M378433 i 五、新型說明： f新型所屬之技術領域】 本創作有關於一種觸控螢幕之佈線处 關於一種電容式觸控螢幕之佈線結構。° ，特別是有 【先前技術】 觸控螢幕的佈線結構-般包括沿χ方向與 縱橫交叉的兩組導線，目前，觸控螢幕佈&二 下所述之問題存在： 傅係有如 (1) X方向與γ方向上之兩組導線空間交又 程技術中，首先，需要製作位於底層一組導線導電膜製 =後’製作-絕緣膜，最後，再製作位於上層―植導 導電膜。由於兩組導線之透明導電膜必須分別製作導： 導電膜顏色上的差異，進而降低觸控榮幕 (2) 由於導線導電膜材料採用透明材料，膜芦 =在兩料線相交又點上，位於其上方之橋接膜^， 生導輯裂現象’導致導線局部斷線，因而使產品 良品率降低之問題。 (3) 導線導電膜之線電阻易增高，造成觸控螢幕性 能降低之問題。 3 【新型内容】 就是：：：上述先前技術之問題’本創作之其中-目的 種電容式觸控營幕之佈線結構，以解決先 乃邱斷I幕之佈線結構所存在之色差現象、導線 局°晴線、導線導電膜之線電阻增高等問題。 係包ί創料m述各㈣騎絲之技術技術手段 佈線妗」作,其中一目的係提供一種電容式觸控螢幕之 A板:儿^電容式觸控營幕之佈線結構係適用於，在 ί電膜：多：广方向所佈置的兩組導線之多個透明 導電膜與多個絕緣膜之觸控螢幕。 電膜===在位於…向上之透明導 結構。 <的、、、°構可包括連續連接結構或橋接連接 電膜I目：：上ΐ透明導電膜在位於與χ方向上之透明導 結構。又处的結構可包括連續連接結構或橋接連接 ’連續連接結構係為，將位於χ方向盘Υ方向 =二兩:t之透明導電膜材料以連續導線連接 又處其:位橋於接Λ接:=在x方向與γ方向上之交 接，並直接形成二板一上方1 …明導電膜係連續連 電膜則在交又點上方向上之透明導 上間斷，並且以絕緣膜所覆蓋之交又點 M378433 上的連續連接之透明導電膜更具有面電阻低於透明導電 膜之橋接膜，此橋接膜係橫跨交叉點上之連續連接之透 明導電膜，並覆蓋在絕緣膜上，以連接斷之透明導電膜。 其中，於本創作之電容式觸控螢幕之佈線結構中， 絕緣膜之邊緣可位於其所覆蓋之連續連接之透明導電膜 鄰近處之基板表面上，亦可位於相鄰之間斷之透明導電 膜鄰近處之基板表面上。 其中，於本創作之電容式觸控螢幕之佈線結構中， 橋接膜可為金屬膜或低電阻導電膜來加以實現。 其中，於本創作之電容式觸控螢幕之佈線結構中， 金屬膜可為-I或—層以上之金屬層或金屬合金層來加 以實現，而低電阻導電膜則可以一層或一層以上的方式 來加以實現。 其中’於本㈣之電容式觸控螢幕之佈線結構中， 方向上之透明導電膜在位於與γ方向上之透 =相互交又處之連續連接結構與橋接連接結構可採取 相間交替配置的方式來加以實現。 ^ I於本創作之電容摘控螢幕之佈線 !=透！導電膜於位於與x方向上之透明導電膜 間 交替連接結構與橋接連接結構可採取相 乂替配置的方式來加以實現。 '、中於本創作之電容式觸控螢幕之佈線社構中 絕緣膜之形狀可為長方形、正方形或:圓：構中’ 承上所述’本創作之電5容式觸控螢幕之佈線結構， 與先前技術相比，其可具有—或多個τ述優點： ⑴因X方向或Y方向上之透明導電膜層可以同時 ’故可避免分別製作所造成之色差現象，藉此可提 咼觸控螢幕產品之品質。 ⑺橋接膜層可採用金屬膜或低阻抗導電膜來加以 山現’由於金屬膜或低阻抗導電膜膜層厚度較厚，不易 現斷線現象，因此可提高導線之連續性。 (3)因橋接膜層之面電阻遠小於透明導線膜層之面 。阻’故降低X方向與γ方向上兩組導線之線電阻 此提高觸控螢幕之性能。 曰 、（4)當絕緣膜之邊緣位於其所覆蓋之透明導電膜鄰 f處之基板表面上時’因絕緣膜之邊緣不會出現勉起現 ，故橋接膜在絕緣膜之邊緣不會斷線，解次提高產品 的良品率。 =ασ <(5)因X方向與Υ方向上兩組導線之透明導電膜均 可採用連續連接結構以及橋接連接結構，故兩方向上導 線之線電阻具有良好一致性，藉此提高觸控螢幕之靈敏 【實施方式】 以下將參照相關圖式，說明依本創作之電容式觸控 螢幕之佈線結構之實施例，為使便於理解，下述實施例 中之相同元件係以相同之符號標示來說明。 請合併參間第】圖 圖為本創作之電容，圖：第3圖，其中，第} 意圖，第2圖為第】圖線結構之平面結構示 1圖中線剖面圖。中A-A線剖面圖’第3圖為第 圖中，本劊作之雷a4紐 在基板1G上沿χ 觸控螢幕之佈線結構係包括 明導電膜1、相導電膜6、^佈導線之透 面電阻低於透明導電们與透明緣膜^邑緣膜5、以及 橋接膜4。 处乃導電臈6之橋接膜2與 Λ々同上之透明導電 導電膜6相互交又處的向上之透明 接連接結構。此連續連接 接結構以及橋 以採用相間交替配置，橋接連接結構分別可 =置方式，舉例來說，可按照「連:連:::二規= 2接結構」、「橋接連接結構」、「連續Ϊ㈡」:「Ϊ 以「連續連接結構、「橋拉查 Τ Α疋 「連續連接結構」、「橋「橋接連接結構」、 橋接連接結構」、橋接連接結構」 的順序來配置來進行配置，但不以此為限，例如亦可以 採取無規律性时絲配置，均能㈣現本創作之目的。 Y方向上之透明導電膜6在位於與χ方向上之透明 導電膜1相互交又處的結構可包括連續連接結構與橋接 連接結構。此連續連接結構與此橋接連接結構皆可採用 相間交替配置方式，可依據設計所需，進行具規律性的 «/6433 續連構舉?ί說’可依序以「連續連接結構」、「連 績=::、、「=，'「連續連接結構」'「二 或者是以「連續3連、接=方f本創作， 病、查拉「 」橋接連接」、「橋接連接,、「诖 ;進行::置橋=:二:接連接」之具規律性的順序 來配置，均能夠實現本：之:= 上之!連續連接結構乃是，將位於X方向與Υ方向 相=又4側之透明導電職料之具有連續性的導線 > Ζ述的橋接連接結構可為，於χ方向與¥方向上之 父又處，將位於X方向及γ方向中，其中一方向 明導電膜連續連接，並直接形成於基板1G上，並將位於 f向及Y方向中’其中另一方向上之透明導電膜間斷 在交又點上，絕緣膜3或絕緣膜5所覆蓋的位於此交又 點上連續連接之透明導電膜丨或透明導電膜6更可具有 橋接膜2或橋接膜4。 ^ 橋接膜2或橋接膜4可橫跨交又點上連續連接之透 明導電膜1或透明導電膜6，並覆蓋在絕緣膜3或絕緣 膜5上，用以連接交叉點上間斷的透明導電膜丨或透明 導電膜6。 在本實施例中，絕緣膜3或絕緣膜5的邊緣可位於 其所覆蓋的透明導電膜1或透明導電膜6鄰近處之基板 10表面上。於其他實施例中，絕緣膜3或絕緣膜5的邊 M378433 緣亦可以位於相鄰之間斷的透明導電膜1或透明導電膜 6上或鄰近處的基板10表面上。 上述橋接膜可以採用金屬膜或低電阻導電膜，金屬 膜可以疋金屬材料所製成的膜層或金屬合金材料所製成 的膜層，低電阻導電膜可以採用透明導電膜材料、不透 明導電膜材料或半透明導電膜材料，但不以此為限。 金屬膜可以根據需要採用一層或一層以上，低電阻 導電膜也可以根據需要採用一層或一層以上。 基板10可以採用玻璃基板或其他替代玻璃的透明 板材。 上述絕緣膜3或絕緣膜5之形狀可以採用長方形、 正方形或橢圓形，但不以此為限。 由於橋接膜層比透明導電膜層之面電阻小、電導率 咼，其寬度通常小於第二組導線之透明導電膜的寬度。 請參閱第4圖，係為本創作之電容式觸控螢幕之佈 線結構之製造方法流程圖，係包含下列步驟·· 步驟S1:同時或分別在基板上製作位於X方向或γ 方向上之透明導電膜，位於X方向上之透明導電膜在 位於與γ方向上之透明導電膜相互交叉處相連或間斷， 位於Y方向上之透明導電膜在位於與乂方向上之透 電膜相互交叉處相連或間斷，於交又處相連之位於 明導電媒相對應之位於丫方向上之透明導 二的位…向上之透明導電膜對應之 於X方向上之透明導電臈間斷。 9 威S2 : ΐ作絕緣膜，絕緣膜層是覆蓋位於X方向 二㈣^相互父又點上之相連透明導電臈上。當絕緣膜 味、、’位於其覆蓋的透明導電膜鄰近處的基板表面 膜斷裂絕緣：會勉起，不會造成橫跨其上的橋接 呵衣攸而棱尚產品的良品率。 、圭Μ S3 · 1作橋接膜’橋接膜是橫跨交又點處連續 連接的透料_，並覆蓋在絕緣膜 斷的透明導電膜。 疋乂又點上間 其中，於步驟2巾，絕緣膜層的邊緣可位於 2 =膜鄰近處的基板表面上或位於相鄰的斷線之 導電膜上或鄰近處的基板表面上。 其中’於步驟3中’橋接膜可為金屬膜或低 電膜。 以上所述僅為舉例性’而非為限制性者。任何未脫 離本創作之精神與範轉，而對1 ® 认處A A 7訂八進仃之·#效修改或變 更，均應包含於後附之申請專利範圍中。 