TWI772816B - Electronic package and manufacturing method thereof - Google Patents

Electronic package and manufacturing method thereof Download PDF

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Publication number
TWI772816B
TWI772816B TW109118804A TW109118804A TWI772816B TW I772816 B TWI772816 B TW I772816B TW 109118804 A TW109118804 A TW 109118804A TW 109118804 A TW109118804 A TW 109118804A TW I772816 B TWI772816 B TW I772816B
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Taiwan
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electronic
package
layer
cladding layer
electronic components
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TW109118804A
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Chinese (zh)
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TW202147532A (en
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蘇品境
王隆源
王愉博
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矽品精密工業股份有限公司
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Priority to TW109118804A priority Critical patent/TWI772816B/en
Priority to CN202010534710.8A priority patent/CN113764359A/en
Publication of TW202147532A publication Critical patent/TW202147532A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3142Sealing arrangements between parts, e.g. adhesion promotors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Abstract

This invention provides an electronic package which forms a encapsulating layer on an electronic component, and then bonds the encapsulating layer on a supporting structure, so that the encapsulating layer is free from crawling to a side of the electronic component due to capillary action. Therefore, when a packaging layer for covering the electronic component and the encapsulating layer is polished, an internal stress of the electronic component can be dispersed to avoid a problem of cracking of the electronic component due to stress concentration.

Description

電子封裝件及其製法 Electronic package and method of making the same

本發明係有關一種半導體裝置,尤指一種覆晶封裝型之電子封裝件及其製法。 The present invention relates to a semiconductor device, in particular to an electronic package of flip chip package type and a manufacturing method thereof.

隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。目前應用於晶片封裝領域之技術繁多,例如晶片尺寸構裝(Chip Scale Package,簡稱CSP)、晶片直接貼附封裝(Direct Chip Attached,簡稱DCA)或多晶片模組封裝(Multi-Chip Module,簡稱MCM)等覆晶型封裝模組,或將晶片立體堆疊化整合為三維積體電路(3D IC)晶片堆疊模組。 With the vigorous development of the electronic industry, electronic products are gradually moving towards the trend of multi-function and high performance. There are many technologies currently used in the field of chip packaging, such as Chip Scale Package (CSP), Direct Chip Attached (DCA) or Multi-Chip Module (Multi-Chip Module) MCM) and other flip-chip packaging modules, or three-dimensionally stacking and integrating chips into a three-dimensional integrated circuit (3D IC) chip stacking module.

圖1係為習知3D IC式半導體封裝件1之剖面示意圖。首先,提供一具有相對之轉接側10a與置晶側10b之矽中介板(Through Silicon interposer,簡稱TSI)10,且該矽中介板10具有複數連通該置晶側10b與轉接側10a之導電矽穿孔(Through-silicon via,簡稱TSV)100,並於該置晶側10b上形成線路結構101以供接置多個具有複數銲錫凸塊12之半導體元件11,再以底膠13包覆該些銲錫凸塊12,並形成封裝層14以包覆該半導體元件11,並研磨該封裝層14,以令該半導體元件11之上表面外露出該封裝層14。接著,將該矽中介板10以其轉接側10a透過複數導電元件15設於一封裝基板16上,並使該封裝基板16電性連接該些導電 矽穿孔100,再以底膠17包覆該些導電元件15。接著,形成封裝膠體18於該封裝基板16上,以令該封裝膠體18包覆該封裝層14與該矽中介板10。最後,形成複數銲球160於該封裝基板16之下側,以供接置於一電路板19上。 FIG. 1 is a schematic cross-sectional view of a conventional 3D IC type semiconductor package 1 . First, provide a through silicon interposer (TSI) 10 having an opposite via side 10a and a die placement side 10b, and the silicon interposer 10 has a plurality of connections between the die placement side 10b and the interposer side 10a. A through-silicon via (TSV) 100 is formed, and a circuit structure 101 is formed on the die-mounting side 10b for connecting a plurality of semiconductor elements 11 with a plurality of solder bumps 12, and then covered with a primer 13 The solder bumps 12 are formed to form an encapsulation layer 14 to cover the semiconductor element 11 , and the encapsulation layer 14 is ground to expose the encapsulation layer 14 from the upper surface of the semiconductor element 11 . Next, the silicon interposer 10 is disposed on a package substrate 16 with its transfer side 10a through a plurality of conductive elements 15, and the package substrate 16 is electrically connected to the conductive elements Through silicon vias 100 , the conductive elements 15 are covered with primer 17 . Next, an encapsulant 18 is formed on the package substrate 16 , so that the encapsulant 18 covers the encapsulation layer 14 and the silicon interposer 10 . Finally, a plurality of solder balls 160 are formed on the lower side of the package substrate 16 for connecting to a circuit board 19 .

