TWI796754B - Method for observing chip fixing process by shadow - Google Patents
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本發明是有關一種固晶方法,特別是一種利用光影觀測固晶過程的方法。The invention relates to a crystal-bonding method, in particular to a method for observing the crystal-bonding process by using light and shadow.
積體電路藉由大批方式,經過多道程序,製作在半導體晶圓上,晶圓進一步分割成複數晶粒。換言之,晶粒是以半導體材料製作而成未經封裝的一小塊積體電路本體。分割好的複數晶粒整齊貼附在一承載膜上,接著一承載框負責運送承載膜,然後藉由一吸嘴吸取承載膜上的該等晶粒,最後吸嘴將該等晶粒固定於基板的複數晶粒放置區,俾利進行後續加工程序。Integrated circuits are fabricated on semiconductor wafers through multiple procedures in a large number of ways, and the wafers are further divided into multiple crystal grains. In other words, a die is a small unpackaged integrated circuit body made of semiconductor material. Divided multiple dies are neatly attached to a carrier film, and then a carrier frame is responsible for transporting the carrier film, and then the dies on the carrier film are sucked by a suction nozzle, and finally the dies are fixed on the carrier film by the suction nozzle The multiple crystal grain placement area of the substrate is convenient for subsequent processing procedures.
如圖1所示,在進行固晶程序以前,首先藉由一測距裝置(圖未示)量測吸嘴1與基板3之間的一間距D1,間距D1扣除晶粒2的厚度T即為吸嘴1的一移動距離。接著,如圖2A所示,在進行固晶程序的過程中,藉由測距裝置量測吸嘴1上的晶粒2與基板3之間的一間距D2。在理想狀態下,控制吸嘴10移動的驅動軸(圖未示)維持正常狀態,間距D1扣除晶粒2的厚度T等於間距D2,此時吸嘴1的移動距離恰好等於間距D2。因此,如圖2B所示,吸嘴1能夠將晶粒2直接且精準地固定於晶粒放置區301上。As shown in FIG. 1 , before performing the die-bonding process, a distance D1 between the
然而,控制吸嘴1移動的驅動軸會因為熱脹冷縮而導致吸嘴1與基板3之間的相對距離一直改變。However, the relative distance between the
如圖3A所示,如果吸嘴1與基板3之間的相對距離變大,則間距D2變大,間距D1扣除晶粒2的厚度T小於間距D2,此時吸嘴1的移動距離小於間距D2。如圖3B所示,吸嘴1僅能將晶粒2移動至晶粒放置區301的上方,無法直接將晶粒2固定於晶粒放置區301。如圖3C所示,吸嘴1必須停止吸取晶粒2,晶粒2才能夠以空拋的方式掉落在晶粒放置區301上。惟,以空拋的方式,晶粒2難以精準地放置在晶粒放置區301上。As shown in Figure 3A, if the relative distance between the
如圖4A所示,如果吸嘴1與基板3之間的相對距離變小,則間距D2變小,間距D1扣除晶粒2的厚度T大於間距D2,此時吸嘴1的移動距離大於間距D2。如圖4B所示,吸嘴1雖可將晶粒2直接且精準地固定於晶粒放置區301上,但吸嘴1卻會進一步往基板3的方向移動而壓碎晶粒2。As shown in Figure 4A, if the relative distance between the
本發明的主要目的在於提供一種利用光影觀測固晶過程的方法,能夠藉由觀察光影的變化,即時監測晶粒和基板的相對位置,控制吸嘴的移動距離,以確保吸嘴能夠直接且精準地將晶粒固定於基板上,防止晶粒空拋或被吸嘴壓碎。The main purpose of the present invention is to provide a method for observing the crystal bonding process by using light and shadow, which can monitor the relative position of the crystal grain and the substrate in real time by observing the change of light and shadow, and control the moving distance of the suction nozzle to ensure that the suction nozzle can be directly and accurately Securely fix the die on the substrate to prevent the die from being thrown or crushed by the nozzle.
