M373508 五、新型說明： 【新型所屬之技術領域】 本新型是有關於一種翻轉襞置及具有該翻轉裝置的曝 光機’特別是指一種用以翻轉待曝光基板之翻轉裝置及具有 該翻轉裝置的曝光機。 【先前技術】 目前曝光機的曝光作業中，通常是將兩光罩與待曝光基M373508 V. New description: [New technical field] The present invention relates to a flipping device and an exposure machine having the same, in particular to an inverting device for flipping a substrate to be exposed and having the turning device Exposure machine. [Prior Art] In the exposure operation of the exposure machine, the two masks are usually exposed to the base to be exposed.
板之對位穿孔對位後，即可同時進行待曝光基板之正面與背 面的曝光。待曝光基板通常是成疊地疊置在一起，再進行鑽 對位穿孔的動作，由於待曝光基板成疊地疊置在一起時整 ，厚度較厚，易導致鑽頭在鑽孔過程中產生偏移的現象，使 =每片待曝光基板正面之對位穿孔的開孔部與背面之對位 牙的開孔部位置有所誤差，若將兩光罩同時以待曝光基板 之正面或背面其中—面之對位穿孔的開孔部為基準進行對 位時’會對於曝光後轉印到待曝光基板之正面與背面的圖案 位置有所影響。 因此’如何構思-種能透過自動化的方式進行待曝以 ㈣翻轉，使待曝光基板可分別進行正面與背面曝光作業3 、··。構设計，遂成為本新型要進—步改進的 【新型内容】 能自動化地進行待曝 面產生壓痕之翻轉裝 本新型之主要目的，在於提供一種 光基板的_且不會對糾光基板表 置。 本新型之另__ 目的，在於提供一種具有翻轉裝置的曝光 M373508 .機’其翻轉裝置能自動化地進行待曝光基板的翻轉且不會對 待曝光基板表面產生壓痕》 本新型的目的及解決先前技術問題是採用以下技術手 段來實現的’依據本新型所揭露的翻轉裝置，適於翻轉一基 板，翻轉裝置包含一基座、一翻轉機構，及一夾持機構。 翻轉機構包括一安裝於基座的驅動單元，及一可受驅動 單元驅動而旋轉的旋轉板，夾持機構包括一導執，及二上下 相間隔的夾板，導軌安裝於旋轉板上且呈縱向延伸，各夾板 滑接於導軌並包括一用以吸附基板的吸附墊，二夾板的吸附 塾相向，二夾板可在一彼此分離的初始位置’及一彼此緊靠 並夾持且吸附基板的夾持位置之間往復運動，且二炎板可受 旋轉板的帶動而翻轉基板。 本新型的目的及解決先前技術問題還可以採用以下技 術手段進一步實現。 月1j述之翻轉裝置，夾持機構還包括一可驅動二夾板在初 始位置與夾持位置之間往復運動的氣缸。 前述之翻轉裝置’夾持機構還包括二分別與二夾板相接 合且呈縱向延伸的齒條，及一嚙合於二齒條之間的傳動齒 輪’氣缸與二夾板其中之一相接合並可帶動二齒條分別朝相 反的方向移動。 前述之翻轉裝置，旋轉板上凸設有二上下相間隔且分別. 用以供二夾板抵接以限制二夾板移動距離的擋止部。 前述之翻轉裝置，吸附墊上設有複數個吸氣孔，基板可 被所述吸氣孔之吸力吸附於吸附墊。 前述之翻轉裝置，基座包括二分別位於二夹板左、右側 的第一導正件，及二分別位於二夾板前、後側的第二導正 件’二第一導正件可靠近並分別抵於基板左、右側，而二第 二導正件可靠近並分別抵於基板前、後側。 别述之翻轉裝置，驅動單元包含一安裝於基座的驅動馬 達，及一與旋轉板接合並可受驅動馬逹帶動而連動旋轉板轉 動的旋轉軸。 前述之翻轉裝置，驅動單元還包含一與驅動馬達相連接 的第一齒輪、一與第一齒輪相間隔並與旋轉軸相接合的第二 齒輪，及一纏繞並嚙合於第一、第二齒輪的傳動皮帶。 依據本新型所揭露的具有翻轉裝置的曝光機，適於對一 基板進行曝光’曝光機包括一機台、一第一曝光裝置、一第 二曝光裝置，及一翻轉裝置。 第一曝光裝置設置於機台上用以曝光基板正面，第二曝 光裝置設置於機台上用以曝光基板背面，翻轉裝置包含一基 座、一翻轉機構，及一夾持機構，基座設置於機台上且位於 第一、第二曝光裝置之間。翻轉機構包括一安裝於基座的驅 動單元，及一可受驅動單元驅動而旋轉的旋轉板，夹持機構 包括一導軌，及一上下相間隔的夾板，導軌安裝於旋轉板上 且呈縱向延伸’各夹板滑接於導軌並包括一用以吸附基板的 吸附墊’二夾板的吸附墊相向，二夾板可在一彼此分離的初 始位置’及一彼此緊靠並夾持且吸附基板的夾持位置之間往 復運動，且二夾板可受旋轉板的帶動而翻轉基板。 本新型之翻轉裝置’透過吸氣孔之吸力將待曝光基板吸 M373508 附在及附塾上，使得二夾板在夾持待曝光基板並將其翻轉的 過程中，二夾板不用施I於待曝綠板上即可穩固地夹持待 曝光基板，因此，不會對待曝光基板之正面或背面產生 【實施方式】 有關本新型之前述及其他技術内容、特點與功效，在以 下配合參考圖式之—個較佳實_的詳細說明中，將可清楚 =呈現。透過具體實施方式的說明，當可對本新型為達成預 定目的所採取的技術手段及功效得以更加深入且具體的了 解’然而所_式只是提供參考與說明之用，並非用來對本 新型加以限制。 在本新型被詳細描述之前，要注意的是，在以下的說明 内容中，類似的元件是以相同的編號來表示。 如圖1及圖2所示’是本新型具有翻轉裝置的曝光機的 一較佳實施例，該曝光機1〇〇適於對一基板進行曝光，該基 板為一待曝光基板10,曝光機1〇〇包括一機台卜一第一曝 光裝置2、-翻轉裝置3、—第二曝光裝置4，及—移載裝 置5。 機台1界定有一入料區11，及一位於入料區丨丨相反側 的出料區12，為了方便說明，在下文中將以圖丨所示之入 料區11所在的一方稱為左方，出料區12所在的一方稱為右 方，第一曝光裝置2設置於機台丨上且位於入料區u右側， 用以曝光待曝光基板1〇之正面1〇1。翻轉裝置3設置於機 台1上且位於第一曝光裝置2右側，用以翻轉待曝光基板 10,使其背面102朝向上方。第二曝光裝置4設置於機台j M373508 上且位於翻轉裝置3與出料區12之間，用以曝光待曝光基 板10之背面102。移載裝置5設置於機台1上，用以將待 曝光基板10由入料區11依序輸送至第一曝光裝置2、翻轉 裝置3、第二曝光裝置4，以及出料區12。 如圖3、圖4及圖5所示’翻轉裝置3包含一基座31、 一翻轉機構32’及一夾持機構33。基座31設置於機台1 上且位於第一、第二曝光裝置2、4(如圖1)之間，基座3 i 包括一前支撐架311、一位於前支撐架311後側的後支撐架 312,及一連接於前支撐架311與後支撐架312之間的連接 框架313,其中，前支撐架311後側近頂端處鎖固有一固定 板314。翻轉機構32包括一安裝於基座31的驅動單元321， 及一可夂驅動單元321驅動而旋轉的旋轉板322，驅動單元 321包含一驅動馬達323，驅動馬達323鎖固於定位架324 上，並透過定位架324鎖固於固定板314而定位於固定板 314前側面。驅動單元321還包含一連接於驅動馬達323前 端的第一齒輪325、一間隔位於第一齒輪325上方的第二齒 輪326、一旋轉軸327，及一傳動皮帶328，旋轉軸327穿 設於旋轉板322的穿孔329以及固定板314的穿孔315，旋 轉軸327前端與第二齒輪326相接合，而後端則透過鎖定部 330鎖固於旋轉板322後側面。傳動皮帶328纏繞於第一、 第二齒輪325、326上並與第一、第二齒輪shy%相嚙合， 藉此，驅動馬達323驅使第一齒輪325正轉或反轉時，能透 過傳動皮帶328帶動第二齒輪及旋轉軸327旋轉，且旋 轉轴327旋轉時能連動旋轉板322轉動。 7 M373508 如圖3、圖4、圖5及圖6所示，夾持機構33包括二鎖 固於旋轉板322後側面的導軌33卜及二上下相間隔的夾板 332 ’二導軌331分別呈縱向延伸且左右相間隔，用以供各 夾板332滑接。各夾板332包含一夾板本體333，及複數片 分別鎖固於夾板本體333内侧面的吸附墊334，二夾板332 的吸附墊334位置相向，各吸附墊334上設有複數個吸氣孔 335 ’待曝光基板1〇(如圖1)可被吸氣孔335所產生之吸力 吸附於吸附墊334上。在本實施例中，吸附墊334的數量為 三個，且各吸附墊334呈矩形狀，其中一個吸附墊334是呈 前後方向延伸’而另外兩個吸附墊334分別呈左右方向延伸 且位於前述吸附墊的左、右側，當然，吸附墊334的設計數 量、形狀及排列方式並不以本實施例所揭露的為限，可視夾 板本體333形狀不同而作變更設計。 各夾板332的夾板本體333前端鎖固有一連接板體 336’連接板體336前側面鎖固有二分別用以滑接於導軌331 上的Μ塊337，藉此，使得各夾板332的夾板本體333能透 過滑塊337沿導軌331上下滑移。其中，位於下側之夾板 332的夾板本體333後端透過一樞接件338與一安裝在後支 撐架312頂端的滑動座339樞接，使得下側之夾板332的夾 板本體3 3 3沿導軌3 31滑移時能同時帶動滑動座3 3 9相對於 後支撐架312上下滑動。 夾持機構33還包括二齒條340，及一傳動齒輪341，二 齒條340分別鎖固於二夾板332的連接板體336前側面且左 右相間隔，各齒條340呈縱向延伸地位於各導軌331内側。 M373508 , 傳動齒輪341透過一軸承342樞接於旋轉軸327的鎖定部 - 330後端，傳動齒輪341設於二齒條34〇之間且與齒條34〇 . 相嚙合。夹持機構33還包括一鎖固於旋轉板322後側面的 氣缸343’氣缸343的桿部344頂端與一鎖固在上側夾板332 之連接板體336頂端的連接片345相連接，氣缸343的桿部 344可透過連接片345帶動上側夾板332沿導軌331向上或 向下滑移，與上側夾板332相連接的齒條34〇會帶動傳動齒 輪341轉動’傳動齒輪341會連動另一齒條34〇朝前述齒條 340移動方向的反向移動，藉此，可驅使二夾板332在一彼 此分離的初始位置（如圖6所示），及一彼此緊靠的夾持位置 (如圖ίο所示）之間往復運動，且二夾板332在夾持位置時 能夹持待曝光基板1 〇。 