TWI776561B - Nano imprint replica mold making device - Google Patents
Nano imprint replica mold making device Download PDFInfo
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- TWI776561B TWI776561B TW110123036A TW110123036A TWI776561B TW I776561 B TWI776561 B TW I776561B TW 110123036 A TW110123036 A TW 110123036A TW 110123036 A TW110123036 A TW 110123036A TW I776561 B TWI776561 B TW I776561B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/40—Plastics, e.g. foam or rubber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/44—Compression means for making articles of indefinite length
- B29C43/46—Rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
本發明涉及一種奈米壓印用複製模製作裝置,包含:轉印部,其在從一側供應的薄膜形成複製模;薄膜供應部,其斷續地對薄膜進行退捲以向轉印部供應薄膜;薄膜回收部,其斷續地捲取薄膜以從轉印部回收薄膜,並且轉印部包含:載台部,其供安放形成有用於塗佈樹脂的圖案的母模;壓輥部,其向水平方向移動以形成複製模;以及轉印部驅動單元,其為了使壓輥部從一側的待機位置移動至另一側並再返回至待機位置而進行驅動。 The present invention relates to a replica mold making device for nanoimprinting, comprising: a transfer part that forms a replica mold on a film supplied from one side; a film supply part that intermittently unwinds the film to feed the transfer part supplying the film; a film recovery section that intermittently winds the film to recover the film from the transfer section, and the transfer section includes: a stage section for placing a master mold on which a pattern for applying resin is formed; a pressing roll section , which is moved in the horizontal direction to form a copying mold; and a transfer portion driving unit which is driven in order to move the pressing roller portion from a standby position on one side to the other side and back to the standby position again.
Description
本發明涉及一種奈米壓印用複製模製作裝置。 The invention relates to a replica mold making device for nano-imprinting.
近來,在顯示製程和半導體製程中採用奈米壓印(Nano Imprint)製程,以在基板(例如,顯示面板和晶片(Wafer)等)的表面形成圖案(例如,用於結構化的成型圖案和蝕刻或蒸鍍的掩模圖案等)。 Recently, a Nano Imprint process is used in display processes and semiconductor processes to form patterns (for example, molding patterns for structuring and etched or evaporated mask pattern, etc.).
在利用模(Mold)以壓印(Imprint)形式在基板的表面形成奈米至微米大小的微細圖案的奈米壓印製程中,雖然也可以利用母模10在基板的表面直接形成圖案,但近來主要採用一種從母模10製作複製模20並利用所製作的複製模20在基板的表面形成圖案的方法。
In the nanoimprinting process of forming micro-patterns of nanometer to micrometer size on the surface of the substrate in the form of imprint by using a mold (Mold), although the
此時,可以製作從由母模10製作的一次複製模20進一步複製的二次複製模20。這種用於製作二次複製模20的一次複製模20也可以稱為母模10。也就是說,母模10可以指用於製作複製模20的模。此外,複製模20可以指從母模10製作的模。
At this time, the
作為製作這種複製模20的多種方法之一,有一種透過使壓輥部120從薄膜60的上側前進(模製工序)及後退(脫模工序)來將複製模20形成於薄膜60的輥轉印方法。
As one of the various methods for producing such a
另一方面,執行輥轉印方法的複製模20的製作裝置存在裝置的大小與壓輥部120前進的長度成比例地變大的問題。
On the other hand, the production apparatus of the
此外,複製模20的製作裝置存在著為了使薄膜60進入壓輥部120的角度恆定而致使裝置的大小變大的問題。
In addition, there is a problem that the size of the apparatus is increased in order to keep the angle at which the
並且,複製模20的製作裝置存在著在將樹脂70塗佈於母模10的圖案時發生塗佈容量的偏差的問題。
In addition, the production apparatus of the
本發明的目的在於,提供一種可以解決先前技術中所述的技術問題的奈米壓印用複製模製作裝置。 An object of the present invention is to provide a replica mold making device for nanoimprinting that can solve the technical problems described in the prior art.
本發明的實施例的奈米壓印用複製模製作裝置包含:轉印部,其在從一側供應的薄膜形成複製模;薄膜供應部,其斷續地對薄膜進行退捲以向轉印部供應薄膜;以及薄膜回收部,其斷續地捲取薄膜以從轉印部回收薄膜,並且轉印部包含:載台部,其供安放形成有用於塗佈樹脂的圖案的母模;壓輥部,其向水平方向移動以形成複製模;轉印部驅動單元,其為了使壓輥部從一側的待機位置移動至另一側並再返回至待機位置而進行驅動;光照射部,其向樹脂照射光;以及,結合移動部,其與光照射部和壓輥部結合以一同透過轉印部驅動單元移動,光照射部的照射方向以與載台部垂直的下側方向為基準朝向壓輥部傾斜。 A replica mold making apparatus for nanoimprinting according to an embodiment of the present invention includes: a transfer part that forms a replica mold on a thin film supplied from one side; a film supply part that intermittently unwinds the thin film to transfer the and a film recovery section that intermittently reels the film to recover the film from the transfer section, and the transfer section includes: a stage section for placing a master mold formed with a pattern for applying resin; a press a roller part, which moves in the horizontal direction to form a copying mold; a transfer part driving unit, which drives to move the pressing roller part from a standby position on one side to the other side and back to the standby position again; a light irradiation part, It irradiates light to the resin; and, a combined moving part is combined with the light irradiation part and the pressing roller part to move together through the transfer part driving unit, and the irradiation direction of the light irradiation part is based on the lower direction perpendicular to the stage part. It is inclined towards the pressing roller part.
根據實施例,光照射部包含照射方向導向部,照射方向導向部用以使照射方向在10度至80度內傾斜的方式進行導向。 According to an embodiment, the light irradiation portion includes an irradiation direction guide portion that guides the irradiation direction in such a way that the irradiation direction is inclined within 10 degrees to 80 degrees.
根據實施例,光照射部進一步包含遮光部,遮光部從光照射部凸出地配置,以遮蔽照射至樹脂的光,防止光被擴散而重疊地照射至樹脂。 According to an embodiment, the light irradiation portion further includes a light shielding portion disposed protruding from the light irradiation portion to shield the light irradiated to the resin and prevent the light from being diffused and irradiated to the resin overlappingly.
根據實施例,本發明之奈米壓印用複製模製作裝置進一步包含:導輥,其在薄膜回收部與轉印部之間配置有一個以上,以調整薄膜的進入角度,並且轉印部進一步包含薄膜角度維持輥部,薄膜角度維持輥部以改變薄膜進入壓輥部的角度的方式與壓輥部在垂直及水平方向上間隔開,薄膜角度維持輥部係配置為相較於壓輥部使從薄膜供應部供應的薄膜先進入,薄膜角度維持輥部與壓輥部之間的薄膜的長度對應於壓輥部為了形成複製模而在水平方向上移動的長度,以使薄膜角度維持輥部與薄膜的兩個面中形成有複製模的面接觸,但在進行脫模工序的過程中薄膜角度維持輥部不與複製模接觸,導輥與薄膜的兩個面中形成有複製模的面的不同的面接觸,以防止導輥與沿回收至薄膜回收部的薄膜移動的複製模接觸。 According to an embodiment, the device for making a replica mold for nanoimprinting of the present invention further includes: a guide roller, which is disposed between the film recovery part and the transfer part with at least one guide roller to adjust the entry angle of the film, and the transfer part further comprises: Including a film angle maintenance roll portion, the film angle maintenance roll portion is vertically and horizontally spaced from the pressure roll portion in a manner that changes the angle at which the film enters the pressure roll portion, and the film angle maintenance roll portion is configured to be relatively The film supplied from the film supply section is made to enter first, and the length of the film between the film angle maintaining roll section and the pressing roll section corresponds to the length that the pressing roll section moves in the horizontal direction in order to form the replication mold, so that the film angle maintaining roll The part is in contact with the two sides of the film where the replica mold is formed, but during the demolding process, the film angle maintaining roller part is not in contact with the replica mold, and the guide roller and the two sides of the film are formed with the replica mold. Different surfaces of the surfaces are in contact to prevent the guide roller from contacting the replica mold moving along the film recovered to the film recovery section.
