TWM328660U - Substrate processing device and control equipment thereof - Google Patents

Description

M328660 VIII. New type of description: [Technical field of the new type] The present invention relates to a substrate processing apparatus and a control device thereof for performing specific processing on a glass substrate (hereinafter simply referred to as a substrate) for a semiconductor wafer or a liquid crystal display device, in particular A technique for preparing a schedule by performing an exchange process including a treatment liquid attached to a treatment step or a washing treatment unit attached to a treatment step, and performing a process before actually performing the treatment. [Prior Art] Conventionally, such a device sets a life of a predetermined life based on the use time of the treatment liquid, and fixedly arranges the liquid exchange process for each life time in the resource of the treatment portion using the treatment liquid. Then, the use timing of each resource is arranged for each batch so as to be interposed between the "regular liquid exchange processes" thus arranged (for example, refer to Patent Document 1). That is, the periodic liquid exchange process is first pre-configured, and scheduling is performed by using the processing unit between the scheduled liquid exchange processes of the configured interactions. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-86562 [New Content] [Problems to be Solved by the Creation] However, the case of the prior example having such a configuration has the following problems. 〃 即 # , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Therefore, if the treatment step is as follows: the periodic liquid exchange treatment is arranged adjacently, the liquid exchange is performed twice in a short time as in the case of regular liquid exchange and treatment: with liquid exchange. Therefore, the problem is that the device with the M328660 liquid exchange process is scheduled. At the time of the fixed-discharge periodic liquid exchange treatment, there is a waste of the treatment liquid, and the production amount is reduced, and the above-mentioned "that is, when the batch is processed, if the batch is processed, the adverse effects such as the adverse effects of the batch are treated. "Processing" is carried out for the following reasons, if you want to treat the batch with only the new liquid, or because the liquid will be extremely deteriorated or contaminated, you want to avoid the follow-up

Further, in the drying treatment section in which the substrate is dried, there is a case where the internal cleaning is periodically performed every predetermined time: the cleaning time. In the case of &, after the periodic cleaning process is fixedly arranged, the timing of using the drying process is interposed between them, but there is still a cleaning process attached to the internal washing process in the processing step. Waste the problem of cleaning liquid

