TWI839439B - Heat treatment furnace - Google Patents
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- TWI839439B TWI839439B TW109101011A TW109101011A TWI839439B TW I839439 B TWI839439 B TW I839439B TW 109101011 A TW109101011 A TW 109101011A TW 109101011 A TW109101011 A TW 109101011A TW I839439 B TWI839439 B TW I839439B
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 57
- 238000005192 partition Methods 0.000 claims abstract description 106
- 238000004891 communication Methods 0.000 claims description 17
- 230000032258 transport Effects 0.000 abstract description 36
- 238000005516 engineering process Methods 0.000 abstract description 5
- 230000005540 biological transmission Effects 0.000 description 11
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 4
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 239000007773 negative electrode material Substances 0.000 description 2
- 239000007774 positive electrode material Substances 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
- F27B9/028—Multi-chamber type furnaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
- F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
- F27B9/2407—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor the conveyor being constituted by rollers (roller hearth furnace)
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/36—Arrangements of heating devices
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Tunnel Furnaces (AREA)
- Furnace Details (AREA)
- Control Of Heat Treatment Processes (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Abstract
本發明提供適當地維持熱處理爐內的各空間的爐氛溫度的技術。熱處理爐對被處理物進行熱處理。熱處理爐具備爐體和輸送裝置,前述爐體具備:以第一溫度對被處理物進行熱處理的第一空間、以與第一溫度不同的第二溫度對被處理物進行熱處理的第二空間、以及隔開第一空間與第二空間的間隔壁,前述輸送裝置將被處理物從第一空間的一端輸送至第二空間的另一端。間隔壁具備連通通道和第三空間,前述連通通道使第一空間與第二空間連通,前述第三空間設置於間隔壁內,與第一空間和第二空間隔開,並且與連通通道連通。 The present invention provides a technology for properly maintaining the furnace atmosphere temperature of each space in a heat treatment furnace. The heat treatment furnace performs heat treatment on the treated object. The heat treatment furnace has a furnace body and a conveying device, the furnace body has: a first space for heat treating the treated object at a first temperature, a second space for heat treating the treated object at a second temperature different from the first temperature, and a partition wall separating the first space and the second space, the conveying device transports the treated object from one end of the first space to the other end of the second space. The partition wall has a connecting channel and a third space, the connecting channel connects the first space with the second space, the third space is arranged in the partition wall, separated from the first space and the second space, and connected to the connecting channel.
Description
本說明書所公開的技術關於對被處理物進行熱處理的熱處理爐。 The technology disclosed in this specification relates to a heat treatment furnace for heat treating a treated object.
有時使用熱處理爐(例如,輥式爐窯等)對被處理物進行熱處理。這種熱處理爐中,將爐體的內部空間分割為多個空間,被處理物依次被輸送至這些空間。利用調整爐體內部的各空間的爐氛溫度來實施被處理物的熱處理所需的各步驟(例如,脫黏合劑步驟、燒製步驟等)。多個空間配合各步驟而各自被調整為不同的爐氛溫度。例如,專利文獻1中公開了熱處理爐的一例。 Sometimes a heat treatment furnace (e.g., a roller kiln) is used to heat treat the object to be treated. In such a heat treatment furnace, the internal space of the furnace body is divided into multiple spaces, and the object to be treated is transported to these spaces in sequence. The various steps required for heat treatment of the object to be treated (e.g., debonding step, firing step, etc.) are implemented by adjusting the furnace atmosphere temperature of each space inside the furnace body. Multiple spaces are adjusted to different furnace atmosphere temperatures in accordance with each step. For example, Patent Document 1 discloses an example of a heat treatment furnace.
專利文獻1:日本特開2016-156612號公報 Patent document 1: Japanese Patent Publication No. 2016-156612
為了以期望的溫度分佈對被處理物進行熱處理,需要分別控制爐體內部的各空間的爐氛溫度,適當地維持各空間的爐氛溫度。然而,在各空間中,在與爐氛溫度不同的其它空間相鄰之區域附近,由於從相鄰的一個空間向另一個空間的熱傳導等影響,有時無法將該空間的爐氛溫度適當地維持在期望的溫度。因此,產生如下問題:在相鄰之爐氛溫度不同的兩個空間的邊界的附近,難以將被處理物控制為期望的溫度分佈。本說明書公開了適當地維持熱處理爐內的各空間的爐氛溫度的技術。 In order to perform heat treatment on the object to be processed with the desired temperature distribution, it is necessary to control the furnace atmosphere temperature of each space inside the furnace body separately and appropriately maintain the furnace atmosphere temperature of each space. However, in each space, near the area adjacent to other spaces with different furnace atmosphere temperatures, due to the influence of heat conduction from one adjacent space to another space, it is sometimes impossible to appropriately maintain the furnace atmosphere temperature of the space at the desired temperature. Therefore, the following problem arises: near the boundary of two adjacent spaces with different furnace atmosphere temperatures, it is difficult to control the object to be processed to the desired temperature distribution. This specification discloses a technology for appropriately maintaining the furnace atmosphere temperature of each space in a heat treatment furnace.
