TWI811737B - laminate - Google Patents

laminate Download PDF

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Publication number
TWI811737B
TWI811737B TW110125744A TW110125744A TWI811737B TW I811737 B TWI811737 B TW I811737B TW 110125744 A TW110125744 A TW 110125744A TW 110125744 A TW110125744 A TW 110125744A TW I811737 B TWI811737 B TW I811737B
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layer
base material
antifouling
refractive index
laminated body
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TW110125744A
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Chinese (zh)
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TW202208884A (en
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宮本幸大
梨木智剛
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日商日東電工股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3464Sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

本發明之積層體朝向厚度方向一側依序具備基材層、及防污層。防污層包含具有全氟聚醚基之烷氧基矽烷化合物。藉由掠角入射X射線繞射法中之面內繞射測定所測得之防污層之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4 Å-1 以上。The laminated body of the present invention includes a base material layer and an antifouling layer in order toward one side in the thickness direction. The antifouling layer contains an alkoxysilane compound having a perfluoropolyether group. The full amplitude at half maximum of the peaks originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction of the antifouling layer measured by in-plane diffraction measurement in the grazing angle incident X-ray diffraction method is: 0.4 Å -1 or more.

Description

積層體laminated body

本發明係關於一種積層體,詳細而言關於一種具備防污層之積層體。 The present invention relates to a laminated body, specifically a laminated body provided with an antifouling layer.

已知,先前為了防止手漬、指紋等污漬之附著而於膜基材之表面或光學膜等光學零件之表面形成防污層。 It is known that an antifouling layer has been formed on the surface of a film base material or on the surface of optical components such as optical films in order to prevent the adhesion of stains such as hand stains and fingerprints.

作為此種具備防污層之光學膜,例如提出有一種依序具備膜基材、抗反射層、及防污層之抗反射膜(例如參照專利文獻1)。 As such an optical film provided with an antifouling layer, for example, an antireflective film including a film base material, an antireflective layer, and an antifouling layer is proposed in this order (see, for example, Patent Document 1).

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Document]

[專利文獻1]日本專利特開2020-52221號公報 [Patent Document 1] Japanese Patent Application Publication No. 2020-52221

另一方面,若將附著於防污層之污漬擦除,則存在防污層之防污性降低之不良情況。 On the other hand, if stains adhering to the antifouling layer are wiped off, the antifouling properties of the antifouling layer may be adversely affected.

本發明提供一種即便將附著於防污層之污漬擦除後,亦能夠抑制防污層之防污性降低之積層體。 The present invention provides a laminate that can suppress the deterioration of the antifouling properties of the antifouling layer even after the stains attached to the antifouling layer are wiped off.

本發明[1]係一種積層體,其朝向厚度方向一側依序具備基材層、及防污層,上述防污層包含具有全氟聚醚基之烷氧基矽烷化合物,且藉由掠角入射X射線繞射法中之面內繞射測定所測得之上述防污層之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上。 The present invention [1] is a laminated body which has a base material layer and an antifouling layer in order toward one side in the thickness direction. The antifouling layer contains an alkoxysilane compound having a perfluoropolyether group and is formed by grazing The full amplitude at half maximum of the peaks originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction of the antifouling layer measured by the in-plane diffraction measurement using the angle-incidence X-ray diffraction method is 0.4Å. -1 or more.

本發明[2]包含如上述[1]中記載之積層體,其中於上述防污層之厚度方向另一面具備底塗層。 The present invention [2] includes the laminated body according to the above [1], which is provided with a primer layer on the other surface in the thickness direction of the antifouling layer.

本發明[3]包含如上述[2]中記載之積層體,其中上述底塗層為包含二氧化矽之層。 The present invention [3] includes the laminated body according to the above [2], wherein the undercoat layer is a layer containing silica.

本發明[4]包含如上述[3]中記載之積層體,其中上述防污層係具有全氟聚醚基之烷氧基矽烷化合物經由矽氧烷鍵形成於上述底塗層上。 The present invention [4] includes the laminated body as described in the above [3], wherein the antifouling layer is an alkoxysilane compound having a perfluoropolyether group formed on the undercoat layer via a siloxane bond.

本發明[5]包含如上述[1]中記載之積層體,其中於上述基材層與上述防污層之間進而具備密接層及抗反射層。 The present invention [5] includes the laminated body according to the above [1], further including an adhesive layer and an anti-reflection layer between the base material layer and the antifouling layer.

本發明[6]包含如上述[5]中記載之積層體,其中上述抗反射層包含2層以上具有互不相同之折射率之層。 The present invention [6] includes the laminated body according to the above [5], wherein the anti-reflection layer includes two or more layers having mutually different refractive indexes.

本發明[7]包含如上述[6]中記載之積層體,其中上述抗反射層包含選自由金屬、金屬氧化物、金屬氮化物所組成之群中之1種。 The present invention [7] includes the laminate according to the above [6], wherein the antireflection layer contains one selected from the group consisting of metal, metal oxide, and metal nitride.

本發明[8]包含如上述[6]或[7]中記載之積層體,其中上述抗反射層之厚度方向一面為包含二氧化矽之層。 The present invention [8] includes the laminated body according to the above [6] or [7], wherein one side of the antireflection layer in the thickness direction is a layer containing silicon dioxide.

本發明之積層體之防污層包含具有全氟聚醚基之烷氧基矽烷化合物。又,於防污層中,藉由掠角入射X射線繞射法中之面內繞射測定所測得之防污層之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上。因此,即便將附著於防污層之污漬擦除後,亦能夠抑制防污層之防污性降低。 The antifouling layer of the laminate of the present invention contains an alkoxysilane compound having a perfluoropolyether group. Furthermore, in the antifouling layer, the periodic arrangement of the perfluoropolyether groups in the in-plane direction measured by in-plane diffraction measurement in the grazing angle incident X-ray diffraction method The full amplitude of the half peak of the wave peak is more than 0.4Å -1 . Therefore, even after the stains attached to the antifouling layer are wiped off, the antifouling properties of the antifouling layer can be suppressed from decreasing.

1:積層體 1: Laminated body

2:基材層 2: Base material layer

3:防污層 3: Antifouling layer

4:基材 4:Substrate

5:功能層 5: Functional layer

6:密接層 6: Adhesive layer

7:光學功能層 7: Optical functional layer

11:第1高折射率層 11: 1st high refractive index layer

12:第1低折射率層 12: 1st low refractive index layer

13:第2高折射率層 13: 2nd high refractive index layer

14:第2低折射率層 14: 2nd low refractive index layer

15:底塗層 15: Base coat

20:具有全氟聚醚基之烷氧基矽烷化合物 20: Alkoxysilane compound with perfluoropolyether group

20A:相對於基材層2垂直地配向之烷氧基矽烷化合物 20A: Alkoxysilane compound vertically aligned with respect to substrate layer 2

20B:相對於基材層2傾斜地配向之烷氧基矽烷化合物 20B: Alkoxysilane compound tiltedly aligned with respect to base material layer 2

20C:相對於基材層2平行地配向之烷氧基矽烷化合物 20C: Alkoxysilane compound aligned parallel to base material layer 2

21:群 21:Group

21A:具備複數個相對於基材層2垂直地配向之烷氧基矽烷化合物20A之群 21A: A group of a plurality of alkoxysilane compounds 20A that are vertically aligned with respect to the base material layer 2

21B:具備複數個相對於基材層2傾斜地配向之烷氧基矽烷化合物20B之群 21B: A group of a plurality of alkoxysilane compounds 20B that are obliquely aligned with respect to the base material layer 2

21C:具備複數個相對於基材層2平行地配向之烷氧基矽烷化合物20C之群 21C: A group of a plurality of alkoxysilane compounds 20C aligned in parallel with respect to the base material layer 2

22:區域 22:Area

圖1表示本發明之積層體之第1實施方式之剖視圖。 FIG. 1 shows a cross-sectional view of the first embodiment of the laminated body of the present invention.

圖2A~圖2C表示本發明之積層體之第1實施方式之製造方法的一實施方式。圖2A表示於第1步驟中準備基材之步驟。圖2B表示於第1步驟中在基材上配置硬塗層(功能層)之步驟。圖2C表示於基材層上配置防污層之第2步驟。 2A to 2C illustrate an embodiment of the manufacturing method of the first embodiment of the laminated body of the present invention. Figure 2A shows the step of preparing the substrate in the first step. FIG. 2B shows the step of arranging a hard coat layer (functional layer) on the base material in the first step. Figure 2C shows the second step of arranging the antifouling layer on the base material layer.

圖3A~圖3G表示沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3A表示沈積於基材層之具有單個全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3B表示沈積於基材層之具有複數個全氟聚醚基 之烷氧基矽烷化合物的說明圖。圖3C表示防污層之半峰全幅值較小之情形時之沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3D表示防污層之半峰全幅值較大之情形時之沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3E表示防污層之積分強度比較小之情形時之沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3F表示防污層之積分強度比較大之情形時之沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。圖3G表示防污層之半峰全幅值為特定範圍以上且防污層之積分強度比為特定範圍以下之情形時之沈積於基材層之具有全氟聚醚基之烷氧基矽烷化合物的說明圖。 3A to 3G illustrate illustrations of an alkoxysilane compound having a perfluoropolyether group deposited on a substrate layer. FIG. 3A shows an illustration of an alkoxysilane compound having a single perfluoropolyether group deposited on a substrate layer. Figure 3B shows a layer with multiple perfluoropolyether groups deposited on the substrate layer. Illustration of an alkoxysilane compound. 3C shows an explanatory diagram of an alkoxysilane compound having a perfluoropolyether group deposited on the base material layer when the half-maximum full-width value of the antifouling layer is small. 3D shows an explanatory diagram of an alkoxysilane compound having a perfluoropolyether group deposited on the base material layer when the half-maximum full-width value of the antifouling layer is large. 3E shows an explanatory diagram of an alkoxysilane compound having a perfluoropolyether group deposited on the base material layer when the integrated intensity of the antifouling layer is relatively small. 3F shows an explanatory diagram of an alkoxysilane compound having a perfluoropolyether group deposited on the base material layer when the integrated intensity of the antifouling layer is relatively large. Figure 3G shows an alkoxysilane compound having a perfluoropolyether group deposited on the base material layer when the half-maximum full-width value of the antifouling layer is above a specific range and the integrated intensity ratio of the antifouling layer is below a specific range. illustrative diagram.

圖4表示本發明之積層體之第2實施方式之剖視圖。 FIG. 4 shows a cross-sectional view of the second embodiment of the laminated body of the present invention.

圖5A~圖5D表示本發明之積層體之第2實施方式之製造方法的一實施方式。圖5A表示於第3步驟中準備基材之步驟。圖5B表示於第3步驟中在基材上配置硬塗層(功能層)之步驟。圖5C表示於基材層上依序配置密接層及光學功能層(抗反射層)之第4步驟。圖5D表示於光學功能層(抗反射層)上配置防污層之第5步驟。 5A to 5D illustrate an embodiment of a manufacturing method of the second embodiment of the laminated body of the present invention. Figure 5A shows the step of preparing the substrate in step 3. FIG. 5B shows the step of arranging a hard coat layer (functional layer) on the substrate in the third step. Figure 5C shows the fourth step of sequentially arranging the adhesive layer and the optical functional layer (anti-reflective layer) on the base material layer. Figure 5D shows the fifth step of arranging the antifouling layer on the optical functional layer (anti-reflection layer).

圖6表示本發明之積層體之第1實施方式之變化例(於基材層與防污層之間進而具備底塗層之積層體)之剖視圖。 FIG. 6 shows a cross-sectional view of a variation of the first embodiment of the laminate of the present invention (a laminate further provided with a primer layer between the base material layer and the antifouling layer).

圖7表示實施例2之面內繞射(in plane)測定之結果。 FIG. 7 shows the results of in-plane diffraction measurement in Example 2.

圖8表示實施例2之面內繞射(in plane)測定之擬合之結果。 FIG. 8 shows the fitting results of the in-plane diffraction measurement in Example 2.

1.第1實施方式 1. First Embodiment

參照圖1對本發明之積層體之第1實施方式進行說明。 The first embodiment of the laminated body of the present invention will be described with reference to FIG. 1 .

於圖1中,紙面上下方向為上下方向(厚度方向),紙面上側為上側(厚度方向一側),紙面下側為下側(厚度方向另一側)。又,紙面左右方向及深度方向為與上下方向正交之面方向。具體依據各圖之方向箭頭。 In FIG. 1 , the upper and lower directions on the paper are the up and down directions (thickness direction), the upper side of the paper is the upper side (one side in the thickness direction), and the lower side of the paper is the lower side (the other side in the thickness direction). In addition, the left-right direction and the depth direction of the paper surface are the surface directions orthogonal to the up-down direction. Please refer to the direction arrows in each figure for details.

<積層體> <Laminated body>

積層體1具有膜形狀(包含薄片形狀),該膜形狀具有特定厚度。積層體1沿與厚度方向正交之面方向延伸。積層體1具有平坦之上表面及平坦之下表面。 The laminated body 1 has a film shape (including a sheet shape) having a specific thickness. The laminated body 1 extends in the plane direction orthogonal to the thickness direction. The laminated body 1 has a flat upper surface and a flat lower surface.

如圖1所示,積層體1朝向厚度方向一側依序具備基材層2、及防污層3。更具體而言,積層體1具備基材層2、及直接配置於基材層2之上表面(厚度方向一面)之防污層3。 As shown in FIG. 1 , the laminated body 1 includes a base material layer 2 and an antifouling layer 3 in order toward one side in the thickness direction. More specifically, the laminated body 1 includes a base material layer 2 and an antifouling layer 3 disposed directly on the upper surface (one surface in the thickness direction) of the base material layer 2 .

