TWI818552B - Bonding machine for improving alignment accuracy - Google Patents
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- TWI818552B TWI818552B TW111119543A TW111119543A TWI818552B TW I818552 B TWI818552 B TW I818552B TW 111119543 A TW111119543 A TW 111119543A TW 111119543 A TW111119543 A TW 111119543A TW I818552 B TWI818552 B TW I818552B
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- 239000000758 substrate Substances 0.000 claims abstract description 115
- 238000003825 pressing Methods 0.000 claims abstract description 29
- 238000005096 rolling process Methods 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000001179 sorption measurement Methods 0.000 claims description 160
- 238000000605 extraction Methods 0.000 claims description 25
- 230000004308 accommodation Effects 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 16
- 230000000630 rising effect Effects 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 18
- 238000006073 displacement reaction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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Abstract
Description
本發明有關於一種可提高對位準確度的鍵合機台,在對位基板的過程中,可動式吸附模組可持續吸附並拉平基板,以利於提高對位基板的準確度。 The invention relates to a bonding machine that can improve alignment accuracy. During the process of aligning a substrate, a movable adsorption module can continuously adsorb and flatten the substrate, thereby improving the accuracy of aligning the substrate.
積體電路技術的發展已經成熟,且目前電子產品朝向輕薄短小、高性能、高可靠性與智能化的趨勢發展。電子產品中的晶片會對電子產品的性能產生重要影響,其中前述性能部分相關於晶片的厚度。舉例來說,厚度較薄的晶圓可以提高散熱效率、增加機械性能、提升電性以及減少封裝的體積及重量。 The development of integrated circuit technology has matured, and electronic products are currently developing towards the trend of being light, thin, short, high-performance, high-reliability and intelligent. The wafers in electronic products can have an important impact on the performance of the electronic products, and the aforementioned performance is partly related to the thickness of the wafer. For example, thinner wafers can improve heat dissipation efficiency, increase mechanical properties, improve electrical properties, and reduce package size and weight.
於半導體製程中,通常會在晶圓的背面(即下表面)進行減薄製程、通孔蝕刻製程與背面金屬化製程。一般而言,在進行晶圓減薄製程前會先進行鍵合製程,主要將黏合層設置在晶圓與載體(例如,藍寶石玻璃)之間,並透過壓合單元及載台壓合層疊的晶圓及載體,已完成晶圓及載體的鍵合。完成晶圓減薄製程後,進行解鍵合製程,以將晶圓與載體分離。 In the semiconductor manufacturing process, a thinning process, a through-hole etching process, and a back metallization process are usually performed on the back side (i.e., the lower surface) of the wafer. Generally speaking, a bonding process is performed before the wafer thinning process. The adhesive layer is mainly placed between the wafer and the carrier (for example, sapphire glass), and the laminated components are pressed together through the pressing unit and the carrier. Wafer and carrier, the bonding of wafer and carrier has been completed. After completing the wafer thinning process, a debonding process is performed to separate the wafer from the carrier.
然而,晶圓的各個材料層的膨脹係數不同,因此晶圓在經過高溫的製程後往往會產生晶圓翹曲(warpage)。此外各個晶圓可能會有不同的翹曲形狀,例如馬鞍狀、山丘狀等,而不利於後續在鍵合製程中對層疊的晶圓進行對位,並容易發生對位不準確的情形。 However, the expansion coefficients of each material layer of the wafer are different, so the wafer often produces wafer warpage after undergoing a high-temperature process. In addition, each wafer may have different warpage shapes, such as saddle-shaped, hill-shaped, etc., which is not conducive to the subsequent alignment of the stacked wafers during the bonding process, and inaccurate alignment is prone to occur.
為了解決先前技術所面臨的問題,本發明提出一種新穎的可提高對位準確度的鍵合機台,可透過複數個可動式吸附模組吸附放置在載台的承載面上的翹曲基板,並拉平翹曲的基板。對位單元在對位基板的過程中,可動式吸附模組會持續吸附基板,並隨著基板相對於載台的承載面位移,使得對位單元可以對平整的基板進行對位,並有利於提高基板對位的準確度。 In order to solve the problems faced by the prior art, the present invention proposes a novel bonding machine that can improve alignment accuracy and can absorb warped substrates placed on the bearing surface of the carrier through a plurality of movable adsorption modules. and flatten warped substrates. During the process of aligning the substrate by the alignment unit, the movable adsorption module will continue to adsorb the substrate and displace as the substrate moves relative to the bearing surface of the stage, so that the alignment unit can align the flat substrate, which is beneficial to Improve the accuracy of substrate alignment.
