TWM279645U - Coated object holding device of physical vapor deposition evaporator - Google Patents
Coated object holding device of physical vapor deposition evaporator Download PDFInfo
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- TWM279645U TWM279645U TW94212182U TW94212182U TWM279645U TW M279645 U TWM279645 U TW M279645U TW 94212182 U TW94212182 U TW 94212182U TW 94212182 U TW94212182 U TW 94212182U TW M279645 U TWM279645 U TW M279645U
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Description
M279645 四、創作說明(1)M279645 IV. Creation Instructions (1)
創作疋有關於一種物理痛^ 、 乳相沉積蒸鍍機之被鍍物固 ’尤指一種t設於基贫德〜 【新型所屬之技術領域】 本 持裝置 持者。 、、、鐵核:内部用以供被鍍物置設固 【先前技術】The creation is about a kind of physical pain ^, the solidification of the object to be plated in the milk phase deposition vapor deposition machine, and more particularly, a type located in the base of the poor. [Technical field to which the new type belongs] The holder of the device. 、、、 Iron core: internally used for the solidification of the plated objects [previous technology]
目前在裝飾品、餐具 等表面處理上,已大量利 vapor deposition 5 PVD) 覆,藉以增加被鍍物的耐 哥命’然如何將此等奈米 鍍物之表面上,以大幅增 已成為從事該項行業之相 習知物理氣相沉積蒸 民國專利公告第5 1 2 1 8 1號 要包括有一固定軸及多數 轉軸,於各該旋轉軸之上 座係用以供被鍵物插設固 作公轉運動外,本身亦作 (Sputtering)的奈米离隹子 用物理 來對被 熱、耐 離子以 加其機 關人士 鍍機之 揭示, 平行於 方連接 持’各 自轉運 得以披 氣相沉 鍍物表 蝕、表 連續性 械性質 所研究 被鍍物 其中該 固定軸 有一錐 該固接 動,以 覆於被 、模具半導 積(phys i ca 面進行奈米 面硬度及延 均勻方式彼 及延長使用 之重要課題 固持裝置, 被鍍物固持 且設於其上 形固接座, 座除了繞著 令濺鍍乾所 鍍物之表面 體元件 1 離子彼 長使用 覆在被 哥命’ 〇 如中華 裝置主 方之旋 該固接 固定軸 濺擊 上。 然而’習知物理氣相沉積蒸鍍機之被鍍物固持裝置, 在實際使用上仍存在有下述之問題點,由於該固接座係呈 直立狀旋轉,使該被錢物的彼覆過程以不連續方式覆芸卉 米離子,且此種物理氣相沉積之蒸鍍溫度低,並不上^At present, in the surface treatment of decorations, tableware, etc., a large amount of vapor deposition 5 PVD has been applied to increase the resistance of the plated material. How to increase the surface of these nano-plated materials has greatly increased The industry is familiar with physical vapor deposition. The Republic of China Patent Bulletin No. 5 1 2 1 8 1 includes a fixed shaft and a plurality of rotating shafts. Above each of the rotating shafts, a seat is provided for the keyed object to be inserted and fixed. In addition to the revolution movement, the nano-scale crickets, which are also sputtering, use physics to reveal the heat and ion resistance in addition to the plating machine of their organs. They are connected in parallel to the squares, and each of them can be deposited in a vapor deposition process. Surface corrosion, surface continuity, mechanical properties of the object to be plated, where the fixed shaft has a cone, which is fixed to cover the mold, mold semiconducting product (phys i ca surface, nanometer surface hardness, uniform extension, and extended use) An important subject holding device, the object to be plated and fixed on the shape of the fixed seat, in addition to the seat around the surface of the body to make the plated dry by sputtering 1 ion ions are used to cover the brother's life 〇 如 中The rotation of the device's main body is fixed and spattered on the shaft. However, the plated material holding device of the conventional physical vapor deposition vaporizer still has the following problems in practical use. The system rotates in an upright shape, so that the covering process of the covered objects is covered in a discontinuous manner, and the evaporation temperature of this physical vapor deposition is low, which is not high ^
