CN101639749B - Wiring and manufacturing method of capacitive touch screen - Google Patents
Wiring and manufacturing method of capacitive touch screen Download PDFInfo
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- CN101639749B CN101639749B CN2009101093962A CN200910109396A CN101639749B CN 101639749 B CN101639749 B CN 101639749B CN 2009101093962 A CN2009101093962 A CN 2009101093962A CN 200910109396 A CN200910109396 A CN 200910109396A CN 101639749 B CN101639749 B CN 101639749B
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- nesa coating
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- touch screen
- junctional membrane
- capacitive touch
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Abstract
The invention relates to a wiring structure of a capacitive touch screen and a manufacturing method thereof, wherein the wiring structure comprises two groups of transparent conducting films on X and Y directions on a substrate, an insulating film and a connecting film, wherein the surface resistance of the connecting film is lower than the surface resistance of the transparent conducting films, an intersection structure of the transparent conducting films on the two directions adopts continuous connection or tunnel connection, wherein the continuous connection structure is a continuation of transparent conducting film materials at two sides of the intersection point, and the tunnel connection structure is achieved as follows: the transparent conducting film on X or Y direction is continuously connected at the intersection point, and the transparent conducting film on the other direction is disconnected; the connecting film is sectionally arranged corresponding to the disconnected transparent conducting films at the intersection point; the insulating film is covered at the middle part of the connecting film, the disconnected transparent conducting films are covered at the end part of the connecting film and the substrate to form a continuous wire, and the transparent conducting films which are continuously connected at the intersection point stretch over the connecting film to be covered on the insulating film and the substrate. The manufacturing method comprises the step of manufacturing the connecting film, the insulating film and two groups of wire conducting films. The invention can avoid color difference and improve the sensitivity, the standard ratio and the quality of the touch screen.
Description
Technical field
The present invention relates to a kind of touch screen wiring structure, also relate to the manufacturing approach of this touch screen wiring structure, be specifically related to a kind of wire structures and manufacturing approach thereof of capacitive touch screen.
Background technology
The wiring of touch-screen comprises two groups of leads that intersect in length and breadth along directions X and Y direction, and there is following defective in existing touch screen wiring structure:
1, two groups of leads of directions X and Y direction are space crossed, in manufacturing process, need to make earlier one group of lead conducting film of bottom, make dielectric film then, make the one group of lead conducting film in upper strata again.Because the nesa coating of two groups of leads must be made respectively, can cause the color distortion of two-layer conducting film, reduce the product quality of touch-screen;
2, because the lead conducting membrane material adopts transparent material, and rete is thinner, the phenomenon that breaks appears in tunnel rete above the crossing crunode place of two groups of leads is positioned at easily, causes the local broken string of lead, reduces the product yields;
3, lead conducting film line resistance is higher, reduces touch screen performance.
Summary of the invention
One of technical matters that the present invention will solve is, a kind of wire structures of capacitive touch screen is provided, and overcomes the high defective of line resistance that existing capacitive touch screen wiring exists aberration, the local broken string of lead, lead conducting film.
Two of the technical matters that the present invention will solve is, a kind of manufacturing approach of capacitive touch screen wiring structure is provided, and overcomes the local broken string of aberration, lead of prior art existence, the high defective of line resistance of lead conducting film.
The present invention solves the technical scheme that one of its technical matters adopts: constructs a kind of wire structures of capacitive touch screen, is included in the nesa coating and the dielectric film of two groups of leads that substrate upper edge X, Y direction arrange, it is characterized in that,
The nesa coating of said directions X is comprising continuous be connected or the tunnel connects with the structure of the nesa coating infall of said Y direction, and the nesa coating of said Y direction is comprising continuous be connected or the tunnel connects with the structure of the nesa coating infall of said directions X;
Said continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously;
Said tunnel syndeton is: at the place, point of crossing of said X, Y direction; The nesa coating of a direction connects continuously and is located immediately on the said substrate in said X, the Y direction, and the nesa coating of another direction is positioned on the substrate and at place, said point of crossing and is interrupted in said X, the Y direction; Comprise that face resistance is lower than the junctional membrane of said nesa coating; The nesa coating that this junctional membrane segmentation setting and corresponding 1 is interrupted in place, said point of crossing attached to said substrate on; Said dielectric film covers this junctional membrane middle part; The nesa coating that is interrupted at place, said point of crossing covers the continuous lead of formation on said junctional membrane end and the said substrate, and the nesa coating that connects continuously at place, said point of crossing covers on said dielectric film and the said substrate across said junctional membrane.