本說明書所公開的熱處理爐對被處理物進行熱處理。熱處理爐具備爐體和輸送裝置,上述爐體具備:以第一溫度對被處理物進行熱處理的第一空間、以與第一溫度不同的第二溫度對被處理物進行熱處理的第二空間、以及隔開第一空間與第二空間的間隔壁,上述輸送裝置將被處理物從第一空間的一端輸送至第二空間的另一端。間隔壁具備連通通道和第三空間,上述連通通道使第一空間與第二空間連通,上述第三空間設置於間隔壁內,藉由間隔壁而與第一空間和第二空間隔開,並且與連通通道連通。 The heat treatment furnace disclosed in this specification performs heat treatment on the treated object. The heat treatment furnace has a furnace body and a conveying device. The furnace body has: a first space for heat treating the treated object at a first temperature, a second space for heat treating the treated object at a second temperature different from the first temperature, and a partition wall separating the first space and the second space. The conveying device transports the treated object from one end of the first space to the other end of the second space. The partition wall has a connecting channel and a third space. The connecting channel connects the first space with the second space. The third space is arranged in the partition wall, separated from the first space and the second space by the partition wall, and connected to the connecting channel.
上述的熱處理爐中,在隔開第一空間與第二空間的間隔壁內設置有第三空間。由此,能抑制從第一空間和第二空間當中的一個空間向另一個空間的熱傳遞的影響。因此,能分別適當地維持第一空間內的爐氛溫度和第二空間內的爐氛溫度。 In the above-mentioned heat treatment furnace, a third space is provided in the partition wall separating the first space and the second space. Thus, the influence of heat transfer from one of the first space and the second space to the other space can be suppressed. Therefore, the furnace atmosphere temperature in the first space and the furnace atmosphere temperature in the second space can be appropriately maintained respectively.
10:熱處理爐 10: Heat treatment furnace
12:被處理物 12: Objects to be processed
20:爐體 20: Furnace body
22:頂壁 22: Top wall
24:底壁 24: Bottom wall
26a~26d:側壁 26a~26d: Side wall
28a,28b:開口 28a,28b: Opening
30a,30b:間隔壁 30a,30b: next door
32a,32b:第一間隔壁 32a,32b: The first next door
34a,34b:第二間隔壁 34a,34b: The second room next door
36:連通通道 36: Connecting channel
38:第三空間 38: The Third Space
40:第一空間 40: First Space
42:第二空間 42: Second Space
44a~44d:加熱器 44a~44d: Heater
46a~46c:供氣流道 46a~46c: air supply channel
48a~48c:排氣流道 48a~48c: Exhaust channel
52:輸送輥 52:Conveyor roller
54:第一驅動裝置 54: First drive device
56:第二驅動裝置 56: Second drive device
58:第三驅動裝置 58: Third drive device
60:控制裝置 60: Control device
62a,62b:感測器 62a,62b:Sensor
L1~L3:尺寸 L1~L3: Size
圖1顯示實施例之熱處理爐的簡要結構,且係以與被處理物的輸送方向平行的平面切斷了熱處理爐時的縱剖面圖。 FIG1 shows a simplified structure of a heat treatment furnace of an embodiment, and is a longitudinal cross-sectional view of the heat treatment furnace cut along a plane parallel to the conveying direction of the treated object.
圖2係圖1的II-II線的剖面圖。 Figure 2 is a cross-sectional view taken along line II-II of Figure 1.
圖3用於說明間隔壁的輸送方向的尺寸。 Figure 3 is used to illustrate the dimensions of the partition wall in the transport direction.
預先列出以下說明的實施例的主要特徵。此外,以下記載的技術要素係各自獨立的技術要素,係單獨或者利用各種組合來發揮技術上的有用性,並不限定於申請時請求項所記載的組合。 The main features of the embodiments described below are listed in advance. In addition, the technical elements described below are independent technical elements, which can be used alone or in various combinations to exert technical usefulness, and are not limited to the combination described in the application.
(特徵1)本說明書所公開的熱處理爐還可具備:排氣流道,設置於爐體,其一端與第三空間連通,另一端連通至爐體的外部,且將第三空間內的氣體排出到爐體的外部。根據如此結構,利用排氣流道,將經由連通通道流入到第三空間內之第一空間內的氣體和第二空間內的氣體排出到爐體的外部。由此,能抑制氣體經由連通通道在第一空間與第二空間之間移動。 (Feature 1) The heat treatment furnace disclosed in this specification may also have: an exhaust flow channel, which is arranged in the furnace body, one end of which is connected to the third space, and the other end is connected to the outside of the furnace body, and the gas in the third space is discharged to the outside of the furnace body. According to such a structure, the exhaust flow channel is used to discharge the gas in the first space and the gas in the second space that flow into the third space through the connecting channel to the outside of the furnace body. In this way, the gas can be suppressed from moving between the first space and the second space through the connecting channel.