M279645 散結合之作用,導致該被鍍物之鍍膜厚度不均勻及結合性 差’另’對於細長形或體積稍大之被鍍物,該等被鍍物將 產生相互間之遮蔽現象,而使離子顆粒產生附著不均勻等 =良現,;又,由於該奈米離子係呈拋物線方式向下掉 落’使得被鍍物上方之區域吸附(A d s ◦ r p ^丨0 n )較多的離 子’而下方則僅吸附微量離子,而形成被鍍物之彼覆層厚 度嚴重不平均;再者,由於該固接座除了繞著固定轴作公 轉運動外’本身亦作自轉運動,因此使得固持裝置之結構 相當複雜,而令製造成本無法有效獲得降低。 於是’本創作人有感於上述問題點及從事該行業多年 之經驗,並針對可進行改善之問題點,乃潛心研究配合實 際之運用’本著精益求精之精神,終於提出一種設計合理 且有效改善上述問題點之本創作。 【新型内容】 本創作之主要目的,在於提供一種物理氣相沉積蒸鑛 機之被鍍物固持裝置,其係利用固定軸與旋轉軸呈#平行 設置’並令該固接座產生傾斜狀旋轉運動,可將奈米離子 連續均勻披覆於被鍍物之表面上,以增加被鍍物之表面硬 度、耐磨性等機械性質及延長使用壽命。 ^ 為達上述之目的,本創作係提供一種物理氣相沉積齋 鍍機之被鍍物固持裝置,該固持裝置係裝設於一蒸鍍機内 部,用以對被鍍物置設固持,包括: 一傳動機構,具有一固定軸及一連接於固定軸之傳動The effect of M279645 loose coupling leads to uneven coating thickness and poor bonding of the plated object. In addition, for slender or slightly larger plated objects, these plated objects will produce mutual shielding phenomenon, so that the ions Non-uniform adhesion of particles, etc. = good appearance; and because the nano-ion system drops down in a parabolic manner, 'the area above the object to be adsorbed (A ds ◦ rp ^ 丨 0 n) with more ions' The lower part only adsorbs a small amount of ions, and the thickness of the coating layer forming the object to be plated is severely uneven. Furthermore, the fixed mount not only performs a revolving motion around a fixed axis, but also itself rotates, so the holding device The structure is quite complicated, so that the manufacturing cost cannot be effectively reduced. Therefore, “The author has felt the above problems and years of experience in the industry, and focused on the problems that can be improved, and concentrated on research and practical application.” In the spirit of excellence, he finally proposed a reasonable and effective improvement. The original creation of the above problems. [New content] The main purpose of this creation is to provide a plated material holding device for a physical vapor deposition steamer, which uses a fixed axis and a rotation axis to be set in #parallel 'and makes the fixed base rotate in an inclined manner. Movement can continuously and uniformly coat nano ions on the surface of the plated object to increase the mechanical properties such as surface hardness and wear resistance of the plated object and extend the service life. ^ In order to achieve the above purpose, this creation is to provide a plated material holding device for a physical vapor deposition Zhai plating machine. The holding device is installed inside a vapor deposition machine to hold and hold the plated material, including: A transmission mechanism having a fixed shaft and a transmission connected to the fixed shaft
第6頁 M279645Page 6 M279645
元件;以及 回接機構 行設置之旋轉軸、一用 ^鏟枳構之固定軸呈非4 轉轴與支撐臂繞著傳動機構 :^—帶動勒 該旋轉軸之二端分別連接一轉動丁;;盤構件’於 係與傳動元件相互配合轉動,以使該固轉動件 轉運動,進而達成上述之目的。口接座產生傾斜狀旋 【實施方式】 請參閱以下之詳細說 說明’並非用來對本 有關本創作之特徵及技術内容, 明與附圖,而所附圖示僅提供參考與 創作加以限制者。 請參閱第一、二及三圖所示,係分 施例應用於蒸鑛機之組合示意圖、使用狀態圖及第乍:圖: 固接座與被鍍物組合剖視圖’本創作係提供一種物理氣相 ,積蒸鍍機之被鍍物固持裝置,該固持裝置〗係裝設於一 蒸鍍機内部,用以供被鍍物置設固持,主要包括有一傳動 機構1 1及至少一固接機構12,其中: 忒傳動機構1 1係固設於蒸鍍機之内部頂面上,且其包 含有一固定軸111及一連接於固定軸U1之傳動元件112、, 該固定軸111係呈縱向鉛直狀設置,而該傳動元件丨丨2則可 為斜齒輪或斜錐輪等具有提供轉動之元件或裝置。 