TWM455255U - Package substrate having interposer and package structure having the substrate - Google Patents

Package substrate having interposer and package structure having the substrate Download PDF

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Publication number
TWM455255U
TWM455255U TW101211735U TW101211735U TWM455255U TW M455255 U TWM455255 U TW M455255U TW 101211735 U TW101211735 U TW 101211735U TW 101211735 U TW101211735 U TW 101211735U TW M455255 U TWM455255 U TW M455255U
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TW
Taiwan
Prior art keywords
interposer
substrate
electrical contact
package
substrate body
Prior art date
Application number
TW101211735U
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Chinese (zh)
Inventor
Dyi-Chung Hu
Ying-Chih Chan
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Unimicron Technology Corp
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Priority to TW101211735U priority Critical patent/TWM455255U/en
Publication of TWM455255U publication Critical patent/TWM455255U/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Abstract

A package substrate having an interposer comprises a substrate body and an interposer, wherein the substrate has a plurality of first and second electrical contact pads formed thereon and first conducting pillars disposed on each of the second contact pad, the interposer includes an interposer body, a plurality of through via and second conducting pillars formed in each of the through vias. The second conducting pillars have protrusions which protrude from the bottom surface of the interposer body, thereby the interposer electrically connects to the first electrical contact pads. The second electrical contact pads locate at circumferential area of the interposer. A package structure having an interposer comprises the package substrate, a semiconductor chip connected to the interposer, and an encapsulant covering the package, semiconductor and the first conducting pillars, wherein the the end of the first conducting pillars are exposed.

Description

具中介層之封裝基板及其封裝結構 Package substrate with interposer and package structure thereof

本創作係關於一種封裝基板及封裝結構,詳而言之,係關於一種具中介層之封裝基板及其封裝結構。 The present invention relates to a package substrate and a package structure, and more particularly to a package substrate having an interposer and a package structure thereof.

如第1A圖所示,係為習知覆晶式封裝結構之剖視示意圖,該封裝結構之製程先提供一具有核心板102、第一表面10a與第二表面10b之雙馬來醯亞胺-三氮雜苯(Bismaleimide-Triazine,BT)封裝基板10,且於該封裝基板10之第一表面10a具有複數覆晶焊墊100;再藉由焊料凸塊11電性連接半導體晶片12之電極墊120;接著,於該封裝基板10之第一表面10a與該半導體晶片12之間形成底膠17,以包覆該焊料凸塊11;又於該封裝基板10之第二表面10b具有複數植球墊101,以藉由焊球13電性連接例如為印刷電路板之另一外部電子裝置(未表示於圖中)。 As shown in FIG. 1A, it is a schematic cross-sectional view of a conventional flip-chip package structure. The process of the package structure first provides a bismaleimide having a core plate 102, a first surface 10a and a second surface 10b. a Bismaleimide-Triazine (BT) package substrate 10, and having a plurality of flip-chip pads 100 on the first surface 10a of the package substrate 10; and electrically connecting the electrodes of the semiconductor wafer 12 by the solder bumps 11 Pad 120; then, a primer 17 is formed between the first surface 10a of the package substrate 10 and the semiconductor wafer 12 to cover the solder bump 11; and the second surface 10b of the package substrate 10 has a plurality of implants. The ball pad 101 is electrically connected to another external electronic device such as a printed circuit board by solder balls 13 (not shown).

然,為了增進該半導體晶片12的電性效能,故於該半導體晶片12的後端製程(Back-End Of Line,BEOL)中通常將採用超低介電係數(Extreme low-k dielectric,ELK)或超低介電常數(Ultra low-k,ULK)之介電材料,但該low-k之介電材料為多孔且易脆之特性,以致於當進行覆晶封裝後,在信賴度熱循環測試時,將因該封裝基板10與該半導體晶片12之間的熱膨脹係數(thermal expansion coefficient,CTE)差異過大,導致該焊料凸塊11所形成 之接點易因承受不住熱應力而產生斷裂,甚至造成該半導體晶片12發生破壞,而降低產品可靠度。 However, in order to improve the electrical performance of the semiconductor wafer 12, an ultra low-k dielectric (ELK) is generally used in the back-end of line (BEOL) of the semiconductor wafer 12. Or ultra low dielectric constant (Ultra low-k, ULK) dielectric material, but the low-k dielectric material is porous and brittle, so that when the flip chip is packaged, the reliability thermal cycle During the test, the difference in thermal expansion coefficient (CTE) between the package substrate 10 and the semiconductor wafer 12 is too large, resulting in the formation of the solder bumps 11. The contact is prone to breakage due to the inability to withstand thermal stress, and even causes damage to the semiconductor wafer 12, thereby reducing product reliability.

再者,隨著電子產品更趨於輕薄短小及功能不斷提昇之需求,該半導體晶片12之佈線密度愈來愈高,以奈米尺寸作單位,因而各該電極墊120之間的間距變得更小;然,習知封裝基板10之覆晶焊墊100之間距係以微米尺寸作單位,而無法有效縮小至對應該電極墊120之間距的大小,導致雖有高線路密度之半導體晶片12,卻未有可配合之封裝基板10,以致於無法有效生產電子產品。 Furthermore, as the electronic products become more compact, shorter, and more functional, the wiring density of the semiconductor wafer 12 is higher and higher, and the pitch between the electrode pads 120 becomes the unit of the nanometer size. Smaller; however, the distance between the flip-chip pads 100 of the conventional package substrate 10 is in units of micrometers, and cannot be effectively reduced to the size of the corresponding electrode pads 120, resulting in a semiconductor wafer 12 having a high line density. However, there is no package substrate 10 that can be matched, so that the electronic product cannot be efficiently produced.

另外,隨著半導體封裝技術的演進,半導體裝置已開發出不同的封裝型態,而為提升電性功能及節省封裝空間,遂堆加複數封裝結構以形成封裝堆疊(Package on Package,POP)結構,此種封裝方式能發揮系統封裝(SiP)異質整合特性,可將不同功用之電子元件,例如:記憶體、中央處理器、繪圖處理器、影像應用處理器等,藉由堆疊設計達到系統的整合,適合應用於輕薄型各種電子產品。 In addition, with the evolution of semiconductor packaging technology, semiconductor devices have developed different package types, and in order to improve electrical functions and save packaging space, a plurality of package structures are stacked to form a package on package (POP) structure. This kind of package can utilize the heterogeneous integration of system package (SiP), and can realize the system of the electronic components of different functions, such as memory, central processing unit, graphics processor, image application processor, etc. Integrated, suitable for a variety of thin and light electronic products.