根據實施例,奈米壓印用複製模製作裝置進一步包含:分配器部,其以不與母模的圖案重疊的方式將樹脂塗佈於塗佈區域,塗佈區域是位於一側的待機位置的壓輥部與母模的圖案之間的空間;以及壓輥驅動單元,其以移動壓輥部的垂直位置以在載台部與壓輥部之間形成間距的方式進行驅動,並且在壓輥部透過載台部與壓輥部之間的間距使樹脂從一側的待機位置向另一側的移動的水平方向上擴散以塗佈於母模的圖案。 According to an embodiment, the replica mold making apparatus for nanoimprinting further includes: a dispenser section that applies resin to a coating area in a standby position on one side in a manner not to overlap with the pattern of the master mold the space between the pressing roller part and the pattern of the master mold; and the pressing roller driving unit, which is driven in such a manner as to move the vertical position of the pressing roller part to form a space between the stage part and the pressing roller part, and The roller portion spreads the resin in the horizontal direction of the movement from the standby position on one side to the other side through the gap between the stage portion and the pressing roller portion, and is applied to the pattern of the master mold.
根據實施例,奈米壓印用複製模製作裝置進一步包含:載台驅動單元,其使載台部升降;以及分配器驅動單元,其將分配器部引入為了塗佈樹脂而透過載台驅動單元下降的載台部並再引出分配器部。 According to an embodiment, the replica molding apparatus for nanoimprinting further includes: a stage driving unit that elevates and lowers the stage part; and a dispenser driving unit that introduces the dispenser part to pass through the stage driving unit for resin coating The descending stage section is then led out of the dispenser section.
根據實施例,本發明提供一種奈米壓印用複製模製作裝置,其包含:轉印部,其在從一側供應的薄膜形成複製模;薄膜供應部,其斷續地對薄膜進行退捲以向轉印部供應薄膜;薄膜回收部,其斷續地捲取薄膜以從轉印 部回收薄膜;以及導輥,其在薄膜回收部與轉印部之間配置有一個以上,以將薄膜引導至薄膜回收部,並且為了使導輥僅與薄膜的兩個面中不形成複製模的面接觸,而不與形成有複製模的面接觸,轉印部包含:壓輥部,其以向水平方向移動以形成複製模的方式,其相較於薄膜回收部位於下側,並且相較於導輥位於供應薄膜的一側;轉印部驅動單元,其為了使壓輥部從待機位置朝向供應薄膜的一側移動以進行模製工序並再返回至待機位置以進行脫模工序而進行驅動;薄膜角度維持輥部,其以改變薄膜進入壓輥部的角度的方式相較於壓輥部位於供應薄膜的一側,從而隔著壓輥部位於導輥的相對側,並且相較於壓輥部位於上側;以及結合移動部,其使以薄膜角度維持輥部和壓輥部一同移動的方式結合,並且透過轉印部驅動單元移動,在從薄膜供應部向轉印部供應薄膜,並進行模製工序,並接續進行脫模工序,並且在從轉印部向薄膜回收部回收薄膜的過程中,薄膜角度維持輥部與壓輥部的相互位置不變,在薄膜角度維持輥部和壓輥部移動的過程中,導輥的位置不移動,在進行模製工序的過程中,薄膜角度維持輥部和壓輥部從導輥的間隔距離增大,在進行脫模工序的過程中,薄膜角度維持輥部和壓輥部從導輥的間隔距離減小。 According to an embodiment, the present invention provides a replica mold making apparatus for nanoimprinting, which includes: a transfer part that forms a replica mold on a film supplied from one side; and a film supply part that intermittently unwinds the film to supply the film to the transfer section; a film recovery section that takes up the film intermittently to remove the film from the transfer section part to recover the film; and guide rollers, one or more of which are arranged between the film recovery part and the transfer part to guide the film to the film recovery part, and in order that the guide rollers are only connected to the two sides of the film without forming a replica mold The surface of the film is in contact with the surface on which the copying mold is formed, and not with the surface on which the copying mold is formed. It is located on the side where the film is supplied compared to the guide roller; the transfer portion driving unit is used to move the pressing roller portion from the standby position toward the side where the film is supplied for the molding process and back to the standby position for the demolding process. Drive; the film angle maintaining roll portion is located on the side of the supply film compared to the nip roll portion in a manner that changes the angle of the film entering the nip roll portion, so as to be on the opposite side of the guide roll across the nip roll portion, and compared to the nip roll portion. on the upper side of the pressing roller part; and a combined moving part that combines the film angle maintaining roller part and the pressing roller part to move together, and is moved by the transfer part driving unit to supply the film from the film supply part to the transfer part , and carry out the molding process, followed by the demolding process, and in the process of recovering the film from the transfer part to the film recovery part, the mutual position of the film angle maintenance roller part and the pressing roller part is unchanged, and the film angle maintenance roller The position of the guide roller does not move during the movement of the roller part and the pressure roller part. During the molding process, the distance between the film angle maintenance roller part and the pressure roller part from the guide roller increases. During the process, the separation distance of the film angle maintenance roll section and the pressure roll section from the guide roll decreases.
根據實施例,薄膜角度維持輥部與薄膜供應部之間的距離比壓輥部與薄膜供應部之間的距離短,薄膜角度維持輥部與壓輥部之間的薄膜的長度對應於壓輥部為了形成複製模而在水平方向上移動的長度,以使薄膜角度維持輥部與薄膜的兩個面中形成有複製模的面接觸,但在進行脫模工序的過程中使薄膜角度維持輥部不與複製模接觸。 According to the embodiment, the distance between the film angle maintaining roller part and the film supply part is shorter than the distance between the pressing roller part and the film supplying part, and the length of the film between the film angle maintaining roller part and the pressing roller part corresponds to the pressing roller The length that the part moves in the horizontal direction in order to form the replica mold so that the film angle maintaining roller part comes into contact with the surface on which the replica mold is formed among the two sides of the film, but the film angle maintaining roller is in the process of performing the mold release process. The part is not in contact with the replica mold.
