TWI774814B - Shaped film and photocurable composition - Google Patents
Shaped film and photocurable composition Download PDFInfo
- Publication number
- TWI774814B TWI774814B TW107127454A TW107127454A TWI774814B TW I774814 B TWI774814 B TW I774814B TW 107127454 A TW107127454 A TW 107127454A TW 107127454 A TW107127454 A TW 107127454A TW I774814 B TWI774814 B TW I774814B
- Authority
- TW
- Taiwan
- Prior art keywords
- meth
- photocurable composition
- radically polymerizable
- mass
- acrylate
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 110
- 238000007493 shaping process Methods 0.000 claims abstract description 117
- 239000000463 material Substances 0.000 claims abstract description 59
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 55
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 18
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims abstract description 16
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 55
- 239000000178 monomer Substances 0.000 claims description 54
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 38
- -1 ethylene oxide-modified bisphenol A Chemical class 0.000 claims description 29
- 239000003999 initiator Substances 0.000 claims description 26
- 125000002723 alicyclic group Chemical group 0.000 claims description 23
- 239000004417 polycarbonate Substances 0.000 claims description 20
- 229920000515 polycarbonate Polymers 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 10
- 239000004611 light stabiliser Substances 0.000 claims description 10
- 239000002530 phenolic antioxidant Substances 0.000 claims description 9
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 7
- 239000005977 Ethylene Substances 0.000 claims description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 6
- 229920006289 polycarbonate film Polymers 0.000 claims description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 3
- 239000003963 antioxidant agent Substances 0.000 claims description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 230000003078 antioxidant effect Effects 0.000 claims 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims 1
- 239000010408 film Substances 0.000 description 64
- 239000000047 product Substances 0.000 description 60
- 235000019589 hardness Nutrition 0.000 description 24
- 230000003287 optical effect Effects 0.000 description 18
- 238000012360 testing method Methods 0.000 description 17
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 150000002009 diols Chemical class 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 230000009477 glass transition Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 4
- VMRIVYANZGSGRV-UHFFFAOYSA-N 4-phenyl-2h-triazin-5-one Chemical compound OC1=CN=NN=C1C1=CC=CC=C1 VMRIVYANZGSGRV-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000005056 polyisocyanate Substances 0.000 description 4
- 229920001228 polyisocyanate Polymers 0.000 description 4
- 238000004383 yellowing Methods 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 229920001610 polycaprolactone Polymers 0.000 description 3
- 239000004632 polycaprolactone Substances 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 2
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001335 aliphatic alkanes Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 150000002924 oxiranes Chemical class 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WXPWZZHELZEVPO-UHFFFAOYSA-N (4-methylphenyl)-phenylmethanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1 WXPWZZHELZEVPO-UHFFFAOYSA-N 0.000 description 1
- LUYHWJKHJNFYGV-UHFFFAOYSA-N 1,2-diisocyanato-3-phenylbenzene Chemical compound O=C=NC1=CC=CC(C=2C=CC=CC=2)=C1N=C=O LUYHWJKHJNFYGV-UHFFFAOYSA-N 0.000 description 1
- HGCMSCWGVAYWHR-UHFFFAOYSA-N 1,3,5-trimethyl-2-[[phenyl-[(2,4,6-trimethylphenyl)methyl]phosphoryl]methyl]benzene Chemical compound CC1=CC(C)=CC(C)=C1CP(=O)(C=1C=CC=CC=1)CC1=C(C)C=C(C)C=C1C HGCMSCWGVAYWHR-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- LMGYOBQJBQAZKC-UHFFFAOYSA-N 1-(2-ethylphenyl)-2-hydroxy-2-phenylethanone Chemical compound CCC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 LMGYOBQJBQAZKC-UHFFFAOYSA-N 0.000 description 1
- VQIPSVLHHAYQJH-UHFFFAOYSA-N 1-(7-acridin-1-ylheptyl)acridine Chemical compound C1=CC=C2C=C3C(CCCCCCCC=4C5=CC6=CC=CC=C6N=C5C=CC=4)=CC=CC3=NC2=C1 VQIPSVLHHAYQJH-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- INUMMPHTUPBOEU-UHFFFAOYSA-N 1-phenylacridine Chemical compound C1=CC=CC=C1C1=CC=CC2=NC3=CC=CC=C3C=C12 INUMMPHTUPBOEU-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KPYPNTLKDIYIKB-UHFFFAOYSA-N 2,3-dichloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(Cl)C(Cl)=C2 KPYPNTLKDIYIKB-UHFFFAOYSA-N 0.000 description 1
- GJDRKHHGPHLVNI-UHFFFAOYSA-N 2,6-ditert-butyl-4-(diethoxyphosphorylmethyl)phenol Chemical compound CCOP(=O)(OCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 GJDRKHHGPHLVNI-UHFFFAOYSA-N 0.000 description 1
- CTWRMVAKUSJNBK-UHFFFAOYSA-N 2-(2,4-dimethoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 CTWRMVAKUSJNBK-UHFFFAOYSA-N 0.000 description 1
- RXAYEPUDXSKVHS-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-bis(3-methoxyphenyl)-1h-imidazole Chemical class COC1=CC=CC(C2=C(NC(=N2)C=2C(=CC=CC=2)Cl)C=2C=C(OC)C=CC=2)=C1 RXAYEPUDXSKVHS-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- UIHRWPYOTGCOJP-UHFFFAOYSA-N 2-(2-fluorophenyl)-4,5-diphenyl-1h-imidazole Chemical class FC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 UIHRWPYOTGCOJP-UHFFFAOYSA-N 0.000 description 1
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 1
- SNFCQJAJPFWBDJ-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 SNFCQJAJPFWBDJ-UHFFFAOYSA-N 0.000 description 1
- GZYZPHPDKCTFFH-UHFFFAOYSA-N 2-(4-methylsulfanylphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(SC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 GZYZPHPDKCTFFH-UHFFFAOYSA-N 0.000 description 1
- LESMLVDJJCWZAJ-UHFFFAOYSA-N 2-(diphenylphosphorylmethyl)-1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 LESMLVDJJCWZAJ-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- MONMFXREYOKQTI-UHFFFAOYSA-M 2-bromopropanoate Chemical compound CC(Br)C([O-])=O MONMFXREYOKQTI-UHFFFAOYSA-M 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- VZMLJEYQUZKERO-UHFFFAOYSA-N 2-hydroxy-1-(2-methylphenyl)-2-phenylethanone Chemical compound CC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 VZMLJEYQUZKERO-UHFFFAOYSA-N 0.000 description 1
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- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/067—Polyurethanes; Polyureas
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- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/005—Reinforced macromolecular compounds with nanosized materials, e.g. nanoparticles, nanofibres, nanotubes, nanowires, nanorods or nanolayered materials
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
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Abstract
本揭示的一方面的賦形膜為包括基材、及積層於該基材的賦形層的賦形膜,且賦形層包含含有(A)自由基聚合性成分的光硬化型組成物的硬化物,(A)自由基聚合性成分包含:(A1)具有2個以上(甲基)丙烯醯基的丙烯酸胺基甲酸酯、及(A2)含氮單官能(甲基)丙烯酸系單體。The shaping film according to one aspect of the present disclosure is a shaping film including a base material and a shaping layer laminated on the base material, wherein the shaping layer includes (A) a photocurable composition containing a radically polymerizable component. Cured product, (A) a radically polymerizable component containing: (A1) acrylic urethane having two or more (meth)acryloyl groups, and (A2) nitrogen-containing monofunctional (meth)acrylic monofunctional body.
Description
本發明是有關於一種賦形膜及光硬化型組成物。The present invention relates to a shaped film and a photocurable composition.
伴隨液晶顯示裝置等的顯示器技術的迅速發展,關於其中所使用的光學片(光學膜),對具有新功能者及品質更高者的需要亦提高。作為此種光學片,例如可列舉:液晶顯示裝置等的背光中使用的稜鏡片,立體照片、投影屏幕等中使用的柱狀透鏡片(lenticular lens sheet),高架式投影機(overhead projector)的聚光透鏡(condensor lens)等中使用的夫瑞奈透鏡片(Fresnel lens sheet),彩色濾光片等中使用的繞射光柵,遊戲機、玩具、家電等中使用的照明用賦形膜等。此種光學片亦稱作賦形膜,通常包括基材、及積層於該基材的賦形層。藉由模具等對賦形層轉印微細形狀,並賦予所需的光學特性。With the rapid development of display technologies such as liquid crystal display devices, the demand for optical sheets (optical films) used therein for those having new functions and higher quality is also increasing. As such an optical sheet, for example, a lens sheet used for backlights of liquid crystal display devices, etc., a lenticular lens sheet used for a 3D photograph, a projection screen, etc., a lens sheet for an overhead projector, etc. Fresnel lens sheets used in condenser lenses, etc., diffraction gratings used in color filters, etc., shaped films for lighting used in game machines, toys, home appliances, etc. . Such an optical sheet is also called a shaping film, and generally includes a base material and a shaping layer laminated on the base material. A fine shape is transferred to the shaping layer by a mold or the like, and desired optical properties are imparted.
關於所述光學片,有時藉由製造時的衝擊或振動,例如微細結構的頂部等賦形層的表面及側面發生變形或缺損,從而磨耗。此種光學片的磨耗於顯示裝置的顯示面上產生不均並使顯示性能下降。為了改善此種問題點,關於賦形層的材料而提出有各種提案(例如參照專利文獻1)。 [現有技術文獻] [專利文獻]With regard to the optical sheet, for example, the surface and side surfaces of the shaping layer such as the top portion of the fine structure may be deformed or chipped due to impact or vibration during production, and may be worn. The abrasion of such an optical sheet causes unevenness on the display surface of the display device and reduces the display performance. In order to improve such a problem, various proposals have been made regarding the material of the shaping layer (for example, refer to Patent Document 1). [Prior Art Document] [Patent Document]
專利文獻1:日本專利特開2011-21114號公報Patent Document 1: Japanese Patent Laid-Open No. 2011-21114
[發明所欲解決之課題][The problem to be solved by the invention]
近年來,車載液晶顯示裝置中使用光學片的情形正在增加,要求一種不僅難以磨耗、且高溫及高濕環境下的耐久性亦優異的光學片。然而,專利文獻1所揭示的光學片存在高溫及高濕的環境下賦形層對基材的密接性下降的情況。本發明的目的在於提供一種包括具有高硬度的賦形層且於高溫及高濕條件下亦能夠長時間維持賦形層對基材的密接性的賦形膜、以及用以製造該賦形膜的光硬化型組成物。In recent years, the use of optical sheets in in-vehicle liquid crystal display devices has been increasing, and an optical sheet which is not only difficult to wear but also has excellent durability in a high temperature and high humidity environment is required. However, in the optical sheet disclosed in
[解決課題之手段][Means of Solving Problems]
本揭示的一方面的賦形膜包括基材、及積層於該基材的賦形層,且所述賦形層包含含有(A)自由基聚合性成分的光硬化型組成物的硬化物,所述(A)自由基聚合性成分包含:(A1)具有2個以上(甲基)丙烯醯基的丙烯酸胺基甲酸酯、及(A2)含氮單官能(甲基)丙烯酸系單體。The shaping film of one aspect of the present disclosure includes a base material, and a shaping layer laminated on the base material, wherein the shaping layer includes a cured product of a photocurable composition containing (A) a radically polymerizable component, The (A) radically polymerizable component includes (A1) urethane acrylate having two or more (meth)acryloyl groups, and (A2) a nitrogen-containing monofunctional (meth)acrylic monomer .
所述賦形膜包含(A1)具有2個以上(甲基)丙烯醯基的丙烯酸胺基甲酸酯作為(A)自由基聚合性成分,藉此,硬化物(即賦形層)對基材的密接力大幅增強。而且,藉由將該(A1)成分與(A2)成分組合,即便於密接力容易下降的高溫及高濕條件下,賦形層亦能夠長時間維持對基材的密接性。另外,硬化物(即賦形層)的硬度提升。藉由包含(A2)含氮單官能(甲基)丙烯酸系單體作為自由基聚合性成分,就物理方面及機械方面而言,可提升硬化物對基材的密接性。另外,硬化物的硬度提升。賦形膜包括具有高硬度的賦形層,且於高溫及高濕條件下亦能夠長時間維持賦形層對基材的密接性,其中,所述賦形膜於賦形層中包含具有將以上的(A1)成分及(A2)成分組合的組成的光硬化型組成物的硬化物。 The said shaped film contains (A1) urethane acrylate having two or more (meth)acryloyl groups as (A) a radically polymerizable component, whereby the cured product (ie, shaped layer) can The adhesion of the material is greatly enhanced. Furthermore, by combining the component (A1) and the component (A2), the shaping layer can maintain the adhesiveness to the base material for a long period of time even under high temperature and high humidity conditions where the adhesive force tends to decrease. In addition, the hardness of the hardened material (ie, the shaping layer) increases. By containing the (A2) nitrogen-containing monofunctional (meth)acrylic monomer as a radically polymerizable component, the adhesiveness of the cured product to the base material can be improved in terms of physical and mechanical aspects. In addition, the hardness of the hardened product increases. The shaping film includes a shaping layer with high hardness, and can maintain the adhesion of the shaping layer to the substrate for a long time under high temperature and high humidity conditions, wherein, the shaping film includes a shaping layer having a The cured product of the photocurable composition of the combination of the above (A1) component and (A2) component.