積層體1之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。 The total light transmittance (JIS K 7375-2008) of the laminated body 1 is, for example, 80% or more, preferably 85% or more.

積層體1之厚度例如為300μm以下,較佳為200μm以下,又,例如為10μm以上,較佳為30μm以上。 The thickness of the laminated body 1 is, for example, 300 μm or less, preferably 200 μm or less, and, for example, 10 μm or more, preferably 30 μm or more.

<基材層> <Substrate layer>

基材層2係用於確保積層體1之機械強度之基材。 The base material layer 2 is a base material for ensuring the mechanical strength of the laminated body 1 .

基材層2具有膜形狀。基材層2以與防污層3之下表面接觸之方式配置於防污層3之整個下表面。 The base material layer 2 has a film shape. The base material layer 2 is disposed on the entire lower surface of the antifouling layer 3 so as to be in contact with the lower surface of the antifouling layer 3 .

基材層2具備基材4及功能層5。具體而言,基材層2朝向厚度方向一側依序具備基材4、及功能層5。 The base material layer 2 includes a base material 4 and a functional layer 5 . Specifically, the base material layer 2 includes a base material 4 and a functional layer 5 in order toward one side in the thickness direction.

基材層2之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。 The total light transmittance (JIS K 7375-2008) of the base material layer 2 is, for example, 80% or more, preferably 85% or more.

<基材> <Substrate>

基材4係藉由防污層3賦予防污性之被處理體。 The base material 4 is an object to be treated that is provided with antifouling properties by the antifouling layer 3 .

基材4具有膜形狀。基材4較佳為具有可撓性。基材4以與功能層5之下表面接觸之方式配置於功能層5之整個下表面。 The base material 4 has a film shape. The base material 4 is preferably flexible. The base material 4 is disposed on the entire lower surface of the functional layer 5 so as to be in contact with the lower surface of the functional layer 5 .

作為基材4,例如可例舉:高分子膜。作為高分子膜之材料,例如可例舉:聚酯樹脂、(甲基)丙烯酸樹脂、烯烴樹脂、聚碳酸酯樹脂、聚醚碸樹脂、聚芳酯樹脂、三聚氰胺樹脂、聚醯胺樹脂、聚醯亞胺樹脂、纖維素樹脂、及聚苯乙烯樹脂。作為聚酯樹脂,例如可例舉:聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、及聚萘二甲酸乙二酯。作為(甲基)丙烯酸樹脂,例如可例舉:聚甲基丙烯酸酯。作為烯烴樹脂,例如可例舉:聚乙烯、聚丙烯、及環烯烴聚合物。作為纖維素樹脂,例如可例舉:三乙醯纖維素。作為高分子膜之材料,較佳為例舉纖維素樹脂,更佳為例舉三乙醯纖維素。 Examples of the base material 4 include a polymer film. Examples of materials for the polymer film include polyester resin, (meth)acrylic resin, olefin resin, polycarbonate resin, polyether resin, polyarylate resin, melamine resin, polyamide resin, polyamide resin, Imide resin, cellulose resin, and polystyrene resin. Examples of the polyester resin include polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate. Examples of the (meth)acrylic resin include polymethacrylate. Examples of the olefin resin include polyethylene, polypropylene, and cycloolefin polymers. Examples of the cellulose resin include triacetyl cellulose. As the material of the polymer membrane, cellulose resin is preferably used, and triacetyl cellulose is more preferably used.

基材4之厚度例如為1μm以上,較佳為5μm以上,更佳為10μm以上,又,例如為200μm以下,較佳為150μm以下,更佳為100μm以下。 The thickness of the base material 4 is, for example, 1 μm or more, preferably 5 μm or more, more preferably 10 μm or more, and, for example, 200 μm or less, preferably 150 μm or less, and more preferably 100 μm or less.

基材4之厚度可使用針盤量規(PEACOCK公司製造,「DG-205」)進行測定。 The thickness of the base material 4 can be measured using a dial gauge (manufactured by PEACOCK, "DG-205").

<功能層> <Functional layer>

功能層5具有膜形狀。功能層5配置於基材4之厚度方向一面。 Functional layer 5 has a film shape. The functional layer 5 is arranged on one side of the base material 4 in the thickness direction.

作為功能層5,例如可例舉:硬塗層。 Examples of the functional layer 5 include a hard coat layer.

於此種情形時,基材層2朝向厚度方向一側依序具備基材4、及硬塗層。 In this case, the base material layer 2 includes the base material 4 and the hard coat layer in order toward the thickness direction side.

以下說明中,係針對功能層5為硬塗層之情形進行說明。 In the following description, the case where the functional layer 5 is a hard coat layer will be described.

硬塗層係用於抑制基材4中產生損傷之保護層。 The hard coat layer is a protective layer used to suppress damage to the base material 4 .

硬塗層例如由硬塗組合物形成。 The hard coat layer is formed of, for example, a hard coat composition.

硬塗組合物包含樹脂、及視需要之粒子。即,硬塗層包含樹脂、及視 需要之粒子。 The hard coating composition contains resin, and optionally particles. That is, the hard coat layer includes resin, visual Particles needed.

作為樹脂,例如可例舉:熱塑性樹脂、及硬化性樹脂。作為熱塑性樹脂,例如可例舉:聚烯烴樹脂。 Examples of the resin include thermoplastic resin and curable resin. Examples of the thermoplastic resin include polyolefin resin.

作為硬化性樹脂,例如可例舉:藉由活性能量線(例如紫外線、及電子束)之照射而硬化之活性能量線硬化性樹脂、及藉由加熱而硬化之熱硬化性樹脂。作為硬化性樹脂,較佳為例舉:活性能量線硬化性樹脂。 Examples of the curable resin include an active energy ray curable resin that is cured by irradiation of active energy rays (such as ultraviolet rays and electron beams) and a thermosetting resin that is cured by heating. As the curable resin, a preferred example is an active energy ray curable resin.

作為活性能量線硬化性樹脂,例如可例舉:(甲基)丙烯酸系紫外線硬化性樹脂、胺基甲酸酯樹脂、三聚氰胺樹脂、醇酸樹脂、矽氧烷系聚合物、及有機矽烷縮合物。作為活性能量線硬化性樹脂,較佳為例舉:(甲基)丙烯酸系紫外線硬化性樹脂。 Examples of the active energy ray-curable resin include: (meth)acrylic ultraviolet curable resin, urethane resin, melamine resin, alkyd resin, siloxane-based polymer, and organosilane condensate . As the active energy ray curable resin, a preferred example is a (meth)acrylic ultraviolet curable resin.

又,樹脂例如可包含日本專利特開2008-88309號公報中記載之反應性稀釋劑。具體而言,樹脂可包含多官能(甲基)丙烯酸酯。 Moreover, the resin may contain the reactive diluent described in Japanese Patent Application Laid-Open No. 2008-88309, for example. Specifically, the resin may include polyfunctional (meth)acrylates.

樹脂可單獨使用或將2種以上併用。 The resin can be used alone or in combination of two or more types.

作為粒子,例如可例舉:金屬氧化物微粒子及有機系微粒子。作為金屬氧化物微粒子之材料,例如可例舉:二氧化矽、氧化鋁、二氧化鈦、氧化鋯、氧化鈣、氧化錫、氧化銦、氧化鎘、及氧化銻。作為有機系微粒子之材料,可例舉:聚甲基丙烯酸甲酯、聚矽氧、聚苯乙烯、聚胺基甲酸酯、 丙烯酸-苯乙烯共聚物、苯并胍胺、三聚氰胺、及聚碳酸酯。作為有機系微粒子,較佳為例舉:聚甲基丙烯酸甲酯。 Examples of the particles include metal oxide fine particles and organic fine particles. Examples of materials for the metal oxide fine particles include silicon dioxide, aluminum oxide, titanium dioxide, zirconium oxide, calcium oxide, tin oxide, indium oxide, cadmium oxide, and antimony oxide. Examples of materials for organic fine particles include: polymethyl methacrylate, polysiloxane, polystyrene, polyurethane, Acrylic-styrene copolymer, benzoguanamine, melamine, and polycarbonate. As the organic fine particles, a preferred example is polymethylmethacrylate.

使硬塗層中包含粒子之目的例如為賦予防眩性、提昇密接性、提昇硬度、調整折射率等。 The purpose of including particles in the hard coat layer is, for example, to provide anti-glare properties, improve adhesion, increase hardness, and adjust refractive index.

粒子可單獨使用或將2種以上併用。 Particles can be used individually or in combination of 2 or more types.

又,硬塗組合物中可視需要以適當之比率調配觸變性賦予劑(例如有機黏土)、光聚合起始劑、填充劑、及調平劑。又,硬塗組合物可藉由公知之溶劑進行稀釋。 In addition, a thixotropy imparting agent (such as organoclay), a photopolymerization initiator, a filler, and a leveling agent may be blended in an appropriate ratio in the hard coating composition if necessary. In addition, the hard coating composition can be diluted with a known solvent.

又,於形成硬塗層時,將硬塗組合物之稀釋液塗佈於基材4之厚度方向一面,並視需要進行加熱使其乾燥,詳情將於後文進行敍述。乾燥後例如藉由活性能量線照射、或加熱使硬塗組合物硬化。 When forming the hard coat layer, a diluted solution of the hard coat composition is applied to one side of the base material 4 in the thickness direction, and is heated and dried if necessary. Details will be described later. After drying, the hard coat composition is hardened by, for example, active energy ray irradiation or heating.

藉此,形成硬塗層。 Thereby, a hard coat layer is formed.

硬塗層之厚度為1μm以上,又,為50μm以下,較佳為30μm以下。 The thickness of the hard coat layer is 1 μm or more and 50 μm or less, preferably 30 μm or less.

<防污層> <Antifouling layer>

防污層3係用於防止自基材層2之厚度方向一側附著污垢、指紋等污 漬之層。 The antifouling layer 3 is used to prevent dirt, fingerprints and other contaminants from adhering to one side in the thickness direction of the base material layer 2 stain layer.

防污層3具有膜形狀。防污層3以與基材層2之上表面接觸之方式配置於基材層2之整個上表面。 The antifouling layer 3 has a film shape. The antifouling layer 3 is disposed on the entire upper surface of the base material layer 2 in contact with the upper surface of the base material layer 2 .

防污層3係由具有全氟聚醚基之烷氧基矽烷化合物形成。換言之,防污層3包含具有全氟聚醚基之烷氧基矽烷化合物,較佳為由具有全氟聚醚基之烷氧基矽烷化合物所構成。 The antifouling layer 3 is formed of an alkoxysilane compound having a perfluoropolyether group. In other words, the antifouling layer 3 includes an alkoxysilane compound having a perfluoropolyether group, and is preferably composed of an alkoxysilane compound having a perfluoropolyether group.

作為具有全氟聚醚基之烷氧基矽烷化合物,例如可例舉:下述通式(1)所表示之化合物。 Examples of the alkoxysilane compound having a perfluoropolyether group include compounds represented by the following general formula (1).

R1-R2-X-(CH2)m-Si(OR3)3 (1) R 1 -R 2 -X-(CH 2 ) m -Si(OR 3 ) 3 (1)

於通式(1)中,R1表示烷基中之一個以上氫原子被取代為氟原子而成之直鏈狀或支鏈狀之氟化烷基(碳數例如為1以上20以下),較佳為表示烷基之所有氫原子被取代為氟原子而成之全氟烷基。 In the general formula (1), R 1 represents a linear or branched fluorinated alkyl group (carbon number, for example, 1 to 20) in which one or more hydrogen atoms in the alkyl group are substituted with a fluorine atom, Preferably, it represents a perfluoroalkyl group in which all hydrogen atoms of the alkyl group are replaced by fluorine atoms.

R2表示包含至少一個全氟聚醚(PFPE)基之重複結構之結構,較佳為表示包含兩個PFPE基之重複結構之結構。作為PFPE基之重複結構,例如可例舉:直鏈狀PFPE基之重複結構、及支鏈狀PFPE基之重複結構。作為直鏈狀PFPE基之重複結構,例如可例舉:由-(OCnF2n)p-所表示之結構(n表示1以上20以下之整數,p表示1以上50以下之整數;以下相同)。作為支鏈狀PFPE基之重複結構,例如可例舉:由-(OC(CF3)2)p-所表示之結 構、及由-(OCF2CF(CF3)CF2)p-所表示之結構。作為PFPE基之重複結構,較佳為例舉直鏈狀PFPE基之重複結構,更佳為例舉-(OCF2)p-及-(OC2F4)p-。 R 2 represents a structure containing a repeating structure of at least one perfluoropolyether (PFPE) group, preferably a structure containing a repeating structure of two PFPE groups. Examples of the repeating structure of the PFPE group include a repeating structure of a linear PFPE group and a repeating structure of a branched PFPE group. As a repeating structure of a linear PFPE group, for example, a structure represented by -(OC n F 2n ) p - (n represents an integer from 1 to 20, p represents an integer from 1 to 50; the same applies to the following ). Examples of the repeating structure of the branched PFPE group include a structure represented by -(OC(CF 3 ) 2 ) p - and a structure represented by -(OCF 2 CF(CF 3 )CF 2 ) p - structure. The repeating structure of the PFPE group is preferably a repeating structure of a linear PFPE group, and more preferably -(OCF 2 ) p - and -(OC 2 F 4 ) p -.

R3表示碳數1以上4以下烷基,較佳為表示甲基。 R 3 represents an alkyl group having 1 to 4 carbon atoms, preferably a methyl group.

