TWI796754B - Method for observing chip fixing process by shadow - Google Patents

Method for observing chip fixing process by shadow Download PDF

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Publication number
TWI796754B
TWI796754B TW110129756A TW110129756A TWI796754B TW I796754 B TWI796754 B TW I796754B TW 110129756 A TW110129756 A TW 110129756A TW 110129756 A TW110129756 A TW 110129756A TW I796754 B TWI796754 B TW I796754B
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shadow
light
control device
die
substrate
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TW110129756A
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TW202307994A (en
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盧彥豪
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梭特科技股份有限公司
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Abstract

A method for observing chip fixing process by shadow includes the following steps: sucking a chip by a nozzle above a base plate; emitting a light towards the chip by a lateral light source, and casting a shadow of the chip on the base plate; taking an image of the shadow by a first camera, and transmitting the image of the shadow from the first camera to a control device; controlling the nozzle to move towards the base plate by the control device; and after moving the chip to a chip placing area of the base plate, the shadow is disappeared or remained a small area, and no image of the shadow can be taken by the first camera or only a small area image of the shadow can be taken by the first camera, controlling the nozzle to stop moving by the control device, and fixing the chip on the chip placing area completely. As such, the method can monitor a relative position between the chip and the base plate, control a travel distance of the nozzle, make sure the nozzle directly and precisely to fix the chip on the base plate.

Description

利用光影觀測固晶過程的方法A Method of Using Light and Shadow to Observe the Crystal Bonding Process

本發明是有關一種固晶方法,特別是一種利用光影觀測固晶過程的方法。The invention relates to a crystal-bonding method, in particular to a method for observing the crystal-bonding process by using light and shadow.

積體電路藉由大批方式,經過多道程序,製作在半導體晶圓上,晶圓進一步分割成複數晶粒。換言之,晶粒是以半導體材料製作而成未經封裝的一小塊積體電路本體。分割好的複數晶粒整齊貼附在一承載膜上,接著一承載框負責運送承載膜,然後藉由一吸嘴吸取承載膜上的該等晶粒,最後吸嘴將該等晶粒固定於基板的複數晶粒放置區,俾利進行後續加工程序。Integrated circuits are fabricated on semiconductor wafers through multiple procedures in a large number of ways, and the wafers are further divided into multiple crystal grains. In other words, a die is a small unpackaged integrated circuit body made of semiconductor material. Divided multiple dies are neatly attached to a carrier film, and then a carrier frame is responsible for transporting the carrier film, and then the dies on the carrier film are sucked by a suction nozzle, and finally the dies are fixed on the carrier film by the suction nozzle The multiple crystal grain placement area of the substrate is convenient for subsequent processing procedures.

如圖1所示,在進行固晶程序以前,首先藉由一測距裝置(圖未示)量測吸嘴1與基板3之間的一間距D1,間距D1扣除晶粒2的厚度T即為吸嘴1的一移動距離。接著,如圖2A所示,在進行固晶程序的過程中,藉由測距裝置量測吸嘴1上的晶粒2與基板3之間的一間距D2。在理想狀態下,控制吸嘴10移動的驅動軸(圖未示)維持正常狀態,間距D1扣除晶粒2的厚度T等於間距D2,此時吸嘴1的移動距離恰好等於間距D2。因此,如圖2B所示,吸嘴1能夠將晶粒2直接且精準地固定於晶粒放置區301上。As shown in FIG. 1 , before performing the die-bonding process, a distance D1 between the suction nozzle 1 and the substrate 3 is first measured by a distance measuring device (not shown in the figure), and the distance D1 is subtracted from the thickness T of the crystal grain 2. is a moving distance of suction nozzle 1. Next, as shown in FIG. 2A , during the process of the die-bonding process, a distance D2 between the die 2 on the suction nozzle 1 and the substrate 3 is measured by a distance measuring device. Ideally, the drive shaft (not shown) that controls the movement of the suction nozzle 10 remains in a normal state, the distance D1 minus the thickness T of the die 2 is equal to the distance D2, and the moving distance of the suction nozzle 1 is just equal to the distance D2. Therefore, as shown in FIG. 2B , the suction nozzle 1 can directly and accurately fix the die 2 on the die placement area 301 .

然而,控制吸嘴1移動的驅動軸會因為熱脹冷縮而導致吸嘴1與基板3之間的相對距離一直改變。However, the relative distance between the suction nozzle 1 and the substrate 3 will always change due to thermal expansion and contraction of the drive shaft controlling the movement of the suction nozzle 1 .

如圖3A所示,如果吸嘴1與基板3之間的相對距離變大,則間距D2變大,間距D1扣除晶粒2的厚度T小於間距D2,此時吸嘴1的移動距離小於間距D2。如圖3B所示,吸嘴1僅能將晶粒2移動至晶粒放置區301的上方,無法直接將晶粒2固定於晶粒放置區301。如圖3C所示,吸嘴1必須停止吸取晶粒2,晶粒2才能夠以空拋的方式掉落在晶粒放置區301上。惟,以空拋的方式,晶粒2難以精準地放置在晶粒放置區301上。As shown in Figure 3A, if the relative distance between the suction nozzle 1 and the substrate 3 becomes larger, the spacing D2 becomes larger, and the thickness T of the grain 2 deducted from the spacing D1 is smaller than the spacing D2, and the moving distance of the suction nozzle 1 is smaller than the spacing D2. D2. As shown in FIG. 3B , the suction nozzle 1 can only move the die 2 to the top of the die placement area 301 , but cannot directly fix the die 2 on the die placement area 301 . As shown in FIG. 3C , the suction nozzle 1 must stop sucking the die 2 , so that the die 2 can drop onto the die placement area 301 in an air drop manner. However, it is difficult to accurately place the die 2 on the die placement area 301 in the way of air throwing.