如圖1及圖7所示，當待曝光基板1〇在第一曝光裝置 2的曝光平台21上完成了正面1〇1的曝光作業後，移載裝 置5的組及取#5丨會將待曝光基板1〇由曝光平台21輸 φ 送至二夾板332之間，並將待曝光基板1〇置放在下側夹板 332上，接著，該組吸取臂51會復位到圖i所示的位置。 如圖7、圖8及圖9所示，基座31還包括二分別設於 - 連接框架313頂面且分別位於夾板332左、右側的第一導正 - 2 316’及二分別設於連接框架3U頂面且分別位於夾板332 刖、後側的第二導正件317，連接框架313後側與一安裝於 後支撐架312内的氣缸310相連接，氣缸31〇可驅使連接框 架3 13向上或向下移動，以帶動第一、第二導正件3i6、3i7 上移或下移。當吸取臂51復位後，氣缸31〇會驅使連接框 M373508 架3U由圖7所示的位置沿箭頭1方向上移到圖“斤示的位 置’使得二第-導正件316的導柱318分別位於待曝光基板 W的左、右側，且二第二導正件317的導柱319分別位於 待曝光基板10的前、後側。接著，左側之第一導正件 會沿箭頭II方向右移而靠近右側之第一導正件3丨6,使得二 第-導正件316的導柱318能分職於待曝光基板1〇的 左、右側，同時，前側之第二導正件317會沿箭頭ui方向 後移而靠近後側之第：導正件317，使得二第二導正件317 的導柱319能分別抵於待曝光基板1〇的前、後側，藉此， 能將待曝光基板U)進行導正的動作，避免待曝光基^ ι〇 在進行翻轉作業前是呈歪斜的狀態。待曝光基板1()被導正 後，下側夾板332之吸附墊334上的吸氣孔335(如圖3)會 產生吸力，以將待曝光基板1 〇吸附在吸附墊334上。當導 正待曝光基板10的作業完成後，氣缸31〇會驅使連接框架 313帶動第-、第二導正件316、317復位到圖7所示的位 置。 如圖10、圖11及圖12所示，夾持機構33的氣缸343 之才干部344會帶動連接片345下移，並同時帶動上側夾板 332透過滑塊337沿導軌331下移，由於上側夾板332下移 過程中，與上側夾板332之連接板體336相連接的齒條34〇 會同時下移並帶動傳動齒輪341旋轉，使得傳動齒輪341 會連動與下側夾板332之連接板體336相連接的齒條340 上移’藉此，使得二夾板332能分別朝箭頭I以及箭頭IV 方向相互靠近，當二夾板332移動到一彼此緊靠且夹持待曝 10 M373508 光基板l〇的夾持位置（如圖〖〇所示）時氣缸343的桿部3料 即不會再驅使夾板332移動，此時，上側夾板332之吸附塾 334上的吸氣孔335(如圖5所示）會產生吸力，使得待曝光 土板10月b同時被吸附在一夾板332的吸附塾334之間。 如圖4、圖13及圖14所示，接著，翻轉機構32的驅 動馬達323會驅使第一齒輪325轉動，第一齒輪325會帶動 傳動皮帶328旋轉，使得第二齒輪326能帶動旋轉軸327 旋轉’旋轉軸327轉動時會帶動旋轉板322以及安裝在旋轉 板322上的夾持機構33旋轉，使得二夾板332能沿箭頭v 所示方向翻轉待曝光基板1〇,當夾板332將待曝光基板ι〇 翻轉180度而使待曝光基板1〇之背面1〇2朝向上方後，驅 動馬達321即停止作動。之後，夾持機構33的氣缸343會 帶動連接片345上移，並同時帶動上側夾板332透過滑塊 337沿導軌331上移，藉由傳動齒輪341的帶動，下側夾板 332能同時透過滑塊337沿導軌331下移，使得二夾板μ] 能分別朝箭頭I以及箭頭IV方向相互遠離。當上、下二組 滑塊337如圖6所示地分別抵接於旋轉板322上之二鄰近頂 4處的擋止部320，以及二鄰近底端處的擋止部320時，二 夹板332即回復到初始位置而不會再移動。 需說明的是，由於傳動齒輪341是透過軸承342與旋轉 轴327的鎖定部330相樞接，因此，當齒條34〇帶動傳動齒 輪341轉動時，傳動齒輪341不會連動旋轉軸327的鎖定部 330旋轉’且旋轉軸327帶動旋轉板322轉動時，旋轉軸327 不會直接帶動傳動齒輪341轉動’傳動齒輪341是透過二齒 11 M373508 條340的帶動而旋轉。另一方面，導軌331的設計數量也可 為一條，同樣能達到供夾板332滑接的功效，並不受限於本 實施例所揭露之二條導執331的設計方式。 . 如圖15及圖16所示，當待曝光基板1〇的翻轉作業完 成後，移载裝置5的另一組吸取臂52會由圖！所示位置移 動到二夹板332之間並吸取待曝光基板1〇，接著，該組吸 取臂52即可將待曝光基板輸送至第二曝光裝置4的曝光 平台41上，以進行待曝光基板1〇之背面1〇2的曝光作業。 歸納上述，本實施例曝光機100之翻轉裝置3,透過吸籲 氣孔335之吸力將待曝光基板1〇吸附在吸附墊334上，使 得二夾板332在夾持待曝光基板1G並將其翻轉的過程中， 二夾板332不用施壓於待曝光基板1〇上即可穩固地夾持待 曝光基板ίο,因此，不會對待曝光基板1〇之正面ι〇ι或背 面102產生壓痕，確實能達到本新型所訴求之目的。 惟以上所述者’僅為本新型之較佳實施例而已，當不能 以此限定本新型實施之範圍，即大凡依本新型中請專二範圍 及新型說明内容所作之簡單的等效變化與修飾，皆仍屬本新# 型專利涵蓋之範圍内。 【圖式簡單說明】 圖1是本新型具有翻轉裝置的曝光機之一較佳實施例— 的前視圖； - 圖2是本新型具有翻轉裝置的曝光機之一較佳實施例 的俯視圖； 圖3是本新型具有翻轉裝置的曝光機之一較佳實施例 12 M373508 的翻轉裝置的立體圖； 圖4是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的局部立體分解圖； 圖5是本新型具有翻轉裝置的曝光機之一較佳實施例 的夾板的立體分解圖； 圖6是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的後視圖； 圖7是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的前視圖，說明移載裝置的吸取臂將待曝光基板 輸送至夾板上； 圖8是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的前視圖，說明連接框架帶動第一、第二導正件 上移； 圖9是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的俯視圖，說明第一導正件的導柱抵接於待曝光 基板左、右側，以及第二導正件的導柱抵接於待曝光基板 前、後側； 圖10是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的前視圖，說明二夾板分別向上及向下移動至夾 持待曝光基板的夾持位置； 圖11是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的後視圖，說明二夾板分別向上及向下移動並夾 持待曝光基板； 圖12是本新型具有翻轉裝置的曝光機之—較佳實施例 13 M373508 的翻轉裝置的局部放大圖，說明二#條透過傳動齒輪分別朝 相反的方向移動； 圖13是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的前視圖’說明二夾板將待曝光基板翻轉180 度，使待曝光基板的背面朝上； 圖14是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的刚視圖’說明二夾板分別向上及向下移動回復 至初始位置； 圖15是本新型具有翻轉裝置的曝光機之一較佳實施例 的翻轉裝置的前視圖，說明移載裝置的另組吸取臂移動到二 夾板之間並吸取待曝光基板；及 圖16是本新型具有翻轉裝置的曝光機之一較佳實施例 的局部放大圖’說明移載裝置的另組吸取臂將待曝光基板輸 送至第二曝光裝置的曝光平台上。 14 M373508After the alignment of the plates is aligned, the front and back sides of the substrate to be exposed can be exposed simultaneously. The substrate to be exposed is usually stacked in a stack, and the operation of drilling the opposite holes is performed. Since the substrates to be exposed are stacked one on another, the thickness is thick, which may cause the bit to be biased during the drilling process. The phenomenon of shifting causes that there is an error in the position of the opening portion of the counter-perforated plate on the front side of each substrate to be exposed and the opening portion of the counter-alignment tooth on the back side, if the two photomasks are simultaneously on the front or back side of the substrate to be exposed. When the alignment of the surface of the counter-perforated hole is aligned, it will affect the position of the pattern on the front and back sides of the substrate to be exposed after exposure. Therefore, how to conceive - can be exposed in an automated manner (4) flipping, so that the