TWI836086B - Primer composition and optical semiconductor device using same - Google Patents
Primer composition and optical semiconductor device using same Download PDFInfo
- Publication number
- TWI836086B TWI836086B TW109117792A TW109117792A TWI836086B TW I836086 B TWI836086 B TW I836086B TW 109117792 A TW109117792 A TW 109117792A TW 109117792 A TW109117792 A TW 109117792A TW I836086 B TWI836086 B TW I836086B
- Authority
- TW
- Taiwan
- Prior art keywords
- primer composition
- optical semiconductor
- methacrylate
- composition
- acrylate
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 145
- 239000004065 semiconductor Substances 0.000 title claims abstract description 62
- 230000003287 optical effect Effects 0.000 title claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 54
- -1 polysiloxane Polymers 0.000 claims abstract description 51
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 26
- 229920001577 copolymer Polymers 0.000 claims abstract description 22
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 18
- 239000002904 solvent Substances 0.000 claims abstract description 14
- 150000001785 cerium compounds Chemical class 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000007259 addition reaction Methods 0.000 claims description 36
- 238000002156 mixing Methods 0.000 claims description 16
- 229910052725 zinc Inorganic materials 0.000 claims description 14
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 13
- 239000011701 zinc Substances 0.000 claims description 13
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000003752 zinc compounds Chemical class 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000000962 organic group Chemical group 0.000 claims description 7
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229920002430 Fibre-reinforced plastic Polymers 0.000 claims description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 3
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 claims description 3
- 239000011151 fibre-reinforced plastic Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 150000003527 tetrahydropyrans Chemical class 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 35
- 238000005260 corrosion Methods 0.000 abstract description 35
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 29
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical group CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 13
- ARXJGSRGQADJSQ-UHFFFAOYSA-N propylene glycol methyl ether Substances COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 12
- 229910052684 Cerium Inorganic materials 0.000 description 11
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 10
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 8
- 239000003566 sealing material Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 229920002379 silicone rubber Polymers 0.000 description 7
- 239000004945 silicone rubber Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 5
- 241000208340 Araliaceae Species 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 4
- 235000003140 Panax quinquefolius Nutrition 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 235000008434 ginseng Nutrition 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 150000003464 sulfur compounds Chemical class 0.000 description 4
- YRAJNWYBUCUFBD-UHFFFAOYSA-N 2,2,6,6-tetramethylheptane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(C)(C)C YRAJNWYBUCUFBD-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000002845 discoloration Methods 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 150000000703 Cerium Chemical class 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- UNRQTHVKJQUDDF-UHFFFAOYSA-N acetylpyruvic acid Chemical compound CC(=O)CC(=O)C(O)=O UNRQTHVKJQUDDF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 150000001622 bismuth compounds Chemical class 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 2
- 150000004696 coordination complex Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000005594 diketone group Chemical group 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001709 polysilazane Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ULYIFEQRRINMJQ-UHFFFAOYSA-N 3-methylbutyl 2-methylprop-2-enoate Chemical compound CC(C)CCOC(=O)C(C)=C ULYIFEQRRINMJQ-UHFFFAOYSA-N 0.000 description 1
- ZVYGIPWYVVJFRW-UHFFFAOYSA-N 3-methylbutyl prop-2-enoate Chemical compound CC(C)CCOC(=O)C=C ZVYGIPWYVVJFRW-UHFFFAOYSA-N 0.000 description 1
- SQNZLBOJCWQLGQ-UHFFFAOYSA-N 6,6,7,7,8,8,8-heptafluoro-2,2-dimethyloctane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(F)(F)C(F)(F)C(F)(F)F SQNZLBOJCWQLGQ-UHFFFAOYSA-N 0.000 description 1
- NQSLZEHVGKWKAY-UHFFFAOYSA-N 6-methylheptyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C(C)=C NQSLZEHVGKWKAY-UHFFFAOYSA-N 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- XFZOHDFQOOTHRH-UHFFFAOYSA-N 7-methyloctyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCOC(=O)C(C)=C XFZOHDFQOOTHRH-UHFFFAOYSA-N 0.000 description 1
- CUXGDKOCSSIRKK-UHFFFAOYSA-N 7-methyloctyl prop-2-enoate Chemical compound CC(C)CCCCCCOC(=O)C=C CUXGDKOCSSIRKK-UHFFFAOYSA-N 0.000 description 1
- COCLLEMEIJQBAG-UHFFFAOYSA-N 8-methylnonyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C(C)=C COCLLEMEIJQBAG-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004322 Butylated hydroxytoluene Substances 0.000 description 1
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- 238000007605 air drying Methods 0.000 description 1
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- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000005998 bromoethyl group Chemical group 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
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- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229960001759 cerium oxalate Drugs 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- XQTIWNLDFPPCIU-UHFFFAOYSA-N cerium(3+) Chemical compound [Ce+3] XQTIWNLDFPPCIU-UHFFFAOYSA-N 0.000 description 1
- ZMZNLKYXLARXFY-UHFFFAOYSA-H cerium(3+);oxalate Chemical compound [Ce+3].[Ce+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZMZNLKYXLARXFY-UHFFFAOYSA-H 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
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- 238000006731 degradation reaction Methods 0.000 description 1
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- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- MNUGKYRGOPILQD-UHFFFAOYSA-N dimethoxy-pentoxy-propylsilane Chemical compound C(CCC)CO[Si](OC)(OC)CCC MNUGKYRGOPILQD-UHFFFAOYSA-N 0.000 description 1
- MKRVHLWAVKJBFN-UHFFFAOYSA-N diphenylzinc Chemical compound C=1C=CC=CC=1[Zn]C1=CC=CC=C1 MKRVHLWAVKJBFN-UHFFFAOYSA-N 0.000 description 1
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- 238000009713 electroplating Methods 0.000 description 1
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- 239000003063 flame retardant Substances 0.000 description 1
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- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
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- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
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- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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- 230000000379 polymerizing effect Effects 0.000 description 1
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- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
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- 230000003014 reinforcing effect Effects 0.000 description 1
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- 230000001568 sexual effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000000341 volatile oil Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- JDLYKQWJXAQNNS-UHFFFAOYSA-L zinc;dibenzoate Chemical compound [Zn+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 JDLYKQWJXAQNNS-UHFFFAOYSA-L 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
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Abstract
本發明之課題在於提供一種底漆(primer)組成物,及使用該底漆組成物之半導體裝置,該底漆組成物係提升安裝有光半導體元件之基板,與密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物的接著性,同時防止形成於基板上之金屬電極之腐蝕,且提升底漆本身之耐熱性・可撓性。 其解決手段為一種底漆組成物,其係將安裝有光半導體元件之基板,與密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著者,且含有:(A)包含1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯之至少一者、1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,及,不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者的共聚物、(B)溶劑,及(C)鈰化合物。The subject of the present invention is to provide a primer composition and a semiconductor device using the primer composition. The primer composition enhances the additive reaction of a substrate mounted with an optical semiconductor element and seals the optical semiconductor element. The hardened polysiloxane composition improves the adhesion of the hardened material, prevents corrosion of the metal electrodes formed on the substrate, and improves the heat resistance and flexibility of the primer itself. The solution is a primer composition that adheres a substrate on which an optical semiconductor element is mounted and a cured product of an addition reaction-hardening polysiloxane composition that seals the optical semiconductor element, and contains: (A) Including at least one of acrylate and methacrylate having one or more SiH groups in one molecule, at least one of acrylate and methacrylate having one or more alkoxy groups in one molecule, and not having SiH group and a copolymer of at least one of alkoxy acrylate and methacrylate, (B) solvent, and (C) cerium compound.
Description
本發明係關於一種將安裝有光半導體元件之基板,與密封前述光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著之底漆組成物,及使用該底漆組成物之光半導體裝置。The present invention relates to a primer composition for bonding a substrate on which an optical semiconductor element is mounted to a cured product of an addition reaction curing type polysilicone composition for sealing the optical semiconductor element, and an optical semiconductor device using the primer composition.
作為光半導體裝置所熟知之發光二極體(LED)燈係以包含透明樹脂之密封材將已安裝於基板之LED予以密封之構成。作為該密封材,自過往即廣泛使用環氧樹脂基底之組成物。A light-emitting diode (LED) lamp known as an optical semiconductor device is composed of an LED mounted on a substrate sealed with a sealing material containing a transparent resin. As this sealing material, epoxy resin-based compositions have been widely used in the past.
但,環氧樹脂基底之密封材由於伴隨近年來半導體封裝之小型化或LED之高亮度化而發熱量增加或因光之短波長化,而變得容易產生龜裂或變黃,導致信賴性降低。However, epoxy resin-based sealing materials are prone to cracking or yellowing due to the increase in heat generation due to the miniaturization of semiconductor packages or the increase in brightness of LEDs in recent years or the shortening of the wavelength of light, resulting in poor reliability. reduce.
因此,從具有優異耐熱性之觀點,使用聚矽氧組成物作為密封材(專利文獻1)。尤其,由於加成反應硬化型之聚矽氧組成物可藉由加熱而短時間內硬化,故生產性良好,而適宜作為LED之密封材(專利文獻2)。Therefore, from the viewpoint of having excellent heat resistance, a polysiloxane composition is used as a sealing material (Patent Document 1). In particular, the addition reaction curable polysiloxane composition can be cured in a short time by heating, so it has good productivity and is suitable as a sealing material for LEDs (Patent Document 2).
