TWI818527B - Conductive film for high frequency circuit board and high frequency circuit board - Google Patents

Conductive film for high frequency circuit board and high frequency circuit board Download PDF

Info

Publication number
TWI818527B
TWI818527B TW111116210A TW111116210A TWI818527B TW I818527 B TWI818527 B TW I818527B TW 111116210 A TW111116210 A TW 111116210A TW 111116210 A TW111116210 A TW 111116210A TW I818527 B TWI818527 B TW I818527B
Authority
TW
Taiwan
Prior art keywords
base material
adhesion layer
frequency circuit
layer
copper
Prior art date
Application number
TW111116210A
Other languages
Chinese (zh)
Other versions
TW202304272A (en
Inventor
保住敏之
Original Assignee
日商尾池工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尾池工業股份有限公司 filed Critical 日商尾池工業股份有限公司
Publication of TW202304272A publication Critical patent/TW202304272A/en
Application granted granted Critical
Publication of TWI818527B publication Critical patent/TWI818527B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/025Electric or magnetic properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Optical Head (AREA)

Abstract

本發明提供高頻電路板用導電性膜片,其依序地包含:基材、設置於前述基材的至少一面上的附著層,及設置於前述附著層上方的銅層,其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下,前述附著層具有鎳銅合金。 The present invention provides a conductive film for high-frequency circuit boards, which sequentially includes: a base material, an adhesion layer disposed on at least one side of the base material, and a copper layer disposed above the adhesion layer, wherein at 10 GHz At the measurement frequency, the relative permittivity of the base material is below 3.3, and the adhesion layer includes a nickel-copper alloy.

Description

高頻電路板用導電性膜片及高頻電路板 Conductive diaphragms for high-frequency circuit boards and high-frequency circuit boards

本發明係關於高頻電路板用導電性膜片及高頻電路板。 The present invention relates to a conductive film for a high-frequency circuit board and a high-frequency circuit board.

現在,主要隨著第五代行動通訊(5G)的標準化,需要在更高頻領域中傳輸習知的訊號。為了利用5G的優勢(超高速、超低延遲、同時多個連接),需要在準毫米波領域中傳輸訊號。 Now, mainly with the standardization of fifth-generation mobile communications (5G), conventional signals need to be transmitted in higher frequency fields. In order to take advantage of the advantages of 5G (ultra-high speed, ultra-low latency, multiple simultaneous connections), signals need to be transmitted in the quasi-millimeter wave field.

在過去,作為電路板使用聚醯亞胺基材為基底的軟性印刷電路板(FPC),其傳輸損失大,存在著電路板難以應用於準毫米波領域中訊號傳輸的問題。因此,比起聚醯亞胺,需要較低相對電容率及損耗正切的基材(低介電材料)作為基底的FPC。 In the past, flexible printed circuit boards (FPCs) based on polyimide substrates were used as circuit boards. Their transmission losses were large, making it difficult to apply circuit boards to signal transmission in the quasi-millimeter wave field. Therefore, compared with polyimide, a substrate with lower relative permittivity and loss tangent (low dielectric material) is required as the base FPC.

此外,將來不只是準毫米波領域,也會考慮利用更高頻的頻率領域(毫米波領域)。此外,第六代行動通訊標準(6G)已被討論,6G中100GHz~1000GHz(1THz)領域的利用也正在考慮中。 In addition, in the future, not only the quasi-millimeter wave field, but also the higher frequency frequency field (millimeter wave field) will be considered. In addition, the sixth generation mobile communication standard (6G) has been discussed, and the utilization of the 100GHz~1000GHz (1THz) field in 6G is also being considered.

從上述背景來看,需要使用低介電材料且傳輸損失小的軟性銅箔層積板(FCCL)。 From the above background, it is necessary to use flexible copper foil laminates (FCCL) with low dielectric materials and small transmission loss.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Document]

[專利文獻1]特開2018-160636號公報。 [Patent Document 1] Japanese Patent Application Publication No. 2018-160636.

專利文獻1揭示了為了提高具有較低電容率的基材和銅層的附著性,選用鉻、鎳及鎳鉻合金之群組設置為基底層的高頻訊號高速傳輸用基板。但是在專利文獻1所揭示的技術中,雖然基材和銅層的附著性良好,但存在電路形成時有著蝕刻性不好的問題。 Patent Document 1 discloses a substrate for high-frequency signal high-speed transmission that uses a group of chromium, nickel, and nickel-chromium alloy as the base layer in order to improve the adhesion between a substrate with a low permittivity and a copper layer. However, in the technology disclosed in Patent Document 1, although the adhesion between the base material and the copper layer is good, there is a problem of poor etching properties during circuit formation.

本發明係解決習知的前述各種問題,並達成以下的目的作為課題。也就是說,本發明的目的是在於提供傳輸損失小、基材和銅層的附著性及蝕刻性良好的高頻電路板用導電性膜片及高頻電路板。 The present invention solves the above-mentioned various problems of the conventional art and achieves the following objects as a subject. That is, an object of the present invention is to provide a conductive film for high-frequency circuit boards and a high-frequency circuit board that have low transmission loss and good adhesion and etching properties between the base material and the copper layer.

作為解決前述問題的手段,如下所述。即是: As a means to solve the aforementioned problems, the following is described. That is:

<1>一種高頻電路板用導電性膜片,其特徵在於依序地包含:基材;設置於前述基材的至少一面上的附著層;及設置於前述附著層上方的銅層;其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下;前述附著層具有鎳銅合金。 <1> A conductive film for high-frequency circuit boards, characterized by comprising in order: a base material; an adhesion layer provided on at least one side of the base material; and a copper layer provided above the adhesion layer; wherein , at a measurement frequency of 10 GHz, the relative permittivity of the base material is less than 3.3; the adhesion layer is made of nickel-copper alloy.

<2>如前述<1>所述的高頻電路板用導電性膜片,前述基材包括環烯烴聚合物樹脂、聚苯硫醚樹脂、聚苯乙烯樹脂、氟樹脂及聚醚醚酮樹脂中的至少任何一種。 <2> The conductive film for high-frequency circuit boards as described in the aforementioned <1>, the aforementioned base material includes cycloolefin polymer resin, polyphenylene sulfide resin, polystyrene resin, fluororesin and polyether ether ketone resin At least any of them.

<3>如前述<1>或前述<2>中任一所述的高頻電路板用導電性膜片,前述基材和前述附著層的界面的附著強度為0.5N/mm以上。 <3> The conductive film for high-frequency circuit boards according to any one of the above <1> or the above <2>, wherein the adhesion strength of the interface between the base material and the adhesion layer is 0.5 N/mm or more.

<4>一種高頻電路板,其特徵在於依序地包含:基材;設置於前述基材的至少一面上的附著層;及設置於前述附著層上方的配線;其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下;前述附著層具有鎳銅合金。 <4> A high-frequency circuit board, characterized by comprising in order: a base material; an adhesion layer provided on at least one side of the base material; and wiring provided above the adhesion layer; wherein, measurement at 10 GHz At frequency, the relative permittivity of the base material is below 3.3; the adhesion layer includes nickel-copper alloy.

根據本發明,能夠解決習知的前述多個問題,並達成前述目的,且提供傳輸損失小、基材和銅層的附著性及蝕刻性良好的高頻電路板用導電性膜片及高頻電路板。 According to the present invention, many of the above-mentioned problems of the conventional art can be solved, the above-mentioned objects can be achieved, and a conductive film for high-frequency circuit boards and high-frequency circuits with low transmission loss, good adhesion and etching properties between the base material and the copper layer can be provided. plate.

