TWI786954B - Device and method of simultaneously removing flammable gas and nitrous oxide - Google Patents
Device and method of simultaneously removing flammable gas and nitrous oxide Download PDFInfo
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- TWI786954B TWI786954B TW110143344A TW110143344A TWI786954B TW I786954 B TWI786954 B TW I786954B TW 110143344 A TW110143344 A TW 110143344A TW 110143344 A TW110143344 A TW 110143344A TW I786954 B TWI786954 B TW I786954B
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- nitrous oxide
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- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 title claims abstract description 134
- 239000001272 nitrous oxide Substances 0.000 title claims abstract description 64
- 238000000034 method Methods 0.000 title claims abstract description 32
- 239000007789 gas Substances 0.000 claims abstract description 95
- 239000000428 dust Substances 0.000 claims abstract description 63
- 239000003054 catalyst Substances 0.000 claims abstract description 59
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 48
- 230000003647 oxidation Effects 0.000 claims abstract description 47
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000000835 fiber Substances 0.000 claims abstract description 18
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 10
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 3
- 238000010438 heat treatment Methods 0.000 claims description 32
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 12
- -1 iron-aluminum-titanium Chemical compound 0.000 claims description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 6
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 239000004408 titanium dioxide Substances 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 238000012545 processing Methods 0.000 abstract description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
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- 238000005979 thermal decomposition reaction Methods 0.000 description 2
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- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 241000178343 Butea superba Species 0.000 description 1
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- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
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- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 229910052750 molybdenum Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本發明是有關於一種處理製程機台的尾氣的技術,且特別是有關於一種同時去除易燃氣體與一氧化二氮的裝置與方法。The invention relates to a technology for treating tail gas of a process machine, and in particular relates to a device and method for simultaneously removing flammable gas and nitrous oxide.
2016年全球溫室氣體總排放量已高達500億公噸的碳當量(CO 2e),根據2018年美國環境保護暑公告的溫室氣體排放量統計顯示,一氧化二氮(N 2O)為排放第三大的溫室氣體。尤其,近年來半導體產業排放量最多的溫室氣體就是N 2O。 In 2016, the total global greenhouse gas emissions have reached 50 billion metric tons of carbon equivalent (CO 2 e). According to the statistics of greenhouse gas emissions in the 2018 U.S. Environmental Protection Summer Announcement, nitrous oxide (N 2 O) is the second largest emission. three major greenhouse gases. In particular, N 2 O is the greenhouse gas that has emitted the most in the semiconductor industry in recent years.
目前大多使用電熱水洗抑或燃燒水洗來處理主要含N 2O的製程尾氣,但是當N 2O經過高溫分解後會產生大量的空氣污染物NO X排放問題。此外,因為半導體製程中不只使用N 2O,還會伴隨著含矽磷砷硼等易燃性氣體一起使用,當這些易燃氣體經高溫氧化後會形成無機粉塵,而導致另類的細懸浮微粒(PM2.5)汙染。 At present, electric hot water washing or combustion water washing is mostly used to treat the process tail gas mainly containing N 2 O, but when N 2 O is decomposed by pyrolysis, a large amount of air pollutant NO X will be emitted. In addition, because N 2 O is not only used in the semiconductor manufacturing process, it is also used together with flammable gases such as silicon, phosphorus, arsenic, and boron. When these flammable gases are oxidized at high temperature, they will form inorganic dust, resulting in alternative fine suspended particles (PM2.5) pollution.
本發明提供一種同時去除易燃氣體與一氧化二氮的裝置,能處理N 2O濃度較高的氣體並且同時處理易燃氣體。 The invention provides a device for simultaneously removing flammable gas and nitrous oxide, which can process gas with a higher concentration of N 2 O and simultaneously process flammable gas.
本發明還提供一種同時去除易燃氣體與一氧化二氮的方法,能將N 2O分解為N 2與O 2達到零汙染排放,並防止易燃氣體經高溫氧化後產生的粉塵被排放到外界。 The present invention also provides a method for removing flammable gas and nitrous oxide at the same time, which can decompose N2O into N2 and O2 to achieve zero pollution discharge, and prevent the dust produced by high temperature oxidation of flammable gas from being discharged into outside world.
