JP4672095B2 - Method for manufacturing antireflection film - Google Patents
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- JP4672095B2 JP4672095B2 JP11882499A JP11882499A JP4672095B2 JP 4672095 B2 JP4672095 B2 JP 4672095B2 JP 11882499 A JP11882499 A JP 11882499A JP 11882499 A JP11882499 A JP 11882499A JP 4672095 B2 JP4672095 B2 JP 4672095B2
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Description
【０００１】
【産業上の利用分野】
本発明は、防汚性を必要とする各種の被処理基材の表面に、防汚層を形成する方法に関するものである。さらに詳しくは、各種の被処理基材上に防汚層を速やかに定着させる方法である。
【０００２】
【従来の技術】
従来、光学レンズ、眼鏡レンズ、カメラや双眼鏡などのレンズには、光の反射を減らし、光の透過性を高めるために、通常、その表面に反射防止処理が施されている。これらの光学部材を人が使用することによって、指紋、皮脂、汗、化粧品などの汚れが付着する場合が多い。
【０００３】
一般に、反射防止膜の表面エネルギーは約６０Ｊ／ｍ2 と大きいために、そのような汚れが付着しやすく、かつ、微細な凹凸があるため除去することが容易ではない。また、そのような汚れが付着した部分だけ高反射となり、汚れが目立つため問題があった。
【０００４】
そこで、これら汚れの問題を解決する手段として、汚れが付着しにくく、付着しても拭き取りやすい性能を持つ防汚層を設ける工夫が考案されている。
【０００５】
例えば、特開昭６４−８６１０１号公報には、基材の表面に、主として二酸化珪素からなる反射防止膜を設け、更にその表面に有機珪素置換基を含む化合物で処理した耐汚染性、耐擦傷性の反射防止膜物品が提案されている。
【０００６】
特開平４−３３８９０１号公報には、同様に基材表面に末端シラノール有機ポリシロキサンを被膜した耐汚染性、耐擦傷性のＣＲＴフィルターが提案されている。
【０００７】
また、特公平６−２９３３２号公報には、プラスチック表面にポリフルオロアルキル基を含むモノおよびジシラン化合物およびハロゲン、アルキルまたはアルコキシのシラン化合物とからなる反射防止膜を有する低反射率および防汚性のプラスチックが提案されている。
【０００８】
更に、特開平７−１６９４０号公報には、パーフルオロアルキル（メタ）アクリレートとアルコキシシラン基を有する単量体との共重合体を二酸化珪素を主とする光学薄膜上に形成した光学物品が提案されている。
【０００９】
【発明が解決しようとしている課題】
しかしながら、従来の防汚層の形成技術において、防汚層を成膜後、その耐防汚性、耐摩耗性、耐溶剤性等を最大限にするまで数時間、場合によっては数日という長時間を要し、その間では汚れや傷が入りやすく、また、他の物品と接触すると、防汚層の一部が転写し、防汚層が剥離してしまうという問題があった。
【００１０】
本発明は、前述のような従来技術の課題を解決しようとするものであり、本発明の目的は、各種光学部材などの被処理基材の表面を前処理を行うことによって、耐防汚性、耐擦傷性、耐溶剤性等に優れた防汚層を短時間に形成することができ防汚層の形成方法を提供することである。
【００１１】
【課題を解決するための手段】
