TWI819278B - Method for manufacturing electromagnetic wave shielding package using conductive composition - Google Patents

Method for manufacturing electromagnetic wave shielding package using conductive composition Download PDF

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Publication number
TWI819278B
TWI819278B TW110106761A TW110106761A TWI819278B TW I819278 B TWI819278 B TW I819278B TW 110106761 A TW110106761 A TW 110106761A TW 110106761 A TW110106761 A TW 110106761A TW I819278 B TWI819278 B TW I819278B
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groove
conductive composition
protective film
sealing
sealing layer
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TW110106761A
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Chinese (zh)
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TW202147468A (en
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野口英俊
津田剛志
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日商拓自達電線股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields

Abstract

本發明課題係提供一種電磁波屏蔽封裝體之製造方法,其藉由使對形成在密封層之槽部填充的導電性組成物硬化,而可形成與密封層上面呈平滑的間隔屏蔽層。 解決手段係一種電磁波屏蔽封裝體之製造方法,具有以下步驟:密封步驟,於基板上搭載複數個電子零件,於該基板上填充密封材且使之硬化,藉此形成用以將上述電子零件密封之密封層;槽形成步驟,於上述複數個電子零件間切削上述密封層,形成槽部;遮蔽步驟,於上述密封層上面,以至少覆蓋上述槽部上面開口部之方式形成保護膜;填充步驟,將用以吐出導電性組成物之裝置之噴嘴前端部刺穿上述保護膜而插入上述槽部內,於上述槽部內填充相當於上述槽部體積之導電性組成物;及硬化步驟,使上述導電性組成物硬化,藉以獲得間隔屏蔽層。The object of the present invention is to provide a method for manufacturing an electromagnetic wave shielding package, which can form a smooth spaced shielding layer with the upper surface of the sealing layer by hardening the conductive composition filled in the groove portion formed in the sealing layer. The solution is a manufacturing method of an electromagnetic wave shielding package, which has the following steps: a sealing step, mounting a plurality of electronic components on a substrate, filling the substrate with a sealing material and hardening it, thereby forming a sealing step for sealing the electronic components The sealing layer; the groove forming step, cutting the sealing layer between the plurality of electronic components to form a groove; the shielding step, forming a protective film on the sealing layer to at least cover the opening on the groove; the filling step , the front end of the nozzle of the device for discharging the conductive composition is pierced through the protective film and inserted into the groove, and a conductive composition equivalent to the volume of the groove is filled in the groove; and a hardening step is made to make the conductive The plastic composition hardens to obtain a barrier shield.

Description

使用導電性組成物之電磁波屏蔽封裝體之製造方法Method for manufacturing electromagnetic wave shielding package using conductive composition

本發明係關於使用導電性組成物之電磁波屏蔽封裝體之製造方法。 The present invention relates to a method for manufacturing an electromagnetic wave shielding package using a conductive composition.

背景技術 Background technology

於行動電話或平板電腦等電子設備中,由於小型化、高功能化的要求,而尋求將複數個半導體晶片收納於一個封裝體中、作為一個系統來運作的封裝體系(System in Package,SIP)。 In electronic devices such as mobile phones and tablet computers, due to the requirements for miniaturization and high functionality, a packaging system (System in Package, SIP) that contains multiple semiconductor chips in one package and operates as a system is being sought. .

於如此的封裝體系中,為了兼具電子設備之小型輕量化與高功能化,而提高電子零件之安裝密度。然而,若提高安裝密度,則有相鄰之電子零件間因為電磁波干擾而發生錯誤動作之虞。 In such a packaging system, in order to achieve both compactness, lightweight and high functionality of electronic devices, the mounting density of electronic components is increased. However, if the mounting density is increased, there is a risk that adjacent electronic components may malfunction due to electromagnetic wave interference.

針對上述問題,關於防止電子零件之錯誤動作之方法,已知有如下方法:於利用密封材密封後的電子零件間形成槽部(溝槽),以導電性組成物填埋該槽部,藉此以於電子零件與電子零件之間設置分隔之方式形成屏蔽層(所謂間隔屏蔽)。 In response to the above problem, as a method of preventing malfunction of electronic components, the following method is known: forming grooves (grooves) between electronic components sealed with a sealing material, and filling the grooves with a conductive composition. This forms a shielding layer (so-called spacer shielding) by providing separation between electronic components.

關於在槽部填充導電性組成物之方法,可使用真空印刷工法或分配工法。於此,所謂真空印刷工法係指使用化學纖維的網來製作版,於真空下經由版摩擦墨水,藉此於設置於版下之被印刷物之印刷面進行印刷的方法。又,所謂分配工法係指將導電性組成物從注射器形狀的噴嘴前端擠出進行塗佈的方法。 As a method of filling the groove portion with the conductive composition, a vacuum printing method or a dispensing method can be used. Here, the so-called vacuum printing method refers to a method in which a chemical fiber mesh is used to make a plate, and ink is rubbed through the plate under vacuum to print on the printing surface of the object to be printed placed under the plate. In addition, the dispensing method refers to a method of applying the conductive composition by extruding it from the tip of a syringe-shaped nozzle.

為了藉由上述方法獲得充分的屏蔽特性,必須使導電性組成物毫 無空隙地從槽部底面填充至上面開口部。又,由封裝體系之低高度化等觀點,而要求導電性組成物不要從槽部溢出,且密封層與間隔屏蔽層之表面呈平滑。 In order to obtain sufficient shielding properties by the above method, the conductive composition must be Fill the groove from the bottom to the upper opening without any gaps. In addition, from the viewpoint of reducing the height of the packaging system, it is required that the conductive composition does not overflow from the groove and that the surfaces of the sealing layer and the spacer shielding layer are smooth.

然而,使用真空印刷工法時,於印刷時會有導電性組成物從槽部上面開口部溢出之情形。另一方面,於分配工法中,雖然將分配裝置之噴嘴前端部一面沿著槽部於水平方向移動,一面吐出導電性組成物,但於基板有翹曲時,難以使基板與噴嘴前端部之距離保持固定,難以以固定吐出量對槽填充導電性組成物。又,由於所形成之槽部之槽寬或深度存在誤差,故導電性組成物之吐出位置所需要的填充量存在偏差。因此,或因已填充的導電性組成物從槽部上面開口部溢出、或因填充量不足,而難以形成與密封層上面呈平滑的間隔屏蔽層。 However, when the vacuum printing method is used, the conductive composition may overflow from the opening on the groove part during printing. On the other hand, in the dispensing method, the conductive composition is ejected while moving the nozzle tip of the dispensing device in the horizontal direction along the groove. However, when the substrate is warped, it is difficult to make the connection between the substrate and the nozzle tip. The distance remains fixed, and it is difficult to fill the grooves with the conductive composition at a fixed discharge amount. In addition, since there is an error in the groove width or depth of the formed groove portion, there is a variation in the filling amount required for the discharge position of the conductive composition. Therefore, it is difficult to form a smooth spacer shield layer with the upper surface of the sealing layer, either because the filled conductive composition overflows from the upper opening of the groove portion or because the filling amount is insufficient.

先行技術文獻 Advanced technical documents

專利文獻 patent documents

[專利文獻1]日本特開平8-153738號公報 [Patent Document 1] Japanese Patent Application Laid-Open No. 8-153738

[專利文獻2]日本特開2018-56186號公報 [Patent Document 2] Japanese Patent Application Publication No. 2018-56186

[專利文獻3]日本特開平3-269514號公報 [Patent Document 3] Japanese Patent Application Publication No. 3-269514

[專利文獻4]日本特開平8-124813號公報 [Patent Document 4] Japanese Patent Application Laid-Open No. 8-124813

發明概要 Summary of the invention

本發明係鑑於上述而完成者,目的係提供一種電磁波屏蔽封裝體之製造方法,其藉由將導電性組成物對形成在密封層之槽部毫無空隙地從槽部底面填充至上面開口部,且使之硬化,而可形成與密封層上面呈平滑的間隔屏蔽層。 The present invention was made in view of the above, and an object thereof is to provide a method for manufacturing an electromagnetic wave shielding package by filling a groove formed in a sealing layer with a conductive composition from the bottom of the groove to the upper opening without any gaps. , and harden it to form a smooth spaced shielding layer above the sealing layer.

