TWI765674B - Bidirectional Anodic Plasma Chemical Vapor Deposition Coating Equipment - Google Patents

Bidirectional Anodic Plasma Chemical Vapor Deposition Coating Equipment Download PDF

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TWI765674B
TWI765674B TW110114564A TW110114564A TWI765674B TW I765674 B TWI765674 B TW I765674B TW 110114564 A TW110114564 A TW 110114564A TW 110114564 A TW110114564 A TW 110114564A TW I765674 B TWI765674 B TW I765674B
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base
isolation space
bearing pedestal
panels
pedestal
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TW110114564A
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TW202242190A (en
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林文賓
黃雪芳
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亨泰光學股份有限公司
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本發明為有關一種雙向陽極電漿化學氣相沉積鍍膜設備,其係於基座內部中空狀之隔離空間、頂部設有輸氣通道,且於隔離空間內裝設承載台座,該承載台座設有複數中空狀之腔室,而於承載台座的二相對表面外部再裝設二陽極分流面板及供電部,二陽極分流面板則分別遮罩於複數腔室的二外側,並相對內側分別形成作業空間,另將升降機構一側組裝於承載台座下方,升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道,達到於隱形眼鏡的鏡片之凹、凸表面均勻鍍膜之目的。 The present invention relates to a bidirectional anodic plasma chemical vapor deposition coating equipment, which is a hollow isolation space inside the base, a gas transmission channel is arranged at the top, and a bearing pedestal is installed in the isolation space, and the bearing pedestal is provided with A plurality of hollow chambers, and two anode shunt panels and a power supply part are installed on the outside of the two opposite surfaces of the bearing pedestal, and the two anode shunt panels are respectively shielded on the two outer sides of the plurality of chambers, and the opposite inner sides respectively form working spaces , In addition, one side of the lifting mechanism is assembled under the bearing pedestal, and the other side of the lifting mechanism extends out of the base to adjust the longitudinal displacement of the bearing pedestal in the isolation space, and the lifting mechanism is provided with a grounding portion for supplying electrical energy to the bearing pedestal , and at the bottom of the base around the lifting mechanism is provided with one or more air extraction channels, so as to achieve the purpose of uniform coating on the concave and convex surfaces of the lenses of the contact lenses.

Description

雙向陽極電漿化學氣相沉積鍍膜設備 Bidirectional Anodic Plasma Chemical Vapor Deposition Coating Equipment

本發明係提供一種雙向陽極電漿化學氣相沉積鍍膜設備,尤指針對隱形眼鏡的凹、凸表面進行鍍膜之設備,係於基座內部裝設承載台座及二陽極分流面板,而於承載台座的複數腔室內置入隱形眼鏡之鏡片,以達到進行隱形眼鏡之鏡片鍍膜程序之目的,並延長隱形眼鏡的親水性時間、抗沾污之功能。 The present invention provides a bidirectional anodic plasma chemical vapor deposition coating equipment, especially the equipment for coating the concave and convex surfaces of contact lenses. The multiple chambers of the contact lens are built into the lens of the contact lens, so as to achieve the purpose of the lens coating process of the contact lens, and prolong the hydrophilic time and the anti-contamination function of the contact lens.

按,隨著各種電子、電氣產品的研發、創新,帶給人們在日常生活及工作上許多便捷,尤其是3C電子產品的大量問世,更造成無線通訊及網際網路等的應用普及化,便導致許多人沉溺在使用3C電子產品的境界中,且長時間大量應用3C電子產品,舉凡學生族群、青少年、上班族、或是部分中、老年人等,幾乎不分男女、老少,涵蓋的範圍相當廣泛,進而衍生出生活中常見的低頭族景像,並造成的許多人的眼睛視力減損、傷害退化等情況日益嚴重,亦直接導致社會上近視人口的急遽提升,眼鏡及隱形眼鏡的使用人口也隨之增加。 Press, with the development and innovation of various electronic and electrical products, it has brought people a lot of convenience in daily life and work, especially the advent of a large number of 3C electronic products, which has also led to the popularization of applications such as wireless communication and the Internet. As a result, many people are indulged in the realm of using 3C electronic products, and a large number of 3C electronic products are used for a long time, including students, teenagers, office workers, or some middle-aged and elderly people, almost regardless of gender, age, and coverage. It is quite extensive, which leads to the common scene of low-headed people in daily life, and causes many people's eyesight loss, damage and degradation, etc. to become increasingly serious, which also directly leads to a rapid increase in the population of myopia in society, and the number of people who use glasses and contact lenses. also increased.

則人們為了解決近視所造成的不便及困擾等,都會配戴眼鏡、隱形眼鏡、角膜塑型鏡片等矯正視力或者透過角膜近視手術進行矯正等,一般常用的隱形眼鏡之鏡片,通常廠商在製造時會在隱形眼鏡的表面 實施電漿表面改質處理,藉以提升隱形眼鏡的親水性,增加配戴隱形眼鏡時的舒適度,但一般隱形眼鏡的親水性只能維持1~2星期左右,其主要因素可列舉以下項目: In order to solve the inconvenience and trouble caused by myopia, people will wear glasses, contact lenses, orthokeratology lenses, etc. to correct their vision or correct their vision through corneal myopia surgery. on the surface of contact lenses Plasma surface modification treatment is carried out to improve the hydrophilicity of contact lenses and increase the comfort of wearing contact lenses. However, the hydrophilicity of contact lenses can only be maintained for about 1 to 2 weeks. The main factors can be listed as follows:

(一)隱形眼鏡之鏡片在進行電漿表面改質處理期間及電漿表面改質處理後,所產生的化學基團為了最小化表面能以及回到熱平衡的狀態會進行重組(re-arrangement),藉此產生疏水性回復現象。 (1) During the plasma surface modification treatment and after the plasma surface modification treatment of the lens of the contact lens, the chemical groups generated will undergo re-arrangement in order to minimize the surface energy and return to the state of thermal equilibrium. , thereby producing a hydrophobic recovery phenomenon.

(二)當經由電漿表面改質處理後的隱形眼鏡之鏡片,大部分在鏡片表面接觸空氣時其表面即會產生新的氧化及降解反應,因而產生疏水性回復現象。 (2) When the lenses of the contact lenses are treated by plasma surface modification, most of the lens surfaces will undergo new oxidation and degradation reactions when the surface of the lenses is exposed to air, resulting in hydrophobic recovery.

(三)為了使隱型眼鏡之鏡片以較低的表面能達成穩定的熱平衡狀態,所以少部分低分子的氧化分子會移向鏡片的內部,進而產生疏水性回復現象。 (3) In order to achieve a stable thermal equilibrium state for the lens of the contact lens with a lower surface energy, a small number of low-molecular oxidized molecules will move to the interior of the lens, thereby producing a hydrophobic recovery phenomenon.

(四)未經改質的低分子量物種(species)及大分子(macromolecules)會從隱形眼鏡之鏡片內部移向表面,因此促進疏水性回復的程度及在表面形成低表面能的低分子層。 (4) Unmodified low-molecular-weight species and macromolecules move from the interior of the contact lens to the surface, thereby promoting the degree of hydrophobic recovery and forming a low-surface-energy low-molecular layer on the surface.

(五)隱形眼鏡之鏡片表面的極性化學基團產生重新轉向(reorientation)之情形。 (5) Reorientation of polar chemical groups on the lens surface of contact lenses.

(六)基材表面粗糙度(the relaxation of the surface roughness)並未因電漿表面改質改善。 (6) The relaxation of the surface roughness of the substrate was not improved by the plasma surface modification.