根據實施例,本發明提供一種奈米壓印用複製模製作裝置,包含:轉印部,其在從一側供應的薄膜形成複製模;以及分配器部,轉印部包含:載台部,其供安放在上表面形成有圖案的母模;壓輥部,其向水平方向移動以形成複製模;以及轉印部驅動單元,其為了使壓輥部從待機位置向水平方向移 動並再返回至待機位置而進行驅動,分配器部以不與母模的圖案重疊的方式將樹脂塗佈於載台部的上表面的塗佈區域,塗佈區域是位於待機位置的壓輥部與母模的圖案之間的空間,壓輥部在從待機位置向水平方向移動時使樹脂從塗佈區域向水平方向擴散以在母模的上表面塗佈樹脂,塗佈區域是不與母模的圖案重疊的區域,並且壓輥部在塗佈於母模的上表面的樹脂的上側移動時,將樹脂結合於母模的圖案以形成複製模,塗佈區域內的最初塗佈樹脂的位置與將樹脂結合於母模的圖案的位置在水平方向上間隔開。 According to an embodiment, the present invention provides a replica mold making apparatus for nanoimprinting, comprising: a transfer part that forms a replica mold on a film supplied from one side; and a dispenser part, the transfer part includes: a stage part, It is used to place a master mold on which a pattern is formed on the upper surface; a pressing roller part, which moves in the horizontal direction to form a copy mold; and a transfer part driving unit, which moves the pressing roller part from the standby position to the horizontal direction The dispenser part applies resin to the application area on the upper surface of the stage part, and the application area is the press roller located in the standby position so as not to overlap with the pattern of the master mold The space between the part and the pattern of the master mold, when the pressing roller part moves from the standby position to the horizontal direction, spreads the resin from the coating area to the horizontal direction to coat the resin on the upper surface of the master mold. The area where the pattern of the master mold overlaps, and when the pressing roller part moves on the upper side of the resin coated on the upper surface of the master mold, binds the resin to the pattern of the master mold to form a replica mold, and the initial coating resin in the coating area are spaced horizontally from the positions of the patterns that bond the resin to the master.
根據實施例,奈米壓印用複製模製作裝置進一步包含:載台驅動單元,其使載台部升降;以及分配器驅動單元,其將分配器部引入為了塗佈樹脂而透過載台驅動單元下降的載台部並再引出分配器部。 According to an embodiment, the replica molding apparatus for nanoimprinting further includes: a stage driving unit that elevates and lowers the stage part; and a dispenser driving unit that introduces the dispenser part to pass through the stage driving unit for resin coating The descending stage section is then led out of the dispenser section.
根據實施例,奈米壓印用複製模製作裝置進一步包含:壓輥驅動單元,其以移動壓輥部的垂直位置以在載台部與壓輥部之間形成間距的方式進行驅動,壓輥部從載台部與壓輥部之間的空間移動以使樹脂透過載台部與壓輥部之間的間距擴散。 According to an embodiment, the replica molding apparatus for nanoimprinting further includes: a pressing roller driving unit which is driven in such a manner as to move the vertical position of the pressing roller part to form a gap between the stage part and the pressing roller part, the pressing roller The part moves from the space between the stage part and the pressing roll part to spread the resin through the gap between the stage part and the pressing roll part.
根據實施例,本發明提供一種奈米壓印用複製模製作方法,包含:載台下降步驟,使載台部下降;塗佈步驟,分配器部在向載台部的內側引入並從載台部的內側引出時不直接將樹脂塗佈於母模的圖案,而是在作為與形成於母模的上表面的圖案間隔開的空間且載台部的上表面的塗佈區域塗佈樹脂;載台上升步驟,使載台部上升;以及模製步驟,壓輥部在從待機位置向水平方向移動時以使樹脂塗佈於形成在母模的上表面的圖案的方式使樹脂向水平方向擴散,在模製步驟中,壓輥部在塗佈於母模的上表面的樹脂的上側移動時,將樹脂結合於母模的圖案以形成複製模,塗佈區域內的最初塗佈樹脂的位置與將樹脂結合於母模的圖案的位置在水平方向上間隔開。 According to an embodiment, the present invention provides a method for manufacturing a replica mold for nanoimprinting, comprising: a step of lowering a stage to lower a stage portion; and a step of coating, in which a dispenser portion is introduced into the inner side of the stage portion and removed from the stage When the inner side of the part is drawn out, the resin is not directly applied to the pattern of the master mold, but the resin is applied to the application area of the upper surface of the stage part as a space spaced from the pattern formed on the upper surface of the master mold; a stage raising step of raising the stage part; and a molding step of making the resin horizontally apply the resin to the pattern formed on the upper surface of the master mold when the pressing roller part moves in the horizontal direction from the standby position Diffusion, in the molding step, when the pressing roller portion moves on the upper side of the resin coated on the upper surface of the master mold, binds the resin to the pattern of the master mold to form a replica mold, the initially coated resin in the coating area is The positions are horizontally spaced from the positions of the patterns that bond the resin to the master.
根據實施例,奈米壓印用複製模製作方法進一步包含:脫模步驟,以使母模和複製模分離並附接於薄膜的下側的方式使壓輥部移動至待機位置;以及回收步驟,為了使複製模移動至薄膜回收部側而移動薄膜。在模製步驟中,光照射部在與壓輥部一同移動時固化樹脂,在脫模步驟中,透過在壓輥部移動至待機位置時由薄膜角度維持輥部形成的薄膜進入壓輥部的角度,複製模從母模分離。在回收步驟之後,為了形成另一複製模而再次執行載台下降步驟、塗佈步驟、載台上升步驟、模製步驟、脫模步驟以及回收步驟。 According to an embodiment, the method for producing a replica mold for nanoimprinting further includes: a demolding step of moving the pressing roller part to a standby position in such a manner that the master mold and the replica mold are separated and attached to the lower side of the film; and a recycling step , and the film is moved in order to move the transfer mold to the side of the film recovery unit. In the molding step, the light irradiation section cures the resin while moving with the pressing roll section, and in the demolding step, the film enters the pressing roll section through the film formed by the film angle maintaining roll section when the pressing roll section moves to the standby position. angle, the replica is separated from the master. After the recovery step, the stage lowering step, the coating step, the stage raising step, the molding step, the demolding step, and the recovery step are performed again in order to form another replica mold.
根據實施例,提供一種奈米壓印用複製模製作裝置,包含:轉印部,其在從一側供應的薄膜形成複製模;薄膜供應部,其斷續地對薄膜進行退捲以向轉印部供應薄膜;薄膜回收部,其斷續地捲取薄膜以從轉印部回收薄膜,並且轉印部包含:載台部,其供安放形成有用於塗佈樹脂的圖案的母模;壓輥部,其向水平方向移動以形成複製模;薄膜角度維持輥部,其以改變薄膜進入壓輥部的角度的方式與壓輥部在垂直及水平方向上間隔開,壓輥部和薄膜角度維持輥部向與以將由薄膜供應部退捲的薄膜回收至薄膜回收部的方式移動的薄膜的移動方向相反的方向移動以執行模製工序,並且壓輥部和薄膜角度維持輥部向薄膜的移動方向移動以執行脫模工序。 According to an embodiment, there is provided a replica mold making apparatus for nanoimprinting, comprising: a transfer part that forms a replica mold on a film supplied from one side; a film supply part that intermittently unwinds the film to transfer The printing section supplies the film; the film recovery section intermittently winds the film to recover the film from the transfer section, and the transfer section includes: a stage section for placing a master mold formed with a pattern for applying resin; a press The roll section, which moves horizontally to form the replica mold; the film angle maintenance roll section, which is vertically and horizontally spaced from the pinch roll section in a manner that changes the angle at which the film enters the pinch roll section, the pinch roll section and the film angle The maintaining roller portion moves in the opposite direction to the moving direction of the film moving in such a way as to recover the film unwound from the film supply portion to the film recovery portion to perform the molding process, and the pressing roller portion and the film angle maintaining roller portion move toward the direction of the film. Move in the moving direction to perform the demolding process.
根據實施例,薄膜角度維持輥部係配置為相較於壓輥部朝向與薄膜的移動方向相反的方向。 According to an embodiment, the film angle maintaining roll portion is configured to face in a direction opposite to the moving direction of the film relative to the pressing roll portion.
根據實施例,薄膜回收部相較於壓輥部位於上側。 According to an embodiment, the film recovery part is located on the upper side compared to the pressing roller part.
