TWI772601B - How to set the cutting device - Google Patents
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- TWI772601B TWI772601B TW108102468A TW108102468A TWI772601B TW I772601 B TWI772601 B TW I772601B TW 108102468 A TW108102468 A TW 108102468A TW 108102468 A TW108102468 A TW 108102468A TW I772601 B TWI772601 B TW I772601B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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Abstract
[課題]適當地導出切割單元的基準位置。[解決手段]一種切割裝置的設定方法,切割裝置具備設定單元,以在卡盤台及切割刀片之間的通電被檢測到時,檢測切割單元的位置,切割裝置的設定方法為使用該切割裝置,以將檢測該切割刀片接觸該卡盤台時該切割單元的位置作為基準位置,其中,該切割裝置的設定方法具有:暫時基準位置登錄步驟,使該切割單元移動,將檢測到該通電時的位置登錄作為暫時基準位置;及接觸痕判定步驟,判定有無該切割刀片的接觸痕,在該接觸痕判定步驟中判定具有該接觸痕的情況下,實施基準位置設定步驟,將該暫時基準位置設定為該基準位置,而在該接觸痕判定步驟中判定無該接觸痕的情況下,再次實施該暫時基準位置登錄步驟及該接觸痕判定步驟。[Problem] Appropriately derive the reference position of the cutting unit. [Solution] A method for setting a dicing device including a setting unit for detecting a position of the dicing unit when energization between a chuck table and a dicing blade is detected, and a method for setting the dicing device using the dicing device , taking the position of the cutting unit when it is detected that the cutting blade contacts the chuck table as the reference position, wherein, the setting method of the cutting device has: a step of temporarily registering the reference position, making the cutting unit move, and detecting when the power is turned on The position of the dicing blade is registered as a temporary reference position; and a contact mark determination step is to determine whether there is a contact mark of the cutting blade, and if it is determined that the contact mark is present in the contact mark determination step, a reference position setting step is performed to set the temporary reference position. The reference position is set, and when it is determined that there is no contact mark in the contact mark determination step, the temporary reference position registration step and the contact mark determination step are performed again.
Description
本發明關於一種以切割刀片切割工件的切割裝置的設定方法。The present invention relates to a setting method of a cutting device for cutting a workpiece with a cutting blade.
搭載有半導體元件的元件晶片是將半導體晶圓或封裝基板等分割而形成。藉由交叉的多條分割預定線劃分半導體晶圓等的正面,在所劃分的各區域中形成半導體元件,之後,沿著分割預定線將該半導體晶圓等進行分割即可形成各個元件晶片。The element wafer on which the semiconductor element is mounted is formed by dividing a semiconductor wafer, a package substrate, or the like. The front surface of a semiconductor wafer or the like is divided by a plurality of intersecting planned dividing lines, semiconductor elements are formed in the divided regions, and then the semiconductor wafer or the like is divided along the planned dividing lines to form individual element wafers.
半導體晶圓等的分割,例如可使用具備切割單元的切割裝置,切割單元還裝設有圓環狀切割刀片。切割裝置中使切割刀片在相對於半導體晶圓等工件的正面垂直的平面上旋轉,並使切割刀片下降至切入進給方向的預定高度位置,將工件在沿著分割預定線的方向上加工進給而以切割刀片切割工件。For the division of semiconductor wafers and the like, for example, a dicing device including a dicing unit can be used, and the dicing unit is further equipped with an annular dicing blade. In the dicing device, the dicing blade is rotated on a plane perpendicular to the front surface of the workpiece such as a semiconductor wafer, and the dicing blade is lowered to a predetermined height position in the incision feeding direction, and the workpiece is processed in the direction along the predetermined dividing line. Instead, the cutting blade is used to cut the workpiece.
將工件進行切割時,以使切割刀片的刀刃的下端位於適當的高度位置的方式將該切割單元定位於基準位置,此點十分重要。該基準位置例如為使切割刀片的刀刃的下端對準保持工件的卡盤台的保持面的高度位置時,切割單元的高度位置(在切入進給方向上的位置)。在實施切割之前,實施導出該基準位置的設定程序。When cutting a workpiece, it is important to position the cutting unit at a reference position so that the lower end of the cutting edge of the cutting blade is positioned at an appropriate height. The reference position is, for example, the height position of the cutting unit (position in the cutting feed direction) when the lower end of the cutting edge of the cutting blade is aligned with the height position of the holding surface of the chuck table holding the workpiece. Before performing cutting, a setting program for deriving the reference position is performed.
