TWI778581B - Oled像素形成用掩模、掩模支撐模板及框架一體型掩模 - Google Patents

Oled像素形成用掩模、掩模支撐模板及框架一體型掩模 Download PDF

Info

Publication number
TWI778581B
TWI778581B TW110113624A TW110113624A TWI778581B TW I778581 B TWI778581 B TW I778581B TW 110113624 A TW110113624 A TW 110113624A TW 110113624 A TW110113624 A TW 110113624A TW I778581 B TWI778581 B TW I778581B
Authority
TW
Taiwan
Prior art keywords
mask
mask pattern
pattern
template
width
Prior art date
Application number
TW110113624A
Other languages
English (en)
Chinese (zh)
Other versions
TW202144907A (zh
Inventor
李炳一
金奉辰
Original Assignee
南韓商奧魯姆材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商奧魯姆材料股份有限公司 filed Critical 南韓商奧魯姆材料股份有限公司
Publication of TW202144907A publication Critical patent/TW202144907A/zh
Application granted granted Critical
Publication of TWI778581B publication Critical patent/TWI778581B/zh

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW110113624A 2020-05-25 2021-04-15 Oled像素形成用掩模、掩模支撐模板及框架一體型掩模 TWI778581B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020200062444A KR102358270B1 (ko) 2020-05-25 2020-05-25 Oled 화소 형성용 마스크, 마스크 지지 템플릿 및 프레임 일체형 마스크
KR10-2020-0062444 2020-05-25

Publications (2)

Publication Number Publication Date
TW202144907A TW202144907A (zh) 2021-12-01
TWI778581B true TWI778581B (zh) 2022-09-21

Family

ID=78672679

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110113624A TWI778581B (zh) 2020-05-25 2021-04-15 Oled像素形成用掩模、掩模支撐模板及框架一體型掩模

Country Status (3)

Country Link
KR (2) KR102358270B1 (ko)
CN (1) CN113725389A (ko)
TW (1) TWI778581B (ko)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201735244A (zh) * 2016-03-24 2017-10-01 台灣積體電路製造股份有限公司 深溝槽隔離結構及其形成方法
US20200056279A1 (en) * 2016-10-07 2020-02-20 Dai Nippon Printing Co., Ltd. Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask
KR20200040471A (ko) * 2018-10-10 2020-04-20 주식회사 오럼머티리얼 마스크의 제조 방법 및 프레임 일체형 마스크의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009068082A (ja) * 2007-09-14 2009-04-02 Sony Corp 蒸着マスクの作製方法および蒸着マスク
KR102506005B1 (ko) * 2017-09-28 2023-03-08 삼성디스플레이 주식회사 마스크 조립체 및 마스크 조립체의 제조 방법
CN112424972A (zh) * 2018-08-29 2021-02-26 悟勞茂材料公司 掩模的制造方法、掩模及框架一体型掩模
KR102138800B1 (ko) * 2019-05-13 2020-07-28 주식회사 오럼머티리얼 마스크 및 프레임 일체형 마스크

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201735244A (zh) * 2016-03-24 2017-10-01 台灣積體電路製造股份有限公司 深溝槽隔離結構及其形成方法
US20200056279A1 (en) * 2016-10-07 2020-02-20 Dai Nippon Printing Co., Ltd. Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask
KR20200040471A (ko) * 2018-10-10 2020-04-20 주식회사 오럼머티리얼 마스크의 제조 방법 및 프레임 일체형 마스크의 제조 방법

Also Published As

Publication number Publication date
CN113725389A (zh) 2021-11-30
KR102458729B1 (ko) 2022-10-26
KR20210145488A (ko) 2021-12-02
TW202144907A (zh) 2021-12-01
KR102358270B1 (ko) 2022-02-07
KR20210145695A (ko) 2021-12-02

Similar Documents

Publication Publication Date Title
TWI825149B (zh) 框架一體型遮罩的製造方法及框架
TWI758661B (zh) 掩模支撐模板和其製造方法及框架一體型掩模的製造方法
KR102202530B1 (ko) 마스크의 제조 방법, 마스크 지지 템플릿의 제조 방법 및 프레임 일체형 마스크의 제조 방법
CN111224019B (zh) 掩模支撑模板和其制造方法及掩模与框架连接体的制造方法
KR102510212B1 (ko) 마스크 지지 템플릿 및 프레임 일체형 마스크의 제조 방법
TWI810381B (zh) 遮罩支撐模板及其製造方法與框架一體型遮罩的製造方法
TWI778581B (zh) Oled像素形成用掩模、掩模支撐模板及框架一體型掩模
TWI812985B (zh) Oled像素形成用掩模、掩模支撐模板及框架一體型掩模的製造方法
TWI771976B (zh) 掩模支撐模板及其製造方法、掩模製造方法及框架一體型掩模的製造方法
TW202147666A (zh) 掩模的製造方法、掩模支撐模板的製造方法及框架一體型掩模的製造方法
KR20220071891A (ko) Oled 화소 형성용 마스크 및 프레임 일체형 마스크
KR102377776B1 (ko) 마스크 제조용 마스크 금속막 및 마스크 금속막 지지 템플릿
KR102377777B1 (ko) 마스크의 제조 방법, 마스크 지지 템플릿의 제조 방법 및 프레임 일체형 마스크의 제조 방법
TW202108790A (zh) 掩模支撐模板、掩模支撐模板的製造方法及框架一體型掩模的製造方法
KR102371178B1 (ko) 마스크 지지 템플릿과 그의 제조 방법, 마스크의 제조 방법 및 프레임 일체형 마스크의 제조 방법
TWI830051B (zh) 掩模支撐模板的製造方法、掩模支撐模板及框架一體型掩模的製造方法
US20230220534A1 (en) Mask-integrated frame and method of manufacturing the same
TWI832113B (zh) Oled像素形成用掩模及框架一體型掩模
KR20220033310A (ko) 마스크의 제조 방법, 마스크 지지 템플릿의 제조 방법 및 프레임 일체형 마스크의 제조 방법
TW202207503A (zh) 掩模金屬膜、掩模金屬膜支撐模板、掩模支撐模板及其製造方法
KR20230123900A (ko) 프레임 일체형 마스크 및 고해상도 oled 화소 형성 방법
KR20220060377A (ko) Oled 화소 형성용 마스크
KR20230107079A (ko) 프레임 일체형 마스크 및 그 제조 방법
KR20220076999A (ko) 프레임 일체형 마스크의 제조 시스템 및 프레임 일체형 마스크의 제조 방법

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent