TWI808833B - Holding substrate and manufacturing method of display device - Google Patents

Holding substrate and manufacturing method of display device Download PDF

Info

Publication number
TWI808833B
TWI808833B TW111126778A TW111126778A TWI808833B TW I808833 B TWI808833 B TW I808833B TW 111126778 A TW111126778 A TW 111126778A TW 111126778 A TW111126778 A TW 111126778A TW I808833 B TWI808833 B TW I808833B
Authority
TW
Taiwan
Prior art keywords
transferred
substrate
light
holding substrate
region
Prior art date
Application number
TW111126778A
Other languages
Chinese (zh)
Other versions
TW202310473A (en
Inventor
浅田圭介
山田一幸
武政健一
磯野大樹
Original Assignee
日商日本顯示器股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本顯示器股份有限公司 filed Critical 日商日本顯示器股份有限公司
Publication of TW202310473A publication Critical patent/TW202310473A/en
Application granted granted Critical
Publication of TWI808833B publication Critical patent/TWI808833B/en

Links

Landscapes

  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Led Device Packages (AREA)

Abstract

本發明之課題在於提供一種被保持在保持基板之複數個第1發光元件即使被移送至被移送基板,亦不易與被移送基板接觸之保持基板及顯示裝置之製造方法。 保持基板具有自一方向觀察為第1面之複數個第1區劃、與自一方向觀察為第2面之第2區劃。第1區劃於第1面保持複數個第1發光元件。第2面自第1面於第1面之深度方向分開。 An object of the present invention is to provide a holding substrate and a method of manufacturing a display device in which a plurality of first light-emitting elements held on a holding substrate do not easily come into contact with the transferred substrate even if they are transferred to the transferred substrate. The holding substrate has a plurality of first sections viewed from one direction as a first surface, and a second section viewed from one direction as a second surface. The first section holds a plurality of first light emitting elements on the first surface. The second surface is separated from the first surface in the depth direction of the first surface.

Description

保持基板及顯示裝置之製造方法Holding substrate and manufacturing method of display device

本揭示係關於一種保持基板及顯示裝置之製造方法。The disclosure relates to a manufacturing method for holding a substrate and a display device.

存在將紅色、綠色及藍色等之發光元件設為像素之顯示裝置。顯示裝置自保持基板移送各色之發光元件,形成像素。There are display devices in which red, green, blue, and other light-emitting elements are used as pixels. The display device transfers light-emitting elements of various colors from the holding substrate to form pixels.

伴隨顯示之像素之密度提高,於顯示裝置搭載大量微細之發光元件。發光元件要求以高定位精度自保持基板移送至顯示裝置。於顯示裝置之製造程序中,有時使用在將發光元件保持於保持基板之狀態下直接壓抵於顯示基板進行發光元件之移送之被稱為直接轉移之技術。As the density of display pixels increases, a large number of fine light-emitting elements are mounted on display devices. The light-emitting elements are required to be transferred from the holding substrate to the display device with high positioning accuracy. In the manufacturing process of a display device, a technique called direct transfer is sometimes used in which a light-emitting element is directly pressed against a display substrate while the light-emitting element is held on the holding substrate to transfer the light-emitting element.

於專利文獻1,揭示有將具備發光器件之生長基板壓抵於背板基板、將發光器件作為集合移送之技術。 [先前技術文獻] [專利文獻] Patent Document 1 discloses a technique in which a growth substrate including a light emitting device is pressed against a backplane substrate and the light emitting devices are transferred as a set. [Prior Art Literature] [Patent Document]

[專利文獻1]日本專利特表2018-508972號公報[Patent Document 1] Japanese Patent Application Publication No. 2018-508972

[發明所欲解決之問題][Problem to be solved by the invention]

於將保持於保持基板之複數個第1發光元件移送至被移送基板之情形時,保持基板與被移送基板接近。此時,被移送基板與保持基板有接觸之可能性。When transferring the plurality of first light-emitting elements held by the holding substrate to the transferred substrate, the holding substrate and the transferred substrate are brought close to each other. At this time, the substrate to be transferred may come into contact with the holding substrate.

本發明係鑑於上述問題而完成者,目的在於提供一種即使保持於保持基板之複數個第1發光元件被移送至被移送基板,亦不易與被移送基板接觸之保持基板及顯示裝置之製造方法。 [解決問題之技術手段] The present invention was made in view of the above-mentioned problems, and an object thereof is to provide a holding substrate and a method of manufacturing a display device that are less likely to come into contact with the transferred substrate even if a plurality of first light-emitting elements held on the holding substrate are transferred to the transferred substrate. [Technical means to solve the problem]

用於達成上述目的之本揭示之保持基板自一方向觀察,區劃為具有第1面之複數個第1區劃、與具有第2面之第2區劃,上述第1區劃係於上述第1面保持複數個第1發光元件之區域,上述第2面自上述第1面於上述第1面之深度方向分開。The holding substrate of the present disclosure used to achieve the above object is viewed from one direction and divided into a plurality of first regions having a first surface and a second region having a second surface. The first region is a region for holding a plurality of first light-emitting elements on the first surface. The second surface is separated from the first surface in the depth direction of the first surface.

用於達成上述目的之本揭示之顯示裝置之製造方法具有以下步驟:使保持於保持基板之第1面之複數個第1發光元件之位置於具備被移送基板之複數個突起部之被移送面之特定位置對位;及將保持於相對於上述被移送基板對位之上述保持基板之上述第1面之上述第1發光元件壓抵於上述被移送基板之上述被移送面;且上述保持基板自一方向觀察,區劃為具有第1面之複數個第1區劃、與具有第2面之第2區劃,上述第1區劃於上述第1面保持複數個第1發光元件,上述第2面自上述第1面於上述第1面之深度方向分開。The manufacturing method of the display device of the present disclosure for achieving the above object has the following steps: aligning the positions of the plurality of first light-emitting elements held on the first surface of the holding substrate at specific positions on the transferred surface having the plurality of protrusions of the transferred substrate; A plurality of first divisions, and a second division having a second surface, wherein the first division holds a plurality of first light emitting elements on the first surface, and the second surface is separated from the first surface in the depth direction of the first surface.

用於達成上述目的之本揭示之顯示裝置之製造方法具有以下步驟:將複數個第1發光元件自第1保持基板移送至被移送基板之第1被移送區域後,使於第1面保持複數個第1發光元件之第2保持基板之位置於上述被移送基板之第2被移送區域之特定位置對位;及將對位後之上述第2保持基板所保持之複數個上述第1發光元件壓抵於被移送基板之被移送面;且上述第1保持基板及上述第2保持基板分別具備第1區域,該第1區域包含自一方向觀察具有第1面之複數個第1區劃、與具有第2面之第2區劃;於上述第1區劃之上述第1面保持複數個上述第1發光元件,上述第2面自上述第1面於上述第1面之深度方向分開,於上述第1區域之外,具備自上述一方向觀察為第3面之第2區域,上述第3面於上述第1面之深度方向自上述第1面分開,上述被移送基板於上述被移送面,具有包含上述第1被移送區域及與上述第1被移送區域相鄰之第2被移送區域之被移送區域,上述被移送區域較上述第1保持基板或上述第2保持基板之上述第1區域寬。The manufacturing method of the display device of the present disclosure for achieving the above object has the following steps: after transferring the plurality of first light emitting elements from the first holding substrate to the first transferred area of the transferred substrate, aligning the position of the second holding substrate holding the plurality of first light emitting elements on the first surface at the specific position of the second transferred area of the aforementioned transferred substrate; and pressing the plurality of the first light emitting elements held by the aligned second holding substrate against the transferred surface of the transferred substrate; The above-mentioned first holding substrate and the above-mentioned second holding substrate respectively have a first region, and the first region includes a plurality of first regions having a first surface viewed from one direction, and a second region having a second surface; on the above-mentioned first surface of the first region, a plurality of the above-mentioned first light-emitting elements are held, and the above-mentioned second surface is separated from the above-mentioned first surface in a depth direction of the above-mentioned first surface. The direction is separated from the first surface, and the substrate to be transferred has a transfer area including the first transfer area and a second transfer area adjacent to the first transfer area on the transfer surface, and the transfer area is wider than the first area of the first holding substrate or the second holding substrate.

就用於實施本揭示之形態(實施形態),一面參照圖式一面詳細說明。並未藉由以下實施形態所記載之內容限定本揭示。又,以下所記載之構成要件中包含本領域技術人員可容易設想者、實質上相同者。再者,以下所記載之構成要件可適當組合。另,揭示僅為一例,關於本領域技術人員可容易想到確保揭示主旨之適當變更者,當然包含於本揭示之範圍內。又,圖式係為使說明更明確,而與實際態樣相比,存在模式性顯示各部之寬度、厚度、形狀等之情形,但僅為一例,並非限定本揭示之解釋。又,於本說明書與各圖中,對與針對已出現之圖上述者同樣之要件,標註相同符號,且有時適當省略詳細說明。Embodiments (embodiments) for implementing the present disclosure will be described in detail with reference to the drawings. This disclosure is not limited by the contents described in the following embodiments. In addition, the constituent requirements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. In addition, the constituent requirements described below can be combined suitably. In addition, the disclosure is only an example, and those skilled in the art can easily conceive appropriate changes to ensure the disclosure, and of course they are included in the scope of the present disclosure. In addition, the drawings may schematically show the width, thickness, shape, etc. of each part compared with the actual form for clarification of the description, but these are just examples and do not limit the interpretation of the present disclosure. In addition, in this specification and each drawing, the same reference numerals are attached to the same elements as those described above for the drawings that have already appeared, and detailed description may be appropriately omitted.

關於用於實施本揭示之形態,於以下參照圖1至16進行說明。圖1係第1實施形態之保持基板之概念俯視圖。圖2係圖1之Y1-Y1剖面箭視之概念箭視剖視圖。圖3係第1實施形態之被移送基板之概念俯視圖。圖4係圖3之Y2-Y2剖面箭視之概念箭視剖視圖。The form for implementing the present disclosure will be described below with reference to FIGS. 1 to 16 . Fig. 1 is a conceptual plan view of a holding substrate according to a first embodiment. Fig. 2 is the conceptual arrow sectional view of Y1-Y1 sectional arrow of Fig. 1. Fig. 3 is a conceptual plan view of the substrate to be transferred according to the first embodiment. Fig. 4 is the conceptual arrow sectional view of the Y2-Y2 sectional arrow in Fig. 3 .

又,以下所記載之構成要件中包含本領域技術人員可容易設想者、實質上相同者。再者,以下所記載之構成要件可適當組合。In addition, the constituent requirements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. In addition, the constituent requirements described below can be combined suitably.

<第1實施形態> 保持於圖1及圖2所示之保持基板100之複數個第1發光元件D1被移送至被移送基板200。於第1實施形態中,於被移送基板200,第2發光元件D2及第3發光元件D3已被移送至被移送基板200。 <First Embodiment> The plurality of first light emitting elements D1 held on the holding substrate 100 shown in FIGS. 1 and 2 are transferred to the transferred substrate 200 . In the first embodiment, the second light emitting element D2 and the third light emitting element D3 have already been transferred to the transferred substrate 200 on the transferred substrate 200 .

<顯示裝置> 顯示裝置10控制複數個像素E而顯示圖像。像素E包含發出複數個不同顏色之光之第1發光元件D1、第2發光元件D2及第3發光元件D3。顯示裝置10係於被移送基板200上配置第1發光元件D1、第2發光元件D2及第3發光元件D3而構成。 <Display device> The display device 10 controls a plurality of pixels E to display an image. The pixel E includes a first light-emitting element D1 , a second light-emitting element D2 and a third light-emitting element D3 that emit light of a plurality of different colors. The display device 10 is configured by arranging the first light emitting element D1 , the second light emitting element D2 , and the third light emitting element D3 on the transferred substrate 200 .

像素E係例如具備發出藍色光之第1發光元件D1、發出紅色光之第2發光元件D2、及發出綠色光之第3發光元件D3。像素E配置成矩陣狀。於每個像素E分別配備第1發光元件D1、第2發光元件D2、及第3發光元件D3。於不區分第1發光元件D1、第2發光元件D2、及第3發光元件D3之情形時,有時稱為發光元件D。The pixel E includes, for example, a first light emitting element D1 emitting blue light, a second light emitting element D2 emitting red light, and a third light emitting element D3 emitting green light. The pixels E are arranged in a matrix. Each pixel E is provided with a first light emitting element D1, a second light emitting element D2, and a third light emitting element D3. When the 1st light emitting element D1, the 2nd light emitting element D2, and the 3rd light emitting element D3 are not distinguished, it may be called a light emitting element D.