X表示醚基、羰基、胺基、或醯胺基,較佳為表示醚基。 X represents an ether group, a carbonyl group, an amine group, or an amide group, and preferably represents an ether group.

m表示1以上之整數。又,m表示較佳為20以下、更佳為10以下、進而較佳為5以下之整數。 m represents an integer above 1. Moreover, m represents an integer which is preferably 20 or less, more preferably 10 or less, and still more preferably 5 or less.

此種具有全氟聚醚基之烷氧基矽烷化合物之中,較佳為使用下述通式(2)所表示之化合物。 Among such alkoxysilane compounds having a perfluoropolyether group, a compound represented by the following general formula (2) is preferably used.

CF3-(OCF2)q-(OC2F4)r-O-(CH2)3-Si(OCH3)3 (2) CF 3 -(OCF 2 ) q -(OC 2 F 4 ) r -O-(CH 2 ) 3 -Si(OCH 3 ) 3 (2)

於通式(2)中,q表示1以上50以下之整數,r表示1以上50以下之整數。 In the general formula (2), q represents an integer ranging from 1 to 50, and r represents an integer ranging from 1 to 50.

具有全氟聚醚基之烷氧基矽烷化合物可使用市售品,具體而言,可例舉:OPTOOL UD509(上述通式(2)所表示之具有全氟聚醚基之烷氧基矽烷化合物,DAIKIN INDUSTRIES公司製造)、OPTOOL UD120(DAIKIN INDUSTRIES股份有限公司製造)、及KY1903-1(信越化學製造)。 As the alkoxysilane compound having a perfluoropolyether group, commercially available products can be used. Specifically, OPTOOL UD509 (an alkoxysilane compound having a perfluoropolyether group represented by the above general formula (2)) can be used. , manufactured by DAIKIN INDUSTRIES Co., Ltd.), OPTOOL UD120 (manufactured by DAIKIN INDUSTRIES Co., Ltd.), and KY1903-1 (manufactured by Shin-Etsu Chemical).

具有全氟聚醚基之烷氧基矽烷化合物可單獨使用或將2種以上併用。 The alkoxysilane compound having a perfluoropolyether group can be used alone or in combination of two or more.

防污層3係藉由下文所述之方法而形成。 The antifouling layer 3 is formed by the method described below.

防污層3之厚度例如為1nm以上,較佳為5nm以上,又,例如為30nm以下,較佳為20nm以下,更佳為15nm以下,進而較佳為10nm以下。 The thickness of the antifouling layer 3 is, for example, 1 nm or more, preferably 5 nm or more, and, for example, 30 nm or less, preferably 20 nm or less, more preferably 15 nm or less, further preferably 10 nm or less.

防污層3之厚度可藉由螢光X射線(Rigaku製造ZXS PrimusII)進行測定。 The thickness of the antifouling layer 3 can be measured by fluorescent X-ray (ZXS PrimusII manufactured by Rigaku).

並且,防污層3之下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上,較佳為0.45Å-1以上,更佳為0.5Å-1以上,進而較佳為0.55Å-1以上,又,例如為0.8Å-1以下。 Furthermore, the antifouling layer 3 has periodic wave peaks originating from the perfluoropolyether groups in the in-plane direction measured by in-plane diffraction measurement in the grazing-angle incident X-ray diffraction method as described below. The full amplitude at half peak is 0.4Å -1 or more, preferably 0.45Å -1 or more, more preferably 0.5Å -1 or more, further preferably 0.55Å -1 or more, and, for example, 0.8Å -1 or less .

又,上述源自全氟聚醚基在面內方向上之週期排列性之波峰(波峰A4(於下文所述之實施例中詳述))於波數1.5~2.0Å-1之間被觀測到。 In addition, the above-mentioned peak originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction (peak A4 (detailed in the examples described below)) was observed at a wave number between 1.5~2.0Å -1 arrive.

又,較佳為藉由下文所述之試驗而測得之積分強度比例如為0.78以下,較佳為0.60以下,更佳為0.50以下,進而較佳為0.40以下,尤佳為0.35以下,最佳為0.30以下。 In addition, the integrated intensity ratio measured by the test described below is preferably 0.78 or less, preferably 0.60 or less, more preferably 0.50 or less, further preferably 0.40 or less, especially 0.35 or less, and most preferably 0.35 or less. The best value is below 0.30.

關於上述半峰全幅值及上述積分強度比,可藉由對具有全氟聚醚基之烷氧基矽烷化合物之種類、下文所述之第2步驟中之對基材層2之表面處理方法(於該表面處理方法為電漿處理之情形時,為電漿處理時使用之氣體之種類)、及該表面處理方法為電漿處理之情形時的電漿處理之輸出電力進行調整,而調整為上述特定值以上或上述特定值以下。 The above half-peak full amplitude and the above integrated intensity ratio can be determined by the type of alkoxysilane compound having a perfluoropolyether group and the surface treatment method of the base material layer 2 in the second step described below. (When the surface treatment method is plasma treatment, it is the type of gas used in plasma treatment), and when the surface treatment method is plasma treatment, the output power of the plasma treatment is adjusted, and the adjustment It is more than the above-mentioned specific value or below the above-mentioned specific value.

又,下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之表示層狀積層結構之波峰之半峰全幅值例如為0.0Å-1以上,又,例如為1.0Å-1以下。 Furthermore, the half-peak full amplitude value of the wave peak indicating the layered laminated structure measured by in-plane diffraction measurement in the grazing angle incident X-ray diffraction method described below is, for example, 0.0Å -1 or more, and, For example, it is 1.0Å -1 or less.

又,上述表示層狀結構之波峰(波峰A1(於下文所述之實施例中詳述))於波數0.2~1.0Å-1之間被觀測到。 In addition, the above-mentioned wave peak indicating the layered structure (wave peak A1 (described in detail in the Examples described below)) was observed at a wave number between 0.2 and 1.0 Å -1 .

下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之表示層狀積層結構之波峰相對於下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之源自全氟聚醚基在面內方向上之週期排列性之波峰的強度比(下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之表示層狀積層結構之波峰/下文所述之藉由掠角入射X射線繞射法中之面內繞射測定所測得之源自全氟聚醚基在面內方向上之週期排列性之波峰)例如為0以上,又,例如為1.0以下。 The peaks indicating the layered laminated structure measured by in-plane diffraction measurement in the grazing angle incident X-ray diffraction method described below are relatively different from those in the grazing angle incident X-ray diffraction method described below. The intensity ratio of the wave peaks originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction measured by in-plane diffraction measurement (in-plane diffraction by grazing angle incident X-ray diffraction method described below) The wave peak indicating the layered laminated structure measured by radiometry/the in-plane direction derived from the perfluoropolyether group measured by the in-plane diffraction measurement in the grazing angle incident X-ray diffraction method described below The periodic peaks above) are, for example, 0 or more, and are, for example, 1.0 or less.

再者,關於面內繞射(in plane)測定(半峰全幅值及積分強度)之測定方 法,於下文所述之實施例中進行詳細說明。 Furthermore, regarding the measurement method of in-plane diffraction (full amplitude at half maximum and integrated intensity) The method is described in detail in the examples described below.

又,防污層3之水接觸角例如為100°以上,較佳為105°以上,又,例如為130°以下。 Moreover, the water contact angle of the antifouling layer 3 is, for example, 100° or more, preferably 105° or more, and, for example, 130° or less.

只要防污層3之水接觸角為上述下限以上,則能夠提昇防污層3之防污性。 As long as the water contact angle of the antifouling layer 3 is above the above-mentioned lower limit, the antifouling property of the antifouling layer 3 can be improved.

再者,關於防污層3之水接觸角之測定方法,於下文所述之實施例中進行詳細說明。 Furthermore, the method for measuring the water contact angle of the antifouling layer 3 will be described in detail in the Examples described below.

<積層體之製造方法> <Manufacturing method of laminated body>

參照圖2A~圖2C對積層體1之製造方法進行說明。 The manufacturing method of the laminated body 1 is demonstrated with reference to FIG. 2A-FIG. 2C.

積層體1之製造方法具備準備基材層2之第1步驟、及於基材層2配置防污層3之第2步驟。又,該製造方法中,例如以卷對卷方式依序配置各層。 The manufacturing method of the laminated body 1 includes the first step of preparing the base material layer 2 and the second step of arranging the antifouling layer 3 on the base material layer 2 . Furthermore, in this manufacturing method, each layer is sequentially arranged in a roll-to-roll manner, for example.

<第1步驟> <Step 1>

第1步驟中,如圖2A所示,首先準備基材4。 In the first step, as shown in FIG. 2A , the base material 4 is first prepared.

繼而,如圖2B所示,於基材4之厚度方向一面塗佈硬塗組合物之稀釋液,乾燥後藉由紫外線照射或加熱使硬塗組合物硬化。 Next, as shown in FIG. 2B , a diluted solution of the hard coating composition is applied to one surface in the thickness direction of the base material 4 , and after drying, the hard coating composition is hardened by ultraviolet irradiation or heating.

藉此,於基材4之厚度方向一面配置(形成)硬塗層(功能層5)。藉此,準備基材層2。 Thereby, the hard coat layer (functional layer 5) is arranged (formed) on one side of the base material 4 in the thickness direction. Thereby, the base material layer 2 is prepared.

<第2步驟> <Step 2>

第2步驟中,如圖2C所示,於基材層2上配置防污層3。具體而言,於基材層2之厚度方向一面配置防污層3。 In the second step, as shown in FIG. 2C , the antifouling layer 3 is disposed on the base material layer 2 . Specifically, the antifouling layer 3 is disposed on one side of the base material layer 2 in the thickness direction.

於基材層2上配置防污層3時,首先對基材層2之表面實施例如表面處理,以提昇基材層2與防污層3之密接性。作為表面處理,例如可例舉電暈處理、電漿處理、火焰處理、臭氧處理、底塗處理、輝光處理、及皂化處理,較佳為例舉電漿處理。 When disposing the antifouling layer 3 on the base material layer 2 , first, for example, surface treatment is performed on the surface of the base material layer 2 to improve the adhesion between the base material layer 2 and the antifouling layer 3 . Examples of the surface treatment include corona treatment, plasma treatment, flame treatment, ozone treatment, primer treatment, glow treatment, and saponification treatment, and a preferred example is plasma treatment.

作為電漿處理,例如可例舉利用氬氣之電漿處理、及利用氧氣之電漿處理,較佳為例舉利用氧氣之電漿處理。又,電漿處理之輸出電力例如為80W以上,又,例如為150W以下。 Examples of the plasma treatment include plasma treatment using argon gas and plasma treatment using oxygen gas. Preferably, plasma treatment using oxygen gas is used. In addition, the output power of the plasma treatment is, for example, 80W or more, or, for example, 150W or less.

並且,作為於基材層2上配置防污層3之方法,例如可例舉乾式塗佈法、及濕式塗佈法,就將上述積分強度比調整為特定值以下之觀點而言,較佳為例舉乾式塗佈法。作為乾式塗佈法,例如可例舉真空蒸鍍法、濺鍍法、及CVD(Chemical Vapor Deposition,化學氣相沈積),較佳為例舉真空蒸鍍法。 In addition, as a method of arranging the antifouling layer 3 on the base material layer 2, for example, a dry coating method and a wet coating method can be mentioned. From the viewpoint of adjusting the above-mentioned integrated intensity ratio to a specific value or less, it is relatively convenient. A good example is the dry coating method. Examples of dry coating methods include vacuum evaporation, sputtering, and CVD (Chemical Vapor Deposition), and a preferred example is vacuum evaporation.

真空蒸鍍法係將蒸鍍源(具有全氟聚醚基之烷氧基矽烷化合物)及基材 層2(功能層5)對向配置於真空腔室內,對蒸鍍源進行加熱使其蒸發或昇華,從而使蒸發或昇華之蒸鍍源沈積於基材層2(功能層5)之表面。 The vacuum evaporation method combines the evaporation source (alkoxysilane compound with perfluoropolyether group) and the substrate Layer 2 (functional layer 5) is arranged in a vacuum chamber facing each other, and the evaporation source is heated to evaporate or sublime, so that the evaporated or sublimated evaporation source is deposited on the surface of base material layer 2 (functional layer 5).

於真空蒸鍍法中,蒸鍍源(坩堝)之溫度例如為200℃以上,較佳為250℃以上,又,例如為300℃以下。 In the vacuum evaporation method, the temperature of the evaporation source (crucible) is, for example, 200°C or higher, preferably 250°C or higher, and, for example, 300°C or lower.

藉此,於基材層2之厚度方向一面配置防污層3,從而製造朝向厚度方向一側依序具備基材層2、及防污層3之積層體1。 Thereby, the antifouling layer 3 is disposed on one side of the base material layer 2 in the thickness direction, thereby producing a laminated body 1 including the base material layer 2 and the antifouling layer 3 in order toward the thickness direction side.

<作用效果> <Effect>

於該積層體1中,防污層3之藉由掠角入射X射線繞射法中之面內繞射測定所測得之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上。 In the laminate 1, the antifouling layer 3 has a periodic arrangement in the in-plane direction of the perfluoropolyether groups measured by in-plane diffraction measurement using the grazing-angle incident X-ray diffraction method. The full amplitude of the half peak of the wave peak is more than 0.4Å -1 .

只要上述半峰全幅值為上述下限以上,則即便將附著於防污層3之污漬擦除後,亦能夠抑制防污層3之防污性降低(防污耐久性優異)。 As long as the half-peak full width value is equal to or higher than the lower limit, even after the stains attached to the antifouling layer 3 are wiped off, the antifouling property of the antifouling layer 3 can be suppressed from being reduced (excellent antifouling durability).

