TWI749366B - Vacuum heating device and reflector device - Google Patents

Vacuum heating device and reflector device Download PDF

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TWI749366B
TWI749366B TW108132424A TW108132424A TWI749366B TW I749366 B TWI749366 B TW I749366B TW 108132424 A TW108132424 A TW 108132424A TW 108132424 A TW108132424 A TW 108132424A TW I749366 B TWI749366 B TW I749366B
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reflector
fixed
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mounting surface
unit reflector
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TW202018237A (en
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阪上弘敏
大野哲宏
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日商愛發科股份有限公司
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D11/00Arrangement of elements for electric heating in or on furnaces
    • F27D11/02Ohmic resistance heating
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/06Forming or maintaining special atmospheres or vacuum within heating chambers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/06Forming or maintaining special atmospheres or vacuum within heating chambers
    • F27D2007/066Vacuum

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
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  • General Physics & Mathematics (AREA)
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Abstract

提供一種具備有不會發生起因於熱延伸所導致的損傷之反射器裝置的真空加熱裝置。將被作了行列配置之複數個的單位反射板(31),藉由固定裝置(21)和保持裝置(11a)~(11d)來分別安裝在真空槽(17)之安裝面(19)處。若是紅外線被照射至各單位反射板(31)處,則伴隨著保持裝置(11a)~(11d)之變形部(64)的變形,各單位反射板(31)係以固定裝置(21)之安裝場所作為中心而進行熱延伸。起因於熱延伸而被施加於各單位反射板(31)處的力係被紓緩,各單位反射板(31)所被安裝在安裝面(19)處的場所之損傷係被防止。Provided is a vacuum heating device equipped with a reflector device that does not cause damage due to thermal extension. Install the multiple unit reflectors (31) arranged in rows and columns on the mounting surface (19) of the vacuum tank (17) by the fixing device (21) and the holding device (11a) ~ (11d) . If infrared rays are irradiated to each unit reflector (31), along with the deformation of the deformed portion (64) of the holding device (11a) to (11d), each unit reflector (31) is fixed by the fixing device (21). The installation site serves as the center for thermal extension. The force applied to each unit reflector (31) due to thermal extension is relieved, and damage to the place where each unit reflector (31) is installed at the installation surface (19) is prevented.

Description

真空加熱裝置、反射器裝置Vacuum heating device, reflector device

本發明,係有關於在真空氛圍中而以紅外線來將加熱對象物作加熱的技術,特別是有關於反射紅外線之反射器裝置、和具備有該反射器裝置之真空加熱裝置。 The present invention relates to a technique for heating an object to be heated with infrared rays in a vacuum atmosphere, and particularly relates to a reflector device that reflects infrared rays and a vacuum heating device equipped with the reflector device.

以半導體基板或玻璃基板等作為處理對象物並在真空氛圍中於處理對象物之表面上形成薄膜或者是對已被形成之薄膜在真空氛圍中進行蝕刻處理的真空處理,係被廣泛地進行,在緊接於進行真空處理之前,係設置有使處理對象物升溫至特定溫度並使真空處理的反應性提升之加熱前置處理工程。 Vacuum processing, which uses semiconductor substrates or glass substrates as processing objects and forms a thin film on the surface of the processing object in a vacuum atmosphere, or etching the formed thin film in a vacuum atmosphere, is widely performed. Immediately before the vacuum treatment, a heating pretreatment process is provided to raise the temperature of the treatment target to a specific temperature and improve the reactivity of the vacuum treatment.

又,若是在真空氛圍中加熱處理對象物,則附著在處理對象物上的有機物或水分係在真空氛圍中蒸發,處理對象物之清淨係被進行。 In addition, if the treatment target is heated in a vacuum atmosphere, the organic matter or moisture adhering to the treatment target evaporates in the vacuum atmosphere, and the purification of the treatment target is performed.

