TWI615926B - Electronic package and method for fabricating the same - Google Patents

Electronic package and method for fabricating the same Download PDF

Info

Publication number
TWI615926B
TWI615926B TW106128425A TW106128425A TWI615926B TW I615926 B TWI615926 B TW I615926B TW 106128425 A TW106128425 A TW 106128425A TW 106128425 A TW106128425 A TW 106128425A TW I615926 B TWI615926 B TW I615926B
Authority
TW
Taiwan
Prior art keywords
interposer
electronic
electronic component
electronic package
package
Prior art date
Application number
TW106128425A
Other languages
Chinese (zh)
Other versions
TW201913902A (en
Inventor
賴杰隆
彭仕良
葉懋華
陳仕卿
Original Assignee
矽品精密工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 矽品精密工業股份有限公司 filed Critical 矽品精密工業股份有限公司
Priority to TW106128425A priority Critical patent/TWI615926B/en
Priority to CN201710950592.7A priority patent/CN109427699A/en
Application granted granted Critical
Publication of TWI615926B publication Critical patent/TWI615926B/en
Publication of TW201913902A publication Critical patent/TW201913902A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip

Abstract

一種電子封裝件及其製法,係於中介板上設有電子元件與補充件,並以封裝層包覆該電子元件與補充件,以藉由該補充件設於該中介板上而減少該封裝層之使用量,進而降低該中介板發生翹曲機率。 An electronic package and a method for manufacturing the same, wherein an electronic component and a supplementary component are disposed on an interposer, and the electronic component and the supplementary component are covered by an encapsulation layer to reduce the package by the supplemental component being disposed on the interposer The amount of layer used, which in turn reduces the chance of warping of the interposer.

Description

電子封裝件及其製法 Electronic package and its manufacturing method

本發明係有關一種半導體製程,尤指一種電子封裝件及其製法。 The present invention relates to a semiconductor process, and more particularly to an electronic package and a method of fabricating the same.

目前應用於晶片封裝領域之技術繁多,例如晶片尺寸構裝(Chip Scale Package,簡稱CSP)、晶片直接貼附封裝(Direct Chip Attached,簡稱DCA)或多晶片模組封裝(Multi-Chip Module,簡稱MCM)等覆晶型態的封裝模組、或將晶片立體堆疊化整合為三維積體電路(3D IC)晶片堆疊技術等。 At present, there are many technologies applied in the field of chip packaging, such as Chip Scale Package (CSP), Direct Chip Attached (DCA) or Multi-Chip Module (referred to as Multi-Chip Module). MCM) and other flip-chip package modules, or three-dimensional stacking of wafers into a three-dimensional integrated circuit (3D IC) wafer stacking technology.

第1圖係為習知3D IC晶片堆疊之半導體封裝件1之剖面示意圖。如第1圖所示,該半導體封裝件1之製法係先提供一矽中介板(Through Silicon interposer,簡稱TSI)10,該矽中介板10具有具有相對之置晶側10b與轉接側10a及連通該置晶側10b與轉接側10a之複數導電矽穿孔(Through-silicon via,簡稱TSV)100,且該置晶側10b上具有一電性連接該些導電矽穿孔100之線路重佈層(Redistribution laver,簡稱RDL)101;接著,將一半導 體晶片11以其間距較小之電極墊110藉由複數銲錫凸塊111電性結合至該線路重佈層101上,並於該半導體晶片11與該矽中介板10之間填充底膠(underfill)12以包覆該些銲錫凸塊111,再形成一封裝膠體13於該矽中介板10上以包覆該半導體晶片11與底膠12,以形成一封裝結構1a;之後,將一封裝基板14以其間距較大之銲墊140藉由複數如銲料凸塊或銅柱之導電元件15電性結合於該封裝結構1a之導電矽穿孔100上,並於該矽中介板10與該封裝基板14之間填充另一底膠12’以包覆該些導電元件15;最後,於該封裝基板14底側接置複數銲球16以外接一電路板(圖略)。 1 is a schematic cross-sectional view of a semiconductor package 1 of a conventional 3D IC wafer stack. As shown in FIG. 1, the semiconductor package 1 is first provided with a through silicon interposer (TSI) 10 having an opposite crystal side 10b and a transfer side 10a. A plurality of conductive-silicon vias (TSVs) 100 are connected to the crystallized side 10b and the transfer side 10a, and the crystallized side 10b has a circuit redistribution layer electrically connected to the conductive vias 100. (Redistribution laver, referred to as RDL) 101; then, will be half-guided The body wafer 11 is electrically bonded to the circuit redistribution layer 101 by a plurality of solder bumps 111 with a small pitch of the electrode pads 110, and an underfill is filled between the semiconductor wafer 11 and the germanium interposer 10. 12 to cover the solder bumps 111, and then form an encapsulant 13 on the germanium interposer 10 to cover the semiconductor wafer 11 and the underfill 12 to form a package structure 1a; thereafter, a package substrate The conductive pad 15 having a relatively large pitch is electrically coupled to the conductive via hole 100 of the package structure 1a by a plurality of conductive members 15 such as solder bumps or copper pillars, and the germane interposer 10 and the package substrate A further adhesive 12' is filled between the 14 to cover the conductive elements 15; finally, a plurality of solder balls 16 are connected to the bottom side of the package substrate 14 to be connected to a circuit board (not shown).