(特徵2)本說明書所公開的熱處理爐還可具備:供氣流道,設置於爐體,其一端與第三空間連通,另一端與爐體的外部連通,且從爐體的外部向第三空間 內供給氣體。根據如此結構,能利用從供氣流道供給的氣體來調整第三空間內的溫度。因此,能利用將第三空間的溫度調整為對於第一空間的爐氛溫度和第二空間的爐氛溫度而言適當的溫度,來抑制氣體經由連通通道在第一空間與第二空間之間移動。 (Feature 2) The heat treatment furnace disclosed in this specification may also have: a gas supply channel, which is provided in the furnace body, one end of which is connected to the third space, and the other end is connected to the outside of the furnace body, and gas is supplied from the outside of the furnace body to the third space. According to such a structure, the temperature in the third space can be adjusted by using the gas supplied from the gas supply channel. Therefore, the temperature of the third space can be adjusted to a temperature appropriate for the furnace atmosphere temperature of the first space and the furnace atmosphere temperature of the second space, so as to suppress the movement of gas between the first space and the second space through the communication channel.
(特徵3)本說明書所公開的熱處理爐中,間隔壁還可具備隔開第一空間與第三空間之第一間隔壁、以及隔開第二空間與第三空間之第二間隔壁。第三空間的輸送方向的尺寸可在第一溫度比第二溫度高時小於第一間隔壁的輸送方向的尺寸,在第二溫度比第一溫度高時小於第二間隔壁的輸送方向的尺寸。根據如此結構,可適當地調整第一間隔壁、第二間隔壁和第三空間的輸送方向的尺寸,能一邊熱隔離第一空間與第二空間、一邊減少不以加熱被處理物為目的之第三空間的輸送方向的尺寸。由此,能減小間隔壁整體的輸送方向的尺寸,能縮短在未執行熱處理步驟的連通通道輸送被處理物的時間。 (Feature 3) In the heat treatment furnace disclosed in this specification, the partition wall may also include a first partition wall separating the first space and the third space, and a second partition wall separating the second space and the third space. The dimension of the third space in the transport direction may be smaller than the dimension of the first partition wall in the transport direction when the first temperature is higher than the second temperature, and smaller than the dimension of the second partition wall in the transport direction when the second temperature is higher than the first temperature. According to such a structure, the dimensions of the first partition wall, the second partition wall and the third space in the transport direction can be appropriately adjusted, and the first space and the second space can be thermally isolated while the dimension of the third space in the transport direction that is not intended to heat the treated object can be reduced. In this way, the dimension of the partition wall in the transport direction as a whole can be reduced, and the time for transporting the treated object in the connecting channel where the heat treatment step is not performed can be shortened.
(特徵4)本說明書所公開的熱處理爐中,爐體中設置有第一加熱器和第二加熱器,上述第一加熱器設置於第一空間內,能將第一空間內調整為第一溫度,上述第二加熱器設置於第二空間內,能將第二空間內調整為第二溫度,另一方面,在第三空間內可不設置加熱器。由於間隔壁將第一空間與第二空間熱隔離,因此無需在設置於間隔壁的第三空間對被處理物進行加熱,且無需在第三空間設置加熱器。此外,由於在第三空間未設置加熱器,因此能減小第三空間的輸送方向的尺寸,能縮短在未執行熱處理步驟的連通通道輸送被處理物的時間。 (Feature 4) In the heat treatment furnace disclosed in this specification, a first heater and a second heater are arranged in the furnace body. The first heater is arranged in the first space and can adjust the first space to the first temperature. The second heater is arranged in the second space and can adjust the second space to the second temperature. On the other hand, no heater is arranged in the third space. Since the partition wall thermally isolates the first space from the second space, it is not necessary to heat the processed object in the third space arranged in the partition wall, and it is not necessary to arrange a heater in the third space. In addition, since no heater is arranged in the third space, the size of the third space in the conveying direction can be reduced, and the time for conveying the processed object in the connecting channel where the heat treatment step is not performed can be shortened.
