random access memory (DRAM) and static random access memory (SRAM). Dynamic random access memory (DRAM) has the advantages of small area and low price, but it must be refreshed from time to time to prevent data from being lost due to leakage current, resulting in high speed and power consumption. Missing. Conversely, the operation of the static random access memory (SRAM) is simple and does not require an update operation, so it has the advantages of high speed and low power consumption.

目前以行動電話為代表之行動電子設備所採用之半導體記憶裝置,係以SRAM為主流。The semiconductor memory devices currently used in mobile electronic devices represented by mobile phones are mainly SRAM.

習知之靜態隨機存取記憶體(SRAM)如第1a圖所示,其主要 包括一記憶體陣列(memory array),該記憶體陣列係由複數個記憶體區塊(memory block,MB1 、MB2 等)所組成,每一記憶體區塊更由複數列記憶體晶胞(a plurality of rows of memory cells)與複數行記憶體晶胞(a plurality of columns of memory cells)所組成,每一列記憶體晶胞與每一行記憶體晶胞各包括有複數個記憶體晶胞;複數條字元線(word line,WL1 、WL2 等),每一字元線對應至複數列記憶體晶胞中之一列;以及複數位元線對(bit line pairs,BL1 、BLB1 ...BLm 、BLBm 等),每一位元線對係對應至複數行記憶體晶胞中之一行,且每一位元線對係由一位元線(BL1 ...BLm )及一互補位元線(BLB1 ...BLBm )所組成。A conventional static random access memory (SRAM), as shown in FIG. 1a, mainly includes a memory array, which is composed of a plurality of memory blocks (MB 1 , MB). 2, etc., each memory block is composed of a plurality of columns of memory cells and a plurality of columns of memory cells, each column The memory cell and each row of memory cells each include a plurality of memory cells; a plurality of word lines (word line, WL 1 , WL 2 , etc.), each word line corresponding to a plurality of columns of memory crystals One of the cells; and a plurality of bit line pairs (BL 1 , BLB 1 ... BL m , BLB m , etc.), each bit line pair corresponding to one of the plurality of rows of memory cells And each bit line pair is composed of one bit line (BL 1 ... BL m ) and one complementary bit line (BLB 1 ... BLB m ).

第1b圖所示即是6T靜態隨機存取記憶體(SRAM)晶胞之電路示意圖,其中,PMOS電晶體(P1)和(P2)稱為負載電晶體(load transistor),NMOS電晶體(M1)和(M2)稱為驅動電晶體(driving transistor),NMOS電晶體(M3)和(M4)稱為存取電晶體(access transistor),WL為字元線(word line),而BL及BLB分別為位元線(bit line)及互補位元線(complementary bit line),由於該SRAM晶胞需要6個電晶體,且驅動電晶體與存取電晶體間的電流驅動能力比(即單元比率,cell ratio)通常設定在2.2至3.5之間,而導致存在有高集積化困難及價格高等缺失。Figure 1b shows the circuit diagram of a 6T static random access memory (SRAM) cell. The PMOS transistors (P1) and (P2) are called load transistors and NMOS transistors (M1). And (M2) are called driving transistors, NMOS transistors (M3) and (M4) are called access transistors, WL is word line, and BL and BLB They are a bit line and a complementary bit line, respectively. Since the SRAM cell requires six transistors, and the current drive capability ratio between the drive transistor and the access transistor (ie, the cell ratio) The cell ratio is usually set between 2.2 and 3.5, resulting in the difficulty of high integration and high price.

第1b圖所示6T靜態隨機存取記憶體晶胞於寫入操作時之HSPICE暫態分析模擬結果,如第2圖所示,其係以level 49模型且使用TSMC 0.18微米CMOS製程參數加以模擬。The HSPICE transient analysis simulation results of the 6T SRAM cell in the write operation shown in Figure 1b, as shown in Figure 2, are simulated in a level 49 model using TSMC 0.18 micron CMOS process parameters. .

用來減少6T靜態隨機存取記憶體(SRAM)晶胞之電晶體數之一種方式係揭露於第3圖中。第3圖顯示一種僅具單一位元線之5T靜態隨機存取記憶體晶胞之電路示意圖,與第1圖之6T靜態隨機存取記憶體晶胞相比,此種5T靜態隨機存取記憶體晶胞比6T靜態隨機存取記憶體晶胞少一個電晶體及少一條位元線,惟該5T靜態隨機存取記憶體晶胞在不變更PMOS電晶體P11和P12以及NMOS電晶體M11、M12和M13的 通道寬長比的情況下(不變更PMOS電晶體P11和P12以及NMOS電晶體M11、M12和M13的通道寬長比的目的係為了保有與6T靜態隨機存取記憶體相同的靜態雜訊邊際(Static Noise Margin,SNM))存在寫入邏輯1相當困難之問題。茲考慮記憶晶胞左側節點A原本儲存邏輯0的情況,由於節點A之電荷僅單獨自位元線(BL)傳送,因此很難將節點A中先前寫入的邏輯0蓋寫成邏輯1。第3圖所示5T靜態隨機存取記憶體晶胞,於寫入操作時之HSPICE暫態分析模擬結果,如第4圖所示,其係以level 49模型且使用TSMC 0.18微米CMOS製程參數加以模擬,由該模擬結果可証實,具單一位元線之5T靜態隨機存取記憶體晶胞存在寫入邏輯1相當困難之問題。One way to reduce the number of transistors in a 6T static random access memory (SRAM) cell is disclosed in FIG. Figure 3 shows a circuit diagram of a 5T SRAM cell with only a single bit line. Compared with the 6T SRAM cell of Figure 1, the 5T static random access memory. The bulk cell has one transistor and one less bit line than the 6T SRAM cell, but the 5T SRAM cell does not change the PMOS transistors P11 and P12 and the NMOS transistor M11, M12 and M13 In the case of the channel width to length ratio (the purpose of not changing the channel width to length ratio of the PMOS transistors P11 and P12 and the NMOS transistors M11, M12, and M13 is to maintain the same static noise margin as the 6T static random access memory ( Static Noise Margin, SNM)) The problem of writing logic 1 is quite difficult. Considering that the node A on the left side of the memory cell originally stores logic 0, since the charge of node A is only transmitted from the bit line (BL) alone, it is difficult to write the logic 0 previously written in node A to logic 1. Figure 5 shows the results of the HSPICE transient analysis simulation of the 5T SRAM cell during the write operation. As shown in Figure 4, it is modeled using the level 49 model using TSMC 0.18 micron CMOS process parameters. Simulation, from the simulation results, it can be confirmed that the 5T SRAM cell with a single bit line has a problem that writing logic 1 is quite difficult.