又,於專利文獻1~4中雖然記載有塗佈導電性組成物之方法,但並未記載如本發明般,以覆蓋形成於密封層之槽部上面開口部之方式形成保護膜 之方法。 Furthermore, Patent Documents 1 to 4 describe a method of applying a conductive composition, but they do not describe forming a protective film so as to cover the opening on the groove portion formed in the sealing layer as in the present invention. method.

本發明之電磁波屏蔽封裝體之製造方法具有以下步驟:密封步驟,於基板上搭載複數個電子零件,於該基板上填充密封材且使之硬化,藉此形成用以將上述電子零件密封之密封層;槽形成步驟,於上述複數個電子零件間切削上述密封材,形成槽部;遮蔽步驟,於上述密封層上面,以至少覆蓋上述槽部上面開口部之方式形成保護膜;填充步驟,將用以吐出導電性組成物之裝置之噴嘴前端部刺穿上述保護膜而插入上述槽部內,於上述槽部內填充相當於上述槽部體積之導電性組成物;及硬化步驟,使上述導電性組成物硬化,藉以獲得間隔屏蔽層。 The manufacturing method of the electromagnetic wave shielding package of the present invention has the following steps: a sealing step, mounting a plurality of electronic components on a substrate, filling the substrate with a sealing material and hardening it, thereby forming a seal for sealing the electronic components layer; the groove forming step is to cut the sealing material between the plurality of electronic components to form a groove; the shielding step is to form a protective film on the sealing layer to at least cover the opening on the groove; the filling step is to The front end of the nozzle of the device for discharging the conductive composition pierces the protective film and is inserted into the groove, filling the groove with a conductive composition equivalent to the volume of the groove; and a hardening step to make the conductive composition The material is hardened to obtain a spacer shield.

本發明之電磁波屏蔽封裝體之製造方法亦可在位於上述槽部末端部之上述保護膜設置有用以排氣之孔。 In the manufacturing method of the electromagnetic wave shielding package of the present invention, the protective film located at the end of the groove portion may also be provided with a hole for exhaust.

本發明之電磁波屏蔽封裝體之製造方法亦可為於上述填充步驟中,在吐出相當於上述槽部體積之導電性組成物後,一面將上述噴嘴前端部從上述槽部拉出,一面吐出相當於曾插入至上述槽部之噴嘴前端部體積的導電性組成物。 The manufacturing method of the electromagnetic wave shielding package of the present invention may also include: in the above-mentioned filling step, after discharging a conductive composition equivalent to the volume of the above-mentioned groove part, the front end of the nozzle is pulled out from the above-mentioned groove part while discharging an equivalent amount. A conductive composition in the volume of the nozzle front end inserted into the groove.

根據本發明之電磁波屏蔽封裝體之製造方法,可獲得屏蔽性優異、具有與密封層上面呈平滑的間隔屏蔽層之電磁波屏蔽封裝體。 According to the method of manufacturing an electromagnetic wave shielding package of the present invention, an electromagnetic wave shielding package having excellent shielding properties and having a smooth shielding layer spaced above the sealing layer can be obtained.

10:基板 10:Substrate

11:接地電路 11: Ground circuit

12:密封層 12:Sealing layer

13:槽部 13: Groove

14:保護膜 14:Protective film

15:導電性組成物 15: Conductive composition

16:噴嘴前端部 16: Nozzle front end

20:間隔屏蔽層 20: Interval shielding layer

21:上面部 21: Upper face

22:底面部 22: Bottom face

23:屏蔽層 23:Shielding layer

30:電子零件 30: Electronic parts

A:於基板上經個別化的封裝體 A: Individualized package on the substrate

B:經單片化的屏蔽封裝體 B: Monolithized shielded package

圖1係顯示本發明一實施形態之製造方法之填充步驟的示意圖。 FIG. 1 is a schematic diagram showing the filling step of the manufacturing method according to an embodiment of the present invention.

圖2係顯示本發明一實施形態之製造方法之於封裝體表面形成屏蔽層之步驟的示意圖。 FIG. 2 is a schematic diagram showing the steps of forming a shielding layer on the surface of a package in a manufacturing method according to an embodiment of the present invention.

圖3係於實施例中使用的樣本基板的密封層所形成的槽部的示意剖面圖。 3 is a schematic cross-sectional view of the groove portion formed by the sealing layer of the sample substrate used in the embodiment.

圖4係於實施例中作成之樣本1的俯視照片。 FIG. 4 is a top view photograph of Sample 1 produced in the Example.

圖5係於實施例中作成之樣本1的剖面照片。 Figure 5 is a cross-sectional photograph of sample 1 prepared in the Example.

圖6係從斜45°上方拍攝於實施例中作成之樣本1的X射線照片。 FIG. 6 is an X-ray photograph of Sample 1 produced in the Example taken from above at an angle of 45°.

圖7係於比較例中作成之樣本2的俯視照片。 FIG. 7 is a top view photograph of Sample 2 produced in Comparative Example.

圖8係於比較例中作成之樣本2的剖面照片。 Figure 8 is a cross-sectional photograph of sample 2 produced in the comparative example.

圖9係從斜45°上方拍攝於比較例中作成之樣本2的X射線照片。 Figure 9 is an X-ray photograph of sample 2 produced in the comparative example taken from above at an angle of 45°.

用以實施發明之形態 Form used to implement the invention

本發明之一實施形態之電磁波屏蔽封裝體之製造方法,如上所述,具有以下步驟:密封步驟,於基板上搭載複數個電子零件,於該基板上填充密封材使之硬化,藉此形成用以將上述電子零件密封之密封層;槽形成步驟,於上述複數個電子零件間切削上述密封層,形成槽部;遮蔽步驟,於上述密封層上面,以至少覆蓋上述槽部上面開口部之方式形成保護膜;填充步驟,將用以吐出導電性組成物之裝置之噴嘴前端部刺穿上述保護膜而插入上述槽部內,於上述槽部內填充相當於上述槽部體積之導電性組成物;及硬化步驟,使上述導電性組成物硬化,藉此獲得間隔屏蔽層。 The manufacturing method of the electromagnetic wave shielding package according to one embodiment of the present invention, as mentioned above, has the following steps: a sealing step, mounting a plurality of electronic components on a substrate, filling the substrate with a sealing material and hardening it, thereby forming a A sealing layer for sealing the above-mentioned electronic components; a groove forming step of cutting the sealing layer between the plurality of electronic components to form a groove; and a shielding step of covering at least the opening on the groove above the sealing layer. Forming a protective film; in the filling step, the front end of a nozzle of a device for discharging the conductive composition is pierced through the protective film and inserted into the groove, and a conductive composition equivalent to the volume of the groove is filled in the groove; and In the hardening step, the conductive composition is hardened to obtain a spacer shielding layer.

上述密封步驟並無特別限定,可依照常法實施。於此所使用之密封材可使用一般所使用者,並無特別限定。 The above sealing steps are not particularly limited and can be implemented according to common methods. The sealing material used here can be commonly used and is not particularly limited.