<發光元件> 發光元件D發出特定顏色之光。發光元件D係自第1面101之面之正交方向觀察,具有3 μm以上、300 μm以下左右之大小之無機發光二極體(LED:Light Emitting Diode)晶片,被稱為微型LED(micro LED)。於各像素具備微型LED之顯示裝置亦被稱為微型LED顯示裝置。另,微型LED之微型並非限定無機發光二極體之大小。又,發光元件D亦可為迷你LED。發光元件D之高度可根據發光之光之顏色而分別具有不同之高度。 <Light emitting element> The light emitting element D emits light of a specific color. The light-emitting element D is an inorganic light-emitting diode (LED: Light Emitting Diode) chip with a size of about 3 μm or more and 300 μm or less when viewed from the direction perpendicular to the first surface 101, and is called a micro LED (micro LED). A display device having a micro LED in each pixel is also called a micro LED display device. In addition, the miniaturization of micro-LEDs does not limit the size of inorganic light-emitting diodes. Moreover, the light emitting element D can also be a miniature LED. The height of the light emitting element D can have different heights according to the color of the light to be emitted.

發光元件D具有未圖示之第1電極連接層、發光層及第2電極連接層依序積層之積層構造。發光元件D於生長基板上使半導體之結晶生長而形成上述之積層構造。於發光層為氮化鎵系材料(GaN)之情形時,第1電極連接層係例如N型GaN,第2電極連接層係P型GaN。藉由對發光元件D之第1電極連接層與第2電極連接層通電,發光層發出特定顏色之光。發光元件D發出之光可為紅色、藍色、黃綠色及綠色等任意顏色。具體而言,自發光元件D發出之各色之光之中心波長於紅色之情形為約610 nm,於藍色之情形為約470 nm,於綠色之情形為約505 nm及於黃綠色之情形為570 nm。The light-emitting element D has a laminated structure in which a first electrode connection layer, a light-emitting layer, and a second electrode connection layer (not shown) are sequentially laminated. In the light-emitting element D, semiconductor crystals are grown on a growth substrate to form the above-mentioned layered structure. When the light-emitting layer is a gallium nitride-based material (GaN), the first electrode connection layer is, for example, N-type GaN, and the second electrode connection layer is P-type GaN. By electrifying the first electrode connection layer and the second electrode connection layer of the light-emitting element D, the light-emitting layer emits light of a specific color. The light emitted by the light-emitting element D can be any color such as red, blue, yellow-green and green. Specifically, the central wavelength of the light of each color emitted from the light-emitting element D is about 610 nm in the case of red, about 470 nm in the case of blue, about 505 nm in the case of green, and 570 nm in the case of yellow-green.

<保持基板> 第1實施形態之保持基板100係板形狀之基板。保持基板100如圖1所示,於自第1面101之正交方向即一方向觀察之面具有第1區域110。第1區域110包含第1區劃112及第2區劃114。第1區劃112係自一方向觀察之面之第1面101。第2區劃114係自一方向觀察之面之第2面120。保持基板100於第1區劃112之第1面101以特定之間隔p保持複數個第1發光元件D1。保持基板100於第1區域110外之第1面101具備複數個第1對準標記103。保持基板100由具有以特定之透過率以上透過特定波長之光之透過性之材料製成。期望保持基板100由進而具有耐熱性及耐蝕性之材料製成。 <Holding substrate> The holding substrate 100 of the first embodiment is a plate-shaped substrate. As shown in FIG. 1 , the holding substrate 100 has a first region 110 on a surface viewed from a direction perpendicular to the first surface 101 , that is, a direction. The first area 110 includes a first area 112 and a second area 114 . The first division 112 is the first surface 101 viewed from one direction. The second division 114 is the second surface 120 viewed from one direction. The holding substrate 100 holds a plurality of first light emitting elements D1 at a predetermined interval p on the first surface 101 of the first section 112 . The holding substrate 100 has a plurality of first alignment marks 103 on the first surface 101 outside the first region 110 . The holding substrate 100 is made of a material that transmits light of a specific wavelength at a specific transmittance or higher. It is desirable that the holding substrate 100 is made of a material that further has heat resistance and corrosion resistance.

第1區域110係用於保持第1發光元件D1之區域。第1實施形態之第1區域110具有與後述之被移送基板200之被移送區域210同等之大小。第1區域110亦可自保持基板100之緣102離開特定之距離設置。The first region 110 is a region for holding the first light emitting element D1. The first region 110 of the first embodiment has the same size as the transferred region 210 of the transferred substrate 200 described later. The first region 110 may also be disposed at a specific distance from the edge 102 of the holding substrate 100 .

第1區劃112係自一方向觀察保持基板100時具有第1面101之區劃。第1區劃112之自第1面101之面之正交方向觀察第1面101之大小為第1發光元件D1之大小以上。第1區劃112配備於第1區域110之與被移送基板200不具備第2發光元件D2及第3發光元件D3之區域對應之區域。The first section 112 is a section having the first surface 101 when the holding substrate 100 is viewed from one direction. The size of the first region 112 viewed from the direction perpendicular to the surface of the first surface 101 to the first surface 101 is equal to or greater than the size of the first light emitting element D1. The first section 112 is provided in an area of the first area 110 corresponding to an area of the substrate to be transferred 200 that does not include the second light emitting element D2 and the third light emitting element D3.

第2區劃114係自一方向觀察保持基板100時具有第2面120之區劃。第2面120係自第1面101於保持基板100之深度方向分開之面。第2區劃114至少配備於第1區域110之與保持於被移送基板200之被移送面201之發光元件D對應之區域。第2區劃114不保持第1發光元件D1。第2區劃114之自第1面101之正交方向觀察之大小大於對應之發光元件D之大小。第2區劃114例如於被移送基板200之被移送面201之被移送區域210,每1個像素E保持有2個發光元件D之情形時,保持基板100之第1面101具備2個發光元件D之量之第2區劃114。相鄰之第2區劃114彼此可連續。於該情形時,包圍第1區域110之第2面120之形狀為格子形狀。The second section 114 is a section having the second surface 120 when the holding substrate 100 is viewed from one direction. The second surface 120 is a surface separated from the first surface 101 in the depth direction of the holding substrate 100 . The second section 114 is provided at least in a region of the first region 110 corresponding to the light emitting device D held on the transferred surface 201 of the transferred substrate 200 . The second section 114 does not hold the first light emitting element D1. The size of the second region 114 viewed from the direction perpendicular to the first surface 101 is larger than the size of the corresponding light emitting element D. As shown in FIG. The second section 114 holds, for example, the second section 114 having two light-emitting elements D on the first surface 101 of the substrate 100 when the transferred area 210 of the transferred surface 201 of the substrate 200 to be transferred holds two light-emitting elements D per one pixel E. Adjacent second regions 114 may be continuous with each other. In this case, the shape of the second surface 120 surrounding the first region 110 is a lattice shape.

保持基板100將複數個第1發光元件D1保持於第1面101之狀態下壓抵於被移送基板200時,第2面120避開保持於被移送基板200之被移送面201之發光元件D,不與發光元件D碰撞。第2面120對應於保持於被移送基板200之發光元件D之被移送基板200中之發光元件D之位置而配備。When the holding substrate 100 holds the plurality of first light-emitting elements D1 on the first surface 101 and presses against the transferred substrate 200, the second surface 120 avoids the light-emitting elements D held on the transferred surface 201 of the transferred substrate 200 and does not collide with the light-emitting elements D. The second surface 120 is provided corresponding to the position of the light emitting element D held in the transferred substrate 200 of the light emitting element D of the transferred substrate 200 .

第2區劃114之沿第2面120之面之方向之寬度較被移送基板200之發光元件D之沿被移送面201之面之方向之寬度寬。又,第2區劃114亦可設置成特定之寬度之槽形狀。於該情形時,槽形狀之第2區劃114之沿第2面120之方向之寬度較發光元件D之朝向被移送面201之面之方向之寬度寬,且長邊方向之長度可為與並行之第1區域110之長邊方向之邊之長度同等以上。The width of the second region 114 along the direction of the second surface 120 is wider than the width of the light emitting element D of the transferred substrate 200 along the direction of the transferred surface 201 . Also, the second section 114 may be provided in a groove shape with a specific width. In this case, the width of the groove-shaped second region 114 along the direction of the second surface 120 is wider than the width of the surface of the light emitting element D facing the surface to be transferred 201, and the length in the longitudinal direction may be equal to or greater than the length of the side in the longitudinal direction of the parallel first regions 110.

第2面120距第1面101之深度DP1大於例如配備於後述之被移送基板200之突起部220距移送面201之高度hD2、與第1發光元件D1之自第1面101之高度hD1之差δ1。即,第2面120之自第1面101之深度DP1,大於突起部220之前端之位置與第1發光元件D1之前端之位置之、與第1面101正交之方向之差δ1。The depth DP1 of the second surface 120 from the first surface 101 is greater than the difference δ1 between the height hD2 of the protrusion 220 provided on the transferred substrate 200 described later from the transfer surface 201 and the height hD1 of the first light emitting element D1 from the first surface 101 . That is, the depth DP1 of the second surface 120 from the first surface 101 is greater than the difference δ1 between the position of the front end of the protrusion 220 and the position of the front end of the first light emitting element D1 in a direction perpendicular to the first surface 101 .

第2面120去除加工保持基板100之第1區域110內之第1面101而設置。保持基板100之第1面101之去除加工之方法並無限制,例如可採用切削加工或蝕刻等加工方法。第2區劃114亦可例如於相當於第1區劃112之部分配置掩模,自第1面101之面方向利用RIE(Reactive Ion Etching:反應性離子蝕刻)等進行乾蝕刻而形成。另,第2區劃114亦可與將生長於第1面101之成為發光元件之半導體之結晶膜進行單片化之加工一起形成。The second surface 120 is provided by removing the first surface 101 in the first region 110 of the processing and holding substrate 100 . The method of removing the first surface 101 of the holding substrate 100 is not limited, for example, machining methods such as cutting or etching can be used. The second region 114 can also be formed by, for example, placing a mask on a portion corresponding to the first region 112 and performing dry etching by RIE (Reactive Ion Etching: Reactive Ion Etching) or the like from the surface direction of the first surface 101 . In addition, the second region 114 may also be formed together with the process of singulating the crystal film of the semiconductor used as the light-emitting element grown on the first surface 101 .

保持基板100係用於使半導體之薄膜之結晶生長之所謂生長基板。保持基板100係例如藍寶石基板。保持基板100亦可為所謂之圖案化藍寶石基板(Patterned Sapphire Substrate)。保持基板100為圖案化藍寶石基板之情形時,第1面101具備使圓錐形、半球形、棱錐形或柱形等形狀作為微細之圖案週期性地形成之光反射之構造體。圖案化藍寶石基板係於例如藍寶石基板之第1面101配置圖案化之掩模,利用RIE(Reactive Ion Etching)等進行乾蝕刻而形成。The holding substrate 100 is a so-called growth substrate for growing crystals of semiconductor thin films. The holding substrate 100 is, for example, a sapphire substrate. The holding substrate 100 can also be a so-called patterned sapphire substrate. When the holding substrate 100 is a patterned sapphire substrate, the first surface 101 has a structure that reflects light periodically formed in a conical, hemispherical, pyramidal, or columnar shape as a fine pattern. The patterned sapphire substrate is formed, for example, by placing a patterned mask on the first surface 101 of the sapphire substrate and performing dry etching by RIE (Reactive Ion Etching).

於保持基板100之第1面101形成第2面120之製程、與於保持基板100之第1面101形成複數個第1發光元件D1之製程之任一者皆可為先。即,於保持基板100之第1面101形成第2區劃114之第2面120後,於保持基板100之第1面101形成並保持複數個第1發光元件D1。或,亦可於保持基板100之第1面101形成並保持複數個第1發光元件D1後,於保持基板100之第1面101形成第2區劃114之第2面120。Either one of the process of forming the second surface 120 on the first surface 101 of the holding substrate 100 and the process of forming a plurality of first light-emitting elements D1 on the first surface 101 of the holding substrate 100 may be performed first. That is, after the second surface 120 of the second region 114 is formed on the first surface 101 of the holding substrate 100 , a plurality of first light emitting elements D1 are formed and held on the first surface 101 of the holding substrate 100 . Alternatively, the second surface 120 of the second region 114 may also be formed on the first surface 101 of the holding substrate 100 after forming and holding the plurality of first light emitting elements D1 on the first surface 101 of the holding substrate 100 .