迄今,有許多具單一位元線之5T靜態隨機存取記憶體晶胞之技術被提出,例如非專利文獻1(I.Carlson et al.,”A high density,low leakage,5T SRAM for embedded caches,”Solid-State Circuits Conference,2004.ESSCIRC 2004.Proceeding of the 30th European,pp.215-218,2004.)之5T SRAM由於係藉由重新設計晶胞中之二驅動電晶體、二負載電晶體以及一存取電晶體之通道寬長比以解決寫入邏輯1困難之問題,而造成破壞原有晶胞中之驅動電晶體與負載電晶體之對稱性關係並從而易受製程變異的影響且具較低之SNM;非專利文獻2(M.Wieckowski et al.,”A novel five-transistor(5T)SRAM cell for high performance cache,”IEEE Conference on SOC,pp.1001-1002,2005.)之5T SRAM由於係將一長通道長度之存取電晶體設置於晶胞中之二負載電晶體之間以解決寫入邏輯1困難之問題,而造成降低存取速度之缺失;專利文獻3(98年6月1日第TW M358390號)所提出之「寫入操作時降低電源電壓之單埠靜態隨機存取記憶體」(其主要代表圖如第5圖所示),雖可有效解決寫入邏輯1困難之問題,惟寫入操作時,由於缺乏有效的放電路徑且須使用雙電源供應電壓(HVDD 、LVDD ),而造成電路結構複雜以及於高記憶容量及/或高速操 作時存在低寫入速度之缺失。專利文獻4(99年11月1日第TW M391711號)所提出之「具放電路徑之單埠SRAM」(其主要代表圖如第6圖所示),雖提供有放電路徑以有效解決寫入邏輯1困難之問題,惟由於仍須使用雙電源供應電壓(HVDD 、LVDD ),而造成電路結構仍稍嫌複雜之缺失。專利文獻5(99年4月27日第US7706203 B2號)所提出之「Memory System」(其主要代表圖如第7圖所示),雖可有效解決寫入邏輯1困難之問題,並設有放電路徑,惟寫入操作期間,由於該放電路徑恆導通,亦即於寫入操作期間位於電源供應電壓與接地間之NMOS電晶體M24與M21恆有直流電流流過,而造成無謂的功率耗損之缺失。To date, many techniques have been proposed for a 5T SRAM cell with a single bit line, such as Non-Patent Document 1 (I. Carlson et al., "A high density, low leakage, 5T SRAM for embedded caches". , "Solid-State Circuits Conference, 2004. ESSCIRC 2004. Proceeding of the 30th European, pp. 215-218, 2004.) The 5T SRAM is due to the redesign of the two of the unit cell, the two-load transistor And accessing the channel width-to-length ratio of the transistor to solve the problem of writing logic 1 is difficult, thereby causing damage to the symmetry relationship between the driving transistor and the load transistor in the original unit cell and thus being susceptible to process variation and Lower SNM; Non-Patent Document 2 (M. Wieckowski et al., "A novel five-transistor (5T) SRAM cell for high performance cache," IEEE Conference on SOC, pp. 1001-1002, 2005.) The 5T SRAM has a problem of reducing the access speed by setting a long channel length access transistor between the two load transistors in the unit cell to solve the problem of writing logic 1; Patent Document 3 (98) "Writed by TW M358390 on June 1, the year of the year" In the operation of the power supply voltage to reduce the static random access memory (the main representative figure as shown in Figure 5), although it can effectively solve the problem of writing logic 1 difficult, but the write operation, due to the lack of effective The discharge path must use dual supply voltages (HV DD , LV DD ), resulting in a complicated circuit structure and a lack of low write speed at high memory capacity and/or high speed operation. Patent Document 4 (No. TW M391711, November 1, 1999), "SRAM with discharge path" (the main representative figure is shown in Fig. 6), although a discharge path is provided to effectively solve the write. The logic 1 is difficult, but the circuit structure is still slightly complicated due to the need to use dual power supply voltages (HV DD , LV DD ). The "Memory System" proposed in Patent Document 5 (No. 7,706,062 B2, April 27, 1999) (the main representative of which is shown in Fig. 7) can effectively solve the problem of writing logic 1 and is provided with The discharge path, but during the write operation, since the discharge path is constantly turned on, that is, the NMOS transistors M24 and M21 located between the power supply voltage and the ground during the writing operation have a constant DC current flowing, thereby causing unnecessary power loss. Missing.

有鑑於此,本創作之主要目的係提出一種雙埠靜態隨機存取記憶體,其僅於寫入操作之一初始時間方提供放電路徑,而於該初始時間後,則將原本要經由該放電路徑放掉之電荷回收(recycling charge),以避免無謂的功率耗損。In view of this, the main purpose of the present invention is to propose a double-埠 static random access memory that provides a discharge path only at an initial time of one of the write operations, and after the initial time, the discharge is originally to be performed. The path is discharged by a recycling charge to avoid unnecessary power consumption.

本創作之次要目的係提出一種雙埠靜態隨機存取記憶體,其毋須使用雙電源供應電壓,以避免電路結構複雜之缺失。The second objective of this creation is to propose a double-turn static random access memory that does not require the use of dual power supply voltages to avoid the lack of complex circuit structures.

本創作之再一目的係提出一種雙埠靜態隨機存取記憶體,其能藉由控制電路以有效避免習知具單一位元線之雙埠SRAM晶胞存在寫入邏輯1相當困難之問題。A further object of the present invention is to provide a dual-band static random access memory capable of effectively avoiding the problem of writing logic 1 by a control circuit to effectively avoid the presence of a double-bit SRAM cell having a single bit line.

本創作提出一種雙埠靜態隨機存取記憶體體,其主要包括一記憶體陣列、複數條字元線、複數條位元線以及複數個控制電路(2),該記憶體陣列係由複數列記憶體晶胞與複數行記憶體晶胞所組成,每一列記憶體晶胞設置一個控制電路(2),且每一記憶體晶胞(1)係包括一第一反相器(由一第一PMOS電晶體P1與一第一NMOS電晶體M1所組成)、一第二反相器(由一第二PMOS電晶體P2與一第二NMOS電晶體M2所組成)、一存取電晶體(由第三NMOS電晶體M3所組成)、一第一和第二讀取用電晶體(M4和M5)。該等控制電路(2)於對應之寫入控制信號 (CTL)為代表寫入模式之邏輯高位準時,藉由將一高電壓節點(VH)之電位放電一預定時間,以便將該高節點(VH)之電位由一電源電壓供應電壓(VDD )降低至該電源供應電壓(VDD )扣減一VTM24 (第七NMOS電晶體(M24)之臨界電壓)的電壓位準,俾藉此以於寫入模式時有效避免寫入邏輯1困難之問題,其中該寫入控制信號(CTL)係為一寫入致能(Write Enable,簡稱WE)信號與對應之寫入用字元線(WWL)信號的及閘(AND gate)運算結果,此時僅於該寫入致能WE信號與該對應之寫入用字元線(WWL)信號均為邏輯高位準時,該寫入控制信號(CTL)方為邏輯高位準。The present invention proposes a double-埠 static random access memory body, which mainly comprises a memory array, a plurality of word lines, a plurality of bit lines, and a plurality of control circuits (2), wherein the memory array is composed of a plurality of columns The memory cell is composed of a plurality of memory cells, each column of memory cells is provided with a control circuit (2), and each memory cell (1) includes a first inverter (by a first a PMOS transistor P1 and a first NMOS transistor M1), a second inverter (composed of a second PMOS transistor P2 and a second NMOS transistor M2), an access transistor ( A third NMOS transistor M3), a first and second read transistor (M4 and M5). The control circuit (2) discharges the potential of a high voltage node (VH) by a predetermined time when the corresponding write control signal (CTL) is at a logic high level representing the write mode, so as to the high node ( The potential of VH) is lowered by a power supply voltage supply voltage (V DD ) to a voltage level at which the power supply voltage (V DD ) is deducted by a V TM24 (the threshold voltage of the seventh NMOS transistor (M24)). The problem of difficulty in writing logic 1 is effectively avoided in the write mode, wherein the write control signal (CTL) is a write enable (WE) signal and a corresponding write word line ( WWL) signal AND gate operation result, at this time, the write control signal is only when the write enable WE signal and the corresponding write word line (WWL) signal are both logic high level ( CTL) is logically high.

