TWI784485B - High accuracy die bonding system, alignment system and method thereof - Google Patents

High accuracy die bonding system, alignment system and method thereof Download PDF

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TWI784485B
TWI784485B TW110113869A TW110113869A TWI784485B TW I784485 B TWI784485 B TW I784485B TW 110113869 A TW110113869 A TW 110113869A TW 110113869 A TW110113869 A TW 110113869A TW I784485 B TWI784485 B TW I784485B
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die
unit
bonding
platform
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TW110113869A
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TW202243165A (en
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石敦智
黃良印
語尚 林
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均華精密工業股份有限公司
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Priority to CN202111320271.1A priority patent/CN115223903A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67121Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

A high accuracy die bonding system comprises: a supply unit providing at least one die; a receiving unit neighbored to the supply unit; a relay unit located between the supply unit and the receiving unit; a suction unit installed above the supply unit, the suction unit placed at least one die on the relay unit; a first bonding unit installed above the receiving unit; and a second bonding unit installed above the receiving unit; wherein, the first bonding unit or the second bonding unit places at least one die located in the relay unit in the receiving unit. An alignment system is disclosed. A high accuracy die bonding method is also disclosed.

Description

高精度黏晶系統、對位系統及其方法High precision die bonding system, alignment system and method thereof

一種高精度黏晶系統、對位系統及其方法,尤指一種能夠提升潔淨度與黏晶精度的系統與方法。 A high-precision die bonding system, alignment system and method thereof, especially a system and method capable of improving cleanliness and die bonding precision.

現有的黏晶技術係利用真空吸取裝置吸取至少一晶粒,再將所吸取的晶粒移動至一所欲黏合的位置處,如晶圓、晶粒、載板。真空吸取裝置再將晶粒黏合於所欲黏合的位置處。 The existing die bonding technology uses a vacuum suction device to suck at least one die, and then moves the sucked die to a desired bonding position, such as a wafer, a die, and a carrier. The vacuum suction device then bonds the die to the desired bonding position.

然真空吸取裝置係於吸取晶粒處至所欲黏合的位置處進行長距離的位移。對於要求潔淨度的黏晶製程而言,該長距離的位移會因裝置與裝置之間的摩擦而產生有微塵,該微塵恐會損及潔淨度。 However, the vacuum suction device performs a long-distance displacement from the position where the crystal grain is sucked to the position to be bonded. For the die-bonding process that requires cleanliness, the long-distance displacement will generate fine dust due to friction between devices, and the fine dust may damage the cleanliness.

如上所述,如何提升潔淨度,或者縮短真空吸取裝置的移動距離,或者改變真空吸取裝置的位置,其就有可改善的空間。 As mentioned above, how to improve the cleanliness, or shorten the moving distance of the vacuum suction device, or change the position of the vacuum suction device, there is room for improvement.

有鑑於此,本發明主要目的在於,提出一種本發明提出一種高精度黏晶系統、對位系統及其方法,其係避免系統的位移裝置於晶圓或晶粒上方動作,藉以提升潔淨度的目的。 In view of this, the main purpose of the present invention is to propose a high-precision die-bonding system, alignment system and method thereof, which prevent the displacement device of the system from moving above the wafer or die, thereby improving cleanliness Purpose.

本發明為達成上述目的提供一種高精度黏晶系統,包括:一供應單元,用來設置一晶粒;一承接單元,相鄰於該供應單元;一中繼單元,設於該供應單元與該承接單元之間;一吸取單元,設於該供應單元的上方,該吸取單元將該晶粒放置於該中繼單元;以及一黏 合總成,設於該承接單元的上方;其中,該黏合總成係將位於該中繼單元之該晶粒放置於該承接單元。 To achieve the above object, the present invention provides a high-precision die bonding system, including: a supply unit for setting a die; a receiving unit adjacent to the supply unit; a relay unit arranged between the supply unit and the supply unit Between the receiving units; a suction unit, arranged above the supply unit, the suction unit places the die on the relay unit; and an adhesive An assembly is arranged above the receiving unit; wherein, the bonding assembly places the die located in the relay unit on the receiving unit.

綜合上述,本發明之高精度黏晶系統及其方法,其係將系統的位移裝置設於供應單元或承接單元的非正上方或下方,故第一中繼台或第二中繼台移動時,其所可能產生的微塵係無法掉落於供應單元或承接單元,藉以提升潔淨度。至於真空模組,由於只有上下的運動,並無側向移位運動或僅微小的向移位,只要以隔離板做適當隔離,即可防止微塵由上方掉落至承接單元。 To sum up the above, the high-precision die bonding system and method of the present invention set the displacement device of the system not directly above or below the supply unit or the receiving unit, so when the first relay station or the second relay station moves , the dust that may be generated cannot fall on the supply unit or the receiving unit, so as to improve the cleanliness. As for the vacuum module, since it only moves up and down, there is no lateral displacement or only a slight displacement. As long as the isolation plate is properly isolated, dust can be prevented from falling from above to the receiving unit.

10、10A、10B:供應單元 10, 10A, 10B: supply unit

100、100A:供應台 100, 100A: supply table

101、101A:頂針 101, 101A: thimble

11、11A、11B:吸取單元 11, 11A, 11B: suction unit

110、110A、110B:真空模組 110, 110A, 110B: vacuum module

111、111A、111B:吸取位移模組 111, 111A, 111B: absorption displacement module

12、12A、12B:承接單元 12, 12A, 12B: receiving unit

120:承台 120: platform

13、13A、13B:中繼單元 13, 13A, 13B: relay unit

130、130A、130B:位移模組 130, 130A, 130B: displacement module

131、131A、131B:第一中繼台 131, 131A, 131B: the first relay station

132、132B:第二中繼台 132, 132B: the second relay station

14、14A、14B:第一黏合單元 14, 14A, 14B: the first bonding unit

140、140A:第一真空模組 140, 140A: the first vacuum module

141:第一透明模組 141: The first transparent module

15、15A、15B:第二黏合單元 15, 15A, 15B: the second bonding unit

150、150A:第二真空模組 150, 150A: Second vacuum module

151:第二透明模組 151:Second transparent module

154:隔離板 154: Isolation board

16、16A、16B:第一上視覺單元 16, 16A, 16B: the first upper visual unit

17、17A、17B:第二上視覺單元 17, 17A, 17B: the second upper visual unit

18、18A、18B:第三上視覺單元 18, 18A, 18B: the third upper visual unit

19、19A、19B:下視覺單元 19, 19A, 19B: lower visual unit

20、20A、20B、30:晶粒 20, 20A, 20B, 30: grain

200、300:晶粒記號 200, 300: Grain mark

301:透明區 301: transparent area

21、31:欲黏合件 21, 31: parts to be bonded

210、310:黏合記號 210, 310: Adhesive mark

S1~S7:步驟 S1~S7: steps

40:上視覺單元 40: Upper Vision Unit

41:黏合單元 41: Bonding unit

410:真空模組 410: Vacuum module

411:透明模組 411: Transparent module

42:承接單元 42: Undertaking unit

420:承台 420: platform

43:下視覺單元 43: Lower visual unit

第1圖為本發明第一實施例之一種高精度黏晶系統之示意圖。 Fig. 1 is a schematic diagram of a high-precision die-bonding system according to the first embodiment of the present invention.

第2圖為本發明第一實施例之一種高精度黏晶系統之局部示意圖。 Fig. 2 is a partial schematic diagram of a high-precision die-bonding system according to the first embodiment of the present invention.

第3圖為本發明第二實施例之一種高精度黏晶方法之流程示意圖。 FIG. 3 is a schematic flow chart of a high-precision die-bonding method according to the second embodiment of the present invention.

第4圖為一黏合記號與一晶粒記號之對位示意圖。 FIG. 4 is a schematic diagram of alignment between an adhesive mark and a die mark.

第5圖為本發明第三實施例之一種高精度黏晶系統之示意圖。 Fig. 5 is a schematic diagram of a high-precision die-bonding system according to the third embodiment of the present invention.

第6圖為本發明第三實施例之一種高精度黏晶系統之局部示意圖。 Fig. 6 is a partial schematic diagram of a high-precision die-bonding system according to the third embodiment of the present invention.