本發明的同時去除易燃氣體與一氧化二氮的裝置包括加熱氧化腔、耐高溫粉塵過濾器與觸媒槽。所述加熱氧化腔用以接收來自製程機台的尾氣。所述尾氣包含易燃氣體與一氧化二氮,其中加熱氧化腔具有第一排氣管,以排放一氧化二氮與尾氣經熱氧化後產生的粉塵。所述耐高溫粉塵過濾器接收來自第一排氣管的粉塵與一氧化二氮,其中耐高溫粉塵過濾器具有過濾纖維網及第二排氣管,所述第二排氣管用以排放一氧化二氮。所述觸媒槽接收來自第二排氣管的一氧化二氮,其中觸媒槽中具有一氧化二氮分解觸媒,以將一氧化二氮分解成氮氣(N 2)與氧氣(O 2)。 The device for simultaneously removing flammable gas and nitrous oxide of the present invention includes a heating oxidation chamber, a high temperature resistant dust filter and a catalyst tank. The heating and oxidation chamber is used to receive the exhaust gas from the processing equipment. The tail gas contains flammable gas and nitrous oxide, wherein the heating oxidation chamber has a first exhaust pipe to discharge nitrous oxide and dust generated by thermal oxidation of the tail gas. The high-temperature-resistant dust filter receives dust and nitrous oxide from the first exhaust pipe, wherein the high-temperature-resistant dust filter has a filter fiber net and a second exhaust pipe, and the second exhaust pipe is used to discharge nitrous oxide. Dinitrogen. The catalyst tank receives the nitrous oxide from the second exhaust pipe, wherein the catalyst tank has a nitrous oxide decomposition catalyst to decompose the nitrous oxide into nitrogen (N 2 ) and oxygen (O 2 ).
本發明的同時去除易燃氣體與一氧化二氮的方法是使用上述裝置,先用上述加熱氧化腔加熱來自製程機台的尾氣,其中所述尾氣包含易燃氣體與一氧化二氮,且所述易燃氣體經熱氧化成為粉塵。然後,使用上述耐高溫粉塵過濾器過濾來自加熱氧化腔的粉塵,再使用上述觸媒槽,將從耐高溫粉塵過濾器排放出的一氧化二氮分解成氮氣與氧氣。The method for simultaneously removing flammable gas and nitrous oxide of the present invention is to use the above-mentioned device, first use the above-mentioned heating and oxidation chamber to heat the tail gas from the process machine, wherein the tail gas contains flammable gas and nitrous oxide, and the The above-mentioned flammable gas is thermally oxidized into dust. Then, use the above-mentioned high-temperature-resistant dust filter to filter the dust from the heating oxidation chamber, and then use the above-mentioned catalyst tank to decompose the nitrous oxide discharged from the high-temperature-resistant dust filter into nitrogen and oxygen.
基於上述,根據本發明的裝置能夠先以加熱氧化腔處理含矽磷砷硼等易燃性氣體,再經由耐高溫粉塵過濾器濾除製程端與上述加熱氧化腔所產生的無機粉塵,最後,藉由含一氧化二氮分解觸媒的觸媒槽,將N 2O完全分解成氮氣與氧氣達到零汙染排放,以解決以往使用高溫熱分解法處理N 2O而產生大量NO X有害副產物的缺點,並且過濾其他製程氣體氧化形成的粉塵。 Based on the above, the device according to the present invention can first process flammable gases containing silicon, phosphorus, arsenic, and boron with a heating and oxidation chamber, and then filter out the inorganic dust generated by the process end and the above-mentioned heating and oxidation chamber through a high-temperature dust filter, and finally, With the catalyst tank containing nitrous oxide decomposition catalyst, N 2 O is completely decomposed into nitrogen and oxygen to achieve zero pollution emissions, so as to solve the harmful side effects of a large amount of NO x produced by the high-temperature thermal decomposition method in the past to treat N 2 O product defects, and filter the dust formed by the oxidation of other process gases.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail together with the accompanying drawings.
以下實施例中所附的圖式是為了能更完整地描述本發明的實施例,然而本發明仍可使用許多不同的形式來實施,不限於所記載的實施例。此外,為了清楚起見,各個裝置或管路的相對距離、尺寸及位置可能縮小或放大。The attached drawings in the following embodiments are for more complete description of the embodiments of the present invention, however, the present invention can still be implemented in many different forms, not limited to the described embodiments. In addition, the relative distances, sizes and positions of various devices or conduits may be reduced or exaggerated for clarity.
圖1是依照本發明的一實施例的一種同時去除易燃氣體與一氧化二氮的裝置示意圖。Fig. 1 is a schematic diagram of a device for simultaneously removing flammable gas and nitrous oxide according to an embodiment of the present invention.