如圖4A所示,如果吸嘴1與基板3之間的相對距離變小,則間距D2變小,間距D1扣除晶粒2的厚度T大於間距D2,此時吸嘴1的移動距離大於間距D2。如圖4B所示,吸嘴1雖可將晶粒2直接且精準地固定於晶粒放置區301上,但吸嘴1卻會進一步往基板3的方向移動而壓碎晶粒2。As shown in Figure 4A, if the relative distance between the suction nozzle 1 and the substrate 3 becomes smaller, the spacing D2 becomes smaller, and the thickness T of the grain 2 deducted from the spacing D1 is greater than the spacing D2, and the moving distance of the suction nozzle 1 is greater than the spacing D2. As shown in FIG. 4B , although the suction nozzle 1 can directly and accurately fix the die 2 on the die placement area 301 , the suction nozzle 1 will move further toward the substrate 3 to crush the die 2 .

本發明的主要目的在於提供一種利用光影觀測固晶過程的方法,能夠藉由觀察光影的變化,即時監測晶粒和基板的相對位置,控制吸嘴的移動距離,以確保吸嘴能夠直接且精準地將晶粒固定於基板上,防止晶粒空拋或被吸嘴壓碎。The main purpose of the present invention is to provide a method for observing the crystal bonding process by using light and shadow, which can monitor the relative position of the crystal grain and the substrate in real time by observing the change of light and shadow, and control the moving distance of the suction nozzle to ensure that the suction nozzle can be directly and accurately Securely fix the die on the substrate to prevent the die from being thrown or crushed by the nozzle.

為了達成前述的目的,本發明提供一種利用光影觀測固晶過程的方法,包括下列步驟:(a)一吸嘴吸取一晶粒並且位於一基板的一晶粒放置區的上方,晶粒與基板平行;(b)一側向光源的一光線從晶粒的一側上方以相對晶粒傾斜的一照射角度往晶粒的方向照射,使得晶粒的一光影投射在基板上;(c)一第一影像擷取裝置擷取光影的影像以獲得一光影影像資訊,並且將光影影像資訊傳送至一控制裝置;(d)控制裝置控制吸嘴往基板的方向移動,光影逐漸往晶粒放置區的方向移動,第一影像擷取裝置持續擷取光影的影像並且持續將光影影像資訊傳送至控制裝置;以及(e)在晶粒移動至晶粒放置區以後,光影完全消失或剩下一小範圍,第一影像擷取裝置未擷取到光影的影像或僅擷取到光影的小範圍影像以獲得一小範圍影像資訊,控制裝置未接收到光影影像資訊或接收到小範圍影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In order to achieve the aforementioned object, the present invention provides a method for observing the crystal bonding process using light and shadow, comprising the following steps: (a) a suction nozzle picks up a crystal grain and is located above a grain placement area of a substrate, and the crystal grain and the substrate Parallel; (b) a light beam from one side of the light source is irradiated toward the direction of the grain at an angle of illumination inclined relative to the grain from one side of the grain, so that a light and shadow of the grain is projected on the substrate; (c) a The first image capture device captures the light and shadow image to obtain a light and shadow image information, and transmits the light and shadow image information to a control device; (d) the control device controls the suction nozzle to move toward the substrate, and the light and shadow gradually move to the die placement area The first image capture device continues to capture the image of the light and shadow and continuously transmits the information of the light and shadow image to the control device; and (e) after the die moves to the die placement area, the light and shadow completely disappear or remain a small range, the first image capture device did not capture the light and shadow image or only captured a small range of light and shadow image to obtain a small range of image information, the control device did not receive the light and shadow image information or received the small range of image information and controlled The suction nozzle stops moving so that the die is completely fixed on the die placement area.

在一些實施例中,在步驟(a)中,晶粒的一側的底部邊緣為一直角;以及,在步驟(e)中,在晶粒移動至晶粒放置區以後,晶粒的一側的底部邊緣完全貼合於晶粒放置區上,使得光影完全消失,第一影像擷取裝置未擷取到光影的影像,控制裝置未接收到光影影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In some embodiments, in step (a), the bottom edge of one side of the die is at a right angle; and, in step (e), after the die is moved to the die placement area, one side of the die is The bottom edge of the bottom edge is completely attached to the die placement area, so that the light and shadow completely disappear, the first image capture device does not capture the light and shadow image, the control device does not receive the light and shadow image information and controls the suction nozzle to stop moving, so that the die Fully fixed on the die placement area.

較佳地,在步驟(c)中,控制裝置根據光影影像資訊計算出光影的一寬度;以及,在步驟(d)中,當控制裝置判斷出光影的寬度等於晶粒相對於基板的一預定高度時,控制裝置控制吸嘴停止移動並且將預定高度設定為一移動距離,控制裝置根據移動距離控制吸嘴繼續往基板的方向移動。Preferably, in step (c), the control device calculates a width of the light shadow according to the light and shadow image information; and, in step (d), when the control device determines that the width of the light shadow is equal to a predetermined height, the control device controls the suction nozzle to stop moving and sets the predetermined height as a moving distance, and the control device controls the suction nozzle to continue moving toward the substrate according to the moving distance.