惟,習知半導體封裝件1於製作過程中,該矽中介板10之置晶側10b上僅設置該半導體晶片11,如第1’圖所示,且該半導體晶片11未填滿於置晶側10b之全部面積,故當形成該封裝膠體13時,該矽中介板10之長邊與短邊的封裝膠體13分配不均,且由於該矽中介板10與該封裝膠體13熱膨脹係數(Coefficient of thermal expansion,簡稱CTE)之差異過大,即不匹配(mismatch),致使熱循環(thermal cycle)時(如熱固化該封裝膠體13),該封裝結構1a之邊緣會產生嚴重翹曲(warpage),導致位於該封裝結構1a邊緣處之導電元件15之間會發生橋接,因而造成短路,進而造成組裝良率下降與可靠度品質降低的問題。 However, in the fabrication process of the conventional semiconductor package 1, only the semiconductor wafer 11 is disposed on the crystallizing side 10b of the germanium interposer 10, as shown in FIG. 1 and the semiconductor wafer 11 is not filled with the crystal. The entire area of the side 10b is such that when the encapsulant 13 is formed, the long side and the short side encapsulant 13 of the interposer 10 are unevenly distributed, and the coefficient of thermal expansion of the interposer 10 and the encapsulant 13 (Coefficient) The difference in thermal expansion (CTE) is too large, that is, mismatch, causing severe warpage at the edge of the package structure 1a during thermal cycle (such as thermal curing of the encapsulant 13). As a result, bridging occurs between the conductive elements 15 located at the edge of the package structure 1a, thereby causing a short circuit, which in turn causes a problem of a decrease in assembly yield and a decrease in reliability quality.

因此,如何克服上述習知技術的問題,實已成目前亟欲解決的問題。 Therefore, how to overcome the problems of the above-mentioned prior art has become a problem that is currently being solved.

鑑於上述習知技術之種種缺失,本發明係提供一種電子封裝件,係包括:中介板,係具有相對之第一側與第二側;電子元件,係設於該中介板之第二側上並電性連接該中介板;補充件,係設於該中介板之第二側上且未電性連接該中介板;以及封裝層,係形成於該中介板之第二側上且包覆該電子元件與補充件。 In view of the above-mentioned various deficiencies of the prior art, the present invention provides an electronic package comprising: an interposer having opposite first and second sides; and an electronic component disposed on the second side of the interposer And electrically connecting the interposer; the replenishing member is disposed on the second side of the interposer and is not electrically connected to the interposer; and the encapsulation layer is formed on the second side of the interposer and is covered Electronic components and supplements.

本發明復提供一種電子封裝件,係包括:中介板,係於一表面定義有置晶區及相對之閒置區;電子元件,係設於該置晶區中並電性連接該中介板;補充件,係設於該閒置區中且未電性連接該中介板;封裝層,係形成於該中介板上且包覆該電子元件與補充件。 The present invention further provides an electronic package comprising: an interposer having a crystallographic region defined thereon and an opposite idle region; an electronic component disposed in the crystallographic region and electrically connected to the interposer; The component is disposed in the idle area and is not electrically connected to the interposer; the encapsulation layer is formed on the interposer and covers the electronic component and the supplement.

本發明亦提供一種電子封裝件之製法,係包括:提供一中介板,係具有相對之第一側與第二側;設置至少一電子元件與至少一補充件於該中介板之第二側上,其中,該電子元件電性連接該中介板,而該補充件未電性連接該中介板;以及形成封裝層於該中介板之第二側上以包覆該電子元件與補充件。 The invention also provides a method for manufacturing an electronic package, comprising: providing an interposer having opposite first and second sides; and disposing at least one electronic component and at least one complementary component on the second side of the interposer The electronic component is electrically connected to the interposer, and the replenishing member is not electrically connected to the interposer; and an encapsulation layer is formed on the second side of the interposer to cover the electronic component and the supplement.

前述之電子封裝件及其製法中,復包括將一封裝基板設於該中介板之第一側上,並使該封裝基板電性連接該中介板。 In the above electronic package and method of manufacturing the same, the package substrate is disposed on the first side of the interposer, and the package substrate is electrically connected to the interposer.

前述之電子封裝件及其製法中,該電子元件及該補充件所占區域的外圍之各側,其與該中介板邊緣之距離係大致相等。 In the above electronic package and method of manufacturing the same, the sides of the periphery of the area occupied by the electronic component and the supplement are substantially equal to the distance from the edge of the interposer.

前述之電子封裝件及其製法中,該中介板中形成有複數導電穿孔,且該中介板上形成有電性連接該導電穿孔之線路重佈結構。 In the above electronic package and method of manufacturing the same, a plurality of conductive vias are formed in the interposer, and a line redistribution structure electrically connecting the conductive vias is formed on the interposer.