請參照圖1,本實施例的裝置100基本包括加熱氧化腔102、耐高溫粉塵過濾器104與觸媒槽106。加熱氧化腔102用來接收來自製程機台(未繪示)的尾氣,其中尾氣可包含易燃氣體與一氧化二氮(nitrous oxide,N
2O)。加熱氧化腔102具有第一排氣管108,以排放N
2O與尾氣經熱氧化後產生的粉塵。
Referring to FIG. 1 , the
高溫粉塵過濾器104則是接收來自第一排氣管108的粉塵與N
2O,其中設置有可耐高溫的過濾纖維網112,所述耐高溫粉塵過濾器104的操作溫度從常溫至高溫,如在20°C~750°C之間。耐高溫粉塵過濾器104還具有第二排氣管110,以排放N
2O。如圖1所示,第一排氣管108連至耐高溫粉塵過濾器104的位置一般低於第二排氣管110的出口位置,可使第一排氣管108的粉塵與N
2O進入高溫粉塵過濾器104之後,粉塵受過濾纖維網112攔阻落在高溫粉塵過濾器104底部,而N
2O通過過濾纖維網112從上方的第二排氣管110排出。在一實施例中,過濾纖維網112的材料為耐高溫材料,不特別限定,例如可為陶瓷(Al
2O
3)纖維、聚四氟乙烯(PTFE)纖維、聚醯亞胺(PI)纖維、芳香族聚醯胺(Aramid)纖維、聚苯硫醚(PPS)纖維;過濾纖維網112具高孔隙率,舉例來說,當過濾纖維網的密度約0.4克/立方公分,陶瓷纖維直徑約2-3 μm,可濾除粒徑100nm-1000nm的粉塵。
The high-
觸媒槽106接收來自第二排氣管110的N
2O,且觸媒槽106中具有一氧化二氮分解觸媒(未繪示),能將N
2O分解成氮氣(N
2)與氧氣(O
2)。在一實施例中,觸媒槽106中係填充所述一氧化二氮分解觸媒顆粒,觸媒顆粒粒徑可介於2 mm ~ 5 mm,觸媒槽106中的孔隙率例如在60% ~ 70%。前述「孔隙率」的定義是在固定體積下,填充觸媒後的水重 / 未填充觸媒的水重×100%。觸媒粒徑或觸媒槽的孔隙率如果太小,不利於氣體通過,影響處理效率。在觸媒的材料方面,在一實施例中,一氧化二氮分解觸媒可為氧化鐵與氧化鋁複合觸媒,搭配的觸媒載體可為二氧化鈦,一般簡稱鐵鋁鈦觸媒,其中,氧化鐵與氧化鋁總莫耳數與二氧化鈦莫耳數的比為3.5: 1至2.5:1,氧化鐵與氧化鋁的莫耳比可例如為2.5:1至1.5:1。然而,本發明並不限於此,上述一氧化二氮分解觸媒也可包含鉑(Pt)、鈀(Pd)、銠(Rh)、銅(Cu)、鎳(Ni)、鈷(Co)、錳(Mn)、銀(Ag)、鉬(Mo)、鎢(W)、釩(V)、鑭(La)等金屬元素。不過,相較於貴金屬元素,採用鐵鋁鈦觸媒可大幅降低處理成本。觸媒槽106還可包括第三排氣管114,用以輸出分解後的N
2與O
2。
The
請繼續參照圖1,本實施例的裝置100還可設置第一幫浦116,來增加尾氣進入加熱氧化腔102的壓力,例如將第一幫浦116連到尾氣的輸入管118。而在第三排氣管114處也可設置第二幫浦120,用以向第三排氣管114提供負壓,有助於觸媒槽106內氣體的流動。而且,為了即時偵測各個設備的效果,可在第一排氣管108增設採樣孔122a、在第二排氣管110增設採樣孔122b、在第三排氣管114增設採樣孔122c、在尾氣的輸入管118增設採樣孔122d。採樣孔122a可用來採樣並檢測氣體(易燃氣體與N
2O)濃度,以確認易燃氣體是否被氧化去除。採樣孔122b可用來採樣並檢測粉塵是否被濾掉,如果粉塵含量超過預設值,則須更換過濾纖維網112。採樣孔122c可用來採樣並檢測N
2O是否被完全分解成N
2與O
2,如果N
2O處理效率< 90%時,需更換觸媒、檢修或更換裝置100。採樣孔122d可用來採樣並檢測尾氣中的氣體(易燃氣體與N
2O)濃度作為初始值。
Please continue to refer to FIG. 1 , the
圖2是依照本發明的另一實施例的一種同時去除易燃氣體與一氧化二氮的步驟圖。FIG. 2 is a step diagram of simultaneously removing flammable gas and nitrous oxide according to another embodiment of the present invention.