為了達成前述的目的,本發明提供一種利用光影觀測固晶過程的方法,包括下列步驟:(a)一吸嘴吸取一晶粒並且位於一基板的一晶粒放置區的上方,晶粒與基板平行;(b)一側向光源的一光線從晶粒的一側上方以相對晶粒傾斜的一照射角度往晶粒的方向照射,使得晶粒的一光影投射在基板上;(c)一第一影像擷取裝置擷取光影的影像以獲得一光影影像資訊,並且將光影影像資訊傳送至一控制裝置;(d)控制裝置控制吸嘴往基板的方向移動,光影逐漸往晶粒放置區的方向移動,第一影像擷取裝置持續擷取光影的影像並且持續將光影影像資訊傳送至控制裝置;以及(e)在晶粒移動至晶粒放置區以後,光影完全消失或剩下一小範圍,第一影像擷取裝置未擷取到光影的影像或僅擷取到光影的小範圍影像以獲得一小範圍影像資訊,控制裝置未接收到光影影像資訊或接收到小範圍影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In order to achieve the aforementioned object, the present invention provides a method for observing the crystal bonding process using light and shadow, comprising the following steps: (a) a suction nozzle picks up a crystal grain and is located above a grain placement area of a substrate, and the crystal grain and the substrate Parallel; (b) a light beam from one side of the light source is irradiated toward the direction of the grain at an angle of illumination inclined relative to the grain from one side of the grain, so that a light and shadow of the grain is projected on the substrate; (c) a The first image capture device captures the light and shadow image to obtain a light and shadow image information, and transmits the light and shadow image information to a control device; (d) the control device controls the suction nozzle to move toward the substrate, and the light and shadow gradually move to the die placement area The first image capture device continues to capture the image of the light and shadow and continuously transmits the information of the light and shadow image to the control device; and (e) after the die moves to the die placement area, the light and shadow completely disappear or remain a small range, the first image capture device did not capture the light and shadow image or only captured a small range of light and shadow image to obtain a small range of image information, the control device did not receive the light and shadow image information or received the small range of image information and controlled The suction nozzle stops moving so that the die is completely fixed on the die placement area.
在一些實施例中,在步驟(a)中,晶粒的一側的底部邊緣為一直角;以及,在步驟(e)中,在晶粒移動至晶粒放置區以後,晶粒的一側的底部邊緣完全貼合於晶粒放置區上,使得光影完全消失,第一影像擷取裝置未擷取到光影的影像,控制裝置未接收到光影影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In some embodiments, in step (a), the bottom edge of one side of the die is at a right angle; and, in step (e), after the die is moved to the die placement area, one side of the die is The bottom edge of the bottom edge is completely attached to the die placement area, so that the light and shadow completely disappear, the first image capture device does not capture the light and shadow image, the control device does not receive the light and shadow image information and controls the suction nozzle to stop moving, so that the die Fully fixed on the die placement area.
較佳地,在步驟(c)中,控制裝置根據光影影像資訊計算出光影的一寬度;以及,在步驟(d)中,當控制裝置判斷出光影的寬度等於晶粒相對於基板的一預定高度時,控制裝置控制吸嘴停止移動並且將預定高度設定為一移動距離,控制裝置根據移動距離控制吸嘴繼續往基板的方向移動。Preferably, in step (c), the control device calculates a width of the light shadow according to the light and shadow image information; and, in step (d), when the control device determines that the width of the light shadow is equal to a predetermined height, the control device controls the suction nozzle to stop moving and sets the predetermined height as a moving distance, and the control device controls the suction nozzle to continue moving toward the substrate according to the moving distance.
在一些實施例中,在步驟(a)中,晶粒的一側的底部邊緣為一斜角;以及,在步驟(e)中,在晶粒移動至晶粒放置區以後,晶粒的一側的底部邊緣未貼合於晶粒放置區上,使得光影剩下一小範圍,第一影像擷取裝置僅擷取到光影的小範圍影像以獲得小範圍影像資訊,控制裝置接收到小範圍影像資訊並且控制吸嘴停止移動,使得晶粒完全固定於晶粒放置區上。In some embodiments, in step (a), the bottom edge of one side of the die is beveled; and, in step (e), after the die is moved to the die placement area, one side of the die is The bottom edge of the side is not attached to the die placement area, leaving a small range of light and shadow. The first image capture device only captures a small range of light and shadow images to obtain small range image information. The control device receives the small range Image information and control the suction nozzle to stop moving, so that the die is completely fixed on the die placement area.
