TWI810334B - Deep-cut and slow-feed grinding method - Google Patents

Deep-cut and slow-feed grinding method Download PDF

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Publication number
TWI810334B
TWI810334B TW108125925A TW108125925A TWI810334B TW I810334 B TWI810334 B TW I810334B TW 108125925 A TW108125925 A TW 108125925A TW 108125925 A TW108125925 A TW 108125925A TW I810334 B TWI810334 B TW I810334B
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Taiwan
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grinding
plate
shaped workpiece
axis direction
holding
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TW108125925A
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Chinese (zh)
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TW202007470A (en
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山中聡
宮本弘樹
阿部裕樹
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日商迪思科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/04Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
    • B24B49/05Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation including the measurement of a first workpiece already machined and of another workpiece being machined and to be matched with the first one
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/20Drives or gearings; Equipment therefor relating to feed movement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/068Table-like supports for panels, sheets or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/06Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels
    • B24B53/07Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels by means of forming tools having a shape complementary to that to be produced, e.g. blocks, profile rolls

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Disintegrating Or Milling (AREA)
  • Crushing And Grinding (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)

Abstract

本發明的課題是在深切緩進磨削(Creep Feed Grinding)方法中,將工件的被磨削面形成凹凸少的漂亮的面。 其解決手段,深切緩進磨削方法,係磨削手段(7)的旋轉軸(70)對於平台(30)的保持面(300a),比Z軸方向更傾斜,將磨削砥石(741)下面與保持面(300a)的距離形成最小的側設為磨削輪(74)的前方,且將磨削砥石(741)下面與保持面(300a)的距離成為最大的側設為磨削輪(74)的後方,具備: 利用Z軸方向移動手段(5),將前方的磨削砥石(741)的下面定位成比被保持於平台(30)的板狀工件(W)上面更低,且利用Y軸方向移動手段(14),將被保持的板狀工件(W)定位於比前方的磨削砥石(741)更後方側之工程;及 定位工程後,利用Y軸方向移動手段(14),使平台(30)對於磨削手段(7),移動至從磨削輪(74)的後方朝向前方的方向,以前方的磨削砥石(741)的下面及內側面來磨削板狀工件(W)之工程。The object of the present invention is to form a surface to be ground of a workpiece into a beautiful surface with few irregularities in a creep feed grinding method. The solution, the deep-cut and slow-feed grinding method, is that the rotating shaft (70) of the grinding means (7) is more inclined than the Z-axis direction for the holding surface (300a) of the platform (30), and the grinding stone (741) The side with the smallest distance between the lower surface and the holding surface (300a) is set as the front of the grinding wheel (74), and the side with the largest distance between the lower surface of the grinding stone (741) and the holding surface (300a) is set as the grinding wheel. Rear of (74), with: Use the Z-axis direction moving means (5) to position the lower surface of the front grinding stone (741) lower than the upper surface of the plate-shaped workpiece (W) held on the platform (30), and use the Y-axis direction moving means ( 14), the project of positioning the held plate-shaped workpiece (W) on the rear side of the grinding stone (741) in front; and After the positioning project, utilize the Y-axis direction moving means (14) to make the platform (30) move to the direction from the rear of the grinding wheel (74) towards the front for the grinding means (7), and use the grinding whetstone ( 741) to grind the bottom and inner side of the plate-shaped workpiece (W).

Description

深切緩進磨削方法Deep-cut and slow-feed grinding method

本發明是有關磨削板狀工件的深切緩進磨削方法。The invention relates to a deep-cut slow-feed grinding method for grinding plate-like workpieces.

以保持平台來吸引保持具備電極的板狀工件,使環狀地配設磨削砥石的磨削輪旋轉,深切緩進磨削該板狀工件的上面時,若將磨削砥石定位於預定的高度,一邊使在與保持平台的保持面方向平行的Y軸方向保持板狀工件的保持平台朝向磨削砥石移動,一邊以磨削砥石的外周面(外側面)來磨削,則可確保大的磨削力(例如參照專利文獻1或2)。 [先前技術文獻] [專利文獻]Use the holding platform to attract and hold the plate-shaped workpiece with electrodes, rotate the grinding wheel with the grinding stone arranged in the ring, and deep-cut and slow-feed the upper surface of the plate-shaped workpiece, if the grinding stone is positioned at the predetermined position If the holding platform holding the plate-shaped workpiece is moved toward the grinding stone in the Y-axis direction parallel to the holding surface direction of the holding platform, and the outer peripheral surface (outer surface) of the grinding stone is used for grinding, a large The grinding force (for example, refer to Patent Document 1 or 2). [Prior Art Literature] [Patent Document]

[專利文獻1] 日本特開2010-016181號公報 [專利文獻2] 日本特開2009-69759號公報[Patent Document 1] Japanese Patent Laid-Open No. 2010-016181 [Patent Document 2] Japanese Unexamined Patent Publication No. 2009-69759

(發明所欲解決的課題)(Problem to be solved by the invention)

但,若以磨削砥石的外周面來淺磨削板狀工件,則在工件的被磨削面產生凹凸等,有被磨削面粗糙的情形。因此,在深切緩進磨削方法中,有使工件的磨削後的被磨削面形成漂亮的面的課題。However, if the plate-shaped workpiece is shallowly ground by grinding the outer peripheral surface of the whetstone, unevenness or the like is generated on the surface to be ground of the workpiece, and the surface to be ground may be rough. Therefore, in the deep-cut creep-feed grinding method, there is a problem of making the ground surface of the workpiece a beautiful surface after grinding.

又,若深切緩進磨削外形長的板狀工件,則因磨削砥石的消耗,磨削砥石開始進入工件之處的厚度與在磨削終了後磨削砥石離開工件之處的厚度會有產生大的厚度差的情形。 因此,在對長的板狀工件實施深切緩進磨削時,有縮小被磨削面的厚度差的課題。 (用以解決課題的手段)Also, if deep-cutting and slow-feeding grind a long plate-shaped workpiece, due to the consumption of the grinding stone, the thickness of the place where the grinding stone starts to enter the workpiece and the thickness of the place where the grinding stone leaves the workpiece after the end of grinding will be different. A case where a large difference in thickness occurs. Therefore, when performing deep-cut creep-feed grinding on a long plate-shaped workpiece, there is a problem of reducing the difference in thickness of the surface to be ground. (means to solve the problem)

用以解決上述課題的本發明係一種深切緩進磨削方法,係利用磨削裝置,以被定位於比該板狀工件的上面更低的位置的該磨削砥石來磨削板狀工件之深切緩進磨削方法,該磨削裝置係具備: 保持平台,其係具有保持板狀工件的保持面; 磨削手段,其係將環狀地配設磨削砥石的磨削輪安裝於連結至旋轉軸的前端的固定台架,使該旋轉軸旋轉,以該磨削砥石來磨削板狀工件; Y軸方向移動手段,其係使該保持平台與該磨削手段相對地移動於與該保持面方向平行的Y軸方向;及 Z軸方向移動手段,其係使該磨削手段移動於與Y軸方向正交且對於該保持面垂直的Z軸方向, 其特徵為: 該旋轉軸,係對於該保持面,比Z軸方向更傾斜,將該磨削砥石的下面與該保持面的距離形成最小的側設為該磨削輪的前方,且將該磨削砥石的下面與該保持面的距離成為最大的側設為該磨削輪的後方, 具備: 定位工程,其係利用該Z軸方向移動手段,將該前方的磨削砥石的下面定位成比被保持於該保持平台的板狀工件的上面更低,且利用該Y軸方向移動手段,將被保持於該保持平台的板狀工件定位於比該前方的磨削砥石更後方側;及 磨削工程,其係於該定位工程之後,利用該Y軸方向移動手段,使該保持平台對於該磨削手段,移動至從該磨削輪的該後方朝向該前方的方向,以該前方的磨削砥石的下面及內側面來磨削板狀工件。The present invention to solve the above-mentioned problems is a deep-cut and creep-feed grinding method in which a plate-shaped workpiece is ground with the grinding stone positioned at a lower position than the upper surface of the plate-shaped workpiece using a grinding device. Deep-cut and slow-feed grinding method, the grinding device is equipped with: A holding platform having a holding surface for holding a plate-shaped workpiece; Grinding means, which is to install a grinding wheel ring-shaped with a grinding stone on a fixed stand connected to the front end of the rotating shaft, rotate the rotating shaft, and grind a plate-shaped workpiece with the grinding stone; Y-axis direction moving means, which is to move the holding platform and the grinding means relatively in the Y-axis direction parallel to the direction of the holding surface; and The Z-axis direction movement means moves the grinding means in the Z-axis direction perpendicular to the Y-axis direction and perpendicular to the holding surface, Its characteristics are: The rotation axis is more inclined than the Z-axis direction with respect to the holding surface, and the side where the distance between the lower surface of the grinding stone and the holding surface is minimized is set as the front of the grinding wheel, and the side of the grinding stone is The side at which the distance between the lower surface and the holding surface becomes the largest is set as the rear of the grinding wheel, have: The positioning process is to use the moving means in the Z-axis direction to position the lower surface of the front grinding stone lower than the upper surface of the plate-shaped workpiece held on the holding platform, and to use the moving means in the Y-axis direction to place the The plate-shaped workpiece held on the holding platform is positioned on the rear side of the front grinding stone; and Grinding process, after the positioning process, using the Y-axis direction moving means to move the holding platform to the direction from the rear of the grinding wheel towards the front of the grinding means, with the front Grinding the bottom and inner side of the whetstone to grind plate-shaped workpieces.

在本發明的深切緩進磨削方法中,具備: 測定工程,其係以被配設於前述環狀的磨削砥石的外側的上面高度測定手段來測定剛開始深切緩進磨削之後的板狀工件的上面高度;及 修正工程,其係按照在該測定工程測定的測定值來使前述磨削手段移動於Z軸方向,縮小磨削後的板狀工件的厚度差。In the deep-cut and slow-feed grinding method of the present invention, it has: Measuring process, which is to measure the upper surface height of the plate-shaped workpiece immediately after the deep-cut and creep-feed grinding is started by means of the upper surface height measurement means arranged on the outer side of the aforementioned annular grinding stone; and In the correction process, the grinding means is moved in the Z-axis direction according to the measurement value measured in the measurement process, and the difference in thickness of the plate-shaped workpiece after grinding is reduced.