根據實施例,轉印部進一步包含結合移動部,結合移動部使以薄膜角度維持輥部和壓輥部一同移動的方式結合,並且透過轉印部驅動單元移動。 According to an embodiment, the transfer portion further includes a coupling moving portion that combines the film angle maintaining roller portion and the pressing roller portion to move together, and is moved by the transfer portion driving unit.
根據實施例,薄膜角度維持輥部與壓輥部之間的薄膜的長度對應於壓輥部為了形成複製模而在水平方向上移動的長度,以使薄膜角度維持輥部 與薄膜的兩個面中形成有複製模的面接觸,但在進行脫模工序的過程中薄膜角度維持輥部不與複製模接觸。 According to the embodiment, the length of the film between the film angle maintaining roller portion and the pressing roller portion corresponds to the length that the pressing roller portion moves in the horizontal direction for forming the replica mold, so that the film angle maintaining roller portion It is in contact with the surface on which the replica mold is formed among both surfaces of the film, but the film angle maintaining roll portion does not come into contact with the replica mold during the mold release process.
根據實施例,薄膜角度維持輥部係配置為相較於壓輥部使得從薄膜供應部供應的薄膜先進入。 According to an embodiment, the film angle maintaining roll section is configured such that the film supplied from the film supply section enters earlier than the pressing roll section.
根據實施例,奈米壓印用複製模製作裝置進一部包含:導輥,其在薄膜回收部與轉印部之間配置有一個以上,以調整薄膜的進入角度,導輥與薄膜的兩個面中形成有複製模的面的不同的面接觸,以防止導輥與沿回收至薄膜回收部的薄膜移動的複製模接觸。 According to an embodiment, the nanoimprint replica mold making device further includes: guide rollers, which are arranged between the film recovery part and the transfer part to adjust the entry angle of the film, two guide rollers and the film Different faces of the faces on which the replica molds are formed are in contact to prevent the guide rollers from coming into contact with the replica molds moving along the film recovered to the film recovery section.
首先,由於具備長度小於第一最小間距的第二最小間距,使得壓輥部移動的最小限度的長度變小,因而具有減小裝置的大小的效果。此外,與第一最小間距相比,具有減少薄膜的消耗量的效果。並且,當使用具備第二最小間距的薄膜來進行奈米壓印工序時,與第一最小間距相比,可以減少從一複製模移動至下一個複製模所需的時間,因而具有能夠縮短工序時間的效果。進一步地,由於透過壓輥部壓於母模的樹脂立即被固化,因而具有能夠縮短樹脂的固化所需的工序時間的效果。此外,由於樹脂立即被固化,因而使得透過壓輥部形成於樹脂的圖案的變化最小化的狀態形成複製模,進而具有防止複製模發生不良的效果。 First, since the second minimum pitch having a length smaller than the first minimum pitch is provided, the minimum length of the movement of the pressing roller portion is reduced, and thus there is an effect of reducing the size of the apparatus. Furthermore, compared with the first minimum pitch, there is an effect of reducing the consumption of the thin film. In addition, when the nanoimprint process is performed using a film having the second minimum pitch, the time required to move from one replica to the next can be reduced compared to the first minimum pitch, so that the process can be shortened. effect of time. Furthermore, since the resin pressed against the master mold through the press roll portion is immediately cured, there is an effect that the process time required for curing the resin can be shortened. In addition, since the resin is immediately cured, the transfer mold can be formed in a state in which the change of the pattern formed in the resin through the pressing roller portion is minimized, and there is an effect of preventing failure of the transfer mold.
此外,照射方向導向部具有能夠根據目的而在限定的數值內改變光照射部的光照射方向的斜率的方式以進行導向的效果。 In addition, the irradiation direction guide portion has an effect of being able to guide by changing the slope of the light irradiation direction of the light irradiation portion within a limited value according to the purpose.
進一步地,遮光部以使樹脂的固化的程度恆定的方式遮蔽擴散照射區域,防止擴散照射區域重疊地向樹脂照射光,從而不會影響脫模工序,進而具有防止複製模發生不良的效果。並且,由於具備長度小於第一間隔距離的 第二間隔距離,使得壓輥部移動的最小限度的長度變小,進而具有減小裝置的大小的效果。 Furthermore, the light shielding portion shields the diffusion irradiation area so that the degree of curing of the resin is constant, and prevents the diffusion irradiation area from irradiating light to the resin overlappingly. And, due to having a length less than the first separation distance The second interval distance reduces the minimum length of the movement of the pressing roller portion, thereby reducing the size of the apparatus.
進一步地,薄膜角度維持輥部具有維持進入角度恆定的效果。並且,由於薄膜角度維持輥部可以使與壓輥部相鄰的導輥間隔開的水平位置最小化,因而具有減小裝置的大小的效果。 Further, the film angle maintaining roll portion has the effect of maintaining the entry angle constant. Also, since the film angle maintaining roller portion can minimize the horizontal position spaced apart from the guide rollers adjacent to the pressing roller portion, there is an effect of reducing the size of the apparatus.
此外,薄膜角度維持輥部防止因壓輥部的移動而引起的進入角度的變更,因此即使沒有獨立的機構也可以維持薄膜的張力,進而具有能夠順暢地進行薄膜的斷續地供應的效果。 In addition, since the film angle maintaining roller prevents the entry angle from being changed due to the movement of the pressing roller, the tension of the film can be maintained even without an independent mechanism, and there is an effect that the intermittent supply of the film can be smoothly performed.
並且,由於薄膜角度維持輥部與壓輥部分離,因此即使不包含移動位置的構件或單獨分離用於模製工序和脫模工序的構件,也可以具有防止因複製模與薄膜角度維持輥部接觸而造成的損傷的效果。 In addition, since the film angle maintaining roller part is separated from the pressing roller part, even if the member for moving position is not included or the members used for the molding process and the demolding process are separated separately, it is possible to have a prevention roller part that prevents the film angle maintaining roller part from being caused by the replication mold and the film angle maintaining roller. The effect of damage caused by contact.
此外,相較於壓輥部位於上側的薄膜回收部具有防止導輥與複製模接觸的效果。 In addition, the film recovery part located on the upper side of the pressing roller part has the effect of preventing the guide roller from contacting the replica mold.
並且,由於間接地使樹脂擴散以塗佈於母模的圖案,因而具有不會發生塗佈於母模的圖的樹脂的塗佈容量的偏差的效果。 Furthermore, since the resin is indirectly diffused and applied to the pattern of the master mold, there is an effect that variation in the coating capacity of the resin applied to the pattern of the master mold does not occur.
10:母模 10: Master mold
20:複製模 20: Copy the mold
30:薄膜供應部 30: Film Supply Department
40:薄膜回收部 40: Film Recycling Department
50:導輥 50: Guide roller
60:薄膜 60: Film
70:樹脂 70: Resin
100:轉印部 100: Transfer part
110:載台部 110: Stage Department
120:壓輥部 120: Press roller part
130:轉印部驅動單元 130: Transfer section drive unit
131:馬達 131: Motor
132:滾珠螺桿 132: Ball Screw
133:區塊 133: Block
140:光照射部 140: Light irradiation part
141:遮光部 141: Shading part
142A:直接照射區域 142A: Directly irradiated area
142B:擴散照射區域 142B: Diffuse irradiated area
143:發光部 143: Luminous part
150:結合移動部 150: Combining the mobile part
160:照射方向導向部 160: Irradiation direction guide
161:凸出部 161: Projection
162:導向槽 162: Guide groove
163:固定部 163: Fixed part
170:薄膜角度維持輥部 170: Film angle maintenance roll section
180:分配器部 180: Dispenser Department
181:分配器噴嘴 181: Dispenser Nozzle
200:載台驅動單元 200: Stage drive unit
210:壓輥驅動單元 210: Roller drive unit
L1:第一最小間距 L1: The first minimum spacing
L2:第二最小間距 L2: Second minimum spacing
PA:塗佈區域 PA: Coating area
S1:第一間隔距離 S1: The first separation distance
S2:第二間隔距離 S2: Second separation distance
AG:傾斜度 AG: Inclination
FG:進入角度 FG: entry angle
圖1為根據本發明的實施例的奈米壓印用複製模製作裝置的示意圖。 FIG. 1 is a schematic diagram of a replica mold manufacturing apparatus for nanoimprinting according to an embodiment of the present invention.