In the wire structures of capacitive touch screen of the present invention, the edge of said dielectric film is positioned on the contiguous said substrate of the said junctional membrane of its covering.
In the wire structures of capacitive touch screen of the present invention, said junctional membrane is metal film or low-resistance conductive.
In the wire structures of capacitive touch screen of the present invention, said metal film is one or more layers of metal level or metal alloy layer, and said low-resistance conductive is one or more layers.
In the wire structures of capacitive touch screen of the present invention, the nesa coating of said directions X with the nesa coating infall of said Y direction said continuous the connection be connected interleaved with the tunnel.
In the wire structures of capacitive touch screen of the present invention, the nesa coating of said Y direction with the nesa coating infall of said directions X said continuous the connection be connected interleaved with the tunnel.
In the wire structures of capacitive touch screen of the present invention, said dielectric film is shaped as rectangle, square or one of oval.
The present invention solves the technical scheme that two of its technical matters adopted: a kind of manufacturing approach of capacitive touch screen wiring structure is provided, comprises the steps:
S1, making junctional membrane, the face resistance of said junctional membrane is lower than the face resistance of said nesa coating, and this junctional membrane covers on the substrate corresponding to the nesa coating segmentation that X, place, Y direction point of crossing are interrupted setting;
S2, making dielectric film, dielectric film cover said junctional membrane middle part;
S3, on substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of said directions X with the nesa coating infall of said Y direction continuously or be interrupted; The nesa coating of said Y direction with the nesa coating infall of said directions X continuously or be interrupted; The nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, and the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted; The nesa coating of the X that is interrupted, Y direction covers the continuous lead of formation on said junctional membrane end and the said substrate, and the nesa coating that connects continuously at place, said point of crossing covers on said dielectric film and the said substrate across said junctional membrane.
In the manufacturing approach of capacitive touch screen wiring structure of the present invention, among the said step S2, the edge of said dielectric film is positioned on the contiguous said substrate of the said junctional membrane of its covering.
The wire structures of the capacitive touch screen of embodiment of the present invention and manufacturing approach thereof compare with prior art, and its beneficial effect is:
1.X, the transparent conductive film layer of Y direction can make simultaneously, avoided making the aberration that causes respectively, improved the product quality of touch-screen;
2. connect rete and adopt metal film or Low ESR conducting film,, be not prone to the broken string phenomenon, improved the continuity of lead because metal film or Low ESR conducting film thicknesses of layers are thicker;
3. connect the face resistance of the face resistance of rete, reduced the line resistance of X, Y direction lead, improved the performance of touch-screen much smaller than transparent lead rete;
4. when the edge of dielectric film was positioned on the substrate surface of nesa coating adjacent to of its covering, the dielectric film edge perk can not occur, so nesa coating can not break at the edge of dielectric film, had improved yield of products;
5.X, the nesa coating of Y direction lead all adopts the structure of continuous connection and tunnel film, the line resistance value consistance of both direction lead is better, the sensitivity that has improved touch-screen.
Description of drawings
To combine accompanying drawing and embodiment that the present invention is described further below, in the accompanying drawing:
Fig. 1 is the structural plan synoptic diagram of a kind of embodiment of wire structures of capacitive touch screen of the present invention.
Fig. 2 is an A-A sectional view among Fig. 1.
Fig. 3 is the B-B sectional view that rotates among Fig. 1.
Fig. 4 is the process flow diagram of a kind of embodiment of manufacturing approach of capacitive touch screen wiring structure of the present invention.
Embodiment
Like Fig. 1, Fig. 2, shown in Figure 3, nesa coating 1,6, dielectric film 3,5 and the face resistance that the wire structures of capacitive touch screen of the present invention is included in two groups of leads that substrate 10 upper edge X, Y direction arrange is lower than the junctional membrane 2,4 of nesa coating 1,6.
