TWI656600B - Exposure rotation fixture - Google Patents

Abstract

An exposure rotation jig includes a support frame and a containing component. The supporting frame has two positioning plates opposite to each other. The accommodating component is rotatably disposed inside the two positioning plates. The accommodating component includes two inner frame plates, a ratchet mechanism, two rotating shafts, a plurality of fixed shafts, and a plurality of clips. The two inner frame plates are respectively located inside the two positioning plates. The ratchet mechanism is located between one of the two inner frame plates and one of the two positioning plates. The rotation shaft passes through the two inner frame plates and the two positioning plates, and one of the two rotation shafts penetrates the ratchet mechanism. Two ends of each fixed shaft are respectively fixed at the corners of the two inner frame plates. Each clip is detachably connected to the two inner frame boards.

Description

Exposure rotation jig

This disclosure is about an exposure rotation jig.

When the substrate to be produced is exposed to UV, multiple parts of the substrate need to be exposed. However, the existing fixture mechanism can only be used to position the substrate. When the light source is activated, only a part of the substrate can be exposed in a single direction. To expose the entire substrate, you need to remove the substrate from the fixture mechanism. After changing the substrate angle (such as rotating the substrate), replace the fixture mechanism again to change the exposure position of the substrate. You need to disassemble and install the substrate multiple times to complete. Substrate requirements for exposure processes. In addition, each time the exposure direction is changed, a different jig mechanism needs to be replaced, which causes the substrate to be repeatedly loaded and unloaded easily, which reduces the operation efficiency and increases the burden on manpower, which is not in line with the benefits of production.

In view of this, some embodiments of the present disclosure disclose an improved clip strip detachable exposure rotation jig, which can make the substrate to be exposed through repeated rotation of the ratchet mechanism without repeated disassembly of the substrate to be exposed without repeated disassembly. After the substrate is exposed, it is more efficient and more stable than the general jam operation.

According to an embodiment of the present disclosure, an exposure rotation jig includes Support frame and receiving assembly. The supporting frame has two positioning plates opposite to each other. The accommodating component is rotatably disposed inside the two positioning plates, and the accommodating component includes two inner frame plates, a ratchet mechanism, two rotating shafts, a plurality of fixed shafts, and a plurality of clips. The two inner frame plates are respectively located inside the two positioning plates. The ratchet mechanism is located between one of the two inner frame plates and one of the two positioning plates. The rotation shaft passes through the two inner frame plates and the two positioning plates, and one of the two rotation shafts penetrates the ratchet mechanism. Two ends of each fixed shaft are respectively fixed at the corners of the two inner frame plates. Each clip is detachably connected to the two inner frame boards.

In one embodiment, the corner of the inner frame plate has a plurality of positioning holes, and the fixing shaft is inserted into the positioning holes.

In one embodiment, the edge of the inner frame plate has a plurality of recesses, and the clips are positioned in the recesses.

In one embodiment, the inner frame plate further includes a plurality of dials and a plurality of magnets. The shifting blocks are pivotally connected to the openings of the recesses, respectively. The magnet is located in the inner frame plate, so that the dial blocks are respectively positioned by being attracted by the magnet.

In one embodiment, each card strip has a plurality of card slots for positioning at least one substrate to be exposed.

In one embodiment, the ratchet mechanism includes a ratchet element and a telescopic block. The ratchet element is penetrated by one of the two rotation shafts, and the telescopic block is located on the inner side of one of the two positioning plates and telescopically abuts the ratchet element.

In one embodiment, the ratchet element has a body and a plurality of convex teeth surrounding the body. The connection between the two side edges of each convex tooth and the body has two contacts, and the connecting clip between the two contacts and the center of the body is 45 degrees.

In one embodiment, the bottom of the support frame has a hollowed-out area. The exposure rotation jig further includes a base. The base is located under a support frame with a hollowed-out area. The base has a bottom plate and a side wall adjacent to the bottom plate. The bottom plate and the side wall define a space, and this space communicates with the hollowed-out area of the support frame.

In one embodiment, when the accommodating component is located obliquely inside the two positioning plates, the accommodating component is at least partially located in the space of the base.