前記課題を解決するため請求項１の発明は、反射防止膜の少なくとも片面に、高周波放電プラズマ法、コロナ処理法の何れかの前処理し、この前処理した反射防止膜表面に一般式（１）で示される有機シラン化合物からなる防汚剤を１Ｐａ以下の圧力において、加熱し、蒸発させ、防汚層を成膜することを特徴とする反射防止膜の製造方法である。
Ｒ ｆ −（ＯＣ ３ Ｆ ６ ） ｎ −Ｏ−（ＣＦ ２ ） ｍ −（ＣＨ ２ ） ｌ −Ｏ−（ＣＨ ２ ） ｓ −Ｓｉ（Ｒ） ３
・・・（１）
（但し、Ｒ ｆ は炭素数１〜１６の直鎖状または分岐状パーフルオロアルキル基、ｎは１〜５０の整数、ｍは０〜３の整数、ｌは１〜３の整数、ｓは１〜６の整数、但し、６≧ｍ＋ｌ＞０、Ｒは加水分解基を示す。）
【００１３】
請求項２の発明は、前記防汚剤を蒸発させる為の加熱方法としては、抵抗加熱法、電子線加熱法、光加熱法、イオンビーム加熱法、高周波加熱法であることを特徴とする請求項１記載の反射防止膜の製造方法である。
【００２４】
【発明の実施の形態】
本発明を詳細に説明する。
【００２５】
防汚層を被処理基材上に成膜する場合、パーフルオロポリエーテル基を含有する有機シラン化合物からなる防汚剤が使用される。前記有機シラン化合物は、下記一般式（１）で表される化合物またはその重合体が好適である。
Ｒf −（ＯＣ3 Ｆ6 ）n −Ｏ−（ＣＦ2 ）m −（ＣＨ2 ）l −Ｏ−（ＣＨ2 ）s −Ｓｉ（Ｒ）3 …（１）
【００２６】
一般式（１）において、Ｒf は炭素数１〜１６の直鎖状または分岐状パーフルオロアルキル基であり、特に、ＣＦ3 ―、Ｃ2 Ｆ5 ―、Ｃ3 Ｆ7 ―が好ましい。Ｒは加水分解基であり、―Ｃｌ、―Ｂｒ、―Ｉ、―ＯＲ1 、―ＯＯＣＲ1 、―ＯＣ（Ｒ1 ）Ｃ＝Ｃ（Ｒ2 ）2 、―ＯＮ＝Ｃ（Ｒ1 ）2 、―ＯＮ＝ＣＲ3 、―Ｎ（Ｒ2 ）2 、―Ｒ2 ＮＯＣＲ1 等が好ましい。
【００２７】
但し、Ｒ1 はアルキル基等の炭素数１〜１０の脂肪族炭化水素基、またはフェニル基等の炭素数６〜２０の芳香族炭化水素基、Ｒ2 は水素原子またはアルキル基等の炭素数１〜５の脂肪族炭化水素基、Ｒ3 はアルキリデン基等の炭素数３〜６の二価の脂肪族炭化水素基である。
【００２８】
上記の有機シラン化合物中の加水分解基は、１種類のみならず、２種類以上の混合系として用いることも可能である。特に、―ＯＣＨ3 、―ＯＣ2 Ｈ5 、―ＯＯＣＣＨ3 、―ＮＨ2 が好ましい。また、ｎは１〜５０の整数、ｍは０〜３の整数、ｌは０〜３の整数、ｓは０〜６の整数、但し、６≧ｍ＋ｌ＞０である。
【００２９】
作業環境や、膜厚の制御の点から、防汚層形成時には希釈溶媒を用いないＰＶＤ法によることが好ましく、特に真空蒸着法によることが好ましい。該方法では、前記防汚剤を１Ｐａ以下の圧力において加熱し、蒸発させ、被処理基材上に形成する。
【００３０】
加熱方法としては抵抗加熱法、電子線加熱法、光加熱法、イオンビーム加熱法、高周波加熱法のような方法が有効である。ＰＶＤ法によると、従来困難であった防汚層の膜厚をオングストロームオーダーで正確に制御することができる。
【００３１】
前記有機シラン化合物を含有する防汚剤は、被処理基材表面のＯＨ基と有機シラン化合物の加水分解可能な基が反応して加水分解を起こし、化学結合を形成すると考えられている。しかし、一般的に防汚層と被処理基材表面との間の加水分解反応は遅く、防汚層が完全に定着し、最大限の耐防汚性、耐擦傷性、耐溶剤性等が生じるまでに数時間から数十日という時間を要する。
【００３２】
一方、本発明の前処理方法である高周波放電プラズマ法、コロナ処理法は、被処理基材表面をクリーニングするだけではなく、表面の分子同士の結合を切り離し、活性な表面を作り出すことができるため、有機シラン化合物を含有する防汚剤からなる防汚層が容易に定着しやすい被処理基材表面を作り出すことができる。