第7圖為本發明第四實施例之一種高精度黏晶系統之示意圖。 Fig. 7 is a schematic diagram of a high-precision die-bonding system according to the fourth embodiment of the present invention.

第8圖為本發明第四實施例之一種高精度黏晶系統之局部示意圖。 Fig. 8 is a partial schematic diagram of a high-precision die-bonding system according to the fourth embodiment of the present invention.

第9圖為本發明第五實施例之一種用於高精度黏晶之對位系統。 Fig. 9 is an alignment system for high-precision die bonding according to the fifth embodiment of the present invention.

本發明第一實施例係一種高精度黏晶系統,如第1圖與第2圖所示,高精度黏晶系統具有一供應單元10、一吸取單元11、一承接單元12、一中繼單元13、一黏合總成、一第一上視覺單元16、一第二上視覺單元17、一第三上視覺單元18與一下視覺單元19。 The first embodiment of the present invention is a high-precision die-bonding system. As shown in Figures 1 and 2, the high-precision die-bonding system has a supply unit 10, a suction unit 11, a receiving unit 12, and a relay unit. 13. A bonding assembly, a first upper visual unit 16 , a second upper visual unit 17 , a third upper visual unit 18 and a lower visual unit 19 .

供應單元10具有一供應台100與至少一頂針101。供應台100用來設置至少一晶粒20。頂針101係設於供應台100的下方,頂針101可為單一或複數個。若為單一頂針101,頂針101係頂出設置於供應台100的單一晶粒20。若為複數個頂針101,頂針101係頂出設於供應台100的複數個晶粒20。該供應台100可進行一橫向移動、一前後移動或一橫向與前後移動。 The supply unit 10 has a supply table 100 and at least one ejector pin 101 . The supply table 100 is used for disposing at least one die 20 . The thimble 101 is arranged under the supply table 100, and the thimble 101 can be single or plural. If it is a single ejector pin 101 , the ejector pin 101 ejects a single die 20 disposed on the supply table 100 . If there are a plurality of ejector pins 101 , the ejector pins 101 eject a plurality of dies 20 provided on the supply table 100 . The supply table 100 can perform a lateral movement, a forward and backward movement, or a lateral and forward and backward movement.

吸取單元11具有至少一真空模組110與一吸取位移模組111。真空模組110係設於吸取位移模組111的一側,並且位於供應單元10的上方。吸取位移模組111可進行一橫向移動、一前後移動或一縱向移動。 The suction unit 11 has at least one vacuum module 110 and one suction displacement module 111 . The vacuum module 110 is disposed on one side of the suction displacement module 111 and above the supply unit 10 . The suction displacement module 111 can perform a horizontal movement, a forward and backward movement or a longitudinal movement.

承接單元12係相鄰於供應單元10。承接單元12具有一承台120,承台120可為透明或部份透明以利影像的穿透與擷取。承台120可進行一橫向移動、一前後移動或一橫向與前後移動。承台120係供一欲黏合件21設置,該欲黏合件21為透明,並具有黏合記號210。該欲黏合件21為晶圓、晶粒、載板。 The receiving unit 12 is adjacent to the supply unit 10 . The receiving unit 12 has a platform 120, and the platform 120 can be transparent or partially transparent to facilitate penetration and capture of images. The platform 120 can perform a lateral movement, a forward and backward movement, or a lateral and forward and backward movement. The supporting platform 120 is provided with a to-be-adhesive part 21 , and the to-be-bonded part 21 is transparent and has an adhesive mark 210 . The object to be bonded 21 is a wafer, a die, or a carrier.

中繼單元13係位於供應單元10與承接單元12之間。中繼單元具有一位移模組130、一第一中繼台131與一第二中繼台132。第一中繼台131與第二中繼台132係設於位移模組130的兩相對端。於本實施例之中繼單元13為一雙翼設計。該位移模組130可進行一前後移動、一橫向移動或一旋轉移動。第一中繼台131與第二中繼台132係呈一平行排列。 The relay unit 13 is located between the supply unit 10 and the receiving unit 12 . The relay unit has a displacement module 130 , a first relay station 131 and a second relay station 132 . The first relay station 131 and the second relay station 132 are disposed at two opposite ends of the displacement module 130 . In this embodiment, the relay unit 13 is a double-wing design. The displacement module 130 can perform a forward and backward movement, a lateral movement or a rotational movement. The first relay station 131 and the second relay station 132 are arranged in parallel.

黏合總成包含有一第一黏合單元14與第二黏合單元15。第一黏合單元14係位於承接單元12的上方。第一黏合單元14具有至少一第 一真空模組140。第一真空模組140具有一第一透明模組141。第一透明模組141可為一透明體或一穿孔。 The bonding assembly includes a first bonding unit 14 and a second bonding unit 15 . The first bonding unit 14 is located above the receiving unit 12 . The first bonding unit 14 has at least one first A vacuum module 140 . The first vacuum module 140 has a first transparent module 141 . The first transparent module 141 can be a transparent body or a perforation.

第二黏合單元15係位於承接單元12的上方,並且相鄰於第一黏合單元14。第二黏合單元15具有至少一第二真空模組150。第二真空模組150具有至少一第二透明模組151。第二透明模組151可為一透明體或一穿孔。本發明之黏合總成的第一黏合單元14與第二黏合單元是15不動或不做大行程移動,可裝置隔離板154,故可減少污染。 The second bonding unit 15 is located above the receiving unit 12 and adjacent to the first bonding unit 14 . The second bonding unit 15 has at least one second vacuum module 150 . The second vacuum module 150 has at least one second transparent module 151 . The second transparent module 151 can be a transparent body or a perforation. The first bonding unit 14 and the second bonding unit 15 of the bonding assembly of the present invention are fixed or do not move in a large stroke, and the isolation plate 154 can be installed, so pollution can be reduced.

第一上視覺單元16係設於吸取單元11與供應台100的上方。若更進一步論述,第一上視覺單元16係位於真空模組110的上方。第一上視覺單元16可具有至少一視覺模組。 The first upper vision unit 16 is disposed above the suction unit 11 and the supply table 100 . If discussed further, the first upper vision unit 16 is located above the vacuum module 110 . The first upper visual unit 16 can have at least one visual module.

第二上視覺單元17係設於中繼單元13的上方。若更進一步論述,第二上視覺單元17係位於第一中繼台131或第二中繼台132的上方,並且相鄰於供應單元10。第二上視覺單元17可具有至少一視覺模組。 The second upper vision unit 17 is disposed above the relay unit 13 . To discuss further, the second upper vision unit 17 is located above the first relay station 131 or the second relay station 132 and adjacent to the supply unit 10 . The second upper visual unit 17 can have at least one visual module.

第三上視覺單元18係位於第一黏合單元14與第二黏合單元15的上方。第三上視覺單元18具有至少一視覺模組,各視覺模組係位於第二真空模組150或第一真空模組140的上方。 The third upper visual unit 18 is located above the first bonding unit 14 and the second bonding unit 15 . The third upper vision unit 18 has at least one vision module, and each vision module is located above the second vacuum module 150 or the first vacuum module 140 .

下視覺單元19係位於承接單元12的下方。若更進一步論述,下視覺單元19具有至少一視覺模組。下視覺單元19係位於承台120的下方。若第一上視覺單元16、第二上視覺單元17、第三上視覺單元18與下視覺單元19使用紅外線感測相機,晶粒與欲黏合件不一定要有透明區,只要是矽材質或是紅外線可以穿透的材料,一樣可以取像與對位。 The lower vision unit 19 is located below the receiving unit 12 . If discussed further, the lower visual unit 19 has at least one visual module. The lower vision unit 19 is located below the platform 120 . If the first upper vision unit 16, the second upper vision unit 17, the third upper vision unit 18, and the lower vision unit 19 use infrared sensing cameras, the die and the parts to be bonded do not necessarily have transparent areas, as long as they are made of silicon or It is a material that can penetrate infrared rays, and it can also be used for imaging and alignment.

本發明第二實施例係一種高精度黏晶方法,如第3圖所示。 The second embodiment of the present invention is a high-precision die bonding method, as shown in FIG. 3 .