設定程序中,例如,在使切割刀片旋轉的狀態下使切割單元逐漸下降,使切割刀片接觸卡盤台的保持面。卡盤台與切割刀片接觸時切割單元在切入進給方向上的位置成為切割單元的基準位置。卡盤台與切割刀片的接觸,例如可藉由監測兩者之間有無通電來檢測(參照專利文獻1及專利文獻2)。In the setting procedure, for example, the dicing unit is gradually lowered while the dicing blade is rotated, and the dicing blade is brought into contact with the holding surface of the chuck table. The position of the cutting unit in the cutting feed direction when the chuck table is in contact with the cutting blade becomes the reference position of the cutting unit. Contact between the chuck table and the dicing blade can be detected, for example, by monitoring the presence or absence of energization between the two (see Patent Document 1 and Patent Document 2).
[習知技術文獻] [專利文獻] [專利文獻1] 日本實開平7-10552號公報 [專利文獻2] 日本特開2010-251577號公報[Previously known technical literature] [Patent Literature] [Patent Document 1] Japanese Patent Application Laid-Open No. 7-10552 [Patent Document 2] Japanese Patent Application Laid-Open No. 2010-251577
[發明所欲解決的課題] 另外,當以切割刀片切割工件時,會從工件產生切割屑而飛散。又,因工件與切割刀片之間的摩擦而產生加工熱。於是,在以切割刀片切割工件時對工件或切割刀片供給純水等的切割液。因切割所產生的加工屑被切割液帶走而去除,又,藉由該切割液將切割刀片及工件冷卻。另一方面,若使用切割液,則有該切割液附著於切割刀片或卡盤台而殘留的情況。[Problems to be solved by the invention] In addition, when the workpiece is cut with the dicing blade, cutting chips are generated from the workpiece and scattered. Also, processing heat is generated due to friction between the workpiece and the cutting blade. Then, when the workpiece is cut with the dicing blade, a cutting liquid such as pure water is supplied to the workpiece or the dicing blade. Machining chips generated by cutting are taken away by the cutting liquid and removed, and the cutting blade and the workpiece are cooled by the cutting liquid. On the other hand, when a dicing liquid is used, the dicing liquid may adhere to the dicing blade or the chuck table and remain.
若該切割液附著於切割刀片或卡盤台,則在設定程序中,在切割單元到達應為基準位置高度之前,會有切割刀片與卡盤台透過切割液而通電的情況。若檢測到透過切割液的傳導,就會導出不適當的位置作為切割單元的基準位置。If the cutting liquid adheres to the cutting blade or the chuck table, the cutting blade and the chuck table may be energized through the cutting liquid before the cutting unit reaches the height that should be the reference position in the setting program. If conduction through the cutting fluid is detected, an inappropriate position is derived as the reference position of the cutting unit.
該基準位置是決定以切割刀片進行切割加工的精確度的非常重要的基準,若將不適當的高度位置登錄作為切割單元的基準位置,則有無法以切割刀片適當切割工件的情況。This reference position is a very important reference for determining the accuracy of the cutting process by the cutting blade. If an inappropriate height position is registered as the reference position of the cutting unit, the workpiece may not be properly cut with the cutting blade.
本發明為鑑於此問題點而完成,其目的在於提供一種可適當地導出切割單元的基準位置的切割裝置的設定方法。The present invention has been made in view of this problem, and an object thereof is to provide a method of setting a cutting device that can appropriately derive the reference position of the cutting unit.