前述之電子封裝件及其製法中,形成該補充件之材質係為半導體材。 In the above electronic package and the method of manufacturing the same, the material forming the supplement is a semiconductor material.

前述之電子封裝件及其製法中,該電子元件之上表面與該補充件之上表面外露出該封裝層。 In the above electronic package and method of manufacturing the same, the upper surface of the electronic component and the upper surface of the complementary component expose the encapsulation layer.

前述之電子封裝件及其製法中,形成該補充件之材質之熱膨脹係數為2至5。 In the above electronic package and the method of manufacturing the same, the material forming the supplement has a thermal expansion coefficient of 2 to 5.

由上可知,本發明之電子封裝件及其製法,係藉由設置補充件於中介板上之閒置區,以減少封裝層的使用量,進而降低該中介板發生翹曲的機率,避免良率過低及產品可靠度不佳等問題。 It can be seen from the above that the electronic package of the present invention and the method for manufacturing the same are provided by adding a supplement to the idle area on the interposer to reduce the amount of use of the encapsulation layer, thereby reducing the probability of warpage of the interposer and avoiding the yield. Low quality and poor product reliability.

1‧‧‧半導體封裝件 1‧‧‧Semiconductor package

1a‧‧‧封裝結構 1a‧‧‧Package structure

10‧‧‧矽中介板 10‧‧‧矽Intermediary board

10a‧‧‧轉接側 10a‧‧‧Transfer side

10b‧‧‧置晶側 10b‧‧‧The crystal side

100‧‧‧導電矽穿孔 100‧‧‧ Conductive piercing

101‧‧‧線路重佈層 101‧‧‧Line redistribution

11‧‧‧半導體晶片 11‧‧‧Semiconductor wafer

110,210‧‧‧電極墊 110,210‧‧‧electrode pads

111‧‧‧銲錫凸塊 111‧‧‧ solder bumps

12,12’,22,22’‧‧‧底膠 12,12’,22,22’‧‧‧Bottom

13‧‧‧封裝膠體 13‧‧‧Package colloid

14,24‧‧‧封裝基板 14,24‧‧‧Package substrate

140,240‧‧‧銲墊 140,240‧‧‧ solder pads

15,25‧‧‧導電元件 15,25‧‧‧ conductive elements

16,26‧‧‧銲球 16,26‧‧‧ solder balls

2‧‧‧電子封裝件 2‧‧‧Electronic package

20‧‧‧中介板 20‧‧‧Intermediary board

20a‧‧‧第一側 20a‧‧‧ first side

20b‧‧‧第二側 20b‧‧‧ second side

200‧‧‧導電穿孔 200‧‧‧Electrical perforation

201‧‧‧線路重佈結構 201‧‧‧Line redistribution structure

201a‧‧‧線路層 201a‧‧‧Line layer

201b‧‧‧介電層 201b‧‧‧ dielectric layer

21‧‧‧電子元件 21‧‧‧Electronic components

21a‧‧‧作用面 21a‧‧‧Action surface

21b‧‧‧非作用面 21b‧‧‧Non-active surface

211‧‧‧導電凸塊 211‧‧‧Electrical bumps

23‧‧‧封裝層 23‧‧‧Encapsulation layer

241‧‧‧植球墊 241‧‧‧Ball mat

27‧‧‧補充件 27‧‧‧Replenishment

A‧‧‧置晶區 A‧‧‧ crystal zone

B‧‧‧閒置區 B‧‧‧ vacant area

C‧‧‧外圍 C‧‧‧ periphery

d‧‧‧距離 D‧‧‧distance

第1圖係為習知半導體封裝件之剖面示意圖;第1’圖係為第1圖之局部上視示意圖;第2A至2D圖係本發明之電子元件之製法的剖面示意圖;以及第2B’及2B”圖係為第2B圖之不同態樣之局部上視示意圖。 1 is a schematic cross-sectional view of a conventional semiconductor package; FIG. 1A is a partial top view of FIG. 1; FIGS. 2A to 2D are schematic cross-sectional views showing a method of manufacturing an electronic component of the present invention; and 2B' And the 2B" diagram is a partial top view of the different aspects of Figure 2B.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上”、“第一”、“第二”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "upper", "first", "second" and "one" are used in the description, and are not intended to limit the scope of the invention. Changes or adjustments in the relative relationship are considered to be within the scope of the present invention.

第2A至2D圖係為本發明之電子封裝件2之製法之剖面示意圖。 2A to 2D are schematic cross-sectional views showing the manufacturing method of the electronic package 2 of the present invention.

如第2A圖所示,提供一中介板20,該中介板20定義有相對之第一側20a與第二側20b,且該中介板20中具有複數連通該第一與第二側20a,20b(即貫穿該中介板20)之導電穿孔200。 As shown in FIG. 2A, an interposer 20 is defined. The interposer 20 defines an opposite first side 20a and a second side 20b, and the interposer 20 has a plurality of first and second sides 20a, 20b. (ie, through the interposer 20) conductive vias 200.

