TWI871700B - 鈰系研磨材、研磨液、研磨液之製造方法及玻璃研磨方法 - Google Patents
鈰系研磨材、研磨液、研磨液之製造方法及玻璃研磨方法 Download PDFInfo
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- TWI871700B TWI871700B TW112125843A TW112125843A TWI871700B TW I871700 B TWI871700 B TW I871700B TW 112125843 A TW112125843 A TW 112125843A TW 112125843 A TW112125843 A TW 112125843A TW I871700 B TWI871700 B TW I871700B
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- niobium
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- 150000002009 diols Chemical class 0.000 description 1
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 210000000245 forearm Anatomy 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000003100 immobilizing effect Effects 0.000 description 1
- 229910001449 indium ion Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910052590 monazite Inorganic materials 0.000 description 1
- 235000019691 monocalcium phosphate Nutrition 0.000 description 1
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium oxide Inorganic materials [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 239000000941 radioactive substance Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/241—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion containing two or more rare earth metals, e.g. NdPrO3 or LaNdPrO3
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022111810 | 2022-07-12 | ||
| JP2022-111810 | 2022-07-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202408964A TW202408964A (zh) | 2024-03-01 |
| TWI871700B true TWI871700B (zh) | 2025-02-01 |
Family
ID=89536763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112125843A TWI871700B (zh) | 2022-07-12 | 2023-07-11 | 鈰系研磨材、研磨液、研磨液之製造方法及玻璃研磨方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP7670231B2 (https=) |
| KR (1) | KR20250018539A (https=) |
| CN (1) | CN119137235A (https=) |
| TW (1) | TWI871700B (https=) |
| WO (1) | WO2024014425A1 (https=) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200426206A (en) * | 2003-04-17 | 2004-12-01 | Mitsui Mining & Smelting Co | Cerium-based abrasive |
| JP2007031261A (ja) * | 2005-06-23 | 2007-02-08 | Hitachi Chem Co Ltd | 酸化セリウム組成物、それを用いた研磨材及び基板の研磨方法 |
| CN103865403A (zh) * | 2014-03-18 | 2014-06-18 | 海城海美抛光材料制造有限公司 | 一种粒度小且分布窄的稀土抛光粉制备方法 |
| CN104017500A (zh) * | 2014-06-11 | 2014-09-03 | 泰安麦丰新材料科技有限公司 | 一种稀土抛光粉的制备方法 |
| KR20190078981A (ko) * | 2017-12-27 | 2019-07-05 | 주식회사 케이씨텍 | 표면개질된 산화 세륨 연마입자의 제조방법 및 이를 포함하는 연마 슬러리 조성물 |
| CN111051463A (zh) * | 2017-09-11 | 2020-04-21 | 昭和电工株式会社 | 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2545830B1 (fr) * | 1983-05-13 | 1986-01-03 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
| TWI281493B (en) * | 2000-10-06 | 2007-05-21 | Mitsui Mining & Smelting Co | Polishing material |
| KR100679966B1 (ko) | 2003-10-31 | 2007-02-08 | 미쓰이 긴조꾸 고교 가부시키가이샤 | 세륨계 연마재 및 세륨계 연마재의 제조 방법 |
| WO2010118553A1 (en) | 2009-04-15 | 2010-10-21 | Rhodia (China) Co., Ltd. | A cerium-based particle composition and the preparation thereof |
| JP4954338B1 (ja) | 2011-04-14 | 2012-06-13 | 旭硝子株式会社 | ガラス製品の製造方法 |
| EP3354705B1 (en) | 2015-09-25 | 2021-10-06 | Showa Denko K.K. | Cerium-based abrasive material and process for producing same |
-
2023
- 2023-07-10 WO PCT/JP2023/025421 patent/WO2024014425A1/ja not_active Ceased
- 2023-07-10 KR KR1020247043321A patent/KR20250018539A/ko active Pending
- 2023-07-10 CN CN202380037546.1A patent/CN119137235A/zh active Pending
- 2023-07-10 JP JP2024510220A patent/JP7670231B2/ja active Active
- 2023-07-11 TW TW112125843A patent/TWI871700B/zh active
-
2024
- 2024-12-06 JP JP2024213113A patent/JP2025027140A/ja active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200426206A (en) * | 2003-04-17 | 2004-12-01 | Mitsui Mining & Smelting Co | Cerium-based abrasive |
| JP2007031261A (ja) * | 2005-06-23 | 2007-02-08 | Hitachi Chem Co Ltd | 酸化セリウム組成物、それを用いた研磨材及び基板の研磨方法 |
| CN103865403A (zh) * | 2014-03-18 | 2014-06-18 | 海城海美抛光材料制造有限公司 | 一种粒度小且分布窄的稀土抛光粉制备方法 |
| CN104017500A (zh) * | 2014-06-11 | 2014-09-03 | 泰安麦丰新材料科技有限公司 | 一种稀土抛光粉的制备方法 |
| CN111051463A (zh) * | 2017-09-11 | 2020-04-21 | 昭和电工株式会社 | 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法 |
| KR20190078981A (ko) * | 2017-12-27 | 2019-07-05 | 주식회사 케이씨텍 | 표면개질된 산화 세륨 연마입자의 제조방법 및 이를 포함하는 연마 슬러리 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2025027140A (ja) | 2025-02-26 |
| KR20250018539A (ko) | 2025-02-06 |
| JPWO2024014425A1 (https=) | 2024-01-18 |
| JP7670231B2 (ja) | 2025-04-30 |
| CN119137235A (zh) | 2024-12-13 |
| TW202408964A (zh) | 2024-03-01 |
| WO2024014425A1 (ja) | 2024-01-18 |
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