substrate to be exposed can be separately exposed to the front and back 3, .... The design is a new type of product that can be improved step by step. The main purpose of the invention is to automatically perform the inversion of the indentation to be exposed. The main purpose of the novel is to provide a light substrate without aligning light. The substrate is placed. Another object of the present invention is to provide an exposure M373508 having an inverting device. The inverting device can automatically perform the inversion of the substrate to be exposed without indentation on the surface of the substrate to be exposed. The technical problem is achieved by the following technical means. The inverting device disclosed in the present invention is adapted to invert a substrate. The inverting device comprises a base, a turning mechanism, and a clamping mechanism. The turning mechanism comprises a driving unit mounted on the base, and a rotating plate rotatable by the driving unit, the clamping mechanism comprises a guiding and two upper and lower spaced clamping plates, the guiding rail is mounted on the rotating plate and is longitudinally Extending, each splint is slidably connected to the guide rail and includes an adsorption pad for adsorbing the substrate. The adsorption plates of the two clamping plates face each other, and the two clamping plates can be in an initial position separated from each other and a clamp that abuts and clamps and adsorbs the substrate. The position is reciprocated between the positions, and the two plates can be turned by the rotating plate to flip the substrate. The object of the present invention and solving the prior art problems can be further realized by the following technical means. The flipping device of the month 1j, the clamping mechanism further includes a cylinder that can drive the two jaws to reciprocate between the initial position and the clamping position. The foregoing inverting device 'clamping mechanism further includes two racks respectively extending from the two clamping plates and extending in a longitudinal direction, and a transmission gear engaged between the two racks, the cylinder and the two clamping plates are engaged with each other and can be driven The two racks move in opposite directions, respectively. In the above-mentioned inverting device, the rotating plate is provided with two upper and lower spaced intervals and respectively for stopping the two clamping plates to limit the moving distance of the two clamping plates. In the above-mentioned inverting device, the adsorption pad is provided with a plurality of suction holes, and the substrate can be adsorbed to the adsorption pad by the suction force of the suction holes. In the foregoing inverting device, the base comprises two first guiding members respectively located on the left and right sides of the two clamping plates, and two second guiding members respectively located on the front and rear sides of the two clamping plates. Abutting the left and right sides of the substrate, the two second guiding members can be close to and respectively abut the front and rear sides of the substrate. In addition to the inverting device, the driving unit comprises a driving motor mounted on the base, and a rotating shaft which is engaged with the rotating plate and can be driven by the driving stirrup to rotate the rotating plate. In the above-mentioned inverting device, the driving unit further includes a first gear coupled to the driving motor, a second gear spaced from the first gear and engaged with the rotating shaft, and a winding and engaging the first and second gears Drive belt. An exposure machine having a turning device according to the present invention is adapted to expose a substrate. The exposure machine includes a machine table, a first exposure device, a second exposure device, and a turning device. The first exposure device is disposed on the machine for exposing the front surface of the substrate, and the second exposure device is disposed on the machine for exposing the back surface of the substrate, the turning device comprises a base, a turning mechanism, and a clamping mechanism, and the base is disposed On the machine table and between the first and second exposure devices. The turning mechanism comprises a driving unit mounted on the base, and