如第1B圖所示,習知封裝堆疊結構係將第二封裝結構2b疊設於第一封裝結構2a上。該第一封裝結構2a包含具有相對之第一及第二表面21a,21b之第一基板21、及設於該第一表面21a上且電性連接該第一基板21之第一電子元件20。該第二封裝結構2b包含具有相對之第三及第四表面22a,22b之第二基板22、及設於該第三表面22a上且電性連接該第二基板22之第二電子元件25。再者,係於該第一基板21之第一表面21a上形成焊球210,以令該第 二基板22之第四表面22b藉由該焊球210疊設且電性連接於該第一基板21上。又,該第一基板21之第二表面21b上具有植球墊212以供結合焊球24,且該第一及第二電子元件20,25係為主動及/或被動元件,並以覆晶方式電性連接基板,且藉由底膠23充填於第一及第二電子元件20,25與第一基板21及第二基板22間,以形成覆晶接合。 As shown in FIG. 1B, the conventional package stack structure stacks the second package structure 2b on the first package structure 2a. The first package structure 2a includes a first substrate 21 having opposite first and second surfaces 21a, 21b, and a first electronic component 20 disposed on the first surface 21a and electrically connected to the first substrate 21. The second package structure 2b includes a second substrate 22 having opposite third and fourth surfaces 22a, 22b, and a second electronic component 25 disposed on the third surface 22a and electrically connected to the second substrate 22. Furthermore, a solder ball 210 is formed on the first surface 21a of the first substrate 21 to make the first The fourth surface 22b of the two substrates 22 is stacked on the solder ball 210 and electrically connected to the first substrate 21. Moreover, the second surface 21b of the first substrate 21 has a ball pad 212 for bonding the solder balls 24, and the first and second electronic components 20, 25 are active and/or passive components, and are flip chip The substrate is electrically connected to the substrate, and is filled between the first and second electronic components 20, 25 and the first substrate 21 and the second substrate 22 by a primer 23 to form a flip chip bond.

然而,習知封裝堆疊結構係藉由焊錫球堆疊兩封裝結構,該焊錫球之尺寸變異不易控制,故容易造成該兩封裝結構之間呈傾斜接置、共平面性不良,甚致於產生接點偏移等問題。再者,當堆疊之高度需增加時,該焊錫球之直徑需增加,導致該焊錫球所佔用之封裝基板表面積增加,因而使封裝基板表面上之佈線與電子元件佈設之空間受到壓縮而影響堆疊焊墊(PoP pad)間距無法持續微縮。又,此結構中該焊錫球之體積增加後,將容易產生橋接現象,此外,對於以覆晶方式接置半導體晶片之封裝基板而言,於封裝過程面臨覆晶焊墊區底膠(underfill)溢膠容易污染該些堆疊焊墊之表面等問題,而致產品之良率損失。 However, the conventional package stack structure is formed by stacking two package structures by solder balls, and the size variation of the solder balls is difficult to control, so that the two package structures are inclined to be tilted and have poor coplanarity, so that the connection is generated. Point offset and other issues. Furthermore, when the height of the stack needs to be increased, the diameter of the solder ball needs to be increased, resulting in an increase in the surface area of the package substrate occupied by the solder ball, thereby causing the space on the surface of the package substrate and the layout of the electronic component to be compressed to affect the stacking. The pitch of the pad (PoP pad) cannot be continuously reduced. Moreover, in this structure, the solder ball is increased in volume, and bridging is likely to occur. In addition, for the package substrate in which the semiconductor wafer is flip-chip mounted, the underfill is faced in the package process. The overflow glue easily contaminates the surface of the stacked pads, and the yield of the product is lost.

因此,如何克服習知技術中之種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome various problems in the prior art has become a problem that is currently being solved.

鑑於上述習知技術之缺點,本創作所揭露之一種具中介層之封裝基板及其封裝結構係能達到線距持續微縮與降低封裝應力之目標。 In view of the above-mentioned shortcomings of the prior art, a package substrate with an interposer and a package structure thereof disclosed in the present invention can achieve the goal of continuously reducing the line pitch and reducing the package stress.

本創作之具中介層之封裝基板,係包括:基板本體, 係具有相對之第一表面與第二表面,該第一表面係具有複數第一電性接觸墊、複數第二電性接觸墊、及設置於各該第二電性接觸墊上之第一導電柱;以及中介層,係包含具有頂面與底面之中介層本體、設置於該頂面上且表面具有複數電性連接墊之線路重佈層、貫穿該中介層本體頂面與底面之複數貫孔、及設置於各該貫孔中之第二導電柱,且該第二導電柱係具有突出於該中介層本體的底面之凸部,該中介層係藉由該凸部電性連接該第一電性接觸墊,該等第二電性接觸墊係位於該中介層之外圍區域。 The package substrate with the interposer of the present invention includes: a substrate body, The first surface has a plurality of first electrical contact pads, a plurality of second electrical contact pads, and a first conductive pillar disposed on each of the second electrical contact pads And an interposer comprising an interposer body having a top surface and a bottom surface, a circuit redistribution layer disposed on the top surface and having a plurality of electrical connection pads on the surface, and a plurality of through holes penetrating the top surface and the bottom surface of the interposer body; And a second conductive pillar disposed in each of the through holes, and the second conductive pillar has a convex portion protruding from a bottom surface of the intermediate layer body, and the intermediate layer is electrically connected to the first portion by the convex portion Electrical contact pads, the second electrical contact pads being located in a peripheral region of the interposer.

上述之基板本體復包括絕緣保護層,係設置於該基板本體之第一表面上,且具有對應該中介層的開口;或者,上述之基板本體復包括絕緣保護層,係設置於該基板本體之第一表面上,且具有對應外露該第一電性接觸墊的開孔。 The substrate body includes an insulating protective layer disposed on the first surface of the substrate body and having an opening corresponding to the interposer; or the substrate body further includes an insulating protective layer disposed on the substrate body The first surface has an opening corresponding to the first electrical contact pad.

於本創作之具中介層之封裝基板中,復包括底膠,係設置於該中介層與基板本體之間。 In the package substrate with the interposer of the present invention, a primer is further disposed between the interposer and the substrate body.