In the above embodiment of the present disclosure, the exposure rotation jig is provided with a ratchet mechanism between the inner frame plate of the accommodating component and the positioning plate of the support frame. The ratchet mechanism can rotate the accommodating component on the supporting frame for a plurality of positioning angles, so that during the exposure process, multiple parts of the substrate can be exposed without removing the substrate. In addition, the ratchet mechanism can avoid reversal of the substrate to be exposed due to reversal, and has the effect of preventing dullness. In addition, the clip holding the component can prevent the substrate to be exposed from falling during rotation, and the clip can be removed during exposure to increase the exposure area. Exposure rotation fixtures can increase output efficiency and reduce fixture costs. The stability of the exposure rotation jig is good, which can solve the problems of traditional jigs such as the substrate being repeatedly loaded and unloaded easily, and the manpower is wasted.

100‧‧‧ exposure rotation fixture

110‧‧‧Support

112a, 112b‧‧‧ Positioning plate

114‧‧‧ Hollow

120‧‧‧accommodating components

122a, 122b‧‧‧Inner frame board

124‧‧‧ Positioning hole

126‧‧‧ Recess

132‧‧‧Dial block

133‧‧‧magnet

140‧‧‧ Ratchet mechanism

142‧‧‧Ratchet element

143‧‧‧ Ontology

144‧‧‧ convex teeth

144a, 144b‧‧‧ convex teeth

145‧‧‧long side edge

146‧‧‧Short side edge

147a, 147b, 147c‧‧‧ contact

150a, 150b‧‧‧rotation shaft

160‧‧‧Fixed shaft

170‧‧‧ card

172‧‧‧Card slot

180‧‧‧base

182‧‧‧ floor

184‧‧‧ sidewall

186‧‧‧space

190‧‧‧ substrate

θ ₁ , θ ₂ ‧‧‧ angle

FIG. 1 is a perspective view of an exposure rotation jig according to an embodiment of the disclosure.

Figure 2 is an exploded view of the exposure rotary jig of Figure 1.

Fig. 3 is a partial enlarged view of the exposure rotation jig of Fig. 1.

Figure 4A is a front view of the ratchet element of Figure 2.

FIG. 4B is a front view of the accommodating component of the exposure rotary jig of FIG. 1 in a horizontal state.

Fig. 4C is a front view of the accommodating component of the exposure rotary jig of Fig. 1 in a vertical state.

Fig. 5A is a perspective view of the exposure assembly of Fig. 1 when the accommodating component of the exposure rotation jig is tilted and placed in a substrate.

FIG. 5B is a perspective view of the exposure rotation jig of FIG. 1 when the accommodating component of the exposure rotation jig is in a horizontal state and a plurality of substrates are put in it.

FIG. 5C is a perspective view of the exposure rotation jig of FIG. 1 when the accommodating component of the exposure rotation jig is in a vertical state and a plurality of substrates are put in it.

Several embodiments of the present disclosure will be disclosed graphically below. For clarity, many practical details will be explained in the following description. However, it should be understood that these practical details should not be used to limit this disclosure. That is, in some embodiments of the present disclosure, these practical details are unnecessary. In addition, in order to simplify the drawings, some conventional structures and components will be shown in the drawings in a simple and schematic manner.

FIG. 1 is a perspective view of an exposure rotation jig 100 according to an embodiment of the disclosure. FIG. 2 is an exploded view of the exposure rotary jig 100 of FIG. 1. Referring to FIG. 1 and FIG. 2 at the same time, the exposure rotation jig 100 includes a support frame 110 and a receiving assembly 120. The support frame 110 has two positioning plates 112a and 112b opposite to each other. The receiving assembly 120 is rotatably disposed inside the positioning plates 112a and 112b. The receiving assembly 120 includes two inner frame plates 122a and 122b, a ratchet mechanism 140, two rotation shafts 150a and 150b, a plurality of fixed shafts 160, and a plurality of clips 170. The inner frame plate 122a is located inside the positioning plate 112a, and the inner frame plate 122b is located inside the positioning plate 112b. The ratchet mechanism 140 is located between the inner frame plate 122a and the positioning plate 112a. Both ends of the fixed shaft 160 are fixed to the corners of the inner frame plates 122a and 122b, respectively. The clip 170 is detachably connected to the inner frame plates 122a and 122b.

In the present embodiment, the corners of the inner frame plates 122a and 122b have a plurality of positioning holes 124, so that both ends of the fixed shaft 160 can be inserted into the positioning holes 124 and span the inner frame plates 122a and 122b.