a rotating plate rotatable by the driving unit, the clamping mechanism comprises a guiding rail, and a vertically spaced clamping plate, the guiding rail is mounted on the rotating plate and extends longitudinally 'The splints are slidably attached to the guide rails and include a suction pad for adsorbing the substrate's adsorption pads, and the two plywoods can be in an initial position separated from each other' and abutting and clamping each other and holding the substrate. The position reciprocates between the two, and the two plates can be turned by the rotating plate to flip the substrate. The flipping device of the present invention attaches the substrate to be exposed M373508 to the attachment through the suction of the suction hole, so that the two clamps do not need to be exposed during the process of holding the substrate to be exposed and flipping it. The substrate to be exposed can be firmly held on the green board, so that the front side or the back side of the substrate to be exposed is not generated. [Embodiment] The foregoing and other technical contents, features and effects of the present invention are related to the following reference drawings. In the detailed description of a better _, it will be clear = presented. Through the description of the specific embodiments, the technical means and effects of the present invention for achieving the intended purpose can be more deeply and specifically understood. However, the formula is only for reference and description, and is not intended to limit the present invention. Before the present invention is described in detail, it is to be noted that in the following description, similar elements are denoted by the same reference numerals. As shown in FIG. 1 and FIG. 2, which is a preferred embodiment of the exposure apparatus of the present invention, the exposure apparatus 1 is adapted to expose a substrate, which is a substrate 10 to be exposed, and an exposure machine. 1〇〇 includes a machine, a first exposure device 2, an inversion device 3, a second exposure device 4, and a transfer device 5. The machine table 1 defines a feed zone 11 and a discharge zone 12 on the opposite side of the feed zone. For convenience of explanation, the side of the feed zone 11 shown in FIG. The one in which the discharge area 12 is located is referred to as the right side, and the first exposure device 2 is disposed on the machine table and located on the right side of the feeding area u for exposing the front side 1〇1 of the substrate 1 to be exposed. The inverting device 3 is disposed on the table 1 and located on the right side of the first exposure device 2 for turning the substrate 10 to be exposed so that the back surface 102 faces upward. The second exposure device 4 is disposed on the machine table j M373508 and between the inverting device 3 and the discharge area 12 for exposing the back side 102 of the substrate 10 to be exposed. The transfer device 5 is disposed on the machine table 1 for sequentially conveying the substrate 10 to be exposed from the feeding zone 11 to the first exposure device 2, the inverting device 3, the second exposure device 4, and the discharge zone 12. As shown in Figures 3, 4 and 5, the inverting device 3 includes a base 31, an inverting mechanism 32' and a clamping mechanism 33. The base 31 is disposed on the machine table 1 and located between the first and second exposure devices 2, 4 (FIG. 1). The base 3 i includes a front support frame 311 and a rear side of the front support frame 311. The support frame 312 and a connecting frame 313 connected between the front support frame 311 and the rear support frame 312, wherein the front support frame 311 has a fixing plate 314 at the near end. The turning mechanism 32 includes a driving unit 321 mounted on the base 31, and a rotating plate 322 driven by the driving unit 321 . The driving unit 321 includes a driving motor 323, and the driving motor 323 is locked on the positioning frame 324. And being fixed to the fixing plate 314 through the positioning frame 324 and positioned on the front side of the fixing plate 314. The driving unit 321 further includes a first gear 325 connected to the front end of the driving motor 323, a second gear 326 spaced above the first gear 325, a rotating shaft 327, and a transmission belt 328. The rotating shaft 327 is rotated. The through hole 329 of the plate 322 and the through hole 315 of the fixing plate 314, the front end of the rotating shaft 327 is engaged with the second gear 326, and the rear end is locked to the rear side of the rotating plate 322 through the locking portion 330. The drive belt 328 is wound around the first and second gears 325, 326 and meshes with the first and second gears shy%, whereby the drive motor 323 drives the first gear 325 to rotate through the drive belt when it is rotated forward or reversed. 