在本發明的深切緩進磨削方法中,在前述定位工程中,將前述後方的磨削砥石的下面定位於比被保持於前述保持平台的板狀工件的上面更低的位置為理想。 [發明的效果]In the deep-cut creep grinding method of the present invention, in the positioning process, it is desirable to position the lower surface of the rear grinding stone at a lower position than the upper surface of the plate-shaped workpiece held on the holding table. [Effect of the invention]

本發明的深切緩進磨削,係旋轉軸對於保持面,比Z軸方向更傾斜,將磨削砥石的下面與保持面的距離形成最小的側設為磨削輪的前方,且將磨削砥石的下面與保持面的距離成為最大的側設為磨削輪的後方, 具備: 定位工程,其係利用Z軸方向移動手段,將前方的磨削砥石的下面定位成比被保持於保持平台的板狀工件的上面更低,且利用Y軸方向移動手段,將被保持於保持平台的板狀工件定位於比前方的磨削砥石更後方側;及 磨削工程,其係於定位工程之後,利用Y軸方向移動手段,使保持平台對於磨削手段,移動至從磨削輪的後方朝向前方的方向,以前方的磨削砥石的下面及內側面來磨削板狀工件, 藉此,可使磨削後的板狀工件的上面成為未產生凹凸等的漂亮的被磨削面。In the deep-cut and slow-feed grinding of the present invention, the rotation axis is more inclined than the Z-axis direction with respect to the holding surface, and the side where the distance between the bottom of the grinding stone and the holding surface is the smallest is set as the front of the grinding wheel, and the grinding The side where the distance between the bottom of the whetstone and the holding surface becomes the largest is set as the rear of the grinding wheel, have: Positioning process, which is to use the Z-axis direction movement means to position the lower side of the grinding stone in front to be lower than the upper surface of the plate-shaped workpiece held on the holding platform, and use the Y-axis direction movement means to position the workpiece held on the holding platform. The plate-shaped workpiece of the platform is positioned on the rear side than the front grinding stone; and Grinding process, which is after the positioning process, uses the Y-axis direction movement means to move the holding platform to the direction from the rear of the grinding wheel to the front of the grinding means to grind the bottom and inner side of the grinding stone in front to grind plate workpieces, Thereby, the upper surface of the plate-shaped workpiece after grinding can be made into a beautiful ground surface without unevenness or the like.

本發明的深切緩進磨削,係具備: 測定工程,其係以被配設於環狀的磨削砥石的外側的上面高度測定手段來測定剛開始深切緩進磨削之後的板狀工件的上面高度;及 修正工程,其係按照在測定工程測定的測定值來使磨削手段移動於Z軸方向,縮小磨削後的板狀工件的厚度差, 藉此,可縮小磨削後的板狀工件W的厚度差。The deep-cut and slow-feed grinding of the present invention has: Measuring process, which is to measure the upper surface height of the plate-shaped workpiece immediately after the deep-cut and creep-feed grinding is started by using the upper surface height measurement means arranged on the outer side of the ring-shaped grinding stone; and Correction process, which is to move the grinding means in the Z-axis direction according to the measurement value measured in the measurement process, and reduce the thickness difference of the plate-shaped workpiece after grinding, Thereby, the difference in thickness of the plate-shaped workpiece W after grinding can be reduced.

在定位工程中,將後方的磨削砥石的下面定位於比被保持於保持平台的板狀工件的上面更低的位置, 藉此,首先以後方的磨削砥石的外側面及下面來大幅度磨削板狀工件,且進一步以前方的磨削砥石的內側面及下面來磨削被後方的磨削砥石的外側面及下面所磨削的板狀工件的上面,藉此可使磨削後的板狀工件的上面成為未產生凹凸等的漂亮的被磨削面。In the positioning process, the lower surface of the rear grinding stone is positioned lower than the upper surface of the plate-shaped workpiece held on the holding platform, In this way, first, the plate-shaped workpiece is largely ground with the outer surface and lower surface of the rear grinding stone, and further, the outer surface and lower surface of the rear grinding stone are ground with the inner surface and lower surface of the front grinding stone. The upper surface of the plate-shaped workpiece to be ground below can make the upper surface of the plate-shaped workpiece after grinding into a beautiful ground surface without unevenness or the like.

圖1所示的磨削裝置1是藉由旋轉的磨削輪74來磨削被保持於保持平台30上的板狀工件W之裝置,具備:延伸於Y軸方向的裝置底部10,及被立設在裝置底部10上的後方(+Y方向側)的支柱11。 磨削裝置1的裝置底部10上的前方(-Y方向側)是對於保持平台30上進行板狀工件W的裝卸的裝卸區域,裝置底部10上的後方是藉由磨削手段7來進行被保持於保持平台30上的板狀工件W的磨削的磨削區域。The grinding device 1 shown in FIG. 1 is a device for grinding a plate-shaped workpiece W held on a holding platform 30 by a rotating grinding wheel 74. It has a device bottom 10 extending in the Y-axis direction, and a The pillar 11 is erected on the rear side (+Y direction side) of the device bottom 10 . The front side (-Y direction side) of the device bottom 10 of the grinding device 1 is a loading and unloading area for loading and unloading the plate-shaped workpiece W on the holding platform 30, and the rear part of the device bottom 10 is where the workpiece W is loaded and unloaded by the grinding means 7. Grinding area for grinding the plate-shaped workpiece W held on the holding table 30 .

在圖2詳示的板狀工件W是具有:例如由PCB等所成的矩形狀的基板W1,及母材為矽等的矩形狀的晶片W2。在基板W1的上面接合晶片W2的下面。 在晶片W2的上面是形成有未圖示的裝置。在此裝置的表面是分別立設有複數的圓柱狀的電極E。電極E是構成為例如以銅為主要素。 在晶片W2的上面是藉由環氧樹脂等的樹脂層J來密封,各電極E的上端部是藉由樹脂層J來覆蓋。The plate-shaped workpiece W shown in detail in FIG. 2 includes, for example, a rectangular substrate W1 made of PCB or the like, and a rectangular wafer W2 whose base material is silicon or the like. The lower surface of the wafer W2 is bonded to the upper surface of the substrate W1. Devices not shown are formed on the upper surface of the wafer W2. On the surface of the device, a plurality of cylindrical electrodes E are respectively erected. The electrode E is composed, for example, of copper as a main component. The upper surface of the wafer W2 is sealed with a resin layer J such as epoxy resin, and the upper ends of the electrodes E are covered with the resin layer J.

樹脂層J的上面是成為板狀工件W的上面Wa,基板W1的下面是成為板狀工件W的下面Wb。板狀工件W的下面Wb是亦可例如貼著未圖示的保護膠帶來保護。 作為矩形狀的板狀工件W的大小之一例,縱600mm×橫300mm。The upper surface of the resin layer J is the upper surface Wa to be the plate-shaped workpiece W, and the lower surface of the substrate W1 is the lower surface Wb to be the plate-shaped workpiece W. The lower surface Wb of the plate-shaped workpiece W may be protected by affixing, for example, a not-shown protective tape. As an example of the size of the rectangular plate-shaped workpiece W, it is 600 mm in length and 300 mm in width.

例如,圖1所示的保持平台30是具備:由多孔構件等所成,吸附板狀工件W的吸附部300,及支撐吸附部300的框體301。吸附部300是連通至真空發生裝置等的未圖示的吸引源,藉由吸引源吸引而產生的吸引力會被傳達至吸附部300的露出面的保持面300a,藉此保持平台30可在保持面300a上吸引保持板狀工件W。 並且,保持平台30是一面藉由蓋39來包圍周圍,一面藉由被配設在保持平台30的下方的旋轉手段34來可繞著Z軸方向的軸心旋轉。 另外,旋轉手段34是磨削加工中使停止,因此亦可不具備。For example, the holding platform 30 shown in FIG. 1 includes a suction unit 300 made of a porous member or the like, which suctions a plate-shaped workpiece W, and a frame body 301 which supports the suction unit 300 . The suction part 300 is connected to an unillustrated suction source such as a vacuum generator, and the suction force generated by the suction source will be transmitted to the holding surface 300a of the exposed surface of the suction part 300, whereby the holding platform 30 can be moved The plate-shaped workpiece W is sucked and held on the holding surface 300a. Furthermore, the holding platform 30 is surrounded by a cover 39 and is rotatable around the axis in the Z-axis direction by the rotating means 34 disposed below the holding platform 30 . In addition, since the rotating means 34 is stopped during grinding processing, it does not need to be provided.

在保持平台30、蓋39及被連結至蓋39的蛇腹蓋39a的下方是配設有使保持平台30移動於與保持面300a方向平行的Y軸方向的Y軸方向移動手段14。Y軸方向移動手段14是具備:具有Y軸方向的軸心的滾珠螺桿140、與滾珠螺桿140平行配設的一對的導軌141、連結至滾珠螺桿140使滾珠螺桿140轉動的馬達142、及在內部具備的螺帽會螺合於滾珠螺桿140且底部會滑動於導軌141上的可動板143,一旦馬達142使滾珠螺桿140轉動,則伴隨於此,可動板143會被引導於導軌141而移動於Y軸方向,在可動板143上經由旋轉手段34來配設的保持平台30會移動至Y軸方向。蛇腹蓋39a是隨著保持平台30的移動而伸縮於Y軸方向。Below the holding platform 30 , the cover 39 and the bellows cover 39 a connected to the cover 39 is provided a Y-axis direction moving means 14 for moving the holding platform 30 in the Y-axis direction parallel to the direction of the holding surface 300 a. The Y-axis direction moving means 14 is provided with: a ball screw 140 having an axis in the Y-axis direction, a pair of guide rails 141 arranged parallel to the ball screw 140, a motor 142 connected to the ball screw 140 to rotate the ball screw 140, and The nut provided inside is screwed to the ball screw 140 and the bottom of the movable plate 143 slides on the guide rail 141 . Once the motor 142 rotates the ball screw 140 , the movable plate 143 is guided on the guide rail 141 accordingly. Moving in the Y-axis direction, the holding platform 30 disposed on the movable plate 143 via the rotating means 34 moves in the Y-axis direction. The bellows cover 39 a expands and contracts in the Y-axis direction as the holding platform 30 moves.