惟,習知半導體封裝件1中,係先將該半導體元件11覆晶接合該線路結構101,再填入該底膠13,致使該底膠13之外側130會呈坡狀,如圖1’所示,導致該底膠13之外側130會因各該半導體元件11之間的間隙S所產生之毛細作用而爬流於各該半導體元件11之側面11c上,以致於該半導體元件11的內部應力增高,故於研磨該封裝層14時,外部的研磨作用力會傳遞至該半導體元件11中,而造成該半導體元件11之應力集中而發生破裂,導致該半導體封裝件1之可靠度不佳。 However, in the conventional semiconductor package 1, the semiconductor element 11 is flip-chip bonded to the circuit structure 101, and then the primer 13 is filled, so that the outer side 130 of the primer 13 is sloped, as shown in FIG. 1' As shown, the outer side 130 of the primer 13 will crawl on the side surface 11c of each semiconductor element 11 due to the capillary action generated by the gap S between the semiconductor elements 11, so that the inside of the semiconductor element 11 The stress increases, so when the encapsulation layer 14 is ground, the external grinding force will be transmitted to the semiconductor element 11 , causing the stress concentration of the semiconductor element 11 to break down, resulting in poor reliability of the semiconductor package 1 .

因此,如何克服上述習知技術的問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the above-mentioned problems of the conventional technology has become an urgent problem to be solved at present.

鑑於上述習知技術之種種缺失,本發明係提供一種電子封裝件,係包括:承載結構;複數電子元件,係間隔設置於該承載結構上,以令任二相鄰之該電子元件之間形成有一間隙,其中,各該電子元件上形成有複數導電凸塊及一包覆該複數導電凸塊之包覆層,使各該電子元件以該包覆層黏固於該承載結構上,且以該導電凸塊電性連接該承載結構;以及封裝層,係形成於該承載結構上,以包覆該複數電子元件與包覆層。 In view of various deficiencies in the above-mentioned prior art, the present invention provides an electronic package, comprising: a bearing structure; a plurality of electronic components arranged on the bearing structure at intervals, so that any two adjacent electronic components are formed between them. There is a gap, wherein a plurality of conductive bumps and a cladding layer covering the plurality of conductive bumps are formed on each of the electronic components, so that each of the electronic components is fixed on the carrier structure by the cladding layer, and is The conductive bump is electrically connected to the carrying structure; and an encapsulation layer is formed on the carrying structure to cover the plurality of electronic components and the covering layer.

本發明復提供一種電子封裝件之製法,係包括:提供複數電子元件,其中,各該電子元件上形成有複數導電凸塊及一包覆該複數導電凸塊之包覆層;將複數電子元件間隔設置於一承載結構上,以令任二相鄰之該電子元件之間形成有一間隙,其中,各該電子元件係以該包覆層黏固於該承載結構上,且以該導電凸塊電性連接該承載結構;以及形成封裝層於該承載結構上,以包覆該複數電子元件與包覆層。 The present invention further provides a method for manufacturing an electronic package, which includes: providing a plurality of electronic components, wherein a plurality of conductive bumps and a coating layer covering the plurality of conductive bumps are formed on each of the electronic components; It is arranged on a carrying structure at intervals, so that a gap is formed between any two adjacent electronic components, wherein each electronic component is fixed on the carrying structure by the coating layer, and the conductive bump is used to form a gap. electrically connecting the carrying structure; and forming an encapsulation layer on the carrying structure to cover the plurality of electronic components and the covering layer.

前述之電子封裝件及其製法中,該複數電子元件之構造係彼此不同。 In the aforementioned electronic package and its manufacturing method, the structures of the plurality of electronic components are different from each other.

前述之電子封裝件及其製法中,該間隙之間距係至多為300微米。 In the aforementioned electronic package and its manufacturing method, the distance between the gaps is at most 300 microns.

前述之電子封裝件及其製法中,復包括對該封裝層進行研磨,以令該電子元件之一表面外露於該封裝層之一表面。 In the aforementioned electronic package and its manufacturing method, the encapsulation layer may be ground, so that a surface of the electronic component is exposed on a surface of the encapsulation layer.

前述之電子封裝件及其製法中,該包覆層之側面係齊平於該電子元件之側面。 In the aforementioned electronic package and the manufacturing method thereof, the side surface of the cladding layer is flush with the side surface of the electronic component.