[解決課題的技術手段] 根據本發明的一態樣,可提供一種切割裝置的設定方法,切割裝置具備:卡盤台,具有保持面,以將工件保持於該保持面上;切割單元,以切割刀片切割保持於該卡盤台上的工件,同時對該工件及該切割刀片供給切割液;切入進給單元,使該切割單元在與該保持面垂直的切入進給方向上移動;攝影機,拍攝保持於該卡盤台上的工件;及設定單元,能夠檢測該卡盤台及該切割刀片之間的通電,且在藉由該切入進給單元使該切割單元移動而該通電被檢測到時,能夠檢測該切割單元在該切入進給方向上的位置,該切割裝置的設定方法為在該切割裝置中,將該切割刀片接觸該卡盤台時該切割單元的位置導出作為基準位置,其中,該切割裝置的設定方法具備:暫時基準位置登錄步驟,使該切割單元朝向該保持面而在該切入進給方向上移動,將檢測到該切割刀片及該卡盤台之間的通電時該切割單元在該切入進給方向上的位置登錄作為暫時基準位置;及接觸痕判定步驟,在實施該暫時基準位置登錄步驟後,以該攝影機拍攝該保持面,判定有無因該切割刀片與該卡盤台的接觸而在該保持面上形成的接觸痕,在該接觸痕判定步驟中判定具有該接觸痕的情況下,實施基準位置設定步驟,將該暫時基準位置設定為該基準位置,在該接觸痕判定步驟中判定無該接觸痕的情況下,再次實施該暫時基準位置登錄步驟及該接觸痕判定步驟。[Technical means to solve the problem] According to an aspect of the present invention, a method for setting a cutting device can be provided, wherein the cutting device includes: a chuck table having a holding surface for holding a workpiece on the holding surface; and a cutting unit for cutting and holding a workpiece on the chuck with a cutting blade The workpiece on the disc table, while supplying cutting liquid to the workpiece and the cutting blade; cutting into the feeding unit, so that the cutting unit moves in the cutting and feeding direction perpendicular to the holding surface; the camera, shooting and holding on the chuck table and a setting unit capable of detecting the energization between the chuck table and the cutting blade, and when the energization is detected when the cutting unit is moved by the plunging feed unit, the cutting unit can be detected At the position in the cutting feed direction, the setting method of the cutting device is that in the cutting device, the position of the cutting unit when the cutting blade contacts the chuck table is derived as a reference position, wherein the setting of the cutting device The method includes a step of temporarily registering a reference position, moving the cutting unit in the cutting feed direction toward the holding surface, and detecting that the cutting unit is in the cutting feed direction when energization between the cutting blade and the chuck table is detected. Register the position in the direction as a temporary reference position; and a contact mark determination step, after the temporary reference position registration step is performed, the holding surface is photographed with the camera to determine whether there is a contact mark between the cutting blade and the chuck table. When it is determined that the contact trace formed on the holding surface has the contact trace in the contact trace determination step, a reference position setting step is performed, the temporary reference position is set as the reference position, and it is determined in the contact trace determination step. When there is no contact trace, the temporary reference position registration step and the contact trace determination step are performed again.
較佳地,在該接觸痕判定步驟中判定無該接觸痕的情況下,於再次實施該暫時基準位置登錄步驟之前,實施噴吹氣體步驟,對該保持面吹氣以將附著於該保持面上的該切割液去除。Preferably, when it is determined in the contact mark determination step that there is no contact mark, before the temporary reference position registration step is performed again, a gas blowing step is performed to blow air to the holding surface to adhere to the holding surface. The cutting fluid on it is removed.
[發明功效] 涉及本發明的一態樣的切割裝置的設定方法,為實施暫時基準位置登錄步驟,將檢測到切割刀片及卡盤台之間的通電時切割單元的高度位置(在切入進給方向上的位置)登錄作為暫時基準位置。[Inventive effect] According to a method for setting a cutting device according to an aspect of the present invention, in order to perform the temporary reference position registration step, the height position (position in the cutting feed direction) of the cutting unit when energization between the cutting blade and the chuck table is detected is detected. ) is registered as a temporary reference position.
將切割單元定位於應為基準位置的高度位置,切割刀片與卡盤台接觸而檢測到兩者之間的通電時,因切割刀片稍微切割卡盤台的保持面,而在該保持面形成接觸痕。另一方面,保持面附著有切割液而透過該切割液檢測到通電的情況下,切割單元未到達應為基準位置的高度位置而未切割卡盤台的保持面,故未在該保持面形成接觸痕。The cutting unit is positioned at a height that should be the reference position, and when the cutting blade is in contact with the chuck table and the energization between the two is detected, the cutting blade slightly cuts the holding surface of the chuck table and makes contact with the holding surface. mark. On the other hand, when the cutting liquid adheres to the holding surface and the energization is detected through the cutting liquid, the cutting unit does not reach the height position that should be the reference position and does not cut the holding surface of the chuck table, so no formation is formed on the holding surface. contact marks.