在一些實施例中,在步驟(a)中,晶粒的一側的底部邊緣為一斜角;以及,在步驟(e)中,在晶粒移動至晶粒放置區以後,晶粒的一側的底部邊緣未貼合於晶粒放置區上,使得光影剩下一小範圍,第一影像擷取裝置僅擷取到光影的小範圍影像以獲得小範圍影像資訊,控制裝置接收到小範圍影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In some embodiments, in step (a), the bottom edge of one side of the die is beveled; and, in step (e), after the die is moved to the die placement area, one side of the die is The bottom edge of the side is not attached to the die placement area, leaving a small range of light and shadow. The first image capture device only captures a small range of light and shadow images to obtain small range image information. The control device receives the small range Image information and control the suction nozzle to stop moving, so that the die is completely fixed on the die placement area.

較佳地,在步驟(a)中,一第二影像擷取裝置擷取斜角的影像以獲得一斜角影像資訊,並且將斜角影像資訊傳送至控制裝置,控制裝置根據斜角影像資訊計算出斜角的一寬度;在步驟(c)中,控制裝置根據光影影像資訊計算出光影的一寬度;以及,在步驟(d)中,當控制裝置判斷出光影的寬度等於斜角的寬度與晶粒相對於基板的一預定高度的總和時,控制裝置控制吸嘴停止移動並且將預定高度設定為一移動距離,控制裝置根據移動距離控制吸嘴繼續往基板的方向移動。Preferably, in step (a), a second image capture device captures the oblique image to obtain oblique image information, and transmits the oblique image information to the control device, and the control device Calculate a width of the bevel; in step (c), the control device calculates a width of the light and shadow according to the light and shadow image information; and, in step (d), when the control device determines that the width of the light and shadow is equal to the width of the bevel When the sum of a predetermined height of the crystal grain relative to the substrate is reached, the control device controls the suction nozzle to stop moving and sets the predetermined height as a moving distance, and the control device controls the suction nozzle to continue moving toward the substrate according to the moving distance.

較佳地,預定高度為2

Figure 02_image001
。 Preferably, the predetermined height is 2
Figure 02_image001
.

在一些實施例中,在步驟(c)中,第一影像擷取裝置與側向光源位於同一側並且從晶粒的一側上方以相對基板傾斜的一拍攝角度往晶粒放置區的方向拍攝,照射角度大於拍攝角度。In some embodiments, in step (c), the first image capture device and the side light source are located on the same side and take pictures from one side of the die in the direction of the die placement area at a shooting angle inclined relative to the substrate , the illumination angle is greater than the shooting angle.

在一些實施例中,在步驟(a)中,當晶粒相對於基板傾斜時,一測距裝置感測到晶粒的兩側與基板的二間距並且將該等間距傳送給控制裝置,控制裝置計算出該等間距的一差值,控制裝置根據差值計算出晶粒相對於基板的角度,控制裝置根據該角度控制吸嘴旋轉,直至控制裝置判斷出該角度為0

Figure 02_image003
為止,此時晶粒與基板平行。 In some embodiments, in step (a), when the die is tilted with respect to the substrate, a ranging device senses two distances from both sides of the die to the substrate and transmits the equal distance to the control device, which controls The device calculates a difference between the equal intervals, and the control device calculates the angle of the grain relative to the substrate according to the difference, and the control device controls the rotation of the suction nozzle according to the angle until the control device judges that the angle is 0
Figure 02_image003
At this point, the grains are parallel to the substrate.

本發明的功效在於,本發明能夠藉由觀察光影的變化,即時監測晶粒和基板的相對位置,控制吸嘴的移動距離,以確保吸嘴能夠直接且精準地將晶粒固定於基板上,防止晶粒空拋或被吸嘴壓碎。The effect of the present invention is that the present invention can monitor the relative position of the crystal grain and the substrate in real time by observing the change of light and shadow, and control the moving distance of the suction nozzle to ensure that the suction nozzle can directly and accurately fix the crystal grain on the substrate. Prevent the die from being dropped or crushed by the suction nozzle.

以下配合圖式及元件符號對本發明的實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The implementation of the present invention will be described in more detail below with reference to the drawings and reference symbols, so that those skilled in the art can implement it after studying this specification.

請參閱圖5至圖9,圖5是本發明的利用光影觀測固晶過程的方法的流程圖,圖6是本發明的第一實施例的步驟S1~S3的示意圖,圖7和圖8是本發明的第一實施例的步驟S4的示意圖,圖9是本發明的第一實施例的步驟S5的示意圖。本發明提供一種利用光影觀測固晶過程的方法,包括下列步驟:Please refer to Fig. 5 to Fig. 9, Fig. 5 is a flowchart of the method for observing the crystal bonding process by using light and shadow of the present invention, Fig. 6 is a schematic diagram of steps S1 to S3 of the first embodiment of the present invention, Fig. 7 and Fig. 8 are A schematic diagram of step S4 in the first embodiment of the present invention, and FIG. 9 is a schematic diagram of step S5 in the first embodiment of the present invention. The invention provides a method for observing the solid crystal process by using light and shadow, comprising the following steps:

步驟S1:如圖5及圖6所示,一吸嘴10吸取一晶粒20並且位於一基板30的一晶粒放置區31的上方,晶粒20與基板30平行,晶粒20的一側的底部邊緣21為一直角。Step S1: As shown in FIG. 5 and FIG. 6 , a suction nozzle 10 sucks a die 20 and is located above a die placement area 31 of a substrate 30 , the die 20 is parallel to the substrate 30 , and one side of the die 20 is The bottom edge 21 is a right angle.