另,保持基板100並不限於生長基板,亦可係為移送而暫時保持第1發光元件D1之移送基板。於該情形時,保持基板100由玻璃系材料或樹脂系材料等之板材製作,將第1發光元件D1例如經由接著片材保持於第1面101。以下,將保持基板100作為生長基板進行說明。In addition, the holding substrate 100 is not limited to a growth substrate, and may be a transfer substrate that temporarily holds the first light emitting element D1 for transfer. In this case, the holding substrate 100 is made of a plate material such as a glass-based material or a resin-based material, and the first light-emitting element D1 is held on the first surface 101 via, for example, an adhesive sheet. Hereinafter, the holding substrate 100 will be described as a growth substrate.

<被移送基板> 被移送基板200,如圖3所示,係板形狀之基板。被移送基板200係例如顯示裝置10之陣列基板。圖3所示之被移送區域210成為移送所有發光元件D之顯示區域。被移送基板200於成為顯示區域之被移送區域210之周圍成為周邊區域。被移送區域210自被移送基板200之緣202離開特定之距離設置。被移送基板200係例如於顯示區域形成有TFT(Thin Film Transistor:薄膜電晶體)電路、信號線、掃描線之陣列基板。被移送基板200具備複數個第2對準標記203。如圖3所示,於被移送基板200之被移送區域210,具備較第1發光元件D1先移送之第2發光元件D2及第3發光元件D3,於實施形態1中,第2發光元件D2及第3發光元件D3為突起部220。 <Substrate to be transferred> The transferred substrate 200 is, as shown in FIG. 3 , a board-shaped substrate. The transferred substrate 200 is, for example, an array substrate of the display device 10 . The transferred area 210 shown in FIG. 3 is the display area where all the light emitting elements D are transferred. The transferred substrate 200 becomes a peripheral region around the transferred region 210 to be a display region. The transferred area 210 is disposed at a specific distance from the edge 202 of the transferred substrate 200 . The transferred substrate 200 is, for example, an array substrate on which TFT (Thin Film Transistor: thin film transistor) circuits, signal lines, and scanning lines are formed in the display area. The transferred substrate 200 includes a plurality of second alignment marks 203 . As shown in FIG. 3 , the transferred area 210 of the substrate 200 to be transferred has a second light emitting element D2 and a third light emitting element D3 that are transferred earlier than the first light emitting element D1. In Embodiment 1, the second light emitting element D2 and the third light emitting element D3 are protrusions 220 .

如圖4所示,被移送基板200具有被移送面201。已移送第2發光元件D2之面、已移送第3發光元件D3之面、及已移送第1發光元件D1之被移送面201於俯視下成為不同之面。As shown in FIG. 4 , the substrate to be transferred 200 has a transferred surface 201 . The surface on which the second light-emitting element D2 has been transferred, the surface on which the third light-emitting element D3 has been transferred, and the transferred surface 201 on which the first light-emitting element D1 has been transferred are different surfaces in plan view.

第2對準標記203於被移送面201形成複數個。第2對準標記203與電路一起形成。被移送基板200可藉由第2對準標記203之位置,精度較佳地規定用於與發光元件D連接之電極之位置。A plurality of second alignment marks 203 are formed on the transferred surface 201 . The second alignment mark 203 is formed together with the circuit. The position of the electrode to be connected to the light-emitting element D can be prescribed|regulated by the position of the 2nd alignment mark 203 on the board|substrate 200 to be transferred with high precision.

<突起部> 複數個突起部220包含第2發光元件D2及第3發光元件D3。複數個第2發光元件D2及第3發光元件D3突出配備於圖3所示之被移送區域210之被移送面201之正交方向。第2發光元件D2及第3發光元件D3自配置各者之面起具有特定之高度。第2發光元件D2及第3發光元件D3之前端之位置係於與被移送面201正交之方向,自用於配置各者之面起成為特定之高度之位置。例如,第2發光元件D2自配置第2發光元件D2之面起具有特定之高度hD2。即,第2發光元件D2之前端之位置係於與被移送面201正交之方向,自用於配置第2發光元件D2之面起成為特定之高度hD2之位置。又,於複數個第2發光元件D2及第3發光元件D3中,第2發光元件D2及第3發光元件D3中任一者之前端之與被移送面201正交之方向之位置可不同於第2發光元件D2及第3發光元件D3中任意另一者之前端之與被移送面201正交之方向之位置。複數個突起部220以特定之間隔配備於被移送區域210之被移送面201備。 <Protruding part> The plurality of protrusions 220 include the second light emitting element D2 and the third light emitting element D3. A plurality of second light emitting elements D2 and third light emitting elements D3 protrude from the direction perpendicular to the transferred surface 201 of the transferred region 210 shown in FIG. 3 . The second light emitting element D2 and the third light emitting element D3 have a specific height from the surface on which they are arranged. The positions of the front ends of the second light-emitting element D2 and the third light-emitting element D3 are in the direction perpendicular to the transfer surface 201 , and are at a predetermined height from the surface on which they are arranged. For example, the second light emitting element D2 has a specific height hD2 from the surface on which the second light emitting element D2 is arranged. That is, the position of the front end of the second light emitting element D2 is a position at a predetermined height hD2 from the surface on which the second light emitting element D2 is arranged in a direction perpendicular to the surface to be transferred 201 . Also, among the plurality of second light emitting elements D2 and third light emitting elements D3, the position of the front end of any one of the second light emitting element D2 and the third light emitting element D3 in the direction perpendicular to the transferred surface 201 may be different from the position of the front end of any other of the second light emitting element D2 and the third light emitting element D3 in the direction perpendicular to the transferred surface 201. A plurality of protrusions 220 are arranged on the transferred surface 201 of the transferred area 210 at specific intervals.

第2發光元件D2及第3發光元件D3與第1發光元件D1一起形成像素E。複數個第2發光元件D2及第3發光元件D3預先配備於被移送基板200之被移送區域210。複數個第2發光元件D2及第3發光元件D3係例如較移送第1發光元件D1先移送至被移送基板200之用於特定之配置之面。第2發光元件D2及第3發光元件D3係例如於1個像素E分別配備至少1個。The second light emitting element D2 and the third light emitting element D3 form a pixel E together with the first light emitting element D1. A plurality of second light emitting elements D2 and third light emitting elements D3 are arranged in advance in the transferred area 210 of the transferred substrate 200 . The plurality of second light emitting elements D2 and third light emitting elements D3 are, for example, transferred to the surface for specific arrangement of the transferred substrate 200 before transferring the first light emitting elements D1. At least one of the second light emitting element D2 and the third light emitting element D3 is provided in one pixel E, for example.

<第1實施形態之顯示裝置之製造方法> 以下,關於第1實施形態之顯示裝置之製造方法,參照圖5至圖8進行說明。圖5係顯示將第1實施形態之保持基板相對於被移送基板定位之情況之概念圖。圖6係顯示將第1實施形態之保持基板壓抵於被移送基板之情況之概念圖。圖7係顯示使第1實施形態之第1發光元件連接於被移送基板之電極之情況之概念圖。圖8係顯示使第1實施形態之第1發光元件自保持基板脫離之情況之概念圖。 <Manufacturing method of display device according to the first embodiment> Hereinafter, a method of manufacturing the display device according to the first embodiment will be described with reference to FIGS. 5 to 8 . Fig. 5 is a conceptual diagram showing the state of positioning the holding substrate with respect to the substrate to be transferred according to the first embodiment. Fig. 6 is a conceptual diagram showing a state in which the holding substrate is pressed against the substrate to be transferred according to the first embodiment. Fig. 7 is a conceptual diagram showing a state where the first light-emitting element of the first embodiment is connected to an electrode of a substrate to be transferred. Fig. 8 is a conceptual diagram showing a state where the first light-emitting element of the first embodiment is detached from the holding substrate.

首先,如圖5所示,進行將保持基板100壓抵於被移送基板200之定位。保持基板100之定位於被移送面201之正交方向之特定之高度進行。保持基板100之定位係例如藉由未圖示之移送裝置以使第1面101朝向被移送基板200之方式固持保持基板100,於被移送面201之正交方向之特定之高度,自保持基板100之與第1面101相反之面側,藉由未圖示之對準裝置觀察而進行。保持基板100之定位以保持於保持基板100之第1發光元件D1之位置成為被移送基板200之被移送面201之特定位置之方式進行。定位保持於保持基板100之第1發光元件D1之位置係例如於被移送基板200之被移送區域210形成之像素E之特定位置。另,保持基板100之定位如圖1及3所示,亦可以保持基板100之第1對準標記103與被移送基板200之第2對準標記203重疊之方式進行。First, as shown in FIG. 5 , positioning is performed to press the holding substrate 100 against the substrate to be transferred 200 . The positioning of the holding substrate 100 is performed at a specific height in the direction perpendicular to the surface to be transferred 201 . The positioning of the holding substrate 100 is performed by, for example, holding the holding substrate 100 by a transfer device not shown so that the first surface 101 faces the substrate 200 to be transferred, at a specific height in the direction perpendicular to the transferred surface 201, and observing it by an alignment device not shown from the side of the holding substrate 100 opposite to the first surface 101. The positioning of the holding substrate 100 is performed so that the position of the first light emitting element D1 held on the holding substrate 100 becomes a specific position of the transferred surface 201 of the transferred substrate 200 . The position of the first light-emitting element D1 positioned and held on the holding substrate 100 is, for example, a specific position of the pixel E formed in the transferred region 210 of the transferred substrate 200 . In addition, as shown in FIGS. 1 and 3 , the positioning of the holding substrate 100 can also be performed in such a way that the first alignment mark 103 of the holding substrate 100 overlaps with the second alignment mark 203 of the substrate 200 to be transferred.

其次,如圖6所示,使定位之保持基板100下降並接近被移送基板200,將保持於第1面101之複數個第1發光元件D1壓抵於被移送基板200之被移送面201。此處,保持基板100以特定之力將複數個第1發光元件D1壓抵於被移送基板200之被移送面201。藉此,複數個第1發光元件D1成為經由未圖示之低熔點金屬構件,與被移送基板200之被移送面201之未圖示之複數個電極分別接觸之狀態。Next, as shown in FIG. 6 , the positioned holding substrate 100 is lowered to approach the transferred substrate 200 , and the plurality of first light emitting elements D1 held on the first surface 101 are pressed against the transferred surface 201 of the transferred substrate 200 . Here, the holding substrate 100 presses the plurality of first light emitting elements D1 against the transferred surface 201 of the transferred substrate 200 with a specific force. Thereby, the plurality of first light-emitting elements D1 are brought into a state of being in contact with a plurality of electrodes (not shown) of the transfer surface 201 of the transfer target substrate 200 through the low-melting point metal member (not shown).

其次,如圖7所示,自保持基板100之配備於與第1面101相反之面之未圖示之加熱雷射照射裝置,出射特定波長之加熱雷射光L1。具體而言,自加熱雷射照射裝置,朝向保持基板100之與第1面101相反之面即照射面,出射加熱雷射光L1。加熱雷射光L1係易被低熔點金屬構件吸收且不易由被移送基板200及發光元件D吸收之光。加熱雷射光L1係紅外光、近紅外光或綠色光。出射之加熱雷射光L1透過保持基板100,照射至配備於被移送基板200之被移送面201之電極之低熔點金屬構件並被吸收。吸收了所照射之加熱雷射光L1之低熔點金屬構件被加熱而成為共晶合金,將保持於保持基板100之第1發光元件D1與被移送基板200之電極連接。另,加熱雷射光L1之照射,亦可於保持基板100之照射面側設置具備開口A1之遮光光罩M1而進行。於該情形時,加熱雷射光L1自配備於遮光光罩M2之與保持基板100相反之面側之加熱雷射照射裝置,朝向保持基板100之與第1面101相反之面即照射面出射,通過遮光光罩M2之開口A2後,照射至保持基板100。Next, as shown in FIG. 7 , heating laser light L1 of a specific wavelength is emitted from a heating laser irradiation device (not shown) provided on the surface opposite to the first surface 101 of the holding substrate 100 . Specifically, the heating laser light L1 is emitted from the heating laser irradiation device toward the irradiation surface which is the surface opposite to the first surface 101 of the holding substrate 100 . The heating laser light L1 is light that is easily absorbed by the low-melting point metal member and is not easily absorbed by the transferred substrate 200 and the light emitting element D. As shown in FIG. The heating laser light L1 is infrared light, near infrared light or green light. The emitted heating laser light L1 passes through the holding substrate 100, is irradiated to the low-melting-point metal member provided on the electrode of the transferred surface 201 of the transferred substrate 200, and is absorbed. The low-melting-point metal member absorbing the irradiated heating laser light L1 is heated to form a eutectic alloy, and connects the first light-emitting element D1 held on the holding substrate 100 and the electrode of the substrate 200 to be transferred. In addition, the irradiation of the heating laser light L1 may be performed by providing the light-shielding mask M1 having the opening A1 on the irradiation surface side of the holding substrate 100 . In this case, the heating laser light L1 is emitted from the heating laser irradiation device provided on the surface side of the light-shielding mask M2 opposite to the holding substrate 100 toward the surface of the holding substrate 100 opposite to the first surface 101, that is, the irradiation surface, passes through the opening A2 of the light-shielding mask M2, and is irradiated to the holding substrate 100.

