TWI816984B - processing method - Google Patents

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TWI816984B
TWI816984B TW109105440A TW109105440A TWI816984B TW I816984 B TWI816984 B TW I816984B TW 109105440 A TW109105440 A TW 109105440A TW 109105440 A TW109105440 A TW 109105440A TW I816984 B TWI816984 B TW I816984B
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processing
workpiece
holding table
injection nozzle
planned
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TW109105440A
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TW202032653A (en
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包家亘
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/024Cleaning by means of spray elements moving over the surface to be cleaned
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0683Accessories therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)

Abstract

[課題]縮短被加工物的加工時間。[解決手段]一種加工方法,係利用加工裝置對被加工物進行加工,該加工裝置具備:保持該被加工物的保持台、與噴射加工液的噴射噴嘴,該被加工物設定有沿著第一方向的第一加工預定線及沿著第二方向的第二加工預定線,並且,該加工方法具備:第一定位步驟,其使該被加工物的該第一方向對準加工進給方向,且將該噴射噴嘴定位在該第一加工預定線的一端;第一加工步驟,其以加工液沿著該第一加工預定線對該被加工物進行加工;第二定位步驟,其使該保持台旋轉並使該被加工物的該第二方向對準該加工進給方向,且將該噴射噴嘴定位在該第二加工預定線的一端;並且,該第二定位步驟中,以在該保持台旋轉中將該加工液持續噴射至該被加工物之方式,使該保持台及該噴射噴嘴相對地移動。[Issue] Shorten the processing time of the workpiece. [Solution] A processing method that uses a processing device to process a workpiece. The processing device is provided with a holding table for holding the workpiece and an injection nozzle for spraying a machining fluid. The workpiece is set along a first A first planned processing line in one direction and a second planned processing line along a second direction, and the processing method includes: a first positioning step that aligns the first direction of the workpiece with the processing feed direction. , and position the spray nozzle at one end of the first planned processing line; the first processing step is to process the object to be processed along the first planned processing line with machining fluid; the second positioning step is to make the The holding table rotates and aligns the second direction of the workpiece with the processing feed direction, and positions the injection nozzle at one end of the second planned processing line; and, in the second positioning step, in the The method of continuously injecting the machining fluid to the workpiece while the holding table is rotating causes the holding table and the injection nozzle to move relative to each other.

Description

加工方法processing method

本發明係關於藉由噴射經加壓的液體而對被加工物進行加工的加工方法。The present invention relates to a processing method for processing a workpiece by injecting pressurized liquid.

若將以樹脂所組成的密封材料(封膜樹脂)覆蓋配置在基板上的多個元件晶片而成之封裝基板、或形成有多個元件的半導體晶圓等所代表之板狀被加工物依各元件進行分割,則能獲得一個個晶片。被加工物上例如設定有沿著第一方向的第一加工預定線、及沿著與該第一方向交叉的第二方向的第二加工預定線。而且,在形成一個個晶片之際,沿著各加工預定線分割被加工物。If a plate-shaped workpiece is represented by a package substrate in which a plurality of element wafers arranged on the substrate are covered with a sealing material (sealing resin) composed of resin, or a semiconductor wafer in which a plurality of elements are formed, the processing Each component is divided into individual wafers. For example, the workpiece is provided with a first planned processing line along a first direction and a second planned processing line along a second direction intersecting the first direction. Furthermore, when forming individual wafers, the workpiece is divided along each planned processing line.

並且,有沿著各加工預定線對被加工物進行加工,而在被加工物的表面形成預定深度的槽(被稱為半切斷槽)之情形。在被加工物的分割及加工中,例如使用具備圓環狀切割刀片的切割裝置。Furthermore, the workpiece may be processed along each planned processing line, and a groove (called a half-cut groove) of a predetermined depth may be formed on the surface of the workpiece. For dividing and processing the workpiece, for example, a cutting device equipped with an annular cutting blade is used.

若使該切割刀片旋轉,且使該切割刀片沿著該被加工物的各加工預定線從表面切入至預定深度為止,則可形成該槽。其後,在對被加工物實施鍍膜等加工後,若以該切割刀片進一步切割該槽的底面而分割被加工物,則可形成一個個晶片。The groove can be formed by rotating the cutting blade and cutting the cutting blade from the surface to a predetermined depth along each planned processing line of the workpiece. Thereafter, after the workpiece is subjected to processing such as coating, the bottom surface of the groove is further cut with the dicing blade to divide the workpiece, thereby forming individual wafers.

此外,被加工物有其外周部黏貼在黏著膠膜,黏著膠膜黏貼在環狀框架之情形。被加工物、黏著膠膜及環狀框架的一體物,例如被稱為框架單元。若被加工物成為框架單元的狀態,則被加工物的搬送變得容易,並且,能以黏著膠膜支撐分割被加工物所形成的晶片。In addition, the outer peripheral part of the workpiece may be adhered to the adhesive film, and the adhesive film may be adhered to the annular frame. The integrated body of the workpiece, the adhesive film and the annular frame is called a frame unit, for example. If the workpiece is in a frame unit state, the workpiece can be transported easily, and the wafer formed by dividing the workpiece can be supported by an adhesive film.

若加工預定線中存在具有高延展性的金屬等構件,則在藉由切割刀片切割被加工物而形成槽時,該構件與切割刀片接觸而被延展,有時會從所形成的槽產生被稱為毛邊的鬍鬚狀突起物。若毛邊殘留在後續分割被加工物而得的晶片中,則會有透過毛邊而產生短路、或在將晶片組裝在預定組裝對象之際毛邊從晶片落下等而產生組裝不良之情形。If a highly ductile metal or other member is present in the line to be processed, when the workpiece is cut with a cutting blade to form a groove, the member is stretched by contact with the cutting blade, and a groove may be formed from the formed groove. Whisker-like projections called burrs. If the burrs remain in the wafers that are subsequently divided into parts to be processed, a short circuit may occur through the burrs, or the burrs may fall from the wafer when the wafer is assembled to the intended assembly target, resulting in assembly defects.

於是,為了去除毛邊,已有人開發一種加工裝置,其可沿著藉由切割而在表面形成槽的被加工物的該槽,噴射經加壓的水等加工液(例如,參照專利文獻1)。該加工裝置被稱為噴水加工裝置。此加工裝置係進行以下加工:將加工液進行加壓並朝向被加工物的該槽進行噴射,藉此從該被加工物去除毛邊等。Therefore, in order to remove burrs, a processing device has been developed that can spray a machining fluid such as pressurized water along the grooves of a workpiece formed on the surface by cutting (see, for example, Patent Document 1) . This processing device is called a water jet processing device. This processing device performs processing by pressurizing the machining fluid and spraying it toward the groove of the workpiece, thereby removing burrs and the like from the workpiece.

該加工裝置具備:上表面成為保持面的保持台、與對被保持在該保持台的被加工物噴射加工液的噴射噴嘴。該加工裝置能將保持台及噴射噴嘴沿著加工進給方向、及與該加工進給方向正交的分度進給方向相對地移動。This processing device includes a holding base whose upper surface serves as a holding surface, and an injection nozzle that injects a machining fluid onto a workpiece held on the holding base. This processing device can relatively move the holding table and the injection nozzle along the processing feed direction and the indexing feed direction orthogonal to the processing feed direction.

在去除被加工物的毛邊之際,將被切割而生成毛邊的被加工物搬至保持台的保持面上,並使該保持台保持被加工物。然後,使保持台繞著與該保持面垂直的軸旋轉,使被加工物的該第一方向對準該加工裝置的加工進給方向。When removing burrs from a workpiece, the workpiece cut to produce burrs is moved to a holding surface of a holding table, and the holding table holds the workpiece. Then, the holding platform is rotated around an axis perpendicular to the holding surface, so that the first direction of the object to be processed is aligned with the processing feed direction of the processing device.

而且,若一邊使噴射噴嘴噴射加工液一邊使保持台與噴射噴嘴沿著加工進給方向相對地移動,則會沿著第一加工預定線對被加工物進行加工。之後,沿著分度進給方向使保持台及噴射噴嘴相對地移動後,若再次使保持台及噴射噴嘴沿著加工進給方向相對地移動,則會沿著另一條第一加工預定線對被加工物進行加工。Furthermore, if the holding table and the injection nozzle are relatively moved in the processing feed direction while the injection nozzle injects the machining fluid, the workpiece will be processed along the first planned processing line. After that, after the holding table and the injection nozzle are relatively moved along the indexing feed direction, if the holding table and the injection nozzle are relatively moved along the processing feed direction again, the pair will be moved along another first planned processing line. The workpiece is processed.

在沿著全部的第一加工預定線對被加工物進行加工後,使該保持台旋轉而使被加工物的第二加工預定線對準該加工裝置的加工進給方向。然後,若使保持台及噴射噴嘴在加工進給方向相對地移動,則會沿著第二加工預定線對被加工物進行加工。 [習知技術文獻] [專利文獻]After the workpiece is processed along all the first planned processing lines, the holding table is rotated so that the second planned processing line of the workpiece is aligned with the processing feed direction of the processing device. Then, when the holding table and the injection nozzle are relatively moved in the processing feed direction, the workpiece is processed along the second planned processing line. [Known technical documents] [Patent Document]

[專利文獻1]日本特開2018-186133號公報[Patent Document 1] Japanese Patent Application Publication No. 2018-186133

[發明所欲解決的課題] 在被加工物黏貼在黏著膠膜,黏著膠膜黏貼在環狀框架之情形,若加工液被噴射至黏著膠膜則黏著膠膜會破裂。並且,若加工液被噴射至保持台的保持面,則會有保持台損壞之情形。因此,沿著第一加工預定線對被加工物進行加工後,在沿著第二加工預定線對被加工物進行加工前使保持台旋轉之際,以加工液不會非預期地被噴射至被加工物以外的物體之方式,使噴射噴嘴停止噴射加工液。[Problem to be solved by the invention] When the workpiece is adhered to the adhesive film and the adhesive film is adhered to the annular frame, if the processing fluid is sprayed onto the adhesive film, the adhesive film will rupture. Furthermore, if the machining fluid is sprayed onto the holding surface of the holding table, the holding table may be damaged. Therefore, when the workpiece is processed along the first planned processing line and the holding table is rotated before the workpiece is processed along the second planned processing line, the machining fluid will not be sprayed unexpectedly. objects other than the workpiece, causing the injection nozzle to stop injecting the machining fluid.

但是,使保持台結束旋轉後,在再次開始從噴射噴嘴噴出加工液時,在成為以預定噴射條件再度穩定地從噴射噴嘴噴出加工液的狀態前,被加工物的加工需要進行待機。因此,為了減少被加工物的加工時間,期望縮短未實施被加工物的加工之待機時間。However, when the machining fluid is ejected from the injection nozzle again after the rotation of the holding table is completed, the processing of the workpiece needs to wait until the machining fluid is stably ejected from the injection nozzle again under predetermined injection conditions. Therefore, in order to reduce the processing time of the workpiece, it is desirable to shorten the standby time in which the workpiece is not processed.