步驟S2:如圖5及圖6所示,一側向光源(圖未示)的一光線41從晶粒20的一側以相對晶粒20傾斜的一照射角度

Figure 02_image005
1往晶粒20的方向照射,使得晶粒20的一光影22投射在基板30上。 Step S2: As shown in FIG. 5 and FIG. 6 , a light ray 41 from one side to the light source (not shown in the figure) is emitted from one side of the crystal grain 20 at an oblique angle relative to the crystal grain 20
Figure 02_image005
1 is irradiated in the direction of the die 20, so that a light shadow 22 of the die 20 is projected on the substrate 30.

步驟S3:如圖5及圖6所示,一第一影像擷取裝置50擷取光影22的影像以獲得一光影影像資訊51,並且將光影影像資訊51傳送至一控制裝置60,控制裝置60根據光影影像資訊51計算出光影22的一寬度。Step S3: As shown in FIG. 5 and FIG. 6, a first image capture device 50 captures the image of the light and shadow 22 to obtain a light and shadow image information 51, and transmits the light and shadow image information 51 to a control device 60, and the control device 60 A width of the light and shadow 22 is calculated according to the light and shadow image information 51 .

步驟S4:如圖5和圖7所示,控制裝置60控制吸嘴10往基板30的方向移動,光影22逐漸往晶粒放置區31的方向移動,第一影像擷取裝置50持續擷取光影22的影像並且持續將光影影像資訊51傳送至控制裝置60。如圖5和圖8所示,當控制裝置60判斷出光影22的寬度等於晶粒20相對於基板30的一預定高度時,控制裝置60控制吸嘴10停止移動並且將預定高度設定為一移動距離,控制裝置60根據移動距離控制吸嘴10繼續往基板30的方向移動。所述預定高度以2

Figure 02_image001
為佳。 Step S4: As shown in FIG. 5 and FIG. 7, the control device 60 controls the suction nozzle 10 to move toward the substrate 30, the light and shadow 22 gradually moves toward the direction of the die placement area 31, and the first image capture device 50 continues to capture the light and shadow 22 and continuously transmit the light and shadow image information 51 to the control device 60 . As shown in Figures 5 and 8, when the control device 60 judges that the width of the light shadow 22 is equal to a predetermined height of the crystal grain 20 relative to the substrate 30, the control device 60 controls the suction nozzle 10 to stop moving and the predetermined height is set as a movement distance, the control device 60 controls the suction nozzle 10 to continue moving toward the substrate 30 according to the moving distance. The predetermined height is 2
Figure 02_image001
better.

步驟S5:如圖5及圖9所示,在晶粒20移動至晶粒放置區31以後,晶粒20的一側的底部邊緣21完全貼合於晶粒放置區31上,使得光影22完全消失,第一影像擷取裝置50未擷取到光影22的影像,控制裝置60未接收到光影影像資訊51並且控制吸嘴10停止移動,使得晶粒20完全固定於晶粒放置區31上。Step S5: As shown in FIG. 5 and FIG. 9, after the die 20 moves to the die placement area 31, the bottom edge 21 of one side of the die 20 is completely attached to the die placement area 31, so that the light and shadow 22 are completely disappears, the first image capture device 50 does not capture the image of the light and shadow 22 , the control device 60 does not receive the light and shadow image information 51 and controls the suction nozzle 10 to stop moving, so that the die 20 is completely fixed on the die placement area 31 .