於本實施例中,該中介板20係為含矽之板體,例如,矽中介板(Through Silicon Interposer,簡稱TSI)或玻璃基板,且該導電穿孔200係為導電矽穿孔(Through-silicon via,簡稱TSV),其中,該導電穿孔200係為銅柱及環繞該銅柱之絕緣材所構成,但有關該導電穿孔200之製作方式繁多,並無特別限制,故於此不再贅述。 In this embodiment, the interposer 20 is a ruthenium-containing plate, such as a Twisted Silicon Interposer (TSI) or a glass substrate, and the conductive via 200 is a through-silicon via. The conductive via 200 is a copper pillar and an insulating material surrounding the copper pillar. However, the conductive via 200 is manufactured in a variety of manners and is not particularly limited, and thus will not be described herein.

再者,該導電穿孔200之兩端面係分別齊平該中介板 20之第一側20a與第二側20b。 Furthermore, the two ends of the conductive via 200 are flushed with the interposer respectively The first side 20a and the second side 20b of 20.

又,可選擇性地於該中介板20之第二側20b上進行線路重佈層(Redistribution layer,簡稱RDL)製程,以形成一線路重佈結構201,且該線路重佈結構201電性連接各該導電穿孔200。具體地,該線路重佈結構201係包含相疊之至少一介電層201b與至少一線路層201a,且該線路層201a電性連接該導電穿孔200。 Moreover, a circuit redistribution layer (RDL) process may be selectively performed on the second side 20b of the interposer 20 to form a line redistribution structure 201, and the circuit redistribution structure 201 is electrically connected. Each of the conductive vias 200. Specifically, the circuit redistribution structure 201 includes at least one dielectric layer 201b and at least one circuit layer 201a stacked, and the circuit layer 201a is electrically connected to the conductive via 200.

另外,亦可選擇性地於該中介板20之第一側20a上形成複數導電元件25。具體地,該導電元件25係為導電凸塊。例如,該導電凸塊包含有金屬柱(如銅柱)及/或銲錫材料,且於該導電凸塊與該中介板20間可形成凸塊底下金屬層(Under Bump Metallurgy,簡稱UBM),其中該凸塊底下金屬層之構造與材質係因種類繁多且無特別限制,因而不再贅述。 Alternatively, a plurality of conductive elements 25 may be selectively formed on the first side 20a of the interposer 20. Specifically, the conductive element 25 is a conductive bump. For example, the conductive bump includes a metal pillar (such as a copper pillar) and/or a solder material, and an under bump metallurgy (UBM) can be formed between the conductive bump and the interposer 20, wherein The structure and material of the metal layer under the bump are various and are not particularly limited, and thus will not be described again.

如第2B及2B’圖所示,設置至少一電子元件21與至少一補充件27於該中介板20之第二側20b上,其中,該電子元件21電性連接該中介板20之導電穿孔200,而該補充件27未電性連接該中介板20。亦即,於置放該電子元件21時,同時置放該補充件27於電子元件21的周圍,以減少後續封裝材的使用量。 As shown in FIG. 2B and FIG. 2B, at least one electronic component 21 and at least one complementary component 27 are disposed on the second side 20b of the interposer 20, wherein the electronic component 21 is electrically connected to the conductive via of the interposer 20. 200, and the supplement 27 is not electrically connected to the interposer 20. That is, when the electronic component 21 is placed, the supplement 27 is placed around the electronic component 21 to reduce the amount of use of the subsequent package.

於本實施例中,該電子元件21係為主動元件、被動元件或其二者組合等,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容及電感。例如,該電子元件21係具有相對之作用面21a與非作用面21b,且該作用 面21a具有複數電極墊210,使該些電極墊210藉由複數如銲錫材料之導電凸塊211以覆晶方式設於該線路重佈結構201上並電性連接該線路層201a,再以底膠22包覆該些導電凸塊211。 In this embodiment, the electronic component 21 is an active component, a passive component, or a combination thereof. The active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 21 has an opposing active surface 21a and an inactive surface 21b, and the effect The surface 21a has a plurality of electrode pads 210, and the electrode pads 210 are provided on the circuit redistribution structure 201 by a plurality of conductive bumps 211 such as solder materials, and are electrically connected to the circuit layer 201a. The glue 22 covers the conductive bumps 211.

再者,如第2B’圖所示,該中介板20之第二側20b之表面定義有相對之置晶區A與閒置區B,其中,該電子元件21係位於該置晶區A,而該補充件27係位於該閒置區B,以令該電子元件21及該補充件27所占區域的外圍C之各側,其與該中介板20邊緣之距離d係相近(約相等)。 Furthermore, as shown in FIG. 2B', the surface of the second side 20b of the interposer 20 is defined with a relative crystal zone A and an idle zone B, wherein the electronic component 21 is located in the crystal zone A, and The replenishing member 27 is located in the idle area B such that the sides of the periphery C of the area occupied by the electronic component 21 and the replenishing member 27 are close to each other (about equal) to the edge d of the interposer 20.