以下,對實施例所關於的熱處理爐10進行說明。如圖1所示,熱處理爐10具備爐體20和輸送被處理物12的輸送裝置(52、54、56、58)。熱處理爐10在利用輸送裝置將被處理物12輸送至爐體20內的期間對被處理物12進行熱處理。
The
作為被處理物12,例如,可舉出層疊有陶瓷制的介電質(基材)和電極的層疊體、鋰離子電池的正極材料或負極材料等。在使用熱處理爐10對陶瓷制的層疊體進行熱處理時,能將它們載置於平板狀的承燒板而在爐內輸送。此外,在使用熱處理爐10對鋰離子電池的正極材料或負極材料進行熱處理的情況下,能將它們收容於箱狀的匣缽而在爐內輸送。本實施例的熱處理爐10中,能在輸送輥52(後述)上將多個承燒板、匣缽以在輸送方向排列的狀態載置並輸送。以下,在本實施例中,將進行熱處理的物質和載置有該進行熱處理的物質的承燒板、進行收容的匣缽合起來的整體稱為“被處理物12”。
As the object to be processed 12, for example, a stack of ceramic dielectrics (substrates) and electrodes, a positive electrode material or a negative electrode material of a lithium ion battery, etc. can be cited. When the ceramic stack is heat-treated using the
如圖1和圖2所示,爐體20被頂壁22、底壁24和側壁26a~26d包圍,在內部具備間隔壁(30a、30b)。爐體20大致為長方形,頂壁22相對於底壁24平行(即,與XY平面平行)地配置。如圖1所示,側壁26a配置於輸送路徑的入口端,相對於輸送方向垂直(即,與YZ平面平行)地配置。側壁26b配置於輸送路徑的出口端,相對於側壁26a平行(即,與YZ平面平行)地配置。如圖2所示,側壁26c、26d相對於輸送方向平行、且相對於頂壁22和底壁24垂直(即,與XZ平面平行)地配置。
As shown in Figures 1 and 2, the
如圖1所示,爐體20的內部空間被間隔壁(30a、30b)分割為第一空間40和第二空間42。具體而言,間隔壁30a在側壁26a、26b之間的大致中間的位置固定於頂壁22,從頂壁22向垂直下方延伸。間隔壁30b在與間隔壁30a對應的位置固定於底壁24,從底壁24向垂直上方延伸。爐體20的內部以間隔壁(30a、30b)為邊界分成第一空間40和第二空間42。間隔壁30a與間隔壁30b之間在上下方向(Z方向)上分開,在分開之間的空間設置有連通通道36。在爐體20的側壁26a形成有開口28a,在側壁26b形成有開口28b。被處理物12由輸送裝置從開口28a輸送至熱處理爐10內,並經過連通通道36,從開口28b輸送至熱處理爐10的外部。即,開口28a用作運入口,開口28b用作運出口。
As shown in FIG1 , the internal space of the
第一空間40被頂壁22、底壁24、側壁26a、26c、26d以及間隔壁(30a、30b)包圍。第一空間40在爐體20內利用間隔壁(30a、30b)與第二空間42隔斷,由此能維持與第二空間42不同的爐氛溫度。第一空間40利用設置於側壁26a的開口28a而與熱處理爐10的外部連通,利用間隔壁30a與間隔壁30b之間的連通通道36而與第二空間42連通。在第一空間40配置有多個輸送輥52以及多個加熱器44a、44b。加熱器44a在輸送輥52的上方的位置以等間隔配置在輸送方向上,加熱器44b在輸送輥52的下方的位置以等間隔配置在輸送方向上。利用使加熱器44a、44b發熱,來對第一空間40內進行加熱。
The
第二空間42被頂壁22、底壁24、側壁26b、26c、26d以及間隔壁(30a、30b)包圍。第二空間42在爐體20內利用間隔壁(30a、30b)與第一空間40隔斷,由此能維持與第一空間40不同的爐氛溫度。第二空間42利用設置於側壁26b的開口28b
而與熱處理爐10的外部連通,利用間隔壁30a與間隔壁30b之間的連通通道36而與第一空間40連通。在第二空間42配置有多個輸送輥52以及多個加熱器44c、44d。加熱器44c在輸送輥52的上方的位置以等間隔配置在輸送方向上,加熱器44d在輸送輥52的下方的位置以等間隔配置在輸送方向上。利用使加熱器44c、44d發熱,來對第二空間42內進行加熱。第二空間42設定為與第一空間40不同的爐氛溫度,在本實施例中,使第二空間42的爐氛溫度比第一空間40的爐氛溫度高。
The
在爐體20設置有向爐體20內供給氣體的多個供氣流道46a~46c以及將爐體20內的氣體排出的多個排氣流道48a~48c。具體而言,供氣流道46a設置於底壁24,且配置於係側壁26a與間隔壁30b之間並係間隔壁30b的附近。即,供氣流道46a設置於第一空間40內的輸送方向的下游側。供氣流道46a與第一空間40連通,從爐體20的外部向第一空間40內供給爐氛氣體。利用從供氣流道46a向第一空間40供給爐氛氣體來控制第一空間40內的氣體爐氛。供氣流道46b設置於底壁24,且配置於係間隔壁30b與側壁26b之間並係側壁26b的附近。即,供氣流道46b設置於第二空間42內的輸送方向的下游側。供氣流道46b與第二空間42連通,從爐體20的外部向第二空間42內供給爐氛氣體。利用從供氣流道46b向第二空間42供給爐氛氣體來控制第二空間42內的氣體爐氛。供氣流道46c設置於底壁24,且配置於間隔壁30b的第一間隔壁32b與第二間隔壁34b(後述)之間。供氣流道46c與第三空間38(後述)連通,向第三空間38內供給氣體。從配置於爐體20的外部的氣體供給源(省略圖示)向供氣流道46a~46c供給氣體。供給到供氣流道46a~46c各者的氣體的流量由控制裝置60控制。