該固接機構12包含有一與傳動機構丨丨之固定軸丨丨i呈 非平行設置之旋轉軸121、一用以固持旋轉軸丨21之支撑^臂 M279645Components; and a rotating shaft arranged in the return mechanism, a fixed shaft with a ^ shovel structure is a non-4 rotating shaft and a support arm around the transmission mechanism: ^-drive two ends of the rotating shaft to be connected to a rotating D; The disc member 'and the transmission element cooperate with each other to rotate, so that the solid rotating member rotates, thereby achieving the above purpose. Mouth socket produces a slanted rotation [Embodiment] Please refer to the detailed description below 'It is not intended to explain the features and technical content of this creation, the description and the drawings, and the attached drawings are only for reference and creation. . Please refer to the first, second, and third figures for the combination diagram, application state diagram, and the first step of the application example of the steamer: Figure: Sectional view of the combination of the fixed seat and the plated object. 'This creative system provides a physical Gas-phase, accumulative vapor deposition machine holding device for plated material, the holding device is installed inside a vapor deposition machine for plated material holding and holding, mainly including a transmission mechanism 11 and at least one fixing mechanism 12. Among them: (1) The transmission mechanism 1 1 is fixed on the inner top surface of the evaporation machine, and includes a fixed shaft 111 and a transmission element 112 connected to the fixed shaft U1. The fixed shaft 111 is vertically vertical. The transmission element 丨 2 can be a helical gear or a helical bevel gear, which has a rotation-providing element or device. The fixing mechanism 12 includes a rotating shaft 121 that is non-parallel to the transmission shaft 丨 丨 i, and a support ^ 21 for holding the rotating shaft 丨 21.
1 2 2及一帶動旋轉軸丨2} 旋轉運動之轉般槿桦…二’122繞者傳動機構11進行 央角係介於5。二:二;;轴121與固定軸111之内 A /土·协姑& 0 /、中该内夾角在1 5。〜4 5。之g 座1^5’遠接^疋轉軸121之二端分別供一轉動件124及一固接 = 12,接,動件124係與傳動賴12;^配合轉 動猎以使该固接座1 25得以產生傾斜狀旋轉運動,該轉 動件1 24亦係可為斜齒輪或斜錐輪等具有提供轉動之元件 或裝置。 φ 该固接座125(如第三圖所示)包含有一底盤1251、一 第一插盤1 252、一第二插盤丨253及一環體1 254,該底盤 1 2 5之中心係與旋轉軸丨2 1相互鎖固連接,且於其上方處分 別設有第一插盤1 2 5 2及第二插盤1 2 53,而該環體丨2 5 4則係 •環繞於底盤1251、第一插盤1 252及第二插盤1 25 3之外部周 圍,並於底盤1251與第一插盤1252及第一插盤1252與第二 *插盤1 2 5 3間分別形成有間隔空間1 2 5 5。另者,於該第一插 盤1 252及第二插盤1 253上分別開設有多數插接孔丨25 6、 1256’ ,且各該插盤1252、1253之插接孔1256、1256,係為 對應設置,以使被鍍物得以穩固插設連接於固接座1 2 5之 _ 插接孔1 256、1 256’中。再者,於該底盤1251及環體1254 上分別開設有多數穿孔1 2 5 7 ’、1 2 5 7,令被鍍物於製作過 程中,可達成熱量散逸之效果,以提昇被鍍物之製程品 質。 而該轉盤構件1 2 3係由一圓形轉盤1 2 3 1及一連接於轉 盤1231底部之轉軸1232所構成,於該轉盤1231之外周緣處1 2 2 and the one that drives the rotation axis 丨 2} The rotation of the rotation of the hibiscus ... 2'122 The winding mechanism 11 performs a central angle of 5. Two: two ;; Within the axis 121 and the fixed axis 111 A / Tuo Xiegu & 0 /, the angle between the inside is 15. ~ 4 5. The g seat 1 ^ 5 'remote connection ^ 疋 The two ends of the rotating shaft 121 are respectively provided with a rotating member 124 and a fixed connection = 12, and the moving member 124 is connected with the transmission base 12; ^ cooperate with the rotation hunting to make the fixed connection seat 1 25 is capable of generating an oblique rotating motion, and the rotating member 1 24 can also be a helical gear or a bevel wheel, which has an element or a device for providing rotation. φ The fixed mount 125 (as shown in the third figure) includes a base plate 1251, a first insert plate 1 252, a second insert plate 253, and a ring body 1 254. The center of the base plate 1 2 5 is rotated. The shaft 丨 2 1 is locked and connected to each other, and the first insert disk 1 2 5 2 and the second insert disk 1 2 53 are respectively arranged above it, and the ring body 2 5 4 is looped around the chassis 1251 The first insert disk 1 252 and the second insert disk 1 25 3 are formed on the outer periphery, and a space is formed between the chassis 1251 and the first insert disk 1252 and the first insert disk 1252 and the second * insert disk 1 2 5 3 respectively. 