本發明係有鑑於此問題而完成者,課題在於提供一種加工方法,其防止黏著膠膜及保持台等的損傷且可縮短被加工物的加工時間。The present invention was completed in view of this problem, and its object is to provide a processing method that can prevent damage to the adhesive film, the holding table, etc. and shorten the processing time of the workpiece.

[解決課題的技術手段] 根據本發明的一態樣,提供一種加工方法,係利用加工裝置對被加工物進行加工,該加工裝置具備:保持台,其具有保持該被加工物的保持面;噴射噴嘴,其對由該保持台所保持的該被加工物噴射加工液;加工進給單元,其使該保持台及該噴射噴嘴沿著加工進給方向相對地移動;以及旋轉單元,其使該保持台繞沿著與該保持面垂直的方向的軸旋轉,並且,該被加工物的表面設定有沿著第一方向的第一加工預定線及沿著與該第一方向交叉的第二方向的第二加工預定線,該加工方法的特徵在於,具備:保持步驟,其以該保持台保持該被加工物;第一定位步驟,其在實施該保持步驟後,以該旋轉單元使該保持台旋轉,使該被加工物的該第一方向對準該加工進給方向,且將該噴射噴嘴定位在該第一加工預定線的一端;第一加工步驟,其在實施該第一定位步驟後,開始從該噴射噴嘴噴射加工液,其後,使該保持台及該噴射噴嘴沿著該加工進給方向相對地移動,藉此以該加工液沿著該第一加工預定線對該被加工物進行加工;第二定位步驟,其在實施該第一加工步驟後,以該旋轉單元使該保持台旋轉,使該被加工物的該第二方向對準該加工進給方向,且將該噴射噴嘴定位在該第二加工預定線的一端;第二加工步驟,其在實施該第二定位步驟後,使該保持台及該噴射噴嘴沿著該加工進給方向相對地移動,以從該噴射噴嘴所噴射的該加工液沿著該第二加工預定線對該被加工物進行加工,並且,該第二定位步驟中,以在該保持台旋轉中將該加工液持續噴射至該被加工物之方式,使該保持台及該噴射噴嘴相對地移動。[Technical means to solve the problem] According to one aspect of the present invention, there is provided a processing method that uses a processing device to process a workpiece. The processing device is provided with: a holding table having a holding surface for holding the workpiece; and a spray nozzle that controls the workpiece. The workpiece held by the holding table is sprayed with machining fluid; a processing feed unit that relatively moves the holding table and the injection nozzle along the processing feed direction; and a rotation unit that makes the holding table rotate along the direction of the processing feed. An axis in a direction perpendicular to the holding surface rotates, and the surface of the workpiece is provided with a first planned machining line along a first direction and a second planned machining line along a second direction intersecting the first direction, The processing method is characterized in that it includes: a holding step of holding the workpiece with the holding table; and a first positioning step of rotating the holding table with the rotation unit to cause the workpiece to be processed after performing the holding step. The first direction of the object is aligned with the processing feed direction, and the injection nozzle is positioned at one end of the first planned processing line; the first processing step is to start from the injection nozzle after implementing the first positioning step. Spray the machining fluid, and then relatively move the holding table and the spray nozzle along the machining feed direction, thereby processing the workpiece along the first planned processing line with the machining fluid; second The positioning step includes, after performing the first processing step, using the rotation unit to rotate the holding table, aligning the second direction of the workpiece with the processing feed direction, and positioning the injection nozzle at the third One end of the second planned processing line; a second processing step, which after implementing the second positioning step, causes the holding table and the injection nozzle to move relatively along the processing feed direction to prevent the injection nozzle from the injection nozzle. The machining fluid processes the workpiece along the second planned processing line, and in the second positioning step, the machining fluid is continuously sprayed to the workpiece while the holding table rotates, so that the machining fluid is continuously sprayed to the workpiece. The holding table and the spray nozzle move relatively.

較佳為,在該被加工物的該表面設定多條該第一加工預定線及多條該第二加工預定線,該被加工物在該表面具有元件區域與圍繞該元件區域的外周剩餘區域,該元件區域在由該第一加工預定線與該第二加工預定線所劃分之各區域分別配設有元件,該第二定位步驟中,在該保持台旋轉中將該加工液持續噴射至該被加工物的該外周剩餘區域。Preferably, a plurality of the first planned processing lines and a plurality of the second planned processing lines are set on the surface of the workpiece, and the workpiece has a component area and a peripheral remaining area surrounding the component area on the surface. , the component area is equipped with components in each area divided by the first planned processing line and the second planned processing line. In the second positioning step, the machining fluid is continuously sprayed to the holding table while the holding table is rotating. The remaining peripheral area of the workpiece.

並且,較佳為,在該被加工物的該表面形成有沿著該第一加工預定線的第一槽、與沿著該第二加工預定線的第二槽,該第二定位步驟中,在該保持台旋轉中將該加工液持續噴射至該被加工物的該第一槽或該第二槽之任一者。Furthermore, preferably, a first groove along the first planned processing line and a second groove along the second planned processing line are formed on the surface of the workpiece, and in the second positioning step, While the holding table is rotating, the machining fluid is continuously sprayed to either the first groove or the second groove of the workpiece.

[發明功效] 本發明的一態樣之加工方法中,在第二定位步驟中使保持台旋轉之際,以將加工液持續噴射至被加工物之方式,使保持台及噴射噴嘴相對地移動。此情形,即使在使保持台旋轉之際不使噴射噴嘴停止噴射加工液,加工液亦不會被直接噴射至被加工物以外的物體。亦即,在使保持台旋轉之際不需要使噴射噴嘴停止噴射加工液。[Invention effect] In a machining method according to one aspect of the present invention, when the holding table is rotated in the second positioning step, the holding table and the injection nozzle are relatively moved such that the machining fluid is continuously sprayed onto the workpiece. In this case, even if the injection nozzle is not stopped to inject the machining fluid when the holding table is rotated, the machining fluid will not be directly ejected to an object other than the workpiece. That is, it is not necessary to stop the injection nozzle from injecting the machining fluid when rotating the holding table.

只要不使加工液停止噴射,則噴射噴嘴會以預定噴射條件穩定地持續噴射加工液,因此在實施第二定位步驟後,第二加工步驟的實施不需要進行待機。因此,可縮短被加工物的加工時間。As long as the injection of the machining fluid is not stopped, the injection nozzle will stably continue to inject the machining fluid under the predetermined injection conditions. Therefore, after the second positioning step is performed, there is no need to wait for the second processing step to be performed. Therefore, the processing time of the workpiece can be shortened.

因此,根據本發明可提供一種加工方法,其防止黏著膠膜及保持台等的損傷且可縮短被加工物的加工時間。Therefore, according to the present invention, it is possible to provide a processing method that prevents damage to the adhesive film, the holding table, etc. and shortens the processing time of the workpiece.

以下,參照附圖並說明本實施方式。圖1係表示實施本實施方式的加工方法之際所使用的加工裝置2之立體圖。加工裝置2可藉由切割刀片切割被加工物,且可將經加壓的液體(以下稱為加工液)噴射至被加工物而對被加工物進行加工。Hereinafter, this embodiment will be described with reference to the drawings. FIG. 1 is a perspective view showing the processing device 2 used when implementing the processing method of this embodiment. The processing device 2 can cut the object to be processed by using a cutting blade, and can process the object by injecting pressurized liquid (hereinafter referred to as processing fluid) onto the object to be processed.

加工裝置2具備支撐各構成要素的基台4,該各構成要素構成該加工裝置2。在基台4前方的角部形成有開口4a,在此開口4a內設置有藉由升降機構(未圖示)進行升降的卡匣支撐台6。卡匣支撐台6的上表面配備有容納多個被加工物1的卡匣8。此外,圖1中為了方便說明而僅顯示卡匣8的輪廓。The processing device 2 includes a base 4 that supports each component that constitutes the processing device 2 . An opening 4a is formed in the front corner of the base 4, and a cassette support 6 that is raised and lowered by a lifting mechanism (not shown) is provided in the opening 4a. A cassette 8 for accommodating a plurality of workpieces 1 is provided on the upper surface of the cassette support base 6 . In addition, only the outline of the cassette 8 is shown in FIG. 1 for convenience of explanation.

被加工物1係以被環狀框架9支撐的狀態被容納在卡匣8內。在環狀框架9上,以阻塞該環狀框架9的開口之方式黏貼有黏著膠膜7,被加工物1係在該環狀框架9的該開口中被該黏著膠膜7黏貼。圖1中顯示被加工物1、黏著膠膜7及環狀框架9經一體化的框架單元11之立體圖。The workpiece 1 is accommodated in the cassette 8 in a state supported by the annular frame 9 . An adhesive film 7 is adhered to the annular frame 9 so as to block the opening of the annular frame 9 , and the workpiece 1 is adhered to the opening of the annular frame 9 by the adhesive film 7 . Figure 1 shows a perspective view of a frame unit 11 in which the workpiece 1, the adhesive film 7 and the annular frame 9 are integrated.

但是,在加工裝置2中被加工的被加工物1不受限於為框架單元11的狀態之情形。本實施方式的加工方法中,亦可僅將被加工物1搬入加工裝置2並進行加工。以下,舉例說明被加工物1以框架單元11的狀態在加工裝置2中被加工之情形。However, the workpiece 1 processed by the processing device 2 is not limited to the state of the frame unit 11 . In the processing method of this embodiment, only the object 1 to be processed may be carried into the processing device 2 and processed. Hereinafter, a case where the workpiece 1 is processed by the processing device 2 in the state of the frame unit 11 will be described as an example.

被加工物1係具備形成為矩形狀的板狀基板1a(參照圖2(A))與配置在基板1a的多個元件5(參照圖2(B)等)之封裝基板。基板1a上形成有密封多個元件5的樹脂層(封膜樹脂)1b。但是,被加工物1不受限於為封裝基板之情形,例如,被加工物1亦可為在表面形成有IC(Integrated Circuit,積體電路)等元件的晶圓等。The workpiece 1 is a package substrate including a plate-shaped substrate 1 a formed in a rectangular shape (see FIG. 2(A) ) and a plurality of elements 5 (see FIG. 2(B) and the like) arranged on the substrate 1 a. A resin layer (sealing resin) 1 b for sealing the plurality of elements 5 is formed on the substrate 1 a. However, the object 1 is not limited to a package substrate. For example, the object 1 may also be a wafer with components such as IC (Integrated Circuit) formed on the surface.