然而,安裝LED之基板(樹脂或電極)與包含加成反應硬化型聚矽氧組成物之硬化物之密封材之接著性並非可謂係充足者。However, the adhesion between the substrate (resin or electrode) on which the LED is mounted and the sealing material including the cured product of the addition reaction curing type polysilicone composition is not sufficient.
又,聚矽氧組成物由於一般而言氣體穿透性優異,故容易受到來自外部環境之影響。LED燈在暴露於大氣中之硫化合物或廢氣等時,硫化合物等會穿透聚矽氧組成物之硬化物,被該硬化物所密封之基板上之金屬電極,尤其Ag電極會被經時性腐蝕進而變黑。作為對於此之對策,已開發出藉由使用含有SiH之丙烯酸酯之聚合物,或與丙烯酸酯之共聚物、與甲基丙烯酸酯之共聚物、與丙烯酸酯與甲基丙烯酸酯之共聚物,或聚矽氮烷化合物來抑制變黑之底漆(專利文獻3~5)。然而,仍要會更加抑制變黑的底漆。又,在使用含有SiH之丙烯酸系聚合物時,底漆膜之耐熱性為不充足,而在近年來會流通高電流之LED元件周邊導致樹脂劣化。相對於此,聚矽氮烷化合物雖然耐熱性為優異,但所形成之膜較硬,故若塗佈於搭載有多數被稱為多晶片之LED元件的安裝基板上時,膜則容易破裂。In addition, since polysiloxane compositions generally have excellent gas permeability, they are easily affected by the external environment. When an LED lamp is exposed to sulfur compounds or exhaust gases in the atmosphere, the sulfur compounds will penetrate the hardened material of the polysiloxane composition, and the metal electrodes on the substrate sealed by the hardened material, especially the Ag electrode, will be damaged over time. Sexual corrosion and then turn black. As a countermeasure against this, it has been developed to use a polymer of acrylate containing SiH, or a copolymer with acrylate, a copolymer with methacrylate, or a copolymer with acrylate and methacrylate. Or a polysilazane compound to inhibit blackening of the primer (
為了解決上述問題,本發明者等雖已開發出一種會提升已安裝LED元件之基板,與密封LED元件之加成反應硬化型聚矽氧組成物之硬化物的接著性,同時防止形成於基板上之金屬電極之腐蝕,且提升底漆本身之耐熱性・可撓性之底漆組成物,及使用該底漆組成物之LED裝置,在近年來之高密度安裝,以大電流進行驅動之LED元件之驅動下,底漆膜之耐熱性依然不充足,而在LED元件周邊導致樹脂劣化,從而要求更加耐熱之底漆組成物。 [先前技術文獻] [專利文獻]In order to solve the above problems, the inventors have developed a primer composition that improves the adhesion between the substrate on which LED components are mounted and the cured product of the addition reaction curing type polysilicone composition that seals the LED components, prevents corrosion of the metal electrode formed on the substrate, and improves the heat resistance and flexibility of the primer itself, and an LED device using the primer composition. However, in recent years, the heat resistance of the primer film is still insufficient under the high-density mounting and high-current driven LED components, which causes resin degradation around the LED components, thus requiring a more heat-resistant primer composition. [Prior technical literature] [Patent literature]
[專利文獻1]日本特開2000-198930號公報 [專利文獻2]日本特開2004-292714號公報 [專利文獻3]日本特開2010-168496號公報 [專利文獻4]日本特開2012-144652號公報 [專利文獻5]日本特開2014-157849號公報[Patent Document 1] Japanese Patent Publication No. 2000-198930 [Patent Document 2] Japanese Patent Publication No. 2004-292714 [Patent Document 3] Japanese Patent Publication No. 2010-168496 [Patent Document 4] Japanese Patent Publication No. 2012-144652 [Patent Document 5] Japanese Patent Publication No. 2014-157849
[發明所欲解決之課題][Problem to be solved by the invention]
本發明係為了解決上述問題所完成者,其目的在於提供一種提升安裝有光半導體元件之基板,與密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物的接著性,同時防止形成於基板上之金屬電極之腐蝕,且大幅提升底漆本身之耐熱性・可撓性的底漆組成物,及使用該底漆組成物之光半導體裝置。 [用以解決課題之手段]The present invention is completed to solve the above-mentioned problems. Its purpose is to provide a primer composition that improves the adhesion between a substrate on which an optical semiconductor element is mounted and a cured product of an addition reaction curing polysilicone composition that seals the optical semiconductor element, prevents corrosion of a metal electrode formed on the substrate, and greatly improves the heat resistance and flexibility of the primer itself, and an optical semiconductor device using the primer composition. [Means for solving the problem]
為了達成上述課題,本發明提供一種底漆組成物,其係將安裝有光半導體元件之基板,與密封前述光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著之底漆組成物,其特徵為含有: (A)共聚物,其包含:1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯之至少一者、1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,及,不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者; (B)溶劑;及 (C)鈰化合物。In order to achieve the above-mentioned problem, the present invention provides a primer composition, which is a primer composition for bonding a substrate mounted with an optical semiconductor element and a cured product of an addition reaction curing type polysilicone composition for sealing the aforementioned optical semiconductor element, and is characterized by containing: (A) a copolymer, which includes: at least one of an acrylate and a methacrylate having one or more SiH groups in one molecule, at least one of an acrylate and a methacrylate having one or more alkoxy groups in one molecule, and at least one of an acrylate and a methacrylate having no SiH groups and no alkoxy groups; (B) a solvent; and (C) a bismuth compound.
若為此種底漆組成物,則會成為提升安裝有光半導體元件之基板,與密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物的接著性者,同時防止形成於基板上之金屬電極之腐蝕,且使底漆本身之耐熱性・可撓性提升者。Such a primer composition improves the adhesion between the substrate on which the optical semiconductor element is mounted and the cured product of the addition reaction curing polysilicone composition that seals the optical semiconductor element, prevents corrosion of the metal electrode formed on the substrate, and improves the heat resistance and flexibility of the primer itself.
前述底漆組成物係以更含有(D)鋅化合物者為佳。The aforementioned primer composition preferably contains (D) a zinc compound.
前述底漆組成物為更含有(D)鋅化合物者時,則成為能更防止形成於基板上之金屬電極之腐蝕者。When the primer composition further contains (D) a zinc compound, it can further prevent corrosion of the metal electrode formed on the substrate.
又,前述(B)成分之摻合量係以前述底漆組成物全體之70質量%以上為佳。In addition, the blending amount of the component (B) is preferably 70% by mass or more of the entire primer composition.
藉由含有(B)成分70質量%以上,而成為作業性更為良好之底漆組成物。By containing 70% by mass or more of component (B), a primer composition with better workability is obtained.
以前述(C)成分為3價或4價之鈰錯合物,相對於前述(A)成分之固體成分之總質量,含有前述(C)成分以鈰金屬計1~10,000ppm者為佳。The component (C) is a trivalent or tetravalent bismuth complex, and preferably contains 1 to 10,000 ppm of the component (C) in terms of bismuth metal relative to the total mass of the solid component of the component (A).
藉由前述(C)成分為前述鈰錯合物,且將前述(C)成分之摻合量作成前述範圍,而能更加提高底漆本身之耐熱性。By using the aforementioned barium complex as the aforementioned component (C) and setting the blending amount of the aforementioned component (C) to the aforementioned range, the heat resistance of the primer itself can be further improved.
以前述(D)成分為鋅錯合物,相對於前述(A)成分之固體成分之總質量,含有前述(D)成分以鋅金屬計1~10,000ppm者為佳。Where the component (D) is a zinc complex, it is preferred that the component (D) contains 1 to 10,000 ppm of zinc metal relative to the total mass of the solid content of the component (A).
藉由前述(D)成分為鋅錯合物,且將前述(D)成分之摻合量作成前述範圍,而能更加提高底漆膜之耐硫化性。Since the component (D) is a zinc complex and the blending amount of the component (D) is within the range described above, the sulfurization resistance of the primer film can be further improved.
前述底漆組成物係以更含有(E)矽烷耦合劑者為佳。The primer composition preferably further contains (E) a silane coupling agent.
如此藉由含有矽烷耦合劑,而成為能使基板與加成反應硬化型聚矽氧組成物之硬化物的接著性更加提升的底漆組成物。By containing the silane coupling agent, the primer composition can further improve the adhesion between the substrate and the cured product of the addition reaction curing type polysilicone composition.
又,本發明提供一種光半導體裝置,其係藉由前述底漆組成物來將安裝有光半導體元件之基板,與密封前述光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著者。The present invention also provides an optical semiconductor device, wherein a substrate on which an optical semiconductor element is mounted and a cured product of an addition reaction curing type polysilicone composition for sealing the optical semiconductor element are bonded together by the primer composition.
若為此種使用本發明之底漆組成物之光半導體裝置,由於基板與加成反應硬化型聚矽氧組成物之硬化物係受到強固地接著,也能防止形成基板上之金屬電極之腐蝕,故為具有高信賴性者。If such an optical semiconductor device uses the primer composition of the present invention, since the substrate and the cured product of the addition reaction curing polysilicone composition are strongly bonded, corrosion of the metal electrode formed on the substrate can be prevented, so it has high reliability.
又,前述光半導體元件係可作成發光二極體。In addition, the aforementioned optical semiconductor element may be a light-emitting diode.
因此,本發明之光半導體裝置係可適宜使用於作為發光二極體用途。Therefore, the optical semiconductor device of the present invention can be suitably used as a light-emitting diode.