10:高頻電路板用導電性膜片 10: Conductive diaphragm for high frequency circuit boards

11:基材 11:Substrate

12:附著層 12:Adhesion layer

13:銅層 13: Copper layer

14:配線 14:Wiring

15:氧化防止層 15: Oxidation prevention layer

16:防鏽層 16: Anti-rust layer

20:高頻電路板 20:High frequency circuit board

[圖1]圖1係表示本發明的高頻電路板用導電性膜片之一例的剖面圖;[圖2A]圖2A係表示本發明的高頻電路板之一例的剖面圖;[圖2B]圖2B係表示本發明的高頻電路板之其他一例的剖面圖;[圖2C]圖2C係表示本發明的高頻電路板之其他一例的剖面圖;[圖2D]圖2D係表示本發明的高頻電路板之其他一例的剖面圖;[圖3]圖3係實施例1至4及比較例1至2中,表示傳輸損失與頻率的關係之一例的圖。 [Fig. 1] Fig. 1 is a cross-sectional view showing an example of a conductive film for a high-frequency circuit board of the present invention; [Fig. 2A] Fig. 2A is a cross-sectional view showing an example of a high-frequency circuit board of the present invention; [Fig. 2B ] Figure 2B is a cross-sectional view showing another example of the high-frequency circuit board of the present invention; [ Figure 2C ] Figure 2C is a cross-sectional view showing another example of the high-frequency circuit board of the present invention; [ Figure 2D ] Figure 2D is a cross-sectional view showing the present invention. Cross-sectional view of another example of the high-frequency circuit board of the invention; [Fig. 3] Fig. 3 is a diagram showing an example of the relationship between transmission loss and frequency in Examples 1 to 4 and Comparative Examples 1 to 2.

(高頻電路板用導電性膜片) (Conductive diaphragm for high frequency circuit boards)

本發明的高頻電路板用導電性膜片依序地包含:基材、設置於前述基材的至少一面上的附著層,及設置於前述附著層上方的銅層,其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下,前述附著層具有鎳銅合金,並且根據必要時,進一步具有其他的層。 The conductive film for high-frequency circuit boards of the present invention sequentially includes: a base material, an adhesion layer provided on at least one side of the base material, and a copper layer provided above the adhesion layer, wherein at 10 GHz At the measurement frequency, the relative permittivity of the base material is 3.3 or less. The adhesion layer includes a nickel-copper alloy and, if necessary, further includes other layers.

在本發明中無線通訊的情況下,通稱10kHz以上的頻率為高頻。 In the case of wireless communication in the present invention, frequencies above 10 kHz are generally referred to as high frequencies.

<基材> <Substrate>

前述基材是本發明的高頻電路板用導電性膜片的基板,也是在10GHz的量測頻率下,其相對電容率為3.3以下的材料。 The aforementioned base material is the substrate of the conductive film for high-frequency circuit boards of the present invention, and is also a material whose relative permittivity is 3.3 or less at a measurement frequency of 10 GHz.

訊號傳輸的傳輸損失大體上可分為三種原因:介電損失、導體損失及其他損失。其中,前述介電損失如下列式子1所示,由基材的相對電容率和損耗正切的函數表示,相對電容率或是損耗正切越大時,介電損失就會越大。因此,為了降低損耗正切,較佳地使用比前述相對電容率低及比前述損耗正切低的基材。透過使用比前述相對電容率低及比前述損耗正切低的基材,能夠得到傳輸損失較少的高頻電路板用的導電性膜片。 Transmission losses in signal transmission can generally be divided into three causes: dielectric loss, conductor loss and other losses. Among them, the aforementioned dielectric loss is shown in the following formula 1, which is represented by a function of the relative permittivity of the base material and the loss tangent. The greater the relative permittivity or the loss tangent, the greater the dielectric loss will be. Therefore, in order to reduce the loss tangent, it is preferable to use a base material that is lower than the aforementioned relative permittivity and lower than the aforementioned loss tangent. By using a base material with a lower relative permittivity than the above and a lower loss tangent than the above, a conductive film for a high-frequency circuit board with less transmission loss can be obtained.

Figure 111116210-A0305-02-0005-1
Figure 111116210-A0305-02-0005-1

以上符號表示為:ε:相對電容率,f:頻率,C:光速,tanδ:損耗正切。 The above symbols are expressed as: ε: relative permittivity, f: frequency, C: speed of light, tanδ: loss tangent.

-相對電容率- -Relative permittivity-

前述基材的相對電容率為3.3以下,較佳為3.1以下,更佳為2.5以下。 The relative permittivity of the base material is 3.3 or less, preferably 3.1 or less, more preferably 2.5 or less.

前述基材的相對電容率的量測,是根據以JIS R1641為標準的共振腔法,在10GHz的頻率下量測。 The relative permittivity of the aforementioned substrate was measured at a frequency of 10 GHz based on the resonant cavity method based on JIS R1641.

-損耗正切- -loss tangent-

前述損耗正切,其值在0.005以下為佳,較佳為0.003以下,更佳為0.001以下。 The aforementioned loss tangent preferably has a value of 0.005 or less, more preferably 0.003 or less, and more preferably 0.001 or less.

前述基材的損耗正切的量測,是根據以JIS R1641為標準的共振腔法,在10GHz的頻率下量測。 The loss tangent of the aforementioned substrate was measured at a frequency of 10 GHz based on the resonant cavity method based on JIS R1641.

作為前述基材的形狀、構造及大小而言,並沒有特別限制且能夠根據目的而適當選擇。 The shape, structure and size of the base material are not particularly limited and can be appropriately selected depending on the purpose.

作為前述基材的材質,舉例來說,列舉環烯烴聚合物樹脂、聚苯硫醚樹脂、聚苯乙烯樹脂、氟樹脂及聚醚醚酮樹脂等的材質。這些材質可以使用單獨1種,也可以併用2種以上。根據使用這些材質做為前述基材,能夠得到傳輸損失較少的高頻電路板用導電性膜片。 Examples of the material of the base material include cycloolefin polymer resin, polyphenylene sulfide resin, polystyrene resin, fluororesin, polyether ether ketone resin, and the like. These materials may be used individually by 1 type, or 2 or more types may be used together. By using these materials as the base material, a conductive film for high-frequency circuit boards with less transmission loss can be obtained.

作為前述基材的平均厚度,在6μm以上300μm以下為佳,較佳為12μm以上250μm以下,更佳為25μm以上200μm以下。前述基材的平均厚度為6μm以上時,能夠提高加工時的處理性及彎曲性。此外,前述基材的平均厚度為300μm以下時,能夠得到可彎曲的高頻電路板用導電性膜片。基材的平均厚度根據用途,其最佳厚度也不同,在需要更薄的薄膜及更高彎曲性的領域中,要求基材的平均厚度要接近6μm。此外,從絕緣性、高可靠性、電路形成工法等方面,也有要求基材的平均厚度接近300μm的應用。 The average thickness of the base material is preferably from 6 μm to 300 μm , preferably from 12 μm to 250 μm , and more preferably from 25 μm to 200 μm . When the average thickness of the base material is 6 μm or more, the handleability and bendability during processing can be improved. In addition, when the average thickness of the base material is 300 μm or less, a flexible conductive film for high-frequency circuit boards can be obtained. The optimal thickness of the average thickness of the base material varies depending on the application. In fields that require thinner films and higher flexibility, the average thickness of the base material is required to be close to 6 μm . In addition, there are also applications that require the average thickness of the base material to be close to 300 μm in terms of insulation, high reliability, and circuit formation methods.

前述基材的平均厚度是使用電子測微計(安立知股份有限公司製造,設備名稱:KG3001A),測量5點的厚度,並且計算其平均值而得到的。 The average thickness of the base material was obtained by measuring the thickness at 5 points using an electronic micrometer (manufactured by Anrichi Co., Ltd., equipment name: KG3001A) and calculating the average value.

此外,關於訊號傳輸的傳輸損失中的導體損失,如下列式2所示,前述導體損失透過電阻率及磁導率的函數表示。在高頻領域中,由於集膚效應的影響,電流只會在導體的表面流動,基材與導體的界面凹凸對訊號傳輸有著非常大的影響。因此,基材與導體的界面的平滑性很重要,界面凹凸程度越小,電阻率會變小,導體損失也會隨著變小。為了抑制高頻電路板中的傳輸損失,不僅要考慮介電損失,也要考慮到導體損失。 In addition, regarding the conductor loss among the transmission losses in signal transmission, as shown in the following equation 2, the conductor loss is expressed as a function of resistivity and magnetic permeability. In the high-frequency field, due to the influence of the skin effect, current will only flow on the surface of the conductor, and the unevenness of the interface between the substrate and the conductor has a great impact on signal transmission. Therefore, the smoothness of the interface between the base material and the conductor is very important. The smaller the unevenness of the interface, the smaller the resistivity will be and the smaller the conductor loss will be. In order to suppress transmission losses in high-frequency circuit boards, not only dielectric losses but also conductor losses must be considered.