在被加工物1的樹脂層1b側黏貼有圓形的黏著膠膜7,其直徑可覆蓋基板1a整體。藉由將被加工物1的樹脂層1b黏貼至黏著膠膜7的中央部,被加工物1係以基板1a在上方露出的狀態被環狀框架9支撐。但是,亦可以被加工物1的樹脂層1b側在上方露出之方式將基板1a黏貼至黏著膠膜7。A circular adhesive film 7 is adhered to the resin layer 1b side of the object 1, and its diameter can cover the entire substrate 1a. By adhering the resin layer 1 b of the workpiece 1 to the center of the adhesive film 7 , the workpiece 1 is supported by the annular frame 9 with the substrate 1 a exposed upward. However, the substrate 1a may be bonded to the adhesive film 7 so that the resin layer 1b side of the workpiece 1 is exposed above.

圖2(B)中包含示意地放大表示被加工物1上方所露出的基板1a側之俯視圖。被加工物1在表面設定有沿著第一方向1c的第一加工預定線3a及沿著與該第一方向1c交叉的第二方向1d的第二加工預定線3b。圖2(B)等中表示第一方向1c與第二方向1d正交之情形,但被加工物1不受限於此。亦即,第一方向1c與第二方向1d亦可不互相正交。FIG. 2(B) includes a schematic enlarged plan view showing the substrate 1 a side exposed above the workpiece 1 . The workpiece 1 is provided with a first planned processing line 3a along the first direction 1c and a second planned processing line 3b along the second direction 1d intersecting the first direction 1c on its surface. FIG. 2(B) and the like show a case where the first direction 1c and the second direction 1d are orthogonal to each other, but the workpiece 1 is not limited to this. That is, the first direction 1c and the second direction 1d may not be orthogonal to each other.

如同圖2(B)等所示,在被加工物1的表面可設定有多條第一加工預定線3a及多條第二加工預定線3b。在被加工物1的由該第一加工預定線3a與該第二加工預定線3b所劃分的各區域中,分別配置有元件5。而且,若將被加工物1沿著該第一加工預定線3a與該第二加工預定線3b進行分割並單體化,則能獲得分別包含元件晶片的多個封裝元件。As shown in FIG. 2(B) and others, a plurality of first planned processing lines 3 a and a plurality of second planned processing lines 3 b can be set on the surface of the workpiece 1 . Components 5 are arranged in respective regions of the workpiece 1 divided by the first planned processing line 3 a and the second planned processing line 3 b. Furthermore, if the workpiece 1 is divided and singulated along the first planned processing line 3a and the second planned processing line 3b, a plurality of packaged components each including a component chip can be obtained.

被加工物1的表面中配設有多個元件5的區域被稱為元件區域5b,圍繞該元件區域5b的該元件區域5b以外的區域被稱為外周剩餘區域5c。在被加工物1的外周剩餘區域5c中並未形成有元件5。A region on the surface of the workpiece 1 in which a plurality of elements 5 are arranged is called an element region 5b, and a region surrounding the element region 5b other than the element region 5b is called an outer peripheral remaining region 5c. The element 5 is not formed in the outer peripheral remaining area 5 c of the workpiece 1 .

在樹脂層1b的內部配置有與被樹脂層1b覆蓋的元件晶片連接的金屬(配線)。而且,在被加工物1的上表面側(基板1a側),樹脂層1b以俯視呈圍繞元件5之方式露出,且該金屬沿著第一加工預定線3a及第二加工預定線3b從該樹脂層1b露出。而且,若沿著第一加工預定線3a及第二加工預定線3b在被加工物1形成被稱為半切斷槽的槽,則該金屬亦會在該槽的側壁露出。Metal (wiring) connected to the element chip covered by the resin layer 1 b is arranged inside the resin layer 1 b. Furthermore, on the upper surface side (substrate 1 a side) of the workpiece 1 , the resin layer 1 b is exposed so as to surround the element 5 in a plan view, and the metal is exposed from the first planned processing line 3 a and the second planned processing line 3 b. The resin layer 1b is exposed. Furthermore, if a groove called a half-cut groove is formed in the workpiece 1 along the first planned processing line 3a and the second planned processing line 3b, the metal will also be exposed on the side wall of the groove.

圖3係示意地放大表示沿著第一加工預定線3a形成有第一槽13a的被加工物1的上表面側之俯視圖。被加工物1的上表面側及第一槽13a的側壁所露出之該金屬,在被加工物1被分割成多個封裝元件且一個個封裝元件被組裝在預定組裝對象之際,發揮作為與形成於該組裝對象的端子連接之連接用的電極5a的功能。FIG. 3 is a schematic enlarged plan view of the upper surface side of the workpiece 1 in which the first groove 13 a is formed along the first planned processing line 3 a. The metal exposed on the upper surface side of the workpiece 1 and the side wall of the first groove 13a plays a role when the workpiece 1 is divided into a plurality of package components and each package component is assembled on the intended assembly target. The function of the connection electrode 5a formed in the terminal connection of this assembly object.

圖1所示之加工裝置2中,在基台4的上表面的卡匣支撐台6的側方,以長邊方向沿著X軸方向(加工進給方向)之方式形成有矩形的開口4b。在開口4b內配置有滾珠螺桿式的X軸移動機構10、與覆蓋X軸移動機構10上部的工作台蓋體12及防塵防滴蓋體14。X軸移動機構10具備被工作台蓋體12覆蓋的X軸移動台(未圖示),並使此X軸移動台在X軸方向移動。In the processing device 2 shown in FIG. 1 , a rectangular opening 4 b is formed on the side of the cassette support 6 on the upper surface of the base 4 so that the long side direction is along the X-axis direction (processing feed direction). . A ball screw type X-axis moving mechanism 10, a table cover 12 and a dust-proof and drip-proof cover 14 covering the upper part of the X-axis moving mechanism 10 are arranged in the opening 4b. The X-axis moving mechanism 10 includes an X-axis moving table (not shown) covered by the table cover 12 and moves the X-axis moving table in the X-axis direction.

在接近卡匣支撐台6側方的位置,設置有用於暫置被加工物1的暫置機構16。暫置機構16例如包含一邊維持與Y軸方向(分度進給方向)平行的狀態一邊接近、分離的一對導軌16a、16b。一對導軌16a、16b係在X軸方向夾住從卡匣8抽出的被加工物1而使其對準預定位置。A temporary placement mechanism 16 for temporarily placing the workpiece 1 is provided at a position close to the side of the cassette support 6 . The temporary setting mechanism 16 includes, for example, a pair of guide rails 16 a and 16 b that approach and separate while maintaining a state parallel to the Y-axis direction (indexing feed direction). The pair of guide rails 16a and 16b clamps the workpiece 1 extracted from the cassette 8 in the X-axis direction and aligns the workpiece 1 with a predetermined position.

在X軸移動台的上表面,以從工作台蓋體12露出之方式設置有吸引保持被加工物1的保持台18。保持台18的上表面成為吸引保持被加工物1的保持面18a。保持面18a形成為相對於X軸方向及Y軸方向呈大致平行,並透過設置在保持台18內部的吸引路徑(未圖示)等而與噴射器等吸引源(未圖示)連接。On the upper surface of the X-axis moving table, a holding table 18 for sucking and holding the workpiece 1 is provided so as to be exposed from the table cover 12 . The upper surface of the holding base 18 serves as a holding surface 18 a that attracts and holds the workpiece 1 . The holding surface 18 a is formed substantially parallel to the X-axis direction and the Y-axis direction, and is connected to a suction source (not shown) such as an injector through a suction path (not shown) provided inside the holding base 18 .

在保持台18的周圍設置有4個夾具20,該4個夾具20用於從四方固定支撐被加工物1的環狀框架9。並且,在與開口4b相鄰的區域配置有將被加工物1往保持台18等搬送的搬送單元(未圖示)。Four clamps 20 are provided around the holding table 18 for fixing the annular frame 9 that supports the workpiece 1 from four directions. Furthermore, a transport unit (not shown) that transports the workpiece 1 to the holding table 18 and the like is arranged in an area adjacent to the opening 4 b.

保持台18與馬達等旋轉單元(未圖示)連結。該旋轉單元係使保持台18繞著大致平行於與保持面18a垂直的Z軸方向的軸旋轉。並且,保持台18係藉由X軸移動機構10而與X軸移動台及工作台蓋體12一起在X軸方向移動。The holding base 18 is connected to a rotation unit (not shown) such as a motor. This rotation unit rotates the holding table 18 about an axis substantially parallel to the Z-axis direction perpendicular to the holding surface 18a. Furthermore, the holding table 18 moves in the X-axis direction together with the X-axis moving table and the table cover 12 by the X-axis moving mechanism 10 .

在保持台18的上方設置有藉由環狀切割刀片切割被加工物1的切割單元22、與將經加壓的液體(加工液)噴射至被加工物1的噴射單元24。並且,在基台4的上表面以跨越開口4b之方式配置有門型的支撐構造26,該門型的支撐構造26用於支撐切割單元22及噴射單元24。A cutting unit 22 that cuts the workpiece 1 with an annular cutting blade and an injection unit 24 that injects pressurized liquid (machining fluid) onto the workpiece 1 are provided above the holding table 18 . Furthermore, a door-shaped support structure 26 for supporting the cutting unit 22 and the spray unit 24 is arranged on the upper surface of the base 4 so as to span the opening 4 b.

在支撐構造26的前面上部設置有使切割單元22在Y軸方向及Z軸方向移動的移動單元28a、與使噴射單元24在Y軸方向及Z軸方向移動的移動單元28b。A moving unit 28 a that moves the cutting unit 22 in the Y-axis direction and the Z-axis direction, and a moving unit 28 b that moves the spray unit 24 in the Y-axis direction and the Z-axis direction are provided on the upper front surface of the support structure 26 .

移動單元28a具備Y軸移動板32a,移動單元28b具備Y軸移動板32b。Y軸移動板32a及Y軸移動板32b可滑動地安裝在一對Y軸導軌30,該一對Y軸導軌30沿著Y軸方向配置在支撐構造26的前面。The moving unit 28a is equipped with the Y-axis moving plate 32a, and the moving unit 28b is equipped with the Y-axis moving plate 32b. The Y-axis moving plate 32a and the Y-axis moving plate 32b are slidably mounted on a pair of Y-axis guide rails 30 arranged in front of the support structure 26 along the Y-axis direction.

Y軸移動板32a的背面側(後面側)設置有螺帽部(未圖示),此螺帽部與Y軸滾珠螺桿34a螺合,該Y軸滾珠螺桿34a相對於Y軸導軌30呈大致平行。並且,Y軸移動板32b的背面側(後面側)設置有螺帽部(未圖示),此螺帽部與Y軸滾珠螺桿34b螺合,該Y軸滾珠螺桿34b相對於Y軸導軌30呈大致平行。A nut portion (not shown) is provided on the back side (rear side) of the Y-axis moving plate 32a. This nut portion is threadedly engaged with the Y-axis ball screw 34a. The Y-axis ball screw 34a is approximately angled relative to the Y-axis guide rail 30. parallel. Furthermore, a nut portion (not shown) is provided on the back side (rear side) of the Y-axis moving plate 32b, and this nut portion is threadedly engaged with the Y-axis ball screw 34b. The Y-axis ball screw 34b is positioned relative to the Y-axis guide rail 30 Approximately parallel.