基於溫度控制性之良好的理由,此種處理對象物之加熱多係藉由紅外線照射來進行,為了將對於真空 槽之紅外線照射遮斷,在真空槽之壁面與紅外線照射裝置之間係被配置有反射器,而構成為不會使真空槽升溫。 For the reason of good temperature controllability, the heating of this kind of processing object is mostly performed by infrared radiation. The infrared radiation of the groove is blocked, and a reflector is arranged between the wall surface of the vacuum groove and the infrared irradiating device, and it is configured to not raise the temperature of the vacuum groove.

另外,為了使製造成本降低,處理對象物係日益大型化,伴隨於此,真空槽亦係大型化,但是,若是將反射器大型化,則起因於熱所導致的線膨脹量係會變大,在反射器或反射器安裝部等處產生變形或者是發生安裝不良等的問題係變得嚴重。 In addition, in order to reduce the manufacturing cost, the object to be processed has become larger and larger. Accompanying this, the vacuum chamber has also become larger. However, if the reflector is enlarged, the amount of linear expansion due to heat will increase. , The problem of deformation or poor installation in the reflector or reflector mounting part has become serious.

近年來,係嘗試開發有將複數之單位反射板作行列配置並構成一台的反射器之反射器裝置,但是,若是將單位反射板僅固定在單一場所處而構成為使其能夠並不產生變形地而作熱膨脹,則在單位反射板之邊緣附近的下垂量係會變大,在單位反射板之間係會產生熱漏洩。 In recent years, an attempt has been made to develop a reflector device in which a plurality of unit reflectors are arranged in rows and constitute one reflector. However, if the unit reflectors are fixed only in a single place, they are constructed so that they can not produce When the ground is deformed and thermally expanded, the amount of sagging near the edge of the unit reflector will increase, and heat leakage will occur between the unit reflectors.

又,若是為了防止熱漏洩而將單位反射板之邊緣附近相互重疊,則在發生熱膨脹時,邊緣附近係會彼此滑動並產生大量的塵埃。 In addition, if the edges of the unit reflectors are overlapped to prevent heat leakage, when thermal expansion occurs, the edges will slide on each other and generate a lot of dust.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開平10-19386號公報 [Patent Document 1] Japanese Patent Application Laid-Open No. 10-19386

本發明,係為了解決上述先前技術之問題而創作者,其之所欲解決之課題,係在於提供一種在反射板 處不會發生變形或下垂的反射器裝置、和設置有該反射器裝置之真空加熱裝置。 The present invention was created to solve the above-mentioned problems of the prior art, and the problem to be solved is to provide a reflection plate A reflector device that does not deform or sag, and a vacuum heating device equipped with the reflector device.

本發明,係為一種真空加熱裝置,其特徵為,係具備有:真空槽,係被作真空排氣;和加熱源,係被配置在前述真空槽之內部,並輻射出紅外線而將加熱對象物加熱;和反射器裝置,係被配置在前述真空槽之內部,並具備有將從前述加熱源而被輻射並朝向前述真空槽之內壁面之中之安裝面的紅外線作遮蔽之複數個的單位反射板,前述單位反射板,係沿著前述安裝面而被作配置,前述反射器裝置,係具備有:複數個的固定裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處;和複數個的保持裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處,前述固定裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置,係藉由前述固定裝置而被固定,前述保持裝置,係具備有可變形之變形部,前述保持裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置關係,係構成為藉由前述變形部之變形而被作變更。 The present invention is a vacuum heating device, which is characterized in that it is provided with: a vacuum tank, which is used for vacuum exhaust; and a heating source, which is arranged inside the vacuum tank and radiates infrared rays to heat the object Object heating; and reflector devices are arranged inside the vacuum tank, and are equipped with a plurality of shielding infrared rays that are radiated from the heating source and directed toward the mounting surface in the inner wall surface of the vacuum tank The unit reflector, the unit reflector is arranged along the mounting surface, and the reflector device is provided with: a plurality of fixing devices, one end of which is fixed to the mounting surface of the vacuum tank , And the other end is fixed at the unit reflector; and a plurality of holding devices, one end is fixed at the installation surface of the vacuum tank, and the other end is fixed at the unit reflector, The relative position between the place where the fixing device is fixed at the mounting surface and the place at the unit reflector is fixed by the fixing device, and the holding device is provided with The deformed deformed part, the relative positional relationship between the place where the holding device is fixed to the mounting surface and the place fixed to the unit reflector is configured to be deformed by the deformed part Make changes.