Figure 111116210-A0305-02-0007-2
Figure 111116210-A0305-02-0007-2

以上符號表示為:f:頻率,μ:磁導率,ρ:電阻率。 The above symbols are expressed as: f: frequency, μ: magnetic permeability, ρ: resistivity.

作為前述基材的平滑性的指標,舉例來說,列舉前述基材的表面的算術平均粗糙度Ra,及前述基材的表面的最大高度Rz。 Examples of indicators of the smoothness of the base material include the arithmetic mean roughness Ra of the surface of the base material and the maximum height Rz of the surface of the base material.

作為前述基材的表面的算術平均粗糙度Ra,在500nm以下為佳,較佳為400nm以下,更佳為300nm以下。前述基材的表面的算術平均粗糙度Ra為500nm以下時,能夠得到傳輸損失少的高頻電路板用導電性膜片。 The arithmetic mean roughness Ra of the surface of the base material is preferably 500 nm or less, more preferably 400 nm or less, and more preferably 300 nm or less. When the arithmetic mean roughness Ra of the surface of the base material is 500 nm or less, a conductive film for a high-frequency circuit board with low transmission loss can be obtained.

前述基材的表面的算術平均粗糙度Ra的量測是使用光干涉表面形狀粗度計(布魯克日本股份有限公司製造,WYKO ContourGT K1M,量測條件:VSI mode)量測而得到的。 The arithmetic mean roughness Ra of the surface of the base material was measured using an optical interference surface roughness meter (WYKO ContourGT K1M, manufactured by Bruker Japan Co., Ltd., measurement conditions: VSI mode).

前述基材的表面的最大高度Rz在5000nm以下為佳,較佳為3000nm以下,更佳為2000nm以下。 The maximum height Rz of the surface of the substrate is preferably 5000 nm or less, more preferably 3000 nm or less, more preferably 2000 nm or less.

前述最大高度Rz是指,在量測面上的頂端和底部所間隔的值中,前10個最大值的平均值。 The aforementioned maximum height Rz refers to the average of the first 10 maximum values among the values separated by the top and bottom of the measurement surface.

前述基材的表面的最大高度Rz是使用光干涉表面形狀粗度計(布魯克日本股份有限公司製造,WYKO ContourGT K1M,量測條件:VSI mode)量測而得到的。 The maximum height Rz of the surface of the aforementioned base material was measured using a light interference surface profile roughness meter (WYKO ContourGT K1M, manufactured by Bruker Japan Co., Ltd., measurement conditions: VSI mode).

雖然作為前述基板的透明性沒有特別限制,本發明的高頻電路板用導電性膜片用於透明顯示器及透明天線等透明性要求的裝置時,透明性(透過率、霧度)高者為佳。 Although the transparency of the substrate is not particularly limited, when the conductive film for high-frequency circuit boards of the present invention is used in devices requiring transparency such as transparent displays and transparent antennas, the one with the highest transparency (transmittance, haze) is good.

前述基材的透過率,在60%以上為佳,較佳為70%以上,更佳為80%以上。 The transmittance of the aforementioned base material is preferably above 60%, more preferably above 70%, and more preferably above 80%.

前述基材的霧度,在10%以下為佳,較佳為8%以下,更佳為6%以下。 The haze of the aforementioned base material is preferably 10% or less, more preferably 8% or less, and more preferably 6% or less.

前述透過率及前述霧度分別是根據JIS K7361-1及JIS K7136,使用霧度計(日本電色工業股份有限公司製造,設備名稱:NDH5000SP)進行量測的。 The aforementioned transmittance and the aforementioned haze were measured using a haze meter (manufactured by Nippon Denshoku Industry Co., Ltd., equipment name: NDH5000SP) in accordance with JIS K7361-1 and JIS K7136 respectively.

雖然對前述基板的透過率及霧度沒有特別限制,當軟性印刷電路板(FPC)配置在透明裝置、模組上時,也要求使FPC不顯眼,並藉由使用60%以上透過率、10%以下霧度的基材,使得FPC本身變得不顯眼。此外,在要求更高透明性的領域中,需要高透明、低霧度,在這種情況下,要求透過率:80%以上,霧度:6%以下。 Although there are no special restrictions on the transmittance and haze of the aforementioned substrate, when the flexible printed circuit board (FPC) is placed on a transparent device or module, it is also required to make the FPC inconspicuous, and by using a transmittance of 60% or more, 10 Substrates with a haze below % make the FPC itself inconspicuous. In addition, in fields requiring higher transparency, high transparency and low haze are required. In this case, transmittance is required: 80% or more and haze: 6% or less.

<附著層> <Adhesion layer>

前述附著層是配置在前述基材的至少一面上的層。前述附著層是配置在前述基材與後述銅層之間的層,其是具有將後述的銅層與前述基材牢固地附著之功能的承載層。 The adhesion layer is a layer disposed on at least one side of the base material. The adhesion layer is a layer disposed between the base material and the copper layer to be described later, and is a carrier layer having the function of firmly adhering the copper layer to be described later and the base material.

前述附著層具有鎳銅合金,並且根據必要時,進一步具有其他的成分。由於附著層具有鎳銅合金,能夠得到蝕刻性、附著性優異的高頻電路板用導電性膜片。 The aforementioned adhesion layer contains a nickel-copper alloy, and if necessary, further contains other components. Since the adhesion layer contains a nickel-copper alloy, a conductive film for high-frequency circuit boards with excellent etching properties and adhesion can be obtained.

作為前述附著層的前述鎳銅合金中銅的含有量,相對於前述附著層中鎳與銅的總量,銅的比例在32質量%以上67質量%以下為佳,32質量%以上56質量%以下較佳,32質量%以上45質量%以下更佳,32質量%以上40質量%以下最佳。 The copper content in the nickel-copper alloy as the adhesion layer is preferably 32 mass% or more and 67 mass% or less relative to the total amount of nickel and copper in the adhesion layer, and 32 mass% or more and 56 mass% The following is preferred, 32 mass % or more and 45 mass % or less is more preferred, and 32 mass % or more and 40 mass % or less is most preferred.

關於前述附著層的組成,相對於前述附著層中鎳與銅的總量,透過將銅的比例設定為32質量%以上,在常溫下不再是強磁性物質,能夠降低磁導率。因此,能減少集膚效應的影響。此外,相對於該附著層中鎳與銅的總量,透過將銅的比例設定在67質量%以下,能夠提升基材和附著層的界面的附著性,透過設定在40質量%以下,能夠再進一步地提高附著性。 Regarding the composition of the adhesion layer, by setting the proportion of copper to 32% by mass or more relative to the total amount of nickel and copper in the adhesion layer, it is no longer a ferromagnetic material at room temperature and the magnetic permeability can be reduced. Therefore, the influence of skin effect can be reduced. In addition, by setting the proportion of copper to 67 mass % or less relative to the total amount of nickel and copper in the adhesion layer, the adhesion of the interface between the base material and the adhesion layer can be improved, and by setting it to 40 mass % or less, it can be further improved. Further improve adhesion.

作為前述附著層的前述鎳銅合金中鎳的含有量,相對於前述附著層中鎳與銅的總量,鎳的比例在33質量%以上68質量%以下為佳,44質量%以上68質量%以下較佳,55質量%以上68質量%以下更佳,60質量%以上68質量%以下最佳。 The content of nickel in the nickel-copper alloy as the above-mentioned adhesion layer is preferably 33 mass % or more and 68 mass % or less, relative to the total amount of nickel and copper in the above-mentioned adhesion layer. It is preferably 44 mass % or more and 68 mass %. The following is preferred, 55 mass % or more and 68 mass % or less is more preferred, and 60 mass % or more and 68 mass % or less is most preferred.

作為前述附著層的材質,相對於附著層的材質的總量,假若鎳與銅的含有量在90質量%以上時,只要是能發揮本發明的功效,本發明就沒有特別限制,並且可以根據目的適當地具有其他的成分。 As for the material of the above-mentioned adhesion layer, if the content of nickel and copper is more than 90% by mass relative to the total amount of the material of the adhesion layer, the present invention is not particularly limited as long as the effect of the present invention can be exerted, and it can be based on Purpose has other ingredients as appropriate.