又,該補充件27之結構特性為不易變形(即不可變形性或高強度),且其熱膨脹係數(CTE)或楊氏模數(Young's modulus)需接近該電子元件21(或矽材)之熱膨脹係數或楊氏模數,其中,矽材之熱膨脹係數為2.5(於10-6/K 20℃之條件下),故形成該補充件27之材質之熱膨脹係數為2至5(於10-6/K20℃之條件下),其可為半導體材,例如,該補充件27可為矽塊(dummy silicon)、玻璃塊、假晶片(Dummy Die)或以置晶膜(Die Attach Film,簡稱DAF)黏貼之晶片等構造。 Moreover, the structural feature of the supplement 27 is not easily deformed (ie, non-deformable or high-strength), and its coefficient of thermal expansion (CTE) or Young's modulus needs to be close to the electronic component 21 (or coffin). The coefficient of thermal expansion or Young's modulus, wherein the thermal expansion coefficient of the coffin is 2.5 (at 10 -6 /K 20 ° C), so the material forming the supplement 27 has a thermal expansion coefficient of 2 to 5 (at 10 - 6 / K 20 ° C), which may be a semiconductor material, for example, the supplement 27 may be a dummy silicon, a glass block, a dummy wafer or a die attach film (Die Attach Film, referred to as DAF) Structure of the attached wafer.

另外,該補充件27的數量、外形及其與電子元件21的相對位置係可依需求設計,例如該補充件27設於該電子元件21之至少任兩側之位置或第2B”圖所示之補充件27設於該電子元件21之其中一側之位置,且其形狀為第2B’或2B”圖所示之分離線狀或類I字形、或未圖示之環狀、連續線狀或類L形等,故該補充件27之構造種類繁多, 並不限於上述。 In addition, the number, shape, and relative position of the replenishing member 27 can be designed according to requirements. For example, the replenishing member 27 is disposed at at least two sides of the electronic component 21 or as shown in FIG. 2B. The replenishing member 27 is provided at one of the positions of the electronic component 21, and has a shape of a line shape or an I-like shape as shown in the second B' or 2B", or a ring-shaped, continuous line shape not shown. Or L-shaped, etc., so the structure of the supplement 27 is various. It is not limited to the above.

如第2C圖所示,形成一封裝層23於該中介板20之第二側20b之線路重佈結構201上,使該封裝層23包覆該電子元件21、底膠22與補充件27,以形成一電子封裝件2。 As shown in FIG. 2C, an encapsulation layer 23 is formed on the circuit redistribution structure 201 of the second side 20b of the interposer 20, so that the encapsulation layer 23 covers the electronic component 21, the primer 22 and the replenishing member 27, To form an electronic package 2.

於本實施例中,形成該封裝層23之材質係為聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、環氧樹脂(epoxy)或封裝材。 In this embodiment, the material of the encapsulation layer 23 is made of polyimide, PI, dry film, epoxy or packaging material.

再者,該電子元件21之非作用面21b係外露於該封裝層23,例如,該電子元件21之非作用面21b齊平該封裝層23之上表面。 Furthermore, the non-active surface 21b of the electronic component 21 is exposed to the encapsulation layer 23. For example, the non-active surface 21b of the electronic component 21 is flush with the upper surface of the encapsulation layer 23.

又,該補充件27亦可外露於該封裝層23,例如,該補充件27之上表面齊平該封裝層23之上表面。該補充件27之高度(或厚度)可與該電子元件21之高度(或厚度)約略相同。 Moreover, the replenishing member 27 can also be exposed to the encapsulating layer 23, for example, the upper surface of the replenishing member 27 is flush with the upper surface of the encapsulating layer 23. The height (or thickness) of the supplement 27 may be approximately the same as the height (or thickness) of the electronic component 21.

如第2D圖所示,將一封裝基板24設於該中介板20之第一側20a上,並使該封裝基板24電性連接該中介板20之導電穿孔200。 As shown in FIG. 2D, a package substrate 24 is disposed on the first side 20a of the interposer 20, and the package substrate 24 is electrically connected to the conductive vias 200 of the interposer 20.

於本實施例中,該封裝基板24以其銲墊240藉由導電元件25電性連接該該中介板20之導電穿孔200,並於該中介板20與該封裝基板24之間形成另一底膠22’以包覆該些導電元件25。 In this embodiment, the package substrate 24 is electrically connected to the conductive vias 200 of the interposer 20 via the conductive pads 25, and forms another bottom between the interposer 20 and the package substrate 24. The glue 22' covers the conductive elements 25.

再者,於該封裝基板24底側之植球墊241上接置複數銲球26以外接一如電路板之電子裝置(圖略)。 Furthermore, a plurality of solder balls 26 are connected to the ball pad 241 on the bottom side of the package substrate 24 to connect an electronic device such as a circuit board (not shown).

本發明之電子封裝件2之製法主要藉由形成該封裝層 23之前,先設置CTE近似該電子元件21(或矽晶片材)的補充件27,以令該補充件27位於該中介板上未為該電子元件21所占區域,且令該電子元件21及該補充件27所占區域的外圍C間隔該中介板20周圍之距離d相近,藉以減少該封裝層23的使用量,以降低發生翹曲的機率。 The electronic package 2 of the present invention is mainly formed by forming the encapsulation layer Before 23, a CTE is added to append the complementary component 27 of the electronic component 21 (or the germanium wafer) so that the supplemental component 27 is located on the interposer and is not occupied by the electronic component 21, and the electronic component 21 and The periphery C of the area occupied by the replenishing member 27 is spaced apart by a distance d around the interposer 20, thereby reducing the amount of use of the encapsulating layer 23 to reduce the probability of occurrence of warpage.