於是,在本發明的一態樣中實施接觸痕判定步驟,以攝影機拍攝卡盤台的保持面,判定有無切割刀片的接觸痕。在判定該保持面具有接觸痕的情況下,確認已藉由暫時基準位置登錄步驟而適當實施設定程序,故實施基準位置設定步驟,將已登錄的暫時基準位置設定為基準位置。Then, in one aspect of the present invention, a contact mark determination step is implemented, the holding surface of the chuck table is photographed with a camera, and the presence or absence of contact marks of the dicing blade is determined. When it is determined that the holding surface has a contact mark, it is confirmed that the setting procedure has been appropriately performed by the temporary reference position registration step, and the reference position setting step is executed to set the registered temporary reference position as the reference position.
另一方面,在判定該保持面無接觸痕的情況下,確認未適當實施設定程序,故再次實施暫時基準位置登錄步驟及接觸痕判定步驟。On the other hand, when it is determined that there is no contact mark on the holding surface, it is confirmed that the setting program has not been properly implemented, so the temporary reference position registration step and the contact mark determination step are performed again.
如上所述,可藉由判定有無形成於該保持面的該接觸痕而適當實施設定程序,進而可適當地導出切割單元的基準位置。As described above, by determining the presence or absence of the contact trace formed on the holding surface, the setting program can be appropriately performed, and the reference position of the cutting unit can be appropriately derived.
因此,根據本發明之一態樣,提供一種切割裝置的設定方法,可適當地導出切割單元的基準位置。Therefore, according to an aspect of the present invention, there is provided a method for setting a cutting device that can appropriately derive the reference position of the cutting unit.
參照圖式對涉及本發明的一態樣的實施方式進行說明。首先,使用圖1對實施涉及本實施方式的設定方法的切割裝置、及被該切割裝置進行切割的工件進行說明。圖1為示意性地表示切割裝置及工件的立體圖。工件1例如為由矽、SiC(碳化矽)、或其他半導體等的材料、或是藍寶石、玻璃、石英等的材料所構成的略圓板狀基板等。Embodiments related to one aspect of the present invention will be described with reference to the drawings. First, the cutting apparatus which implements the setting method concerning this embodiment, and the workpiece|work cut by this cutting apparatus are demonstrated using FIG. 1. FIG. FIG. 1 is a perspective view schematically showing a cutting device and a workpiece. The workpiece 1 is, for example, a substantially disk-shaped substrate or the like made of materials such as silicon, SiC (silicon carbide), or other semiconductor materials, or materials such as sapphire, glass, and quartz.