又,本發明,係為一種真空加熱裝置,其係構成為:當前述單位反射板被加熱而發生熱延伸時,前述變形部係 變形,前述保持裝置之被固定於前述安裝面處之場所和被固定於前述單位反射板處之場所之間的相對性之位置關係係被作變更。 In addition, the present invention is a vacuum heating device, which is configured such that when the unit reflector is heated and thermally stretched, the deformed portion is Deformed, the relative positional relationship between the place where the holding device is fixed at the installation surface and the place where it is fixed at the unit reflector is changed.

又,本發明,係為一種真空加熱裝置,其係構成為:前述變形部係為板彈簧,前述板彈簧,係被配置在藉由前述單位反射板之熱延伸而被施加有與前述板彈簧之表面相垂直之方向的力之方向上。 In addition, the present invention is a vacuum heating device, which is configured such that the deformed portion is a leaf spring, and the leaf spring is arranged to be applied with the leaf spring by the thermal extension of the unit reflector. The direction of the force in the direction perpendicular to the surface.

又,本發明,係為一種真空加熱裝置,其係構成為:在前述單位反射板處,係被設置有餘裕孔,前述保持裝置,係藉由被插通於前述餘裕孔處之第1螺絲鎖合裝置而被螺絲鎖合固定於前述安裝面處,前述餘裕孔之邊緣和前述第1螺絲鎖合裝置,係構成為就算是前述單位反射板沿著前述安裝面而作熱延伸,在前述單位反射板為室溫以上且較上限溫度而更低溫之溫度範圍內也會成為非接觸。 In addition, the present invention is a vacuum heating device, which is configured such that the unit reflector is provided with a clearance hole, and the holding device is provided by a first screw inserted into the clearance hole. The locking device is screwed and fixed to the mounting surface. The edge of the margin hole and the first screw locking device are configured to thermally extend along the mounting surface even if the unit reflector is The unit reflector becomes non-contact in the temperature range above room temperature and lower than the upper limit temperature.

又,本發明,係為一種真空加熱裝置,其係構成為:前述固定裝置和前述保持裝置,係被熔接固定於前述單位反射板處。 In addition, the present invention is a vacuum heating device, which is configured such that the fixing device and the holding device are welded and fixed to the unit reflector.

又,本發明,係為一種真空加熱裝置,其係構成為:前述固定裝置係被熔接固定於前述單位反射板處,前述保持裝置係藉由第2螺絲鎖合裝置而被螺絲鎖合固定於前述單位反射板處。 In addition, the present invention is a vacuum heating device, which is configured such that the fixing device is welded and fixed to the unit reflector, and the holding device is screwed and fixed to the unit reflector by a second screw locking device. At the aforementioned unit reflector.

又,本發明,係為一種真空加熱裝置,其係構成為:被固定在1片的前述單位反射板處之前述固定裝置,係被配置在被固定於相同的前述單位反射板處之前述保持裝置 與前述保持裝置之間。 In addition, the present invention is a vacuum heating device, which is configured such that the fixing device fixed to one unit reflector is arranged on the holder fixed to the same unit reflector. Device Between and the aforementioned holding device.

又,本發明,係為一種真空加熱裝置,其係構成為:以被固定在1片的前述單位反射板處之前述固定裝置作為中心,而被配置有被固定於相同的前述單位反射板處之複數之前述保持裝置。 In addition, the present invention is a vacuum heating device, which is configured to be fixed to the same unit reflector with the fixing device fixed at the unit reflector as the center. The plural of the aforementioned holding devices.

