JPWO2024014425A1 - - Google Patents

Info

Publication number
JPWO2024014425A1
JPWO2024014425A1 JP2024510220A JP2024510220A JPWO2024014425A1 JP WO2024014425 A1 JPWO2024014425 A1 JP WO2024014425A1 JP 2024510220 A JP2024510220 A JP 2024510220A JP 2024510220 A JP2024510220 A JP 2024510220A JP WO2024014425 A1 JPWO2024014425 A1 JP WO2024014425A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024510220A
Other languages
Japanese (ja)
Other versions
JP7670231B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024014425A1 publication Critical patent/JPWO2024014425A1/ja
Priority to JP2024213113A priority Critical patent/JP2025027140A/ja
Application granted granted Critical
Publication of JP7670231B2 publication Critical patent/JP7670231B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/241—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion containing two or more rare earth metals, e.g. NdPrO3 or LaNdPrO3
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2024510220A 2022-07-12 2023-07-10 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法 Active JP7670231B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024213113A JP2025027140A (ja) 2022-07-12 2024-12-06 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022111810 2022-07-12
JP2022111810 2022-07-12
PCT/JP2023/025421 WO2024014425A1 (ja) 2022-07-12 2023-07-10 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024213113A Division JP2025027140A (ja) 2022-07-12 2024-12-06 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法

Publications (2)

Publication Number Publication Date
JPWO2024014425A1 true JPWO2024014425A1 (https=) 2024-01-18
JP7670231B2 JP7670231B2 (ja) 2025-04-30

Family

ID=89536763

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024510220A Active JP7670231B2 (ja) 2022-07-12 2023-07-10 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法
JP2024213113A Pending JP2025027140A (ja) 2022-07-12 2024-12-06 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024213113A Pending JP2025027140A (ja) 2022-07-12 2024-12-06 セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法

Country Status (5)

Country Link
JP (2) JP7670231B2 (https=)
KR (1) KR20250018539A (https=)
CN (1) CN119137235A (https=)
TW (1) TWI871700B (https=)
WO (1) WO2024014425A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035075A (ja) * 1983-05-13 1985-02-22 ローヌ―プーラン・スペシアリテ・シミーク 新規なセリウム系研磨組成物及びその製造法
WO2002031079A1 (en) * 2000-10-06 2002-04-18 Mitsui Mining & Smelting Co.,Ltd. Abrasive material
JP2012524129A (ja) * 2009-04-15 2012-10-11 ロディア チャイナ カンパニー、リミテッド セリウム系粒子組成物およびその調製
JP2012219006A (ja) * 2011-04-14 2012-11-12 Asahi Glass Co Ltd ガラス製品の製造方法
WO2017051629A1 (ja) * 2015-09-25 2017-03-30 昭和電工株式会社 セリウム系研磨材及びその製造方法
WO2019049932A1 (ja) * 2017-09-11 2019-03-14 昭和電工株式会社 セリウム系研磨材用原料の製造方法、及びセリウム系研磨材の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI313707B (en) * 2003-04-17 2009-08-21 Mitsui Mining & Smelting Co Cerium-based abrasive
KR100679966B1 (ko) 2003-10-31 2007-02-08 미쓰이 긴조꾸 고교 가부시키가이샤 세륨계 연마재 및 세륨계 연마재의 제조 방법
JP2007031261A (ja) * 2005-06-23 2007-02-08 Hitachi Chem Co Ltd 酸化セリウム組成物、それを用いた研磨材及び基板の研磨方法
CN103865403B (zh) * 2014-03-18 2015-07-29 海城海美抛光材料制造有限公司 一种粒度小且分布窄的稀土抛光粉制备方法
CN104017500A (zh) * 2014-06-11 2014-09-03 泰安麦丰新材料科技有限公司 一种稀土抛光粉的制备方法
KR102479603B1 (ko) * 2017-12-27 2022-12-22 주식회사 케이씨텍 표면개질된 산화 세륨 연마입자의 제조방법 및 이를 포함하는 연마 슬러리 조성물

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035075A (ja) * 1983-05-13 1985-02-22 ローヌ―プーラン・スペシアリテ・シミーク 新規なセリウム系研磨組成物及びその製造法
WO2002031079A1 (en) * 2000-10-06 2002-04-18 Mitsui Mining & Smelting Co.,Ltd. Abrasive material
JP2012524129A (ja) * 2009-04-15 2012-10-11 ロディア チャイナ カンパニー、リミテッド セリウム系粒子組成物およびその調製
JP2012219006A (ja) * 2011-04-14 2012-11-12 Asahi Glass Co Ltd ガラス製品の製造方法
WO2017051629A1 (ja) * 2015-09-25 2017-03-30 昭和電工株式会社 セリウム系研磨材及びその製造方法
WO2019049932A1 (ja) * 2017-09-11 2019-03-14 昭和電工株式会社 セリウム系研磨材用原料の製造方法、及びセリウム系研磨材の製造方法

Also Published As

Publication number Publication date
JP2025027140A (ja) 2025-02-26
KR20250018539A (ko) 2025-02-06
TWI871700B (zh) 2025-02-01
JP7670231B2 (ja) 2025-04-30
CN119137235A (zh) 2024-12-13
TW202408964A (zh) 2024-03-01
WO2024014425A1 (ja) 2024-01-18

Similar Documents

Publication Publication Date Title
BR102023014872A2 (https=)
JPWO2024014425A1 (https=)
BR102023012440A2 (https=)
BR102023010976A2 (https=)
BR102023009641A2 (https=)
BR102023008688A2 (https=)
BR102023007252A2 (https=)
BR102023005164A2 (https=)
BR102023001987A2 (https=)
BR102023001877A2 (https=)
BR102023000289A2 (https=)
BR102022026909A2 (https=)
BR102022017795A2 (https=)
BR202022009269U2 (https=)
BR202022005961U2 (https=)
BR202022001779U2 (https=)
BR202022000931U2 (https=)
BY13141U (https=)
BY13152U (https=)
BY13136U (https=)
BY13137U (https=)
BY13138U (https=)
BY13139U (https=)
BY13140U (https=)
CN307049445S (https=)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240216

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20240216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240402

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20240528

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240612

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20240910

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241206

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20241213

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250318

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250331

R150 Certificate of patent or registration of utility model

Ref document number: 7670231

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150