上述槽形成步驟並無特別限定,可依照常法實施。於先前之真空印刷工法或分配工法中,由防止導電性組成物從槽部上面開口部溢出之觀點,槽部形狀採用槽部上面開口部的槽寬比槽部底面的槽寬更寬的形狀(所謂的二段溝槽),但根據本實施形態之製造方法,並不限定於此,可採用各種多樣形狀。 The above-mentioned groove forming step is not particularly limited and can be carried out according to common methods. In the conventional vacuum printing method or dispensing method, from the viewpoint of preventing the conductive composition from overflowing from the opening on the top of the groove, the shape of the groove is adopted such that the width of the opening on the top of the groove is wider than the groove width on the bottom of the groove. (so-called two-stage groove), but according to the manufacturing method of this embodiment, it is not limited to this, and various shapes can be adopted.

上述遮蔽步驟只要以至少上述槽部上面開口部獲覆蓋之方式形成保護膜即可。 The above-mentioned shielding step only needs to form a protective film in such a manner that at least the opening on the upper surface of the groove is covered.

保護膜可根據導電性組成物之組成或導電性組成物之硬化溫度、填充導電性組成物時之裝置設定、填充體積、槽部之設計而適當選擇。關於保護膜之材質,可使用一般所使用者,並無特別限定,可列舉:聚乙烯、聚酯、聚矽氧橡膠、聚醯亞胺、聚對苯二甲酸乙二酯、聚丙烯、聚萘二甲酸乙二酯、尼龍、聚伸苯硫醚、氟樹脂、聚醚醚酮等。關於此種的保護膜,例如可使用3M日本股份有限公司製「7414」等。 The protective film can be appropriately selected based on the composition of the conductive composition or the curing temperature of the conductive composition, the device settings when filling the conductive composition, the filling volume, and the design of the groove. Regarding the material of the protective film, any commonly used material can be used without particular limitations. Examples include: polyethylene, polyester, polysilicone rubber, polyimide, polyethylene terephthalate, polypropylene, polyethylene Ethylene naphthalate, nylon, polyphenylene sulfide, fluororesin, polyetheretherketone, etc. As such a protective film, for example, "7414" manufactured by 3M Japan Co., Ltd. can be used.

使用圖1說明上述填充步驟。圖1係顯示採用已於基板10上形成接地電路11、且基板10及接地電路11已藉密封層12所密封、並於密封層12形成有槽部13者,而於該槽部13內填充導電性組成物15之步驟的圖。於本實施形態中,由於使用圓錐台狀的噴嘴前端部16,故若欲一次刺穿保護膜14,恐會有保護膜14拉伸而於保護膜14與噴嘴前端部16之間產生間隙,導電性組成物15從該間隙洩漏之虞。因此,首先如圖1(a)、(b)所示,將噴嘴前端部16對已形成有保護膜14的槽部13一鼓作氣壓入,於保護膜14賦型。此時的壓入量或壓入速度可根據噴嘴前端部16的形狀或槽部13的形狀、保護膜14的種類而適當調整。然後,將噴嘴前端部16暫時離開基板10。再者,於本說明書中所謂「壓入量」係指密封層上面與插入至槽部之噴嘴前端部的距離。 The above filling steps are explained using Figure 1. Figure 1 shows that the ground circuit 11 has been formed on the substrate 10, and the substrate 10 and the ground circuit 11 have been sealed by the sealing layer 12, and a groove 13 is formed in the sealing layer 12, and the groove 13 is filled. Diagram of the steps of conductive composition 15. In this embodiment, since the truncated cone-shaped nozzle front end 16 is used, if the protective film 14 is to be pierced at one time, the protective film 14 may stretch and create a gap between the protective film 14 and the nozzle front end 16. There is a risk that the conductive composition 15 leaks from this gap. Therefore, first, as shown in FIGS. 1(a) and (b) , the nozzle front end 16 is pressed into the groove part 13 where the protective film 14 has been formed, and the protective film 14 is shaped. The pushing amount or the pushing speed at this time can be appropriately adjusted according to the shape of the nozzle tip 16 or the shape of the groove portion 13 and the type of the protective film 14 . Then, the nozzle tip 16 is temporarily separated from the substrate 10 . In addition, in this specification, the "press-in amount" refers to the distance between the upper surface of the sealing layer and the front end of the nozzle inserted into the groove.

接著,如圖1(c)、(d)所示,將噴嘴前端部16對槽部13慢慢地壓入,刺穿保護膜14。藉由如此分二次壓入,可於保護膜14與噴嘴前端部16之間不產生間隙地將噴嘴前端部16刺穿保護膜14。此時的壓入量或壓入速度可根據噴嘴前端部16的形狀或槽部13的形狀、保護膜14的種類而適當調整,但宜為壓入量比第一次的壓入大、壓入速度比第一次的壓入慢。 Next, as shown in FIGS. 1(c) and (d) , the nozzle tip 16 is slowly pressed into the groove 13 to pierce the protective film 14 . By pressing in twice in this manner, the nozzle front end 16 can pierce the protective film 14 without creating a gap between the protective film 14 and the nozzle front end 16 . The amount of press-in or the speed of press-in at this time can be adjusted appropriately according to the shape of the nozzle tip 16 or the shape of the groove portion 13 and the type of the protective film 14. However, it is preferable that the amount of press-in is larger than that of the first press-in and the pressure is greater than that of the first press-in. The insertion speed is slower than the first pressing.

如圖1(e)所示,吐出相當於槽部13體積的導電性組成物15。吐出的導電性組成物15填充至由槽部13與覆蓋槽部13開口部的保護膜14所劃出的空間的每個角落。於先前的分配工法中,在槽部13之縱橫比(深度/槽寬)較大時,難以 無空隙地填充導電性組成物15,但根據本實施形態之填充方法,即使對例如縱橫比為10~20之槽部13亦可無空隙地填充導電性組成物15。 As shown in FIG. 1(e) , the conductive composition 15 corresponding to the volume of the groove portion 13 is discharged. The discharged conductive composition 15 fills every corner of the space defined by the groove portion 13 and the protective film 14 covering the opening of the groove portion 13 . In the previous distribution method, when the aspect ratio (depth/groove width) of the groove portion 13 is large, it is difficult to The conductive composition 15 is filled without voids. However, according to the filling method of this embodiment, the conductive composition 15 can be filled without voids even in the groove portion 13 having an aspect ratio of 10 to 20, for example.

如圖1(e)所示,填充導電性組成物15時,根據噴嘴前端部16的形狀或噴嘴前端部16對槽部13的壓入量等的不同,有產生相當於插入槽部13的噴嘴前端部16的體積的凹部之情形。此時,視需要如圖1(f)所示,藉由一面將噴嘴前端部16從槽部13拔出,一面吐出相當於曾插入至槽部13之噴嘴前端部16體積的導電性組成物15,藉此可填埋相當於所插入的噴嘴前端部16體積的凹部。 As shown in FIG. 1(e) , when filling the conductive composition 15 , depending on the shape of the nozzle tip 16 or the amount of pressing of the nozzle tip 16 into the groove 13 , there may be a problem corresponding to the insertion into the groove 13 . The case of a concave portion in the volume of the nozzle tip 16. At this time, if necessary, as shown in FIG. 1( f ), the conductive composition equivalent to the volume of the nozzle front end 16 inserted into the groove 13 is ejected while pulling out the nozzle front end 16 from the groove 13 . 15, whereby a recess equivalent to the volume of the inserted nozzle front end 16 can be filled.

吐出導電性組成物15時使用的裝置,只要為可使用於分配工法者,則並無特別限定,可例舉:於Nordson ASYMTEK公司製的分配器「S2-920N-P」使用閥「DV-8000」者。吐出導電性組成物15時之裝置設定,例如閥溫度、基板溫度可根據導電性組成物15之組成或黏度等而適當調整。 The device used when discharging the conductive composition 15 is not particularly limited as long as it can be used for the dispensing method. An example is the valve "DV-" used in the dispenser "S2-920N-P" manufactured by Nordson ASYMTEK Co., Ltd. 8000". The device settings when discharging the conductive composition 15, such as the valve temperature and substrate temperature, can be appropriately adjusted according to the composition or viscosity of the conductive composition 15.