本創作之具中介層之封裝結構,係包括:基板本體,係具有相對之第一表面與第二表面,該第一表面係具有複數第一電性接觸墊、複數第二電性接觸墊、及設置於各該第二電性接觸墊上之第一導電柱;中介層,係包含具有頂面與底面之中介層本體、設置於該頂面上且表面具有複數電性連接墊之線路重佈層、貫穿該中介層本體頂面與底面之複數貫孔、及設置於各該貫孔中之第二導電柱,且該第二導電柱係具有突出於該中介層本體的底面之凸部,該中介層係藉由該凸部電性連接該第一電性接觸墊,該等第二 電性接觸墊係位於該中介層之外圍區域;半導體晶片,係接置於該中介層上並電性連接該中介層之線路重佈層的複數電性連接墊;以及封裝膠體,係包覆該基板本體、中介層及半導體晶片,並外露該第一導電柱的端部。 The package structure of the present invention includes: a substrate body having opposite first and second surfaces, the first surface having a plurality of first electrical contact pads and a plurality of second electrical contact pads, And a first conductive pillar disposed on each of the second electrical contact pads; the interposer comprises an interposer body having a top surface and a bottom surface, and a circuit re-distribution disposed on the top surface and having a plurality of electrical connection pads on the surface a layer, a plurality of through holes penetrating the top surface and the bottom surface of the interposer body, and a second conductive pillar disposed in each of the through holes, and the second conductive pillar has a convex portion protruding from a bottom surface of the interposer body, The interposer is electrically connected to the first electrical contact pad by the protrusion, and the second The electrical contact pad is located in a peripheral region of the interposer; the semiconductor wafer is connected to the plurality of electrical connection pads disposed on the interposer and electrically connected to the circuit redistribution layer of the interposer; and the encapsulant is coated The substrate body, the interposer, and the semiconductor wafer expose the ends of the first conductive pillars.

上述之具中介層之封裝結構復包括接置於該第一導電柱上之電子元件,如另一封裝結構,該具中介層之封裝結構係利用該第一導電柱的端部接置並電性連接該另一封裝結構。 The package structure with the interposer includes an electronic component connected to the first conductive pillar, such as another package structure, and the package structure with the interposer is connected and electrically connected by the end of the first conductive pillar The other package structure is connected sexually.

相較於習知技術,本創作之具中介層之封裝基板及其封裝結構係藉由中介層以解決習知缺乏可配合之封裝基板的問題,以進一步提供符合高線路密度之半導體晶片之封裝基板。 Compared with the prior art, the package substrate with the interposer and the package structure thereof are provided by the interposer to solve the problem of the lack of a compatible package substrate, thereby further providing a package of the semiconductor chip conforming to the high line density. Substrate.

以下藉由特定的具體實施例說明本創作之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本創作之其他優點及功效。 The embodiments of the present invention are described below by way of specific embodiments, and those skilled in the art can readily appreciate other advantages and functions of the present invention from the disclosure of the present disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本創作可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本創作所能產生之功效及所能達成之目的下,均應仍落在本創作所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「一」、「上」及「下」等之用語,亦僅為便於敘述之明瞭, 而非用以限定本創作可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本創作可實施之範疇。 It is to be understood that the structure, the proportions, the size and the like of the drawings are only used in conjunction with the disclosure of the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effectiveness and the purpose of the creation. The technical content revealed by the creation can be covered. At the same time, the terms "one", "upper" and "lower" as quoted in this manual are for convenience only. It is not intended to limit the scope of the creation of the creation, and the change or adjustment of the relative relationship is considered to be within the scope of the creation of the creation without substantial changes in the technical content.

本創作之具中介層之封裝基板,其製法之實施大致上可分為兩個階段,首先,製備中介層(interposer),請參閱第2A至2G圖,其係本創作之具中介層之封裝基板之中介層及其製法的剖視圖。 The implementation of the method for manufacturing the package substrate with the interposer can be divided into two stages. First, the interposer is prepared. Please refer to the 2A to 2G drawings, which are the interposer packages of the present creation. A cross-sectional view of an interposer of a substrate and a method of making the same.

如第2A圖所示,準備一具有相對之頂面30a與底面30b之中介層本體30,該中介層本體30之材質可為玻璃、單晶矽、多晶矽或其他半導體材料。 As shown in FIG. 2A, an interposer body 30 having an opposite top surface 30a and a bottom surface 30b is prepared. The material of the interposer body 30 may be glass, single crystal germanium, polysilicon or other semiconductor material.

如第2B圖所示,於該底面30b上形成保護層31。 As shown in FIG. 2B, a protective layer 31 is formed on the bottom surface 30b.

如第2C圖所示,於該中介層本體30中形成貫穿該中介層本體30之頂面30a與底面30b之複數個貫孔32。 As shown in FIG. 2C, a plurality of through holes 32 penetrating through the top surface 30a and the bottom surface 30b of the interposer body 30 are formed in the interposer body 30.

如第2D圖所示,於各該貫孔32中形成第二導電柱33,該第二導電柱33之材質可為銅或其他導電材料,該第二導電柱33的製法可例如將銅膏印刷於各該貫孔32中,再固化之。 As shown in FIG. 2D, a second conductive pillar 33 is formed in each of the through holes 32. The second conductive pillar 33 may be made of copper or other conductive material, and the second conductive pillar 33 may be made of, for example, a copper paste. It is printed in each of the through holes 32 and cured.

如第2E圖所示,於該頂面30a上形成線路重佈層(redistribution layer,簡稱RDL)34,且該線路重佈層34之最外層有複數電性連接墊35,以供接置並電性連接半導體晶片。 As shown in FIG. 2E, a redistribution layer (RDL) 34 is formed on the top surface 30a, and a plurality of electrical connection pads 35 are disposed on the outermost layer of the circuit redistribution layer 34 for connection. The semiconductor wafer is electrically connected.

如第2F圖所示,進行切割製程。 As shown in Fig. 2F, the cutting process is performed.

如第2G圖所示,移除該保護層31,使該第二導電柱33具有凸出於該底面30b之凸部330,至此即完成本創作 之中介層3。 As shown in FIG. 2G, the protective layer 31 is removed, so that the second conductive pillar 33 has a convex portion 330 protruding from the bottom surface 30b, thereby completing the creation. Intermediary layer 3.

接著,進入本創作之具中介層之封裝基板的製作步驟,請參閱第2H至2I圖,係本創作之具有中介層之封裝基板及其製法的剖視圖。 Next, the steps of fabricating the package substrate having the interposer of the present invention, refer to FIGS. 2H to 2I, which are cross-sectional views of the package substrate having the interposer and the method of manufacturing the same.