以排列成網格狀的多條分割預定線劃分工件1的正面,在所劃分的各區域中形成IC等的元件。最終沿著該分割預定線將工件1分割,藉此形成各個元件晶片。例如,將工件1保持於貼在環狀框架3的膠膜5上,在與框架3、膠膜5形成一體的框架單元的狀態下進行切割。適當切割工件1的情況下,下述切割刀片的刀刃的下端會到達該膠膜5。The front surface of the workpiece 1 is divided by a plurality of planned division lines arranged in a grid shape, and elements such as ICs are formed in the divided regions. Finally, the workpiece 1 is divided along the planned dividing line, whereby each element wafer is formed. For example, the workpiece 1 is held on the
接著,對切割裝置進行說明。如圖1所示,切割裝置2具備支撐各構成要件的裝置基台4。在裝置基台4的中央上部配設有X軸移動台6、及使該X軸移動台6在加工進給方向(X軸方向)上移動的加工進給單元(未圖示)。在該X軸移動台6的上部的端部安裝有覆蓋該加工進給單元的防塵防滴蓋8。Next, the cutting device will be described. As shown in FIG. 1 , the
在X軸移動台6上設有用以吸引保持工件1的卡盤台10。卡盤台10具備形成有向上方開口的凹部的圓盤狀框體10c、及配設於該凹部內的多孔質構件,該多孔質構件的上表面成為吸引、保持工件1的保持面10a。該多孔質構件透過形成於卡盤台10內部的流路(未圖示)與吸引源(未圖示)連接。將工件1載置於該保持面10a上,施加負壓即可吸引保持工件1。The X-axis moving table 6 is provided with a chuck table 10 for sucking and holding the workpiece 1 . The chuck table 10 includes a disk-
在該保持面10a的周圍配設有夾具10b,其用以固定透過膠膜5保持該工件1的環狀框架3。卡盤台10與馬達等的旋轉驅動源(未圖示)連結,而可繞著與該保持面10a垂直的旋轉軸旋轉。又,藉由上述加工進給單元將卡盤台10送至加工進給方向(X軸方向)。A
在裝置基台4的前部配設有可載置容納工件1的卡匣12a的卡匣載置台12。切割裝置2具備搬送單元(未圖示),其在載置於卡匣載置台12的卡匣12a與卡盤台10之間搬送工件1。In the front part of the apparatus base 4, the
在裝置基台4的上表面,以在X軸移動台6的上方突出的方式配置有支撐部16,以支撐切割工件1的切割單元14。在支撐部16的前面配設有使切割單元14在分度進給方向(Y軸方向)上移動的分度進給單元18a。On the upper surface of the apparatus base 4 , a
分度進給單元18a具備配置於支撐部16的前面且與Y軸方向平行的一對Y軸導軌20。Y軸移動板22可滑動地安裝於Y軸導軌20上。在Y軸移動板22的背面側(後面側)設有螺帽部(未圖示),與Y軸導軌20平行的Y軸滾珠螺桿24螺合於該螺帽部。The
在Y軸滾珠螺桿24的一端部上連結有Y軸脈衝馬達(未圖示)。若以Y軸脈衝馬達使Y軸滾珠螺桿24旋轉,則Y軸移動板22沿著Y軸導軌20在分度進給方向上移動。在Y軸移動板22的正面(前面)配設有使切割單元14在切入進給方向(Z軸方向)上移動的切入進給單元18b。A Y-axis pulse motor (not shown) is connected to one end of the Y-
在Y軸移動板22的表面設有與Z軸方向平行的一對Z軸導軌26。Z軸移動板28可滑動地安裝於各Z軸導軌26上。A pair of Z-axis guide rails 26 parallel to the Z-axis direction are provided on the surface of the Y-
在Z軸移動板28的背面側(後面側)設有螺帽部(未圖示),與Z軸導軌26平行的Z軸滾珠螺桿30螺合於該螺帽部。在Z軸滾珠螺桿30的一端部上連結有Z軸脈衝馬達32。若以Z軸脈衝馬達32使Z軸滾珠螺桿30旋轉,則Z軸移動板28沿著Z軸導軌26在切入進給方向上移動。A nut portion (not shown) is provided on the back side (rear side) of the Z-
在Z軸移動板28的前面下部固定有將保持於卡盤台10上的工件1進行切割的切割單元14、及可拍攝該工件1的攝影機(攝像單元)34。若使Y軸移動板22在Y軸方向上移動,則切割單元14及攝影機34在分度進給方向上移動,若使Z軸移動板28在Z軸方向上移動,則切割單元14及攝影機34在切入進給方向上移動。A cutting
切割單元14具備構成與Y軸方向平行的旋轉軸的主軸40(參照圖2(A))、及裝設於該主軸40的一端側的圓環狀切割刀片36。在主軸40的另一端側連結有馬達等的旋轉驅動源42(參照圖2(A)),若使旋轉驅動源42運作,則可使裝設於主軸40的切割刀片36旋轉。在切割刀片36的外周部固定有用以切入工件1的環狀切割刀刃。The cutting