Further, the "washing treatment" is carried out by the following reasons, that is, when the batch is processed, it is only required to be cleaned and dried in the pre-treatment of the county, or because the batch is dried. The inside will be extreme/defective and want to avoid mutual contamination of subsequent batches. In the case of the author of the present invention, the object of the present invention is to provide a substrate processing apparatus and a control apparatus thereof capable of preventing waste of processing liquid even when there is a liquid exchange treatment in batch processing, and which can increase the throughput. . Further, another object of the present invention is to provide a substrate processing control device which can prevent waste of waste liquid even when there is a liquid exchange treatment in a batch process. [Technical means to solve the problem] M328660, this: The following structure is adopted for the purpose of achieving the above. The creation of the monthly long item 15 is a substrate processing apparatus having a processing method for processing the substrate by the treatment liquid; and a control day; while using the resources of the processing unit while processing The multiple batches of H determine the use timing of each resource before starting the processing, and formulate the schedule management unit when the schedule is specified by the control unit. 'Based on the life time of the treatment liquid according to the usage time of the above-mentioned & liquid, ^ material processing Department of data processing, liquid exchange, periodic liquid exchange and attachment, and the process of the exchange of the treatment liquid, the liquid exchange, the time of the previous liquid exchange treatment, and the resource allocation of the processing unit in the other processing section. Further, when the specific processing step with the accommodating liquid exchange processing is performed as described above: the liquid exchange processing is repeated in time or adjacent or close to each other, the other (4) exchange processing is deleted and the specific processing steps are preferentially arranged. The control unit arranges periodic liquid exchange processing from the previous periodic liquid exchange, the rational or incidental liquid exchange treatment, and only the life time, and the specific processing steps and periodicity accompanying the liquid exchange treatment. The liquid exchange process "deletes the periodic liquid exchange process" when the time is repeated or is arranged adjacent or close to each other, and the specific processing steps are preferentially configured. Therefore, since it is possible to prevent the liquid exchange process and the periodic liquid exchange process from being performed in a short time, even if there is an incidental amount in the batch processing, the treatment liquid can prevent the wave of the treatment liquid, and the production can be improved. 'The term "close" to the periodic liquid exchange treatment time means that M328660 has been processed from the previous liquid exchange to the life time. Further, in the present invention, the pre-processing step should be accompanied by an accompanying liquid exchange process (request item 2) immediately before the start of the processing step, and the specific processing step should be accompanied by the accompanying liquid exchange process (request item 3) immediately after the processing step. When the batch is treated with the new liquid, it is advisable to carry out the processing before the start of the processing step: When the treatment is carried out and the treatment liquid is extremely contaminated or deteriorated due to the treatment of the batch, the liquid exchange treatment should be carried out immediately after the treatment step. In the above-mentioned specific processing steps which are preferentially arranged in the present creation, the liquid exchange processing is preferably carried out from the previous liquid exchange processing or the previous periodic wide processing to the life time (request item 4). Since the supply of the processing to the processing unit is performed almost periodically, it is possible to prevent the supply system of the processing liquid from malfunctioning due to excessive supply of the supply interval for a long time. Further, in the creation system described in the claim 5, the substrate processing apparatus includes a processing unit that processes the substrate by the processing liquid, and the processing unit performs processing based on the usage time of the processing liquid. The liquid exchange process for the exchange of the treatment liquid during the life of the liquid and the liquid exchange process for the exchange of the treatment liquid with the treatment step, the control device is characterized in that it has a scheduling unit, which is based on the previous one. The periodic liquid exchange treatment or the pre-existing liquid exchange treatment is performed at the time when only the life time has elapsed, and the money exchange treatment is disposed in the processing unit, and when the liquid exchange treatment is performed, the specific _ field is stopped. Before the above-mentioned periodic liquid exchange processing is changed, the priority is set before == the above-mentioned periodic liquid delivery execution instruction unit is deleted, and the basin (4) is prepared according to the schedule; and the schedule is issued according to the scheduling section specified by the other scheduling unit M328660 Commander. According to the creation of the request item 5, the control unit arranges the periodic liquid exchange process in the resource of the processing unit at the time when only the life time has elapsed since the pre-rear liquid exchange process or the pre-charge liquid exchange process, and the specificity of the liquid exchange process is accompanied. The processing step is to delete the periodic liquid exchange processing priority configuration specific processing step when the processing step is repeated or adjacent or close to the periodic liquid exchange processing time. Therefore, since it is possible to prevent the liquid exchange process and the periodic liquid exchange process from being performed in a short time, even if it is in the treatment of the batch: the waste of the treatment liquid can be prevented during the liquid exchange treatment, and the borrowing can be improved. The creation described in claim 6 is a substrate processing device. The dry processing unit performs a dry portion on the substrate, and when the drying unit and the control batch are used, the actual door is used. The old-fashioned person handles the multi-party process. When the use of the resource is determined, and the use of the resource is determined, the control unit is based on the cleaning time of the internal cleaning by the treatment liquid according to the drying treatment unit. The internal cleaning process of the resources of the monthly no-processing department and the processing steps are carried out. First, the net treatment is carried out, and the cleaning time at the washing station of the white av light lamp first #process: second time: cooking or The previous processing with the cleaning process is only processed, and the resource processing of the *Bulk Processing Department is periodically repeated. The specific processing steps of the washing process are repeated or adjacent or close to each other. When set, delete ... qe, ten.

The above-mentioned specific processing steps are preferentially configured in the cleaning process. ...L's documented creation's control unit has been cleaned from the front-period washing place, ▼ liquid cleaning only at the time of cleaning, and the resource configuration in the dry M328660 processing unit is set to be cleaned, and #included with washing treatment When the specific processing step is arranged in such a manner that the periodic cleaning process is repeated in time, the occupational periodic cleaning process preferentially configures the teaching processing step q, so that it is possible to prevent the cleaning process and the periodic cleaning process from being performed in a short time. Therefore, even if there is a washing treatment in the batch processing, the waste of the treatment liquid can be prevented, and the production amount can be increased.