在支柱11的前面是配設有使磨削手段7移動於與Y軸方向正交且對於保持平台30的保持面300a垂直的Z軸方向之Z軸方向移動手段5。Z軸方向移動手段5是具備:具有Z軸方向的軸心的滾珠螺桿50、與滾珠螺桿50平行配設的一對的導軌51、連結至滾珠螺桿50的上端使滾珠螺桿50轉動的馬達52、及內部的螺帽會螺合於滾珠螺桿50且側部會滑接於導軌51的昇降板53,一旦馬達52使滾珠螺桿50轉動,則伴隨於此,昇降板53會被引導於導軌51而往返移動於Z軸方向,被固定於昇降板53的磨削手段7會被磨削進給於Z軸方向。A Z-axis direction moving means 5 for moving the grinding means 7 in the Z-axis direction perpendicular to the Y-axis direction and perpendicular to the holding surface 300 a of the holding table 30 is arranged in front of the pillar 11 . The Z-axis direction moving means 5 is provided with: a ball screw 50 having an axis in the Z-axis direction, a pair of guide rails 51 arranged parallel to the ball screw 50 , and a motor 52 connected to the upper end of the ball screw 50 to rotate the ball screw 50 , and the internal nut will be screwed on the ball screw 50 and the side will slide on the lifting plate 53 of the guide rail 51. Once the motor 52 rotates the ball screw 50, the lifting plate 53 will be guided on the guide rail 51 accordingly. While moving back and forth in the Z-axis direction, the grinding means 7 fixed to the lifting plate 53 will be ground and fed in the Z-axis direction.

磨削手段7是具備: 軸方向對於保持平台30的保持面300a,比Z軸方向更傾斜的旋轉軸70; 可旋轉地支撐旋轉軸70的機殼(housing)71; 旋轉驅動旋轉軸70的馬達72; 被連結至旋轉軸70的前端的圓形板狀的固定台架(mount)73; 被安裝於固定台架73的下面的磨削輪74;及 支撐機殼71,其側面會被固定於Z軸方向移動手段5的昇降板53的支架(holder)75。Grinding means 7 is equipped with: The axial direction is more inclined than the Z-axis direction with respect to the holding surface 300a of the holding platform 30; a casing (housing) 71 that rotatably supports the rotating shaft 70; a motor 72 that rotatably drives the rotary shaft 70; A circular plate-shaped fixed stand (mount) 73 connected to the front end of the rotating shaft 70; The grinding wheel 74 is mounted on the lower side of the fixed stand 73; and The side of the support case 71 is fixed to a holder 75 of the lifting plate 53 of the moving means 5 in the Z-axis direction.

藉由旋轉軸70比Z軸方向更傾斜,環狀的磨削砥石741也形成比Z軸方向更傾斜的狀態。而且,將圖2所示的磨削砥石741的下面741b與保持平台30的保持面300a的距離形成最小的側(-Y方向側)設為磨削輪74的前方(亦即,磨削砥石741的前方)。並且,將磨削砥石741的下面741b與保持面300a的距離成為最大的側(圖2的+Y方向側)設為磨削輪74的後方(磨削砥石741的後方)。 另外,在圖2中,將磨削裝置1的各構成要素的一部分簡略化及省略表示。Since the rotating shaft 70 is more inclined than the Z-axis direction, the ring-shaped grinding stone 741 is also in a state of being more inclined than the Z-axis direction. Moreover, the side (the side in the −Y direction) on which the distance between the lower surface 741b of the grinding stone 741 shown in FIG. 741 ahead). Furthermore, the side (the side in the +Y direction in FIG. 2 ) where the distance between the lower surface 741b of the grinding stone 741 and the holding surface 300a is the largest is defined as the rear of the grinding wheel 74 (the rear of the grinding stone 741 ). In addition, in FIG. 2, a part of each component of the grinding apparatus 1 is simplified and abbreviate|omitted and shown.

旋轉軸70之來自Z軸方向的傾斜角度是成為些微的角度,該角度是例如對應於磨削輪74的直徑來設定預定的值。 旋轉軸70之來自Z軸方向的傾斜角度,例如磨削輪74的直徑(mm)為Φ300時,被設成前方的磨削砥石741的下面741b的高度位置與後方的磨削砥石741的下面741b的高度位置的差L0例如成為20μm~30μm的角度。 又,旋轉軸70之來自Z軸方向的傾斜角度,例如磨削輪74的直徑(mm)為Φ500時,被設定成前方的磨削砥石741的下面741b的高度位置與後方的磨削砥石741的下面741b的高度位置的差L0例如成為30μm~50μm的角度。 另外,保持平台30的保持面300a在旋轉軸70被傾斜的狀態下,以磨削砥石741的下面741b磨削,下面741b與保持面300a被平行之後,使板狀工件W保持於保持面300a,以磨削砥石741的下面741b磨削。The inclination angle of the rotation shaft 70 from the Z-axis direction is a slight angle, and the angle is set to a predetermined value corresponding to the diameter of the grinding wheel 74, for example. The inclination angle of the rotating shaft 70 from the Z-axis direction, for example, when the diameter (mm) of the grinding wheel 74 is Φ300, is set at the height position of the lower surface 741b of the front grinding stone 741 and the lower surface of the rear grinding stone 741. The height position difference L0 of 741b is, for example, an angle of 20 μm to 30 μm. In addition, the inclination angle of the rotating shaft 70 from the Z-axis direction is set so that the height position of the lower surface 741b of the front grinding stone 741 and the height position of the rear grinding stone 741 are set when the diameter (mm) of the grinding wheel 74 is Φ500, for example. The difference L0 of the height position of the lower surface 741b is, for example, an angle of 30 μm to 50 μm. In addition, the holding surface 300a of the holding table 30 is ground with the lower surface 741b of the grinding stone 741 in the state where the rotating shaft 70 is inclined, and after the lower surface 741b is parallel to the holding surface 300a, the plate-shaped workpiece W is held on the holding surface 300a. , to grind with the following 741b of the grinding whetstone 741.

磨削輪74是具備圓環狀的輪基台740,在輪基台740的底面的外周側的區域是環狀地配設有大致長方體形狀的複數的磨削砥石741。磨削砥石741是以預定的黏合劑來固定鑽石砥粒等而成形。並且,磨削砥石741是例如用以磨削具備以銅等所構成的電極E的板狀工件W的砥石,砥石中的空孔的比例或大小與通常的磨削砥石作比較為大者。磨削砥石741中的空孔的比例或大小被設定成大的理由是因為若以通常的磨削砥石來磨削電極E,則構成電極E的銅容易堵塞於磨削砥石的空孔,所以為了防止此堵塞。另一方面,因為磨削砥石741是空孔的比例或大小被設定成大的砥石,所以隨著板狀工件W的磨削的磨耗量也比通常的磨削砥石大。The grinding wheel 74 is provided with an annular wheel base 740 , and a plurality of grinding stones 741 having a substantially rectangular parallelepiped shape are arranged annularly in an area on the outer peripheral side of the bottom surface of the wheel base 740 . The grinding stone 741 is shaped by fixing diamond grains and the like with a predetermined binder. In addition, the grinding stone 741 is used for grinding a plate-shaped workpiece W provided with an electrode E made of copper or the like, for example, and the ratio or size of pores in the grinding stone is larger than that of a normal grinding stone. The reason why the ratio or size of the pores in the grinding stone 741 is set to be large is because if the electrode E is ground with a normal grinding stone, the copper constituting the electrode E is likely to clog the pores of the grinding stone, so To prevent this clogging. On the other hand, since the grinding stone 741 has a large ratio or size of voids, the amount of wear accompanying the grinding of the plate-shaped workpiece W is larger than that of a normal grinding stone.

例如,在旋轉軸70的內部,連通至磨削水供給源而成為磨削水的通道的未圖示的流路會貫通於旋轉軸70的軸方向來形成,流路是開口成可在磨削輪74的底面朝向磨削砥石741噴出磨削水。For example, in the inside of the rotating shaft 70, a flow path (not shown) that communicates with the grinding water supply source and becomes a passage of grinding water is formed through the axial direction of the rotating shaft 70, and the flow path is opened so that it can be used in the grinding process. The bottom surface of the shaving wheel 74 sprays grinding water toward the grinding stone 741 .

如圖1所示般,在保持平台30的移動路徑上方,配設有以接觸式來測定被保持於保持平台30的板狀工件W的上面Wa的高度之上面高度測定手段38。上面高度測定手段38是在其前端具備昇降於上下方向接觸於被測定面的接觸頭(contact)380,該接觸頭380是例如被形成朝向下方漸次縮徑的銳頭狀。接觸頭380是藉由臂部381來支持,臂部381是可藉由內藏於其內部的彈簧所產生的推壓力來以適當的力對於被測定面推壓接觸頭380。正在實施深切緩進磨削之中,上面高度測定手段38是在磨削手段7的環狀的磨削砥石741的外側測定板狀工件W的上面Wa的高度。 另外,上面高度測定手段是亦可為將測定光照射至板狀工件W的上面Wa的非接觸式者。As shown in FIG. 1 , above the moving path of the holding table 30 , a top surface height measuring means 38 for measuring the height of the top surface Wa of the plate-shaped workpiece W held on the holding table 30 by a contact method is arranged. The upper surface height measuring means 38 is equipped with a contact 380 at its front end that moves up and down to contact the surface to be measured. The contact 380 is, for example, formed in the shape of a sharp head whose diameter gradually decreases downward. The contact head 380 is supported by the arm part 381, and the arm part 381 can push the contact head 380 against the surface to be measured with an appropriate force by the pressing force generated by the spring built in the arm part 381. While deep-cut and creep-feed grinding is being performed, the upper surface height measuring means 38 measures the height of the upper surface Wa of the plate-shaped workpiece W outside the annular grinding stone 741 of the grinding means 7 . In addition, the upper surface height measuring means may be a non-contact type which irradiates the upper surface Wa of the plate-shaped workpiece W with measurement light.