P1‧‧‧第一PMOS電晶體P1‧‧‧First PMOS transistor

P2‧‧‧第二PMOS電晶體P2‧‧‧Second PMOS transistor

M1‧‧‧第一NMOS電晶體M1‧‧‧First NMOS transistor

M2‧‧‧第二NMOS電晶體M2‧‧‧Second NMOS transistor

M3‧‧‧第三NMOS電晶體M3‧‧‧ third NMOS transistor

M4‧‧‧第一讀取用電晶體M4‧‧‧first read transistor

M5‧‧‧第二讀取用電晶體M5‧‧‧Second reading transistor

A‧‧‧儲存節點A‧‧‧ storage node

B‧‧‧反相儲存節點B‧‧‧ Inverting storage node

VDD ‧‧‧電源供應電壓V DD ‧‧‧Power supply voltage

WBL‧‧‧寫入用位元線WBL‧‧‧Write bit line

WWL‧‧‧寫入用字元線WWL‧‧‧write word line

RBL‧‧‧讀取用位元線RBL‧‧‧Reading bit line

RWL‧‧‧讀取用字元線RWL‧‧‧Read word line

M21‧‧‧第四NMOS電晶體M21‧‧‧4th NMOS transistor

M22‧‧‧第五NMOS電晶體M22‧‧‧ Fifth NMOS transistor

M23‧‧‧第六NMOS電晶體M23‧‧‧ sixth NMOS transistor

M24‧‧‧第七NMOS電晶體M24‧‧‧ seventh NMOS transistor

P21‧‧‧第三PMOS電晶體P21‧‧‧ Third PMOS transistor

P22‧‧‧第四PMOS電晶體P22‧‧‧4th PMOS transistor

1‧‧‧SRAM晶胞1‧‧‧SRAM cell

2‧‧‧控制電路2‧‧‧Control circuit

CTL‧‧‧寫入控制信號CTL‧‧‧ write control signal

VH‧‧‧高電壓節點VH‧‧‧ high voltage node

第1a圖 係顯示習知之靜態隨機存取記憶體;第1b圖 係顯示習知6T靜態隨機存取記憶體晶胞之電路示意圖;第2圖 係顯示習知6T靜態隨機存取記憶體晶胞之寫入動作時序圖;第3圖 係顯示習知5T靜態隨機存取記憶體晶胞之電路示意圖;第4圖 係顯示習知5T靜態隨機存取記憶體晶胞之寫入動作時序圖;第5圖 係顯示習知第TW M358390號之5T靜態隨機存取記憶體晶胞之電路示意圖;第6圖 係顯示習知第TW M391711號之5T靜態隨機存取記憶體晶胞之電路示意圖;第7圖 係顯示習知第US7706203 B2號之5T靜態隨機存取記憶體晶胞之電路示意圖;第8圖 係顯示本創作較佳實施例所提出之電路示意圖。Figure 1a shows a conventional static random access memory; Figure 1b shows a schematic circuit diagram of a conventional 6T static random access memory cell; and Fig. 2 shows a conventional 6T static random access memory cell. The write operation timing chart; the third figure shows the circuit diagram of the conventional 5T static random access memory unit cell; the fourth figure shows the write operation timing chart of the conventional 5T static random access memory unit cell; 5 is a circuit diagram showing a 5T static random access memory cell of the conventional TW M358390; and FIG. 6 is a circuit diagram showing a 5T static random access memory cell of the conventional TW M391711; Fig. 7 is a circuit diagram showing a 5T static random access memory cell of the conventional US Pat. No. 7,706,062 B2; and Fig. 8 is a circuit diagram showing the preferred embodiment of the present invention.

根據上述之主要目的,本創作提出一種雙埠靜態隨機存取記憶體,其主要包括一記憶體陣列,該記憶體陣列係由複數列記憶體晶胞與複 數行記憶體晶胞所組成,每一列記憶體晶胞與每一行記憶體晶胞均包括有複數個記憶體晶胞(1);複數個控制電路(2),每一列記憶晶胞設置一個控制電路(2)。According to the above main object, the present invention proposes a double-twist static random access memory, which mainly comprises a memory array, which is composed of a plurality of columns of memory cells and complex A plurality of rows of memory cells, each column of memory cells and each row of memory cells includes a plurality of memory cells (1); a plurality of control circuits (2), one column of each memory cell Control circuit (2).

為了便於說明起見,第8圖所示之雙埠靜態隨機存取記憶體僅以一個記憶體晶胞(1)、一條寫入用字元線(WWL)、一條寫入用位元線(WBL)以及一控制電路(2)做為實施例來說明。該記憶體晶胞(1)係包括一第一反相器(由一第一PMOS電晶體P1與一第一NMOS電晶體M1所組成)、一第二反相器(由一第二PMOS電晶體P2與一第二NMOS電晶體M2所組成)、一第三NMOS電晶體(M3)、一第一讀取用電晶體(M4)以及一第二讀取用電晶體(M5),其中,該第一反相器及該第二反相器係呈交互耦合連接,亦即該第一反相器之輸出(即節點A)係連接該第二反相器之輸入,而該第二反相器之輸出(即節點B)則連接該第一反相器之輸入,並且該第一反相器之輸出(節點A)係用於儲存SRAM晶胞之資料,而該第二反相器之輸出(節點B)則用於儲存SRAM晶胞之反相資料。For convenience of explanation, the double-chip static random access memory shown in FIG. 8 has only one memory cell (1), one write word line (WWL), and one write bit line ( WBL) and a control circuit (2) are described as examples. The memory cell (1) includes a first inverter (composed of a first PMOS transistor P1 and a first NMOS transistor M1) and a second inverter (by a second PMOS) a crystal P2 and a second NMOS transistor M2), a third NMOS transistor (M3), a first read transistor (M4), and a second read transistor (M5), wherein The first inverter and the second inverter are connected in an alternating coupling manner, that is, the output of the first inverter (ie, node A) is connected to the input of the second inverter, and the second The output of the phase converter (ie, node B) is connected to the input of the first inverter, and the output of the first inverter (node A) is used to store data of the SRAM cell, and the second inverter The output (node B) is used to store the inverted data of the SRAM cell.