所述(A)自由基聚合性成分亦可進而包含:(A3)下述通式(1)所表示的環氧乙烷改質雙酚A二(甲基)丙烯酸酯。 The (A) radically polymerizable component may further include (A3) ethylene oxide-modified bisphenol A di(meth)acrylate represented by the following general formula (1).
[式中,R1及R2分別獨立地表示氫原子或甲基,n及m表示以成為n+m=20~40的方式所選擇的正整數] [In the formula, R 1 and R 2 each independently represent a hydrogen atom or a methyl group, and n and m represent positive integers selected so that n+m=20 to 40]
藉由包含此種成分而光硬化型組成物硬化時的收縮得到緩和,因此,即便藉由光照射及高溫處理來進行光硬化型組成物的硬化反應,亦可長時間維持硬化物對基材的密接性。另外,(A3)環氧乙烷改質雙酚A二(甲基)丙烯酸酯可適度提升硬化物的柔軟性,藉此,可提升硬化物的密接性。 By including such a component, the shrinkage of the photocurable composition during curing is alleviated, and therefore, even if the photocurable composition is cured by light irradiation and high temperature treatment, the cured product can be maintained on the base material for a long time. of tightness. In addition, (A3) ethylene oxide-modified bisphenol A di(meth)acrylate can moderately improve the flexibility of the cured product, thereby improving the adhesiveness of the cured product.
所述(A)自由基聚合性成分亦可進而包含:(A4)脂環式單官能(甲基)丙烯酸系單體。藉由包含此種成分而光硬化型組成物硬化時的收縮得到緩和,因此,即便藉由光照射及高溫處理來進行光硬化型組成物的硬化反應,亦可長時間維持硬化物對基材的密接性。The (A) radically polymerizable component may further include (A4) an alicyclic monofunctional (meth)acrylic monomer. By including such a component, the shrinkage of the photocurable composition during curing is alleviated, and therefore, even if the photocurable composition is cured by light irradiation and high temperature treatment, the cured product can be maintained on the base material for a long time. of tightness.
所述(A4)脂環式單官能(甲基)丙烯酸系單體亦可具有二環戊二烯骨架。藉由脂環式單官能(甲基)丙烯酸系單體具有二環戊二烯骨架,於高溫條件下,可更長時間地維持賦形層對基材的密接性。The (A4) alicyclic monofunctional (meth)acrylic monomer may also have a dicyclopentadiene skeleton. Since the alicyclic monofunctional (meth)acrylic monomer has a dicyclopentadiene skeleton, the adhesion of the shaping layer to the substrate can be maintained for a longer time under high temperature conditions.
所述(A)自由基聚合性成分亦可進而包含:(A5)具有2個以上(甲基)丙烯醯基的多官能(甲基)丙烯酸系單體。藉由包含此種成分而賦形層的硬度變得更高,並且,於高溫及高濕條件下,可更長時間地維持賦形層對基材的密接性。The (A) radically polymerizable component may further include (A5) a polyfunctional (meth)acrylic monomer having two or more (meth)acryloyl groups. By including such a component, the hardness of the shaping layer becomes higher, and the adhesion of the shaping layer to the base material can be maintained for a longer period of time under high temperature and high humidity conditions.
所述(A1)丙烯酸胺基甲酸酯亦可具有聚碳酸酯結構。藉由丙烯酸胺基甲酸酯具有聚碳酸酯結構,而賦形層對基材的密接性變得更高。The (A1) urethane acrylate may also have a polycarbonate structure. Since urethane acrylate has a polycarbonate structure, the adhesiveness of the shaping layer to the base material becomes higher.
所述光硬化型組成物亦可進而包含(B)光聚合起始劑。(B)光聚合起始劑對於藉由光自由基聚合而進行的光硬化型組成物的有效率的硬化而言有用。The photocurable composition may further contain (B) a photopolymerization initiator. (B) The photopolymerization initiator is useful for efficient curing of the photocurable composition by photoradical polymerization.
所述光硬化型組成物亦可進而含有(C)包含下述通式(2)所表示的結構的酚系抗氧化劑。 [化2][式中,R3 表示第三丁基或甲基] (C)酚系抗氧化劑具有如下效果:藉由抑制硬化物的熱氧化劣化來提高硬化物的耐熱黃變性、賦形層對基材的密接性及高分子的壽命等長期可靠性。The photocurable composition may further contain (C) a phenolic antioxidant containing a structure represented by the following general formula (2). [hua 2] [wherein, R 3 represents a tertiary butyl group or a methyl group] (C) The phenolic antioxidant has the following effects: by suppressing the thermal oxidative deterioration of the cured product, the heat-resistant yellowing property of the cured product is improved, and the forming layer has the effect on the base material. long-term reliability such as adhesion and polymer life.
所述光硬化型組成物亦可進而包含(D)光穩定劑。(D)光穩定劑對於獲得賦形層的更優異的密接性、硬度及光穩定性而言有用。The photocurable composition may further contain (D) a light stabilizer. (D) The light stabilizer is useful for obtaining more excellent adhesion, hardness, and light stability of the shaping layer.
以所述(A)自由基聚合性成分總量為基準,所述光硬化型組成物中的所述(A1)丙烯酸胺基甲酸酯的含量亦可為0.1質量%~50質量%。若丙烯酸胺基甲酸酯的含量處於該範圍,則於高溫及高濕條件下,可更長時間地維持賦形層對基材的密接性。Content of the said (A1) urethane acrylate in the said photocurable composition may be 0.1 mass % - 50 mass % based on the total amount of the said (A) radically polymerizable component. When the content of urethane acrylate is in this range, the adhesion of the shaping layer to the substrate can be maintained for a longer period of time under high temperature and high humidity conditions.
以所述(A)自由基聚合性成分總量為基準,所述光硬化型組成物中的所述(A3)環氧乙烷改質雙酚A二(甲基)丙烯酸酯的含量亦可為0.1質量%~20質量%。若環氧乙烷改質雙酚A二(甲基)丙烯酸酯的含量為所述下限值以上,則於獲得優異的密接性的方面可賦予更適合的柔軟性,並且可進一步緩和光硬化型組成物硬化時的收縮。另外,若環氧乙烷改質雙酚A二(甲基)丙烯酸酯的含量為所述上限值以下,則可將硬化物的玻璃轉移溫度保持為一定以上。若硬化物的Tg為一定以上,則可抑制高溫條件下硬化物的分子運動所引起的密接性的下降。The content of the (A3) ethylene oxide-modified bisphenol A di(meth)acrylate in the photocurable composition may be based on the total amount of the (A) radically polymerizable components. It is 0.1 mass % - 20 mass %. When the content of ethylene oxide-modified bisphenol A di(meth)acrylate is equal to or greater than the lower limit value, more suitable flexibility can be imparted in order to obtain excellent adhesiveness, and photohardening can be further eased. shrinkage of the type composition upon hardening. Moreover, when content of ethylene oxide modified bisphenol A di(meth)acrylate is below the said upper limit, the glass transition temperature of hardened|cured material can be maintained at a fixed value or more. When the Tg of the cured product is a certain value or more, the decrease in adhesion due to molecular motion of the cured product under high temperature conditions can be suppressed.
以所述(A)自由基聚合性成分總量為基準,所述光硬化型組成物中的所述(A4)脂環式單官能(甲基)丙烯酸系單體的含量亦可為30質量%~75質量%。若脂環式單官能(甲基)丙烯酸系單體的含量為30質量%~75質量%,則於高溫條件下,可更長時間地維持賦形層對基材的密接性。The content of the (A4) alicyclic monofunctional (meth)acrylic monomer in the photocurable composition may be 30 mass based on the total amount of the (A) radically polymerizable components. % to 75% by mass. When the content of the alicyclic monofunctional (meth)acrylic monomer is 30% by mass to 75% by mass, the adhesiveness of the shaping layer to the base material can be maintained for a longer period of time under high temperature conditions.
所述基材亦可為聚碳酸酯膜。本揭示的所述方面的賦形膜的賦形層即便基材為聚碳酸酯膜,亦發揮優異的密接性。The substrate can also be a polycarbonate film. The shaped layer of the shaped film of the aspect of the present disclosure exhibits excellent adhesiveness even if the base material is a polycarbonate film.
本揭示的一方面的光硬化型組成物包含(A)自由基聚合性成分,所述(A)自由基聚合性成分包含:(A1)具有2個以上(甲基)丙烯醯基的丙烯酸胺基甲酸酯、及(A2)含氮單官能(甲基)丙烯酸系單體。A photocurable composition according to an aspect of the present disclosure includes (A) a radically polymerizable component including (A1) acrylamide having two or more (meth)acryloyl groups Carbamate, and (A2) nitrogen-containing monofunctional (meth)acrylic monomer.
所述(A)自由基聚合性成分亦可進而包含:(A3)下述通式(1)所表示的環氧乙烷改質雙酚A二(甲基)丙烯酸酯。 [化3][式中,R1 及R2 分別獨立地表示氫原子或甲基,n及m表示以成為n+m=20~40的方式所選擇的正整數]The (A) radically polymerizable component may further include (A3) ethylene oxide-modified bisphenol A di(meth)acrylate represented by the following general formula (1). [hua 3] [In the formula, R 1 and R 2 each independently represent a hydrogen atom or a methyl group, and n and m represent positive integers selected so that n+m=20 to 40]
所述(A)自由基聚合性成分亦可進而包含:(A4)脂環式單官能(甲基)丙烯酸系單體。The (A) radically polymerizable component may further include (A4) an alicyclic monofunctional (meth)acrylic monomer.
所述(A4)脂環式單官能(甲基)丙烯酸系單體亦可具有二環戊二烯骨架。The (A4) alicyclic monofunctional (meth)acrylic monomer may also have a dicyclopentadiene skeleton.
所述(A)自由基聚合性成分亦可進而包含:(A5)具有2個以上(甲基)丙烯醯基的多官能(甲基)丙烯酸系單體。The (A) radically polymerizable component may further include (A5) a polyfunctional (meth)acrylic monomer having two or more (meth)acryloyl groups.
所述(A1)丙烯酸胺基甲酸酯亦可具有聚碳酸酯結構。The (A1) urethane acrylate may also have a polycarbonate structure.
所述光硬化型組成物亦可進而包含(B)光聚合起始劑。The photocurable composition may further contain (B) a photopolymerization initiator.
所述光硬化型組成物亦可進而含有(C)包含下述通式(2)所表示的結構的酚系抗氧化劑。 [化4][式中,R3 表示第三丁基或甲基]The photocurable composition may further contain (C) a phenolic antioxidant containing a structure represented by the following general formula (2). [hua 4] [In the formula, R 3 represents a tert-butyl group or a methyl group]
所述光硬化型組成物亦可進而包含(D)光穩定劑。The photocurable composition may further contain (D) a light stabilizer.
所述光硬化型組成物的25℃下的黏度亦可為40 mPa·s~1000 mPa·s。若黏度處於該範圍內,則就光硬化型組成物的塗敷性的觀點及自模具朝賦形層轉印微細形狀的觀點而言有利。The viscosity at 25° C. of the photocurable composition may be 40 mPa·s to 1000 mPa·s. When the viscosity is within this range, it is advantageous from the viewpoint of the coatability of the photocurable composition and the transfer of the fine shape from the mold to the shaping layer.
[發明的效果][Effect of invention]
根據本發明,可提供一種包括具有高硬度的賦形層且於高溫及高濕條件下(例如,溫度85℃以上且濕度85%相對濕度(Relative Humidity,RH)以上)亦能夠長時間(例如,50小時以上)維持賦形層對基材的密接性的賦形膜、以及用以製造該賦形膜的光硬化型組成物。特別是所述賦形膜即便基材為聚碳酸酯膜,亦能夠長時間維持高溫及高濕條件下的賦形層對基材的密接性。According to the present invention, it is possible to provide a shaping layer comprising a high hardness and capable of being used for a long time (for example, under high temperature and high humidity conditions (for example, the temperature is above 85°C and the humidity is above 85% Relative Humidity, RH)). , 50 hours or more) a shaped film that maintains the adhesion of the shaped layer to the substrate, and a photocurable composition for producing the shaped film. In particular, the shaped film can maintain the adhesiveness of the shaped layer to the base material under high temperature and high humidity conditions for a long time even if the base material is a polycarbonate film.