如圖1所示般,磨削裝置1是具備包含CPU及記憶體等的記憶部91進行裝置全體的控制的控制手段9。控制手段9是藉由未圖示的配線來電性連接至Z軸方向移動手段5、Y軸方向移動手段14等,在控制手段9的控制之下,控制藉由Z軸方向移動手段5之磨削手段7往Z軸方向的移動動作及定位高度、及藉由Y軸方向移動手段14之保持平台30的移動速度等。As shown in FIG. 1 , the grinding apparatus 1 is a control means 9 that includes a memory unit 91 including a CPU, a memory, and the like, and controls the entire apparatus. The control means 9 is electrically connected to the moving means 5 in the Z-axis direction and the moving means 14 in the Y-axis direction through unshown wiring. The moving action and positioning height of the cutting means 7 in the Z-axis direction, and the moving speed of the holding platform 30 by the moving means 14 in the Y-axis direction, etc.

例如,上述的Z軸方向移動手段5的馬達52是藉由從未圖示的脈衝振盪器供給的驅動脈衝來動作的脈衝馬達。控制手段9是計數被供給至Z軸方向移動手段5的驅動脈衝數。辨識磨削手段7的高度位置。 另外,亦可將Z軸方向移動手段5的馬達52設為伺服馬達,作為旋轉編碼器會被連接至伺服馬達的構成。旋轉編碼器是被連接至亦具有作為伺服放大器的機能的控制手段9,從控制手段9對於伺服馬達供給動作訊號之後,對於控制手段9輸出編碼器訊號(伺服馬達的旋轉數)。控制手段9是依據接受的編碼器訊號,算出磨削手段7的Z軸方向的移動量,辨識其高度位置。For example, the motor 52 of the above-mentioned Z-axis direction moving means 5 is a pulse motor operated by a drive pulse supplied from a pulse oscillator not shown. The control means 9 counts the number of drive pulses supplied to the Z-axis direction moving means 5 . Identify the height position of the grinding means 7. In addition, the motor 52 of the Z-axis direction moving means 5 may be used as a servo motor, and a rotary encoder may be connected to the servo motor. The rotary encoder is connected to the control means 9 which also functions as a servo amplifier, and after an operation signal is supplied to the servo motor from the control means 9, an encoder signal (number of revolutions of the servo motor) is output to the control means 9. The control means 9 calculates the movement amount of the grinding means 7 in the Z-axis direction according to the received encoder signal, and identifies its height position.

(深切緩進磨削方法的實施形態1) 以下,利用圖1~圖4來說明有關藉由磨削裝置1來深切緩進磨削板狀工件W時的各工程。(Embodiment 1 of deep-cut creep grinding method) Hereinafter, each process related to the deep-cutting and creep-feed grinding of the plate-shaped workpiece W by the grinding device 1 will be described with reference to FIGS. 1 to 4 .

(1)定位工程 首先,圖1、2所示的板狀工件W會在裝置底部10上的裝卸區域,將樹脂層J朝向上側,載置於保持平台30的保持面300a上。然後,藉由被連接至保持平台30的未圖示的吸引源作動而產生的吸引力傳達至保持面300a,板狀工件W會藉由保持平台30來吸引保持。(1) Positioning engineering First, the plate-shaped workpiece W shown in FIGS. 1 and 2 is placed on the holding surface 300 a of the holding platform 30 with the resin layer J facing upward in the loading and unloading area on the bottom 10 of the apparatus. Then, the suction force generated by the operation of an unillustrated suction source connected to the holding table 30 is transmitted to the holding surface 300 a, and the plate-shaped workpiece W is sucked and held by the holding table 30 .

藉由Y軸方向移動手段14使吸引保持板狀工件W的保持平台30從裝置底部10上的裝卸區域移動至磨削區域內的+Y方向的預定的位置,保持平台30會被定位於Y軸方向進給的開始位置。亦即,被保持於保持平台30的板狀工件W會被定位於比磨削砥石741的下面741b與保持平台30的保持面300a的距離形成最小的前方側(-Y方向側)的磨削砥石741更後方側。The holding platform 30 that attracts and holds the plate-shaped workpiece W moves from the loading and unloading area on the bottom 10 of the device to a predetermined position in the +Y direction in the grinding area by the Y-axis direction moving means 14, and the holding platform 30 will be positioned in the Y direction. The start position of axis direction feed. That is, the plate-shaped workpiece W held on the holding table 30 is positioned on the front side (the side in the −Y direction) where the distance between the lower surface 741 b of the grinding stone 741 and the holding surface 300 a of the holding table 30 is the smallest. Whetstone 741 is on the rear side.

而且,磨削手段7會藉由Z軸方向移動手段5來朝-Z方向傳送,在藉由控制手段9之Z軸方向移動手段5的控制下,磨削手段7會被定位於成為磨削砥石741的最下端的前方的磨削砥石741切入至板狀工件W的上面Wa的預定的高度位置。亦即,前方的磨削砥石741的下面741b會形成被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的狀態。另外,磨削手段7的被定位的高度位置是前方的磨削砥石741的下面741b及內側面741c會預定量切入至樹脂層J及電極E的高度位置。 另外,在磨削加工之前,實施記憶前方(-Y方向側)的該磨削砥石741的下面741b接觸於保持平台30的保持面300a的磨削手段7的高度位置之建立(set up),被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的該前方的磨削砥石741的下面741b的位置是從建立記憶之磨削手段7的高度位置到板狀工件W的完工厚度上的位置。Moreover, the grinding means 7 will be transmitted in the -Z direction by the moving means 5 in the Z-axis direction, and under the control of the moving means 5 in the Z-axis direction by the control means 9, the grinding means 7 will be positioned to become The grinding whetstone 741 in front of the lowermost end of the whetstone 741 cuts to a predetermined height position on the upper surface Wa of the plate-shaped workpiece W. As shown in FIG. That is, the lower surface 741b of the front grinding stone 741 is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30 . In addition, the height position at which the grinding means 7 is positioned is the height position at which the lower surface 741b and the inner surface 741c of the front grinding stone 741 cut into the resin layer J and the electrode E by a predetermined amount. In addition, before the grinding process, the height position of the grinding means 7 in which the lower surface 741b of the grinding stone 741 in the front (-Y direction side) is in contact with the holding surface 300a of the holding table 30 is set up, The position of the lower surface 741b of the front grinding stone 741, which is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30, is from the height position of the memory-built grinding means 7 to the plate-shaped workpiece W. The location on the finished thickness of .

(2)磨削工程 圖1所示的馬達72會將旋轉軸70旋轉驅動於例如從+Z方向來看逆時針方向,伴隨於此,磨削輪74會旋轉。 如圖3所示般,Y軸方向移動手段14會使吸引保持板狀工件W的保持平台30以預定的進給速度來移動至-Y方向,亦即,使保持平台30對於磨削手段7,移動至從磨削輪74的後方(+Y方向側)朝向前方(-Y方向側)的方向。然後,以旋轉的前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的樹脂層J及電極E的圓形上面。另外,在被磨削的板狀工件W的上面Wa出現的樹脂層J的面積與全電極E的圓形上面的面積的合計的比率之一例是例如樹脂層J:全電極E的圓形上面=20:80。 另外,旋轉的後方(+Y方向側)的磨削砥石741是未磨削板狀工件W。(2) Grinding engineering The motor 72 shown in FIG. 1 rotates the rotating shaft 70 in the counterclockwise direction viewed from the +Z direction, for example, and the grinding wheel 74 rotates accordingly. As shown in FIG. 3 , the Y-axis direction moving means 14 moves the holding platform 30 that attracts and holds the plate-shaped workpiece W to the -Y direction at a predetermined feed speed, that is, the holding platform 30 moves to the -Y direction with respect to the grinding means 7. , moving to the direction from the rear (+Y direction side) of the grinding wheel 74 toward the front (−Y direction side). Then, the resin layer J of the plate-shaped workpiece W and the circular upper surface of the electrode E are ground with the lower surface 741b and the inner surface 741c of the grinding stone 741 rotating in front. In addition, an example of the ratio of the area of the resin layer J appearing on the upper surface Wa of the plate-shaped workpiece W to be ground to the total area of the circular upper surface of the full electrode E is, for example, the resin layer J: the circular upper surface of the full electrode E =20:80. In addition, the grinding whetstone 741 at the rear side of the rotation (+Y direction side) is the plate-shaped workpiece W that has not been ground.

然後,如圖4所示般,使保持平台30移動至-Y方向的預定的位置,藉由前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的上面Wa全面之後,磨削手段7會拉起至+Z方向而從板狀工件W離開。Then, as shown in FIG. 4 , the holding table 30 is moved to a predetermined position in the -Y direction, and the entire upper surface Wa of the plate-shaped workpiece W is ground by the lower surface 741b and the inner surface 741c of the front grinding stone 741. , the grinding means 7 is pulled up to the +Z direction and separated from the plate-shaped workpiece W.