在Y軸滾珠螺桿34a、34b的一端部分別連結Y軸脈衝馬達36。藉由與Y軸滾珠螺桿34a連結的Y軸脈衝馬達36,使Y軸滾珠螺桿34a旋轉,藉此Y軸移動板32a沿著Y軸導軌30在Y軸方向移動。並且,藉由與Y軸滾珠螺桿34b連結的Y軸脈衝馬達,使Y軸滾珠螺桿34b旋轉,藉此Y軸移動板32b沿著Y軸導軌30在Y軸方向移動。A Y-axis pulse motor 36 is connected to one end portion of the Y-axis ball screws 34a and 34b respectively. The Y-axis ball screw 34a is rotated by the Y-axis pulse motor 36 connected to the Y-axis ball screw 34a, whereby the Y-axis moving plate 32a moves in the Y-axis direction along the Y-axis guide rail 30. Furthermore, the Y-axis ball screw 34b is rotated by the Y-axis pulse motor connected to the Y-axis ball screw 34b, whereby the Y-axis moving plate 32b moves in the Y-axis direction along the Y-axis guide rail 30.

在Y軸移動板32a的正面(前面)側,沿著Z軸方向設置有一對Z軸導軌38a,在Y軸移動板32b的正面(前面)側,沿著Z軸方向設置有一對Z軸導軌38b。並且,在一對Z軸導軌38a上能滑動地安裝Z軸移動板40a,在一對Z軸導軌38b上能滑動地安裝Z軸移動板40b。A pair of Z-axis guide rails 38a are provided along the Z-axis direction on the front (front) side of the Y-axis moving plate 32a, and a pair of Z-axis guide rails are provided along the Z-axis direction on the front (front) side of the Y-axis moving plate 32b. 38b. Furthermore, the Z-axis moving plate 40a is slidably attached to the pair of Z-axis guide rails 38a, and the Z-axis moving plate 40b is slidably attached to the pair of Z-axis guide rails 38b.

Z軸移動板40a的背面側(後面側)設置有螺帽部(未圖示),此螺帽部與Z軸滾珠螺桿42a螺合,該Z軸滾珠螺桿42a係以沿著相對於Z軸導軌38a呈大致平行的方向之方式設置。Z軸滾珠螺桿42a的一端部與Z軸脈衝馬達44a連結,藉由此Z軸脈衝馬達44a使Z軸滾珠螺桿42a旋轉,藉此Z軸移動板40a沿著Z軸導軌38a在Z軸方向移動。A nut portion (not shown) is provided on the back side (rear side) of the Z-axis moving plate 40a. This nut portion is threadedly engaged with the Z-axis ball screw 42a. The Z-axis ball screw 42a is arranged along the axis relative to the Z-axis. The guide rails 38a are provided in substantially parallel directions. One end of the Z-axis ball screw 42a is connected to the Z-axis pulse motor 44a. The Z-axis pulse motor 44a rotates the Z-axis ball screw 42a, whereby the Z-axis moving plate 40a moves in the Z-axis direction along the Z-axis guide rail 38a. .

Z軸移動板40b的背面側(後面側)設置有螺帽部(未圖示),此螺帽部與Z軸滾珠螺桿42b螺合,該Z軸滾珠螺桿42b係以沿著相對於Z軸導軌38b呈大致平行的方向之方式設置。Z軸滾珠螺桿42b的一端部與Z軸脈衝馬達44b連結,藉由此Z軸脈衝馬達44b使Z軸滾珠螺桿42b旋轉,藉此Z軸移動板40b沿著Z軸導軌38b在Z軸方向移動。A nut portion (not shown) is provided on the back side (rear side) of the Z-axis moving plate 40b. This nut portion is threadedly engaged with the Z-axis ball screw 42b. The Z-axis ball screw 42b is arranged along the axis relative to the Z-axis. The guide rails 38b are provided in substantially parallel directions. One end of the Z-axis ball screw 42b is connected to the Z-axis pulse motor 44b. The Z-axis pulse motor 44b rotates the Z-axis ball screw 42b, so that the Z-axis moving plate 40b moves in the Z-axis direction along the Z-axis guide rail 38b. .

Z軸移動板40a的下部設置有切割單元22。在與切割單元22相鄰的位置設置有攝像單元(攝影機)46a,其用於拍攝被保持台18吸引保持的被加工物1等。並且,Z軸移動板40b的下部設置有噴射單元24。在與噴射單元24相鄰的位置設置有攝像單元(攝影機)46b,其用於拍攝被保持台18吸引保持的被加工物1等。A cutting unit 22 is provided at the lower part of the Z-axis moving plate 40a. An imaging unit (camera) 46 a is provided adjacent to the cutting unit 22 for photographing the workpiece 1 and the like attracted and held by the holding table 18 . Furthermore, the injection unit 24 is provided at the lower part of the Z-axis moving plate 40b. An imaging unit (camera) 46 b is provided adjacent to the injection unit 24 for photographing the workpiece 1 and the like sucked and held by the holding table 18 .

藉由移動單元28a控制切割單元22及攝像單元46a的Y軸方向及Z軸方向的位置,藉由移動單元28b控制噴射單元24及攝像單元46b的Y軸方向及Z軸方向的位置。亦即,分別獨立地控制切割單元22的位置與噴射單元24的位置。The moving unit 28a controls the Y-axis and Z-axis positions of the cutting unit 22 and the imaging unit 46a, and the Y-axis and Z-axis positions of the injection unit 24 and the imaging unit 46b are controlled by the moving unit 28b. That is, the position of the cutting unit 22 and the position of the injection unit 24 are controlled independently.

在相對於開口4b與開口4a相反側的位置形成有開口4c。開口4c內配置有用於清洗被加工物1的清洗單元48,在保持台18上已施以預定加工的被加工物1係藉由清洗單元48而被清洗。An opening 4c is formed at a position opposite to the opening 4a with respect to the opening 4b. A cleaning unit 48 for cleaning the workpiece 1 is disposed in the opening 4c. The workpiece 1 that has been subjected to predetermined processing on the holding table 18 is cleaned by the cleaning unit 48.

使安裝在切割單元22的環狀切割刀片(未圖示)旋轉並切入被加工物1,藉此可進行被加工物1的切割加工。切割單元22具備主軸,其軸心位在相對於保持台18的保持面18a呈大致平行的方向,此主軸的前端部安裝有環狀的切割刀片。切割刀片例如係藉由以鍍鎳固定金剛石磨粒而成的電鑄磨石所構成。The annular cutting blade (not shown) mounted on the cutting unit 22 is rotated and cut into the workpiece 1 , whereby the workpiece 1 can be cut. The cutting unit 22 is provided with a main shaft, the axis of which is substantially parallel to the holding surface 18 a of the holding table 18 , and an annular cutting blade is installed at the front end of the main shaft. The cutting blade is composed of, for example, an electroformed grindstone with nickel-plated fixed diamond abrasive grains.

主軸係與馬達等旋轉驅動源連結,安裝在主軸的切割刀片係藉由從該旋轉驅動源傳出的力而旋轉。使切割刀片旋轉並切入被保持在保持台18的被加工物1,使保持台18及切割刀片沿著X軸方向(加工進給方向)相對地移動,藉此切割被加工物1。The spindle is connected to a rotational drive source such as a motor, and the cutting blade mounted on the spindle is rotated by force transmitted from the rotational drive source. The cutting blade is rotated to cut into the workpiece 1 held on the holding table 18 , and the holding table 18 and the cutting blade are relatively moved in the X-axis direction (processing feed direction) to cut the workpiece 1 .

並且,從噴射單元24朝向被加工物1噴射經加壓的水等液體(加工液),藉此可實施以下加工:去除被加工物1的一部分、去除形成在被加工物1的金屬毛邊等。此外,關於使用噴射單元24之毛邊的去除,將於後述。Furthermore, by injecting pressurized liquid such as water (machining fluid) from the injection unit 24 toward the workpiece 1 , the following processing can be performed: removing a part of the workpiece 1 , removing metal burrs formed on the workpiece 1 , etc. . In addition, the removal of burrs using the spray unit 24 will be described later.

噴射單元24中安裝有噴射噴嘴24c,其將加工液噴射至被保持在保持台18的被加工物1。噴射噴嘴24c係透過供給路徑24d而與加工液的供給源24a連接。在將被加工物1進行加工之際,打開設置在供給路徑24d的切換閥24b,從供給源24a將加工液供給至噴射噴嘴24c,從該噴射噴嘴24c的噴射口朝向被加工物1噴射該加工液。The injection unit 24 is equipped with an injection nozzle 24 c that injects the machining fluid to the workpiece 1 held on the holding table 18 . The injection nozzle 24c is connected to the supply source 24a of the machining fluid through the supply path 24d. When the workpiece 1 is processed, the switching valve 24b provided in the supply path 24d is opened, the machining fluid is supplied from the supply source 24a to the injection nozzle 24c, and the processing fluid is sprayed toward the workpiece 1 from the injection port of the injection nozzle 24c. machining fluid.

並且,噴射單元24具備覆蓋噴射噴嘴24c下部的蓋體24e。蓋體24e的內部形成為空洞的半球狀(碗型)。該蓋體24e中插入噴射噴嘴24c,蓋體24e係以下部的圓環狀邊緣與保持台18的保持面18a對向之方式被安裝於噴射噴嘴24c。該蓋體24e防止因加工而生成之霧氣或加工屑的飛散。此外,為了方便說明,在圖1以外的各圖中省略蓋體24e。Furthermore, the injection unit 24 is provided with the cover 24e which covers the lower part of the injection nozzle 24c. The inside of the cover 24e is formed into a hollow hemispherical shape (bowl shape). The injection nozzle 24c is inserted into the cover 24e, and the cover 24e is attached to the injection nozzle 24c so that the lower annular edge faces the holding surface 18a of the holding base 18. The cover 24e prevents mist generated during processing and machining chips from scattering. In addition, for convenience of explanation, the cover 24e is omitted in the figures other than FIG. 1 .

並且,蓋體24e的側壁形成有開口,開口與設置在蓋體24e外側的導管24f的一端連接。此導管24f的另一端與吸引源(未圖示)連接。因被加工物1的加工而在蓋體24e內部生成的霧氣或加工屑會透過導管24f而被吸引去除。Furthermore, an opening is formed on the side wall of the cover 24e, and the opening is connected to one end of the conduit 24f provided outside the cover 24e. The other end of this duct 24f is connected to a suction source (not shown). The mist or processing chips generated inside the cover 24e due to the processing of the workpiece 1 are sucked and removed through the duct 24f.