又,本發明,係為一種反射器裝置,其特徵為,係具備有:複數個的單位反射板,係在真空槽之內部沿著前述真空槽之內壁面之中之安裝面而被作配置,並將從加熱源而被輻射並朝向前述安裝面的紅外線作遮蔽;和複數個的固定裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處;和複數個的保持裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處,前述固定裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置,係藉由前述固定裝置而被固定,前述保持裝置,係具備有可變形之變形部,前述保持裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置關係,係構成為藉由前述變形部之變形而被作變更。 Furthermore, the present invention is a reflector device characterized in that it is provided with: a plurality of unit reflectors, which are arranged inside the vacuum tank along the mounting surface in the inner wall surface of the vacuum tank , And shield the infrared rays radiated from the heating source toward the aforementioned mounting surface; and a plurality of fixing devices, one end of which is fixed to the aforementioned mounting surface of the aforementioned vacuum tank, and the other end is fixed to the aforementioned The unit reflector; and a plurality of holding devices, one end of which is fixed to the mounting surface of the vacuum tank, and the other end is fixed to the unit reflector, and the fixing device is fixed to the installation The relative position between the place on the surface and the place fixed on the unit reflector is fixed by the fixing device. The holding device is provided with a deformable deforming part. The relative positional relationship between the place fixed to the mounting surface and the place fixed to the unit reflector is configured to be changed by the deformation of the deforming portion.

又,本發明,係為一種反射器裝置,其係構成為:當前述單位反射板被加熱而發生熱延伸時,前述變形部係變形,前述保持裝置之被固定於前述安裝面處之場所和被固定於前述單位反射板處之場所之間的相對性之位置關係係被作變更。 In addition, the present invention is a reflector device, which is configured such that when the unit reflector is heated and thermally stretched, the deformed portion is deformed, and the holding device is fixed to the mounting surface at the location and The relative positional relationship between the places fixed to the unit reflector is changed.

又,本發明,係為一種反射器裝置,其係構成為:前述變形部係為板彈簧,前述板彈簧,係被配置在藉由前述單位反射板之熱延伸而被施加有與前述板彈簧之表面相垂直之方向的力之方向上。 In addition, the present invention is a reflector device, which is configured such that the deformed portion is a leaf spring, and the leaf spring is arranged to be applied with the leaf spring by the thermal extension of the unit reflector. The direction of the force in the direction perpendicular to the surface.

又,本發明,係為一種反射器裝置,其係構成為:在前述單位反射板處,係被設置有餘裕孔,前述保持裝置,係藉由被插通於前述餘裕孔處之第1螺絲鎖合裝置而被螺絲鎖合固定於前述安裝面處,前述餘裕孔之邊緣和前述第1螺絲鎖合裝置,係構成為就算是前述單位反射板沿著前述安裝面而作熱延伸,在前述單位反射板為室溫以上且較上限溫度而更低溫之溫度範圍內也會成為非接觸。 In addition, the present invention is a reflector device, which is configured such that the unit reflector is provided with a clearance hole, and the holding device is provided with a first screw inserted into the clearance hole. The locking device is screwed and fixed to the mounting surface. The edge of the margin hole and the first screw locking device are configured to thermally extend along the mounting surface even if the unit reflector is The unit reflector becomes non-contact in the temperature range above room temperature and lower than the upper limit temperature.

又,本發明,係為一種反射器裝置,其係構成為:前述固定裝置和前述保持裝置,係被熔接固定於前述單位反射板處。 In addition, the present invention is a reflector device, which is configured such that the fixing device and the holding device are welded and fixed to the unit reflector.