詳細而言,於上述第2步驟中,如圖3A所示,具有全氟聚醚基之烷氧基矽烷化合物20沈積於基材層2之厚度方向一面。此種具有全氟聚醚基之烷氧基矽烷化合物20相對於基材層2進行配向。具體而言,可例舉:相對於基材層2垂直地配向之烷氧基矽烷化合物20A、相對於基材層2傾斜地配向之烷氧基矽烷化合物20B、及相對於基材層2平行地配向之烷氧基矽烷化合物20C。 Specifically, in the above second step, as shown in FIG. 3A , the alkoxysilane compound 20 having a perfluoropolyether group is deposited on one side of the base material layer 2 in the thickness direction. The alkoxysilane compound 20 having a perfluoropolyether group is aligned with respect to the base material layer 2 . Specifically, the alkoxysilane compound 20A is aligned perpendicularly with respect to the base material layer 2 , the alkoxysilane compound 20B is aligned obliquely with respect to the base material layer 2 , and the alkoxysilane compound 20B is aligned in parallel with respect to the base material layer 2 . Aligned alkoxysilane compound 20C.

又,如圖3B所示,沿同一方向配向之複數個具有全氟聚醚基之烷氧基矽烷化合物20沈積而構成群21。具體而言,可例舉:具備複數個相對於基材層2垂直地配向之烷氧基矽烷化合物20A之群21A、具備複數個相對於基材層2傾斜地配向之烷氧基矽烷化合物20B之群21B、及複數個相對於基材層2平行地配向之烷氧基矽烷化合物20C。 Furthermore, as shown in FIG. 3B , a plurality of alkoxysilane compounds 20 having perfluoropolyether groups aligned in the same direction are deposited to form a group 21 . Specifically, a group 21A including a plurality of alkoxysilane compounds 20A aligned perpendicularly with respect to the base material layer 2 and a group including a plurality of alkoxysilane compounds 20B oriented obliquely with respect to the base material layer 2 are exemplified. Group 21B, and a plurality of alkoxysilane compounds 20C aligned in parallel with respect to the base material layer 2 .

並且,上述半峰全幅值表示相關長之反數。即,其係表示1個1個群21之區域22之大小(換言之為具有全氟聚醚基之烷氧基矽烷化合物之氟烷基週期性地排列之量)的指標。 Furthermore, the above-mentioned half-peak full amplitude value represents the inverse of the correlation length. That is, it is an index indicating the size of the region 22 of each group 21 (in other words, the amount of periodic arrangement of the fluoroalkyl groups of the alkoxysilane compound having a perfluoropolyether group).

因此,若半峰全幅值變小,則如圖3C所示,意味著1個1個群21之區域22之大小變大。另一方面,若半峰全幅值變大,則如圖3D所示,意味著1個1個群21之區域22之大小變小。 Therefore, if the half-maximum full-width value becomes smaller, as shown in FIG. 3C , it means that the size of the region 22 of each group 21 becomes larger. On the other hand, if the half-maximum full-width value becomes larger, as shown in FIG. 3D , it means that the size of the region 22 of each group 21 becomes smaller.

並且,該防污層3之半峰全幅值為0.4Å-1以上。即,如圖3C所示,1個1個群21之區域22之大小相對較小。如此,即便將附著於防污層3之污漬擦除後,亦能夠抑制防污層3之防污性降低(防污耐久性優異)。 Furthermore, the half-peak full amplitude value of the antifouling layer 3 is 0.4Å -1 or more. That is, as shown in FIG. 3C , the size of the area 22 of each group 21 is relatively small. In this way, even after the stains adhering to the antifouling layer 3 are wiped off, the antifouling property of the antifouling layer 3 can be suppressed from decreasing (excellent antifouling durability).

又,於該積層體1中,較佳為防污層3之藉由下文所述之試驗所測得之積分強度比較佳為0.78以下。 Moreover, in the laminated body 1, it is preferable that the integrated strength ratio of the antifouling layer 3 measured by the test mentioned below is 0.78 or less.

詳細而言,於試驗中,藉由掠角入射X射線繞射法中之面內繞射(in plane)測定,針對防污層3測定歸屬於層狀結構(片層相對於基材層2平行 地配向之結構)之波峰之積分強度(第1面內繞射積分強度)。另外,藉由掠角入射X射線繞射法中之面內繞射測定,針對防污層測定源自全氟聚醚基在面內方向上之週期排列性之波峰的積分強度(第2面內繞射積分強度)。基於所獲得之第1面內繞射積分強度及第2面內繞射積分強度,算出第1面內繞射積分強度相對於第2面內繞射積分強度之積分強度比(第1面內繞射積分強度/第2面內繞射積分強度)。 Specifically, in the experiment, through the in-plane diffraction measurement in the grazing angle incident parallel The integrated intensity of the wave peak (the first in-plane diffraction integrated intensity) of the ground-aligned structure). In addition, by in-plane diffraction measurement in the grazing angle incident X-ray diffraction method, the integrated intensity of the peaks originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction was measured for the antifouling layer (second surface Internal diffraction integrated intensity). Based on the obtained first in-plane diffraction integrated intensity and the second in-plane diffraction integrated intensity, the integrated intensity ratio of the first in-plane diffraction integrated intensity to the second in-plane diffraction integrated intensity is calculated (the first in-plane diffraction integrated intensity Diffraction integrated intensity/second in-plane diffraction integrated intensity).

積分強度比係防污層3中具有全氟聚醚基之烷氧基矽烷化合物之氟烷基週期性地於面內方向上排列之量(以下,有時稱為排列量)的指標。若積分強度比變小,則如圖3E所示,意味著排列量變多。另一方面,若積分強度比變大,則如圖3F所示,意味著排列量變少。 The integrated intensity ratio is an index of the amount (hereinafter, sometimes referred to as the amount of arrangement) that the fluoroalkyl groups of the alkoxysilane compound having a perfluoropolyether group are periodically arranged in the in-plane direction in the antifouling layer 3 . If the integrated intensity ratio becomes smaller, as shown in FIG. 3E , it means that the amount of arrangement becomes larger. On the other hand, if the integrated intensity ratio becomes larger, as shown in FIG. 3F , it means that the amount of arrangement becomes smaller.

並且,如上所述,此種積分強度比係藉由用第1面內繞射積分強度除以第2面內繞射積分強度而算出。 And, as mentioned above, this integrated intensity ratio is calculated by dividing the first in-plane diffraction integrated intensity by the second in-plane diffraction integrated intensity.

第2面內繞射積分強度係源自具有全氟聚醚基之烷氧基矽烷化合物之全氟聚醚基在面內方向上之週期排列性之波峰的積分強度。若第2面內繞射積分強度變大,則意味著排列量變多。如此,亦對於將此種第2面內繞射積分強度直接用作排列量之指標進行研究。 The second in-plane diffraction integrated intensity is the integrated intensity derived from the periodically arranged wave peaks in the in-plane direction of the perfluoropolyether group of the alkoxysilane compound having a perfluoropolyether group. If the second in-plane diffraction integrated intensity increases, this means that the amount of arrangement increases. In this way, studies have also been conducted on using the second in-plane diffraction integrated intensity directly as an index of the alignment amount.

然而,於掠角入射X射線繞射測定中,背景值於每次測定時會因試樣之細微差別而產生變化,因此第2面內繞射積分強度亦會於每次測定時產生變化。因此,若將第2面內繞射積分強度之絕對值直接作為指標,則無 法統一求出排列量。 However, in grazing angle incident X-ray diffraction measurement, the background value will change each time due to subtle differences in the sample, so the integrated intensity of the second in-plane diffraction will also change each time it is measured. Therefore, if the absolute value of the integrated intensity of diffraction in the second plane is directly used as an index, then there is no The method can be used to find the permutation quantity uniformly.

因此,藉由用第1面內繞射積分強度除以第2面內繞射積分強度,以相對於第1面內繞射積分強度之相對值即積分強度比之形式表示第2面內繞射積分強度。藉此,能夠統一求出排列量。 Therefore, by dividing the first in-plane diffraction integrated intensity by the second in-plane diffraction integrated intensity, the second in-plane diffraction integrated intensity is expressed as a relative value to the first in-plane diffraction integrated intensity, that is, an integrated intensity ratio. Integrated radiation intensity. This makes it possible to obtain the amount of arrangement uniformly.

只要積分強度比為上述上限以下,則排列量變多。如此,即便將附著於防污層3之污漬擦除後,亦能夠抑制防污層3之防污性降低(防污耐久性優異)。 As long as the integrated intensity ratio is below the above upper limit, the amount of arrangement increases. In this way, even after the stains adhering to the antifouling layer 3 are wiped off, the antifouling property of the antifouling layer 3 can be suppressed from decreasing (excellent antifouling durability).

根據以上情況,防污層3之上述半峰全幅值為0.4Å-1以上,較佳為積分強度比為0.78以下。即,較佳為如圖3G所示,群21之區域22之大小較小且群21之區域22之量較多之態樣。 Based on the above situation, the half-peak full amplitude value of the antifouling layer 3 is 0.4Å -1 or more, and preferably the integrated intensity ratio is 0.78 or less. That is, as shown in FIG. 3G , it is preferable that the size of the area 22 of the group 21 is small and the amount of the area 22 of the group 21 is large.

又,防污耐久性可藉由下文所述之實施例中詳細說明之防污耐久性試驗進行評價。具體而言,只要藉由防污耐久性試驗而得之接觸角之變化量例如為30°以下,較佳為23°以下,更佳為15°以下,則防污層3之防污耐久性優異。 In addition, the antifouling durability can be evaluated by the antifouling durability test described in detail in the Examples described below. Specifically, as long as the change amount of the contact angle obtained by the antifouling durability test is, for example, 30° or less, preferably 23° or less, more preferably 15° or less, the antifouling durability of the antifouling layer 3 Excellent.

2.第2實施方式 2. Second embodiment

參照圖4對本發明之積層體之第2實施方式進行說明。 A second embodiment of the laminated body of the present invention will be described with reference to FIG. 4 .

再者,於第2實施方式中,針對與第1實施方式相同之構件及步驟附 相同之參照符號,並省略其詳細說明。又,除特別說明之情況以外,第2實施方式可發揮出與第1實施方式相同之作用效果。進而,可將第1實施方式及第2實施方式適當組合。 Furthermore, in the second embodiment, the same components and steps as those in the first embodiment are appended. The same reference symbols are used, and detailed descriptions thereof are omitted. In addition, unless otherwise stated, the second embodiment can exhibit the same functions and effects as those of the first embodiment. Furthermore, the first embodiment and the second embodiment can be combined appropriately.

<積層體> <Laminated body>

如圖4所示,積層體1朝向厚度方向一側依序具備基材層2、密接層6、光學功能層7、及防污層3。更具體而言,積層體1具備基材層2、直接配置於基材層2之上表面(厚度方向一面)之密接層6、直接配置於密接層6之上表面(厚度方向一面)之光學功能層7、及直接配置於光學功能層7之上表面(厚度方向一面)之防污層3。 As shown in FIG. 4 , the laminated body 1 includes a base material layer 2 , an adhesive layer 6 , an optical functional layer 7 , and an antifouling layer 3 in this order toward the thickness direction side. More specifically, the laminated body 1 includes a base material layer 2, an adhesion layer 6 directly disposed on the upper surface of the base material layer 2 (one surface in the thickness direction), and an optical fiber layer directly disposed on the upper surface (one surface in the thickness direction) of the adhesion layer 6. The functional layer 7 and the antifouling layer 3 are directly arranged on the upper surface (one side in the thickness direction) of the optical functional layer 7 .

積層體1之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。 The total light transmittance (JIS K 7375-2008) of the laminated body 1 is, for example, 80% or more, preferably 85% or more.

積層體1之厚度例如為250μm以下,較佳為200μm以下,又,例如為10μm以上,較佳為20μm以上。 The thickness of the laminated body 1 is, for example, 250 μm or less, preferably 200 μm or less, and, for example, 10 μm or more, preferably 20 μm or more.

<基材層> <Substrate layer>

基材層2為用於確保積層體1之機械強度之基材。 The base material layer 2 is a base material for ensuring the mechanical strength of the laminated body 1 .

基材層2具有膜形狀。基材層2以與光學功能層7之下表面接觸之方式配置於光學功能層7之整個下表面。 The base material layer 2 has a film shape. The base material layer 2 is disposed on the entire lower surface of the optical functional layer 7 so as to be in contact with the lower surface of the optical functional layer 7 .

基材層2與第1實施方式之基材層2相同,具備基材4及功能層5。 The base material layer 2 is the same as the base material layer 2 of the first embodiment, and includes a base material 4 and a functional layer 5 .

基材層2之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。 The total light transmittance (JIS K 7375-2008) of the base material layer 2 is, for example, 80% or more, preferably 85% or more.

<基材> <Substrate>

基材4具有膜形狀。基材4較佳為具有可撓性。基材4以與功能層5之下表面接觸之方式配置於功能層5之整個下表面。 The base material 4 has a film shape. The base material 4 is preferably flexible. The base material 4 is disposed on the entire lower surface of the functional layer 5 so as to be in contact with the lower surface of the functional layer 5 .

作為基材4,可例舉與第1實施方式之基材4相同之基材,較佳為例舉纖維素樹脂,更佳為例舉三乙醯纖維素。 Examples of the base material 4 include the same base material as the base material 4 of the first embodiment, preferably a cellulose resin, more preferably a triacetyl cellulose.

基材4之厚度與第1實施方式之基材4之厚度相同。 The thickness of the base material 4 is the same as the thickness of the base material 4 of the first embodiment.

<功能層> <Functional layer>

功能層5具有膜形狀。功能層5配置於基材4之厚度方向一面。 Functional layer 5 has a film shape. The functional layer 5 is arranged on one side of the base material 4 in the thickness direction.