換言之,藉由該補充件27抑制該封裝層23與該電子元件21之間因CTE不匹配所造成的翹曲,亦即該封裝層23內之應力可分散至該補充件27,以改善該中介板20之翹曲程度,且可針對不同的電子封裝件2,調整該補充件27的尺寸或排列方式以最佳化翹曲數值。 In other words, the warpage caused by the CTE mismatch between the encapsulating layer 23 and the electronic component 21 is suppressed by the replenishing member 27, that is, the stress in the encapsulating layer 23 can be dispersed to the replenishing member 27 to improve the The degree of warpage of the interposer 20, and the size or arrangement of the refill 27 can be adjusted for different electronic packages 2 to optimize the warpage value.

因此,相較於習知技術,本發明之製法能降低該電子封裝件2發生翹曲機率,因而能避免位於邊緣處之導電元件25之間發生橋接而所造成之短路問題,亦或邊緣處之導電元件25無法與外部連接之問題,進而避免組裝良率下降與可靠度品質降低的問題。 Therefore, compared with the prior art, the method of the present invention can reduce the probability of warpage of the electronic package 2, thereby avoiding the short circuit problem caused by bridging between the conductive members 25 at the edges, or at the edges. The problem that the conductive member 25 cannot be connected to the outside can avoid the problem of a decrease in the assembly yield and a decrease in the reliability quality.

本發明復提供一種電子封裝件2,係包括:一封裝基板24、一中介板20、至少一電子元件21、至少一補充件27以及封裝層23。 The present invention further provides an electronic package 2 comprising: a package substrate 24, an interposer 20, at least one electronic component 21, at least one supplement 27, and an encapsulation layer 23.

所述之中介板20係具有相對之第一側20a與第二側20b、及複數連通該第一側20a與第二側20b之導電穿孔200,其中,該中介板20以其第一側20a設於該封裝基板24上,且該封裝基板24電性連接該導電穿孔200。 The interposer 20 has a first side 20a and a second side 20b opposite to each other, and a plurality of conductive vias 200 communicating with the first side 20a and the second side 20b, wherein the interposer 20 has its first side 20a The package substrate 24 is electrically connected to the conductive via 200.

所述之電子元件21係設於該中介板20之第二側20b上並電性連接該導電穿孔200。 The electronic component 21 is disposed on the second side 20b of the interposer 20 and electrically connected to the conductive via 200.

所述之補充件27係設於該中介板20之第二側20b上且未電性連接該中介板20。 The replenishing member 27 is disposed on the second side 20b of the interposer 20 and is not electrically connected to the interposer 20 .

所述之封裝層23係形成於該中介板20之第二側20b上且包覆該電子元件21與補充件27,以藉由該補充件27設於該第二側20b上而減少該封裝層23之體積,因而降低中介板20發生翹曲機率。 The encapsulation layer 23 is formed on the second side 20b of the interposer 20 and covers the electronic component 21 and the replenishing member 27 to reduce the package by the replenishing member 27 being disposed on the second side 20b. The volume of layer 23 thus reduces the chance of warping of interposer 20.

於一實施例中,該中介板20係為含矽之板體。 In one embodiment, the interposer 20 is a slab containing enamel.

於一實施例中,該中介板20之第二側20b係定義有一置晶區A與閒置區B,且該電子元件21係位於該置晶區A,而該補充件27係位於該閒置區B。 In an embodiment, the second side 20b of the interposer 20 defines a crystal zone A and an idle zone B, and the electronic component 21 is located in the crystal zone A, and the supplement 27 is located in the idle zone. B.

於一實施例中,該中介板20之第二側20b上形成有電性連接該導電穿孔200之線路重佈結構201,以令該電子元件21結合於該線路重佈結構201上並電性連接該線路重佈結構201,且該線路重佈結構201未電性連接該補充件27。 In an embodiment, the second side 20b of the interposer 20 is formed with a circuit redistribution structure 201 electrically connected to the conductive via 200, so that the electronic component 21 is bonded to the circuit redistribution structure 201 and electrically The line redistribution structure 201 is connected, and the line redistribution structure 201 is not electrically connected to the supplemental member 27.

於一實施例中,形成該補充件27之材質係為半導體材。 In one embodiment, the material forming the supplement 27 is a semiconductor material.

綜上所述,本發明之電子封裝件及其製法,係藉由該補充件之設計,以減少該封裝層的使用量,因而降低該中介板發生翹曲機率,故能提升產品良率及可靠度。 In summary, the electronic package of the present invention and the method for manufacturing the same are designed to reduce the amount of use of the package layer, thereby reducing the probability of warping of the interposer, thereby improving product yield and Reliability.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範 圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as follows. Listed around.

