TWI618914B - Electro-conductive film thickness detection apparatus - Google Patents

Electro-conductive film thickness detection apparatus Download PDF

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TWI618914B
TWI618914B TW105100363A TW105100363A TWI618914B TW I618914 B TWI618914 B TW I618914B TW 105100363 A TW105100363 A TW 105100363A TW 105100363 A TW105100363 A TW 105100363A TW I618914 B TWI618914 B TW I618914B
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conductive film
port
light source
film thickness
spectrometer
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TW201725357A (en
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林克默
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南臺科技大學
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Abstract

本發明係關於一種導電薄膜厚度檢測裝置,其係包含載台、光源以及光譜儀,位於載台之容置槽設有貫通之第一端口及第二端口,且分別於第一端口及第二端口設有光源及光譜儀;藉此,將導電薄膜置於光譜儀上方,當光源所發出之光線穿透導電薄膜後,能藉光譜儀接收並進行特定波段訊號之分析,以獲知薄膜厚度資訊,並完成薄膜厚度之量測。The invention relates to a conductive film thickness detecting device, which comprises a stage, a light source and a spectrometer. The receiving slot of the loading platform is provided with a first port and a second port, and is respectively connected to the first port and the second port. The light source and the spectrometer are provided; thereby, the conductive film is placed above the spectrometer, and when the light emitted by the light source penetrates the conductive film, the spectrometer can receive and analyze the specific band signal to obtain the film thickness information, and complete the film. The measurement of the thickness.

Description

導電薄膜厚度檢測裝置Conductive film thickness detecting device

本發明係關於一種導電薄膜厚度檢測裝置,尤指透過光源照射使導電薄膜出現不同穿透率時,能藉光譜儀快速完成檢測並判斷薄膜厚度之裝置者。The invention relates to a conductive film thickness detecting device, in particular to a device capable of quickly detecting and judging a film thickness by a spectrometer when the conductive film exhibits different transmittances by irradiation with a light source.

按,目前透明導電薄膜(Transparent conductive oxides, TCOs)已普遍應用於智慧型手機、平板電腦、平面顯示器及太陽能晶片…等各類光電產品。其中,氧化銦錫薄膜(Indium tin oxide, ITO)具有極佳的導電特性及高透光率,故已為現今最重要的透明導電薄膜材料。而透明導電薄膜的光電性質及均勻度對於產品性能有極大的影響,因此,如何快速檢測透明導電薄膜之品質為目前亟需重視之課題。According to the current, transparent conductive oxides (TCOs) have been widely used in various types of optoelectronic products such as smart phones, tablet computers, flat panel displays and solar chips. Among them, Indium tin oxide (ITO) has excellent electrical conductivity and high light transmittance, so it is the most important transparent conductive film material. The photoelectric properties and uniformity of the transparent conductive film have a great influence on the performance of the product. Therefore, how to quickly detect the quality of the transparent conductive film is an urgent issue.

關於檢測透明導電薄膜之先前技術,如中華民國公告第428079號專利,係揭露一種「使用光干涉方法之薄膜厚度測量裝置」,其係利用一光接受單元以一光源及一光纖將光導向近乎垂直之基板,並接收該基板反射的光,以透過一分析單元之分光鏡依據反射光強弱分開各波長強度來分析並計算基板上之薄膜厚度。The prior art for detecting a transparent conductive film, such as the Republic of China Publication No. 428079, discloses a "film thickness measuring device using an optical interference method" which uses a light receiving unit to guide light to a light source and an optical fiber. The substrate is vertical and receives the light reflected by the substrate, and the thickness of the film on the substrate is analyzed and calculated by separating the intensity of each wavelength according to the intensity of the reflected light through a beam splitter of an analyzing unit.

中華民國公告第M453837號專利,為發明人先前所研發之專利,係揭露一種「薄膜厚度線上檢測裝置」,其係於輸送薄膜之路徑上設有彼此對應的光源與光學感測元件,並將光學感測元件電性連接於計算膜厚單元,使光源之光穿透透明導電薄膜後,因透明導電薄膜具不同厚度而產生不同程度的衰減,待光學感測元件吸收後,將所吸收的光源轉換為對應的電壓訊號,以藉由計算該電壓訊號獲知薄膜之厚度值。The Republic of China Announcement No. M453837, which is a patent previously developed by the inventors, discloses a "film thickness line detecting device" which is provided with a light source and an optical sensing element corresponding to each other in the path of transporting the film, and The optical sensing component is electrically connected to the calculated film thickness unit, so that after the light of the light source penetrates the transparent conductive film, the transparent conductive film has different degrees of attenuation with different thicknesses, and after being absorbed by the optical sensing component, the absorbed light is absorbed. The light source is converted into a corresponding voltage signal to obtain a thickness value of the film by calculating the voltage signal.