較佳地,在步驟(a)中,一第二影像擷取裝置擷取斜角的影像以獲得一斜角影像資訊,並且將斜角影像資訊傳送至控制裝置,控制裝置根據斜角影像資訊計算出斜角的一寬度;在步驟(c)中,控制裝置根據光影影像資訊計算出光影的一寬度;以及,在步驟(d)中,當控制裝置判斷出光影的寬度等於斜角的寬度與晶粒相對於基板的一預定高度的總和時,控制裝置控制吸嘴停止移動並且將預定高度設定為一移動距離,控制裝置根據移動距離控制吸嘴繼續往基板的方向移動。Preferably, in step (a), a second image capture device captures the oblique image to obtain oblique image information, and transmits the oblique image information to the control device, and the control device Calculate a width of the bevel; in step (c), the control device calculates a width of the light and shadow according to the light and shadow image information; and, in step (d), when the control device determines that the width of the light and shadow is equal to the width of the bevel When the sum of a predetermined height of the crystal grain relative to the substrate is reached, the control device controls the suction nozzle to stop moving and sets the predetermined height as a moving distance, and the control device controls the suction nozzle to continue moving toward the substrate according to the moving distance.
較佳地,預定高度為2 。 Preferably, the predetermined height is 2 .
在一些實施例中,在步驟(c)中,第一影像擷取裝置與側向光源位於同一側並且從晶粒的一側上方以相對基板傾斜的一拍攝角度往晶粒放置區的方向拍攝,照射角度大於拍攝角度。In some embodiments, in step (c), the first image capture device and the side light source are located on the same side and take pictures from one side of the die in the direction of the die placement area at a shooting angle inclined relative to the substrate , the illumination angle is greater than the shooting angle.
在一些實施例中,在步驟(a)中,當晶粒相對於基板傾斜時,一測距裝置感測到晶粒的兩側與基板的二間距並且將該等間距傳送給控制裝置,控制裝置計算出該等間距的一差值,控制裝置根據差值計算出晶粒相對於基板的角度,控制裝置根據該角度控制吸嘴旋轉,直至控制裝置判斷出該角度為0 為止,此時晶粒與基板平行。 In some embodiments, in step (a), when the die is tilted with respect to the substrate, a ranging device senses two distances from both sides of the die to the substrate and transmits the equal distance to the control device, which controls The device calculates a difference between the equal intervals, and the control device calculates the angle of the grain relative to the substrate according to the difference, and the control device controls the rotation of the suction nozzle according to the angle until the control device judges that the angle is 0 At this point, the grains are parallel to the substrate.
本發明的功效在於,本發明能夠藉由觀察光影的變化,即時監測晶粒和基板的相對位置,控制吸嘴的移動距離,以確保吸嘴能夠直接且精準地將晶粒固定於基板上,防止晶粒空拋或被吸嘴壓碎。The effect of the present invention is that the present invention can monitor the relative position of the crystal grain and the substrate in real time by observing the change of light and shadow, and control the moving distance of the suction nozzle to ensure that the suction nozzle can directly and accurately fix the crystal grain on the substrate. Prevent the die from being dropped or crushed by the suction nozzle.
以下配合圖式及元件符號對本發明的實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The implementation of the present invention will be described in more detail below with reference to the drawings and reference symbols, so that those skilled in the art can implement it after studying this specification.