請參閱圖10至圖13,圖10是本發明的第二實施例的步驟S1的示意圖,圖11是本發明的第二實施例的步驟S2及步驟S3的示意圖,圖12是本發明的第二實施例的步驟S4的示意圖,圖13是本發明的第二實施例的步驟S5的示意圖。如圖10所示,第二實施例的步驟S1與第一實施例的步驟S1的差異在於:晶粒20的一側的底部邊緣21A為一斜角,一第二影像擷取裝置70擷取斜角的影像以獲得一斜角影像資訊71,並且將斜角影像資訊71傳送至控制裝置60,控制裝置60根據斜角影像資訊71計算出斜角的一寬度。如圖11所示,第二實施例的步驟S2與第一實施例的步驟S2完全相同,第二實施例的步驟S3與第一實施例的步驟S3完全相同。如圖12所示,第二實施例的步驟S4與第一實施例的步驟S4的差異在於:當控制裝置60判斷出光影22的寬度等於斜角的寬度與晶粒20相對於基板30的一預定高度的總和時,控制裝置60控制吸嘴10停止移動並且將預定高度設定為一移動距離,控制裝置60根據移動距離控制吸嘴10繼續往基板30的方向移動。如圖13所示,第二實施例的步驟S5與第一實施例的步驟S5的差異在於:在晶粒20移動至晶粒放置區31以後,晶粒20的一側的底部邊緣21A未貼合於晶粒放置區31上,使得光影22剩下一小範圍,第一影像擷取裝置50僅擷取到光影22的小範圍影像以獲得一小範圍影像資訊52,控制裝置60接收到小範圍影像資訊52並且控制吸嘴10停止移動,使得晶粒20完全固定於晶粒放置區31上。Please refer to FIG. 10 to FIG. 13, FIG. 10 is a schematic diagram of step S1 of the second embodiment of the present invention, FIG. 11 is a schematic diagram of step S2 and step S3 of the second embodiment of the present invention, and FIG. 12 is a schematic diagram of the first embodiment of the present invention A schematic diagram of step S4 in the second embodiment, and FIG. 13 is a schematic diagram of step S5 in the second embodiment of the present invention. As shown in FIG. 10 , the difference between step S1 of the second embodiment and step S1 of the first embodiment is that: the bottom edge 21A of one side of the die 20 is an oblique angle, and a second image capture device 70 captures The oblique image information 71 is obtained from the oblique image, and the oblique image information 71 is sent to the control device 60 , and the control device 60 calculates a width of the oblique angle according to the oblique image information 71 . As shown in FIG. 11 , step S2 of the second embodiment is identical to step S2 of the first embodiment, and step S3 of the second embodiment is identical to step S3 of the first embodiment. As shown in FIG. 12 , the difference between step S4 of the second embodiment and step S4 of the first embodiment lies in that: when the control device 60 judges that the width of the light shadow 22 is equal to the width of the bevel angle and the distance between the crystal grain 20 and the substrate 30 When the sum of the predetermined heights is reached, the control device 60 controls the suction nozzle 10 to stop moving and sets the predetermined height as a moving distance, and the control device 60 controls the suction nozzle 10 to continue moving toward the substrate 30 according to the moving distance. As shown in FIG. 13 , the difference between step S5 of the second embodiment and step S5 of the first embodiment is that after the die 20 moves to the die placement area 31 , the bottom edge 21A of one side of the die 20 is not pasted. fit on the die placement area 31, leaving a small area of the light shadow 22, the first image capture device 50 only captures a small area image of the light shadow 22 to obtain a small area of image information 52, the control device 60 receives the small area Scope the image information 52 and control the suction nozzle 10 to stop moving, so that the die 20 is completely fixed on the die placement area 31 .

綜上所述,無論控制吸嘴10移動的驅動軸(圖未示)維持正常狀態或因為熱脹冷縮而導致吸嘴10與基板30之間的相對距離一直改變,本發明能夠藉由側向光源的光線41對晶粒20打光以將其光影22投射在基板30上,並且利用第一影像擷取裝置50觀察光影22的變化,即時監測晶粒20和基板30的相對位置,再搭配控制裝置60控制吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於晶粒放置區31上,防止晶粒20空拋或被吸嘴10壓碎。In summary, no matter whether the drive shaft (not shown) that controls the movement of the suction nozzle 10 remains in a normal state or the relative distance between the suction nozzle 10 and the substrate 30 is constantly changing due to thermal expansion and contraction, the present invention can be used by side The light 41 toward the light source illuminates the crystal grain 20 to project its light shadow 22 on the substrate 30, and uses the first image capture device 50 to observe the change of the light shadow 22, monitor the relative position of the crystal grain 20 and the substrate 30 in real time, and then The moving distance of the suction nozzle 10 is controlled with the control device 60 to ensure that the suction nozzle 10 can directly and accurately fix the die 20 on the die placement area 31 to prevent the die 20 from being thrown or crushed by the suction nozzle 10 .

再者,在第一實施例中,由於晶粒20切割時其底部邊緣21可能十分銳利而成為直角,所以晶粒20與基板30之間的相對距離實質上等於光影22的寬度。為了更加精準地控制吸嘴10的移動距離,第一實施例能夠先設定晶粒20與基板30之間的某一相對距離為所述預定高度,接著再藉由判斷光影22的寬度是否等於晶粒20與基板30之間的相對距離,即時監測晶粒20和基板30的相對位置,並且將此預定高度設定為吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於基板30上,防止晶粒20空拋或被吸嘴10壓碎。Furthermore, in the first embodiment, since the bottom edge 21 of the die 20 may be very sharp and form a right angle when cutting, the relative distance between the die 20 and the substrate 30 is substantially equal to the width of the light shadow 22 . In order to control the moving distance of the suction nozzle 10 more accurately, the first embodiment can first set a certain relative distance between the die 20 and the substrate 30 as the predetermined height, and then determine whether the width of the light and shadow 22 is equal to the die height. The relative distance between the die 20 and the substrate 30 is monitored in real time relative to the position of the die 20 and the substrate 30, and this predetermined height is set as the moving distance of the suction nozzle 10 to ensure that the suction nozzle 10 can directly and accurately place the die 20 is fixed on the substrate 30 to prevent the die 20 from being air-dropped or crushed by the suction nozzle 10 .

此外,在第二實施例中,由於晶粒20切割時其底部邊緣21A不夠銳利而成為斜角(即,裂邊),所以晶粒20與基板30之間的相對距離與斜角的寬度的總和實質上等於光影22的寬度。為了更加精準地控制吸嘴10的移動距離,第二實施例能夠先設定晶粒20與基板30之間的某一相對距離為所述預定高度,接著再藉由判斷光影22的寬度是否等於晶粒20與基板30之間的相對距離與斜角的寬度的總和,即時監測晶粒20和基板30的相對位置,並且將此預定高度設定為吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於基板30上,防止晶粒20空拋或被吸嘴10壓碎。In addition, in the second embodiment, since the bottom edge 21A of the crystal grain 20 is not sharp enough to form a bevel (that is, a cracked edge), the relationship between the relative distance between the crystal grain 20 and the substrate 30 and the width of the bevel The sum is substantially equal to the width of the light shadow 22 . In order to control the moving distance of the suction nozzle 10 more precisely, the second embodiment can first set a certain relative distance between the die 20 and the substrate 30 as the predetermined height, and then determine whether the width of the light and shadow 22 is equal to the die height. The sum of the relative distance between the grain 20 and the substrate 30 and the width of the bevel, real-time monitoring of the relative position of the grain 20 and the substrate 30, and this predetermined height is set as the moving distance of the suction nozzle 10, to ensure that the suction nozzle 10 can Directly and accurately fix the die 20 on the substrate 30 to prevent the die 20 from being thrown or crushed by the suction nozzle 10 .