前述之電子封裝件及其製法中,該包覆層係凸出該電子元件之側面,且該包覆層未接觸該電子元件之側面。例如,該包覆層以其端部凸出該電子元件之側面,且該包覆層之邊緣之剖面係呈球面。 In the aforementioned electronic package and its manufacturing method, the cladding layer protrudes from the side surface of the electronic component, and the cladding layer does not contact the side surface of the electronic component. For example, the end of the cladding layer protrudes from the side surface of the electronic component, and the cross-section of the edge of the cladding layer is spherical.

前述之電子封裝件及其製法中,該包覆層係為非導電性膜。 In the aforementioned electronic package and its manufacturing method, the coating layer is a non-conductive film.

前述之電子封裝件及其製法中,該封裝層之楊氏模數係至少為20GPa。 In the aforementioned electronic package and its manufacturing method, the Young's modulus of the package layer is at least 20 GPa.

前述之電子封裝件及其製法中,該封裝層之楊氏模數係大於該包覆層之楊氏模數。 In the aforementioned electronic package and the manufacturing method thereof, the Young's modulus of the packaging layer is greater than the Young's modulus of the cladding layer.

由上可知,本發明之電子封裝件及其製法中,主要藉由該電子元件上佈設該包覆層,以黏固於該承載結構上,使該包覆層不會因毛細作用而爬流至該電子元件之側面上,故相較於習知技術,本發明於研磨該封裝層時,即使外部的研磨作用力傳遞至該電子元件中,該電子元件之內部仍可分散其所受之應力,以避免該電子元件因應力集中而發生破裂之問題,因而能提高該電子封裝件之可靠度。 As can be seen from the above, in the electronic package and the manufacturing method thereof of the present invention, the coating layer is mainly arranged on the electronic component to be fixed on the bearing structure, so that the coating layer will not crawl due to capillary action to the side of the electronic component, so compared with the prior art, when the present invention grinds the encapsulation layer, even if the external grinding force is transmitted to the electronic component, the inside of the electronic component can still disperse the impact on the packaging layer. stress, so as to avoid the problem of cracking of the electronic component due to stress concentration, thereby improving the reliability of the electronic package.

1:半導體封裝件 1: Semiconductor package

10:矽中介板 10: Silicon interposer

10a:轉接側 10a: Transfer side

10b:置晶側 10b: chip placement side

100:導電矽穿孔 100: Conductive TSV

101:線路結構 101: Line structure

11:半導體元件 11: Semiconductor components

11c,21c,23c,31c:側面 11c, 21c, 23c, 31c: Side

12:銲錫凸塊 12: Solder bumps

13:底膠 13: Primer

130:外側 130: Outside

14,24:封裝層 14,24: Encapsulation layer

15:導電元件 15: Conductive elements

16:封裝基板 16: Package substrate

160:銲球 160: Solder Ball

17:底膠 17: Primer

18:封裝膠體 18: Encapsulating colloid

19:電路板 19: circuit board

2,2’,3:電子封裝件 2,2',3: Electronic package

2a:整版面基材結構 2a: Full-page substrate structure

20:承載結構 20: Bearing structure

200:線路層 200: circuit layer

21,31:電子元件 21,31: Electronic Components

21a:作用面 21a: Action surface

21b:非作用面 21b: Non-active surface

210:電極墊 210: Electrode pads

22:導電凸塊 22: Conductive bumps

23:包覆層 23: Cladding

230:邊緣 230: Edge

24b:上表面 24b: Upper surface

310:封裝材 310: Packaging material

311:控制晶片 311: Control Chip

312:高頻寬記憶體型晶片 312: High bandwidth memory chip

X:水平方向 X: horizontal direction

L:切割路徑 L: cutting path

S:間隙 S: Clearance

t:間距 t: spacing

圖1係為習知半導體封裝件之剖面示意圖。 FIG. 1 is a schematic cross-sectional view of a conventional semiconductor package.

圖1’係為圖1的局部放大剖視示意圖。 Fig. 1' is a schematic partial enlarged cross-sectional view of Fig. 1 .

圖2A至圖2C係為本發明之電子封裝件之製法的剖視示意圖。 2A to 2C are schematic cross-sectional views of a method for manufacturing an electronic package of the present invention.

圖2B’係為圖2B之另一態樣的局部放大剖視示意圖。 Fig. 2B' is a schematic partial enlarged cross-sectional view of another aspect of Fig. 2B.