如上述般,本發明的深切緩進磨削方法是具備:旋轉軸70對於保持平台30的保持面300a,比Z軸方向更傾斜,將磨削砥石741的下面741b與保持平台30的保持面300a的距離形成最小的側設為磨削輪74的前方,且將磨削砥石741的下面741b與保持平台30的保持面300a的距離成為最大的側設為磨削輪74的後方,利用Z軸方向移動手段5,將該前方(-Y方向側)的磨削砥石741的下面741b定位成比被保持於保持平台30的板狀工件W的上面Wa更低,且利用Y軸方向移動手段14,將被保持於保持平台30的板狀工件W定位於比前方的磨削砥石741更後方側(+Y方向側)的定位工程,及定位工程之後,利用Y軸方向移動手段14,使保持平台30對於磨削手段7,移動成從磨削輪74的後方(+Y方向)朝向前方(-Y方向),以前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的磨削工程,藉此可使磨削後的板狀工件W的被磨削面之上面Wa成為幾乎未產生凹凸等的漂亮的被磨削面。As mentioned above, the deep-cutting creep grinding method of the present invention is equipped with: the rotating shaft 70 is more inclined than the Z-axis direction with respect to the holding surface 300a of the holding platform 30, and the lower surface 741b of the grinding stone 741 is connected to the holding surface of the holding platform 30. The side where the distance of 300a is the smallest is set as the front of the grinding wheel 74, and the side where the distance between the lower surface 741b of the grinding stone 741 and the holding surface 300a of the holding platform 30 becomes the largest is set as the rear of the grinding wheel 74, using Z The axial direction moving means 5 positions the lower surface 741b of the grinding stone 741 at the front (-Y direction side) lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30, and uses the Y axis direction moving means 14. The positioning process of positioning the plate-shaped workpiece W held on the holding table 30 on the rear side (+Y direction side) than the front grinding stone 741, and after the positioning process, use the Y-axis direction moving means 14 to make The holding table 30 moves toward the front (-Y direction) from the rear (+Y direction) of the grinding wheel 74 with respect to the grinding means 7, and grinds the plate shape with the lower surface 741b and the inner side surface 741c of the front grinding stone 741. In the grinding process of the workpiece W, the upper surface Wa of the ground surface of the plate-shaped workpiece W after grinding can be made into a beautiful ground surface with almost no unevenness or the like.

(深切緩進磨削方法的實施形態2) 以下,利用圖1及圖5~圖8說明有關藉由磨削裝置1來深切緩進磨削板狀工件W時的各工程。(Embodiment 2 of deep-cut creep grinding method) Hereinafter, each process related to the deep-cutting and creep-feed grinding of the plate-shaped workpiece W by the grinding device 1 will be described with reference to FIGS. 1 and 5 to 8 .

(1)定位工程 定位工程會與實施形態1的情況同樣進行,被保持於保持平台30的板狀工件W會被定位於比圖5所示的磨削砥石741的下面741b與保持平台30的保持面300a的距離形成最小的前方側(-Y方向側)的磨削砥石741更後方側。並且,前方(-Y方向側)的磨削砥石741的下面741b會形成被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的狀態。另外,磨削手段7的被定位的高度位置是前方的磨削砥石741的下面741b及內側面741c會預定量切入至樹脂層J及電極E的高度位置,用以將被磨削的板狀工件W設為所望的厚度(完工厚度)的高度位置Z0(初期高度位置Z0)。 並且,在本實施形態2中,記憶磨削手段7的高度位置之建立也是事前進行,被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的該前方的磨削砥石741的下面741b的位置是從建立記憶之磨削手段7的高度位置到板狀工件W的完工厚度上的位置。(1) Positioning engineering The positioning process is performed in the same manner as in Embodiment 1, and the plate-shaped workpiece W held on the holding table 30 is positioned at a distance from the holding surface 300a of the holding table 30 from the lower surface 741b of the grinding stone 741 shown in FIG. 5 . The grinding stone 741 that forms the smallest front side (the −Y direction side) is further to the rear side. In addition, the lower surface 741b of the grinding stone 741 at the front (the side in the −Y direction) is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30 . In addition, the positioned height position of the grinding means 7 is that the lower surface 741b and inner side surface 741c of the front grinding stone 741 will cut into the resin layer J and the height position of the electrode E by a predetermined amount, so as to grind the plate-shaped The workpiece W is set at a height position Z0 (initial height position Z0 ) of a desired thickness (finished thickness). Furthermore, in the second embodiment, the height position of the memory grinding means 7 is also established in advance, and the front grinding stone is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30. The position of the lower face 741b of 741 is the position from the height position of the grinding means 7 to the finished thickness of the plate-shaped workpiece W.

(2)磨削工程 馬達72會將旋轉軸70旋轉驅動於例如從+Z方向來看逆時針方向,伴隨於此,磨削輪74會旋轉。如圖6所示般,Y軸方向移動手段14會使吸引保持板狀工件W的保持平台30移動至-Y方向,亦即,使保持平台30對於磨削手段7,移動至從磨削輪74的後方(+Y方向側)朝向前方(-Y方向側)的方向。然後以旋轉的前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的樹脂層J及電極E的圓形上面。(2) Grinding engineering The motor 72 rotates the rotating shaft 70 counterclockwise as viewed from the +Z direction, and the grinding wheel 74 rotates accordingly. As shown in FIG. 6, the Y-axis direction moving means 14 moves the holding platform 30 that attracts and holds the plate-shaped workpiece W to the -Y direction, that is, the holding platform 30 moves to the grinding wheel 7 with respect to the grinding means 7. The rear (+Y direction side) of 74 faces the direction of the front (-Y direction side). Then, the lower surface 741b and the inner surface 741c of the rotating front grinding stone 741 are used to grind the resin layer J of the plate-shaped workpiece W and the circular upper surface of the electrode E.

(3)測定工程 在磨削工程中,如圖6所示般,上述深切緩進磨削加工開始的同時,上面高度測定手段38的接觸頭380下降,接觸於以環狀的磨削砥石741的外側來剛開始磨削板狀工件W之後的被磨削的上面Wa而開始測定其高度。然後,上面高度測定手段38會每單位時間依序將有關測定的板狀工件W的剛開始磨削之後的被磨削的上面Wa的高度及之後被磨削的上面Wa的高度的資訊傳送至控制手段9。被傳送至控制手段9的該資訊是被依序記憶於控制手段9的記憶部91。(3) Measurement engineering In the grinding process, as shown in FIG. 6, at the same time as the above-mentioned deep-cut and slow-feed grinding process starts, the contact head 380 of the upper height measuring means 38 descends and contacts the outer side of the ring-shaped grinding stone 741 to start. After the plate-shaped workpiece W is ground, the height of the ground surface Wa is started to be measured. Then, the upper surface height measuring means 38 sequentially transmits the information about the measured height of the ground surface Wa immediately after the grinding of the plate-shaped workpiece W and the height of the ground surface Wa to be ground later per unit time. means of control9. The information transmitted to the control means 9 is sequentially stored in the memory unit 91 of the control means 9 .

例如圖6所示般,上面高度測定手段38所測定的板狀工件W的剛開始磨削之後的被磨削的上面Wa的高度是例如作為高度Z1被記憶於記憶部91。並且,記憶部91記憶高度Z1時的前方的磨削砥石741的Y軸方向的板狀工件W上的位置是例如成為位置Y1。而且,磨削手段7是被位於用以將被磨削的板狀工件W設為所望的厚度的初期高度位置Z0。 (4)修正工程For example, as shown in FIG. 6 , the height of the ground surface Wa of the plate-shaped workpiece W measured by the surface height measuring means 38 immediately after grinding is stored in the memory unit 91 as height Z1, for example. Further, the memory unit 91 memorizes the position of the front grinding stone 741 on the plate-shaped workpiece W in the Y-axis direction at the height Z1 as, for example, the position Y1. Furthermore, the grinding means 7 is located at the initial height position Z0 for setting the plate-shaped workpiece W to be ground to a desired thickness. (4) Correction works

在磨削工程中,按照在測定工程,上面高度測定手段38所測定的測定值來使磨削手段7移動於Z軸方向,實施縮小磨削後的板狀工件W的厚度差的修正工程。具體而言,如圖7所示般,藉由保持平台30移動至-Y方向,進行板狀工件W的上面Wa的磨削,且控制手段9所具備的圖1所示的算出部92會算出從每單位時間自上面高度測定手段38送至控制手段9的板狀工件W的上面Wa的高度(測定值)減去板狀工件W的剛磨削開始之後的被磨削的上面Wa的高度Z1之差分。亦即,例如,算出從圖7所示的新測定的板狀工件W的上面Wa的高度Z2減去記憶部91所記憶的板狀工件W的剛開始磨削之後的被磨削的上面Wa的高度Z1之差分L1。In the grinding process, the grinding means 7 is moved in the Z-axis direction according to the measurement value measured by the upper surface height measuring means 38 in the measurement process, and the correction process of reducing the thickness difference of the plate-shaped workpiece W after grinding is performed. Specifically, as shown in FIG. 7, by moving the holding table 30 to the −Y direction, the upper surface Wa of the plate-shaped workpiece W is ground, and the calculation unit 92 shown in FIG. The height (measured value) of the upper surface Wa of the plate-shaped workpiece W sent from the upper surface height measuring means 38 to the control means 9 per unit time is calculated by subtracting the ground surface Wa of the plate-shaped workpiece W immediately after the grinding starts. The difference in height Z1. That is, for example, the height Z2 of the upper surface Wa of the plate-shaped workpiece W newly measured as shown in FIG. The difference L1 of the height Z1.

