TWM453837U - Online detection device of film thickness - Google Patents

Description

Film thickness line detecting device

The present invention relates to a film thickness line detecting device, and more particularly to an innovative device for calculating the thickness of a film by using the degree of light decay at a path through which the film is transported, so as to monitor the thickness of the film at any time.

According to the sheet resistance, sheet resistance is one of the important characteristics of the conductive film. In particular, the sheet resistance is affected by factors such as film thickness, grain size and impurity concentration. Therefore, for film manufacturers, the thickness uniformity of the film is in plating. One of the most important indicators for high-quality optical films, therefore, in order to effectively control the thickness of the material to ensure the quality of the optical film, it is indispensable to constantly detect and monitor the thickness of the film.

There are many methods for measuring the thickness of a film. According to the measurement method, it can be divided into two types: direct measurement and indirect measurement. Among them, direct measurement refers to the application of measuring instruments, which directly induces the thickness of the film through contact; common direct methods of measurement include: spiral micrometry, precision contour scanning (step method), and scanning electron microscopy (SEM). Indirect measurement refers to the conversion of the relevant physical quantity into the thickness of the film according to a certain physical relationship, so as to achieve the purpose of measuring the thickness of the film; common indirect methods are: weighing method, capacitance method, electric resistance method, etc. Thick interferometry, variable angle interferometry, ellipsometry.

In the previous literature, an optical film surface measurement system was proposed. The system is based on the Twyman-Green interferometer and combined with a software program. The wavelet transform is used to divide the captured image into high and low frequencies, and at the same time, with gray scale. The co-occurrence matrix (GLCM) and entropy calculations are used to quickly determine the flatness of the film surface, and the interferogram is processed by software analysis to measure the film thickness.

Since the measurement of the above thickness must be achieved by using an interferometer and accurately determining the displacement amount of the interference fringe, otherwise the measurement error will be caused. Therefore, in order to improve the accuracy of the interferometric film thickness measurement, it is necessary to further utilize The chopper removes the noise and is thinned by the interference pattern, so that the program can accurately and automatically determine the distance between the stripes and the amount of streak displacement, and achieve the purpose of measuring the thickness of the film.

The main purpose of the present invention is to provide a film thickness line detecting device, which mainly uses the different degrees of light decay to calculate the thickness of the film in the path of transporting the film, so as to achieve the effect of monitoring the thickness of the film in an instant manner, thereby ensuring the film. quality.

The main purpose and effect of the above creations are achieved by the following specific technical means:

A thin film thickness line detecting device comprises a light source, an optical sensing component and a calculated film thickness unit; wherein, in the path of transporting the film, a light source and an optical sensing component corresponding to each other are disposed, and the optical sensing component is electrically The connection is performed to calculate the film thickness unit; then, when the light generated by the light source penetrates the transparent conductive film, the transparent conductive film of different thickness is generated to have different degrees of attenuation, and after absorption by the optical sensing element, the absorbed light is absorbed. The voltage signal is converted into a corresponding voltage signal, and the voltage signal is obtained by calculating the film thickness unit to obtain the thickness value of the film.

The thin film thickness line detecting device as described above, wherein the light source is a full-band light source, and includes a light source of one of ultraviolet light, visible light and near infrared light.

The film thickness line detecting device as described above, wherein in each of the conveying paths after attaching a film, corresponding light sources and light sensing elements are disposed at corresponding portions of the path to detect the thickness of each film. .

The thin film thickness line detecting device as described above, wherein each of the light sensing elements disposed in the transport path after attaching a thin film is electrically connected to the calculated film thickness unit to calculate each stage of each stage. membrane thickness.

The thin film thickness line detecting device as described above, wherein each of the light sensing elements disposed in the transport path after attaching a thin film is electrically connected to a calculated film thickness unit to calculate each stage of the film. thickness.

The film thickness line detecting device as described above further includes a display unit electrically connected to the calculated film thickness unit, and the film thickness value calculated by calculating the film thickness unit can be displayed on the display unit.

In order to make the technical means, creative purpose and achievement of this creation more complete and clear, it is explained in detail below, and please refer to the disclosed drawings and component symbols.

Please refer to the first figure, which is a schematic diagram of the structure of the thin film thickness line detecting device.

The film thickness line detecting device of the present invention comprises a light source (1), an optical sensing component (2) and a calculated film thickness unit (3); wherein:

Referring to the second figure, it is revealed that the film (4) is produced and conveyed in an on-line manner, that is, in a transport path (T _P ), at least one layer is formed on a light-transmissive substrate (5). a film (4), on the path (T _P ) of the transport film, a light source (1) corresponding to each other and an optical sensing element (2) are disposed, and the optical sensing element (2) is electrically connected to the film Calculate the film thickness unit (3).

In this way, when the light generated by the light source (1) penetrates through the film (4), the light may have different degrees of attenuation when penetrating the transparent conductive film (4) due to the thickness of the film (4) itself. That is, the thinner the thickness, the smaller the degree of light attenuation, and the thicker the thickness of the film (4), the greater the degree of light attenuation. At this time, the optical sensing element (2) absorbs the light passing through the film (4). Converting the intensity of the absorbed light into a corresponding voltage signal, and transmitting the voltage signal to the calculated film thickness unit (3), and calculating the film thickness unit (3) according to the voltage signals to calculate the film (4) Thickness value.