又,在第一實施例和第二實施例的步驟S1中,當晶粒20相對於基板30傾斜時,一測距裝置(圖未示)感測到晶粒20的兩側與基板30的二間距並且將該等間距傳送給控制裝置60,控制裝置60計算出該等間距的一差值,控制裝置60根據差值計算出晶粒20相對於基板30的角度,控制裝置60根據該角度控制吸嘴10旋轉,直至控制裝置60判斷出該角度為0

Figure 02_image003
為止,此時晶粒20與基板30平行。一般的測距裝置(例如,紅外線測距裝置)能夠將晶粒20與基板30的平行度調整至
Figure 02_image007
0.1
Figure 02_image009
m,高精度的雷射測距裝置則可將晶粒20與基板30的平行度調整至
Figure 02_image007
5nm。 Also, in step S1 of the first embodiment and the second embodiment, when the crystal grain 20 is tilted relative to the substrate 30, a distance measuring device (not shown) senses the distance between the two sides of the crystal grain 20 and the substrate 30. two pitches and transmit the equal pitch to the control device 60, the control device 60 calculates a difference of the equal pitch, the control device 60 calculates the angle of the crystal grain 20 relative to the substrate 30 according to the difference, and the control device 60 calculates the angle of the crystal grain 20 with respect to the substrate 30 according to the angle Control the suction nozzle 10 to rotate until the control device 60 judges that the angle is 0
Figure 02_image003
So far, the crystal grain 20 is parallel to the substrate 30 at this time. A general distance measuring device (for example, an infrared distance measuring device) can adjust the parallelism between the crystal grain 20 and the substrate 30 to
Figure 02_image007
0.1
Figure 02_image009
m, the high-precision laser ranging device can adjust the parallelism between the crystal grain 20 and the substrate 30 to
Figure 02_image007
5nm.

值得一提的是,如圖6和圖11所示,在第一實施例和第二實施例的步驟S3中,第一影像擷取裝置50與側向光源位於同一側並且從晶粒20的一側上方以相對基板30傾斜的一拍攝角度

Figure 02_image005
2往晶粒放置區31的方向拍攝,照射角度
Figure 02_image005
1大於拍攝角度
Figure 02_image005
2。是以,側向光源的光線41不會被第一影像擷取裝置50遮住,吸嘴10往基板30的方向移動的過程中,晶粒20的光影能夠一直投射在基板30上,第一影像擷取裝置50能夠持續擷取光影22的影像。 It is worth mentioning that, as shown in FIG. 6 and FIG. 11 , in step S3 of the first embodiment and the second embodiment, the first image capture device 50 is located on the same side as the side light source and A photographing angle inclined relative to the substrate 30 above one side
Figure 02_image005
Figure 02_image005
2 Shooting in the direction of the grain placement area 31, the irradiation angle
Figure 02_image005
Figure 02_image005
1 greater than the shooting angle
Figure 02_image005
Figure 02_image005
2. Therefore, the light 41 of the side light source will not be blocked by the first image capture device 50, and the light and shadow of the die 20 can always be projected on the substrate 30 during the movement of the suction nozzle 10 towards the substrate 30, the first The image capturing device 50 can continuously capture images of the light and shadow 22 .

以上所述者僅為用以解釋本發明的較佳實施例,並非企圖據以對本發明做任何形式上的限制,是以,凡有在相同的發明精神下所作有關本發明的任何修飾或變更,皆仍應包括在本發明意圖保護的範疇。The above-mentioned ones are only preferred embodiments for explaining the present invention, and are not intended to limit the present invention in any form. Therefore, any modification or change of the present invention made under the same spirit of the invention , all should still be included in the category that the present invention intends to protect.

1:吸嘴 2:晶粒 3:基板 301:晶粒放置區 10:吸嘴 20:晶粒 21,21A:底部邊緣 22:光影 30:基板 31:晶粒放置區 41:光線 50:第一影像擷取裝置 51:光影影像資訊 52:小範圍影像資訊 60:控制裝置 70:第二影像擷取裝置 71:斜角影像資訊 D1,D2:間距 S1~S5:步驟 T:厚度

Figure 02_image011
1:照射角度
Figure 02_image011
2:拍攝角度 1: Suction nozzle 2: Die 3: Substrate 301: Die placement area 10: Suction nozzle 20: Die 21,21A: Bottom edge 22: Light and shadow 30: Substrate 31: Die placement area 41: Light 50: First Image capture device 51: light and shadow image information 52: small-scale image information 60: control device 70: second image capture device 71: oblique image information D1, D2: spacing S1~S5: step T: thickness
Figure 02_image011
1: Irradiation angle
Figure 02_image011
2: Shooting angle