又,前述基板之構成材料係可使用聚醯胺、纖維強化塑膠、陶瓷、聚矽氧、聚矽氧變性聚合物,或液晶聚合物。In addition, the aforementioned substrate may be made of polyamide, fiber-reinforced plastic, ceramic, polysilicone, polysilicone modified polymer, or liquid crystal polymer.
本發明之光半導體裝置中由於底漆之接著性優異,故即使為此種基板,也能不損及接著性而使用。Since the optical semiconductor device of the present invention has excellent primer adhesion, it can be used even with such a substrate without impairing the adhesion.
並且,前述加成反應硬化型聚矽氧組成物之硬化物係以橡膠狀者為佳。Furthermore, the cured product of the aforementioned addition reaction curing type polysilicone composition is preferably in a rubbery state.
若為此種加成反應硬化型聚矽氧組成物之硬化物,具有更加強固之接著性,且能更有效地防止形成於基板上之金屬電極,尤其Ag電極之腐蝕。 [發明之效果]The hardened product of such an addition reaction hardening polysiloxane composition has stronger adhesion and can more effectively prevent corrosion of metal electrodes, especially Ag electrodes, formed on the substrate. [Effects of the invention]
如以上所述,若為本發明之底漆組成物,即能成為提升安裝有光半導體元件之基板,與密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物的接著性,同時能防止形成於基板上之金屬電極之腐蝕,且使底漆本身之耐熱性・可撓性提升的底漆組成物,並且使用該底漆組成物之光半導體裝置成為具有高信賴性者。As described above, the primer composition of the present invention can improve the adhesion between the substrate on which the optical semiconductor element is mounted and the hardened material of the addition reaction curable polysiloxane composition for sealing the optical semiconductor element. It is a primer composition that simultaneously prevents corrosion of the metal electrodes formed on the substrate and improves the heat resistance and flexibility of the primer itself. Optical semiconductor devices using this primer composition become highly reliable.
如上述般,至今要求開發一種能提升安裝有光半導體元件之基板,密封光半導體元件之加成反應硬化型聚矽氧組成物之硬化物的接著性,同時防止形成於基板上之金屬電極之腐蝕,且使底漆本身之耐熱性・可撓性提升之底漆組成物之開發。As mentioned above, there has been a demand for the development of a substrate that can improve the adhesion of a hardened product of an addition reaction curable polysiloxane composition that seals the optical semiconductor element on a substrate on which the optical semiconductor element is mounted, and at the same time prevent the metal electrodes formed on the substrate from coming into contact with each other. Development of a primer composition that prevents corrosion and improves the heat resistance and flexibility of the primer itself.
本發明者等針對上述課題經過重複精心檢討之結果,發現若為含有共聚物,與鈰化合物之底漆組成物,其中該共聚物包含1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯之至少一者、1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,及,不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,就能成為使安裝有光半導體元件之基板,與密封該光半導體元件之加成反應硬化型聚矽氧組成物之硬化物強固地接著,且防止形成於基板上之金屬電極,尤其Ag電極之腐蝕的底漆組成物,進而完成本發明。As a result of repeated and careful examination of the above-mentioned subject, the inventors found that if it is a primer composition containing a copolymer and a cerium compound, wherein the copolymer contains an acrylate and methacrylic acid having more than one SiH group in one molecule At least one of esters, at least one of acrylate and methacrylate having one or more alkoxy groups in one molecule, and at least one of acrylate and methacrylate that does not have SiH group and alkoxy group , it is possible to firmly adhere the substrate on which the optical semiconductor element is mounted to the cured product of the addition reaction curable polysiloxane composition that seals the optical semiconductor element, and to prevent metal electrodes, especially Ag electrodes, from being formed on the substrate. The corrosive primer composition is used to complete the present invention.
即,本發明為一種底漆組成物,其係將安裝有光半導體元件之基板,與密封前述光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著之底漆組成物,且含有 (A)共聚物,其包含1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯之至少一者、1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,及,不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者 (B)溶劑;及 (C)鈰化合物。That is, the present invention is a primer composition for bonding a substrate on which an optical semiconductor element is mounted to a cured product of an addition reaction curing type polysilicone composition for sealing the optical semiconductor element, and contains (A) a copolymer comprising at least one of an acrylate and a methacrylate having one or more SiH groups in one molecule, at least one of an acrylate and a methacrylate having one or more alkoxy groups in one molecule, and at least one of an acrylate and a methacrylate having no SiH groups and no alkoxy groups; (B) a solvent; and (C) a bismuth compound.
以下,詳細說明關於本發明,但本發明並非係受到該等所限定者。The present invention is described in detail below, but the present invention is not limited thereto.
<底漆組成物> 本發明之底漆組成物為含有後述之(A)成分、(B)成分及(C)成分作為必須成分者。<Primer composition> The primer composition of the present invention contains the following components (A), (B) and (C) as essential components.
以下,說明關於本發明之底漆組成物之各成分。The following describes the components of the primer composition of the present invention.
[(A)成分] 本發明之底漆組成物所含有之(A)成分為共聚物,其包含:1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯之至少一者、1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者,及,不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯之至少一者。[(A) ingredient] The component (A) contained in the primer composition of the present invention is a copolymer, which includes: at least one of acrylate and methacrylate having one or more SiH groups in one molecule, and one or more alkoxylates having one or more alkoxy groups in one molecule. At least one of acrylate and methacrylate that has a group, and at least one of acrylate and methacrylate that does not have a SiH group and an alkoxy group.
共聚物之(A)成分係可藉由使用2,2’-偶氮二異丁腈(AIBN)等之自由基聚合起始劑,使該當之單體(後述之酯)進行聚合而得。The component (A) of the copolymer can be obtained by polymerizing the corresponding monomer (ester described below) using a free radical polymerization initiator such as 2,2'-azobisisobutyronitrile (AIBN).
含有此種(A)成分之底漆組成物係會對安裝光半導體元件之基板及電極賦予充分之接著性,同時形成在前述基板上具有可撓性之膜,且抑制金屬電極(尤其Ag電極)之經時性腐蝕者。The primer composition containing component (A) imparts sufficient adhesion to the substrate and electrode on which the optical semiconductor element is mounted, forms a flexible film on the substrate, and inhibits the formation of metal electrodes (especially Ag electrodes). ) is corroded over time.
(A)成分之摻合量只要會溶解於後述(B)成分之量,即無特別限定,以組成物全體((A)~(C)成分等之合計)之30質量%以下為佳,較佳為0.01~20質量%,更佳為0.1~10質量%。含量若在30質量%以下,可防止取得之膜之表面產生凹凸,且可取得作為底漆之充足性能。The amount of component (A) to be blended is not particularly limited as long as it is soluble in the amount of component (B) described below, but is preferably 30% by mass or less of the total composition (the total of components (A) to (C) etc.), more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass. If the content is 30% by mass or less, the surface of the obtained film can be prevented from being uneven, and sufficient performance as a primer can be obtained.
1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯 作為1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯,可舉出如包含下述式(1)所示構造之化合物。 (式中,R為氫原子或甲基,R1 為1價有機基,R2 為2價有機基。n為0、1或2。)Acrylates and methacrylates having one or more SiH groups per molecule Examples of acrylates and methacrylates having one or more SiH groups per molecule include compounds having a structure represented by the following formula (1) . (In the formula, R is a hydrogen atom or a methyl group, R 1 is a monovalent organic group, and R 2 is a divalent organic group. n is 0, 1 or 2.)
又,也可例示在二有機聚矽氧烷中具有下述式(2)或下述式(3)所示構造之化合物。 (式中,R、R1 、R2 係表示與上述相同意義。l為0或正整數,m為正整數。被附加括弧之各矽氧烷單位之排列順序為任意者。)In addition, compounds having a structure represented by the following formula (2) or the following formula (3) among diorganopolysiloxanes can also be exemplified. (In the formula, R, R 1 , and R 2 have the same meanings as above. l is 0 or a positive integer, and m is a positive integer. The order of arrangement of the siloxane units in parentheses is arbitrary.)
(式中,R、R1 、R2 係表示與上述相同意義。o、p為正整數。被附加括弧之各矽氧烷單位之排列順序為任意者。) (In the formula, R, R 1 , and R 2 have the same meanings as above. o and p are positive integers. The order of arrangement of the siloxane units in parentheses is arbitrary.)
在此,作為R1 所示之1價有機基,以碳數1~10,尤其碳數1~3之非取代或取代1價烴基為佳。作為1價烴基,可舉出如甲基、乙基、丙基、異丙基、丁基、異丁基、tert-丁基、戊基、新戊基、己基、辛基等之烷基,環己基等之環烷基,乙烯基、烯丙基、丙烯基等之烯基,苯基、甲苯基、茬基、萘基等之芳基,苄基、苯基乙基、苯基丙基等之芳烷基等,或該等基之氫原子之一部分或全部被氟、溴、氯等之鹵素原子、氰基等所取代者,例如氯甲基、氯丙基、溴乙基、三氟丙基、氰基乙基等。R1 係以甲基、乙基、苯基為佳,以甲基為特佳。Here, the monovalent organic group represented by R 1 is preferably an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, particularly an unsubstituted or substituted monovalent hydrocarbon group having 1 to 3 carbon atoms. Examples of the monovalent hydrocarbon group include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, octyl, etc. Cycloalkyl groups such as cyclohexyl, alkenyl groups such as vinyl, allyl, and propenyl, aryl groups such as phenyl, tolyl, stubble, naphthyl, etc., benzyl, phenylethyl, and phenylpropyl Aralkyl groups, etc., or those in which part or all of the hydrogen atoms of these groups are replaced by halogen atoms such as fluorine, bromine, chlorine, cyano groups, etc., such as chloromethyl, chloropropyl, bromoethyl, tribromoethyl, etc. Fluoropropyl, cyanoethyl, etc. R1 is preferably methyl, ethyl or phenyl, with methyl being particularly preferred.