請參照圖2,本實施例是使用上一實施例的裝置100。首先進行步驟200,先用上述加熱氧化腔(如圖1的102)加熱來自製程機台的尾氣,例如半導體製程機台,其中尾氣包含易燃氣體與N
2O,且易燃氣體會經熱氧化成為粉塵,其中所述熱氧化的溫度例如在450℃~750℃之間。所述易燃氣體包括含矽、磷、砷與硼中至少一種組成的氣體,例如SiH
4、Si
2H
6、PH
3、AsH
3或B
2H
6。在使用加熱氧化腔加熱來自製程機台的尾氣之前,還可先使用第一幫浦(如圖1的116)通入氮氣,以對所述尾氣加壓,其中氮氣的流量可控制在500 LPM以下,有利於進入後端觸媒槽(如圖1的106)的N
2O的反應。由於進入加熱氧化腔(如圖1的102)的流量與壓力相關,所以加熱氧化腔(如圖1的102)的壓力可控制在650 torr~750 torr之間。
Please refer to FIG. 2 , this embodiment uses the
然後,進行步驟202,使用耐高溫粉塵過濾器(如圖1的104)過濾來自加熱氧化腔(如圖1的102)的粉塵。在此道步驟202中不需要特別控制溫度或流量,進入耐高溫粉塵過濾器(如圖1的104)的氣體自然能經由過濾纖維網(如圖1的112)進入第二排氣管(如圖1的110)。Then, proceed to
接著,進行步驟204,使用上述觸媒槽(如圖1的106)將從耐高溫粉塵過濾器(如圖1的104)排放出的N
2O分解成N
2與O
2。所述觸媒槽(如圖1的106)的工作溫度例如在450°C ~ 600°C之間。由於本發明的裝置是將熱氧化易燃氣體的設備與分解一氧化二氮的設備整合在一起,並在兩者之間加設過濾器,所以能夠連續地處理製程的尾氣,具有節省處理時間與提高去除效率的功效。
Next, step 204 is performed, using the catalyst tank (
以下列舉實驗來驗證本發明的功效,但本發明並不侷限於以下的內容。The following experiments are listed to verify the efficacy of the present invention, but the present invention is not limited to the following content.
〈實驗例1〉<Experimental Example 1>
半導體廠所使用含矽磷砷硼等易燃氣體中,以SiH 4的用量最大,且這些易燃氣體在溫度500 °C時,皆可斷鍵分解,故實驗例1中使用SiH 4作為測試氣體。 Among the flammable gases containing silicon, phosphorus, arsenic, and boron used in semiconductor factories, SiH 4 is used in the largest amount, and these flammable gases can break bonds and decompose at a temperature of 500 °C, so SiH 4 was used as a test in Experimental Example 1. gas.
首先,設置如圖3所示的檢測設備以電熱或燃燒加熱體積約1900 L之腔體至500℃,然後利用質量流量控制器(MFC)通入純SiH 4,經不同流量的純N 2稀釋再通過加熱氧化腔處理,利用傅立葉轉換紅外光譜分析儀(FTIR)分析加熱氧化腔前後端的SiH 4濃度並計算破壞去除效率(Destruction and Removal Efficiency,DRE)。實驗結果顯示於下表1與圖4。 First, set up the detection equipment as shown in Figure 3 to heat the chamber with a volume of about 1900 L to 500°C by electric heating or combustion, and then use a mass flow controller (MFC) to feed pure SiH 4 and dilute it with different flows of pure N 2 After treatment in the heating oxidation chamber, use Fourier transform infrared spectroscopy (FTIR) to analyze the concentration of SiH 4 at the front and rear ends of the heating oxidation chamber and calculate the destruction removal efficiency (Destruction and Removal Efficiency, DRE). The experimental results are shown in Table 1 and FIG. 4 below.
表1
從圖4與表1可得到,本發明的裝置的加熱氧化腔能有效去除SiH 4,使其氧化成為氧化矽。而且,流量越低,代表進入加熱氧化腔的SiH 4越濃,DRE越高。 It can be seen from FIG. 4 and Table 1 that the heated oxidation chamber of the device of the present invention can effectively remove SiH 4 and oxidize it into silicon oxide. Moreover, the lower the flow rate, the more concentrated the SiH 4 entering the heated oxidation chamber, and the higher the DRE.