Further, the term "proximity" with respect to the periodic washing treatment time means that the washing process is within the life time from the previous washing process. In addition, in the present creation, the aforementioned processing step should be accompanied by a washing process (request item 7) immediately before the start of the processing step, and the pre-treatment step should be accompanied by the washing process immediately after the processing step (request item 8) ). In order to dry the inside of the batch, it is advisable to carry out the washing treatment immediately before the start of the treatment step. When it is necessary to wash the inside, it is advisable to carry out the washing treatment after the treatment step. Further, in the present invention, the specific processing step which is preferentially arranged, the liquid washing treatment is preferably carried out in the cleaning time from the previous liquid washing treatment or the previous periodic washing = (request item 9). Since the cleaning of the drying treatment unit is performed periodically, it is possible to prevent the failure of the drying treatment unit due to the excessively long washing interval. Further, the creation of the item 10 is a control device for a substrate processing apparatus including a drying processing unit for drying a substrate, and the drying processing unit is based on the usage time of the drying processing unit. The cleaning process of the internal cleaning process by the cleaning time of the internal cleaning of the treatment liquid, and the internal cleaning of the M328660 with the cleaning process attached to the processing step; the control and scheduling section, Zhisun/ The second type of system is characterized by the fact that it is only after the cleaning time is processed by the cleaning process of the first cleaning process: the cleaning process of the f-washing period is provided, and the drying treatment unit is configured to set the aforementioned periodicity. When the cleaning process is in the middle of the time..., the special processing steps are configured with #j ftA. ^ ^ , complex or adjacent or close, :: : The net processing preferentially configures the aforementioned specific processing step and defines two: :=r Department, base __(10) fixed production::: the creation of the item ,, the control device is cleaned from the front - regular cleaning - the cleaning process is only after the clearing interval, in the drying process: the resource allocation "cleaning process" and when the specific processing steps accompanying the washing process are repeated in time or adjacent or close to each other, the 'removal of the regular washing process is preferentially configured to preferentially configure the specific process step' because it can be prevented Since the washing process and the periodic washing process are performed in a short period of time, even if there is a washing process in the batch process, waste of the processing liquid can be prevented, and the throughput can be increased. [Embodiment] BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to an embodiment. FIG. 2 is a block diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment. The substrate processing apparatus is, for example, a device for performing a chemical liquid treatment, a cleaning treatment, and a drying treatment on the substrate W. The substrate W is housed in the cartridge 1 in a plurality of blocks (for example, 25 blocks) in an upright posture. The cassette 1 of the substrate W is placed on the input unit 3 by the M328660. In the case of θ, the θ is placed in the adjacent stage 3, and the mounting table 5 having the two mounting cassettes 1 is placed. On the opposite side of the input unit 3 of the central part of the center, there is an exit: 7. The output unit 7 stores the processed substrate W in the cassette 1 and outputs it together with the lone 1 . Similarly to the input unit 3, the output unit 7 includes two mounting stages 9 for mounting the cassette 1. At the position along the input unit 3 and the output unit 7, a first transport that is configured to be movable between them is disposed. The first transport mechanism 11 transports the plurality of substrates W together with the cartridge placed on the input unit 3 to the second transport mechanism 。). After the second transport mechanism 13 takes out all the substrates accommodated from the cartridge 1, All the substrates w are transported to the third transport mechanism 15 . After the processed substrates W are collected from the third transport mechanism 15 , the substrates w are stored in the cassette 1 and transported to the first transport mechanism 11 . The third transport mechanism 15 is configured to be movable in the longitudinal direction of the substrate processing apparatus. In the front side of the moving direction of the third conveying mechanism 15, a drying processing unit 17 for storing a plurality of substrates W in a low pressure chamber and drying them is provided. The first processing unit 19 is provided at a position in which the moving direction of the third conveying mechanism 15 is adjacent to the drying processing unit π. The first processing unit 19 includes a pure water washing treatment unit 21 for performing a pure water washing treatment on the plurality of substrates W, and a chemical liquid treatment for performing a chemical liquid treatment on the plurality of substrates W by the processing liquid. Part 23. Further, a sub-transport mechanism 25 that transports the substrate W between them is provided. The sub-transport mechanism 25 transfers the substrate W to and from the third transfer mechanism 15 in addition to the substrate transported in the first processing unit 19. The second processing unit 27 is provided at a position adjacent to the first processing unit 19. The processing unit 27 of the -12th to the M328660 2 has the same configuration as the first processing unit 19 described above. That is, the pure water washing treatment unit 29, the chemical liquid processing unit 31, and the sub transport mechanism 33 are provided. Further, the cartridge cleaning unit 35 of the second transport mechanism 13 has a function of washing out the empty cassette 1 after the second transport mechanism 13 takes out all the substrates W. The substrate processing apparatus constructed as above is integrally controlled by the control unit 37 as shown in the block diagram of Fig. 2 . The control unit 37 is constituted by a CPU or the like, and includes a scheduling unit 39 and a processing execution instruction unit 41. The memory unit 43 connected to the control unit 37 stores in advance a flow including a plurality of processing steps defined in advance by the user of the substrate processing apparatus, including how to process the substrate, a scheduling program, and a process of executing the scheduled schedule. The programmer waits. Also, schedules prepared by scheduling programs are stored. The dispatching unit 39 processes the plurality of substrates w placed in the cassette 3 and placed in the input unit 3 as a batch process, and schedules the memory in advance according to the procedure indicated by the device operator, so that the processing can be started actually. Before, the processing steps of each batch are efficiently configured according to the time series. The processing instruction unit 41 performs an operation instruction related to the processing of each processing unit or the like at an appropriate timing based on the memory set by the scheduling unit 39 and stored in the L P 43. Here is a description of the specific process. Further, in order to make the description easy to understand, only the processing steps including the chemical processing unit 23 and the processing steps before and after the processing are described, and the actual flow is simplified. For example, in the case of processing the first batch 11, the second batch 12, and the third batch 13 in sequence, the first batch of L1; the six stacks; the machine privately includes the processing by the second transport mechanism 13; 13- M328660 The step pl corresponds to the processing step p2 of the chemical liquid treatment by the chemical processing unit 23 and the processing step p3 corresponding to the second transport mechanism 13 being carried out. The second batch L2 and the third batch L3 include a processing step pl corresponding to the loading by the second transport mechanism 13, a processing step P5' corresponding to the chemical liquid processing by the chemical processing unit 23, and a second processing step 2 The processing step p3 in which the transport mechanism 13 is carried out. In addition, here, only the processing step p2 of the first batch L1 is preceded by a "specific processing step" in which the chemical liquid exchange processing ex-b is attached. This chemical exchange treatment ex-b corresponds to the accompanying liquid exchange treatment of the present creation. 10 Next, the operation of the substrate processing apparatus having the above configuration will be described with reference to Figs. 3 to 5 . Also, Figures 3 to 5 show time charts showing the process of setting up the schedule. Source side processing. In the arrangement position, for example, the scheduling unit 319 of the control unit 37 first arranges the liquid medicine parenting process at the time when the chemical liquid processing unit 23 has passed the life time T1 from the chemical liquid exchange process that has just been performed. Here, it is assumed that the periodic liquid exchange process ex is arranged from the time point of the passage of the life time to the time point of the time. Then, the first batch is scheduled in accordance with the flow of the memory unit 43. The first batch of L1 is based on the flow of the second transfer mechanism 13 and the chemical liquid processing unit 23 by the processing steps P1, P2, and P3, as shown in Fig. 3, and the chemical liquid exchange processing ex_b attached to the processing step p2. When it is set from & tl to t3, it is partially repeated with respect to the periodic liquid exchange process ex. In this case, the scheduling unit 3 9, as shown in FIG. 4, deletes the periodic liquid exchange.