328 drives the second gear and the rotating shaft 327 to rotate, and when the rotating shaft 327 rotates, the rotating plate 322 can be rotated. 7 M373508 As shown in FIG. 3, FIG. 4, FIG. 5 and FIG. 6, the clamping mechanism 33 includes two guide rails 33 which are locked on the rear side of the rotating plate 322, and two upper and lower spaced plates 332. The extensions are spaced apart from each other to allow the splints 332 to slide. Each of the clamping plates 332 includes a clamping plate body 333, and a plurality of adsorption pads 334 respectively locked to the inner side of the clamping plate body 333. The adsorption pads 334 of the two clamping plates 332 are opposite to each other, and each of the adsorption pads 334 is provided with a plurality of suction holes 335'. The substrate to be exposed 1 (FIG. 1) can be adsorbed on the adsorption pad 334 by the suction force generated by the suction holes 335. In the present embodiment, the number of the adsorption pads 334 is three, and each of the adsorption pads 334 has a rectangular shape, wherein one of the adsorption pads 334 extends in the front-rear direction and the other two adsorption pads 334 respectively extend in the left-right direction and are located in the foregoing The left and right sides of the adsorption pad, of course, the design number, shape and arrangement of the adsorption pad 334 are not limited to those disclosed in the embodiment, and the shape of the visible plate body 333 is changed and the design is changed. The front end of the splint body 333 of each splint 332 has a connecting plate body 336 ′. The front side lock of the connecting plate body 336 is respectively slidably connected to the slab 337 on the guide rail 331 , whereby the splint body 333 of each splint 332 is made. It can slide down the guide rail 331 through the slider 337. The rear end of the clamping plate body 333 of the lower clamping plate 332 is pivotally connected to a sliding seat 339 mounted on the top end of the rear supporting frame 312 through a pivoting member 338, so that the clamping plate body 3 3 3 of the lower clamping plate 332 is along the guiding rail. 3 31 When sliding, the sliding seat 3 3 9 can be driven to slide up and down with respect to the rear support frame 312. The clamping mechanism 33 further includes two racks 340 and a transmission gear 341. The two racks 340 are respectively locked to the front side of the connecting plate body 336 of the two clamping plates 332 and spaced apart from each other. The racks 340 are longitudinally extended. The inside of the guide rail 331. M373508, the transmission gear 341 is pivotally connected to the rear end of the locking portion 330 of the rotating shaft 327 through a bearing 342. The transmission gear 341 is disposed between the two racks 34〇 and meshes with the rack 34〇. The clamping mechanism 33 further includes a cylinder 343 ′ that is locked to the rear side of the rotating plate 322. The top end of the rod 344 of the cylinder 343 is connected to a connecting piece 345 which is locked at the top end of the connecting plate 336 of the upper clamping plate 332. The rod portion 344 can drive the upper side clamp plate 332 to slide upward or downward along the guide rail 331 through the connecting piece 345. The rack 34 connected to the upper side clamp plate 332 can drive the transmission gear 341 to rotate. The transmission gear 341 will interlock with the other rack 34. The reverse movement of the cymbal toward the moving direction of the aforementioned rack 340, whereby the two clamping plates 332 can be driven in an initial position separated from each other (as shown in FIG. 6), and a clamping position abutting each other (as shown in FIG. Reciprocating between the two, and the two plates 332 can hold the substrate 1 to be exposed