圖2為根據本發明的實施例的轉印部的示意圖。 2 is a schematic diagram of a transfer portion according to an embodiment of the present invention.
圖3為圖2的背面的示意圖。 FIG. 3 is a schematic view of the back side of FIG. 2 .
圖4至圖6為根據本發明的實施例的光照射部的示意圖。 4 to 6 are schematic diagrams of a light irradiation part according to an embodiment of the present invention.
圖7為根據本發明的實施例的第一間隔距離及第二間隔距離的示意圖。 7 is a schematic diagram of a first separation distance and a second separation distance according to an embodiment of the present invention.
圖8為根據本發明的實施例的進入角度的示意圖。 8 is a schematic diagram of an entry angle according to an embodiment of the present invention.
圖9至圖15為根據本發明的實施例的模製工序及脫模工序的示意圖。 9 to 15 are schematic views of a molding process and a demolding process according to an embodiment of the present invention.
圖16至圖20為根據本發明的實施例的分配器部的示意圖(作為參考,所繪示 的分配器噴嘴標示在分配器部中的位置,而實際上分配器噴嘴的塗佈方向 係配置為朝向載台部)。 16-20 are schematic diagrams of a dispenser portion according to an embodiment of the present invention (for reference, the depicted The position of the dispenser nozzle marked in the dispenser section is actually the coating direction of the dispenser nozzle is arranged to face the stage portion).
下文中參照附圖對本發明的實施例進行詳細說明,以便本發明所屬技術領域中的具有通常知識者能夠容易地實施。 Hereinafter, the embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those having ordinary knowledge in the technical field to which the present invention pertains can be easily implemented.
本發明可以實現為多種不同的形態,並不限定於此處說明的實施例。 The present invention can be implemented in many different forms, and is not limited to the embodiments described herein.
在本發明中,水平方向可以指圖中向X軸的方向或向左側及右側的方向,垂直方向可以指圖中向Y軸的方向或向上側及下側的方向。 In the present invention, the horizontal direction may refer to the X-axis direction or the left and right directions in the drawing, and the vertical direction may refer to the Y-axis direction or the upward and downward directions in the drawing.
在本發明中,長度可以指在X軸的方向上的相對距離,而高度可以指在Y軸的方向上的相對距離。 In the present invention, the length may refer to the relative distance in the direction of the X axis, and the height may refer to the relative distance in the direction of the Y axis.
近年來,在顯示製程和半導體製程中採用奈米壓印(Nano Imprint)製程,以在基板(例如,顯示面板和晶片(Wafer)等)的表面形成圖案(例如,用於結構化的成型圖案和蝕刻或蒸鍍的掩模圖案等)。 In recent years, a Nano Imprint process has been used in display and semiconductor processes to form patterns (for example, molding patterns for structuring) on the surface of substrates (for example, display panels and wafers, etc.). and etching or evaporation mask pattern, etc.).
在利用模(Mold)以壓印(Imprint)形式在基板的表面形成奈米至微米大小的微細圖案的奈米壓印製程中,雖然也可以利用母模10在基板的表面直接形成圖案,但近來主要採用一種從母模10製作複製模20並利用所製作的複製模20在基板的表面形成圖案的方法。
In the nanoimprinting process of forming micro-patterns of nanometer to micrometer size on the surface of the substrate in the form of imprint by using a mold (Mold), although the
此時,可以製作從由母模10製作的一次複製模20進一步複製的二次複製模20。這種用於製作二次複製模20的一次複製模20也可以稱為母模10。也就是說,母模10可以指用於製作複製模20的模。此外,複製模20可以指從母模10製作的模。
At this time, the
作為這種製作複製模20的多種方法之一,有一種透過使得壓輥部120從薄膜60的上側前進(模製工序)及後退(脫模工序)來將複製模20形成於薄膜60的輥轉印方法。
As one of the various methods of producing the
另一方面,執行輥轉印方法的複製模20的製作裝置存在裝置的大小與壓輥部120前進的長度成比例地變大的問題。
On the other hand, the production apparatus of the
此外,複製模20的製作裝置存在有為了使薄膜60進入壓輥部120的角度恆定而致使裝置的大小變大的問題。
In addition, there is a problem that the size of the apparatus is increased in order to keep the angle at which the
並且,複製模20的製作裝置存在有在將樹脂70塗佈於母模10的圖案時發生塗佈容量的偏差的問題。
In addition, the production apparatus of the
為了解決這樣的問題,如圖1至圖3所示,本發明的實施例的奈米壓印用複製模20的製作裝置可以包含轉印部100、薄膜供應部30以及薄膜回收部40。
In order to solve such a problem, as shown in FIGS. 1 to 3 , the manufacturing apparatus of the
轉印部100可以在從一側供應的薄膜60的下側形成複製模20。
The
薄膜供應部30可以斷續地對薄膜60進行退捲以朝向轉印部100供應薄膜60。
The
薄膜回收部40可以斷續地捲取薄膜60以從轉印部100回收薄膜60。
The
上述轉印部100可以包含載台部110、壓輥部120以及轉印部驅動單元130。
The above-described
在載台部110,可以安放形成有用於塗佈樹脂70的圖案的母模10。
On the
形成於母模10的圖案可以透過直接在硬質基板的上表面加工圖案來形成,或者透過將圖案附接於基板的上表面來形成。在下文中,當說明母模10時,可以省略圖案的形成而進行說明。
The pattern formed on the
壓輥部120可以在水平方向上移動以透過輥轉印方法來形成複製模20。
The
轉印部驅動單元130可以為了使壓輥部120從一側的待機位置移動至另一側並再返回至待機位置而進行驅動。也就是說,轉印部驅動單元130可以為了使壓輥部120從待機位置在水平方向上移動後,並且返回至待機位置而進行驅動。例如,轉印部驅動單元130可以為了使壓輥部120從待機位置朝向供應薄膜60的一側移動以進行模製工序,並且使壓輥部120再次返回至待機位置以進行脫模工序而進行驅動。