作為R2 所示之2價有機基,以碳數1~10,尤其碳數1~3之非取代或取代2價烴基為佳。作為2價烴基,可舉出如亞甲基、伸乙基、n-伸丙基、n-伸丁基、n-伸戊基、n-伸丙基、伸環己基、n-伸辛基等之伸烷基,伸苯基、伸萘基等之伸芳基。R2 係以伸乙基、n-伸丙基為佳,以n-伸丙基為特佳。As the divalent organic group represented by R 2 , a non-substituted or substituted divalent alkyl group having 1 to 10 carbon atoms, especially 1 to 3 carbon atoms, is preferred. As the divalent alkyl group, there can be mentioned alkylene groups such as methylene, ethylene, n-propylene, n-butylene, n-pentylene, n-propylene, cyclohexylene, n-octylene, and arylene groups such as phenylene and naphthylene. R 2 is preferably ethylene or n-propylene, and particularly preferably n-propylene.
1分子中具有一個以上SiH基之丙烯酸酯及甲基丙烯酸酯係可單獨使用1種,或亦可併用2種以上。One type of acrylate and methacrylate having one or more SiH groups per molecule may be used alone, or two or more types may be used in combination.
1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯 作為1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯,可舉出如包含下述式(4)所示構造之化合物。 (式中,R、R1 、R2 係表示與上述相同意義。R3 表示碳數1~4之1價烴基。q為0、1或2。)Acrylates and Methacrylates Having One or More Alkoxy Groups in One Molecule Examples of acrylates and methacrylates having one or more alkoxy groups in one molecule include compounds having a structure represented by the following formula (4). (In the formula, R, R 1 and R 2 have the same meanings as above. R 3 represents a monovalent hydrocarbon group having 1 to 4 carbon atoms. q is 0, 1 or 2.)
又,也可例示在二有機聚矽氧烷中具有下述式(5)或下述式(6)所示構造之化合物。 (式中,R、R1 、R2 、R3 係表示與上述相同意義。r為0或正整數,s為正整數。被附加括弧之各矽氧烷單位之排列順序為任意者。)Furthermore, compounds having a structure represented by the following formula (5) or the following formula (6) among diorganopolysiloxanes can also be exemplified. (In the formula, R, R 1 , R 2 , and R 3 have the same meanings as above. r is 0 or a positive integer, and s is a positive integer. The order of the siloxane units enclosed by brackets is arbitrary.)
(式中,R、R1 、R2 、R3 係表示與上述相同意義。t、u為正整數。被附加括弧之各矽氧烷單位之排列順序為任意者。) (In the formula, R, R 1 , R 2 and R 3 have the same meanings as above. t and u are positive integers. The order of the siloxane units in brackets is arbitrary.)
在此,作為R1 、R2 所示之有機基,可舉出如與上述為相同者。作為R3 所示之碳數1~4之1價烴基,可舉出如甲基、乙基、丙基、異丙基、丁基、異丁基、tert-丁基等,以甲基或乙基為佳。Here, the organic groups represented by R1 and R2 include the same as those mentioned above. The monovalent hydrocarbon group having 1 to 4 carbon atoms represented by R3 includes methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, etc., and methyl or ethyl is preferred.
1分子中具有一個以上烷氧基之丙烯酸酯及甲基丙烯酸酯係可單獨使用1種,或亦可併用2種以上。The acrylate and methacrylate having one or more alkoxy groups in 1 molecule may be used individually by 1 type, or may use 2 or more types together.
不具有SiH基及烷氧基之丙烯酸酯及甲基丙烯酸酯 作為不具有SiH基及烷氧基之丙烯酸酯,可舉出例如丙烯酸甲酯、丙烯酸乙酯、丙烯酸-n-丁基酯、丙烯酸異丁基酯、丙烯酸異戊基酯、丙烯酸-n-己酯、丙烯酸異辛基酯、丙烯酸-2-乙基己基酯、丙烯酸-n-辛基酯、丙烯酸異壬基酯、丙烯酸-n-癸基酯、丙烯酸異癸基酯等。Acrylates and methacrylates without SiH groups and alkoxy groups Examples of acrylates that do not have a SiH group and an alkoxy group include methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, isopentyl acrylate, and n-hexyl acrylate. Ester, isooctyl acrylate, 2-ethylhexyl acrylate, n-octyl acrylate, isononyl acrylate, n-decyl acrylate, isodecyl acrylate, etc.
作為不具有SiH基及烷氧基之甲基丙烯酸酯,可舉出例如甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸-n-丁基酯、甲基丙烯酸異丁基酯、甲基丙烯酸異戊基酯、甲基丙烯酸-n-己基酯、甲基丙烯酸異辛基酯、甲基丙烯酸-2-乙基己基酯、甲基丙烯酸-n-辛基酯、甲基丙烯酸異壬基酯、甲基丙烯酸-n-癸基酯、甲基丙烯酸異癸基酯等。Examples of the methacrylate having no SiH group and no alkoxy group include methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, isoamyl methacrylate, n-hexyl methacrylate, isooctyl methacrylate, 2-ethylhexyl methacrylate, n-octyl methacrylate, isononyl methacrylate, n-decyl methacrylate, and isodecyl methacrylate.
上述例示之中,以烷基之碳原子數為1~12,尤其以烷基之碳原子數為1~4之丙烯酸烷基酯、甲基丙烯酸烷基酯為佳,可單獨使用1種或亦可併用2種以上。Among the above examples, an alkyl acrylate or an alkyl methacrylate having an alkyl group having 1 to 12 carbon atoms, especially an alkyl acrylate or alkyl methacrylate having an alkyl group having a carbon number of 1 to 4 is preferred. One or more of these may be used alone. You can also use 2 or more types together.
[(B)成分] 作為溶劑之(B)成分,只要係會溶解本發明之構成底漆組成物之上述(A)成分及後述之任意成分者,即並非係受到特別限定者,可使用公知之有機溶劑。[(B)Component] The component (B) of the solvent is not particularly limited as long as it can dissolve the above-mentioned component (A) constituting the primer composition of the present invention and any components described below, and known organic solvents can be used.
作為溶劑,可舉出例如,二甲苯、甲苯、苯等之芳香族烴系溶劑,庚烷、己烷等之脂肪族烴系溶劑,三氯乙烯、全氯乙烯、二氯甲烷等之鹵化烴系溶劑,乙酸乙酯、1-丙二醇甲基醚乙酸酯等之酯系溶劑,甲基異丁基酮、甲基乙基酮等之酮系溶劑,乙醇、異丙醇、丁醇等之醇系溶劑,輕石油(Ligroin)、環己酮、二乙基醚、橡膠揮發油、聚矽氧系溶劑等。其中較適宜使用乙酸乙酯、1-丙二醇甲基醚乙酸酯、己烷、丙酮。Examples of the solvent include, for example, aromatic hydrocarbon solvents such as xylene, toluene, and benzene; aliphatic hydrocarbon solvents such as heptane and hexane; and halogenated hydrocarbons such as trichlorethylene, perchlorethylene, and methylene chloride. Solvents, ester solvents such as ethyl acetate, 1-propylene glycol methyl ether acetate, etc., ketone solvents such as methyl isobutyl ketone, methyl ethyl ketone, etc., ethanol, isopropyl alcohol, butanol, etc. Alcohol-based solvents, light petroleum (Ligroin), cyclohexanone, diethyl ether, rubber volatile oil, polysiloxane-based solvents, etc. Among them, ethyl acetate, 1-propylene glycol methyl ether acetate, hexane, and acetone are more suitable.
(B)成分在因應底漆組成物塗佈作業時之蒸發速度,可單獨使用1種,亦可組合2種以上而使用作為混合溶劑。The component (B) may be used alone or in combination of two or more to form a mixed solvent, depending on the evaporation rate of the primer composition during coating.
(B)成分之摻合量並無特別限定,以底漆組成物全體((A)~(C)成分等之合計)之70質量%以上為佳,較佳為80~99.99質量%,更佳為90~99.9質量%。(B)成分之摻合量若為70質量%以上,則成為在塗佈時及乾燥時之作業性更加良好之底漆組成物,例如,在後述基板上形成底漆膜時可將膜作成均勻者,且不會有表面上因能產生凹凸所導致之膜之破裂,而成為賦予作為底漆之充足性能者。The blending amount of component (B) is not particularly limited, but it is preferably 70% by mass or more of the total primer composition (total of components (A) to (C), etc.), more preferably 80 to 99.99% by mass, and more Preferably, it is 90~99.9% by mass. If the blending amount of component (B) is 70% by mass or more, the primer composition will have better workability during coating and drying. For example, when forming a primer film on a substrate described later, the film can be It is uniform and does not cause film breakage due to unevenness on the surface, thereby conferring sufficient performance as a primer.