圖2C’係為圖2C之另一態樣的剖視示意圖。 Fig. 2C' is a schematic cross-sectional view of another aspect of Fig. 2C.

圖3係為圖2C之另一態樣的剖視示意圖。 FIG. 3 is a schematic cross-sectional view of another aspect of FIG. 2C .

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following specific embodiments are used to illustrate the implementation of the present invention, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings in this specification are only used to cooperate with the contents disclosed in the specification for the understanding and reading of those who are familiar with the art, and are not intended to limit the implementation of the present invention. Therefore, it has no technical significance. Any modification of the structure, change of the proportional relationship or adjustment of the size should still fall within the scope of the present invention without affecting the effect and the purpose that the present invention can achieve. The technical content disclosed by the invention can be covered within the scope. At the same time, the terms such as "above" quoted in this specification are only for the convenience of description, and are not used to limit the scope of implementation of the present invention. Changes or adjustments of their relative relationships do not substantially change the technical content. Hereinafter, it should also be regarded as the scope in which the present invention can be implemented.

圖2A至圖2C係為本發明之電子封裝件2之製法之剖視示意圖。 2A to 2C are schematic cross-sectional views of a method of manufacturing the electronic package 2 of the present invention.

如圖2A所示,提供一整版面基材結構2a,其包含複數陣列排設之電子元件21,且各該電子元件21上佈設有複數導電凸塊22及一包覆該些導電凸塊22之包覆層23。 As shown in FIG. 2A , a full-page substrate structure 2 a is provided, which includes a plurality of electronic components 21 arranged in an array, and each of the electronic components 21 is provided with a plurality of conductive bumps 22 and a covering the conductive bumps 22 the cladding layer 23.

該電子元件21可為主動元件、被動元件、封裝結構或其組合者,且該主動元件係如半導體晶片,而該被動元件係如電阻、電容及電感。於本實施例中,該電子元件21係為半導體晶片,並具有相對之作用面21a與非作用面21b,該作用面21a上具有複數電極墊210,且於各該電極墊210上形成有導電凸塊22,且於該作用面21a上形成有該包覆層23以包覆該些導電凸塊22,同時,各該導電凸塊22係外露於該包覆層23。 The electronic element 21 can be an active element, a passive element, a package structure or a combination thereof, and the active element is such as a semiconductor chip, and the passive element is such as a resistor, a capacitor and an inductor. In the present embodiment, the electronic element 21 is a semiconductor chip, and has an opposite active surface 21a and a non-active surface 21b, the active surface 21a has a plurality of electrode pads 210, and conductive electrodes are formed on each of the electrode pads 210. The bumps 22 are formed with the cladding layer 23 on the active surface 21 a to cover the conductive bumps 22 , and at the same time, the conductive bumps 22 are exposed to the cladding layer 23 .

再者,該導電凸塊22係為金屬柱(如銅柱)、焊錫材或其組合,且該包覆層23係為非導電性膜(Non-Conductive Film,簡稱NCF)。 Furthermore, the conductive bumps 22 are metal pillars (such as copper pillars), solder materials or a combination thereof, and the cladding layer 23 is a non-conductive film (NCF for short).

如圖2B所示,沿如圖2A所示之切割路徑L對該整版面基材結構2a進行切單製程,以分離各該電子元件21,再於一承載結構20上沿水平方向X上間隔佈設至少兩個電子元件21,且任二相鄰之該電子元件21之間係形成一空間(間隙)S,該空間(間隙)S之間距t至多為300微米(μm)。 As shown in FIG. 2B , the whole-layout substrate structure 2 a is subjected to a singulation process along the cutting path L shown in FIG. 2A to separate the electronic components 21 , and then spaced along the horizontal direction X on a carrier structure 20 At least two electronic components 21 are arranged, and a space (gap) S is formed between any two adjacent electronic components 21 , and the distance t between the spaces (gap) S is at most 300 micrometers (μm).