The transfer
轉印部驅動單元130可以是致動器。例如,如圖3所示,轉印部驅動單元130可以包含馬達131、透過馬達131旋轉的滾珠螺桿132、以及透過滾珠螺桿132移動的區塊133。此外,區塊133可以透過與下文中所述的結合移動部150結合而一同移動,使得結合於結合移動部150的壓輥部120在水平方向上移動。
The transfer
在薄膜供應部30與轉印部100之間以及薄膜回收部40與轉印部100之間中的至少一處,可以配置有至少一個調整薄膜60的進入角度FG的導輥50。例如,至少一個導輥50可以配置於薄膜回收部40與轉印部100之間以將薄膜60引導至薄膜回收部40。
At least one
母模10和樹脂70可以位於載台部110與薄膜60之間。例如,可以在載台部110的上側安放母模10,在形成於母模10的上表面的圖案的上側塗佈樹脂70,並且使薄膜60位於樹脂70的上側。此時,從薄膜60的上側在水平方向上移動的壓輥部120對薄膜60加壓,由此可以將位於薄膜60的下側的樹脂70壓於母模10。
The
壓輥部120可以在從一側的待機位置移動至另一側時將樹脂70結合於母模10的圖案(模製工序)以形成複製模20。此外,壓輥部120可以在從另一側返回至一側的待機位置時分離母模10和複製模20(脫模工序)以形成附接於薄膜60的複製模20。也就是說,壓輥部120可以從待機位置在水平方向上移動以進行模製工序並再返回至待機位置以進行脫模工序來形成複製模20。例如,壓輥部120可以從待機位置朝向供應薄膜60的一側移動以進行模製工序,並且壓輥部120可以再返回至待機位置以進行脫模工序來形成複製模20。
The
作為複製模20的製作裝置的主要實施例,有關於光照射部140、薄膜角度維持輥部170及分配器部180的實施例將在下文中詳細說明。接下來,將針對關於光照射部140、薄膜角度維持輥部170以及分配器部180的實施例分別進行說明。然而,作為實施例,可以分別或兩個以上同時應用於複製模20的製作裝置。
As the main embodiment of the manufacturing apparatus of the
首先,將針對關於複製模20的製作裝置的光照射部140的實施例進行說明。
First, an embodiment of the
如圖4中的(a)部分所示,當光照射部140的照射方向朝向與載台部110垂直的下側方向時,可以與從光照射部140的照射區域到達壓輥部120所經過的母模10的區域為止的長度為基準,成比例地決定第一最小間距L1,第一最小間距L1是彼此相鄰地形成於薄膜60的一對複製模20之間所隔開的長度。
As shown in part (a) of FIG. 4 , when the irradiation direction of the
由於上述的第一最小間距L1是壓輥部120移動的最小限度的長度,因而存在有裝置的大小與第一最小間距L1成比例地變大的問題。此外,存在有薄膜60的消耗量與第一最小間距L1成比例地增加的問題。並且,當使用具備第一最小間距L1的薄膜60進行奈米壓印工序時,由於從一複製模20移動至下一個複製模20所需的時間與第一最小間距L1成比例地增加,因而存在有工序的
速度減慢的問題。另一方面,存在有因由壓輥部120形成於樹脂70的圖案隨著時間點的經過會發生變化而致使複製模20發生不良的問題。
Since the above-described first minimum pitch L1 is the minimum length of the movement of the
為了解決這樣的問題,如圖4的(b)和圖5所示,作為對實施例的具體說明,轉印部100可以包含光照射部140和結合移動部150。
In order to solve such a problem, as shown in FIG. 4( b ) and FIG. 5 , as a specific description of the embodiment, the
光照射部140可以透過由作為光源的發光部143產生的光來向樹脂70照射光。
The
此時,樹脂70可以是透過光能固化的光固化樹脂。此外,光照射部140照射至樹脂70的光可以是紫外線(Ultraviolet light)。也就是說,樹脂70可以透過光照射部140照射的光而固化。
At this time, the
光照射部140可以形成有使照射方向以與載台部110垂直的下側方向為基準朝向壓輥部120的方式傾斜的傾斜度AG。
The
光照射部140的傾斜度AG可以形成為用於對壓輥部120所經過的母模10立即照射光的斜率。也就是說,可以立即固化被壓輥部120壓於母模10的樹脂70。
The inclination AG of the
如圖5所示,光照射部140的傾斜度AG可以以朝向被定義為0度的載台部110的方向和朝向被定義為90度的壓輥部120的方向為基準而形成為10度至80度的斜率。
As shown in FIG. 5 , the inclination AG of the
光照射部140照射樹脂70的光可以形成光到達樹脂70的照射區域。
The light irradiated by the
結合移動部150可以與光照射部140和壓輥部120結合以一同透過轉印部驅動單元130移動。
The combined moving
當光照射部140的照射方向以與載台部110垂直的下側方向為基準朝向壓輥部120傾斜而形成有傾斜度AG時,可以以與光照射部140的照射區域
達到壓輥部120所經過的母模10的區域為止的長度為基準,成比例地決定形成於薄膜60的彼此相連的一對複製模20之間的第二最小間距L2。
When the irradiation direction of the
就上述的第二最小間距L2而言,與光照射部140的照射方向朝向與載台部110垂直的下側方向的情況相比,照射區域達到壓輥部120所經過的母模10的區域為止的長度變小,因而第二最小間距L2的長度可以小於第一最小間距L1的長度。
Compared with the case where the irradiation direction of the
藉由上述配置,由於具備長度小於第一最小間距L1的長度的第二最小間距L2,使得壓輥部120所移動的最小限度的長度變小,因而具有裝置的大小變小的效果。此外,與第一最小間距L1相比,具有薄膜60的消耗量減少的效果。並且,當使用具備第二最小間距L2的薄膜60進行奈米壓印工序時,與第一最小間距L1相比,減少了從一複製模20移動至下一個複製模20所需的時間,因而具有能夠縮短工序時間的效果。此外,透過壓輥部120壓於母模10的樹脂70立即被固化,因而具有能夠縮短樹脂70的固化所需的工序時間的效果。並且,由於樹脂70被立即固化,以使由壓輥部120形成於樹脂70的圖案的變化最小化的狀態形成複製模20,因而具有防止複製模20發生不良的效果。
With the above arrangement, since the second minimum pitch L2 having a length smaller than that of the first minimum pitch L1 is provided, the minimum length of the movement of the
如圖5和圖6所示,作為對實施例的具體說明,光照射部140可以包含照射方向導向部160。
As shown in FIGS. 5 and 6 , as a specific description of the embodiment, the
照射方向導向部160可以透過使得其照射方向與呈0度以照射壓輥部120的下側的載台部110垂直的下側方向為基準,進而在10度至80度內傾斜的方式進行導向。
The irradiation
作為一實施例,如圖5和圖6所示,照射方向導向部160可以是在形成為以對從形成為能夠旋轉的光照射部140凸出的凸出部161的移動進行導向以引導光照射方向的斜率的方式具備長度的曲線形態的導向槽162結合以防止照射方向的斜率變化的方式進行固定的固定部163的結構。
As an example, as shown in FIGS. 5 and 6 , the irradiation
作為另一實施例,雖然圖中未繪示出,照射方向導向部160為可以透過致動器(Actuator)以改變光照射方向的斜率的結構。
As another embodiment, although not shown in the drawings, the irradiation
如此,照射方向導向部160具有以能夠根據目的而在限定的數值內改變光照射部140的光照射方向的斜率的方式進而進行導向的效果。
In this way, the irradiation
如圖4所示,照射區域可以由光照射部140的發光部143所產生的光直接到達樹脂70的直接照射區域142A和直接照射區域142A的周圍的光擴散而到達樹脂70的擴散照射區域142B構成。
As shown in FIG. 4 , the irradiation area can be diffused by the light generated by the