中華民國公開第201420993號專利,係揭露一種「多功能之薄膜元件檢測儀」,其係使參考面接收一光源之第一光線以產生第一反射光,並使薄膜元件之待測面接收光源之第二光線以產生第二反射光,第一反射光與第二反射光會形成複數干涉光,而能透過光感測器接收並藉處理器依據複數反射相位或待測薄膜之反射率進行運算,以獲知薄膜元件的待測面表面輪廓或厚度資訊。The Republic of China Publication No. 201420993 discloses a "multifunctional film element detector" which causes a reference surface to receive a first light of a light source to generate first reflected light and to receive a light source of the film element to be tested. The second light is generated to generate the second reflected light, and the first reflected light and the second reflected light form a plurality of interference light, which can be received by the light sensor and processed by the processor according to the complex reflection phase or the reflectivity of the film to be tested. Calculate to know the surface profile or thickness information of the surface of the film element to be tested.

中華民國公告第I386638號專利,係揭露一種「薄膜光學檢測裝置」,其係藉多波長光源提供具有多個波段之光束至分光準直模組,再利用分光準直模組將光束分為多個具有對應波段之次光束,並透過多通道極化旋轉模組分別調整次光束偏振之方位角,以利用合光準直模組將次光束合為聚合光束後入射薄膜製品,並藉偏極化模組檢偏限制聚合光束不同偏振態之穿透量,使影像光譜儀能接收聚合光束呈多波長影像。The Republic of China Announcement No. I386638 discloses a "thin film optical detecting device" which provides a beam having a plurality of wavelength bands to a spectroscopic collimating module by means of a multi-wavelength light source, and splits the beam by a spectroscopic collimating module. The sub-beams having the corresponding wavelength bands are respectively adjusted by the multi-channel polarization rotation module to adjust the azimuth angle of the sub-beam polarization, so that the sub-beams are combined into a convergent beam by the combined light collimation module, and then incident on the film product, The detection of the module limits the penetration of different polarization states of the converged beam, so that the image spectrometer can receive the multi-wavelength image of the converged beam.

上述先前技術雖均能達成檢測薄膜厚度或均勻度之功效,但對於量測之程序、後續計算、量測精度以及於生產線的運用上,仍有改良之空間。Although the above prior art can achieve the effect of detecting film thickness or uniformity, there is still room for improvement in the measurement procedure, subsequent calculation, measurement accuracy, and application in the production line.

有鑑於習用透明導電薄膜大部分是應用光學干涉、X光或渦電流、雷射超音波…等方法來檢測厚度,且該技術多半是透過光的反射率來進行檢測,故僅能用於定點量測而無法運用於生產線或會震動的機台上,並具有量測時間過久之缺失。In view of the fact that most of the conventional transparent conductive films are applied by optical interference, X-ray or eddy current, laser ultrasonic wave, etc., and the thickness of the technique is mostly detected by the reflectance of light, it can only be used for fixed point. Measurement can not be applied to the production line or the machine that will vibrate, and has the lack of measurement time.

因此,本發明之目的乃是基於比爾吸收定律(Beer-Lambert Law),利用光源照射透明導電薄膜時,其穿透率會隨導電薄膜厚度改變,而能藉光譜儀分析特定波段之訊號以獲知薄膜的厚度資訊,並藉光譜儀提升量測精度。Therefore, the object of the present invention is based on the Beer-Lambert Law. When a transparent conductive film is irradiated with a light source, the transmittance thereof changes with the thickness of the conductive film, and the signal of the specific wavelength band can be analyzed by the spectrometer to obtain the film. The thickness information, and the spectrometer to improve the measurement accuracy.

本發明之另一目的係藉由簡單結構組成薄膜厚度檢測裝置,使該裝置能應用於輸送裝置或組裝於現有設備機台,藉以達成線上檢測與降低設備成本之目的。Another object of the present invention is to form a film thickness detecting device by a simple structure, so that the device can be applied to a conveying device or assembled to an existing equipment machine, thereby achieving on-line detection and reducing equipment cost.