以下,對本發明的若干實施形態進行詳細說明。但本發明並不限定於以下的實施形態。本說明書中,「(甲基)丙烯酸基」的用語表示甲基丙烯酸基或丙烯酸基。「(甲基)丙烯醯基」、「(甲基)丙烯酸酯」等的用語亦同樣。Hereinafter, some embodiments of the present invention will be described in detail. However, the present invention is not limited to the following embodiments. In this specification, the term "(meth)acrylic group" represents a methacrylic group or an acrylic group. The same applies to terms such as "(meth)acryloyl" and "(meth)acrylate".
本揭示的一方面的賦形膜包括基材、及積層於該基材的賦形層,且賦形層包含含有自由基聚合性成分的光硬化型組成物的硬化物(以下,亦簡稱作「硬化物」)。圖1中示意性地表示賦形膜的一實施形態。圖1所示的賦形膜10包括基材5、及積層於基材5的賦形層1,且賦形層1包含含有自由基聚合性成分的光硬化型組成物的硬化物。賦形層1亦可僅包含光硬化型組成物的硬化物。賦形層將硬化物與基材以接觸的方式積層,因此,本說明書中,硬化物對基材的密接性高與賦形層對基材的密接性高為相同含義。本說明書中,既存在分別將「硬化物對基材的密接性」表述為「硬化物的密接性」、將「賦形層對基材的密接性」表述為「賦形層的密接性」的情況,亦存在將該些簡稱作「密接性」的情況。A shaping film according to one aspect of the present disclosure includes a base material and a shaping layer laminated on the base material, and the shaping layer includes a cured product of a photocurable composition containing a radically polymerizable component (hereinafter, also simply referred to as "hardening"). An embodiment of the shaped film is schematically shown in FIG. 1 . The shaping
圖2中示意性地表示賦形膜的另一實施形態。圖2所示的賦形膜20包括基材5、及積層於基材5的賦形層4,且賦形層4包含含有自由基聚合性成分的光硬化型組成物的硬化物。更具體而言,賦形層4包括:作為光硬化型組成物的硬化物的第1賦形層2(亦稱作底塗層)、及積層於第1賦形層2的第2賦形層3。第2賦形層3的材料只要為可於第2賦形層3上形成微細結構的材料,則無特別限定,亦可為現有賦形膜中所使用的材料。或者,第2賦形層3亦可為與第1賦形層2相同的光硬化型組成物的硬化物。於後者的情況下,賦形層4亦可以說僅包含光硬化型組成物的硬化物。Another embodiment of the shaped film is schematically shown in FIG. 2 . The shaping
本揭示的賦形層亦可於表面具有微細結構。例如,圖1中的賦形層1亦可於表面具有微細結構(未圖示)。同樣,圖2中的賦形層4、更嚴格地說,圖2中的第2賦形層3亦可於表面具有微細結構(未圖示)。本揭示中,賦形層由於包含光硬化型組成物的硬化物,因此具有高硬度。具有高硬度的賦形層的形狀保持性變得良好。此處,所謂良好的形狀保持性,是指賦形層的表面及側面難以變形及缺損。例如,於賦形層的表面任意形成的微細結構的頂部難以變形及缺損亦為具有良好的形狀保持性的一例。The shaping layer of the present disclosure may also have a fine structure on the surface. For example, the
賦形層1及賦形層4的厚度均可為0.5 μm以上或1 μm以上,亦可為200 μm以下或100 μm以下。若賦形層厚,則有容易對賦形層賦形的傾向(即,容易形成微細結構),若賦形層薄,則有賦形層的霧度減小、賦形膜的光學特性優異的傾向。若賦形層的厚度處於所述範圍,則可以更高的水準使對賦形層的容易賦形性與光學特性併存。如圖2所示的實施形態般,於賦形層包含2個層的情況下,包含光硬化型組成物的硬化物的第1賦形層2的厚度例如可為1 μm~5 μm,第2賦形層3的厚度可根據第1賦形層2的厚度而適宜設計。The thicknesses of the shaped
基材可為聚碳酸酯(polycarbonate,PC)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、聚酯、環烯烴聚合物(cycio olefins polymer,COP)、聚醯亞胺等膜,較佳為PC膜。先前,有與賦形層對PET膜的密接性相比,賦形層對PC膜的密接性低的傾向。本揭示的所述方面的賦形膜的賦形層即便基材為PC膜,亦發揮優異的密接性。基材的厚度並無特別限定,例如為10 μm~125 μm。The substrate can be polycarbonate (PC), polyethylene terephthalate (PET), polyester, cycloolefin polymer (COP), polyimide and other films. Preferably it is a PC film. Conventionally, the adhesion of the shaping layer to the PC film tends to be lower than the adhesion of the shaping layer to the PET film. The shaped layer of the shaped film of the aspect of the present disclosure exhibits excellent adhesiveness even if the base material is a PC film. The thickness of the base material is not particularly limited, but is, for example, 10 μm to 125 μm.
以下對光硬化型組成物進行說明。光硬化型組成物包含(A1)丙烯酸胺基甲酸酯及(A2)含氮單官能(甲基)丙烯酸系單體作為(A)自由基聚合性成分。(A)自由基聚合性成分藉由光照射而進行自由基聚合,並形成交聯聚合體。藉此,光硬化型組成物進行硬化。 The photocurable composition will be described below. The photocurable composition contains (A1) urethane acrylate and (A2) nitrogen-containing monofunctional (meth)acrylic monomer as (A) radically polymerizable components. (A) The radically polymerizable component is radically polymerized by light irradiation to form a cross-linked polymer. Thereby, the photocurable composition is cured.
(A1)丙烯酸胺基甲酸酯 (A1) Urethane Acrylate
丙烯酸胺基甲酸酯(亦稱作「(A1)成分」)具有2個以上(甲基)丙烯醯基。藉由包含此種丙烯酸胺基甲酸酯,硬化物對基材的密接力大幅增強。而且,藉由與後述(A2)成分組合,即便於密接力容易下降的高溫及高濕條件下,賦形層亦能夠長時間維持對基材的密接性。另外,藉由光硬化型組成物包含丙烯酸胺基甲酸酯,而硬化物的硬度提升。丙烯酸胺基甲酸酯例如是使作為多元醇與聚異氰酸酯的縮聚物的聚胺基甲酸酯鏈與具有羥基的單官能(甲基)丙烯酸系單體反應所得。 Urethane acrylate (also referred to as "(A1) component") has two or more (meth)acryloyl groups. By including such urethane acrylate, the adhesion of the cured product to the base material is greatly enhanced. Furthermore, by combining with the below-mentioned (A2) component, even under the conditions of high temperature and high humidity in which the adhesive force tends to decrease, the shaping layer can maintain the adhesiveness to the base material for a long time. In addition, when the photocurable composition contains urethane acrylate, the hardness of the cured product is improved. The urethane acrylate is obtained by reacting a monofunctional (meth)acrylic monomer having a hydroxyl group with a polyurethane chain which is a polycondensate of a polyol and a polyisocyanate, for example.
作為丙烯酸胺基甲酸酯的原料而使用的多元醇例如可列舉:聚碳酸酯二醇、聚酯二醇、聚醚二醇、聚己內酯二醇等二醇。該些多元醇可單獨使用一種,亦可併用兩種以上。一般而言,使用聚碳酸酯二醇、聚酯二醇、聚醚二醇、或聚己內酯二醇而獲得的丙烯酸胺基甲酸酯分別稱作聚碳酸酯丙烯酸胺基甲酸酯、聚酯丙烯酸胺基甲酸酯、聚醚丙烯酸胺基甲酸酯、或聚己內酯丙烯酸胺基甲酸酯。 As a polyhydric alcohol used as a raw material of urethane acrylate, diols, such as polycarbonate diol, polyester diol, polyether diol, polycaprolactone diol, are mentioned, for example. These polyols may be used alone or in combination of two or more. In general, urethane acrylates obtained using polycarbonate diols, polyester diols, polyether diols, or polycaprolactone diols are referred to as polycarbonate acrylate urethanes, Polyester acrylate urethane, polyether acrylate urethane, or polycaprolactone acrylate urethane.
作為丙烯酸胺基甲酸酯的原料而使用的聚異氰酸酯例如可列舉:甲苯二異氰酸酯、二甲苯二異氰酸酯、二苯基甲烷二異氰酸酯、六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯、四甲基二甲苯二異氰酸酯、異佛爾酮二異氰酸酯、經氫化的甲苯二異氰酸酯、經氫化的二甲苯二異氰酸酯、經氫化的二苯基甲烷 二異氰酸酯、間苯二異氰酸酯、聯苯二異氰酸酯、四亞甲基二異氰酸酯等二異氰酸酯。該些聚異氰酸酯可單獨使用一種,亦可併用兩種以上。 Examples of the polyisocyanate used as a raw material of urethane acrylate include tolylene diisocyanate, xylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, and trimethylhexamethylene diisocyanate. , tetramethyl xylene diisocyanate, isophorone diisocyanate, hydrogenated toluene diisocyanate, hydrogenated xylene diisocyanate, hydrogenated diphenylmethane Diisocyanates such as diisocyanate, isophenylene diisocyanate, biphenyl diisocyanate, and tetramethylene diisocyanate. These polyisocyanates may be used alone or in combination of two or more.
作為丙烯酸胺基甲酸酯的原料而使用的具有羥基的單官能(甲基)丙烯酸系單體例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸6-羥基己酯、及1,4-環己烷二甲醇單(甲基)丙烯酸酯。該些(甲基)丙烯酸系單體可單獨使用一種,亦可併用兩種以上。 Examples of the monofunctional (meth)acrylic monomer having a hydroxyl group used as a raw material for urethane acrylate include 2-hydroxyethyl (meth)acrylate and 4-hydroxybutyl (meth)acrylate. , 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, and 1,4-cyclohexanedimethanol mono(meth)acrylic acid ester. These (meth)acrylic-type monomers may be used individually by 1 type, and may use 2 or more types together.
丙烯酸胺基甲酸酯較佳為具有聚碳酸酯(PC)結構的丙烯酸胺基甲酸酯,更佳為具有PC結構且不具有脂環結構的丙烯酸胺基甲酸酯。藉由使用具有PC結構的丙烯酸胺基甲酸酯,而賦形層的密接性變得更高。另外,藉由使用不具有脂環結構的丙烯酸胺基甲酸酯,可獲得具有高透明性(即,小的霧度)的硬化物。 The acrylate urethane is preferably an acrylate urethane having a polycarbonate (PC) structure, and more preferably an acrylate urethane having a PC structure and no alicyclic structure. By using urethane acrylate having a PC structure, the adhesiveness of the shaping layer becomes higher. Moreover, by using the acrylic urethane which does not have an alicyclic structure, the hardened|cured material which has high transparency (that is, small haze) can be obtained.
丙烯酸胺基甲酸酯的重量平均分子量並無特別限制,但較佳為1000以上且30000以下,更佳為2000以上且20000以下,進而佳為3000以上且10000以下。若丙烯酸胺基甲酸酯的重量平均分子量為1000以上,則光硬化型組成物的黏度對於以捲對捲(roll to roll)方式塗敷而言變得良好,且有光硬化型組成物的塗敷性提升的傾向。若重量平均分子量為30000以下,則為了維持塗敷性而可使用的稀釋單體的量少,因此,有硬化物的硬度及密接性提升的傾向。丙烯酸胺基甲酸酯的重量平均分子量例如可藉由多元醇與聚異氰酸酯的莫耳比、或該些的分子量來調整。本說明書中,重量平均分子量(Mw)是藉由凝膠滲透層析(Gel Permeation Chromatography,GPC)法並根據使用了標準聚苯乙烯的校準曲線進行換算所得的值。The weight average molecular weight of the urethane acrylate is not particularly limited, but is preferably 1,000 or more and 30,000 or less, more preferably 2,000 or more and 20,000 or less, and still more preferably 3,000 or more and 10,000 or less. When the weight-average molecular weight of the urethane acrylate is 1000 or more, the viscosity of the photocurable composition becomes favorable for roll-to-roll coating, and the photocurable composition has a good viscosity. Tendency to improve coatability. If the weight average molecular weight is 30,000 or less, the amount of diluent monomers that can be used to maintain coatability is small, and therefore, the hardness and adhesiveness of the cured product tend to improve. The weight average molecular weight of urethane acrylate can be adjusted, for example, by the molar ratio of polyol and polyisocyanate, or the molecular weight of these. In the present specification, the weight average molecular weight (Mw) is a value converted from a calibration curve using standard polystyrene by a gel permeation chromatography (Gel Permeation Chromatography, GPC) method.