當以切割刀片36切割工件1時,會從工件1產生切割屑,在工件1上或切割裝置2的內部飛散而成為汙染源。又,由於工件1與切割刀片36之間的摩擦而產生加工熱,進而有對切割刀片36或工件1造成損傷的疑慮。於是,在切割工件1時,對切割刀片36及工件1供給切割液。When the workpiece 1 is cut with the
在切割刀片36的附近配設有對該切割刀片36及工件1供給該切割液的切割液供給噴嘴50(參照圖4)。因切割所產生的加工屑被切割液帶走而去除,故可抑制工件1或切割裝置2的汙染。又,可藉由該切割液將切割刀片36及工件1冷卻,故可抑制切割刀片36或工件1的損傷。該切割液例如為純水或添加有界面活性劑等的水。A cutting liquid supply nozzle 50 (see FIG. 4 ) for supplying the cutting liquid to the
如圖1所示,在裝置基台4的上表面後部配設有清洗經切割的工件1的清洗單元38。清洗單元38具備保持工件1的清洗台38a、及對保持於清洗台38a的工件1供給清洗液以清洗工件1的清洗噴嘴38b。As shown in FIG. 1 , a
在藉由切割單元14切割工件1時,首先,將框架單元狀態的工件1載置於卡盤台10的保持面10a上,對工件1施加負壓以使工件1吸引保持於卡盤台10上。此時,藉由夾具10b把持框架單元的框架3。When the workpiece 1 is cut by the cutting
接著,使卡盤台10在加工進給方向上移動,並藉由攝影機34拍攝保持於卡盤台10上的工件1的上表面,以確認工件1的分割預定線的位置。然後,調整切割單元14及卡盤台10的相對位置,以能夠沿著該分割預定線將工件1進行切割加工。Next, the chuck table 10 is moved in the machining feed direction, and the upper surface of the workpiece 1 held on the chuck table 10 is photographed by the
之後,使切割刀片36在卡盤台10的外周側的上方旋轉,並使切入進給單元18b運作以使切割單元14下降至以基準位置為基準的預定高度位置。此處,基準位置為切割刀片36接觸卡盤台10時切割單元14在切入進給方向(Z軸方向)上的位置。接著,當使加工進給單元運作以使卡盤台10在加工進給方向上移動,而切割刀片36切入工件1時,就會將工件1進行切割。Then, the
沿著一條分割預定線切割工件1後,藉由分度進給單元18a使切割單元14在分度進給方向上移動,再陸續沿著其他分割預定線切割工件1。在沿著排列於一個方向的全部分割預定線切割工件1後,使卡盤台10繞著與保持面10a垂直的軸旋轉,並沿著依照其他方向排列的分割預定線切割工件1。然後,若沿著全部分割預定線切割工件1,則切割加工完成。After cutting the workpiece 1 along one planned dividing line, the cutting
切割裝置2進一步具備設定單元44(參照圖2(A)),其實施在開始工件1的切割加工之前導出切割單元的基準位置的設定程序。此外,設定單元44亦可具備控制切割裝置2的各構成的控制單元(未圖示)。設定單元44透過主軸40(參照圖2(A))與切割刀片36電性連接,又,與卡盤台10的框體10c電性連接。The
設定程序中,使切割刀片36一邊旋轉一邊朝向保持面10a而在該切入進給方向上移動,以使該切割刀片36接觸卡盤台10的框體10c。該設定單元44藉由檢測切割刀片36與卡盤台10之間的通電而檢測兩者的接觸。然後,將檢測到切割刀片36與卡盤台10的接觸時切割單元14在切入進給方向上的位置登錄作為基準位置。In the setting procedure, the
然而,例如,在切割工件1時所供給的切割液殘留於卡盤台10的保持面10a上的情況下,在實施設定程序時,會有切割刀片36與卡盤台10透過該切割液而通電的情況。此情況下,儘管切割刀片36的刀刃的下端未到達卡盤台10,但是設定單元44檢測到兩者的接觸,而登錄不適當的位置作為基準位置。However, for example, when the cutting liquid supplied when cutting the workpiece 1 remains on the holding
於是,涉及本實施方式的切割裝置2的設定方法中,為檢測由切割刀片36對卡盤台10的接觸而形成於保持面10a的接觸痕。然後,確認切割刀片36與卡盤台10有接觸而適當地導出切割單元14的基準位置。以下,對涉及本實施方式的切割裝置2的設定方法進行詳細敘述。Therefore, in the setting method of the
該設定方法具備暫時基準位置登錄步驟,將檢測到切割刀片36及卡盤台10之間的通電時切割單元14在該切入進給方向上的位置登錄作為暫時基準位置。使用圖2(A)對暫時基準位置登錄步驟進行說明。圖2(A)為示意性地表示暫時基準位置登錄步驟的剖面圖。This setting method includes a temporary reference position registration step, and registers the position of the cutting