該承載結構20可為具有核心層與線路結構之封裝基板(substrate)或無核心層(coreless)之線路構造,且其構成係於介電材上形成複數線路層200,如線路重佈層(redistribution layer,簡稱RDL)。於本實施例中,該承載結構20係無核心層(coreless)之線路構造。然而,於其它實施例中,該承載結構20亦可為具有複數導電矽穿孔(Through-silicon via,簡稱TSV)之半導體基板,以作為矽中介板(Through Silicon interposer,簡稱TSI)。應可理解地,該承載結構20亦可為其它可供承載如晶片等電子元件之承載單元,如導線架(lead frame),但並不限於上述。 The carrier structure 20 can be a package substrate with a core layer and a circuit structure or a circuit structure without a core layer, and the structure is formed by forming a plurality of circuit layers 200 on a dielectric material, such as a circuit redistribution layer ( redistribution layer, referred to as RDL). In this embodiment, the carrier structure 20 is a coreless circuit structure. However, in other embodiments, the carrier structure 20 may also be a semiconductor substrate having a plurality of conductive through-silicon vias (TSVs), which serve as a Through Silicon interposer (TSI). It should be understood that the carrying structure 20 can also be other carrying units capable of carrying electronic components such as chips, such as a lead frame, but is not limited to the above.

再者,當該電子元件21藉其包覆層23壓合黏固於該承載結構20上時,係以覆晶方式使該些導電凸塊22電性連接該承載結構20之線路層200。 Furthermore, when the electronic device 21 is bonded on the carrier structure 20 by means of the cladding layer 23 , the conductive bumps 22 are electrically connected to the circuit layer 200 of the carrier structure 20 in a flip-chip manner.

又,藉由切單製程,該電子元件21之側面21c係齊平該包覆層23之側面23c。然而,於另一實施例中,基於將該電子元件21壓合於該承載結構20上之作用力,可使該包覆層23之側面23c形成為凸出該電子元件21之側面21c的邊緣230,如圖2B’所示。具體地,該包覆層23之邊緣230之剖面係呈凸狀(如半球狀之球面)。 In addition, through the singulation process, the side surface 21c of the electronic device 21 is flush with the side surface 23c of the cladding layer 23 . However, in another embodiment, the side surface 23c of the cladding layer 23 can be formed to protrude from the edge of the side surface 21c of the electronic element 21 based on the force of pressing the electronic element 21 on the carrier structure 20 . 230, as shown in Figure 2B'. Specifically, the cross-section of the edge 230 of the cladding layer 23 is convex (eg, a hemispherical spherical surface).

另外,於本實施例中,該些電子元件21雖均為相同類型(即主動元件),但其內部構造可相同或不相同。 In addition, in this embodiment, although the electronic components 21 are of the same type (ie, active components), their internal structures may be the same or different.

如圖2C所示,形成一封裝層24於該承載結構20上,以包覆該包覆層23與該些電子元件21。 As shown in FIG. 2C , an encapsulation layer 24 is formed on the carrier structure 20 to cover the cladding layer 23 and the electronic components 21 .

該封裝層24可為絕緣材,如聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、環氧樹脂(epoxy)、模封化合物(molding compound)或其它適當材料。於本實施例中,該封裝層24係採用壓合(lamination)或模壓(molding)之方式形成於該承載結構20上,以令該封裝層24填滿該間隙S。 The encapsulation layer 24 can be an insulating material, such as polyimide (PI), dry film, epoxy, molding compound or other suitable materials. In this embodiment, the encapsulation layer 24 is formed on the carrier structure 20 by lamination or molding, so that the encapsulation layer 24 fills the gap S.

再者,該封裝層24之楊氏模數(Young's modulus)係大於該包覆層23之楊氏模數。於本實施例中,該封裝層24之楊氏模數係為20GPa以上。 Furthermore, the Young's modulus of the encapsulation layer 24 is greater than the Young's modulus of the cladding layer 23 . In this embodiment, the Young's modulus of the encapsulation layer 24 is above 20 GPa.

又,可藉由整平製程或薄化製程,使該電子元件21之非作用面21b與該封裝層24之上表面24b共平面,如圖2C’所示,以令該電子元件21之非作用面21b外露於該封裝層24。例如,當形成該封裝層24於該承載結構20上時,該封裝層24係覆蓋該電子元件21之非作用面21b,再以研磨或切割方式移除該封裝層24之部分材質(亦可依需求同時移除該電子元件21之非作用面21b之部分材質),使該電子元件21之非作用面21b齊平於該封裝層24之上表面24b。 In addition, the non-active surface 21b of the electronic element 21 and the upper surface 24b of the encapsulation layer 24 can be made coplanar by a leveling process or a thinning process, as shown in FIG. The active surface 21 b is exposed to the encapsulation layer 24 . For example, when the encapsulation layer 24 is formed on the carrier structure 20, the encapsulation layer 24 covers the inactive surface 21b of the electronic component 21, and then a part of the material of the encapsulation layer 24 is removed by grinding or cutting (or Part of the material of the inactive surface 21b of the electronic component 21 is removed at the same time as required, so that the inactive surface 21b of the electronic component 21 is flush with the top surface 24b of the encapsulation layer 24 .