步驟S1,提供至少一晶粒。如第1圖與第2圖所示,頂針101頂出位於供應台100所欲頂出之晶粒20。第一上視覺單元16係擷取被頂出之晶粒20的影像資訊,並將該影像資訊傳送給吸取單元20。吸取單元11之真空模組110依據影像資訊,以吸取晶粒20。真空模組110係吸取至少一晶粒20或複數個晶粒20。 Step S1, providing at least one die. As shown in FIG. 1 and FIG. 2 , the ejector pin 101 ejects the die 20 to be ejected from the supply table 100 . The first upper vision unit 16 captures the image information of the ejected die 20 and sends the image information to the suction unit 20 . The vacuum module 110 of the suction unit 11 sucks the die 20 according to the image information. The vacuum module 110 sucks at least one die 20 or a plurality of dies 20 .

若更進一步論述,供應單元10之供應台100係進行一前後位移、一橫向位移或一橫向與前後移動,以將欲被吸取之晶粒20移動至真空模組110的下方。 To discuss further, the supply table 100 of the supply unit 10 performs a forward-backward displacement, a lateral displacement, or a lateral and forward-backward movement, so as to move the die 20 to be sucked to the bottom of the vacuum module 110 .

待欲被吸取之晶粒20移動真空模組110的下方後,第一上視覺單元16係擷取所欲頂出之晶粒20的影像資訊,頂針101依據該影像資訊,以頂出晶粒20。 After the die 20 to be sucked moves below the vacuum module 110, the first upper vision unit 16 captures the image information of the die 20 to be ejected, and the ejector pin 101 ejects the die according to the image information 20.

第一上視覺單元16係擷取被頂出之晶粒20的影像資訊,並將該影像資訊傳送給吸取單元20。吸取單元11之真空模組110依據影像資訊,以吸取晶粒20。 The first upper vision unit 16 captures the image information of the ejected die 20 and sends the image information to the suction unit 20 . The vacuum module 110 of the suction unit 11 sucks the die 20 according to the image information.

步驟S2,將至少一晶粒轉移至一中繼單元。吸取位移模組111係將吸取有晶粒20之真空模組110移動至中繼單元13之第一中繼台131的上方。 Step S2, transferring at least one die to a relay unit. The suction displacement module 111 moves the vacuum module 110 with the die 20 sucked to the top of the first relay platform 131 of the relay unit 13 .

第二上視覺單元17係擷取晶粒20與中繼單元13之第一中繼台131的影像資訊,並將影像資訊傳送給吸取單元11,以使真空模組110將晶粒20放置於第一中繼台131。 The second upper vision unit 17 captures the image information of the die 20 and the first relay station 131 of the relay unit 13, and transmits the image information to the suction unit 11, so that the vacuum module 110 places the die 20 on the The first relay station 131.

待真空模組110將晶粒20放置於第一中繼台131後,吸取位移模組111係將真空模組110移回至最初位置,以再次吸取晶粒20。 After the vacuum module 110 places the die 20 on the first relay station 131 , the suction displacement module 111 moves the vacuum module 110 back to the original position to suck the die 20 again.

位移模組130係進行一旋轉動作,以使第一中繼台131被轉動至承台120的上方,以及第二中繼台132被轉動至供應台100的上方。位移模組130再將第一中繼台131移動至第一黏合單元14的下方。 The displacement module 130 performs a rotation action, so that the first relay platform 131 is rotated to the top of the platform 120 , and the second relay platform 132 is rotated to the top of the supply platform 100 . The displacement module 130 then moves the first relay platform 131 to the bottom of the first bonding unit 14 .

步驟S3,對位至少一晶粒與承接單元之位置。第三上視覺單元18係擷取晶粒20之影像資訊,並將該影像資訊提供給第一黏合單元14,以使第一真空模組140吸取位於第一中繼台131之晶粒20。 Step S3, aligning the position of at least one die and the receiving unit. The third upper vision unit 18 captures the image information of the die 20 and provides the image information to the first bonding unit 14 so that the first vacuum module 140 absorbs the die 20 located on the first relay station 131 .

待第一真空模組140係吸取晶粒20後,承台120係對第一真空模組120進行一位置調整,以使承台120之欲黏合件21可移動至所欲放置晶粒20的位置。該位置調整為橫向位移、一前後位移或一橫向與前後位移。 After the first vacuum module 140 absorbs the die 20, the support platform 120 adjusts the position of the first vacuum module 120 so that the desired bonding member 21 of the support platform 120 can be moved to where the die 20 is to be placed. Location. The position adjustment is a lateral displacement, a front-rear displacement or a lateral and front-rear displacement.

待承台120停止移動後,請配合參考第4圖所示,第三上視覺單元18係透過第一透明模組141,以擷取位於晶粒20之晶粒記號200與欲黏合件21之黏合記號210的上影像資訊。 After the platform 120 stops moving, please refer to FIG. 4 , the third upper vision unit 18 passes through the first transparent module 141 to capture the die mark 200 located on the die 20 and the part 21 to be bonded. The upper image information of the adhesive mark 210 .

下視覺單元19係透過承台120,以擷取黏合記號210與晶粒記號200的下影像資訊。該承台為透明或部分透明,以利影像的穿透與擷取。 The lower vision unit 19 captures the lower image information of the bonding mark 210 and the die mark 200 through the platform 120 . The platform is transparent or partially transparent to facilitate penetration and capture of images.

該上影像資訊與該下影像資訊係可判斷晶粒20是否位於承台120之所欲放置晶粒20的位置處。 The upper image information and the lower image information can determine whether the die 20 is located on the platform 120 where the die 20 is to be placed.

若為是,則至步驟S5。 If yes, go to step S5.

若為否,第一真空模組140係進行一位置調整,以使晶粒記號200對位黏合記號210。該位置調整可為一角度轉動、一軸向移動或一橫向移動。第三上視覺單元18係再次擷取上影像資訊,以及下視覺單元19係再次擷取下影像資訊,藉以判斷晶粒20是否位於承台120之所欲放置晶粒20的位置處。 If not, the first vacuum module 140 performs a position adjustment so that the die mark 200 is aligned with the bonding mark 210 . The position adjustment can be an angular rotation, an axial movement or a lateral movement. The third upper vision unit 18 captures the upper image information again, and the lower vision unit 19 captures the lower image information again, so as to determine whether the die 20 is located at the position where the die 20 is to be placed on the platform 120 .

若由再次擷取的上影像資訊的下影像資訊判讀出,晶粒記號200已對位黏合記號210,則至步驟S5。 If it is judged from the lower image information of the upper image information captured again that the die mark 200 has been aligned with the adhesive mark 210, then go to step S5.

步驟S4,再次提供至少一晶粒。供應單元10之供應台100係進行一橫向移動、一前後移動或一橫向與前後移動,以將欲被吸取之晶粒20移動至真空模組110的下方。 Step S4, providing at least one die again. The supply stage 100 of the supply unit 10 performs a lateral movement, a forward and backward movement, or a lateral and forward movement, so as to move the die 20 to be sucked to the bottom of the vacuum module 110 .

待欲被吸取之晶粒20移動真空模組110的下方後,第一上視覺單元16係擷取所欲頂出之晶粒20的影像資訊,頂針101依據該影像資訊,以再次頂出晶粒20。 After the die 20 to be sucked moves below the vacuum module 110, the first upper vision unit 16 captures the image information of the die 20 to be ejected, and the ejector pin 101 ejects the die again according to the image information. grain 20.

第一上視覺單元16係擷取被頂出之晶粒20的影像資訊,並將該影像資訊傳送給吸取單元20。吸取單元11之真空模組110依據影像資訊,以吸取晶粒20。 The first upper vision unit 16 captures the image information of the ejected die 20 and sends the image information to the suction unit 20 . The vacuum module 110 of the suction unit 11 sucks the die 20 according to the image information.

位移模組130將第二中繼台132動至吸取有晶粒20之真空模組110的下方。 The displacement module 130 moves the second relay table 132 to the lower part of the vacuum module 110 which has sucked the die 20 .