[(C)成分] (C)成分為鈰化合物,具有不會大大損及本發明之底漆組成物之透明性,而使耐熱性、耐光性、耐龜裂性等提升的效果。 作為鈰化合物,可例示如鈰錯合物、包含鈰之複合金屬錯合物、氧化鈰、鈰之無機酸鹽或有機酸鹽,以將3價或4價之鈰作為中心金屬且將醇或二酮作為配位子之鈰錯合物,或包含鈰之複合金屬錯合物為佳。[(C)Component] Component (C) is a cerium compound, which has the effect of improving heat resistance, light resistance, crack resistance, etc. without greatly impairing the transparency of the primer composition of the present invention. Examples of the cerium compound include cerium complexes, composite metal complexes containing cerium, cerium oxide, and inorganic or organic acid salts of cerium, in which trivalent or tetravalent cerium is used as the central metal and an alcohol or The diketone is preferably a cerium complex as a ligand or a composite metal complex containing cerium.
(C)成分只要係會溶解於上述之(A)成分及(B)成分之混合物者,即無特別限定,可舉出如2-甲氧基乙氧基鈰(IV)、參(異丙基環戊二烯基)鈰、參(環戊二烯基)鈰、參(1,2,3,4-四甲基-2,4-環戊二烯基)鈰(III)、草酸鈰(III)、參(6,6,7,7,8,8,8-七氟‐2,2-二甲基‐3,5-辛烷二酮基)鈰(III)、肆(2,2,6,6、-四甲基3-5-庚烷二酮基)鈰(IV)、2,4-戊烷二酮基鈰(III)、三氟乙醯丙酮酸鈰(III)、參(乙醯丙酮酸)鈰(III)等。其中,以3價鈰錯合物因耐熱性賦予效果高而為佳,具體地可舉出如參(環戊二烯基)鈰、參(乙醯丙酮酸)鈰(III)。(C) Component is not particularly limited as long as it is soluble in the mixture of the above-mentioned (A) component and (B) component. Examples include 2-methoxyethoxycerium(IV), ginseng(isopropyl) Cerium cyclopentadienyl), cerium (cyclopentadienyl) cerium, cerium (1,2,3,4-tetramethyl-2,4-cyclopentadienyl)cerium (III), cerium oxalate (III), cerium (6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedione)cerium (III), four (2, 2,6,6,-tetramethyl3-5-heptanedione)cerium(IV), 2,4-pentanedionecerium(III), trifluoroacetylpyruvate cerium(III), Ginseng (acetyl pyruvic acid) cerium (III), etc. Among them, trivalent cerium complexes are preferred because of their high heat resistance imparting effect. Specific examples include ginseng(cyclopentadienyl)cerium and ginseng(acetylpyruvate)cerium(III).
鈰化合物之摻合量在相對於(A)成分之固體成分之總質量而言,以鈰金屬計係以1ppm以上為佳,較佳為10ppm以上。前述摻合量之上限值係以10,000ppm以下為佳,較佳為1,000ppm以下。鈰化合物之前述摻合量為1ppm以上時,可取得底漆組成物之充足耐熱性、耐光性。又,鈰化合物之前述摻合量若在10,000ppm以下,就不會損及底漆硬化物之透明性。 (C)成分係也可預先溶解於作為前述(B)成分所例示之溶劑後才添加。 (C)成分係可單獨使用1種,亦可併用2種以上。The blending amount of the cerium compound is preferably 1 ppm or more in terms of cerium metal relative to the total mass of the solid content of component (A), and more preferably 10 ppm or more. The upper limit of the aforementioned blending amount is preferably 10,000 ppm or less, more preferably 1,000 ppm or less. When the aforementioned blending amount of the cerium compound is 1 ppm or more, sufficient heat resistance and light resistance of the primer composition can be obtained. In addition, if the aforementioned blending amount of the cerium compound is 10,000 ppm or less, the transparency of the cured primer will not be impaired. The component (C) may be added after being dissolved in the solvent exemplified as the component (B) in advance. (C) Component system may be used individually by 1 type, and may be used in combination of 2 or more types.
[(D)成分] (D)成分為鋅化合物,具有不會大大損及本發明之底漆組成物之透明性,而使耐熱性、耐光性、耐龜裂性、耐硫化性等提升的效果。 作為鋅化合物,也可使用氧化鋅粉末或鋅之無機酸鹽,從在塗佈底漆組成物時將表面平滑性作成良好之觀點,以將鋅原子作為中心金屬且將醇或二酮作為配位子之鋅錯合物,或包含鋅之複合金屬錯合物為佳。[Component (D)] Component (D) is a zinc compound, which has the effect of improving heat resistance, light resistance, crack resistance, and sulfidation resistance without significantly impairing the transparency of the primer composition of the present invention. As the zinc compound, zinc oxide powder or an inorganic acid salt of zinc may be used. From the viewpoint of achieving good surface smoothness when applying the primer composition, a zinc complex having a zinc atom as a central metal and an alcohol or a diketone as a ligand, or a composite metal complex containing zinc is preferred.
(D)成分只要會溶解於上述之(A)~(C)成分之混合物中者,即無特別限定,可舉出如二乙基鋅、二苯基鋅、tert-丁氧基鋅、i-丙氧基鋅、2-甲氧基乙氧基鋅、二安息香酸鋅、草酸鋅、2-乙基己酸鋅、雙(2,4-戊烷二酮基)鋅(II)、六氟乙醯丙酮酸鋅、雙(2,2,6,6、-四甲基-3,5-庚烷二酮基)鋅(II)等。其中,2價鈰錯合物因耐熱性賦予效果高而為佳,具體地可舉出如雙(2,4-戊烷二酮基)鋅(II)、六氟乙醯丙酮酸鋅、雙(2,2,6,6、-四甲基-3,5-庚烷二酮基)鋅(II)。The component (D) is not particularly limited as long as it is soluble in the mixture of the components (A) to (C) above, and examples thereof include diethyl zinc, diphenyl zinc, tert-butoxy zinc, i-propoxy zinc, 2-methoxyethoxy zinc, zinc dibenzoate, zinc oxalate, zinc 2-ethylhexanoate, bis(2,4-pentanedione)zinc(II), zinc hexafluoroacetylacetonate, bis(2,2,6,6,-tetramethyl-3,5-heptanedione)zinc(II), and the like. Among them, divalent zinc complexes are preferred due to their high heat resistance-imparting effect, and specific examples thereof include bis(2,4-pentanedione)zinc(II), hexafluoroacetylacetonate zinc, and bis(2,2,6,6,-tetramethyl-3,5-heptanedione)zinc(II).
(D)成分之摻合量在相對於(A)成分之固體成分之總質量份而言,以鋅金屬計係以1ppm以上為佳,較佳為10ppm以上。上限值係以10,000ppm以下為佳,較佳為1,000ppm以下。藉由確保1ppm以上之濃度,而可取得充足之耐熱性、耐光性。又,若在10,000ppm以下,就不會損及底漆硬化物之透明性。 (D)成分係預先溶解於溶劑後再添加即可,可舉出如在常溫下或加熱下藉由混合攪拌機來均勻混合之方法等。預先溶解(D)成分之溶劑係可與(B)成分為相同,亦可為相異。The blending amount of component (D) is preferably 1 ppm or more in terms of zinc metal relative to the total mass parts of the solid content of component (A), and more preferably 10 ppm or more. The upper limit is preferably 10,000 ppm or less, more preferably 1,000 ppm or less. By ensuring a concentration of 1 ppm or above, sufficient heat resistance and light resistance can be obtained. In addition, if it is below 10,000 ppm, the transparency of the hardened primer will not be impaired. (D) The component may be added after being dissolved in a solvent in advance. Examples include a method of uniformly mixing with a mixer at normal temperature or under heating. The solvent in which component (D) is dissolved in advance may be the same as or different from component (B).
[(E)成分] 本發明之底漆組成物中,亦可更摻合矽烷耦合劑作為(E)成分。[(E)INGREDIENT] In the primer composition of the present invention, a silane coupling agent may be further blended as the (E) component.
作為矽烷耦合劑,一般性矽烷耦合劑即可,可舉出例如,乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷等之含乙烯基之矽烷耦合劑,環氧丙氧基丙基三甲氧基矽烷等之含環氧基之矽烷耦合劑,甲基丙烯醯氧基丙基三甲氧基矽烷、丙烯醯氧基丙基三甲氧基矽烷等之含(甲基)丙烯醯氧基之矽烷耦合劑,巰基丙基三甲氧基矽烷等之含巰基之矽烷耦合劑等。其中亦以乙烯基三甲氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷為佳。As the silane coupling agent, general silane coupling agents may be used, for example, vinyl-containing silane coupling agents such as vinyl trimethoxy silane and vinyl triethoxy silane, epoxy-containing silane coupling agents such as glycidoxypropyl trimethoxy silane, (meth)acryloxy-containing silane coupling agents such as methacryloxypropyl trimethoxy silane and acryloxypropyl trimethoxy silane, butylyl-containing silane coupling agents such as butylpropyl trimethoxy silane, etc. Among them, vinyl trimethoxy silane and methacryloxypropyl trimethoxy silane are preferred.
作為使用(E)成分時之摻合量,以底漆組成物全體((A)~(E)成分等之合計)之0.05~10質量%為佳,較佳為0.1~3質量%。(E)成分之摻合量若在0.05質量%以上,則接著性提升效果變得充足,由於即使摻合超過10質量%之值也無法取得更多接著性提升效果,故以10質量%以下為佳。When the component (E) is used, the blending amount is preferably 0.05 to 10% by mass of the total primer composition (the total of the components (A) to (E) etc.), and more preferably 0.1 to 3% by mass. If the blending amount of the component (E) is 0.05% by mass or more, the adhesion-improving effect becomes sufficient. However, even if the blending amount exceeds 10% by mass, no further adhesion-improving effect can be obtained, so it is preferably 10% by mass or less.