when in the clamping position. As shown in FIG. 1 and FIG. 7 , after the substrate 1 to be exposed is exposed on the exposure stage 21 of the first exposure device 2, the exposure operation of the front side 1〇1 is completed, and the group of the transfer device 5 and the #5丨 will be taken. The substrate 1 to be exposed is sent from the exposure stage 21 to the two clamping plates 332, and the substrate 1 to be exposed is placed on the lower clamping plate 332. Then, the group of suction arms 51 is reset to the position shown in FIG. . As shown in FIG. 7, FIG. 8 and FIG. 9, the base 31 further includes two first guides - 2 316' and two respectively disposed on the top surface of the connecting frame 313 and located on the left and right sides of the clamping plate 332, respectively. The second guiding member 317 of the top surface of the frame 3U and the rear side of the clamping plate 332, respectively, the rear side of the connecting frame 313 is connected with a cylinder 310 installed in the rear supporting frame 312, and the cylinder 31 is driven to connect the connecting frame 3 13 Move up or down to drive the first and second guiding members 3i6, 3i7 to move up or down. When the suction arm 51 is reset, the cylinder 31 驱 will drive the connection frame M373508 frame 3U to move from the position shown in FIG. 7 in the direction of the arrow 1 to the position of the pinned position so that the guide post 318 of the second-guide member 316 The guide pillars 319 of the second and second guiding members 317 are respectively located on the front and rear sides of the substrate 10 to be exposed. Then, the first guiding member on the left side is directed to the right in the direction of the arrow II. The first guiding member 3丨6 is moved closer to the right side, so that the guiding post 318 of the second first guiding member 316 can be divided into the left and right sides of the substrate 1 to be exposed, and at the same time, the second guiding member 317 of the front side. The guide member 317 of the second guide member 317 can be respectively moved to the front and rear sides of the substrate 1 to be exposed, thereby being able to move backward in the direction of the arrow ui. The substrate U to be exposed is guided to prevent the substrate to be exposed from being skewed before the flipping operation. After the substrate 1 to be exposed is guided, the adsorption pad 334 of the lower clamping plate 332 is placed. The suction hole 335 (as shown in FIG. 3) generates suction to adsorb the substrate 1 to be exposed on the adsorption pad 334. After the operation of the optical substrate 10 is completed, the cylinder 31 驱 drives the connecting frame 313 to bring the first and second guiding members 316 and 317 to the position shown in FIG. 7. As shown in FIG. 10, FIG. 11 and FIG. The trunk portion 344 of the cylinder 343 of the holding mechanism 33 drives the connecting piece 345 to move downward, and simultaneously drives the upper side clamping plate 332 to move down the guide rail 331 through the slider 337. Since the upper side clamping plate 332 moves downward, the connecting plate with the upper side clamping plate 332 The racks 34 connected to the body 336 will simultaneously move down and drive the transmission gear 341 to rotate, so that the transmission gear 341 will move up and down the rack 340 connected to the connecting plate 336 of the lower side plate 332. The clamping plate 332 can be adjacent to each other in the direction of the arrow I and the arrow IV, respectively, when the two clamping plates 332 are moved to a clamping position to be exposed to each other and the 10 M373508 optical substrate is to be exposed (as shown in FIG. The rod 3 material does not drive the splint 332 to move any more. At this time, the suction hole 335 (shown in FIG. 5) on the adsorption 塾 334 of the upper side plate 332 generates suction force, so that the soil plate to be exposed is simultaneously b b It is adsorbed between the adsorption crucibles 334 of a splint 332. 