〈實驗例2〉<Experimental Example 2>
SiH 4經由高溫氧化後所產生粉末狀的SiO 2粒徑峰值大約在200 nm~300 nm,且過濾溫度越高,其過濾效果越好,故本實驗以粒徑約200 nm之SiO 2於常溫下進行過濾實驗,測試耐高溫粉塵過濾器的過濾效果。 The peak particle size of powdered SiO 2 produced by SiH 4 after high-temperature oxidation is about 200 nm~300 nm, and the higher the filtration temperature, the better the filtering effect. Therefore, in this experiment, SiO 2 with a particle size of about 200 nm was used at room temperature The filtration experiment is carried out to test the filtration effect of the high temperature resistant dust filter.
首先,設置如圖5所示的檢測設備,在45 L之耐高溫粉塵過濾器中架設1支陶瓷過濾器,可以處理的氣體流量為350 LPM以下,然後在氣流中以PALAS(粉塵氣溶膠發生器)等速添加200 nm之SiO 2粉末,採樣並測量耐高溫粉塵過濾器出入口端的粉塵濃度,計算其粉塵去除效率(Particle Removal Efficiency,PRE)。實驗結果顯示於下表2。 First, set up the detection equipment as shown in Figure 5, set up a ceramic filter in the 45 L high temperature resistant dust filter, the gas flow rate that can be processed is below 350 LPM, and then use PALAS (dust aerosol generation Add 200 nm SiO 2 powder at constant speed, sample and measure the dust concentration at the inlet and outlet of the high temperature dust filter, and calculate its dust removal efficiency (Particle Removal Efficiency, PRE). The experimental results are shown in Table 2 below.
表2
從表2可得到,本發明的裝置的耐高溫粉塵過濾器,即使在常溫也有高達97%以上的PRE。因此,在接收來自加熱氧化腔的粉塵時不需特別控制耐高溫粉塵過濾器中的溫度,即可達到有效過濾的結果。It can be obtained from Table 2 that the high temperature resistant dust filter of the device of the present invention has a PRE up to more than 97% even at normal temperature. Therefore, effective filtration can be achieved without special control of the temperature in the high-temperature-resistant dust filter when receiving dust from the heating oxidation chamber.
〈實驗例3〉<Experimental example 3>
為了模擬半導體廠真實製程N 2O尾氣濃度,故本實驗以鐵鋁鈦觸媒進行分解濃度約20%的N 2O實驗。 In order to simulate the concentration of N 2 O tail gas in the real process of semiconductor factories, this experiment uses iron-aluminum-titanium catalysts to decompose N 2 O with a concentration of about 20%.
首先,設置如圖6所示的檢測設備,觸媒槽體積約20 ml,其中填充有鐵鋁鈦觸媒顆粒,顆粒粒徑介於2 mm ~ 5 mm,且觸媒槽中的孔隙率約為62%;鐵鋁鈦觸媒中的氧化鐵與氧化鋁總莫耳數與二氧化鈦莫耳數的比約為3:1,氧化鐵與氧化鋁的莫耳比約為2:1。然後以下列條件進行測試。 1. 入口端N 2O濃度:~ 20% 2. 氣體流量:648.2 sccm (129.9 sccm N 2O、518.3 sccm N 2) 3. 反應溫度:500 °C 4. GHSV:1944.6 h -1(滯留時間~1.9秒) 5. 線速度:10.2 cm/s First, set up the detection equipment as shown in Figure 6. The volume of the catalyst tank is about 20 ml, which is filled with iron-aluminum-titanium catalyst particles, the particle size is between 2 mm and 5 mm, and the porosity in the catalyst tank is about The molar ratio of iron oxide and aluminum oxide in the iron-aluminum-titanium catalyst to the total molar number of titanium dioxide is about 3:1, and the molar ratio of iron oxide and aluminum oxide is about 2:1. Then test with the following conditions. 1. N 2 O concentration at inlet: ~ 20% 2. Gas flow: 648.2 sccm (129.9 sccm N 2 O, 518.3 sccm N 2 ) 3. Reaction temperature: 500 °C 4. GHSV: 1944.6 h -1 (residence time ~1.9 seconds) 5. Line speed: 10.2 cm/s
測量N 2O觸媒腔出口端的N 2O濃度大約7837 ppm,可計算得到DRE= 96.1%( )。而且,並未測到NO與NO 2。 Measure the N 2 O concentration at the outlet of the N 2 O catalyst chamber to be about 7837 ppm, and it can be calculated that DRE= 96.1% ( ). Also, NO and NO 2 were not detected.