1 2 5 5. In addition, the first insert disk 1 252 and the second insert disk 1 253 are respectively provided with a plurality of insertion holes 丨 25 6, 1256 ', and the insertion holes 1256 and 1256 of the insertion disks 1252 and 1253 are respectively It is correspondingly arranged so that the object to be plated can be firmly inserted and connected to the _ insertion holes 1 256 and 1 256 ′ of the fixing base 1 2 5. Furthermore, a plurality of perforations 1 2 5 7 ′ and 1 2 5 7 are respectively provided on the chassis 1251 and the ring body 1254, so that the object to be plated can achieve the effect of heat dissipation during the production process, so as to improve the object to be plated. Process quality. The turntable member 1 2 3 is composed of a circular turntable 1 2 3 1 and a rotating shaft 1232 connected to the bottom of the turntable 1231. At the outer periphery of the turntable 1231
第8頁 四、創作說明(5) 固接有支撐臂122,而轉軸1232 置(圖未示)上,並電遠接於]係連接在馬達寺驅動裝 #用爲壓電源供應器2。 使用日守係可將銑刀、鑽頭(針) J寸之刀工具等被鍍物插設固持於固接座Γ25上,而/;、 電及孔體抽出裝置7,該電弧電源供應器3連接有- 電弧% 3 1,而該離子裝晉$将在 ^ W7 ,,封^于衣置5係為一離子搶,另該氣體抽出 穑置7係為一幫浦,將蒸鍍機内部抽成真空狀態後,依各 不同被鑛物之特性而施以不同加熱溫度,—般約於3代 450 C之間,利用離子裝置5打出離子清洗該被鍍表面, f以電弧槍3一1將奈米離子自濺鍍靶4以拋物線方式濺擊 出,並再次藉離子裝置5之輔助,將電弧運作後之夺米離 子以離子裝置5將其做一次更小的細化,而該固接則 系,著奈米離子向下掉落之方向作傾斜狀旋轉運動,以令 轅等奈米離子得以均句且連續披覆於被鍍物之表面上,最 後,再從氣體入口 6處通入含氮 '碳氣體,並施以冷卻作 業即可完成鍍層之製作。 請參閱第四及五圖所示,係分別為本創作之固接座另 貫施例及又一實施例組合剖視圖,本創作之固接座1 2 5 除可為上述實施例之型態外,該固接座1 2 5可由一底盤 U51、一設於底盤1251上方之第一插盤1252及一設於底盤 1 251及第一插盤1 252之外部周圍之環體1 2 54所構成,於該 扈盤1251、第一插盤1 2 52及環體1 2 54間係形成有一間隔空 間1 255,於該第一插盤1 2 5 2上設有多數插接孔1 2 5 6,而該 M279645 四、創作說明(6) 底盤1251上則設有多數穿孔;[257,及多數凹槽1 2 58,該等 凹槽1 2 5 8係分別與各該插接孔1 2 5 6對應設置,藉以供被鍍 物插設固定(如第四圖所示)。另針對各種不同形狀或尺寸 之被鑛物,亦可在該底盤丨251上直接延伸設有多數凸柱 1 2 5 9及開設有穿孔1 2 5 7 ’,該等凸柱1 2 5 9係供具有孔洞之 被鐘物插设連接(如第五圖所示)。 請參閱第六圖所示,係為本創作第二實施例應用於蒸 鑛機之組合示意圖,本創作之固接機構丨2除可為上述實施 例單組設置外,亦可由複數組固接機構丨2所構成,且各該 固接機構1 2係為等間隔對應設置,且係繞著傳動機構丨丨進 行%轉運動’並令各该固接座125產生旋轉運動,藉以達 成運轉過程中之受力平衡及增加生產速度。 本創作物理氣相沉積蒸鍍機之被鍍物固持裝置,不僅 可改善習用之種種缺點,並具有下述之優點:由於該固定 f :系呈傾斜狀旋轉’得以順向承接奈米離子拋物線方式之 f落,並在被鍍物之表面以連續性方式覆蓋奈米離子, 々被鍍物之鍍膜厚度均勻及結合性佳;另,本 裝置結構簡單,製造成本低廉及維修方面 i 者,本創作之固持裝置不受限於不同形狀、+再 被鍍物,更增使用之廣泛性及適用範圍。 、之 綜上所述,當知本創作之物理氣相沉 物固拄驴罟ρ目亡方In @枝之被鍍 U持裝置已具有產業利用性、新穎性與進 作之構造亦不曾見於同類產品及公開使用, 創 於諸類刊物上,完全符合新型專利申請要件。叫1未見Page 8 4. Creation instructions (5) A support arm 122 is fixedly connected, and a rotating shaft 1232 is placed (not shown in the figure), and is electrically connected to] is connected to the motor temple drive device #Used as a voltage power supply 2. With the Nissei system, the objects to be plated, such as milling cutters, drills (pins), J-inch knife tools, etc. can be inserted and held on the fixed base Γ25, and / ;, electrical and hole extraction device 7, the arc power supply 3 Connected with-arc% 31, and the ion device will be placed at ^ W7, and sealed in the clothes set 5 series as an ion grab, and the gas is