TWM615604U - Bidirectional anode plasma chemical vapor deposition coating apparatus - Google Patents

Bidirectional anode plasma chemical vapor deposition coating apparatus Download PDF

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Publication number
TWM615604U
TWM615604U TW110204480U TW110204480U TWM615604U TW M615604 U TWM615604 U TW M615604U TW 110204480 U TW110204480 U TW 110204480U TW 110204480 U TW110204480 U TW 110204480U TW M615604 U TWM615604 U TW M615604U
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Taiwan
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bearing pedestal
anode
base
lifting mechanism
vapor deposition
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TW110204480U
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Chinese (zh)
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林文賓
黃雪芳
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亨泰光學股份有限公司
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Abstract

本創作為有關一種雙向陽極電漿化學氣相沉積鍍膜設備,其係於基座內部中空狀之隔離空間、頂部設有輸氣通道,且於隔離空間內裝設承載台座,該承載台座設有複數中空狀之腔室,而於承載台座的二相對表面外部再裝設二陽極分流面板及供電部,二陽極分流面板則分別遮罩於複數腔室的二外側,則相對內側分別形成作業空間,另將升降機構一側組裝於承載台座下方,升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道,達到於隱形眼鏡的鏡片之凹、凸表面均勻鍍膜之目的。 This creation is about a two-way anode plasma chemical vapor deposition coating equipment, which is located in the hollow isolation space inside the base, with a gas transmission channel on the top, and a bearing pedestal is installed in the isolation space, and the bearing pedestal is equipped with A plurality of hollow chambers, and two anode shunt panels and power supply parts are installed outside the two opposite surfaces of the bearing pedestal. The two anode shunt panels are respectively shielded on the two outer sides of the plurality of chambers, and the opposite inner sides form working spaces respectively , In addition, one side of the lifting mechanism is assembled under the bearing pedestal, and the other side of the lifting mechanism is extended out of the base to adjust the longitudinal displacement of the bearing pedestal in the isolated space, and the lifting mechanism is provided with a grounding portion for supplying power to the bearing pedestal , And at the bottom of the base around the lifting mechanism is provided with one or more air extraction channels to achieve the purpose of uniform coating on the concave and convex surfaces of the contact lens.

Description

雙向陽極電漿化學氣相沉積鍍膜設備 Bidirectional anode plasma chemical vapor deposition coating equipment

本創作係提供一種雙向陽極電漿化學氣相沉積鍍膜設備,尤指針對隱形眼鏡的凹、凸表面進行鍍膜之設備,係於基座內部裝設承載台座及二陽極分流面板,而於承載台座的複數腔室內置入隱形眼鏡之鏡片,以達到進行隱形眼鏡之鏡片鍍膜程序之目的,並延長隱形眼鏡的親水性時間、抗沾污之功能。 This creation provides a two-way anode plasma chemical vapor deposition coating equipment, especially the equipment for coating the concave and convex surfaces of contact lenses. It is equipped with a bearing pedestal and a two-anode shunt panel inside the base, and the bearing pedestal The multiple chambers of the contact lens are built into the lens of the contact lens to achieve the purpose of the lens coating procedure of the contact lens, and to extend the hydrophilic time and anti-contamination function of the contact lens.

按,隨著各種電子、電氣產品的研發、創新,帶給人們在日常生活及工作上許多便捷,尤其是3C電子產品的大量問世,更造成無線通訊及網際網路等的應用普及化,便導致許多人沉溺在使用3C電子產品的境界中,且長時間大量應用3C電子產品,舉凡學生族群、青少年、上班族、或是部分中、老年人等,幾乎不分男女、老少,涵蓋的範圍相當廣泛,進而衍生出生活中常見的低頭族景像,並造成的許多人的眼睛視力減損、傷害退化等情況日益嚴重,亦直接導致社會上近視人口的急遽提升,眼鏡及隱形眼鏡的使用人口也隨之增加。 By the way, with the development and innovation of various electronic and electrical products, it has brought people a lot of convenience in daily life and work, especially the advent of a large number of 3C electronic products, which has led to the popularization of wireless communication and Internet applications. Many people are indulging in the use of 3C electronic products, and a large number of 3C electronic products are used for a long time. For example, students, young people, office workers, or some middle-aged and elderly people, almost regardless of men and women, young and old, and covering the scope It is quite extensive, which leads to the common sight of people with lowered heads in life, and causes many people's eyesight loss, injury and deterioration, etc., which are becoming more and more serious. It also directly leads to a rapid increase in the myopia population in the society, and the use of glasses and contact lenses. Also increase.

則人們為了解決近視所造成的不便及困擾等,都會配戴眼鏡、隱形眼鏡、角膜塑型鏡片等矯正視力或者透過角膜近視手術進行矯正等,一般常用的隱形眼鏡之鏡片,通常廠商在製造時會在隱形眼鏡的表面 實施電漿表面改質處理,藉以提升隱形眼鏡的親水性,增加配戴隱形眼鏡時的舒適度,但一般隱形眼鏡的親水性只能維持1~2星期左右,其主要因素可列舉以下項目: In order to solve the inconvenience and trouble caused by myopia, people will wear glasses, contact lenses, orthokeratology lenses, etc. to correct their vision or correct them through corneal myopia surgery. Generally, the commonly used contact lens lenses are usually manufactured by manufacturers. On the surface of the contact lens Plasma surface modification treatment is implemented to improve the hydrophilicity of contact lenses and increase the comfort of wearing contact lenses. However, the hydrophilicity of contact lenses can only be maintained for about 1 to 2 weeks. The main factors include the following items:

(一)隱形眼鏡之鏡片在進行電漿表面改質處理期間及電漿表面改質處理後,所產生的化學基團為了最小化表面能以及回到熱平衡的狀態會進行重組(re-arrangement),藉此產生疏水性回復現象。 (1) During and after the plasma surface modification treatment of the contact lens lens, the chemical groups generated will undergo re-arrangement in order to minimize the surface energy and return to a state of thermal equilibrium. , Thereby generating a hydrophobic recovery phenomenon.

(二)當經由電漿表面改質處理後的隱形眼鏡之鏡片,大部分在鏡片表面接觸空氣時其表面即會產生新的氧化及降解反應,因而產生疏水性回復現象。 (2) When most of the contact lens lenses after plasma surface modification treatment are exposed to air, new oxidation and degradation reactions will occur on the surface of the lens, which will result in hydrophobic recovery.

(三)為了使隱型眼鏡之鏡片以較低的表面能達成穩定的熱平衡狀態,所以少部分低分子的氧化分子會移向鏡片的內部,進而產生疏水性回復現象。 (3) In order to achieve a stable thermal equilibrium state for the contact lens lens with a lower surface energy, a small part of the low-molecular oxidized molecules will move to the inside of the lens, thereby causing the phenomenon of hydrophobic recovery.