吐出導電性組成物15的速度(每1秒的吐出量)可根據形成在密封層12之槽部13的形狀或導電性組成物15的黏度等而適當調整。 The speed at which the conductive composition 15 is discharged (the discharge amount per second) can be appropriately adjusted depending on the shape of the groove portion 13 formed in the sealing layer 12 or the viscosity of the conductive composition 15 .

導電性組成物15只要為可用於形成間隔(compartment)屏蔽層20者即可,並無特別限定,但宜為不包含溶劑者。包含溶劑時,恐有溶劑在導電性組成物15硬化時揮發而產生空隙之虞。 The conductive composition 15 is not particularly limited as long as it can be used to form the compartment shielding layer 20 , but it is preferably one that does not contain a solvent. When a solvent is included, there is a risk that the solvent may evaporate when the conductive composition 15 is hardened and voids may be generated.

又,於先前之分配工法中,由填充性等觀點,需要將導電性組成物之25℃下的黏度調整至600dPa.s以下,但根據本實施形態之填充方法,即使具有更高黏度之導電性組成物亦可使用。具體而言,可根據所使用之裝置之種類、或形成於密封層12之槽部13之形狀等而適當調整,但作為一般的標準,導電性組成物15在25℃下的黏度宜為1500dPa.s以下、較佳為1000dPa.s以下。為1500dPa.s以下時,可從插入之噴嘴前端部16沿著槽部13流入導電性組成物15,容易獲得朝槽部13的優異的填充性。再者,黏度之測定方法可根據JIS K7117-1,利用單一圓筒形旋轉黏度計(所謂B型或BH型黏度計)使用轉子No.7以10rpm進行測定。只 要為可利用單一圓筒形旋轉黏度計測定的黏度,再低也沒有問題。 In addition, in the previous dispensing method, from the viewpoint of filling properties, the viscosity of the conductive composition at 25°C needs to be adjusted to 600dPa. s or less, but according to the filling method of this embodiment, even a conductive composition with a higher viscosity can be used. Specifically, it can be adjusted appropriately according to the type of device used, the shape of the groove portion 13 formed in the sealing layer 12, etc., but as a general standard, the viscosity of the conductive composition 15 at 25°C is preferably 1500 dPa. . s or less, preferably 1000dPa. s or less. is 1500dPa. When s or less, the conductive composition 15 can flow from the inserted nozzle tip 16 along the groove 13, and excellent filling properties into the groove 13 can be easily obtained. Furthermore, the viscosity can be measured according to JIS K7117-1 using a single cylindrical rotational viscometer (so-called B-type or BH-type viscometer) using spindle No. 7 at 10 rpm. Only The viscosity can be measured with a single cylindrical rotational viscometer, no matter how low it is.

上述硬化步驟只要根據所使用的導電性組成物15適當設定硬化條件即可,並無特別限定。再者,保護膜14宜於硬化步驟後剝離。 The above-mentioned hardening step is not particularly limited as long as the hardening conditions are appropriately set according to the conductive composition 15 used. Furthermore, the protective film 14 is preferably peeled off after the hardening step.

根據本實施形態之電磁波屏蔽封裝體之製造方法,可將導電性組成物15無空隙地填充至槽部13的每個角落,導電性組成物15亦不會從槽部13上面開口部溢出或產生凹陷,藉由使導電性組成物15硬化,可不進行研磨等即獲得與密封層12上面沒有階差的平滑的間隔屏蔽層20。 According to the manufacturing method of the electromagnetic wave shielding package of this embodiment, the conductive composition 15 can be filled into every corner of the groove 13 without gaps, and the conductive composition 15 will not overflow from the upper opening of the groove 13 or By hardening the conductive composition 15 to generate dents, a smooth spacer shield layer 20 having no step difference from the upper surface of the sealing layer 12 can be obtained without polishing or the like.

又,於先前之分配工法中,例如對於放射狀延伸的形狀或S字等彎曲形狀般具有複雜形狀的槽部13,填充導電性組成物15時,需要以較高的位置精度來控制噴嘴前端部16。於本實施形態之電磁波屏蔽封裝體之製造方法中,與先前之分配工法不同,由於只要使噴嘴前端部16相對於基板10上下地移動即可,不需要沿著槽部13水平方向地移動,故即使槽部13具有如上述般複雜形狀時,亦可簡單且無空隙地填充導電性組成物15、使之硬化,藉此,可獲得具有優異屏蔽性、且與密封層12上面呈平滑的間隔屏蔽層20。 In addition, in the previous dispensing method, for example, when filling the conductive composition 15 into the groove portion 13 that has a complex shape such as a radially extending shape or a curved shape such as an S, it is necessary to control the nozzle tip with high positional accuracy. Department 16. In the manufacturing method of the electromagnetic wave shielding package of this embodiment, unlike the previous dispensing method, it is only necessary to move the nozzle tip 16 up and down relative to the substrate 10, and there is no need to move it horizontally along the groove portion 13. Therefore, even when the groove portion 13 has a complex shape as described above, the conductive composition 15 can be filled and hardened simply and without gaps, thereby obtaining a smooth surface with excellent shielding properties and the upper surface of the sealing layer 12 . Spacer shield 20.

<變化例> <Example of changes>

於上述實施形態中,說明藉由分二次壓入噴嘴前端部16,而於保護膜14與噴嘴前端部16之間不產生間隙地將噴嘴前端部16刺穿保護膜14之例,但並不限定於此,可使用預先開孔的保護膜14,又,亦可具有使用針等於保護膜14開孔的步驟。 In the above embodiment, the example in which the nozzle front end 16 is pressed in twice so that the nozzle front end 16 pierces the protective film 14 without creating a gap between the protective film 14 and the nozzle front end 16 is explained. However, this is not the case. It is not limited to this, and the protective film 14 with pre-opened holes may be used, and there may also be a step of using a needle to open holes in the protective film 14 .

又,由於使用噴嘴前端部16之形狀為圓錐台狀者,故有保護膜14拉伸、於保護膜14與噴嘴前端部16之間產生間隙之虞,但根據噴嘴前端部16形狀的不同,亦有保護膜14與噴嘴前端部16之間無產生間隙之虞的情形。具體而言,可舉例:噴嘴前端部16之形狀如注射針般地前端部傾斜地切斷,切斷面具有刀面。使用如此的噴嘴時,由於容易將噴嘴前端部16刺穿保護膜14,故保護膜14與 噴嘴前端部16之間無產生間隙之虞,因此,不需要將噴嘴前端部16分二次壓入。 In addition, since the shape of the nozzle tip 16 is a truncated cone, the protective film 14 may stretch and a gap may be generated between the protective film 14 and the nozzle tip 16. However, depending on the shape of the nozzle tip 16, There may be cases where there is no risk of a gap occurring between the protective film 14 and the nozzle tip 16 . Specifically, for example, the shape of the nozzle front end portion 16 is like an injection needle, the front end portion is cut obliquely, and the cut surface has a knife surface. When such a nozzle is used, since the nozzle front end 16 is easily pierced through the protective film 14, the protective film 14 and There is no risk of a gap occurring between the nozzle tip portions 16, so there is no need to push the nozzle tip portion 16 in twice.