作為前述附著層的形狀、構造、大小沒有特別限制,並且可以根據目的適當地選擇。 The shape, structure, and size of the aforementioned adhesion layer are not particularly limited and can be appropriately selected depending on the purpose.

作為前述其他的成分沒有特別限制,只要不妨礙本發明的功效,就可以適當地具有鎳銅合金以外的成分。 There are no particular restrictions on the other components mentioned above. As long as the effect of the present invention is not hindered, components other than nickel-copper alloy may be appropriately included.

前述附著層的平均厚度,在3nm以上100nm以下為佳,較佳為4nm以上50nm以下,更佳為5nm以上25nm以下。前述附著層的平均厚度為3nm 以上時,能夠提升附著性,為100nm以下時,則能夠提升生產性。此外,鎳合金的導電性比銅差,附著層的平均厚度為100nm以上時,可能會影響訊號傳輸。另外,前述附著層的平均厚度(高度)如以下進行量測。 The average thickness of the adhesion layer is preferably from 3 nm to 100 nm, preferably from 4 nm to 50 nm, more preferably from 5 nm to 25 nm. The average thickness of the aforementioned adhesion layer is 3nm When it is above, adhesion can be improved, and when it is below 100nm, productivity can be improved. In addition, the electrical conductivity of nickel alloy is worse than that of copper. When the average thickness of the adhesion layer is more than 100nm, it may affect signal transmission. In addition, the average thickness (height) of the aforementioned adhesion layer was measured as follows.

首先,準備電路板,複數個特定規格厚度的附著層形成在電路板上,透過接觸式輪廓儀,量測複數個特定規格厚度的前述附著層的物理膜厚。接著,透過使用螢光X射線量測裝置(XRF)的定量分析,量測複數個特定規格厚度的前述附著層中附著層材料的量。透過接觸式輪廓儀量測的前述膜厚,及透過使用螢光X射線量測裝置(XRF)的定量分析量測到附著層材料的量,製成檢量線。在實際想要量測的樣品中,使用螢光X射線量測裝置(XRF)定量分析附著層材料的量,並使用製作的檢量線算出膜厚。同樣地,製作10個樣品,取其平均值作為平均厚度。 First, a circuit board is prepared, and a plurality of adhesion layers with a specific thickness are formed on the circuit board. The physical film thickness of the adhesion layers with a specific thickness is measured using a contact profilometer. Next, through quantitative analysis using a fluorescence X-ray measurement device (XRF), the amount of the adhesion layer material in the adhesion layer with a plurality of specific thicknesses is measured. The aforementioned film thickness measured by a contact profilometer and the amount of adhesion layer material measured through quantitative analysis using a fluorescent X-ray measuring device (XRF) were used to create a calibration line. In the actual sample to be measured, the amount of the adhesion layer material is quantitatively analyzed using a fluorescent X-ray measurement device (XRF), and the film thickness is calculated using the prepared calibration curve. Similarly, make 10 samples and take the average value as the average thickness.

前述基材與前述附著層的附著強度(N/mm),在0.5N/mm以上為佳,較佳為0.6N/mm以上,更佳為0.7N/mm以上。前述基材與前述附著層的附著強度為0.5N/mm以上時,在電路形成時的抗蝕劑塗布或是圖案化的期間,前述基材與前述附著層不會剝離,而能夠形成電路。此外,若有必要更進一步形成細微電路,0.5N/mm以上的附著強度為佳。 The adhesion strength (N/mm) of the base material and the adhesion layer is preferably 0.5 N/mm or more, more preferably 0.6 N/mm or more, and more preferably 0.7 N/mm or more. When the adhesion strength between the base material and the adhesion layer is 0.5 N/mm or more, a circuit can be formed without peeling off the base material and the adhesion layer during resist coating or patterning during circuit formation. In addition, if it is necessary to further form fine circuits, an adhesion strength of 0.5N/mm or more is preferred.

作為前述附著層的形成方法,舉例來說,使用以鎳銅合金作為材料的DC磁控濺射法為代表的各種濺鍍法、真空蒸鍍法、離子電鍍法等,列舉處理前述基材的整體表面之方法等。 Examples of methods for forming the adhesion layer include various sputtering methods, vacuum evaporation methods, ion plating methods, and the like, including DC magnetron sputtering using nickel-copper alloy as a material. Overall surface method, etc.

<銅層> <Copper Layer>

前述銅層是配置在前述附著層上方的層。前述銅層至少配置在,前述附著層中的與前述基材對向的面之相反面上。 The copper layer is a layer disposed above the adhesion layer. The copper layer is disposed on at least a surface of the adhesion layer opposite to the surface facing the base material.

作為前述銅層的形狀、構造、大小沒有特別限制,並且可以根據目的適當地選擇。 The shape, structure, and size of the copper layer are not particularly limited and can be appropriately selected depending on the purpose.

作為前述銅層的材質,相對於銅層的材質的總量,假若銅的含有量在95質量%以上時,只要是能發揮本發明的功效,本發明就沒有特別限制,並且可以根據目的適當地具有其他的成分。 As for the material of the copper layer, if the content of copper is 95% by mass or more relative to the total amount of the material of the copper layer, the present invention is not particularly limited as long as the effect of the present invention can be exerted, and it can be appropriately determined according to the purpose. Earth has other ingredients.

前述銅層的平均厚度,在0.05μm以上5μm以下為佳,較佳為0.06μm以上3μm以下,更佳為0.07μm以上2μm以下。前述銅層的平均厚度為0.05μm以上時,可以透過作為晶種層形成銅層後的後加工的銅電解電鍍,使膜增厚;若為5μm以下,則能夠形成生產性優良的銅層。 The average thickness of the aforementioned copper layer is preferably from 0.05 μm to 5 μm , preferably from 0.06 μm to 3 μm , and more preferably from 0.07 μm to 2 μm . When the average thickness of the copper layer is 0.05 μm or more, the film can be thickened by post-processing copper electrolytic plating after forming the copper layer as a seed layer; if it is 5 μm or less, it is possible to form a highly productive product. copper layer.

另外,前述銅層的平均厚度(高度)如以下進行量測。 In addition, the average thickness (height) of the aforementioned copper layer is measured as follows.

首先,準備電路板,複數個特定規格厚度的銅層形成在電路板上,透過接觸式輪廓儀,量測複數個特定規格厚度的前述銅層的物理膜厚。接著,透過使用螢光X射線量測裝置(XRF)的定量分析,量測複數個特定規格厚度的前述銅層中銅層材料的量。透過接觸式輪廓儀量測的前述膜厚,及透過使用螢光X射線量測裝置(XRF)的定量分析量測到銅層材料的量,製成檢量線。在實際想要量測的樣品中,使用螢光X射線量測裝置(XRF)定量分析銅層材料的量,並使用製作的檢量線算出膜厚。同樣地,製作10個樣品,取其平均值作為平均厚度。 First, a circuit board is prepared, and a plurality of copper layers with a specific thickness are formed on the circuit board. The physical film thickness of the plurality of copper layers with a specific thickness is measured using a contact profilometer. Next, through quantitative analysis using a fluorescent X-ray measurement device (XRF), the amount of copper layer material in a plurality of the aforementioned copper layers with specific thicknesses is measured. The aforementioned film thickness measured by a contact profilometer and the amount of copper layer material measured through quantitative analysis using a fluorescent X-ray measuring device (XRF) were used to create a calibration line. In the actual sample to be measured, a fluorescent X-ray measurement device (XRF) is used to quantitatively analyze the amount of copper layer material, and the film thickness is calculated using the prepared calibration line. Similarly, make 10 samples and take the average value as the average thickness.

另外在別的態樣中,前述銅層的平均厚度,在0.05μm以上40μm以下為佳,較佳為0.05μm以上25μm以下,更佳為0.05μm以上18μm以下。前述銅層的平均厚度在40μm以下時,能夠形成與一般電路形成所使用之附有銅箔之基材同等的電路。 In addition, in other aspects, the average thickness of the aforementioned copper layer is preferably from 0.05 μm to 40 μm , more preferably from 0.05 μm to 25 μm , more preferably from 0.05 μm to 18 μm . . When the average thickness of the copper layer is 40 μm or less, a circuit equivalent to a base material with copper foil used for general circuit formation can be formed.