此外,可藉由移動單元28b控制噴射噴嘴24c的位置。藉由控制移動單元28b,可使保持台18與噴射噴嘴24c相對地移動。Furthermore, the position of the injection nozzle 24c can be controlled by the moving unit 28b. By controlling the moving unit 28b, the holding base 18 and the injection nozzle 24c can be relatively moved.

供給源24a具備用於將液體進行加壓並供給作為加工液的泵(未圖示),水等液體係藉由該泵而被加壓。供給源24a具備控制機構,其控制從噴射噴嘴24c噴出之加工液的流量及壓力。噴射單元24係以預定壓力(例如0MPa至70MPa)及預定流量將加工液供給至被保持在保持台18的被加工物1,並將該被加工物1進行加工。The supply source 24a is equipped with a pump (not shown) for pressurizing a liquid and supplying it as a machining fluid, and a liquid system such as water is pressurized by the pump. The supply source 24a is provided with a control mechanism that controls the flow rate and pressure of the machining fluid ejected from the injection nozzle 24c. The injection unit 24 supplies the machining fluid at a predetermined pressure (for example, 0 MPa to 70 MPa) and a predetermined flow rate to the workpiece 1 held on the holding table 18, and processes the workpiece 1.

加工裝置2可僅利用噴射單元24對被加工物1進行加工,亦可利用切割單元22及噴射單元24對被加工物1進行加工。並且,加工裝置2可不具備切割單元22,且可為對被加工物1供給高壓水的噴水加工裝置。The processing device 2 may process the object 1 using only the spray unit 24 , or may use the cutting unit 22 and the spray unit 24 to process the object 1 . Furthermore, the processing device 2 does not need to include the cutting unit 22 , and may be a water jet processing device that supplies high-pressure water to the workpiece 1 .

接著,針對本實施方式之加工方法的各步驟進行說明。以下,針對被加工物1以框架單元11的狀態被搬入加工裝置2進行加工之情形進行說明,但本實施方式之加工方法並不受限於此。被加工物1亦可不與環狀框架9及黏著膠膜7一體化。Next, each step of the processing method of this embodiment will be described. Hereinafter, a case where the workpiece 1 is carried into the processing device 2 in the state of the frame unit 11 and processed will be described, but the processing method of this embodiment is not limited thereto. The workpiece 1 does not need to be integrated with the annular frame 9 and the adhesive film 7 .

該加工方法中,首先,實施以保持台18保持被加工物1的保持步驟。圖2(A)係示意地表示保持步驟之剖面圖。在保持台18的保持面18a上透過黏著膠膜7配置被加工物1,且藉由夾具20固定環狀框架9。其後,使吸引源運作而使負壓作用在被加工物1,藉此被加工物1透過黏著膠膜7而被保持台18吸引保持。In this processing method, first, a holding step of holding the workpiece 1 on the holding table 18 is performed. Fig. 2(A) is a cross-sectional view schematically showing the holding step. The workpiece 1 is arranged on the holding surface 18 a of the holding table 18 through the adhesive film 7 , and the annular frame 9 is fixed by the clamp 20 . Thereafter, the suction source is operated to cause negative pressure to act on the workpiece 1 , whereby the workpiece 1 is attracted and held by the holding table 18 through the adhesive film 7 .

此外,本實施方式之加工方法中藉由噴射單元24而被加工的被加工物1上,預先形成沿著第一加工預定線3a之預定深度的第一槽13a、與沿著第二加工預定線3b之預定深度的第二槽13b。In addition, in the processing method of this embodiment, the first groove 13a of a predetermined depth along the first planned processing line 3a and the first groove 13a along the second planned processing line 3a are formed in advance on the workpiece 1 processed by the injection unit 24. a second groove 13b of a predetermined depth along line 3b.

例如,在保持步驟之前亦可實施槽形成步驟,其在被加工物1形成槽13a、13b。例如,可在被收納至卡匣8前預先在其他加工裝置等中實施槽形成步驟。或者,亦可在實施保持步驟後,藉由加工裝置2的切割單元22而實施槽形成步驟。For example, a groove forming step for forming grooves 13 a and 13 b in the workpiece 1 may be performed before the holding step. For example, the groove forming step may be performed in other processing equipment or the like before being stored in the cassette 8 . Alternatively, after the holding step is performed, the groove forming step may be performed by the cutting unit 22 of the processing device 2 .

在加工裝置2中實施槽形成步驟之情形,首先,以使保持台18旋轉的旋轉單元使保持台18旋轉,使被加工物1的第一方向1c對準加工裝置2的加工進給方向12a(X軸方向)。然後,將切割單元22的切割刀片定位在被加工物1的外側的第一加工預定線3a的延長線上方。When performing the groove forming step in the processing device 2 , first, the holding table 18 is rotated by a rotation unit that rotates the holding table 18 so that the first direction 1 c of the workpiece 1 is aligned with the processing feed direction 12 a of the processing device 2 (X-axis direction). Then, the cutting blade of the cutting unit 22 is positioned above the extension line of the first planned processing line 3 a on the outside of the workpiece 1 .

其後,開始旋轉切割刀片,使切割單元22下降到預定的高度位置。然後,使保持台18與切割單元22沿著加工進給方向12a相對地移動。此情形,旋轉的切割刀片與被加工物1接觸,被加工物1沿著該第一加工預定線3a被切割,而在被加工物1形成沿著該第一加工預定線3a的第一槽13a。Thereafter, the cutting blade is started to be rotated, so that the cutting unit 22 is lowered to a predetermined height position. Then, the holding table 18 and the cutting unit 22 are relatively moved along the processing feed direction 12a. In this case, the rotating cutting blade contacts the workpiece 1, the workpiece 1 is cut along the first planned processing line 3a, and the first groove along the first planned processing line 3a is formed in the workpiece 1 13a.

沿著一條第一加工預定線3a切割被加工物1而形成第一槽13a後,使保持台18及切割單元22沿著分度進給方向(Y軸方向)相對地移動,並沿著另一條第一加工預定線3a切割被加工物1。然後,沿著全部的第一加工預定線3a切割被加工物1,並沿著各自的第一加工預定線3a形成第一槽13a。After the workpiece 1 is cut along a first planned processing line 3a to form the first groove 13a, the holding table 18 and the cutting unit 22 are relatively moved along the indexing feed direction (Y-axis direction) and moved along the other direction. A first planned processing line 3a cuts the workpiece 1. Then, the workpiece 1 is cut along all the first planned processing lines 3a, and the first grooves 13a are formed along the respective first planned processing lines 3a.

其後,以旋轉單元使保持台18旋轉,使被加工物1的第二方向1d對準加工裝置2的加工進給方向12a。然後,同樣地沿著第二加工預定線3b切割被加工物1,在被加工物1形成沿著第二加工預定線3b的第二槽13b。於此,第一槽13a及第二槽13b被稱為半切斷槽。Thereafter, the holding table 18 is rotated by the rotation unit so that the second direction 1d of the object 1 is aligned with the processing feed direction 12a of the processing device 2 . Then, the workpiece 1 is similarly cut along the second planned processing line 3b, and the second groove 13b along the second planned processing line 3b is formed in the workpiece 1. Here, the first groove 13a and the second groove 13b are called half-cut grooves.

此外,雖針對在形成第一槽13a後形成第二槽13b之情形進行說明,但槽形成步驟並不受限於此。例如,亦可在形成第二槽13b後形成第一槽13a。In addition, although the case where the second groove 13b is formed after the first groove 13a is formed is described, the groove forming step is not limited to this. For example, the first groove 13a may be formed after the second groove 13b is formed.

於此,被加工物1的第一加工預定線3a及第二加工預定線3b存在使用於電極的金屬。而且,若以切割刀片切割金屬,則該金屬與切割刀片接觸並被延展,而在槽13a、13b形成被稱為毛邊的鬍鬚狀突起。Here, the metal used for the electrode exists in the first planned processing line 3 a and the second planned processing line 3 b of the workpiece 1 . And when metal is cut with a cutting blade, the metal contacts the cutting blade and is stretched, and whisker-shaped protrusions called burrs are formed in the grooves 13a and 13b.

若此毛邊殘留在槽13a、13b的內部,則在分割被加工物1而形成封裝元件且將該封裝元件組裝在預定組裝對象之際會成為障礙。於是,本實施方式之加工方法中,從噴射單元24的噴射噴嘴24c沿著槽13a、13b噴出加工液,去除該毛邊。If the burrs remain inside the grooves 13a and 13b, they will become an obstacle when the workpiece 1 is divided to form packaged components and the packaged components are assembled on a predetermined assembly target. Therefore, in the processing method of this embodiment, the processing fluid is ejected from the injection nozzle 24c of the injection unit 24 along the grooves 13a and 13b to remove the burrs.

本實施方式之加工方法中,實施保持步驟後,實施第一定位步驟。第一定位步驟中,以旋轉單元使該保持台18旋轉而使被加工物1的第一方向1c對準加工裝置2的加工進給方向12a,且將該噴射噴嘴24c定位在第一加工預定線3a的一端。圖2(B)中顯示示意地表示在第一定位步驟結束時的被加工物1及噴射噴嘴24c之俯視圖。In the processing method of this embodiment, after the holding step is performed, the first positioning step is performed. In the first positioning step, the rotation unit is used to rotate the holding table 18 so that the first direction 1c of the workpiece 1 is aligned with the processing feed direction 12a of the processing device 2, and the injection nozzle 24c is positioned at the first planned processing position. One end of line 3a. FIG. 2(B) shows a plan view schematically showing the workpiece 1 and the injection nozzle 24c at the end of the first positioning step.

第一定位步驟中,以攝像單元46b拍攝被加工物1,例如,檢測對應第一加工預定線3a而設置在被加工物1且未圖示的對準標記或該第一加工預定線3a,藉此檢測第一方向1c。然後,在第一方向1c未對準加工裝置2的加工進給方向12a之情形中,使保持台18旋轉,使被加工物1的第一方向1c對準該加工進給方向12a。In the first positioning step, the camera unit 46b is used to photograph the workpiece 1, for example, to detect an alignment mark (not shown) provided on the workpiece 1 corresponding to the first planned processing line 3a or the first planned processing line 3a. The first direction 1c is thus detected. Then, when the first direction 1c is not aligned with the processing feed direction 12a of the processing device 2, the holding table 18 is rotated so that the first direction 1c of the workpiece 1 is aligned with the processing feed direction 12a.