基於以上各項因素,隱形眼鏡之鏡片經由電漿表面改質處理經過一~二星期後,其表面的接觸角便會逐漸增加,而變成疏水性表面,且大約在第10~14天時,則會回復至和未經電漿處理的隱形眼鏡之鏡片 相同的接觸角,則當配戴者配戴疏水性之隱形眼鏡的鏡片時,配戴者的眼球即會感受到不適的異物感,以致於影響配戴者繼續配戴隱形眼鏡的意願;且疏水性隱形眼鏡之鏡片也容易供沉澱物黏著、貼附,鏡片上的沉澱物不僅會影響配戴者的視力、配戴隱形眼鏡之鏡片的舒適度及鏡片表面潤溼度,又,沉澱物中的蛋白質沉澱亦容易成為細菌成長的溫床,而當沉澱物在隱形眼鏡之鏡片表面的蛋白質隨著時間產生變性時,可能會誘發人體的免疫反應,進而造成巨大乳突狀結膜炎(Giant Papillary Conjunctivitis)、急性紅眼等角膜感染之徵象,導致配戴者無法配戴隱形眼鏡;另,由於位於隱形眼鏡之鏡片上的沉澱物,無法藉由隱形眼鏡清潔劑完全去除,所以一段時間後,沉澱物便會與隱形眼鏡之鏡片本身的材質結合,便會縮短隱形眼鏡的鏡片之使用時間,並導致鏡片的損壞。 Based on the above factors, the contact angle of the contact lens surface will gradually increase after one to two weeks after the plasma surface modification treatment, and become a hydrophobic surface, and about the 10th to 14th day, the will revert to and untreated contact lenses With the same contact angle, when the wearer wears the lens of the hydrophobic contact lens, the eyeball of the wearer will feel an uncomfortable foreign body sensation, which will affect the wearer's willingness to continue wearing the contact lens; and The lenses of hydrophobic contact lenses are also easy for sediments to adhere and stick. The sediments on the lenses will not only affect the wearer's vision, the comfort of wearing contact lenses and the wettability of the lens surface, but also the sediments. The protein precipitation is also easy to become a breeding ground for bacterial growth, and when the protein deposited on the surface of the contact lens denatures over time, it may induce an immune response in the human body, resulting in Giant Papillary Conjunctivitis (Giant Papillary Conjunctivitis) , acute red eye and other symptoms of corneal infection, which make the wearer unable to wear contact lenses; in addition, because the deposits on the lenses of the contact lenses cannot be completely removed by contact lens cleaners, the deposits will become difficult after a period of time. It will be combined with the material of the lens of the contact lens itself, which will shorten the use time of the lens of the contact lens and cause damage to the lens.

是以,如何解決目前隱形眼鏡之鏡片製造、配戴時所存在之問題與困擾等,隱形眼鏡配戴時形成沉澱物及親水性時間較短之麻煩與缺失等,即為從事此行業之相關廠商所亟欲研究改善之方向所在者。 Therefore, how to solve the problems and troubles in the current lens manufacturing and wearing of contact lenses, the formation of sediments when wearing contact lenses and the troubles and defects of short hydrophilicity time, etc., are related to engaging in this industry. Manufacturers are eager to study the direction of improvement.

故,發明人有鑑於上述之問題與缺失,乃搜集相關資料,經由多方評估及考量,並以從事於此行業累積之多年經驗,經由不斷研發及修改,始設計出此種雙向陽極電漿化學氣相沉積鍍膜設備的發明專利誕生者。 Therefore, in view of the above problems and deficiencies, the inventor collected relevant information, evaluated and considered from various parties, and based on years of experience in this industry, through continuous research and development and modification, to design this bidirectional anode plasma chemical. The inventor of the invention patent of vapor deposition coating equipment.

本發明之主要目的乃在於該雙向陽極電漿化學氣相沉積鍍膜設備,其係於基座內部中空狀之隔離空間、頂部設有輸氣通道,且於隔離空間內裝設承載台座,該承載台座設有複數中空狀之腔室,而於承載台 座的二相對表面外部再裝設二陽極分流面板及供電部,二陽極分流面板為分別遮罩於複數腔室的二外側,則相對內側分別形成作業空間,另將升降機構一側組裝於承載台座下方,升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道,達到於隱形眼鏡的鏡片之凹、凸表面均勻鍍膜之目的,並供隱形眼鏡之鏡片親水性效能時間延長,並可減少蛋白質沉澱在鏡片表面,以及減少表面粗糙度,藉以增加隱形眼鏡之鏡片配戴時的舒適度及鏡片的使用壽命延長之功效。 The main purpose of the present invention is the bidirectional anodic plasma chemical vapor deposition coating equipment, which is a hollow isolation space inside the base, a gas transmission channel is arranged on the top, and a bearing pedestal is installed in the isolation space. The pedestal is provided with a plurality of hollow chambers, and the bearing platform is Two anode shunt panels and a power supply part are installed on the outside of the two opposite surfaces of the seat. The two anode shunt panels are respectively shielded on the two outer sides of the plurality of chambers, and the opposite inner sides respectively form working spaces, and one side of the lifting mechanism is assembled on the bearing Below the pedestal, the other side of the lifting mechanism extends out of the base, which is used to adjust the longitudinal displacement of the bearing pedestal in the isolated space, and the lifting mechanism is provided with a grounding portion for supplying electrical energy to the bearing pedestal, and a base around the lifting mechanism is provided The bottom is provided with one or more air extraction channels to achieve the purpose of uniform coating on the concave and convex surfaces of the lenses of the contact lenses, prolong the hydrophilic performance of the lenses of the contact lenses, and reduce protein precipitation on the surface of the lenses, and Reduce the surface roughness, so as to increase the comfort of wearing contact lenses and prolong the service life of the lenses.

本發明之另一目的乃在於該承載台座係設有複數腔室,各腔室分別呈寬通道、窄通道銜接貫通狀,並於各寬通道、窄通道銜接位置形成內肩部,可供預設隱形眼鏡由寬通道內呈水平橫放,抵靠於內肩部處;而二陽極分流面板之面積係可等於或大於承載台座之面積,且該二陽極分流面板與承載台座、複數腔室之間分別形成相同或相異高度之作業空間。 Another object of the present invention is that the bearing base is provided with a plurality of chambers, and each chamber is respectively formed in the shape of a wide channel and a narrow channel connecting and passing through, and an inner shoulder is formed at the connecting position of each wide channel and narrow channel, which can be used for presetting. The contact lenses are horizontally laid out from the wide channel and abut against the inner shoulder; and the area of the two anode shunt panels can be equal to or greater than the area of the bearing pedestal, and the two anode shunt panels and the bearing pedestal, a plurality of chambers Work spaces of the same or different heights are formed between them.

本發明之再一目的乃在於該升降機構係設有氣密式之絕緣本體、以供穿設於基座,再於絕緣本體內部設有金屬導電材質製成並呈縱向位移之升降導桿,該升降導桿一側延伸入基座的隔離空間內且結合於承載台座底部,而該升降導桿另側為延伸出基座外部並電性連接於接地部,且二陽極分流面板所設之供電部係為射頻發電機,誘使電漿從二陽極分流面板產生至承載台座(陰極電極板)方向鍍膜於隱形眼鏡上。 Another object of the present invention is that the lifting mechanism is provided with an air-tight insulating body for passing through the base, and a lifting guide rod made of metal conductive material and longitudinally displaced is arranged inside the insulating body. , one side of the lifting guide rod extends into the isolation space of the base and is combined with the bottom of the bearing pedestal, and the other side of the lifting guide rod extends out of the base and is electrically connected to the grounding portion, and the two anode shunt panels are provided with The power supply part is a radio frequency generator, which induces plasma to be produced from the two anode shunt panels to the bearing base (cathode electrode plate) to coat the contact lens.