[其他成分] 本發明之底漆組成物中,除了上述成分以外,因應必要亦可摻合其他之任意成分。例如,作為金屬腐蝕抑制劑,可摻合苯並三唑、丁基羥基甲苯、氫醌或其衍生物。[Other ingredients] In addition to the above-mentioned components, the primer composition of the present invention may also be blended with other optional components as necessary. For example, as metal corrosion inhibitors, benzotriazole, butylated hydroxytoluene, hydroquinone or derivatives thereof may be blended.
苯並三唑、二丁基羥基甲苯、氫醌或其衍生物係為在LED燈暴露於過苛之外部環境,例如大氣中之硫化合物已穿透光半導體裝置之密封材(加成反應硬化型聚矽氧組成物之硬化物)的情況,會更有效果地抑制被該密封材所密封之基板上之金屬電極,尤其Ag電極之腐蝕的成分。Benzotriazole, dibutylhydroxytoluene, hydroquinone or their derivatives are used when LED lamps are exposed to harsh external environments, such as sulfur compounds in the atmosphere that have penetrated the sealing materials of optical semiconductor devices (addition reaction hardening In the case of a hardened product of a polysiloxane composition), the corrosion of the metal electrode, especially the Ag electrode, on the substrate sealed by the sealing material will be more effectively suppressed.
在添加金屬腐蝕抑制劑時之摻合量,相對於(A)~(C)成分或(A)~(D)成分之合計100質量份而言,以0.005~1質量份為佳,尤其係以0.01~0.5質量份為佳。When the metal corrosion inhibitor is added, the blending amount is preferably 0.005 to 1 part by weight, and more preferably 0.01 to 0.5 parts by weight, relative to 100 parts by weight of the total of components (A) to (C) or components (A) to (D).
並且,作為其他任意成分,亦可添加螢光體、補強性填充劑、染料、顏料、耐熱性向上劑、防氧化劑、接著促進劑等。Furthermore, as other optional components, phosphors, reinforcing fillers, dyes, pigments, heat-resistant improving agents, antioxidants, adhesion accelerators, etc. can also be added.
[底漆組成物之製造方法] 作為本發明之底漆組成物之製造方法,可舉出如在常溫下或加熱下,藉由混合攪拌機來均勻混合上述(A)、(B)、(C)成分及因應必要之上述任意成分的方法等。[Production method of primer composition] An example of a method for producing the primer composition of the present invention is to uniformly mix the above-mentioned (A), (B), (C) components and any of the above-mentioned components as necessary using a mixer at normal temperature or under heating. methods etc.
<光半導體裝置> 又,本發明提供一種光半導體裝置,其係藉由前述底漆組成物來將安裝有光半導體元件之基板,與密封前述光半導體元件之加成反應硬化型聚矽氧組成物之硬化物予以接著者。 以下,參照圖式來說明關於本發明之光半導體裝置之一態樣。<Optical semiconductor device> The present invention also provides an optical semiconductor device, which is a substrate on which an optical semiconductor element is mounted and a cured product of an addition reaction curing type polysilicone composition that seals the optical semiconductor element are bonded together by the aforementioned primer composition. The following is an explanation of one aspect of the optical semiconductor device of the present invention with reference to the drawings.
圖1為展示本發明之光半導體裝置一例之光半導體裝置(LED燈)的剖面圖。光半導體裝置(LED燈)1係藉由上述底漆組成物2而將安裝有LED 3作為光半導體元件之基板4,與密封LED 3之加成反應硬化型聚矽氧組成物之硬化物5予以接著者。其中,基板4上已形成Ag電極等之金屬電極6,並以接合線7來電性連接LED 3之電極端子(未圖示)與金屬電極6。FIG1 is a cross-sectional view of an optical semiconductor device (LED lamp) showing an example of the optical semiconductor device of the present invention. The optical semiconductor device (LED lamp) 1 is a
作為構成基板4之材料,可舉出如聚醯胺、各種纖維強化塑膠、陶瓷、聚矽氧、聚矽氧變性聚合物、液晶聚合物等。Examples of materials constituting the
加成反應硬化型聚矽氧組成物之硬化物5係藉由加成反應硬化型聚矽氧組成物進行硬化而得者,以透明之硬化物為佳,又以橡膠者為佳。作為上述加成反應硬化型聚矽氧組成物,可使用過往公知之至少包含:含乙烯基之有機聚矽氧烷、交聯劑之有機氫聚矽氧烷及加成反應觸媒之鉑系觸媒者,又,上述加成反應硬化型聚矽氧組成物中亦可添加反應抑制劑、著色劑、難燃性賦予劑、耐熱性向上劑、塑化劑、補強性二氧化矽、接著性賦予劑等作為其他任意成分。The cured product 5 of the addition reaction curing type silicone composition is obtained by curing the addition reaction curing type silicone composition, and is preferably a transparent cured product, and more preferably a rubber. As the above-mentioned addition reaction curing type silicone composition, a conventionally known one at least comprising: a vinyl-containing organic polysiloxane, an organic hydrogen polysiloxane as a crosslinking agent, and a platinum-based catalyst as an addition reaction catalyst can be used. Furthermore, the above-mentioned addition reaction curing type silicone composition can also be added with a reaction inhibitor, a coloring agent, a flame retardant imparting agent, a heat resistance improving agent, a plasticizer, a reinforcing silica, an adhesion imparting agent, etc. as other arbitrary components.
作為圖1所示之光半導體裝置(LED燈)1之製造方法,可例示如以下之方法。
在預先以Ag電鍍來形成有Ag電極等之金屬電極6之基板4上,以接著劑來接合LED 3等之光半導體元件,藉由接合線7來預先將LED 3之電極端子(未圖示)與金屬電極6予以電性連接,其後,因應必要將安裝有LED 3之基板4予以清淨後,使用旋塗機等之塗佈裝置或噴霧器等將底漆組成物2塗佈於基板4後,藉由加熱、風乾等而使底漆組成物2中之溶劑揮發,進而形成較佳10μm以下,更佳0.1~5μm厚度之被膜。形成底漆之被膜後,使用分配器等來塗佈加成反應硬化型聚矽氧組成物,在室溫下放置或使其加熱硬化,以橡膠狀之硬化物5來密封LED 3。As a method for manufacturing the optical semiconductor device (LED lamp) 1 shown in FIG. 1 , the following method can be exemplified.
On a
如此般,藉由使用含有前述之(A)~(C)成分或(A)~(D)成分之本發明之底漆組成物,可強固地接著安裝有LED等之光半導體元件之基板,與加成反應硬化型聚矽氧組成物之硬化物,且可提供具有高信賴性之光半導體裝置,尤其係LED燈。In this way, by using the primer composition of the present invention containing the aforementioned components (A) to (C) or (A) to (D), it is possible to firmly adhere to the substrate on which optical semiconductor elements such as LEDs are mounted. It is a hardened product of an addition reaction-hardening polysiloxane composition and can provide highly reliable optical semiconductor devices, especially LED lamps.
又,即使在LED燈暴露於過苛之外部環境,而大氣中之硫化合物等已穿透至上述聚矽氧組成物之硬化物內的情況,由於係使用本發明之底漆組成物,故能抑制基板上之金屬電極,尤其Ag電極之腐蝕。Furthermore, even when the LED lamp is exposed to an excessively harsh external environment and the sulfur compounds in the atmosphere have penetrated into the cured polysilicon composition, the use of the primer composition of the present invention can suppress the corrosion of the metal electrode on the substrate, especially the Ag electrode.
尚且,本發明之光半導體裝置係能適宜使用作為LED用途,上述之一態樣中已使用LED作為光半導體元件之一例進行說明,除此以外,也可適用於例如,光電晶體、光二極體、CCD、太陽電池模組、EPROM、光電耦合器等。 [實施例]In addition, the optical semiconductor device of the present invention can be suitably used as an LED. In the above aspect, LED has been used as an example of the optical semiconductor element in the description. In addition, it can also be applied to, for example, photoelectric crystals and photodiodes. , CCD, solar cell modules, EPROM, optocoupler, etc. [Example]
以下,例示合成例、實施例及比較例來具體地說明本發明,但本發明並非係受到下述實施例所限定者。Hereinafter, the present invention will be specifically described with reference to Synthesis Examples, Examples, and Comparative Examples, but the present invention is not limited to the following Examples.
[合成例1] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、下述式(7)所示之含SiH之甲基丙烯酸酯10質量份、下述式(8)所示之含甲氧基之甲基丙烯酸酯6質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。 [Synthesis Example 1] 40 parts by mass of methyl methacrylate, 10 parts by mass of SiH-containing methacrylate represented by the following formula (7), 6 parts by mass of methoxy-containing methacrylate represented by the following formula (8), 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were stirred under heating at 90° C. for 6 hours to prepare a solution containing a copolymer.
[合成例2] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、上述式(7)所示之含SiH之甲基丙烯酸酯14質量份、上述式(8)所示之含甲氧基之甲基丙烯酸酯4質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。[Synthesis example 2] 40 parts by mass of methyl methacrylate, 14 parts by mass of SiH-containing methacrylate represented by the above formula (7), and methoxy group-containing methacrylic acid represented by the above formula (8) were heated and stirred at 90°C. 4 parts by mass of ester, 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were added for 6 hours to prepare a solution containing the copolymer.