又,本發明,係為一種反射器裝置,其係構成為:前述固定裝置係被熔接固定於前述單位反射板處,前述保持裝置係藉由第2螺絲鎖合裝置而被螺絲鎖合固定於前述單位反射板處。 In addition, the present invention is a reflector device, which is configured such that the fixing device is welded and fixed to the unit reflector, and the holding device is screwed and fixed to the unit reflector by a second screw locking device. At the aforementioned unit reflector.

又,本發明,係為一種反射器裝置,其係構成為:被固定在1片的前述單位反射板處之前述固定裝置,係被配置在被固定於相同的前述單位反射板處之前述保持裝置與前述保持裝置之間。 In addition, the present invention is a reflector device, which is configured such that the fixing device fixed to one piece of the unit reflector is arranged on the holder fixed to the same unit reflector Between the device and the aforementioned holding device.

又,本發明,係為一種反射器裝置,其係構成為:以被固定在1片的前述單位反射板處之前述固定裝置作為中 心,而被配置有被固定於相同的前述單位反射板處之複數之前述保持裝置。 In addition, the present invention is a reflector device, which is configured to use the fixing device fixed to one piece of the unit reflector as the center The core is configured with a plurality of the holding devices fixed to the same unit reflector.

由於單位反射板係藉由固定裝置和保持裝置而被固定在真空槽處,因此係並不會發生起因於熱所導致的大的下垂。 Since the unit reflector is fixed at the vacuum tank by the fixing device and the holding device, the large sagging caused by heat does not occur.

由於安裝構件和單位反射板之間或者是單位反射板彼此之間係並不會滑動,因此並不會產生塵埃。 Since the mounting member and the unit reflector or the unit reflector will not slide between each other, no dust will be generated.

2:真空加熱裝置 2: Vacuum heating device

11a~11d,12,13a,13b,14a~14c,15a~15d,16a~16d:保持裝置 11a~11d,12,13a,13b,14a~14c,15a~15d,16a~16d: holding device

17:真空槽 17: Vacuum tank

19:安裝面 19: Mounting surface

21~24,54,55:固定裝置 21~24,54,55: fixed device

26a~26d:第1螺絲鎖合裝置 26a~26d: The first screw locking device

28a~28d:第2螺絲鎖合裝置 28a~28d: 2nd screw locking device

31~36:單位反射板 31~36: unit reflector

46a~46d:餘裕孔 46a~46d: surplus hole

64:變形部 64: Deformation

87:加熱對象物 87: Heating object

88:加熱源 88: heating source

110,210,310,410:反射器裝置 110,210,310,410: reflector device

[圖1]係為本發明之真空加熱裝置的其中一例。 [Figure 1] is an example of the vacuum heating device of the present invention.

[圖2]係為用以對於第1例之反射器裝置作說明之平面圖。 [Fig. 2] is a plan view for explaining the reflector device of the first example.

[圖3](a):係為組裝前之第1例之反射器裝置的單位反射裝置,(b):係為組裝後之第1例之反射器裝置的單位反射裝置。 [Figure 3] (a): is the unit reflector of the reflector device of the first example before assembly, (b): is the unit reflector of the reflector device of the first example after assembly.

[圖4]係為保持裝置之(a):平面圖,(b):左側面圖,(c):正面圖,(d):背面圖,(e):剖面圖。 [Figure 4] is the holding device (a): plan view, (b): left side view, (c): front view, (d): back view, (e): cross-sectional view.

[圖5]係為用以對於第2例之反射器裝置作說明之平面圖。 [Fig. 5] is a plan view for explaining the reflector device of the second example.

[圖6]係為用以對於第3例之反射器裝置作說明之平面圖。 [Fig. 6] is a plan view for explaining the reflector device of the third example.

[圖7]係為用以對於第4例之反射器裝置作說明之平面圖。 [Fig. 7] is a plan view for explaining the reflector device of the fourth example.

[圖8](a)、(b):係為保持裝置與固定裝置之安裝方法為相異的單位反射裝置之例。 [Figure 8] (a), (b): are examples of unit reflection devices in which the mounting methods of the holding device and the fixing device are different.