(四)未經改質的低分子量物種(species)及大分子(macromolecules)會從隱形眼鏡之鏡片內部移向表面,因此促進疏水性回復的程度及在表面形成低表面能的低分子層。 (4) Unmodified low-molecular-weight species and macromolecules will move from the inside of the contact lens to the surface, thus promoting the degree of hydrophobic recovery and the formation of a low-molecular-weight layer with low surface energy on the surface.

(五)隱形眼鏡之鏡片表面的極性化學基團產生重新轉向(reorientation)之情形。 (5) Reorientation of the polar chemical groups on the surface of the contact lens.

(六)基材表面粗糙度(the relaxation of the surface roughness)並未因電漿表面改質改善。 (6) The relaxation of the surface roughness is not improved by plasma surface modification.

基於以上各項因素,隱形眼鏡之鏡片經由電漿表面改質處理經過一~二星期後,其表面的接觸角便會逐漸增加,而變成疏水性表面,且大約在第10~14天時,則會回復至和未經電漿處理的隱形眼鏡之鏡片 相同的接觸角,則當配戴者配戴疏水性之隱形眼鏡的鏡片時,配戴者的眼球即會感受到不適的異物感,以致於影響配戴者繼續配戴隱形眼鏡的意願;且疏水性隱形眼鏡之鏡片也容易供沉澱物黏著、貼附,鏡片上的沉澱物不僅會影響配戴者的視力、配戴隱形眼鏡之鏡片的舒適度及鏡片表面潤溼度,又,沉澱物中的蛋白質沉澱亦容易成為細菌成長的溫床,而當沉澱物在隱形眼鏡之鏡片表面的蛋白質隨著時間產生變性時,可能會誘發人體的免疫反應,進而造成巨大乳突狀結膜炎(Giant Papillary Conjunctivitis)、急性紅眼等角膜感染之徵象,導致配戴者無法配戴隱形眼鏡;另,由於位於隱形眼鏡之鏡片上的沉澱物,無法藉由隱形眼鏡清潔劑完全去除,所以一段時間後,沉澱物便會與隱形眼鏡之鏡片本身的材質結合,便會縮短隱形眼鏡的鏡片之使用時間,並導致鏡片的損壞。 Based on the above factors, after one to two weeks of plasma surface modification treatment, the contact angle of the contact lens will gradually increase and become a hydrophobic surface, and it is about 10 to 14 days. Will revert to the lens of the contact lens that has not been treated with plasma With the same contact angle, when the wearer wears a hydrophobic contact lens lens, the wearer’s eyeball will feel uncomfortable foreign body sensation, which will affect the wearer’s willingness to continue wearing the contact lens; and The lenses of hydrophobic contact lenses are also easy for deposits to adhere and stick. The deposits on the lenses will not only affect the wearer’s vision, the comfort of wearing contact lenses and the wettability of the lens surface, but also the deposits. The protein deposits are also easy to become a breeding ground for bacterial growth, and when the deposits on the surface of the contact lens lens degenerate over time, it may induce the body's immune response and cause Giant Papillary Conjunctivitis (Giant Papillary Conjunctivitis) , Acute red eye and other signs of corneal infection, make the wearer unable to wear contact lenses; in addition, because the deposits on the lenses of the contact lenses cannot be completely removed by contact lens cleaners, the deposits will disappear after a period of time It will be combined with the material of the lens of the contact lens, it will shorten the use time of the lens of the contact lens, and cause the damage of the lens.

是以,如何解決目前隱形眼鏡之鏡片製造、配戴時所存在之問題與困擾等,隱形眼鏡配戴時形成沉澱物及親水性時間較短之麻煩與缺失等,即為從事此行業之相關廠商所亟欲研究改善之方向所在者。 Therefore, how to solve the problems and troubles in the manufacturing and wearing of the current contact lens lenses, the formation of deposits when wearing contact lenses and the troubles and deficiencies in the short hydrophilic time, etc., are related to engaging in this industry. Manufacturers desperately want to study the direction of improvement.

故,創作人有鑑於上述之問題與缺失,乃蒐集相關資料,經由多方評估及考量,並以從事於此行業累積之多年經驗,經由不斷試作及修改,始設計出此種雙向陽極鍍長效型電漿化學氣相沉積法鍍膜於隱形眼鏡設備的新型專利誕生。 Therefore, in view of the above-mentioned problems and deficiencies, the creators collected relevant information, evaluated and considered in many ways, and based on the accumulated years of experience in this industry, through continuous trials and modifications, they began to design this kind of bidirectional anode plating long-lasting effect. The new patent of plasma chemical vapor deposition method for coating contact lens equipment was born.

本創作之主要目的乃在於該雙向陽極電漿化學氣相沉積鍍膜設備,其係於基座內部中空狀之隔離空間、頂部設有輸氣通道,且於隔離空間內裝設承載台座,該承載台座設有複數中空狀之腔室,而於承載台 座的二相對表面外部再裝設二陽極分流面板及供電部,二陽極分流面板為分別遮罩於複數腔室的二外側,則相對內側分別形成作業空間,另將升降機構一側組裝於承載台座下方,升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道,達到於隱形眼鏡的鏡片之凹、凸表面均勻鍍膜之目的,並供隱形眼鏡之鏡片親水性效能時間延長,並可減少蛋白質沉澱在鏡片表面,以及減少表面粗糙度,藉以增加隱形眼鏡之鏡片配戴時的舒適度及鏡片的使用壽命延長之功效。 The main purpose of this creation is the two-way anode plasma chemical vapor deposition coating equipment, which is located in the hollow isolation space inside the base, with a gas transmission channel on the top, and a bearing pedestal is installed in the isolation space. The pedestal is provided with a plurality of hollow chambers, and the carrying platform Two anode shunt panels and power supply parts are installed on the outside of the two opposite surfaces of the seat. The two anode shunt panels are respectively shielded on the two outer sides of the plurality of chambers, and the opposite inner sides form working spaces respectively. In addition, one side of the lifting mechanism is assembled on the bearing Below the pedestal, the other side of the lifting mechanism extends out of the base to adjust the longitudinal displacement of the bearing pedestal in the isolated space, and the lifting mechanism is provided with a grounding portion for supplying electric power to the bearing pedestal, and is located at the base around the lifting mechanism One or more air extraction channels are provided at the bottom to achieve the purpose of uniform coating on the concave and convex surfaces of the contact lens, and to extend the hydrophilic performance time of the contact lens and reduce the precipitation of protein on the surface of the lens, and Reduce the surface roughness, thereby increasing the comfort of wearing contact lenses and extending the service life of the lenses.

本創作之另一目的乃在於該承載台座係設有複數腔室,各腔室分別呈寬通道、窄通道銜接貫通狀,並於各寬通道、窄通道銜接位置形成內肩部,可供預設隱形眼鏡由寬通道內呈水平橫放,抵靠於內肩部處;而二陽極分流面板之面積係可等於或大於承載台座之面積,且該二陽極分流面板與承載台座、複數腔室之間分別形成相同或相異高度之作業空間。 Another purpose of this creation is that the bearing pedestal is provided with a plurality of chambers, each chamber is in the shape of a wide channel and a narrow channel connecting through, and an inner shoulder is formed at the connecting position of each wide channel and narrow channel, which can be used for pre-preparation. The contact lens is placed horizontally from the wide channel and abuts against the inner shoulder; and the area of the two-anode shunt panel can be equal to or larger than the area of the bearing pedestal, and the two-anode shunt panel and the bearing pedestal, multiple chambers The working spaces of the same or different heights are formed between them.

