TWM456583U - Reticle SMIF pod structure - Google Patents

Description

Photomask transfer box structure

The present invention belongs to the technical field of a transfer box for transporting and storing a reticle, and specifically relates to a reticle transfer box capable of reducing the release of harmful gases, so as to meet the antistatic effect of the reticle transfer case when used in a clean room. Low sulphide, wear resistance and high cleanliness.

According to the continuous innovation and miniaturization of semiconductor technology, wafers made using semiconductor technology are widely used in various fields. Due to the miniaturization of the integrated circuit and the low cost, the size of the wafer is getting larger and larger, but the number of wafers per wafer is increasing, so that the value of the wafer is continuously increased, so the wafer is processed on the wafer. Any problem can cause great losses. And the yellow light process in the general integrated circuit process is an important process related to the overall yield, which is usually coated with an opaque or translucent desired pattern on the surface of the reticle for projecting the desired pattern onto the wafer light. On the barrier layer. Therefore, any defects attached to the surface of the reticle may be projected onto the photoresist layer of the wafer, resulting in a proper rate of the finished circuit component or even being unusable. However, in the semiconductor manufacturing process, or due to process materials, or process gases, or due to the storage environment, or due to the environment of the clean room, there are many particles and gas free molecules in the adjacent environment of the mask. After the accumulation or chemical change of these contaminants, it is very easy to produce defects such as particles or haze during storage and transportation of the reticle; and in the semiconductor process, using automated material handling systems [Automated] Material Handling System, AMHS] Standard mechanical interface (SMIF) equipment for the maintenance and transportation of the reticle during non-use, not only can replace the traditional manual handling, reduce the construction and maintenance costs of the clean room equipment, but also improve The cleanliness of the mask has reached a high production yield, so in recent years, AMHS and SMIF have been listed as standard equipment specifications for international semiconductor factories.

According to the above technical concept, in addition to the exposure, the reticle must be placed in a high-purity, airtight, low-gas escape [Outgassing] and anti-static protection (ESD) light during transportation or storage. Cover the transfer box [Reticle SMIF Pod, RSP] to prevent contamination of the wafer and the mask, ensuring high cleanliness and high production yield of the mask.

The early reticle transfer boxes are mainly made of plastic materials, the most commonly used is PP plastic, but the reticle transfer box made of PP material is most easily released by harmful gas ions [Outgassing] However, haze occurs on the surface of the mask, and even problems such as adhesion of particles are caused by friction or collision.

In other words, how to provide a reticle transfer box with good antistatic effect, low ion release, wear resistance and high cleanliness is a very important issue.

In view of this, the creator has been engaged in research and development and production experience of related industries for many years, and has in-depth discussion on the problems faced by the above-mentioned reticle transfer box, and has continuously made efforts to improve and test, and successfully developed a reticle. The transmission box structure can solve the inconvenience and trouble caused by the insufficient hardness of the existing reticle transfer box and the release of harmful ions.

Therefore, the main purpose of the present invention is to provide a reticle transfer box structure, thereby reducing the release of harmful gas ions, thereby reducing the haze of the reticle surface and preventing the reticle from being contaminated.

Moreover, the second main purpose of the present invention is to provide a reticle transfer box which can improve the hardness of the reticle transfer case to improve its wear resistance and impact resistance to meet the high cleanliness requirements of the reticle transfer case.

In addition, another main object of the present invention is to provide a reticle transfer box structure, which can have a better antistatic effect and avoid the adhesion of harmful substances.

To this end, this creation mainly uses the following technical means to achieve the purpose and effectiveness of the creation: it includes at least a base made of a plastic body material and a cover made of a plastic body material, and The cover and the base can be oppositely closed to form a storage space for accommodating the reticle. The plastic body material is composed of polyetheretherketone containing 1% to 15% of carbon nanotubes; The support group of the reticle is supported, and a pressure guiding group is disposed in the casing, and the pressure guiding group and the supporting group can relatively restrict the guiding illuminator in the storage space of the reticle conveying box.