本發明的一目的,在於提出一種可提高對位準確度的鍵合機台,主要包括一第一腔體、一第二腔體、一壓合單元、一載台及複數個可動式吸附模組,其中第一腔體用以連接第二腔體,並於兩者之間形成一密閉空間。 An object of the present invention is to provide a bonding machine that can improve alignment accuracy, which mainly includes a first cavity, a second cavity, a pressing unit, a carrier and a plurality of movable adsorption molds. A group in which the first cavity is used to connect the second cavity and form a closed space between the two.
可動式吸附模組設置在載台上,並包括一框體、一吸附單元、一滾動模組及一吸附單元驅動器,其中吸附單元驅動器經由框體連接並帶動吸附單元相對於載台的承載面升降。具體而言,吸附單元驅動器可帶動吸附單元升起,並吸附翹曲的基板。而後吸附單元驅動器會帶動吸附單元下降,以將基板翹曲的部分拉平。 The movable adsorption module is arranged on the stage and includes a frame, an adsorption unit, a rolling module and an adsorption unit driver. The adsorption unit driver is connected through the frame and drives the adsorption unit relative to the bearing surface of the stage. Lift. Specifically, the adsorption unit driver can drive the adsorption unit to rise and adsorb the warped substrate. The adsorption unit driver will then drive the adsorption unit down to flatten the warped part of the substrate.
滾動模組位於框體及吸附單元之間,使得吸附單元可相對於框體沿著平行載台的承載面的方向位移。對位單元在對位基板的過程中,吸附單元會持續吸附基板,其中對位單元會經由基板帶動吸附單元相對於載台的承載面位移。因此在對位的過程中,基板不會回復到原本翹曲的狀態,並有利於提高基板對位的準確度。 The rolling module is located between the frame and the adsorption unit, so that the adsorption unit can be displaced relative to the frame in a direction parallel to the bearing surface of the stage. While the alignment unit is aligning the substrate, the adsorption unit will continue to adsorb the substrate, and the alignment unit will drive the adsorption unit to move relative to the bearing surface of the stage through the substrate. Therefore, during the alignment process, the substrate will not return to its original warped state, which is beneficial to improving the accuracy of substrate alignment.
本發明的一目的,在於提出一種可提高對位準確度的鍵合機台,主要於吸附單元及框體之間設置一滾動模組或一變形單元,以利於吸附單元相對於框體位移。透過滾動模組或變形單元的設置,更可減少吸附單元及框體之間的磨擦力,以避免吸附單元及框體相對位移時產生污染微粒。 One object of the present invention is to provide a bonding machine that can improve alignment accuracy. It mainly provides a rolling module or a deformation unit between the adsorption unit and the frame to facilitate the displacement of the adsorption unit relative to the frame. Through the setting of the rolling module or the deformation unit, the friction between the adsorption unit and the frame can be reduced to avoid the generation of pollution particles when the adsorption unit and the frame are displaced relative to each other.