如第2H圖所示,提供一具有相對之第一表面5a與第二表面5b之基板本體5,該第一表面5a具有複數第一電性接觸墊5211、複數第二電性接觸墊5212、及設置於各該第二電性接觸墊5212上之第一導電柱54,而於第2H圖中,該等第二電性接觸墊5212係位於該基板本體5之第一電性接觸墊5211之外圍區域。此外,於該第一表面5a和該第二電性接觸墊5212上具有第一絕緣保護層53a,且該第一絕緣保護層53a具有開口530a以外露部份的第一表面5a及全部的第一電性接觸墊5211,以供接置並電性連接中介層3的第二導電柱33的凸部330,該第二表面5b具有複數第三電性接觸墊5213,而該第二表面5b上具有第二絕緣保護層53b,且該第二絕緣保護層53b具有開孔530b以外露第三電性接觸墊5213。 As shown in FIG. 2H, a substrate body 5 having an opposite first surface 5a and a second surface 5b is provided. The first surface 5a has a plurality of first electrical contact pads 5211 and a plurality of second electrical contact pads 5212. And the first conductive pillars 54 disposed on the second electrical contact pads 5212, and in the second embodiment, the second electrical contact pads 5212 are located on the first electrical contact pads 5211 of the substrate body 5. Peripheral area. In addition, a first insulating protective layer 53a is disposed on the first surface 5a and the second electrical contact pad 5212, and the first insulating protective layer 53a has a first surface 5a of the exposed portion of the opening 530a and all of the first surface An electrical contact pad 5211 for connecting and electrically connecting the convex portion 330 of the second conductive pillar 33 of the interposer 3, the second surface 5b having a plurality of third electrical contact pads 5213, and the second surface 5b There is a second insulating protective layer 53b, and the second insulating protective layer 53b has an opening 530b for exposing the third electrical contact pad 5213.

另外,如第2H圖所示,該基板本體5可包括核心層51,該核心層51包含具有相對之頂面510a與底面510b之核心介電層510、分別形成於該頂面510a與該底面510b之第一線路層511a與第二線路層511b、貫通該核心介電層510以連接該第一線路層511a和第二線路層511b之導電通孔5101。此外,該基板本體5可包括形成於該第一線路層511a及核心介電層510的頂面510a上之第一增層結 構52a以及形成於該第二線路層511b及核心介電層510的底面510b上之第二增層結構52b,其中,該第一增層結構52a包括至少一第一介電層520a及設於該第一介電層520a上之第一增層線路層521a,且該第一增層線路層521a具有前述之第一電性接觸墊5211和第二電性接觸墊5212,而該第二增層結構52b包括至少一第二介電層520b及設於該第二介電層520b上之第二增層線路層521b,且該第二增層線路層521b具有前述之第三電性接觸墊5213。 In addition, as shown in FIG. 2H, the substrate body 5 may include a core layer 51 including a core dielectric layer 510 having opposing top surfaces 510a and 510b, respectively formed on the top surface 510a and the bottom surface. The first circuit layer 511a and the second circuit layer 511b of 510b pass through the core dielectric layer 510 to connect the conductive vias 5101 of the first circuit layer 511a and the second circuit layer 511b. In addition, the substrate body 5 may include a first build-up layer formed on the top surface 510a of the first circuit layer 511a and the core dielectric layer 510. And a second build-up structure 52b formed on the bottom surface 510b of the second circuit layer 511b and the core dielectric layer 510, wherein the first build-up structure 52a includes at least one first dielectric layer 520a and is disposed on The first build-up circuit layer 521a on the first dielectric layer 520a, and the first build-up circuit layer 521a has the first electrical contact pad 5211 and the second electrical contact pad 5212, and the second increase The layer structure 52b includes at least one second dielectric layer 520b and a second build-up wiring layer 521b disposed on the second dielectric layer 520b, and the second build-up wiring layer 521b has the third electrical contact pad described above. 5213.

要補充說明的是,此時,本創作之基板本體5之第一絕緣保護層53a除了如前述第2H圖的態樣之外,還可為如下之態樣:如第2H’圖所示,該第一絕緣保護層53a’可覆蓋該基板本體5之全部第一表面5a,並具有複數個分別對應外露各該第一電性接觸墊5211之開孔530a’,以供後續接置並電性連接該中介層3的第二導電柱33的凸部330。 It should be noted that, at this time, the first insulating protective layer 53a of the substrate body 5 of the present invention may be in the following aspect as in the aspect of the above-mentioned FIG. 2H: as shown in FIG. 2H', The first insulating protective layer 53a' can cover all the first surfaces 5a of the substrate body 5, and has a plurality of openings 530a' corresponding to the first electrical contact pads 5211, respectively, for subsequent connection and power supply. The convex portion 330 of the second conductive pillar 33 of the interposer 3 is connected.

如第2I圖所示,利用焊料凸塊55將該凸部330電性連接該第一電性接觸墊5211,以將該中介層3與該基板本體5結合,且各該第二電性接觸墊5212係位於該中介層3之外圍區域,而得到本創作之具中介層之封裝基板。 As shown in FIG. 2I, the convex portion 330 is electrically connected to the first electrical contact pad 5211 by using the solder bumps 55 to bond the interposer 3 to the substrate body 5, and each of the second electrical contacts The pad 5212 is located in the peripheral region of the interposer 3 to obtain the encapsulating substrate with the interposer of the present invention.

要補充說明的是,此時,本創作之基板本體5與該中介層3之結合除了如前述第2I圖的態樣之外,還可為如下之態樣:如第2I’圖所示,於該中介層3與基板本體5之間設置有底膠56,亦即利用該底膠56填充於該中介層本體30與該第一電性接觸墊5211之間以及該中介層本體30與第一表面5a之間。 It should be noted that, at this time, the combination of the substrate body 5 of the present invention and the interposer 3 may be as follows, as shown in the second aspect of FIG. A primer 56 is disposed between the interposer 3 and the substrate body 5, that is, the underfill 56 is filled between the interposer body 30 and the first electrical contact pad 5211, and the interposer body 30 and Between a surface 5a.

另外,請參閱第2J至2L圖,係本創作之具有中介層之封裝基板之應用例的剖視圖。 In addition, please refer to FIGS. 2J to 2L, which are cross-sectional views of an application example of the package substrate having the interposer of the present invention.

如第2J圖所示,係延續自第2I圖,於該中介層3上接置半導體晶片4,而半導體晶片4與中介層3之間亦可先填充底膠(圖未示),再進行後續說明之步驟。 As shown in FIG. 2J, the semiconductor wafer 4 is attached to the interposer 3, and the underlayer (not shown) may be filled between the semiconductor wafer 4 and the interposer 3, and then performed. Follow-up steps.