此外,後述銅層的平均厚度,舉例來說,可以在與基板的面方向正交的方向上拍攝的剖面圖像中的一個前述銅層的厚度的10個以上的值(部位)的平均來求出。 In addition, the average thickness of the copper layer described later can be determined by, for example, the average of 10 or more values (parts) of the thickness of the copper layer in a cross-sectional image taken in a direction orthogonal to the surface direction of the substrate. Find out.

作為平均厚度為0.05μm以上5μm以下的前述銅層的形成方法,舉例來說,使用以銅作為材料的DC磁控濺射法為代表的各種濺鍍法、真空蒸鍍法、離子電鍍法等,列舉至少處理前述附著層中的與前述基材對向之面的相反面的整體表面之方法。 As a method for forming the copper layer with an average thickness of 0.05 μm or more and 5 μm or less, for example, various sputtering methods, vacuum evaporation methods, ion deposition methods, and DC magnetron sputtering methods using copper as a material are used. Examples of the electroplating method include methods of treating at least the entire surface of the adhesion layer opposite to the surface facing the base material.

作為平均厚度為0.05μm以上40μm以下的前述銅層的形成方法,舉例來說,列舉電解銅電鍍等。 Examples of a method for forming the copper layer having an average thickness of 0.05 μm to 40 μm include electrolytic copper plating.

<其他的層> <Other layers>

作為前述其他的層沒有特別限制,並且可以根據目的適當地選擇,舉例來說,列舉氧化防止層等。 The aforementioned other layers are not particularly limited and can be appropriately selected depending on the purpose. Examples thereof include an oxidation prevention layer and the like.

<<氧化防止層>> <<Oxidation prevention layer>>

前述氧化防止層為配置在,前述銅層中的與前述附著層對向之面的相反面上的層。 The oxidation prevention layer is a layer disposed on a surface of the copper layer opposite to the surface facing the adhesion layer.

作為前述氧化防止層的形狀、構造、大小沒有特別限制,並且可以根據目的適當地選擇。 The shape, structure, and size of the aforementioned oxidation prevention layer are not particularly limited and can be appropriately selected depending on the purpose.

作為前述氧化防止層的材質,舉例來說,列舉包括鎳、鉻、矽、鋅、銀、金及鋁中的至少一種的金屬、氧化物及氮化物等。 Examples of the material of the oxidation prevention layer include metals including at least one of nickel, chromium, silicon, zinc, silver, gold, and aluminum, oxides, and nitrides.

前述氧化防止層的平均厚度在0.001μm以上5μm以下為佳,較佳為0.002μm以上3μm以下。 The average thickness of the aforementioned oxidation prevention layer is preferably from 0.001 μm to 5 μm , and more preferably from 0.002 μm to 3 μm .

作為前述氧化防止層的形成方法,舉例來說,將各種金屬、合金作為材料,以DC磁控濺射法為代表的各種濺鍍法、真空蒸鍍法、離子電鍍法,其他還有,透過電解電鍍、無電解電鍍、濕氏鍍膜、浸漬鍍膜、噴霧鍍膜 等,列舉形成前述銅層中的與前述附著層對向之面的相反面的整體表面之方法等。 Examples of methods for forming the oxidation prevention layer include various metals and alloys as materials, various sputtering methods represented by DC magnetron sputtering, vacuum evaporation, ion plating, and others. Electrolytic plating, electroless plating, wetland coating, immersion coating, spray coating Examples include methods of forming the entire surface of the copper layer opposite to the surface facing the adhesion layer.

本發明的高頻電路板用導電性膜片,依序地包含:前述基材、前述附著層、前述銅層及前述其他的層。 The conductive film for high-frequency circuit boards of the present invention includes, in order, the aforementioned base material, the aforementioned adhesion layer, the aforementioned copper layer, and the aforementioned other layers.

於此,參考圖式,關於本發明的高頻電路板用導電性膜片的一例進行說明。 Here, an example of the conductive film for high-frequency circuit boards of the present invention will be described with reference to the drawings.

圖1係表示本發明的高頻電路板用導電性膜片之一例的剖面圖。 FIG. 1 is a cross-sectional view showing an example of the conductive film for high-frequency circuit boards of the present invention.

在圖1所示的高頻電路板用導電性膜片10中,在基材11上依序地包含附著層12及銅層13。 The conductive film 10 for high-frequency circuit boards shown in FIG. 1 includes an adhesion layer 12 and a copper layer 13 on a base material 11 in this order.

作為本發明的高頻電路板用導電性膜片的用途,舉例來說,列舉和天線有關的如5G基地台、毫米波雷達及各種天線等。列舉和高速通訊FPC有關的如智慧型手機、平板裝置及伺服器等。 Examples of applications of the conductive film for high-frequency circuit boards of the present invention include antenna-related applications such as 5G base stations, millimeter-wave radars, and various antennas. Lists those related to high-speed communication FPC such as smartphones, tablet devices and servers.

(高頻電路板) (High frequency circuit board)

作為本發明的高頻電路板,依序地包含:基材、設置於前述基材的至少一面上的附著層,及設置於前述附著層上方的配線,其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下,前述附著層具有鎳銅合金,並且根據必要時,進一步具有其他的層。 The high-frequency circuit board of the present invention includes, in order, a base material, an adhesion layer provided on at least one side of the base material, and wiring provided above the adhesion layer, wherein at a measurement frequency of 10 GHz, The relative permittivity of the base material is 3.3 or less. The adhesion layer includes a nickel-copper alloy and, if necessary, further includes other layers.

在本發明的高頻電路板中,關於前述基材及前述附著層,和本發明的高頻電路板用導電性膜片中所述者相同。 In the high-frequency circuit board of the present invention, the base material and the adhesive layer are the same as those described in the conductive film for high-frequency circuit boards of the present invention.

<配線> <Wiring>

前述配線是配置在,前述附著層中的與前述基板對向之面的相反面上的配線。 The wiring is arranged on a surface of the adhesion layer opposite to a surface facing the substrate.

作為前述配線的形狀沒有特別限制,並且可以根據目的適當地選擇,舉例來說,列舉與長度方向正交的截面可約略為四邊形等。 The shape of the wiring is not particularly limited and can be appropriately selected depending on the purpose. For example, a cross-section orthogonal to the longitudinal direction may be approximately a quadrilateral or the like.

作為前述配線的構造沒有特別限制,並且可以根據目的適當地選擇。 There is no particular limitation as to the structure of the aforementioned wiring, and can be appropriately selected depending on the purpose.

作為前述配線的材質,相對於配線的材質的總量,假若銅的含有量在95質量%以上時,只要是能發揮本發明的功效,本發明就沒有特別限制,並且可以根據目的適當地選擇。 As for the material of the wiring, if the content of copper is 95% by mass or more relative to the total amount of the wiring material, the present invention is not particularly limited as long as the effect of the present invention can be exerted, and can be appropriately selected according to the purpose. .

作為前述配線的大小的一例,前述配線的線寬在50μm以下為佳,較佳為40μm以下,更佳為30μm以下。前述配線的線寬為50μm以下時,能夠將電路板細微化,並將應用的半導體裝置微型化。此外,作為前述配線的平均厚度(高度),只要是能夠發揮其功能程度的厚度的話,就沒有特別限制,並且可以根據目的適當地選擇,舉例來說,其厚度在1.0μm以上40μm以下為佳,較佳為1.5μm以上25μm以下,更佳為2.0μm以上18μm以下。此外,前述配線的平均厚度(高度),舉例來說,可以在與高頻電路板的面方向正交的方向上拍攝的剖面圖像中的一個前述配線的厚度(高度)的10個以上的值(部位)的平均來求出。前述配線的平均厚度為1.0μm以上時,可以傳輸電性訊號,適合作為電路板使用。前述配線的平均厚度為40μm以下時,適合作為具有可撓性的電路板使用。 As an example of the size of the wiring, the line width of the wiring is preferably 50 μm or less, more preferably 40 μm or less, and more preferably 30 μm or less. When the line width of the wiring is 50 μm or less, the circuit board can be miniaturized and the applied semiconductor device can be miniaturized. In addition, the average thickness (height) of the wiring is not particularly limited as long as it is a thickness that can exert its function, and can be appropriately selected according to the purpose. For example, the thickness is 1.0 μm or more and 40 μm . The following is preferred, preferably 1.5 μm or more and 25 μm or less, more preferably 2.0 μm or more and 18 μm or less. In addition, the average thickness (height) of the wiring may be, for example, 10 or more of the thickness (height) of the wiring in one cross-sectional image taken in a direction orthogonal to the surface direction of the high-frequency circuit board. It is calculated by averaging the values (parts). When the average thickness of the aforementioned wiring is 1.0 μm or more, it can transmit electrical signals and is suitable for use as a circuit board. When the average thickness of the wiring is 40 μm or less, it is suitable for use as a flexible circuit board.