[圖9](a)、(b):係為保持裝置與固定裝置之安裝方法為相異的單位反射裝置之其他例。 [Figure 9] (a), (b): are other examples of unit reflection devices in which the mounting methods of the holding device and the fixing device are different.

[圖10]係為保持裝置之其他例之(a):平面圖,(b):左側面圖,(c):正面圖,(d):背面圖,(e):剖面圖。 [Fig. 10] is another example of the holding device (a): plan view, (b): left side view, (c): front view, (d): back view, (e): cross-sectional view.

[圖11]係為保持裝置之又一其他例之(a):平面圖,(b):左側面圖,(c):正面圖,(d):背面圖,(e):剖面圖。 [Fig. 11] is another example of the holding device (a): plan view, (b): left side view, (c): front view, (d): back view, (e): cross-sectional view.

〈真空加熱裝置〉 <Vacuum heating device>

圖1之元件符號2,係為本發明之其中一例之真空加熱裝置,並具備有真空槽17。 The symbol 2 in FIG. 1 is an example of the vacuum heating device of the present invention, and is provided with a vacuum tank 17.

在真空槽17之內部,係被配置有加熱源88,真空槽17係具備有複數之內壁面。在身為複數之內壁面之中之其中一個內壁面的安裝面19與加熱源88之間,係被設置有反射器裝置110。在與該安裝面19相對向的其他之內壁面18與加熱源88之間,係被設置有基板配置裝置85。於此,真空槽17之內壁面中的安裝面19,係身為頂板之表面,與安裝面19平行地相對向之內壁面18,係身為底面。 Inside the vacuum chamber 17, a heating source 88 is arranged, and the vacuum chamber 17 is provided with a plurality of inner wall surfaces. A reflector device 110 is provided between the mounting surface 19 of one of the inner wall surfaces among the plurality of inner wall surfaces and the heating source 88. Between the other inner wall surface 18 facing the mounting surface 19 and the heating source 88, a substrate arrangement device 85 is provided. Here, the mounting surface 19 of the inner wall surface of the vacuum chamber 17 is the surface of the top plate, and the inner wall surface 18 facing parallel to the mounting surface 19 is the bottom surface.

在真空槽17處,係被連接有真空排氣裝置78,若是真空排氣裝置78動作,則真空槽17之內部係被作真空排氣,並被形成有真空氛圍。 A vacuum exhaust device 78 is connected to the vacuum tank 17, and if the vacuum exhaust device 78 is activated, the inside of the vacuum tank 17 is evacuated and a vacuum atmosphere is formed.

在基板配置裝置85處,係被設置有銷86,在銷86為上升至較基板配置裝置85之表面而更上方處的狀態下,身為加熱對象物之基板87係被搬入至真空槽17之內部,並被承載於銷86之上。圖1,係對於該狀態作展示。 The substrate placement device 85 is provided with a pin 86. In the state where the pin 86 rises above the surface of the substrate placement device 85, the substrate 87, which is the object to be heated, is carried into the vacuum chamber 17 , And is carried on the pin 86. Figure 1 shows this state.

接著,銷86係下降,基板87係被水平地配置在基板配置裝置85上,接著,加熱源88係被通電,加熱源88係升溫並輻射出紅外線。 Next, the pins 86 are lowered, and the substrate 87 is horizontally arranged on the substrate arranging device 85. Next, the heating source 88 is energized, and the heating source 88 is heated and radiates infrared rays.

從加熱源88所輻射出的紅外線中之朝向基板配置裝置85所輻射的紅外線,係被照射至基板87處,基板87係被加熱。 Among the infrared rays radiated from the heating source 88, the infrared rays radiated toward the substrate arrangement device 85 are irradiated to the substrate 87, and the substrate 87 is heated.