In addition, the edges of the inner frame plates 122a and 122b have a plurality of recesses 126. In this embodiment, each side of the inner frame plates 122a and 122b has at least two recessed portions 126, and the clip 170 is positioned in the recessed portions 126. Each of the inner frame plates 122 a and 122 b of the receiving assembly 120 includes a plurality of dial blocks 132 and a plurality of magnets 133. FIG. 3 is a partial enlarged view of the exposure rotation jig 100 of FIG. 1. As shown in FIG. 3, at the edges of the inner frame plate 122a, the dials 132 are respectively pivotally connected to the openings of the recessed portions 126, and the magnets 133 are located in the inner frame plate 122a.

The dial 132 on the right in FIG. 3 is in an open state. When the dial 132 is turned off, an opening is formed above the recessed portion 126, and a corresponding clip 170 can be taken out or placed. The dial 132 on the left in FIG. 3 is in a closed state. When the dial 132 is closed, the recessed portion 126 assumes a closed state, thereby positioning the clip 170. The edge structure of the other inner frame plate 122b is similar to the edge structure of the inner frame plate 122a in FIG. 3, and is not repeated here.

Referring to FIG. 1 and FIG. 3 at the same time, when the clip 170 is put into the recessed portion 126 of the inner frame plates 122a and 122b, the adsorption force between the magnet 133 and the metal in the inner frame plates 122a and 122b makes the dial block 132 Positioned by the magnet 133 to prevent rotation of the dial 132. For example, when the dial block 132 is in the open state, the magnet 133 attracts the dial block 132 so that the recess 126 is in the open state for easy insertion. Or remove the clip 170. When the dial block 132 is in the closed state, another magnet 133 attracts the dial block 132 so that the recessed portion 126 is in the closed state to facilitate fixing the clip 170.

In this embodiment, the clamping strip 170 of the accommodating component 120 has a plurality of clamping slots 172 for positioning at least one substrate 190 to be exposed as shown in FIG. 5A.

FIG. 4A is a front view of the ratchet element 142 of FIG. 2. FIG. 4B is a front view of the accommodating component 120 of the exposure rotary jig 100 of FIG. 1 in a horizontal state. In order that the ratchet mechanism 140 in FIG. 4B can be clearly depicted, the positioning plate 112a that covers the ratchet mechanism 140 in FIG. 4B is shown by a dotted line. Referring to FIG. 4A and FIG. 4B simultaneously, the ratchet mechanism 140 of the receiving assembly 120 includes a telescopic block 141 and a ratchet element 142. The ratchet element 142 is penetrated by the rotation shaft 150 a, and the telescopic block 141 is located inside the positioning plate 112 a and telescopically abuts the ratchet element 142.

The ratchet element 142 of the ratchet mechanism 140 has a body 143 and a plurality of convex teeth 144 surrounding the body 143. Each convex tooth 144 has two side edges, namely a long side edge 145 and a short side edge 146. For example, the connection between the short side edge 146 of the convex tooth 144a and the body 143 has a contact 147a, and the connection between the long side edge 145 of the convex tooth 144a and the body 143 has a contact 147b, and the contact 147a and the contact 147b The connection line with the center of the body 143 has an included angle θ ₁ . The convex tooth 144b adjacent to the convex tooth 144a has a contact point 147c at the connection point between the long side edge 145 and the body 143, and the connection point between the contact point 147a and the contact point 147c and the center of the body 143 has an angle θ ₂ .

In the present embodiment, the contact 147a and the contact 147b of the body 142 on the ratchet member connecting the centers of _an angle θ 143 may be 45 degrees, so that the projections 142 the number of teeth on the ratchet member 144 may be 8, and further such that the receiving The assembly 120 has eight positioning points between the positioning plates 112a and 112b. Through these 8 positioning points, in addition to controlling the tilting angle of the accommodating component 120 when the substrate 190 to be exposed is placed (see FIG. 5A), the rotational positioning points of the accommodating component 120 can also be controlled so that the substrate 190 to be exposed is rotated multiple times. (E.g. four times) to complete the exposure.