本創作之再一目的乃在於該升降機構係設有氣密式之絕緣本體、以供穿設於基座,再於絕緣本體內部設有金屬導電材質製成並呈縱向位移之升降導桿,該升降導桿一側延伸入基座的隔離空間內且結合於承載台座底部,而該升降導桿另側為延伸出基座外部並電性連接於接地部,且二陽極分流面板所設之供電部係為射頻發電機,誘使電漿從二陽極分流面板產生至承載台座(陰極電極板)方向鍍膜於隱形眼鏡上。 Another purpose of this creation is that the lifting mechanism is provided with an airtight insulating body for passing through the base, and then a lifting guide rod made of metal conductive material and longitudinally displaced is arranged inside the insulating body One side of the lifting guide rod extends into the isolation space of the base and is combined with the bottom of the bearing platform, and the other side of the lifting guide rod extends out of the base and is electrically connected to the grounding part, and the two anode shunt panel is provided The power supply part is a radio frequency generator, which induces plasma to be generated from the two-anode shunt panel to the bearing pedestal (cathode electrode plate) and coated on the contact lens.

本創作之又一目的乃在於該隱形眼鏡進行雙向陽極鍍長效 型電漿化學氣相沉積法鍍膜之步驟係為:清洗基座內部之承載台座,並清除承載台座表面的水分;清潔基座內部隔離空間、承載台座及二陽極分流面板;將承載台座置入基座之隔離空間內;透過抽氣通道對基座之隔離空間進行抽真空處理;利用輸氣通道對基座之隔離空間注入產生等體離子之氣體(工作氣體),開啟射頻發電機以對隔離空間內部進行清潔;將複數預設隱形眼鏡之鏡片分別置入承載台座之各腔室內;再次對基座之隔離空間進行抽真空處理;利用輸氣通道對基座之隔離空間助入產生等離子之氣體(工作氣體),待基座內部隔離空間壓力穩定後,再開啟射頻發電機,則開始對隱形眼鏡之鏡片進行預處理,完成預處理後,關閉發電機;關閉氣體流量,關閉抽氣馬達,並打開基座;已達曝氣之目的,再關閉基座重複對基座之隔離空間進行抽空處理,將至少一個或一個以上之閥門所連接承裝液體之瓶體的加熱器予以開啟,同時開啟電磁攪拌器,並確認瓶體被加熱後,對基座之隔離空間注入工作氣體,同時確認隔離空間內之壓力穩定,再將至少一個或一個以上瓶體中之液體蒸氣加入基座之隔離空間內,並控制隔離空間內之壓力,對隱形眼鏡之鏡片進行鍍膜,承載台座為陰極電極板、其上下方之二陽極分流面板利用供電部為電漿功率,透過二陽極分流面板及承載台座對各腔室內隱形眼鏡之鏡片進行雙向陽極電漿化學氣相沉積作用鍍膜,待鍍膜作業結束,關閉發電機,再關閉瓶體之加熱器及電磁攪拌器,並確認瓶體以降溫至室溫狀態,將至少一個或一個以上之閥門關閉,關閉位於基座底部之抽氣通道,調整基座內部隔離空間之壓力至常壓,即可將承載台取出隔離空間,將承載台上各腔室內隱形眼鏡之鏡片取出。 Another purpose of this creation is to carry out long-lasting bidirectional anode plating on the contact lens The steps of plasma chemical vapor deposition method are: cleaning the bearing pedestal inside the pedestal and removing the moisture on the surface of the bearing pedestal; cleaning the isolation space inside the pedestal, the bearing pedestal and the two-anode shunt panel; placing the bearing pedestal in Inside the isolated space of the base; vacuumize the isolated space of the base through the air extraction channel; use the gas transmission channel to inject the gas (working gas) that generates plasma ions into the isolated space of the base, and turn on the radio frequency generator to Clean the interior of the isolated space; place the lenses of a plurality of preset contact lenses into the chambers of the pedestal; vacuumize the isolated space of the pedestal again; use the gas channel to help generate plasma in the isolated space of the pedestal After the pressure in the isolation space inside the base stabilizes, turn on the RF generator to start the pretreatment of the contact lens lenses. After the pretreatment is completed, turn off the generator; turn off the gas flow and turn off the exhaust Motor, and open the base; when the purpose of aeration is reached, close the base again to evacuate the isolated space of the base, and turn on the heater of the bottle containing the liquid connected to at least one or more valves , Turn on the electromagnetic stirrer at the same time, and after confirming that the bottle is heated, inject working gas into the isolated space of the base, and at the same time confirm that the pressure in the isolated space is stable, and then add at least one or more liquid vapor in the bottle to the base In the isolated space, and control the pressure in the isolated space to coat the lens of the contact lens, the bearing pedestal is the cathode electrode plate, and the two anode shunt panels above and below it use the power supply as the plasma power through the two anode shunt panels and The bearing pedestal conducts bidirectional anode plasma chemical vapor deposition coating on the contact lens lenses in each cavity. When the coating operation is over, turn off the generator, then turn off the heater and electromagnetic stirrer of the bottle body, and confirm that the bottle body is cooled to At room temperature, close at least one or more valves, close the air extraction channel at the bottom of the base, adjust the pressure of the isolation space inside the base to normal pressure, and then remove the bearing platform from the isolation space, Take out the lens of the contact lens in the chamber.

1:基座 1: pedestal

10:隔離空間 10: Isolated space

11:輸氣通道 11: Gas transmission channel

12:抽氣通道 12: Exhaust channel

13:閥門 13: Valve

14:電磁攪拌器 14: Electromagnetic stirrer

15:瓶體 15: Bottle body

151:加熱器 151: heater

2:承載台座 2: Bearing pedestal

20:腔室 20: Chamber

201:寬通道 201: wide channel

202:窄通道 202: narrow channel

203:內肩部 203: inner shoulder

3:陽極分流面板 3: Anode shunt panel

30:作業空間 30: Work space

4:升降機構 4: Lifting mechanism

41:供電部 41: Power Supply Department

42:絕緣本體 42: Insulating body

421:升降導桿 421: Lifting guide rod

422:接地部 422: Grounding part

5:鏡片 5: Lens

[第1圖]係為本創作之立體外觀圖。 [Picture 1] is the three-dimensional appearance of this creation.

[第2圖]係為本創作承載台座之立體外觀圖。 [Picture 2] is the three-dimensional appearance of the creative bearing pedestal.

[第3圖]係為本創作承載台座之局部剖面圖。 [Picture 3] is a partial cross-sectional view of this creative bearing pedestal.