The
排氣流道48a設置於頂壁22,且配置於係側壁26a與間隔壁30a之間並係側壁26a的附近。即,排氣流道48a設置於第一空間40內的輸送方向的上游側。排氣流道48a與第一空間40連通,將第一空間40內的爐氛氣體排出到爐體20的外部。排氣流道48b設置於頂壁22,且配置於係間隔壁30a與側壁26b之間並係間隔壁30a的附近。即,排氣流道48b設置於第二空間42內的輸送方向的上游側。排氣流道48b與第二空間42連通,將第二空間42內的爐氛氣體排出到爐體20的外部。排氣流道48c設置於頂壁22,配置於間隔壁30a的第一間隔壁32a與第二間隔壁34a(後述)之間。排氣流道48c與第三空間38(後述)連通,將第三空間38內的氣體排出到爐體20的外部。從排氣流道48a~48c排出的氣體的流量係由控制裝置60分別控制成與分別由供氣流道46a~46c供給的氣體的流量對應。
The
另外,在本實施例中,在各空間40、42內的輸送方向的上游側設置有排氣流道48a、48b,在各空間40、42內的輸送方向的下游側設置有供氣流道46a、46b。此外,在包圍各空間40、42、38的底壁24設置有供氣流道46a~46c,在包圍各空間40、42、38的頂壁22設置有排氣流道48a~48c。然而,供氣流道和排氣流道的配置位置、配置數量不限於本實施例的構成,能根據熱處理條件等而適當變更。
In addition, in this embodiment,
接著,對間隔壁(30a、30b)的結構進行說明。間隔壁30a具備配置於與第一空間40相鄰的位置的第一間隔壁32a、以及配置於與第二空間42相鄰的位置的第二間隔壁34a。第一間隔壁32a和第二間隔壁34a在輸送方向上分開,在第一間隔壁32a與第二間隔壁34a之間設置有第三空間38的一部分。間隔壁30b具備配置於
與第一空間40相鄰的位置的第一間隔壁32b、以及配置於與第二空間42相鄰的位置的第二間隔壁34b。第一間隔壁32b配置於與第一間隔壁32a對應的位置,第二間隔壁34b配置於與第二間隔壁34a對應的位置。第一間隔壁32b和第二間隔壁34b在輸送方向上分開,在第一間隔壁32b與第二間隔壁34b之間設置有第三空間38的另一部分。即,第三空間38被頂壁22、底壁24、間隔壁30a的第一間隔壁32a和第二間隔壁34a、以及間隔壁30b的第一間隔壁32b和第二間隔壁34b所包圍,且與連通通道36連通;並且,於第三空間內沒有間隔壁。
Next, the structure of the partition walls (30a, 30b) is described. The
如圖3所示,第三空間38的輸送方向(即,X方向)的尺寸L1比第二間隔壁34a、34b的輸送方向(即,X方向)的尺寸L2小。即,為了抑制從第二空間42側向第一空間40側的熱傳導的影響,需要在一定程度上延長第二間隔壁34a、34b的輸送方向的尺寸。因此,利用使第三空間38的輸送方向的尺寸L1比第二間隔壁34a、34b的輸送方向的尺寸小,抑制了對被處理物12的熱處理沒有貢獻的間隔壁(30a、30b)的輸送方向的尺寸變長。同樣地,為了抑制從第一空間40側向第二空間42側的熱傳導的影響,需要在一定程度上延長第一間隔壁32a、32b的輸送方向的尺寸。利用使第三空間38的輸送方向的尺寸L1比第一間隔壁32a、32b的輸送方向(即,X方向)的尺寸L3小,抑制了間隔壁(30a、30b)的輸送方向的尺寸變長。此外,如圖1所示,在第三空間38中,與第一空間40和第二空間42不同,未配置加熱器。
As shown in FIG3 , the dimension L1 of the
例如,在間隔壁(30a、30b)未設置第三空間38的情況下,若第一空間40的爐氛溫度與第二空間42的爐氛溫度不同,則爐氛氣體容易從爐氛溫度高的空間向
爐氛溫度低的空間移動。例如,在如本實施例那樣將第二空間42的爐氛溫度設定為比第一空間40的爐氛溫度高的情況下,第二空間42內的爐氛氣體容易穿過連通通道36流入第一空間40內。在本實施例的熱處理爐10中,在間隔壁(30a、30b)設置有與第一空間40和第二空間42隔開並且與連通通道36連通的第三空間38。因此,即使爐氛溫度比第一空間40高的第二空間42內的爐氛氣體從第二空間42穿過連通通道36向第三空間38移動,移動到第三空間38內的爐氛氣體也難以進一步穿過連通通道36移動到第一空間40。因此,能抑制第二空間42內的爐氛氣體流入第一空間40內。
For example, when the
此外,由於在第三空間38未設置對空間內進行加熱的加熱器,因此第三空間38內的溫度難以高於空間內經加熱的第一空間40內的溫度和第二空間42內的溫度。因此,即使第一空間40內的爐氛氣體移動到第三空間38內,移動到第三空間38內的爐氛氣體也難以移動到比第三空間38內的溫度高的第二空間42。同樣地,即使第二空間42內的爐氛氣體移動到第三空間38內,移動到第三空間38內的爐氛氣體也難以移動到比第三空間38內的溫度高的第一空間40。因此,能抑制第二空間42的爐氛氣體流入第一空間40內,並且能抑制第一空間40的爐氛氣體流入第二空間42內。
In addition, since no heater is provided in the
此外,如同前述,第三空間38係與供氣流道46c和排氣流道48c連通。由供氣流道46c供給的氣體的溫度比在第一空間40內被加熱後的爐氛氣體、在第二空間42內被加熱後的爐氛氣體低。因此,可利用從供氣流道46c供給至第三空間38內的氣體,將第三空間38內的溫度調整為比第一空間40和第二空間42低。由此,