Therefore, through the above-mentioned technical means, the plastic part of the reticle transfer box of the present invention is made of a plastic main material containing a polyether ether ketone [PEEK] containing a carbon nanotube, so that it can greatly improve its Hardness, which improves the wear resistance and scratch resistance, greatly reduces dust or particle flaking of the material, reduces the chance of damaging the surface of the reticle, and provides better Antistatic effect, at the same time, can further reduce the release of harmful gas ions such as sulfur ions, chloride ions, sodium ions, ammonium ions and potassium ions, so as to prevent the occurrence of haze on the surface of the mask, and avoid the occurrence in subsequent processes. Defective products can reduce the number of cleanings and reduce the cost of the process. At the same time, the support sheet between the two supporting blocks of the supporting member can prevent the reticle from directly hitting the base when slipping during the moving process, without damaging the surface of the reticle, thereby greatly improving the economic benefit of the product.

In order to enable the review board to further understand the composition, characteristics and other purposes of the creation, the following are some of the preferred embodiments of the creation, and the detailed description of the creation is as follows, and the person familiar with the technical field can be implemented. .

The present invention is a reticle transfer box structure, with reference to the illustrated embodiment of the present invention and its components, all of which relate to front and rear, left and right, top and bottom, upper and lower, and horizontal and vertical references, It is for convenience of description only and does not limit the creation of the invention, nor does it limit its components to any position or space. The drawings and the dimensions specified in the specification may be varied according to the design and needs of the specific embodiments of the present invention, without departing from the scope of the invention.

