CN101634922B - Wiring structure and manufacturing method of capacitive touch screen - Google Patents
Wiring structure and manufacturing method of capacitive touch screen Download PDFInfo
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- CN101634922B CN101634922B CN2009101093977A CN200910109397A CN101634922B CN 101634922 B CN101634922 B CN 101634922B CN 2009101093977 A CN2009101093977 A CN 2009101093977A CN 200910109397 A CN200910109397 A CN 200910109397A CN 101634922 B CN101634922 B CN 101634922B
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Abstract
The invention relates to a wiring structure of a capacitive touch screen and a manufacturing method thereof, wherein the wiring structure comprises the step of arranging two groups of wire transparent conducting films in X and Y directions, an insulating film and a bridging film on a basal plate, wherein the surface resistance of the bridging film is lower than the surface resistance of the transparent conducting films, an intersection structure of the transparent conducting films in the two directions comprises continuous connection or bridging connection, wherein the continuous connection structure is a continuation of transparent conducting film material at two sides of the intersection point, and the bridging connection structure has the structures that the transparent conducting film in X or Y direction is continuously connected and positioned on the basal plate at the intersection point, the transparent conducting film in the other direction is disconnected at the intersection point, the insulating film is covered on the transparent conducting films that are continuously connected at the intersection part, and the bridging film stretches over the transparent conducting films that are continuously connected at the intersection point and is covered on the insulating film and connected with the transparent conducting film disconnected at the intersection point; and the method comprises the step of manufacturing two groups of wire conducing film, the insulating film and the bridging film. The invention can avoid color difference and improve the sensitivity, the standard ratio and the quality of the touch screen.
Description
Technical field
The present invention relates to a kind of touch screen wiring structure, also relate to the manufacturing approach of this touch screen wiring structure, be specifically related to a kind of wire structures and manufacturing approach thereof of capacitive touch screen.
Background technology
The wiring of touch-screen comprises two groups of leads that intersect in length and breadth along directions X and Y direction, and there is following defective in existing touch screen wiring structure:
1, two groups of leads of directions X and Y direction are space crossed, in manufacturing process, need to make earlier one group of lead conducting film of bottom, make dielectric film then, make the one group of lead conducting film in upper strata again.Because the nesa coating of two groups of leads must be made respectively, can cause the color distortion of two-layer conducting film, reduce the product quality of touch-screen;
2, because the lead conducting membrane material adopts transparent material, and rete is thinner, the phenomenon that breaks appears in bridging rete above the crossing crunode place of two groups of leads is positioned at easily, causes the local broken string of lead, reduces the product yields;
3, lead conducting film line resistance is higher, reduces touch screen performance.
Summary of the invention
One of technical matters that the present invention will solve is, a kind of wire structures of capacitive touch screen is provided, and overcomes the high defective of line resistance that existing capacitive touch screen wiring exists aberration, the local broken string of lead, lead conducting film.
Two of the technical matters that the present invention will solve is, a kind of manufacturing approach of capacitive touch screen wiring structure is provided, and overcomes the local broken string of aberration, lead of prior art existence, the high defective of line resistance of lead conducting film.
The present invention solves the technical scheme that one of its technical matters adopts: constructs a kind of wire structures of capacitive touch screen, is included in the nesa coating and the dielectric film of two groups of leads that substrate upper edge X, Y direction arrange, it is characterized in that,
The nesa coating of said directions X is comprising continuous the connection or the connection of putting up a bridge with the structure of the nesa coating infall of said Y direction, and the nesa coating of said Y direction is comprising continuous the connection or the connection of putting up a bridge with the structure of the nesa coating infall of said directions X;
Said continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously;
Said bridging syndeton is: at the place, point of crossing of said X, Y direction; The nesa coating of a direction connects continuously and is located immediately on the said substrate in said X, the Y direction; The nesa coating of another direction is positioned on the substrate and at place, said point of crossing and is interrupted in said X, the Y direction, and said dielectric film covers the nesa coating of the said continuous connection at place, said point of crossing; Comprise that face resistance is lower than the bridging film of said nesa coating, this bridging film is across the nesa coating of the continuous connection at place, said point of crossing and cover and connect the said nesa coating that place, said point of crossing is interrupted on the said dielectric film.
In the wire structures of capacitive touch screen of the present invention, the edge of said dielectric film is positioned on the substrate surface of said nesa coating adjacent to of its covering or the edge of said dielectric film is positioned on the adjacent said substrate surface that is interrupted on the nesa coating with adjacent to.
In the wire structures of capacitive touch screen of the present invention, said bridging film is metal film or low-resistance conductive.
In the wire structures of capacitive touch screen of the present invention, said metal film is one or more layers of metal level or metal alloy layer, and said low-resistance conductive is one or more layers.