為了達到上述的目的,本發明提出一種可提高對位準確度的鍵合機台,包括:一第一腔體;一第二腔體,面對第一腔體,其中第一腔體用以連接第二腔體,並於第一腔體及第二腔體之間形成一密閉空間;一壓合單元,連接第一腔體,且位於密閉空間;一載台,連接第二腔體,且位於密閉空間,載台包括一承載面朝向壓合單元,承載面用以承載一第一基板,並於第一基板上放置一第二基板,其中載台的承載面上設置複數個設置凹槽;及複數個可動式吸附模組,包括:一框體,設置在承載面的設置凹槽內;一吸附單元,連接框體,其中吸附單元用以吸附放置在載台的承載面上的第一基板;一滾動模組,位於框體與吸附單元之間,使得吸附單元相對於框體位移;一吸附單元驅動器,連接框體,並經由框體帶動吸附單元相對於載台的承載面升降,使得吸附單元拉平吸附的第一基板。 In order to achieve the above object, the present invention proposes a bonding machine that can improve alignment accuracy, including: a first cavity; a second cavity facing the first cavity, wherein the first cavity is used to Connect the second cavity and form a closed space between the first cavity and the second cavity; a pressing unit is connected to the first cavity and is located in the closed space; a carrier is connected to the second cavity, And located in a closed space, the carrier includes a bearing surface facing the pressing unit, the bearing surface is used to carry a first substrate, and a second substrate is placed on the first substrate, wherein a plurality of placement recesses are provided on the bearing surface of the carrier. groove; and a plurality of movable adsorption modules, including: a frame, which is arranged in a groove on the bearing surface; an adsorption unit connected to the frame, wherein the adsorption unit is used to adsorb particles placed on the bearing surface of the stage The first substrate; a rolling module located between the frame and the adsorption unit, causing the adsorption unit to move relative to the frame; an adsorption unit driver connected to the frame, and driving the adsorption unit relative to the bearing surface of the stage through the frame Lifting and lowering causes the adsorption unit to flatten the adsorbed first substrate.
本發明提供另一種可提高對位準確度的鍵合機台,包括:一第一腔體;一第二腔體,面對第一腔體,其中第一腔體用以連接第二腔體,並於第一腔體及第二腔體之間形成一密閉空間;一壓合單元,連接第一腔體,且位於密閉空間;一載台,連接第二腔體,且位於密閉空間,載台包括一承載面朝向壓合單元,承載面用以承載一第一基板,並於第一基板上放置一第二基板,其中載台的承載面上設置複數個設置凹槽;及複數個可動式吸附模組,包括:一框體,設置在承載面的設置凹槽內;一吸附單元,連 接框體,其中吸附單元用以吸附放置在載台的承載面上的第一基板;一變形單元,位於框體與吸附單元之間,使得吸附單元相對於框體位移;一吸附單元驅動器,連接框體,並經由框體帶動吸附單元相對於載台的承載面升降,使得吸附單元拉平吸附的第一基板。 The present invention provides another bonding machine that can improve alignment accuracy, including: a first cavity; a second cavity, facing the first cavity, wherein the first cavity is used to connect the second cavity , and forms a closed space between the first cavity and the second cavity; a pressing unit is connected to the first cavity and is located in the closed space; a carrier is connected to the second cavity and is located in the closed space, The carrier includes a bearing surface facing the pressing unit. The bearing surface is used to carry a first substrate and place a second substrate on the first substrate. The bearing surface of the carrier is provided with a plurality of grooves; and a plurality of grooves are provided on the bearing surface. The movable adsorption module includes: a frame, which is arranged in a groove on the bearing surface; an adsorption unit connected to Connected to the frame, the adsorption unit is used to adsorb the first substrate placed on the bearing surface of the stage; a deformation unit is located between the frame and the adsorption unit, so that the adsorption unit is displaced relative to the frame; an adsorption unit driver, The frame is connected, and the adsorption unit is driven to rise and fall relative to the bearing surface of the stage through the frame, so that the adsorption unit flattens the adsorbed first substrate.
在本發明至少一實施例中,包括複數個距離量測單元設置於壓合單元上,並用以量測複數個距離量測單元與放置在載台的承載面上的第一基板之間的距離。 In at least one embodiment of the present invention, a plurality of distance measurement units are provided on the lamination unit and used to measure the distance between the plurality of distance measurement units and the first substrate placed on the bearing surface of the carrier. .
在本發明至少一實施例中,其中吸附單元驅動器依據距離量測單元量測的結果,調整吸附單元的上升高度,使得吸附單元吸附第一基板。 In at least one embodiment of the present invention, the adsorption unit driver adjusts the rising height of the adsorption unit according to the measurement result of the distance measurement unit, so that the adsorption unit adsorbs the first substrate.