丙烯酸胺基甲酸酯所具有的(甲基)丙烯醯基只要為2個以上,則無特別限制,但較佳為6個以下,更佳為4個以下,進而佳為3個以下。若丙烯酸胺基甲酸酯所具有的(甲基)丙烯醯基的個數為所述範圍內,則於高溫及高濕條件下,可更長時間地維持賦形層對基材的密接性。The number of (meth)acryloyl groups in the urethane acrylate is not particularly limited as long as it has two or more, but preferably six or less, more preferably four or less, and still more preferably three or less. When the number of (meth)acryloyl groups contained in the urethane acrylate is within the above range, the adhesion of the shaping layer to the substrate can be maintained for a longer period of time under high temperature and high humidity conditions .
以自由基聚合性成分總量為基準,光硬化型組成物中的丙烯酸胺基甲酸酯的含量亦可為0.1質量%~90質量%。就於高溫及高濕條件下更長時間地維持賦形層的密接性的觀點而言,以自由基聚合性成分總量為基準,丙烯酸胺基甲酸酯的含量亦可為5質量%~90質量%。就將光硬化型組成物的黏度設為適合形成賦形層的值的觀點而言,以自由基聚合性成分總量為基準,丙烯酸胺基甲酸酯的含量可為10質量%~70質量%,可為11質量%~50質量%,亦可為15質量%~35質量%。另外,以自由基聚合性成分總量為基準,丙烯酸胺基甲酸酯的含量亦可為0.1質量%~50質量%。The content of the urethane acrylate in the photocurable composition may be 0.1% by mass to 90% by mass based on the total amount of the radically polymerizable components. From the viewpoint of maintaining the adhesiveness of the shaping layer for a longer period of time under high temperature and high humidity conditions, the content of the urethane acrylate may be 5% by mass to the total amount of the radically polymerizable components. 90% by mass. From the viewpoint of setting the viscosity of the photocurable composition to a value suitable for forming the shaping layer, the content of the urethane acrylate may be 10% by mass to 70% by mass based on the total amount of the radically polymerizable components. %, 11-50 mass % may be sufficient, and 15-35 mass % may be sufficient. Moreover, content of urethane acrylate may be 0.1 mass % - 50 mass % based on the total amount of radically polymerizable components.
(A2)含氮單官能(甲基)丙烯酸系單體 含氮單官能(甲基)丙烯酸系單體(亦稱作「(A2)成分」)是僅具有1個(甲基)丙烯醯基且具有含有氮原子的官能基的單官能(甲基)丙烯酸系單體。藉由包含此種單官能(甲基)丙烯酸系單體,就物理方面及機械方面而言,可提升賦形層對基材的密接性。更具體而言,藉由包含所述成分,而硬化物與基材之間產生化學的相互作用(物理方面),另外,發揮硬化物對基材的定錨效應(機械方面),因此硬化物對基材的密接性提升。另外,硬化物的硬度亦提升。(A2) Nitrogen-containing monofunctional (meth)acrylic monomer Nitrogen-containing monofunctional (meth)acrylic monomer (also referred to as "(A2) component") has only one (meth)acryloyl group and a monofunctional (meth)acrylic monomer having a functional group containing a nitrogen atom. By including such a monofunctional (meth)acrylic monomer, the adhesiveness of the shaping layer to the base material can be improved from a physical point of view and a mechanical point of view. More specifically, by including these components, chemical interaction (physical aspect) occurs between the cured product and the base material, and the anchoring effect (mechanical aspect) of the cured product on the base material is exhibited, so the cured product The adhesion to the substrate is improved. In addition, the hardness of the hardened product is also improved.
含氮單官能(甲基)丙烯酸系單體例如可列舉(甲基)丙烯醯胺、丙烯醯基嗎啉、(甲基)丙烯酸二烷基胺基烷基酯及該些的衍生物,較佳為(甲基)丙烯醯胺及其衍生物。含氮單官能(甲基)丙烯酸系單體亦可為下述通式(3a)或通式(3b)所表示的(甲基)丙烯醯胺衍生物(包含(甲基)丙烯醯胺)。通式(3a)及通式(3b)中,R為氫原子或甲基。通式(3a)中,R1 及R2 分別獨立地表示包含選自碳原子、氫原子及氧原子中的至少一種原子的1價基。R1 及R2 分別獨立地可為具有取代基或不具有取代基的碳數1~3的烷基、或者氫原子,特別是亦可為甲基、乙基、異丙基或羥基乙基。R1 及R2 分別獨立地亦可為氫原子或甲基。通式(3b)中,R3 及R4 分別獨立地表示包含選自碳原子、氫原子及氧原子中的至少一種原子的2價基。R3 、R4 及氮原子(N)亦可形成四氫-1,4-噁嗪環。Nitrogen-containing monofunctional (meth)acrylic monomers include, for example, (meth)acrylamido, acryl morpholine, (meth)acrylic acid dialkylamino alkyl esters, and derivatives thereof, and more Preferred are (meth)acrylamides and derivatives thereof. The nitrogen-containing monofunctional (meth)acrylic monomer may also be a (meth)acrylamide derivative (including (meth)acrylamide) represented by the following general formula (3a) or general formula (3b). . In the general formula (3a) and the general formula (3b), R is a hydrogen atom or a methyl group. In the general formula (3a), R 1 and R 2 each independently represent a monovalent group containing at least one atom selected from a carbon atom, a hydrogen atom, and an oxygen atom. R 1 and R 2 may each independently be a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms, or a hydrogen atom, and in particular, may be a methyl group, an ethyl group, an isopropyl group or a hydroxyethyl group . R 1 and R 2 may each independently be a hydrogen atom or a methyl group. In the general formula (3b), R 3 and R 4 each independently represent a divalent group containing at least one atom selected from a carbon atom, a hydrogen atom, and an oxygen atom. R 3 , R 4 and nitrogen atom (N) can also form a tetrahydro-1,4-oxazine ring.
[化5] [hua 5]
含氮單官能(甲基)丙烯酸系單體的具體例可列舉:丙烯醯胺、(甲基)丙烯酸N,N-二甲基胺基乙酯、N,N-二甲基胺基丙基丙烯醯胺、N,N-二甲基丙烯醯胺、(甲基)丙烯醯基嗎啉、N-異丙基丙烯醯胺、N,N-二乙基丙烯醯胺、及N-羥基乙基丙烯醯胺。該些含氮單官能(甲基)丙烯酸系單體可單獨使用一種,亦可併用兩種以上。Specific examples of nitrogen-containing monofunctional (meth)acrylic monomers include acrylamide, N,N-dimethylaminoethyl (meth)acrylate, N,N-dimethylaminopropyl Acrylamide, N,N-Dimethacrylamide, (Meth)acrylomorpholine, N-Isopropylacrylamide, N,N-Diethylacrylamide, and N-Hydroxyethyl base acrylamide. These nitrogen-containing monofunctional (meth)acrylic monomers may be used alone or in combination of two or more.
以自由基聚合性成分總量為基準,光硬化型組成物中的含氮單官能(甲基)丙烯酸系單體的含量可為5質量%~70質量%,可為5質量%~40質量%,可為5.5質量%~30質量%,亦可為6質量%~25質量%。若含氮單官能(甲基)丙烯酸系單體的含量為所述範圍內,則可提升賦形層的硬度,並且於高溫及高濕條件下,可更長時間地維持賦形層對基材的密接性。另外,若含氮單官能(甲基)丙烯酸系單體的含量為40質量%以下,則與含量超過40質量%的情況相比,可減小硬化物的霧度。The content of the nitrogen-containing monofunctional (meth)acrylic monomer in the photocurable composition may be 5% by mass to 70% by mass, and may be 5% by mass to 40% by mass based on the total amount of radically polymerizable components %, 5.5 mass % - 30 mass % may be sufficient, and 6 mass % - 25 mass % may be sufficient. If the content of the nitrogen-containing monofunctional (meth)acrylic monomer is within the above range, the hardness of the shaping layer can be increased, and under high temperature and high humidity conditions, the shaping layer can be maintained to the base for a longer time. material adhesion. Moreover, when content of a nitrogen-containing monofunctional (meth)acrylic-type monomer is 40 mass % or less, compared with the case where content exceeds 40 mass %, the haze of hardened|cured material can be reduced.
(A3)環氧乙烷改質雙酚A二(甲基)丙烯酸酯 光硬化型組成物亦可進而包含下述通式(1)所表示的環氧乙烷(Ethylene Oxide,EO)改質雙酚A二(甲基)丙烯酸酯(亦稱作「EO改質雙酚A二(甲基)丙烯酸酯」或「(A3)成分」)作為(A)自由基聚合性成分。藉由包含此種EO改質雙酚A二(甲基)丙烯酸酯而硬化物的玻璃轉移溫度(Tg)適度提升,藉此柔軟性適度提升,因此硬化物的密接性進一步提升。另外,光硬化型組成物硬化時的收縮得到緩和,因此,即便藉由光照射及高溫處理來進行光硬化型組成物的硬化反應,亦可維持硬化物的密接性。(A3) Ethylene oxide modified bisphenol A di(meth)acrylate photocurable composition may further include modified ethylene oxide (EO) represented by the following general formula (1) Bisphenol A di(meth)acrylate (also referred to as "EO-modified bisphenol A di(meth)acrylate" or "(A3) component") serves as the (A) radically polymerizable component. By including such EO-modified bisphenol A di(meth)acrylate, the glass transition temperature (Tg) of the cured product is moderately improved, whereby the flexibility is moderately improved, and thus the adhesiveness of the cured product is further improved. In addition, the shrinkage at the time of curing the photocurable composition is alleviated, so even if the curing reaction of the photocurable composition proceeds by light irradiation and high temperature treatment, the adhesiveness of the cured product can be maintained.
[化6][式中,R1 及R2 分別獨立地表示氫原子或甲基,n及m表示以成為n+m=20~40的方式所選擇的正整數][hua 6] [In the formula, R 1 and R 2 each independently represent a hydrogen atom or a methyl group, and n and m represent positive integers selected so that n+m=20 to 40]
通式(1)中,就提高硬化物的柔軟性的觀點而言,n及m較佳為以成為n+m=22~37的方式所選擇的正整數,更佳為以成為n+m=25~35的方式所選擇的正整數。另外,就光硬化型組成物的光硬化性、及光硬化型組成物的硬化物的Tg的觀點而言,R1 及R2 較佳為氫原子。換言之,通式(1)所表示的化合物較佳為EO改質雙酚A二丙烯酸酯。In the general formula (1), from the viewpoint of improving the flexibility of the cured product, n and m are preferably positive integers selected so as to be n+m=22 to 37, more preferably n+m A positive integer selected in the form of =25 to 35. Moreover, R 1 and R 2 are preferably hydrogen atoms from the viewpoint of the photocurability of the photocurable composition and the Tg of the cured product of the photocurable composition. In other words, the compound represented by the general formula (1) is preferably EO-modified bisphenol A diacrylate.
(A3)成分的具體例可列舉FA-323A(日立化成股份有限公司製造)及A-BPE-30(新中村化學工業股份有限公司製造)。該些均為經環氧乙烷(EO)改質的雙酚A的二丙烯酸酯,且n+m=30。(A3) Specific examples of the component include FA-323A (manufactured by Hitachi Chemical Co., Ltd.) and A-BPE-30 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.). These are diacrylates of bisphenol A modified with ethylene oxide (EO), and n+m=30.
以自由基聚合性成分總量為基準,光硬化型組成物中的EO改質雙酚A二(甲基)丙烯酸酯的含量可為0.1質量%~20質量%,可為5質量%~19質量%,亦可為10質量%~15質量%。於EO改質雙酚A二(甲基)丙烯酸酯的含量為0.1質量%以上的情況下,於獲得優異的密接性的方面賦予更適合的柔軟性,並且可進一步緩和光硬化型組成物硬化時的收縮。於EO改質雙酚A二(甲基)丙烯酸酯的含量為20質量%以下的情況下,可將硬化物的Tg保持為一定以上。若硬化物的Tg為一定以上,則可抑制高溫條件下硬化物的分子運動所引起的密接性的下降。The content of the EO-modified bisphenol A di(meth)acrylate in the photocurable composition may be 0.1% by mass to 20% by mass, or 5% by mass to 19% by mass based on the total amount of the radically polymerizable components. The mass % may be 10 to 15 mass %. When the content of EO-modified bisphenol A di(meth)acrylate is 0.1 mass % or more, more suitable flexibility is provided in order to obtain excellent adhesiveness, and hardening of the photocurable composition can be further eased contraction of time. When the content of the EO-modified bisphenol A di(meth)acrylate is 20 mass % or less, the Tg of the cured product can be kept at a constant level or more. When the Tg of the cured product is a certain value or more, the decrease in adhesion due to molecular motion of the cured product under high temperature conditions can be suppressed.