步驟S5,將至少一晶粒放置於承接單元。如步驟S3所述。第一黏合單元14之第一真空模組140係將所吸取之晶粒20放置於承接單元12之承台120的欲黏合件21。 Step S5, placing at least one die on the receiving unit. As described in step S3. The first vacuum module 140 of the first bonding unit 14 is used to place the picked-up die 20 on the platform 120 of the receiving unit 12 to be bonded.

步驟S6,再次將至少一晶粒轉移至中繼單元。如步驟S4所述,吸取單元11係將所吸取之晶粒20放置於第二中繼台132。 Step S6, transferring at least one die to the relay unit again. As described in step S4 , the pick-up unit 11 places the picked-up die 20 on the second relay station 132 .

步驟S7,再次對位至少一晶粒與承接單元之位置。第三上視覺單元18係擷取晶粒20之影像資訊,並將該影像資訊提供給第二黏合單元15,以使第二真空模組140吸取位於第二中繼台132之晶粒20。 Step S7, aligning the position of at least one die and the receiving unit again. The third upper vision unit 18 captures the image information of the die 20 and provides the image information to the second bonding unit 15 so that the second vacuum module 140 absorbs the die 20 located on the second relay station 132 .

待第二真空模組150係吸取晶粒20後,承台120係對第二真空模組150進行一位置調整,以使承台120可移動至所欲放置晶粒20 的位置。該位置調整可為一橫向移動、一前後移動或一橫向與前後移動。 After the second vacuum module 150 absorbs the die 20, the support platform 120 adjusts the position of the second vacuum module 150 so that the support platform 120 can move to the desired placement of the die 20 s position. The position adjustment can be a lateral movement, a forward and backward movement or a lateral and forward and backward movement.

待承台120移動至所欲放置晶粒20的位置後,第三上視覺單元18係透過第二黏合單元15之第二透明模組151,以擷取晶粒記號200與黏合記號210的上影像資訊。下視覺單元19係透過承台12,以擷取晶粒記號200與黏合記號210的下影像資訊。 After the stage 120 moves to the position where the die 20 is to be placed, the third upper vision unit 18 captures the upper part of the die mark 200 and the adhesive mark 210 through the second transparent module 151 of the second bonding unit 15 Image information. The lower vision unit 19 captures the lower image information of the die mark 200 and the bonding mark 210 through the platform 12 .

藉由上影像資訊與下影像資訊,以判斷晶粒記號200與黏合記號210是否對位,若已對位,則第二黏合單元15係將晶粒20放置於承台12。若未對位,則第二黏合單元15之第二真空模組150進行位置調整,以將晶粒記號200對位黏合記號210。該位置調整為一角度旋轉、一橫向移動或一前後移動,並再次擷取上影像資訊與下影像資訊,藉以判斷晶粒20是否位於承台120之所欲放置晶粒的位置處,即欲黏合件21。 Based on the upper image information and the lower image information, it is judged whether the die mark 200 and the bonding mark 210 are aligned. If they are aligned, the second bonding unit 15 places the die 20 on the platform 12 . If not aligned, the second vacuum module 150 of the second bonding unit 15 performs position adjustment to align the die mark 200 with the bonding mark 210 . The position is adjusted to an angle rotation, a lateral movement or a forward and backward movement, and the upper image information and the lower image information are captured again, so as to determine whether the die 20 is located at the desired position of the die 20 on the platform 120, that is, Adhesives 21.

若由再次擷取的上影像資訊的下影像資訊判讀出,晶粒記號200已對位黏合記號210,第二黏合單元15之第二真空模組150係將晶粒20放置於承台120之所欲放置晶粒的位置處,即欲黏合件21。 If it is judged from the lower image information of the upper image information captured again, the die mark 200 has been aligned with the bonding mark 210, and the second vacuum module 150 of the second bonding unit 15 places the die 20 on the platform 120 The position where the die is to be placed is the bonding part 21 .

若第二黏合單元14已將晶粒20放置於承台12的欲黏合件21後,則回至步驟S1。 If the second bonding unit 14 has placed the die 20 behind the part to be bonded 21 of the platform 12 , go back to step S1 .

本發明第三實施例係一種高精度黏晶系統,如第5圖與第6圖所示,高精度黏晶系統具有一供應單元10A、一吸取單元11A、一承接單元12A、一中繼單元13A、一第一黏合單元14A、第二黏合單元15A、一第一上視覺單元16A、一第二上視覺單元17A、一第三上視覺單元18A與一下視覺單元19A。 The third embodiment of the present invention is a high-precision die-bonding system, as shown in Figures 5 and 6, the high-precision die-bonding system has a supply unit 10A, a suction unit 11A, a receiving unit 12A, and a relay unit 13A, a first bonding unit 14A, a second bonding unit 15A, a first upper visual unit 16A, a second upper visual unit 17A, a third upper visual unit 18A and a lower visual unit 19A.

於第三實施例中,供應單元10A、吸取單元11A、承接單元12A、中繼單元13A、第一黏合單元14A、第二黏合單元15A、第上視覺單元16A、第二上視覺單元17A、第三上視覺單元18A與下視覺單元19A的設置方式係如同上述之本發明之高精度黏晶系統之第一實施例,故不於此多做贅述,特先陳明。 In the third embodiment, the supply unit 10A, the suction unit 11A, the receiving unit 12A, the relay unit 13A, the first bonding unit 14A, the second bonding unit 15A, the upper visual unit 16A, the second upper visual unit 17A, the 3. The arrangement of the upper vision unit 18A and the lower vision unit 19A is the same as the above-mentioned first embodiment of the high-precision die bonding system of the present invention, so it will not be repeated here, but will be stated first.

第三實施例與上述之第一實施例的差異在於,中繼單元13A僅具有一第一中繼台131A與一位移模組130A,第一中繼台131A係設於位移模組130A的一側,而使本實施例之中繼單元13A為一單翼設計。 The difference between the third embodiment and the above-mentioned first embodiment is that the relay unit 13A only has a first relay station 131A and a displacement module 130A, and the first relay station 131A is located in one of the displacement modules 130A. side, so that the relay unit 13A in this embodiment is designed as a single wing.

本發明第二實施例之一種高精度黏晶方法,如第3圖所示。 A high-precision die-bonding method according to the second embodiment of the present invention is shown in FIG. 3 .

步驟S1,提供至少一晶粒。如第5圖所示,頂針101A頂出位於供應台100A所欲頂出之晶粒20A。第一上視覺單元16A係擷取被頂出之晶粒20A的影像資訊,並將該影像資訊傳送給吸取單元20A。吸取單元11A之真空模組110A依據影像資訊,以吸取晶粒20A。真空模組110A係吸取至少一晶粒20A或複數個晶粒20A。 Step S1, providing at least one die. As shown in FIG. 5 , the ejector pin 101A ejects the die 20A to be ejected from the supply table 100A. The first upper vision unit 16A captures the image information of the ejected die 20A, and transmits the image information to the suction unit 20A. The vacuum module 110A of the pick-up unit 11A picks up the die 20A according to the image information. The vacuum module 110A sucks at least one die 20A or a plurality of dies 20A.

步驟S2,將至少一晶粒轉移至一中繼單元。吸取位移模組111A係將吸取有晶粒20A之真空模組110A移動至中繼單元13A之第一中繼台131A的上方。 Step S2, transferring at least one die to a relay unit. The suction displacement module 111A moves the vacuum module 110A with the die 20A sucked to the top of the first relay platform 131A of the relay unit 13A.

第二上視覺單元17A係擷取晶粒20A與中繼單元13A之第一中繼台131A的影像資訊,並將影像資訊傳送給吸取單元11A,以使真空模組110A將晶粒20A放置於第一中繼台131A。 The second upper vision unit 17A captures the image information of the die 20A and the first relay station 131A of the relay unit 13A, and transmits the image information to the suction unit 11A, so that the vacuum module 110A places the die 20A on the The first relay station 131A.

待真空模組110A將晶粒20A放置於第一中繼台131A後,吸取位移模組111A係將真空模組110A移回至最初位置,以再次吸取晶粒20A。 After the vacuum module 110A places the die 20A on the first relay station 131A, the vacuum displacement module 111A moves the vacuum module 110A back to the original position to suck the die 20A again.