如第2K圖所示,利用封裝膠體60封裝該中介層3、半導體晶片4、及基板本體5,以形成一封裝結構6,該封裝膠體60係包覆中介層3和半導體晶片4,並覆蓋該第一絕緣保護層53a、第一電性連接墊5211、第二電性連接墊5212,並外露該第一導電柱54的端部。 As shown in FIG. 2K, the interposer 3, the semiconductor wafer 4, and the substrate body 5 are encapsulated by the encapsulant 60 to form a package structure 6, which encapsulates the interposer 3 and the semiconductor wafer 4 and covers The first insulating protective layer 53a, the first electrical connection pad 5211, and the second electrical connection pad 5212 expose the end of the first conductive pillar 54.

如第2L圖所示,利用該第一導電柱54的端部以於該封裝結構6上接置並電性連接電子元件,例如另一封裝結構7。 As shown in FIG. 2L, the end of the first conductive pillar 54 is used to connect and electrically connect the electronic component, such as another package structure 7, to the package structure 6.

另外,本創作復提供一種具中介層之封裝基板,如第2I圖所示,其係包括:基板本體5,係具有相對之第一表面5a與第二表面5b,該第一表面5a係具有複數第一電性接觸墊5211、複數第二電性接觸墊5212、及設置於各該第二電性接觸墊5212上之第一導電柱54;以及中介層3,係包含具有頂面30a與底面30b之中介層本體30、設置於該頂面30a上且表面具有複數電性連接墊35之線路重佈層34、貫穿該中介層本體30頂面30a與底面30b之複數貫孔32、及設置於各該貫孔32中之第二導電柱33,且該第二導電柱33係具有突出於該中介層本體30的底面30b之凸部330,該中介層3係藉由該凸部330電性連接該第一電 性接觸墊5211,該等第二電性接觸墊5211係位於該中介層3之外圍區域。 In addition, the present invention provides a package substrate having an interposer, as shown in FIG. 2I, comprising: a substrate body 5 having an opposite first surface 5a and a second surface 5b, the first surface 5a having a plurality of first electrical contact pads 5211, a plurality of second electrical contact pads 5212, and first conductive pillars 54 disposed on each of the second electrical contact pads 5212; and an interposer 3 comprising a top surface 30a and The interposer body 30 of the bottom surface 30b, the circuit redistribution layer 34 disposed on the top surface 30a and having a plurality of electrical connection pads 35, and the plurality of through holes 32 extending through the top surface 30a and the bottom surface 30b of the interposer body 30, and The second conductive pillar 33 is disposed in each of the through holes 32, and the second conductive pillar 33 has a convex portion 330 protruding from the bottom surface 30b of the interposer body 30. The interposer 3 is formed by the convex portion 330. Electrically connecting the first electric The second contact pads 5211 are located in the peripheral region of the interposer 3 .

於前述之封裝基板中,該基板本體5復包括第一絕緣保護層53a,其係設置於該基板本體5之第一表面5a上,且具有對應該中介層3的開口530a,如第2H圖所示。或者,該基板本體5復包括第一絕緣保護層53a’,其係設置於該基板本體5之第一表面5a上,且具有對應外露該第一電性接觸墊5211的開孔530a’,如第2H’圖所示。 In the above package substrate, the substrate body 5 further includes a first insulating protective layer 53a disposed on the first surface 5a of the substrate body 5 and having an opening 530a corresponding to the interposer 3, as shown in FIG. 2H. Shown. Alternatively, the substrate body 5 further includes a first insulating protective layer 53a' disposed on the first surface 5a of the substrate body 5 and having an opening 530a' corresponding to the first electrical contact pad 5211, such as Figure 2H' is shown.

於前述之封裝基板中,復包括底膠56,該底膠56係設置於該中介層3與基板本體5之間,如第2I’圖所示。 In the above package substrate, a primer 56 is provided, and the primer 56 is disposed between the interposer 3 and the substrate body 5 as shown in FIG.

再者,本創作復提供一種具中介層之封裝結構,如第2K圖所示,其係包括:基板本體5,係具有相對之第一表面5a與第二表面5b,該第一表面5a係具有複數第一電性接觸墊5211、複數第二電性接觸墊5212、及設置於各該第二電性接觸墊5212上之第一導電柱54;中介層3,係包含具有頂面30a與底面30b之中介層本體30、設置於該頂面30a上且表面具有複數電性連接墊35之線路重佈層34、貫穿該中介層本體30頂面30a與底面30b之複數貫孔32、及設置於各該貫孔32中之第二導電柱33,且該第二導電柱33係具有突出於該中介層本體30的底面30b之凸部330,該中介層3係藉由該凸部330電性連接該第一電性接觸墊5211,該等第二電性接觸墊5211係位於該中介層3之外圍區域;半導體晶片4,係接置於該中介層3上並電性連接該中介層3之線路重佈層34的複數電性連接墊 35;以及封裝膠體60,係包覆該基板本體5、中介層3及半導體晶片4,並外露該第一導電柱54的端部。 Furthermore, the present invention provides a package structure having an interposer, as shown in FIG. 2K, which includes a substrate body 5 having opposing first and second surfaces 5a and 5b, the first surface 5a being a plurality of first electrical contact pads 5211, a plurality of second electrical contact pads 5212, and a first conductive pillar 54 disposed on each of the second electrical contact pads 5212; the interposer 3 includes a top surface 30a and The interposer body 30 of the bottom surface 30b, the circuit redistribution layer 34 disposed on the top surface 30a and having a plurality of electrical connection pads 35, and the plurality of through holes 32 extending through the top surface 30a and the bottom surface 30b of the interposer body 30, and The second conductive pillar 33 is disposed in each of the through holes 32, and the second conductive pillar 33 has a convex portion 330 protruding from the bottom surface 30b of the interposer body 30. The interposer 3 is formed by the convex portion 330. The second electrical contact pads 5211 are electrically connected to the peripheral region of the interposer 3; the semiconductor wafer 4 is electrically connected to the interposer 3 and electrically connected to the interposer. The plurality of electrical connection pads of the layer redistribution layer 34 of layer 3 And the encapsulant 60 covers the substrate body 5, the interposer 3, and the semiconductor wafer 4, and exposes the end of the first conductive pillar 54.