暫時基準位置登錄步驟中,首先,以將切割刀片36定位於卡盤台10的框體10c上方的方式使X軸移動台6移動,又,使分度進給單元18a運作。接著,使切入進給單元18b運作,並使切割單元14朝向保持面10a在切入進給方向上移動。In the temporary reference position registration step, first, the X-axis moving table 6 is moved so that the
此時,使設定單元44監測切割刀片36與卡盤台10之間有無通電。然後,在觀測到兩者的通電時,將切割單元14的高度位置登錄作為暫時基準位置。例如,設定單元44可具備暫時基準位置登錄部(未圖示),將該暫時基準位置登錄於暫時基準位置登錄部。此外,該暫時基準位置登錄部可配設於控制切割裝置2的控制單元(未圖示)。At this time, the setting
接著,實施接觸痕判定步驟。圖2(B)為示意性地表示接觸痕判定步驟的剖面圖。使用圖2(B)對接觸痕判定步驟進行說明。接觸痕判定步驟中,使攝影機34移動至保持面10a的欲使切割刀片36接觸的區域上方,並以攝影機34拍攝保持面10a。然後,判定有無形成於保持面10a的切割刀片36的接觸痕。Next, a contact trace determination step is performed. FIG. 2(B) is a cross-sectional view schematically showing a contact trace determination step. The contact trace determination procedure will be described with reference to FIG. 2(B). In the contact mark determination step, the
圖3為示意性地表示接觸痕判定步驟的俯視圖。如圖3所示,藉由先前實施的設定程序在卡盤台10的框體10c上形成有接觸痕48。FIG. 3 is a plan view schematically showing a contact trace determination step. As shown in FIG. 3 , a
在預定使保持面10a的切割刀片36接觸的接觸預定處46確認到這種接觸痕48的情況下,檢測到切割刀片36與卡盤台10的通電時確認兩者有接觸。亦即,確認已實施適當的設定程序,故實施將暫時基準位置設定為基準位置的基準位置設定步驟。If such a
另一方面,圖3所示的例中,可知在接觸預定處46未形成接觸痕48。此情況下,例如,由於在切割刀片36或保持面10a上附著有切割液而檢測到透過該切割液造成的兩者之通電等的理由,而確認實際上兩者未接觸。因此,可確認所登錄的暫時基準位置並非應登錄作為基準位置的位置。On the other hand, in the example shown in FIG. 3 , it can be seen that the
於是,為了適當地導出切割單元14的基準位置而再次實施暫時基準位置登錄步驟及接觸痕判定步驟。此時,亦可無需在保持面10a的該接觸預定處46直接實施兩個步驟,而可重新設定與該接觸預定處46不同的位置作為接觸預定處46而實施兩個步驟。Then, in order to appropriately derive the reference position of the cutting
此外,在再次實施暫時基準位置登錄步驟之前,可實施噴吹氣體步驟,對保持面10a吹氣以將附著於該保持面10a的該切割液去除。圖4為示意性地表示噴吹氣體步驟的剖面圖。例如,切割單元14可具備對該保持面10a噴吹高壓的乾燥空氣等氣體52a的噴吹氣體單元52。噴吹氣體步驟中,藉由噴吹氣體單元52對保持面10a供給氣體52a,以將切割液50a去除。Furthermore, before performing the temporary reference position registration step again, a gas blowing step may be performed to blow air to the holding
之後,若再次實施暫時基準位置登錄步驟,則切割刀片36與卡盤台10接觸而檢測到通電,同時在保持面10a形成接觸痕。然後,在接觸痕判定步驟中判定具有該接觸痕,而將再次實施的暫時基準位置登錄步驟中所登錄的暫時基準位置作為基準位置。After that, when the temporary reference position registration step is performed again, the
此外,即使在接觸痕判定步驟中判定無接觸痕的情況下,亦有可不實施噴吹氣體步驟的情況。例如,在暫時基準位置登錄步驟中,旋轉的切割刀片36與附著於保持面10a的切割液接觸時,檢測到該通電的同時,該切割液可能因切割刀片36的旋轉而彈飛。此情況下,若直接再次實施暫時基準位置登錄步驟,即可適當地導出基準位置。In addition, even when it is judged that there is no contact trace in the contact trace determination step, the gas blowing step may not be performed in some cases. For example, in the temporary reference position registration step, when the