本發明之電磁波屏蔽封裝體之製造方法亦可為於位於槽部13末端部的保護膜14設置用以排氣的孔。即使槽部13只在密封層12上面開口(槽部13於密封層12之側面不連通),且槽部13上面開口部被保護膜14完全地密閉時,藉由如此於保護膜14設置用以排氣的孔,可將伴隨著填充導電性組成物15而無處可去的空氣排出到槽部13外,而可將導電性組成物15無空隙地填充至槽部13之各個角落。 The manufacturing method of the electromagnetic wave shielding package of the present invention may also provide a hole for exhaust in the protective film 14 located at the end of the groove portion 13 . Even if the groove portion 13 only opens on the sealing layer 12 (the groove portion 13 is not connected to the side surface of the sealing layer 12), and the opening on the groove portion 13 is completely sealed by the protective film 14, by setting the protective film 14 in this way, The exhaust holes can discharge the air that has nowhere to go when filling the conductive composition 15 to the outside of the groove portion 13, and the conductive composition 15 can be filled into every corner of the groove portion 13 without gaps.

本發明之電磁波屏蔽封裝體之製造方法亦可為具有以下步驟者:將保護膜14剝除後,於封裝體表面塗佈導電性組成物並使之硬化,而於封裝體表面形成屏蔽層的步驟;及使各電子零件之封裝體單片化的步驟。 The manufacturing method of the electromagnetic wave shielding package of the present invention may also include the following steps: after peeling off the protective film 14, coating a conductive composition on the surface of the package and hardening it to form a shielding layer on the surface of the package Steps; and steps of monolithizing the package of each electronic component.

具體而言,根據封裝體系之設計,如於圖2(a)中箭頭所示,於未形成有間隔屏蔽層20之電子零件30間切削密封層12而形成槽部,藉由此等槽部使基板10之電子零件30之封裝體個別化。符號A表示分別經個別化的封裝體。接地電路11之至少一部分從構成槽的壁面露出,槽底部並未完全地貫通基板10。 Specifically, according to the design of the packaging system, as shown by the arrow in FIG. 2(a) , the sealing layer 12 is cut between the electronic components 30 without the spacing shielding layer 20 to form grooves. Through these grooves The packages of the electronic components 30 on the substrate 10 are individualized. Symbol A indicates individualized packages. At least part of the ground circuit 11 is exposed from the wall forming the trench, and the bottom of the trench does not completely penetrate the substrate 10 .

接著,如圖2(b)所示,藉由周知的噴槍等霧狀地噴射導電性組成物,均勻地塗佈於封裝體表面。然後,進行加熱使導電性組成物充分地硬化,於封裝體表面形成屏蔽層23。塗佈導電性組成物之方法並不限定於噴霧塗佈,可為真空印刷工法等方法,且亦可為藉由金屬鍍覆法等形成金屬層作為屏蔽層23。 Next, as shown in FIG. 2(b) , the conductive composition is sprayed in a mist form using a well-known spray gun or the like, and is evenly coated on the surface of the package. Then, heating is performed to fully harden the conductive composition, and the shielding layer 23 is formed on the surface of the package. The method of applying the conductive composition is not limited to spray coating, and may be a vacuum printing method, or a metal plating method or the like to form a metal layer as the shielding layer 23 .

接著,如於圖2(c)中箭頭所示,藉由切割機(dicing saw)等沿著單片化前的封裝體的槽底部將基板10切斷,獲得經單片化的封裝體B。 Next, as shown by the arrow in FIG. 2(c) , the substrate 10 is cut with a dicing saw or the like along the groove bottom of the pre-single package to obtain the singulated package B. .

於圖2中,顯示接地電路11與屏蔽層23連接的電磁波屏蔽封裝體的構造,但亦可為接地電路11與間隔屏蔽層20連接的構造、接地電路11與間隔屏蔽層20及屏蔽層23兩者連接的構造。 In FIG. 2 , the structure of the electromagnetic wave shielding package in which the ground circuit 11 and the shield layer 23 are connected is shown. However, it may also be a structure in which the ground circuit 11 and the space shield layer 20 are connected, or the ground circuit 11 and the space shield layer 20 and the shield layer 23 may be connected. The structure that connects the two.

再者,於圖2(a)中,雖然切削接地電路11與密封層12而形成槽部, 但並不限定於此,亦可僅切削密封層12而形成槽部。藉由如此形成槽部,可使接地電路11從經單片化的封裝體B的側面露出。 Furthermore, in FIG. 2(a) , although the ground circuit 11 and the sealing layer 12 are cut to form grooves, However, it is not limited to this, and only the sealing layer 12 may be cut to form the groove portion. By forming the groove portion in this way, the ground circuit 11 can be exposed from the side surface of the singulated package B.

<導電性組成物> <Conductive composition>

關於適合作為間隔屏蔽用的導電性組成物,可舉例:包含二聚酸型環氧樹脂5~20質量份且相對於環氧樹脂100質量份含有導電性填料400~800質量份者。 An example of a conductive composition suitable for use as a spacer shield is one containing 5 to 20 parts by mass of a dimer acid type epoxy resin and 400 to 800 parts by mass of a conductive filler relative to 100 parts by mass of the epoxy resin.

二聚酸型環氧樹脂以外的環氧樹脂可為於分子內具有1個以上環氧基者,亦可併用2種以上。關於具體例,可列舉:雙酚A型環氧樹脂、溴化環氧樹脂、雙酚F型環氧樹脂、酚醛型環氧樹脂、脂環式環氧樹脂、環氧丙基胺型環氧樹脂、環氧丙基醚型環氧樹脂、環氧丙基酯型環氧樹脂、雜環式環氧樹脂等,此等之中,較佳為含有環氧丙基胺型環氧樹脂或環氧丙基醚型環氧樹脂者。 Epoxy resins other than dimer acid type epoxy resin may have one or more epoxy groups in the molecule, and two or more types may be used in combination. Specific examples include bisphenol A-type epoxy resin, brominated epoxy resin, bisphenol F-type epoxy resin, novolac-type epoxy resin, alicyclic epoxy resin, and epoxypropylamine-type epoxy. Resin, glycidyl ether type epoxy resin, glycidyl ester type epoxy resin, heterocyclic epoxy resin, etc., among these, glycidyl amine type epoxy resin or ring-based epoxy resin is preferred. Oxypropyl ether type epoxy resin.

二聚酸型環氧樹脂以外的環氧樹脂的環氧當量並無特別限定,宜為1500g/eq以下、較佳為20~1000g/eq。環氧當量為上述範圍內時,容易獲得耐熱性、黏性、密著性之平衡良好的導電性組成物。 The epoxy equivalent of epoxy resins other than dimer acid type epoxy resin is not particularly limited, but is preferably 1500 g/eq or less, and more preferably 20 to 1000 g/eq. When the epoxy equivalent is within the above range, it is easy to obtain a conductive composition with a good balance of heat resistance, viscosity, and adhesion.

二聚酸型環氧樹脂可為於分子內具有1個以上環氧基之環氧樹脂且二聚酸經改質者,可舉二聚酸之環氧丙基改質化合物等為例,亦可併用2種以上。關於此等樹脂,例如可使用下述通式(1)、(2)所示者。 The dimer acid type epoxy resin can be an epoxy resin with more than one epoxy group in the molecule and the dimer acid has been modified. For example, the epoxy propyl modified compound of dimer acid can be cited. Two or more types can be used together. As these resins, for example, those represented by the following general formulas (1) and (2) can be used.

[化學式1]

Figure 110106761-A0305-02-0012-3
[Chemical formula 1]
Figure 110106761-A0305-02-0012-3

式(1)、(2)中的n1~n5分別獨立地表示3~9的整數。 n1 to n5 in formulas (1) and (2) respectively independently represent integers from 3 to 9.

n1表示3~9的整數、以4~8的整數為佳、較佳為5~7、更佳為7。n2表示3~9的整數、以5~9的整數為佳、較佳為7或8、更佳為7。n3表示3~9的整數、以4~8的整數為佳、較佳為6或7、更佳為6。n4表示3~9的整數。n5表示3~9的整數、以4~8的整數為佳、較佳為5或6、更佳為5。 n1 represents an integer of 3 to 9, preferably an integer of 4 to 8, more preferably 5 to 7, and more preferably 7. n2 represents an integer from 3 to 9, preferably an integer from 5 to 9, more preferably 7 or 8, more preferably 7. n3 represents an integer from 3 to 9, preferably an integer from 4 to 8, more preferably 6 or 7, more preferably 6. n4 represents an integer from 3 to 9. n5 represents an integer from 3 to 9, preferably an integer from 4 to 8, more preferably 5 or 6, more preferably 5.