綜上所述,本發明的裝置是由連續連接的加熱氧化腔、耐高溫粉塵過濾器以及觸媒槽組成,所以能夠先利用加熱氧化腔處理含矽磷砷硼等易燃性氣體,再經由耐高溫粉塵過濾器濾除製程端與上述加熱氧化腔所產生的粉塵,最後藉由觸媒槽將N 2O完全分解成氮氣與氧氣,以達到零汙染排放的結果並且可解決傳統使用高溫熱分解法處理N 2O而產生大量NO X有害副產物的問題,同時可處理掉其他製程中的易燃氣體。 In summary, the device of the present invention is composed of a continuously connected heating and oxidation chamber, a high temperature resistant dust filter and a catalyst tank, so the heating and oxidation chamber can be used to treat flammable gases such as silicon, phosphorus, arsenic and boron, and then through The high-temperature resistant dust filter filters out the dust generated by the process end and the above-mentioned heating and oxidation chamber, and finally uses the catalyst tank to completely decompose N 2 O into nitrogen and oxygen, so as to achieve the result of zero pollution emission and solve the problem of traditional high temperature The problem of producing a large amount of harmful by-products of NO x in the treatment of N 2 O by thermal decomposition can also be used to deal with flammable gases in other processes.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above with the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field may make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention should be defined by the scope of the appended patent application.
100:裝置
102:加熱氧化腔
104:耐高溫粉塵過濾器
106:觸媒槽
108:第一排氣管
110:第二排氣管
112:過濾纖維網
114:第三排氣管
116:第一幫浦
118:輸入管
120:第二幫浦
122a、122b、122c、122d:採樣孔
200、202、204:步驟
MFC:質量流量控制器
FTIR:傅立葉轉換紅外光譜分析儀100: device
102: heating oxidation chamber
104: High temperature resistant dust filter
106: Catalyst tank
108: The first exhaust pipe
110: Second exhaust pipe
112: Filtration fiber net
114: The third exhaust pipe
116: The first pump
118: input tube
120:
圖1是依照本發明的一實施例的一種同時去除易燃氣體與一氧化二氮的裝置示意圖。 圖2是依照本發明的另一實施例的一種同時去除易燃氣體與一氧化二氮的步驟圖。 圖3是實驗例1的加熱氧化腔的檢測設備示意圖。 圖4是實驗例1的SiH 4濃度隨時間變化的曲線圖。 圖5是實驗例2的耐高溫粉塵過濾器的檢測設備示意圖。 圖6是實驗例3的觸媒槽的檢測設備示意圖。 Fig. 1 is a schematic diagram of a device for simultaneously removing flammable gas and nitrous oxide according to an embodiment of the present invention. FIG. 2 is a step diagram of simultaneously removing flammable gas and nitrous oxide according to another embodiment of the present invention. FIG. 3 is a schematic diagram of detection equipment for the heating and oxidation chamber of Experimental Example 1. FIG. Fig. 4 is a graph showing the change of SiH 4 concentration with time in Experimental Example 1. FIG. 5 is a schematic diagram of testing equipment for the high-temperature-resistant dust filter of Experimental Example 2. FIG. FIG. 6 is a schematic diagram of detection equipment for the catalyst tank of Experimental Example 3. FIG.
100:裝置 100: device
102:加熱氧化腔 102: heating oxidation chamber
104:耐高溫粉塵過濾器 104: High temperature resistant dust filter
106:觸媒槽 106: Catalyst tank
108:第一排氣管 108: The first exhaust pipe
110:第二排氣管 110: Second exhaust pipe
112:過濾纖維網 112: Filtration fiber net
114:第三排氣管 114: The third exhaust pipe
116:第一幫浦 116: The first pump
118:輸入管 118: input tube
120:第二幫浦 120:Second pump
122a、122b、122c、122d:採樣孔 122a, 122b, 122c, 122d: sampling holes
Claims (17)
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US17/564,228 US11633695B1 (en) | 2021-11-22 | 2021-12-29 | Device and method of simultaneously removing flammable gases and nitrous oxide |
CN202210135092.9A CN116139612A (en) | 2021-11-22 | 2022-02-14 | Device and method for simultaneously removing inflammable gas and nitrous oxide |
JP2022153191A JP7369842B2 (en) | 2021-11-22 | 2022-09-27 | Apparatus and method for simultaneously removing flammable gas and nitrous oxide |
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