被算出的差分L1是板狀工件W的厚度差,來自前方的磨削砥石741的當初開始磨削的磨耗量。一旦算出部92算出差分L1,則在藉由控制手段9的控制之下,Z軸方向移動手段5會使磨削手段7移動於Z軸方向,進行縮小磨削後的板狀工件W的厚度差之第一次的修正。亦即,位於初期高度位置Z0的磨削手段7會僅以差分L1的距離來接近(下降)至被吸引保持於保持平台30的保持面300a的板狀工件W而進行磨削,藉此在本修正後被磨削的板狀工件W的上面Wa的高度會再度成為高度Z1,被磨削的板狀工件W成為所望的厚度。The calculated difference L1 is the difference in thickness of the plate-shaped workpiece W, and the wear amount from the front grinding stone 741 at the beginning of grinding. Once the calculation unit 92 calculates the difference L1, under the control of the control means 9, the moving means 5 in the Z-axis direction moves the grinding means 7 in the direction of the Z-axis to reduce the thickness of the plate-shaped workpiece W after grinding. Bad first correction. That is, the grinding means 7 at the initial height position Z0 approaches (descends) the plate-shaped workpiece W sucked and held on the holding surface 300a of the holding platform 30 by only a distance of the difference L1, and grinds the plate-like workpiece W. After this correction, the height of the upper surface Wa of the plate-shaped workpiece W to be ground becomes the height Z1 again, and the plate-shaped workpiece W to be ground becomes the desired thickness.

進一步進行磨削,且從藉由圖8所示的上面高度測定手段38來新測定的板狀工件W的上面Wa的高度位置Z3減去記憶部91所記憶的板狀工件W的剛開始磨削之後的被磨削的上面Wa的高度Z1之差分L2會藉由算出部92來算出。被算出的差分L2是板狀工件W的厚度差,來自前方的磨削砥石741的上述第一次的修正進行之後的磨耗量。然後,在藉由控制手段9的控制之下,Z軸方向移動手段5會使磨削手段7移動於Z軸方向,進行縮小磨削後的板狀工件W的厚度差之第二次的修正。亦即,磨削手段7會僅以差分L2的距離來接近至板狀工件W而進行磨削,藉此在第二次的修正後被磨削的板狀工件W的上面Wa的高度位置會再度成為高度Z1,被磨削的板狀工件W成為所望的厚度。Grinding is further performed, and the height position Z3 of the upper surface Wa of the plate-shaped workpiece W newly measured by the upper surface height measuring means 38 shown in FIG. The calculation part 92 calculates the difference L2 of the height Z1 of the ground surface Wa after grinding. The calculated difference L2 is the difference in thickness of the plate-shaped workpiece W, and the wear amount after the above-mentioned first correction of the grinding stone 741 from the front. Then, under the control of the control means 9, the moving means 5 in the Z-axis direction will move the grinding means 7 in the Z-axis direction to perform the second correction of reducing the thickness difference of the plate-shaped workpiece W after grinding. . That is, the grinding means 7 approaches and grinds the plate-shaped workpiece W only by the distance of the difference L2, whereby the height position of the upper surface Wa of the plate-shaped workpiece W to be ground after the second correction will be changed. The height Z1 is reached again, and the plate-shaped workpiece W to be ground becomes a desired thickness.

如此在磨削工程中,一面被配設於環狀的磨削砥石741的外側的上面高度測定手段38之板狀工件W的上面Wa的高度測定及對應於測定值之磨削手段7往Z軸方向的移動之修正會每單位時間重複進行,一面保持平台30會移動至-Y方向的預定的位置,藉由前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的上面Wa全面之後,磨削手段7會被拉起至+Z方向而從板狀工件W離開。In this way, in the grinding process, the height measurement of the upper surface Wa of the plate-shaped workpiece W of the upper surface height measurement means 38 arranged on the outer side of the annular grinding stone 741 and the grinding means 7 to Z corresponding to the measured value The correction of movement in the axial direction is repeated per unit time, while the holding table 30 moves to a predetermined position in the -Y direction, and the plate-shaped workpiece W is ground by the lower surface 741b and the inner surface 741c of the grinding stone 741 in front. After the upper surface Wa of W is fully formed, the grinding means 7 is pulled up to the +Z direction and separated from the plate-shaped workpiece W.

在此,利用圖11~圖13來簡潔說明有關以往的深切緩進磨削方法的問題點。 在以往的深切緩進磨削方法中,磨削手段7會藉由Z軸方向移動手段5來朝-Z方向傳送,前方(-Y方向側)的磨削砥石741的下面741b會被定位於預定量切入至被保持於保持平台30的板狀工件W的樹脂層J及電極E的高度位置。然後,Y軸方向移動手段14會使吸引保持板狀工件W的保持平台30以預定的進給速度移動至從磨削輪74的前方朝向後方的方向之+Y方向。然後,如圖12所示般,以旋轉的前方的磨削砥石741的下面741b及外側面741d來磨削板狀工件W的樹脂層J及電極E的圓形上面。Here, problems related to the conventional deep-cut creep grinding method will be briefly described using FIGS. 11 to 13 . In the conventional deep-cut and creep-feed grinding method, the grinding means 7 will be transported in the -Z direction by moving the means 5 in the Z-axis direction, and the lower surface 741b of the grinding stone 741 at the front (-Y direction side) will be positioned at The predetermined amount is cut to the height position of the resin layer J and the electrode E of the plate-shaped workpiece W held on the holding table 30 . Then, the Y-axis direction moving means 14 moves the holding table 30 that attracts and holds the plate-shaped workpiece W to the +Y direction in the direction from the front to the rear of the grinding wheel 74 at a predetermined feed speed. Then, as shown in FIG. 12 , the resin layer J of the plate-shaped workpiece W and the circular upper surface of the electrode E are ground with the lower surface 741b and the outer surface 741d of the rotating front grinding stone 741 .

如圖13所示般,使保持平台30移動至-Y方向的預定的位置,藉由前方的磨削砥石741的下面741b及外側面741d來磨削板狀工件W的上面Wa全面之後,磨削手段7會被拉起於+Z方向而從板狀工件W離開。As shown in FIG. 13 , the holding table 30 is moved to a predetermined position in the -Y direction, and the entire upper surface Wa of the plate-shaped workpiece W is ground by the lower surface 741b and the outer surface 741d of the front grinding stone 741, and then ground. The cutting means 7 is pulled up in the +Z direction and separated from the plate-shaped workpiece W.

如圖13所示般,若例如對於長的板狀工件W實施以往的深切緩進磨削,則藉由磨削砥石741的磨耗,在磨削砥石741開始進入板狀工件W之處的厚度與磨削砥石741離開板狀工件W之處的厚度產生大的厚度差。並且,在磨削後的板狀工件W的被磨削面之上面Wa產生凹凸等。而且,當工件為板狀工件W之類具備以銅所構成的電極E者時,由於磨削砥石741是空孔的比例或大小被設定成大的砥石,因此隨著板狀工件W的磨削的磨耗量也變大,該厚度的差變得特別大。As shown in FIG. 13 , for example, if the conventional deep-cut creep grinding is performed on a long plate-shaped workpiece W, the thickness of the place where the grinding stone 741 begins to penetrate into the plate-shaped workpiece W will be reduced due to the abrasion of the grinding stone 741. There is a large difference in thickness from the thickness at which the grinding stone 741 separates from the plate-shaped workpiece W. In addition, irregularities and the like are generated on the surface Wa of the ground surface of the plate-shaped workpiece W after grinding. Moreover, when the workpiece is a plate-shaped workpiece W or the like provided with an electrode E made of copper, since the grinding stone 741 is a stone with a large hole ratio or size, the grinding of the plate-shaped workpiece W will The amount of abrasion for cutting also increases, and the difference in thickness becomes particularly large.

另一方面,在本發明的實施形態2的深切緩進磨削方法中,是與實施形態1的情況同樣,圖8所示的磨削後的板狀工件W的被磨削面之上面Wa是成為幾乎未產生凹凸等的漂亮的被磨削面。而且,本發明的深切緩進磨削是藉由具備:以被配設於環狀的磨削砥石741的外側的上面高度測定手段38來測定剛開始深切緩進磨削之後的板狀工件W的被磨削的上面Wa的高度之測定工程,及按照在測定工程測定的測定值來使磨削手段7移動於Z軸方向,縮小磨削後的板狀工件W的厚度差之修正工程,可如圖8所示般縮小磨削後的板狀工件W的厚度差。On the other hand, in the deep-cut and creep-feed grinding method according to the second embodiment of the present invention, as in the case of the first embodiment, the upper surface Wa of the ground surface of the plate-shaped workpiece W after grinding shown in FIG. It becomes a beautiful ground surface with almost no irregularities. Furthermore, the deep-cut and creep-feed grinding of the present invention is to measure the plate-shaped workpiece W immediately after the deep-cut and creep-feed grinding is started by using the upper surface height measuring means 38 arranged on the outer side of the annular grinding stone 741. The measurement process of the height of the upper surface Wa to be ground, and the correction process of moving the grinding means 7 in the Z-axis direction according to the measured value measured in the measurement process to reduce the thickness difference of the plate-shaped workpiece W after grinding, The difference in thickness of the plate-shaped workpiece W after grinding can be reduced as shown in FIG. 8 .

(深切緩進磨削方法的實施形態3) 以下,利用圖1、及圖9~圖10來說明有關藉由磨削裝置1來深切緩進磨削板狀工件W時的各工程。(Embodiment 3 of deep-cut creep grinding method) Hereinafter, each process related to the deep-cutting and creep-feed grinding of the plate-shaped workpiece W by the grinding device 1 will be described with reference to FIG. 1 and FIGS. 9 to 10 .

(1)定位工程 如圖9所示般,Y軸方向移動手段14會使吸引保持板狀工件W的保持平台30從裝置底部10上的裝卸區域往磨削區域內移動至+Y方向,被保持於保持平台30的板狀工件W會被定位於比磨削砥石741的下面741b與保持平台30的保持面300a的距離形成最小的前方(-Y方向側)的磨削砥石741更後方。(1) Positioning engineering As shown in FIG. 9 , the Y-axis direction moving means 14 moves the holding platform 30 that attracts and holds the plate-shaped workpiece W from the loading and unloading area on the bottom 10 of the device to the grinding area to the +Y direction, and is held on the holding platform 30. The plate-shaped workpiece W is positioned behind the grinding stone 741 in front (on the −Y direction side) where the distance between the lower surface 741 b of the grinding stone 741 and the holding surface 300 a of the holding table 30 is the smallest.