本發明之又一目的乃在於該隱形眼鏡進行雙向陽極鍍長效 型電漿化學氣相沉積法鍍膜之步驟係為:清洗基座內部之承載台座,並清除承載台座表面的水分;清潔基座內部隔離空間、承載台座及二陽極分流面板;將承載台座置入基座之隔離空間內;透過抽氣通道對基座之隔離空間進行抽真空處理;利用輸氣通道對基座之隔離空間注入產生電漿之氣體(工作氣體),開啟射頻發電機以對隔離空間內部進行清潔;將複數預設隱形眼鏡之鏡片分別置入承載台座之各腔室內;再次對基座之隔離空間進行抽真空處理;利用輸氣通道對基座之隔離空間助入產生等離子之氣體(工作氣體),待基座內部隔離空間壓力穩定後,再開啟射頻發電機,則開始對隱形眼鏡之鏡片進行預處理,完成預處理後,關閉發電機;關閉氣體流量,關閉抽氣馬達,並打開基座;已達曝氣之目的,再關閉基座重複對基座之隔離空間進行抽空處理,將至少一個或一個以上之閥門所連接承裝液體之瓶體的加熱器予以開啟,同時開啟電磁攪拌器,並確認瓶體被加熱後,對基座之隔離空間注入工作氣體,同時確認隔離空間內之壓力穩定,再將至少一個或一個以上瓶體中之液體蒸氣加入基座之隔離空間內,並控制隔離空間內之壓力,對隱形眼鏡之鏡片進行鍍膜,承載台座為陰極電極板、其上下方之二陽極分流面板利用供電部為電漿功率,透過二陽極分流面板及承載台座對各腔室內隱形眼鏡之鏡片進行雙向陽極電漿化學氣相沉積作用鍍膜,待鍍膜作業結束,關閉發電機,再關閉瓶體之加熱器及電磁攪拌器,並確認瓶體以降溫至室溫狀態,將至少一個或一個以上之閥門關閉,關閉位於基座底部之抽氣通道,調整基座內部隔離空間之壓力至常壓,即可將承載台取出隔離空間,將承載台上各腔室內隱形眼鏡之鏡片取出。 Another object of the present invention is that the contact lens is subjected to bidirectional anodic plating for long-term effects The steps of the plasma chemical vapor deposition method are: cleaning the bearing pedestal inside the pedestal and removing the moisture on the surface of the bearing pedestal; cleaning the isolation space inside the pedestal, the bearing pedestal and the two anode shunt panels; placing the bearing pedestal in the In the isolation space of the base; vacuumize the isolation space of the base through the air extraction channel; inject plasma-generating gas (working gas) into the isolation space of the base through the gas transmission channel, and turn on the radio frequency generator to isolate the isolation space. The interior of the space is cleaned; the lenses of a plurality of preset contact lenses are placed in the chambers of the bearing pedestal respectively; the isolation space of the base is vacuumized again; the isolation space of the base is assisted by the gas transmission channel to generate plasma. Gas (working gas), after the pressure of the isolation space inside the base is stable, then turn on the RF generator, then start to pretreat the lenses of the contact lens, after the preprocessing is completed, turn off the generator; turn off the gas flow, and turn off the suction motor , and open the base; the purpose of aeration has been achieved, then close the base and repeat the evacuation treatment of the isolated space of the base, and turn on the heater of the bottle body holding the liquid connected to at least one or more valves. At the same time, turn on the electromagnetic stirrer, and after confirming that the bottle body is heated, inject working gas into the isolation space of the base, and confirm that the pressure in the isolation space is stable, and then add the liquid vapor in at least one or more bottles into the base of the base. In the isolation space, and control the pressure in the isolation space, the lens of the contact lens is coated, the bearing base is the cathode electrode plate, and the two anode shunt panels above and below it use the power supply part as the plasma power, through the two anode shunt panels and the bearing The pedestal performs bidirectional anodic plasma chemical vapor deposition coating on the lenses of the contact lenses in each chamber. After the coating operation is completed, turn off the generator, then turn off the heater and electromagnetic stirrer of the bottle body, and confirm that the bottle body is cooled to the room temperature. In the warm state, close at least one or more valves, close the air extraction channel at the bottom of the base, and adjust the pressure of the isolation space inside the base to normal pressure, and then the bearing platform can be taken out of the isolation space, and each cavity on the bearing platform can be removed. Lens removal of indoor contact lenses.

1:基座 1: Base

10:隔離空間 10: Isolation space

11:輸氣通道 11: Air channel

12:抽氣通道 12: Exhaust channel

13:閥門 13: Valve

14:電磁攪拌器 14: Electromagnetic stirrer

15:瓶體 15: bottle body

151:加熱器 151: Heater

2:承載台座 2: Bearing pedestal

20:腔室 20: Chamber

201:寬通道 201: Wide Channel

202:窄通道 202: Narrow channel

203:內肩部 203: inner shoulder

3:陽極分流面板 3: Anode shunt panel

30:作業空間 30: Workspace

4:升降機構 4: Lifting mechanism

41:供電部 41: Power Supply Department

42:絕緣本體 42: Insulation body

421:升降導桿 421: Lifting guide rod

422:接地部 422: Ground

5:鏡片 5: Lenses

[第1圖]係為本發明之立體外觀圖。 [Fig. 1] is a perspective external view of the present invention.

[第2圖]係為本發明承載台座之立體外觀圖。 [Fig. 2] is a three-dimensional appearance view of the bearing platform of the present invention.

[第3圖]係為本發明承載台座之局部剖面圖。 [Fig. 3] is a partial cross-sectional view of the bearing platform of the present invention.

[第4圖]係為本發明鍍膜作業之流程圖(一)。 [Fig. 4] is the flow chart (1) of the coating operation of the present invention.

[第5圖]係為本發明鍍膜作業之流程圖(二)。 [Fig. 5] is the flow chart (2) of the coating operation of the present invention.

[第6圖]係為本發明鍍膜作業之流程圖(三)。 [Fig. 6] is the flow chart (3) of the coating operation of the present invention.

為達成上述目的與功效,本發明所採用之技術手段及其構造、實施之方法等,茲繪圖就本發明之較佳實施例詳加說明其特徵與功能如下,俾利完全瞭解。 In order to achieve the above purpose and effect, the technical means used in the present invention and its structure, implementation method, etc., are described in detail with respect to the preferred embodiment of the present invention and its features and functions are as follows, so as to be fully understood.

請參閱第1、2、3圖所示,係為本發明之立體外觀圖、承載台座之立體外觀圖、承載台座之局部剖面圖,由圖中所示可以清楚看出,本發明雙向陽極電漿化學氣相沉積鍍膜設備,係包括基座1、承載台座2、二陽極分流面板3及升降機構4,其中:該基座1內部具有中空狀之隔離空間10,頂部設有輸氣通道11、底部設有至少一個或一個以上之抽氣通道12,並於至至少一側邊設有至少一個或一個以上輸送液體之閥門13及電磁攪拌器14,且至少一個或一個以上閥門13為連接有承裝液體之瓶體15,並於至少一個或一個以上之瓶體15處設有加熱器151及至少一個或一個以上電磁攪拌器14,即可藉由至少一個或一個以上加熱器151對至少一個或一個以上之瓶體15進行加熱處 理。 Please refer to Figures 1, 2, and 3, which are the three-dimensional appearance diagram of the present invention, the three-dimensional appearance diagram of the bearing pedestal, and the partial cross-sectional view of the bearing pedestal. The slurry chemical vapor deposition coating equipment includes a base 1, a bearing pedestal 2, two anode shunt panels 3 and a lifting mechanism 4, wherein: the base 1 has a hollow isolation space 10 inside, and a gas channel 11 is arranged on the top , The bottom is provided with at least one or more suction channels 12, and at least one side is provided with at least one or more liquid conveying valves 13 and electromagnetic stirrers 14, and at least one or more than one valve 13 is connected There is a bottle body 15 for holding liquid, and at least one or more than one bottle body 15 is provided with a heater 151 and at least one or more electromagnetic stirrers 14, which can be adjusted by at least one or more heaters 151. At least one or more than one bottle body 15 is heated reason.

該承載台座2係裝設於基座1之隔離空間10內,並於承載台座2設有複數中空狀之腔室20。 The support base 2 is installed in the isolation space 10 of the base 1 , and a plurality of hollow cavities 20 are provided on the support base 2 .

該二陽極分流面板3係裝設於基座1的隔離空間10內、且分別位於承載台座2的二相對表面外部,而供二陽極分流面板3分別遮罩於複數腔室20的二外側,則於二陽極分流面板3與承載台座2、複數腔室20之間分別形成作業空間30。 The two anode shunt panels 3 are installed in the isolation space 10 of the base 1 and are respectively located outside the two opposite surfaces of the bearing base 2 , and the two anode shunt panels 3 are used to cover the two outer sides of the plurality of chambers 20 respectively. Then, working spaces 30 are respectively formed between the two anode shunt panels 3 , the bearing pedestal 2 and the plurality of chambers 20 .

該升降機構4一側係組裝於承載台座2下方,另側並延伸出基座1的隔離空間10外部、位於至少一個或一個以上之抽氣通道12側邊(該升降機構4與基座1之間形成緊密結合無縫隙、不漏氣,此為一般常見知識,於此恕不再加贅述),係供升降機構4調整承載台座2位於隔離空間10內之縱向位移,且於升降機構4設有供應二陽極分流面板3電能之供電部41。 One side of the lifting mechanism 4 is assembled under the bearing pedestal 2, and the other side extends out of the isolation space 10 of the base 1, and is located on the side of at least one or more than one air extraction channel 12 (the lifting mechanism 4 is connected to the base 1 ). There is a close connection between them without gaps and no air leakage. This is a common knowledge and will not be repeated here.), it is used for the lifting mechanism 4 to adjust the longitudinal displacement of the bearing platform 2 in the isolation space 10, and the lifting mechanism 4 There is a power supply part 41 for supplying electrical energy to the two anode shunt panels 3 .