[第4圖]係為本創作鍍膜作業之流程圖(一)。 [Picture 4] is the flow chart (1) of this creative coating operation.

[第5圖]係為本創作鍍膜作業之流程圖(二)。 [Picture 5] is the flow chart (2) of this creative coating operation.

[第6圖]係為本創作鍍膜作業之流程圖(三)。 [Picture 6] is the flow chart (3) of this creative coating operation.

為達成上述目的與功效,本創作所採用之技術手段及其構造、實施之方法等,茲繪圖就本創作之較佳實施例詳加說明其特徵與功能如下,俾利完全瞭解。 In order to achieve the above-mentioned purposes and effects, the technical means used in this creation, its structure, and the method of implementation, etc., are drawn to illustrate the characteristics and functions of the preferred embodiment of this creation in detail as follows, for the benefit of a complete understanding.

請參閱第1、2、3圖所示,係為本創作之立體外觀圖、承載台座之立體外觀圖、承載台座之局部剖面圖,由圖中所示可以清楚看出,本創作雙向陽極鍍長效型電漿化學氣相沉積法鍍膜於隱形眼鏡設備,係包括基座1、承載台座2、二陽極分流面板3及升降機構4,其中: Please refer to Figures 1, 2 and 3, which are the three-dimensional appearance of this creation, the three-dimensional appearance of the bearing pedestal, and the partial cross-sectional view of the bearing pedestal. It can be clearly seen from the figures that this creation is two-way anodized. Long-term plasma chemical vapor deposition method for coating on contact lens equipment includes a base 1, a bearing stand 2, a two-anode shunt panel 3, and a lifting mechanism 4. Among them:

該基座1內部具有中空狀之隔離空間10,頂部設有輸氣通道11、底部設有至少一個或一個以上之抽氣通道12,並於至至少一側邊設有至少一個或一個以上輸送液體之閥門13及電磁攪拌器14,且至少一個或一個以上閥門13為連接有承裝液體之瓶體15,並於至少一個或一個以上之瓶體15處設有加熱器151及至少一個或一個以上電磁攪拌器14,即可藉由至少一個或一個以上加熱器151對至少一個或一個以上之瓶體15進行加熱處 理。 The base 1 has a hollow isolation space 10 inside, a gas delivery channel 11 at the top, at least one or more air extraction channels 12 at the bottom, and at least one or more delivery channels on at least one side. Liquid valve 13 and electromagnetic stirrer 14, and at least one or more valves 13 are connected with a bottle 15 for holding liquid, and at least one or more bottles 15 are provided with heaters 151 and at least one or More than one electromagnetic stirrer 14 can be used to heat at least one or more bottles 15 by at least one or more heaters 151 reason.

該承載台座2係裝設於基座1之隔離空間10內,並於承載台座2設有複數中空狀之腔室20。 The bearing pedestal 2 is installed in the isolated space 10 of the base 1, and the bearing pedestal 2 is provided with a plurality of hollow chambers 20.

該二陽極分流面板3係裝設於基座1的隔離空間10內、且分別位於承載台座2的二相對表面外部,而供二陽極分流面板3分別遮罩於複數腔室20的二外側,則於二陽極分流面板3與承載台座2、複數腔室20之間分別形成作業空間30。 The two-anode shunt panels 3 are installed in the isolation space 10 of the base 1 and are respectively located outside the two opposite surfaces of the bearing pedestal 2, and the two-anode shunt panels 3 are respectively shielded on the two outsides of the plurality of chambers 20, A working space 30 is formed between the two-anode shunt panel 3 and the bearing pedestal 2 and the plurality of chambers 20 respectively.

該升降機構4一側係組裝於承載台座2下方,另側並延伸出基座1的隔離空間10外部、位於至少一個或一個以上之抽氣通道12側邊(該升降機構4與基座1之間形成緊密結合無縫隙、不漏氣,此為一般常見知識,於此恕不再加贅述),係供升降機構4調整承載台座2位於隔離空間10內之縱向位移,且於升降機構4設有二陽極分流面板3電能之供電部41。 One side of the lifting mechanism 4 is assembled under the bearing pedestal 2, and the other side extends outside the isolation space 10 of the base 1, and is located on the side of at least one or more air extraction channels 12 (the lifting mechanism 4 and the base 1 This is a common knowledge, and will not be repeated here.) It is used for the lifting mechanism 4 to adjust the longitudinal displacement of the bearing pedestal 2 in the isolation space 10, and the lifting mechanism 4 A power supply unit 41 for the electric energy of the two-anode shunt panel 3 is provided.

而上述該承載台座2係包括複數腔室20,且各腔室20分別呈寬通道201、窄通道202銜接貫通狀,並於各腔室20內部寬通道201、窄通道202銜接位置形成內肩部203,以供複數預設隱形眼鏡之鏡片5分別由各寬通道201內呈水平橫放,抵靠於各內肩部203處。 The above-mentioned bearing pedestal 2 includes a plurality of chambers 20, and each chamber 20 is in the shape of a wide channel 201 and a narrow channel 202 that are connected through each other, and an inner shoulder is formed at the joint position of the wide channel 201 and the narrow channel 202 inside each chamber 20. The part 203 is provided for the lenses 5 of a plurality of preset contact lenses to be placed horizontally and horizontally in each wide channel 201, and abut against each inner shoulder 203.

且上述該二陽極分流面板3之面積係等於或大於承載台座2之面積,且該二陽極分流面板3與承載台座2、複數腔室20之間分別形成相同或相異高度之作業空間30。 Moreover, the area of the two-anode shunt panel 3 is equal to or larger than the area of the bearing pedestal 2, and the two-anode shunt panel 3 and the bearing pedestal 2 form a working space 30 of the same or different heights respectively.

另,上述該升降機構4係包括穿設於基座1呈氣密式之絕緣本體42,再於絕緣本體42內部設有金屬導電材質製成之升降導桿421,升降導桿421並可呈縱向位移,並設有供應承載台座2電能之接地部422,且 升降機構4所設之供電部41係可為射頻發電機等。 In addition, the above-mentioned lifting mechanism 4 includes an air-tight insulating body 42 that penetrates through the base 1, and a lifting guide rod 421 made of metal conductive material is provided inside the insulating body 42. The lifting guide rod 421 can be Longitudinal displacement, and is provided with a grounding portion 422 for supplying electric energy to the bearing pedestal 2, and The power supply unit 41 of the lifting mechanism 4 may be a radio frequency generator or the like.

又,上述該複數預設隱形眼鏡之鏡片5,係可為聚甲基丙烯酸甲酯(PMMA)、氟矽丙烯酸酯(FSA)、透氣性半硬鏡片、聚甲基丙酸羥乙酯、GMMA、矽水膠等或其它製作預設隱形眼鏡之鏡片5的材料等。 In addition, the lens 5 of the plurality of preset contact lenses can be polymethylmethacrylate (PMMA), fluorosilicone acrylate (FSA), breathable semi-hard lens, polyhydroxyethyl methacrylate, GMMA , Silicone rubber, etc. or other materials for making the lens 5 of the preset contact lens, etc.