第三空間38內的氣體難以移動到第一空間40、第二空間42,能抑制氣體在第一空間40與第二空間42之間移動。此外,利用設置排氣流道48c來排出第三空間38內的氣體。因此,即使第一空間40內的爐氛氣體向第三空間38內移動,移動到第三空間38內的爐氛氣體也會從第三空間38經由排氣流道48c排出到爐體20的外部,難以從第三空間38移動到第二空間42。同樣地,即使第二空間42內的爐氛氣體向第三空間38內移動,移動到第三空間38內的爐氛氣體也會從第三空間38經由排氣流道48c排出到爐體20的外部,難以從第三空間38移動到第一空間40。由此,能抑制氣體在第一空間40與第二空間42之間移動。
In addition, as mentioned above, the
輸送裝置具備多個輸送輥52、第一驅動裝置54、第二驅動裝置56、第三驅動裝置58和控制裝置60。輸送裝置將被處理物12從第一空間40的開口28a側之一端經由連通通道36輸送至第二空間42的開口28b側之另一端。被處理物12由輸送輥52進行輸送。
The conveying device has a plurality of conveying
輸送輥52為圓筒狀,設置於第一空間40內、連通通道36內和第二空間42內,其軸線向與輸送方向垂直的方向(即,向Y方向)延伸。多個輸送輥52全部具有相同的直徑,以恒定的間距等間隔地配置在輸送方向上。輸送輥52被支撐為能環繞其軸線旋轉,利用傳遞驅動裝置的驅動力而旋轉。
The
第一驅動裝置54係對配置於第一空間40內的輸送輥52進行驅動的驅動裝置(例如,電動機)。第一驅動裝置54經由動力傳遞機構而與配置於第一空間40內的輸送輥52連接。當第一驅動裝置54的驅動力經由動力傳遞機構傳遞到第一空間
40內的輸送輥52時,則第一空間40內的輸送輥52旋轉。同樣地,第二驅動裝置56係對配置於第二空間42內的輸送輥52進行驅動的驅動裝置(例如,電動機)。第二驅動裝置56經由動力傳遞機構而與配置於第二空間42內的輸送輥52連接。當第二驅動裝置56的驅動力經由動力傳遞機構傳遞到第二空間42內的輸送輥52時,第二空間42內的輸送輥52旋轉。作為動力傳遞機構,能使用公知的動力傳遞機構,例如使用鏈輪和鏈條所成的機構。第一驅動裝置54和第二驅動裝置56驅動所對應的輸送輥52俾使第一空間40內的輸送輥52和第二空間42內的輸送輥52以大致相同的速度旋轉。第一驅動裝置54和第二驅動裝置56分別由控制裝置60控制。
The
第三驅動裝置58係對配置於連通通道36內的輸送輥52、第一空間40內的配置於連通通道36側的輸送輥52、以及第二空間42內的配置於連通通道36側的輸送輥52進行驅動的驅動裝置(例如,電動機)。第三驅動裝置58經由動力傳遞機構,而與配置於連通通道36、第一空間40的一部分和第二空間42的一部分的輸送輥52連接。當第三驅動裝置58的驅動力經由動力傳遞機構傳遞到輸送輥52時,則輸送輥52旋轉。作為動力傳遞機構,能使用公知的動力傳遞機構,例如使用鏈輪和鏈條所成的機構。第三驅動裝置58成為能利用調整輸出來改變輸送輥52的轉速的結構。利用調整第三驅動裝置58的輸出,而使與第三驅動裝置58連接的輸送輥52以與第一驅動裝置54或第二驅動裝置56連接的輸送輥52大致相同的速度旋轉(以下,也稱為低速旋轉),或以比與第一驅動裝置54或第二驅動裝置56連接的輸送輥52更高的速度旋轉(以下,也稱為高速旋轉)。第三驅動裝置58分別由控制裝置60控制。
The
在本實施例中,第一空間40內的輸送輥52係與第一驅動裝置54連接,第二空間42內的輸送輥52係與第二驅動裝置56連接,但不限定於如此結構。例如,第一空間40內的輸送輥52和第二空間42內的輸送輥52也可與一個驅動裝置連接。此外,第三驅動裝置58成為能調整輸出的結構,但不限定於如此結構。也可構成為能不切換第三驅動裝置58的輸出而使配置於連通通道36、第一空間40的一部分和第二空間42的一部分的輸送輥52低速旋轉或者高速旋轉。例如,輸送裝置也可具備:第四驅動裝置以與第一驅動裝置54和第二驅動裝置56相比更使輸送輥52高速旋轉的方式進行驅動。在如此情況下,配置於連通通道36的輸送輥52可利用離合機構而切換在使輸送輥52低速旋轉的驅動裝置(即,第一驅動裝置54或第二驅動裝置56)與使輸送輥52高速旋轉的驅動裝置(即,第四驅動裝置)之間。
In this embodiment, the conveying
接著,說明對被處理物12進行熱處理時的熱處理爐10的操作。為了對被處理物12進行熱處理,首先,使加熱器44a~44d運作而使第一空間40和第二空間42的爐氛溫度成為設定的溫度。接著,在輸送輥52上載置被處理物12。接著,使第一驅動裝置54、第二驅動裝置56、第三驅動裝置58運作,將被處理物12從熱處理爐10的開口28a經過第一空間40、連通通道36和第二空間42而輸送至熱處理爐10的開口28b。由此,被處理物12被熱處理。此外,如圖2所示,在實施例中,在輸送輥52的軸線方向(即,Y方向)上載置一個被處理物12而在熱處理爐10內輸送,但不限定於如此結構。例如,熱處理爐也可為以在輸送輥52的軸線方向上排列多個被處理物12的狀態輸送被處理物12的結構。
Next, the operation of the
對被處理物12的輸送進一步詳細地進行說明。首先,被處理物12從開口28a被運入後,在第一空間40中被輸送。在第一空間40中,利用第一驅動裝置54的運作,來使輸送輥52旋轉而對被處理物12進行輸送。此時,第三驅動裝置58以與第一驅動裝置54大致相同的輸出進行驅動,且與第三驅動裝置58連接的輸送輥52係以與第一驅動裝置54連接的輸送輥52大致相同的速度旋轉。因此,被處理物12在從開口28a被輸送到第一空間40至從第一空間40運出為止的期間,以大致相同的速度進行輸送。被處理物12在第一空間40中被輸送的期間,以第一空間40內的爐氛溫度進行熱處理。