Preferably, the excipient exchange treatment ex-b is included in the life time b from -14- M328660 T1. Since the supply of the treatment liquid to the chemical solution processing unit 23 is performed almost periodically (every life time T1), it is possible to prevent the supply of the treatment liquid from malfunctioning due to excessive supply of the supply interval with respect to the chemical treatment unit. After that. Next, in the second batch L2 and the third batch L3, since the liquid exchange processing ex-b attached to the processing step P5 does not exist, as shown in FIG. 5, the HfcL1, the chemical liquid exchange processing ex-b, and The periodic liquid exchange process is appropriately configured between the processing steps 1 . In addition, after the life cycle T1 has elapsed from the time when the liquid exchange process ex is performed at the time t5, the next periodic liquid exchange process ex is arranged at 6 o'clock. In this way, the scheduling unit 39 creates a row of resources for using each processing unit. After the process, the processing execution instructing unit 41 instructs each unit in accordance with the use timing of each resource, and actually processes each batch. The control unit 37 as described above is only at the time when the life time T1 has elapsed since the previous liquid exchange process. The resource of the liquid processing unit 23 is configured to periodically discharge the liquid exchange process eX, and when the specific process step associated with the liquid exchange process ex-b is repeated with the periodic liquid exchange process π, the periodic liquid exchange process ex is deleted. The specific processing step ρ2 is preferentially arranged. Therefore, since the liquid exchange processing ex_b and the periodic liquid exchange processing ex can be prevented from being performed in a short time, the waste of the treatment liquid can be prevented even if there is a liquid exchange treatment in the treatment. The present invention is not limited to the above embodiment, and the following modifications can be made. (1) Periodic liquid exchange treatment ex and incidental liquid exchange treatment ex tons, When only the above-mentioned partial repetition is repeated, even if it is adjacent (close to) between -15-M328660 when it is adjacent or separated only a little, the periodic liquid exchange process ex can be deleted and the liquid exchange process ex- b. In this case, the temporal adjacency (proximity) means that it is within the life time T1. For example, as shown in Fig. 6, although the liquid exchange process is arranged at the time point of the life time T1 from the previous liquid exchange process. However, when the processing step 0 is arranged only once at a time from this point, the processing step a accompanying the liquid exchange processing ex_b may be arranged as long as the periodic liquid exchange processing ex is deleted.