作為功能層5,例如可例舉與第1實施方式相同之硬塗層。 Examples of the functional layer 5 include the same hard coat layer as in the first embodiment.

於此種情形時,基材層2朝向厚度方向一側依序具備基材4、及硬塗層。 In this case, the base material layer 2 includes the base material 4 and the hard coat layer in order toward the thickness direction side.

硬塗層之厚度與第1實施方式之硬塗層之厚度相同。 The thickness of the hard coat layer is the same as the thickness of the hard coat layer in the first embodiment.

<密接層> <Adhesive layer>

密接層6係用於確保基材層2與光學功能層7之間之密接力之層。 The adhesive layer 6 is a layer for ensuring the adhesive force between the base material layer 2 and the optical functional layer 7 .

密接層6具有膜形狀。密接層6以與基材層2(功能層5)之上表面接觸之方式配置於基材層2(功能層5)之整個上表面。 The adhesive layer 6 has a film shape. The adhesive layer 6 is disposed on the entire upper surface of the base layer 2 (functional layer 5) in contact with the upper surface of the base layer 2 (functional layer 5).

作為密接層6之材料,例如可例舉:金屬。作為金屬,例如可例舉:銦、矽、鎳、鉻、鋁、錫、金、銀、鉑、鋅、鈦、鎢、鋯、及鈀。又,作為密接層6之材料,亦可例舉:上述金屬之2種以上之合金、及上述金屬之氧化物。 As a material of the adhesion layer 6, metal can be mentioned, for example. Examples of the metal include indium, silicon, nickel, chromium, aluminum, tin, gold, silver, platinum, zinc, titanium, tungsten, zirconium, and palladium. In addition, examples of the material of the adhesion layer 6 include alloys of two or more of the above-mentioned metals and oxides of the above-mentioned metals.

作為密接層6之材料,就密接性及透明性之觀點而言,較佳為例舉:氧化矽(SiOx)及銦錫氧化物(ITO)。於使用氧化矽作為密接層6之材料之情形時,較佳為使用氧量少於化學計量組成之SiOx,更佳為使用x為1.2以上1.9以下之SiOx。作為密接層6之材料,更佳為例舉:銦錫氧化物(ITO)。 As a material for the adhesive layer 6, from the viewpoint of adhesiveness and transparency, preferred examples include silicon oxide (SiOx) and indium tin oxide (ITO). When silicon oxide is used as the material of the adhesive layer 6, it is preferable to use SiOx with an oxygen content less than the stoichiometric composition, and more preferably to use SiOx with x being 1.2 or more and 1.9 or less. As the material of the contact layer 6, a more preferred example is: indium tin oxide (ITO).

關於密接層6之厚度,就確保基材層2與光學功能層7之間之密接力、及兼顧密接層6之透明性之觀點而言,例如為1nm以上,又,例如為10nm以下。 The thickness of the adhesion layer 6 is, for example, 1 nm or more, and, for example, 10 nm or less, from the viewpoint of ensuring the adhesion between the base material layer 2 and the optical functional layer 7 and taking into account the transparency of the adhesion layer 6 .

<光學功能層> <Optical functional layer>

第2實施方式中,光學功能層7係用於抑制外界光之反射強度之抗反 射層。 In the second embodiment, the optical functional layer 7 is used to suppress the reflection intensity of external light. Shooting layer.

以下說明中,針對光學功能層7為抗反射層之情形進行詳細說明。 In the following description, the case where the optical functional layer 7 is an anti-reflection layer will be described in detail.

抗反射層具有2層以上具有互不相同之折射率之層。具體而言,抗反射層於厚度方向上交替地具有折射率相對較大之高折射率層、及折射率相對較小之低折射率層。抗反射層中所包含之複數層薄層(高折射率層、低折射率層)之複數個界面中之反射光間的干涉作用會使淨反射光強度衰減。又,抗反射層中,可藉由調整各薄層之光學膜厚(折射率與厚度之積)來表現出使反射光強度衰減之干涉作用。此種抗反射層朝向厚度方向一側依序具備第1高折射率層11、第1低折射率層12、第2高折射率層13、及第2低折射率層14。 The anti-reflection layer includes two or more layers having mutually different refractive indexes. Specifically, the anti-reflection layer alternately has a high refractive index layer with a relatively large refractive index and a low refractive index layer with a relatively small refractive index in the thickness direction. The interference between the reflected light in the multiple interfaces of the multiple thin layers (high refractive index layer, low refractive index layer) included in the anti-reflective layer will attenuate the net reflected light intensity. In addition, in the anti-reflection layer, the interference effect of attenuating the intensity of reflected light can be expressed by adjusting the optical film thickness (product of refractive index and thickness) of each thin layer. This anti-reflection layer includes a first high refractive index layer 11, a first low refractive index layer 12, a second high refractive index layer 13, and a second low refractive index layer 14 in order toward the thickness direction side.

抗反射層(具體而言,高折射率層及低折射率層)較佳為包含選自由金屬、合金、金屬氧化物、金屬氮化物、及金屬氟化物所組成之群中之1種,更佳為包含選自由金屬、金屬氧化物、及金屬氮化物所組成之群中之1種。藉此,抗反射層能夠抑制外界光之反射強度。 The anti-reflection layer (specifically, the high refractive index layer and the low refractive index layer) preferably contains one selected from the group consisting of metals, alloys, metal oxides, metal nitrides, and metal fluorides, and more Preferably, it includes one selected from the group consisting of metals, metal oxides, and metal nitrides. Thereby, the anti-reflection layer can suppress the reflection intensity of external light.

作為金屬,例如可例舉:矽、鎳、鉻、鋁、錫、金、銀、鉑、鋅、鈦、鎢、鋯、鈮、及鈀。作為合金,例如可例舉:上述金屬之合金。作為金屬氧化物,例如可例舉:上述金屬之金屬氧化物。作為金屬氮化物,例如可例舉:上述金屬之金屬氮化物。作為金屬氟化物,例如可例舉:上述金屬之金屬氟化物之金屬氮化物。 Examples of the metal include silicon, nickel, chromium, aluminum, tin, gold, silver, platinum, zinc, titanium, tungsten, zirconium, niobium, and palladium. Examples of the alloy include alloys of the above metals. Examples of metal oxides include metal oxides of the above metals. Examples of the metal nitride include metal nitrides of the above metals. Examples of the metal fluoride include metal nitrides of metal fluorides of the above metals.

尤其是抗反射層中所使用之材料可視所需折射率進行選擇。 In particular, the materials used in the anti-reflective layer can be chosen depending on the required refractive index.

具體而言,第1高折射率層11及第2高折射率層13分別包含波長550nm下之折射率較佳為1.9以上之高折射率材料。就兼顧高折射率與可見光之低吸收性之觀點而言,作為高折射率材料,例如可例舉氧化鈮(Nb2O5)、氧化鈦、氧化鋯、銦錫氧化物(ITO)、及摻銻氧化錫(ATO),較佳為例舉氧化鈮。即,較佳為第1低折射率層12之材料及第2低折射率層14之材料同時為氧化鈮。 Specifically, the first high refractive index layer 11 and the second high refractive index layer 13 each include a high refractive index material whose refractive index at a wavelength of 550 nm is preferably 1.9 or more. From the viewpoint of balancing high refractive index with low absorption of visible light, examples of high refractive index materials include niobium oxide (Nb 2 O 5 ), titanium oxide, zirconium oxide, indium tin oxide (ITO), and Antimony-doped tin oxide (ATO), preferably niobium oxide, is used. That is, it is preferable that the material of the first low refractive index layer 12 and the material of the second low refractive index layer 14 are both niobium oxide.

第1低折射率層12及第2低折射率層14分別包含波長550nm下之折射率較佳為1.6以下之低折射率材料。就兼顧低折射率與可見光之低吸收性之觀點而言,作為低折射率材料,例如可例舉二氧化矽(SiO2)、及氟化鎂,較佳為例舉二氧化矽。即,較佳為第1低折射率層12之材料及第2低折射率層14之材料同時為二氧化矽。 The first low refractive index layer 12 and the second low refractive index layer 14 each include a low refractive index material having a refractive index of preferably 1.6 or less at a wavelength of 550 nm. From the viewpoint of balancing low refractive index and low absorption of visible light, examples of the low refractive index material include silicon dioxide (SiO 2 ) and magnesium fluoride, and a preferred example is silicon dioxide. That is, it is preferable that the material of the first low refractive index layer 12 and the material of the second low refractive index layer 14 are both silicon dioxide.

尤其是若第2低折射率層14之材料為二氧化矽(換言之,若抗反射層之厚度方向一面為包含二氧化矽之層),則第2低折射率層14與防污層3之間之密接性優異。 Especially if the material of the second low refractive index layer 14 is silicon dioxide (in other words, if one side of the anti-reflective layer in the thickness direction is a layer containing silicon dioxide), then the difference between the second low refractive index layer 14 and the antifouling layer 3 Excellent adhesion between them.

又,於抗反射層中,第1高折射率層11之厚度例如為1nm以上,較佳為5nm以上,又,例如為30nm以下,較佳為20nm以下。第1低折射率層12之厚度例如為10nm以上,較佳為20nm以上,又,例如為50 nm以下,較佳為30nm以下。第2高折射率層13之厚度例如為50nm以上,較佳為80nm以上,又,例如為200nm以下,較佳為150nm以下。第2低折射率層14之厚度例如為60nm以上,較佳為80nm以上,又,例如為150nm以下,較佳為100nm以下。 In addition, in the anti-reflection layer, the thickness of the first high refractive index layer 11 is, for example, 1 nm or more, preferably 5 nm or more, and, for example, 30 nm or less, preferably 20 nm or less. The thickness of the first low refractive index layer 12 is, for example, 10 nm or more, preferably 20 nm or more, and, for example, 50 nm. nm or less, preferably 30 nm or less. The thickness of the second high refractive index layer 13 is, for example, 50 nm or more, preferably 80 nm or more, and, for example, 200 nm or less, preferably 150 nm or less. The thickness of the second low refractive index layer 14 is, for example, 60 nm or more, preferably 80 nm or more, and, for example, 150 nm or less, preferably 100 nm or less.

第2低折射率層14之厚度相對於第2高折射率層13之厚度之比(第2低折射率層14之厚度/第2高折射率層13之厚度)例如為0.5以上,較佳為0.7以上,又,例如為0.9以下。 The ratio of the thickness of the second low refractive index layer 14 to the thickness of the second high refractive index layer 13 (thickness of the second low refractive index layer 14/thickness of the second high refractive index layer 13) is, for example, preferably 0.5 or more. It is 0.7 or more, and for example, it is 0.9 or less.

第2高折射率層13之厚度相對於第1高折射率層11之厚度之比(第2高折射率層13之厚度/第1高折射率層11之厚度)例如為5以上,較佳為7以上,又,例如為15以下,較佳為10以下。 The ratio of the thickness of the second high refractive index layer 13 to the thickness of the first high refractive index layer 11 (thickness of the second high refractive index layer 13/thickness of the first high refractive index layer 11) is, for example, 5 or more, preferably It is 7 or more, and for example, it is 15 or less, Preferably it is 10 or less.

第2低折射率層14之厚度相對於第1低折射率層12之厚度之比(第2低折射率層14之厚度/第1低折射率層12之厚度)例如為1以上,較佳為3以上,又,例如為10以下,較佳為8以下。 The ratio of the thickness of the second low refractive index layer 14 to the thickness of the first low refractive index layer 12 (thickness of the second low refractive index layer 14/thickness of the first low refractive index layer 12) is, for example, 1 or more, preferably It is 3 or more, and for example, it is 10 or less, Preferably it is 8 or less.

抗反射層係藉由下文所述之方法而形成。 The anti-reflective layer is formed by the method described below.

抗反射層之厚度例如為100nm以上,較佳為150nm以上,又,例如為300nm以下,較佳為250nm以下。 The thickness of the anti-reflection layer is, for example, 100 nm or more, preferably 150 nm or more, and, for example, 300 nm or less, preferably 250 nm or less.

抗反射層之厚度可藉由剖面TEM(Transmission Electron Microscopy,穿透式電子顯微鏡)觀察進行測定。 The thickness of the anti-reflective layer can be measured by cross-sectional TEM (Transmission Electron Microscopy, transmission electron microscope) observation and determination.

<防污層> <Antifouling layer>

防污層3具有膜形狀。防污層3以與光學功能層7(抗反射層)之上表面接觸之方式配置於光學功能層7(抗反射層)之整個上表面。 The antifouling layer 3 has a film shape. The antifouling layer 3 is disposed on the entire upper surface of the optical functional layer 7 (anti-reflective layer) in contact with the upper surface of the optical functional layer 7 (anti-reflective layer).

防污層3由上述具有全氟聚醚基之烷氧基矽烷化合物(較佳為以上述通式(2)表示之具有全氟聚醚基之烷氧基矽烷化合物)形成。換言之,防污層3包含具有全氟聚醚基之烷氧基矽烷化合物,較佳為由具有全氟聚醚基之烷氧基矽烷化合物所構成。 The antifouling layer 3 is formed of the above-described alkoxysilane compound having a perfluoropolyether group (preferably, the alkoxysilane compound having a perfluoropolyether group represented by the above general formula (2)). In other words, the antifouling layer 3 includes an alkoxysilane compound having a perfluoropolyether group, and is preferably composed of an alkoxysilane compound having a perfluoropolyether group.

防污層3係藉由下文所述之方法而形成。 The antifouling layer 3 is formed by the method described below.

防污層3之厚度、半峰全幅值、積分強度比、及水接觸角與第1實施方式之防污層3之厚度、半峰全幅值、積分強度比、及水接觸角相同。 The thickness, full width at half maximum, integrated intensity ratio, and water contact angle of the antifouling layer 3 are the same as those of the antifouling layer 3 in the first embodiment.