此外,在第一定位步驟之前實施槽形成步驟之情形等,以攝像單元46b拍攝被加工物1的結果,有判明在使保持台18旋轉前該第一方向1c對準該加工進給方向12a之情形。如此,作為結果,第一定位步驟亦包含確認不需要使保持台18旋轉之情形。換言之,第一定位步驟亦包含以旋轉單元使保持台18旋轉0度之情形。In addition, when the groove forming step is performed before the first positioning step, etc., it is found that the first direction 1c is aligned with the processing feed direction 12a before the holding table 18 is rotated by photographing the workpiece 1 with the imaging unit 46b. situation. Thus, as a result, the first positioning step also includes confirming that there is no need to rotate the holding table 18 . In other words, the first positioning step also includes using the rotation unit to rotate the holding platform 18 by 0 degrees.

實施第一定位步驟後,實施第一加工步驟,其從噴射噴嘴24c噴射加工液,沿著第一加工預定線3a對被加工物1進行加工。圖4(A)係示意地表示第一加工步驟之剖面圖。After the first positioning step is performed, a first processing step is performed in which the processing fluid is sprayed from the injection nozzle 24c to process the workpiece 1 along the first planned processing line 3a. Fig. 4(A) is a cross-sectional view schematically showing the first processing step.

第一加工步驟中,首先,開始從噴射噴嘴24c噴射加工液。此時,為了均勻地對被加工物1的被加工處的全部區域進行加工,在成為以預定的噴射條件穩定地從噴射噴嘴24c噴出加工液的狀態前,進行待機。其後,使保持台18及噴射噴嘴24c沿著加工進給方向12a相對地移動,藉此以該加工液沿著第一加工預定線3a對被加工物1進行加工。In the first machining step, first, injection of the machining fluid from the injection nozzle 24c is started. At this time, in order to process the entire area of the workpiece 1 uniformly, a wait is performed until the machining fluid is stably ejected from the ejection nozzle 24c under predetermined ejection conditions. Thereafter, the holding table 18 and the injection nozzle 24c are relatively moved along the processing feed direction 12a, whereby the workpiece 1 is processed along the first planned processing line 3a with the processing fluid.

若沿著第一加工預定線3a對被加工物1噴出加工液,則去除沿著該第一槽13a存在的金屬毛邊。此外,在結束此沿著最初的第一加工預定線3a之被加工物1的加工之際,在噴射噴嘴24c從與被加工物1重疊的區域脫離前,使保持台18及噴射噴嘴24c停止相對移動。When the machining fluid is ejected onto the workpiece 1 along the first planned machining line 3a, the metal burrs existing along the first groove 13a are removed. In addition, when the processing of the workpiece 1 along the initial first planned processing line 3a is completed, the holding table 18 and the injection nozzle 24c are stopped before the injection nozzle 24c is separated from the area overlapping the workpiece 1. relative movement.

若噴射噴嘴24c從該區域脫離,則加工液會被直接噴射至黏著膠膜7及保持台18的保持面18a,黏著膠膜7及保持台18會產生損傷。於是,例如,在噴射噴嘴24c被配設在被加工物1的外周剩餘區域5c(參照圖2(B)等)上方的期間,使保持台18及噴射噴嘴24c停止相對移動。If the injection nozzle 24c is separated from this area, the machining fluid will be directly injected to the adhesive film 7 and the holding surface 18a of the holding table 18, and the adhesive film 7 and the holding table 18 will be damaged. Then, for example, while the injection nozzle 24 c is arranged above the outer peripheral remaining area 5 c of the workpiece 1 (see FIG. 2(B) and the like), the relative movement of the holding base 18 and the injection nozzle 24 c is stopped.

然後,使保持台18及噴射噴嘴24c在與加工進給方向12a正交的分度進給方向(Y軸方向)移動,將噴射噴嘴24c定位在另一條第一加工預定線3a的上方。其後,再度使保持台18及噴射噴嘴24c沿著加工進給方向12a移動,藉此沿著該另一條第一加工預定線3a對被加工物1進行加工。接連進行加工,沿著全部的第一加工預定線3a對被加工物1進行加工,使第一加工步驟結束。Then, the holding table 18 and the injection nozzle 24c are moved in the indexing feed direction (Y-axis direction) orthogonal to the processing feed direction 12a, and the injection nozzle 24c is positioned above the other first planned processing line 3a. Thereafter, the holding table 18 and the injection nozzle 24c are moved along the processing feed direction 12a again, thereby processing the workpiece 1 along the other first planned processing line 3a. Processing is performed continuously, the workpiece 1 is processed along all the first planned processing lines 3a, and the first processing step is completed.

此外,第一加工步驟中,亦可在沿著第一加工預定線3a對被加工物1進行加工之際,分別對由第一槽13a所分隔之一方的區域與另一方的區域噴射加工液而對被加工物1進行加工。對此情形中之噴射噴嘴24c的軌道進行說明。圖3所示之被加工物1的俯視圖中,顯示噴射噴嘴24c相對於被加工物1的軌道24g。In addition, in the first processing step, when processing the workpiece 1 along the first planned processing line 3a, the processing fluid may be sprayed into one area and the other area separated by the first groove 13a. And the workpiece 1 is processed. The trajectory of the injection nozzle 24c in this case will be described. In the top view of the workpiece 1 shown in FIG. 3 , the injection nozzle 24c is shown relative to the track 24g of the workpiece 1 .

如同圖3所示,沿著第一槽13a的一方的側壁使噴射噴嘴24c相對地移動而對被加工物1進行加工後,沿著第一槽13a的另一方的側壁使噴射噴嘴24c相對地移動而對被加工物1進行加工。此情形,因可分別對第一槽13a的該一方的側壁存在之金屬毛邊、與該另一方的側壁存在之金屬毛邊噴射加工液,故可更確實地去除各自的毛邊。但是,本實施方式之加工方法並不受限於此。As shown in FIG. 3 , after the injection nozzle 24 c is relatively moved along one side wall of the first groove 13 a to process the workpiece 1 , the injection nozzle 24 c is relatively moved along the other side wall of the first groove 13 a. Move to process the workpiece 1. In this case, since the metal burrs present on the one side wall of the first groove 13a and the metal burrs present on the other side wall of the first groove 13a can be sprayed with the machining fluid respectively, the respective burrs can be removed more reliably. However, the processing method of this embodiment is not limited to this.

作為沿著第二加工預定線3b對被加工物1進行加工的準備,在實施第一加工步驟後實施第二定位步驟。第二定位步驟中,以旋轉單元使保持台18旋轉並使被加工物1的第二方向1d對準加工裝置2的加工進給方向12a,且將噴射噴嘴24c定位在第二加工預定線3b的一端。此外,針對第二定位步驟,將在之後詳細敘述。As preparation for processing the workpiece 1 along the second planned processing line 3b, the second positioning step is performed after the first processing step. In the second positioning step, the rotation unit is used to rotate the holding table 18 so that the second direction 1d of the workpiece 1 is aligned with the processing feed direction 12a of the processing device 2, and the injection nozzle 24c is positioned at the second planned processing line 3b one end. In addition, the second positioning step will be described in detail later.

實施該第二定位步驟後,實施第二加工步驟,其沿著第二加工預定線3b對被加工物1進行加工。圖4(B)係示意地表示第二加工步驟之剖面圖。第二加工步驟中,使保持台18及噴射噴嘴24c沿著加工進給方向12a相對地移動,以從該噴射噴嘴24c所噴射的該加工液,沿著第二加工預定線3b對被加工物1進行加工。After the second positioning step is performed, the second processing step is performed to process the workpiece 1 along the second planned processing line 3b. FIG. 4(B) is a cross-sectional view schematically showing the second processing step. In the second processing step, the holding table 18 and the injection nozzle 24c are relatively moved along the processing feed direction 12a, so that the processing fluid injected from the injection nozzle 24c is applied to the workpiece along the second planned processing line 3b. 1 for processing.

第二加工步驟中,與第一加工步驟同樣地,重複保持台18及噴射噴嘴24c往加工進給方向12a的移動、與往分度進給方向的移動。然後,沿著全部的第二加工預定線3b對被加工物1進行加工,使第二加工步驟結束。然後,使從第一加工步驟開始時便持續的從噴射噴嘴24c噴射加工液的動作停止。In the second processing step, similarly to the first processing step, the movement of the holding table 18 and the injection nozzle 24c in the processing feed direction 12a and the movement in the indexing feed direction are repeated. Then, the workpiece 1 is processed along all the second planned processing lines 3b, and the second processing step is completed. Then, the operation of injecting the machining fluid from the injection nozzle 24 c that has been continued since the start of the first processing step is stopped.

若實施第一加工步驟及第二加工步驟,則可去除形成在槽13a、13b的金屬毛邊。因此,在其後將分割被加工物1所形成之封裝元件組裝在預定的組裝對象之際,不會有金屬毛邊妨礙適當組裝的狀況。If the first processing step and the second processing step are performed, the metal burrs formed in the grooves 13a and 13b can be removed. Therefore, when the package components formed by dividing the workpiece 1 are subsequently assembled on a predetermined assembly target, there will be no metal burrs that hinder proper assembly.

但是,以往在實施沿著第一加工預定線3a之被加工物1的加工後,在以旋轉單元使保持台18旋轉之際,會使噴射噴嘴24c暫時停止噴射加工液。其原因在於,伴隨著保持台18的旋轉,被加工物1會離開噴射噴嘴24c的正下方區域。此情形,若在使保持台18旋轉的期間繼續噴射加工液,則會將加工液直接噴射至黏著膠膜7及保持台18的保持面18a,而會在黏著膠膜7等產生損傷。However, conventionally, after processing the workpiece 1 along the first planned processing line 3a, when the holding table 18 is rotated by the rotation unit, the injection nozzle 24c temporarily stops injecting the machining fluid. The reason for this is that as the holding table 18 rotates, the workpiece 1 moves away from the area directly below the injection nozzle 24c. In this case, if the machining fluid is continued to be sprayed while the holding table 18 is rotating, the machining fluid will be sprayed directly to the adhesive film 7 and the holding surface 18 a of the holding table 18 , causing damage to the adhesive film 7 and the like.

然而,若使加工液的噴射一度停止,則在使保持台18旋轉且將噴射噴嘴24c定位在第二加工預定線3b的一端後,在使噴射噴嘴24c再次開始噴射加工液後,需要進行預定時間待機。其原因在於,為了以預定條件穩定地實施沿著第二加工預定線3b之被加工物1的加工,需要在成為以預定的噴射條件穩定地從噴射噴嘴24c噴射加工液的狀態後再開始加工。However, if the injection of the machining fluid is stopped once, it is necessary to make a reservation after rotating the holding table 18 and positioning the injection nozzle 24c at one end of the second planned machining line 3b, and then causing the injection nozzle 24c to start injecting the machining fluid again. Time to wait. The reason for this is that in order to stably process the workpiece 1 along the second planned processing line 3b under predetermined conditions, it is necessary to start processing after the machining fluid is stably injected from the injection nozzle 24c under the predetermined injection conditions. .