In addition, the long side edge 145 and the short side edge 146 of each convex tooth 144 on the ratchet element 142 extend from the body 143. The long side edge 145 is arc-shaped, and the length of the long side edge 145 of the arc shape is greater than the short side.缘 146。 146. This design can prevent the inner frame plates 122a and 122b from rotating in the reverse direction when the ratchet element 142 is rotated, thereby preventing repeated exposure of a part of the substrate 190 to be exposed, and has a dull effect.

In this embodiment, a spring may be connected below the telescopic block 141 to abut against the ratchet element 142. When the ratchet element 142 rotates in a single direction, the ratchet element 142 forces the expansion and contraction block 141 to lower and the spring is compressed. When the expansion block 141 is clamped upward between the two convex teeth 144 of the ratchet element 142, the spring is in a stretched state So that the ratchet element 142 is positioned without rotating.

FIG. 4C is a front view of the accommodating component 120 of the exposure rotary jig 100 of FIG. 1 in a vertical state. Referring to FIG. 4B and FIG. 4C simultaneously, the ratchet element 142 and the rotation shaft 150a have the same axis. When the accommodating assembly 120 rotates, for example, the state from FIG. 4B to FIG. 4C, or the state from FIG. 4C to FIG. 4B, the rotation axes 150a and 150b (see FIG. 1) and the ratchet element 142 are The center of the circle rotates. For example, if the ratchet element 142 is in the design of FIG. 4A (that is, the included angle θ ₁ is 45 degrees), when the receiving assembly 120 in FIG. 4B uses the ratchet mechanism 140 to rotate clockwise, the telescopic block 141 can cross the two protrusions. After the teeth 144 stop rotating, the state of the accommodating assembly 120 in FIG. 4C can be obtained.

FIG. 5A is a perspective view of the accommodating component 120 of the exposure rotary jig 100 shown in FIG. 1 when it is tilted and the substrate 190 is placed. As shown in FIG. 5A, the bottom of the support frame 110 of the exposure rotation jig 100 has a hollow region 114. Exposure rotation The fixture 100 further includes a base 180, which is located below the support frame 110. The base 180 has a bottom plate 182 and a side wall 184 adjacent to the bottom plate 182. The bottom plate 182 and the side wall 184 define a space 186, and the space 186 communicates with the hollowed out region 114 of the support frame 110.

When the accommodating component 120 of the exposure rotation jig 100 is located obliquely inside the positioning plates 112a and 112b, the accommodating component 120 is at least partially located in a space 186 defined by the bottom plate and the side wall 184 of the base 180, and the accommodating component 120 is in an inclined state at this time. In order to conveniently put the substrate 190 to be exposed into the accommodating component 120, the accommodating component 120 may be rotated to a tilted state by using the ratchet mechanism 140, as shown in FIG. 5A. At this time, remove the clip 170 on one side, put it into one or more substrates 190 to be exposed, and let the substrate 190 fit into the slot 172 of the clip 170 to ensure that the substrate 190 will not be exposed during the exposure process. Shake. In the inclined state, in order to conveniently put the substrate 190 to be exposed into the accommodating assembly 120, the clips 170 on the upper side and the left side in FIG. 5A are removed, but it is not intended to limit the present disclosure.

FIG. 5B is a perspective view of the exposure assembly 120 of FIG. 1 when the accommodating component 120 of the exposure rotary jig 100 is in a horizontal state and a plurality of substrates 190 are placed therein. When changing the accommodating unit 120 in FIG. 5A from the inclined state to the horizontal state in FIG. 5B, the ratchet mechanism 140 is only required to position the accommodating unit 120 by rotating the accommodating unit 120. For example, if the ratchet element 142 is the design shown in FIG. 4A (that is, the included angle θ ₁ is 45 degrees), when the receiving component 120 rotates clockwise using the ratchet mechanism 140, the telescopic block 141 can pass through a single convex tooth 144 and stop rotating. Then, the accommodating component 120 can be changed from the inclined state to the horizontal state. During the transition from the tilted state to the horizontal state, clips 170 on the four edges of the inner frame plates 122a and 122b may be installed to prevent the substrate 190 from falling out. When the accommodating component 120 is in a horizontal state and the substrate 190 is to be exposed, the upper clip 170 may be removed to facilitate exposure, as shown in FIG. 5B.