For the detailed construction of the reticle transfer box structure, please refer to the first and second figures, which comprises a base 10 and a cover 30, and the cover 30 and the base 10 can be oppositely formed to form a The storage space of the reticle 50 is accommodated, and the base 10 is provided with a support group 20 for supporting a reticle 50. The cover 30 is provided with a pressure guiding group 40, and the pressure guiding group 40 and the supporting group 20 are relatively limited. Guide mask 50 in the reticle transfer box The plastic material of the base 10, the support group 20, the cover 30 and the pressure guiding group 40 is made of a plastic main material, which is composed of carbon nanotubes. The polyetheretherketone [PEEK] is composed, and the content of the carbon nanotubes of the plastic host material is 1% to 15%, and the content of the carbon nanotubes in the preferred embodiment of the present invention is 2%~5%, and the carbon nanotubes may be selected from one of a multilayer carbon nanotube or a single-layer carbon nanotube or a combination thereof, so that the base 10, the cover 30, the support group 20 and the pressure guiding layer Group 40 has good antistatic, high hardness, low sulfide, wear resistance and high cleanliness; among them, the base 10 made of plastic main material is formed with a plurality of upper and lower connecting holes. 11, the base 10 is covered with a metal backsheet 15, the metal backsheet 15 is formed with a plurality of valve seats 16 corresponding to the receiving holes 11 and having a through hole at the periphery, and the base 10 accommodates the hole 11 and the metal back plate 15 valve seat 16 valves are provided for the inlet and outlet valves 18, wherein the plastic material of the valve 18 can also be The support body 20 made of the plastic body material and the plastic body material comprises two support members 21 and an abutting member 25, and the top surfaces of the two support members 21 are provided with two supports for supporting the bottom surface of the reticle 50. The block 22, the support block 22 can be a pyramid shape for reducing the contact area of the reticle 50, and a support piece 220 having a lower height between the two support blocks 22 to prevent the reticle 50 from directly sliding down, and the two support members 21 are respectively formed on the outer side of the plurality of side panels 23 for the edge of the mask 50, and the side surfaces of the side panels 23 are formed with side abutting members 24 corresponding to the edges of the mask 50, and the sides of the supporting members 21 are provided on the sides. The spacing of the resisting members 24 is close to the width of the reticle 50 to reduce the amount of slip before the reticle 50 is restrained. Further, the supporting block 22 and the side abutting members 24 can be coupled to the supporting members. 21 is a unitary structure or a separate structure. In order to reduce the cost, the separate supporting block 22 and the side abutting member 24 may further be selected from the aforementioned wear-resistant and high-hardness plastic body material containing carbon nanotubes to reduce particles. Peeling off. Furthermore, the abutment element 25 has at least one upwardly projecting backrest 26 which can be placed against the back edge of the reticle 50, and the support element 21 and the abutment element 25 can be selected from the same plastic material. Or different plastic materials, and the plastic material of the supporting member 21 and the abutting member 25 may be selected from the plastic main material; and the top surface of the cover 30 made of the plastic main material is provided with a handle 31, and the shell 30 is shell The cover 30 is provided with a plurality of locking members 32 of the optional snap base 10, so that the cover 30 and the base 10 can be selectively covered, and the metal cover 35 is locked in the cover 30, and the metal inner cover 35 is The bottom end of the periphery can be in contact with the metal backsheet 15 of the base 10 to form a conductive receiving space for eliminating static electricity. Further, the inside of the cover 30 is inside the metal inner cover and is synchronously locked with a pressure guiding group 40. The pressure guiding group 40 made of the plastic body material substantially includes a plurality of symmetrical elements 43 and a guiding element 47. The pressing element 43 and the guiding element 47 are disposed on a pedestal 41 corresponding to the reticle 50. One side of the base 41 is embedded with a stud 42 for locking the lock member 33 on the top surface of the base 41. The component 43 can correspond to the peripheral edge of the surface of the pressure limiting mask 50, and the pressing element 43 is formed with a through hole 44 in the base 41, and the pressing element 43 is suspended in the through hole 44. The pressing member 45 has an inverted tapered cone 450 in an inverted tapered shape to reduce the contact area with the reticle 50. The guiding member 47 is further disposed on the side of the base 41 opposite to the edge of the back side abutting member 26 of the supporting group 20 and adjacent to the edge, so that the opening of the corresponding supporting group 20 can be utilized. The guiding element 47 pushes the reticle 50 against the backing piece 26 of the abutting element 25, and the guiding elements 47 on both sides can directly clamp the sides of the reticle 50 to prevent the reticle 50 from being transferred to the reticle transfer case. Arbitrarily slipping during structural transportation, the aforementioned guiding element 47 is formed by an arc-shaped positive guiding arc piece 48 extending downward from the base 41, and the guiding positive guiding piece 48 corresponds to the side surface of the photomask 50 and is formed. An arc pressing edge 480 is provided for gradually pushing the adjustment mask 50 to be returned, and the convex pressing cone 450 of the pressing member 45 may be in an integrated structure or a separate structure, and the convex pressing cone 450 may further be selected from the foregoing wear-resistant structure. The plastic body material containing the carbon nanotubes of high hardness and high hardness is used to reduce the peeling of the particles, and the deformation amount of the finished product can be reduced, and the handle 31 and the locking member 32 can be selected from the same plastic material or different. The plastic material, and the plastic material of the handle 31 and the locking member 32 may be selected from the plastic body material.

Through the foregoing design, the group constitutes a reticle transfer box structure with low harmful gas release and high hardness.