Referring to the second figure, each optical sensing element (2) is electrically connected to the calculated film thickness unit (3) to uniformly calculate the film thickness of each stage from the calculated film thickness unit (3). . Or as shown in the third figure, each of the optical sensing elements (2) is electrically connected to a calculated film thickness unit (3), and the film thickness of each stage is calculated by each of the calculated film thickness units (3).

Referring to the fourth and fifth figures, the thin film thickness line detecting device of the present invention further includes at least a display unit (6). The fourth figure discloses that in the embodiment shown in the second figure, a display unit (6) is further electrically connected to the calculated film thickness unit (3), and the calculated film thickness unit (3) can be calculated. The obtained film thickness value is shown. The fifth figure discloses that in the embodiment shown in the third figure, a plurality of display units (6) are further provided, and each display unit (6) is electrically connected to each of the calculated film thickness units (3), and each calculation is performed. The film thickness values calculated by the film thickness unit (3) are each displayed on the display unit (6) electrically connected thereto, and in this embodiment, the respective calculated film thickness units (3) can also be electrically connected together. A display unit (6) displays the film thickness values calculated by the respective calculated film thickness units (3) from a single display unit (6).

Wherein, the light source (1) is a full-band light source including one of ultraviolet light, visible light and near infrared light.

The above are only some of the examples of this creation, and are not intended to limit the creation of this creation. It should be included in the scope of this patent, based on the creative spirit and characteristics of this creation.

In summary, the present embodiment can achieve the expected use efficiency, and the specific structure disclosed therein has not been seen in similar products, nor has it been disclosed before the application, and has fully complied with the provisions of the Patent Law. And the request, the application for a new type of patent in accordance with the law, please forgive the review, and grant the patent, it is really sensible.

(1) ‧‧‧Light source

(2) ‧‧‧ Optical sensing components

(3) ‧‧‧Computed film thickness unit

(4) ‧‧‧film

(5) ‧‧‧Substrate

(T _P )‧‧‧ Path

(6)‧‧‧Display unit

The first picture: a schematic diagram of the structure of the thin film thickness line detecting device of the present invention

Second: Schematic diagram of the structure of the second preferred embodiment of the thin film thickness line detecting device of the present invention

Third: Schematic diagram of the structure of the three preferred embodiments of the thin film thickness line detecting device of the present invention

Fourth: Schematic diagram of the structure of the four preferred embodiments of the thin film thickness line detecting device of the present invention

Fig. 5 is a schematic view showing the structure of the fifth preferred embodiment of the thin film thickness line detecting device of the present invention

(1) ‧‧‧Light source

(2) ‧‧‧ Optical sensing components

(3) ‧‧‧Computed film thickness unit

(4) ‧‧‧film

(5) ‧‧‧Substrate

Claims (11)

A thin film thickness line detecting device comprises a light source, an optical sensing component and a calculated film thickness unit; and a light source and an optical sensing component corresponding to each other are disposed on the conveying path of the prepared film, so that the path passes through the corresponding light source and Between the optical sensing elements, the optical sensing element is electrically connected to the calculated film thickness unit; when the light of the light source passes through the film of different thickness, different degrees of attenuation are generated, and after the optical sensing element is absorbed, the voltage is converted into a corresponding voltage. Signal, the voltage signal is calculated by calculating the film thickness unit to obtain the thickness value of the film. The film thickness line detecting device according to claim 1, wherein in each of the conveying paths after the film is attached, the corresponding light source and the light sensing component are disposed at corresponding positions of the path to detect The thickness of each layer of film. The film thickness line detecting device of claim 2, wherein each of the light sensing elements is electrically connected to the calculated film thickness unit. The film thickness line detecting device of claim 3, further comprising a display unit electrically connected to the calculated film thickness unit, capable of displaying a film thickness value calculated by calculating the film thickness unit For the display unit. The film thickness line detecting device according to claim 4, wherein the light source is a full-band light source, and includes a light source of one of ultraviolet light, visible light and near infrared light. The film thickness line detecting device of claim 2, wherein each of the light sensing elements is electrically connected to a calculated film thickness unit. The film thickness line detecting device according to claim 6, further comprising a display unit electrically connected to the calculated film thickness unit, capable of displaying a film thickness value calculated by calculating the film thickness unit For the display unit. The film thickness line detecting device according to claim 7, wherein the light source is a full-band light source, and includes a light source of one of ultraviolet light, visible light and near infrared light. The film thickness line detecting device according to claim 1 or 2, further comprising a display unit electrically connected to the calculated film thickness unit, capable of calculating a film thickness calculated by the film thickness unit The value is displayed on the display unit. The film thickness line detecting device according to claim 9, wherein the light source is a full-band light source, and includes a light source of one of ultraviolet light, visible light and near infrared light. The film thickness line detecting device according to claim 1 or 2, wherein the light source is a full-band light source, and includes a light source of one of ultraviolet light, visible light and near infrared light.