另外,於形成該封裝層24後,可於該承載結構20之下側(或植球側)上形成複數銲球(圖略),以供該電子封裝件2接置於一如電路板之電子裝置(圖略)上。 In addition, after the encapsulation layer 24 is formed, a plurality of solder balls (not shown) can be formed on the lower side (or the ball-mounting side) of the carrier structure 20 for the electronic package 2 to be mounted on a circuit board such as a circuit board. electronic device (figure omitted).

應可理解地,該些電子元件21亦可為不相同類型的電子元件。如圖3所示之兩電子元件21,31,該電子元件21(主動元件)係為特殊應用積體電路(Application-specific integrated circuit,簡稱ASIC)型半導體晶片,而另一電子元件31係為封裝結構,其包含有封裝材310、控制晶片311及至少一高頻寬記憶體(High Bandwidth Memory,簡稱HBM)型晶片312之封裝模組,並以控制晶片311之電極墊210結合該些導電凸塊22。 It should be understood that the electronic components 21 may also be different types of electronic components. The two electronic components 21 and 31 shown in FIG. 3 , the electronic component 21 (active component) is an Application-specific integrated circuit (ASIC) type semiconductor chip, and the other electronic component 31 is The package structure includes a package material 310 , a control chip 311 and at least one package module of a High Bandwidth Memory (HBM) type chip 312 , and the conductive bumps are combined with the electrode pads 210 of the control chip 311 twenty two.

因此,本發明之製法,主要先於該電子元件21,31上形成該包覆層23,再藉該包覆層23黏固於該承載結構20上,以使該包覆層23不會因毛細作用而爬流至該電子元件21,31之側面21c,31c上,因而不論該間隙S之間距t大小(如小於或等於150微米),該包覆層23於該間隙S中均不會有毛細現象,使該電子元件21,31的內部能避免應力增大之現象,故相較於習知技術,本發明之製法於研磨該封裝層24時,即使外部的研磨作用力傳遞至該電子元件21,31中,該電子元件21,31之內部仍可分散其所受之應力,以避免該電子元件21,31因應力集中而發生破裂之問題,因而能提高該電子封裝件2之可靠度。 Therefore, in the manufacturing method of the present invention, the cladding layer 23 is formed on the electronic components 21 and 31 first, and then the cladding layer 23 is fixed on the bearing structure 20 so that the cladding layer 23 will not be damaged by The capillary action crawls to the side surfaces 21c, 31c of the electronic components 21, 31, so no matter the size of the distance t between the gaps S (for example, less than or equal to 150 microns), the coating layer 23 will not be in the gap S. There is a capillary phenomenon, so that the inside of the electronic components 21 and 31 can avoid the phenomenon of stress increase. Therefore, compared with the prior art, the manufacturing method of the present invention can grind the encapsulation layer 24 even if the external grinding force is transmitted to the Among the electronic components 21 and 31 , the internal stress of the electronic components 21 and 31 can still be dispersed, so as to avoid the problem of cracking of the electronic components 21 and 31 due to the stress concentration, thereby improving the reliability of the electronic package 2 . reliability.

再者,藉由楊氏模數較大之封裝層24填滿該間隙S,能強化該間隙的強度,使該電子元件21,31的內部不會發生應力集中造成封裝件破裂之現象。 Furthermore, the gap S is filled by the package layer 24 with a larger Young's modulus, which can strengthen the strength of the gap, so that the stress concentration inside the electronic components 21 and 31 will not cause the cracking of the package.

本發明復提供一種電子封裝件2,2’,3,係包括:一承載結構20、複數電子元件21,31、以及一封裝層24。 The present invention further provides an electronic package 2 , 2 ′, 3 , which includes: a bearing structure 20 , a plurality of electronic components 21 , 31 , and a package layer 24 .

所述之複數電子元件21,31係間隔設置於該承載結構20上,以令任二相鄰之該電子元件21,31之間形成有一間隙S,各該電子元件21,31係具有複數導電凸塊22及一包覆該複數導電凸塊22之包覆層23,使各該電子元件21,31以該包覆層23黏固於該承載結構20上,且以該導電凸塊22電性連接該承載結構20。 The plurality of electronic components 21, 31 are disposed on the carrier structure 20 at intervals, so that a gap S is formed between any two adjacent electronic components 21, 31, and each of the electronic components 21, 31 has a plurality of conductive The bumps 22 and a cladding layer 23 covering the plurality of conductive bumps 22 , so that the electronic components 21 and 31 are fixed on the carrier structure 20 by the covering layer 23 , and the conductive bumps 22 are used to electrically The carrier structure 20 is sexually connected.