4. As shown in FIG. 13 and FIG. 14, the driving motor 323 of the inverting mechanism 32 drives the first gear 325 to rotate, and the first gear 325 drives the transmission belt 328 to rotate, so that the second gear 326 can rotate the rotating shaft 327. When the rotating shaft 327 rotates, the rotating plate 322 and the clamping mechanism 33 mounted on the rotating plate 322 are rotated, so that the two clamping plates 332 can flip the substrate to be exposed 1 沿 in the direction indicated by the arrow v, when the clamping plate 332 is to be exposed. When the back surface 1〇2 of the substrate 1 to be exposed is turned upward by 180 degrees, the drive motor 321 stops operating. Then, the cylinder 343 of the clamping mechanism 33 drives the connecting piece 345 to move up, and simultaneously drives the upper clamping plate 332 to move up along the guiding rail 331 through the slider 337. By the driving gear 341, the lower clamping plate 332 can simultaneously pass through the sliding block. The 337 is moved down along the guide rail 331 so that the two clamping plates μ] can be moved away from each other in the direction of the arrow I and the arrow IV, respectively. When the upper and lower sets of the sliders 337 abut against the stop portions 320 at the adjacent tops 4 of the rotating plate 322 as shown in FIG. 6, and the two adjacent splice portions 320 at the bottom end, the two splints 332 will return to the initial position and will not move again. It should be noted that since the transmission gear 341 is pivotally connected to the locking portion 330 of the rotating shaft 327 through the bearing 342, when the rack 34 〇 drives the transmission gear 341 to rotate, the transmission gear 341 does not interlock with the rotation shaft 327. When the rotating portion 327 rotates and the rotating shaft 327 rotates, the rotating shaft 327 does not directly drive the transmission gear 341 to rotate. The transmission gear 341 is rotated by the rotation of the two teeth 11 M373508 340. On the other hand, the number of the guide rails 331 can also be one, which can also achieve the effect of sliding the splint 332, and is not limited to the design of the two guides 331 disclosed in the embodiment. As shown in Fig. 15 and Fig. 16, after the inversion operation of the substrate 1 to be exposed is completed, the other group of suction arms 52 of the transfer device 5 will be illustrated! The position shown moves between the two clamping plates 332 and sucks the substrate 1 to be exposed. Then, the group of suction arms 52 can transport the substrate to be exposed to the exposure platform 41 of the second exposure device 4 to perform the substrate 1 to be exposed. Exposure operation of 1〇2 on the back of the cymbal. In summary, the inverting device 3 of the exposure machine 100 of the present embodiment adsorbs the substrate 1 to be exposed on the adsorption pad 334 through the suction force of the suction air hole 335, so that the two clamping plates 332 hold the substrate to be exposed 1G and flip it. During the process, the two clamping plates 332 can firmly hold the substrate to be exposed without pressing on the substrate 1 to be exposed. Therefore, the front surface ι 〇 or the back surface 102 of the substrate 1 to be exposed is not indented. Achieve the purpose of this new type of claim. However, the above description is only a preferred embodiment of the present invention, and the scope of the present invention cannot be limited thereto, that is, the simple equivalent change made by the scope of the special scope and the new description of the present invention is Modifications are still covered by this new # patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a front elevational view of a preferred embodiment of the exposure apparatus of the present invention having a turning device; FIG. 2 is a plan view of a preferred embodiment of the exposure apparatus of the present invention having a turning device; 3 is a perspective view of the inverting device of the preferred embodiment 12 M373508 of the present invention; FIG. 4 is a partial exploded perspective view of the inverting device of the preferred embodiment of the exposure machine with the inverting device; Figure 5 is an exploded perspective view of a preferred embodiment of the present invention with an inverting device; Figure 6 is a rear elevational view of the preferred embodiment of the inverting device of the present invention having an inverting device; Figure 7 It is a front view of the inverting device of the preferred embodiment of the present invention with an inverting device, illustrating that the suction arm of the transfer