於前述之封裝結構中,可如第2H圖和第H’圖所示,該基板本體5可包括設置於該基板本體5之第一表面5a上且具對應該中介層3的開口530a之第一絕緣保護層53a,如第2H圖所示,或者,該基板本體5可包括設置於該基板本體5之第一表面5a上且具對應外露該第一電性接觸墊5211的開孔530a’之第一絕緣保護層53a’,如第2H’圖所示。 In the foregoing package structure, as shown in FIGS. 2H and H′, the substrate body 5 may include an opening 530a disposed on the first surface 5a of the substrate body 5 and having an interposer 3 corresponding thereto. An insulating protective layer 53a, as shown in FIG. 2H, or the substrate body 5 may include an opening 530a' disposed on the first surface 5a of the substrate body 5 and corresponding to the first electrical contact pad 5211. The first insulating protective layer 53a' is as shown in FIG. 2H'.

於前述之封裝結構中,可如第2I’圖所示,復包括底膠56,該底膠56係設置於該中介層3與基板本體5之間。 In the above package structure, as shown in FIG. 2I, a primer 56 is provided, and the primer 56 is disposed between the interposer 3 and the substrate body 5.

於前述之封裝結構中,可復包括設置於該半導體晶片4與中介層3之間的底膠(未圖示)。 In the above package structure, a primer (not shown) disposed between the semiconductor wafer 4 and the interposer 3 may be further included.

於前述之封裝結構中,如第2L圖所示,復包括接置於該第一導電柱上之電子元件,如另一封裝結構7,該封裝結構6係利用該第一導電柱54的端部以於該封裝結構6上接置並電性連接該另一封裝結構7。 In the foregoing package structure, as shown in FIG. 2L, the electronic component is placed on the first conductive pillar, such as another package structure 7, and the package structure 6 utilizes the end of the first conductive pillar 54. The other package structure 7 is connected and electrically connected to the package structure 6.

要補充說明的是,雖然本實施方式係以有核心(core)之基板本體做為例示說明,但無核心之基板本體同樣也可以應用在本創作中,而包含在本創作的申請專利範圍中;另外,雖然圖式中顯示本創作之中介層與基板本體間之電性連接、及中介層與半導體晶片間之電性連接係藉由焊球,但是該電性連接亦可藉由其他方式,而不以焊球為限。 It should be noted that although the embodiment is illustrated by a substrate having a core, the substrate body without a core can also be applied to the present invention, and is included in the patent application scope of the present application. In addition, although the figure shows the electrical connection between the interposer of the present creation and the substrate body, and the electrical connection between the interposer and the semiconductor wafer is by solder balls, the electrical connection can also be by other means. , not limited to solder balls.

綜上所述,本創作之具中介層之封裝基板係利用所述 中介層連接半導體晶片與基板本體,因而可作為訊號連接與應力緩衝之橋樑,並可防止在該半導體晶片與基板本體之間由於熱應力而導致破裂;其次,本創作之位於中介層本體的貫孔中之第二導電柱係凸出於中介層本體的底面,並電性連接該基板本體之第一電性接觸墊,該第二導電柱係使該中介層易於與基板本體電性連接;再者,本創作之位於中介層外圍區域之第一導電柱係垂直凸出於基板本體,使得封裝膠體於包覆半導體晶片、中介層及基板本體後而能外露該第一導電柱的端部,以與一封裝結構疊合而成為封裝堆疊結構。 In summary, the intervening package substrate of the present invention utilizes the The interposer connects the semiconductor wafer and the substrate body, thereby serving as a bridge between the signal connection and the stress buffer, and preventing cracking due to thermal stress between the semiconductor wafer and the substrate body. Secondly, the creation is located on the interposer body. The second conductive pillar in the hole protrudes from the bottom surface of the interposer body, and is electrically connected to the first electrical contact pad of the substrate body, and the second conductive pillar is configured to electrically connect the interposer to the substrate body; Furthermore, the first conductive pillar in the peripheral region of the interposer protrudes perpendicularly from the substrate body, so that the encapsulant can cover the end of the first conductive post after covering the semiconductor wafer, the interposer and the substrate body. To overlap with a package structure to form a package stack structure.

上述實施例係用以例示性說明本創作之原理及其功效,而非用於限制本創作。任何熟習此項技藝之人士均可在不違背本創作之精神及範疇下,對上述實施例進行修改。因此本創作之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the present invention and its effects, and are not intended to limit the present invention. Anyone who is familiar with the art may modify the above embodiments without departing from the spirit and scope of the creation. Therefore, the scope of protection of this creation should be as listed in the scope of patent application described later.