【圖式簡單說明】 實 第1圖係為本觸m魅螢幕之佈線一 施例之平面結構示意圖； 第2圖係為第1圖中A__ A線剖面_丨 第3圖係、為第1圖+ B — B線剖面圖·以及 第4圖係、為本創作之電容式觸控螢幕之佈線結構一實 M378433 施例之製造方法流程圖。 【主要元件符號說明】 1 :透明導電膜； 2 :橋接膜； 3 :絕緣膜； 4 :橋接膜； 5 :絕緣膜； 6 :透明導電膜； 10 :基板；以及 S1〜S3 :各步驟流程。 11M378433 i V. New description: f new technology field] This creation is about a wiring scheme of touch screen. About the wiring structure of a capacitive touch screen. ° Especially, there are [previous techniques] The wiring structure of the touch screen generally includes two sets of wires crossing the vertical and horizontal directions along the χ direction. At present, the problems described in the touch screen cloth & 2 are: In the X-direction and γ-direction two-space wire space-crossing technique, firstly, it is necessary to fabricate a conductive film on the bottom layer of the conductive film to make a 'production-insulation film, and finally, to make a conductive film located on the upper layer. Since the transparent conductive films of the two sets of wires must be separately guided: the difference in the color of the conductive film, thereby reducing the touch glory (2) Since the conductive film material of the wire is made of a transparent material, the film ru is at the intersection of the two feed lines, The bridging film located above it, the phenomenon of the cracking of the conductor, causes the wire to be partially broken, thus reducing the yield of the product. (3) The wire resistance of the conductive film of the wire is easily increased, resulting in a problem of reduced performance of the touch screen. 3 [New content] is::: The above-mentioned problems of the prior art 'The creation of the purpose of the purpose of the capacitive touch screen wiring structure to solve the chromatic aberration phenomenon of the wiring structure of the first Naiqiu I screen, wire The problem is that the line resistance of the wire and the conductive film of the wire is increased. The system is designed to provide a capacitive touch screen A board: the wiring structure of the capacitive touch screen is suitable for In the Ø film: multi: a plurality of transparent conductive film and a plurality of insulating film touch screens arranged in two directions. The electric film === is in the transparent guide structure located in the upward direction. The structure of the <,, and the structure may include a continuous connection structure or a bridge connection film I:: a transparent conductive film of the upper transparent conductive film in the direction of the χ. The further structure may comprise a continuous connection structure or a bridge connection. The continuous connection structure is such that the transparent conductive film material in the direction of the χ steering wheel = = two: t is connected by a continuous wire and at the same time: the bridge is connected: = the intersection of the x direction and the gamma direction, and directly forming the upper surface of the two plates and the upper surface of the second conductive film. The continuous conductive film of the conductive film is intermittently blocked on the transparent guide in the direction of the intersection point, and is covered by the insulating film. Further, the continuously connected transparent conductive film on M378433 further has a bridge film having a lower surface resistance than the transparent conductive film, and the bridge film crosses the continuously connected transparent conductive film on the intersection and covers the insulating film to be connected Broken transparent conductive film. In the wiring structure of the capacitive touch screen of the present invention, the edge of