其次,如圖8所示,自保持基板100之配備於第1面101之相反面之未圖示之切除雷射照射裝置,出射特定波長之切除雷射光L2。具體而言,切除雷射光L2係自切除雷射照射裝置,朝向保持基板100之與第1面101相反之面即照射面,出射切除雷射光L2。切除雷射光L2係易被第1發光元件D1吸收且不易由被移送基板200吸收之光。切除雷射光L2係紫外光、藍色光或綠色光。出射之切除雷射光L2透過保持基板100,照射至保持於保持基板100之第1面101之第1發光元件D1之、與保持基板100之第1面101之界面部並被吸收。吸收了切除雷射光L2之第1發光元件D1之界面部溶解,第1發光元件D1與保持基板100分離。另,切除雷射光L2之照射亦可於保持基板100之照射面側設置具備開口A2之遮光光罩M2而進行。於該情形時,切除雷射光L2自配備於遮光光罩M2之與保持基板100相反之面側之切除雷射照射裝置,朝向保持基板100之與第1面101相反之面即照射面出射,通過遮光光罩M2之開口A2後,照射至保持基板100。以此方式,將第1發光元件D1自保持基板100移送至被移送基板200。Next, as shown in FIG. 8 , an ablation laser light L2 of a specific wavelength is emitted from an ablation laser irradiation device (not shown) provided on the surface opposite to the first surface 101 of the holding substrate 100 . Specifically, the ablation laser light L2 is emitted from the ablation laser irradiation device toward the irradiation surface which is the surface opposite to the first surface 101 of the holding substrate 100 , and the ablation laser light L2 is emitted. The ablation laser light L2 is light that is easily absorbed by the first light emitting element D1 and is not easily absorbed by the transferred substrate 200 . Excision laser light L2 is ultraviolet light, blue light or green light. The emitted ablation laser light L2 passes through the holding substrate 100 , is irradiated to the interface between the first light emitting element D1 held on the first surface 101 of the holding substrate 100 and the first surface 101 of the holding substrate 100 , and is absorbed. The interface portion of the first light emitting element D1 that absorbed the ablation laser light L2 is dissolved, and the first light emitting element D1 is separated from the holding substrate 100 . In addition, the irradiation of the ablation laser light L2 may be performed by providing the light-shielding mask M2 having the opening A2 on the irradiation surface side of the holding substrate 100 . In this case, the ablation laser light L2 is emitted from the ablation laser irradiation device provided on the surface side of the light-shielding mask M2 opposite to the holding substrate 100 toward the irradiation surface, which is the surface opposite to the first surface 101 of the holding substrate 100, and is irradiated to the holding substrate 100 after passing through the opening A2 of the light-shielding mask M2. In this manner, the first light emitting element D1 is transferred from the holding substrate 100 to the transferred substrate 200 .

(變化例) 圖9係第1實施形態之變化例之被移送基板之概念箭視剖視圖。突起部220並不限於發光元件D,亦可為反射壁222。又,突起部220亦可由複數個發光元件D與複數個反射壁222之兩者構成。於該情形時,複數個反射壁222亦可配置於被移送基板200之與移送複數個第1發光元件D1之被移送面201不同之面。又,發光元件D亦可進而配備於與被移送面201不同、且與用於配置反射壁222之面不同之面。再者,於該情形時,複數個反射壁222之前端之位置亦可為於與被移送面201之面正交之方向上,較複數個發光元件D之前端之位置更遠離被移送基板200之位置。 (variation example) Fig. 9 is a conceptual arrow cross-sectional view of a substrate to be transferred according to a modification of the first embodiment. The protruding portion 220 is not limited to the light-emitting element D, and can also be a reflective wall 222 . Moreover, the protruding portion 220 may also be composed of both the plurality of light emitting elements D and the plurality of reflective walls 222 . In this case, the plurality of reflective walls 222 may also be arranged on a surface of the substrate 200 to be transferred that is different from the surface to be transferred 201 on which the plurality of first light-emitting elements D1 are transferred. In addition, the light emitting element D may further be provided on a surface different from the surface to be transferred 201 and different from the surface on which the reflective wall 222 is arranged. Furthermore, in this case, the positions of the front ends of the plurality of reflective walls 222 may be further away from the position of the transferred substrate 200 than the positions of the front ends of the plurality of light emitting elements D in the direction perpendicular to the surface to be transferred 201 .

對突起部220為反射壁222之情形進行說明。反射壁222將發光元件D發出之光反射至被移送面201之正交方向。反射壁222如圖9所示,配備於被移送基板200之被移送面201。反射壁222於被移送面201之正交方向具有特定之高度hR。反射壁222之前端之位置與圖6之突起部220為發光元件D之情形同樣,係於被移送面201之正交方向上較第1面101之位置更深之第2面120側之位置。反射壁222如圖9所示,以特定之間隔於被移送基板200之被移送面201配置複數個。於相鄰之複數個反射壁222之間之被移送面201,收容至少1個像素E。反射壁222配備於被移送基板200之被移送區域210之像素E彼此之間隙。The case where the protruding portion 220 is the reflective wall 222 will be described. The reflective wall 222 reflects the light emitted by the light emitting element D to the direction perpendicular to the transferred surface 201 . The reflection wall 222 is provided on the transferred surface 201 of the transferred substrate 200 as shown in FIG. 9 . The reflective wall 222 has a specific height hR in the direction perpendicular to the conveyed surface 201 . The position of the front end of the reflective wall 222 is the same as the case where the protruding portion 220 is the light emitting element D in FIG. As shown in FIG. 9 , a plurality of reflective walls 222 are arranged at predetermined intervals on the transferred surface 201 of the transferred substrate 200 . At least one pixel E is accommodated on the transferred surface 201 between a plurality of adjacent reflective walls 222 . The reflective wall 222 is disposed in the gap between the pixels E of the transferred area 210 of the transferred substrate 200 .

自被移送面201之正交方向觀察反射壁222之側面成為具有傾斜之平滑面。反射壁222之側面成為相對於被移送面201之正交方向傾斜之平滑面。即,反射壁222之沿被移送面201之方向之寬度隨著自被移送面201於被移送面201之正交方向遠離而減少。The side surface of the reflective wall 222 viewed from the direction perpendicular to the conveyed surface 201 becomes a smooth surface with an inclination. The side surface of the reflective wall 222 is a smooth surface inclined with respect to the direction perpendicular to the conveyed surface 201 . That is, the width of the reflective wall 222 along the direction of the transferred surface 201 decreases as it moves away from the transferred surface 201 in the direction perpendicular to the transferred surface 201 .

保持基板100自一方向觀察,區劃為具有第1面101之複數個第1區劃112與具有第2面120之第2區劃114。第1區劃112係於第1面101保持複數個第1發光元件D1之區域。第2面120自第1面101於第1面101之深度方向分開。When viewed from one direction, the holding substrate 100 is divided into a plurality of first zones 112 having a first surface 101 and a second zone 114 having a second surface 120 . The first region 112 is a region for holding a plurality of first light emitting elements D1 on the first surface 101 . The second surface 120 is separated from the first surface 101 in the depth direction of the first surface 101 .

藉此,保持基板100區劃為具有第1面101之複數個第1區劃112、與具有第2面120之第2區劃114,於第1面101保持複數個第1發光元件D1,於第1面101之深度方向,具備自第1面101分開之第2面120,故於將複數個第1發光元件D1保持於第1面101之狀態下,壓抵於被移送基板200之被移送面201時,即使於被移送基板200於被移送面201具備突起部220之情形時,亦可避免與突起部220接觸。Thereby, the holding substrate 100 is divided into a plurality of first regions 112 having a first surface 101 and a second region 114 having a second surface 120. The first surface 101 holds a plurality of first light-emitting elements D1, and has a second surface 120 separated from the first surface 101 in the depth direction of the first surface 101. Therefore, in a state where the plurality of first light-emitting elements D1 are held on the first surface 101, they are pressed against the substrate. When transferring the transferred surface 201 of the substrate 200 , even when the transferred substrate 200 has the protrusion 220 on the transferred surface 201 , contact with the protrusion 220 can be avoided.

複數個第1發光元件D1可於保持於第1區劃112之第1面101之狀態下,壓抵於具有用於配置複數個突起部220之面之被移送基板200。第2區劃114可配備於保持基板100之與被移送基板200之突起部220之位置對應之位置。The plurality of first light emitting elements D1 can be pressed against the transferred substrate 200 having a surface for arranging the plurality of protrusions 220 while being held on the first surface 101 of the first section 112 . The second section 114 may be provided at a position of the holding substrate 100 corresponding to the position of the protrusion 220 of the substrate 200 to be transferred.

藉此,因保持基板100之第2區劃114配備於保持基板100之第1面101之與被移送基板200之突起部220對應之位置,故於保持基板100將複數個第1發光元件D1保持於第1面101之狀態下,壓抵於具有用於配置複數個突起部220之面之被移送基板200時,因藉由保持基板100之第2面120避開被移送基板200之突起部220,故可避免與被移送基板200之突起部220接觸。Thus, since the second section 114 of the holding substrate 100 is provided on the first surface 101 of the holding substrate 100 corresponding to the protrusions 220 of the transferred substrate 200, when the holding substrate 100 holds the plurality of first light-emitting elements D1 on the first surface 101 and is pressed against the transferred substrate 200 having a surface for disposing the plurality of protrusions 220, the second surface 12 of the holding substrate 100 0 avoids the protruding portion 220 of the substrate 200 to be transferred, so contact with the protruding portion 220 of the substrate 200 to be transferred can be avoided.

第2面120之自第1面101之深度可大於突起部220之自被移送面201之高度、與第1發光元件D1之自第1面101之高度之差δ1。即,假設,用於配置突起部220之面與第1面101於第1面101之正交方向為相同位置之面之情形時,第2面120之自第1面101之深度可大於突起部220之自被移送面201之高度、與第1發光元件D1之自第1面101之高度之差δ1。The depth of the second surface 120 from the first surface 101 may be larger than the difference δ1 between the height of the protrusion 220 from the conveyed surface 201 and the height of the first light emitting element D1 from the first surface 101 . That is, assuming that the surface on which the projections 220 are arranged and the first surface 101 are at the same position in the direction perpendicular to the first surface 101, the depth of the second surface 120 from the first surface 101 may be greater than the difference δ1 between the height of the projections 220 from the surface to be transferred 201 and the height of the first light emitting element D1 from the first surface 101.

藉此,因第2面120之自第1面101之深度DP1大於突起部220之前端之位置與第1發光元件D1之前端之位置之、與第1面101之面正交之方向之差δ1,故於保持基板100將複數個第1發光元件D1保持於第1面101之狀態下,壓抵於具有用於配置複數個突起部220之面之被移送基板200時,因藉由保持基板100之第2面120避開被移送基板200之突起部220,故可避免與被移送基板200之突起部220接觸。換言之,假設,用於配置突起部220之面與第1面101於第1面101之正交方向為相同位置之面之情形時,因保持基板100自第2區劃114之第1面101之正交方向觀察之面之自第1面101之深度DP1,大於被移送基板200之突起部220之自被移送面201之高度hR與第1發光元件D1之自第1面101之高度hD1之差δ1,故於保持複數個第1發光元件D1之狀態下壓抵於被移送基板200時,可避免與被移送基板200之突起部220接觸。Therefore, since the depth DP1 of the second surface 120 from the first surface 101 is greater than the difference δ1 between the position of the front end of the protrusion 220 and the position of the front end of the first light-emitting element D1 in a direction perpendicular to the first surface 101, when the holding substrate 100 holds the plurality of first light-emitting elements D1 on the first surface 101 and is pressed against the transferred substrate 200 having a surface for arranging the plurality of protrusions 220, By keeping the second surface 120 of the substrate 100 away from the protrusion 220 of the substrate 200 to be transferred, contact with the protrusion 220 of the substrate 200 to be transferred can be avoided. In other words, assuming that the surface for disposing the protrusions 220 and the first surface 101 are at the same position in the direction perpendicular to the first surface 101, the depth DP1 from the first surface 101 of the surface of the holding substrate 100 viewed from the direction perpendicular to the first surface 101 of the second section 114 is greater than the height hR of the protrusions 220 of the transferred substrate 200 from the transferred surface 201 and the height hR of the first light-emitting element D1. The difference δ1 of the height hD1 of the first surface 101 can avoid contact with the protrusion 220 of the transferred substrate 200 when pressing against the transferred substrate 200 while holding the plurality of first light emitting elements D1.