在本發明至少一實施例中,其中吸附單元包括一吸附口及一抽氣管線,抽氣管線流體連接吸附口,並用以在吸附口上形成負壓,使得吸附口吸附放置在承載面上的第一基板。 In at least one embodiment of the present invention, the adsorption unit includes an adsorption port and an air extraction line. The air extraction line is fluidly connected to the adsorption port and is used to form a negative pressure on the adsorption port, so that the adsorption port adsorbs the third object placed on the bearing surface. A substrate.
在本發明至少一實施例中,其中框體包括一容置空間用以容置吸附單元,容置空間的截面積大於吸附單元的截面積,使得吸附單元在容置空間內相對於載台的承載面位移。 In at least one embodiment of the present invention, the frame includes an accommodating space for accommodating the adsorption unit, and the cross-sectional area of the accommodating space is larger than the cross-sectional area of the adsorption unit, so that the adsorption unit is in the accommodating space relative to the stage. Loading surface displacement.
在本發明至少一實施例中,其中框體的容置空間包括至少一連接底面,並於連接底面上設置至少一穿孔,滾動模組位於連接底面上,一緊固件穿過連接底面的穿孔連接吸附單元,其中穿孔的截面積大於緊固件的一桿部的截面積。 In at least one embodiment of the present invention, the accommodation space of the frame includes at least one connecting bottom surface, and at least one through hole is provided on the connecting bottom surface. The rolling module is located on the connecting bottom surface, and a fastener is connected through the through hole on the connecting bottom surface. An adsorption unit in which the cross-sectional area of the perforation is greater than the cross-sectional area of a shank of the fastener.
在本發明至少一實施例中,其中滾動模組包括一底座、複數個滾珠及一連接座,底座連接框體,連接座連接吸附單元,而複數個滾珠則位於底座與連接座之間。 In at least one embodiment of the present invention, the rolling module includes a base, a plurality of balls and a connecting seat. The base is connected to the frame, the connecting seat is connected to the adsorption unit, and the plurality of balls are located between the base and the connecting seat.
在本發明至少一實施例中,包括複數個彈性單元,位於框體與吸附單元之間。 In at least one embodiment of the present invention, a plurality of elastic units are included, located between the frame and the adsorption unit.
在本發明至少一實施例中,包括複數個對位單元位於載台的承載面上,並用以對位第一基板及第二基板,對位單元對位第一基板的過程中,會經由第一基板帶動吸附單元在框體的容置空間內,相對於載台的承載面位移。 In at least one embodiment of the present invention, a plurality of alignment units are located on the bearing surface of the stage and are used to align the first substrate and the second substrate. In the process of aligning the first substrate by the alignment unit, a third substrate is passed through the alignment unit. A substrate drives the adsorption unit to move relative to the bearing surface of the stage in the accommodation space of the frame.
10:可提高對位準確度的鍵合機台 10: Bonding machine that can improve alignment accuracy
111:第一腔體 111:First cavity
112:密閉空間 112:Confined space
113:第二腔體 113:Second cavity
121:第一基板 121: First substrate
123:第二基板 123: Second substrate
13:壓合單元 13: Pressing unit
14:對位單元 14: Counterpoint unit
15:載台 15: Carrier platform
151:承載面 151: Bearing surface
153:設置凹槽 153: Set the groove
155:抽氣口 155:Exhaust port
16:抽氣馬達 16:Extraction motor
17:可動式吸附模組 17: Movable adsorption module
171:吸附單元驅動器 171: Adsorption unit driver
172:容置空間 172: Accommodation space
1721:第一開口 1721:First opening
1723:第二開口 1723:Second opening
1725:連接底面 1725: Connect the bottom surface
173:吸附單元 173:Adsorption unit
1731:吸附口 1731:Adsorption port
1732:固定孔 1732:Fixing hole
1733:彈性單元 1733:Elastic unit
1735:抽氣管線 1735:Exhaust pipeline
174:間隔空間 174: Interval space
175:緊固件 175:Fasteners
1751:頭部 1751:Head
1753:桿部 1753:Rod
177:框體 177:frame
1771:穿孔 1771:Perforation
179:滾動模組 179:Scrolling module
1791:底座 1791: base
1792:凹槽 1792: Groove
1793:連接座 1793: Connector
1794:連接孔 1794:Connection hole
1795:滾珠 1795: Ball
18:距離量測單元 18: Distance measurement unit
191:腔體驅動器 191: Cavity driver
193:壓合單元驅動器 193: Press unit driver
[圖1]為本發明可提高對位準確度的鍵合機台一實施例的立體示意圖。 [Fig. 1] is a three-dimensional schematic diagram of an embodiment of a bonding machine that can improve alignment accuracy according to the present invention.