device transports the substrate to be exposed to the splint; FIG. 8 is an exposure machine of the present invention having a turning device. A front view of the inverting device of a preferred embodiment illustrates that the connecting frame drives the first and second guiding members to move up; FIG. 9 is one of the exposure machines of the present invention having a turning device. The top view of the inverting device of the embodiment shows that the guiding post of the first guiding member abuts on the left and right sides of the substrate to be exposed, and the guiding post of the second guiding member abuts on the front and rear sides of the substrate to be exposed; The front view of the inverting device of the preferred embodiment of the present invention has an inverting device, which illustrates that the two clamping plates are respectively moved up and down to the clamping position for holding the substrate to be exposed; FIG. 11 is a new type of inverting device. Rear view of the inverting device of one preferred embodiment of the exposure machine, illustrating that the two clamping plates move up and down respectively and hold the substrate to be exposed; FIG. 12 is an exposure machine with a turning device of the present invention - a preferred embodiment 13 M373508 A partial enlarged view of the inverting device, illustrating that the two strips are respectively moved in opposite directions through the transmission gear; FIG. 13 is a front view of the inverting device of the preferred embodiment of the present invention with an inverting device. The substrate to be exposed is turned 180 degrees, so that the back side of the substrate to be exposed is facing upwards; FIG. 14 is a front view of the flipping device of a preferred embodiment of the exposure machine with the inverting device of the present invention. 'Description of the two splints moving back up and down respectively to the initial position; Figure 15 is a front view of the flipping device of a preferred embodiment of the present invention with an inverting device, illustrating the movement of the other set of suction arms of the transfer device to The substrate to be exposed is sucked between the two plywoods; and FIG. 16 is a partially enlarged view of a preferred embodiment of the exposure machine with the inverting device of the present invention, illustrating another set of suction arms of the transfer device for transporting the substrate to be exposed to the second Exposure device on the exposure platform. 14 M373508
【主要元件符號說明】 100· 曝光機 321 ··· …·驅動單元 10 .· 待曝光基板 322… •…旋轉板 101 · 正面 323… •…驅動馬達 102· 反面 324… •…定位架 卜… 機台 325… •…第 齒輪 11 · 入料區 326… •…第二齒輪 12 · 出料區 327… •…旋轉軸 2 第一曝光裝置 328… •…傳動皮帶 21、 41 ·· 曝光平台 330… •…鎖定部 〇 .... 翻轉裝置 Ί 0..... ____土 4主祕、拔 D---- 火行微稱 31 ·· 基座 331… •…導執 310、 343 ，氣缸 332… •…夾板 311 · 前支撐架 333… 失板本體 312. 後支撐架 334… •…吸附墊 313. 連接框架 33 5… •…吸氣孔 314· 固定板 336… •…連接板體 315、 329 •穿孔 337… •…滑塊 316· 第一導正件 338… •…樞接件 317· 第二導正件 339… •…滑動座 318· 導柱 340… •…齒條 319· 導柱 341… •…傳動齒輪 32 ·· 翻轉機構 342… —軸承 320. 擋止部 344… •…桿部 15 M373508 345··.· …連接片 51、52 ··吸取臂 4....... …第二曝光裝置 I、II、111··箭頭 5....... …移載裝置 IV、V…·…箭頭[Description of main component symbols] 100· Exposure machine 321 ············································································· Machine 325... •...Frequency gear 11 · Feeding area 326... •...Second gear 12 · Discharge area 327... •... Rotary shaft 2 First exposure unit 328... •... Transmission belt 21, 41 ·· Exposure platform 330 ... •...locking part 〇.... flipping device Ί 0..... ____ soil 4 main secret, pull D---- fire line micro-name 31 ·· pedestal 331... •...lead 310, 343 , Cylinder 332... •...Plywood 311 · Front support frame 333... Lost plate body 312. Rear support frame 334... •...Adsorption pad 313. Connection frame 33 5... •... Inspiratory hole 314· Fixing plate 336... •...Connection plate Body 315, 329 • Perforation 337... •... Slider 316· First Guide 338... •...Pivot 317·Second Guide 339... •... Slider 318· Guide Post 340... •...Rack 319 · Guide post 341... •...transmission gear 32 ·· Inverting mechanism 34 2... —bearing 320. stopper 344... •...bar 15 M373508 345····...connecting piece 51, 52 ··absorbing arm 4........second exposure device I, II, 111 ··Arrow 5.............Transfer device IV, V...·...arrow
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