The transportation of the processed
當被處理物12被輸送至第一空間40的下游側時,則第三驅動裝置58以使輸送輥52高速旋轉的輸出進行驅動。設置於間隔壁30a的第一間隔壁32a的第一空間40側的感測器62a檢測被處理物12,從而變更第三驅動裝置58的輸出。例如,感測器62a和後述的感測器62b能使用光學式感測器,感測器62a、62b能檢測被處理物12是否遮擋光路。當感測器62a檢測出被處理物12的前端時,則控制裝置60增大第三驅動裝置58的輸出。如此,被處理物12高速地從第一空間40被輸送至連通通道36。
When the
如同前述,間隔壁30a、30b係為了分離第一空間40的爐氛溫度和第二空間42的爐氛溫度而設置,且形成於間隔壁30a、30b之間的連通通道36係為了將被處理物12從第一空間40輸送至第二空間42而設置。因此,在連通通道36內輸送的期間,對被處理物12不進行熱處理。被處理物12在連通通道36內被高速輸送,
由此能以短時間在對熱處理沒有貢獻的連通通道36內輸送被處理物12。此外,在使對被處理物12進行熱處理的溫度產生變化時,宜溫度變化的前後將溫度差定為與被處理物12相應的溫度。利用在連通通道36中高速輸送被處理物12,能將被處理物12從第一空間40的爐氛溫度急速升溫至第二空間42的爐氛溫度。
As mentioned above, the
此外,如同前述,在第三空間38未配置加熱器。因此,第三空間38的輸送方向的尺寸無需設為能設置加熱器的大小,該尺寸能減小。此外,第三空間38的輸送方向的尺寸比第一間隔壁32a、32b和第二間隔壁34a、34b的輸送方向的尺寸小。能利用設為如此尺寸,而確保第一間隔壁32a、32b和第二間隔壁34a、34b的輸送方向的尺寸(厚度),並且減小間隔壁30a、30b整體的輸送方向的尺寸(即,連通通道36的輸送方向的尺寸)。在本實施例中,第二空間42的爐氛溫度被設定為比第一空間40的爐氛溫度高,因此特別需要充分確保第二間隔壁34a、34b的輸送方向的厚度。利用使配置於第二空間42側的第二間隔壁34a、34b的輸送方向的尺寸L2比第三空間38的輸送方向的尺寸L1大,能充分確保第二間隔壁34a、34b的輸送方向的厚度,並且能減小間隔壁30a、30b的輸送方向的尺寸。如此,能利用減小連通通道36的輸送方向的尺寸,而以短時間在對熱處理沒有貢獻的連通通道36內輸送被處理物12。
In addition, as mentioned above, no heater is configured in the
當被處理物12在連通通道36內被輸送時,則將第三驅動裝置58的輸出切換為與第二驅動裝置56大致相同的輸出。如此一來,則與第三驅動裝置58連接的輸送輥52係以與第二驅動裝置56連接的輸送輥52大致相同的速度旋轉。設置於間隔壁30a的第二間隔壁34a的第二空間42側的感測器62b檢測被處理物12,從而
變更第三驅動裝置58的輸出。具體而言,當感測器62b檢測出被處理物12的後端時,則控制裝置60減小第三驅動裝置58的輸出。如此,被處理物12在第二空間42內以低速被輸送。被處理物12在第二空間42內被輸送的期間,以第二空間42內的爐氛溫度進行熱處理。被處理物12在第二空間42內進行輸送,並從開口28b向熱處理爐10的外部運出。
When the
以上,對本說明書所公開的技術的具體例進行了詳細說明,但這些只不過係例示,並不對申請專利範圍進行限定。申請專利範圍所記載的技術包括對以上例示的具體例進行各種變形、變更而得到的技術。另外,本說明書或附圖中說明的技術要素,係單獨或者利用各種組合來發揮技術上的有用性,並不限定於申請時技術方案所記載的組合。 The above detailed descriptions of the specific examples of the technology disclosed in this specification are only examples and do not limit the scope of the patent application. The technology described in the scope of the patent application includes various modifications and changes to the specific examples illustrated above. In addition, the technical elements described in this specification or the attached drawings are technically useful alone or in various combinations, and are not limited to the combinations described in the technical solution at the time of application.
10:熱處理爐 10: Heat treatment furnace
12:被處理物 12: Objects to be processed
20:爐體 20: Furnace body
22:頂壁 22: Top wall
24:底壁 24: Bottom wall
26a~26d:側壁 26a~26d: Side wall
28a,28b:開口 28a,28b: Opening
30a,30b:間隔壁 30a,30b: next door
32a,32b:第一間隔壁 32a,32b: The first next door
34a,34b:第二間隔壁 34a,34b: The second room next door