[圖2]為本發明可提高對位準確度的鍵合機台一實施例的剖面示意圖。 [Fig. 2] is a schematic cross-sectional view of an embodiment of a bonding machine that can improve alignment accuracy according to the present invention.
[圖3]為本發明可提高對位準確度的鍵合機台的壓合單元及載台一實施例的立體示意圖。 [Fig. 3] is a schematic three-dimensional view of an embodiment of the pressing unit and the carrier of a bonding machine that can improve alignment accuracy according to the present invention.
[圖4]為本發明可提高對位準確度的鍵合機台的可動式吸附模組一實施例的立體剖面示意圖。 [Fig. 4] is a schematic three-dimensional cross-sectional view of an embodiment of the movable adsorption module of the bonding machine according to the present invention, which can improve the alignment accuracy.
[圖5]為本發明可提高對位準確度的鍵合機台的吸附單元及框體一實施例的立體分解示意圖。 [Fig. 5] is a three-dimensional exploded schematic diagram of an embodiment of the adsorption unit and frame of a bonding machine that can improve alignment accuracy according to the present invention.
[圖6]為本發明可提高對位準確度的鍵合機台的吸附單元及框體一實施例的立體透視圖。 [Fig. 6] is a three-dimensional perspective view of an embodiment of the adsorption unit and frame of a bonding machine according to the present invention, which can improve alignment accuracy.
[圖7]為本發明可提高對位準確度的鍵合機台的吸附單元、框體及滾動模組一實施例的剖面示意圖。 [Fig. 7] is a schematic cross-sectional view of an embodiment of the adsorption unit, frame and rolling module of a bonding machine that can improve alignment accuracy according to the present invention.
[圖8]為本發明可提高對位準確度的鍵合機台的滾動模組一實施例的立體透視圖。 [Fig. 8] is a perspective view of a rolling module of a bonding machine that can improve alignment accuracy according to an embodiment of the present invention.
[圖9]為本發明可提高對位準確度的鍵合機台上升吸附基板一實施例的剖面示意圖。 [Fig. 9] is a schematic cross-sectional view of an embodiment of the present invention in which a bonding machine platform lifts up and absorbs a substrate, which can improve alignment accuracy.
[圖10]為本發明可提高對位準確度的鍵合機台吸附並拉平基板一實施例的剖面示意圖。 [Fig. 10] is a schematic cross-sectional view of an embodiment of the present invention in which a bonding machine that can improve alignment accuracy absorbs and flattens a substrate.
請參閱圖1及圖2,分別為本發明可提高對位準確度的鍵合機台一實施例的立體示意圖及剖面示意圖。如圖所示,可提高對位準確度的鍵合機台10包括一第一腔體111、一第二腔體113、一壓合單元13、一載台15及複數個可動式吸附模組17,其中第一腔體111面對第二腔體113,且第一腔體111可相對於第二腔體113位移。
Please refer to FIGS. 1 and 2 , which are respectively a three-dimensional schematic diagram and a cross-sectional schematic diagram of an embodiment of a bonding machine that can improve alignment accuracy according to the present invention. As shown in the figure, the