(A4)脂環式單官能(甲基)丙烯酸系單體 光硬化型組成物亦可進而包含脂環式單官能(甲基)丙烯酸系單體(亦稱作「(A4)成分」)作為(A)自由基聚合性成分。脂環式單官能(甲基)丙烯酸系單體是僅具有1個(甲基)丙烯醯基且具有脂環結構的單官能(甲基)丙烯酸系單體。藉由包含此種單官能(甲基)丙烯酸系單體而光硬化型組成物硬化時的收縮得以減輕,因此,即便藉由光照射及高溫處理來進行光硬化型組成物的硬化反應,亦可維持硬化物的密接性。(A4) Alicyclic monofunctional (meth)acrylic monomer The photocurable composition may further contain an alicyclic monofunctional (meth)acrylic monomer (also referred to as "(A4) component") as a (A) Radical polymerizable component. The alicyclic monofunctional (meth)acrylic monomer is a monofunctional (meth)acrylic monomer having only one (meth)acryloyl group and having an alicyclic structure. By including such a monofunctional (meth)acrylic monomer, the shrinkage at the time of curing of the photocurable composition is reduced. Therefore, even if the curing reaction of the photocurable composition is performed by light irradiation and high temperature treatment, Adhesion of the cured product can be maintained.
脂環結構例如可列舉:環己基骨架、二環戊二烯骨架、金剛烷骨架、異冰片基骨架、環烷烴骨架(環庚烷骨架、環辛烷骨架、環壬烷骨架、環癸烷骨架、環十一烷骨架、環十二烷骨架等)、環烯烴骨架(環庚烯骨架、環辛烯骨架等)、降冰片烯骨架、降冰片二烯骨架、多環式骨架(立方烷骨架、籃烷骨架、房烷骨架等)、螺骨架等。該些中,就於高溫條件下更長時間地維持賦形層的密接性的觀點而言,較佳為環己基骨架、二環戊二烯骨架、金剛烷骨架或異冰片基骨架。Alicyclic structures include, for example, cyclohexyl skeleton, dicyclopentadiene skeleton, adamantane skeleton, isobornyl skeleton, cycloalkane skeleton (cycloheptane skeleton, cyclooctane skeleton, cyclononane skeleton, cyclodecane skeleton , cycloundecane skeleton, cyclododecane skeleton, etc.), cycloolefin skeleton (cycloheptene skeleton, cyclooctene skeleton, etc.), norbornene skeleton, norbornadiene skeleton, polycyclic skeleton (cubicane skeleton, etc.) , basket alkane skeleton, room alkane skeleton, etc.), spiro skeleton, etc. Among these, a cyclohexyl skeleton, a dicyclopentadiene skeleton, an adamantane skeleton, or an isobornyl skeleton is preferable from the viewpoint of maintaining the adhesiveness of the shaping layer for a longer period of time under high temperature conditions.
脂環式單官能(甲基)丙烯酸系單體較佳為(甲基)丙烯酸酯,具體而言,可列舉:(甲基)丙烯酸環己酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸金剛烷酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊烯基酯、(甲基)丙烯酸二環戊烯基氧乙酯等。該些中,就於高溫條件下更長時間地維持賦形層的密接性的觀點而言,較佳為(甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊酯、或(甲基)丙烯酸二環戊烯基氧乙酯。該些可單獨使用一種,亦可併用兩種以上。The alicyclic monofunctional (meth)acrylic monomer is preferably (meth)acrylate, and specifically, cyclohexyl (meth)acrylate, dicyclopentyl (meth)acrylate, ( Adamantyl meth)acrylate, isobornyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and the like. Among these, from the viewpoint of maintaining the adhesiveness of the shaping layer for a longer period of time under high temperature conditions, isobornyl (meth)acrylate, dicyclopentyl (meth)acrylate, or (meth)acrylate are preferred. base) dicyclopentenyloxyethyl acrylate. These may be used individually by 1 type, and may use 2 or more types together.
就於高溫條件下更長時間地維持賦形層的密接性的觀點而言,以自由基聚合性成分總量為基準,光硬化型組成物中的脂環式單官能(甲基)丙烯酸系單體的含量可為0.1質量%~75質量%,可為0.1質量%~70質量%,可為40質量%~65質量%,亦可為45質量%~60質量%。另外,就同樣的觀點而言,以光硬化型組成物的總量為基準,脂環式單官能(甲基)丙烯酸系單體的含量可為30質量%~75質量%,可為30質量%~70質量%,可為35質量%~65質量%,可為40質量%~60質量%,亦可為45質量%~57質量%。From the viewpoint of maintaining the adhesiveness of the shaping layer for a longer period of time under high temperature conditions, the alicyclic monofunctional (meth)acrylic type in the photocurable composition is based on the total amount of the radically polymerizable components. The content of the monomer may be 0.1 to 75 mass %, 0.1 to 70 mass %, 40 to 65 mass %, or 45 to 60 mass %. In addition, from the same viewpoint, the content of the alicyclic monofunctional (meth)acrylic monomer may be 30% by mass to 75% by mass, and may be 30% by mass based on the total amount of the photocurable composition. % to 70 mass %, 35 to 65 mass %, 40 to 60 mass %, or 45 to 57 mass %.
(A5)多官能(甲基)丙烯酸系單體 光硬化型組成物亦可進而包含具有2個以上(甲基)丙烯醯基的多官能(甲基)丙烯酸系單體(亦稱作「(A5)成分」)作為(A)自由基聚合性成分。藉由包含此種多官能(甲基)丙烯酸系單體,於高溫及高濕條件下,可更長時間地維持賦形層對基材的密接性。另外,硬化物的硬度變得更高。再者,(A5)成分為既不相當於(A1)成分亦不相當於(A3)成分的成分。(A5) Polyfunctional (meth)acrylic monomer The photocurable composition may further include a polyfunctional (meth)acrylic monomer having two or more (meth)acryloyl groups (also referred to as "( A5) Component") as (A) radically polymerizable component. By including such a polyfunctional (meth)acrylic monomer, the adhesion of the shaping layer to the substrate can be maintained for a longer period of time under high temperature and high humidity conditions. In addition, the hardness of the hardened product becomes higher. In addition, (A5) component is a component which does not correspond to neither (A1) nor (A3) component.
多官能(甲基)丙烯酸系單體例如可列舉:1,3-丁二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、羥基三甲基乙酸酯新戊二醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、3-甲基戊二醇二(甲基)丙烯酸酯、雙二乙二醇鄰苯二甲酸α,ω-二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三(丙烯醯氧基乙基)異氰脲酸酯、三(甲基丙烯醯氧基乙基)異氰脲酸酯、二季戊四醇五(甲基)丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、二季戊四醇單羥基五(甲基)丙烯酸酯、聚甘油聚丙烯酸酯、以及對該些進行環氧乙烷改質或環氧丙烷改質而成的環氧烷改質多官能(甲基)丙烯酸酯、及對該些進行己內酯改質而成的己內酯改質多官能(甲基)丙烯酸酯。該些多官能(甲基)丙烯酸系單體可單獨使用一種,亦可併用兩種以上。該些中,較佳為聚乙二醇二(甲基)丙烯酸酯。Examples of polyfunctional (meth)acrylic monomers include 1,3-butanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, and 1,6-hexanediol. Alcohol di(meth)acrylate, polyethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate (meth)acrylate, tripropylene glycol di(meth)acrylate, hydroxytrimethylacetate, neopentyl glycol di(meth)acrylate, trimethylolpropane di(meth)acrylate, 3 - Methylpentanediol di(meth)acrylate, bisdiethylene glycol phthalate α,ω-di(meth)acrylate, trimethylolpropane tri(meth)acrylate, trihydroxy Methyl ethane tri(meth)acrylate, glycerol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tri- (Acryloyloxyethyl)isocyanurate, tris(methacryloyloxyethyl)isocyanurate, dipentaerythritol penta(meth)acrylate, di-trimethylolpropane tetraacrylic acid ester, dipentaerythritol monohydroxypenta (meth)acrylate, polyglycerol polyacrylate, and alkylene oxide modified polyfunctional (methyl) modified with ethylene oxide or propylene oxide. ) acrylates, and caprolactone-modified polyfunctional (meth)acrylates obtained by modifying these caprolactones. These polyfunctional (meth)acrylic monomers may be used alone or in combination of two or more. Among these, polyethylene glycol di(meth)acrylate is preferable.
以自由基聚合性成分總量為基準,光硬化型組成物中的多官能(甲基)丙烯酸系單體的含量較佳為0.1質量%~90質量%,更佳為0.5質量%~50質量%,進而佳為1質量%~40質量%。The content of the polyfunctional (meth)acrylic monomer in the photocurable composition is preferably 0.1% by mass to 90% by mass, more preferably 0.5% by mass to 50% by mass, based on the total amount of the radically polymerizable components. %, more preferably 1% by mass to 40% by mass.
光硬化型組成物可進而包含所述(A1)成分~(A5)成分以外的(A)自由基聚合性成分。(A1)成分~(A5)成分以外的(A)自由基聚合性成分例如可列舉丙烯酸四氫糠酯、丙烯酸鄰苯基苯氧基乙酯等稀釋單體。以(A)自由基聚合性成分總量為基準,(A1)成分~(A5)成分以外的自由基聚合性成分的含量可為90質量%以下,可為0.1質量%~90質量%,可為0.5質量%~80質量%,可為1質量%~75質量%,亦可為1質量%~50質量%。The photocurable composition may further contain (A) radically polymerizable components other than the above-mentioned (A1) components to (A5) components. (A) radically polymerizable components other than (A1) component - (A5) component, diluent monomers, such as tetrahydrofurfuryl acrylate and acrylate o-phenylphenoxyethyl, are mentioned, for example. The content of the radical polymerizable components other than the components (A1) to (A5) may be 90% by mass or less, 0.1% by mass to 90% by mass, based on the total amount of the (A) radically polymerizable components. 0.5 mass % - 80 mass %, 1 mass % - 75 mass %, and 1 mass % - 50 mass % may be sufficient.
(B)光聚合起始劑 為了藉由光自由基聚合來進行光硬化型組成物的有效率的硬化,光硬化型組成物亦可進而含有光聚合起始劑(亦稱作「(B)成分」)。光聚合起始劑只要為照射有活性能量線時使自由基聚合開始的化合物,則無特別限制。活性能量線的例子例如包含紫外線、電子束、α射線、β射線及γ射線。作為光聚合起始劑,可使用二苯甲酮系光聚合起始劑、蒽醌系光聚合起始劑、苯甲醯基系光聚合起始劑、鋶鹽系光聚合起始劑、重氮鎓鹽系光聚合起始劑、鎓鹽系光聚合起始劑、醯基氧化膦系光聚合起始劑等光聚合起始劑。光聚合起始劑亦可為藉由抽出分子內的氫而使聚合開始的光聚合起始劑。(B) Photopolymerization Initiator In order to efficiently harden the photocurable composition by photoradical polymerization, the photocurable composition may further contain a photopolymerization initiator (also referred to as "(B) Element"). The photopolymerization initiator is not particularly limited as long as it is a compound that starts radical polymerization when irradiated with active energy rays. Examples of active energy rays include ultraviolet rays, electron beams, alpha rays, beta rays, and gamma rays. As the photopolymerization initiator, benzophenone-based photopolymerization initiators, anthraquinone-based photopolymerization initiators, benzyl-based photopolymerization initiators, perylene salt-based photopolymerization initiators, heavyweight Photopolymerization initiators such as azonium salt-based photopolymerization initiators, onium salt-based photopolymerization initiators, and acylphosphine oxide-based photopolymerization initiators. The photopolymerization initiator may also be a photopolymerization initiator that starts polymerization by extracting hydrogen in the molecule.