drawn out and the 7 series is set as a pump, the inside of the vapor deposition machine After being evacuated, different heating temperatures are applied according to the characteristics of the different minerals, typically between 450 C and 3 generations. The ionized device 5 is used to clean the surface to be plated. F The arc gun 3 to 1 The nano-ion self-sputtering target 4 is sputtered out in a parabolic manner, and again with the assistance of the ion device 5, the rice ion after the arc operation is further refined by the ion device 5 and the solid Then, the nano ions are tilted and rotated in a downward direction so that the nano ions such as tritium can be uniformly and continuously covered on the surface of the object to be plated. Finally, from the gas inlet 6 Nitrogen-containing carbon gas is passed in and cooled to complete the production of the coating. Please refer to the fourth and fifth figures, which are sectional views of another embodiment and another embodiment of the fixed mount of this creation. The fixed mount 1 2 5 of this creation can be in addition to the above embodiment. The fixed base 1 2 5 can be composed of a chassis U51, a first insert disc 1252 provided above the chassis 1251, and a ring body 1 2 54 provided on the outer periphery of the chassis 1 251 and the first insert disc 1 252. A space 1 255 is formed between the pan plate 1251, the first insert plate 1 2 52 and the ring body 1 2 54. A plurality of insertion holes 1 2 5 6 are provided on the first insert plate 1 2 5 2 And the M279645 Fourth, creation instructions (6) The chassis 1251 is provided with a large number of perforations; [257, and most of the grooves 1 2 58, the grooves 1 2 5 8 are respectively connected to the plug holes 1 2 5 6 corresponding settings, so that the plated objects can be inserted and fixed (as shown in the fourth figure). In addition, for various substrates of different shapes or sizes, many protrusions 1 2 5 9 and perforations 1 2 5 7 'can be directly extended on the chassis 丨 251. These protrusions 1 2 5 9 are provided for The bell-shaped object with holes is inserted and connected (as shown in the fifth figure). Please refer to the sixth figure, which is a schematic diagram of the combination of the second embodiment of the present invention applied to the steamer. The fixed connection mechanism of this creation can be set in a single group in the above embodiment, or it can be fixed by a complex array. The mechanism 丨 2 is formed, and each of the fixed mechanisms 12 is correspondingly arranged at an equal interval, and is rotated around the transmission mechanism 丨 丨 to perform a% rotation motion 'and cause each of the fixed mounts 125 to rotate to achieve the operation process. The balance of forces and increase production speed. The holding device for the plated object of this creative physical vapor deposition vaporizer can not only improve the various shortcomings of conventional use, but also has the following advantages: Because of the fixed f: rotating in an inclined shape, the nano-ion parabola can be received in the forward direction The method of the method is to cover the surface of the object to be covered with nano ions in a continuous manner. The thickness of the object to be plated is uniform and the bonding is good. In addition, the