例如,加工一個被加工物1所需要的總加工時間為70秒鐘左右。其中,從再次開始噴射加工液至加工液的噴射狀態穩定為止的待機時間,例如為20秒鐘~30秒鐘左右。亦即,該待機時間在該加工時間所佔的比例並不少,期望該待機時間的縮短化。For example, the total processing time required to process one workpiece 1 is about 70 seconds. The waiting time from when the injection of the machining fluid is restarted until the injection state of the machining fluid stabilizes is, for example, about 20 seconds to 30 seconds. That is, the proportion of the waiting time in the processing time is not small, and it is desired to shorten the waiting time.

於是,本實施方式之加工方法中,在實施保持台18的旋轉之該第二定位步驟中,不使噴射噴嘴24c停止噴射加工液。亦即,第二定位步驟中,以在保持台18旋轉中將加工液持續噴射至被加工物1之方式,使該保持台18及該噴射噴嘴24c相對地移動。Therefore, in the machining method of this embodiment, in the second positioning step of rotating the holding table 18, the injection nozzle 24c is not stopped from injecting the machining fluid. That is, in the second positioning step, the holding table 18 and the injection nozzle 24 c are relatively moved in such a manner that the machining fluid is continuously sprayed to the workpiece 1 while the holding table 18 is rotating.

例如,在加工裝置2中預先登錄以下位置:被加工物1在第一加工步驟開始時及結束時的噴射噴嘴24c的位置、與在第二加工步驟開始時及結束時的噴射噴嘴24c的位置。再進一步登錄各自的第一加工預定線3a及第二加工預定線3b中的加工開始位置與加工結束位置。然後,算出從第一加工步驟結束時的位置至第二加工步驟開始時的位置為止之噴射噴嘴24c的軌跡。For example, the following positions are registered in advance in the processing device 2: the positions of the injection nozzle 24c at the start and end of the first processing step of the workpiece 1, and the positions of the injection nozzle 24c at the start and end of the second processing step. . Furthermore, the processing start position and the processing end position in each of the first planned processing line 3a and the second planned processing line 3b are registered. Then, the trajectory of the injection nozzle 24c from the position at the end of the first processing step to the position at the start of the second processing step is calculated.

而且,第二定位步驟中,使保持台18旋轉且同時對準該軌跡,使保持台18及噴射噴嘴24c沿著X軸方向及Y軸方向相對地移動。此情形,因被加工物1不會離開噴射噴嘴24c的正下方區域,故不需要使噴射噴嘴24c停止噴射加工液。因以預定條件穩定地從噴射噴嘴24c噴出加工液,故在實施第二定位步驟後,可立刻開始第二加工步驟。Furthermore, in the second positioning step, the holding table 18 is rotated while aligning with the trajectory, and the holding table 18 and the injection nozzle 24 c are relatively moved in the X-axis direction and the Y-axis direction. In this case, since the workpiece 1 will not leave the area directly below the injection nozzle 24c, there is no need to stop the injection nozzle 24c from injecting the machining fluid. Since the machining fluid is stably ejected from the injection nozzle 24c under predetermined conditions, the second machining step can be started immediately after the second positioning step is performed.

因此,本實施方式之加工方法中,可縮短開始第二加工步驟前的待機時間,且可縮短被加工物1的加工所需要的時間。Therefore, in the processing method of this embodiment, the waiting time before starting the second processing step can be shortened, and the time required for processing the workpiece 1 can be shortened.

此外,本實施方式之加工方法中,在實施第二定位步驟前,亦可實施登錄步驟,其係將關於在該第二定位步驟中之保持台18及噴射噴嘴24c的相對移動之計畫登錄至加工裝置2。並且,在連續加工相同種類的多個被加工物1之情形,若一度登錄關於保持台18及噴射噴嘴24c的相對移動之計畫,則可利用該計畫而對全部的被加工物1實施第二加工步驟。In addition, in the processing method of this embodiment, before performing the second positioning step, a registration step may be performed, which is to register the relative movement plan of the holding table 18 and the injection nozzle 24c in the second positioning step. to processing device 2. Furthermore, when a plurality of workpieces 1 of the same type are continuously processed, if a plan for the relative movement of the holding table 18 and the injection nozzle 24c is once registered, the plan can be used for all the workpieces 1 Second processing step.

並且,第二定位步驟中,例如,可以在保持台18旋轉中將加工液持續噴射至被加工物1的外周剩餘區域5c之方式,使保持台18及噴射噴嘴24c相對地移動。在實施第二定位步驟的期間,若將加工液持續噴射至被加工物1的元件區域5b,則會有形成在元件區域5b的元件5產生損傷等之情形。因此,較佳為以被加工物1的外周剩餘區域5c持續接受保持台18旋轉中所噴射之加工液。Furthermore, in the second positioning step, for example, the holding table 18 and the injection nozzle 24 c may be relatively moved such that the machining fluid is continuously sprayed to the remaining outer peripheral area 5 c of the workpiece 1 while the holding table 18 is rotating. While the second positioning step is being performed, if the machining fluid is continuously sprayed into the component area 5 b of the workpiece 1 , the component 5 formed in the component area 5 b may be damaged or the like. Therefore, it is preferable that the remaining outer peripheral area 5 c of the workpiece 1 continues to receive the machining fluid sprayed while the holding table 18 rotates.

或者,第二定位步驟中,亦可以在保持台18旋轉中將加工液持續噴射至被加工物1的第一槽13a或第二槽13b的任一者之方式,使保持台18及噴射噴嘴24c相對地移動。針對在此情形中之噴射噴嘴24c的移動路徑,使用圖5(A)、圖5(B)及圖5(C)進行說明。Alternatively, in the second positioning step, the machining fluid may be continuously sprayed to either the first groove 13 a or the second groove 13 b of the workpiece 1 while the holding table 18 is rotating, so that the holding table 18 and the injection nozzle 24c moves relatively. The movement path of the injection nozzle 24c in this case will be described using Fig. 5(A), Fig. 5(B), and Fig. 5(C).

圖5(A)係示意地表示在第一加工步驟結束時之噴射噴嘴的位置之俯視圖。圖5(A)中顯示在第一加工步驟結束時、或在第二定位步驟開始時之噴射噴嘴24c的位置。如同圖5(A)所示,在此時間點,噴射噴嘴24c定位在外周剩餘區域5c且在沿著第一加工預定線3a所形成之第一槽13a的上方。FIG. 5(A) is a top view schematically showing the position of the injection nozzle at the end of the first processing step. The position of the injection nozzle 24c at the end of the first processing step or at the beginning of the second positioning step is shown in Figure 5(A). As shown in FIG. 5(A) , at this point in time, the injection nozzle 24 c is positioned in the outer peripheral remaining area 5 c and above the first groove 13 a formed along the first planned processing line 3 a.

圖5(B)係示意地表示第二定位步驟之俯視圖。第二定位步驟中,一邊使保持台18旋轉一邊使該保持台18及噴射噴嘴24c相對地移動。此時,如同圖5(B)所示,以噴射噴嘴24c能持續定位在被加工物1的第一槽13a上方之方式,使保持台18及噴射噴嘴24c相對地移動。FIG. 5(B) is a top view schematically showing the second positioning step. In the second positioning step, the holding table 18 and the injection nozzle 24c are relatively moved while the holding table 18 is rotated. At this time, as shown in FIG. 5(B) , the holding base 18 and the injection nozzle 24 c are relatively moved so that the injection nozzle 24 c can be continuously positioned above the first groove 13 a of the workpiece 1 .

其後,在被加工物1的第二方向1d對準加工裝置2的加工進給方向12a時,使保持台18停止旋轉。接著,使保持台18及噴射噴嘴24c相對地移動,將定位在第一槽13a上方的噴射噴嘴24c定位在沿著第二加工預定線3b的第二槽13b上方,使第二定位步驟結束。其後,開始第二加工步驟。圖5(C)係示意地表示在第二加工步驟開始時之噴射噴嘴的位置之俯視圖。Thereafter, when the second direction 1d of the workpiece 1 is aligned with the processing feed direction 12a of the processing device 2, the rotation of the holding table 18 is stopped. Next, the holding table 18 and the injection nozzle 24c are relatively moved, and the injection nozzle 24c positioned above the first groove 13a is positioned above the second groove 13b along the second planned processing line 3b, thereby completing the second positioning step. Thereafter, the second processing step begins. FIG. 5(C) is a top view schematically showing the position of the injection nozzle at the start of the second processing step.

此外,在第二定位步驟中,雖針對在保持台18旋轉中將加工液持續噴射至被加工物1的第一槽13a之情形進行說明,但亦可在保持台18旋轉中將加工液持續噴射至第二槽13b。此情形,在開始旋轉保持台18前,將定位在第一槽13a上方的噴射噴嘴24c定位在第二槽13b的上方。其後,開始旋轉保持台18。In addition, in the second positioning step, although the case where the machining fluid is continuously sprayed to the first groove 13 a of the workpiece 1 is described while the holding table 18 is rotating, the machining fluid may also be continuously sprayed while the holding table 18 is rotating. Spray to the second groove 13b. In this case, before starting to rotate the holding table 18, the injection nozzle 24c positioned above the first groove 13a is positioned above the second groove 13b. Thereafter, the rotation of the holding table 18 is started.

此外,在第二定位步驟中使保持台18旋轉的期間,不需要對被加工物1的同一處持續噴射加工液。例如,在使保持台18旋轉的期間,可在被加工物1的外周剩餘區域5c之中變換接受加工液處。而且,亦可在保持台18結束旋轉的同時將噴射噴嘴24c定位在第二槽13b的上方。In addition, while the holding table 18 is rotated in the second positioning step, it is not necessary to continuously spray the machining fluid to the same place on the workpiece 1 . For example, while the holding table 18 is being rotated, the position for receiving the machining fluid can be changed in the outer peripheral remaining area 5 c of the workpiece 1 . Furthermore, the injection nozzle 24c may be positioned above the second groove 13b at the same time as the rotation of the holding table 18 is completed.

此情形,在實施第一加工步驟後,可立刻開始旋轉保持台18。並且,在保持台18結束旋轉後,可立刻開始第二加工步驟。因此,可將第二定位步驟所需要的時間最短化。In this case, the rotation of the holding table 18 can be started immediately after the first processing step is performed. Moreover, after the rotation of the holding table 18 is completed, the second processing step can be started immediately. Therefore, the time required for the second positioning step can be minimized.

此外,本發明不限於上述實施方式的記載,能進行各種變更並實施。例如,上述實施方式中雖針對對被加工物1進行加工而去除金屬毛邊之情形進行說明,但本發明的一態樣並不受限於此。例如,本發明的一態樣之加工方法中,亦可以去除金屬毛邊以外之目的對被加工物1進行加工。In addition, the present invention is not limited to the description of the above embodiment, and can be implemented with various modifications. For example, in the above-mentioned embodiment, the case where the workpiece 1 is processed to remove metal burrs has been described, but an aspect of the present invention is not limited thereto. For example, in one aspect of the processing method of the present invention, the workpiece 1 can be processed for purposes other than removing metal burrs.