前述配線的寬度在50μm以下情況時,作為前述配線的形成方法,舉例來說,列舉SAP(Semi Additive Process)及MSAP(Modified Semi Additive Process)等。前述SAP及前述MSAP可適合用於形成細微電路。 When the width of the wiring is 50 μm or less, examples of the wiring forming method include SAP (Semi Additive Process) and MSAP (Modified Semi Additive Process). The aforementioned SAP and the aforementioned MSAP can be suitably used to form fine circuits.

雖然作為前述配線的形成方法沒有特別限制,列舉如SAP(Semi Additive Process)及MSAP(Modified Semi Additive Process)之外的減材技術方法等。 Although there is no particular limitation on the method of forming the wiring, subtractive technology methods other than SAP (Semi Additive Process) and MSAP (Modified Semi Additive Process) are exemplified.

<其他的層> <Other layers>

作為前述其他的層,舉例來說,列舉氧化防止層、防鏽層等。 Examples of the aforementioned other layers include an oxidation prevention layer, an anti-rust layer, and the like.

<<氧化防止層>> <<Oxidation prevention layer>>

前述氧化防止層是配置在,前述配線及附著層所露出的表面上的層。 The oxidation prevention layer is a layer disposed on the surface where the wiring and the adhesion layer are exposed.

作為前述氧化防止層,和前述高頻電路板用導電性膜片中所述者相同。 The oxidation prevention layer is the same as that described for the conductive film for high-frequency circuit boards.

<<防鏽層>> <<Anti-rust layer>>

前述防鏽層是配置在前述配線及前述附著層的露出表面,或是配置在前述配線中前述氧化防止層的露出表面上的層。 The anti-rust layer is a layer disposed on the exposed surface of the wiring and the adhesion layer, or on the exposed surface of the oxidation prevention layer in the wiring.

作為前述防鏽層的形狀、構造、大小沒有特別限制,並且可以根據目的適當地選擇。 The shape, structure, and size of the rust-proof layer are not particularly limited and can be appropriately selected depending on the purpose.

作為前述防鏽層的材質,舉例來說,列舉苯並三唑系、咪唑系、硫醇系等的化合物。 Examples of materials for the anti-rust layer include benzotriazole-based, imidazole-based, thiol-based compounds, and the like.

作為前述防鏽層的形成方法,根據濕氏鍍膜、浸漬鍍膜、噴霧鍍膜等,能夠將其形成於前述配線及前述附著層的露出表面,或是配置在前述配線中前述氧化防止層的露出表面。 The anti-rust layer can be formed on the exposed surface of the wiring and the adhesion layer by wet plating, immersion plating, spray plating, or the like, or can be disposed on the exposed surface of the oxidation prevention layer in the wiring. .

作為本發明的高頻電路板的傳輸損失,在40GHz的頻率下,-10dB/100mm以上為佳,較佳為-9dB/100mm以上,更佳為-8dB/100mm以上。 The transmission loss of the high-frequency circuit board of the present invention is preferably -10dB/100mm or more at a frequency of 40 GHz, more preferably -9dB/100mm or more, and more preferably -8dB/100mm or more.

對於高頻電路板的傳輸損失,各種基材上形成微帶線,調整電路線寬及前述配線的平均厚度,使電路的阻抗符合50Ω。阻抗及傳輸損失係能夠使用網路分析儀(製造商:KEYSIGHT TECNOLOGIES公司,型號:E8363B)以探針的方式,量測至40GHz而得到的。 For the transmission loss of high-frequency circuit boards, microstrip lines are formed on various substrates, and the circuit line width and the average thickness of the aforementioned wiring are adjusted to make the impedance of the circuit comply with 50Ω. Impedance and transmission loss can be measured to 40GHz using a network analyzer (manufacturer: KEYSIGHT TECNOLOGIES, model: E8363B) using a probe.

本發明的高頻電路板依序地包含:前述基材、前述附著層、前述配線及前述其他的層。 The high-frequency circuit board of the present invention sequentially includes: the aforementioned base material, the aforementioned adhesion layer, the aforementioned wiring, and the aforementioned other layers.

於此,參考圖式,關於本發明的高頻電路板的一例進行說明。 Here, an example of the high-frequency circuit board of the present invention will be described with reference to the drawings.

圖2A係表示本發明的高頻電路板之一例的剖面圖。圖2A所示的高頻電路板20中,在基材11上依序地包含附著層12、配線14。 FIG. 2A is a cross-sectional view showing an example of the high-frequency circuit board of the present invention. The high-frequency circuit board 20 shown in FIG. 2A includes an adhesion layer 12 and wiring 14 on a base material 11 in this order.

圖2B係表示本發明的高頻電路板之其他一例的剖面圖。圖2B所示的高頻電路板20中,在基材11上依序地包含附著層12、配線14、氧化防止層15。氧化防止層15以覆蓋附著層12及配線14的露出表面之方式配置。 FIG. 2B is a cross-sectional view showing another example of the high-frequency circuit board of the present invention. The high-frequency circuit board 20 shown in FIG. 2B includes an adhesion layer 12, a wiring 14, and an oxidation prevention layer 15 on the base material 11 in this order. The oxidation prevention layer 15 is disposed to cover the exposed surfaces of the adhesion layer 12 and the wiring 14 .

圖2C係表示本發明的高頻電路板之其他一例的剖面圖。圖2C所示的高頻電路板20中,在基材11上依序地包含附著層12、配線14、防鏽層16。防鏽層16以覆蓋附著層12及配線14的露出表面之方式配置。 FIG. 2C is a cross-sectional view showing another example of the high-frequency circuit board of the present invention. The high-frequency circuit board 20 shown in FIG. 2C includes an adhesion layer 12, a wiring 14, and an anti-rust layer 16 on the base material 11 in this order. The anti-rust layer 16 is disposed to cover the exposed surfaces of the adhesion layer 12 and the wiring 14 .

圖2D係表示本發明的高頻電路板之其他一例的剖面圖。圖2D所示的高頻電路板20中,在基材11上依序地包含附著層12、配線14、氧化防止層15、防鏽層16。 FIG. 2D is a cross-sectional view showing another example of the high-frequency circuit board of the present invention. The high-frequency circuit board 20 shown in FIG. 2D includes an adhesion layer 12, a wiring 14, an oxidation prevention layer 15, and an anti-rust layer 16 in this order on the base material 11.

[實施例] [Example]

以下,雖然對本發明的實施例進行說明,但本發明並不限定於這些實施例。 Hereinafter, although the Example of this invention is demonstrated, this invention is not limited to these Examples.

(實施例1) (Example 1)

<高頻電路板用導電性膜片1的製造> <Manufacturing of conductive film 1 for high-frequency circuit boards>

對平均厚度100μm的環烯烴聚合物(COP)膜片(基材,日本ZEON公司製造,產品名稱:ZEONOR)的上方進行預先處理後,使用含有35質量%銅的鎳銅合金作為材料,藉由導入氬氣進行濺鍍,形成平均厚度10nm的附著層。 After pre-processing the top of a cycloolefin polymer (COP) diaphragm (base material, manufactured by Japan ZEON Corporation, product name: ZEONOR) with an average thickness of 100 μm , a nickel-copper alloy containing 35% by mass copper was used as the material. By introducing argon gas and performing sputtering, an adhesion layer with an average thickness of 10 nm is formed.