藉由含有如此的二聚酸型環氧樹脂,導電性組成物的黏度或觸變指數(TI值)容易變低,容易獲得朝形成在密封層12的槽部13的優異填充性。 By containing such a dimer acid type epoxy resin, the viscosity or thixotropic index (TI value) of the conductive composition can be easily reduced, and excellent filling properties into the groove portion 13 formed in the sealing layer 12 can be easily obtained.

二聚酸型環氧樹脂之環氧當量並無特別限定,宜為80~1500g/eq、較佳為200~1000g/eq。環氧當量為上述範圍內時,容易獲得耐熱性、黏性、密著性之平衡良好的導電性組成物。 The epoxy equivalent of the dimer acid type epoxy resin is not particularly limited, but is preferably 80~1500g/eq, and more preferably 200~1000g/eq. When the epoxy equivalent is within the above range, it is easy to obtain a conductive composition with a good balance of heat resistance, viscosity, and adhesion.

導電性填料之含量只要相對於環氧樹脂100質量份為400~800質量份即可,並無特別限定,但較佳為450~600質量份。為上述範圍內時,容易獲得 屏蔽特性或朝形成在密封層12的槽部13的填充性優異的導電性組成物。 The content of the conductive filler is not particularly limited as long as it is 400 to 800 parts by mass relative to 100 parts by mass of the epoxy resin, but is preferably 450 to 600 parts by mass. Within the above range, it is easy to obtain A conductive composition that is excellent in shielding properties and fillability into the groove portion 13 formed in the sealing layer 12 .

導電性填料宜為銅粉、銀粉、金粉、銀被覆銅粉或銀被覆銅合金粉,此等之中可單獨使用一種,亦可併用二種以上,由降低成本之觀點,較佳為銅粉、銀被覆銅粉或銀被覆銅合金粉。 The conductive filler is preferably copper powder, silver powder, gold powder, silver-coated copper powder or silver-coated copper alloy powder. One of these may be used alone or two or more may be used in combination. From the viewpoint of cost reduction, copper powder is preferred. , silver-coated copper powder or silver-coated copper alloy powder.

銀被覆銅粉係具有銅粉、與被覆該銅粉粒子至少一部分的銀層或含銀層者,銀被覆銅合金粉係具有銅合金粒子、與被覆該銅合金粒子至少一部分的銀層或含銀層者。銅合金粒子例如鎳含量為0.5~20質量%、且鋅含量為1~20質量%、剩餘部分由銅構成,剩餘部分的銅亦可包含不可避免的雜質。藉由如此使用具有銀被覆層的銅合金粒子,可獲得屏蔽性及耐變色性優異的電磁波屏蔽封裝體。 The silver-coated copper powder has copper powder and a silver layer or silver-containing layer covering at least a part of the copper powder particles. The silver-coated copper alloy powder has copper alloy particles and a silver layer or a silver-containing layer covering at least a part of the copper alloy particles. Silver layer person. For example, the copper alloy particles have a nickel content of 0.5 to 20 mass %, a zinc content of 1 to 20 mass %, and the remainder is composed of copper. The remainder of the copper may also contain unavoidable impurities. By using copper alloy particles having a silver coating layer in this manner, an electromagnetic wave shielding package excellent in shielding properties and discoloration resistance can be obtained.

關於導電性填料的形狀,例如可列舉:片狀(鱗片狀)、樹枝狀、球狀、纖維狀、不規則形狀(多面體)等,由獲得電阻值較低、屏蔽性更加提高的屏蔽層且提高填充性之觀點,較佳為球狀。 Examples of the shape of the conductive filler include: flake (scale), dendritic, spherical, fibrous, irregular shape (polyhedron), etc., thereby obtaining a shielding layer with lower resistance value and improved shielding properties. From the viewpoint of improving filling properties, a spherical shape is preferred.

關於導電性填料,宜為平均粒徑為1~8μm的導電性填料、較佳為併用平均粒徑為4~8μm的導電性填料(A)與平均粒徑較導電性填料(A)小2μm以上的導電性填料(B)。於此,所謂平均粒徑係指利用雷射繞射散射式粒度分布測定法測得的以個數為基準的平均粒徑D50(中值粒徑)。 The conductive filler is preferably a conductive filler with an average particle diameter of 1 to 8 μm. It is more preferable to use a combination of a conductive filler (A) with an average particle diameter of 4 to 8 μm and a conductive filler (A) with an average particle diameter that is 2 μm smaller than the conductive filler. The above conductive filler (B). Here, the average particle diameter refers to the number-based average particle diameter D50 (median particle diameter) measured by a laser diffraction scattering particle size distribution measuring method.

導電性填料(A)藉由平均粒徑為4~8μm,分散性為良好且可防止凝集,封裝體與接地電路之連接性及屏蔽特性容易為良好。 The conductive filler (A) has an average particle size of 4 to 8 μm, has good dispersion and can prevent aggregation, and the connectivity and shielding properties of the package and the ground circuit are likely to be good.

藉由導電性填料(B)之平均粒徑比導電性填料(A)小2μm以上,由於可填充導電性填料(A)彼此之間隙,故可使對於100MHz~1GHz的電磁波的屏蔽性提高,且可獲得低黏度的導電性組成物。 Since the average particle diameter of the conductive filler (B) is smaller than that of the conductive filler (A) by more than 2 μm, the gaps between the conductive fillers (A) can be filled, so the shielding property against electromagnetic waves of 100 MHz to 1 GHz can be improved. And a conductive composition with low viscosity can be obtained.

導電性填料(A)與導電性填料(B)之含有比率((A):(B)),以質量比計宜為97:3~50:50、較佳為95:5~70:30。 The content ratio ((A):(B)) of the conductive filler (A) and the conductive filler (B) is preferably 97:3~50:50, preferably 95:5~70:30 in terms of mass ratio. .

又,導電性填料(A)為球狀時,導電性填料(A)之振實密度宜為3.5~7.0g/cm3。振實密度為上述範圍內時,屏蔽層的導電性更容易為良好。 Moreover, when the conductive filler (A) is spherical, the tap density of the conductive filler (A) is preferably 3.5 to 7.0 g/cm 3 . When the tap density is within the above range, the conductivity of the shielding layer is more likely to be good.

又,導電性填料(B)為球狀時,導電性填料(B)之振實密度宜為3.5~7.0g/cm3。振實密度為上述範圍內時,屏蔽層的導電性更容易為良好。 Moreover, when the conductive filler (B) is spherical, the tap density of the conductive filler (B) is preferably 3.5 to 7.0 g/cm 3 . When the tap density is within the above range, the conductivity of the shielding layer is more likely to be good.

較佳之一實施形態的導電性組成物亦可為含有環氧樹脂硬化劑者。關於環氧樹脂硬化劑,可列舉:酚系硬化劑、咪唑系硬化劑、胺系硬化劑、陽離子系硬化劑等。此等可單獨使用一種,亦可併用二種以上。 The conductive composition of a preferred embodiment may contain an epoxy resin hardener. Examples of epoxy resin hardeners include phenol-based hardeners, imidazole-based hardeners, amine-based hardeners, and cationic hardeners. These may be used individually by 1 type, and may use 2 or more types together.