而上述該承載台座2係包括複數腔室20,且各腔室20分別呈寬通道201、窄通道202銜接貫通狀,並於各腔室20內部寬通道201、窄通道202銜接位置形成內肩部203,以供複數預設隱形眼鏡之鏡片5分別由各寬通道201內呈水平橫放,抵靠於各內肩部203處。 The above-mentioned bearing pedestal 2 includes a plurality of chambers 20 , and each chamber 20 has a wide channel 201 and a narrow channel 202 connected and penetrated respectively, and an inner shoulder is formed at the connecting position of the wide channel 201 and the narrow channel 202 in each chamber 20 . The part 203 is used for the lenses 5 of the plurality of preset contact lenses to be laid horizontally and horizontally in each wide channel 201 respectively, and abut against each inner shoulder part 203 .

且上述該二陽極分流面板3之面積係等於或大於承載台座2之面積,且該二陽極分流面板3與承載台座2、複數腔室20之間分別形成相同或相異高度之作業空間30。 And the area of the two anode distribution panels 3 is equal to or greater than the area of the bearing base 2 , and the two anode distribution panels 3 , the bearing base 2 and the plurality of chambers 20 respectively form working spaces 30 of the same or different heights.

另,上述該升降機構4係包括穿設於基座1呈氣密式之絕緣本體42,再於絕緣本體42內部設有金屬導電材質製成之升降導桿421,升 降導桿421並可呈縱向位移,並設有供應承載台座2電能之接地部422,且升降機構4所設之供電部41係可為射頻發電機等。 In addition, the above-mentioned lifting mechanism 4 includes an air-tight insulating body 42 which is penetrated through the base 1 , and a lifting guide rod 421 made of metal conductive material is arranged inside the insulating body 42 to lift the The lowering guide rod 421 can be longitudinally displaced, and is provided with a grounding portion 422 for supplying electrical energy to the bearing base 2 , and the power supply portion 41 of the lifting mechanism 4 can be a radio frequency generator or the like.

又,上述該複數預設隱形眼鏡之鏡片5,係可為聚甲基丙烯酸甲酯(PMMA)、氟矽丙烯酸酯(FSA)、透氣性半硬鏡片、聚甲基丙酸羥乙酯、GMMA、矽水膠等或其它製作預設隱形眼鏡之鏡片5的材料等。 In addition, the above-mentioned lenses 5 of the plurality of preset contact lenses can be polymethyl methacrylate (PMMA), fluorosilicone acrylate (FSA), breathable semi-hard lenses, polyhydroxyethyl methacrylate, GMMA , silicone water glue, etc., or other materials for making the lenses 5 of the preset contact lenses.

請參閱第1、2、3、4、5、6圖所示,係為本發明之立體外觀圖、承載台座之立體外觀圖、承載台座之局部剖面圖、鍍膜作業之流程圖(一)、鍍膜作業之流程圖(二)、鍍膜作業之流程圖(三),由圖中所示可以清楚看出,上述該隱形眼鏡進行雙向陽極電漿化學氣相沉積鍍膜之步驟係為: Please refer to Figures 1, 2, 3, 4, 5 and 6, which are the three-dimensional appearance diagram of the present invention, the three-dimensional appearance diagram of the bearing pedestal, the partial cross-sectional view of the bearing pedestal, and the flow chart of the coating operation (1), The flow chart of the coating operation (2) and the flow chart of the coating operation (3), as shown in the figures, it can be clearly seen that the steps of the above-mentioned bidirectional anodic plasma chemical vapor deposition coating on the contact lens are as follows:

(A01)分別清洗基座1及內部之承載台座2,並清除承載台座2表面殘留的水分。 (A01) Clean the base 1 and the inner bearing pedestal 2 respectively, and remove the residual moisture on the surface of the bearing pedestal 2.

(A02)清潔基座1內部隔離空間10、承載台座2及二陽極分流面板3。 (A02) Clean the isolation space 10 inside the base 1 , the bearing pedestal 2 and the two anode shunt panels 3 .

(A03)將承載台座2置入基座1之隔離空間10內。 (A03) Put the support base 2 into the isolation space 10 of the base 1 .

(A04)透過抽氣通道12對基座1之隔離空間10進行抽真空處理。 (A04) Evacuate the isolated space 10 of the base 1 through the evacuation channel 12 .

(A05)利用輸氣通道11對基座之隔離空間10注入工作氣體,並開啟供電部41(可為射頻發電機),以對隔離空間10產生電漿進行內部清潔。 (A05) Use the gas transmission channel 11 to inject working gas into the isolation space 10 of the base, and turn on the power supply 41 (which can be a radio frequency generator) to generate plasma in the isolation space 10 for internal cleaning.

(A06)將複數預設隱形眼鏡之鏡片5分別置入承載台座2 之各腔室20內,並供複數預設鏡片5分別由各腔室20的寬通道201內呈水平橫放,則各鏡片5分別抵靠於各腔室20的內肩部203處。 (A06) Put the lenses 5 of the plurality of preset contact lenses into the bearing base 2 respectively In each chamber 20 , a plurality of preset lenses 5 are arranged horizontally and horizontally in the wide passage 201 of each chamber 20 , and then each lens 5 abuts against the inner shoulder 203 of each chamber 20 respectively.

(A07)再次對基座1之隔離空間10進行抽真空處理。 (A07) Evacuate the isolation space 10 of the base 1 again.

(A08)對基座1的隔離空間10通入前處理氣體,啟動供電部41對二陽極分流面板3進行電漿預處理。 (A08) Pour the pretreatment gas into the isolation space 10 of the susceptor 1 , and activate the power supply unit 41 to perform plasma pretreatment on the two-anode split panel 3 .

(A09)停止對基座1的隔離空間10注入氣體,並對隔離空間10進行洩壓,再開啟基座1。 (A09) Stop injecting gas into the isolation space 10 of the base 1 , depressurize the isolation space 10 , and then open the base 1 .

(A10)關閉基座1,並對基座1之隔離空間10進行抽真空處理,且開啟加熱器151對承裝液體的至少一個或一個以上之瓶體15加熱,同時開啟至少一個或一個以上之電磁攪拌器14,再確認該瓶體15已經被加熱。 (A10) Close the base 1, perform vacuum treatment on the isolation space 10 of the base 1, and turn on the heater 151 to heat at least one or more of the bottle bodies 15 containing the liquid, and simultaneously turn on at least one or more of the bottle bodies 15. the electromagnetic stirrer 14, and then confirm that the bottle body 15 has been heated.

(A11)由輸氣通道11對基座1之隔離空間10注入氬氣,再自至少一個或一個以上之閥門13加入親水性的液體蒸氣後,且調整氬氣之流量,基座1內隔離空間10之壓力呈不穩定,透過至少一個或一個以上之閥門13加入親水性的液體蒸氣維持預定壓力。 (A11) Inject argon gas into the isolation space 10 of the base 1 through the gas delivery channel 11, and then add hydrophilic liquid vapor from at least one or more than one valve 13, and adjust the flow rate of argon gas to isolate the interior of the base 1. The pressure of the space 10 is unstable, and the predetermined pressure is maintained by adding hydrophilic liquid vapor through at least one or more valves 13 .

(A12)開啟供電部41對基座1的隔離空間10內之二陽極分流面板3供電,並確認基座1的隔離空間10之壓力,若壓力有變動,則調整輸入液體蒸氣的至少一個或一個以上之閥門13,使基座1內隔離空間10維持預定之壓力,對承載台座2的各腔室20內之各預設隱形眼鏡之鏡片5進行鍍膜。 (A12) Turn on the power supply unit 41 to supply power to the two anode shunt panels 3 in the isolation space 10 of the base 1, and confirm the pressure of the isolation space 10 of the base 1. If the pressure changes, adjust at least one of the input liquid vapor or More than one valve 13 maintains a predetermined pressure in the isolation space 10 in the base 1 to coat the lenses 5 of the predetermined contact lenses in the chambers 20 of the carrier base 2 .

(A13)利用基座1的隔離空間10內位於承載台座2上、下方二相對之陽極分流面板3,同步對各腔室20內之各預設鏡片5進行雙向陽 極電漿化學氣相沉積處理。 (A13) Using two opposite anode shunt panels 3 located on the upper and lower sides of the bearing platform 2 in the isolation space 10 of the base 1, synchronously conduct bidirectional anode operation on each preset mirror 5 in each chamber 20 Electrode plasma chemical vapor deposition process.