[合成例3] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、上述式(7)所示之含SiH之甲基丙烯酸酯19質量份、上述式(8)所示之含甲氧基之甲基丙烯酸酯1質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。[Synthesis example 3] 40 parts by mass of methyl methacrylate, 19 parts by mass of SiH-containing methacrylate represented by the above formula (7), and methoxy group-containing methacrylic acid represented by the above formula (8) were heated and stirred at 90°C. 1 part by mass of ester, 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were added for 6 hours to prepare a solution containing the copolymer.
[合成例4] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、上述式(7)所示之含SiH之甲基丙烯酸酯14質量份、下述式(9)所示之含甲氧基之甲基丙烯酸酯5質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。 [Synthesis Example 4] 40 parts by mass of methyl methacrylate, 14 parts by mass of the SiH-containing methacrylate represented by the above formula (7), 5 parts by mass of the methacrylate containing a methoxy group represented by the following formula (9), 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were stirred with heating at 90°C for 6 hours to prepare a solution containing a copolymer.
[合成例5] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、下述式(10)所示之含SiH之丙烯酸酯14質量份、上述式(8)所示之含甲氧基之甲基丙烯酸酯4質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。 [Synthesis Example 5] 40 parts by mass of methyl methacrylate, 14 parts by mass of SiH-containing acrylate represented by the following formula (10), and methoxy group-containing ester represented by the above formula (8) were heated and stirred at 90°C. 4 parts by mass of methacrylate, 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were added for 6 hours to prepare a solution containing the copolymer.
[合成例6] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、上述式(7)所示之含SiH之甲基丙烯酸酯14質量份、下述式(11)所示之含甲氧基之丙烯酸酯4質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。 [Synthesis Example 6] 40 parts by mass of methyl methacrylate, 14 parts by mass of the SiH-containing methacrylate represented by the above formula (7), 4 parts by mass of the methoxy-containing acrylate represented by the following formula (11), 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were stirred with heating at 90°C for 6 hours to prepare a solution containing a copolymer.
[比較合成例1] 在90℃下加熱攪拌甲基丙烯酸甲酯40質量份、上述式(7)所示之含SiH含有之丙烯酸酯14質量份、1-丙二醇甲基醚乙酸酯230質量份、AIBN 0.25質量份6小時,而調製出含有共聚物之溶液。[Comparative synthesis example 1] 40 parts by mass of methyl methacrylate, 14 parts by mass of SiH-containing acrylate represented by the above formula (7), 230 parts by mass of 1-propylene glycol methyl ether acetate, and 0.25 parts by mass of AIBN were heated and stirred at 90°C. 6 hours to prepare a solution containing the copolymer.
[實施例1~6] 在上述合成例1~6所合成之共聚物中,相對於(A)成分之固體成分之總質量,添加作為鈰化合物(C)之參(乙醯丙酮酸)鈰(III)以鈰計為50ppm,且以底漆組成物全體之不揮發分成為8%之方式,使用(B)成分之1-丙二醇甲基醚乙酸酯進行稀釋,而取得底漆組成物。 使用取得之底漆組成物,藉由下述所示之評價方法來測量各種物性(外觀、穿透率、接著性(接著強度)及腐蝕性),並將結果展示於表1。尚且,表1所示之物性係在23℃下測量之值。[Examples 1 to 6] In the copolymers synthesized in the above-mentioned Synthesis Examples 1 to 6, 50 ppm of bis(acetylpyruvate) bis(III) as the bis(iodide) compound (C) was added in terms of bis(iodide) relative to the total mass of the solid components of the component (A), and the 1-propylene glycol methyl ether acetate of the component (B) was used for dilution in such a manner that the non-volatile content of the entire primer composition was 8%, thereby obtaining a primer composition. Using the obtained primer composition, various physical properties (appearance, penetration, adhesion (adhesion strength) and corrosion resistance) were measured by the evaluation method shown below, and the results are shown in Table 1. The physical properties shown in Table 1 are values measured at 23°C.
[實施例7~13] 在上述合成例1~6所合成之共聚物中,相對於(A)成分之固體成分之總質量份,添加作為鈰化合物(C)之肆(2,2,6,6-四甲基3-5-庚烷二酮基)鈰(IV)以鈰計為50ppm,在實施例7~12中,相對於(A)成分之固體成分之總質量份,摻合作為鋅化合物(D)之雙(2,2,6,6-四甲基-3,5-庚烷二酮基)鋅(II)以鋅計為50ppm,但在實施例13中並未摻合鋅化合物(D),且以底漆組成物全體之不揮發分成為8%之方式使用(B)成分之1-丙二醇甲基醚乙酸酯進行稀釋,而取得底漆組成物。 使用取得之底漆組成物,藉由下述所示之評價方法來測量各種物性(外觀、穿透率、接著性(接著強度)及腐蝕性),並將結果展示於表3。尚且,表3所示之物性係在23℃下測量之值。[Examples 7 to 13] In the copolymers synthesized in the above-mentioned Synthesis Examples 1 to 6, tetrakis(2,2,6,6-tetramethyl-3-5-heptanedione)indium(IV) was added as the indium compound (C) in an amount of 50 ppm in terms of indium relative to the total mass of the solid components of the component (A). In Examples 7 to 12, bis(2,2,6,6-tetramethyl-3,5-heptanedione)zinc(II) was blended as the zinc compound (D) in an amount of 50 ppm in terms of zinc relative to the total mass of the solid components of the component (A). However, in Example 13, the zinc compound (D) was not blended, and 1-propylene glycol methyl ether acetate as the component (B) was used to dilute the primer composition so that the nonvolatile content of the entire primer composition was 8%, thereby obtaining a primer composition. Using the primer composition obtained, various physical properties (appearance, transmittance, adhesion (adhesion strength) and corrosion resistance) were measured by the evaluation methods shown below, and the results are shown in Table 3. The physical properties shown in Table 3 are values measured at 23°C.
[外觀] 將取得之底漆組成物在載玻片上以厚度2μm成為之方式進行毛刷塗佈,在60℃下放置30分鐘使其乾燥,並且在180℃下進行30分鐘乾燥處理。在該底漆組成物上,將加成反應硬化型聚矽氧橡膠組成物(信越化學工業股份有限公司製、KER-2600)塗佈成2mm厚度,在150℃下使其硬化1小時,並觀察其外觀。[Appearance] The primer composition was applied to a glass slide with a brush to a thickness of 2 μm, dried at 60°C for 30 minutes, and then dried at 180°C for 30 minutes. An addition reaction curing type silicone rubber composition (KER-2600 manufactured by Shin-Etsu Chemical Co., Ltd.) was applied to a thickness of 2 mm on the primer composition, cured at 150°C for 1 hour, and its appearance was observed.
[穿透率試驗] 將取得之底漆組成物在載玻片上以厚度2μm成為之方式進行毛刷塗佈,在60℃下放置30分鐘使其乾燥,而形成底漆組成物被膜。測量形成有該底漆組成物被膜之載玻片在波長400nm處之穿透率(初期穿透率)並測量載玻片作為空白對照,並將此設為100%。其次,將形成有上述底漆組成物被膜之載玻片在180℃下熱處理500小時,與上述同樣地測量熱處理後之穿透率,並求出相對於初期穿透率之變化。[Transmittance test] The primer composition was applied to a glass slide with a brush to a thickness of 2μm, and dried at 60°C for 30 minutes to form a primer composition film. The transmittance (initial transmittance) of the glass slide with the primer composition film at a wavelength of 400nm was measured and the glass slide was measured as a blank control, and this was set to 100%. Next, the glass slide with the primer composition film was heat-treated at 180°C for 500 hours, and the transmittance after the heat treatment was measured in the same way as above, and the change relative to the initial transmittance was calculated.
[接著性(接著強度)試驗]
製作出如圖2所示之接著試驗用之試片11。即,對2片之Al基板12、13(KDS公司製,寬25mm)之個別單面,將取得之底漆組成物塗佈成厚度0.01mm,在60℃下放置30分鐘,並且在180℃下使其乾燥,而形成底漆組成物被膜14、15。使該等Al基板之形成有底漆組成物被膜14、15之面成為相對向,並將該等之端部作成重疊10mm,將其之間以2mm厚度夾住加成反應硬化型聚矽氧橡膠組成物(信越化學工業股份有限公司製,KER-2600),藉由在150℃下加熱30分鐘,而使該加成反應硬化型聚矽氧橡膠組成物硬化,而製作出包含藉由聚矽氧橡膠組成物之硬化物16所接著(接著面積25mm×10mm=250mm2
)之2片Al基板的試片。
使該試片之Al基板12、13之個別之端部朝向相反方向(圖2之箭頭方向),使用拉伸試驗機(島津製作所製,Autograph),以拉伸速度50mm/分鐘進行拉伸,求出每單位面積之接著強度(MPa)。[Adhesion (adhesion strength) test] A
[耐腐蝕性試驗] 將取得之底漆組成物填充於在底部具有銀電極之LED封裝,在60℃下放至30分鐘並在180℃下使其乾燥後,在其上將加成反應硬化型聚矽氧橡膠組成物(信越化學工業股份有限公司製,KER-2600)塗佈成1mm厚,在150℃下使其硬化2小時而製作出具有聚矽氧橡膠層之試片。將該試片與硫結晶0.1g一同地放入100cc玻璃瓶並予以密閉,實施例1~6及後述之比較例1~3係放置在70℃下,後述之實施例7~13及比較例4~7係放置在90℃下,以目視觀察1天後及7天後之銀電鍍之腐蝕程度,並以下述基準進行評價。 ○:無腐蝕(變色) △:多少有腐蝕(變色) ×:變黑[Corrosion resistance test] The obtained primer composition is filled into an LED package with a silver electrode at the bottom, placed at 60°C for 30 minutes and dried at 180°C, and then the addition reaction hardening polysiloxane rubber composition is placed on it (KER-2600, manufactured by Shin-Etsu Chemical Industry Co., Ltd.) was applied to a thickness of 1 mm and hardened at 150° C. for 2 hours to prepare a test piece having a silicone rubber layer. The test piece was put into a 100cc glass bottle together with 0.1g of sulfur crystal and sealed. Examples 1 to 6 and Comparative Examples 1 to 3 described later were placed at 70°C. Examples 7 to 13 and Comparative Examples described later 4~7 are placed at 90°C, and the corrosion degree of the silver plating after 1 day and 7 days is visually observed, and evaluated based on the following standards. ○: No corrosion (discoloration) △: How much corrosion (discoloration) is there? ×: darken
[比較例1] 除了未摻合鈰化合物(C)以外,其他係與實施例1同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative example 1] The above-mentioned adhesiveness (adhesion strength) test and corrosion resistance test were conducted in the same manner as in Example 1 except that the cerium compound (C) was not blended.