[圖1〕是習知技術藉由測距裝置量測吸嘴與基板之間的間距的示意圖。 [圖2A〕和[圖2B〕是習知技術在理想狀態下轉移晶粒的示意圖。 [圖3A〕至[圖3C〕是習知技術在吸嘴與基板之間的相對距離變大時轉移晶粒的示意圖。 [圖4A〕和[圖4B〕是習知技術在吸嘴與基板之間的相對距離變小時轉移晶粒的示意圖。 [圖5〕是本發明的利用光影觀測固晶過程的方法的流程圖。 [圖6〕是本發明的第一實施例的步驟S1~S3的示意圖。 [圖7〕和[圖8〕是本發明的第一實施例的步驟S4的示意圖。 [圖9〕是本發明的第一實施例的步驟S5的示意圖。 [圖10〕是本發明的第二實施例的步驟S1的示意圖。 [圖11〕是本發明的第二實施例的步驟S2及步驟S3的示意圖。 [圖12〕是本發明的第二實施例的步驟S4的示意圖。 [圖13〕是本發明的第二實施例的步驟S5的示意圖。 [FIG. 1] is a schematic diagram of measuring the distance between the nozzle and the substrate by the distance measuring device in the prior art. [FIG. 2A] and [FIG. 2B] are schematic diagrams of transferring crystal grains in an ideal state in conventional technology. [FIG. 3A] to [FIG. 3C] are schematic diagrams of transferring die when the relative distance between the suction nozzle and the substrate becomes larger in the conventional technology. [FIG. 4A] and [FIG. 4B] are schematic diagrams of transferring die in the prior art when the relative distance between the nozzle and the substrate becomes smaller. [Fig. 5] is a flow chart of the method for observing the crystal-bonding process by using light and shadow of the present invention. [ FIG. 6 ] is a schematic diagram of steps S1 to S3 in the first embodiment of the present invention. [ FIG. 7 ] and [ FIG. 8 ] are schematic diagrams of step S4 in the first embodiment of the present invention. [ Fig. 9 ] is a schematic diagram of step S5 in the first embodiment of the present invention. [ Fig. 10 ] is a schematic diagram of step S1 in the second embodiment of the present invention. [ Fig. 11 ] is a schematic diagram of step S2 and step S3 of the second embodiment of the present invention. [ Fig. 12 ] is a schematic diagram of step S4 of the second embodiment of the present invention. [ Fig. 13 ] is a schematic diagram of step S5 in the second embodiment of the present invention.

S1~S5:步驟S1~S5: steps

Claims (8)