(A14)利用供電部41對二陽極分流面板3供電,藉由接地部422使該承載台座2成為陰極電極板,而二陽極分流面板3透過供電部41提供電漿功率,則可透過二陽極分流面板3與承載台座2(陰極電極板)之間,形成雙向陽極電漿氣相化學沉積作用,使電漿集中於承載台座2的各腔室20中,且供電漿沉積於各腔室20內的各預設鏡片5之正、反表面處,以供各預設鏡片5的正、反表面同時進行鍍膜處理。 (A14) Use the power supply part 41 to supply power to the two-anode shunt panel 3, use the grounding part 422 to make the bearing base 2 a cathode electrode plate, and the two-anode shunt panel 3 provides plasma power through the power supply part 41, and can pass through the two anodes Between the distribution panel 3 and the carrier base 2 (cathode electrode plate), bidirectional anodic plasma vapor chemical deposition is formed, so that the plasma is concentrated in each chamber 20 of the carrier pedestal 2, and the plasma is deposited in each chamber 20 The front and back surfaces of each preset lens 5 in the interior are used for coating treatment on the front and back surfaces of each preset lens 5 at the same time.

(A15)鍍膜結束,關閉供電部41、至少一個或一個以上之瓶體15的加熱器151及至少一個或一個以上之電磁攪拌器14,再透過輸氣通道11對基座1的隔離空間10注入氣體。 (A15) After the coating is finished, turn off the power supply unit 41, at least one or more heaters 151 of the bottle body 15, and at least one or more electromagnetic stirrers 14, and then pass the gas transmission channel 11 to the isolation space 10 of the base 1 Inject gas.

(A16)確認承裝液體的至少一個或一個以上之瓶體15降溫至室溫,關閉該至少一個或一個以上瓶體15連接之閥門13。 (A16) Confirm that at least one or more of the bottle bodies 15 containing the liquid are cooled to room temperature, and close the valve 13 connected to the at least one or more bottle bodies 15 .

(A17)將輸氣通道11對基座1的隔離空間10注入之氬氣關閉,使基座1內隔離空間10回壓至正常壓力〔正常大氣壓力:1kg/cm2〕,即可取出已鍍膜的各預設隱形眼鏡之鏡片5。 (A17) Close the argon gas injected into the isolation space 10 of the base 1 by the gas transmission channel 11, so that the isolation space 10 in the base 1 is back pressured to the normal pressure [normal atmospheric pressure: 1kg/cm 2 ], and the argon gas can be taken out. Coated lenses 5 of each preset contact lens.

上述各步驟中之該基座1,可於一側至少一個或一個以上之閥門13連接有承裝液體之瓶體15,該至少一個或一個以上之瓶體15係供承裝親水性之液體,該親水性之液體係可為甲基丙烯酸聚乙二醇酯〔Poly(ethylene glycol)Methacrylate,PEGMA〕或N-乙烯基-2-咯吡酮(N-Vinylpyrrolidone,NVP)等親水性之液體。 The base 1 in each of the above steps can be connected to at least one or more valves 13 on one side with a bottle body 15 for holding liquid, and the at least one or more than one bottle body 15 is for holding hydrophilic liquid. , the hydrophilic liquid system can be a hydrophilic liquid such as polyethylene glycol methacrylate (Poly(ethylene glycol) Methacrylate, PEGMA] or N-vinylpyrrolidone (N-Vinylpyrrolidone, NVP) .

上述該步驟(A01)之對基座1及內部承載台座2進行清洗作業,係先以清水對承載台座2作進行清洗,再利用異丙醇〔Isopropy Alc ohol,IPA〕進行清洗,則藉由壓縮乾燥空氣〔Clean Dry Air,CDA〕清除承載台座2表面的水分;並利用逆滲透〔RO〕水對基座1內部隔離空間10及承載台座2進行擦拭,且藉由異丙醇〔IPA〕對基座1內部隔離空間10及承載台座2進行擦拭至少二次或二次以上。 In the above-mentioned step (A01), the cleaning operation of the base 1 and the inner bearing pedestal 2 is carried out by cleaning the bearing pedestal 2 with clean water, and then using isopropyl alcohol (Isopropy Alc ohol, IPA], then use compressed dry air (Clean Dry Air, CDA) to remove the moisture on the surface of the bearing pedestal 2; and use reverse osmosis (RO) water to wipe the inner isolation space 10 of the pedestal 1 and the bearing pedestal 2. , and use isopropyl alcohol (IPA) to wipe the inner isolation space 10 of the base 1 and the bearing base 2 at least twice or more.

上述該步驟(A04)及(A07)之抽真空處理,必須確認基座1內之隔離空間10內部壓力達1.0*10-1Torr以下;而該步驟(A10)之抽真空處理,且必須確認基座1內之隔離空間10內部壓力達3.0*10-2Torr以下。 In the vacuum treatment in the above steps (A04) and (A07), it must be confirmed that the internal pressure of the isolation space 10 in the base 1 is below 1.0 * 10 -1 Torr; and in the vacuum treatment in this step (A10), it must be confirmed The internal pressure of the isolation space 10 in the base 1 is below 3.0 * 10 -2 Torr.

該步驟(A05)之工作氣體係可為氬氣(Ar)的流量為10sccm及氧氣(O2)的流量為20sccm等氣體,並以電漿壓力(plasma power):60W,進行8分鐘之清潔處理作業;該步驟(A08)、(A09)對基座1之隔離空間10注入之氣體係可為氬氣(Ar)的流量為30sccm,而該預定時間為10~30分鐘,較佳時間為20分鐘。 The working gas system of this step (A05) can be argon (Ar) with a flow rate of 10 sccm and oxygen (O 2 ) with a flow rate of 20 sccm and other gases, and the plasma pressure (plasma power): 60W, for 8 minutes of cleaning Processing operation; the gas system injected into the isolation space 10 of the base 1 in the steps (A08) and (A09) can be argon (Ar) with a flow rate of 30 sccm, and the predetermined time is 10 to 30 minutes, and the preferred time is 20 minutes.

該步驟(A06)將複數預設隱形眼鏡之鏡片5呈水平行向方式分別置入承載台座2之各腔室20內,且該承載台座2之複數腔室20係分別設有呈寬通道201、窄通道202銜接貫通狀,並於各腔室20內部寬通道201、窄通道202銜接位置設有內肩部203,可供預設隱形眼鏡的鏡片5由寬通道201內呈水平橫放、抵靠於內肩部203處。 In this step (A06), the lenses 5 of the plurality of preset contact lenses are placed in the respective chambers 20 of the bearing base 2 in a horizontal manner, and the plurality of chambers 20 of the bearing base 2 are respectively provided with wide channels 201 , The narrow channel 202 is connected in a through shape, and an inner shoulder 203 is provided at the connection position of the wide channel 201 and the narrow channel 202 inside each chamber 20, and the lens 5 for presetting the contact lens is horizontally laid in the wide channel 201, against the inner shoulder 203 .

該步驟(A08)之前處理氣體係可為氬氣(Ar)的流量為9sccm及氧氣(O2)的流量為36sccm等氣體;而該步驟(A05)、(A08)、(A12)、(A14)啟動升降機構4之供電部41進行電漿處理或供電,該供電部41係可為射頻發電機(RF generator power);則該步驟(A05)之供電部41的射頻發電機設定120W,處理時間可為5-10分鐘,較佳時間為6 分鐘;且步驟(A08)開啟升降機構4之供電部41對二陽極分流面板3進行電漿處理,設定該射頻發電機為40W,持續16分鐘,並確認基座1內隔離空間10之壓力為300mTorr;至於該基座1內隔離空間10維持之預定壓力係為300-350mTorr。 The treatment gas system before this step (A08) can be argon (Ar) with a flow rate of 9 sccm and oxygen (O 2 ) with a flow rate of 36 sccm and other gases; and in the steps (A05), (A08), (A12), (A14) ) Start the power supply part 41 of the lifting mechanism 4 for plasma processing or power supply, and the power supply part 41 can be a radio frequency generator (RF generator power); then the RF generator of the power supply part 41 in this step (A05) is set to 120W, and the processing The time can be 5-10 minutes, and the preferred time is 6 minutes; and step (A08) turns on the power supply unit 41 of the lifting mechanism 4 to perform plasma treatment on the two anode shunt panels 3, and set the radio frequency generator to 40W for 16 minutes. , and confirm that the pressure of the isolation space 10 in the base 1 is 300 mTorr; the predetermined pressure maintained in the isolation space 10 in the base 1 is 300-350 mTorr.