FIG. 5C is a perspective view of the accommodating component 120 of the exposure rotary jig 100 shown in FIG. 1 when a plurality of substrates 190 are placed in a vertical state. When the storage assembly 120 in FIG. 5B is changed from the horizontal state to the vertical state in FIG. 5C, the ratchet mechanism 140 is only required to position the storage assembly 120 by rotating the storage assembly 120. For example, if the ratchet element 142 is the design of FIG. 4A (that is, the included angle θ ₁ is 45 degrees and the included angle θ ₂ is 90 degrees), when the receiving component 120 is rotated clockwise using the ratchet mechanism 140, the telescopic block 141 can be crossed. After the two convex teeth 144 stop rotating, the receiving component 120 can be changed from a horizontal state to a vertical state. During the process of changing from the horizontal state to the vertical state, clips 170 on the four edges of the inner frame plates 122a and 122b may be installed to prevent the substrate 190 from falling out. When the accommodating component 120 is in a vertical state and the substrate 190 is to be exposed, the upper clip 170 may be removed to facilitate exposure, as shown in FIG. 5C.

In one embodiment, to fully expose the substrate 190 to be exposed, the accommodating component 120 needs to be rotated multiple times (for example, four times) through the ratchet mechanism 140 to achieve the effect of full exposure, but it is not intended to limit the present disclosure.

In this embodiment, the material of the fixed shaft 160 may be 304 stainless steel (SUS304). The material of the clip 170 may include 304 stainless steel, Teflon, and fiber. The materials of the inner frame plates 122a and 122b may be 6061 anodized aluminum alloy, and the material of the support frame 110 may be a steel plate coldrolled coil (SPCC) coated with baking paint. However, the materials of the fixed shaft 160, the clip 170, the support frame 110, and the inner frame plates 122a and 122b are not limited to the above materials.

Although this disclosure has been disclosed as above by way of implementation, it is not intended to be used To limit this disclosure, anyone skilled in this art can make various modifications and retouching without departing from the spirit and scope of this disclosure. Therefore, the scope of protection of this disclosure shall be determined by the scope of the attached patent application. .

Claims (10)

An exposure rotation jig includes: a support frame having two positioning plates opposite to each other; and a receiving component rotatably disposed inside the two positioning plates, the receiving component including: two inner frame plates respectively located at the two positionings The inside of the plate; a ratchet mechanism located between one of the two inner frame plates and one of the two positioning plates; two rotation shafts passing through the two inner frame plates and the two positioning plates, and the two rotation shafts One of them penetrates the ratchet mechanism; a plurality of fixed shafts, and two ends of each of the fixed shafts are respectively fixed at the corners of the two inner frame plates; and a plurality of clips are detachably connected to the two inner frame plates. . The exposure rotary jig as described in claim 1, wherein the corners of the inner frame plates have a plurality of positioning holes, and the fixed shafts are inserted into the positioning holes. The exposure rotary jig according to claim 1, wherein the edges of the inner frame plates have a plurality of recesses, and the clips are positioned in the recesses. The exposure rotary jig as described in claim 3, wherein the inner frame plates further include: a plurality of dials respectively pivotally connected to the openings of the recesses; and a plurality of magnets located in the inner frame plates, The positioning blocks are respectively attracted by the magnets. The exposure rotary jig according to claim 1, wherein the clips have a plurality of card slots for positioning at least one substrate to be exposed. The exposure rotary jig as described in claim 1, wherein the ratchet mechanism includes: a ratchet element penetrated by one of the two rotation axes; and a telescopic block located inside one of the two positioning plates, and can be The ratchet element abuts telescopically. The exposure rotation jig as described in claim 6, wherein the ratchet element has a body and a plurality of convex teeth surrounding the body, and two joints of the two side edges of each of the convex teeth and the body have two contacts. , And the connection between the two contacts and the center of the body is 45 degrees. The exposure rotary jig as described in claim 6, wherein the two side edges of each of the convex teeth extend from the body, one of the two side edges is arc-shaped, and the side edges of the arc are Is longer than the other of the two side edges. The exposure rotary jig as described in claim 1, wherein the bottom of the support frame has a hollowed-out area, and the exposure rotation jig further includes: a base, located below the support frame, the base having a bottom plate and A side wall, the bottom plate and the side wall define a space, and the space communicates with the hollowed-out area of the support frame. The exposure rotary jig as described in claim 9, wherein when the containing component is positioned obliquely inside the two positioning plates, the containing component is at least partially located in the space of the base.