請參閱圖5至圖9,圖5是本發明的利用光影觀測固晶過程的方法的流程圖,圖6是本發明的第一實施例的步驟S1~S3的示意圖,圖7和圖8是本發明的第一實施例的步驟S4的示意圖,圖9是本發明的第一實施例的步驟S5的示意圖。本發明提供一種利用光影觀測固晶過程的方法,包括下列步驟:Please refer to Fig. 5 to Fig. 9, Fig. 5 is a flowchart of the method for observing the crystal bonding process by using light and shadow of the present invention, Fig. 6 is a schematic diagram of steps S1 to S3 of the first embodiment of the present invention, Fig. 7 and Fig. 8 are A schematic diagram of step S4 in the first embodiment of the present invention, and FIG. 9 is a schematic diagram of step S5 in the first embodiment of the present invention. The invention provides a method for observing the solid crystal process by using light and shadow, comprising the following steps:
步驟S1:如圖5及圖6所示,一吸嘴10吸取一晶粒20並且位於一基板30的一晶粒放置區31的上方,晶粒20與基板30平行,晶粒20的一側的底部邊緣21為一直角。Step S1: As shown in FIG. 5 and FIG. 6 , a
步驟S2:如圖5及圖6所示,一側向光源(圖未示)的一光線41從晶粒20的一側以相對晶粒20傾斜的一照射角度
1往晶粒20的方向照射,使得晶粒20的一光影22投射在基板30上。
Step S2: As shown in FIG. 5 and FIG. 6 , a
步驟S3:如圖5及圖6所示,一第一影像擷取裝置50擷取光影22的影像以獲得一光影影像資訊51,並且將光影影像資訊51傳送至一控制裝置60,控制裝置60根據光影影像資訊51計算出光影22的一寬度。Step S3: As shown in FIG. 5 and FIG. 6, a first
步驟S4:如圖5和圖7所示,控制裝置60控制吸嘴10往基板30的方向移動,光影22逐漸往晶粒放置區31的方向移動,第一影像擷取裝置50持續擷取光影22的影像並且持續將光影影像資訊51傳送至控制裝置60。如圖5和圖8所示,當控制裝置60判斷出光影22的寬度等於晶粒20相對於基板30的一預定高度時,控制裝置60控制吸嘴10停止移動並且將預定高度設定為一移動距離,控制裝置60根據移動距離控制吸嘴10繼續往基板30的方向移動。所述預定高度以2
為佳。
Step S4: As shown in FIG. 5 and FIG. 7, the
步驟S5:如圖5及圖9所示,在晶粒20移動至晶粒放置區31以後,晶粒20的一側的底部邊緣21完全貼合於晶粒放置區31上,使得光影22完全消失,第一影像擷取裝置50未擷取到光影22的影像,控制裝置60未接收到光影影像資訊51並且控制吸嘴10停止移動,使得晶粒20完全固定於晶粒放置區31上。Step S5: As shown in FIG. 5 and FIG. 9, after the die 20 moves to the
請參閱圖10至圖13,圖10是本發明的第二實施例的步驟S1的示意圖,圖11是本發明的第二實施例的步驟S2及步驟S3的示意圖,圖12是本發明的第二實施例的步驟S4的示意圖,圖13是本發明的第二實施例的步驟S5的示意圖。如圖10所示,第二實施例的步驟S1與第一實施例的步驟S1的差異在於:晶粒20的一側的底部邊緣21A為一斜角,一第二影像擷取裝置70擷取斜角的影像以獲得一斜角影像資訊71,並且將斜角影像資訊71傳送至控制裝置60,控制裝置60根據斜角影像資訊71計算出斜角的一寬度。如圖11所示,第二實施例的步驟S2與第一實施例的步驟S2完全相同,第二實施例的步驟S3與第一實施例的步驟S3完全相同。如圖12所示,第二實施例的步驟S4與第一實施例的步驟S4的差異在於:當控制裝置60判斷出光影22的寬度等於斜角的寬度與晶粒20相對於基板30的一預定高度的總和時,控制裝置60控制吸嘴10停止移動並且將預定高度設定為一移動距離,控制裝置60根據移動距離控制吸嘴10繼續往基板30的方向移動。如圖13所示,第二實施例的步驟S5與第一實施例的步驟S5的差異在於:在晶粒20移動至晶粒放置區31以後,晶粒20的一側的底部邊緣21A未貼合於晶粒放置區31上,使得光影22剩下一小範圍,第一影像擷取裝置50僅擷取到光影22的小範圍影像以獲得一小範圍影像資訊52,控制裝置60接收到小範圍影像資訊52並且控制吸嘴10停止移動,使得晶粒20完全固定於晶粒放置區31上。