被移送基板200可具備前端之位置不同之複數個突起部220。於第1發光元件D1壓抵於被移送基板200之狀態下,複數個突起部220中一部分之突起部220之前端可位於較第1面101更深之第2面120側之位置。即,第2面120之自第1面101之深度DP1可大於被移送基板200之複數個突起部220中自被移送面201之高度最高之突起部220之高度、與保持於第1面101之第1發光元件D1之自第1面101之高度hD1之差。換言之,用於配置突起部220之面與第1面101於第1面101之正交方向為相同位置之面之情形時,被移送基板200之複數個突起部220中自被移送面201之高度最高之突起部220為第2發光元件D2之情形,第2面120之自第1面101之深度DP1可大於被移送基板200之複數個第2發光元件D2中自被移送面201之高度最高之第2發光元件D2之高度hD2、與保持於保持基板100之第1面101之第1發光元件D1之自第1面101之高度hD1之差δ1。又,於被移送基板200之複數個突起部220中自被移送面201之高度最高之突起部220為反射壁222之情形,第2面120之自第1面101之深度DP1可大於被移送基板200之複數個突起部220中自被移送面201之反射壁222之高度hR、與保持於第1面101之第1發光元件D1之自第1面101之高度之差。The substrate to be transferred 200 may include a plurality of protrusions 220 with different positions of the front ends. In the state where the first light-emitting element D1 is pressed against the transferred substrate 200 , the front end of a part of the plurality of protrusions 220 may be positioned on the side of the second surface 120 deeper than the first surface 101 . That is, the depth DP1 of the second surface 120 from the first surface 101 may be greater than the difference between the height of the highest protrusion 220 from the transferred surface 201 among the plurality of protrusions 220 of the transferred substrate 200 and the height hD1 of the first light emitting element D1 held on the first surface 101 from the first surface 101. In other words, when the surface for disposing the protrusions 220 and the first surface 101 are at the same position in the direction perpendicular to the first surface 101, and among the plurality of protrusions 220 of the transferred substrate 200, the protrusion 220 with the highest height from the transferred surface 201 is the second light-emitting element D2, the depth DP1 of the second surface 120 from the first surface 101 can be greater than the plurality of second light-emitting elements of the transferred substrate 200. The difference δ1 between the height hD2 of the second light emitting element D2 having the highest height from the transferred surface 201 of the element D2 and the height hD1 of the first light emitting element D1 held on the first surface 101 of the holding substrate 100 from the first surface 101 . Also, in the case where the protrusion 220 with the highest height from the transferred surface 201 among the plurality of protrusions 220 of the transferred substrate 200 is the reflective wall 222, the depth DP1 of the second surface 120 from the first surface 101 can be greater than the height hR of the reflective wall 222 from the transferred surface 201 among the plurality of protrusions 220 of the transferred substrate 200, and the first light-emitting element D1 held on the first surface 101 The height difference from the first surface 101.

藉此,保持基板100於第1發光元件D1壓抵於被移送基板200之狀態下,即使被移送基板200之複數個突起部220之前端之位置為不同之位置,因一部分之突起部220之前端位於較第1面101更深之第2面120側之位置,故亦可避免被移送基板200之突起部220與保持基板100接觸。換言之,於用於配置突起部220之面與第1面101於第1面101之正交方向為相同位置之面之情形時,因第2面120之自第1面101之深度DP1大於最高之突起部220例如第2發光元件D2之自被移送面201之高度hD2、與第1發光元件D1之自第1面101之高度hD1之差δ1,故於保持複數個第1發光元件D1之狀態下壓抵於被移送基板200時,可避免被移送基板200之突起部220與保持基板100接觸。Thereby, holding the substrate 100 in the state where the first light-emitting element D1 is pressed against the transferred substrate 200, even if the positions of the front ends of the plurality of protrusions 220 of the transferred substrate 200 are in different positions, since the front ends of some of the protrusions 220 are located on the side of the second surface 120 that is deeper than the first surface 101, the contact between the protrusions 220 of the transferred substrate 200 and the holding substrate 100 can be avoided. In other words, when the surface for disposing the protruding portion 220 and the first surface 101 are at the same position in the direction perpendicular to the first surface 101, since the depth DP1 of the second surface 120 from the first surface 101 is greater than the difference δ1 between the height hD2 of the second light-emitting element D2 from the transferred surface 201 and the height hD1 of the first light-emitting element D1 from the first surface 101, the difference δ1 is maintained. When the plurality of first light-emitting elements D1 are pressed against the transferred substrate 200 , it is possible to prevent the protrusion 220 of the transferred substrate 200 from contacting the holding substrate 100 .

突起部220亦可為發光元件及反射壁222之至少一者。The protruding part 220 can also be at least one of the light emitting element and the reflective wall 222 .

藉此,保持基板100於在被移送基板200具備已移送之發光元件或反射壁222之至少一者之情形時,亦可於保持基板100將複數個第1發光元件D1保持於第1面101之狀態下,壓抵於被移送基板200之被移送面201時,避免與被移送面201之已移送之發光元件D或反射壁222接觸。Thereby, when the substrate 100 to be transferred has at least one of the transferred light-emitting element D1 or the reflective wall 222 , the holding substrate 100 can hold the plurality of first light-emitting elements D1 on the first surface 101 and press against the transferred surface 201 of the substrate 200 to avoid contact with the transferred light-emitting element D or the reflective wall 222 of the transferred surface 201 .

顯示裝置10之製造方法具有以下步驟:使保持於保持基板100之第1面101之複數個第1發光元件D1之位置,於具備複數個突起部220之被移送基板200之特定位置對位;及將保持於相對於被移送基板200對位之保持基板100之第1面101之第1發光元件D1壓抵於被移送基板200之被移送面201。保持基板100區劃為自一方向觀察具有第1面101之複數個第1區劃112、與自一方向觀察具有第2面120之第2區劃114。第1區劃112於第1面101保持複數個第1發光元件D1,第2面120自第1面101於第1面101之深度方向分開。The manufacturing method of the display device 10 has the following steps: aligning the positions of the plurality of first light-emitting elements D1 held on the first surface 101 of the holding substrate 100 at specific positions of the transferred substrate 200 having a plurality of protrusions 220; The holding substrate 100 is divided into a plurality of first zones 112 having the first surface 101 viewed from one direction, and a second zone 114 having the second surface 120 viewed from one direction. The first section 112 holds a plurality of first light emitting elements D1 on the first surface 101 , and the second surface 120 is separated from the first surface 101 in the depth direction of the first surface 101 .

藉此,顯示裝置10之製造方法係於保持基板100將複數個第1發光元件D1保持於第1面101之狀態下將第1發光元件D1壓抵於具備被移送基板200之突起部220之被移送面201時,使自第1面101之正交方向觀察保持基板100之面即第2面120自第1面101於深度方向分開之第2區劃114之位置,以與被移送基板200及突起部220之位置對應之方式對位後,將保持基板100壓抵於被移送基板200之被移送面201,故可避免突起部220與保持基板100接觸。Thus, the manufacturing method of the display device 10 is to press the first light-emitting element D1 against the transferred surface 201 having the protrusion 220 of the transferred substrate 200 in a state where the holding substrate 100 holds the plurality of first light-emitting elements D1 on the first surface 101, so that the surface of the holding substrate 100, that is, the position of the second section 114 separated from the first surface 101 in the depth direction by the second surface 120 is viewed from the direction perpendicular to the first surface 101. After aligning in a manner corresponding to the position of the transferred substrate 200 and the protrusion 220, the holding substrate 100 is pressed against the transferred surface 201 of the transferred substrate 200, so that the protrusion 220 and the holding substrate 100 can be prevented from contacting.

<第2實施形態> 以下,對第2實施形態,參照圖10至圖16進行說明。圖10係第2實施形態之保持基板之概念俯視圖。圖11係圖10之Y3-Y3剖面箭視之概念箭視剖視圖。圖12係第2實施形態之被移送基板之概念俯視圖。圖13係圖12之Y4-Y4剖面箭視之概念箭視剖視圖。圖14係顯示將第2實施形態之保持基板壓抵於被移送基板之第1區域之情況之概念圖。圖15係顯示將第2實施形態之保持基板相對於被移送基板之被移送區域定位之情況之概念圖。圖16係顯示將第2實施形態之保持基板壓抵於被移送基板之被移送區域之情況之概念圖。 <Second Embodiment> Hereinafter, a second embodiment will be described with reference to FIGS. 10 to 16 . Fig. 10 is a conceptual plan view of the holding substrate of the second embodiment. Fig. 11 is the conceptual arrow sectional view of the Y3-Y3 sectional arrow in Fig. 10 . Fig. 12 is a conceptual plan view of a substrate to be transferred according to the second embodiment. Fig. 13 is a conceptual arrow sectional view of the Y4-Y4 sectional arrow in Fig. 12 . Fig. 14 is a conceptual diagram showing the state of pressing the holding substrate against the first region of the substrate to be transferred according to the second embodiment. Fig. 15 is a conceptual diagram showing the state of positioning the holding substrate with respect to the transferred area of the transferred substrate according to the second embodiment. Fig. 16 is a conceptual diagram showing the state of pressing the holding substrate against the transferred area of the transferred substrate according to the second embodiment.

第2實施形態之保持基板130之不同點在於具備第3區劃146。又,第2實施形態之被移送基板230之不同點在於,被移送區域240之大小大於保持基板130之第1區域140之大小,藉由複數個保持基板移送第1發光元件。另,關於第2實施形態之說明,省略與第1實施形態重複之內容之說明。The difference between the holding substrate 130 of the second embodiment is that the third section 146 is provided. Also, the difference of the transferred substrate 230 in the second embodiment is that the size of the transferred region 240 is larger than the size of the first region 140 of the holding substrate 130, and the first light-emitting element is transferred by a plurality of holding substrates. In addition, regarding the description of the second embodiment, the description of the contents overlapping with the first embodiment will be omitted.

<保持基板> 第2實施形態之保持基板130如圖10及圖11所示,第1發光元件D1保持於第1面131之第1區域140之第1區劃142。保持基板130與第1實施形態之保持基板100相比,進而於第1面131具備第1區域140外之區域即第2區域。即,第2區域係保持基板130之緣132與第1區域140之間之區域。以下,將第2區域稱為第3區劃146。第3區劃146具有自保持基板130之緣132至第1區域140之特定之寬度w。第3區劃146之特定之寬度w大於保持第1發光元件D1之特定之間隔p。另,如圖10所示,保持基板130之自第1面131之正交方向觀察之形狀為圓形狀之情形、且第1區域140為方形狀之情形時,第3區劃146之寬度w係欲獲得第1區域140之寬度w之位置之、與欲獲得第1區域140之方形狀之寬度w之方向之邊平行方向的自第1區域140之緣132至第1區域140之端之距離。 <Holding substrate> In the holding substrate 130 of the second embodiment, as shown in FIGS. 10 and 11 , the first light emitting element D1 is held in the first section 142 of the first region 140 of the first surface 131 . Compared with the holding substrate 100 of the first embodiment, the holding substrate 130 further includes a second region that is a region other than the first region 140 on the first surface 131 . That is, the second region is a region between the edge 132 of the holding substrate 130 and the first region 140 . Hereinafter, the second area is referred to as a third division 146 . The third region 146 has a specific width w from the edge 132 of the holding substrate 130 to the first region 140 . The specific width w of the third region 146 is greater than the specific interval p for maintaining the first light emitting elements D1. In addition, as shown in FIG. 10 , when the shape of the substrate 130 viewed from the direction perpendicular to the first surface 131 is circular and the first region 140 is square, the width w of the third region 146 is the distance from the edge 132 of the first region 140 to the end of the first region 140 in the direction parallel to the side in the direction where the width w of the first region 140 is to be obtained.

第3區劃146具有自第1面131起特定之深度DP2之第3面148。第3區劃146之第3面148之特定之深度DP2例如大於配備於後述之被移送基板230之突起部220例如第2發光元件D2之自被移送面231之高度hD2、與第1發光元件D1之自保持基板130之第1面131之高度hD1之差δ2。第3面148可與保持基板130之外周面(緣132)連接。於該情形時,保持基板130之與第3面148連接之緣132之厚度相較於第3面148不與保持基板130之緣132連接之情形時之厚度,薄第3面148之深度DP2之量。第3區劃146之第3面148之深度DP2亦可與第2區劃144之第2面150之深度DP1相同。第3區劃146之第3面148可以與第2區劃144之第2面150相同之程序形成。The third section 146 has a third surface 148 having a predetermined depth DP2 from the first surface 131 . The specific depth DP2 of the third surface 148 of the third region 146 is, for example, greater than the difference δ2 between the height hD2 of the protrusion 220 provided on the transferred substrate 230 described later, such as the height hD2 of the second light emitting element D2 from the transferred surface 231, and the height hD1 of the first light emitting element D1 from the first surface 131 of the self-holding substrate 130. The third surface 148 can be connected to the outer peripheral surface (edge 132 ) of the holding substrate 130 . In this case, the thickness of the edge 132 of the holding substrate 130 connected to the third surface 148 is thinner by the depth DP2 of the third surface 148 than the thickness of the case where the third surface 148 is not connected to the edge 132 of the holding substrate 130 . The depth DP2 of the third surface 148 of the third section 146 may be the same as the depth DP1 of the second surface 150 of the second section 144 . The third surface 148 of the third region 146 can be formed in the same procedure as the second surface 150 of the second region 144 .