請參考第8圖,該第三NMOS電晶體(M3)係連接在該第一反相器之輸出(節點A)與對應之一寫入用位元線(WBL)之間,且閘極連接至對應之一寫入用字元線(WWL),該第二讀取用電晶體(M5)之源極、閘極與汲極係分別連接至接地電壓、該第二反相器之輸出(節點B)與該第一讀取用電晶體(M4)之源極;該第一讀取用電晶體(M4)之源極、閘極與汲極係分別連接至該第二讀取用電晶體(M5)之汲極、一讀取用字元線(RWL)與一讀取用位元線(RBL)。Referring to FIG. 8, the third NMOS transistor (M3) is connected between the output of the first inverter (node A) and a corresponding one of the write bit lines (WBL), and the gate is connected. To correspond to one of the write word lines (WWL), the source, the gate and the drain of the second read transistor (M5) are respectively connected to the ground voltage and the output of the second inverter ( a node B) and a source of the first read transistor (M4); a source, a gate and a drain of the first read transistor (M4) are respectively connected to the second read power The drain of the crystal (M5), a read word line (RWL) and a read bit line (RBL).

請再參考第8圖,該控制電路(2)係由一第四NMOS電晶體(M21)、一第五NMOS電晶體(M22)、一第六NMOS電晶體(M23)、一第七NMOS電晶體(M24)、一第三PMOS電晶體(P21)、一第四PMOS電晶體(P22)以及一寫入控制信號(CTL)所組成。該第四NMOS電晶體 (M21)與該第三PMOS電晶體(P21)係形成一連接於一電源供應電壓(VDD )與接地電壓之間之第三反相器,該第三反相器之輸入係供接收該寫入控制信號(CTL);該第五NMOS電晶體(M22)之源極、閘極與汲極係分別連接至該第六NMOS電晶體(M23)之汲極、該第三反相器之輸出與該第四PMOS電晶體(P22)之汲極;該第六NMOS電晶體(M23)之源極、閘極與汲極係分別連接至接地電壓、該寫入控制信號(CTL)與該第五NMOS電晶體(M22)之源極;該第七NMOS電晶體(M24)之汲極與閘極連接在一起並連接至該電源供應電壓(VDD ),而源極則連接至該第五NMOS電晶體(M22)之汲極和該第四PMOS電晶體(P22)之汲極;該第四PMOS電晶體(P22)之源極、閘極與汲極係分別連接至該電源供應電壓(VDD )、該寫入控制信號(CTL)與該第五NMOS電晶體(M22)之汲極。Referring again to FIG. 8, the control circuit (2) is composed of a fourth NMOS transistor (M21), a fifth NMOS transistor (M22), a sixth NMOS transistor (M23), and a seventh NMOS device. The crystal (M24), a third PMOS transistor (P21), a fourth PMOS transistor (P22), and a write control signal (CTL) are formed. The fourth NMOS transistor (M21) and the third PMOS transistor (P21) form a third inverter connected between a power supply voltage (V DD ) and a ground voltage, the third inverter The input is for receiving the write control signal (CTL); the source, the gate and the drain of the fifth NMOS transistor (M22) are respectively connected to the drain of the sixth NMOS transistor (M23), An output of the third inverter and a drain of the fourth PMOS transistor (P22); a source, a gate and a drain of the sixth NMOS transistor (M23) are respectively connected to a ground voltage, and the write control a signal (CTL) and a source of the fifth NMOS transistor (M22); a drain of the seventh NMOS transistor (M24) is connected to the gate and connected to the power supply voltage (V DD ), and the source The pole is connected to the drain of the fifth NMOS transistor (M22) and the drain of the fourth PMOS transistor (P22); the source, the gate and the drain of the fourth PMOS transistor (P22) respectively Connected to the power supply voltage (V DD ), the write control signal (CTL), and the drain of the fifth NMOS transistor (M22).

該控制電路(2)係設計成可因應不同操作模式而控制該高電壓節點(VH)之電壓位準,亦即該控制電路(2)於對應之寫入控制信號(CTL)為代表寫入模式之邏輯高位準時,藉由將一高電壓節點(VH)之電位放電一預定時間,以便將該高電壓節點(VH)之電位由該電源供應電壓(VDD )降低至該電源供應電壓(VDD )扣減一VTM24 (該第七NMOS電晶體(M24)之臨界電壓)的電壓位準,俾藉此以於寫入模式時有效避免寫入邏輯1困難之問題,其中該寫入控制信號(CTL)係為一寫入致能(Write Enable,簡稱WE)信號與對應之寫入用字元線(WWL)信號的及閘(AND gate)運算結果,此時僅於該寫入致能WE信號與該對應之寫入寫入字元線(WWL)信號均為邏輯高位準時,該寫入控制信號(CTL)方為邏輯高位準。The control circuit (2) is designed to control the voltage level of the high voltage node (VH) according to different operation modes, that is, the control circuit (2) writes a representative write control signal (CTL) The logic high timing of the mode is discharged by discharging a potential of a high voltage node (VH) for a predetermined time to lower the potential of the high voltage node (VH) from the power supply voltage (V DD ) to the power supply voltage ( V DD ) deducts the voltage level of a V TM 24 (the threshold voltage of the seventh NMOS transistor (M24)), thereby effectively avoiding the problem of writing logic 1 in the write mode, wherein the writing The control signal (CTL) is an AND gate operation result of a Write Enable (WE) signal and a corresponding write word line (WWL) signal, and only the write is performed at this time. When the enable WE signal and the corresponding write write word line (WWL) signal are both at a logic high level, the write control signal (CTL) side is at a logic high level.

茲依雙埠靜態隨機存取記憶體之工作模式說明第8圖之本創作較佳實施例的工作原理如下:The working principle of the preferred embodiment of the present invention is as follows:

(I)寫入模式(write mode)(I) write mode

於寫入操作開始前,該寫入控制信號(CTL)為邏輯低位準,使得該第三PMOS電晶體(P21)、該第四PMOS電晶體(P22)及該第五NMOS 電晶體(M22)均呈導通(ON)狀態,並使得該第四NMOS電晶體(M21)、該第六NMOS電晶體(M23)及該第七NMOS電晶體(M24)均呈OFF(截止)狀態,於是該高電壓節點(VH)之電壓位準係等於該電源供應電壓(VDD )。The write control signal (CTL) is at a logic low level before the start of the write operation, so that the third PMOS transistor (P21), the fourth PMOS transistor (P22), and the fifth NMOS transistor (M22) All of them are in an ON state, and the fourth NMOS transistor (M21), the sixth NMOS transistor (M23), and the seventh NMOS transistor (M24) are both turned OFF, so the height is high. The voltage level of the voltage node (VH) is equal to the power supply voltage (V DD ).