為達前揭目的,本發明提供一種導電薄膜厚度檢測裝置,其係包含︰一載台,具有一容置槽,並設有貫通該容置槽之第一端口及第二端口;一光源,設於該載台之第一端口;以及;一光譜儀,設於該載台之第二端口,且能吸收330 ~ 400奈米之訊號。In order to achieve the foregoing, the present invention provides a conductive film thickness detecting device, comprising: a carrier having a receiving slot and having a first port and a second port extending through the receiving slot; a light source, a first port disposed on the stage; and a spectrometer disposed at the second port of the stage and capable of absorbing signals of 330 to 400 nm.

基於上述,利用透明導電薄膜會吸收紫外光線之原理,將導電薄膜置於光譜儀上方,當光源所發出之光線穿透該導電薄膜後,能藉光譜儀接收並進行特定波段之訊號分析,以藉分析結果獲知薄膜厚度資訊,並完成薄膜厚度之量測。Based on the above principle, the transparent conductive film absorbs ultraviolet light, and the conductive film is placed above the spectrometer. When the light emitted by the light source penetrates the conductive film, the spectrometer can receive and perform signal analysis of a specific band for analysis. As a result, the film thickness information was obtained, and the film thickness measurement was completed.

為使 貴審查委員瞭解本發明欲達成目的所運用之技術、手段及功效,餘下,茲列舉一較佳實施例並配合圖式,詳細說明如后︰In order to make the reviewers aware of the techniques, means and effects of the present invention in order to achieve the objectives, the remainder of the present invention will be described in detail with reference to the drawings.

首先,請參閱第1圖所示,係本發明之立體分解圖,該檢測裝置1包含一載台11、一光源12、一濾鏡13以及一光譜儀14;該載台11具有一容置槽111,並設有貫通容置槽111之第一端口112及第二端口113;該光源12為鹵素燈,並設於載台11之第一端口112;該濾鏡13置於載台11之容置槽111內,並連接於光源12;該光譜儀14設於載台11之第二端口113,且能吸收330~400奈米之訊號。First, referring to Fig. 1, an exploded perspective view of the present invention includes a stage 11, a light source 12, a filter 13, and a spectrometer 14; the stage 11 has a receiving slot The first port 112 and the second port 113 are disposed through the accommodating groove 111. The light source 12 is a halogen lamp and is disposed on the first port 112 of the stage 11; the filter 13 is placed on the stage 11 The accommodating groove 111 is connected to the light source 12; the spectrometer 14 is disposed at the second port 113 of the stage 11 and can absorb signals of 330 to 400 nm.

其次,請仍然參閱第1圖並配合第2圖所示,組裝時,係分別於載台11之第一端口112及第二端口113設置光源12及光譜儀14,並於光源12朝向容置槽111之位置設有濾鏡13,以濾除波長範圍200nm~400nm以外之光線,特別是波長380nm以外之光線,而能將導電薄膜3(圖中未顯示)置於濾鏡13與光譜儀14之間,以進行檢測。此外,為能配合線上機台使用檢測裝置1,係能於載台11之第一端口112與光源12之間設一第一光纖15(配合參閱第3圖),並於載台11之第二端口113與光譜儀14之間設一第二光纖16,使光線的傳送與接收能透過第一光纖15及第二光纖16來進行傳輸,而能將檢測裝置1置於生產線機台上,以減少空間的佔用。Next, please refer to FIG. 1 and in conjunction with FIG. 2, when assembling, the light source 12 and the spectrometer 14 are respectively disposed on the first port 112 and the second port 113 of the stage 11, and the light source 12 faces the receiving groove. A filter 13 is disposed at a position of 111 to filter out light having a wavelength range of 200 nm to 400 nm, particularly light having a wavelength other than 380 nm, and the conductive film 3 (not shown) can be placed in the filter 13 and the spectrometer 14. Between, for testing. In addition, in order to be able to cooperate with the detection device 1 of the online machine, a first optical fiber 15 can be disposed between the first port 112 of the stage 11 and the light source 12 (refer to FIG. 3), and the first stage of the stage 11 A second optical fiber 16 is disposed between the two ports 113 and the spectrometer 14 to enable transmission and reception of light to be transmitted through the first optical fiber 15 and the second optical fiber 16, and the detecting device 1 can be placed on the production line machine. Reduce the space occupied.