光聚合起始劑的具體例可列舉:二苯甲酮、4-甲基二苯甲酮、N,N,N',N'-四甲基-4,4'-二胺基二苯甲酮(米其勒酮)、N,N,N',N'-四乙基-4,4'-二胺基二苯甲酮、4-甲氧基-4'-二甲基胺基二苯甲酮、α-羥基異丁基苯酮、2-乙基蒽醌、第三丁基蒽醌、1,4-二甲基蒽醌、1-氯蒽醌、2,3-二氯蒽醌、3-氯-2-甲基蒽醌、1,2-苯并蒽醌、2-苯基蒽醌、1,4-萘醌、9,10-菲醌、硫雜蒽酮、2-氯硫雜蒽酮、1-羥基環己基苯基酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、2-羥基-2-甲基-1-苯基丙烷-1-酮等芳香族酮化合物;安息香、甲基安息香、乙基安息香等安息香化合物;安息香甲醚、安息香乙醚、安息香異丁醚、安息香苯醚等安息香醚化合物;苯偶醯、苯偶醯二甲基縮酮等苯偶醯化合物;2,2-二乙氧基苯乙酮等芳香族酮化合物;β-(吖啶-9-基)(甲基)丙烯酸的酯化合物、9-苯基吖啶、9-吡啶基吖啶、1,7-二吖啶基庚烷等吖啶化合物;2-(鄰氯苯基)-4,5-二苯基咪唑二聚物、2-(鄰氯苯基)-4,5-二(間甲氧基苯基)咪唑二聚物、2-(鄰氟苯基)-4,5-二苯基咪唑二聚物、2-(鄰甲氧基苯基)-4,5-二苯基咪唑二聚物、2-(對甲氧基苯基)-4,5-二苯基咪唑二聚物、2,4-二(對甲氧基苯基) -5-苯基咪唑二聚物、2-(2,4-二甲氧基苯基)-4,5-二苯基咪唑二聚物、2-(對甲基巰基苯基)-4,5-二苯基咪唑二聚物等2,4,5-三芳基咪唑二聚物;2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-1-丁酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-1-丙烷等α-胺基烷基苯酮化合物;雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦及2,4,6-三甲基苯甲醯基二苯基氧化膦;以及寡聚(2-羥基-2-甲基-1-(4-(1-甲基乙烯基)苯基)丙酮)。該些化合物可單獨使用一種,亦可併用兩種以上。Specific examples of the photopolymerization initiator include benzophenone, 4-methylbenzophenone, N,N,N',N'-tetramethyl-4,4'-diaminobenzophenone Ketone (Michler's ketone), N,N,N',N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminodi Benzophenone, α-hydroxyisobutylphenone, 2-ethylanthraquinone, tert-butylanthraquinone, 1,4-dimethylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone Quinone, 3-chloro-2-methylanthraquinone, 1,2-benzoanthraquinone, 2-phenylanthraquinone, 1,4-naphthoquinone, 9,10-phenanthraquinone, thiaxanthone, 2- Chlorothiathanone, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethan-1-one, 2-hydroxy-2-methyl-1-benzene Aromatic ketone compounds such as benzoin-1-one; benzoin compounds such as benzoin, methyl benzoin, ethyl benzoin; benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin phenyl ether and other benzoin ether compounds; benzoin, benzene Benzil compounds such as azodimethyl ketal; aromatic ketone compounds such as 2,2-diethoxyacetophenone; β-(acridin-9-yl)(meth)acrylic acid ester compounds, 9 - Acridine compounds such as phenyl acridine, 9-pyridyl acridine, 1,7-diacridyl heptane; 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2 -(o-Chlorophenyl)-4,5-bis(m-methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2-( o-methoxyphenyl)-4,5-diphenylimidazole dimer, 2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer, 2,4-bis(p-methoxyphenyl)-4,5-diphenylimidazole dimer Methoxyphenyl)-5-phenylimidazole dimer, 2-(2,4-dimethoxyphenyl)-4,5-diphenylimidazole dimer, 2-(p-methylmercapto Phenyl)-4,5-diphenylimidazole dimer and other 2,4,5-triarylimidazole dimers; 2-benzyl-2-dimethylamino-1-(4-morpholinyl Phenyl)-1-butanone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-1-propane and other α-aminoalkylphenone compounds; bis( 2,4,6-Trimethylbenzyl)-phenylphosphine oxide and 2,4,6-trimethylbenzyldiphenylphosphine oxide; and oligo(2-hydroxy-2-methyl) base-1-(4-(1-methylvinyl)phenyl)acetone). These compounds may be used alone or in combination of two or more.
相對於自由基聚合性成分100質量份而言,光硬化型組成物中的光聚合起始劑的含量可為0.01質量份以上、0.1質量份以上、或0.5質量份以上,且可為10質量份以下、6質量份以下、或5質量份以下。藉由光聚合起始劑的含量處於該範圍,可獲得特別良好的光聚合性。The content of the photopolymerization initiator in the photocurable composition may be 0.01 part by mass or more, 0.1 part by mass or more, or 0.5 part by mass or more, and may be 10 parts by mass relative to 100 parts by mass of the radically polymerizable component parts or less, 6 parts by mass or less, or 5 parts by mass or less. When the content of the photopolymerization initiator is within this range, particularly favorable photopolymerization properties can be obtained.
(C)酚系抗氧化劑 光硬化型組成物亦可進而含有包含下述通式(2)所表示的結構的酚系抗氧化劑(亦稱作「(C)成分」)。該酚系抗氧化劑具有如下效果:藉由抑制硬化物的熱氧化劣化來提高硬化物的耐熱黃變性、賦形層對基材的密接性及高分子的壽命等長期可靠性。(C) Phenolic antioxidant The photocurable composition may further contain a phenolic antioxidant (also referred to as "(C) component") having a structure represented by the following general formula (2). This phenolic antioxidant has the effect of improving long-term reliability such as thermal yellowing resistance of the cured product, adhesion of the shaping layer to the base material, and life of the polymer by suppressing the thermal oxidative deterioration of the cured product.
[化7][式中,R3 表示第三丁基或甲基][hua 7] [In the formula, R 3 represents a tert-butyl group or a methyl group]
酚系抗氧化劑例如可較佳地列舉:季戊四醇四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、硫代二伸乙基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、正十八烷基-3-(4'-羥基-3',5'-二-第三丁基-苯基)丙酸酯、N,N'-己烷-1,6-二基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙醯胺]、六亞甲基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5.5]十一烷、二乙基{[3,5-雙(1,1-二甲基乙基)-4-羥基苯基]甲基}膦酸酯等。該些抗氧化劑可單獨使用一種,亦可併用兩種以上。該些中,就獲得更良好的耐熱黃變性及密接性的觀點而言,較佳為季戊四醇四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、或3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5.5]十一烷。Preferred examples of phenolic antioxidants include pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], thiodieneethylbis[3-( 3,5-Di-tert-butyl-4-hydroxyphenyl)propionate], n-octadecyl-3-(4'-hydroxy-3',5'-di-tert-butyl-benzene yl) propionate, N,N'-hexane-1,6-diylbis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionamide], hexamethylene bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], 3,9-bis{2-[3-(3-tert-butyl-4-hydroxy -5-Methylphenyl)propionyloxy]-1,1-dimethylethyl}-2,4,8,10-tetraoxaspiro[5.5]undecane, diethyl{[3 , 5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl}phosphonate and the like. These antioxidants may be used alone or in combination of two or more. Among these, pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] is preferred from the viewpoint of obtaining better thermal yellowing resistance and adhesion. , or 3,9-bis{2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethyl}-2 ,4,8,10-Tetraoxaspiro[5.5]undecane.
相對於自由基聚合性成分與光聚合起始劑的總量100質量份而言,光硬化型組成物中的酚系抗氧化劑的含量較佳為0.5質量份~2.0質量份。The content of the phenolic antioxidant in the photocurable composition is preferably 0.5 parts by mass to 2.0 parts by mass relative to 100 parts by mass of the total amount of the radically polymerizable component and the photopolymerization initiator.
(D)光穩定劑 光硬化型組成物亦可進而含有光穩定劑(紫外線吸收劑)(亦稱作「(D)成分」)。光穩定劑例如可使用硫醇系化合物、硫醚系化合物、受阻胺系化合物等自由基捕捉劑,或者苯并三唑系紫外線吸收劑、羥基苯基三嗪(hydroxyphenyltriazine,HPT)系紫外線吸收劑等紫外線吸收劑。該些光穩定劑可單獨使用一種,亦可併用兩種以上。其中,就獲得優異的密接性、硬度及光穩定性的觀點、以及與光硬化型組成物中含有的(甲基)丙烯酸系單體的相容性的觀點而言,較佳為HPT系紫外線吸收劑。(D) Light stabilizer The light-curable composition may further contain a light stabilizer (ultraviolet absorber) (also referred to as "component (D)"). As the light stabilizer, for example, radical scavengers such as thiol-based compounds, thioether-based compounds, and hindered amine-based compounds, or benzotriazole-based ultraviolet absorbers and hydroxyphenyltriazine (HPT)-based ultraviolet absorbers can be used. and other UV absorbers. These light stabilizers may be used alone or in combination of two or more. Among them, HPT-based ultraviolet rays are preferred from the viewpoint of obtaining excellent adhesion, hardness, and light stability, and from the viewpoint of compatibility with the (meth)acrylic-based monomer contained in the photocurable composition. absorbent.
HPT系紫外線吸收劑例如可列舉:85% 2-(4,6-雙(2,4-二甲基苯基)-1,3,5-三嗪-2-基)-5-羥基苯基與氧雜環丙烷(特別是為[(烷基氧基)甲基]氧雜環丙烷,且烷基氧基為C10~C16,主要為C12~C13)的反應產物的15% 1-甲氧基-2-丙醇溶液(商品名:帝奴彬(TINUVIN)(註冊商標)400)、2-(2,4-二羥基苯基)-4,6-雙-(2,4-二甲基苯基)-1,3,5-三嗪與(2-乙基己基)-縮水甘油酸酯的反應產物(商品名:帝奴彬(TINUVIN)405)、2,4-雙[2-羥基-4-丁氧基苯基]-6-(2,4-二丁氧基苯基)-1,3,5-三嗪(商品名:帝奴彬(TINUVIN)460)、帝奴彬(TINUVIN)477、及帝奴彬(TINUVIN)479(均為巴斯夫(BASF)日本股份有限公司製造)。其中,就獲得優異的光穩定性的觀點以及與光硬化型組成物中含有的(甲基)丙烯酸系單體的相容性的觀點而言,較佳為帝奴彬(TINUVIN)479。帝奴彬(TINUVIN)479為4-[4,6-雙(聯苯-4-基)-1,3,5-三嗪-2-基]苯-1,3-二醇與烷基=2-溴丙酸酯的反應產物,且將烷基=2-{4-[4,6-雙(聯苯-4-基)-1,3,5-三嗪-2-基]-3-羥基苯氧基}丙酸酯作為主成分。所述「烷基」是指碳數8的分支型烷基。Examples of HPT-based ultraviolet absorbers include: 85% 2-(4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl)-5-hydroxyphenyl 15% 1-Methoxy of the reaction product with oxiranes (especially [(alkyloxy)methyl]oxiranes, and the alkyloxy is C10-C16, mainly C12-C13) Alkyl-2-propanol solution (trade name: TINUVIN (registered trademark) 400), 2-(2,4-dihydroxyphenyl)-4,6-bis-(2,4-dimethylene) (Trade name: TINUVIN 405), 2,4-bis[2- Hydroxy-4-butoxyphenyl]-6-(2,4-dibutoxyphenyl)-1,3,5-triazine (trade name: TINUVIN 460), TINUVIN (TINUVIN) 477, and Dinubin (TINUVIN) 479 (both are manufactured by BASF (BASF) Japan Co., Ltd.). Among them, TINUVIN 479 is preferred from the viewpoint of obtaining excellent photostability and compatibility with the (meth)acrylic monomer contained in the photocurable composition. Dinubin (TINUVIN) 479 is 4-[4,6-bis(biphenyl-4-yl)-1,3,5-triazin-2-yl]benzene-1,3-diol and alkyl= The reaction product of 2-bromopropionate and the alkyl=2-{4-[4,6-bis(biphenyl-4-yl)-1,3,5-triazin-2-yl]-3 -Hydroxyphenoxy}propionate as the main component. The "alkyl" refers to a branched alkyl group having 8 carbon atoms.
就防止高溫所引起的硬化物的黃變的觀點而言,相對於自由基聚合性成分與光聚合起始劑的總量100質量份而言,光硬化型組成物中的光穩定劑的含量較佳為0.01質量份~10質量份,更佳為0.1質量份~5質量份。From the viewpoint of preventing yellowing of the cured product caused by high temperature, the content of the light stabilizer in the photocurable composition with respect to 100 parts by mass of the total amount of the radically polymerizable component and the photopolymerization initiator It is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 5 parts by mass.
光硬化型組成物亦可進而含有脫模劑。將脫模劑添加於光硬化型組成物中於使用模具將微細結構形成於賦形層的情況下有用。於賦形層中任意形成的微細結構可自具有微細形狀的模具例如轉印於硬化前的賦形層,於光硬化型組成物含有脫模劑的情況下,賦形層容易自模具脫模。脫模劑例如可列舉含有(甲基)丙烯醯基的聚醚改質聚二甲基矽氧烷或不含(甲基)丙烯醯基的聚醚改質聚二甲基矽氧烷。其中,就抑制脫模劑自硬化物中滲出的觀點而言,較佳為含有(甲基)丙烯醯基的聚醚改質聚二甲基矽氧烷。相對於自由基聚合性成分與光聚合起始劑的總量100質量份而言,光硬化型組成物中的脫模劑的含量較佳為0.1質量份~1.0質量份。The photocurable composition may further contain a release agent. Adding a mold release agent to a photocurable composition is useful when forming a fine structure in a shaping layer using a mold. The fine structure arbitrarily formed in the shaping layer can be transferred from a mold having a fine shape, for example, to the shaping layer before curing. When the photocurable composition contains a mold release agent, the shaping layer can be easily released from the mold. . The release agent includes, for example, a (meth)acryloyl group-containing polyether-modified polydimethylsiloxane or a (meth)acryloyl group-free polyether-modified polydimethylsiloxane. Among them, a polyether-modified polydimethylsiloxane containing a (meth)acryloyl group is preferable from the viewpoint of suppressing the oozing of the release agent from the cured product. The content of the mold release agent in the photocurable composition is preferably 0.1 part by mass to 1.0 part by mass relative to 100 parts by mass of the total of the radically polymerizable component and the photopolymerization initiator.