而於寫入模式之一初始期間(該初始期間約等於當該寫入控制信號(CTL)由邏輯低位準轉換至邏輯高位準時起算,至該第三反相器下降至足以關閉該第五NMOS電晶體M22為止之時間)內,該寫入控制信號(CTL)為邏輯高位準,該第三PMOS電晶體(P21)及該第四PMOS電晶體(P22)均為截止,該第四NMOS電晶體(M21)及該第六NMOS電晶體(M23)均呈導通,由於此時該第五NMOS電晶體(M22)仍呈導通,因此可將該高電壓節點(VH)由該電源供應電壓(VDD )之電壓位準朝(RM22 +RM23 )/(RM22 +RM23 +RM24 )乘以該電源供應電壓(VDD )之電壓位準開始放電,其中該RM22 表示該第五NMOS電晶體(M22)之導通等效電阻,該RM23 表示該第六NMOS電晶體(M23)之導通等效電阻,而該RM24 表示該第七NMOS電晶體(M24)之導通等效電阻,藉此得以有效防止寫入邏輯1困難之問題。And during an initial period of the write mode (the initial period is approximately equal to when the write control signal (CTL) is converted from the logic low level to the logic high level, until the third inverter falls to be sufficient to turn off the fifth NMOS During the period of the transistor M22, the write control signal (CTL) is at a logic high level, and the third PMOS transistor (P21) and the fourth PMOS transistor (P22) are both turned off, and the fourth NMOS is turned off. The crystal (M21) and the sixth NMOS transistor (M23) are both turned on. Since the fifth NMOS transistor (M22) is still turned on at this time, the high voltage node (VH) can be supplied with the voltage from the power source ( V DD) towards the voltage level (R M22 + R M23) / (R M22 + R M23 + R M24) is multiplied by the power supply voltage (V DD) voltage level of the start of discharge, wherein the second represents the R M22 The on-resistance equivalent resistance of the five NMOS transistor (M22), the R M23 represents the on-resistance equivalent of the sixth NMOS transistor (M23), and the R M24 represents the on-equivalent equivalent of the seventh NMOS transistor (M24) The resistor, thereby effectively preventing the problem of writing logic 1 difficult.

最後,於該初始期間之後,由於此時該寫入控制信號(CTL)仍為邏輯高位準,該第四NMOS電晶體(M21)及該第六NMOS電晶體(M23)仍呈導通,惟由於該第五NMOS電晶體(M22)截止,因此會將原本要經由該第五NMOS電晶體(M22)及該第六NMOS電晶體(M23)之放電路徑放掉之電荷回收,並使該高電壓節點(VH)朝該電源供應電壓(VDD )扣減一VTM24 (該第七NMOS電晶體(M24)之臨界電壓)的電壓位準充電。Finally, after the initial period, since the write control signal (CTL) is still at a logic high level, the fourth NMOS transistor (M21) and the sixth NMOS transistor (M23) are still turned on, but The fifth NMOS transistor (M22) is turned off, so that the charge to be discharged through the discharge path of the fifth NMOS transistor (M22) and the sixth NMOS transistor (M23) is recovered, and the high voltage is restored. The node (VH) is deducted from the power supply voltage (V DD ) by a voltage level of a V TM 24 (the threshold voltage of the seventh NMOS transistor (M24)).

接下來依雙埠靜態隨機存取記憶體靜態隨機存取記憶晶胞之4種寫入狀態來說明第8圖之本創作較佳實施例如何完成寫入動作。Next, the preferred embodiment of the present invention of FIG. 8 illustrates how the write operation is completed in accordance with the four write states of the SRAM static random access memory cell.

(一)節點A原本儲存邏輯0,而現在欲寫入邏輯0:(1) Node A originally stores a logic 0, but now wants to write a logic 0:

在寫入動作發生前(該寫入用字元線WWL為接地電壓),該第一NMOS電晶體(M1)為導通(ON)。因為該第一NMOS電晶體(M11)為ON,所以當寫入動作開始時,該寫入用字元線(WWL)由Low(接地電壓)轉High(電源供應電壓VDD )。當該寫入用字元線(WWL)的電壓大於該第三NMOS電晶體(M13)(即存取電晶體)的臨界電壓時,該第三NMOS電晶體(M13)由截止(OFF)轉變為導通(ON),此時因為寫入用位元線(WBL)是接地電壓,所以該節點(A)會保持接地電壓,直到寫入週期結束。Before the write operation occurs (the write word line WWL is a ground voltage), the first NMOS transistor (M1) is turned "ON". Since the first NMOS transistor (M11) is ON, the write word line (WWL) is turned from Low (ground voltage) to High (power supply voltage V DD ) when the write operation starts. When the voltage of the write word line (WWL) is greater than the threshold voltage of the third NMOS transistor (M13) (ie, the access transistor), the third NMOS transistor (M13) is turned off (OFF) To be ON, at this time, since the write bit line (WBL) is the ground voltage, the node (A) maintains the ground voltage until the end of the write cycle.

(二)節點A原本儲存邏輯0,而現在欲寫入邏輯1:(2) Node A originally stores logic 0, but now wants to write logic 1:

在寫入動作發生前(該寫入用字元線WWL為接地電壓),該第一NMOS電晶體(M1)為導通(ON)。因為該第一NMOS電晶體(M11)為ON,所以當寫入動作開始時,該寫入用字元線(WWL)由Low(接地電壓)轉High(該電源供應電壓VDD ),該節點(A)的電壓會跟隨該寫入用字元線(WWL)的電壓而上升。Before the write operation occurs (the write word line WWL is a ground voltage), the first NMOS transistor (M1) is turned "ON". Since the first NMOS transistor (M11) is ON, when the write operation starts, the write word line (WWL) is turned from Low (ground voltage) to High (the power supply voltage V DD ), the node The voltage of (A) rises following the voltage of the write word line (WWL).

當該寫入用字元線(WWL)的電壓大於該第三NMOS電晶體(M13)的臨界電壓時,該第三NMOS電晶體(M13)由截止(OFF)轉變為導通(ON),此時因為該寫入用位元線(WBL)是High(該電源供應電壓VDD ),並且因為該第一NMOS電晶體(M1)仍為ON且該節點(B)仍處於電壓位準為接近於該電源供應電壓(VDD )之電壓位準的初始狀態,所以該第一PMOS電晶體P1仍為截止(OFF),而該節點(A)則會朝一分壓電壓位準快速充電,該分壓電壓位準等於RM3 /(RM3 +RM1 )乘以該電源供應電壓(VDD ),其中該RM3 表示該第三NMOS電晶體(M13)之導通等效電阻,該RM1 表示該第一NMOS電晶體(M11)之導通等效電阻。When the voltage of the write word line (WWL) is greater than the threshold voltage of the third NMOS transistor (M13), the third NMOS transistor (M13) is turned from OFF to ON. Because the write bit line (WBL) is High (the power supply voltage V DD ), and because the first NMOS transistor (M1) is still ON and the node (B) is still at a voltage level is close At the initial state of the voltage level of the power supply voltage (V DD ), the first PMOS transistor P1 is still turned off (OFF), and the node (A) is rapidly charged toward a divided voltage level. The divided voltage level is equal to R M3 /(R M3 +R M1 ) multiplied by the power supply voltage (V DD ), wherein the R M3 represents the on-resistance equivalent resistance of the third NMOS transistor (M13), the R M1 Indicates the on-resistance equivalent resistance of the first NMOS transistor (M11).