一種利用光影觀測固晶過程的方法,包括下列步驟: (a)一吸嘴吸取一晶粒並且位於一基板的一晶粒放置區的上方,該晶粒與該基板平行; (b)一側向光源的一光線從該晶粒的一側上方以相對該晶粒傾斜的一照射角度往該晶粒的方向照射,使得該晶粒的一光影投射在該基板上; (c)一第一影像擷取裝置擷取該光影的影像以獲得一光影影像資訊,並且將該光影影像資訊傳送至一控制裝置; (d)該控制裝置控制該吸嘴往該基板的方向移動,該光影逐漸往該晶粒放置區的方向移動,該第一影像擷取裝置持續擷取該光影的影像並且持續將該光影影像資訊傳送至該控制裝置;以及 (e)在該晶粒移動至該晶粒放置區以後,該光影完全消失或剩下一小範圍,該第一影像擷取裝置未擷取到該光影的影像或僅擷取到該光影的小範圍影像以獲得一小範圍影像資訊,該控制裝置未接收到該光影影像資訊或接收到該小範圍影像資訊並且控制該吸嘴停止移動,使得該晶粒完全固定於該晶粒放置區上。 A method for observing the solid crystal process by using light and shadow, comprising the following steps: (a) a suction nozzle picks up a die and is located above a die placement area of a substrate, the die being parallel to the substrate; (b) A light beam from one side of the light source is irradiated toward the direction of the crystal grain at an angle of illumination oblique to the crystal grain from above one side of the crystal grain, so that a light shadow of the crystal grain is projected on the substrate; (c) a first image capture device captures the image of the light and shadow to obtain a light and shadow image information, and transmits the light and shadow image information to a control device; (d) the control device controls the suction nozzle to move toward the substrate, the light shadow gradually moves toward the die placement area, the first image capture device continues to capture the light shadow image and continues the light shadow image information is sent to the control device; and (e) After the die moves to the die placement area, the light shadow completely disappears or a small area remains, and the first image capture device does not capture the image of the light shadow or only captures the light shadow image A small-scale image is obtained to obtain a small-scale image information, the control device does not receive the light-shade image information or receives the small-scale image information and controls the suction nozzle to stop moving, so that the die is completely fixed on the die placement area . 如請求項1所述的利用光影觀測固晶過程的方法,其中,在該步驟(a)中,該晶粒的一側的底部邊緣為一直角;以及,在該步驟(e)中,在該晶粒移動至該晶粒放置區以後,該晶粒的一側的底部邊緣完全貼合於該晶粒放置區上,使得該光影完全消失,該第一影像擷取裝置未擷取到該光影的影像,該控制裝置未接收到該光影影像資訊並且控制該吸嘴停止移動,使得該晶粒完全固定於該晶粒放置區上。The method for observing the crystal-bonding process using light and shadow as described in Claim 1, wherein, in the step (a), the bottom edge of one side of the grain is at a right angle; and, in the step (e), at After the die moves to the die placement area, the bottom edge of one side of the die is completely attached to the die placement area, so that the light and shadow completely disappear, and the first image capture device does not capture the The light and shadow image, the control device does not receive the light and shadow image information and controls the suction nozzle to stop moving, so that the die is completely fixed on the die placement area. 如請求項2所述的利用光影觀測固晶過程的方法,其中,在該步驟(c)中,該控制裝置根據該光影影像資訊計算出該光影的一寬度;以及,在該步驟(d)中,當該控制裝置判斷出該光影的該寬度等於該晶粒相對於該基板的一預定高度時,該控制裝置控制該吸嘴停止移動並且將該預定高度設定為一移動距離,該控制裝置根據該移動距離控制該吸嘴繼續往該基板的方向移動。The method of using light and shadow to observe the crystal bonding process as described in claim 2, wherein, in the step (c), the control device calculates a width of the light and shadow according to the light and shadow image information; and, in the step (d) wherein, when the control device judges that the width of the light shadow is equal to a predetermined height of the grain relative to the substrate, the control device controls the suction nozzle to stop moving and sets the predetermined height as a moving distance, the control device The suction nozzle is controlled to continue moving toward the substrate according to the moving distance. 如請求項1所述的利用光影觀測固晶過程的方法,其中,在該步驟(a)中,該晶粒的一側的底部邊緣為一斜角;以及,在該步驟(e)中,在該晶粒移動至該晶粒放置區以後,該晶粒的一側的底部邊緣未貼合於該晶粒放置區上,使得該光影剩下一小範圍,該第一影像擷取裝置僅擷取到該光影的小範圍影像以獲得該小範圍影像資訊,該控制裝置接收到該小範圍影像資訊並且控制該吸嘴停止移動,使得該晶粒完全固定於該晶粒放置區上。The method for observing the crystal bonding process using light and shadow as described in claim 1, wherein, in the step (a), the bottom edge of one side of the crystal grain is an oblique angle; and, in the step (e), After the die moves to the die placement area, the bottom edge of one side of the die is not attached to the die placement area, so that the light shadow remains in a small range, and the first image capture device only The small-scale image of the light and shadow is captured to obtain the small-scale image information. The control device receives the small-scale image information and controls the suction nozzle to stop moving so that the die is completely fixed on the die placement area. 如請求項4所述的利用光影觀測固晶過程的方法,其中,在該步驟(a)中,一第二影像擷取裝置擷取該斜角的影像以獲得一斜角影像資訊,並且將該斜角影像資訊傳送至該控制裝置,該控制裝置根據該斜角影像資訊計算出該斜角的一寬度;在該步驟(c)中,該控制裝置根據該光影影像資訊計算出該光影的一寬度;以及,在該步驟(d)中,當該控制裝置判斷出該光影的寬度等於該斜角的寬度與該晶粒相對於該基板的一預定高度的總和時,該控制裝置控制該吸嘴停止移動並且將該預定高度設定為一移動距離,該控制裝置根據該移動距離控制該吸嘴繼續往該基板的方向移動。The method of using light and shadow to observe the crystal bonding process as described in claim 4, wherein, in the step (a), a second image capture device captures the image of the oblique angle to obtain an oblique angle image information, and the The oblique angle image information is sent to the control device, and the control device calculates a width of the oblique angle according to the oblique angle image information; in the step (c), the control device calculates the light and shadow width according to the light and shadow image information a width; and, in the step (d), when the control device determines that the width of the light shadow is equal to the sum of the width of the bevel and a predetermined height of the grain relative to the substrate, the control device controls the The suction nozzle stops moving and the predetermined height is set as a moving distance, and the control device controls the suction nozzle to continue moving toward the substrate according to the moving distance. 如請求項3或5所述的利用光影觀測固晶過程的方法,其中,該預定高度為2
Figure 03_image001
The method for observing the solid crystal process using light and shadow as described in claim 3 or 5, wherein the predetermined height is 2
Figure 03_image001
.
如請求項1所述的利用光影觀測固晶過程的方法,其中,在該步驟(c)中,該第一影像擷取裝置與該側向光源位於同一側並且從該晶粒的一側上方以相對該基板傾斜的一拍攝角度往該晶粒放置區的方向拍攝,該照射角度大於該拍攝角度。The method of using light and shadow to observe the crystal bonding process as described in claim 1, wherein, in the step (c), the first image capture device is located on the same side as the side light source and from above the side of the crystal grain Shooting in the direction of the crystal grain placement area at a shooting angle inclined relative to the substrate, the irradiation angle is larger than the shooting angle. 如請求項1所述的利用光影觀測固晶過程的方法,其中,在該步驟(a)中,當該晶粒相對於該基板傾斜時,一測距裝置感測到該晶粒的兩側與該基板的二間距並且將該等間距傳送給該控制裝置,該控制裝置計算出該等間距的一差值,該控制裝置根據該差值計算出該晶粒相對於該基板的角度,該控制裝置根據該角度控制該吸嘴旋轉,直至該控制裝置判斷出該角度為0
Figure 03_image003
為止,此時該晶粒與該基板平行。
The method for observing the crystal bonding process by using light and shadow as described in Claim 1, wherein, in the step (a), when the crystal grain is tilted relative to the substrate, a distance measuring device senses both sides of the crystal grain the two distances from the substrate and transmit the equal distance to the control device, the control device calculates a difference of the equal distance, the control device calculates the angle of the grain relative to the substrate according to the difference, the The control device controls the nozzle to rotate according to the angle until the control device judges that the angle is 0
Figure 03_image003
At this point, the grain is parallel to the substrate.
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