In the actual application, the present invention is disclosed in the first and third and fourth figures. When the photomask 50 is placed on the support group 20 of the base 10, the support group 20 is supported by the support members 21 of the two sides. The support block 22 is supported by the lower cover 50, and the photomask 50 is confined between the side abutting members 24 of the side support members 21 (as shown in the third figure), and the cover 30 is attached to the base 10. In the upper case, the guide arc 48 of the pressure guiding group 40 on the cover 30 different from the supporting group 20 against the component 25 can push the mask 50 so that the back edge of the mask 50 abuts against the abutting member 25 On the sheet 26 [as shown in the fourth figure], the photomask 50 is provided with an appropriate home adjustment function. At the same time, the guiding arcs 48 on both sides of the reticle 50 can also simultaneously sandwich the side edges of the reticle 50. Moreover, when the cover 30 is fully buckled to the base by the locking member 32 At 10 o'clock, the pressing member 45 of the pressure guiding group 40 in the casing 30 is adapted to press the surface of the photomask 50, and the elastic pressing member 45 can absorb the deformation amount [as shown in the fourth figure). Therefore, the problem of excessive or insufficient crushing force can be avoided, the movement of the mask 50 can be effectively restricted, and the mask 50 can be completely positioned inside the mask transport box structure, and the mask 50 can be prevented from being damaged by collision. At the same time, the support piece 220 between the two supporting blocks 22 of the supporting member 21 can be further prevented from directly hitting the base 10 when the reticle 50 slips during the movement without damaging the surface of the reticle.

Furthermore, since at least one of the base 10, the cover 30, the support group 20 and the pressure guiding group 40 of the reticle transfer case is made of a plastic body material, and the plastic body material is composed of a carbon nanotube Polyetheretherketone, according to the experimental results in Table 1; 1. The test method is to immerse the sample in 100 mL of deionized water for 20 minutes and detect by ion chromatography; 2. The detection limit is 0.0010; 3. The measured value below the detection limit of the method is represented by "ND".

The plastic part of the wafer/mask of the present invention has a much lower release amount of chloride, sodium, ammonium and potassium ions than the simple polyether. Ether ketone [PEEK] plastic material prevents these harmful gases from being synthesized during storage to avoid haze on the surface of the wafer/mask. At the same time, this creation can greatly improve its hardness and anti-static effect, so that the wear resistance and scratch resistance of the plastic part of the carrier are greatly improved, and the dust or particles of the material are reduced to reduce the chance of damaging the surface of the wafer or the mask. In order to avoid the occurrence of defective products in the subsequent process, the number of cleanings can be reduced, thereby reducing the process cost.

In this way, it can be understood that this creation is a creative new creation. In addition to effectively solving the problems faced by the practitioners, the effect is greatly enhanced, and the same or similar product creation or disclosure is not seen in the same technical field. The use, at the same time, has an improvement in efficacy. Therefore, this creation has met the requirements of "newness" and "progressiveness" of the new patent, and is applying for a new type of patent according to law.

(10)‧‧‧Base

(11) ‧‧‧ accommodating holes

(15)‧‧‧Metal negatives

(16)‧‧‧ Seat

(18) ‧‧‧Valve Group

(20) ‧‧‧Support group

(21)‧‧‧Supporting components

(22) ‧‧‧Support block

(220)‧‧‧

(23) ‧‧‧ side films

(24) ‧‧‧Parts

(25) ‧‧‧Resist components

(26)‧‧‧ Backrest

(30)‧‧‧Shell cover

(31)‧‧‧Hands

(32)‧‧‧Locks

(35)‧‧‧Metal inner cover

(40)‧‧‧Guide pressure group

(41) ‧ ‧ pedestal

(42)‧‧‧ Studs

(43)‧‧‧掣掣 unit

(44) ‧‧‧through holes

(45) ‧‧‧Parts

(450)‧‧‧ convex pressure cone

(47) ‧ ‧ Alignment unit

(48) ‧ ‧ lead positive arc

(480)‧‧‧Arc edge

The first picture is a schematic view of the appearance of the reticle transfer box structure of the present invention, which illustrates the aspects of each component and their relative relationship.

The second picture is a schematic view of the appearance of the pressure guiding group device of the reticle transfer box structure of the present invention.

The third picture is a schematic cross-sectional view of the reticle transfer box structure of the present invention before the cover.

The fourth picture is a schematic cross-sectional view of the reticle transfer box structure of the present invention after being covered.