2‧‧‧電子封裝件 2‧‧‧Electronic package

20‧‧‧中介板 20‧‧‧Intermediary board

20a‧‧‧第一側 20a‧‧‧ first side

20b‧‧‧第二側 20b‧‧‧ second side

200‧‧‧導電穿孔 200‧‧‧Electrical perforation

201‧‧‧線路重佈結構 201‧‧‧Line redistribution structure

21‧‧‧電子元件 21‧‧‧Electronic components

21b‧‧‧非作用面 21b‧‧‧Non-active surface

22‧‧‧底膠 22‧‧‧Bottom

23‧‧‧封裝層 23‧‧‧Encapsulation layer

25‧‧‧導電元件 25‧‧‧Conductive components

27‧‧‧補充件 27‧‧‧Replenishment

Claims (16)

一種電子封裝件,係包括:中介板,係具有相對之第一側與第二側;電子元件,係設於該中介板之第二側上並電性連接該中介板;補充件,係呈條狀並設於該中介板之第二側上且未電性連接該中介板;以及封裝層,係形成於該中介板之第二側上且包覆該電子元件與該補充件。 An electronic package comprising: an interposer having opposite first and second sides; an electronic component disposed on a second side of the interposer and electrically connected to the interposer; a strip is disposed on the second side of the interposer and is not electrically connected to the interposer; and an encapsulation layer is formed on the second side of the interposer and covers the electronic component and the replenishing member. 一種電子封裝件,係包括:中介板,係於其一表面定義有置晶區及相對之閒置區;電子元件,係設於該置晶區中並電性連接該中介板;補充件,係呈條狀並設於該閒置區中且未電性連接該中介板;以及封裝層,係形成於該中介板上且包覆該電子元件與該補充件。 An electronic package includes: an interposer having a crystallographic region and an opposite idle region defined on a surface thereof; an electronic component disposed in the crystallographic region and electrically connected to the interposer; And being disposed in the idle area and not electrically connected to the interposer; and an encapsulation layer formed on the interposer and covering the electronic component and the supplement. 如申請專利範圍第1或2項所述之電子封裝件,復包括供該中介板接置其上之封裝基板。 The electronic package according to claim 1 or 2, further comprising a package substrate on which the interposer is attached. 如申請專利範圍第1或2項所述之電子封裝件,其中,該電子元件及該補充件所占區域的外圍之各側,係與該中介板邊緣之距離係大致相等。 The electronic package of claim 1 or 2, wherein each side of the periphery of the area occupied by the electronic component and the supplement is substantially equal to the distance from the edge of the interposer. 如申請專利範圍第1或2項所述之電子封裝件,其中, 該中介板中形成有複數導電穿孔,且該中介板上形成有電性連接該導電穿孔之線路重佈結構。 The electronic package of claim 1 or 2, wherein A plurality of conductive vias are formed in the interposer, and a line redistribution structure electrically connecting the conductive vias is formed on the interposer. 如申請專利範圍第1或2項所述之電子封裝件,其中,形成該補充件之材質係為半導體材。 The electronic package of claim 1 or 2, wherein the material forming the supplement is a semiconductor material. 如申請專利範圍第1或2項所述之電子封裝件,其中,形成該補充件之材質之熱膨脹係數為2至5。 The electronic package of claim 1 or 2, wherein the material forming the supplement has a thermal expansion coefficient of 2 to 5. 如申請專利範圍第1或2項所述之電子封裝件,其中,該電子元件之上表面與該補充件之上表面外露出該封裝層。 The electronic package of claim 1 or 2, wherein the upper surface of the electronic component and the upper surface of the complementary component expose the encapsulation layer. 一種電子封裝件之製法,係包括:提供一中介板,係具有相對之第一側與第二側;設置至少一電子元件與呈條狀之至少一補充件於該中介板之第二側上,其中,該電子元件電性連接該中介板,該補充件未電性連接該中介板;以及形成封裝層於該中介板之第二側上以包覆該電子元件與該補充件。 An electronic package manufacturing method includes: providing an interposer having opposite first and second sides; and disposing at least one electronic component and at least one complementary component in a strip shape on the second side of the interposer The electronic component is electrically connected to the interposer, the replenishing member is not electrically connected to the interposer; and an encapsulation layer is formed on the second side of the interposer to encapsulate the electronic component and the replenishing member. 如申請專利範圍第9項所述之電子封裝件之製法,復包括將一封裝基板設於該中介板之第一側上,並使該封裝基板電性連接該中介板。 The method for manufacturing an electronic package according to claim 9, further comprising: providing a package substrate on the first side of the interposer, and electrically connecting the package substrate to the interposer. 如申請專利範圍第9項所述之電子封裝件之製法,其中,該中介板之第二側定義有一置晶區與相對之閒置區,其中,該電子元件係位於該置晶區,而該補充件係位於該閒置區。 The method of manufacturing the electronic package of claim 9, wherein the second side of the interposer defines a crystallographic region and an opposite idle region, wherein the electronic component is located in the crystallographic region, and the electronic component is located in the crystallographic region. The supplement is located in the free area. 如申請專利範圍第9項所述之電子封裝件之製法,其 中,該中介板中形成有複數導電穿孔,且該中介板上形成有電性連接該導電穿孔之線路重佈結構。 The method for manufacturing an electronic package according to claim 9 of the patent application, A plurality of conductive vias are formed in the interposer, and a line redistribution structure electrically connecting the conductive vias is formed on the interposer. 如申請專利範圍第9項所述之電子封裝件之製法,其中,形成該補充件之材質係為半導體材。 The method of manufacturing an electronic package according to claim 9, wherein the material forming the supplement is a semiconductor material. 如申請專利範圍第9項所述之電子封裝件之製法,其中,該電子元件之上表面與該補充件之上表面外露出該封裝層。 The method of manufacturing an electronic package according to claim 9, wherein the upper surface of the electronic component and the upper surface of the complementary component expose the encapsulation layer. 如申請專利範圍第9項所述之電子封裝件之製法,其中,該電子元件及該補充件所占區域的外圍之各側,係與該中介板邊緣之距離係大致相等。 The method of manufacturing an electronic package according to claim 9, wherein each side of the periphery of the area occupied by the electronic component and the supplement is substantially equal to the distance from the edge of the interposer. 如申請專利範圍第9項所述之電子封裝件之製法,其中,形成該補充件之材質之熱膨脹係數為2至5。 The method of manufacturing an electronic package according to claim 9, wherein the material forming the supplement has a thermal expansion coefficient of 2 to 5.
TW106128425A 2017-08-22 2017-08-22 Electronic package and method for fabricating the same TWI615926B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW106128425A TWI615926B (en) 2017-08-22 2017-08-22 Electronic package and method for fabricating the same
CN201710950592.7A CN109427699A (en) 2017-08-22 2017-10-13 Electronic package and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW106128425A TWI615926B (en) 2017-08-22 2017-08-22 Electronic package and method for fabricating the same