Please refer to FIG. 10 to FIG. 13, FIG. 10 is a schematic diagram of step S1 of the second embodiment of the present invention, FIG. 11 is a schematic diagram of step S2 and step S3 of the second embodiment of the present invention, and FIG. 12 is a schematic diagram of the first embodiment of the present invention A schematic diagram of step S4 in the second embodiment, and FIG. 13 is a schematic diagram of step S5 in the second embodiment of the present invention. As shown in FIG. 10 , the difference between step S1 of the second embodiment and step S1 of the first embodiment is that: the
綜上所述,無論控制吸嘴10移動的驅動軸(圖未示)維持正常狀態或因為熱脹冷縮而導致吸嘴10與基板30之間的相對距離一直改變,本發明能夠藉由側向光源的光線41對晶粒20打光以將其光影22投射在基板30上,並且利用第一影像擷取裝置50觀察光影22的變化,即時監測晶粒20和基板30的相對位置,再搭配控制裝置60控制吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於晶粒放置區31上,防止晶粒20空拋或被吸嘴10壓碎。In summary, no matter whether the drive shaft (not shown) that controls the movement of the
再者,在第一實施例中,由於晶粒20切割時其底部邊緣21可能十分銳利而成為直角,所以晶粒20與基板30之間的相對距離實質上等於光影22的寬度。為了更加精準地控制吸嘴10的移動距離,第一實施例能夠先設定晶粒20與基板30之間的某一相對距離為所述預定高度,接著再藉由判斷光影22的寬度是否等於晶粒20與基板30之間的相對距離,即時監測晶粒20和基板30的相對位置,並且將此預定高度設定為吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於基板30上,防止晶粒20空拋或被吸嘴10壓碎。Furthermore, in the first embodiment, since the
此外,在第二實施例中,由於晶粒20切割時其底部邊緣21A不夠銳利而成為斜角(即,裂邊),所以晶粒20與基板30之間的相對距離與斜角的寬度的總和實質上等於光影22的寬度。為了更加精準地控制吸嘴10的移動距離,第二實施例能夠先設定晶粒20與基板30之間的某一相對距離為所述預定高度,接著再藉由判斷光影22的寬度是否等於晶粒20與基板30之間的相對距離與斜角的寬度的總和,即時監測晶粒20和基板30的相對位置,並且將此預定高度設定為吸嘴10的移動距離,以確保吸嘴10能夠直接且精準地將晶粒20固定於基板30上,防止晶粒20空拋或被吸嘴10壓碎。In addition, in the second embodiment, since the
又,在第一實施例和第二實施例的步驟S1中,當晶粒20相對於基板30傾斜時,一測距裝置(圖未示)感測到晶粒20的兩側與基板30的二間距並且將該等間距傳送給控制裝置60,控制裝置60計算出該等間距的一差值,控制裝置60根據差值計算出晶粒20相對於基板30的角度,控制裝置60根據該角度控制吸嘴10旋轉,直至控制裝置60判斷出該角度為0
為止,此時晶粒20與基板30平行。一般的測距裝置(例如,紅外線測距裝置)能夠將晶粒20與基板30的平行度調整至
0.1
m,高精度的雷射測距裝置則可將晶粒20與基板30的平行度調整至
5nm。
Also, in step S1 of the first embodiment and the second embodiment, when the
值得一提的是,如圖6和圖11所示,在第一實施例和第二實施例的步驟S3中,第一影像擷取裝置50與側向光源位於同一側並且從晶粒20的一側上方以相對基板30傾斜的一拍攝角度
2往晶粒放置區31的方向拍攝,照射角度
1大於拍攝角度
2。是以,側向光源的光線41不會被第一影像擷取裝置50遮住,吸嘴10往基板30的方向移動的過程中,晶粒20的光影能夠一直投射在基板30上,第一影像擷取裝置50能夠持續擷取光影22的影像。
It is worth mentioning that, as shown in FIG. 6 and FIG. 11 , in step S3 of the first embodiment and the second embodiment, the first
以上所述者僅為用以解釋本發明的較佳實施例,並非企圖據以對本發明做任何形式上的限制,是以,凡有在相同的發明精神下所作有關本發明的任何修飾或變更,皆仍應包括在本發明意圖保護的範疇。The above-mentioned ones are only preferred embodiments for explaining the present invention, and are not intended to limit the present invention in any form. Therefore, any modification or change of the present invention made under the same spirit of the invention , all should still be included in the category that the present invention intends to protect.