該步驟(A09)對基座1內隔離空間10進行洩壓,係將隔離空間10洩壓至1atm,且開啟基座1約可為1~3分鐘。 In this step (A09), the pressure of the isolation space 10 in the base 1 is decompressed, the isolation space 10 is depressurized to 1 atm, and the base 1 is opened for about 1 to 3 minutes.

該步驟(A10)之啟動至少一個或一個以上之電磁攪拌器14,該各電磁攪拌器14係以20rpm/sec〔轉/秒〕之速度運作。 In this step (A10), at least one or more than one electromagnetic stirrer 14 is activated, and each electromagnetic stirrer 14 operates at a speed of 20 rpm/sec.

該步驟(A11)對基座1之隔離空間10注入氬氣(Ar)的流量為8sccm,當調整氬氣之流量時係調整氬氣流量至12sccm;至於該親水性液體蒸氣係為先加入甲基丙烯酸聚乙醇酯〔PEGMA,Poly(ethylene glycol)methacrylate〕,壓力控制於1.5~2*10-1Torr;再加入N-乙烯基-2-咯吡酮(N-Vinylpyrrolidone,NVP),壓力控制於2~3*10-1Torr;該步驟(A12)當基座1內隔離空間10壓力不穩定呈浮動情況,加入親水性液體PEGMA/NVP蒸氣時,預定壓力維持在3*10-1Torr;另該步驟(A15)對基座1的隔離空間10注入之氣體係為氬氣(Ar)的流量為70sccm,持續15分鐘。 In this step (A11), the flow rate of argon gas (Ar) injected into the isolation space 10 of the base 1 is 8 sccm, and when adjusting the flow rate of argon gas, the flow rate of argon gas is adjusted to 12 sccm; as for the hydrophilic liquid vapor, the argon gas is added first. Poly(ethylene glycol) methacrylate [PEGMA, Poly(ethylene glycol)methacrylate], the pressure is controlled at 1.5~2 * 10 -1 Torr; then N-Vinylpyrrolidone (NVP) is added, and the pressure is controlled At 2~3 * 10 -1 Torr; in this step (A12), when the pressure of the isolation space 10 in the base 1 is unstable and floats, and the hydrophilic liquid PEGMA/NVP vapor is added, the predetermined pressure is maintained at 3 * 10 -1 Torr ; In addition, the gas system injected into the isolation space 10 of the base 1 in this step (A15) is argon (Ar) with a flow rate of 70 sccm for 15 minutes.

透過上述步驟加工鍍膜的複數預設隱形眼鏡之鏡片5,因甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮,透過二陽極分流面板3與承載台座2之間,利用雙陽極長效型電漿化學氣相沉積法製程,使鏡片5的正、反表面鍍附形成均勻薄膜,而可供各預設隱形眼鏡之鏡片5具有良好的親水性及抗生化沾污的功能,並利用甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮彼此間會產生交聯作用,而供隱形眼鏡之鏡片5親水性效能時間延長 ,並可減少蛋白質沉澱在各預設鏡片5表面,藉以增加各預設隱形眼鏡之鏡片5配戴時的舒適度及各預設鏡片5的使用壽命延長等之功效。 The lenses 5 of the plurality of preset contact lenses processed and coated through the above steps, due to polyethylene glycol methacrylate and N-vinyl-2-rolepyrone, pass between the two anode shunt panels 3 and the bearing base 2, and use The double anode long-acting plasma chemical vapor deposition process makes the front and back surfaces of the lens 5 plated to form a uniform film, and the lens 5 for each preset contact lens has good hydrophilicity and anti-biochemical contamination. function, and utilizes the cross-linking effect between polyethylene glycol methacrylate and N-vinyl-2-rolepyrone, and prolongs the hydrophilic performance time of lens 5 for contact lenses and can reduce protein precipitation on the surface of each preset lens 5, thereby increasing the comfort of wearing the lens 5 of each preset contact lens and prolonging the service life of each preset lens 5.

且上述複數預設隱形眼鏡之鏡片5,再經過雙向陽極電漿化學氣相沉積鍍膜,使各預設鏡片5的正、反表面形成具親水性功能之官能基,該官能基則會與甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮接枝成為一體,所以可延長官能基為了最小化表面能回到熱平衡狀態而產生重組的情形,藉此達到延長親水性時間之效用,並能提高各預設鏡片5的正、反表面鍍膜的貼附性,增加鍍膜的穩定性等。 And the lenses 5 of the above-mentioned plurality of preset contact lenses are then coated by bidirectional anodic plasma chemical vapor deposition, so that the front and back surfaces of the preset lenses 5 form functional groups with hydrophilic functions, and the functional groups will interact with methyl alcohol. Polyethylene glycol based acrylate and N-vinyl-2-rolepyrone are grafted into one, so it can prolong the reorganization of the functional group in order to minimize the surface energy returning to the thermal equilibrium state, thereby extending the hydrophilic time The utility model can improve the adhesion of the coating on the front and back surfaces of each preset lens 5, and increase the stability of the coating.

上述詳細說明為針對本發明一種較佳之可行實施例說明而已,惟該實施例並非用以限定本發明之申請專利範圍,舉凡其它未脫離本發明所揭示之技藝精神下所完成之均等變化與修飾變更,均應包含於本發明所涵蓋之專利範圍中。 The above detailed description is only for describing a preferred feasible embodiment of the present invention, but this embodiment is not intended to limit the scope of the patent application of the present invention, and all other equivalent changes and modifications are completed without departing from the technical spirit disclosed in the present invention. Changes should be included in the patent scope covered by the present invention.

綜上所述,本發明上述雙向陽極電漿化學氣相沉積鍍膜設備於實際應用、實施時,為確實能達到預期之功效及目的,故本發明誠為一實用性優異之研發,為符合發明專利之申請要件,爰依法提出申請,盼 貴審查委員早日賜准本案,以保障發明人之辛苦研發、創設,倘若 鈞局暨貴審查委員對本案有任何稽疑,請不吝來電或來函指正賜教,發明人定當竭力配合,極感德便。 To sum up, the above-mentioned bidirectional anodic plasma chemical vapor deposition coating equipment of the present invention can achieve the expected effect and purpose in practical application and implementation. Therefore, the present invention is a research and development with excellent practicability, in order to comply with the invention The application requirements for a patent should be filed in accordance with the law. We hope that your review committee will approve this case as soon as possible to protect the inventor's hard work in research and development. If you have any doubts about this case, please feel free to call or write to us for corrections and advice. , the inventor will do his best to cooperate, and he is very grateful.

1:基座 1: Base

10:隔離空間 10: Isolation space

11:輸氣通道 11: Air channel

12:抽氣通道 12: Exhaust channel

13:閥門 13: Valve

14:電磁攪拌器 14: Electromagnetic stirrer

15:瓶體 15: bottle body

151:加熱器 151: Heater

2:承載台座 2: Bearing pedestal

20:腔室 20: Chamber

3:陽極分流面板 3: Anode shunt panel

30:作業空間 30: Workspace

4:升降機構 4: Lifting mechanism

41:供電部 41: Power Supply Department

42:絕緣本體 42: Insulation body

421:升降導桿 421: Lifting guide rod

422:接地部 422: Ground

Claims (10)