可以透過擴散照射區域142B對透過光照射部140的直接照射區域142A重疊地照射光,以完成樹脂70的光照射的區域。此時,被重疊地照射光的樹脂70的區域的固化程度會不同。例如,與光照射部140結束光照射的樹脂70的另一側相比,在光照射部140開始光照射的樹脂70的一側透過擴散照射區域142B更多地重疊地照射光,因而固化的程度可能更高。
The
這樣的光照射的重疊引起的固化程度的差異將影響母模10和複製模20的分離,從而存在複製模20發生不良的問題。
The difference in the degree of curing caused by the overlapping of such light irradiation affects the separation of the
如圖7的(a)部分所示,雖然可以透過使擴散照射區域142B完全經過樹脂70以對樹脂70的所有區域重疊地照射光來解決固化程度不同的問題,但這樣可能會與擴散照射區域142B完全經過樹脂70,而相應地決定壓輥部120與樹脂70之間的第一間隔距離S1。
As shown in part (a) of FIG. 7 , although it is possible to solve the problem of different degrees of curing by passing the diffusely
由於這樣的第一間隔距離S1是壓輥部120所移動的最小限度的長度,因而存在裝置的大小與第一間隔距離S1成比例地變大的問題。
Since the first separation distance S1 is the minimum length that the
為了解決這樣的問題,作為對本實施例的具體說明,如圖6所示,光照射部140可以包含遮光部141。
In order to solve such a problem, as a specific description of this embodiment, as shown in FIG. 6 , the
遮光部141可以被配置為從光照射部140凸出以遮蔽照射至樹脂70的光擴散,進而防止光重疊地照射至樹脂70。
The
遮光部141可以被配置使光照射部140的照射區域位於遮光部141與壓輥部120之間。
The
遮光部141的寬度可以大於光照射部140的發光部143,並且可以具備不妨礙薄膜60的移動路線的凸出長度。例如,如圖6所示,遮光部141可以形成為板狀並配置於光照射部140。
The width of the
如圖7的(b)部分所示,遮光部141遮蔽從擴散照射區域142B向樹脂70重疊地照射的光,從而使樹脂70的固化程度恆定,並且可以使壓輥部120與樹脂70之間的第二間隔距離S2最小化。
As shown in part (b) of FIG. 7 , the
藉由上述配置,遮光部141遮蔽從擴散照射區域142B向樹脂70重疊地照射的光,以使樹脂70的固化程度恆定,從而不會影響脫模工序,進而具有防止複製模20發生不良的效果。此外,由於具備長度小於第一間隔距離S1的第二間隔距離S2,使得壓輥部120所移動的最小限度的長度變小,因而具有裝置的大小變小的效果。
With the above arrangement, the
接下來,將針對複製模20的製作裝置中的薄膜角度維持輥部170的實施例進行說明。
Next, the example of the film angle maintaining
薄膜角度維持輥部170可以配置為相較於壓輥部120使得從薄膜供應部30供應的薄膜60先進入。例如,薄膜角度維持輥部170可以相較於壓輥部120位於供應薄膜60的一側,並且可以相較於壓輥部120位於上側。此外,薄膜角度維持輥部170和光照射部140可以隔著壓輥部120位於兩側,而壓輥部120可以相較於光照射部140位於供應薄膜60的一側。
The film angle maintaining
作為薄膜60進入壓輥部120的角度的進入角度FG可以由相鄰的輥的水平位置決定。
The entry angle FG, which is the angle at which the
如圖8的(a)部分所示,就進入角度FG而言,在壓輥部120從一側的待機位置移動至另一側並再返回至待機位置的過程中,隨時可以改變進入角度
FG。也就是說,為了模製工序和脫模工序的進行,隨著壓輥部120以水平位置與相鄰的導輥50相鄰的方式移動並以間隔開的方式移動,可以改變進入角度FG。
As shown in part (a) of FIG. 8 , with regard to the entry angle FG, the entry angle can be changed at any time during the movement of the
這樣的進入角度FG存在有當與位於待機位置的壓輥部120相鄰的導輥50的水平位置越相鄰時,進入角度FG的變化越急劇的問題。此外,當進入角度FG急劇變化時,因脫模工序中的母模10和複製模20的分離不會以相同的角度進行而將導致複製模20發生不良的問題。此外,為了進行模製工序和脫模工序,需要維持薄膜60的張力,但是,當進入角度FG急劇變化時,薄膜60的張力也會發生變化,因而存在有需要獨立的機構以維持薄膜60的張力的問題。例如,用於維持張力的獨立機構可以是包含位置隨薄膜60的張力的變化而變化以維持薄膜60的張力的張力輥機構,或者是薄膜供應部30相對於為了對薄膜60進行退捲而旋轉的方向而進行逆向旋轉,或者薄膜回收部40相對於為了捲取薄膜60而旋轉的方向而進行逆向旋轉,又或者薄膜供應部30和薄膜回收部40均逆向旋轉以維持薄膜60的張力的機構。此外,用於維持薄膜60的張力的獨立機構的存在有妨礙了順暢的薄膜60的斷續地供應的問題。此時,如圖8的(b)部分所示,當與位於待機位置的壓輥部120相鄰的導輥50的水平位置間隔開時,可以解決進入角度FG急劇變化的問題,儘管進入角度FG的變化的幅度較小,但仍有效,並且存在有因與位於待機位置的壓輥部120相鄰的輥的水平位置被間隔開而導致裝置的大小變大的又一問題。
Such an approach angle FG has a problem in that the change of the approach angle FG becomes steeper as the horizontal position of the
為了解決這樣的問題,作為對實施例的具體說明,如圖2所示,轉印部100可以包含薄膜角度維持輥部170和結合移動部150。 In order to solve such a problem, as a specific description of the embodiment, as shown in FIG.
薄膜角度維持輥部170可以透過改變薄膜60進入壓輥部120的角度的方式以與壓輥部120在垂直及水平方向上間隔開。
The film angle
結合移動部150可以與薄膜角度維持輥部170和壓輥部120結合以一同透過轉印部驅動單元130移動。
The combined moving
如圖8的(c)部分所示,薄膜角度維持輥部170在壓輥部120從一側的待機位置移動至另一側並再返回至待機位置的過程中,其與壓輥部120一同移動,從而可以使得作為薄膜60進入壓輥部120的角度的進入角度FG維持恆定。
As shown in part (c) of FIG. 8 , the film angle maintaining
薄膜角度維持輥部170與壓輥部120之間的薄膜60的長度可以對應於壓輥部120為了形成複製模20而在水平方向上移動的長度,以使薄膜角度維持輥部170可以與薄膜60的兩個面中形成有複製模20的面接觸,但在進行脫模工序的過程中薄膜角度維持輥部170不與複製模20接觸。也就是說,如圖14所示,薄膜角度維持輥部170與壓輥部120之間的薄膜60的長度可以大於複製模20的水平方向上的長度。
The length of the
如此,薄膜角度維持輥部170具有維持進入角度FG恆定的效果。此外,薄膜角度維持輥部170可以使與壓輥部120相鄰的導輥50所間隔開的水平位置最小化,因而具有使裝置的大小變小的效果。此外,薄膜角度維持輥部170可以防止壓輥部120的移動而引起的進入角度FG的變化,從而使得即使沒有獨立機構也可以維持薄膜60的張力,進而具有使薄膜60的斷續地供應順暢的效果。
In this way, the film angle maintaining
為了使壓輥部120向從薄膜供應部30退捲的薄膜60被回收至薄膜回收部40的方式移動的薄膜60的移動方向移動以執行模製工序,並使壓輥部120向與薄膜60的移動方向相反的方向移動以執行脫模工序,薄膜角度維持輥部170需要被配置為相較於壓輥部120朝向薄膜60的移動方向。因此,所存在的問題是,在以透過模製工序和脫模工序形成的複製模20被回收至薄膜回收部40的方式進行移動的過程中,複製模20因與薄膜角度維持輥部170接觸而受損傷。
The molding process is performed so that the
為了防止複製模20與薄膜角度維持輥部170接觸,可以透過包含使薄膜角度維持輥部170與壓輥部120分離而移動位置的構件,或獨立地分離用於模製工序和脫模工序的構件來解決問題,但難以將其視為較佳的解決問題的方法。
In order to prevent the
為了解決這樣的問題,壓輥部120可以向與薄膜60的移動方向相反的方向移動以執行模製工序,並且壓輥部120可以向薄膜60的移動方向移動以執行脫模工序。此外,薄膜角度維持輥部170可以被配置為相較於壓輥部120朝向與薄膜60的移動方向相反的方向。