In addition, the regular liquid exchange process ex is arranged after the life-time time is ton from the incidental liquid exchange treatment. (2) The liquid exchange (with the liquid exchange treatment ex-b) is carried out not only before the treatment step, but also in the same manner as described above, even if the liquid exchange is performed thereafter. For example, as shown in Figure 7, as in the processing steps? (2) After the replacement (4), the periodic liquid exchange process ex' placement process step p2 and the incidental liquid exchange process (4) are deleted, and after the life (4) is passed from the attached liquid exchange process (4) Configure the periodic liquid exchange process ex. (7) In the above-described embodiment, the example in which the chemical liquid processing unit 23 is subjected to the liquid exchange treatment of the chemical liquid has been described. However, for example, even if the drying processing unit 17 is attached to the cleaning process inside the drying process, By performing the same schedule as described above, the effects and effects of the above-described embodiment (4) can also be exerted. In addition, the chemical liquid processing unit 23 and the drying processing unit port of the above-described embodiment are replaced by the "fourth" exchange process, and the cleaning time is performed based on the dry work department and the internal cleaning process. The periodic washing treatment of the internal washing treatment, and the incidental liquid exchange treatment before or after the treatment - 1628, M328660, step P2, which is attached to the specific processing step, is performed as a periodic washing process, and the same schedule as described above is performed. It is possible to prevent the waste of the treatment liquid for washing while performing the regular tank washing of the chemical liquid processing unit 23 and the tank washing accompanying the processing step. (4) In the above embodiment, the case where three batches are simultaneously processed is exemplified, but the present invention can be applied even in the case of processing 1 to 2 batches or 4 batches or more at the same time. [Effects of Creation] According to the substrate processing apparatus and the control device related to the present creation, the periodic liquid exchange process is performed only at the time of the life cycle from the previous periodic liquid exchange process or the previous liquid exchange process, and When the specific processing steps accompanying the liquid exchange processing and the periodic liquid exchange processing are repeated in time or adjacent or close to each other, the liquid phase exchange processing is deleted and preferentially configured: a processing step. Therefore, since the incidental liquid replacement process and the periodic liquid exchange process can be prevented from being performed in a short period of time, waste of the treatment liquid can be prevented even if the liquid exchange treatment is performed in the batch process, and the production yield can be improved. [Brief Description of the Drawings] Fig. 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to an embodiment. Fig. 2 is a block diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment. Figure 3 is a time chart showing the process of setting up the schedule. Figure 4 is a time chart showing the development process of the schedule. -17- M328660 Figure 5 is a time chart showing the process of setting up the schedule. Fig. 6 is a time chart showing other configuration examples. Fig. 7 is a timing chart showing a configuration example in the case where there is an accompanying liquid exchange process immediately after a specific processing step. [Main component symbol description]

W substrate 1 cassette 3 input unit 5 mounting table 7 output unit 9 mounting table 11 first conveying mechanism 13 second conveying mechanism 15 third conveying mechanism 17 drying processing unit 19 first processing unit 21 pure water washing processing unit 23 chemical liquid Processing unit 25 Sub-transporting mechanism 27 Second processing unit 29 Pure water washing processing unit 31 Chemical liquid processing unit 33 Sub-transporting mechanism 35 Cartridge cleaning unit -18 - M328660 37 Control unit 39 Scheduling unit 41 Processing instruction unit 43 Memory Ex-b chemical exchange treatment ex regular liquid exchange treatment

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Claims (1)