一種雙向陽極電漿化學氣相沉積鍍膜設備,係包括基座、承載台座、二陽極分流面板及升降機構,其中:該基座內部具有中空狀之隔離空間,頂部設有輸氣通道;該承載台座係裝設於基座之隔離空間內,並於承載台座設有複數中空狀之腔室;該二陽極分流面板係裝設於基座的隔離空間內、且分別位於承載台座的二相對表面外部,而供二陽極分流面板分別遮罩於複數腔室的二外側,則於二陽極分流面板與承載台座的複數腔室的二外側之間分別形成作業空間;及該升降機構一側係組裝於承載台座下方,另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之供電部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道。 A bidirectional anodic plasma chemical vapor deposition coating equipment, comprising a base, a bearing pedestal, two anode shunt panels and a lifting mechanism, wherein: the base has a hollow isolation space inside, and a gas transmission channel is arranged on the top; the bearing The pedestal is installed in the isolation space of the base, and a plurality of hollow chambers are arranged on the bearing pedestal; the two anode shunt panels are installed in the isolation space of the base, and are respectively located on two opposite surfaces of the bearing pedestal outside, and the two anode shunt panels are used to cover the two outer sides of the plurality of chambers respectively, so that a working space is formed between the two anode shunt panels and the two outer sides of the plurality of chambers of the bearing pedestal; and one side of the lifting mechanism is assembled Below the bearing pedestal, the other side extends out of the base for adjusting the longitudinal displacement of the bearing pedestal in the isolated space, and the lifting mechanism is provided with a power supply portion for supplying electrical energy to the bearing pedestal, and the pedestal around the lifting mechanism is provided The bottom is provided with one or more air extraction channels. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該承載台座係包括複數呈寬通道、窄通道銜接貫通狀之腔室,並於各腔室內部寬通道、窄通道銜接位置形成內肩部,以供預設隱形眼鏡之鏡片由寬通道內呈水平橫放,抵靠於內肩部處。 The bidirectional anodic plasma chemical vapor deposition coating equipment as claimed in claim 1, wherein the bearing pedestal comprises a plurality of chambers with wide channels and narrow channels connected through, and the wide channels and narrow channels are connected inside each chamber The position forms an inner shoulder so that the lens of the preset contact lens is horizontally laid out from the wide channel and abuts against the inner shoulder. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該二陽極分流面板之面積係等於或大於承載台座之面積,且該二陽極分流面板與承載台座、複數腔室的二外側之間分別形成相同或相異高度之作業空間。 The bidirectional anodic plasma chemical vapor deposition coating equipment as claimed in claim 1, wherein the area of the two anode shunt panels is equal to or greater than the area of the bearing pedestal, and the two anode shunt panels and the bearing pedestal and the two chambers are Work spaces with the same or different heights are formed between the outer sides. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該升降機構係包括穿設於基座呈氣密式之絕緣本體,再於絕緣本體內部設有金屬導電材質製成並呈縱向位移之升降導桿,且升降機構所設之供電部係為射頻發電機。 The bidirectional anodic plasma chemical vapor deposition coating equipment as claimed in claim 1, wherein the lifting mechanism comprises an air-tight insulating body pierced through the base, and a metal conductive material is arranged inside the insulating body. The lift guide rod is longitudinally displaced, and the power supply part of the lift mechanism is a radio frequency generator. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,係包括具中空狀隔離空間之基座、組裝於基座的隔離空間內部之承載台座及二陽極分流面板,該承載台座內部具有貫通狀之複數腔室,且基座係於頂部設有輸氣通道及至少一個或一個以上供液體蒸氣輸入之閥門,且至少一個或一個以上之閥門連接有承裝液體之瓶體,並於至少一個或一個以上之瓶體上設有加熱器及電磁攪拌器,而供二陽極分流面板位於承載台座的二相對表面外部、並遮罩於複數腔室的二外側,則於二陽極分流面板與承載台座的二外側之間分別形成作業空間,二陽極分流面板分別電性連接於供電部,再於承載台座下方組裝升降機構,該升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,該升降機構周邊之基座底部設有一個或一個以上之抽氣通道,其中該雙向陽極電漿化學氣相沉積鍍膜之步驟係為:(A01)清洗基座及內部之承載台座,並清除承載台座表面的水分;(A02)清潔基座內部隔離空間、承載台座及二陽極分流面板;(A03)將承載台座置入基座之隔離空間內;(A04)透過抽氣通道對基座之隔離空間進行抽真空處理;(A05)利用輸氣通道對基座之隔離空間注入工作氣體,並開啟供電 部,以對隔離空間產生電漿進行內部清潔;(A06)將複數預設隱形眼鏡之鏡片分別置入承載台座之各腔室內;(A07)再次對基座之隔離空間進行抽真空處理;(A08)對基座的隔離空間通入前處理氣體,啟動升降機構之供電部對二陽極分流面板進行電漿預處理;(A09)停止對基座的隔離空間注入氣體,並對隔離空間進行洩壓,再開啟基座;(A10)關閉基座,並對基座之隔離空間進行抽真空處理,且開啟加熱器對承裝液體的至少一個或一個以上之瓶體加熱,同時開啟至少一個或一個以上之電磁攪拌器,再確認該瓶體已經被加熱;(A11)由輸氣通道對基座之隔離空間注入氬氣,再自至少一個或一個以上之閥門加入液體蒸氣後,調整氬氣之流量,基座內隔離空間之壓力呈不穩定,透過至少一個或一個以上之閥門加入液體蒸氣維持預定壓力;(A12)開啟供電部對基座的隔離空間內之二陽極分流面板進行供電,並確認基座的隔離空間之壓力,若壓力有變動,則調整輸入液體蒸氣的至少一個或一個以上之閥門,使基座內隔離空間維持預定之壓力,並對承載台座的各腔室內的各預設隱形眼鏡之鏡片進行鍍膜;(A13)基座的隔離空間內位於承載台座上、下方二相對之陽極分流面板,對各腔室內之各預設鏡片進行雙向陽極電漿化學氣相 沉積處理;(A14)利用供電部對二陽極分流面板供電,藉由接地部對承載台座供電,該承載台座成為陰極電極板,而二陽極分流面板透過供電部提供電漿功率,則可透過二陽極分流面板與承載台座之間的各作業空間形成雙向陽極電漿氣相化學沉積作用,使電漿集中於承載台座的各腔室中,且供電漿沉積於各腔室內各預設鏡片之正、反表面處,以供各預設鏡片的正、反表面同時進行鍍膜處理;(A15)鍍膜結束,關閉供電部、至少一個或一個以上之瓶體的加熱器及至少一個或一個以上之電磁攪拌器,再透過輸氣通道對基座的隔離空間注入氣體;(A16)確認承裝液體的至少一個或一個以上之瓶體降溫至室溫,關閉該至少一個或一個以上瓶體連接之閥門;(A17)將輸氣通道對基座的隔離空間注入之氬氣關閉,使基座內部隔離空間回壓至正常壓力,即可取出已鍍膜的複數預設隱形眼鏡之鏡片。 The bidirectional anodic plasma chemical vapor deposition coating equipment as claimed in claim 1 comprises a base with a hollow isolation space, a support base assembled inside the isolation space of the base, and two anode shunt panels, the interior of the support base It has a plurality of through chambers, and the base is provided with a gas transmission channel and at least one or more valves for liquid vapor input at the top, and at least one or more valves are connected with a bottle body for holding liquid, and At least one or more than one bottle body is provided with a heater and an electromagnetic stirrer, and the two anode shunt panels are located on the outside of the two opposite surfaces of the bearing pedestal, and cover the two outer sides of the plurality of chambers, then the two anode shunts A working space is formed between the panel and the two outer sides of the bearing pedestal. The two anode shunt panels are respectively electrically connected to the power supply part, and a lifting mechanism is assembled under the bearing pedestal. The other side of the lifting mechanism extends out of the base for adjustment. The bearing platform is located in the longitudinal displacement of the isolation space, and the lifting mechanism is provided with a grounding portion for supplying electrical energy to the bearing platform, and the bottom of the pedestal around the lifting mechanism is provided with one or more air extraction channels, wherein the bidirectional anode plasma chemical The steps of vapor deposition coating are as follows: (A01) Clean the base and the inner bearing pedestal, and remove the moisture on the surface of the bearing pedestal; (A02) Clean the isolation space inside the pedestal, the bearing pedestal and the two anode shunt panels; (A03) Put the bearing base into the isolation space of the base; (A04) Evacuate the isolation space of the base through the air extraction channel; (A05) Use the gas transmission channel to inject the working gas into the isolation space of the base, and turn on the power supply (A06) Put the lenses of a plurality of preset contact lenses into the chambers of the pedestal respectively; (A07) Evacuate the isolated space of the base again; (A07) A08) Pour the pretreatment gas into the isolation space of the base, start the power supply part of the lifting mechanism to perform plasma pretreatment on the two anode shunt panels; (A09) Stop injecting gas into the isolation space of the base, and vent the isolation space pressure, and then open the base; (A10) close the base, vacuumize the isolated space of the base, and turn on the heater to heat at least one or more bottles containing liquid, and simultaneously turn on at least one or more bottles. One or more electromagnetic stirrers, and then confirm that the bottle body has been heated; (A11) Inject argon gas into the isolation space of the base through the gas delivery channel, and then add liquid vapor from at least one or more valves, and adjust the argon gas The pressure of the isolation space in the base is unstable, and liquid vapor is added through at least one or more valves to maintain the predetermined pressure; (A12) Turn on the power supply unit to supply power