關於半峰全幅值及積分強度,可藉由對具有全氟聚醚基之烷氧基矽烷化合物之種類、下文所述之第5步驟中之對光學功能層7(抗反射層)之表面處理方法(於該表面處理方法為電漿處理之情形時,為電漿處理時使用之氣體之種類)、及該表面處理方法為電漿處理之情形時之電漿處理之輸出電力進行調整而調整為上述特定值以上或上述特定值以下。 Regarding the half-peak full amplitude and integrated intensity, the type of alkoxysilane compound having a perfluoropolyether group and the surface of the optical functional layer 7 (anti-reflection layer) in the fifth step described below can be determined. The treatment method (when the surface treatment method is plasma treatment, the type of gas used in the plasma treatment), and the output power of the plasma treatment when the surface treatment method is plasma treatment are adjusted. Adjust to be above the above specific value or below the above specific value.

<積層體之製造方法> <Manufacturing method of laminated body>

參照圖5A~圖5D對積層體1之製造方法進行說明。 The manufacturing method of the laminated body 1 is demonstrated with reference to FIG. 5A - FIG. 5D.

積層體1之製造方法具備準備基材層2之第3步驟、於基材層2依序配置密接層6及光學功能層7(抗反射層)之第4步驟、及於光學功能層7(抗反射層)配置防污層3之第5步驟。又,該製造方法中,例如以卷對卷方式依序配置各層。 The manufacturing method of the laminated body 1 includes the third step of preparing the base material layer 2, the fourth step of sequentially arranging the adhesive layer 6 and the optical functional layer 7 (anti-reflection layer) on the base material layer 2, and the optical functional layer 7 ( Anti-reflective layer) Step 5 of configuring the anti-fouling layer 3. Furthermore, in this manufacturing method, each layer is sequentially arranged in a roll-to-roll manner, for example.

<第3步驟> <Step 3>

第3步驟中,如圖5A所示,首先準備基材4。 In the third step, as shown in FIG. 5A , the base material 4 is first prepared.

繼而,如圖5B所示,於基材4之厚度方向一面塗佈硬塗組合物之稀釋液,於乾燥後藉由紫外線照射或加熱使硬塗組合物硬化。 Next, as shown in FIG. 5B , a diluted solution of the hard coating composition is applied to one surface in the thickness direction of the base material 4 , and after drying, the hard coating composition is hardened by ultraviolet irradiation or heating.

藉此,於基材4之厚度方向一面配置(形成)硬塗層(功能層5)。藉此,準備基材層2。 Thereby, the hard coat layer (functional layer 5) is arranged (formed) on one side of the base material 4 in the thickness direction. Thereby, the base material layer 2 is prepared.

<第4步驟> <Step 4>

第4步驟中,如圖5C所示,於基材層2依序配置密接層6及光學功能層7(抗反射層)。具體而言,於基材層2之厚度方向一面依序配置密接層6及光學功能層7(抗反射層)。 In the fourth step, as shown in FIG. 5C , the adhesive layer 6 and the optical functional layer 7 (anti-reflection layer) are sequentially arranged on the base material layer 2 . Specifically, the adhesive layer 6 and the optical functional layer 7 (anti-reflection layer) are sequentially arranged on one side of the base material layer 2 in the thickness direction.

更具體而言,於基材層2朝向厚度方向一側依序配置密接層6、第1高折射率層11、第1低折射率層12、第2高折射率層13、及第2低折射率層14。 More specifically, the adhesive layer 6, the first high refractive index layer 11, the first low refractive index layer 12, the second high refractive index layer 13, and the second low refractive index layer are sequentially arranged on the side of the base material layer 2 facing the thickness direction. Refractive index layer 14.

即,該方法中,第4步驟具備:於基材層2配置密接層6之密接層配置步驟、於密接層6配置第1高折射率層11之第1高折射率層配置步驟、於第1高折射率層11配置第1低折射率層12之第1低折射率層配置步驟、於第1低折射率層12配置第2高折射率層13之第2高折射率層配置步驟、及於第2高折射率層13配置第2低折射率層14之第2低折射率層配置步驟。又,該製造方法中,例如藉由真空蒸鍍法、濺鍍法、層壓法、鍍敷法、離子鍍敷法依序配置各層,較佳為藉由濺鍍法。 That is, in this method, the fourth step includes: a step of arranging the adhesion layer 6 on the base material layer 2, a step of arranging the first high refractive index layer 11 on the adhesion layer 6, and a step of arranging the first high refractive index layer 11 on the adhesion layer 6. 1. The first low refractive index layer arranging step of arranging the first low refractive index layer 12 on the high refractive index layer 11, the second high refractive index layer arranging step of arranging the second high refractive index layer 13 on the first low refractive index layer 12, and a second low refractive index layer arranging step of arranging the second low refractive index layer 14 on the second high refractive index layer 13 . Furthermore, in this manufacturing method, each layer is sequentially arranged by a vacuum evaporation method, a sputtering method, a lamination method, a plating method, or an ion plating method, and a sputtering method is preferable.

以下,針對藉由濺鍍法依序配置各層之方法進行詳細說明。 Hereinafter, the method of arranging each layer sequentially by sputtering will be described in detail.

該方法中,首先,自提昇基材層2與密接層6之密接性之觀點出發,對基材層2之表面例如實施表面處理。作為表面處理,可例舉於上述第2步驟中所例舉之表面處理,較佳為例舉電漿處理。 In this method, first, from the viewpoint of improving the adhesion between the base material layer 2 and the adhesion layer 6 , the surface of the base material layer 2 is subjected to surface treatment, for example. As the surface treatment, the surface treatment exemplified in the above-mentioned second step can be exemplified, and a preferred example is plasma treatment.

並且,濺鍍法係將靶(各層(密接層6、第1高折射率層11、第1低折射率層12、第2高折射率層13、及第2低折射率層14)之材料)及基材層2對向配置於真空腔室內,在供給氣體之同時自電源施加電壓,藉此使氣體離子加速照射至靶,而使靶材料自靶表面彈出,從而使該靶材料於基材層2之表面依序沈積出各層。 Moreover, the sputtering method is to use the target (material of each layer (adhesive layer 6, first high refractive index layer 11, first low refractive index layer 12, second high refractive index layer 13, and second low refractive index layer 14) ) and the base material layer 2 are arranged facing each other in the vacuum chamber. While supplying gas, a voltage is applied from the power source, thereby accelerating the gas ions and irradiating them to the target, causing the target material to eject from the target surface, thereby causing the target material to be ejected from the target surface. Each layer is deposited sequentially on the surface of material layer 2.

作為氣體,例如可例舉:惰性氣體(例如氬氣)。又,可視需要將氧氣等反應性氣體併用。於將反應性氣體併用之情形時,反應性氣體之流量比 (sccm)並無特別限定,相對於濺鍍氣體及反應性氣體之合計流量比,例如為0.1流量%以上100流量%以下。 Examples of the gas include inert gases (for example, argon gas). In addition, reactive gases such as oxygen may be used together if necessary. When reactive gases are used together, the flow ratio of the reactive gases (sccm) is not particularly limited, but the ratio to the total flow rate of the sputtering gas and the reactive gas is, for example, 0.1 flow % or more and 100 flow % or less.

濺鍍時之氣壓例如為0.1Pa以上,又,例如為1.0Pa以下,較佳為0.7Pa以下。 The gas pressure during sputtering is, for example, 0.1 Pa or more, and, for example, 1.0 Pa or less, preferably 0.7 Pa or less.

電源例如為DC(Direct Current,直流)電源、AC(Alternating Current,交流)電源、MF(Medium frequency,中頻)電源及RF(Radio Frequency,射頻)電源之任一者均可,又,亦可為該等之組合。 For example, the power supply may be any one of DC (Direct Current) power supply, AC (Alternating Current) power supply, MF (Medium frequency, intermediate frequency) power supply, and RF (Radio Frequency, radio frequency) power supply. Alternatively, it may be It is a combination of these.

藉此,於基材層2之厚度方向一面依序配置密接層6及光學功能層7(抗反射層)。 Thereby, the adhesive layer 6 and the optical functional layer 7 (anti-reflection layer) are sequentially arranged on one side of the base material layer 2 in the thickness direction.

<第5步驟> <Step 5>

第5步驟中,如圖5D所示,於光學功能層7(抗反射層)配置防污層3。具體而言,於光學功能層7(抗反射層)之厚度方向一面配置防污層3。 In the fifth step, as shown in FIG. 5D , the antifouling layer 3 is disposed on the optical functional layer 7 (anti-reflection layer). Specifically, the antifouling layer 3 is disposed on one side of the optical functional layer 7 (antireflection layer) in the thickness direction.

該方法中,首先,自提昇光學功能層7(抗反射層)與防污層3之密接性之觀點出發,對光學功能層7(抗反射層)之表面例如實施表面處理。作為表面處理,可例舉上述第2步驟中所例舉之表面處理,較佳為例舉電漿處理,更佳為例舉利用氧氣之電漿處理。 In this method, first, from the viewpoint of improving the adhesion between the optical functional layer 7 (anti-reflective layer) and the anti-fouling layer 3, the surface of the optical functional layer 7 (anti-reflective layer) is subjected to surface treatment, for example. As the surface treatment, the surface treatment exemplified in the above-mentioned second step can be exemplified. Preferably, it is plasma treatment, and more preferably, it is plasma treatment using oxygen.

作為於光學功能層7(抗反射層)配置防污層3之方法,可例舉與上述 第2步驟之作為於基材層2配置防污層3之方法所例舉之方法相同的方法,就將上述積分強度比調整為特定值以下之觀點而言,較佳為例舉乾式塗佈法,更佳為例舉真空蒸鍍法。 As a method of arranging the antifouling layer 3 on the optical functional layer 7 (anti-reflection layer), the above-mentioned method can be exemplified. The method of arranging the antifouling layer 3 on the base material layer 2 in the second step is the same as the method exemplified. From the viewpoint of adjusting the above-mentioned integrated intensity ratio to a specific value or less, dry coating is preferably exemplified. Method, preferably a vacuum evaporation method.

真空蒸鍍法係將蒸鍍源(具有全氟聚醚基之烷氧基矽烷化合物)與光學功能層7(抗反射層)對向配置於真空腔室內,並對蒸鍍源進行加熱使其蒸發或昇華,使經蒸發或昇華之蒸鍍源沈積於光學功能層7(抗反射層)之表面。 The vacuum evaporation method is to arrange the evaporation source (an alkoxysilane compound with a perfluoropolyether group) and the optical functional layer 7 (anti-reflection layer) in a vacuum chamber to face each other, and heat the evaporation source to make it Evaporate or sublimate, and the evaporated or sublimated evaporation source is deposited on the surface of the optical functional layer 7 (anti-reflective layer).

於真空蒸鍍法中,蒸鍍源(坩堝)之溫度例如為200℃以上,較佳為250℃以上,又,例如為300℃以下。 In the vacuum evaporation method, the temperature of the evaporation source (crucible) is, for example, 200°C or higher, preferably 250°C or higher, and, for example, 300°C or lower.

藉此而製造於光學功能層7(抗反射層)之厚度方向一面配置防污層3並且朝向厚度方向一側依序具備基材層2、密接層6、光學功能層7(抗反射層)、及防污層3的積層體1。 In this way, the antifouling layer 3 is disposed on one side of the optical function layer 7 (anti-reflection layer) in the thickness direction, and the substrate layer 2, the adhesion layer 6, and the optical function layer 7 (anti-reflection layer) are sequentially provided toward the thickness direction side. , and the laminate 1 of the antifouling layer 3.

<作用效果> <Effect>

積層體1於基材層2與防污層3之間具備光學功能層7(抗反射層)。 The laminated body 1 has an optical functional layer 7 (antireflection layer) between the base material layer 2 and the antifouling layer 3 .

因此,能夠抑制外界光之反射。 Therefore, reflection of external light can be suppressed.

又,於光學功能層7(抗反射層)之厚度方向一面為包含二氧化矽之層之情形時,換言之,於在防污層3之下表面直接配置有包含二氧化矽之層(例如包含二氧化矽之第2低折射率層14)之情形時,防污層3之具有全氟聚醚基之烷氧基矽烷化合物中之水解基(上述式(1)中之-(OR3))之水解過程 中產生之矽烷醇基與二氧化矽中之矽會進行脫水縮合反應。換言之,防污層3係具有全氟聚醚基之烷氧基矽烷化合物經由矽氧烷鍵於光學功能層7(抗反射層)形成。藉此,能夠進一步提昇防污耐久性。 Furthermore, when one side in the thickness direction of the optical functional layer 7 (antireflection layer) is a layer containing silicon dioxide, in other words, a layer containing silicon dioxide (for example, containing silicon dioxide) is directly disposed on the surface below the antifouling layer 3 In the case of the second low refractive index layer 14 of silicon dioxide, the hydrolyzable group (-(OR 3) in the above formula (1) in the alkoxysilane compound having a perfluoropolyether group in the antifouling layer 3 ), the silanol group generated during the hydrolysis process will undergo a dehydration condensation reaction with the silicon in silica dioxide. In other words, the antifouling layer 3 is formed of an alkoxysilane compound having a perfluoropolyether group on the optical functional layer 7 (anti-reflective layer) via a siloxane bond. This can further improve antifouling durability.

3.變化例 3.Examples of changes

於變化例中,針對與第1實施方式及第2實施方式相同之構件及步驟附相同之參照符號,並省略其詳細說明。又,除特別說明之情況以外,變化例可發揮出與第1實施方式及第2實施方式相同之作用效果。進而,可將第1實施方式、第2實施方式及其變化例適當組合。 In the modification example, the same components and steps as those in the first embodiment and the second embodiment are assigned the same reference numerals, and detailed descriptions thereof are omitted. In addition, unless otherwise stated, the modified examples can exhibit the same functions and effects as those of the first embodiment and the second embodiment. Furthermore, the first embodiment, the second embodiment and their modifications can be appropriately combined.