光硬化型組成物中視需要亦可進而添加矽酮系界面活性劑、增黏劑、調平劑、抗靜電劑、消泡劑等添加劑,亦可進而加入溶劑。相對於自由基聚合性成分與光聚合起始劑的總量100質量份而言,光硬化型組成物中的添加劑及溶劑的合計含量例如亦可為0.01質量份~10質量份。再者,於光硬化型組成物中不含溶劑的情況下,光硬化型組成物的黏度亦具有適合塗敷的充分低的黏度。Additives such as silicone-based surfactants, tackifiers, leveling agents, antistatic agents, and antifoaming agents, as well as solvents, may be further added to the photocurable composition if necessary. The total content of additives and solvents in the photocurable composition may be, for example, 0.01 to 10 parts by mass relative to 100 parts by mass of the total of the radically polymerizable component and the photopolymerization initiator. Furthermore, when the photocurable composition does not contain a solvent, the viscosity of the photocurable composition has a sufficiently low viscosity suitable for coating.
光硬化型組成物的25℃下的黏度較佳為40 mPa·s~1000 mPa·s,更佳為45 mPa·s~500 mPa·s。若黏度處於所述範圍內,則就光硬化型組成物的塗敷性的觀點及自模具朝賦形層轉印微細形狀的觀點而言有利。黏度例如可藉由調節溶媒的量、各成分的分子量等來調整。The viscosity at 25°C of the photocurable composition is preferably 40 mPa·s to 1000 mPa·s, more preferably 45 mPa·s to 500 mPa·s. When the viscosity is within the above-mentioned range, it is advantageous from the viewpoint of the coatability of the photocurable composition and the transfer of the fine shape from the mold to the shaping layer. The viscosity can be adjusted, for example, by adjusting the amount of the solvent, the molecular weight of each component, and the like.
就耐熱性(例如,將賦形膜用作光學片時的對於來自周圍環境的熱的耐熱性、以及將該光學片用於顯示器時的對於顯示器的散熱的耐熱性)的觀點以及於高溫及高濕條件下長時間維持賦形層的密接性的觀點而言,光硬化型組成物的硬化物的玻璃轉移溫度(Tg)較佳為20℃~90℃,更佳為40℃~90℃。本說明書中,玻璃轉移溫度使用動態黏彈性測定裝置加以測定。From the viewpoint of heat resistance (for example, heat resistance to heat from the surrounding environment when the shaped film is used as an optical sheet, and heat resistance to heat dissipation of the display when the optical sheet is used for a display) and at high temperatures and From the viewpoint of maintaining the adhesiveness of the shaping layer for a long time under high humidity conditions, the glass transition temperature (Tg) of the cured product of the photocurable composition is preferably 20°C to 90°C, more preferably 40°C to 90°C . In this specification, the glass transition temperature is measured using a dynamic viscoelasticity measuring apparatus.
所述賦形膜的製造方法並無特別限定,例如可藉由下述般的製造方法來製造所述賦形膜。首先,藉由將光硬化型組成物均勻塗佈於基材的單面(主面)來形成光硬化型組成物的塗膜。此處,亦可藉由脫模膜來覆蓋塗膜。繼而,自基材之側對塗膜照射活性能量線而使塗膜硬化,藉此可獲得於基材上積層有光硬化型組成物的硬化物的賦形膜。此處,光源只要為可將光硬化型組成物充分硬化者,則無特別限制,可使用金屬鹵化物燈等將光硬化型的組成物硬化通常所使用的光源。活性能量線的照射量只要為可將光硬化型組成物充分硬化的量,則亦無特別限制,例如可為1000 mJ/cm2 。The manufacturing method of the said shaped film is not specifically limited, For example, the said shaped film can be manufactured by the following manufacturing method. First, a coating film of the photocurable composition is formed by uniformly coating the photocurable composition on one side (main surface) of the base material. Here, the coating film may be covered with a release film. Then, active energy rays are irradiated to the coating film from the side of the base material to harden the coating film, whereby a shaped film in which the cured product of the photocurable composition is laminated on the base material can be obtained. Here, the light source is not particularly limited as long as it can sufficiently cure the photocurable composition, and a light source generally used for curing a photocurable composition such as a metal halide lamp can be used. The irradiation amount of the active energy ray is not particularly limited as long as it is an amount that can sufficiently harden the photocurable composition, and may be, for example, 1000 mJ/cm 2 .
於賦形層如圖2所示般包含兩層的情況下,首先,可藉由與所述相同的方法於基材上形成第1賦形層。繼而,將第2賦形層的材料均勻塗佈於第1賦形層的表面而形成塗膜,並藉由與第2賦形層的材料相對應的方法將其硬化,藉此,可獲得依序積層有第1賦形層及第2賦形層的賦形膜。When the shaping layer includes two layers as shown in FIG. 2 , first, the first shaping layer can be formed on the substrate by the same method as described above. Then, the material of the second shaping layer is uniformly coated on the surface of the first shaping layer to form a coating film, and is cured by a method corresponding to the material of the second shaping layer, thereby obtaining A shaped film in which the first shaped layer and the second shaped layer are laminated in this order.
賦形膜的賦形層亦可具有微細結構,微細結構可藉由公知的方法來形成。例如,於所述任一種製造方法中,於塗膜硬化前或與硬化同時,將仿照有微細結構的形狀的模具抵壓於塗膜上,藉此可將模具的形狀轉印於塗膜。硬化後,塗膜成為具有微細結構的賦形層。微細結構的形狀根據賦形膜的用途而適宜設計。The shaped layer of the shaped film may have a fine structure, and the fine structure can be formed by a known method. For example, in any of the above-mentioned manufacturing methods, the shape of the mold can be transferred to the coating film by pressing a mold having a shape imitating the microstructure against the coating film before or simultaneously with the curing of the coating film. After curing, the coating film becomes a shaped layer having a fine structure. The shape of the microstructure is appropriately designed according to the application of the shaped film.
本揭示的所述方面的賦形膜具有優異的光學特性,因此,例如可用於液晶顯示裝置等的背光中使用的稜鏡片、立體照片及投影屏幕等中使用的柱狀透鏡片、投影機的聚光透鏡等中使用的夫瑞奈透鏡片、或彩色濾光片中使用的繞射光柵。另外,所述賦形膜於高溫及高濕條件下亦維持賦形層的密接性,此外,耐熱性亦優異,因此,除遊戲機、玩具、家電等中使用的光學片以外,亦能夠作為車載顯示器中使用的光學片來適當使用。 [實施例]The shaped film of the aspect of the present disclosure has excellent optical properties, and therefore, can be used, for example, for a lens sheet used in a backlight of a liquid crystal display device, etc., a lenticular lens sheet used in a 3D photograph, a projection screen, and the like, a film for a projector, etc. Frenanet lenses used in condenser lenses, etc., or diffraction gratings used in color filters. In addition, the shaping film maintains the adhesiveness of the shaping layer even under high temperature and high humidity conditions, and also has excellent heat resistance, so it can be used as an optical sheet other than an optical sheet used in game machines, toys, home appliances, and the like. Optical sheets used in in-vehicle monitors should be used appropriately. [Example]
以下,列舉實施例來對本發明進一步進行具體說明。但本發明並不限定於該些實施例。Hereinafter, the present invention will be further specifically described with reference to Examples. However, the present invention is not limited to these Examples.
<原材料> 表1示出以下例子中為了製備光硬化型組成物而使用的原材料。<Raw material> Table 1 shows the raw material used in order to prepare a photocurable composition in the following examples.
[表1]
表1中的A1-3是以如下方式獲得。於300 mL的燒瓶內加入季戊四醇四丙烯酸酯167.4 g(亞羅尼斯(Aronix)M305:東亞合成股份有限公司製造)、甲氧基苯酚0.1 g及二丁基錫二月桂酸酯0.1 g,均勻地攪拌,並升溫至75℃。於75℃下使其保溫穩定化之後,分24次(一次1.2 g)以5分鐘為間隔添加異佛爾酮二異氰酸酯28.8 g。添加完成後,於75℃下保溫4小時而使反應完成。反應完成後,投入季戊四醇四丙烯酸酯,確認到所獲得的A1-3的25℃下的黏度為45 Pa·s~65 Pa·s。所獲得的A1-3為具有脂環結構、不具有PC結構的多官能丙烯酸胺基甲酸酯。A1-3 in Table 1 was obtained as follows. 167.4 g of pentaerythritol tetraacrylate (Aronix M305: manufactured by Toagosei Co., Ltd.), 0.1 g of methoxyphenol, and 0.1 g of dibutyltin dilaurate were added to a 300 mL flask, and the mixture was uniformly stirred. and heated to 75°C. After thermal stabilization at 75° C., 28.8 g of isophorone diisocyanate was added at 5-minute intervals in 24 times (1.2 g at a time). After the addition was completed, the reaction was completed by holding at 75°C for 4 hours. After completion of the reaction, pentaerythritol tetraacrylate was charged, and the viscosity at 25° C. of the obtained A1-3 was confirmed to be 45 Pa·s to 65 Pa·s. The obtained A1-3 is a polyfunctional acrylic urethane which has an alicyclic structure and does not have a PC structure.
表1中,重量平均分子量Mw是藉由GPC法並根據使用了標準聚苯乙烯的校準曲線進行換算所得的值。GPC法的測定條件如以下所述。 ·裝置:東曹(Tosoh)股份有限公司製造的HLC-8320GPC(內置折射率(refractive index,RI)檢測器) ·檢測器:RI(示差折射計) ·溶媒:純正1級四氫呋喃(tetrahydrofuran,THF) ·保護管柱:TSK-保護管柱(guardcolumn) 超級(Super)MP(HZ)-H(1支) ·保護管柱尺寸:4.6 mm(ID)×20 mm ·管柱:東曹(Tosoh)股份有限公司製造的TSK-凝膠超級多細孔(GEL Super Multipore)HZ-H(3支連接)、管柱尺寸:4.6 mm(ID)×150 mm ·溫度:40℃ ·試樣濃度:0.01 g/5 mL ·注入量:10 μL ·流量:0.35 mL/minIn Table 1, the weight average molecular weight Mw is a value converted from a calibration curve using standard polystyrene by the GPC method. The measurement conditions of the GPC method are as follows.・Device: HLC-8320GPC (built-in refractive index (RI) detector) manufactured by Tosoh Co., Ltd. ・Detector: RI (differential refractometer) ・Solvent:
<光硬化型組成物的製備> 相對於表2所示的調配比例的自由基聚合性成分100質量份而調配表3所示的量(質量份)的其他成分,並於60℃下攪拌1小時,從而獲得實施例1~實施例11及比較例1~比較例4的均勻的光硬化型組成物。表2及表3中的數值是質量份。<Preparation of photocurable composition> The other components in the amounts (parts by mass) shown in Table 3 were blended with respect to 100 parts by mass of the radically polymerizable components in the blending ratios shown in Table 2, and stirred at 60° C. for 1 hours, the uniform photocurable compositions of Examples 1 to 11 and Comparative Examples 1 to 4 were obtained. Numerical values in Table 2 and Table 3 are parts by mass.
[表2]
[表3]
使用東機產業股份有限公司製造的數位型黏度計 RE80R型於25℃下測定各光硬化型組成物的黏度。The viscosity of each photocurable composition was measured at 25°C using a digital viscometer RE80R manufactured by Toki Sangyo Co., Ltd.
<密接性及鉛筆硬度評價用的樣品的製作> 於厚度為100 μm的PC膜(三菱瓦斯化學(Mitsubishi Gas Chemical)股份有限公司製造的商品名:尤皮隆(Iupilon)(註冊商標)·膜FE-2000)上,以硬化物的厚度成為30 μm的方式分別均勻地塗佈實施例1~實施例11及比較例1~比較例4的光硬化型組成物。藉由厚度50 μm的脫模膜(藤森工業股份有限公司製造的商品名:菲姆百納(FILMBYNA)(註冊商標)BD)來覆蓋所形成的光硬化型組成物的塗膜,並使用金屬鹵化物燈自PC膜側照射1000 mJ/cm2 的紫外線,藉此將塗膜硬化。<Preparation of Sample for Adhesion and Pencil Hardness Evaluation> PC film (trade name: Iupilon (registered trademark) film by Mitsubishi Gas Chemical Co., Ltd. made by Mitsubishi Gas Chemical Co., Ltd.) with a thickness of 100 μm FE-2000), the photocurable compositions of Examples 1 to 11 and Comparative Examples 1 to 4 were uniformly coated so that the thickness of the cured product was 30 μm. The formed coating film of the photocurable composition was covered with a release film (trade name: FILMBYNA (registered trademark) BD, manufactured by Fujimori Kogyo Co., Ltd.) with a thickness of 50 μm, and a metal The halide lamp irradiated ultraviolet rays of 1000 mJ/cm 2 from the PC film side, thereby curing the coating film.