接著,請參閱第4圖所示,係本發明組裝於輸送裝置之示意圖,該檢測裝置1可供裝設於一輸送裝置2,該輸送裝置2包含一平台21,該平台21上方固定有一滑軌22,位於滑軌22二端分別設有轉軸23,並於其中一轉軸23組接有馬達24,且於二轉軸23之間套設有一皮帶25,該皮帶25上方固定有一夾件26,而能藉馬達24帶動轉軸23呈順時針或逆時針方向轉動,連帶使皮帶25轉動並使夾件26於滑軌22上水平往復運動。位於輸送裝置2之平台21上能供檢測裝置1之載台11設置,並將夾件26設於濾鏡13與第二光纖16之間。Next, referring to FIG. 4, a schematic view of the present invention assembled on a transport device, the detection device 1 can be mounted on a transport device 2, the transport device 2 including a platform 21, and a slide is fixed on the platform 21 The rails 22 are respectively provided with a rotating shaft 23 at two ends of the sliding rails 22, and a motor 24 is assembled to one of the rotating shafts 23, and a belt 25 is disposed between the two rotating shafts 23. A clamping member 26 is fixed on the belt 25, The motor 24 can be used to rotate the shaft 23 in a clockwise or counterclockwise direction, and the belt 25 is rotated to rotate the clip 26 horizontally on the slide rail 22. The stage 21 on the conveyor 2 is provided for the stage 11 of the detecting unit 1, and the clip 26 is placed between the filter 13 and the second optical fiber 16.

檢測時,請配合參閱第5~6圖所示,其係將導電薄膜3置於輸送裝置2之夾件26上方,使光源12發出之光線經由第一光纖15傳輸後,藉由濾鏡13濾除所限定波長範圍以外之光線,讓保留之特定波段區間光線穿透於導電薄膜3,並使穿透之光線經第二光纖16傳輸至光譜儀14,以藉光譜儀14將穿透光譜傳送至後端工作電腦來進行膜厚分析,藉此獲知導電薄膜3厚度資訊,並完成導電薄膜3厚度之檢測。除了進行導電薄膜3厚度之靜態檢測外,亦能透過輸送裝置2之馬達24驅動轉軸23使皮帶25轉動同時讓夾件26於滑軌22上水平往復運動,藉此輸送導電薄膜3,並供進行線上動態之膜厚檢測。For the detection, please refer to the figures 5-6, which are placed above the clip 26 of the transport device 2, so that the light emitted by the light source 12 is transmitted through the first optical fiber 15 through the filter 13 Filtering out the light outside the defined wavelength range, allowing the remaining band of light to penetrate the conductive film 3, and transmitting the transmitted light to the spectrometer 14 via the second fiber 16 to transmit the transmission spectrum to the spectrometer 14 The back-end working computer performs film thickness analysis to know the thickness information of the conductive film 3 and complete the detection of the thickness of the conductive film 3. In addition to the static detection of the thickness of the conductive film 3, the motor 24 of the transport device 2 can be driven to rotate the belt 23 to rotate the belt 25 while the clip member 26 is horizontally reciprocated on the slide rail 22, thereby conveying the conductive film 3 and supplying it. Perform on-line dynamic film thickness detection.

由於透明導電薄膜3具有吸收紫外光線之特性,因此,當紫外光線穿透導電薄膜3時,會因導電薄膜3之不同厚度而產生不同的穿透率,是以,本發明即是透過事先求出導電薄膜3其穿透率與膜厚之相關性(如第7圖所示),以獲得膜厚與穿透率的迴歸公式,並基於上述結構實際進行檢測實驗,其檢測實驗之結果如下︰其係先行濺鍍製作膜厚為80~115nm之氧化銦錫薄膜(ITO)以及膜厚為88~115nm之氧化銦錫薄膜(ITO)於康寧玻璃上以構成樣品基板,完成濺鍍後利用多角度光譜式橢圓儀測定樣品基板,以獲得奈米單位之精確膜厚數據,據此,作為判定樣品基板膜厚之依據。當將膜厚80~115nm之樣品基板置於檢測裝置1上,並進行靜態檢測時,其量測誤差(絕對值平均)為0.87nm,標準差為1.3nm。而當將膜厚88~115nm之樣品基板置於檢測裝置1上,並透過輸送裝置2進行線上動態檢測時,其量測誤差(絕對值平均)為3.88nm,標準差為4.38nm(如第8圖所示),故由上述檢測實驗結果可得知本發明之檢測裝置1確實能達成檢測薄膜厚度之目的。Since the transparent conductive film 3 has the property of absorbing ultraviolet light, when the ultraviolet light penetrates the conductive film 3, different transmittances are generated due to different thicknesses of the conductive film 3. Therefore, the present invention seeks through advance The conductivity of the conductive film 3 is correlated with the film thickness (as shown in Fig. 7) to obtain a regression formula of film thickness and transmittance, and the actual test is performed based on the above structure, and the results of the test are as follows .. It is firstly sputtered to form an indium tin oxide film (ITO) with a film thickness of 80 to 115 nm and an indium tin oxide film (ITO) having a thickness of 88 to 115 nm on a Corning glass to form a sample substrate, which is used after sputtering. The multi-angle spectroscopic ellipsometer measures the sample substrate to obtain accurate film thickness data of the nano unit, and accordingly, serves as a basis for determining the film thickness of the sample substrate. When a sample substrate having a film thickness of 80 to 115 nm was placed on the detecting device 1 and subjected to static detection, the measurement error (absolute value average) was 0.87 nm, and the standard deviation was 1.3 nm. When the sample substrate having a thickness of 88 to 115 nm is placed on the detecting device 1 and subjected to on-line dynamic detection through the transport device 2, the measurement error (absolute value average) is 3.88 nm, and the standard deviation is 4.38 nm (eg, As shown in Fig. 8 , it can be seen from the above test results that the detecting device 1 of the present invention can achieve the purpose of detecting the thickness of the film.