如圖2所示,壓合單元13位於第一腔體111內,並且連接第一腔體111。載台15則位於第二腔體113內,並且連接第二腔體113。載台15的承載面151朝向壓合單元13。第一腔體111連接第二腔體113後,會在兩者之間形成一密閉空間112,而壓合單元13及載台15則位於密閉空間112內。載台15的承載面151用以承載一第一基板121,並可於第一基板121上放置一第二基板123。
As shown in FIG. 2 , the
如圖1所示,在本發明一實施例中,第一腔體111可連接一腔體驅動器191,其中腔體驅動器191位於密閉空間112外部,並連接第一腔體111。腔體驅動器191用以驅動第一腔體111相對於第二腔體113位移,例如腔體驅動器191可以是線性致動器。
As shown in FIG. 1 , in an embodiment of the present invention, the
此外,壓合單元驅動器193位於密閉空間112外部,並連接壓合單元13,例如壓合單元驅動器193可以是線性致動器,用以驅動壓合單元13靠近或遠離載台15。在完成第一基板121及第二基板123對位後,壓合單元驅動器193可驅動壓合單元13朝載台15的承載面151靠近,並壓合載台15承載的第一基板121及第二基板123,以完成第一基板121及第二基板123的鍵合。
In addition, the
如圖2所示,第一腔體111或第二腔體113可設置一抽氣馬達16,其中抽氣馬達16流體連接密閉空間112,並用以抽出密閉空間112內的氣體,以降低密閉空間112內的壓力,使得密閉空間112維持真空或低壓狀態。
As shown in FIG. 2 , the
載台15的承載面151用以承載層疊的一第一基板121及一第二基板123,例如第一基板121為承載基板,而第二基板123為晶圓,其中第一基板121及第二基板123之間具有一黏合層,以黏合第一基板121及第二基板123。在不同實施例中,第一基板121及第二基板123亦可以是經過半導體製程的晶圓。
The carrying
如圖3及圖4所示,可動式吸附模組17位於第二腔體113,並設置在載台15上。在本發明一實施例中,載台15的承載面151上可設置複數個設置凹槽153,並將可動式吸附模組17設置在各個設置凹槽153內,其中可動式吸附模組17可相對於載台15的承載面151升降,並可沿著平行載台15的承載面151的方向位移。
As shown in FIGS. 3 and 4 , the
如圖5及圖6所示,可動式吸附模組17包括一吸附單元驅動器171、一吸附單元173、一框體177及一滾動模組179。框體177設置於載台15的設置凹槽153內,並包括一容置空間172用以容置吸附單元173,其中部分的吸附單元173可凸出框體177。吸附單元驅動器171連接框體177,並經由
框體177連接並帶動吸附單元173相對於載台15的承載面151升降,例如吸附單元驅動器171可以是線性致動器。
As shown in FIGS. 5 and 6 , the
滾動模組179位於框體177及吸附單元173之間,以利於吸附單元173在容置空間172內相對於框體177位移。在本發明一實施例中,框體177的容置空間172包括至少一連接底面1725,而滾動模組179則設置於連接底面1725上。吸附單元173放置在框體177的容置空間172內,並使得框體177的連接底面1725經由滾動模組179連接及承載吸附單元173。
The rolling
框體177的連接底面1725上可設置至少一穿孔1771,一緊固件175可穿過連接底面1725的穿孔1771,並連接吸附單元173底部的固定孔1732上。例如緊固件175可為螺絲,而固定孔1732則為螺孔。
At least one through
具體而言,吸附單元173的橫向截面積可小於容置空間172的橫向截面積,吸附單元173設置在框體177的容置空間172時,吸附單元173不會完全填滿容置空間172,並於吸附單元173及框體177之間存在一間隔空間174,使得吸附單元173可在容置空間172內相對於框體177及/或載台15的承載面151位移,例如以平行載台15的承載面151的方向位移。
Specifically, the lateral cross-sectional area of the
緊固件175並未完全地固定吸附單元173及框體177,使得吸附單元173可相對於框體177位移。具體而言,緊固件175可包括一頭部1751及一桿部1753,頭部1751的截面積大於桿部1753,例如桿部1753為螺桿。緊固件175的桿部1753用以連接吸附單元173的固定孔1732,而緊固件175的頭部1751與框體177之間則具有微小的間隙。此外,緊固件175的桿部1753的截面積可小於框體177的穿孔1771的截面積,使得緊固件175的桿部1753可以在穿孔1771內相對於框體177。
The
在本發明一實施例中,吸附單元173與框體177之間可設置複數個彈性單元1733,例如彈簧,其中彈性單元1733位於間隔空間174內。
In an embodiment of the present invention, a plurality of
如圖7及圖8所示,滾動模組179包括一底座1791、一連接座1793及至少一滾珠1795,其中滾珠1795位於底座1791及連接座1793之間,使得底座1791與連接座1793之間具有一間隙,並防止連接座1793直接接觸底座1791。連接座1793可相對於底座1791位移,並帶動兩者之間的滾珠1795滾動。