to the two anode shunt panels in the isolation space of the base, And confirm the pressure of the isolation space of the base. If the pressure changes, adjust at least one or more valves for inputting the liquid vapor to maintain the predetermined pressure in the isolation space in the base, and adjust the pressure of each chamber in the bearing platform. The lenses of the preset contact lenses are coated; (A13) In the isolation space of the base, two opposite anode shunt panels are located on the upper and lower sides of the bearing platform, and the bidirectional anodic plasma chemical vapor phase is applied to each preset lens in each chamber. Deposition treatment; (A14) use the power supply part to supply power to the two anode shunt panels, and use the ground part to supply power to the bearing pedestal, the bearing pedestal becomes a cathode electrode plate, and the two anode shunt panels provide plasma power through the power supply part, and can pass through the two anode shunt panels. Each working space between the anode shunt panel and the bearing pedestal forms a bidirectional anode plasma vapor chemical deposition effect, so that the plasma is concentrated in each chamber of the bearing pedestal, and the plasma is deposited on the positive side of each preset lens in each chamber. , at the reverse surface, so that the positive and negative surfaces of each preset lens can be coated at the same time; (A15) After coating, turn off the power supply, at least one or more heaters of the bottle body, and at least one or more electromagnetic Stirrer, and then inject gas into the isolation space of the base through the gas transmission channel; (A16) Confirm that at least one or more bottles containing liquid are cooled to room temperature, and close the valve connecting the at least one or more bottles (A17) Close the argon gas injected into the isolation space of the base by the gas transmission channel, and make the isolation space inside the base back to the normal pressure, and then the lenses of the multiple preset contact lenses that have been coated can be taken out. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該步驟(A01)之對基座內部承載台座進行清洗作業,係先以清水對承載台座作進行清洗,再利用異丙醇進行清洗,則藉由壓縮乾燥空氣清除承載台座表面的水分;並利用逆滲透水對基座內部隔離空間及承載台座進行擦拭,且藉由異丙醇對基座內部隔離空間及承載台座進行擦拭至少二次或二次以上;而該基座於一側至少一個或一個以上之 閥門連接有承裝液體之瓶體,該至少一個或一個以上之瓶體係供承裝親水性之液體,該親水性之液體係為甲基丙烯酸聚乙二醇酯或N-乙烯基-2-咯吡酮;則該步驟(A11)對基座之隔離空間注入氬氣的流量為8sccm,當調整氬氣之流量時係調整氬氣流量至12sccm;至於該親水性液體蒸氣係為先加入甲基丙烯酸聚乙醇酯,壓力控制於1.5~2*10-1Torr;再加入N-乙烯基-2-咯吡酮,壓力控制於2~3*10-1Torr;該步驟(A12)當基座內隔離空間壓力不穩定呈浮動情況,加入親水性液體PEGMA/NVP蒸氣時,預定壓力維持在3*10-1Torr。 The bidirectional anodic plasma chemical vapor deposition coating equipment according to claim 5, wherein in the step (A01), the cleaning operation of the inner bearing pedestal of the base is to first clean the bearing pedestal with clean water, and then use isopropyl For cleaning with alcohol, the moisture on the surface of the bearing pedestal is removed by compressing dry air; reverse osmosis water is used to wipe the inner isolation space of the pedestal and the bearing pedestal, and isopropyl alcohol is used to clean the inner isolation space of the pedestal and the bearing pedestal. Wipe at least two times or more; and at least one or more valves on one side of the base are connected with a bottle body for holding liquid, and the at least one or more bottle system is used for holding hydrophilic liquid, the The hydrophilic liquid system is polyethylene glycol methacrylate or N-vinyl-2-rolepyridone; then the flow rate of argon gas injected into the isolation space of the base in this step (A11) is 8sccm, when adjusting the argon gas The flow rate of argon is adjusted to 12sccm; as for the hydrophilic liquid vapor, polyethyl methacrylate is added first, and the pressure is controlled at 1.5~2*10 -1 Torr; then N-vinyl-2- Pyridone, the pressure is controlled at 2~3*10 -1 Torr; in this step (A12), when the pressure of the isolation space in the base is unstable and floats, and the hydrophilic liquid PEGMA/NVP vapor is added, the predetermined pressure is maintained at 3*10 -1 Torr. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該步驟(A04)及(A07)之抽真空處理,必須確認隔離空間內部壓力達1.0*10-1Torr以下;而該步驟(A10)之抽真空處理,且必須確認隔離空間內部壓力達3.0*100-2Torr以下;且該步驟(A10)之啟動至少一個或一個以上之電磁攪拌器,該各電磁攪拌器係分別以20rpm/sec〔轉/秒〕之速度運作。 The bidirectional anodic plasma chemical vapor deposition coating equipment according to claim 5, wherein the vacuum treatment in the steps (A04) and (A07) must confirm that the internal pressure of the isolated space is below 1.0*10 -1 Torr; and the In the vacuum treatment of step (A10), it must be confirmed that the internal pressure of the isolated space reaches below 3.0* 100-2 Torr; and in the step (A10), at least one or more electromagnetic stirrers are activated, and the electromagnetic stirrers are respectively Operates at a speed of 20rpm/sec. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該步驟(A05)之工作氣體係為氬氣及氧氣,並以電漿壓力:60W,進行8分鐘之清潔處理作業;該步驟(A08)、(A09)對基座之隔離空間注入之氣體係為氬氣,而該預定時間為10~30分鐘;且該步驟(A08)之前處理氣體,係為氬氣及氧氣;而該步驟(A05)、(A08)、(A12)、(A14)啟動升降機構之供電部進行電漿處理或供電,該供電部係為射頻發電機;則該步驟(A05)之供電部的射頻發電機設定120W,處理時間為5-10分鐘;且步驟(A08)開啟升降機 構之供電部對二陽極分流面板進行電漿處理,設定該射頻發電機為40W,持續16分鐘,並確認基座內隔離空間之壓力為300mTorr;至於該基座內隔離空間維持之預定壓力係為300-350mTorr;該步驟(A09)對基座內隔離空間洩壓,係將隔離空間洩壓至1atm,且開啟基座為1~3分鐘。 The bidirectional anodic plasma chemical vapor deposition coating equipment as claimed in claim 5, wherein the working gas system of this step (A05) is argon and oxygen, and the cleaning operation is performed for 8 minutes with the plasma pressure: 60W; The gas system injected into the isolation space of the base in the steps (A08) and (A09) is argon, and the predetermined time is 10 to 30 minutes; and the processing gas before the step (A08) is argon and oxygen; In the steps (A05), (A08), (A12), (A14), the power supply part of the lifting mechanism is activated to perform plasma processing or power supply, and the power supply part is a radio frequency generator; then the power supply part of the step (A05) is The radio frequency generator is set to 120W, and the processing time is 5-10 minutes; and step (A08) starts the elevator The power supply part of the structure conducts plasma treatment on the two anode shunt panels, sets the RF generator to 40W for 16 minutes, and confirms that the pressure of the isolation space in the base is 300mTorr; as for the predetermined pressure maintained in the isolation space in the base is 300-350mTorr; this step (A09) depressurizes the isolation space in the base, which is to depressurize the isolation space to 1 atm, and open the base for 1 to 3 minutes. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該步驟步驟(A06)將複數預設隱形眼鏡的鏡片呈水平行向方式分別置入承載台座之各腔室內,且該承載台座係設有複數分別呈寬通道、窄通道銜接貫通狀之腔室,並於各腔室內部的寬通道、窄通道銜接位置設有供各預設隱形眼鏡的鏡片分別由各寬通道內呈水平橫放、抵靠之內肩部。 The bidirectional anodic plasma chemical vapor deposition coating equipment according to claim 5, wherein the step (A06) is to place the lenses of a plurality of preset contact lenses into each chamber of the bearing base in a horizontal row, and the The bearing pedestal is provided with a plurality of chambers which are respectively connected with a wide channel and a narrow channel, and at the connecting position of the wide channel and the narrow channel inside each chamber, the lenses for each preset contact lens are respectively connected from each wide channel. Lay horizontally against the inner shoulders. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該步驟(A15)對基座的隔離空間注入之氣體係為氬氣,持續15分鐘;該步驟(A17)之基座內部隔離空間係回復至正常大氣壓力:1kg/cm2。 The bidirectional anodic plasma chemical vapor deposition coating equipment according to claim 5, wherein the gas system injected into the isolation space of the susceptor in this step (A15) is argon for 15 minutes; the susceptor of this step (A17) The internal isolation space is returned to normal atmospheric pressure: 1kg/cm2.
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