是以,利用本發明之檢測裝置顯然能達成如下之功效︰ 1. 本發明之檢測裝置係利用透明導電薄膜具有吸收紫外光線之特性,藉由光源、濾鏡及光譜儀之設置,使導電薄膜因厚度改變進而讓穿透率改變時,能藉光譜儀進行訊號的分析,並藉此達成檢測導電薄膜厚度之功效。 2. 本發明之檢測裝置係利用光譜儀以針對特定波段進行訊號分析,藉此,提升檢測精度至奈米單位,並利用光譜儀能選擇特定波段之功能來有效解決感測器動態反應不足之問題。 3. 本發明之檢測裝置結構簡單且易於組裝,此外,基於穿透率的改變進行分析之方式,使該檢測裝置不受機台震動影響,並能整合於各種機台設備內或運用於生產線上,藉以達成大幅降低成本與自動化檢測之功效。Therefore, the detection device of the present invention can obviously achieve the following effects: 1. The detection device of the present invention utilizes a transparent conductive film to absorb ultraviolet light, and the conductive film is provided by a light source, a filter, and a spectrometer. When the thickness is changed and the transmittance is changed, the signal can be analyzed by the spectrometer, and the effect of detecting the thickness of the conductive film can be achieved. 2. The detecting device of the present invention uses a spectrometer to perform signal analysis for a specific wavelength band, thereby improving detection accuracy to nanometer units, and using the spectrometer to select a specific band function to effectively solve the problem of insufficient dynamic response of the sensor. 3. The detecting device of the invention has a simple structure and is easy to assemble, and further, the detecting device is not affected by the vibration of the machine due to the change of the transmittance, and can be integrated into various machine equipment or used in the production line. In order to achieve significant cost reduction and automated testing.

惟以上所述者,僅為本發明之較佳實施例,並非用以限定本發明之實施範圍,凡未脫離本發明技術精神所為之變化與修飾,皆為本發明專利範圍所涵蓋。The above is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. All changes and modifications that do not depart from the technical spirit of the present invention are covered by the scope of the present invention.

綜上所述,本發明確實已突破傳統並具有改良及創新之創作內容且能具體實施,理應符合發明專利之法定要件,爰依法提出專利申請,懇請 鈞局審查委員授予合法專利權,以勵創作,至感德便。In summary, the present invention has indeed broken through the tradition and has improved and innovative creation content and can be specifically implemented, which should meet the statutory requirements of the invention patent, and file a patent application according to law, and invite the examination committee of the bureau to grant legal patent rights. Creation, to the sense of virtue.