所述之封裝層24係形成於該承載結構20上,以包覆該複數電子元件21,31與包覆層23。 The encapsulation layer 24 is formed on the carrier structure 20 to encapsulate the plurality of electronic components 21 , 31 and the encapsulation layer 23 .

於一實施例中,該複數電子元件21,31之構造係彼此不同。 In one embodiment, the structures of the plurality of electronic components 21, 31 are different from each other.

於一實施例中,該間隙S之間距t係至多為300微米。 In one embodiment, the distance t between the gaps S is at most 300 microns.

於一實施例中,該電子元件21,31之表面(如非作用面)係外露於該封裝層24之表面上24b。 In one embodiment, the surfaces (eg, inactive surfaces) of the electronic components 21 and 31 are exposed on the surface 24 b of the encapsulation layer 24 .

於一實施例中,該包覆層23之側面23c係齊平該電子元件21,31之側面21c,31c。 In one embodiment, the side surface 23c of the cladding layer 23 is flush with the side surfaces 21c and 31c of the electronic components 21 and 31 .

於一實施例中,該包覆層23係凸出該電子元件21,31之側面21c,31c,且該包覆層23未接觸該電子元件21,31之側面21c,31c。例如,該包覆層23以其邊緣230凸出該電子元件21之側面21c,且該包覆層23之邊緣230之剖面係呈球面。 In one embodiment, the cladding layer 23 protrudes from the side surfaces 21c and 31c of the electronic components 21 and 31 , and the cladding layer 23 does not contact the side surfaces 21c and 31c of the electronic components 21 and 31 . For example, the edge 230 of the cladding layer 23 protrudes from the side surface 21c of the electronic device 21 , and the cross-section of the edge 230 of the cladding layer 23 is spherical.

於一實施例中,該包覆層23係為非導電性膜。 In one embodiment, the cladding layer 23 is a non-conductive film.

於一實施例中,該封裝層24之楊氏模數係至少為20GPa。 In one embodiment, the Young's modulus of the encapsulation layer 24 is at least 20 GPa.

於一實施例中,該封裝層24之楊氏模數係大於該包覆層23之楊氏模數。 In one embodiment, the Young's modulus of the encapsulation layer 24 is greater than the Young's modulus of the cladding layer 23 .

綜上所述,本發明之電子封裝件及其製法,係藉由該電子元件上佈設該包覆層,以黏固於該承載結構上,使該包覆層不會擠壓至該電子元件之側面上,故本發明之電子元件之內部能避免因應力集中而發生破裂之問題,因而能提高該電子封裝件之可靠度。另外,封裝層24填滿該間隙S,能強化該間隙的強度,使該電子元件的內部不會應力集中造成封裝件破裂。 To sum up, the electronic package of the present invention and the manufacturing method thereof are arranged on the electronic component by disposing the coating layer to be fixed on the supporting structure, so that the coating layer will not be pressed against the electronic component On the lateral side, the internal part of the electronic component of the present invention can avoid the problem of cracking due to stress concentration, thereby improving the reliability of the electronic package. In addition, the encapsulation layer 24 fills the gap S, which can strengthen the strength of the gap, so that the internal stress concentration of the electronic component will not cause the package to break.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to illustrate the principles and effects of the present invention, but not to limit the present invention. Any person skilled in the art can make modifications to the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the right of the present invention should be listed in the scope of the patent application described later.

2:電子封裝件 2: Electronic packages

20:承載結構 20: Bearing structure

21:電子元件 21: Electronic Components

22:導電凸塊 22: Conductive bumps

23:包覆層 23: Cladding

24:封裝層 24: Encapsulation layer

S:間隙 S: Clearance

Claims (12)