[比較例2] 除了將上述比較合成例1所合成之共聚物以不揮發分成為8%之方式,使用1-丙二醇甲基醚乙酸酯進行稀釋,而取得底漆組成物以外,其他係與實施例1同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative example 2] The copolymer synthesized in Comparative Synthesis Example 1 was diluted with 1-propylene glycol methyl ether acetate so that the non-volatile content was 8% to obtain a primer composition. The conditions were the same as Example 1. Conduct the above-mentioned adhesiveness (adhesion strength) test and corrosion resistance test accordingly.
[比較例3] 除了未使用底漆組成物以外,其他係與實施例1同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative Example 3] Except that no primer composition was used, the above-mentioned adhesion (adhesion strength) test and corrosion resistance test were carried out in the same manner as in Example 1.
[比較例4] 除了未摻合鈰化合物(C)、鋅化合物(D)以外,其他係與實施例7同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative example 4] The above-mentioned adhesiveness (adhesion strength) test and corrosion resistance test were conducted in the same manner as in Example 7 except that the cerium compound (C) and the zinc compound (D) were not blended.
[比較例5] 除了將上述比較合成例1所合成之共聚物以不揮發分成為8%之方式,使用1-丙二醇甲基醚乙酸酯進行稀釋,而取得底漆組成物以外,其他係與實施例7同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative Example 5] Except that the copolymer synthesized in the comparative synthesis example 1 was diluted with 1-propylene glycol methyl ether acetate so that the non-volatile content was 8% to obtain a primer composition, the above-mentioned adhesion (adhesion strength) test and corrosion resistance test were carried out in the same manner as in Example 7.
[比較例6] 除了未摻合鈰化合物(C)以外,其他係與實施例7同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative example 6] The above-mentioned adhesiveness (adhesion strength) test and corrosion resistance test were conducted in the same manner as in Example 7 except that the cerium compound (C) was not blended.
[比較例7] 除了未使用底漆組成物以外,其他係與實施例7同樣地進行上述接著性(接著強度)試驗及耐腐蝕性試驗。[Comparative Example 7] Except that no primer composition was used, the above-mentioned adhesion (adhesion strength) test and corrosion resistance test were carried out in the same manner as in Example 7.
從表1及3所示之結果,可清楚明白得知使用本發明之底漆組成物之實施例1~13係強固地接著Al與加成反應硬化型聚矽氧橡膠組成物之硬化物。並且,在塗佈於載玻片之底漆組成物被膜之耐熱性試驗中,並無變色,且也無被膜本身之變化,耐熱性亦為優異。又,在使用搭載銀電極之LED封裝之耐腐蝕性試驗中,實施例1~12之任一者在經過7天後仍然維持高穿透率,且展現高腐蝕抑制效果,且實施例13展現些許之腐蝕性。尤其,除可(A)~(C)成分之外也包含(D)成分之實施例7~12展現更高之腐蝕抑制效果。From the results shown in Tables 1 and 3, it can be clearly understood that Examples 1 to 13 using the primer composition of the present invention are hardened products that strongly bond Al and the addition reaction curing type silicone rubber composition. In addition, in the heat resistance test of the primer composition film applied on the slide glass, there was no discoloration, and there was no change in the film itself, and the heat resistance was also excellent. In the corrosion resistance test of the LED package using the silver electrode, any one of Examples 1 to 12 still maintained a high transmittance after 7 days and showed a high corrosion inhibition effect, and Example 13 showed some corrosion. In particular, Examples 7 to 12, which also include component (D) in addition to components (A) to (C), showed a higher corrosion inhibition effect.
另一方面,從表1及2所示之結果,可清楚明白得知在與實施例1相比,並未添加本發明之(C)成分之比較例1在180℃×500小時後之穿透率較差。在與實施例1~6相比,使用與本發明之底漆組成物相異之底漆組成物之比較例2之耐腐蝕性較差。又,在與實施例1~6相比,並未使用底漆組成物本身之比較例3之接著性及耐腐蝕性皆大幅較差。又,從表3及4所示之結果,可清楚明白得知在與實施例7相比,並未添加本發明之(C)成分、(D)成分之比較例4在180℃×500小時後之穿透率較差。在與實施例7~13相比,使用與本發明之底漆組成物相異之底漆組成物之比較例5之接著性及耐腐蝕性較差。在與實施例7相比,並未添加(C)成分之比較例6在180℃×500小時後之穿透率較差。在與實施例7~13相比,並未使用底漆組成物本身之比較例7之接著性及耐腐蝕性皆大幅較差。On the other hand, from the results shown in Tables 1 and 2, it can be clearly understood that compared with Example 1, Comparative Example 1 in which the (C) component of the present invention is not added has better wear performance after 180°C × 500 hours. The transmittance is poor. Compared with Examples 1 to 6, Comparative Example 2 using a primer composition different from the primer composition of the present invention has poorer corrosion resistance. Furthermore, compared with Examples 1 to 6, Comparative Example 3, which did not use the primer composition itself, had significantly poorer adhesion and corrosion resistance. In addition, from the results shown in Tables 3 and 4, it can be clearly understood that compared with Example 7, Comparative Example 4 in which the (C) component and (D) component of the present invention are not added has a higher temperature at 180° C. × 500 hours. The penetration rate is poor afterwards. Compared with Examples 7 to 13, Comparative Example 5 using a primer composition different from the primer composition of the present invention has poor adhesion and corrosion resistance. Compared with Example 7, Comparative Example 6, which did not add component (C), had poor penetration after 180°C × 500 hours. Compared with Examples 7 to 13, Comparative Example 7, which did not use the primer composition itself, had significantly poorer adhesion and corrosion resistance.
尚且,本發明並非係受到上述實施形態所限定者。上述實施形態僅為例示,具有本發明之申請專利範圍記載之技術思想實質相同之構成,且達成相同作用效果者,無論係任何形態皆係包含在本發明之技術範圍內。Furthermore, the present invention is not limited to the above-mentioned embodiments. The above-mentioned embodiments are merely examples, and any embodiments having substantially the same structure as the technical concept described in the scope of the patent application of the present invention and achieving the same effect are included in the technical scope of the present invention.
1:光半導體裝置(LED燈)
2:底漆組成物
3:LED
4:基板
5:加成反應硬化型聚矽氧組成物之硬化物
6:金屬電極
7:接合線
11:試片
12,13:Al基板
14,15:底漆組成物被膜
16:加成反應硬化型聚矽氧橡膠組成物之硬化物1: Optical semiconductor device (LED lamp)
2: Primer composition
3: LED
4: Substrate
5: Cured product of addition reaction curing type silicone composition
6: Metal electrode
7: Bonding wire
11:
[圖1]展示本發明之光半導體裝置之一例的LED剖面圖。 [圖2]說明實施例及比較例中之接著性試驗用試片的斜視圖。[Figure 1] A cross-sectional view of an LED showing an example of a photoconductor device of the present invention. [Figure 2] An oblique view of a test piece for adhesion testing in an embodiment and a comparative example.
1:光半導體裝置(LED燈) 1: Optical semiconductor device (LED lamp)
2:底漆組成物 2: Primer composition
3:LED 3:LED
4:基板 4:Substrate
5:加成反應硬化型聚矽氧組成物之硬化物 5: Hardened product of addition reaction hardening polysiloxane composition
6:金屬電極 6: Metal electrode
7:接合線 7:Joining line
Claims (10)
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JP2008150438A (en) * | 2006-12-14 | 2008-07-03 | Momentive Performance Materials Japan Kk | Silicone composition for sealing semiconductor and semiconductor apparatus using the same |
TW200947769A (en) * | 2008-02-26 | 2009-11-16 | Shinetsu Chemical Co | Method of sealing led device, and led device |
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JP2004292714A (en) | 2003-03-28 | 2004-10-21 | Kanegafuchi Chem Ind Co Ltd | Curable composition, cured product, its manufacturing method and light emitting diode encapsulated by cured product |
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JP2008150438A (en) * | 2006-12-14 | 2008-07-03 | Momentive Performance Materials Japan Kk | Silicone composition for sealing semiconductor and semiconductor apparatus using the same |
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