In the wire structures of capacitive touch screen of the present invention, the nesa coating of said directions X with said continuous connection of the nesa coating infall of said Y direction be connected interleaved with putting up a bridge.
In the wire structures of capacitive touch screen of the present invention, the nesa coating of said Y direction with said continuous connection of the nesa coating infall of said directions X be connected interleaved with putting up a bridge.
In the wire structures of capacitive touch screen of the present invention, said dielectric film is shaped as rectangle, square or one of oval.
The present invention solves the technical scheme that two of its technical matters adopted: a kind of manufacturing approach of capacitive touch screen wiring structure is provided, comprises the steps:
S1, on substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of said directions X with the nesa coating infall of said Y direction continuously or be interrupted; The nesa coating of said Y direction with the nesa coating infall of said directions X continuously or be interrupted; The nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, and the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted;
S2, making dielectric film, insulating film layer cover on the continuous transparent conductive film at X, place, Y direction point of crossing;
S3, making bridging film; The face resistance of said bridging film is lower than the face resistance of said nesa coating, and the bridging film is across the continuous nesa coating that connects in place, said point of crossing and cover the said nesa coating that place, the said point of crossing of connection is interrupted on the said dielectric film.
In the manufacturing approach of capacitive touch screen wiring structure of the present invention; Among the said step S2, the edge of insulating film layer is positioned on the substrate surface of said nesa coating adjacent to of its covering or the edge of said dielectric film is positioned on the adjacent said substrate surface that is interrupted on the nesa coating with adjacent to.
The wire structures of the capacitive touch screen of embodiment of the present invention and manufacturing approach thereof compare with prior art, and its beneficial effect is:
1.X, the transparent conductive film layer of Y direction can make simultaneously, avoided making the aberration that causes respectively, improved the product quality of touch-screen;
2. the bridging rete adopts metal film or Low ESR conducting film, because metal film or Low ESR conducting film thicknesses of layers are thicker, is not prone to the broken string phenomenon, has improved the continuity of lead;
3. the face resistance of bridging rete is much smaller than the face resistance of transparent lead rete, reduced the line resistance of X, Y direction lead, improved the performance of touch-screen;
4. when the edge of dielectric film was positioned on the substrate surface of nesa coating adjacent to of its covering, the dielectric film edge perk can not occur, and the film of therefore putting up a bridge can not break at the edge of dielectric film, has improved yield of products;
5.X, the nesa coating of Y direction lead all adopts the structure of continuous connection and bridging film, the line resistance value consistance of both direction lead is better, the sensitivity that has improved touch-screen.
Description of drawings
To combine accompanying drawing and embodiment that the present invention is described further below, in the accompanying drawing:
Fig. 1 is the structural plan synoptic diagram of a kind of embodiment of wire structures of capacitive touch screen of the present invention.
Fig. 2 is an A-A sectional view among Fig. 1.
Fig. 3 is the B-B sectional view that rotates among Fig. 1.
Fig. 4 is the process flow diagram of a kind of embodiment of manufacturing approach of capacitive touch screen wiring structure of the present invention.
Embodiment
Like Fig. 1, Fig. 2, shown in Figure 3, nesa coating 1,6, dielectric film 3,5 and the face resistance that the wire structures of capacitive touch screen of the present invention is included in two groups of leads that substrate 10 upper edge X, Y direction arrange is lower than the bridging film 2,4 of nesa coating 1,6.
The nesa coating 1 of directions X is comprising that with the structure of nesa coating 6 infalls of Y direction continuous the connection with putting up a bridge is connected; Connect continuously with put up a bridge is connected can adopt alternate arranged alternate, according to the rule of designing institute needs arrange (as according to " connect continuously, connect continuously, put up a bridge connect, connect continuously, connect continuously, putting up a bridge connects " or " connect continuously, put up a bridge connect, put up a bridge connect, connect continuously, put up a bridge connection, put up a bridge to connect " etc. rule arrange etc.) or irregular layout, all can realize the object of the invention.
The nesa coating 6 of Y direction is comprising that with the structure of nesa coating 1 infall of directions X continuous the connection with putting up a bridge is connected; Connect continuously with put up a bridge is connected also can adopt alternate arranged alternate, according to the rule of designing institute needs arrange (as according to " connect continuously, connect continuously, put up a bridge connect, connect continuously, connect continuously, putting up a bridge connects " or " connect continuously, put up a bridge connect, put up a bridge connect, connect continuously, put up a bridge connection, put up a bridge to connect " etc. rule arrange etc.) or irregular layout, all can realize the object of the invention.
Above-mentioned continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously.