接著,在導入氬氣的狀況下,以銅做為材料在附著層的上方進行濺鍍,形成平均厚度120nm的銅層,得到高頻電路板用導電性膜片1。 Next, with argon gas introduced, copper was used as a material and sputtered on the adhesion layer to form a copper layer with an average thickness of 120 nm, thereby obtaining the conductive film 1 for a high-frequency circuit board.

(實施例2~8及比較例1~2) (Examples 2 to 8 and Comparative Examples 1 to 2)

於實施例1,如表1所示改變基材的種類、附著層的種類以外,與實施例1同樣地製造高頻電路板用導電性膜片2~10。 In Example 1, conductive films 2 to 10 for high-frequency circuit boards were manufactured in the same manner as in Example 1, except that the type of base material and the type of adhesion layer were changed as shown in Table 1.

接者,高頻電路板用導電性膜片中各層的平均厚度如以下所示進行量測。 Next, the average thickness of each layer in the conductive film for high-frequency circuit boards is measured as follows.

-附著層及銅層的平均厚度- -Average thickness of adhesion layer and copper layer-

首先,準備電路板,複數個特定規格厚度的附著層或是銅層形成在電路板上,透過接觸式輪廓儀,量測複數個特定規格厚度的附著層或是銅層的物理膜厚。接著,透過使用螢光X射線量測裝置(XRF)的定量分析,量測複數個特定規格厚度的附著層或是銅層中附著層或是銅層材料的量。透過接觸式輪廓儀量測的前述膜厚,及透過使用螢光X射線量測裝置(XRF)的定量分析量測到附著層或是銅層材料的量,製成檢量線。透過使用螢光X射線量測裝置(XRF)對高頻電路板用導電性膜片進行定量分析,檢測來自附著層的鎳及銅(或鉻),取10個部分的量測值的平均值作為平均厚度。 First, a circuit board is prepared. A plurality of adhesion layers or copper layers with a specific thickness are formed on the circuit board. The physical film thickness of a plurality of adhesion layers or copper layers with a specific thickness is measured through a contact profilometer. Next, through quantitative analysis using a fluorescent X-ray measurement device (XRF), the amount of adhesion layer or copper layer material in a plurality of adhesion layers or copper layers with specific thicknesses is measured. The aforementioned film thickness is measured by a contact profilometer, and the amount of the adhesion layer or copper layer material is measured through quantitative analysis using a fluorescent X-ray measuring device (XRF) to form a calibration line. Quantitative analysis of the conductive film for high-frequency circuit boards using a fluorescent as the average thickness.

關於銅層的平均厚度,除了檢測來自銅層的銅,並將10個部分的量測值的平均值作為平均厚度之外,與附著層的平均厚度的量測相同地進行量測,結果如表1所示。 Regarding the average thickness of the copper layer, the measurement is carried out in the same manner as the average thickness of the adhesion layer, except that the copper from the copper layer is detected and the average of the measurement values of 10 parts is used as the average thickness. The results are as follows As shown in Table 1.

此外,基材的相對電容率及損耗正切,是根據以JIS R1641為標準的共振腔法,在10GHz的頻率下量測。結果如表1所示。 In addition, the relative permittivity and loss tangent of the substrate were measured at a frequency of 10GHz based on the resonant cavity method based on JIS R1641. The results are shown in Table 1.

各基材的表面粗糙度,使用的是布魯克日本股份有限公司製造的光干涉表面形狀粗度計(型號:WYKO ContourGT K1M,量測條件:VSI mode)。 The surface roughness of each base material was measured using an optical interference surface roughness meter manufactured by Bruker Japan Co., Ltd. (model: WYKO ContourGT K1M, measurement conditions: VSI mode).

此外,各基材的光學特性,是根據JIS K7361-1/霧度:JIS K7136,使用霧度計(日本電色工業股份有限公司製造,型號等:NDH5000SP)量測全光線透過率。結果如表1所示。 In addition, the optical properties of each base material were measured according to JIS K7361-1/Haze: JIS K7136, using a haze meter (manufactured by Nippon Denshoku Industry Co., Ltd., model number: NDH5000SP) to measure the total light transmittance. The results are shown in Table 1.

此外,附著層的組成是使用X射線光電子能譜儀(XPS,ESCA,ULVAC-PHI股份有限公司製造,型號:model 5400),透過分析附著層的鎳、鉻、銅的元素濃度進行量測。結果如表2所示。 In addition, the composition of the adhesion layer is measured using an X-ray photoelectron spectrometer (XPS, ESCA, manufactured by ULVAC-PHI Co., Ltd., model: model 5400) by analyzing the element concentrations of nickel, chromium, and copper in the adhesion layer. The results are shown in Table 2.

Figure 111116210-A0305-02-0018-3
Figure 111116210-A0305-02-0018-3
Figure 111116210-A0305-02-0019-4
Figure 111116210-A0305-02-0019-4

Figure 111116210-A0305-02-0019-5
Figure 111116210-A0305-02-0019-5

接著,關於得到的高頻電路板用導電性膜片,如下所示評價「蝕刻性」、「附著強度」及「傳輸損失」。結果如表3所示。 Next, regarding the obtained conductive film for high-frequency circuit boards, "etchability", "adhesion strength" and "transmission loss" were evaluated as follows. The results are shown in Table 3.

<蝕刻性> <Etching property>

將1%三氯化鐵(液溫:23℃)放入玻璃燒杯中,將高頻電路板用導電性膜片浸入其中,並於180秒後取出,之後再用水沖洗。以KIM TOWEL擦拭紙擦去水分,根據以下評價基準目測殘渣的有無並進行評價。 Put 1% ferric chloride (liquid temperature: 23°C) into a glass beaker, immerse the conductive diaphragm of the high-frequency circuit board into it, take it out after 180 seconds, and then rinse with water. Wipe off the moisture with KIM TOWEL wipes and visually check for the presence of residue and evaluate based on the following evaluation criteria.

[評價基準] [Evaluation criteria]

無殘渣:O No residue: O

有殘渣:X There is residue:X

<附著強度> <Adhesion strength>

首先,透過稀硫酸將銅層(銅濺射)面表面清洗後,在硫酸銅水溶液中進行電解電鍍,得到平均厚度20μm的濕式電鍍銅層,並作為測試用樣品。使用得到的測試用樣品,根據下述量測方法,量測附著強度。 First, the copper layer (copper sputtering) surface was cleaned with dilute sulfuric acid, and then electroplated in a copper sulfate aqueous solution to obtain a wet electroplated copper layer with an average thickness of 20 μm , which was used as a test sample. Using the obtained test sample, the adhesion strength was measured according to the following measurement method.

-量測方法- -Measurement method-

在10cm平方的銅層(銅濺射)樣品上,透過電解電鍍形成平均厚度20μm的銅層後,將其切割成5mm的寬度。用雙面膠帶將樣品貼在貼板上。將固定在貼板的基材部分固定在下夾具,並將藉機剝離的附著層及濕式電鍍銅層的部分,安裝在上夾具。使用精密萬能試驗機(島津製作所),以速度:50mm/min,拉伸方向:180度拉伸,量測當下承載量。 On a 10 cm square copper layer (copper sputtering) sample, a copper layer with an average thickness of 20 μm was formed by electrolytic plating, and then cut into a width of 5 mm. Attach the sample to the mounting board with double-sided tape. Fix the base material part fixed to the board on the lower fixture, and install the part of the adhesion layer and wet electroplated copper layer that has been peeled off on the upper fixture. Use a precision universal testing machine (Shimadzu Corporation) to measure the current load capacity at a speed of 50mm/min and a stretching direction of 180 degrees.