請參閱第1、2、3、4、5、6圖所示,係為本創作之立體外觀圖、承載台座之立體外觀圖、承載台座之局部剖面圖、鍍膜作業之流程圖(一)、鍍膜作業之流程圖(二)、鍍膜作業之流程圖(三),由圖中所示可以清楚看出,上述該隱形眼鏡進行雙向陽極電漿化學氣相沉積鍍膜之步驟係為: Please refer to Figures 1, 2, 3, 4, 5 and 6, which are the three-dimensional appearance of this creation, the three-dimensional appearance of the bearing pedestal, the partial cross-sectional view of the bearing pedestal, and the flow chart of the coating operation (1), The flow chart of the coating operation (2) and the flow chart of the coating operation (3) can be clearly seen from the figure. The steps of the above-mentioned contact lens for bidirectional anode plasma chemical vapor deposition coating are:

(A01)分別清洗基座1及內部之承載台座2,並清除承載台座2表面殘留的水分。 (A01) Clean the base 1 and the internal bearing pedestal 2 respectively, and remove the residual moisture on the surface of the bearing pedestal 2.

(A02)清潔基座1內部隔離空間10、承載台座2及二陽極分流面板3。 (A02) Clean the internal isolation space 10 of the base 1, the bearing pedestal 2 and the two-anode shunt panel 3.

(A03)將承載台座2置入基座1之隔離空間10內。 (A03) Put the bearing pedestal 2 into the isolated space 10 of the base 1.

(A04)透過抽氣通道12對基座1之隔離空間10進行抽真空處理。 (A04) Vacuum processing is performed on the isolated space 10 of the susceptor 1 through the suction channel 12.

(A05)利用輸氣通道11對基座之隔離空間10注入工作氣體,並開啟供電部41(可為射頻發電機),以對隔離空間10產生等體離子進行內部清潔。 (A05) Use the gas channel 11 to inject working gas into the isolated space 10 of the base, and turn on the power supply 41 (which can be a radio frequency generator) to generate plasma ions in the isolated space 10 for internal cleaning.

(A06)將複數預設隱形眼鏡之鏡片5分別置入承載台座2之各腔室20內,並供複數預設鏡片5分別由各腔室20的寬通道201內呈水平 橫放,則各鏡片5分別抵靠於各腔室20的內肩部203處。 (A06) Put the lenses 5 of the plural preset contact lenses into each chamber 20 of the bearing pedestal 2, and supply the plural preset lenses 5 to be horizontal in the wide passage 201 of each chamber 20 respectively When placed horizontally, each lens 5 abuts against the inner shoulder 203 of each cavity 20 respectively.

(A07)再次對基座1之隔離空間10進行抽真空處理。 (A07) Vacuum the isolated space 10 of the base 1 again.

(A08)對基座1的隔離空間10通入前處理氣體,啟動供電部41對二陽極分流面板3進行電漿預處理。 (A08) Pass the pretreatment gas into the isolated space 10 of the base 1, and start the power supply unit 41 to perform plasma pretreatment on the two-anode shunt panel 3.

(A09)停止對基座1的隔離空間10注入氣體,並對隔離空間10進行洩壓,再開啟基座1。 (A09) Stop injecting gas into the isolation space 10 of the susceptor 1, release the pressure of the isolation space 10, and then turn on the susceptor 1.

(A10)關閉基座1,並對基座1之隔離空間10進行抽真空處理,且開啟加熱器151對承裝液體的至少一個或一個以上之瓶體15加熱,同時開啟至少一個或一個以上之電磁攪拌器14,再確認該瓶體15已經被加熱。 (A10) The base 1 is closed, and the isolated space 10 of the base 1 is vacuumed, and the heater 151 is turned on to heat at least one or more bottles 15 containing liquid, and at least one or more bottles 15 are turned on at the same time The electromagnetic stirrer 14 confirms that the bottle 15 has been heated.

(A11)由輸氣通道11對基座1之隔離空間10注入氬氣,再自至少一個或一個以上之閥門13加入親水性的液體蒸氣後,且調整氬氣之流量,基座1內隔離空間10之壓力呈不穩定,透過至少一個或一個以上之閥門13加入親水性的液體蒸氣維持預定壓力。 (A11) Argon gas is injected into the isolation space 10 of the base 1 from the gas channel 11, and then hydrophilic liquid vapor is added from at least one or more valves 13 and the flow rate of argon is adjusted. The base 1 is isolated The pressure in the space 10 is unstable, and hydrophilic liquid vapor is added through at least one or more valves 13 to maintain a predetermined pressure.

(A12)開啟供電部41對基座1的隔離空間10內之二陽極分流面板3供電,並確認基座1的隔離空間10之壓力,若壓力有變動,則調整輸入液體蒸氣的至少一個或一個以上之閥門13,使基座1內隔離空間10維持預定之壓力,對承載台座2的各腔室20內之各預設隱形眼鏡之鏡片5進行鍍膜。 (A12) Turn on the power supply unit 41 to supply power to the two anode shunt panels 3 in the isolation space 10 of the base 1, and confirm the pressure of the isolation space 10 of the base 1. If the pressure changes, adjust at least one of the input liquid vapor or More than one valve 13 keeps the isolation space 10 in the base 1 at a predetermined pressure, and coats the lenses 5 of the preset contact lenses in the chambers 20 of the pedestal 2.

(A13)利用基座1的隔離空間10內位於承載台座2上、下方二相對之陽極分流面板3,同步對各腔室20內之各預設鏡片5進行雙向陽極電漿化學氣相沉積處理。 (A13) Using the two opposite anode shunt panels 3 located above and below the bearing pedestal 2 in the isolated space 10 of the base 1, simultaneously perform bidirectional anode plasma chemical vapor deposition treatment on each preset lens 5 in each chamber 20 .

(A14)利用供電部41對二陽極分流面板3供電,藉由接地部422使該承載台座2成為陰極電極板,而二陽極分流面板3透過供電部41提供電漿功率,則可透過二陽極分流面板3與承載台座2(陰極電極板)之間,形成雙向陽極電漿氣相化學沉積作用,使電漿集中於承載台座2的各腔室20中,且供電漿沉積於各腔室20內的各預設鏡片5之正、反表面處,以供各預設鏡片5的正、反表面同時進行鍍膜處理。 (A14) Use the power supply unit 41 to supply power to the two-anode shunt panel 3, and the grounding portion 422 makes the bearing stand 2 become a cathode electrode plate, and the two-anode shunt panel 3 provides plasma power through the power supply unit 41, which can pass through the two anodes Between the shunt panel 3 and the bearing pedestal 2 (cathode electrode plate), a bidirectional anode plasma vapor chemical deposition is formed, so that the plasma is concentrated in each chamber 20 of the bearing pedestal 2, and the power supply slurry is deposited in each chamber 20 The front and back surfaces of each preset lens 5 inside are provided for simultaneous coating treatment on the front and back surfaces of each preset lens 5.

(A15)鍍膜結束,關閉供電部41、至少一個或一個以上之瓶體15的加熱器151及至少一個或一個以上之電磁攪拌器14,再透過輸氣通道11對基座1的隔離空間10注入氣體。 (A15) After coating, turn off the power supply 41, at least one or more heaters 151 of the bottle body 15, and at least one or more electromagnetic stirrers 14, and then pass the gas channel 11 to the isolated space 10 of the base 1 Inject gas.

(A16)確認承裝液體的至少一個或一個以上之瓶體15降溫至室溫,關閉該至少一個或一個以上瓶體15連接之閥門13。 (A16) Confirm that the temperature of at least one or more bottles 15 containing the liquid is cooled to room temperature, and close the valve 13 connected to the at least one or more bottles 15.

(A17)將輸氣通道11對基座1的隔離空間10注入之氬氣關閉,使基座1內隔離空間10回壓至正常壓力〔正常大氣壓力:1kg/cm2〕,即可取出已鍍膜的各預設隱形眼鏡之鏡片5。 (A17) Close the argon gas injected into the isolated space 10 of the base 1 by the gas channel 11, and return the pressure of the isolated space 10 in the base 1 to the normal pressure (normal atmospheric pressure: 1kg/cm 2 ). The lens 5 of each preset contact lens with coating.

上述各步驟中之該基座1,可於一側至少一個或一個以上之閥門13連接有承裝液體之瓶體15,該至少一個或一個以上之瓶體15係供承裝親水性之液體,該親水性之液體係可為甲基丙烯酸聚乙二醇酯〔Poly(ethylene glycol)Methacrylate,PEGMA〕或N-乙烯基-2-咯吡酮(N-Vinylpyrrolidone,NVP)等親水性之液體。 In the above-mentioned steps, the base 1 can be connected to at least one or more valves 13 on one side with a bottle 15 for holding liquid, and the at least one or more bottle 15 is for holding a hydrophilic liquid. The hydrophilic liquid system can be a hydrophilic liquid such as Poly(ethylene glycol) Methacrylate (PEGMA) or N-Vinylpyrrolidone (NVP) .

上述該步驟(A01)之對基座1及內部承載台座2進行清洗作業,係先以清水對承載台座2作進行清洗,再利用異丙醇〔Isopropy Alcohol,IPA〕進行清洗,則藉由壓縮乾噪空氣〔Clean Dry Air,CDA〕清 除承載台座2表面的水分;並利用逆滲透〔RO〕水對基座1內部隔離空間10及承載台座2進行擦拭,且藉由異丙醇〔IPA〕對基座1內部隔離空間10及承載台座2進行擦拭至少二次或二次以上。 In the above step (A01), the cleaning operation of the base 1 and the internal bearing pedestal 2 is to first clean the bearing pedestal 2 with clean water, and then use isopropy alcohol [Isopropy Alcohol, IPA] for cleaning, and then by compression Clean Dry Air [Clean Dry Air, CDA] Remove the moisture on the surface of the bearing pedestal 2; and use reverse osmosis [RO] water to wipe the internal isolation space 10 and the bearing pedestal 2 of the pedestal 1, and use isopropyl alcohol [IPA] to wipe the internal isolation space 10 and the bearing of the pedestal 1 The pedestal 2 is wiped at least twice or more than twice.

上述該步驟(A04)及(A07)之抽真空處理,必須確認基座1內之隔離空間10內部壓力達1.0*10-1Torr以下;而該步驟(A10)之抽真空處理,且必須確認基座1內之隔離空間10內部壓力達3.0*10-2Torr以下。 For the vacuum treatment in the above steps (A04) and (A07), it must be confirmed that the internal pressure of the isolation space 10 in the base 1 is below 1.0 * 10 -1 Torr; and the vacuum treatment in this step (A10) must be confirmed The internal pressure of the isolation space 10 in the base 1 is below 3.0 * 10 -2 Torr.

該步驟(A05)之工作氣體係可為氬氣(Ar-10sccm)及氧氣(O2-20sccm)等氣體,並以等體離子壓力(plasma power):60W,進行8分鐘之清潔處理作業;該步驟(A08)、(A09)對基座1之隔離空間10注入之氣體係可為氬氣(Ar-30sccm),而該預定時間為10~30分鐘,較佳時間為20分鐘。 The working gas system of this step (A05) can be argon (Ar- 10sccm) and oxygen (O 2 -20sccm) and other gases, and use plasma power: 60W for cleaning for 8 minutes; In the steps (A08) and (A09), the gas system injected into the isolated space 10 of the base 1 can be argon (Ar-30sccm), and the predetermined time is 10-30 minutes, preferably 20 minutes.

該步驟(A06)將複數預設隱形眼鏡之鏡片5呈水平行向方式分別置入承載台座2之各腔室20內,且該承載台座2之複數腔室20係分別設有呈寬通道201、窄通道202銜接貫通狀,並於各腔室20內部寬通道201、窄通道202銜接位置設有內肩部203,可供預設隱形眼鏡的鏡片5由寬通道201內呈水平橫放、抵靠於內肩部203處。 In this step (A06), the lenses 5 of the plurality of preset contact lenses are placed in the respective chambers 20 of the bearing pedestal 2 in a horizontal row direction, and the plural cavities 20 of the bearing pedestal 2 are respectively provided with wide passages 201 , The narrow channel 202 is connected through the shape, and the inner shoulder 203 is provided at the connection position of the wide channel 201 and the narrow channel 202 inside each chamber 20, so that the lens 5 of the preset contact lens can be placed horizontally in the wide channel 201, Abut against the inner shoulder 203.

該步驟(A08)之前處理氣體係可為氬氣(Ar-9sccm)及氧氣(O2-36sccm)等氣體;而該步驟(A05)、(A08)、(A12)、(A14)啟動升降機構4之供電部41進行電漿處理或供電,該供電部41係可為射頻發電機(RF generator power);則該步驟(A05)之供電部41的射頻發電機設定120W,處理時間可為5-10分鐘,較佳時間為6分鐘;且步驟(A08)開啟升降機構4之供電部41對二陽極分流面板3進行電漿處理,設定 該射頻發電機為40W,持續16分鐘,並確認基座1內隔離空間10之壓力為300mTorr;至於該基座1內隔離空間10維持之預定壓力係為300-350mTorr。 The processing gas system before this step (A08) can be argon (Ar-9sccm) and oxygen (O 2 -36sccm) and other gases; and this step (A05), (A08), (A12), (A14) starts the lifting mechanism The power supply unit 41 of 4 performs plasma processing or power supply. The power supply unit 41 can be an RF generator power; then the RF generator of the power supply unit 41 in this step (A05) is set to 120W, and the processing time can be 5 -10 minutes, preferably 6 minutes; and step (A08) turn on the power supply 41 of the lifting mechanism 4 to perform plasma treatment on the two-anode shunt panel 3, set the radio frequency generator to 40W for 16 minutes, and confirm the base The pressure of the isolation space 10 in the base 1 is 300 mTorr; the predetermined pressure maintained by the isolation space 10 in the base 1 is 300-350 mTorr.