並且,雖針對在沿著第一加工預定線3a對被加工物1進行加工後,沿著第二加工預定線3b對被加工物1進行加工之情形進行說明,但本發明的一態樣之加工方法並不受限於此。亦即,亦可在沿著第二加工預定線3b對被加工物1進行加工後,沿著第一加工預定線3a對被加工物1進行加工。並且,第一方向1c並不受限於沿著被加工物1長邊的方向,第二方向1d並不受限於沿著被加工物1短邊的方向。Furthermore, although the case where the workpiece 1 is processed along the first planned processing line 3a and then the workpiece 1 is processed along the second planned processing line 3b is described, one aspect of the present invention The processing method is not limited to this. That is, after processing the workpiece 1 along the second planned processing line 3b, the workpiece 1 may be processed along the first planned processing line 3a. Furthermore, the first direction 1 c is not limited to the direction along the long side of the workpiece 1 , and the second direction 1 d is not limited to the direction along the short side of the workpiece 1 .

除此以外,上述實施方式之構造、方法等,只要不脫離本發明之目的範圍,則可進行適當變更並實施。In addition, the structures, methods, etc. of the above-described embodiments can be appropriately modified and implemented as long as they do not deviate from the scope of the invention.

1:被加工物 1a:基板 1b:樹脂層 1c、1d:方向 3a、3b:加工預定線 5:元件 5a:電極 5b:元件區域 5c:外周剩餘區域 7:黏著膠膜 9:環狀框架 11:框架單元 13a、13b:槽 2:加工裝置 4:基台 4a、4b、4c:開口 6:卡匣支撐台 8:卡匣 10:X軸移動機構 12:工作台蓋體 12a:加工進給方向 14:防塵防滴蓋體 16:暫置機構 16a、16b:導軌 18:保持台 18a:保持面 20:夾具 22:切割單元 24:噴射單元 24a:供給源 24b:切換閥 24c:噴射噴嘴 24d:供給路徑 24e:蓋體 24f:導管 24g:軌道 26:支撐構造 28a、28b:移動單元 30、38a、38b:導軌 32a、32b、40a、40b:移動板 34a、34b、42a、42b:滾珠螺桿 36、44a、44b:Y軸脈衝馬達 46a、46b:攝像單元 48:清洗單元1: Processed object 1a:Substrate 1b: Resin layer 1c, 1d: direction 3a, 3b: Processing scheduled line 5:Component 5a:Electrode 5b: component area 5c: Remaining peripheral area 7: Adhesive film 9: Ring frame 11: Frame unit 13a, 13b: slot 2: Processing device 4:Abutment 4a, 4b, 4c: opening 6: Cassette support platform 8: Cassette 10:X-axis moving mechanism 12:Workbench cover 12a: Processing feed direction 14: Dust-proof and drip-proof cover 16: Temporary institution 16a, 16b: guide rail 18:Keeping platform 18a:Maintenance surface 20: Fixture 22: Cutting unit 24:Injection unit 24a: Source of supply 24b: switching valve 24c:Jet nozzle 24d: Supply path 24e: Cover 24f:Conduit 24g: Orbit 26:Support structure 28a, 28b: mobile unit 30, 38a, 38b: guide rail 32a, 32b, 40a, 40b: moving board 34a, 34b, 42a, 42b: Ball screw 36, 44a, 44b: Y-axis pulse motor 46a, 46b: camera unit 48:Cleaning unit

圖1係示意地表示加工裝置之立體圖。 圖2(A)係示意地表示保持步驟之剖面圖,圖2(B)係示意地表示被保持在保持台的框架單元之俯視圖。 圖3係示意地放大表示被加工物的上表面之俯視圖。 圖4(A)係示意地表示第一加工步驟之剖面圖,圖4(B)係示意地表示第二加工步驟之剖面圖。 圖5(A)係示意地表示在第一加工步驟結束時之噴射噴嘴的位置之俯視圖,圖5(B)係示意地表示第二定位步驟之俯視圖,圖5(C)係示意地表示在第二加工步驟開始時之噴射噴嘴的位置之俯視圖。Fig. 1 is a perspective view schematically showing a processing device. FIG. 2(A) is a cross-sectional view schematically showing the holding step, and FIG. 2(B) is a plan view schematically showing the frame unit held on the holding table. FIG. 3 is a schematic enlarged plan view showing the upper surface of the workpiece. FIG. 4(A) is a cross-sectional view schematically showing the first processing step, and FIG. 4(B) is a cross-sectional view schematically showing the second processing step. Figure 5(A) is a top view schematically showing the position of the injection nozzle at the end of the first processing step. Figure 5(B) is a top view schematically showing the second positioning step. Figure 5(C) is a schematic top view showing the position of the injection nozzle at the end of the first processing step. Top view of the position of the spray nozzle at the beginning of the second processing step.

1:被加工物 1: Processed object

1c、1d:方向 1c, 1d: direction

3a、3b:加工預定線 3a, 3b: Processing scheduled line

5:元件 5:Component

5b:元件區域 5b: component area

5c:外周剩餘區域 5c: Remaining peripheral area

7:黏著膠膜 7: Adhesive film

9:環狀框架 9: Ring frame

11:框架單元 11: Frame unit

12a:加工進給方向 12a: Processing feed direction

13a、13b:槽 13a, 13b: slot

18a:保持面 18a:Maintenance surface

20:夾具 20: Fixture

24c:噴射噴嘴 24c:Jet nozzle

Claims (2)

一種加工方法,係利用加工裝置對被加工物進行加工,該加工裝置具備:保持台,其具有保持該被加工物的保持面;噴射噴嘴,其對由該保持台所保持的該被加工物噴射加工液;加工進給單元,其使該保持台及該噴射噴嘴沿著加工進給方向相對地移動;以及旋轉單元,其使該保持台繞沿著與該保持面垂直的方向的軸旋轉,並且,該被加工物的表面設定有沿著第一方向的第一加工預定線及沿著與該第一方向交叉的第二方向的第二加工預定線,該加工方法的特徵在於,具備:保持步驟,其以該保持台保持該被加工物;第一定位步驟,其在實施該保持步驟後,以該旋轉單元使該保持台旋轉,使該被加工物的該第一方向對準該加工進給方向,且將該噴射噴嘴定位在該第一加工預定線的一端;第一加工步驟,其在實施該第一定位步驟後,開始從該噴射噴嘴噴射加工液,其後,使該保持台及該噴射噴嘴沿著該加工進給方向相對地移動,藉此以該加工液沿著該第一加工預定線對該被加工物進行加工;第二定位步驟,其在實施該第一加工步驟後,以該旋轉單元使該保持台旋轉,使該被加工物的該第二方向對準該加工進給方向,且將該噴射噴嘴定位在該第二加工預定線的一端;第二加工步驟,其在實施該第二定位步驟後,使該保持台及該噴射噴嘴沿著該加工進給方向相對地移動,以從該噴射噴嘴所噴射的該加工液沿著該第二加工預定線對該被加工物進行加工,並且,該第二定位步驟中,以在該保持台旋轉中將該加工液持續噴射至該被加工物之方式,使該保持台及該噴射噴嘴相對地移動,在該加工裝置中預先登錄以下位置:該被加工物在該第一加工步驟開始時及結束時的該噴射噴嘴的位置、在該第二加工步驟開始時及結束時的該噴射噴嘴的位置、各自的該第一加工預定線及該第二加工預定線中的加工開始位置與加工結束位置,算出從該第一加工步驟結束時的位置至該第二加工步驟開始時的位置為止之該噴射噴嘴的軌跡, 在該第二定位步驟中,使該保持台旋轉且同時對準該軌跡,使該保持台及該噴射噴嘴沿著X軸方向及Y軸方向相對地移動。 A processing method that uses a processing device to process a workpiece. The processing device is provided with: a holding table having a holding surface for holding the workpiece; and a spray nozzle that sprays the workpiece held by the holding table. machining fluid; a machining feed unit that relatively moves the holding table and the injection nozzle along the machining feed direction; and a rotation unit that rotates the holding table around an axis along a direction perpendicular to the holding surface, Furthermore, the surface of the workpiece is provided with a first planned processing line along a first direction and a second planned processing line along a second direction intersecting the first direction. The processing method is characterized by: a holding step, which uses the holding table to hold the workpiece; a first positioning step, which after performing the holding step, uses the rotation unit to rotate the holding table so that the first direction of the workpiece is aligned with the machining feed direction, and positioning the injection nozzle at one end of the first planned processing line; the first processing step, after implementing the first positioning step, starts to inject the processing fluid from the injection nozzle, and then causes the The holding table and the injection nozzle move relatively along the processing feed direction, thereby processing the workpiece along the first planned processing line with the processing fluid; the second positioning step is to perform the first After the processing step, the rotation unit is used to rotate the holding table, so that the second direction of the processed object is aligned with the processing feed direction, and the injection nozzle is positioned at one end of the second planned processing line; second The processing step includes, after implementing the second positioning step, relatively moving the holding table and the injection nozzle along the processing feed direction so that the processing fluid sprayed from the injection nozzle moves along the second processing plan. The workpiece is processed in a line, and in the second positioning step, the holding table and the injection nozzle are relatively moved in such a manner that the machining fluid is continuously sprayed to the workpiece while the holding table is rotating. , the following positions are registered in advance in the processing device: the positions of the injection nozzle at the beginning and end of the first processing step of the workpiece, and the positions of the injection nozzle at the beginning and end of the second processing step. , the processing start position and the processing end position in each of the first planned processing line and the second planned processing line, and the position from the position at the end of the first processing step to the position at the start of the second processing step is calculated. the trajectory of the spray nozzle, In the second positioning step, the holding platform is rotated and aligned with the trajectory, and the holding platform and the injection nozzle are relatively moved along the X-axis direction and the Y-axis direction. 如請求項1之加工方法,其中,在該被加工物的該表面設定多條該第一加工預定線及多條該第二加工預定線,該被加工物在該表面具有元件區域與圍繞該元件區域的外周剩餘區域,該元件區域在由該第一加工預定線與該第二加工預定線所劃分之各區域分別配設有元件,該第二定位步驟中,在該保持台旋轉中將該加工液持續噴射至該被加工物的該外周剩餘區域。 The processing method of claim 1, wherein a plurality of the first planned processing lines and a plurality of the second planned processing lines are set on the surface of the workpiece, and the workpiece has a component area on the surface and surrounding the The remaining peripheral area of the component area, which is provided with components in each area divided by the first planned processing line and the second planned processing line. In the second positioning step, the holding table is rotated while the components are arranged. The machining fluid is continuously sprayed to the remaining peripheral area of the workpiece.
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