device has a simple structure, low manufacturing cost and maintenance. The holding device of this creation is not limited to different shapes, + re-plated objects, and more extensive and applicable scope. To sum up, when we know that the physical vapour deposits in this creation are solid, and do n’t see the dead side. In @ 枝 之 被 plated U holding device has industrial applicability, novelty, and advanced structure. Similar products and public use were created in various types of publications, fully complying with the requirements for new patent applications. Call 1 not seen
第10頁 M279645 四、創作說明(7) 惟以上所述者,僅為本創作之較佳實施例而已,當不 M279645 圖式簡單說明 【圖式簡單說明】 第一圖係本創作第一實施例應用於蒸鍍機之組合示意 圖。 第二圖係本創作第一實施例應用於蒸鍍機之使用狀態 圖。 第三圖係第二圖之固接座與被鍍物組合剖視圖。 第四圖係本創作之固接座另一實施例組合剖視圖。 第五圖係本創作之固接座又一實施例組合剖視圖。 第六圖係本創作第二實施例應用於蒸鍍機之組合示意 圖。 【主要元件符號說明: 【本創作】 固定軸11 1 固接機構1 2 支撐臂1 2 2 轉盤1231 轉動件124 底盤1251 第二插盤1 2 5 3 間隔空間1 2 5 5 穿孔 1 2 5 7,1 2 5 7 ’ 凸柱1 2 5 9 固持裝置1 傳動機構11 傳動元件11 2 旋轉軸1 2 1 轉盤構件1 2 3 轉軸1 2 3 2 固定座125 第一插盤1 2 5 2 環體1254 插接孔 1 2 5 6,1 2 5 6 ’ 凹槽1258Page 10 M279645 IV. Creation Instructions (7) The above is only the preferred embodiment of this creation. When the M279645 diagram is simply explained, the first diagram is the first implementation of this creation. The example is applied to the vapor deposition machine. The second figure is a use state diagram of the first embodiment of the present invention applied to the vapor deposition machine. The third figure is a sectional view of the combination of the fixing seat and the plated object in the second figure. The fourth figure is a combined sectional view of another embodiment of the fixing base of the present invention. The fifth figure is a combined sectional view of another embodiment of the fixing base of the present invention. The sixth diagram is a schematic combination diagram of the second embodiment of the present invention applied to a vapor deposition machine. [Description of the main component symbols: [This creation] Fixed shaft 11 1 Fixing mechanism 1 2 Support arm 1 2 2 Turntable 1231 Rotating part 124 Chassis 1251 Second insert disk 1 2 5 3 Space 1 2 5 5 Perforation 1 2 5 7 , 1 2 5 7 'convex column 1 2 5 9 holding device 1 transmission mechanism 11 transmission element 11 2 rotary shaft 1 2 1 rotary plate member 1 2 3 rotary shaft 1 2 3 2 fixed seat 125 first insert plate 1 2 5 2 ring body 1254 socket 1 2 5 6, 1 2 5 6 'recess 1258
第12頁 M279645 圖式簡單說明 偏壓電源供應器2 電弧電源供應!§' 3 電弧槍31 濺鍍靶4 離子裝置5 氣體入口 6 氣體抽出裝置7 fl丨Page 12 M279645 Brief description of the diagram Bias power supply 2 Arc power supply! § '3 Arc gun 31 Sputter target 4 Ion device 5 Gas inlet 6 Gas extraction device 7 fl 丨
第13頁Page 13
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TW94212182U TWM279645U (en) | 2005-07-19 | 2005-07-19 | Coated object holding device of physical vapor deposition evaporator |
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TW94212182U TWM279645U (en) | 2005-07-19 | 2005-07-19 | Coated object holding device of physical vapor deposition evaporator |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI397598B (en) * | 2008-10-15 | 2013-06-01 |
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2005
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TWI397598B (en) * | 2008-10-15 | 2013-06-01 |
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