該步驟(A09)對基座1內隔離空間10進行洩壓,係將隔離空間10洩壓至1atm,且開啟基座1約可為1~3分鐘。 In this step (A09), the pressure of the isolation space 10 in the base 1 is relieved, and the pressure of the isolation space 10 is relieved to 1 atm, and the base 1 can be opened for about 1 to 3 minutes.

該步驟(A10)之啟動至少一個或一個以上之電磁攪拌器14,該各電磁攪拌器14係以20rpm/sec〔轉/秒〕之速度運作。 In this step (A10), at least one or more electromagnetic stirrers 14 are activated, and each electromagnetic stirrer 14 is operated at a speed of 20 rpm/sec (revolutions per second).

該步驟(A11)對基座1之隔離空間10注入氬氣(Ar-8sccm),當調整氬氣之流量時係調整氬氣至(Ar-12sccm);至於該親水性液體蒸氣係為先加入甲基丙烯酸聚乙醇酯〔PEGMA,Poly(ethylene glycol)methacrylate〕,壓力控制於1.5~2*10-1Torr;再加入N-乙烯基-2-咯吡酮(N-Vinylpyrrolidone,NVP),壓力控制於2~3*10-1Torr;該步驟(A12)當基座1內隔離空間10壓力不穩定呈浮動情況,加入親水性液體PEGMA/NVP蒸氣時,預定壓力維持在3*10-1Torr;另該步驟(A15)對基座1的隔離空間10注入之氣體係為氬氣(Ar-70sccm),持續15分鐘。 This step (A11) injects argon gas (Ar-8sccm) into the isolated space 10 of the base 1, when adjusting the flow rate of argon gas, adjust the argon gas to (Ar-12sccm); as for the hydrophilic liquid vapor, add it first Poly(ethylene glycol) methacrylate [PEGMA, Poly(ethylene glycol)methacrylate], the pressure is controlled at 1.5~2 * 10 -1 Torr; then N-Vinylpyrrolidone (NVP) is added, the pressure is Control at 2~3 * 10 -1 Torr; in this step (A12), when the pressure in the isolation space 10 in the base 1 is unstable and floating, when the hydrophilic liquid PEGMA/NVP vapor is added, the predetermined pressure is maintained at 3 * 10 -1 Torr; In addition, the gas system injected into the isolated space 10 of the susceptor 1 in this step (A15) is argon (Ar-70 sccm) for 15 minutes.

透過上述步驟加工鍍膜的複數預設隱形眼鏡之鏡片5,因甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮,透過二陽極分流面板3與承載台座2之間,利用雙陽極長效型電漿化學氣相沉積法製程,使鏡片5的正、反表面鍍附形成均勻薄膜,而可供各預設隱形眼鏡之鏡片5具有良好的親水性及抗生化沾污的功能,並利用甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮彼此間會產生交聯作用,而供隱形眼鏡之鏡片5親水性效能時間延長,並可減少蛋白質沉澱在各預設鏡片5表面,藉以增加各預設隱形眼鏡之鏡片5配戴時的舒適度及各預設鏡片5的使用壽命延長等之功效。 Through the above-mentioned steps, the lens 5 of the plural preset contact lenses is processed and coated. Because polyethylene glycol methacrylate and N-vinyl-2-pyrrolidone pass through between the two-anode shunt panel 3 and the bearing pedestal 2, use The double anode long-acting plasma chemical vapor deposition process allows the front and back surfaces of the lens 5 to be coated to form a uniform film, and the lens 5 for each preset contact lens has good hydrophilicity and resistance to biochemical contamination Function, and the use of polyethylene glycol methacrylate and N-vinyl-2-pyrrolidone will cross-link each other, and the hydrophilic performance time of the lens 5 for contact lenses is prolonged, and protein precipitation can be reduced. The surface of each preset lens 5 can increase the comfort of wearing the lens 5 of each preset contact lens and the effect of extending the service life of each preset lens 5 and so on.

且上述複數預設隱形眼鏡之鏡片5,再經過雙向陽極電漿化學氣相沉積鍍膜,使各預設鏡片5的正、反表面形成具親水性功能之官能基,該官能基則會與甲基丙烯酸聚乙二醇酯與N-乙烯基-2-咯吡酮接枝成為一體,所以可延長官能基為了最小化表面能回到熱平衡狀態而產生重組的情形,藉此達到延長親水性時間之效用,並能提高各預設鏡片5的正、反表面鍍膜的貼附性,增加鍍膜的穩定性等。 And the lenses 5 of the plural preset contact lenses are then coated by bidirectional anode plasma chemical vapor deposition, so that the front and back surfaces of each preset lens 5 form a functional group with hydrophilic function, and the functional group will interact with the former. Polyethylene glycol acrylate and N-vinyl-2-pyrrolidone are grafted into one body, so the functional group can be extended to minimize the surface energy returning to the thermal equilibrium state and recombine, thereby extending the hydrophilic time It can improve the adhesion of the coating on the front and back of each preset lens 5, and increase the stability of the coating.

上述詳細說明為針對本創作一種較佳之可行實施例說明而已,惟該實施例並非用以限定本創作之申請專利範圍,舉凡其它未脫離本創作所揭示之技藝精神下所完成之均等變化與修飾變更,均應包含於本創作所涵蓋之專利範圍中。 The above detailed description is only for a better feasible embodiment of this creation, but this embodiment is not used to limit the scope of patent application of this creation, for all other equal changes and modifications completed without departing from the spirit of the technique disclosed in this creation All changes shall be included in the scope of patents covered by this creation.

綜上所述,本創作上述雙向陽極電漿化學氣相沉積鍍膜設備於實際應用、實施時,為確實能達到預期之功效及目的,故本創作誠為一實用性優異之研發,為符合新型專利之申請要件,爰依法提出申請,盼 貴審查委員早日賜准本案,以保障創作人之辛苦研發、創設,倘若 鈞局暨貴審查委員對本案有任何稽疑,請不吝來電或來函指正賜教,創作人定當竭力配合,極感德便。 In summary, the above-mentioned two-way anode plasma chemical vapor deposition coating equipment of this creation can indeed achieve the expected effect and purpose when it is actually applied and implemented. Therefore, this creation is a research and development with excellent practicality and is in line with the new model. For the patent application requirements, I filed an application in accordance with the law. I hope that your reviewer will approve this case as soon as possible to protect the creator's hard research and development and creation. If the bureau and your reviewer have any doubts about this case, please feel free to call or write to correct us. , The creators must do their best to cooperate and feel extremely virtuous.