the insulating film may be located on the surface of the substrate adjacent to the continuously connected transparent conductive film covered by the insulating film, or may be located adjacent to the intermittent transparent conductive film. On the surface of the substrate adjacent to it. Among them, in the wiring structure of the capacitive touch screen of the present invention, the bridge film can be realized by a metal film or a low-resistance conductive film. Wherein, in the wiring structure of the capacitive touch screen of the present invention, the metal film can be realized by a metal layer or a metal alloy layer of -I or above, and the low resistance conductive film can be one layer or more. To achieve it. In the wiring structure of the capacitive touch screen of the present invention, the transparent conductive film in the direction can be alternately arranged in a continuous connection structure and a bridge connection structure in the γ direction. To achieve it. ^ I in the circuit of the capacitor extraction control screen of this creation! = through! The conductive film is alternately connected between the transparent conductive film located in the x direction and the bridge connection structure can be implemented in a mutually alternate configuration. 'In the wiring structure of the capacitive touch screen of this creation, the shape of the insulating film can be rectangular, square or: round: in the structure of the electric 5 capacitive touch screen of the creation Compared with the prior art, the structure may have - or a plurality of τ advantages: (1) The transparent conductive film layer in the X direction or the Y direction can simultaneously avoid the chromatic aberration caused by the separate fabrication, thereby improving the structure. The quality of touch screen products. (7) The bridge film layer can be made of a metal film or a low-impedance conductive film. Since the thickness of the metal film or the low-impedance conductive film layer is thick, it is difficult to break the wire, so that the continuity of the wire can be improved. (3) Since the surface resistance of the bridge film layer is much smaller than that of the transparent wire film layer. Resistance reduces the line resistance of the two sets of wires in the X and γ directions. This improves the performance of the touch screen.曰, (4) When the edge of the insulating film is on the surface of the substrate adjacent to the transparent conductive film covered by the 'f", since the edge of the insulating film does not appear to smash, the bridging film does not break at the edge of the insulating film. Line, solve the product to improve the yield of the product. =ασ <(5) Since the transparent conductive films of the two sets of wires in the X direction and the Υ direction can adopt a continuous connection structure and a bridge connection structure, the line resistance of the wires in both directions has good consistency, thereby improving touch Sensitivity of the screen [Embodiment] Hereinafter, embodiments of the wiring structure of the capacitive touch screen according to the present invention will be described with reference to the related drawings. For ease of understanding, the same components in the following embodiments are denoted by the same symbols. To illustrate. Please merge the reference table] Figure is the capacitance of the creation, Figure: Figure 3, where the first intention, the second picture is the first] the plane structure of the line structure is shown in the figure. The middle AA line profile 'Fig. 3 is the figure. The wire of the