步驟S3,對位至少一晶粒與一承接單元之位置。其係如上述之本發明之高精度黏晶方法所述之步驟S3,故不於此多做贅述,特先陳明。 Step S3, aligning the positions of at least one die and one receiving unit. It is the step S3 described in the above-mentioned high-precision die bonding method of the present invention, so it will not be repeated here, but will be stated first.

步驟S4,再次提供至少一晶粒。供應單元10A之供應台100A係進行一橫向移動、一前後移動或一橫向與前後移動,以將欲被吸取之晶粒20A移動至真空模組110A的下方。 Step S4, providing at least one die again. The supply stage 100A of the supply unit 10A performs a lateral movement, a forward and backward movement, or a lateral and forward movement, so as to move the die 20A to be sucked to the bottom of the vacuum module 110A.

待欲被吸取之晶粒20A移動真空模組110A的下方後,第一上視覺單元16A係擷取所欲頂出之晶粒20A的影像資訊,頂針101A依據該影像資訊,以頂出晶粒20A。 After the die 20A to be sucked moves below the vacuum module 110A, the first upper vision unit 16A captures the image information of the die 20A to be ejected, and the ejector pin 101A ejects the die according to the image information 20A.

第一上視覺單元16A係擷取被頂出之晶粒20A的影像資訊,並將該影像資訊傳送給吸取單元20A。吸取單元11A之真空模組110A依據影像資訊,以吸取晶粒20A。 The first upper vision unit 16A captures the image information of the ejected die 20A, and transmits the image information to the suction unit 20A. The vacuum module 110A of the pick-up unit 11A picks up the die 20A according to the image information.

位移模組130A將第一中繼台131A移動至吸取有晶粒20A之真空模組110A的下方。 The displacement module 130A moves the first relay platform 131A to the lower part of the vacuum module 110A which has absorbed the die 20A.

步驟S5,將至少一晶粒放置於承接單元。其係如上述之本發明之高精度黏晶方法所述之步驟S5,故不於此多做贅述,特先陳明。 Step S5, placing at least one die on the receiving unit. It is the step S5 described in the above-mentioned high-precision die bonding method of the present invention, so it will not be repeated here, but will be stated first.

步驟S6,再次將至少一晶粒轉移至中繼單元。吸取單元11A真空模組110A將所吸取之晶粒20A置於第一中繼台131A。 Step S6, transferring at least one die to the relay unit again. The vacuum module 110A of the suction unit 11A places the sucked die 20A on the first relay station 131A.

步驟S7,再次對位至少一晶粒與一承接單元之位置。第三上視覺單元18A係擷取晶粒20A之影像資訊,並將該影像資訊提供給第二黏合單元15A,以使第二真空模組140A吸取位於第一中繼台131A之晶粒20A。 Step S7, aligning the positions of at least one die and one receiving unit again. The third upper vision unit 18A captures the image information of the die 20A, and provides the image information to the second bonding unit 15A, so that the second vacuum module 140A absorbs the die 20A located on the first relay station 131A.

待第二真空模組150A係吸取晶粒20A後,承台120A係對第二真空模組150A進行位置調整,以使承台120A可移動至所欲放置晶粒20A的位置,即欲黏合件21A。 After the second vacuum module 150A absorbs the die 20A, the support platform 120A adjusts the position of the second vacuum module 150A so that the support platform 120A can move to the position where the die 20A is to be placed. 21A.

如步驟S3所述,藉由該上影像資訊與該下影像資訊係可判斷晶粒20A是否位於承台120A之所欲放置晶粒的位置處。藉以將晶粒放置於承台120A之欲黏合件21A。 As described in step S3, it can be determined whether the die 20A is located at the position where the die is to be placed on the platform 120A according to the upper image information and the lower image information. The bonding member 21A for placing the die on the platform 120A.

藉由上影像資訊與下影像資訊,以判斷晶粒記號與黏合記號是否對位,若已對位,則第二黏合單元15A係將晶粒20A放置於承台12A。若未對位,則第二黏合單元15A之第二真空模組150A進行一位置調整,以將晶粒記號對位黏合記號。該位置調整為角度旋轉、一橫向移動或一前後移動。並再次擷取上影像資訊與下影像資訊,藉以判斷晶粒20A是否位於承台120A之所欲放置晶粒的位置處。 Based on the upper image information and the lower image information, it is judged whether the die mark and the bonding mark are aligned. If they are aligned, the second bonding unit 15A places the die 20A on the platform 12A. If not aligned, the second vacuum module 150A of the second bonding unit 15A performs a position adjustment to align the die marks with the bonding marks. The position adjustment is an angular rotation, a lateral movement or a back and forth movement. And capture the upper image information and the lower image information again, so as to determine whether the die 20A is located at the position where the die is to be placed on the platform 120A.

若由再次擷取的上影像資訊的下影像資訊判讀出,晶粒記號已對位黏合記號,第二黏合單元15A之第二真空模組150A係將晶粒20A放置於承台120A之所欲放置晶粒的位置處。 If it is judged from the lower image information of the upper image information captured again, the die mark has been aligned with the bonding mark, and the second vacuum module 150A of the second bonding unit 15A places the die 20A on the platform 120A as desired. where the grains are placed.

若第二黏合單元14A已將晶粒20A放置於承台12A後,則回至步驟S1。 If the second bonding unit 14A has placed the die 20A behind the platform 12A, go back to step S1.

本發明第四實施例係一種高精度黏晶系統,如第7圖與第8圖所示,高精度黏晶系統具有一供應單元10B、一吸取單元11B、一承接單元12B、一中繼單元13B、一第一黏合單元14B、第二黏合單元15B、一第一上視覺單元16B、一第二上視覺單元17B、一第三上視覺單元18B與一下視覺單元19B。 The fourth embodiment of the present invention is a high-precision die-bonding system. As shown in Figures 7 and 8, the high-precision die-bonding system has a supply unit 10B, a suction unit 11B, a receiving unit 12B, and a relay unit. 13B, a first bonding unit 14B, a second bonding unit 15B, a first upper visual unit 16B, a second upper visual unit 17B, a third upper visual unit 18B and a lower visual unit 19B.

於第四實施例中,供應單元10B、吸取單元11B、承接單元12B、中繼單元13B、第一黏合單元14B、第二黏合單元15B、第一上 視覺單元16B、第二上視覺單元17B、第三上視覺單元18B與下視覺單元19B的設置方式係如同上述之本發明之高精度黏晶系統之第第一實施例,故不於此多做贅述,特先陳明。 In the fourth embodiment, supply unit 10B, suction unit 11B, receiving unit 12B, relay unit 13B, first bonding unit 14B, second bonding unit 15B, first upper The arrangement of the vision unit 16B, the second upper vision unit 17B, the third upper vision unit 18B, and the lower vision unit 19B is the same as the first embodiment of the high-precision die-bonding system of the present invention described above, so no further details are given here. To repeat, let me explain first.

第四實施例與上述之第一實施例的差異在於,中繼單元13B具有一第一中繼台131B、一第二中繼台132B與一位移模組130B,第一中繼台131B與第二中繼台132B係設於位移模組130B的兩相對側,第一中繼台131B與第二中繼台132B為一錯位排列,而使本實施例之中繼單元13B為一錯位設計。 The difference between the fourth embodiment and the above-mentioned first embodiment is that the relay unit 13B has a first relay station 131B, a second relay station 132B and a displacement module 130B, and the first relay station 131B and the second relay station 131B The two relay units 132B are arranged on two opposite sides of the displacement module 130B. The first relay unit 131B and the second relay unit 132B are arranged in a staggered position, so that the relay unit 13B in this embodiment is designed in a staggered position.

本發明第二實施例之一種高精度黏晶方法,如第3圖所示。 A high-precision die-bonding method according to the second embodiment of the present invention is shown in FIG. 3 .

步驟S1,提供至少一晶粒。其如上述之本發明之高精度黏晶方法所述之步驟S1,故不於此多做贅述,特先陳明。 Step S1, providing at least one die. It is like step S1 described in the above-mentioned high-precision die bonding method of the present invention, so it will not be repeated here, but will be stated first.