在此值得注意的是,若此時該高電壓節點(VH)仍為該電源供應電壓(VDD ),則其結果,將如第4圖之習知5T靜態隨機存取記憶體晶胞所模擬般存在寫入邏輯1困難之缺失,所幸本創作會將該高電壓節點(VH) 由該電源供應電壓(VDD )之電壓位準朝(RM22 +RM23 )/(RM22 +RM23 +RM24 )乘以該電源供應電壓(VDD )之電壓位準放電,該高電壓節點(VH)放電過程中,節點(B)亦隨著逐步放電至較低電壓位準,該節點(B)之較低電壓位準會使得該第一NMOS電晶體(M1)之導通等效電阻(RM1 )呈現較高的電阻值,該較高的電阻值會於節點A獲得較高電壓位準,該節點(A)之較高電壓位準又會經由該第二反相器(由第二PMOS電晶體P2與第二NMOS電晶體M2所組成),而使得節點(B)獲得更低電壓位準,該節點(B)之更低電壓位準又會經由該第一反相器(由第一PMOS電晶體P1與第一NMOS電晶體M1所組成),而使得節點(A)獲得更高電壓位準,依此循環,即可將節點(A)充電至該電源供應電壓(VDD )扣減該第七NMOS電晶體(M24)的臨界電壓(VTM24 )之電壓位準,而完成邏輯1的寫入動作。It is worth noting here that if the high voltage node (VH) is still the power supply voltage (V DD ) at this time, the result will be as shown in FIG. 4 of the 5T static random access memory cell unit. There is a lack of difficulty in writing logic 1 in simulation. Fortunately, this high voltage node (VH) will be at the voltage level of the power supply voltage (V DD ) toward (R M22 +R M23 )/(R M22 +R M23 + R M24 ) multiplied by the voltage level discharge of the power supply voltage (V DD ). During the discharge of the high voltage node (VH), the node (B) is also gradually discharged to a lower voltage level, the node The lower voltage level of (B) causes the on-resistance equivalent (R M1 ) of the first NMOS transistor ( M1 ) to exhibit a higher resistance value, which will result in a higher voltage at node A. Level, the higher voltage level of the node (A) is again via the second inverter (composed of the second PMOS transistor P2 and the second NMOS transistor M2), so that the node (B) gets more The low voltage level, the lower voltage level of the node (B) is again via the first inverter (composed of the first PMOS transistor P1 and the first NMOS transistor M1), so that the node (A) Obtained Higher voltage level, and so the cycle, to the node (A) charged to the power supply voltage (V DD) deduct the seventh NMOS transistor (M24) of the threshold voltage (V TM24) the voltage level, The logic 1 write operation is completed.

(三)節點A原本儲存邏輯1,而現在欲寫入邏輯1:(3) Node A originally stores logic 1, but now wants to write logic 1:

在寫入動作發生前(該寫入用字元線WWL為接地電壓),該第一PMOS電晶體(P11)為導通(ON)。當該寫入用字元線(WWL)由Low(接地電壓)轉High(該電源供應電壓VDD ),且該寫入用字元線(WWL)的電壓大於該第三NMOS電晶體(M13)的臨界電壓時,該第三NMOS電晶體(M13)由截止(OFF)轉變為導通(ON);此時因為該寫入用位元線(WBL)是High(該電源供應電壓VDD ),並且因為該第一PMOS電晶體(P11)仍為ON,所以該節點(A)的電壓會維持於該電源供應電壓(VDD )扣減該第七NMOS電晶體(M24)的臨界電壓(VTM24 )之電壓位準,直到寫入週期結束。在此值得注意的是,於寫入週期結束後,該節點(A)會繼續充電至該電源供應電壓(VDD )之電壓位準。Before the write operation occurs (the write word line WWL is a ground voltage), the first PMOS transistor (P11) is turned "ON". When the write word line (WWL) is turned from Low (ground voltage) to High (the power supply voltage V DD ), and the voltage of the write word line (WWL) is greater than the third NMOS transistor (M13) When the threshold voltage is applied, the third NMOS transistor (M13) is turned from OFF to ON; at this time, since the write bit line (WBL) is High (the power supply voltage V DD ) And because the first PMOS transistor (P11) is still ON, the voltage of the node (A) is maintained at the power supply voltage (V DD ) minus the threshold voltage of the seventh NMOS transistor (M24) ( The voltage level of V TM24 ) is reached until the end of the write cycle. It is worth noting here that after the end of the write cycle, the node (A) will continue to charge to the voltage level of the power supply voltage (V DD ).

(四)節點A原本儲存邏輯1,而現在欲寫入邏輯0:(4) Node A originally stores logic 1, but now wants to write logic 0:

在寫入動作發生前(該寫入用字元線WWL為接地電壓),第一PMOS電晶體P1為ON(導通),當寫入用字元線(WWL)由Low(接地電壓)轉High(高電源供應電壓HVDD ),且該寫入用字元線(WWL)的電壓大於第三 NMOS電晶體(M3)的臨界電壓時,第三NMOS電晶體(M3)由OFF(截止)轉變為ON(導通),此時因為位元線(BL)是Low(接地電壓),所以會將節點(A)放電而完成邏輯0的寫入動作,直到寫入週期結束。在此值得注意的是,該高電壓節點(VH)於寫入初期係具有該電源供應電壓(VDD )扣減該第七NMOS電晶體(M24)的臨界電壓(VTM24 )之電壓位準,而於寫入週期結束後則具有該電源供應電壓(VDD )之位準。Before the write operation occurs (the write word line WWL is the ground voltage), the first PMOS transistor P1 is turned ON, and the write word line (WWL) is turned from Low (ground voltage) to High. (high power supply voltage HV DD ), and the voltage of the write word line (WWL) is greater than the threshold voltage of the third NMOS transistor (M3), and the third NMOS transistor (M3) is turned from OFF (off) It is ON. At this time, since the bit line (BL) is Low (ground voltage), the node (A) is discharged to complete the logic 0 write operation until the end of the write cycle. It is worth noting here that the high voltage node (VH) has the power supply voltage (V DD ) at the initial stage of writing to deduct the voltage level of the threshold voltage (V TM24 ) of the seventh NMOS transistor (M24). And at the end of the write cycle, it has the level of the power supply voltage (V DD ).

(II)讀取模式(read mode)(II) Read mode (read mode)

依雙埠SRAM晶胞之二種儲存資料狀態說明第8圖之本創作較佳實施例如何完成讀取動作。According to the two stored data states of the double-sink SRAM cell, the preferred embodiment of the present invention of FIG. 8 performs the reading operation.

(一)節點A儲存邏輯0:(1) Node A stores logic 0:

在讀取動作發生前(讀取用字元線(RWL)為接地電壓),寫入用字元線(WWL)為接地電壓,第二NMOS電晶體(M2)為OFF(截止),第二PMOS電晶體(P2)為ON(導通),節點B為High(電源供應電壓VDD )。當讀取動作開始時,讀取用字元線RWL由接地電壓轉為High(電源供應電壓VDD ),且當該讀取用字元線(RWL)的電壓大於該第一讀取用電晶體(M4)之臨界電壓時,第一讀取用電晶體(M4)由OFF(截止)轉變為ON(導通),此時由於節點B為High,第二讀取用電晶體(M5)為ON(導通),因此,會在讀取用位元線(RBL)、第一讀取用電晶體(M4)、第二讀取用電晶體(M5)及接地間形成電流路徑,此電流路徑即會使讀取用位元線(RBL)之電壓位準降低,藉此即可感測出節點A係儲存邏輯0之資料,並完成邏輯0的讀取動作。Before the read operation occurs (the read word line (RWL) is the ground voltage), the write word line (WWL) is the ground voltage, and the second NMOS transistor (M2) is turned (off), and the second The PMOS transistor (P2) is ON (on) and the node B is High (power supply voltage V DD ). When the read operation starts, the read word line RWL is turned from the ground voltage to High (power supply voltage V DD ), and when the read word line (RWL) voltage is greater than the first read power When the threshold voltage of the crystal (M4) is reached, the first read transistor (M4) is turned from OFF (turned off) to turned "on", and at this time, since the node B is High, the second read transistor (M5) is ON (conduction), therefore, a current path is formed between the read bit line (RBL), the first read transistor (M4), the second read transistor (M5), and the ground. That is, the voltage level of the read bit line (RBL) is lowered, thereby sensing that node A stores the data of logic 0 and completes the logic 0 read operation.