The nesa coating 1 of directions X is comprising that with the structure of nesa coating 6 infalls of Y direction continuous the connection with the tunnel is connected; Connect continuously to be connected and to adopt alternate arranged alternate, arrange (as arranging according to rules such as " connect continuously, connect continuously, the tunnel connects, connect continuously, connect continuously, the tunnel connects " or " connect continuously, the tunnel connects, the tunnel connects, connection continuously, tunnel connection, tunnel connection " etc.) or irregular layout, all can realize the object of the invention according to the rule of designing institute needs with the tunnel.
The nesa coating 6 of Y direction is comprising that with the structure of nesa coating 1 infall of directions X continuous the connection with the tunnel is connected; Connect continuously to be connected and also can adopt alternate arranged alternate, arrange (as arranging according to rules such as " connect continuously, connect continuously, the tunnel connects, connect continuously, connect continuously, the tunnel connects " or " connect continuously, the tunnel connects, the tunnel connects, connection continuously, tunnel connection, tunnel connection " etc.) or irregular layout, all can realize the object of the invention according to the rule of designing institute needs with the tunnel.
Above-mentioned continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously.
The tunnel syndeton is following: at the place, point of crossing of X, Y direction, the nesa coating of a direction connects continuously in X, the Y direction, and the nesa coating of another direction is interrupted at the place, point of crossing in X, the Y direction; Comprise the junctional membrane 2 (or 4) that the nesa coating 6 (or 1) that is interrupted corresponding to point of crossing place is provided with attached to segmentation on the substrate 10; Dielectric film 3 (or 5) covers this junctional membrane 2 (or 4) middle part, and the edge of dielectric film 3 (or 5) is positioned on the contiguous substrate 10 of the junctional membrane 2 (or 4) of its covering.Constitute continuous lead on the end that the nesa coating 6 (or 1) that is interrupted at point of crossing place covers junctional membrane 2 (or 4) and the substrate 10, the nesa coating 1 (or 6) of connection covers on dielectric film 3 (or 5) and the substrate 10 across junctional membrane 2 (or 4) continuously at the place, point of crossing.
Above-mentioned junctional membrane can adopt metal film or low-resistance conductive; Metal film can be the rete that the rete processed of metal material or metal alloy compositions are processed, and low-resistance conductive can adopt and include but not limited to electrically conducting transparent membrane material, opaque conductive film material or translucent conducting membrane material.
Metal film can adopt one or more layers as required, and low-resistance conductive also can adopt one or more layers as required.
The shape of above-mentioned dielectric film 3,5 can adopt and include but not limited to rectangle, square or oval.
Rete is littler than the face resistance of transparent conductive film layer, conductivity is high owing to connect, and its width is usually less than the width of the nesa coating of second group of lead.
As shown in Figure 4, the manufacturing approach of capacitive touch screen wiring structure of the present invention is following:
The first step is made junctional membrane, and junctional membrane covers on the substrate corresponding to the nesa coating segmentation that X, place, Y direction point of crossing are interrupted setting.
Second step, make dielectric film, dielectric film covers said junctional membrane middle part.
The 3rd step; On substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of said directions X with the nesa coating infall of said Y direction continuously or be interrupted; The nesa coating of said Y direction with the nesa coating infall of said directions X continuously or be interrupted, the nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted; The nesa coating of the X that is interrupted, Y direction covers the continuous lead of formation on said junctional membrane end and the said substrate, and the nesa coating that connects continuously at place, said point of crossing covers on said dielectric film and the said substrate across said junctional membrane.
In the above-mentioned steps one, junctional membrane is metal film or low-resistance conductive.
In the above-mentioned steps two, the edge of this dielectric film is positioned on the contiguous substrate of the junctional membrane of its covering.