一種電子封裝件,係包括:承載結構;複數電子元件,係間隔設置於該承載結構上,以令任二相鄰之該電子元件之間形成有一間隙,其中,各該電子元件上係形成有複數導電凸塊及一包覆該複數導電凸塊之包覆層,該包覆層係為非導電性膜(Non-Conductive Film,簡稱NCF),使各該電子元件以該包覆層黏固於該承載結構後,藉該導電凸塊電性連接該承載結構,且該包覆層以其端部凸出該電子元件之側面,該包覆層之邊緣之剖面係呈球面,以使該包覆層不會因毛細作用而爬流至該電子元件之側面上,該包覆層未接觸該電子元件之側面;以及封裝層,係形成於該承載結構上,以包覆該複數電子元件與包覆層。 An electronic package includes: a bearing structure; a plurality of electronic components are arranged on the bearing structure at intervals, so that a gap is formed between any two adjacent electronic components, wherein each of the electronic components is formed with a A plurality of conductive bumps and a cladding layer covering the plurality of conductive bumps, the cladding layer is a non-conductive film (Non-Conductive Film, referred to as NCF), so that the electronic components are fixed by the cladding layer After the carrying structure, the carrying structure is electrically connected by the conductive bump, and the end of the cladding layer protrudes from the side surface of the electronic component, and the cross-section of the edge of the cladding layer is spherical, so that the The cladding layer will not crawl to the side of the electronic element due to capillary action, and the cladding layer does not contact the side of the electronic element; and the encapsulation layer is formed on the carrier structure to cover the plurality of electronic elements with cladding. 如請求項1所述之電子封裝件,其中,該複數電子元件之構造係彼此不同。 The electronic package of claim 1, wherein the structures of the plurality of electronic components are different from each other. 如請求項1所述之電子封裝件,其中,該間隙之間距係至多為300微米。 The electronic package of claim 1, wherein the distance between the gaps is at most 300 microns. 如請求項1所述之電子封裝件,其中,該電子元件之一表面係外露於該封裝層之一表面。 The electronic package as claimed in claim 1, wherein a surface of the electronic component is exposed on a surface of the packaging layer. 如請求項1所述之電子封裝件,其中,該封裝層之楊氏模數係至少為20GPa。 The electronic package of claim 1, wherein the Young's modulus of the package layer is at least 20GPa. 如請求項1所述之電子封裝件,其中,該封裝層之楊氏模數係大於該包覆層之楊氏模數。 The electronic package of claim 1, wherein the Young's modulus of the encapsulation layer is greater than the Young's modulus of the cladding layer. 一種電子封裝件之製法,係包括: 提供複數電子元件,其中,各該電子元件上形成有複數導電凸塊及一包覆該複數導電凸塊之包覆層,該包覆層係為非導電性膜;將複數電子元件間隔設置於一承載結構上,以令任二相鄰之該電子元件之間形成有一間隙,其中,各該電子元件係以該包覆層黏固於該承載結構上,並以該導電凸塊電性連接該承載結構,且該包覆層以其端部凸出該電子元件之側面,該包覆層之邊緣之剖面係呈球面,該包覆層未接觸該電子元件之側面;以及形成封裝層於該承載結構上,以包覆該複數電子元件與包覆層。 A manufacturing method of an electronic package, comprising: A plurality of electronic components are provided, wherein a plurality of conductive bumps and a coating layer covering the plurality of conductive bumps are formed on each of the electronic components, and the coating layer is a non-conductive film; the plurality of electronic components are arranged at intervals on the On a carrier structure, a gap is formed between any two adjacent electronic components, wherein each of the electronic components is fixed on the carrier structure with the cladding layer, and is electrically connected with the conductive bumps the carrying structure, the end of the cladding layer protrudes from the side of the electronic component, the cross-section of the edge of the cladding layer is spherical, the cladding layer does not contact the side of the electronic component; and the encapsulation layer is formed on On the carrying structure, the plurality of electronic components and the cladding layer are covered. 如請求項7所述之電子封裝件之製法,其中,該複數電子元件之構造係彼此不同。 The manufacturing method of an electronic package as claimed in claim 7, wherein the structures of the plurality of electronic components are different from each other. 如請求項7所述之電子封裝件之製法,其中,該間隙之間距係至多為300微米。 The method for manufacturing an electronic package as claimed in claim 7, wherein the distance between the gaps is at most 300 microns. 如請求項7所述之電子封裝件之製法,復包括對該封裝層進行研磨,以令該電子元件之一表面外露於該封裝層之一表面。 The method for manufacturing an electronic package as claimed in claim 7 further comprises grinding the package layer, so that a surface of the electronic component is exposed on a surface of the package layer. 如請求項7所述之電子封裝件之製法,其中,該封裝層之楊氏模數係至少為20GPa。 The manufacturing method of an electronic package as claimed in claim 7, wherein the Young's modulus of the package layer is at least 20GPa. 如請求項7所述之電子封裝件之製法,其中,該封裝層之楊氏模數係大於該包覆層之楊氏模數。 The method for manufacturing an electronic package as claimed in claim 7, wherein the Young's modulus of the encapsulation layer is greater than the Young's modulus of the cladding layer.
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