步驟S2,將至少一晶粒轉移至一中繼單元。吸取位移模組111B係將吸取有晶粒20B之真空模組110B移動至中繼單元13B之第一中繼台131B的上方。 Step S2, transferring at least one die to a relay unit. The suction displacement module 111B moves the vacuum module 110B with the die 20B sucked to the top of the first relay platform 131B of the relay unit 13B.

第二上視覺單元17B係擷取晶粒20B與中繼單元13B之第一中繼台131B的影像資訊,並將影像資訊傳送給吸取單元11B,以使真空模組110B將晶粒20B放置於第一中繼台131B。 The second upper vision unit 17B captures the image information of the die 20B and the first relay station 131B of the relay unit 13B, and transmits the image information to the suction unit 11B, so that the vacuum module 110B places the die 20B on the The first relay station 131B.

待真空模組110B將晶粒20B放置於第一中繼台131B後,吸取位移模組111B係將真空模組110B移回至最初位置,以再次吸取晶粒20B。 After the vacuum module 110B places the die 20B on the first relay station 131B, the vacuum displacement module 111B moves the vacuum module 110B back to the original position to suck the die 20B again.

位移模組130B係使第一中繼台131B移動至承台120B的上方,以及移動第二中繼台132B至供應台100B的上方。位移模組130B再將第一中繼台131B移動至第一黏合單元14B的下方。 The displacement module 130B moves the first relay platform 131B to the top of the support platform 120B, and moves the second relay platform 132B to the top of the supply platform 100B. The displacement module 130B then moves the first relay platform 131B to the bottom of the first bonding unit 14B.

於本實施例中,步驟S3至步驟S7係如上述之本發明之高精度黏晶方法所述之步驟S3至步驟S7,故不於此多做贅述,特先陳明。 In this embodiment, steps S3 to S7 are as described in the above-mentioned high-precision die bonding method of the present invention, so they will not be repeated here, but will be stated first.

第9圖為本發明第五實施例之一種用於高精度黏晶之對位系統,第9圖顯示黏合記號與一晶粒記號之對位。本發明之用於高精度黏晶之對位系統,適用一具有晶粒記號300之晶粒30,該對位系統包含有一上視覺單元40、一黏合單元41、一承接單元42與一下視覺單元43。 Fig. 9 is an alignment system for high-precision die bonding according to the fifth embodiment of the present invention. Fig. 9 shows the alignment of bonding marks and a die mark. The alignment system for high-precision die bonding of the present invention is suitable for a die 30 with a die mark 300. The alignment system includes an upper vision unit 40, a bonding unit 41, a receiving unit 42 and a lower vision unit. 43.

黏合單元41具有一真空模組410,真空模組410具有一透明模組411。透明模組411為一透明體或一穿孔。 The bonding unit 41 has a vacuum module 410 , and the vacuum module 410 has a transparent module 411 . The transparent module 411 is a transparent body or a perforation.

上視覺單元40設於黏合單元41的上方。 The upper visual unit 40 is disposed above the adhesive unit 41 .

承接單元42具有一承台420。承台420為透明。承台420係供一欲黏合件31設置,欲黏合件31為透明,欲黏合件31具有至少一黏合記號310。 The receiving unit 42 has a platform 420 . The platform 420 is transparent. The support platform 420 is provided for a desired adhesive member 31 , the desired adhesive member 31 is transparent, and the desired adhesive member 31 has at least one adhesive mark 310 .

上述之晶粒30具有至少一透明區301,晶粒記號300係位於該透明區301。 The above-mentioned die 30 has at least one transparent region 301 , and the die mark 300 is located in the transparent region 301 .

如上所述,真空模組410係吸取晶粒30。上視覺單元40透過透明模組411與透明區301,以擷取晶粒記號301與黏合記號310的上影像資訊。下視覺單元43透過承台420與欲黏合件31,以擷取黏合記號310與晶粒記號301的下影像資訊。藉由該上影像資訊與該下影像資訊,而得知晶粒30是否對位承台420之欲黏合件31。用於高精度黏晶之對位系統須精密對位時,將該黏合單元41側移或將該承台420側移來進行對位,達成該晶粒30與該欲黏合件31的精密對位。 As mentioned above, the vacuum module 410 sucks the die 30 . The upper vision unit 40 captures the upper image information of the die mark 301 and the adhesive mark 310 through the transparent module 411 and the transparent area 301 . The lower vision unit 43 captures the lower image information of the bonding mark 310 and the die mark 301 through the platform 420 and the part to be bonded 31 . Based on the upper image information and the lower image information, it is known whether the die 30 is aligned with the mounting block 420 to be bonded 31 . When the alignment system used for high-precision die bonding requires precise alignment, the bonding unit 41 or the platform 420 is moved sideways to perform alignment, so as to achieve precise alignment between the die 30 and the part 31 to be bonded bit.

綜合上述,本發明之高精度黏晶系統及其方法,其係將系統的位移裝置設於供應單元或承接單元的非正上方或下方,故真空模 組、第一中繼台或第二中繼台移動時,其所可能產生的微塵係無法掉落於供應單元或承接單元,藉以提升潔淨度。 To sum up the above, the high-precision die bonding system and method of the present invention set the displacement device of the system not directly above or below the supply unit or the receiving unit, so the vacuum mold When the group, the first relay station or the second relay station is moving, the dust that may be generated cannot fall on the supply unit or the receiving unit, so as to improve the cleanliness.

另外,第一真空模組或第二真空模組的移動距離甚小,故可能產生的微塵甚微,故亦可保持潔淨度。 In addition, the moving distance of the first vacuum module or the second vacuum module is very small, so the dust that may be generated is very small, so the cleanliness can also be maintained.

再者,本發明之中繼單元、第一黏合單元與第二黏合單元的設計係可一次提供至少一晶粒給承接單元,藉以提升黏晶的速率。 Furthermore, the design of the relay unit, the first bonding unit and the second bonding unit in the present invention can provide at least one die to the receiving unit at a time, so as to increase the speed of die bonding.

再一,本發明所使用的對位方法係運用晶粒記號與黏合記號之間的對位,故可提升黏晶的精度。 Furthermore, the alignment method used in the present invention uses the alignment between the die mark and the bonding mark, so the precision of die bonding can be improved.

再二,本發明之黏合總成的第一黏合單元與第二黏合單元是不動或不做大行程移動,可裝置隔離板,故可減少污染。同時為了精度,黏合總成的第一黏合單元與第二黏合單元可微小的橫向移動。因此本發明具有低汙染與高精度的特性。 Second, the first bonding unit and the second bonding unit of the bonding assembly of the present invention do not move or move in large strokes, and can be equipped with a separation plate, so pollution can be reduced. At the same time, for precision, the first bonding unit and the second bonding unit of the bonding assembly can move slightly laterally. Therefore, the present invention has the characteristics of low pollution and high precision.

10:供應單元 100:供應台 101:頂針 11:吸取單元 110:真空模組 111:吸取位移模組 12:承接單元 120:承台 13:中繼單元 130:位移模組 131:第一中繼台 132:第二中繼台 14:第一黏合單元 140:第一真空模組 141:第一透明模組 15:第二黏合單元 150:第二真空模組 151:第二透明模組 154:隔離板 16:第一上視覺單元 17:第二上視覺單元 18:第三上視覺單元 19:下視覺單元 20:晶粒 21:欲黏合件 10: supply unit 100: Supply Desk 101: Thimble 11: suction unit 110: Vacuum Module 111: Suction Displacement Module 12: Undertaking unit 120: platform 13: Relay unit 130: Displacement Module 131: The first repeater 132: Second relay station 14: The first bonding unit 140: The first vacuum module 141: The first transparent module 15: Second bonding unit 150: Second Vacuum Module 151: Second transparent module 154: isolation board 16: The first visual unit 17: Second Upper Vision Unit 18: Third Upper Vision Unit 19: Lower Visual Unit 20: grain 21: To glue parts

Claims (17)

