M354807 五、新型說明： 【新型所屬之技術領域】 本創作係關於-種電容式觸控面板，尤指一種具光阻 剝離法製成結構之電容式觸控面板。 【先前技術】 、—電容式觸控面板係具有複數由透明導電膜形成 的透明電極，該些透明電極係作為按鍵功能陶州而分 佈於觸控面板的可視區（View Afea)，爲了降低阻值，連接 。玄些透明電極的導線材f係大多採用金屬或是網印銀膠。 =九圖的電容式觸控面板為例，其包含複數組橫向 奉接的_極(60)以及複數組縱向串接 :::!輛與縱轴的觸控感測，為避免橫抽與縱輛透： 電極=而導通’故必須於兩者位於不同層面 有一層絕緣膜。 又 由於透明導電膜、形成金屬 緣膜，該些不同材質之材的金屬¥電膜以及絕 業，設備;===作 者間料亦較為複雜’也將會提高環保成本二 或厚膜光㈣製程，以進行不同材質薄膜（ 及成本較高堆疊，因此’製程較繁瑣，所需製造時間 (二十者圖::，控面板在下層圖叫 間的絕緣膜（7 2)所遇到複層堆疊的部分或是其 M354807 他特定結構設計需求下所設計 1 <i層堆《結構，常受限曝 光製程精度影響而衍生對位傯莫„ 對位偏差問題，以第十圖而言，a 曝光製程精度為D’ = 5//m， 、 田尽兴層之間在相反方向偏差 ，對位最大誤差值合計可達彳〇以m。 【新型内容】 由上述说明可知’習知按鍵型電容式觸控面板因不同 層面與材質之材料須於不同製程作業而成，不僅須建置多 種製程設備，且非常浪費工時。 有鑑於此，本創作之主要目的在於提供一種電容式觸 控面板，係包含： 一基板，係表面規劃有一可視區； 複數訊號線，係為形成於該基板表面的複層結構，盆 中’複層結構中層與層之間的對位偏差小3請，且位於可 視區内的訊號線係分成、適I p θ i 丨了刀玖複數&段而具有複數戴斷端； 、邑緣膜係形成於該基板表面之可視區範圍，其中M354807 V. New Description: [New Technology Field] This creation is about a capacitive touch panel, especially a capacitive touch panel with a photoresist stripping method. [Previous Technology] The capacitive touch panel has a plurality of transparent electrodes formed of a transparent conductive film, and the transparent electrodes are distributed as a button function in the visible area of the touch panel (View Afea), in order to reduce the resistance. Value, connection. Most of the wire materials f of the transparent electrode are made of metal or screen printing silver glue. = The capacitive touch panel of the nine figure is an example, which includes the _ pole (60) of the complex array and the longitudinal array of the complex array:::! The touch sensing of the vehicle and the vertical axis, in order to avoid horizontal pumping and Longitudinal penetration: Electrode = conduction", so there must be an insulating film on the different layers. And because of the transparent conductive film, the formation of the metal edge film, the metal material of the different materials and the industry, equipment; === author material is also more complex 'will also increase the environmental cost of two or thick film light (four) Process to make films of different materials (and higher cost stacking, so 'the process is more cumbersome, the required manufacturing time (twentieth::, the control panel in the lower layer called the insulation film (7 2) encountered complex The layer stacking part or its M354807 is designed according to his specific structural design requirements. 1 <i layer stack "structure, often limited exposure process accuracy and derivative alignment 偬 „ 对 deviation problem, in the tenth figure , a The exposure process accuracy is D' = 5//m, and the Tianquanxing layer is offset in the opposite direction, and the maximum value of the alignment error can be up to mm. [New content] From the above description, the conventional button can be known. Due to the different layers and material materials, the capacitive touch panel must be manufactured in different processes. It is not only necessary to build a variety of process equipment, but also wastes man-hours. In view of this, the main purpose of this creation is to provide a capacitive touch. Control surface The system comprises: a substrate, the surface of which is planned to have a visible area; the complex signal line is a multi-layer structure formed on the surface of the substrate, and the alignment deviation between the layers in the 'multilayer structure of the pot is small 3, and The signal line located in the visible area is divided into, and the Ip θ i has a plurality of broken ends and a segment has a plurality of broken ends; and the edge film is formed on a visible area of the surface of the substrate, wherein