【００３３】
被処理基材は、光学レンズ、眼鏡レンズ、カメラや双眼鏡、または他の光学装置のレンズ、ビーム・スプリッタ、プリズム、鏡、窓ガラス、反射防止膜、光学フィルターなどの光学部材に対して特に有効である。
【００３４】
【実施例】
以下、本発明の実施例を説明するが、これらに限定されるものではない。
【００３５】
＜実施例１＞
反射防止膜を平行平板型高周波放電装置内に設置し、該装置内を１．０×１０-3Ｐａにまで排気した。該装置内に水素ガスを１０ｓｃｃｍ／ｍｉｎ．の流量で導入して圧力を１．０×１０-1Ｐａに調節した。該装置内に高周波（周波数＝１３．５６ＭＨｚ）を印可し、発生された１００Ｗのプラズマに該反射防止膜を１分間さらすことにより該反射防止膜の表面の前処理を行った。
【００３６】
次に、一般式（２）で表される有機シラン化合物をモリブデンボート上に入れ、真空蒸着法（抵抗加熱法）により、該反射防止膜上に防汚層を作製した。真空蒸着機内を１．０×１０-3Ｐａ以下に排気した後、ボートを４００℃に加熱し、該有機シラン化合物を蒸発させた。
ＣＦ3 −（ＯＣ3 Ｆ6 ）24−Ｏ−（ＣＦ2 ）2 −（ＣＨ2 ）2 −Ｏ−ＣＨ2 −Ｓｉ（ＯＣＨ3 ）3 …（２）
【００３７】
＜実施例２＞
反射防止膜の表面を大気圧中で発生された５０Ｗ／ｍ2 ・ｍｉｎ．のコロナ放電にさらすことにより前処理を行った。次に、実施例１と同様にして前記反射防止膜上に防汚層を形成した。
【００３８】
＜比較例１＞
前記有機シラン化合物を用いて実施例１と同様にして前処理を行っていない反射防止膜上に防汚層を形成した。
上記の実施例１及び２並びに比較例において、各種物性評価方法と結果を（表１）を以下に示す。
【００３９】
（ａ）接触角測定：
接触角計［ＣＡ−Ｘ型：協和界面科学（株）製］を用いて、乾燥状態（２０℃−６５％ＲＨ）で直径１．０ｍｍの液滴を針先に作り、これを基材（固体）の表面に接触させて液滴を作った。接触角とは、固体液体が接する点における液体表面に対する接線と固体表面がなす角で、液体を含む方の角度で定義した。液体には蒸留水を使用した。
【００４０】
（ｂ）耐摩耗性：
基材表面をセルロース製不織布［ベンコットＭ−３：旭化成（株）製］で荷重５００ｇｆ／ｍ2 で１００回こすった後に前記物性評価を行った。
【００４１】
【表１】
【発明の効果】
本発明の方法によれば、各種光学部材（光学レンズ、眼鏡レンズ、カメラや双眼鏡、または他の光学装置のレンズ、ビーム・スプリッタ、プリズム、鏡、窓ガラス、反射防止膜、光学フィルターなど）の表面に、各種光学特性を損なわせることがなく、指紋、皮脂、汗、化粧品などの汚れが付着しにくく、付着しても拭き取りやすい性能を持ち、また、定着性の高く、耐久性のある防汚層を形成することが可能になる。
【図面の簡単な説明】
【図１】本発明の光学部材を示す断面図である。
【符号の説明】
１ 透明基材
２ 防汚層
３ 処理面[0001]
[Industrial application fields]
The present invention relates to a method for forming an antifouling layer on the surface of various substrates to be treated that require antifouling properties. More specifically, the antifouling layer is quickly fixed on various substrates to be treated.