第1實施方式中,積層體1具備基材層2及防污層3,亦可如圖6所示,於基材層2與防污層3之間進而具備底塗層15。詳細而言,積層體1亦可於防污層3之厚度方向另一面具備底塗層15。 In the first embodiment, the laminated body 1 includes the base material layer 2 and the antifouling layer 3. As shown in FIG. 6, the laminated body 1 may further include a primer layer 15 between the base material layer 2 and the antifouling layer 3. Specifically, the laminated body 1 may have the primer layer 15 on the other surface in the thickness direction of the antifouling layer 3 .

即,於此種情形時,積層體1朝向厚度方向一側依序具備基材層2、底塗層15、及防污層3。 That is, in this case, the laminated body 1 has the base material layer 2, the primer layer 15, and the antifouling layer 3 in order toward the thickness direction side.

底塗層15為與防污層3密接之層。 The primer layer 15 is a layer closely connected with the antifouling layer 3 .

作為底塗層15之材料,較佳為例舉:二氧化矽(SiO2)。更佳為底塗層15包含二氧化矽(SiO2)。 As a material of the undercoat layer 15, a preferred example is silicon dioxide (SiO 2 ). More preferably, the undercoat layer 15 contains silicon dioxide (SiO 2 ).

只要底塗層15之材料為二氧化矽(SiO2),則防污層3之具有全氟聚醚 基之烷氧基矽烷化合物中之水解基(上述式(1)中之-(OR3))之水解過程中產生之矽烷醇基與二氧化矽中之矽會進行脫水縮合反應。換言之,防污層3係具有全氟聚醚基之烷氧基矽烷化合物經由矽氧烷鍵形成於底塗層15。藉此,能夠進一步提昇防污耐久性。 As long as the material of the primer layer 15 is silicon dioxide (SiO 2 ), the hydrolyzable group (-(OR 3) in the above formula (1) in the alkoxysilane compound having a perfluoropolyether group in the antifouling layer 3 )) The silanol group generated during the hydrolysis process will undergo a dehydration condensation reaction with the silicon in the silica dioxide. In other words, the antifouling layer 3 is an alkoxysilane compound having a perfluoropolyether group formed on the base coat layer 15 via a siloxane bond. This can further improve antifouling durability.

底塗層15例如藉由濺鍍法、電漿CVD法、真空蒸鍍法等形成。 The undercoat layer 15 is formed by, for example, sputtering, plasma CVD, vacuum evaporation, or the like.

第1實施方式及第2實施方式中,基材層2朝向厚度方向一側依序具備基材4、及功能層5。然而,基材層2亦可由基材4構成,而不具備功能層5。 In the first embodiment and the second embodiment, the base material layer 2 includes the base material 4 and the functional layer 5 in order toward one side in the thickness direction. However, the base material layer 2 may also be composed of the base material 4 without the functional layer 5 .

第2實施方式中,抗反射層具備2層折射率相對較高之高折射率層,並且具備2層折射率相對較低之低折射率層。但是,高折射率層及低折射率層之數量無特別限定。 In the second embodiment, the anti-reflection layer includes two high refractive index layers with a relatively high refractive index, and two low refractive index layers with a relatively low refractive index. However, the number of high refractive index layers and low refractive index layers is not particularly limited.

[實施例] [Example]

以下示出實施例及比較例,進一步具體地對本發明進行說明。再者,本發明不受實施例及比較例任何限定。又,以下記載中所使用之調配比率(含有比率)、物性值、參數等具體數值可替代為上述「實施方式」中記載之與其等對應之調配比率(含有比率)、物性值、參數等相關記載之上限值(以「以下」、「未達」定義之數值)或下限值(以「以上」、「超過」定義之數值)。 Examples and comparative examples are shown below to further explain the present invention in detail. In addition, the present invention is not limited at all by the Examples and Comparative Examples. In addition, specific numerical values such as blending ratios (content ratios), physical property values, and parameters used in the following description may be replaced by corresponding blending ratios (content ratios), physical property values, parameters, etc. described in the above "Embodiments". The recorded upper limit value (a value defined as "below" or "under") or the lower limit value (a value defined as "above" or "exceeds").

1.積層體之製造 1. Manufacturing of laminated body 實施例1 Example 1 <第3步驟> <Step 3>

準備三乙醯纖維素(TAC)膜(厚度80μm)作為基材。 A triacetyl cellulose (TAC) film (thickness: 80 μm) was prepared as a base material.

繼而,於基材(TAC膜)之厚度方向一面配置硬塗層。具體而言,首先向紫外線硬化性丙烯酸系樹脂組合物(DIC製造,商品名「GRANDIC PC-1070」,波長405nm下之折射率:1.55)中以相對於樹脂成分100質量份之二氧化矽粒子之量成為25質量份之方式添加有機矽溶膠(日產化學公司製造之「MEK-ST-L」,二氧化矽粒子(無機填料)之平均一次粒徑:50nm,二氧化矽粒子之粒徑分佈:30nm~130nm,固形物成分30重量%)並加以混合,製備出硬塗組合物。於基材(TAC膜)之厚度方向一面以乾燥後之厚度成為6μm之方式塗佈硬塗組合物,並以80℃乾燥3分鐘。其後,使用高壓水銀燈照射累計光量200mJ/cm2之紫外線,使塗佈層硬化而形成硬塗層。藉此,準備基材層。 Then, a hard coat layer is disposed on one side of the base material (TAC film) in the thickness direction. Specifically, first, 100 parts by mass of silica particles were added to an ultraviolet curable acrylic resin composition (manufactured by DIC, trade name "GRANDIC PC-1070", refractive index at a wavelength of 405 nm: 1.55) based on 100 parts by mass of the resin component. Organosilica sol ("MEK-ST-L" manufactured by Nissan Chemical Co., Ltd.) was added so that the amount became 25 parts by mass. The average primary particle diameter of the silica particles (inorganic filler): 50 nm. The particle size distribution of the silica particles. : 30nm~130nm, solid content 30% by weight) and mixed to prepare a hard coating composition. The hard coating composition was applied to one side in the thickness direction of the base material (TAC film) so that the thickness after drying became 6 μm, and dried at 80° C. for 3 minutes. Thereafter, ultraviolet rays with a cumulative light intensity of 200 mJ/cm 2 were irradiated using a high-pressure mercury lamp to harden the coating layer to form a hard coat layer. Thereby, the base material layer is prepared.

<第4步驟> <Step 4>

藉由卷對卷方式之電漿處理裝置於1.0Pa之真空環境下對基材層(硬塗層)之厚度方向一面進行電漿處理。該電漿處理中,使用氬氣作為惰性氣體,將放電電力設為100W。 Plasma treatment is performed on one side of the substrate layer (hard coating) in the thickness direction using a roll-to-roll plasma treatment device in a vacuum environment of 1.0Pa. In this plasma treatment, argon gas was used as an inert gas, and the discharge power was set to 100W.

繼而,於基材層之厚度方向一面依序配置(形成)密接層及抗反射層(光學功能層)。 Then, an adhesive layer and an anti-reflection layer (optical functional layer) are sequentially arranged (formed) on one side of the base material layer in the thickness direction.

具體而言,藉由卷對卷方式之濺鍍成膜裝置於電漿處理後之附HC(Hard Coating,硬塗)層之TAC膜之HC層上依序配置(形成)作為密接層之厚度2.0nm之銦錫氧化物(ITO)層、作為第1高折射率層之厚度12nm之Nb2O5層、作為第1低折射率層之厚度28nm之SiO2層、作為第2高折射率層之厚度100nm之Nb2O5層、及作為第2低折射率層之厚度85nm之SiO2層。 Specifically, a roll-to-roll sputtering film forming device is used to sequentially arrange (form) the thickness of the adhesive layer on the HC layer of the TAC film with the HC (Hard Coating) layer after plasma treatment. An indium tin oxide (ITO) layer of 2.0 nm, a Nb 2 O 5 layer with a thickness of 12 nm as the first high refractive index layer, a SiO 2 layer with a thickness of 28 nm as the first low refractive index layer, and a second high refractive index layer. The Nb 2 O 5 layer with a thickness of 100 nm, and the SiO 2 layer with a thickness of 85 nm as the second low refractive index layer.

密接層之形成中,使用ITO靶,使用作為惰性氣體之氬氣、及相對於氬氣100體積份為10體積份之作為反應性氣體之氧氣,將放電電壓設為350V,將成膜室內之氣壓(成膜氣壓)設為0.4Pa,藉由MFAC(medium frequency alternating currentModel Free Adaptive Control,中頻交流電)濺鍍使ITO層成膜。 In the formation of the adhesion layer, an ITO target was used, argon as an inert gas, and oxygen as a reactive gas in an amount of 10 parts by volume relative to 100 parts by volume of argon, and the discharge voltage was set to 350V. The air pressure (film forming pressure) is set to 0.4Pa, and the ITO layer is formed by MFAC (medium frequency alternating current Model Free Adaptive Control, medium frequency alternating current) sputtering.

第1高折射率層之形成中,使用Nb靶。又,使用100體積份之氬氣及5體積份之氧氣。又,將放電電壓設為415V,將成膜氣壓設為0.42Pa,藉由MFAC濺鍍使Nb2O5層成膜。 In the formation of the first high refractive index layer, an Nb target is used. Moreover, 100 parts by volume of argon gas and 5 parts by volume of oxygen gas were used. Furthermore, the discharge voltage was set to 415V, the film-forming gas pressure was set to 0.42 Pa, and an Nb 2 O 5 layer was formed by MFAC sputtering.

第1低折射率層之形成中,使用Si靶。又,使用100體積份之氬氣及30體積份之氧氣。又,將放電電壓設為350V,將成膜氣壓設為0.3Pa,藉由MFAC濺鍍使SiO2層成膜。 In the formation of the first low refractive index layer, a Si target is used. Moreover, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas were used. Furthermore, the discharge voltage was set to 350V, the film-forming gas pressure was set to 0.3 Pa, and a SiO 2 layer was formed by MFAC sputtering.

第2高折射率層之形成中,使用Nb靶。又,使用100體積份之氬氣及13體積份之氧氣。又,將放電電壓設為460V,將成膜氣壓設為0.5Pa, 藉由MFAC濺鍍使Nb2O5層成膜。 In the formation of the second high refractive index layer, an Nb target is used. Moreover, 100 parts by volume of argon gas and 13 parts by volume of oxygen gas were used. Furthermore, the discharge voltage was set to 460V and the film-forming gas pressure was set to 0.5 Pa, and an Nb 2 O 5 layer was formed by MFAC sputtering.

第2低折射率層之形成中,使用Si靶。又,使用100體積份之氬氣及30體積份之氧氣。又,將放電電壓設為340V,將成膜氣壓設為0.25Pa,藉由MFAC濺鍍使SiO2層成膜。 In the formation of the second low refractive index layer, a Si target is used. Moreover, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas were used. Furthermore, the discharge voltage was set to 340V and the film-forming gas pressure was set to 0.25 Pa, and a SiO 2 layer was formed by MFAC sputtering.

按照以上方式於基材層之厚度方向一面依序配置(形成)密接層及抗反射層。 In the above manner, the adhesive layer and the anti-reflective layer are sequentially arranged (formed) on one side of the base material layer in the thickness direction.

<第5步驟> <Step 5>

於抗反射層之厚度方向一面配置防污層。 An antifouling layer is disposed on one side of the anti-reflective layer in the thickness direction.

具體而言,首先對抗反射層之厚度方向一面實施作為表面處理之利用氬氣之電漿處理。電漿處理之輸出電力為100W。繼而,藉由使用含有全氟聚醚基之烷氧基矽烷化合物作為蒸鍍源之真空蒸鍍法,於抗反射層之厚度方向一面配置厚度7nm之防污層。 Specifically, first, plasma treatment using argon gas as surface treatment is performed on one side of the antireflective layer in the thickness direction. The output power of plasma treatment is 100W. Then, an antifouling layer with a thickness of 7 nm was placed on one side of the antireflection layer in the thickness direction by a vacuum evaporation method using an alkoxysilane compound containing a perfluoropolyether group as the evaporation source.

蒸鍍源為將OPTOOL UD120(DAIKIN INDUSTRIES股份有限公司製造)進行乾燥而得之固形物成分。又,真空蒸鍍法之蒸鍍源(坩堝)之加熱溫度設為260℃。藉此而獲得積層體。 The vapor deposition source is a solid component obtained by drying OPTOOL UD120 (manufactured by DAIKIN INDUSTRIES Co., Ltd.). In addition, the heating temperature of the vapor deposition source (crucible) of the vacuum vapor deposition method was set to 260°C. In this way, a layered body is obtained.

實施例2 Example 2

基於與實施例1相同之順序製造積層體。 A laminated body was produced based on the same procedure as Example 1.

但是,於第5步驟中,對於抗反射層之厚度方向一面,表面處理變更為藉由氧氣進行電漿處理來代替藉由氬氣進行電漿處理。 However, in the fifth step, for one side of the anti-reflection layer in the thickness direction, the surface treatment is changed to plasma treatment with oxygen instead of plasma treatment with argon.

實施例3 Example 3

基於與實施例2相同之順序製造積層體。 A laminated body was produced based on the same procedure as in Example 2.

但是,於第5步驟中,將蒸鍍源變更為KY1903-1(信越化學製造)。 However, in the fifth step, the evaporation source was changed to KY1903-1 (manufactured by Shin-Etsu Chemical Co., Ltd.).