1:基座 1: pedestal

10:隔離空間 10: Isolated space

11:輸氣通道 11: Gas transmission channel

12:抽氣通道 12: Exhaust channel

13:閥門 13: Valve

14:電磁攪拌器 14: Electromagnetic stirrer

15:瓶體 15: Bottle body

151:加熱器 151: heater

2:承載台座 2: Bearing pedestal

20:腔室 20: Chamber

3:陽極分流面板 3: Anode shunt panel

30:作業空間 30: Work space

4:升降機構 4: Lifting mechanism

41:供電部 41: Power Supply Department

42:絕緣本體 42: Insulating body

421:升降導桿 421: Lifting guide rod

422:接地部 422: Grounding part

Claims (7)

一種雙向陽極電漿化學氣相沉積鍍膜設備,係包括基座、承載台座、二陽極分流面板及升降機構,其中: A two-way anode plasma chemical vapor deposition coating equipment, which includes a base, a bearing stand, a two-anode shunt panel and a lifting mechanism, wherein: 該基座內部具有中空狀之隔離空間,頂部設有輸氣通道; The base has a hollow isolation space inside, and a gas transmission channel is provided on the top; 該承載台座係裝設於基座之隔離空間內,並於承載台座設有複數中空狀之腔室; The bearing pedestal is installed in the isolated space of the base, and the bearing pedestal is provided with a plurality of hollow chambers; 該二陽極分流面板係裝設於基座的隔離空間內、且分別位於承載台座的二相對表面外部,而供二陽極分流面板分別遮罩於複數腔室的二外側,則於二陽極分流面板與承載台座的複數腔室二外側之間分別形成作業空間;及 The two-anode shunt panels are installed in the isolation space of the base and are respectively located outside the two opposite surfaces of the bearing pedestal, and the two-anode shunt panels are respectively shielded on the two outer sides of the plurality of chambers, and are located on the two-anode shunt panel To form working spaces respectively between the two outer sides of the plurality of chambers of the bearing pedestal; and 該升降機構一側係組裝於承載台座下方,另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之供電部,並於該升降機構周邊之基座底部設有一個或一個以上之抽氣通道。 One side of the lifting mechanism is assembled under the bearing pedestal, and the other side extends outside the base to adjust the longitudinal displacement of the bearing pedestal in the isolated space. The lifting mechanism is provided with a power supply unit for supplying electric energy to the bearing pedestal. One or more air extraction channels are arranged at the bottom of the base around the lifting mechanism. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該承載台座係包括複數呈寬通道、窄通道銜接貫通狀之腔室,並於各腔室內部寬通道、窄通道銜接位置形成內肩部,以供預設隱形眼鏡之鏡片由寬通道內呈水平橫放,抵靠於內肩部處。 The two-way anode plasma chemical vapor deposition coating equipment according to claim 1, wherein the bearing pedestal includes a plurality of chambers in the shape of a wide channel and a narrow channel connected through, and the wide channel and the narrow channel are connected in each chamber The position forms an inner shoulder, so that the lens of the preset contact lens is placed horizontally from the wide channel and abuts against the inner shoulder. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該二陽極分流面板之面積係等於或大於承載台座之面積,且該二陽極分流面板與承載台座、複數腔室二外側之間分別形成相同或相異高度之作業空間。 The bidirectional anode plasma chemical vapor deposition coating equipment according to claim 1, wherein the area of the two anode splitter panel is equal to or greater than the area of the bearing pedestal, and the two anode splitter panel, the bearing pedestal, and the outer side of the plurality of chambers The working spaces of the same or different heights are formed between them. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該升降機構係包括穿設於基座呈氣密式之絕緣本體,再於絕緣本體內部設有金屬導電材質製成並呈縱向位移之升降導桿,且升降機構所設之供電部係為射頻發電機。 The bidirectional anode plasma chemical vapor deposition coating equipment according to claim 1, wherein the lifting mechanism includes an airtight insulating body pierced through the base, and a metal conductive material is arranged inside the insulating body And it is a vertical displacement lifting guide rod, and the power supply part of the lifting mechanism is a radio frequency generator. 如請求項1所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該中空狀隔離空間之基座係於頂部設有輸氣通道及至少一個或一個以上供液體蒸氣輸入之閥門,且至少一個或一個以上之閥門連接有承裝液體之瓶體,並於至少一個或一個以上之瓶體上設有加熱器及電磁攪拌器,而於基座的隔離空間內部組裝承載台座及二陽極分流面板,該承載台座內部具有貫通狀之複數腔室,且供二陽極分流面板位於承載台作的二相對表面外部、並遮罩於複數腔室的二外側,則於二陽極分流面板與承載台座的二外側之間分別形成作業空間,二陽極分流面板分別電性連接於供電部,再於承載台座下方組裝升降機構,該升降機構另側並延伸出基座外部,係供調整承載台座位於隔離空間內之縱向位移,且於升降機構設有供應承載台座電能之接地部,該升降機構周邊之基座底部設有一個或一個以上之抽氣通道。 The bidirectional anode plasma chemical vapor deposition coating equipment according to claim 1, wherein the base of the hollow isolation space is provided with a gas transmission channel and at least one or more valves for liquid vapor input at the top, and at least One or more valves are connected to the bottle body that holds the liquid, and at least one or more bottles are provided with heaters and electromagnetic stirrers, and the bearing pedestal and two anode shunts are assembled in the isolated space of the base Panel, the carrying platform has a plurality of through-shaped chambers inside, and the two anode shunt panels are located outside the two opposite surfaces of the carrying platform, and cover the two outer sides of the plurality of chambers, then on the two anode shunt panel and the carrying platform A working space is formed between the two outer sides of the two anode shunt panels respectively. The two anode shunt panels are electrically connected to the power supply part, and then a lifting mechanism is assembled under the bearing pedestal. The vertical displacement in the space, and the lifting mechanism is provided with a grounding portion for supplying electric power to the bearing pedestal, and the bottom of the base around the lifting mechanism is provided with one or more air extraction channels. 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其中該基座於一側至少一個或一個以上之閥門連接有承裝液體之瓶體,該至少一個或一個以上之瓶體係供承裝親水性之液體,該親水性之液體係為甲基丙烯酸聚乙二醇酯〔Poly(ethylene glycol)Methacrylate,PEGMA〕或N-乙烯基-2-咯吡酮(N-Vinylpyrrolidone,NVP)。 The two-way anode plasma chemical vapor deposition coating equipment according to claim 5, wherein at least one or more valves on one side of the base are connected to a bottle body for holding liquid, and the at least one or more bottle systems For holding hydrophilic liquid, the hydrophilic liquid system is polyethylene glycol methacrylate [Poly(ethylene glycol) Methacrylate, PEGMA] or N-Vinylpyrrolidone (N-Vinylpyrrolidone, NVP) ). 如請求項5所述之雙向陽極電漿化學氣相沉積鍍膜設備,其 中該升降機構之接地部為電性連接於供電部。 The bidirectional anode plasma chemical vapor deposition coating equipment described in claim 5, which The grounding part of the lifting mechanism is electrically connected to the power supply part.
TW110204480U 2021-04-22 2021-04-22 Bidirectional anode plasma chemical vapor deposition coating apparatus TWM615604U (en)

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