，該絕緣膜對應可插1¾肉欠4 & ΛΑ丑M 兄L·内各机唬線的截斷端形成鏤空區； 以及 一圖案化導電膜，係形成於該絕緣膜上並包含複數並 ㈣電極組以及複數獨立電極，纟中，各電極組係由複數 接4串接的電極構成，·!亥些電極組一端係分別連接位於可 視區外的訊號線，該些獨立電極係位於該些電極組之間， 且各獨iL電極係對應透過絕緣膜之鐘空區❿以立於下層的 讯號線區段電性接觸。 4 M354807 本創作以前揭觸控面板設計，使其可利用剝離光阻的 手段來製成其結構’在吻合特定結構設計下（如訊號線的複 層結構）’對於垂直投影—致之相異層圖案係使用一次光阻 剝離製程同時完成，層與層間的膜層圖案自動對準，對位 冰月準度可、准持在誤差值3 " m以内，是以本創作之複層結 構之對位精準遠優於習知技術採用多道黃光製程之上下層 圖案對位精準度。 【實施方式】 晴麥考第一圖所示，係本創作之電容式觸控面板一較 佳貫施例的局部平面示意圖，該電容式觸控面板係包含： 基板（1 〇)，係表面規劃有一可視區（11); 複數訊嬈線(20) ’如第二圖所示，該些訊號線(2〇)係形 成於該基板（10)表面，且位於可視區⑴）㈣訊號線（2〇)係 分成複數區段而具有複數截斷端（200); 絕緣膜（30)，如第三圖所示，係形成於該基板（1〇)表 面之可視區（11)範圍，其中，該絕緣膜（3〇)對應可視區 内各訊號線（2〇)的截斷端（200)形成鎮空區（3Q0)，本實施例 中，該絕緣膜（3_為負光⑯，其經由塗佈、曝光、顯影 及燒成等步驟形成鏤空區（3〇〇);以及 圖案化導電膜（4〇)，係形成於該絕緣膜（3〇)上並包含 複數並排的電極組（41)以及複數獨立電極（42),其中，各電 極組（41)係由複數接續串接的電極（41〇)構成，該些電極組 (41)一端係分別連接位於可視區（I”外的訊號線；該些獨立 5 M354807 電極（42)係位於該些電極組（41)之間，且各獨立電極Μ?)係 對應透過絕緣膜（30)之鏤空區（3〇〇)而與位於下層的訊號線 (20)截斷端（200)電性接觸。 前述訊號線（20)係為複層結構，可視設計需求包含有 透明導電層、絕緣臈、金屬層等材質，請參考沿第二圖之 割面線所示之第八圖，前述訊號線（2〇)的複層結構係包含 下層（21)、-中層（22)以及—上層（23)，係藉由光阻剝離 2_观)依序形成於基板（1Q)上，此光阻㈣法之過程如 •帛四圖至第八圖所示，一開始先於基板（1〇)上進行負光阻 塗佈、光罩曝光，再透過顯影及燒成而將未曝光的負光阻 移除’以形成圖案化的負光阻層（5〇)，如第四圖所示，該 圖案化的負光阻層（5G)於負光阻移除部位形成空白區（51)。 再如第五到第七圖所示，藉由賤鐘技術於基板⑼）依 序形成前述之下層（21)、中層（22)以及上層（23); 取後將負光阻層（5〇)移除而連同其上的複層結構移除 掉 >第八圖所不，僅留存位於空白區⑼）的複層結構。 』本實施例巾，該下層（21)與上層（23)係為透明導電膜； /中層（22)則為金屬層；此複層結構之設計可利用中層金 屬大幅降低訊號線(20)之阻值，又可藉由下層(21)透明導電 版=附著力差之金屬層與基板（1〇)之間的介面材料，從 提门附著力’而上層（23)透明導電膜則可包覆金屬層以 防止其氧化。 一：i二白區（51)成形時，其側視係呈一梯形狀而具有 ' 使1白區（51)與複層結構之間留有缝隙，可加速 之後化學溶液移除負光阻層(50)之速率，該空白區(51)上端 6 M354807 開口對基板（1Q)之垂直投影與負光阻層（5Q)之間的兩側距離 D &、’勺為1.5 # m，故在濺鍍時即使角度偏差導致層舆層之 間在相對方向偏移，該兩層之間其下層（21)與其上每一層 之間的對位誤差最大值可維持在3//m以内，相較於先; 技術提及之對位最大誤差值達1〇#m,本創作可維持良好 的對位精準度。 . 本創作以剝離光阻的手段所製成之結構，以前述實施 例而5 ’在訊號線結構製程中可節省一道光罩費用及製程 I 本創作的各層結構皆可採用光阻剝離製程，將 I在不使用金屬蝕刻及絕緣膜（如二氧化矽）蝕刻製程（包含 设備及蝕刻液），達到金屬線路以及絕緣膜之圖案化 (Pattern)，可節省相關之設備投資，亦較符合環保概念。 士本創作對於垂直投影一致之相異層圖案，在吻合特定 1構設計下（如前述訊號線的複層結構）而使用一次光阻剝離 製程同時完成，其層與層間的膜層圖案自動對準，對位精 準^可維持在誤差值3# m以内，遠優於習知技術採用多月 道頁光製程所衍生之上下層圖案對位偏差。 【圖式簡單說明】 第—圖：本創作一較佳實施例的局部平面示意圖。 回第一圖：本創作一較佳實施例訊號線的局部平面示竟 第三圖：本創作一較佳實施例塗佈絕緣膜後的局部平 面示意圖。 7 M354807 車又佳實施例成形訊號線之負光阻圖 車父佳實施例成形訊號線之形成下層 車父佳實施例成形訊號線之形成中層 較佳實施例成形訊號線之形成上層The insulating film forms a hollow region corresponding to the truncated end of the 唬 肉 ; ; ; ;; and a patterned conductive film formed on the insulating film and includes a plurality The electrode group and the plurality of independent electrodes, wherein each electrode group is composed of a plurality of electrodes connected in series, and one of the electrode groups is connected to a signal line outside the visible area, and the independent electrodes are located at the electrode group. Between the electrode groups, each of the individual iL electrodes is electrically connected to the signal line segment of the lower layer corresponding to the clock hole region of the insulating film. 4 M354807 Previously, the touch panel design was unveiled so that it can be made by stripping photoresist to make its structure 'under the specific structure design (such as the multi-layer structure of the signal line)' for vertical projection. The layer pattern is completed by using a photoresist stripping process at the same time, and the layer pattern between the layer and the layer is automatically aligned, and the alignment ice index can be within the error value of 3 " m, which is the multi-layer structure of the present creation. The alignment accuracy is far superior to the prior art technique. The multi-channel yellow light process has a lower pattern alignment accuracy. [Embodiment] As shown in the first figure of the clear wheat test, a partial plan view of a preferred embodiment of the capacitive touch panel of the present invention, the capacitive touch panel comprising: a substrate (1 〇), a surface The plan has a