10‧‧‧封裝基板 10‧‧‧Package substrate

10a、21a、5a‧‧‧第一表面 10a, 21a, 5a‧‧‧ first surface

10b、21b、5b‧‧‧第二表面 10b, 21b, 5b‧‧‧ second surface

100‧‧‧覆晶焊墊 100‧‧‧Flip solder pad

101、212‧‧‧植球墊 101, 212‧‧‧ ball mat

102‧‧‧核心板 102‧‧‧ core board

11、55‧‧‧焊料凸塊 11, 55‧‧‧ solder bumps

12、4‧‧‧半導體晶片 12, 4‧‧‧ semiconductor wafer

120‧‧‧電極墊 120‧‧‧electrode pads

13、210、24‧‧‧焊球 13, 210, 24‧‧ ‧ solder balls

17、23、56‧‧‧底膠 17, 23, 56‧‧ ‧ primer

2a‧‧‧第一封裝結構 2a‧‧‧First package structure

2b‧‧‧第二封裝結構 2b‧‧‧Second package structure

20‧‧‧第一電子元件 20‧‧‧First electronic components

21‧‧‧第一基板 21‧‧‧First substrate

22‧‧‧第二基板 22‧‧‧second substrate

22a‧‧‧第三表面 22a‧‧‧ third surface

22b‧‧‧第四表面 22b‧‧‧Fourth surface

25‧‧‧第二電子元件 25‧‧‧Second electronic components

3‧‧‧中介層 3‧‧‧Intermediary

30‧‧‧中介層本體 30‧‧‧Intermediary layer ontology

30a、510a‧‧‧頂面 30a, 510a‧‧‧ top

30b、510b‧‧‧底面 30b, 510b‧‧‧ bottom

32‧‧‧貫孔 32‧‧‧Tongkong

33‧‧‧第二導電柱 33‧‧‧Second conductive column

330‧‧‧凸部 330‧‧‧ convex

34‧‧‧線路重佈層 34‧‧‧Line redistribution

35‧‧‧電性連接墊 35‧‧‧Electrical connection pads

5‧‧‧基板本體 5‧‧‧Substrate body

51‧‧‧核心層 51‧‧‧ core layer

510‧‧‧核心介電層 510‧‧‧core dielectric layer

5101‧‧‧導電通孔 5101‧‧‧Electrical through hole

511a‧‧‧第一線路層 511a‧‧‧First circuit layer

511b‧‧‧第二線路層 511b‧‧‧second circuit layer

52a‧‧‧第一增層結構 52a‧‧‧First buildup structure

520a‧‧‧第一介電層 520a‧‧‧First dielectric layer

521a‧‧‧第一增層線路層 521a‧‧‧First build-up circuit layer

52b‧‧‧第二增層結構 52b‧‧‧Second layered structure

520b‧‧‧第二介電層 520b‧‧‧Second dielectric layer

521b‧‧‧第二增層線路層 521b‧‧‧Second layered circuit layer

5211‧‧‧第一電性接觸墊 5211‧‧‧First electrical contact pad

5212‧‧‧第二電性接觸墊 5212‧‧‧Second electrical contact pads

5213‧‧‧第三電性接觸墊 5213‧‧‧ Third electrical contact pad

53a、53a’‧‧‧第一絕緣保護層 53a, 53a’‧‧‧ first insulating protective layer

530a‧‧‧開口 530a‧‧‧ openings

530b、530a’‧‧‧開孔 530b, 530a’‧‧‧ openings

53b‧‧‧第二絕緣保護層 53b‧‧‧Second insulation protection layer

54‧‧‧第一導電柱 54‧‧‧First conductive column

60‧‧‧封裝膠體 60‧‧‧Package colloid

6、7‧‧‧封裝結構 6, 7‧‧‧ package structure

第1A圖係為習知覆晶式封裝結構之剖視圖;第1B圖係為習知封裝堆疊結構之剖視圖;以及第2A至2L圖為本創作之具中介層之封裝基板及其製法暨其應用例之剖視圖,第2H’圖為第2H圖之一實施態樣之剖視圖,第2I’圖為第2I圖之一實施態樣之剖視圖。 1A is a cross-sectional view of a conventional flip-chip package structure; FIG. 1B is a cross-sectional view of a conventional package stack structure; and 2A to 2L are diagrams of a package substrate with an interposer and a method for fabricating the same and application thereof In the cross-sectional view of the example, the 2H' is a cross-sectional view of an embodiment of the 2Hth, and the 2I' is a cross-sectional view of an embodiment of the 2I.

3‧‧‧中介層 3‧‧‧Intermediary

30‧‧‧中介層本體 30‧‧‧Intermediary layer ontology

30a、510a‧‧‧頂面 30a, 510a‧‧‧ top

30b、510b‧‧‧底面 30b, 510b‧‧‧ bottom

32‧‧‧貫孔 32‧‧‧Tongkong

33‧‧‧第二導電柱 33‧‧‧Second conductive column

330‧‧‧凸部 330‧‧‧ convex

34‧‧‧線路重佈層 34‧‧‧Line redistribution

35‧‧‧電性連接墊 35‧‧‧Electrical connection pads

5‧‧‧基板本體 5‧‧‧Substrate body

5a‧‧‧第一表面 5a‧‧‧ first surface

5b‧‧‧第二表面 5b‧‧‧ second surface

51‧‧‧核心層 51‧‧‧ core layer

510‧‧‧核心介電層 510‧‧‧core dielectric layer

5101‧‧‧導電通孔 5101‧‧‧Electrical through hole

511a‧‧‧第一線路層 511a‧‧‧First circuit layer

511b‧‧‧第二線路層 511b‧‧‧second circuit layer

52a‧‧‧第一增層結構 52a‧‧‧First buildup structure

520a‧‧‧第一介電層 520a‧‧‧First dielectric layer

521a‧‧‧第一增層線路層 521a‧‧‧First build-up circuit layer

52b‧‧‧第二增層結構 52b‧‧‧Second layered structure

520b‧‧‧第二介電層 520b‧‧‧Second dielectric layer

521b‧‧‧第二增層線路層 521b‧‧‧Second layered circuit layer

5211‧‧‧第一電性接觸墊 5211‧‧‧First electrical contact pad

5212‧‧‧第二電性接觸墊 5212‧‧‧Second electrical contact pads

5213‧‧‧第三電性接觸墊 5213‧‧‧ Third electrical contact pad

53a‧‧‧第一絕緣保護層 53a‧‧‧First insulation protection layer

530a‧‧‧開口 530a‧‧‧ openings

53b‧‧‧第二絕緣保護層 53b‧‧‧Second insulation protection layer

530b‧‧‧開孔 530b‧‧‧Opening

54‧‧‧第一導電柱 54‧‧‧First conductive column

55‧‧‧焊料凸塊 55‧‧‧ solder bumps

Claims (10)