<被移送基板> 第2實施形態之被移送基板230如圖12所示,於被移送面231具備大於保持基板130之第1區域140之被移送區域240。被移送區域240自被移送基板230之緣232離開特定之距離設置。被移送基板230於被移送面231之被移送區域240具備第1被移送區域242及第2被移送區域244。第1被移送區域242與第2被移送區域244分別為可保持自保持基板130移送之複數個第1發光元件D1之大小。 <Substrate to be transferred> The transferred substrate 230 of the second embodiment has, as shown in FIG. 12 , a transferred area 240 larger than the first area 140 of the holding substrate 130 on the transferred surface 231 . The transferred area 240 is disposed at a specific distance from the edge 232 of the transferred substrate 230 . The transferred substrate 230 includes a first transferred area 242 and a second transferred area 244 in the transferred area 240 of the transferred surface 231 . The first transferred area 242 and the second transferred area 244 are each of a size capable of holding the plurality of first light emitting elements D1 transferred from the holding substrate 130 .

<第2實施形態之顯示基板之製造方法> 以下,關於第2實施形態之顯示裝置之製造方法,參照圖13至圖16進行說明。第2實施形態之顯示裝置之製造方法係使用複數個保持基板130進行,將各個保持基板130所保持之第1發光元件D1依序壓抵並移送於被移送基板230之各個區域。於以下之說明中,將複數個保持基板130設為第1保持基板130A及第2保持基板130B。 <Manufacturing method of display substrate according to the second embodiment> Hereinafter, a method of manufacturing the display device according to the second embodiment will be described with reference to FIGS. 13 to 16 . The manufacturing method of the display device of the second embodiment is performed using a plurality of holding substrates 130 , and the first light-emitting elements D1 held by each holding substrate 130 are sequentially pressed and transferred to each area of the transferred substrate 230 . In the following description, the plurality of holding substrates 130 are referred to as a first holding substrate 130A and a second holding substrate 130B.

首先,如圖13所示,相對於被移送基板230之被移送區域240進行第1保持基板130A之定位。此處,被移送基板230保持複數個第2發光元件D2及第3發光元件D3,複數個第2發光元件D2及第3發光元件D3以特定之間隔配置。First, as shown in FIG. 13 , positioning of the first holding substrate 130A is performed with respect to the transferred region 240 of the transferred substrate 230 . Here, the transferred substrate 230 holds a plurality of second light emitting elements D2 and third light emitting elements D3, and the plurality of second light emitting elements D2 and third light emitting elements D3 are arranged at predetermined intervals.

其次,如圖14所示,將保持於第1保持基板130A之第1面131之複數個第1發光元件D1壓抵於被移送基板230之被移送面231之第1被移送區域242。壓抵之複數個第1發光元件D1成為經由低熔點金屬構件分別與設置於被移送基板230之被移送面231之複數個電極接觸之狀態。於該狀態下,與圖7所示之態樣同樣,自第1保持基板130A之與第1面131相反之面照射加熱雷射光L1。經照射加熱雷射光L1之低熔點金屬構件熔融,連接保持於第1保持基板130A之第1發光元件D1與被移送基板230之被移送面231之電極。另,與圖8所示之態樣同樣,自第1保持基板130A之與第1面131相反之面照射特定波長之切除雷射光L2,使第1保持基板130A之第1面131與第1發光元件D1脫離。Next, as shown in FIG. 14 , the plurality of first light emitting elements D1 held on the first surface 131 of the first holding substrate 130A are pressed against the first transferred region 242 of the transferred surface 231 of the transferred substrate 230 . The pressed plurality of first light emitting elements D1 are in contact with the plurality of electrodes provided on the transferred surface 231 of the transferred substrate 230 via the low-melting point metal member. In this state, heating laser light L1 is irradiated from the surface of the first holding substrate 130A opposite to the first surface 131 as in the aspect shown in FIG. 7 . The low-melting-point metal member irradiated with the heating laser light L1 is melted, and the first light-emitting element D1 held on the first holding substrate 130A is connected to the electrodes on the transferred surface 231 of the transferred substrate 230 . In addition, similarly to the aspect shown in FIG. 8 , the ablation laser light L2 of a specific wavelength is irradiated from the surface of the first holding substrate 130A opposite to the first surface 131 to separate the first surface 131 of the first holding substrate 130A from the first light emitting element D1.

其次,如圖15所示,相對於被移送基板230之第2被移送區域244進行第2保持基板130B之定位。第2保持基板130B之定位以於被移送基板230之被移送面231之正交方向之特定之高度,保持於第2保持基板130B之第1面131之第1發光元件D1成為被移送基板230之被移送面231之第2被移送區域244之特定位置之方式進行。定位保持於第2保持基板130B之第1發光元件D1之位置係例如於被移送基板230之被移送區域240形成之像素E之特定位置。Next, as shown in FIG. 15 , the positioning of the second holding substrate 130B is performed with respect to the second transfer area 244 of the transfer target substrate 230 . The positioning of the second holding substrate 130B is performed so that the first light emitting element D1 held on the first surface 131 of the second holding substrate 130B becomes a specific position of the second transferred region 244 of the transferred surface 231 of the transferred substrate 230 at a specific height in the direction perpendicular to the transferred surface 231 of the transferred substrate 230 . The position of the first light-emitting element D1 positioned and held on the second holding substrate 130B is, for example, a specific position of the pixel E formed in the transferred region 240 of the transferred substrate 230 .

再者,亦可使第2保持基板130B之位置,於保持於被移送基板230之被移送面231之第1被移送區域242的複數個第2發光元件D2及第3發光元件D3中最靠近第2被移送區域244側之第3發光元件D3、與自第2保持基板130B壓抵於被移送基板230之被移送面231之第2被移送區域244的複數個第1發光元件D1中最靠近第1被移送區域242側之第1發光元件D1之間隔成為特定之間隔p之位置進行對位。Furthermore, the position of the second holding substrate 130B may be positioned between the third light emitting element D3 closest to the second transferred region 244 among the plurality of second light emitting elements D2 and third light emitting elements D3 held on the first transferred region 242 of the transferred surface 231 of the transferred substrate 230 , and the second transferred region 244 pressed against the transferred surface 231 of the transferred substrate 230 from the second holding substrate 130B. Among the plurality of first light emitting elements D1, the first light emitting elements D1 closest to the first transfer region 242 side are aligned at a predetermined interval p.

另,第2保持基板130B之定位如圖10及12所示,亦可以預先設置於第2保持基板130B之第1對準標記133與預先設置於被移送基板230之第2對準標記233重疊之方式進行。In addition, as shown in FIGS. 10 and 12 , the positioning of the second holding substrate 130B can also be performed in such a way that the first alignment mark 133 previously provided on the second holding substrate 130B overlaps with the second alignment mark 233 previously provided on the transferred substrate 230 .

其次,如圖16所示,使第2保持基板130B下降,將保持於第2保持基板130B之第1面131之複數個第1發光元件D1壓抵於被移送基板230之被移送面231之第2被移送區域244。此處,複數個第1發光元件D1以特定之力壓抵於被移送基板230之被移送面231。複數個第1發光元件D1成為經由低熔點金屬構件分別與設置於被移送基板230之被移送面231之複數個電極接觸之狀態。於該狀態下,與圖7所示之態樣同樣,自配備於第2保持基板130B之與第1面131相反之面之加熱雷射裝置,朝向第2保持基板130B之與第1面131相反之面即照射面,出射特定波長之加熱雷射光L1。吸收了所照射之加熱雷射光L1之低熔點金屬構件熔融,將保持於第2保持基板130B之第1發光元件D1與被移送基板230之電極連接。又,與圖8所示之態樣同樣,照射加熱雷射光L1而將第1發光元件D1與電極連接後,自配備於第2保持基板130B之與第1面131相反之面之切除雷射裝置,朝向第2保持基板130B之與第1面131相反之面,出射特定波長之切除雷射光L2。吸收了所照射之切除雷射光L2之第1發光元件D1之與第1面131之界面部變質,使第1面131與第1發光元件D1脫離。以此種方式,進行將第1發光元件D1自保持基板130向被移送基板230之移送。Next, as shown in FIG. 16 , the second holding substrate 130B is lowered, and the plurality of first light emitting elements D1 held on the first surface 131 of the second holding substrate 130B are pressed against the second transferred region 244 of the transferred surface 231 of the transferred substrate 230 . Here, the plurality of first light emitting elements D1 are pressed against the transferred surface 231 of the transferred substrate 230 with a specific force. The plurality of first light emitting elements D1 are in contact with the plurality of electrodes provided on the transferred surface 231 of the transferred substrate 230 through the low melting point metal member. In this state, similar to the aspect shown in FIG. 7 , the heating laser light L1 of a specific wavelength is emitted from the heating laser device provided on the surface of the second holding substrate 130B opposite to the first surface 131 toward the irradiation surface, which is the surface opposite to the first surface 131 of the second holding substrate 130B. The low-melting-point metal member absorbing the irradiated heating laser light L1 is melted, and the first light-emitting element D1 held on the second holding substrate 130B is connected to the electrode of the transferred substrate 230 . 8, after irradiating the heating laser light L1 to connect the first light-emitting element D1 to the electrode, the ablation laser light L2 of a specific wavelength is emitted toward the surface of the second holding substrate 130B opposite to the first surface 131 from the ablation laser device provided on the surface of the second holding substrate 130B opposite to the first surface 131. The interface between the first light-emitting element D1 and the first surface 131 that has absorbed the irradiated ablation laser light L2 is modified, and the first surface 131 is separated from the first light-emitting element D1. In this manner, the transfer of the first light emitting element D1 from the holding substrate 130 to the transfer target substrate 230 is performed.

保持基板130具有包含第1區劃142與第2區劃144之第1區域140、及第1區域110之外之區域即第2區域(第3區劃146)。第2區域係自一方向觀察之面為第3面148,第3面148可於第1面131之深度方向與第1面131分開。The holding substrate 130 has a first region 140 including the first region 142 and the second region 144 , and a second region (third region 146 ) which is a region other than the first region 110 . The second area is the third surface 148 viewed from one direction, and the third surface 148 can be separated from the first surface 131 in the depth direction of the first surface 131 .

藉此,因保持基板130中第1面131之第1區域140外之第2區域(第3區劃146),乃自第1面131之正交方向觀察到第1面131之面為於深度方向與第1面131分開之第3面148,故於複數個第1發光元件D1在被保持於第1面101之狀態下壓抵於被移送基板230之被移送面231時,即使於被移送基板230之被移送面231之、與保持基板130之緣132與第1區域140之間之區域即第2區域對應之區域具有自被移送面231突出之突起部220之情形,亦可藉由第3面148而避開被移送面231之突起部220。又,移送第1發光元件D1之被移送基板230之被移送面231之、用於保持第1發光元件D1之被移送區域240大於保持基板130之第1區域140,即使於藉由例如第1保持基板130A及第2保持基板130B移送第1發光元件D1之情形時,亦可於保持藉由第1保持基板130A移送之複數個第1發光元件D1之第1被移送區域242相鄰之第2被移送區域244,由第2保持基板130B保持複數個第1發光元件D1之狀態下將複數個第1發光元件D1壓抵於被移送基板230並移送時,避免突起部220與保持基板130接觸。Thereby, because the second region (third region 146) outside the first region 140 of the first surface 131 in the holding substrate 130 is viewed from the direction perpendicular to the first surface 131, the surface of the first surface 131 is the third surface 148 separated from the first surface 131 in the depth direction, so the plurality of first light-emitting elements D1 are pressed against the transferred surface 23 of the transferred substrate 230 while being held on the first surface 101. 1, even if there is a protrusion 220 protruding from the transferred surface 231 on the transferred surface 231 of the transferred substrate 230 and the region between the edge 132 of the holding substrate 130 and the first region 140, that is, the region corresponding to the second region, the third surface 148 can avoid the raised portion 220 of the transferred surface 231. Also, the transferred area 240 for holding the first light emitting element D1 of the transferred surface 231 of the transferred substrate 230 for transferring the first light emitting element D1 is larger than the first area 140 of the holding substrate 130, even when the first light emitting element D1 is transferred by, for example, the first holding substrate 130A and the second holding substrate 130B, it is possible to hold the first light emitting element D1 transferred by the first holding substrate 130A. When the second transferred region 244 adjacent to the transferred region 242 is held by the second holding substrate 130B and the plurality of first light emitting elements D1 are pressed against the transferred substrate 230 and transferred, the protrusions 220 are prevented from contacting the holding substrate 130 .