A4 button on the substrate 1G along the touch screen structure includes the conductive film 1, the phase conductive film 6, and the wire. The surface resistance is lower than that of the transparent conductive film and the transparent edge film 5, and the bridge film 4. It is an upward transparent connection structure in which the bridge film 2 of the conductive crucible 6 and the transparent conductive conductive film 6 on the same side are mutually overlapped. The continuous connection structure and the bridge are alternately arranged with each other, and the bridge connection structure can be respectively set, for example, according to "connection: connection::: two rules = 2 connection structure", "bridge connection structure", Continuous Ϊ (2): Ϊ 配置 Configured in the order of "continuous connection structure, "bridge connection", "continuous connection structure", "bridge "bridge connection structure", bridge connection structure", bridge connection structure) However, it is not limited to this. For example, it is also possible to adopt a silk arrangement with no regularity, which can (4) the purpose of the present creation. The structure in which the transparent conductive film 6 in the Y direction is located at the intersection with the transparent conductive film 1 in the χ direction may include a continuous connection structure and a bridge connection structure. The continuous connection structure and the bridge connection structure can adopt alternate arrangement of phases, and can carry out the regular «/6433 continuous connection structure according to the design requirements. ί 〕 can be followed by "continuous connection structure", Succession =::,, "=, '"Continuous connection structure" '"Second or "Continuous 3 connection, connection = side f creation, disease, Chara "bridge connection", "bridge connection,"进行; proceed:: set bridge:: two: connect the connection in a regular order to configure, can achieve this: it: = above! The continuous connection structure is, will be in the X direction and the Υ direction = The continuous conductive wire of the transparent conductive material on the 4 side> The bridge connection structure described above may be in the X direction and the γ direction in the direction of the χ and the direction of the ¥ direction, one of which is electrically conductive. The film is continuously connected and formed directly on the substrate 1G, and the transparent conductive film located in the other direction in the f direction and the Y direction is interrupted at the intersection point, and the insulating film 3 or the insulating film 5 is covered by the intersection. Further, the transparent conductive film or the transparent conductive film 6 which is continuously connected may have a bridge Film 2 or bridge film 4. ^ The bridge film 2 or the bridge film 4 can be connected across the transparent conductive film 1 or the transparent conductive film 6 continuously connected at the point of intersection and over the insulating film 3 or the insulating film 5 for connecting the intermittent transparent conductive at the intersection Membrane or transparent conductive film 6. In the present embodiment, the edge of the insulating film 3 or the insulating film 5 may be located on the surface of the substrate 10 adjacent to the transparent conductive film 1 or the transparent conductive film 6 which it covers. In other embodiments, the edge of the insulating film 3 or the edge of the insulating film 5, M378433, may also be located on the surface of the substrate 10 adjacent to or adjacent to the adjacent