<玻璃轉移溫度評價用的樣品的製作> 於玻璃板上,以硬化物的厚度成為100 μm的方式分別均勻地塗佈實施例1~實施例11及比較例1~比較例4的光硬化型組成物。藉由厚度50 μm的脫模膜(菲姆百納(FILMBYNA)BD)來覆蓋所形成的光硬化型組成物的層,並使用金屬鹵化物燈自PC膜側照射1000 mJ/cm2 的紫外線,藉此將塗膜硬化。<Preparation of samples for glass transition temperature evaluation> The photocurable types of Examples 1 to 11 and Comparative Examples 1 to 4 were uniformly coated on a glass plate so that the thickness of the cured product was 100 μm. composition. The layer of the photocurable composition formed was covered with a release film (FILMBYNA BD) with a thickness of 50 μm, and 1000 mJ/cm 2 of ultraviolet rays were irradiated from the PC film side using a metal halide lamp. , thereby hardening the coating film.
<評價> (1)壓力鍋試驗後的密接性的評價 將密接性的評價用的樣品切斷並製作長度10 cm、寬度5 cm的試驗片(賦形層(硬化物)的厚度:30 μm)。使用壓力鍋(平山製作所股份有限公司製造的PC-242SIII)於溫度121℃、壓力0.2 MPa、濕度100%RH的條件下對試驗片處理一定時間(壓力鍋試驗(Pressure Cooker Test),以下省略為PCT)。每25小時自壓力鍋中取出試驗片,觀察其外觀,並且評價硬化物(賦形層)對PC膜(基材)的密接性。密接性依據日本工業標準(Japanese Industrial Standard,JIS)K 5600-5-6:1999的規格並藉由交叉切割剝離試驗進行評價。具體而言,首先,於試驗片中,使用切割刀對10 mm×10 mm的區塊賦予1 mm間隔的刀痕而成為棋盤格狀。使玻璃紙膠帶(米其邦(Nichiban)股份有限公司製造的賽羅膠帶(Cellotape)(註冊商標))壓接於刀痕部分,持膠帶的端部以45°的角度將膠帶剝離。觀察試驗片,於任一刀痕部分,硬化物均未自基材剝落的情況下,判定為硬化物「密接」,於存在硬化物以刀痕部分為起點自基材剝落的部位的情況下,判定為硬化物「未密接」。反覆進行PCT直至判定為硬化物「未密接」,記錄維持了硬化物密接於基材的狀態的時間。於自PCT開始25小時後硬化物已未密接的情況下,將維持了密接狀態的時間記錄為0小時。維持了自PCT開始密接50小時以上的狀態的試驗片可評價為於高溫及高濕條件下,亦長時間維持賦形層對基材的密接性。<Evaluation> (1) Evaluation of Adhesion after Pressure Cooker Test A sample for evaluation of adhesion was cut to prepare a test piece with a length of 10 cm and a width of 5 cm (thickness of the shaping layer (hardened product): 30 μm) . Using a pressure cooker (PC-242SIII manufactured by Hirayama Seisakusho Co., Ltd.) under the conditions of temperature 121°C, pressure 0.2 MPa, and humidity 100% RH, the test piece was treated for a certain period of time (Pressure Cooker Test, hereinafter abbreviated as PCT) . The test piece was taken out from the pressure cooker every 25 hours, the external appearance was observed, and the adhesiveness of the cured product (shape layer) to the PC film (substrate) was evaluated. Adhesion was evaluated by the cross-cut peel test according to the specification of Japanese Industrial Standard (JIS) K 5600-5-6:1999. Specifically, first, the test piece was formed into a checkerboard shape by using a dicing blade to give knife marks at intervals of 1 mm to blocks of 10 mm×10 mm. A cellophane tape (Cellotape (registered trademark) manufactured by Nichiban Co., Ltd.) was pressed against the cut portion, and the tape was peeled off at an angle of 45° with the end of the tape. The test piece was observed, and when the cured product did not peel off from the base material in any of the knife marks, it was judged that the cured product was "adhered", and when there was a portion where the cured product peeled off from the base with the knife mark as a starting point, The hardened material was judged to be "not in close contact". PCT was repeatedly performed until it was determined that the cured product was "not in close contact", and the time in which the state of the cured product in close contact with the base material was maintained was recorded. When the cured product was not in close contact after 25 hours from the start of PCT, the time for which the adhered state was maintained was recorded as 0 hours. The test piece maintained in the state of being in close contact with each other for 50 hours or more from the PCT can be evaluated as maintaining the adhesion of the shaping layer to the base material for a long period of time even under high temperature and high humidity conditions.
(2)霧度的測定 使用霧度計(須賀(Suga)試驗機股份有限公司製造的型號:HGM-2)對(1)中的試驗片的PCT前與自PCT開始25小時後的賦形層(硬化物)的霧度進行測定,算出試驗前後的霧度的變化量ΔHz。具有0~1.5的ΔHz的試驗片可評價為具有優異的光學特性。(2) Measurement of haze Using a haze meter (Model: HGM-2, manufactured by Suga Testing Machine Co., Ltd.), the test piece in (1) was shaped before PCT and 25 hours after the start of PCT. The haze of the layer (hardened product) was measured, and the amount of change ΔHz in the haze before and after the test was calculated. A test piece having ΔHz of 0 to 1.5 can be evaluated as having excellent optical properties.
(3)玻璃轉移溫度的測定 將玻璃轉移溫度評價用的樣品切斷並製作長度25 mm、寬度10 mm的試驗片。使用動態黏彈性測定裝置(SII奈米科技(SII Nano Technology)股份有限公司製造的型號:DMS6100)並以「拉伸正弦波模式」於頻率1 Hz、應變振幅0.05%、升溫速度3℃/min的條件下測定試驗片的損失正切(tanδ)的極大值(玻璃轉移溫度)。(3) Measurement of glass transition temperature The sample for glass transition temperature evaluation was cut, and a test piece having a length of 25 mm and a width of 10 mm was prepared. A dynamic viscoelasticity measuring device (Model: DMS6100 manufactured by SII Nano Technology Co., Ltd.) was used in the "stretching sine wave mode" at a frequency of 1 Hz, a strain amplitude of 0.05%, and a heating rate of 3°C/min. The maximum value (glass transition temperature) of the loss tangent (tanδ) of the test piece was measured under the same conditions.
(4)鉛筆硬度的測定 依據JIS K 5600-5-4:1999的規格對密接性評價用的樣品中的賦形層(硬化度)的鉛筆硬度進行測定。使鉛筆相對於賦形層的主面而為45°的角度,一面施加200 g的負荷一面劃賦形層的表面。利用硬度不同的鉛筆將以上操作各反覆進行5次,5次中4次以上未於賦形層上殘留傷痕的鉛筆的硬度中,記錄最硬者。鉛筆硬度為3 B以上的樣品可評價為具有高硬度。(4) Measurement of pencil hardness According to the specification of JIS K 5600-5-4:1999, the pencil hardness of the shaping|molding layer (hardening degree) in the sample for adhesion evaluation was measured. The surface of the shaping layer was scribed while applying a load of 200 g with a pencil at an angle of 45° with respect to the main surface of the shaping layer. Each of the above operations was repeated 5 times with pencils with different hardnesses, and among the hardnesses of the pencils that did not leave scratches on the
將以上評價及測定的結果示於表4。表4中,各成分的比例表示以自由基聚合性成分總量為基準的調配量(質量%)。具備包含(A1)成分及(A2)成分的組合的光硬化型組成物的硬化物作為賦形層的實施例1~實施例11的賦形膜於長時間的嚴酷的溫度及濕度下的試驗後,亦維持了賦形層的高密接性及賦形層的優異的霧度。另外,實施例1~實施例11的賦形膜包括硬度高的賦形層,因此能夠維持優異的外觀。另一方面,關於比較例1、比較例2及比較例4的賦形膜,藉由嚴酷的溫度及濕度下的試驗而賦形層的密接性顯著下降。另外,比較例3的賦形膜中的賦形層不具有充分的硬度。The results of the above evaluation and measurement are shown in Table 4. In Table 4, the ratio of each component shows the compounding quantity (mass %) based on the total amount of radically polymerizable components. Tests of the shaped films of Examples 1 to 11 having a hardened product of a photocurable composition containing a combination of the (A1) component and the (A2) component as the shaped layer under severe temperature and humidity for a long time After that, the high adhesiveness of the shaping layer and the excellent haze of the shaping layer were also maintained. In addition, since the shaped films of Examples 1 to 11 include shaped layers with high hardness, excellent appearance can be maintained. On the other hand, with respect to the shaped films of Comparative Example 1, Comparative Example 2, and Comparative Example 4, the adhesiveness of the shaped layer was significantly decreased by the test under severe temperature and humidity. In addition, the shaped layer in the shaped film of Comparative Example 3 did not have sufficient hardness.
[表4]
1、4‧‧‧賦形層2‧‧‧第1賦形層3‧‧‧第2賦形層5‧‧‧基材10、20‧‧‧賦形膜1. 4‧‧‧
圖1是表示賦形膜的一實施形態的示意剖面圖。 圖2是表示賦形膜的一實施形態的示意剖面圖。FIG. 1 is a schematic cross-sectional view showing an embodiment of a shaped film. FIG. 2 is a schematic cross-sectional view showing an embodiment of a shaped film.
1‧‧‧賦形層 1‧‧‧Shaping layer
5‧‧‧基材 5‧‧‧Substrate
10‧‧‧賦形膜 10‧‧‧Shaping film
Claims (21)
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JP2017154486 | 2017-08-09 |
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JP (1) | JP7210844B2 (en) |
KR (1) | KR20200039659A (en) |
CN (2) | CN116396519A (en) |
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WO (1) | WO2019031310A1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05117348A (en) * | 1991-10-31 | 1993-05-14 | Dainippon Printing Co Ltd | Ultraviolet-curing type resin composition for fresnel lens and transmission type screen |
CN1572833A (en) * | 2003-05-08 | 2005-02-02 | Dsmip财产有限公司 | Radiation solidified resin composition for forming optical element and optical element |
WO2013151119A1 (en) * | 2012-04-06 | 2013-10-10 | 東亞合成株式会社 | Active-energy-curable composition for forming optical layer |
Family Cites Families (5)
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JP2011021114A (en) | 2009-07-16 | 2011-02-03 | Dainippon Printing Co Ltd | Ionizing radiation-curable resin composition for optical sheet, and optical sheet |
JP5733175B2 (en) * | 2011-11-28 | 2015-06-10 | 東亞合成株式会社 | Active energy ray-curable adhesive composition |
JP6299079B2 (en) * | 2013-04-22 | 2018-03-28 | 日立化成株式会社 | Photocurable resin composition for forming fine structure and cured product |
KR102365604B1 (en) * | 2014-07-18 | 2022-02-18 | 쇼와덴코머티리얼즈가부시끼가이샤 | Laminate film |
JP6679234B2 (en) * | 2015-07-29 | 2020-04-15 | マクセルホールディングス株式会社 | Model material resin composition, support material resin composition, stereolithography product, and method for producing stereolithography product |
-
2018
- 2018-07-31 KR KR1020207000882A patent/KR20200039659A/en not_active Application Discontinuation
- 2018-07-31 JP JP2019535129A patent/JP7210844B2/en active Active
- 2018-07-31 CN CN202310372793.9A patent/CN116396519A/en active Pending
- 2018-07-31 WO PCT/JP2018/028669 patent/WO2019031310A1/en active Application Filing
- 2018-07-31 CN CN201880051129.1A patent/CN110997770A/en active Pending
- 2018-08-07 TW TW107127454A patent/TWI774814B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05117348A (en) * | 1991-10-31 | 1993-05-14 | Dainippon Printing Co Ltd | Ultraviolet-curing type resin composition for fresnel lens and transmission type screen |
CN1572833A (en) * | 2003-05-08 | 2005-02-02 | Dsmip财产有限公司 | Radiation solidified resin composition for forming optical element and optical element |
WO2013151119A1 (en) * | 2012-04-06 | 2013-10-10 | 東亞合成株式会社 | Active-energy-curable composition for forming optical layer |
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JPWO2019031310A1 (en) | 2020-07-02 |
TW201910132A (en) | 2019-03-16 |
CN116396519A (en) | 2023-07-07 |
WO2019031310A1 (en) | 2019-02-14 |
JP7210844B2 (en) | 2023-01-24 |
KR20200039659A (en) | 2020-04-16 |
CN110997770A (en) | 2020-04-10 |
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