[0002]
[Prior art]
Conventionally, lenses such as optical lenses, spectacle lenses, cameras, and binoculars are usually subjected to antireflection treatment on the surface in order to reduce light reflection and increase light transmittance. When these optical members are used by humans, dirt such as fingerprints, sebum, sweat, cosmetics and the like often adhere.
[0003]
In general, since the surface energy of the antireflection film is as large as about 60 J / m 2, it is difficult to remove such dirt because it easily adheres and has fine irregularities. Further, only the portion where such dirt is attached becomes highly reflective, and there is a problem because the dirt is conspicuous.
[0004]
Therefore, as a means for solving these problems of contamination, a device has been devised to provide an antifouling layer having a performance that makes it difficult for dirt to adhere and easily wipes it off.
[0005]
For example, in Japanese Patent Application Laid-Open No. 64-86101, an antireflection film mainly made of silicon dioxide is provided on the surface of a base material, and the surface is further treated with a compound containing an organosilicon substituent. Antireflective film articles have been proposed.
[0006]
Japanese Patent Application Laid-Open No. 4-338901 proposes a CRT filter having stain resistance and scratch resistance, in which a terminal silanol organopolysiloxane is similarly coated on the surface of a substrate.
[0007]
Japanese Patent Publication No. 6-29332 discloses a low reflectance and antifouling property having an antireflection film comprising a mono and disilane compound containing a polyfluoroalkyl group on the plastic surface and a halogen, alkyl or alkoxy silane compound. Plastic has been proposed.
[0008]
Further, JP-A-7-16940 proposes an optical article in which a copolymer of perfluoroalkyl (meth) acrylate and a monomer having an alkoxysilane group is formed on an optical thin film mainly composed of silicon dioxide. Has been.
[0009]
[Problems to be solved by the invention]
However, in the conventional antifouling layer formation technology, after the antifouling layer is formed, the antifouling property, abrasion resistance, solvent resistance, etc. are maximized for several hours, sometimes several days. In the meantime, dirt and scratches are likely to occur, and when it comes into contact with other articles, a part of the antifouling layer is transferred and the antifouling layer is peeled off.
[0010]
The present invention is intended to solve the above-described problems of the prior art, and an object of the present invention is to provide antifouling resistance by pretreating the surface of a substrate to be treated such as various optical members. Another object of the present invention is to provide a method for forming an antifouling layer that can form an antifouling layer excellent in scratch resistance, solvent resistance and the like in a short time.
[0011]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the invention of
R f - (OC 3 F 6 ) n -O- (CF 2) m - (CH 2) l -O- (CH 2) s -Si (R) 3
... (1)
(However, Rf is a linear or branched perfluoroalkyl group having 1 to 16 carbon atoms, n is an integer of 1 to 50, m is an integer of 0 to 3, l is an integer of 1 to 3, and s is 1. An integer of ˜6, where 6 ≧ m + 1> 0, R represents a hydrolyzable group.
[0013]
The invention of claim 2 is characterized in that the heating method for evaporating the antifouling agent is a resistance heating method, an electron beam heating method, a light heating method, an ion beam heating method, or a high frequency heating method. it is a manufacturing method of the anti-reflection film of
[0024]
DETAILED DESCRIPTION OF THE INVENTION
The present invention will be described in detail.
[0025]
When the antifouling layer is formed on the substrate to be treated, an antifouling agent composed of an organic silane compound containing a perfluoropolyether group is used. The organic silane compound is preferably a compound represented by the following general formula (1) or a polymer thereof.
R f - (OC 3 F 6 ) n -O- (CF 2) m - (CH 2) l -O- (CH 2) s -Si (R) 3 ... (1)
[0026]
In the general formula (1), R f is a linear or branched perfluoroalkyl group having 1 to 16 carbon atoms, and CF 3 —, C 2 F 5 —, and C 3 F 7 — are particularly preferable. R is a hydrolyzable group, -Cl, -Br, -I, -OR 1 , -OOCR 1 , -OC (R 1 ) C = C (R 2 ) 2 , -ON = C (R 1 ) 2 , -ON = CR 3 , -N (R 2 ) 2 , -R 2 NOCR 1 and the like are preferable.