(二)節點A儲存邏輯1:(2) Node A stores logic 1:

在讀取動作發生前(讀取用字元線(RWL)為接地電壓),寫入用字元線(WWL)為接地電壓,第二NMOS電晶體(M2)為ON(導通),第二PMOS電晶體(P2)為OFF(截止),節點B為Low(接地電壓)。當讀取動作開始時,讀取用字元線(RWL)由接地電壓轉為High(電源供應電壓VDD ),且當該讀取 用字元線(RWL)的電壓大於該第一讀取用電晶體(M4)之臨界電壓時,該第一讀取用電晶體(M4)由OFF(截止)轉變為ON(導通),此時由於節點B為Low(接地電壓),第二讀取用電晶體(M5)為OFF(截止),因此,並不會在讀取用位元線(RBL)、第一讀取用電晶體(M4)、第二讀取用電晶體(M5)及接地間形成電流路徑,結果,讀取用位元線(RBL)之電壓位準能平穩地保持在High狀態,藉此即可感測出節點A係儲存邏輯1之資料,並完成邏輯1的讀取動作。Before the read operation occurs (the read word line (RWL) is the ground voltage), the write word line (WWL) is the ground voltage, the second NMOS transistor (M2) is ON (on), and the second The PMOS transistor (P2) is OFF (off) and the node B is Low (ground voltage). When the read operation starts, the read word line (RWL) is turned from the ground voltage to High (power supply voltage V DD ), and when the read word line (RWL) voltage is greater than the first read When the threshold voltage of the transistor (M4) is used, the first read transistor (M4) is turned from OFF (off) to ON (on), and at this time, since the node B is Low (ground voltage), the second read Since the transistor (M5) is OFF (off), it is not in the read bit line (RBL), the first read transistor (M4), and the second read transistor (M5). As a result, a current path is formed between the grounds. As a result, the voltage level of the read bit line (RBL) can be smoothly maintained in the High state, thereby sensing the data of the node A storing the logic 1 and completing the logic 1 Read action.

(III)保持模式(hold mode)(III) Hold mode (hold mode)

保持模式時,由於該高電壓節點(VH)係具有該電源供應電壓(VDD )之電壓位準,其工作原理相同於第7圖之5T SRAM,於此不再累述。In the hold mode, since the high voltage node (VH) has the voltage level of the power supply voltage (V DD ), the operation principle is the same as that of the 5T SRAM of FIG. 7 and will not be described here.

【創作功效】[Creation effect]

本創作所提出之雙埠靜態隨機存取記憶體,具有如下功效:(1)寫入期間具有較低之功率消耗:由於本創作所提出之雙埠靜態隨機存取記憶體晶胞僅於寫入操作之一初始時間方提供放電路徑,而於該初始時間後,則將原本要經由該放電路徑放掉之電荷回收(recycling charge),以避免無謂的功率耗損,因此於寫入期間具有較低之功率消耗;(2)避免寫入邏輯1困難之問題:本創作所提出之雙埠靜態隨機存取記憶體於寫入操作時,可於寫入操作之一初始時間藉由將該高電壓節點(VH)由該電源供應電壓(VDD )之電壓位準朝(RM22 +RM23 )/(RM22 +RM23 +RM24 )乘以該電源供應電壓(VDD )之電壓位準開始放電,以有效降低該高電壓節點(VH)之之電壓位準,從而提高該第三NMOS電晶體(M13)之導通等效電阻(RM3 ),並得以有效避免習知具單一位元線之單埠靜態隨機存取記憶體晶胞存在寫入邏輯1困難之問題;(3)電路結構簡單:由於本創作所提出之雙埠靜態隨機存取記憶體毋須使用雙電源供應電壓,因此可避免電路結構複雜之缺失。The double-static static random access memory proposed by the present invention has the following effects: (1) low power consumption during writing: since the double-twist static random access memory cell proposed by the present invention is only written One of the initial operations of the input operation provides a discharge path, and after the initial time, the charge charge that would otherwise be discharged through the discharge path is used to avoid unnecessary power consumption, and thus is relatively high during writing. Low power consumption; (2) Avoiding the difficulty of writing logic 1: The double-click static random access memory proposed in the present invention can be high at the initial time of one of the write operations during the write operation. voltage of the node voltage level (VH) of the power supply voltage (V DD) of the quasi toward (R M22 + R M23) / (R M22 + R M23 + R M24) is multiplied by the power supply voltage (V DD) of the voltage level The discharge is started to effectively lower the voltage level of the high voltage node (VH), thereby improving the on-resistance equivalent resistance (R M3 ) of the third NMOS transistor (M13), and effectively avoiding a single position The line of the static random access memory cell is written Problems Series 1 difficulties; (3) a simple circuit structure: Because of this proposed creation of dual-port static random-access memory without using dual power supply voltages, the circuit configuration can be deleted to avoid complication.

P1‧‧‧第一PMOS電晶體P1‧‧‧First PMOS transistor

P2‧‧‧第二PMOS電晶體P2‧‧‧Second PMOS transistor

M1‧‧‧第一NMOS電晶體M1‧‧‧First NMOS transistor

M2‧‧‧第二NMOS電晶體M2‧‧‧Second NMOS transistor

M3‧‧‧第三NMOS電晶體M3‧‧‧ third NMOS transistor

M4‧‧‧第一讀取用電晶體M4‧‧‧first read transistor

M5‧‧‧第二讀取用電晶體M5‧‧‧Second reading transistor

A‧‧‧儲存節點A‧‧‧ storage node

B‧‧‧反相儲存節點B‧‧‧ Inverting storage node

VDD ‧‧‧電源供應電壓V DD ‧‧‧Power supply voltage

WBL‧‧‧寫入用位元線WBL‧‧‧Write bit line

WWL‧‧‧寫入用字元線WWL‧‧‧write word line

RBL‧‧‧讀取用位元線RBL‧‧‧Reading bit line

RWL‧‧‧讀取用字元線RWL‧‧‧Read word line

M21‧‧‧第四NMOS電晶體M21‧‧‧4th NMOS transistor

M22‧‧‧第五NMOS電晶體M22‧‧‧ Fifth NMOS transistor

M23‧‧‧第六NMOS電晶體M23‧‧‧ sixth NMOS transistor

M24‧‧‧第七NMOS電晶體M24‧‧‧ seventh NMOS transistor

P21‧‧‧第三PMOS電晶體P21‧‧‧ Third PMOS transistor

P22‧‧‧第四PMOS電晶體P22‧‧‧4th PMOS transistor

1‧‧‧SRAM晶胞1‧‧‧SRAM cell

2‧‧‧控制電路2‧‧‧Control circuit

CTL‧‧‧寫入控制信號CTL‧‧‧ write control signal

VH‧‧‧高電壓節點VH‧‧‧ high voltage node

Claims (2)