Publications (2)

Publication Number Publication Date
TWI615926B true TWI615926B (en) 2018-02-21
TW201913902A TW201913902A (en) 2019-04-01

Family

ID=62014653

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106128425A TWI615926B (en) 2017-08-22 2017-08-22 Electronic package and method for fabricating the same

Country Status (2)

Country Link
CN (1) CN109427699A (en)
TW (1) TWI615926B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI668811B (en) * 2018-10-17 2019-08-11 矽品精密工業股份有限公司 Electronic package and load bearing structure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150262972A1 (en) * 2014-03-12 2015-09-17 Invensas Corporation Integrated circuit assemblies with reinforcement frames, and methods of manufacture
US9478504B1 (en) * 2015-06-19 2016-10-25 Invensas Corporation Microelectronic assemblies with cavities, and methods of fabrication

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5762119B2 (en) * 2011-05-06 2015-08-12 日東電工株式会社 Suspension board with circuit and manufacturing method thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150262972A1 (en) * 2014-03-12 2015-09-17 Invensas Corporation Integrated circuit assemblies with reinforcement frames, and methods of manufacture
US9478504B1 (en) * 2015-06-19 2016-10-25 Invensas Corporation Microelectronic assemblies with cavities, and methods of fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI668811B (en) * 2018-10-17 2019-08-11 矽品精密工業股份有限公司 Electronic package and load bearing structure

Also Published As

Publication number Publication date
CN109427699A (en) 2019-03-05
TW201913902A (en) 2019-04-01

Similar Documents

Publication Publication Date Title
TWI631676B (en) Electronic package and method of manufacture
TWI541954B (en) Semiconductor package and manufacturing method thereof
US9502360B2 (en) Stress compensation layer for 3D packaging
TWI570842B (en) Electronic package and method for fabricating the same
TWI649839B (en) Electronic package and substrate structure thereof
TWI753686B (en) Electronic packaging and manufacturing method thereof
TWM455255U (en) Package substrate having interposer and package structure having the substrate
TW202209582A (en) Electronic package and manufacturing method thereof
US9754898B2 (en) Semiconductor package and fabrication method thereof
TWI601259B (en) Electronic package, semiconductor substrate of the electronic package, and method for manufacturing the electronic package
TW201742167A (en) Electronic package and method for fabricating the same
TW201707174A (en) Electronic package and method of manufacture thereof
CN108987355B (en) Electronic package and manufacturing method thereof
TWI615926B (en) Electronic package and method for fabricating the same
TWI638411B (en) Method of fabricating electronic packing
TWI772816B (en) Electronic package and manufacturing method thereof
TW201911500A (en) Electronic package and its manufacturing method
TWI802726B (en) Carrying substrate, electronic package having the carrying substrate, and methods for manufacturing the same
TW201413903A (en) Semiconductor package and method of forming the same
TWM537303U (en) 3D multi-chip module packaging structure
TWI546920B (en) Semiconductor device and manufacturing method thereof
TWI785371B (en) Electronic packaging and manufacturing method thereof
TWI503932B (en) Semiconductor package disposed on an adhesive layer and method thereof
TWI581676B (en) Electronic package and substrate structure
CN117153805A (en) Electronic package and method for manufacturing the same