[0027]
Where R 1 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms such as an alkyl group, or an aromatic hydrocarbon group having 6 to 20 carbon atoms such as a phenyl group, and R 2 is a carbon number such as a hydrogen atom or an alkyl group. 1-5 aliphatic hydrocarbon group, R 3 is a divalent aliphatic hydrocarbon group having 3 to 6 carbon atoms such as alkylidene groups.
[0028]
The hydrolyzable group in the organosilane compound can be used not only as one type but also as a mixed system of two or more types. In particular, —OCH 3 , —OC 2 H 5 , —OOCCH 3 , and —NH 2 are preferable. N is an integer of 1 to 50, m is an integer of 0 to 3, l is an integer of 0 to 3, s is an integer of 0 to 6, provided that 6 ≧ m + 1> 0.
[0029]
From the viewpoint of working environment and control of the film thickness, it is preferable to use a PVD method that does not use a diluting solvent when forming an antifouling layer, and particularly preferably a vacuum deposition method. In this method, the antifouling agent is heated at a pressure of 1 Pa or less, evaporated and formed on a substrate to be treated.
[0030]
As the heating method, methods such as a resistance heating method, an electron beam heating method, a light heating method, an ion beam heating method, and a high frequency heating method are effective. According to the PVD method, the film thickness of the antifouling layer, which has been difficult in the past, can be accurately controlled in angstrom order.
[0031]
The antifouling agent containing the organic silane compound is considered to form a chemical bond by causing the OH group on the surface of the substrate to be treated and the hydrolyzable group of the organic silane compound to react to cause hydrolysis. However, in general, the hydrolysis reaction between the antifouling layer and the surface of the substrate to be treated is slow, the antifouling layer is completely fixed, and maximum antifouling resistance, scratch resistance, solvent resistance, etc. It takes several hours to tens of days to occur.
[0032]
On the other hand, high-frequency discharge plasma method Ru pretreatment method der of the present invention, corona treatment is not only to clean the treated surface of the substrate, disconnecting the binding between molecules on the surface, it is possible to produce active surface Therefore, it is possible to create a surface of the substrate to be treated in which the antifouling layer composed of the antifouling agent containing the organosilane compound is easily fixed.
[0033]
The treated substrate is particularly effective for optical members such as optical lenses, eyeglass lenses, lenses for cameras and binoculars, or other optical devices, beam splitters, prisms, mirrors, window glass, antireflection films, optical filters, etc. It is.
[0034]
【Example】
Examples of the present invention will be described below, but the present invention is not limited thereto.
[0035]
<Example 1>
The antireflection film was placed in a parallel plate type high frequency discharge device, and the inside of the device was evacuated to 1.0 × 10 −3 Pa. Hydrogen gas was supplied at 10 sccm / min. The pressure was adjusted to 1.0 × 10 −1 Pa. A high frequency (frequency = 13.56 MHz) was applied in the apparatus, and the surface of the antireflection film was pretreated by exposing the antireflection film to the generated 100 W plasma for 1 minute.
[0036]
Next, the organosilane compound represented by the general formula (2) was put on a molybdenum boat, and an antifouling layer was produced on the antireflection film by a vacuum deposition method (resistance heating method). After evacuating the inside of the vacuum evaporation apparatus to 1.0 × 10 −3 Pa or less, the boat was heated to 400 ° C. to evaporate the organosilane compound.
CF 3 - (OC 3 F 6 ) 24 -O- (CF 2) 2 - (CH 2) 2 -O-CH 2 -Si (OCH 3) 3 ... (2)
[0037]
<Example 2>
50 W / m 2 · min. Generated at atmospheric pressure on the surface of the antireflection film. The pretreatment was performed by exposure to a corona discharge. Next, an antifouling layer was formed on the antireflection film in the same manner as in Example 1.