一種高精度黏晶系統,包括:一供應單元,用來設置一晶粒;一承接單元,相鄰於該供應單元;一中繼單元,設於該供應單元與該承接單元之間;一吸取單元,設於該供應單元的上方,該吸取單元將該晶粒放置於該中繼單元;以及一黏合總成,設於該承接單元的上方;其中,該黏合總成係將位於該中繼單元之該晶粒放置於該承接單元;其中,該中繼單元具有一位移模組與一第一中繼台,該第一中繼台係設於該位移模組的一側;其中,該吸取單元具有至少一真空模組與一吸取位移模組,該真空模組係設於該吸取位移模組的一側;其中,該位移模組與該吸取位移模組均設於該供應單元或該承接單元的非正上方或下方。 A high-precision die bonding system, comprising: a supply unit for setting a crystal grain; a receiving unit adjacent to the supply unit; a relay unit arranged between the supply unit and the receiving unit; unit, arranged above the supply unit, the suction unit places the die on the relay unit; and a bonding assembly, arranged above the receiving unit; wherein, the bonding assembly will be positioned on the relay unit The crystal grain of the unit is placed on the receiving unit; wherein, the relay unit has a displacement module and a first relay station, and the first relay station is arranged on one side of the displacement module; wherein, the The suction unit has at least one vacuum module and a suction displacement module, and the vacuum module is arranged on one side of the suction displacement module; wherein, the displacement module and the suction displacement module are both arranged on the supply unit or Not directly above or below the receiving unit. 如請求項1所述之高精度黏晶系統,其中該供應單元具有一供應台與至少一頂針,該頂針係設於該供應台的下方,該供應台係供該晶粒設置,該頂針係頂出該晶粒。 The high-precision die bonding system as described in Claim 1, wherein the supply unit has a supply table and at least one thimble, the thimble is arranged under the supply table, the supply table is used for setting the die, and the thimble is The die is ejected. 如請求項2所述之高精度黏晶系統,其中該供應台可進行一橫向移動、一前後移動或一橫向與前後移動。 The high-precision die bonding system as described in Claim 2, wherein the supply table can perform a lateral movement, a forward and backward movement, or a lateral and forward and backward movement. 如請求項1所述之高精度黏晶系統,其中該承接單元具有一承台。 The high-precision die-bonding system according to claim 1, wherein the receiving unit has a platform. 如請求項4所述之高精度黏晶系統,其中該承台為透明或部份透明以利影像的穿透與擷取,該承台可進行一橫向移動、一前後移動或一橫向與前後移動。 The high-precision die-bonding system as described in Claim 4, wherein the platform is transparent or partially transparent to facilitate the penetration and capture of images, and the platform can perform a lateral movement, a forward and backward movement, or a lateral and forward and backward movement move. 如請求項1所述之高精度黏晶系統,其中該中繼單元更具有一第二中繼台,該第二中繼台係設於該位移模組的另一側,該第一中繼台與該第二中繼台係呈一平行排列或一錯位排列,該位移模組可進行一前後移動、一橫向移動或一旋轉移動。 The high-precision die bonding system as described in claim 1, wherein the relay unit further has a second relay station, the second relay station is set on the other side of the displacement module, and the first relay station The station and the second relay station are in a parallel arrangement or a dislocation arrangement, and the displacement module can perform a forward and backward movement, a lateral movement or a rotational movement. 如請求項1所述之高精度黏晶系統,其中該黏合總成具有一第一黏合單元與一第二黏合單元;該第一黏合單元具有至少一第一真空模組,該第一真空模組具有一第一透明模組;該第二黏合單元具有至少一第二真空模組,該第二真空模組具有至少一第二透明模組。 The high-precision die bonding system as described in Claim 1, wherein the bonding assembly has a first bonding unit and a second bonding unit; the first bonding unit has at least one first vacuum module, and the first vacuum module The set has a first transparent module; the second bonding unit has at least one second vacuum module, and the second vacuum module has at least one second transparent module. 如請求項1所述之高精度黏晶系統,其更具有一第一上視覺單元、一第二上視覺單元、一第三視覺單元與一下視覺單元,該第一上視覺單元係設於該吸取單元的上方,該第二上視覺單元係位於該中繼單元的上方,該三上視覺單元係位於該第一黏合單元與第二黏合單元的上方,該下視覺單元係位於該承接單元的下方。 The high-precision die-bonding system as described in Claim 1 further has a first upper vision unit, a second upper vision unit, a third vision unit and a lower vision unit, the first upper vision unit is set on the Above the suction unit, the second upper visual unit is located above the relay unit, the third upper visual unit is located above the first bonding unit and the second bonding unit, and the lower visual unit is located on the receiving unit below. 一種高精度黏晶方法,包括以下步驟:提供一供應單元用來設置一晶粒給一吸取單元,該吸取單元吸取該晶粒;該吸取單元將所吸取之該晶粒轉移至一中繼單元;該中繼單元將該晶粒移動至一黏合總成的下方,該黏合總成吸取該晶粒; 移動一承接單元至所欲放置晶粒的位置,該晶粒對位該承接單元之該所欲放置晶粒的位置;該供應單元再次提供另一晶粒給該吸取單元,該吸取單元吸取該晶粒;將該另一晶粒放置於該承接單元,該黏合總成將該晶粒放置於該承接單元之該所欲放置晶粒的位置;將該另一晶粒轉移至該中繼單元,該吸取單元將該另一晶粒放置於該中繼單元;該中繼單元將該另一晶粒移動至該黏合總成的下方;以及該黏合總成吸取該另一晶粒,該承接單元移動至該所欲放置晶粒的位置,該另一晶粒係對位該所欲放置晶粒的位置,該黏合總成將該另一晶粒放置於該所欲放置晶粒的位置處;其中於將該晶粒轉移至一中繼單元之步驟中,更包括以下步驟:一吸取位移模組係將吸取有晶粒之該真空模組移動至該中繼單元之一第一中繼台的上方;一第二上視覺單元係擷取該晶粒與該第一中繼台的影像資訊,並將影像資訊傳送給該吸取單元,以使該真空模組將該晶粒放置於該第一中繼台;該中繼單元之位移模組係進行一旋轉動作,以使該第一中繼台被轉動至該承接單元之一承台的上方;或者,該位移模組係進行一旋轉動作,以使該第一中繼台被轉動至該承台的上方,以及一第二中繼台被轉動至該供應單元之一供應台的上方,該位移模組再將該第一中繼台移動至該黏合總成之一第一黏合單元的下方;以及 或者,該位移模組係使該第一中繼台移動至該承台的上方,以及該第二中繼台被移動至該供應台的上方,該位移模組再將該第一中繼台移動至該第一黏合單元的下方。 A high-precision die bonding method, comprising the following steps: providing a supply unit for setting a die to a suction unit, and the suction unit picks up the die; the pick-up unit transfers the picked-up die to a relay unit ; the relay unit moves the die under a bonding assembly, and the bonding assembly absorbs the die; Move a receiving unit to the position where the die is to be placed, and the die is aligned with the position where the die is to be placed on the receiving unit; the supply unit provides another die to the suction unit again, and the suction unit absorbs the die die; placing the other die on the receiving unit, the bonding assembly places the die on the receiving unit at the position where the die is to be placed; transfers the other die to the relay unit , the suction unit places the other die on the relay unit; the relay unit moves the other die below the bonding assembly; and the bonding assembly sucks the other die, the receiving The unit moves to the position where the die is to be placed, the other die is aligned to the position where the die is to be placed, and the bonding assembly places the other die at the position where the die is to be placed ; Wherein, in the step of transferring the crystal grain to a relay unit, the following steps are further included: a suction displacement module is to move the vacuum module with the crystal grain to the first relay of the relay unit above the table; a second upper vision unit captures the image information of the die and the first relay station, and sends the image information to the suction unit, so that the vacuum module places the die on the The first relay platform; the displacement module of the relay unit performs a rotation action so that the first relay platform is rotated to the top of the bearing platform of the receiving unit; or, the displacement module performs a rotation Rotation action, so that the first relay platform is rotated to the top of the platform, and a second relay platform is rotated to the top of one of the supply platforms of the supply unit, and the displacement module then the stepping table moves to the bottom of one of the first bonding units of the bonding assembly; and Alternatively, the displacement module moves the first relay platform to the top of the platform, and the second relay platform is moved to the top of the supply platform, and the displacement module then moves the first relay platform Move to the bottom of the first bonding unit. 