如上所述,根據涉及本實施方式的切割裝置的設定方法,可適當地導出切割單元14的基準位置。又,可確認所導出的該基準位置為適當位置。As described above, according to the setting method of the cutting device according to the present embodiment, the reference position of the cutting
此外,上述實施方式中是在接觸痕判定步驟中藉由攝影機34拍攝保持面10a而判定有無接觸痕48,但本發明的一態樣並不限定於此。本發明的一態樣中亦可藉由其他方法判定是否應將暫時基準位置登錄作為基準位置。In addition, in the above-described embodiment, the
例如,亦可藉由攝影機34拍攝保持面10a,而判定有無殘留的切割液等。此情況下,例如,判定在切割刀片36的接觸預定處46附著有切割液等的情況下,實施噴吹氣體步驟將該切割液去除,並再次實施暫時基準位置登錄步驟。For example, the holding
此外,在不脫離本發明的目的的範圍內,涉及上述實施方式的結構、方法等可適當變更而實施。In addition, in the range which does not deviate from the objective of this invention, the structure, method, etc. concerning the above-mentioned embodiment can be suitably changed and implemented.
1‧‧‧工件
3‧‧‧框架
5‧‧‧膠膜
2‧‧‧切割裝置
4‧‧‧裝置基台
6‧‧‧X軸移動台
8‧‧‧防塵防滴蓋
10‧‧‧卡盤台
10a‧‧‧保持面
10b‧‧‧夾具
10c‧‧‧框體
12‧‧‧卡匣載置台
12a‧‧‧卡匣
14‧‧‧切割單元
16‧‧‧支撐部
18a‧‧‧分度進給單元
18b‧‧‧切入進給單元
20、26‧‧‧導軌
22、28‧‧‧移動板
24、30‧‧‧滾珠螺桿
32‧‧‧脈衝馬達
34‧‧‧攝影機
36‧‧‧切割刀片
38‧‧‧清洗單元
38a‧‧‧清洗台
38b‧‧‧清洗噴嘴
40‧‧‧主軸
42‧‧‧旋轉驅動源
44‧‧‧設定單元
46‧‧‧接觸預定處
48‧‧‧接觸痕
50‧‧‧切割液供給噴嘴
50a‧‧‧切割液
52‧‧‧噴吹氣體單元
52a‧‧‧氣體1‧‧‧
圖1為示意性地表示切割裝置及工件的立體圖。 圖2(A)為示意性地表示暫時基準位置登錄步驟的剖面圖,圖2(B)為示意性地顯示接觸痕判定步驟的剖面圖。 圖3為示意性地表示形成於卡盤台的保持面的切割痕的俯視圖。 圖4為示意性地表示噴吹氣體步驟的剖面圖。FIG. 1 is a perspective view schematically showing a cutting device and a workpiece. FIG. 2(A) is a cross-sectional view schematically showing a temporary reference position registration step, and FIG. 2(B) is a cross-sectional view schematically showing a contact trace determination step. FIG. 3 is a plan view schematically showing a cut mark formed on the holding surface of the chuck table. FIG. 4 is a cross-sectional view schematically showing a gas blowing step.
10‧‧‧卡盤台 10‧‧‧Chuck table
10a‧‧‧保持面 10a‧‧‧Maintaining surface
10c‧‧‧框體 10c‧‧‧Frame
46‧‧‧接觸預定處 46‧‧‧Contact reservation
48‧‧‧接觸痕 48‧‧‧Contact marks
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CN113140491B (en) * | 2021-05-26 | 2022-07-12 | 吉林华微电子股份有限公司 | Film sticking machine and semiconductor device production system |
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KR102551970B1 (en) | 2023-07-05 |
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CN110076917B (en) | 2022-08-30 |
JP2019129282A (en) | 2019-08-01 |
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