viewable area (11); a plurality of signal lines (20) 'As shown in the second figure, the signal lines (2〇) are formed on the surface of the substrate (10) and are located in the visible area (1)) (four) signal lines (2〇) is divided into a plurality of segments and has a plurality of truncated ends (200); an insulating film (30), as shown in the third figure, is formed in a visible region (11) of the surface of the substrate (1), wherein The insulating film (3〇) forms a hollow space (3Q0) corresponding to the cut end (200) of each signal line (2〇) in the visible area. In this embodiment, the insulating film (3_ is negative light 16 Forming a hollow region (3〇〇) through steps of coating, exposure, development, and firing; and patterning a conductive film (4〇) formed on the insulating film (3〇) and including a plurality of electrode groups side by side ( 41) and a plurality of independent electrodes (42), wherein each electrode group (41) is composed of a plurality of electrodes (41 接) connected in series, the electrodes (41) One end is respectively connected to the signal line outside the visible area (I); the independent 5 M354807 electrodes (42) are located between the electrode groups (41), and the independent electrodes Μ?) are corresponding to the transmission insulation The hollow region (3〇〇) of the film (30) is in electrical contact with the cut-off end (200) of the signal line (20) located at the lower layer. The signal line (20) is a multi-layer structure, and the transparent design includes transparent conductive For the layers, insulating rafts, metal layers, etc., please refer to the eighth figure shown along the cut line in the second figure. The multi-layer structure of the above signal line (2〇) includes the lower layer (21) and the middle layer (22). And the upper layer (23) is sequentially formed on the substrate (1Q) by photoresist stripping 2_view), and the process of the photoresist (four) method is as shown in Fig. 4 to Fig. 8 Performing negative photoresist coating on the substrate (1 〇), exposing the reticle, and then removing the unexposed negative photoresist by development and firing to form a patterned negative photoresist layer (5 〇), such as As shown in the four figures, the patterned negative photoresist layer (5G) forms a blank area (51) at the negative photoresist removal portion. As shown in the fifth to seventh figures, The lower layer (21), the middle layer (22) and the upper layer (23) are sequentially formed by the cesium clock technology on the substrate (9); the negative photoresist layer (5 〇) is removed and removed along with the multi-layer structure thereon Except for the eighth figure, only the multi-layer structure located in the blank area (9) is retained. In the embodiment, the lower layer (21) and the upper layer (23) are transparent conductive films; / the middle layer (22) It is a metal layer; the design of the multi-layer structure can greatly reduce the resistance of the signal line (20) by using the middle layer metal, and can also be performed by the lower layer (21) transparent conductive plate = the metal layer with poor adhesion and the substrate (1) The interfacial material from the door adhesion 'and the upper layer (23) transparent conductive film can coat the metal layer to prevent oxidation. A: When the i-white area (51) is formed, its side view system has a trapezoidal shape and has a gap between the white area (51) and the multi-layer structure, which can accelerate the removal of the negative photoresist after the chemical solution. The rate of the layer (50), the upper end of the blank area (51) 6 M354807 opening to the substrate (1Q) and