transparent conductive film 1 or transparent conductive film 6. The bridge film may be a metal film or a low-resistance conductive film, the metal film may be a film layer made of a metal material or a metal alloy material, and the low-resistance conductive film may be a transparent conductive film material or an opaque conductive film. Material or semi-transparent conductive film material, but not limited to this. The metal film may be one or more layers as needed, and the low-resistance conductive film may be used one or more layers as needed. The substrate 10 may be a glass substrate or other transparent sheet instead of glass. The shape of the insulating film 3 or the insulating film 5 may be a rectangle, a square or an ellipse, but is not limited thereto. Since the bridge film layer has a smaller surface resistance and a lower conductivity than the transparent conductive film layer, the width thereof is generally smaller than the width of the transparent conductive film of the second group of wires. Please refer to FIG. 4 , which is a flow chart of a manufacturing method of the wiring structure of the capacitive touch screen of the present invention, which comprises the following steps: Step S1: Making transparent in the X direction or the γ direction simultaneously or separately on the substrate The conductive film, the transparent conductive film in the X direction is connected or discontinuous at a position where the transparent conductive film located in the γ direction intersects with each other, and the transparent conductive film located in the Y direction is connected to the intersection of the transparent film located in the direction of the 乂Or intermittently, at the intersection of the transparent conductive material in the 丫 direction corresponding to the bright conductive medium, the upward transparent conductive film corresponds to the transparent conductive 臈 interrupt in the X direction. 9 Wei S2: 绝缘 as an insulating film, the insulating film layer is covered on the connected transparent conductive 位于 on the X direction (two) ^ mutual father and point. When the insulating film tastes, the film on the surface of the substrate adjacent to the transparent conductive film covered by it breaks the insulation: it will pick up, and will not cause the yield of the product across the bridge. , Μ Μ S3 · 1 for the bridge film 'Bridge film is a continuous connection _ across the intersection and point, and covered in the transparent film of the insulating film. Further, in the second step, in the step 2, the edge of the insulating film layer may be located on the surface of the substrate adjacent to the film 2 or on the surface of the substrate on or adjacent to the conductive film of the adjacent broken wire. The bridge film in 'Step 3' may be a metal film or a low voltage film. The above is intended to be illustrative only and not limiting. Any changes or changes to the 1 ® recognition of A A 7 shall be included in the scope of the attached patent application. [Simple diagram of the diagram] The first diagram is a schematic diagram of the plane structure of the wiring scheme of the touch screen. The second diagram is the A__ line profile of the first diagram in the first diagram. Fig. + B - B line sectional view and Fig. 4 are the flow chart of the manufacturing method of the capacitive touch screen of the present invention. [Main component symbol description] 1 : transparent conductive film; 2: bridge film; 3: insulating film; 4: bridge film; 5: insulating film; 6: transparent conductive film; 10: substrate; and S1 to S3: steps . 11