As shown in Figures 7 and 8, the rolling
滾動模組179的底座1791連接框體177,而連接座1793則連接吸附單元173。此外,底座1791朝向連接座1793的表面上可設置一凹槽1792,並將滾珠1795放置在凹槽1792內,使得滾珠1795在凹槽1792內滾動。透過滾動模組179的設置,可減少吸附單元173相對於框體177位移時的摩擦力,並可防止在位移的過程中產生微粒。
The
在本發明另一實施例中,上述的滾動模組179亦可置換為一變形單元,並透過變形單元位於吸附單元173及框體177之間,例如變形單元可以是彈簧或彈性墊片等。具體而言,變形單元可設置在框體177的連接底面1725上,使得框體177的連接底面1725經由變形單元承載及連接吸附單元173。當吸附單元173相對於框體177位移時,會使得變形單元變形。透過變形單元的設置同樣以可避免吸附單元173與框體177直接接觸,必可防止吸附單元173及框體177相對位移時產生的摩擦。
In another embodiment of the present invention, the above-mentioned
在本發明一實施例中,底座1791及連接座1793可為環狀體,並於底座1791及連接座1793上設置一連接孔1794。而設置在底座1791上的凹槽1792可以是一環狀凹槽,並可將複數個滾珠1795排列在環狀凹槽內。滾動
模組179的連接孔1794可對準吸附單元173的固定孔1732及框體177的穿孔1771,而緊固件175的桿部1753可穿過框體177的穿孔及滾動模組179的連接孔1794,並固定在吸附單元173的固定孔1732上,其中緊固件175的桿部1753的截面積小於連接孔1794的截面積。
In one embodiment of the present invention, the
如圖3所示,載台15的承載面151上可設置複數個對位單元14,對位單元14環繞放置在載台15的第一基板121及/或第二基板123周圍,並可靠近或遠離第一基板121、第二基板123及/或承載面151的中心,以對位第一基板121及第二基板123。例如對位單元14可為桿狀,並可相對於載台15的承載面151伸縮,其中對位單元14凸出承載面151後,可沿著承載面151的徑向朝第一基板121位移,對位單元14在位移的過程中會接觸並對位第一基板121,以將第一基板121定位在承載面151的固定位置上。
As shown in FIG. 3 , a plurality of
對位單元14在對位基板的過程中,可能會推動第一基板121相對載台15的承載面151位移時,並經由第一基板121帶動吸附單元173在框體177的容置空間172內相對於載台15的承載面151位移,以壓縮及/或拉長位於吸附單元173與框體177之間的彈性單元1733。具體而言,第一基板121及吸附單元173會沿著平行承載面151的方向位移。
During the process of aligning the substrate, the
當吸附單元173未吸附第一基板121時,例如第一基板121及第二基板123已完成鍵合,彈性單元1733則會回復到原本的長度,使得吸附單元173回復到容置空間172內的固定位置。
When the
如圖4、圖5及圖6所示,吸附單元173包括至少一吸附口1731及一抽氣管線1735,抽氣管線1735流體連接吸附口1731。具體而言,吸附單元
173內可設置至少一流體通道,而抽氣管線1735則經由流體通道連接吸附口1731。
As shown in FIGS. 4 , 5 and 6 , the
抽氣管線1735用以連接一抽氣裝置,例如馬達,抽氣裝置啟動時,會經由抽氣管線1735在吸附單元173的吸附口1731上形成負壓,並吸附放置在承載面151上的第一基板121。
The
在本發明一實施例中,框體177的容置空間172具有一第一開口1721及一第二開口1723。第一開口1721位於框體177的頂部,當框體177設置在載台15的設置凹槽153內時,第一開口1721會位在載台15的承載面151上。抽氣管線1735可經由第二開口1723連接抽氣裝置,例如第二開口1723位於框體177的底部。
In an embodiment of the present invention, the
抽氣管線1735可為一可撓式抽氣管線,當吸附單元173相對於框體177位移時,吸附單元173可能會彎折抽氣管線1735。
The
在本發明一實施例中,如圖3所示,壓合單元13上可設置複數個距離量測單元18,例如距離量測單元18可以是雷射測距儀。距離量測單元18用以將產生的量測光束投射在第一基板121上,以量測各個距離量測單元18與第一基板121之間的距離。
In an embodiment of the present invention, as shown in FIG. 3 , a plurality of
由各個距離量測單元18所量測的距離,可判斷第一基板121的翹曲程度或高度。而後可依據量測的結果,控制吸附單元驅動器171調整吸附單元173及/或框體177的上升高度,使得吸附單元173接觸並吸附第一基板121。
The distance measured by each
距離量測單元18可設置在壓合單元13的上方,並於壓合單元13上設置複數個通孔。距離量測單元18產生的量測光束可經由壓合單元13上