比較例1 Comparative example 1

基於與實施例1相同之順序製造積層體。 A laminated body was produced based on the same procedure as Example 1.

但是,如下變更第5步驟。 However, change step 5 as follows.

<第5步驟> <Step 5>

於抗反射層之厚度方向一面,藉由凹版塗佈機以塗佈厚度成為8μm之方式塗佈OPTOOL UD509。其後,以乾燥溫度60℃加熱處理60秒。藉此,於抗反射層之厚度方向一面配置厚度7nm之防污層。 On one side of the anti-reflective layer in the thickness direction, apply OPTOOL UD509 using a gravure coater so that the coating thickness becomes 8 μm. Thereafter, heat treatment was performed at a drying temperature of 60° C. for 60 seconds. Thereby, an antifouling layer with a thickness of 7 nm is disposed on one side of the antireflection layer in the thickness direction.

比較例2 Comparative example 2

基於與實施例1相同之順序製造積層體。 A laminated body was produced based on the same procedure as Example 1.

但是,於第5步驟中,將電漿處理之輸出電力變更為4500W。 However, in step 5, the output power of the plasma treatment is changed to 4500W.

2.評價 2.Evaluation (掠角入射X射線繞射測定) (grazing angle incident X-ray diffraction measurement)

針對各實施例及各比較例之積層體之防污層,於以下條件下藉由掠角入射X射線繞射法實施面內繞射(in plane)測定。 For the antifouling layer of the laminated body of each Example and each Comparative Example, in-plane diffraction (in plane) measurement was performed by the grazing angle incident X-ray diffraction method under the following conditions.

將實施例2之面內繞射(in plane)測定之結果示於圖7。 The results of in-plane diffraction measurement in Example 2 are shown in FIG. 7 .

<測定條件> <Measurement conditions>

實驗設施:愛知同步加速器輻射中心 Experimental facility: Aichi Synchrotron Radiation Center

實驗站:BL8S1 Experiment station: BL8S1

入射能:14.4keV Incident energy: 14.4keV

光束尺寸:500μm(橫寬)×40μm(縱) Beam size: 500μm (width) × 40μm (vertical)

試樣角:相對於入射光為0.1度 Sample angle: 0.1 degrees relative to incident light

檢測器:二維檢測器PILATAS Detector: 2D detector PILATAS

試樣設置方法:利用較薄地塗佈之滑脂固定於平面試樣台上 Sample setting method: Use thinly applied grease to fix it on the flat sample table

以下,根據所獲得之面內繞射(in plane)測定之結果,算出半峰全幅值。算出方法使用擬合法,以統一算出半峰全幅值。關於該方法,以實施例2為例進行詳細說明。 Hereinafter, the full amplitude at half maximum value is calculated based on the obtained in-plane diffraction (in plane) measurement results. The calculation method uses the fitting method to uniformly calculate the half-peak full amplitude value. This method will be described in detail using Example 2 as an example.

首先,基於下述式(3),對面內繞射(in plane)測定中所獲得之結果(以下,稱為實測資料(面內繞射(in plane)測定))實施擬合。詳細而言,假定實測資料(面內繞射(in plane)測定)為背景與波峰A1~A4(參照圖8)之總和,實施擬合。再者,進行標準化,以使所有試樣之間,高波長24nm-1之背景 一致。 First, the results obtained by in-plane diffraction (in plane) measurement (hereinafter, referred to as actual measurement data (in-plane diffraction (in plane) measurement)) are fitted based on the following equation (3). Specifically, it is assumed that the actual measurement data (in-plane diffraction (in plane) measurement) is the sum of the background and the peaks A1 to A4 (see Figure 8), and fitting is performed. Furthermore, standardization was performed so that the background at high wavelength 24 nm -1 was consistent among all samples.

Figure 110125744-A0305-02-0039-1
Figure 110125744-A0305-02-0039-1

(於式(3)中,q表示散射向量(波數)(=4πsinΘ/λ)/nm-1(Θ表示布拉格角;λ表示X射線之波長);An表示波峰強度(n為1~4之整數;A1表示波峰A1之波峰強度;A2表示波峰A2之波峰強度;A3表示波峰A3之波峰強度;A4表示波峰A4之波峰強度);qAn表示重心位置(qA1表示波峰A1之重心位置;qA2表示波峰A2之重心位置;qA3表示波峰A3之重心位置;qA4表示波峰A4之重心位置);△qAn表示半峰全幅值(△qA1表示波峰A1之半峰全幅值;△qA2表示波峰A2之半峰全幅值;△qA3表示波峰A3之半峰全幅值;△qA4表示波峰A4之半峰全幅值)。 (In formula (3), q represents the scattering vector (wave number) (=4πsinΘ/λ)/nm -1 (Θ represents the Bragg angle; λ represents the wavelength of X-rays); An represents the wave peak intensity (n is 1~4 is an integer; A 1 represents the peak intensity of wave peak A1; A 2 represents the peak intensity of wave peak A2; A 3 represents the peak intensity of wave peak A3; A 4 represents the peak intensity of wave peak A4); q An represents the center of gravity position (q A1 represents the wave peak The center of gravity position of A1; q A2 represents the center of gravity position of wave peak A2; q A3 represents the center of gravity position of wave peak A3; q A4 represents the center of gravity position of wave peak A4); △q An represents the half-peak full amplitude value (△q A1 represents the center of gravity position of wave peak A1 The full amplitude at half peak; △q A2 represents the full amplitude at half peak of peak A2; △q A3 represents the full amplitude at half peak of peak A3; △q A4 represents the full amplitude at half peak of peak A4).

又,波峰A1為表示層狀積層結構之波峰,重心位置為0.2Å-1以上1.0Å-1以下。又,波峰A4為源自全氟聚醚基在面內方向上之週期排列性之波峰,重心位置為1.5Å-1以上2.0Å-1以下。 In addition, the peak A1 is a peak indicating a layered laminated structure, and the center of gravity position is 0.2Å -1 or more and 1.0Å -1 or less. In addition, the peak A4 is a peak derived from the periodic arrangement of perfluoropolyether groups in the in-plane direction, and the center of gravity position is 1.5Å -1 or more and 2.0Å -1 or less.

將擬合之結果示於圖8(實施例2)。 The fitting results are shown in Figure 8 (Example 2).

又,將擬合之結果與實測資料(面內繞射(in plane)測定)一併記載於圖7。 In addition, the fitting results are shown in Figure 7 together with the actual measurement data (in-plane diffraction (in plane) measurement).

根據圖7可知,實測資料(面內繞射(in plane)測定)與擬合結果充分一致。 According to Figure 7, it can be seen that the measured data (in plane diffraction (in plane) measurement) are fully consistent with the fitting results.

由此可知,可如假定那樣以背景與波峰A1~A4之總和之形式來表示實測資料(面內繞射(in plane)測定)。 From this, it can be seen that the actual measured data (in plane diffraction (in plane) measurement) can be represented as the sum of the background and the peaks A1 to A4 as assumed.

又,將藉由擬合而獲得之源自全氟聚醚基在面內方向上之週期排列性之波峰A4之半峰全幅值、波峰之強度、峰位置、積分強度及標準化積分強度、及表示層狀積層結構之波峰A1之波峰之強度、峰位置、半峰全幅值、積分強度及標準化積分強度示於表1。 In addition, the half-peak full amplitude of the wave peak A4 derived from the periodic arrangement of the perfluoropolyether groups in the in-plane direction obtained by fitting, the intensity of the wave peak, the peak position, the integrated intensity and the normalized integrated intensity, Table 1 shows the peak intensity, peak position, half-peak full amplitude value, integrated intensity and normalized integrated intensity of the peak A1 representing the layered laminated structure.

(防污耐久性) (anti-fouling durability)

針對各實施例及各比較例之積層體之防污層,使用協和界面科學公司製造之DMo-501,基於以下條件,測定防污層對純水之接觸角(有時稱為初期接觸角)。其將結果示於表1。 For the antifouling layer of the laminate of each example and each comparative example, DMo-501 manufactured by Kyowa Interface Science Co., Ltd. was used, and the contact angle (sometimes called the initial contact angle) of the antifouling layer to pure water was measured based on the following conditions. . The results are shown in Table 1.

<測定條件> <Measurement conditions>

液滴量:2μl Drop volume: 2μl

溫度:25℃ Temperature: 25℃

濕度:40% Humidity: 40%

繼而,針對各實施例及各比較例之積層體之防污層,基於以下條件實施橡皮擦滑動試驗,其後按照與上述方法相同之順序測定水接觸角(有時稱為橡皮擦滑動試驗後之接觸角)。其將結果示於表1。 Next, with respect to the antifouling layer of the laminate of each Example and each Comparative Example, an eraser sliding test was performed based on the following conditions, and then the water contact angle was measured in the same procedure as the above method (sometimes referred to as the post-erasing eraser sliding test). the contact angle). The results are shown in Table 1.

繼而,基於下述式(4)算出接觸角之變化量。其將結果示於表1。 Next, the change amount of the contact angle is calculated based on the following equation (4). The results are shown in Table 1.

接觸角之變化量越小,評價為防污耐久性越優異。 The smaller the change amount of the contact angle, the more excellent the antifouling durability is evaluated.

接觸角之變化量=初期接觸角-橡皮擦滑動試驗後之接觸角 (4) Change in contact angle = initial contact angle - contact angle after eraser sliding test (4)

(橡皮擦滑動試驗) (Eraser sliding test)

Minoan公司製造之橡皮擦(Φ6mm) Eraser manufactured by Minoan Company (Φ6mm)

滑動距離:單程100mm Sliding distance: 100mm one way

滑動速度:100mm/秒 Sliding speed: 100mm/second

荷重:1kg/6mmΦ Load: 1kg/6mmΦ

滑動次數:3000次 Number of slides: 3000 times

Figure 110125744-A0305-02-0042-2
Figure 110125744-A0305-02-0042-2

再者,上述發明係作為本發明例示之實施方式而提供,其僅為例示,不應限定性地進行解釋。對該技術領域之業者而言明顯之本發明之變化例包含於下文所述之申請專利範圍中。 In addition, the above-mentioned invention is provided as an exemplary embodiment of the present invention, and it is only an example and should not be interpreted in a restrictive manner. Modifications of the present invention that are obvious to those skilled in the art are included in the scope of the patent application described below.

[產業上之可利用性] [Industrial availability]

本發明之積層體例如適合用於附防污層之抗反射膜、附防污層之透明導電膜、及附防污層之電磁波遮蔽膜。 The laminate of the present invention is suitably used for, for example, an antireflective film with an antifouling layer, a transparent conductive film with an antifouling layer, and an electromagnetic wave shielding film with an antifouling layer.

1:積層體 1: Laminated body

2:基材層 2: Base material layer

3:防污層 3: Antifouling layer

4:基材 4:Substrate

5:功能層 5: Functional layer

Claims (5)

一種積層體,其朝向厚度方向一側依序具備基材層、及防污層,上述防污層包含具有全氟聚醚基之烷氧基矽烷化合物,藉由掠角入射X射線繞射法中之面內繞射測定所測得之上述防污層之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上,於上述防污層之厚度方向另一面具備底塗層,且上述底塗層為包含二氧化矽之層。 A laminated body having a base material layer and an antifouling layer in sequence toward one side in the thickness direction. The antifouling layer contains an alkoxysilane compound having a perfluoropolyether group. According to the grazing angle incident X-ray diffraction method, The half-peak full amplitude of the wave peaks originating from the periodic arrangement of perfluoropolyether groups in the in-plane direction of the above-mentioned antifouling layer measured by in-plane diffraction measurement is more than 0.4Å -1 . In the above-mentioned anti-fouling layer, The other side of the dirt layer in the thickness direction is provided with a primer layer, and the primer layer is a layer containing silicon dioxide. 一種積層體,其朝向厚度方向一側依序具備基材層、及防污層,上述防污層包含具有全氟聚醚基之烷氧基矽烷化合物,藉由掠角入射X射線繞射法中之面內繞射測定所測得之上述防污層之源自全氟聚醚基在面內方向上之週期排列性的波峰之半峰全幅值為0.4Å-1以上,於上述基材層與上述防污層之間進而具備密接層及抗反射層,且上述抗反射層之厚度方向一面為包含二氧化矽之層。 A laminated body having a base material layer and an antifouling layer in sequence toward one side in the thickness direction. The antifouling layer contains an alkoxysilane compound having a perfluoropolyether group. According to the grazing angle incident X-ray diffraction method, The half-peak full amplitude of the wave peaks originating from the periodic arrangement of the perfluoropolyether groups in the in-plane direction of the above-mentioned antifouling layer measured by in-plane diffraction measurement is more than 0.4Å -1 , and the above-mentioned base A close contact layer and an anti-reflective layer are further provided between the material layer and the anti-fouling layer, and one side of the anti-reflective layer in the thickness direction is a layer containing silicon dioxide. 如請求項1之積層體,其中上述防污層係具有全氟聚醚基之烷氧基矽烷化合物經由矽氧烷鍵形成於上述底塗層上。 The laminate according to claim 1, wherein the antifouling layer is an alkoxysilane compound having a perfluoropolyether group formed on the undercoat layer via a siloxane bond. 如請求項2之積層體,其中上述抗反射層包含2層以上具有互不相同之折射率之層。 The laminated body of claim 2, wherein the anti-reflection layer includes two or more layers having mutually different refractive indexes. 如請求項4之積層體,其中上述抗反射層包含選自由金屬、金屬氧化物、及金屬氮化物所組成之群中之1種。 The laminated body of claim 4, wherein the anti-reflection layer includes one selected from the group consisting of metal, metal oxide, and metal nitride.
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