<傳輸損失> <Transmission loss>

在得到的高頻電路板用導電性膜片中的銅層(銅濺射)上,使用減材技術形成微帶線,製造高頻電路板,量測傳輸損失。調整電路寬度及電鍍厚度使電路阻抗符合50Ω。阻抗及傳輸損失係使用網路分析儀(製造商:KEYSIGHT TECNOLOGIES公司,型號:E8363B)以探針的方式,量測至40GHz並進行評價。結果如表3及圖3所示。此外,關於實施例5-8,則是未量測傳輸損失。 On the copper layer (copper sputtering) in the obtained conductive film for high-frequency circuit boards, a microstrip line was formed using subtractive technology, a high-frequency circuit board was manufactured, and the transmission loss was measured. Adjust the circuit width and plating thickness to make the circuit impedance comply with 50Ω. The impedance and transmission loss were measured to 40GHz using a network analyzer (manufacturer: KEYSIGHT TECNOLOGIES, model: E8363B) using a probe and evaluated. The results are shown in Table 3 and Figure 3. In addition, regarding Examples 5-8, the transmission loss was not measured.

Figure 111116210-A0305-02-0021-6
Figure 111116210-A0305-02-0021-6

10:高頻電路板用導電性膜片 10: Conductive diaphragm for high frequency circuit boards

11:基材 11:Substrate

12:附著層 12:Adhesion layer

13:銅層 13: Copper layer

Claims (4)

一種高頻電路板用導電性膜片,其特徵在於依序地包含:基材;設置於前述基材的至少一面上的附著層;及設置於前述附著層上方的銅層;其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下;前述附著層具有鎳銅合金,且前述附著層的平均厚度為3nm以上且50nm以下。 A conductive film for high-frequency circuit boards, characterized in that it sequentially includes: a base material; an adhesion layer provided on at least one side of the base material; and a copper layer provided above the adhesion layer; wherein, at 10 GHz At the measurement frequency, the relative permittivity of the base material is 3.3 or less; the adhesion layer includes a nickel-copper alloy, and the average thickness of the adhesion layer is between 3 nm and 50 nm. 如請求項1所述的高頻電路板用導電性膜片,前述基材包括環烯烴聚合物樹脂、聚苯硫醚樹脂、聚苯乙烯樹脂、氟樹脂及聚醚醚酮樹脂中的至少任何一種。 The conductive film for high-frequency circuit boards according to claim 1, wherein the base material includes at least any one of cycloolefin polymer resin, polyphenylene sulfide resin, polystyrene resin, fluororesin and polyether ether ketone resin. One kind. 如請求項1或2所述的高頻電路板用導電性膜片,前述基材和前述附著層的界面的附著強度為0.5N/mm以上。 The conductive film for high-frequency circuit boards according to claim 1 or 2, wherein the adhesion strength of the interface between the base material and the adhesion layer is 0.5 N/mm or more. 一種高頻電路板,其特徵在於依序地包含:基材;設置於前述基材的至少一面上的附著層;及設置於前述附著層上方的配線;其中,在10GHz的量測頻率下,前述基材的相對電容率為3.3以下;前述附著層具有鎳銅合金,且前述附著層的平均厚度為3nm以上且50nm以下。 A high-frequency circuit board, characterized by sequentially comprising: a base material; an adhesion layer provided on at least one side of the base material; and wiring provided above the adhesion layer; wherein, at a measurement frequency of 10 GHz, The relative permittivity of the base material is 3.3 or less; the adhesion layer includes a nickel-copper alloy, and the average thickness of the adhesion layer is 3 nm or more and 50 nm or less.
TW111116210A 2021-06-30 2022-04-28 Conductive film for high frequency circuit board and high frequency circuit board TWI818527B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-108391 2021-06-30
JP2021108391A JP7057012B1 (en) 2021-06-30 2021-06-30 Conductive film for high frequency circuit boards and high frequency circuit boards

Publications (2)

Publication Number Publication Date
TW202304272A TW202304272A (en) 2023-01-16
TWI818527B true TWI818527B (en) 2023-10-11

Family

ID=81291705

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111116210A TWI818527B (en) 2021-06-30 2022-04-28 Conductive film for high frequency circuit board and high frequency circuit board

Country Status (3)

Country Link
JP (1) JP7057012B1 (en)
TW (1) TWI818527B (en)
WO (1) WO2023276433A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015931A (en) * 1999-07-01 2001-01-19 Ibiden Co Ltd Multilayer printed wiring board and manufacture thereof
WO2014148418A1 (en) * 2013-03-19 2014-09-25 日本ゼオン株式会社 Polymerizable composition, resin molded article, complex, and laminate
TW201843046A (en) * 2017-05-03 2018-12-16 中山台光電子材料有限公司 Resin composition and article made therefrom
JP2021054031A (en) * 2019-10-02 2021-04-08 住友金属鉱山株式会社 Copper-clad laminate and method for producing copper-clad laminate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4850487B2 (en) 2005-11-07 2012-01-11 富士フイルム株式会社 LAMINATE FOR PRINTED WIRING BOARD, PRINTED WIRING BOARD USING THE SAME, METHOD FOR PRODUCING PRINTED WIRING BOARD, ELECTRICAL COMPONENT, ELECTRONIC COMPONENT, AND ELECTRIC DEVICE
JP6322188B2 (en) * 2013-03-26 2018-05-09 株式会社カネカ Conductive film substrate, transparent conductive film and method for producing the same, and touch panel
JP2016199779A (en) * 2015-04-08 2016-12-01 パナソニックIpマネジメント株式会社 Modified metal nanoparticle, manufacturing method therefor, modified metal nano ink and wiring layer formation method
JP7141275B2 (en) * 2018-08-07 2022-09-22 信越ポリマー株式会社 high frequency circuit board

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015931A (en) * 1999-07-01 2001-01-19 Ibiden Co Ltd Multilayer printed wiring board and manufacture thereof
WO2014148418A1 (en) * 2013-03-19 2014-09-25 日本ゼオン株式会社 Polymerizable composition, resin molded article, complex, and laminate
TW201843046A (en) * 2017-05-03 2018-12-16 中山台光電子材料有限公司 Resin composition and article made therefrom
JP2021054031A (en) * 2019-10-02 2021-04-08 住友金属鉱山株式会社 Copper-clad laminate and method for producing copper-clad laminate

Also Published As

Publication number Publication date
JP2023006022A (en) 2023-01-18
WO2023276433A1 (en) 2023-01-05
JP7057012B1 (en) 2022-04-19
TW202304272A (en) 2023-01-16

Similar Documents

Publication Publication Date Title
JP6682516B2 (en) Roughened copper foil and printed wiring board
US20100190029A1 (en) Metal layer laminate having roughened metal surface layer and method for producing the same
JP5129642B2 (en) Surface treated copper foil, copper clad laminate obtained using the surface treated copper foil, and printed wiring board obtained using the copper clad laminate
TWI787174B (en) Metal-clad laminate and manufacturing method thereof
CN107109663B (en) Surface-treated copper foil for forming high-frequency signal transmission circuit, copper-clad laminate, and printed wiring board
WO2013168646A1 (en) Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board
JP6722452B2 (en) Surface-treated copper foil, copper-clad laminate obtained by using the surface-treated copper foil, and printed wiring board
US20120196144A1 (en) Ultra thin copper foil with very low profile copper foil as carrier and its manufacturing method
TWI821355B (en) High frequency circuit substrate
JP2019119935A5 (en)
TWI818527B (en) Conductive film for high frequency circuit board and high frequency circuit board
JP6379055B2 (en) Surface-treated copper foil and laminate
TWI585245B (en) Method for producing single sided thin metal clad laminate
WO2004068918A2 (en) Method for producing thin silver layers
KR20210056965A (en) Fluorine-based substrate with a low dielectric constant
TWI825562B (en) Copper clad laminate film, electronic device including the same, and method of preparing the copper clad laminate film
Abel et al. Novel PCB fabrication process roughness free for high frequency applications
Divya et al. A Novel Additive Technique to Fabricate 24GHz Array Patch Antenna Using LCP Film
WO2022255422A1 (en) Roughened copper foil, copper-clad laminate board, and printed circuit board
JP2006175634A (en) Metal-polyimide substrate
JP7513717B2 (en) Copper foil laminate film, electronic device including same, and method for manufacturing said copper foil laminate film
EP4307846A1 (en) Low-roughness surface-treated copper foil with low bending deformation, copper clad laminate comprising same, and printed wiring board
TWM528251U (en) Flexible metal laminate
TW202117074A (en) Copper-clad laminate and method for producing same
TW202332586A (en) Conductive film for circuit board and manufacturing method thereof