關於酚系硬化劑,例如可列舉:苯酚酚醛、萘酚系化合物等。 Examples of the phenol-based hardener include phenol novolac, naphthol-based compounds, and the like.

關於咪唑系硬化劑,例如可列舉:咪唑、2-十一烷基咪唑、2-十七烷基咪唑、2-甲基咪唑、2-乙基咪唑、2-苯基咪唑、1-苄基-2-苯基咪唑、2-乙基-4-甲基-咪唑、1-氰乙基-2-十一烷基咪唑。 Examples of imidazole-based hardeners include imidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, and 1-benzyl -2-Phenylimidazole, 2-ethyl-4-methyl-imidazole, 1-cyanoethyl-2-undecylimidazole.

關於胺系硬化劑,例如可列舉:二伸乙三胺、三伸乙四胺等脂肪族多胺、間苯二胺、二胺基二苯甲烷、二胺基二苯基碸等芳香族多胺。 Examples of amine-based hardeners include aliphatic polyamines such as diethylenetriamine and triethylenetetramine, and aromatic polyamines such as m-phenylenediamine, diaminodiphenylmethane, and diaminodiphenylthione. amine.

關於陽離子系硬化劑之例,可列舉以下列諸等為代表的鎓系化合物:三氟化硼的胺鹽、對甲氧基苯重氮鎓六氟磷酸鹽、二苯基錪六氟磷酸鹽、三苯基鋶鹽、四正丁基鏻四苯硼酸鹽、四正丁基鏻-o,o-二乙基二硫代磷酸鹽。 Examples of cationic hardeners include onium compounds represented by the following: amine salt of boron trifluoride, p-methoxyphenyldiazonium hexafluorophosphate, and diphenylphosphonium hexafluorophosphate. , triphenylsulfonium salt, tetra-n-butylphosphonium tetraphenylborate, tetra-n-butylphosphonium-o,o-diethyl dithiophosphate.

硬化劑的含量宜相對於環氧樹脂100質量份為0.3~40質量份、較佳為0.5~35質量份。硬化劑之含量為0.3質量份以上時,導電性組成物可充分地硬化,容易獲得導電性為良好且屏蔽效果優異的屏蔽層,硬化劑之含量為40質量份以下時,容易獲得保存穩定性優異的導電性組成物。 The content of the hardener is preferably 0.3 to 40 parts by mass, preferably 0.5 to 35 parts by mass relative to 100 parts by mass of the epoxy resin. When the content of the hardener is 0.3 parts by mass or more, the conductive composition can be fully hardened, and it is easy to obtain a shielding layer with good conductivity and excellent shielding effect. When the content of the hardener is 40 parts by mass or less, storage stability is easily obtained. Excellent conductive composition.

較佳一實施形態的導電性組成物亦可為含有消泡劑、增稠劑、黏著劑、填充劑、阻燃劑、著色劑等周知的添加劑。 The conductive composition of a preferred embodiment may also contain well-known additives such as defoaming agents, thickeners, adhesives, fillers, flame retardants, and colorants.

[實施例] [Example]

以下,基於實施例詳細地說明本發明之內容,但本發明並不限定 於以下實施例。又,於以下,除非另有說明,「份」或「%」為質量基準。 Hereinafter, the contents of the present invention will be described in detail based on examples, but the present invention is not limited to in the following examples. In addition, in the following, unless otherwise stated, "parts" or "%" are based on mass.

[導電性組成物之調製] [Preparation of conductive composition]

將以下所示之環氧樹脂(a)48質量份、環氧樹脂(b)42質量份、二聚酸型環氧樹脂10質量份、導電性填料(A)450質量份、導電性填料(B)50質量份、硬化劑(a)6質量份及硬化劑(b)11質量份混合,獲得導電性組成物。使用的各成分的細節如下。 The following 48 parts by mass of epoxy resin (a), 42 parts by mass of epoxy resin (b), 10 parts by mass of dimer acid type epoxy resin, 450 parts by mass of conductive filler (A), and 50 parts by mass of B), 6 parts by mass of the hardener (a) and 11 parts by mass of the hardener (b) were mixed to obtain a conductive composition. Details of each ingredient used are as follows.

.環氧樹脂(a):環氧丙基胺型環氧樹脂、(股)ADEKA製「EP-3905S」、環氧當量=95g/eq . Epoxy resin (a): Glycidylamine type epoxy resin, "EP-3905S" manufactured by ADEKA Co., Ltd., epoxy equivalent = 95g/eq

.環氧樹脂(b):環氧丙基醚型環氧樹脂、(股)ADEKA製「ED502」、環氧當量=320g/eq . Epoxy resin (b): Glycidyl ether type epoxy resin, "ED502" manufactured by ADEKA Co., Ltd., epoxy equivalent = 320g/eq

.二聚酸型環氧樹脂:使用於上述式(2)中n1=7、n2=7、n4=4、n5=5者。 . Dimer acid type epoxy resin: used in the above formula (2) where n1=7, n2=7, n4=4, n5=5.

.導電性填料(A):銀粒子、D50=4μm、球狀 . Conductive filler (A): silver particles, D50=4μm, spherical

.導電性填料(B):銀粒子、D50=2μm、球狀 . Conductive filler (B): silver particles, D50=2μm, spherical

.硬化劑(a):咪唑系硬化劑、四國化成工業(股)製「2E4MZ」 . Hardener (a): Imidazole-based hardener, "2E4MZ" manufactured by Shikoku Chemical Industry Co., Ltd.

.硬化劑(b):苯酚酚醛系硬化劑、荒川化學工業(股)製「Tamanol 758」 . Hardener (b): Phenolic hardener, "Tamanol 758" manufactured by Arakawa Chemical Industry Co., Ltd.

依循JIS K7117-1,利用單一圓筒形旋轉黏度計(所謂B型黏度計)使用轉子No.7以10rpm測定上述所獲得之導電性組成物於25℃下的黏度,結果黏度為780dPa.s。 In accordance with JIS K7117-1, the viscosity of the conductive composition obtained above was measured at 25°C using a single cylindrical rotational viscometer (so-called B-type viscometer) using spindle No. 7 at 10 rpm. The result was that the viscosity was 780 dPa. s.

[實施例] [Example]

使用圖3所示之樣本基板,藉由本發明之電磁波屏蔽封裝體之製造方法製作樣本1。作為樣本基板,使用於基板10上形成有接地電路11、且基板10及接地電路11已藉密封層12所密封並於密封層12形成有槽部13者。 Using the sample substrate shown in FIG. 3, sample 1 is produced by the manufacturing method of the electromagnetic wave shielding package of the present invention. As a sample substrate, a ground circuit 11 is formed on the substrate 10 , the substrate 10 and the ground circuit 11 are sealed by a sealing layer 12 , and a groove 13 is formed in the sealing layer 12 .

將3M日本股份有限公司製的「7414」以覆蓋上述樣本基板之槽部13上面之方式黏貼。然後,使用Nordson ASYMTEK公司製的分配器「S2-920N- P」及閥「DV-8000」,首先以壓入速度300mm/秒、壓入量0.05mm將噴嘴前端部壓入槽部13,維持0.1秒,將噴嘴前端部暫時離開槽部13後,再度以壓入速度5mm/秒、壓入量0.08mm將噴嘴前端部壓入槽部13,刺穿保護膜14。接著,將上述獲得之導電性組成物以如下條件填充於槽部13。 "7414" manufactured by 3M Japan Co., Ltd. was adhered so as to cover the upper surface of the groove portion 13 of the sample substrate. Then, use the distributor "S2-920N- P" and valve "DV-8000", first press the front end of the nozzle into the groove 13 at a press speed of 300mm/second and a press amount of 0.05mm, hold for 0.1 seconds, and then temporarily remove the nozzle front end from the groove 13, and then press it again The front end of the nozzle was pressed into the groove portion 13 at a pushing speed of 5 mm/second and a pushing amount of 0.08 mm to pierce the protective film 14 . Next, the conductive composition obtained above was filled into the groove portion 13 under the following conditions.