1:吸嘴
2:晶粒
3:基板
301:晶粒放置區
10:吸嘴
20:晶粒
21,21A:底部邊緣
22:光影
30:基板
31:晶粒放置區
41:光線
50:第一影像擷取裝置
51:光影影像資訊
52:小範圍影像資訊
60:控制裝置
70:第二影像擷取裝置
71:斜角影像資訊
D1,D2:間距
S1~S5:步驟
T:厚度
1:照射角度
2:拍攝角度
1: Suction nozzle 2: Die 3: Substrate 301: Die placement area 10: Suction nozzle 20:
[圖1〕是習知技術藉由測距裝置量測吸嘴與基板之間的間距的示意圖。 [圖2A〕和[圖2B〕是習知技術在理想狀態下轉移晶粒的示意圖。 [圖3A〕至[圖3C〕是習知技術在吸嘴與基板之間的相對距離變大時轉移晶粒的示意圖。 [圖4A〕和[圖4B〕是習知技術在吸嘴與基板之間的相對距離變小時轉移晶粒的示意圖。 [圖5〕是本發明的利用光影觀測固晶過程的方法的流程圖。 [圖6〕是本發明的第一實施例的步驟S1~S3的示意圖。 [圖7〕和[圖8〕是本發明的第一實施例的步驟S4的示意圖。 [圖9〕是本發明的第一實施例的步驟S5的示意圖。 [圖10〕是本發明的第二實施例的步驟S1的示意圖。 [圖11〕是本發明的第二實施例的步驟S2及步驟S3的示意圖。 [圖12〕是本發明的第二實施例的步驟S4的示意圖。 [圖13〕是本發明的第二實施例的步驟S5的示意圖。 [FIG. 1] is a schematic diagram of measuring the distance between the nozzle and the substrate by the distance measuring device in the prior art. [FIG. 2A] and [FIG. 2B] are schematic diagrams of transferring crystal grains in an ideal state in conventional technology. [FIG. 3A] to [FIG. 3C] are schematic diagrams of transferring die when the relative distance between the suction nozzle and the substrate becomes larger in the conventional technology. [FIG. 4A] and [FIG. 4B] are schematic diagrams of transferring die in the prior art when the relative distance between the nozzle and the substrate becomes smaller. [Fig. 5] is a flow chart of the method for observing the crystal-bonding process by using light and shadow of the present invention. [ FIG. 6 ] is a schematic diagram of steps S1 to S3 in the first embodiment of the present invention. [ FIG. 7 ] and [ FIG. 8 ] are schematic diagrams of step S4 in the first embodiment of the present invention. [ Fig. 9 ] is a schematic diagram of step S5 in the first embodiment of the present invention. [ Fig. 10 ] is a schematic diagram of step S1 in the second embodiment of the present invention. [ Fig. 11 ] is a schematic diagram of step S2 and step S3 of the second embodiment of the present invention. [ Fig. 12 ] is a schematic diagram of step S4 of the second embodiment of the present invention. [ Fig. 13 ] is a schematic diagram of step S5 in the second embodiment of the present invention.
S1~S5:步驟S1~S5: steps
Claims (8)
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