的通孔,投射至第一基板121上。在本發明一實施例中,各個距離量測單元18的位置可分別對應各個可動式吸附模組17,例如朝向各個可動式吸附模組17的吸附單元173。
The
在本發明一實施例中,如圖9所示,吸附單元驅動器171可驅動吸附單元173升高,使得吸附單元173凸出載台15的承載面151,並吸附往上翹曲的第一基板121。如圖10所示,吸附單元驅動器171驅動吸附單元173下降,例如吸附單元173的高度近似於承載面151。吸附單元173下降時會拉動被吸附第一基板121,並將往上翹曲的第一基板121拉平。
In one embodiment of the present invention, as shown in FIG. 9 , the
載台15的承載面151上可設置複數個抽氣口155,其中抽氣口155流體連接一抽氣裝置,抽器裝置抽氣時會在抽氣口155形成負壓,以吸附放置在載台15的承載面151上的第一基板121。具體而言,設置在承載面151上的抽氣口155可位於可動式吸附模組17的內側,並用以吸附第一基板121的內側,而可動式吸附模組17則用以吸附第一基板121的外側,以提高第一基板121的平整度。此外在透過對位單元14對位第一基板121時,承載面151上的抽氣口155會停止產生負壓,使得對位單元14可推動第一基板121及吸附單元173相對於載台15的承載面151位移。
A plurality of
在本發明圖式中,可動式吸附模組17設置在第一基板121及/或承載面151的外側,在實際應用時可動式吸附模組17亦可設置在第一基板121及/或承載面151的內側,例如圖3、圖9及圖10的部分或全部的抽氣口155可以是可動式吸附模組17。
In the drawings of the present invention, the
以上所述者,僅為本發明之一較佳實施例而已,並非用來限定本發明實施之範圍,即凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾,均應包括於本發明之申請專利範圍內。 The above is only one of the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention. That is, all changes in shape, structure, characteristics and spirit described in the patent scope of the present invention may be equal to those described above. Modifications should be included in the patentable scope of the present invention.
13:壓合單元 13: Pressing unit
14:對位單元 14: Counterpoint unit
15:載台 15: Carrier platform
151:承載面 151: Bearing surface
153:設置凹槽 153: Set the groove
155:抽氣口 155:Exhaust port
17:可動式吸附模組 17: Movable adsorption module
18:距離量測單元 18: Distance measurement unit
Claims (10)
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TW201805174A (en) * | 2016-08-01 | 2018-02-16 | 陽程科技股份有限公司 | Curved surface laminating device and laminating method |
TW201906070A (en) * | 2013-05-23 | 2019-02-01 | 日商尼康股份有限公司 | Substrate holding apparatus, exposing apparatus, and device manufacturing method |
TW201919830A (en) * | 2017-08-30 | 2019-06-01 | 日商平田機工股份有限公司 | Holding nozzle, holding head and transportation apparatus |
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TW201906070A (en) * | 2013-05-23 | 2019-02-01 | 日商尼康股份有限公司 | Substrate holding apparatus, exposing apparatus, and device manufacturing method |
TW201805174A (en) * | 2016-08-01 | 2018-02-16 | 陽程科技股份有限公司 | Curved surface laminating device and laminating method |
TW201919830A (en) * | 2017-08-30 | 2019-06-01 | 日商平田機工股份有限公司 | Holding nozzle, holding head and transportation apparatus |
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