(10)‧‧‧Base

(11) ‧‧‧ accommodating holes

(15)‧‧‧Metal negatives

(16)‧‧‧ Seat

(18) ‧‧‧Valve Group

(20) ‧‧‧Support group

(21)‧‧‧Supporting components

(22) ‧‧‧Support block

(220)‧‧‧

(23) ‧‧‧ side films

(24) ‧‧‧Parts

(25) ‧‧‧Resist components

(26)‧‧‧ Backrest

(30)‧‧‧Shell cover

(31)‧‧‧Hands

(32)‧‧‧Locks

(35)‧‧‧Metal inner cover

(40)‧‧‧Guide pressure group

(41) ‧ ‧ pedestal

(42)‧‧‧ Studs

(43)‧‧‧掣掣 unit

(44) ‧‧‧through holes

(45) ‧‧‧Parts

(450)‧‧‧ convex pressure cone

(47) ‧ ‧ Alignment unit

(48) ‧ ‧ lead positive arc

(480)‧‧‧Arc edge

Claims (10)

A reticle transfer box structure comprising at least a base made of a plastic body material and a cover made of a plastic body material, and the cover and the base can be oppositely closed to form a storage space for accommodating the reticle. The plastic body material is composed of a polyether ether ketone containing a carbon nanotube; wherein the base is provided with a support group for supporting a photomask, and a pressure guiding group, a pressure guiding group and a support are arranged in the shell The group can relatively restrict the guiding reticle into the storage space of the reticle transfer case; thereby, the group constitutes a reticle transfer box structure with low harmful gas release and high hardness. The reticle transfer box structure according to the first aspect of the invention, wherein the base is formed with a plurality of upper and lower communication receiving holes, and the base is covered with a metal negative film, and the metal negative film is formed with a plurality of corresponding contents. A valve seat having a hole and a through hole at the periphery, and a gas valve for inlet and outlet is disposed between the base receiving hole and the metal back valve seat, wherein the plastic material portion of the gas valve is selected from a plastic body material. The reticle transfer box structure according to claim 1, wherein the support set comprises two support members and an abutting member, and the top surfaces of the two support members are provided with two supports for supporting the bottom surface of the reticle. The block has a lower height between the two supporting blocks, and the two supporting members are respectively formed with a plurality of side sheets for the edge of the mask to be abutted on the different outer sides, and the inner side of the side sheets are formed with Corresponding to the edge of the reticle, the abutment element has at least one upwardly projecting backrest that can be placed against the back edge of the reticle. The reticle transfer box structure according to claim 1 or 3, wherein the plastic part of the support set is selected from a plastic body material. The reticle transfer box structure according to claim 1, wherein the top surface of the cover is provided with a handle, and the periphery of the cover cover is provided with a plurality of lockable parts of the selectable snap base, and the cover is inside the cover The lock is provided with a metal inner cover, and the inner cover of the inner cover of the inner cover is synchronously locked with a pressure guiding group, and the pressure guiding group comprises a plurality of symmetrically arranged pressing elements and guiding elements, and the pressing element and the guiding element The component is disposed on a side of the pedestal corresponding to the reticle, and the pressing component is formed with a through hole on the pedestal, and the pressing component is suspended in the through hole, and a pressing member for pressing the reticle is suspended. The guiding element is further disposed on the opposite side of the edge of the supporting group opposite the edge of the supporting member and adjacent to the edge, and the guiding element is an arc-shaped curved guiding piece extending downward from the base. Composition. The reticle transfer box structure according to claim 5, wherein the handle portion of the cover, the locking member or the plastic portion of the pressure guiding group is selected from a plastic body material. The reticle transfer box structure according to claim 1, wherein the plastic body material has a carbon nanotube content of 1% to 15%. The reticle transfer box structure according to claim 1, wherein the plastic body material has a carbon nanotube content of 2% to 5%. The reticle transfer box structure of claim 1 or 7 or 8, wherein the carbon nanotubes are selected from the group consisting of multilayer carbon nanotubes. The reticle transfer box structure of claim 1 or 7 or 8, wherein the carbon nanotubes are selected from the group consisting of single-layer carbon nanotubes.