36:連通通道 36: Connecting channel
38:第三空間 38: The Third Space
40:第一空間 40: First Space
42:第二空間 42: Second Space
44a~44d:加熱器 44a~44d: Heater
46a~46c:供氣流道 46a~46c: air supply channel
48a~48c:排氣流道 48a~48c: Exhaust channel
52:輸送輥 52:Conveyor roller
54:第一驅動裝置 54: First drive device
56:第二驅動裝置 56: Second drive device
58:第三驅動裝置 58: Third drive device
60:控制裝置 60: Control device
62a,62b:感測器 62a,62b:Sensor
Claims (4)
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01181966A (en) * | 1988-01-13 | 1989-07-19 | Matsushita Electric Ind Co Ltd | Substrate heating device |
JPH11257862A (en) * | 1998-03-12 | 1999-09-24 | Ngk Insulators Ltd | Atmosphere controller in continuous firing furnace |
JP2002310563A (en) * | 2001-04-13 | 2002-10-23 | Matsushita Electric Ind Co Ltd | Heat treating apparatus and method for manufacturing material to be heat treated |
JP2015064189A (en) * | 2013-08-26 | 2015-04-09 | 日本碍子株式会社 | Heat treatment furnace and heat treatment method |
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IT1205512B (en) * | 1986-12-30 | 1989-03-23 | Mauro Poppi | OVEN FOR COOKING CERAMIC MATERIALS SUCH AS TILES AND SIMILAR |
JPH0570822A (en) * | 1991-09-18 | 1993-03-23 | Nkk Corp | Method for carrying material in heating furnace |
JP2001328870A (en) * | 2000-05-19 | 2001-11-27 | Taiyo Yuden Co Ltd | Method for burning ceramic, tunnel type burning furnace, method and apparatus for procuding ceramic electronic part and housing unit for burning ceramic electronic part |
JP2004354043A (en) * | 2004-07-22 | 2004-12-16 | Ngk Insulators Ltd | Heat treatment method for substrate, and continuous heat treatment furnace used therefor |
KR101425213B1 (en) * | 2013-01-02 | 2014-08-01 | 허혁재 | A continuous type furnace and a control method of the same |
KR20150124207A (en) * | 2014-04-28 | 2015-11-05 | 삼성전기주식회사 | Firing furnace |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01181966A (en) * | 1988-01-13 | 1989-07-19 | Matsushita Electric Ind Co Ltd | Substrate heating device |
JPH11257862A (en) * | 1998-03-12 | 1999-09-24 | Ngk Insulators Ltd | Atmosphere controller in continuous firing furnace |
JP2002310563A (en) * | 2001-04-13 | 2002-10-23 | Matsushita Electric Ind Co Ltd | Heat treating apparatus and method for manufacturing material to be heat treated |
JP2015064189A (en) * | 2013-08-26 | 2015-04-09 | 日本碍子株式会社 | Heat treatment furnace and heat treatment method |
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