Claims (9)
1. the wire structures of a capacitive touch screen is included in the nesa coating and the dielectric film of two groups of leads that substrate upper edge X, Y direction arrange, it is characterized in that,
The nesa coating of said directions X is comprising continuous be connected or the tunnel connects with the structure of the nesa coating infall of said Y direction, and the nesa coating of said Y direction is comprising continuous be connected or the tunnel connects with the structure of the nesa coating infall of said directions X;
Said continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously;
Said tunnel syndeton is: at the place, point of crossing of said X, Y direction; The nesa coating of a direction connects continuously and is located immediately on the said substrate in said X, the Y direction, and the nesa coating of another direction is positioned on the substrate and at place, said point of crossing and is interrupted in said X, the Y direction; Comprise that face resistance is lower than the junctional membrane of said nesa coating; This junctional membrane segmentation setting and the nesa coating that is interrupted corresponding to place, said point of crossing are attached on the said substrate; Said dielectric film covers this junctional membrane middle part; The nesa coating that is interrupted at place, said point of crossing covers the continuous lead of formation on said junctional membrane end and the said substrate, and the nesa coating that connects continuously at place, said point of crossing covers on said dielectric film and the said substrate across said junctional membrane.
2. the wire structures of capacitive touch screen as claimed in claim 1 is characterized in that, the edge of said dielectric film is positioned on the contiguous said substrate of the said junctional membrane of its covering.
3. the wire structures of capacitive touch screen as claimed in claim 1 is characterized in that, said junctional membrane is metal film or low-resistance conductive.
4. the wire structures of capacitive touch screen as claimed in claim 3 is characterized in that, said metal film is one or more layers of metal level or metal alloy layer, and said low-resistance conductive is one or more layers.
5. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that, the nesa coating of said directions X with the nesa coating infall of said Y direction said continuous the connection be connected interleaved with the tunnel.
6. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that, the nesa coating of said Y direction with the nesa coating infall of said directions X said continuous the connection be connected interleaved with the tunnel.
7. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that said dielectric film is shaped as rectangle, square or one of oval.
8. the manufacturing approach of a capacitive touch screen wiring structure comprises the steps:
S1, making junctional membrane, the face resistance of said junctional membrane is lower than the face resistance of said nesa coating, and this junctional membrane covers on the substrate corresponding to the nesa coating segmentation that X, place, Y direction point of crossing are interrupted setting;
S2, making dielectric film, dielectric film cover said junctional membrane middle part;
S3, on substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of said directions X with the nesa coating infall of said Y direction continuously or be interrupted; The nesa coating of said Y direction with the nesa coating infall of said directions X continuously or be interrupted; The nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, and the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted; The nesa coating of the X that is interrupted, Y direction covers the continuous lead of formation on said junctional membrane end and the said substrate, and the nesa coating that connects continuously at place, said point of crossing covers on said dielectric film and the said substrate across said junctional membrane.
9. the manufacturing approach of capacitive touch screen wiring structure as claimed in claim 8 is characterized in that, among the said step S2, the edge of said dielectric film is positioned on the contiguous said substrate of the said junctional membrane of its covering.
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| CN101639749B true CN101639749B (en) | 2012-01-11 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102236482B (en) * | 2010-05-04 | 2013-11-06 | 宸鸿光电科技股份有限公司 | Capacitive touch structure, manufacturing method thereof and touch equipment |
| CN101893976B (en) * | 2010-07-08 | 2012-07-25 | 汕头超声显示器（二厂）有限公司 | Production methods of projection-type touch screen of capacitance |
| CN101980122A (en) * | 2010-09-30 | 2011-02-23 | 深圳市中显微电子有限公司 | Capacitance type touch screen touchpad and manufacturing method thereof |
| CN104347156A (en) * | 2013-07-31 | 2015-02-11 | 南昌欧菲光科技有限公司 | Transparent conducting film |
| TW201709040A (en) * | 2015-08-24 | 2017-03-01 | 達鴻先進科技股份有限公司 | Flexible touch panel device |
| CN109032437B (en) * | 2018-05-24 | 2020-05-19 | 深圳市艾博德科技股份有限公司 | Capacitive touch equipment |
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| CN201489508U (en) * | 2009-08-21 | 2010-05-26 | 深圳莱宝高科技股份有限公司 | Wiring of capacitive touch screen |
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| US20070273560A1 (en) * | 2006-05-25 | 2007-11-29 | Cypress Semiconductor Corporation | Low pin count solution using capacitance sensing matrix for keyboard architecture |
| CN101334702A (en) * | 2007-06-28 | 2008-12-31 | 触控科技有限公司 | Transparent touching control panel device |
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