一種具中介層之封裝基板,係包括:基板本體,係具有相對之第一表面與第二表面,該第一表面係具有複數第一電性接觸墊、複數第二電性接觸墊、及設置於各該第二電性接觸墊上之第一導電柱;以及中介層,係包含具有頂面與底面之中介層本體、設置於該頂面上且表面具有複數電性連接墊之線路重佈層、貫穿該中介層本體頂面與底面之複數貫孔、及設置於各該貫孔中之第二導電柱,且該第二導電柱係具有突出於該中介層本體的底面之凸部,該中介層係藉由該凸部電性連接該第一電性接觸墊,該等第二電性接觸墊係位於該中介層之外圍區域。 A package substrate with an interposer includes: a substrate body having opposite first and second surfaces, the first surface having a plurality of first electrical contact pads, a plurality of second electrical contact pads, and a setting a first conductive pillar on each of the second electrical contact pads; and an interposer comprising an interposer body having a top surface and a bottom surface, and a circuit redistribution layer disposed on the top surface and having a plurality of electrical connection pads on the surface a plurality of through holes penetrating the top surface and the bottom surface of the interposer body, and a second conductive post disposed in each of the through holes, and the second conductive post has a convex portion protruding from a bottom surface of the interposer body, The interposer is electrically connected to the first electrical contact pad by the protrusion, and the second electrical contact pads are located in a peripheral region of the interposer. 如申請專利範圍第1項所述之具中介層之封裝基板,其中,該基板本體復包括絕緣保護層,其係設置於該基板本體之第一表面上,且具有對應該中介層的開口。 The package substrate with an interposer as described in claim 1, wherein the substrate body further comprises an insulating protective layer disposed on the first surface of the substrate body and having an opening corresponding to the interposer. 如申請專利範圍第1項所述之具中介層之封裝基板,其中,該基板本體復包括絕緣保護層,其係設置於該基板本體之第一表面上,且具有對應外露該第一電性接觸墊的開孔。 The package substrate of the interposer of claim 1, wherein the substrate body further comprises an insulating protective layer disposed on the first surface of the substrate body and having the corresponding first electrical property The opening of the contact pad. 如申請專利範圍第1項所述之具中介層之封裝基板,復包括底膠,係設置於該中介層與基板本體之間。 The package substrate with an interposer as described in claim 1 further comprises a primer disposed between the interposer and the substrate body. 一種具中介層之封裝結構,係包括:基板本體,係具有相對之第一表面與第二表面,該 第一表面係具有複數第一電性接觸墊、複數第二電性接觸墊、及設置於各該第二電性接觸墊上之第一導電柱;中介層,係包含具有頂面與底面之中介層本體、設置於該頂面上且表面具有複數電性連接墊之線路重佈層、貫穿該中介層本體頂面與底面之複數貫孔、及設置於各該貫孔中之第二導電柱,且該第二導電柱係具有突出於該中介層本體的底面之凸部,該中介層係藉由該凸部電性連接該第一電性接觸墊,該等第二電性接觸墊係位於該中介層之外圍區域;半導體晶片,係接置於該中介層上並電性連接該中介層之線路重佈層的複數電性連接墊;以及封裝膠體,係包覆該基板本體、中介層及半導體晶片,並外露該第一導電柱的端部。 The package structure with an interposer includes: a substrate body having opposite first and second surfaces, The first surface has a plurality of first electrical contact pads, a plurality of second electrical contact pads, and a first conductive pillar disposed on each of the second electrical contact pads; the interposer includes an intermediary having a top surface and a bottom surface a layer body, a circuit redistribution layer disposed on the top surface and having a plurality of electrical connection pads on the surface, a plurality of through holes penetrating through the top surface and the bottom surface of the interposer body, and a second conductive column disposed in each of the through holes And the second conductive pillar has a convex portion protruding from a bottom surface of the interposer body, and the interposer is electrically connected to the first electrical contact pad by the convex portion, and the second electrical contact pads are a semiconductor wafer, a plurality of electrical connection pads disposed on the interposer and electrically connected to the circuit redistribution layer of the interposer; and an encapsulant that encapsulates the substrate body and the interposer a layer and a semiconductor wafer, and exposing an end of the first conductive pillar. 如申請專利範圍第5項所述之具中介層之封裝結構,其中,該基板本體復包括絕緣保護層,其係設置於該基板本體之第一表面上,且具有對應該中介層的開口。 The package structure with an interposer as described in claim 5, wherein the substrate body further comprises an insulating protective layer disposed on the first surface of the substrate body and having an opening corresponding to the interposer. 如申請專利範圍第5項所述之具中介層之封裝結構,其中,該基板本體復包括絕緣保護層,其係設置於該基板本體之第一表面上,且具有對應外露該第一電性接觸墊的開孔。 The package structure of the interposer according to claim 5, wherein the substrate body further comprises an insulating protective layer disposed on the first surface of the substrate body and having the corresponding first electrical property The opening of the contact pad. 如申請專利範圍第5項所述之具中介層之封裝結構,復包括底膠,其係設置於該中介層與基板本體之間。 The package structure with an interposer as described in claim 5, further comprising a primer disposed between the interposer and the substrate body. 如申請專利範圍第5項所述之具中介層之封裝結構,復包括底膠,其係設置於該半導體晶片與中介層之間。 The encapsulation structure with an interposer as described in claim 5, further comprising a primer disposed between the semiconductor wafer and the interposer. 如申請專利範圍第5項所述之具中介層之封裝結構,復包括電子元件,係接置於該第一導電柱上。 The encapsulation structure with an interposer as described in claim 5, further comprising an electronic component attached to the first conductive post.
TW101211735U 2012-06-18 2012-06-18 Package substrate having interposer and package structure having the substrate TWM455255U (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105323948A (en) * 2014-07-31 2016-02-10 恒劲科技股份有限公司 Interposer substrate and method of manufacturing the same
TWI549236B (en) * 2014-12-26 2016-09-11 恆勁科技股份有限公司 Package stack structure
TWI556363B (en) * 2014-01-02 2016-11-01 矽品精密工業股份有限公司 Semiconductor device and manufacturing method thereof
TWI566331B (en) * 2015-08-14 2017-01-11 恆勁科技股份有限公司 Package module and its substrate structure
CN106469705A (en) * 2015-08-14 2017-03-01 恒劲科技股份有限公司 Package module and its board structure
TWI632624B (en) * 2014-06-17 2018-08-11 矽品精密工業股份有限公司 Packaging substrate and method for fabricating the same
TWI727996B (en) * 2015-12-18 2021-05-21 美商英特爾Ip公司 Interposer with conductive routing exposed on sidewalls
TWI802210B (en) * 2021-02-18 2023-05-11 台灣積體電路製造股份有限公司 Package structure and method for manufacturing the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI556363B (en) * 2014-01-02 2016-11-01 矽品精密工業股份有限公司 Semiconductor device and manufacturing method thereof
TWI632624B (en) * 2014-06-17 2018-08-11 矽品精密工業股份有限公司 Packaging substrate and method for fabricating the same
CN105323948A (en) * 2014-07-31 2016-02-10 恒劲科技股份有限公司 Interposer substrate and method of manufacturing the same
CN105323948B (en) * 2014-07-31 2018-04-13 恒劲科技股份有限公司 Interposer substrate and method of manufacturing the same
TWI549236B (en) * 2014-12-26 2016-09-11 恆勁科技股份有限公司 Package stack structure
TWI566331B (en) * 2015-08-14 2017-01-11 恆勁科技股份有限公司 Package module and its substrate structure
CN106469705A (en) * 2015-08-14 2017-03-01 恒劲科技股份有限公司 Package module and its board structure
CN106469705B (en) * 2015-08-14 2019-02-05 恒劲科技股份有限公司 Package module and its board structure
TWI727996B (en) * 2015-12-18 2021-05-21 美商英特爾Ip公司 Interposer with conductive routing exposed on sidewalls
TWI802210B (en) * 2021-02-18 2023-05-11 台灣積體電路製造股份有限公司 Package structure and method for manufacturing the same
US11842935B2 (en) 2021-02-18 2023-12-12 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming a reconstructed package substrate comprising substrates blocks

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