The bridging syndeton is following: at the place, point of crossing of X, Y direction; The nesa coating of a direction connects continuously and is located immediately on the substrate 10 in X, the Y direction; The nesa coating of another direction is interrupted at this place, point of crossing in X, the Y direction; Dielectric film 3 (or 5) covers the nesa coating 1 (or 6) that place, this point of crossing connects continuously, and bridging film 2 (or 4) is across the nesa coating 1 (or 6) of the continuous connection at place, point of crossing and cover dielectric film 3 (or 5) and go up and connect the nesa coating 1 (or 6) that the place, point of crossing is interrupted.
In the present embodiment, the edge of dielectric film 3 (or 5) is positioned on substrate 10 surfaces of nesa coating 1 (or 6) adjacent to of its covering.In other embodiments, the edge of dielectric film 3 (or 5) can be positioned on substrate 10 surfaces of the adjacent last and adjacent to of being interrupted nesa coating 1 (or 6).
Above-mentioned bridging film can adopt metal film or low-resistance conductive; Metal film can be the rete that the rete processed of metal material or metal alloy compositions are processed, and low-resistance conductive can adopt and include but not limited to electrically conducting transparent membrane material, opaque conductive film material or translucent conducting membrane material.
Metal film can adopt one or more layers as required, and low-resistance conductive also can adopt one or more layers as required.
The shape of above-mentioned dielectric film 3,5 can adopt and include but not limited to rectangle, square or oval.
Because the bridging rete is littler than the face resistance of transparent conductive film layer, conductivity is high, its width is usually less than the width of the nesa coating of second group of lead.
As shown in Figure 4, the manufacturing approach of capacitive touch screen wiring structure of the present invention is following:
The first step; On substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of directions X with the nesa coating infall of Y direction continuously or be interrupted; The nesa coating of Y direction with the nesa coating infall of directions X continuously or be interrupted, the nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted.
Second step, make dielectric film, insulating film layer covers on the continuous transparent conductive film at X, place, Y direction point of crossing.When the edge of insulating film layer was positioned on the substrate surface of nesa coating adjacent to of its covering, the dielectric film edge can perk, can not cause across the fracture of the bridging film on it, thereby improve yield of products.
The 3rd step, make the bridging film, the bridging film is located the nesa coating that connects continuously across the point of crossing and covers to connect the nesa coating that the place, point of crossing is interrupted on the dielectric film.
In the above-mentioned steps two, the edge of insulating film layer is positioned on the substrate surface of nesa coating adjacent to of its covering or the edge of dielectric film is positioned on the adjacent substrate surface that is interrupted on the nesa coating with adjacent to.
In the above-mentioned steps three, the bridging film is metal film or low-resistance conductive.
Claims (9)
1. the wire structures of a capacitive touch screen is included in the nesa coating and the dielectric film of two groups of leads that substrate upper edge X, Y direction arrange, it is characterized in that,
The nesa coating of said directions X is comprising continuous the connection or the connection of putting up a bridge with the structure of the nesa coating infall of said Y direction, and the nesa coating of said Y direction is comprising continuous the connection or the connection of putting up a bridge with the structure of the nesa coating infall of said directions X;
Said continuous syndeton is: the electrically conducting transparent membrane material that is positioned at the both sides, point of crossing of X, Y direction is realized the connection of lead continuously;
Said bridging syndeton is: at the place, point of crossing of said X, Y direction; The nesa coating of a direction connects continuously and is located immediately on the said substrate in said X, the Y direction; The nesa coating of another direction is positioned on the substrate and at place, said point of crossing and is interrupted in said X, the Y direction, and said dielectric film covers the nesa coating of the said continuous connection at place, said point of crossing; Comprise that face resistance is lower than the bridging film of said nesa coating, this bridging film is across the nesa coating of the continuous connection at place, said point of crossing and cover and connect the said nesa coating that place, said point of crossing is interrupted on the said dielectric film.
2. the wire structures of capacitive touch screen as claimed in claim 1; It is characterized in that the edge of said dielectric film is positioned on the substrate surface of said nesa coating adjacent to of its covering or the edge of said dielectric film is positioned on the adjacent said substrate surface that is interrupted on the nesa coating with adjacent to.
3. the wire structures of capacitive touch screen as claimed in claim 1 is characterized in that, said bridging film is metal film or low-resistance conductive.
4. the wire structures of capacitive touch screen as claimed in claim 3 is characterized in that, said metal film is one or more layers of metal level or metal alloy layer, and said low-resistance conductive is one or more layers.
5. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that, the nesa coating of said directions X with said continuous connection of the nesa coating infall of said Y direction be connected interleaved with putting up a bridge.
6. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that, the nesa coating of said Y direction with said continuous connection of the nesa coating infall of said directions X be connected interleaved with putting up a bridge.
7. like the wire structures of the described capacitive touch screen of one of claim 1 to 4, it is characterized in that said dielectric film is shaped as rectangle, square or one of oval.
8. the manufacturing approach of a capacitive touch screen wiring structure comprises the steps:
S1, on substrate, make the nesa coating of X, Y direction at the same time or separately; The nesa coating of said directions X with the nesa coating infall of said Y direction continuously or be interrupted; The nesa coating of said Y direction with the nesa coating infall of said directions X continuously or be interrupted; The nesa coating of the Y direction that the nesa coating of the directions X that infall is continuous is corresponding is interrupted, and the nesa coating of the directions X that the nesa coating of the Y direction that infall is continuous is corresponding is interrupted;
S2, making dielectric film, insulating film layer cover on the continuous transparent conductive film at X, place, Y direction point of crossing;
S3, making bridging film; The face resistance of said bridging film is lower than the face resistance of said nesa coating, and the bridging film is across the continuous nesa coating that connects in place, said point of crossing and cover the said nesa coating that place, the said point of crossing of connection is interrupted on the said dielectric film.
9. the manufacturing approach of capacitive touch screen wiring structure as claimed in claim 8; It is characterized in that; Among the said step S2, the edge of insulating film layer is positioned on the substrate surface of said nesa coating adjacent to of its covering or the edge of said dielectric film is positioned on the adjacent said substrate surface that is interrupted on the nesa coating with adjacent to.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2009101093977A CN101634922B (en) | 2009-08-21 | 2009-08-21 | Wiring structure and manufacturing method of capacitive touch screen |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2009101093977A CN101634922B (en) | 2009-08-21 | 2009-08-21 | Wiring structure and manufacturing method of capacitive touch screen |
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| CN101634922A CN101634922A (en) | 2010-01-27 |
| CN101634922B true CN101634922B (en) | 2012-01-11 |
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Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102193700B (en) * | 2010-03-15 | 2015-07-08 | 上海天马微电子有限公司 | Touch screen |
| JP2012052809A (en) * | 2010-08-31 | 2012-03-15 | Hitachi Automotive Systems Ltd | Sensor structure |
| KR101686108B1 (en) * | 2010-09-28 | 2016-12-14 | 엘지디스플레이 주식회사 | Display device associated with touch panel |
| CN102135676A (en) * | 2011-03-17 | 2011-07-27 | 信利半导体有限公司 | Capacitive touch screen display |
| CN102116954A (en) * | 2011-03-17 | 2011-07-06 | 信利半导体有限公司 | Capacitance-type touch screen displayer |
| CN102253776B (en) * | 2011-07-06 | 2013-07-03 | 汕头超声显示器有限公司 | Electrode bridging connection structure for inhibiting picture interference of capacitance type touch screen |
| CN102236492B (en) * | 2011-08-16 | 2012-07-18 | 深圳市宝明科技股份有限公司 | ITO (Indium Tin Oxide) bridge crossing capacitive touch screen and manufacturing method thereof |
| CN102253783A (en) * | 2011-08-23 | 2011-11-23 | 汕头超声显示器有限公司 | Electrode intersection arranged on flexible base plate and flexible touch sensing plate |
| CN102955594B (en) * | 2011-08-23 | 2016-05-04 | 汕头超声显示器有限公司 | Be arranged at jumper wire construction and pliability touch-sensitive panel on flexible base plate |
| CN102830841A (en) * | 2012-08-14 | 2012-12-19 | 北京京东方光电科技有限公司 | Touch screen, touch display device and production method of touch screen |
| CN102968234A (en) * | 2012-11-27 | 2013-03-13 | 南昌欧菲光科技有限公司 | Film capacitive touch screen with bridging structure |
| TWI489361B (en) * | 2013-02-08 | 2015-06-21 | Wintek Corp | Touch panel and manufacturing method thereof |
| CN103309509A (en) * | 2013-06-04 | 2013-09-18 | 苏州欧菲光科技有限公司 | Conductive film |
| CN104461092B (en) * | 2013-09-13 | 2019-12-13 | 宸鸿科技(厦门)有限公司 | Touch panel and touch electrode structure thereof |
| KR102105607B1 (en) * | 2016-04-19 | 2020-04-29 | 알프스 알파인 가부시키가이샤 | Capacitive sensor |
| JP6472467B2 (en) * | 2017-01-23 | 2019-02-20 | Ｎｉｓｓｈａ株式会社 | Capacitive touch panel |
| CN110413156B (en) * | 2019-08-06 | 2021-08-27 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method thereof and display device |
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2009
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| CN101634922A (en) | 2010-01-27 |
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