To solve such a problem, the
藉由上述配置,可以具有防止複製模20因與薄膜角度維持輥部170接觸而受損傷的效果,而無需包含使薄膜角度維持輥部170與壓輥部120分離而移動位置的構件,或者單獨地分離用於模製工序和脫模工序的構件。
With the above arrangement, the effect of preventing the
此外,為了防止導輥50與沿被回收至薄膜回收部40的薄膜60移動的複製模20接觸,薄膜回收部40可以相較於壓輥部120位於上側,使得導輥50與薄膜60的兩個面中形成有複製模20的面的不同的面接觸。也就是說,可以使導輥50僅與薄膜60的兩個面中不形成有複製模20的面接觸,而不與形成有複製模20的面接觸。
In addition, in order to prevent the
藉由上述配置,相較於壓輥部120位於上側的薄膜回收部40具有防止導輥50與複製模20接觸的效果。
With the above configuration, the
接下來,對關於複製模20的製作裝置的分配器部180的實施例進行說明。
Next, an embodiment of the
當將樹脂70直接塗佈於母模10的圖案時,會因塗佈得不均勻而發生塗佈容量的偏差。
When the
這樣的塗佈容量的偏差的問題在於,當塗佈容量不足時,會發生複製模20的圖案未形成的不良,而當塗佈容量過度時,會因樹脂70作為殘留物殘留在複製模20上而導致其污染其他構件進而發生不良。
The problem of such variation in coating capacity is that when the coating capacity is insufficient, the pattern of the
為了解決這樣的問題,作為對實施例的具體說明,如圖9所示,可以包含分配器部180和壓輥驅動單元210。
In order to solve such a problem, as a concrete description of the embodiment, as shown in FIG. 9 , the
分配器部180可以以不與母模10的圖案重疊的方式將樹脂70塗佈於塗佈區域PA,塗佈區域PA是位於待機位置的壓輥部120與母模10的圖案之間的空間。此時,塗佈區域PA可以是載台部110的上表面。
The
分配器部180可以透過分配器噴嘴181塗佈樹脂70。
The
如圖18至圖20所示,分配器部180可以以多種形態塗佈樹脂70。例如,如圖18所示,分配器部180可以以連成一行的方式塗佈樹脂70。此外,如圖19所示,分配器部180可以以連成兩行或連成更多行(雖然未繪示出)的方式塗佈樹脂70。此外,如圖20所示,分配器部180可以以呈一行或分離為多個行(雖然未繪示出,例如,呈虛線形狀)的方式塗佈樹脂70。
As shown in FIGS. 18 to 20 , the
壓輥驅動單元210可以移動壓輥部120的垂直位置以在載台部110與壓輥部120之間形成間距。
The pressing
透過這樣的載台部110與壓輥部120之間的間距,可以使樹脂70在壓輥部120所移動的水平方向上擴散以塗佈於母模10的圖案。
Through such a distance between the
並且,壓輥驅動單元210可以是致動器。
Also, the pressing
藉由上述配置,由於間接地使樹脂70擴散以塗佈於母模10的圖案,因而具有塗佈於母模10的圖案的樹脂70的塗佈容量的不會發生偏差的效果。
With the above arrangement, since the
作為對實施例的具體說明,如圖9所示,可以包含載台驅動單元200和分配器驅動單元(未繪示出)。
As a specific description of the embodiment, as shown in FIG. 9 , a
載台驅動單元200可以使載台部110升降。
The
分配器驅動單元可以將分配器部180引入透過載台驅動單元200下降的載台部110以塗佈樹脂70,並再引出分配器部180。
The dispenser driving unit may introduce the
載台驅動單元200和分配器驅動單元可以是致動器。
The
接下來,將針對前述的複製模20的製作裝置複製模20的製造工序進行詳細說明。
Next, the manufacturing process of the
首先,對模製工序步驟進行說明。 First, the molding process steps will be described.
如圖9至圖12所示,可以不直接在母模10的圖案上塗佈樹脂70,而是在設於與母模10的圖案間隔開的空間的塗佈區域PA塗佈樹脂70以在母模10的圖案模製(結合)樹脂70來形成複製模20。
As shown in FIGS. 9 to 12 , instead of directly applying the
例如,首先,如圖9所示,載台部110可以下降以在薄膜60與載台部110之間形成可以引入分配器部180的空間。
For example, first, as shown in FIG. 9 , the
之後,如圖16所示,分配器部180可以從載台部110的側面被引入載台部110的內側。
After that, as shown in FIG. 16 , the
並且,如圖17和圖18所示,分配器部180被引出時可以將樹脂70塗佈於塗佈區域PA。
Furthermore, as shown in FIGS. 17 and 18 , when the
並且,如圖10所示,塗佈有樹脂70的載台部110可以上升。
Then, as shown in FIG. 10 , the
並且,如圖11和圖12所示,壓輥部120在從一側的待機位置移動至另一側時可以使塗佈於塗佈區域PA的樹脂70擴散以塗佈於母模10的圖案。也就是說,可以透過載台部110與壓輥部120之間的間距使樹脂70在壓輥部120所移動的水平方向上擴散以塗佈於母模10的圖案。
Furthermore, as shown in FIGS. 11 and 12 , when the
此時,壓輥部120可以在在塗佈於母模10的圖案的樹脂70的上側移動時,將樹脂70結合於母模10的圖案(模製工序)以形成複製模20。
At this time, the
透過這樣的方式,塗佈區域PA內最初塗佈樹脂70的位置與將樹脂70結合於母模10的圖案的位置可以在水平方向上間隔開。
In this way, the position within the coating area PA where the
此外,光照射部140可以在與壓輥部120一同移動時固化樹脂70以形成複製模20。
In addition, the
接下來,對脫模工序步驟進行說明。 Next, the demolding step will be described.
如圖13至圖15所示,可以分離母模10和複製模20以形成附接於薄膜60的下側的複製模20。
As shown in FIGS. 13-15 , the
例如,如圖13至圖14所示,在壓輥部120從另一側移動至一側的待機位置時,可以透過薄膜角度維持輥部170形成的薄膜60進入壓輥部120的角度以從母模10分離複製模20。
For example, as shown in FIGS. 13 to 14 , when the
之後,如圖15所示,可以移動薄膜60以將完成的複製模20移動至薄膜回收部40的一側,然後,載台部110下降以形成複製模20。
After that, as shown in FIG. 15 , the
此時,當載台部110下降時,機械臂(未繪示出)可以將母模10更換為另一母模10。
At this time, when the
這樣的複製模20的製造工序可以反覆進行多次。
The manufacturing process of such a
儘管已經透過上述較佳實施例對本發明進行了詳細說明,但本發明不限定於此,而是可以在申請專利範圍的範圍內進行多樣化的實施。 Although the present invention has been described in detail through the above-mentioned preferred embodiments, the present invention is not limited thereto, but can be variously implemented within the scope of the patent application.
30:薄膜供應部 30: Film Supply Department
40:薄膜回收部 40: Film Recycling Department
50:導輥 50: Guide roller
60:薄膜 60: Film
100:轉印部 100: Transfer part
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KR1020200165523A KR20220076734A (en) | 2020-12-01 | 2020-12-01 | Nano imprint replica mold making device |
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