而且,磨削手段7會藉由Z軸方向移動手段5來朝-Z方向傳送,在藉由控制手段9之Z軸方向移動手段5的控制下,形成前方的磨削砥石741的下面741b會被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的狀態。同時,形成後方(+Y方向側)的磨削砥石741的下面741b會被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的狀態。磨削手段7的被定位的高度位置是例如後方的磨削砥石741的下面741b及前方的磨削砥石741的下面741b會預定量切入至樹脂層J及電極E的高度位置,用以將被前方的磨削砥石741磨削的板狀工件W設為所望的厚度(完工厚度)的高度位置Z4。 並且,在本實施形態3中,記憶磨削手段7的高度位置之建立是事前進行,被定位成比被保持於保持平台30的板狀工件W的上面Wa更低的該前方的磨削砥石741的下面741b的位置是從建立記憶之磨削手段7的高度位置到板狀工件W的完工厚度上的位置。Moreover, the grinding means 7 will be transported in the -Z direction by the moving means 5 in the Z-axis direction, and under the control of the moving means 5 in the Z-axis direction of the control means 9, the lower surface 741b of the grinding stone 741 that forms the front will be It is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30 . At the same time, the lower surface 741b of the grinding stone 741 forming the rear (+Y direction side) is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30 . The positioned height position of the grinding means 7 is, for example, the height position where the lower surface 741b of the grinding stone 741 at the rear and the lower surface 741b of the grinding stone 741 at the front will cut into the resin layer J and the electrode E by a predetermined amount, so as to be The height position Z4 of the plate-shaped workpiece W to be ground by the front grinding stone 741 has a desired thickness (finished thickness). Furthermore, in the third embodiment, the height position of the memory grinding means 7 is established in advance, and the front grinding stone is positioned lower than the upper surface Wa of the plate-shaped workpiece W held on the holding table 30. The position of the lower face 741b of 741 is the position from the height position of the grinding means 7 to the finished thickness of the plate-shaped workpiece W.

如圖10所示般,Y軸方向移動手段14會使吸引保持板狀工件W的保持平台30移動至-Y方向。亦即,使保持平台30對於磨削手段7,移動至從磨削輪74的後方(+Y方向側)朝向前方(-Y方向側)的方向。 然後,首先,以旋轉的後方的磨削砥石741的下面741b及外側面741d來磨削板狀工件W的樹脂層J及電極E的圓形上面。而且,使被旋轉的後方的磨削砥石741磨削的板狀工件W的上面Wa從-Y方向朝向+Y方向追趕,而以旋轉的前方的磨削砥石741的下面741b及內側面741c來磨削時,將板狀工件W形成所望的厚度。 然後,使保持平台30移動至-Y方向的預定的位置,藉由旋轉的前方的磨削砥石741的下面741b及內側面741c來磨削板狀工件W的上面Wa全面之後,磨削手段7會被拉起至+Z方向而從板狀工件W離開。As shown in FIG. 10 , the Y-axis direction moving means 14 moves the holding table 30 that sucks and holds the plate-shaped workpiece W to the −Y direction. That is, the holding table 30 is moved in a direction from the rear (+Y direction side) of the grinding wheel 74 toward the front (−Y direction side) with respect to the grinding means 7 . Then, first, the resin layer J of the plate-shaped workpiece W and the circular upper surface of the electrode E are ground by the lower surface 741b and the outer surface 741d of the rotating rear grinding stone 741 . Then, the upper surface Wa of the plate-shaped workpiece W ground by the rotating rear grinding stone 741 is chased from the -Y direction toward the +Y direction, and the lower surface 741b and the inner surface 741c of the rotating front grinding stone 741 are drawn to the front surface Wa. During grinding, the plate-shaped workpiece W is formed into a desired thickness. Then, the holding table 30 is moved to a predetermined position in the -Y direction, and the entire upper surface Wa of the plate-shaped workpiece W is ground by the lower surface 741b and the inner surface 741c of the grinding stone 741 in front of the rotation, and then the grinding means 7 It will be pulled up to the +Z direction and separated from the plate-shaped workpiece W.

在本發明的實施形態3的深切緩進磨削方法中,是在定位工程中,藉由將後方(+Y方向側)的磨削砥石741的下面741b定位於比被保持於保持平台30的板狀工件W的上面Wa更低的位置,首先以後方的磨削砥石741的外側面741d及下面741b來大幅度磨削板狀工件W,且進一步以前方的磨削砥石741的內側面741c及下面741b來磨削被後方的磨削砥石741的外側面741d及下面741b所磨削的板狀工件W的上面Wa,藉此可使磨削後的板狀工件W的上面Wa成為幾乎未產生凹凸等的漂亮的被磨削面。In the deep-cut and creep-feed grinding method according to Embodiment 3 of the present invention, in the positioning process, the lower surface 741b of the grinding stone 741 at the rear (+Y direction side) is positioned at a position higher than that held on the holding table 30. At the position where the upper surface Wa of the plate-shaped workpiece W is lower, the plate-shaped workpiece W is largely ground first with the outer surface 741d and the lower surface 741b of the rear grinding stone 741, and further, the inner surface 741c of the front grinding stone 741 is used to grind the plate-shaped workpiece W. and the lower surface 741b to grind the upper surface Wa of the plate-shaped workpiece W ground by the outer surface 741d and the lower surface 741b of the rear grinding stone 741, whereby the upper surface Wa of the plate-shaped workpiece W after grinding can be almost Beautiful surface to be ground with irregularities.

本發明的深切緩進磨削方法是不限於上述的實施形態1~3,當然可在其技術思想的範圍內實施各種不同的形態。又,有關在附圖中所被圖示的磨削裝置1的構成要素也不限於此,可在能夠發揮本發明的效果的範圍內適當變更。 例如,在實施形態3的深切緩進磨削方法中,亦可進行測定工程及修正工程。The deep-cut and creep-feed grinding method of the present invention is not limited to the above-mentioned Embodiments 1 to 3, and it is of course possible to implement various different embodiments within the scope of the technical idea. In addition, the components of the grinding apparatus 1 shown in the drawings are not limited thereto, and can be appropriately changed within the range in which the effects of the present invention can be exhibited. For example, in the deep-cut creep grinding method of the third embodiment, measurement process and correction process can also be performed.

W‧‧‧板狀工件 W1‧‧‧基板 W2‧‧‧晶片 E‧‧‧電極 J‧‧‧樹脂層 1‧‧‧磨削裝置 10‧‧‧裝置底部 11‧‧‧支柱 14‧‧‧Y軸方向移動手段 140‧‧‧滾珠螺桿 141‧‧‧一對的導軌 142‧‧‧馬達 143‧‧‧可動板 30‧‧‧保持平台 300‧‧‧吸附部 300a‧‧‧保持面 301‧‧‧框體 34‧‧‧旋轉手段 39‧‧‧蓋 39a‧‧‧蛇腹蓋 38‧‧‧上面高度測定手段 380‧‧‧接觸頭 381‧‧‧臂部 5‧‧‧Z軸方向移動手段 50‧‧‧滾珠螺桿 51‧‧‧一對的導軌 52‧‧‧馬達 53‧‧‧昇降板 7‧‧‧磨削手段 70‧‧‧旋轉軸 71‧‧‧機殼 72‧‧‧馬達 73‧‧‧固定台架 74‧‧‧磨削輪 740‧‧‧輪基台 741‧‧‧磨削砥石 75‧‧‧支架 9‧‧‧控制手段 91‧‧‧記憶部 92‧‧‧算出部W‧‧‧Plate Workpiece W1‧‧‧substrate W2‧‧‧chip E‧‧‧Electrode J‧‧‧resin layer 1‧‧‧Grinding device 10‧‧‧The bottom of the device 11‧‧‧Pillar 14‧‧‧Moving means in Y axis direction 140‧‧‧Ball screw 141‧‧‧A pair of guide rails 142‧‧‧motor 143‧‧‧movable plate 30‧‧‧maintain the platform 300‧‧‧Adsorption part 300a‧‧‧Retaining surface 301‧‧‧frame 34‧‧‧rotation means 39‧‧‧cover 39a‧‧‧Constrictor cover 38‧‧‧Measurement of upper height 380‧‧‧Contact head 381‧‧‧arm 5‧‧‧Z-axis direction movement means 50‧‧‧Ball screw 51‧‧‧A pair of guide rails 52‧‧‧motor 53‧‧‧lifting plate 7‧‧‧Grinding means 70‧‧‧rotation axis 71‧‧‧Chassis 72‧‧‧motor 73‧‧‧fixed stand 74‧‧‧Grinding wheel 740‧‧‧wheel abutment 741‧‧‧Grinding Whetstone 75‧‧‧Stent 9‧‧‧Control means 91‧‧‧memory department 92‧‧‧calculation department

圖1是表示磨削裝置之一例的立體圖。 圖2是說明將前方的磨削砥石的下面定位成比板狀工件的上面低,且利用Y軸方向移動手段,將板狀工件定位至比前方的磨削砥石更後方側的狀態的側面圖。 圖3是說明利用Y軸方向移動手段,使保持平台對於磨削手段,移動至從磨削輪的後方朝向前方的方向,以前方的磨削砥石的下面及內側面來開始磨削板狀工件的狀態的側面圖。 圖4是以前方的磨削砥石的下面及內側面來完成磨削板狀工件的上面的狀態的側面圖。 圖5是說明將前方的磨削砥石的下面定位成比板狀工件的上面更低,且利用Y軸方向移動手段,將板狀工件定位至比前方的磨削砥石更後方側的狀態的側面圖。 圖6是說明利用Y軸方向移動手段,使保持平台對於磨削手段,移動至從磨削輪的後方朝向前方的方向,以前方的磨削砥石的下面及內側面來開始磨削板狀工件的狀態的側面圖。 圖7是說明使磨削手段移動於Z軸方向,進行縮小磨削後的板狀工件的厚度差的修正時的側面圖。 圖8是說明以前方的磨削砥石的下面及內側面來完成磨削板狀工件的上面的狀態的側面圖。 圖9是說明將前方的磨削砥石的下面定位成比板狀工件的上面更低,且將後方的磨削砥石的下面定位至比板狀工件的上面更低的位置,利用Y軸方向移動手段,將板狀工件定位至比前方的磨削砥石更後方側的狀態的側面圖。 圖10是說明一面以後方的磨削砥石的下面及外側面來磨削板狀工件的上面,一面更以前方的磨削砥石的下面及內側面來磨削板狀工件的上面的狀態的側面圖。 圖11是說明在以往的深切緩進磨削方法中,將前方的磨削砥石的下面定位成比板狀工件的上面更低,且利用Y軸方向移動手段,將板狀工件定位至比前方的磨削砥石更前方側的狀態的側面圖。 圖12是說明在以往的深切緩進磨削方法中,使保持平台對於磨削手段,移動至從磨削輪的前方朝向後方的方向,以前方的磨削砥石的下面及外側面來開始磨削板狀工件的狀態的側面圖。 圖13是說明在以往的深切緩進磨削方法中,以前方的磨削砥石的下面及外側面來完成磨削板狀工件的上面的狀態的側面圖。FIG. 1 is a perspective view showing an example of a grinding device. Fig. 2 is a side view illustrating a state in which the lower surface of the front grinding stone is positioned lower than the upper surface of the plate-shaped workpiece, and the plate-shaped workpiece is positioned to the rear side of the front grinding stone by means of moving in the Y-axis direction . Fig. 3 illustrates that the holding platform is moved to the direction from the rear of the grinding wheel towards the front of the grinding means by using the moving means in the Y-axis direction, and the plate-shaped workpiece is started to be ground from the underside and inner side of the grinding stone in front side view of the state. Fig. 4 is a side view of a state in which the upper surface of a plate-shaped workpiece is completely ground by grinding the lower surface and the inner surface of the front grinding stone. Fig. 5 is a side view illustrating a state in which the lower surface of the front grinding stone is positioned lower than the upper surface of the plate-shaped workpiece, and the plate-shaped workpiece is positioned to the rear side of the front grinding stone by means of moving in the Y-axis direction picture. Fig. 6 illustrates that the holding platform is moved to the direction from the rear of the grinding wheel toward the front of the grinding means by using the moving means in the Y-axis direction, and the plate-shaped workpiece is started to be ground from the lower surface and the inner side of the grinding stone in front side view of the state. 7 is a side view illustrating the case of moving the grinding means in the Z-axis direction and performing correction to reduce the difference in thickness of the plate-shaped workpiece after grinding. 8 is a side view illustrating a state in which the upper surface of a plate-shaped workpiece is completely ground by grinding the lower surface and the inner surface of the front grinding stone. Figure 9 illustrates positioning the bottom of the front grinding stone lower than the upper surface of the plate-shaped workpiece, and positioning the lower surface of the rear grinding stone lower than the upper surface of the plate-shaped workpiece, and moving in the Y-axis direction Means, a side view of the state where the plate-shaped workpiece is positioned to the rear side of the front grinding stone. Fig. 10 is a side view illustrating a state in which the upper surface of a plate-shaped workpiece is ground with the lower surface and outer surface of the rear grinding stone, and the upper surface of the plate-shaped workpiece is ground with the lower surface and inner surface of the front grinding stone. picture. Fig. 11 illustrates that in the conventional deep-cutting and slow-feed grinding method, the lower surface of the front grinding stone is positioned lower than the upper surface of the plate-shaped workpiece, and the plate-shaped workpiece is positioned lower than the front surface of the plate-shaped workpiece by means of moving in the Y-axis direction. A side view of the state of the grinding whetstone on the front side. Fig. 12 illustrates that in the conventional deep-cut and creep-feed grinding method, the holding platform is moved to the direction from the front of the grinding wheel toward the rear for the grinding means, and the grinding is started on the lower surface and the outer surface of the grinding stone in front. A side view of the state of a chipped workpiece. 13 is a side view illustrating a state in which the upper surface of a plate-shaped workpiece is completely ground by grinding the lower surface and the outer surface of the front grinding stone in the conventional deep-cut and creep-feed grinding method.

5‧‧‧Z軸方向移動手段 5‧‧‧Z-axis direction movement means

7‧‧‧磨削手段 7‧‧‧Grinding means

14‧‧‧Y軸方向移動手段 14‧‧‧Moving means in Y axis direction

30‧‧‧保持平台 30‧‧‧maintain the platform

70‧‧‧旋轉軸 70‧‧‧rotation axis

73‧‧‧固定台架 73‧‧‧fixed stand

74‧‧‧磨削輪 74‧‧‧Grinding wheel

141‧‧‧一對的導軌 141‧‧‧A pair of guide rails

143‧‧‧可動板 143‧‧‧movable plate

300a‧‧‧保持面 300a‧‧‧Retaining surface

740‧‧‧輪基台 740‧‧‧wheel abutment

741‧‧‧磨削砥石 741‧‧‧Grinding Whetstone

741b‧‧‧下面 741b‧‧‧below

741c‧‧‧內側面 741c‧‧‧inner side

E‧‧‧電極 E‧‧‧Electrode

J‧‧‧樹脂層 J‧‧‧resin layer

W‧‧‧板狀工件 W‧‧‧Plate Workpiece

W1‧‧‧基板 W1‧‧‧substrate

W2‧‧‧晶片 W2‧‧‧chip

Wa‧‧‧上面 Wa‧‧‧above

Wb‧‧‧下面 Wb‧‧‧below

Claims (2)

一種深切緩進磨削方法,係利用磨削裝置,以被定位於比板狀工件的上面更低的位置的磨削砥石來磨削該板狀工件之深切緩進磨削方法,該磨削裝置係具備:保持平台,其係具有保持該板狀工件的保持面;磨削手段,其係將環狀地配設該磨削砥石的磨削輪安裝於連結至旋轉軸的前端的固定台架,使該旋轉軸旋轉,以該磨削砥石來磨削該板狀工件;Y軸方向移動手段,其係使該保持平台與該磨削手段相對地移動於與該保持面方向平行的Y軸方向;及Z軸方向移動手段,其係使該磨削手段移動於與Y軸方向正交且對於該保持面垂直的Z軸方向,其特徵為:該旋轉軸,係對於該保持面,比Z軸方向更傾斜,將該磨削砥石的下面與該保持面的距離形成最小的側設為該磨削輪的前方,且將該磨削砥石的下面與該保持面的距離成為最大的側設為該磨削輪的後方,具備:定位工程,其係利用該Z軸方向移動手段,將該前方的磨削砥石的下面定位成比被保持於該保持平台的板狀工件的上面更低,且將該後方的磨削砥石的下面定位於比被保持於該保持平台的板狀工件的上面更低的位置,利用該Y軸方向移動手段,將被保持於該保持平台的板狀工件定 位於比該前方的磨削砥石更後方側;及磨削工程,其係於該定位工程之後,利用該Y軸方向移動手段,使該保持平台對於該磨削手段,移動至從該磨削輪的該後方朝向該前方的方向,以該後方的磨削砥石的外側面及下面來磨削該板狀工件之後,以該前方的磨削砥石的下面及內側面來磨削該板狀工件。 A deep-cut and creep-feed grinding method, which uses a grinding device to grind a plate-shaped workpiece with a grinding whetstone positioned at a lower position than the upper surface of the plate-shaped workpiece. The device includes: a holding platform having a holding surface for holding the plate-shaped workpiece; and a grinding means for attaching a grinding wheel ring-shaped with the grinding stone to a fixed table connected to the front end of the rotating shaft. The frame rotates the rotating shaft to grind the plate-shaped workpiece with the grinding stone; the Y-axis direction moving means moves the holding platform and the grinding means relatively in the Y direction parallel to the holding surface direction. axis direction; and Z-axis direction moving means, which makes the grinding means move in the Z-axis direction perpendicular to the Y-axis direction and perpendicular to the holding surface, characterized in that: the rotation axis is for the holding surface, It is more inclined than the Z-axis direction, and the side where the distance between the lower surface of the grinding stone and the holding surface is the smallest is defined as the front of the grinding wheel, and the distance between the lower surface of the grinding stone and the holding surface is the largest. The side is set to the rear of the grinding wheel, and a positioning process is provided, which uses the moving means in the Z-axis direction to position the lower surface of the front grinding stone to be closer than the upper surface of the plate-shaped workpiece held on the holding platform. low, and the lower side of the grinding stone at the rear is positioned at a lower position than the upper surface of the plate-shaped workpiece held on the holding platform, and the plate-shaped workpiece held on the holding platform is moved using the Y-axis direction movement means. Workpiece The grinding stone located on the rear side of the front; and the grinding process, which is after the positioning process, using the Y-axis direction moving means to move the holding platform from the grinding wheel to the grinding means The rear side faces the front direction, and after grinding the plate-shaped workpiece with the outer surface and the lower surface of the rear grinding stone, the plate-shaped workpiece is ground with the lower surface and the inner surface of the front grinding stone. 如申請專利範圍第1項之深切緩進磨削方法,其中,具備:測定工程,其係以被配設於前述環狀的磨削砥石的外側的上面高度測定手段來測定剛開始深切緩進磨削之後的板狀工件的上面高度;及修正工程,其係按照在該測定工程測定的測定值來使前述磨削手段移動於Z軸方向,縮小磨削後的板狀工件的厚度差。For example, the deep-cut and creep-feed grinding method of item 1 of the scope of the patent application, wherein, it has: a measurement process, which is to measure the initial deep-cut and creep-feed grinding by means of measuring the upper surface height arranged on the outside of the aforementioned ring-shaped grinding stone The upper surface height of the plate-shaped workpiece after grinding; and the correction process, which is to move the aforementioned grinding means in the Z-axis direction according to the measured value measured in the measurement process, and reduce the thickness difference of the plate-shaped workpiece after grinding.
TW108125925A 2018-07-24 2019-07-23 Deep-cut and slow-feed grinding method TWI810334B (en)

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