顯示裝置之製造方法具有以下步驟:將複數個第1發光元件D1自第1保持基板130A移送至被移送基板230之第1被移送區域242後,使於第1面131保持複數個第1發光元件D1之第2保持基板130B之位置,於被移送基板230之第2被移送區域244之特定位置對位;及將對位後之第2保持基板130B保持之複數個第1發光元件D1壓抵於被移送基板230之被移送面231。第1保持基板130A及第2保持基板130B各自具備第1區域140,該第1區域140包含自一方向觀察具有第1面131之複數個第1區劃142、與自一方向觀察具有第2面150之第2區劃144。第1保持基板130A及第2保持基板130B於第1區劃142之第1面131保持複數個第1發光元件D1,第2面150自第1面131於第1面131之深度方向分開。第1保持基板130A及第2保持基板130B於第1區域140之外具備自一方向觀察之面為第3面148之第2區域(第3區劃146),第2區域於第1面131之深度方向與第1面131分開。被移送基板230於被移送面231包含第1被移送區域242、及與第1被移送區域242相鄰之第2被移送區域244。被移送基板230具有較保持基板130之第1區域140寬之被移送區域240。The manufacturing method of the display device has the following steps: After transferring the plurality of first light-emitting elements D1 from the first holding substrate 130A to the first transferred region 242 of the transferred substrate 230, aligning the position of the second holding substrate 130B holding the plurality of first light-emitting elements D1 on the first surface 131 at a specific position in the second transferred region 244 of the transferred substrate 230; and holding the aligned second holding substrate 130B. The plurality of first light emitting elements D1 are pressed against the transferred surface 231 of the transferred substrate 230 . The first holding substrate 130A and the second holding substrate 130B each have a first region 140 including a plurality of first regions 142 having the first surface 131 viewed from one direction and a second region 144 having the second surface 150 viewed from one direction. The first holding substrate 130A and the second holding substrate 130B hold a plurality of first light emitting elements D1 on the first surface 131 of the first section 142 , and the second surface 150 is separated from the first surface 131 in the depth direction of the first surface 131 . The first holding substrate 130A and the second holding substrate 130B have a second region (third section 146 ) whose surface viewed from one direction is the third surface 148 outside the first region 140 , and the second region is separated from the first surface 131 in the depth direction of the first surface 131 . The transferred substrate 230 includes a first transferred region 242 and a second transferred region 244 adjacent to the first transferred region 242 on the transferred surface 231 . The transferred substrate 230 has a transferred region 240 wider than the first region 140 of the holding substrate 130 .

藉此,第1保持基板130A及第2保持基板130B分別具有第1區域140與第2區域,該第1區域140包含自一方向觀察為第1面131之第1區劃142、與自一方向觀察為第2面150之第2區劃144,該第2區域於第1區域140之外自一方向觀察之面為第3面148;第3面148自第1面131於第1面131之深度方向分開,故於自第1保持基板130A移送第1發光元件D1之第1被移送區域242相鄰之第2被移送區域244,第2保持基板130B將第1發光元件D1保持於第1面131之狀態下壓抵並移送時,可避免第1被移送區域242之第1發光元件D1與第2保持基板130B接觸。Thereby, the first holding substrate 130A and the second holding substrate 130B respectively have a first region 140 and a second region. The first region 140 includes a first region 142 viewed from one direction as the first surface 131 and a second region 144 viewed from one direction as the second surface 150. The surface of the second region viewed from one direction outside the first region 140 is the third surface 148; Separated in the depth direction of the first surface 131, when transferring the second transferred region 244 adjacent to the first transferred region 242 of the first light-emitting element D1 from the first holding substrate 130A, the second holding substrate 130B holds the first light-emitting element D1 on the first surface 131 and presses and transfers the first light-emitting element D1 in the first transferred region 242 to avoid contact with the second holding substrate 130B.

供第2保持基板130B對位之被移送基板230之被移送面231之位置,係保持於第2保持基板130B之第1面131的最靠近第1被移送區域242側之第1發光元件D1、與保持於第1被移送區域242的最靠近第2被移送區域244側之第1發光元件D1之間隔,與保持於第1保持基板130A之複數個第1發光元件D1彼此之間隔相同之位置。The position of the transferred surface 231 of the transferred substrate 230 for the alignment of the second holding substrate 130B is spaced between the first light-emitting element D1 on the first surface 131 of the second holding substrate 130B closest to the first transferred region 242 and the first light-emitting element D1 held on the first transferred region 242 closest to the second transferred region 244, and the plurality of first light-emitting elements D1 retained on the first holding substrate 130A. The light emitting elements D1 are spaced at the same distance from each other.

藉此,顯示裝置10之製造方法即使於被移送基板230之被移送區域240較保持基板130之第1區域140寬之情形時,因保持基板130於第1面131之第1區域140外之第3區劃146具有自第1面131於特定之深度方向分開之第3面148,故亦可於被移送基板230之被移送面231之、已藉由第1保持基板130A保持複數個第1發光元件D1之第1被移送區域242相鄰之第2被移送區域244,不將保持於第1被移送區域242之最靠近第2被移送區域244側的第1發光元件D1與保持於第2被移送區域244之最靠近第1被移送區域242側的第1發光元件D1之間隔,改變為保持於保持基板130之第1發光元件D1之特定之間隔地壓抵於被移送基板230。Thereby, even when the transferred region 240 of the transferred substrate 230 is wider than the first region 140 of the holding substrate 130 in the manufacturing method of the display device 10, because the holding substrate 130 has the third surface 148 separated from the first surface 131 in a specific depth direction in the third region 146 outside the first region 140 of the first surface 131, the transferred surface 231 of the transferred substrate 230 has been passed through the third region 146. 1 The holding substrate 130A holds the second transferred region 244 adjacent to the first transferred region 242 of the plurality of first light emitting elements D1, and does not change the interval between the first light emitting element D1 held on the side of the first transferred region 242 closest to the second transferred region 244 and the first light emitting element D1 held on the side of the second transferred region 244 closest to the first transferred region 242 to the first light emitting element D1 held on the holding substrate 130 The specific intervals are pressed against the transferred substrate 230 .

根據本實施形態,若為先前,則當第2保持基板130B欲將複數個第1發光元件D1壓抵並移送於被移送基板230之第2被移送區域244時,因第3區劃146之寬度w大於第1發光元件D1之特定之間隔p,故有第1被移送區域242之第1發光元件D1與第3區劃146干涉之可能性。但,因本實施形態之第2保持基板130B於第3區劃146具有自第1面131分開特定之深度之第3面148,故可避開第1被移送區域242之第1發光元件D1。藉此,可不論第3區劃146之寬度地設定藉由第2保持基板130B移送之第1發光元件D1之位置。可將保持於第1被移送區域242之第1發光元件D1與保持於第2被移送區域244之第1發光元件D1之位置,例如移送至成為保持於第1被移送區域242之複數個第1發光元件D1之特定之間隔p之位置。According to the present embodiment, when the second holding substrate 130B intends to press and transfer the plurality of first light-emitting elements D1 to the second transferred region 244 of the transferred substrate 230, since the width w of the third region 146 is greater than the specific interval p of the first light-emitting elements D1, there is a possibility that the first light-emitting elements D1 in the first transferred region 242 interfere with the third region 146. However, since the second holding substrate 130B of the present embodiment has the third surface 148 separated from the first surface 131 by a specific depth in the third region 146, the first light emitting element D1 in the first transferred region 242 can be avoided. Thereby, the position of the first light emitting element D1 transferred by the second holding substrate 130B can be set irrespective of the width of the third region 146 . The position of the first light emitting element D1 held in the first transferred area 242 and the first light emitting element D1 held in the second transferred area 244 can be transferred, for example, to a position at a specific interval p between the plurality of first light emitting elements D1 held in the first transferred area 242.

以上,對較佳之實施形態進行說明,但本揭示並非限定於此種實施形態者。實施形態所揭示之內容僅為一例,可於不脫離本揭示之主旨之範圍內適當變更。於不脫離本揭示之主旨之範圍內進行之適當變更,當然亦屬於本揭示之技術範圍。As mentioned above, although preferred embodiment was demonstrated, this indication is not limited to this embodiment. The content disclosed in the embodiment is only an example, and can be appropriately changed within the scope not departing from the gist of the present disclosure. Appropriate changes made within the scope not departing from the gist of this disclosure also belong to the technical scope of this disclosure.

10:顯示裝置 100,130,130A,130B:保持基板 101,131:第1面 102,132:緣 103,133:第1對準標記 110,140:第1區域 112,142:第1區劃 114,144:第2區劃 120,150:第2面 146:第2區域/第3區劃 148:第3面 200,230:被移送基板 201,231:被移送面 202,232:緣 203,233:第2對準標記 210,240:被移送區域 220:突起部 222:反射壁 242:第1被移送區域 244:第2被移送區域 A1,A2:開口 D1:第1發光元件 D2:第2發光元件 D3:第3發光元件 DP1:第2面之深度 DP2:第3面之深度 E:像素 hD1:第1發光元件高度 hD2:發光元件之高度 hR:反射壁之高度 L1:加熱雷射光 L2:切除雷射光 M1,M2:遮光光罩 p:保持複數個第1發光元件之間隔 w:第3區劃之寬度 δ1:第1發光元件之前端之位置與第2發光元件之前端之位置之差 δ2:第1發光元件之前端之位置與突起部之前端之位置之差 10: Display device 100, 130, 130A, 130B: holding substrate 101,131: side 1 102,132: Fate 103,133: 1st alignment mark 110,140: Area 1 112,142: Division 1 114,144: Division 2 120,150: side 2 146:Second area/3rd division 148: Side 3 200, 230: transferred substrate 201,231: Transferred surface 202,232: Fate 203,233: 2nd alignment mark 210,240: Transferred area 220: protrusion 222: reflective wall 242: The first transferred area 244: The second transferred area A1, A2: opening D1: The first light-emitting element D2: The second light-emitting element D3: The third light-emitting element DP1: Depth of face 2 DP2: Depth of face 3 E: pixel hD1: Height of the first light-emitting element hD2: height of light emitting element hR: height of reflective wall L1: heating laser light L2: cutting laser light M1, M2: shading mask p: Keep the interval between multiple first light-emitting elements w: the width of the third division δ1: The difference between the position of the front end of the first light-emitting element and the position of the front end of the second light-emitting element δ2: The difference between the position of the front end of the first light-emitting element and the position of the front end of the protrusion

圖1係第1實施形態之保持基板之概念俯視圖。 圖2係圖1之Y1-Y1剖面箭視之概念箭視剖視圖。 圖3係第1實施形態之被移送基板之概念俯視圖。 圖4係圖3之Y2-Y2剖面箭視之概念箭視剖視圖。 圖5係顯示將第1實施形態之保持基板相對於被移送基板定位之情況之概念圖。 圖6係顯示將第1實施形態之保持基板壓抵於被移送基板之情況之概念圖。 圖7係顯示使第1實施形態之第1發光元件連接於被移送基板之電極之情況之概念圖。 圖8係顯示使第1實施形態之第1發光元件自保持基板脫離之情況之概念圖。 圖9係第1實施形態之變化例之被移送基板之概念箭視剖視圖。 圖10係第2實施形態之保持基板之概念俯視圖。 圖11係圖10之Y3-Y3剖面箭視之概念箭視剖視圖。 圖12係第2實施形態之被移送基板之概念俯視圖。 圖13係圖12之Y4-Y4剖面箭視之概念箭視剖視圖。 圖14係顯示將第2實施形態之保持基板壓抵於被移送基板之第1移送區域之情況之概念圖。 圖15係顯示將第2實施形態之保持基板相對於被移送基板之第2移送區域定位之情況之概念圖。 圖16係顯示將第2實施形態之保持基板壓抵於被移送基板之第2移送區域之情況之概念圖。 Fig. 1 is a conceptual plan view of a holding substrate according to a first embodiment. Fig. 2 is the conceptual arrow sectional view of Y1-Y1 sectional arrow of Fig. 1. Fig. 3 is a conceptual plan view of the substrate to be transferred according to the first embodiment. Fig. 4 is the conceptual arrow sectional view of the Y2-Y2 sectional arrow in Fig. 3 . Fig. 5 is a conceptual diagram showing the state of positioning the holding substrate with respect to the substrate to be transferred according to the first embodiment. Fig. 6 is a conceptual diagram showing a state in which the holding substrate is pressed against the substrate to be transferred according to the first embodiment. Fig. 7 is a conceptual diagram showing a state where the first light-emitting element of the first embodiment is connected to an electrode of a substrate to be transferred. Fig. 8 is a conceptual diagram showing a state where the first light-emitting element of the first embodiment is detached from the holding substrate. Fig. 9 is a conceptual arrow cross-sectional view of a substrate to be transferred according to a modification of the first embodiment. Fig. 10 is a conceptual plan view of the holding substrate of the second embodiment. Fig. 11 is the conceptual arrow sectional view of the Y3-Y3 sectional arrow in Fig. 10 . Fig. 12 is a conceptual plan view of a substrate to be transferred according to the second embodiment. Fig. 13 is a conceptual arrow sectional view of the Y4-Y4 sectional arrow in Fig. 12 . Fig. 14 is a conceptual diagram showing the state of pressing the holding substrate against the first transfer region of the substrate to be transferred according to the second embodiment. Fig. 15 is a conceptual diagram showing the state of positioning the holding substrate with respect to the second transfer area of the substrate to be transferred according to the second embodiment. Fig. 16 is a conceptual diagram showing the state of pressing the holding substrate against the second transfer region of the substrate to be transferred according to the second embodiment.