一種雙埠靜態隨機存取記憶體,包括:一記憶體陣列,該記憶體陣列係由複數列記憶體晶胞與複數行記憶體晶胞所組成,每一列記憶體晶胞與每一行記憶體晶胞均包含有複數個記憶體晶胞(1);複數個控制電路(2),每一列記憶體晶胞設置一個控制電路(2);其中,每一記憶體晶胞(1)更包含:一第一反相器,係由一第一PMOS電晶體(P1)與一第一NMOS電晶體(M1)所組成,該第一反相器係連接在一電源供應電壓(VDD )與接地電壓之間;一第二反相器,係由一第二PMOS電晶體(P2)與一第二NMOS電晶體(M2)所組成,該第二反相器係連接在該電源供應電壓(VDD )與該接地電壓之間;一儲存節點(A),係由該第一反相器之輸出端所形成;一反相儲存節點(B),係由該第二反相器之輸出端所形成;一第三NMOS電晶體(M3),係連接在該儲存節點(A)與對應之一寫入用位元線(WBL)之間,且閘極連接至對應之一寫入用字元線(WWL);一第一讀取用電晶體(M4),該第一讀取用電晶體(M4)之源極、閘極與汲極係分別連接至一第二讀取用電晶體(M5)之汲極、一讀取用字元線(RWL)與一讀取用位元線(RBL);以及該第二讀取用電晶體(M5),該第二讀取用電晶體(M5)之源極、閘極與汲極係分別連接至接地電壓、該反相儲存節點(B)與該第一讀取用電晶體(M4)之源極;其中,該第一反相器和該第二反相器係呈交互耦合連接,亦即該第一反相器之輸出端(即儲存節點A)係連接至該第二反相器之輸入端,而該第二反相器之輸出端(即反相儲存節點B)則連接至該第一反相器之輸入端;而每一控制電路(2)更包含:一第四NMOS電晶體(M21)、一第五NMOS 電晶體(M22)、一第六NMOS電晶體(M23)、一第七NMOS電晶體(M24)、一第三PMOS電晶體(P21)以及一第四PMOS電晶體(P22);其中,該第四NMOS電晶體(M21)與該第三PMOS電晶體(P21)係形成一連接於該電源供應電壓(VDD )與接地電壓之間之第三反相器,該第三反相器之輸入係供接收對應之寫入控制信號(CTL);該第五NMOS電晶體(M22)之源極、閘極與汲極係分別連接至該第六NMOS電晶體(M23)之汲極、該第三反相器之輸出與該第四PMOS電晶體(P22)之汲極;該第六NMOS電晶體(M23)之源極、閘極與汲極係分別連接至接地電壓、對應之該寫入控制信號(CTL)與該第五NMOS電晶體(M22)之源極;該第七NMOS電晶體(M24)之汲極與閘極連接在一起並連接至該電源供應電壓(VDD ),而源極則連接至該第五NMOS電晶體(M22)之汲極和該第四PMOS電晶體(P22)之汲極;該第四PMOS電晶體(P22)之源極、閘極與汲極係分別連接至該電源供應電壓(VDD )、對應之該寫入控制信號(CTL)與該第五NMOS電晶體(M22)之汲極。A double-click static random access memory, comprising: a memory array consisting of a plurality of columns of memory cells and a plurality of rows of memory cells, each column of memory cells and each row of memory The unit cell comprises a plurality of memory cells (1); a plurality of control circuits (2), each column of memory cells is provided with a control circuit (2); wherein each memory cell (1) further comprises A first inverter is composed of a first PMOS transistor (P1) and a first NMOS transistor (M1) connected to a power supply voltage (V DD ) and Between the ground voltages; a second inverter consisting of a second PMOS transistor (P2) and a second NMOS transistor (M2) connected to the power supply voltage ( V DD ) is between the ground voltage; a storage node (A) is formed by the output of the first inverter; and an inverting storage node (B) is output from the second inverter Formed at the end; a third NMOS transistor (M3) is connected between the storage node (A) and a corresponding write bit line (WBL), and the gate is connected Corresponding to one of the write word lines (WWL); a first read transistor (M4), the source, the gate and the drain of the first read transistor (M4) are respectively connected to one a drain of the second read transistor (M5), a read word line (RWL) and a read bit line (RBL); and the second read transistor (M5), a source, a gate and a drain of the second read transistor (M5) are respectively connected to a ground voltage, a source of the inverting storage node (B) and the first read transistor (M4); The first inverter and the second inverter are connected in an alternating coupling manner, that is, the output end of the first inverter (ie, the storage node A) is connected to the input end of the second inverter. The output of the second inverter (ie, the inverting storage node B) is connected to the input end of the first inverter; and each control circuit (2) further comprises: a fourth NMOS transistor ( M21), a fifth NMOS transistor (M22), a sixth NMOS transistor (M23), a seventh NMOS transistor (M24), a third PMOS transistor (P21), and a fourth PMOS transistor ( P22); wherein the fourth NMOS transistor (M21) and the third PMOS Crystals (of P21) formed in a line connected to the power supply voltage (V DD) and a third inverter connected between the ground voltage, the input system of the third inverter for receiving the write control signal corresponding to (the CTL); The source, the gate and the drain of the fifth NMOS transistor (M22) are respectively connected to the drain of the sixth NMOS transistor (M23), the output of the third inverter, and the fourth PMOS transistor. a drain of (P22); a source, a gate and a drain of the sixth NMOS transistor (M23) are respectively connected to a ground voltage, corresponding to the write control signal (CTL) and the fifth NMOS transistor ( a source of M22); a drain of the seventh NMOS transistor (M24) is connected to the gate and connected to the power supply voltage (V DD ), and a source is connected to the fifth NMOS transistor (M22) a drain of the fourth PMOS transistor (P22); a source, a gate and a drain of the fourth PMOS transistor (P22) are respectively connected to the power supply voltage (V DD ), corresponding to The write control signal (CTL) and the drain of the fifth NMOS transistor (M22). 如申請專利範圍第1項所述之雙埠靜態隨機存取記憶體,其中,該寫入控制信號(CTL)為一寫入致能(Write Enable,簡稱WE)信號與每一列記憶體晶胞所對應之寫入用字元線(WWL)信號的及閘(AND gate)運算結果,亦即僅於該寫入致能(WE)信號與該對應之寫入用字元線(WWL)信號均為邏輯高位準時,該寫入控制信號(CTL)方為邏輯高位準。The double-click static random access memory according to claim 1, wherein the write control signal (CTL) is a write enable (WE) signal and each column of memory cells. The AND gate operation result of the corresponding write word line (WWL) signal, that is, only the write enable (WE) signal and the corresponding write word line (WWL) signal When the logic high level is on time, the write control signal (CTL) side is a logic high level.
TW102219054U 2013-10-14 2013-10-14 Dual port SRAM TWM472292U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI605551B (en) * 2016-09-08 2017-11-11 修平學校財團法人修平科技大學 Dual port static random access memory

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI605551B (en) * 2016-09-08 2017-11-11 修平學校財團法人修平科技大學 Dual port static random access memory

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