[0038]
<Comparative Example 1>
Using the organosilane compound, an antifouling layer was formed on the antireflection film that had not been pretreated in the same manner as in Example 1.
In the above Examples 1 and 2 and Comparative Example, various physical property evaluation methods and results (Table 1) are shown below.
[0039]
(A) Contact angle measurement:
Using a contact angle meter [CA-X type: manufactured by Kyowa Interface Science Co., Ltd.], a droplet having a diameter of 1.0 mm is formed on the needle tip in a dry state (20 ° C.-65% RH), and this is formed on a substrate ( The droplets were made in contact with the surface of the solid). The contact angle is the angle formed by the solid surface and the tangent to the liquid surface at the point where the solid liquid contacts, and is defined as the angle containing the liquid. Distilled water was used as the liquid.
[0040]
(B) Abrasion resistance:
The physical properties were evaluated after rubbing the surface of the substrate 100 times with a non-woven fabric made of cellulose [Bencot M-3: manufactured by Asahi Kasei Co., Ltd.] at a load of 500 gf / m 2 .
[0041]
[Table 1]
【The invention's effect】
According to the method of the present invention, various optical members (optical lenses, spectacle lenses, cameras and binoculars, lenses of other optical devices, beam splitters, prisms, mirrors, window glasses, antireflection films, optical filters, etc.) Various optical properties are not impaired on the surface, and dirt such as fingerprints, sebum, sweat, cosmetics, etc. is difficult to adhere, and even if it adheres, it has a performance that is easy to wipe off, and has a high fixability and durable protection A dirty layer can be formed.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an optical member of the present invention.
[Explanation of symbols]
1 transparent substrate 2
Claims (2)
この前処理した反射防止膜表面に一般式（１）で示される有機シラン化合物からなる防汚剤を１Ｐａ以下の圧力において、加熱し、蒸発させ、防汚層を成膜することを特徴とする反射防止膜の製造方法。
Ｒ ｆ −（ＯＣ ３ Ｆ ６ ） ｎ −Ｏ−（ＣＦ ２ ） ｍ −（ＣＨ ２ ） ｌ −Ｏ−（ＣＨ ２ ） ｓ −Ｓｉ（Ｒ） ３
・・・（１）
（但し、Ｒ ｆ は炭素数１〜１６の直鎖状または分岐状パーフルオロアルキル基、ｎは１〜５０の整数、ｍは０〜３の整数、ｌは１〜３の整数、ｓは１〜６の整数、但し、６≧ｍ＋ｌ＞０、Ｒは加水分解基を示す。） At least one surface of the antireflection film is pretreated by either a high frequency discharge plasma method or a corona treatment method,
An antifouling agent comprising an organosilane compound represented by the general formula (1) is heated and evaporated on the pretreated antireflection film surface at a pressure of 1 Pa or less to form an antifouling layer. Manufacturing method of antireflection film.
R f - (OC 3 F 6 ) n -O- (CF 2) m - (CH 2) l -O- (CH 2) s -Si (R) 3
... (1)
(However, Rf is a linear or branched perfluoroalkyl group having 1 to 16 carbon atoms, n is an integer of 1 to 50, m is an integer of 0 to 3, l is an integer of 1 to 3, and s is 1. An integer of ˜6, where 6 ≧ m + 1> 0, R represents a hydrolyzable group.)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11882499A JP4672095B2 (en) | 1999-04-26 | 1999-04-26 | Method for manufacturing antireflection film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11882499A JP4672095B2 (en) | 1999-04-26 | 1999-04-26 | Method for manufacturing antireflection film |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005369437A Division JP2006175438A (en) | 2005-12-22 | 2005-12-22 | Forming method of stain-proofing layer |
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| Publication Number | Publication Date |
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| JP2000308846A JP2000308846A (en) | 2000-11-07 |
| JP4672095B2 true JP4672095B2 (en) | 2011-04-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP11882499A Expired - Fee Related JP4672095B2 (en) | 1999-04-26 | 1999-04-26 | Method for manufacturing antireflection film |
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