M328660 IX. Patent application scope: !.- Kind of substrate processing device, which comprises: a processing unit, which is a 斟I, a 隹-one 糸 hunter, the processing liquid is applied to the substrate; and the control unit *Time, s. When the field uses the above-mentioned α-bee and quot;, when processing a plurality of batches, the processing sequence of each resource is actually started and the scheduler is set; /, and the characteristics are as follows: According to the use time of the treatment liquid in the treatment unit, the life of the treatment liquid is used, and the treatment liquid exchange is performed using the resources of the treatment unit (4), and the treatment is carried out. The treatment is performed in the resource-distributed periodic liquid exchange process of the resource in the processing unit from the time when the life-time is passed from the pre-reported liquid exchange treatment or the pre-liquidation treatment, and the specific processing steps accompanying the liquid money treatment are When the periodic liquid exchange process is repeated in time or adjacent or close to each other, the above-described specific process steps are preferentially arranged by deleting the periodic liquid exchange process. 2. The substrate processing apparatus of claim 1, wherein the specific processing step is accompanied by an attached liquid exchange process immediately before the processing step is started. 3. The substrate processing apparatus of claim 2, wherein the specific processing step is followed by the accompanying liquid exchange processing immediately after the processing step. 4. The substrate processing apparatus according to any one of claims 1 to 3, wherein the specific processing step of preferentially arranging the liquid exchange treatment system -20-M328660 from the previous liquid exchange treatment or the previous periodic liquid exchange treatment From the life time. A control device for a substrate processing apparatus, comprising: a processing unit that processes a substrate by a processing liquid, and wherein the processing unit performs a life time based on a life of the processing liquid according to a usage time of the processing liquid. The periodic liquid exchange process for the treatment liquid exchange, and the additional liquid exchange process for the treatment liquid exchange attached to the treatment step; the control device is characterized by comprising: a scheduling unit, which is attached to the previous periodic liquid exchange process or the previous When the liquid exchange process is performed only at the time of the life time, the periodic liquid exchange process is disposed in the processing unit, and when the specific process step associated with the liquid exchange process is repeated in time or adjacent or close to the periodic liquid exchange process And deleting the predetermined liquid exchange process to preferentially arrange the specific processing steps and formulating the scheduler; and the process execution instruction unit that issues the process command based on the schedule defined by the scheduler. A substrate processing apparatus comprising: a drying processing unit that performs drying processing on a substrate; and a control unit that starts t_ while processing the plurality of batches using the resource of the processing unit of the ς = processing unit Before the treatment, the use timing of each of the lean sources is determined and the scheduler is set up; the control unit is characterized in that the control unit is based on the cleaning time of the internal cleaning by the treatment liquid according to the drying treatment unit, and the test is made, and the error is made. The periodic washing treatment of the internal washing treatment using the poor source of the dry strip processing section is considered, and: -21 - M328660 The cleaning process is carried out in the internal washing process, and the cleaning process is performed only after the cleaning time is passed from the regular cleaning process or the previous cleaning process, and the resource is periodically washed in the drying process unit. And when the specific processing step accompanying the washing process is arranged in time or overlapping or close to the periodic washing process, the periodic washing process is deleted and the specific processing step is preferentially arranged. The substrate processing apparatus of claim 6, wherein the specific processing step is accompanied by an accompanying cleaning process immediately before the processing step is started. 8. The substrate processing apparatus of claim 6, wherein the specific processing step of the month is accompanied by the accompanying cleaning process immediately after the processing step. 9. The substrate processing apparatus according to any one of claims 6 to 8, wherein the specific processing step of the prior arrangement is preceded by the cleaning process from the cleaning process or the previous periodic cleaning process. 0 ^ 10 in the cleaning time. 1. A control device for a substrate processing apparatus, comprising: a drying process for drying a substrate, and a drying process according to the drying process The use time of the processing unit is determined by the cleaning time of the internal cleaning process, the internal cleaning process, and the processing step. The control device is characterized in that the control device is attached to the cleaning device. Including: the scheduling unit is disposed at the time of the previous drying treatment step or the provision of the previous cleaning treatment or the previous cleaning step -22-M328660, and is disposed in the drying processing unit*, and is accompanied by the washing Specific treatment of the net treatment. = The aforementioned periodic washing treatment is repeated in time or adjacent: the connection is based on the departure of the above-mentioned scheduling department. -23- M328660 VII. Designated representative map: (1) The representative representative of the case is: (4). (2) A brief description of the component symbols of the representative drawing: (2) A brief description of the component symbols of the representative drawing. · 13 Second conveying mechanism 23 Chemical liquid processing unit ex-b Chemical liquid exchange processing ex Periodic liquid exchange processing LI No. 1 Batch Pi processing step P2 processing step P3 processing step T1 life time