the distance between the two sides of the negative photoresist layer (5Q) D &, 'spoon is 1.5 # m, Therefore, even if the angular deviation causes the layer of germanium to be offset in the opposite direction during sputtering, the maximum value of the alignment error between the lower layer (21) and each layer above the two layers can be maintained within 3//m. Compared with the first; the maximum error value of the alignment mentioned by the technology is 1〇#m, this creation can maintain good alignment accuracy. The structure made by the method of stripping the photoresist, in the foregoing embodiment, can save a mask cost and process in the signal line structure process. The photoresist layer stripping process can be adopted for each layer structure of the creation. I can use metal etching and insulating film (such as cerium oxide) etching process (including equipment and etching solution) to achieve the patterning of metal lines and insulating films, which can save related equipment investment and also meet the requirements. Environmental protection concept. The creation of a different layer pattern consistent with the vertical projection is performed by using a photoresist stripping process at the same time in a specific 1-frame design (such as the multi-layer structure of the aforementioned signal line), and the layer pattern between the layers is automatically matched. Precise, the alignment accuracy can be maintained within the error value of 3# m, which is far superior to the deviation of the lower layer pattern deviation derived by the conventional technology using the multi-month channel photo-process. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a partial plan view showing a preferred embodiment of the present invention. Returning to the first figure: a partial plan view of a signal line of a preferred embodiment of the present invention. FIG. 3 is a partial plan view showing a preferred embodiment of the present invention after coating an insulating film. 7 M354807 The best negative resistance diagram of the formed signal line of the embodiment of the vehicle. The formation of the lower layer of the formed signal line of the embodiment of the vehicle is carried out. The upper layer of the formed signal line is formed by the embodiment of the preferred embodiment. The upper layer of the formed signal line is formed by the preferred embodiment.
第四圖：本創作— 案的局部剖視圖。 第五圖：本創作— 的局部剖視圖。 苐六圖：本創作_ 的局部剖視圖。 弟七圖：本創作— 的局部剖視圖。 第八 第九圖 Ο 第十圖 傳差示意圖 J乍車又佳霄施例之訊號線的局部剖視g 既有電谷式觸控面板之電極分佈平面示意圖 白知電谷式觸控面板之複層堆疊結構的對位Figure 4: This creation - a partial cutaway view of the case. Figure 5: Partial cutaway view of this creation. Figure 6: A partial cross-sectional view of this creation _. Seven Diagrams: A partial cutaway view of this creation. The eighth and the ninth figure 第十 The first part of the signal line of the J 乍 又 霄 霄 霄 g g 既 既 既 既 既 既 既 既 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极 电极Alignment of multi-layer stack structure
【主要元件符號說明】 (1 0)基板 (20) 訊號線 (21) 下層 (23)上層 (300)鏤空區 (41)電極組 (41 0)電極 (51)空白區 (11)可視區 (200)截斷端 (22)中層 (30)絕緣膜 (40)圖案化導電膜 (42)獨立電極 (50)負光阻層 (60)橫軸電極 8 M354807 (61)縱軸電極 (71)上層圖案 (70)下層圖案 (72)絕緣膜[Description of main component symbols] (1 0) Substrate (20) Signal line (21) Lower layer (23) Upper layer (300) Hollow area (41) Electrode group (41 0) Electrode (51) Blank area (11) Visible area ( 200) cut-off end (22) middle layer (30) insulating film (40) patterned conductive film (42) independent electrode (50) negative photoresist layer (60) horizontal axis electrode 8 M354807 (61) vertical axis electrode (71) upper layer Pattern (70) under layer pattern (72) insulating film