如請求項9所述之高精度黏晶方法,其中於該提供該晶粒的步驟中,更包括以下步驟:該供應單元之一供應台係進行一前後位移、一橫向位移或一橫向與前後移動,以將欲被吸取之晶粒移動至該吸取單元之真空模組的下方;一第一上視覺單元係擷取所欲頂出之晶粒的影像資訊,至少一頂針依據該影像資訊,以頂出該晶粒;以及該第一上視覺單元係擷取被頂出之晶粒的影像資訊,並將該影像資訊傳送給該吸取單元,該真空模組依據影像資訊,以吸取該晶粒。 The high-precision die bonding method as described in Claim 9, wherein in the step of providing the die, it further includes the following steps: one of the supply units of the supply unit performs a front-back displacement, a lateral displacement, or a lateral and front-rear displacement move to move the grains to be sucked to the bottom of the vacuum module of the suction unit; a first upper vision unit is to capture the image information of the grains to be ejected, and at least one thimble is based on the image information, to eject the die; and the first upper vision unit captures the image information of the ejected die, and transmits the image information to the suction unit, and the vacuum module sucks the die according to the image information grain. 如請求項9所述之高精度黏晶方法,其中於該再次將該晶粒轉移至該中繼單元之步驟中,該吸取單元係吸取位於該供應單元之晶粒,並將該晶粒放置於該第二中繼台;或者該吸取單元將所吸取之晶粒放置於該第一中繼台。 The high-precision die bonding method as described in Claim 9, wherein in the step of transferring the die to the relay unit again, the suction unit is to suck the die located in the supply unit, and place the die at the second relay station; or the suction unit places the sucked die on the first relay station. 如請求項9所述之高精度黏晶方法,其中於該對位該晶粒與承接單元之位置之步驟中,更包括以下步驟:一第三上視覺單元係擷取該晶粒之影像資訊,該影像資訊係提供給該第一黏合單元,以使該第一黏合單元之一第一真空模組位於該第一中繼台之晶粒;該承台係移動至所欲放置晶粒的位置;該第三上視覺單元係透過該第一真空模組之一第一透明模組,以擷取該晶粒之晶粒記號與該承台之一欲黏合件之黏合記號的上影像資訊; 一下視覺單元係透過該承台,以擷取該黏合記號與該晶粒記號的下影像資訊;該上影像資訊與該下影像資訊係可判斷該晶粒是否位於該承台之所欲放置晶粒的位置處;若為是,則至該將該晶粒放置於承接單元之步驟;若為否,該第一真空模組進行一位置調整,以使該晶粒記號對位黏合記號;該第三上視覺單元再次擷取該上影像資訊,以及該下視覺單元再次擷取該下影像資訊,以判斷該晶粒是否位於該所欲放置晶粒的位置處;以及若該晶粒記號已對位該黏合記號,則至該將該晶粒放置於承接單元之步驟。 The high-precision die bonding method as described in Claim 9, wherein in the step of aligning the position of the die and the receiving unit, the following steps are further included: a third upper vision unit is to capture the image information of the die , the image information is provided to the first bonding unit, so that a first vacuum module of the first bonding unit is located on the die of the first intermediate station; the platform is moved to the place where the die is to be placed position; the third upper vision unit is through one of the first transparent modules of the first vacuum module to capture the upper image information of the die mark of the die and the bonding mark of a part to be bonded on the platform ; The lower vision unit captures the lower image information of the bonding mark and the die mark through the platform; the upper image information and the lower image information can determine whether the die is located on the platform where the die is to be placed. If yes, go to the step of placing the die on the receiving unit; if no, the first vacuum module performs a position adjustment so that the die mark is aligned with the bonding mark; the The third upper vision unit captures the upper image information again, and the lower vision unit captures the lower image information again to determine whether the die is located at the position where the die is to be placed; and if the die mark has been placed Align the bonding mark, and then go to the step of placing the die on the receiving unit. 如請求項12所述之高精度黏晶方法,其中於該再次對位該晶粒與承接單元之位置之步驟中,該第三上視覺單元係擷取該晶粒之影像資訊,並將該影像資訊提供給該黏合總成之一第二黏合單元,以使該第二黏合單元之一第二真空模組吸取位於該第二中繼台之該晶粒;或者該第三上視覺單元係擷取該晶粒之影像資訊,並將該影像資訊提供給該第二黏合單元,以使該第二真空模組吸取位於該第一中繼台之該晶粒;該承台係移動至該所欲放置晶粒的位置,該第三上視覺單元係透過該第二黏合單元之一第二透明模組,以擷取該上影像資訊,該下視覺單元係透過該承台,以擷取該下影像資訊;藉由該上影像資訊與該下影像資訊,以判斷該晶粒記號與該黏合記號是否對位,若已對位,則該第二黏合單元係將晶粒放置於該承台;若該第二黏合單元已將該晶粒放置於該承台後,則回至該提供該晶粒之步驟。 The high-precision die bonding method as described in claim 12, wherein in the step of re-aligning the position of the die and the receiving unit, the third upper vision unit captures the image information of the die, and the The image information is provided to a second bonding unit of the bonding assembly, so that a second vacuum module of the second bonding unit absorbs the die located on the second relay station; or the third upper vision unit is capturing the image information of the die, and providing the image information to the second bonding unit, so that the second vacuum module absorbs the die located on the first intermediate platform; the platform is moved to the The position where the die is to be placed, the third upper vision unit passes through a second transparent module of the second bonding unit to capture the upper image information, and the lower vision unit passes through the platform to capture The lower image information; by using the upper image information and the lower image information, it is judged whether the die mark and the bonding mark are aligned, and if they are aligned, the second bonding unit places the die on the substrate platform; if the second bonding unit has placed the die behind the platform, return to the step of providing the die. 如請求項9所述之高精度黏晶方法,其中於該對位該晶粒與承接單元之位置之步驟中,該欲黏合件係設於該承台,該欲黏合件為透明。 The high-precision die bonding method as described in Claim 9, wherein in the step of aligning the positions of the die and the receiving unit, the part to be bonded is set on the platform, and the part to be bonded is transparent. 一種用於高精度黏晶之對位系統,適用於一具有晶粒記號之晶粒,包括:一黏合單元,具有一真空模組,該真空模組具有一透明模組;一上視覺單元,設於該黏合單元的上方;一承接單元,具有一承台用來設置一欲黏合件,該欲黏合件具有一黏合記號;以及一下視覺單元,其係設於該承接單元的下方;其中,該真空模組係吸取該晶粒,該上視覺單元係透過該透明模組與該晶粒,以擷取該晶粒記號與該黏合記號的上影像資訊;該下視覺單元係透過該承台,以擷取該晶粒記號與該黏合記號,藉由該上影像資訊與該下影像資訊,而得知該晶粒是否對位該承台。 An alignment system for high-precision die bonding, suitable for a die with a die mark, including: a bonding unit with a vacuum module, the vacuum module has a transparent module; an upper vision unit, It is arranged above the bonding unit; a receiving unit has a platform for setting a part to be bonded, and the part to be bonded has a bonding mark; and a visual unit is arranged under the receiving unit; wherein, The vacuum module absorbs the die, the upper vision unit passes through the transparent module and the die to capture the upper image information of the die mark and the bonding mark; the lower vision unit passes through the platform , to capture the die mark and the bonding mark, and use the upper image information and the lower image information to know whether the die is aligned with the platform. 如請求項15所述之用於高精度黏晶之對位系統,其中該晶粒具有一透明區,該晶粒記號係位於該透明區,該承台為透明或部份透明以利影像的穿透與擷取;該透明模組為一透明體或一穿孔。 The alignment system for high-precision die bonding as described in claim 15, wherein the die has a transparent area, the die mark is located in the transparent area, and the platform is transparent or partially transparent for image Penetration and extraction; the transparent module is a transparent body or a perforation. 如請求項15所述之用於高精度黏晶之對位系統,更包括將該黏合單元側移或將該承台側移來進行對位,達成該晶粒與該欲黏合件的精密對位。 The alignment system for high-precision die bonding as described in claim 15 further includes moving the bonding unit or the platform sideways to perform alignment, so as to achieve precise alignment between the die and the part to be bonded bit.
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