本發明︰this invention︰

1‧‧‧檢測裝置1‧‧‧Detection device

11‧‧‧載台11‧‧‧ stage

111‧‧‧容置槽111‧‧‧ accommodating slots

112‧‧‧第一端口112‧‧‧First port

113‧‧‧第二端口113‧‧‧second port

12‧‧‧光源12‧‧‧Light source

13‧‧‧濾鏡13‧‧‧ filter

14‧‧‧光譜儀14‧‧‧ Spectrometer

15‧‧‧第一光纖15‧‧‧First fiber

16‧‧‧第二光纖16‧‧‧second fiber

2‧‧‧輸送裝置2‧‧‧Conveyor

21‧‧‧平台21‧‧‧ platform

22‧‧‧滑軌22‧‧‧Slide rails

23‧‧‧轉軸23‧‧‧ shaft

24‧‧‧馬達24‧‧‧Motor

25‧‧‧皮帶25‧‧‧Land

26‧‧‧夾件26‧‧‧Clamps

3‧‧‧導電薄膜3‧‧‧Electrical film

第1圖係本發明之立體分解圖。 第2圖係本發明之立體圖。 第3圖係本發明另一實施例之立體圖。 第4圖係本發明組裝於輸送裝置之示意圖。 第5~6圖係本發明量測之示意圖。 第7圖係本發明膜厚與穿透率強度關係之曲線圖。 第8圖係本發明實際測量結果之比較圖。Figure 1 is a perspective exploded view of the present invention. Figure 2 is a perspective view of the present invention. Figure 3 is a perspective view of another embodiment of the present invention. Figure 4 is a schematic illustration of the assembly of the present invention in a delivery device. Figures 5 to 6 are schematic views of the measurement of the present invention. Fig. 7 is a graph showing the relationship between the film thickness and the transmittance of the present invention. Figure 8 is a comparison of actual measurement results of the present invention.

Claims (6)

一種導電薄膜厚度檢測裝置,包含:一載台,具有一容置槽,並設有貫通該容置槽之第一端口及第二端口;一光源,設於該載台之第一端口;一光譜儀,設於該載台之第二端口,且能吸收330~400奈米之訊號;以及一濾鏡,設於該容置槽內,並供濾除波長範圍200nm~400nm以外之光線,且使該濾鏡連接於該光源。 The invention relates to a conductive film thickness detecting device, comprising: a loading platform having a receiving slot and a first port and a second port extending through the receiving slot; a light source disposed at the first port of the loading platform; a spectrometer disposed at the second port of the stage and capable of absorbing signals of 330 to 400 nm; and a filter disposed in the accommodating groove for filtering out light having a wavelength range of 200 nm to 400 nm, and The filter is attached to the light source. 根據請求項1所述之導電薄膜厚度檢測裝置,其中,該載台之第一端口與該光源之間設有一第一光纖。 The conductive film thickness detecting device according to claim 1, wherein a first optical fiber is disposed between the first port of the stage and the light source. 根據請求項1所述之導電薄膜厚度檢測裝置,其中,該載台之第二端口與該光譜儀之間設有一第二光纖。 The conductive film thickness detecting device according to claim 1, wherein a second optical fiber is disposed between the second port of the stage and the spectrometer. 根據請求項1所述之導電薄膜厚度檢測裝置,其中,該光源為鹵素燈。 The conductive film thickness detecting device according to claim 1, wherein the light source is a halogen lamp. 一種導電薄膜厚度檢測裝置,包含:一載台,具有一容置槽,並設有貫通該容置槽之第一端口及第二端口;一光源;一第一光纖,一端設於該載台之第一端口,另一端則連接於該光源;一濾鏡,置於該容置槽內,且供濾除波長範圍200nm~400nm以外之光線,並連接於該第一光纖;一光譜儀,能吸收330~400奈米之訊號;以及一第二光纖,一端設於該載台之第二端口,另一端則連接於該光譜儀。 The invention relates to a conductive film thickness detecting device, comprising: a loading platform having a receiving groove, and a first port and a second port extending through the receiving groove; a light source; a first optical fiber, one end of which is disposed on the loading platform a first port, the other end is connected to the light source; a filter is disposed in the receiving groove, and is configured to filter out light having a wavelength range of 200 nm to 400 nm and is connected to the first optical fiber; A signal of 330 to 400 nm is absorbed; and a second optical fiber is disposed at one end of the second port of the stage and connected to the spectrometer at the other end. 根據請求項5所述之導電薄膜厚度檢測裝置,其中,該光源為鹵素燈。 The conductive film thickness detecting device according to claim 5, wherein the light source is a halogen lamp.
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TWI746318B (en) * 2020-12-17 2021-11-11 萬潤科技股份有限公司 Detection method, detection device and equipment

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Publication number Priority date Publication date Assignee Title
CN108593555A (en) * 2018-07-04 2018-09-28 河南农业大学 Multichannel absorption spectrum monitor station and detecting system
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