100:保持基板 100: hold substrate

101:第1面 101: Side 1

120:第2面 120:Side 2

200:被移送基板 200: Substrate being transferred

201:被移送面 201: Transferred surface

D1:第1發光元件 D1: The first light-emitting element

D2:第2發光元件 D2: The second light-emitting element

DP1:第2面之深度 DP1: Depth of face 2

hD1:第1發光元件高度 hD1: Height of the first light-emitting element

hD2:發光元件之高度 hD2: height of light emitting element

δ1:第1發光元件之前端之位置與第2發光元件之前端之位置之差 δ1: The difference between the position of the front end of the first light-emitting element and the position of the front end of the second light-emitting element

Claims (8)

一種保持基板,其自一方向觀察被區劃為具有第1面之複數個第1區劃、與具有第2面之第2區劃;且上述第1區劃係於上述第1面保持複數個第1發光元件之區域;上述第2面於上述第1面之深度方向與上述第1面分開;上述複數個第1發光元件於被保持在上述第1區劃之上述第1面之狀態下,壓抵於具有用於配置複數個突起部之面之被移送基板;上述第2區劃配備於與上述突起部之位置對應之位置。 A holding substrate, which is divided into a plurality of first divisions having a first surface and a second division having a second surface when viewed from one direction; and the first division is an area for holding a plurality of first light-emitting elements on the first surface; the second surface is separated from the first surface in the depth direction of the first surface; and the plurality of first light-emitting elements are held on the first surface of the first division and pressed against the substrate having a surface for arranging a plurality of protrusions The substrate is transferred; the above-mentioned second section is arranged at a position corresponding to the position of the above-mentioned protruding part. 如請求項1之保持基板,其中上述第2面之自上述第1面之深度,大於上述突起部之前端之位置與上述第1發光元件之前端之位置之、與上述第1面之面正交之方向之差。 The holding substrate according to claim 1, wherein the depth of the second surface from the first surface is larger than the difference between the position of the front end of the protrusion and the position of the front end of the first light-emitting element in a direction perpendicular to the surface of the first surface. 如請求項1之保持基板,其中上述被移送基板具備前端之位置不同之複數個突起部;且於上述第1發光元件壓抵於上述被移送基板之狀態下,上述複數個突起部中之一部分突起部之前端位於上述第2面側較上述第1面更深之位置。 The holding substrate according to claim 1, wherein the substrate to be transferred has a plurality of protrusions with different front ends; and in a state where the first light-emitting element is pressed against the substrate to be transferred, the front ends of some of the plurality of protrusions are located at a position deeper on the side of the second surface than on the first surface. 如請求項1或2之保持基板,其具有:第1區域,其包含上述第1區劃與上述第2區劃;及第2區域,其係上述第1區域之外之區域;且於上述第2區域,自上述一方向觀察具有第3面; 上述第3面於上述第1面之深度方向與上述第1面分開。 The holding substrate according to Claim 1 or 2, which has: a first area, which includes the above-mentioned first area and the above-mentioned second area; and a second area, which is an area other than the above-mentioned first area; and in the above-mentioned second area, it has a third surface viewed from the above-mentioned one direction; The third surface is separated from the first surface in the depth direction of the first surface. 如請求項1或2之保持基板,其中上述突起部係發光元件及反射壁之至少一者。 The holding substrate according to claim 1 or 2, wherein the protrusion is at least one of a light emitting element and a reflective wall. 一種顯示裝置之製造方法,其具有以下步驟:使被保持在保持基板之複數個第1發光元件之位置於被移送基板之具備複數個突起部之被移送面之特定位置對位;及將被保持在相對於上述被移送基板對位之上述保持基板的上述第1發光元件壓抵於上述被移送基板;且上述保持基板自一方向觀察被區劃為具有第1面之複數個第1區劃、與具有第2面之第2區劃;上述第1區劃於上述第1面保持複數個第1發光元件;上述第2面於上述第1面之深度方向與上述第1面分開;於上述保持基板將上述複數個第1發光元件保持於上述第1面之狀態下,壓抵於上述被移送基板之上述被移送面時;上述第2區劃以與上述突起部之位置對應之方式與上述被移送基板對位。 A method of manufacturing a display device, comprising the steps of: aligning the positions of a plurality of first light-emitting elements held on a holding substrate at specific positions on a transferred surface of a transferred substrate having a plurality of protrusions; and pressing the first light-emitting elements held on the holding substrate aligned relative to the transferred substrate against the transferred substrate; The first section holds a plurality of first light-emitting elements on the first surface; the second surface is separated from the first surface in the depth direction of the first surface; when the holding substrate holds the plurality of first light-emitting elements on the first surface and is pressed against the transferred surface of the transferred substrate; the second section is aligned with the transferred substrate in a manner corresponding to the position of the protrusion. 一種顯示裝置之製造方法,其具有以下步驟:使複數個第1發光元件自第1保持基板移送至被移送基板之第1被移送區域後,將第2保持基板所保持之複數個第1發光元件之位置於上述被移送基板之具備複數個突起部之被移送面之特定位置對位;及 將對位後之上述第2保持基板所保持之複數個上述第1發光元件壓抵於被移送基板之被移送面;且上述第1保持基板及上述第2保持基板各自具備第1區域,該第1區域包含自一方向觀察具有第1面之複數個第1區劃、與具有第2面之第2區劃;於上述第1區劃之上述第1面保持複數個上述第1發光元件,上述第2面於上述第1面之深度方向與上述第1面分開,且於上述第1區域之外,具備自上述一方向觀察為第3面之第2區域,上述第3面於上述第1面之深度方向與上述第1面分開;上述被移送基板於上述被移送面具有被移送區域,該被移送區域包含上述第1被移送區域、及與上述第1被移送區域相鄰之第2被移送區域;上述被移送區域較上述第1保持基板或上述第2保持基板之上述第1區域寬;於上述第2保持基板將上述複數個第1發光元件保持於上述第2保持基板之第1面之狀態下,壓抵於上述被移送基板之上述被移送面時;上述第2區劃以與上述突起部之位置對應之方式與上述被移送基板對位。 A method for manufacturing a display device, comprising the following steps: after transferring a plurality of first light emitting elements from a first holding substrate to a first transferred area of a transferred substrate, aligning positions of a plurality of first light emitting elements held by a second holding substrate at specific positions on a transferred surface of the transferred substrate having a plurality of protrusions; and The plurality of the first light-emitting elements held by the aligned second holding substrate are pressed against the transferred surface of the transferred substrate; and the above-mentioned first holding substrate and the above-mentioned second holding substrate each have a first region, the first region includes a plurality of first regions with a first surface viewed from one direction, and a second region with a second surface; a plurality of the first light-emitting elements are held on the first surface of the first region, and the second surface is in the depth direction of the first surface and the first region. 1 surface is separated, and in addition to the above-mentioned first region, there is a second region that is viewed as a third surface from the above-mentioned one direction. The above-mentioned third surface is separated from the above-mentioned first surface in the depth direction of the above-mentioned first surface; When the holding substrate holds the plurality of first light-emitting elements on the first surface of the second holding substrate and is pressed against the transferred surface of the transferred substrate; the second division is aligned with the transferred substrate in a manner corresponding to the position of the protrusion. 如請求項7之顯示裝置之製造方法,其中供上述第2保持基板對位之上述被移送基板之第2被移送區域之位置係被保持在上述第2保持基板之上述第1面且最靠近上述第1被移送區域側之上述第1發光元件、與被保持在第1被移送區域且最靠近第2被移送區域側之上述第1發光元件之間隔,與被保持在上述第1保持基板之複數個第1發光元件彼此之間隔為相同之位置。 The manufacturing method of a display device according to claim 7, wherein the position of the second transferred region of the transferred substrate for aligning the second holding substrate is held at the same position between the first light-emitting element on the first surface of the second holding substrate and the closest to the first transferred region, the first light-emitting element held on the first transferred region and closest to the second transferred region, and the plurality of first light-emitting elements held on the first holding substrate.
TW111126778A 2021-08-19 2022-07-18 Holding substrate and manufacturing method of display device TWI808833B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-134414 2021-08-19
JP2021134414A JP2023028604A (en) 2021-08-19 2021-08-19 Holding substrate and method of manufacturing display device

Publications (2)

Publication Number Publication Date
TW202310473A TW202310473A (en) 2023-03-01
TWI808833B true TWI808833B (en) 2023-07-11

Family

ID=85331564

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111126778A TWI808833B (en) 2021-08-19 2022-07-18 Holding substrate and manufacturing method of display device

Country Status (2)

Country Link
JP (1) JP2023028604A (en)
TW (1) TWI808833B (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202045855A (en) * 2019-04-12 2020-12-16 日商日本顯示器股份有限公司 Light source device and display device having light source device
CN112670312A (en) * 2020-08-24 2021-04-16 錼创显示科技股份有限公司 Display device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202045855A (en) * 2019-04-12 2020-12-16 日商日本顯示器股份有限公司 Light source device and display device having light source device
CN112670312A (en) * 2020-08-24 2021-04-16 錼创显示科技股份有限公司 Display device

Also Published As

Publication number Publication date
TW202310473A (en) 2023-03-01
JP2023028604A (en) 2023-03-03

Similar Documents

Publication Publication Date Title
JP2003077940A (en) Method of transferring device, method of arranging device using same, and method of manufacturing image display device unit
JP2002313914A (en) Method for forming wiring, method for arranging element using it and method for manufacturing image display device
JP3994681B2 (en) Element arrangement method and image display device manufacturing method
JP2003045901A (en) Method for transferring element and method for arraying element using the same, and method for manufacturing image display unit
KR20210116456A (en) Light emitting element transfer method for display and display device
KR20210134309A (en) Unit pixel having light emitting element, pixel module and display device
US8741535B2 (en) Laser irradiation device and method of fabricating organic light emitting display device using the same
JP4078825B2 (en) Circuit board manufacturing method and display device manufacturing method
JP4734770B2 (en) Manufacturing method of resin forming element, manufacturing method of image display device, and manufacturing method of lighting device
TWI679716B (en) Method of manufacturing flexible electronic device
JP2020068313A (en) Light emitting element and manufacturing method of display device
US20210183897A1 (en) Substrate and method for manufacturing the same, display panel, and display apparatus
JP2003347524A (en) Transferring method of element, arraying method of element, and manufacturing method of image display
TWI808833B (en) Holding substrate and manufacturing method of display device
JP2002343944A (en) Transferring method of electronic part, arraying method of element, and manufacturing method of image display device
JP6674593B1 (en) Method and apparatus for manufacturing flexible light emitting device
KR20220137887A (en) Unit pixel having light emitting element, pixel module and display device
KR102480160B1 (en) LED backplane having planar bonding surfaces and manufacturing method thereof
JP4120224B2 (en) Manufacturing method of resin forming element and manufacturing method of image display device
JP4000856B2 (en) Element arrangement method and image display device manufacturing method
KR20190130081A (en) Micro lightemitting device substrate
KR20190130082A (en) Method of manufacturing a micro lightemitting device substrate
CN113130348B (en) LED chip transfer method
JP2003218392A (en) Image display and its manufacturing method
TWI815447B (en) Manufacturing method and holding substrate of display device