<分配裝置之設定> <Settings of distribution device>

吐出量:1.3×10-4cm3/秒 Discharge volume: 1.3×10 -4 cm 3 /second

噴嘴內徑:75μm Nozzle inner diameter: 75μm

樣本基板與噴嘴前端部之距離:0.08mm(噴嘴前端部插入於槽部13) The distance between the sample substrate and the front end of the nozzle: 0.08mm (the front end of the nozzle is inserted into the groove 13)

<比較例> <Comparative example>

使用圖3所示之樣本基板,利用先前之分配工法將上述獲得之導電性組成物朝槽部13填充。裝置使用與上述實施例相同者。裝置設定如下。 Using the sample substrate shown in FIG. 3 , the conductive composition obtained above is filled into the groove portion 13 using the previous dispensing method. The equipment used is the same as that of the above embodiment. The device settings are as follows.

<分配裝置之設定> <Settings of distribution device>

吐出量:1.3×10-4cm3/秒 Discharge volume: 1.3×10 -4 cm 3 /second

噴嘴內徑:75μm Nozzle inner diameter: 75μm

樣本基板與噴嘴前端部之距離:0.05mm(噴嘴前端部不插入槽部13) The distance between the sample substrate and the front end of the nozzle: 0.05mm (the front end of the nozzle is not inserted into the groove 13)

噴嘴進給速度:1.2mm/秒 Nozzle feed speed: 1.2mm/second

將獲得之樣本1、2於80℃加熱60分鐘,進而於160℃加熱60分鐘,藉此使導電性組成物硬化。就獲得之樣本1、2,於硬化後使用YXLON International公司製的X射線透過裝置「Y.Cheetah μHD」按以下的測定條件觀察槽部13,確認有無空隙。 The obtained samples 1 and 2 were heated at 80°C for 60 minutes and further at 160°C for 60 minutes to harden the conductive composition. For the obtained samples 1 and 2, after hardening, the groove portion 13 was observed using the X-ray transmission device "Y.Cheetah μHD" manufactured by YXLON International under the following measurement conditions to confirm the presence or absence of voids.

於實施例中,如圖4~6所示,可知導電性組成物無空隙地從槽部底面填充至上面開口部,且間隔屏蔽層上面部21不進行研磨等即獲得了與密封層上面呈平滑的間隔屏蔽層。 In the embodiment, as shown in FIGS. 4 to 6 , it can be seen that the conductive composition is filled from the bottom surface of the groove portion to the upper opening portion without gaps, and the upper surface portion 21 of the spacer shielding layer is formed in the same shape as the upper surface of the sealing layer without polishing or the like. Smooth spacer shield.

另一方面,於比較例中,如圖7、8所示,於間隔屏蔽層上面部21 中,導電性組成物從槽部溢出,導電性組成物不能充分地填充於槽部,產生凹部。 On the other hand, in the comparative example, as shown in Figs. 7 and 8, the upper portion 21 of the spacer shield layer , the conductive composition overflows from the groove, and the conductive composition cannot fully fill the groove, resulting in a concave portion.

又,如圖8、9所示,導電性組成物未充分地填充於間隔屏蔽層底面部22,產生空隙。於圖9之X射線照片中,可知間隔屏蔽層20之上側表示上面部21、下側表示底面部22,由於底面部22並非直線狀,故於底面部22大範圍地產生空隙。 Furthermore, as shown in FIGS. 8 and 9 , the conductive composition is not fully filled in the spacer shield layer bottom portion 22 and voids are generated. In the X-ray photograph of FIG. 9 , it can be seen that the upper side of the spacer shielding layer 20 represents the upper portion 21 and the lower side represents the bottom portion 22 . Since the bottom portion 22 is not linear, a wide range of gaps are generated in the bottom portion 22 .

10:基板10:Substrate

11:接地電路11: Ground circuit

12:密封層12:Sealing layer

13:槽部13: Groove

14:保護膜14:Protective film

15:導電性組成物15: Conductive composition

16:噴嘴前端部16: Nozzle front end

Claims (3)

一種電磁波屏蔽封裝體之製造方法,具有以下步驟: 密封步驟,於基板上搭載複數個電子零件,於該基板上填充密封材且使之硬化,藉此形成用以將前述電子零件密封之密封層; 槽形成步驟,於前述複數個電子零件間切削前述密封層,形成槽部; 遮蔽步驟,於前述密封層上面,以至少覆蓋前述槽部上面開口部之方式形成保護膜; 填充步驟,將用以吐出導電性組成物之裝置之噴嘴前端部刺穿前述保護膜而插入前述槽部內,於前述槽部內填充相當於前述槽部體積之導電性組成物;及 硬化步驟,使前述導電性組成物硬化,藉以獲得間隔屏蔽層。A method for manufacturing an electromagnetic wave shielding package, which has the following steps: The sealing step is to mount a plurality of electronic components on a substrate, fill the substrate with a sealing material and harden it, thereby forming a sealing layer for sealing the aforementioned electronic components; The groove forming step is to cut the sealing layer between the plurality of electronic components to form a groove; In the shielding step, a protective film is formed on the sealing layer to cover at least the opening on the groove; In the filling step, the front end of the nozzle of the device for discharging the conductive composition is pierced through the protective film and inserted into the groove, and a conductive composition equivalent to the volume of the groove is filled in the groove; and In the hardening step, the aforementioned conductive composition is hardened to obtain a spacer shielding layer. 如請求項1之電磁波屏蔽封裝體之製造方法,其在位於前述槽部末端部之前述保護膜設置有用以排氣之孔。In the method of manufacturing an electromagnetic wave shielding package according to claim 1, the protective film is provided with a hole for exhausting air in front of the end portion of the groove portion. 如請求項1或2之電磁波屏蔽封裝體之製造方法,其中前述填充步驟中,在吐出相當於前述槽部體積之導電性組成物後,一面將前述噴嘴前端部從前述槽部拉出,一面吐出相當於曾插入至前述槽部之前述噴嘴前端部體積的導電性組成物。The method for manufacturing an electromagnetic wave shielding package according to claim 1 or 2, wherein in the filling step, after discharging the conductive composition equivalent to the volume of the groove, the front end of the nozzle is pulled out from the groove. The conductive composition is discharged corresponding to the volume of the front end portion of the nozzle before being inserted into the groove portion.
TW110106761A 2020-06-10 2021-02-25 Method for manufacturing electromagnetic wave shielding package using conductive composition TWI819278B (en)

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JPH07202399A (en) * 1993-12-21 1995-08-04 Internatl Business Mach Corp <Ibm> Method and nozzle for applying bonding agent for connecting parts to carrier and circuit base plate coated with bonding agent
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JP2018056186A (en) * 2016-09-26 2018-04-05 日本特殊陶業株式会社 Manufacturing method of green sheet and manufacturing method of wiring board
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JPH07202399A (en) * 1993-12-21 1995-08-04 Internatl Business Mach Corp <Ibm> Method and nozzle for applying bonding agent for connecting parts to carrier and circuit base plate coated with bonding agent
TW200940673A (en) * 2005-11-08 2009-10-01 Toyo Ink Mfg Co Curable, electromagnetic shielding, and adhesive film, process for manufacturing and utilizing same, and process for manufacturing electromagnetic shielding product, and electromagnetic shielding product
JP2018056186A (en) * 2016-09-26 2018-04-05 日本特殊陶業株式会社 Manufacturing method of green sheet and manufacturing method of wiring board
JP2018093014A (en) * 2016-12-01 2018-06-14 太陽誘電株式会社 Wireless module and manufacturing method thereof

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