從加熱源88所輻射出的紅外線中之朝向位置於與基板87相反側處的安裝面19所輻射的紅外線,係被照射至位置於加熱源88與安裝面19之間之反射器裝置110處。 Among the infrared rays radiated from the heating source 88, the infrared rays radiated from the mounting surface 19 on the opposite side of the substrate 87 are irradiated to the reflector device 110 located between the heating source 88 and the mounting surface 19 .

故而,在安裝面19側處,藉由反射器裝置110,紅外線係被遮蔽,而並不會被照射至安裝面19處,真空槽17係構成為並不會升溫。 Therefore, at the side of the mounting surface 19, the infrared rays are shielded by the reflector device 110 and will not be irradiated to the mounting surface 19, and the vacuum chamber 17 is configured to not rise in temperature.

被照射至反射器裝置110處之紅外線,係被反射至加熱源88所位置之方向,並被照射至基板87處。 The infrared rays irradiated to the reflector device 110 are reflected to the direction of the position of the heating source 88 and irradiated to the substrate 87.

基板87,若是在被配置於將真空槽17之內部作真空排氣所形成的真空氛圍中之狀態下而被加熱,並升 溫至特定之溫度,則對於加熱源88之通電係被停止,基板87係從真空加熱裝置2之內部而被搬送至被與真空加熱裝置2作了連接的真空處理裝置處。 The substrate 87 is heated in a state of being placed in a vacuum atmosphere formed by evacuating the inside of the vacuum chamber 17 and rising When the temperature reaches a certain temperature, the energization of the heating source 88 is stopped, and the substrate 87 is transported from the inside of the vacuum heating device 2 to the vacuum processing device connected to the vacuum heating device 2.

〈反射器裝置〉 <Reflector device>

針對反射器裝置110之構造作說明。反射器裝置110,係如同圖2中所示一般,具備有複數之單位反射裝置111~113、121~123、131~133。各單位反射裝置111~113、121~123、131~133,係具備有四角形狀之單位反射板31,各單位反射裝置111~113、121~123、131~133之單位反射板31,於此係被配置為橫方向3個且縱方向3個的3×3個之行列狀。單位反射板31係被配置為水平。 The structure of the reflector device 110 will be described. The reflector device 110 is generally as shown in FIG. 2, and is provided with plural unit reflection devices 111 to 113, 121 to 123, and 131 to 133. Each unit reflection device 111~113, 121~123, 131~133 is equipped with a quadrangular unit reflection plate 31, and each unit reflection device 111~113, 121~123, 131~133 unit reflection plate 31, here It is arranged in a row and column of 3 in the horizontal direction and 3 in the vertical direction. The unit reflection plate 31 is arranged horizontally.

在各單位反射板31處,1個的固定裝置21和1乃至複數個(於此係為4個)的保持裝置11a~11d,係分別被安裝在相同之表面上。 At each unit reflector 31, one fixing device 21 and one or even a plurality of (here, four) holding devices 11a-11d are respectively installed on the same surface.

各單位反射裝置111~113、121~123、131~133之構造係為相同,在圖3(a)、(b)中,係展示有該些之單位反射裝置111~113、121~123、131~133之中之一台的單位反射裝置122之構造。 The structure of each unit reflection device 111~113, 121~123, 131~133 is the same. In Figure 3(a), (b), the unit reflection device 111~113, 121~123, The structure of the unit reflector 122 in one of 131~133.

各單位反射裝置111~113、121~123、131~133,係藉由固定裝置21和保持裝置11a~11d,而如同後述一般地分別被安裝在真空槽17之複數之內壁面中的安裝面19處。 The unit reflection devices 111 to 113, 121 to 123, and 131 to 133 are installed on the mounting surface of the plurality of inner wall surfaces of the vacuum tank 17 by the fixing device 21 and the holding device 11a-11d, as described later. 19 locations.

圖3(a),係對於單位反射板31被從安裝面19 而作了分離的狀態作展示,同圖之(b),係對於單位反射板31被安裝在安裝面19處的狀態作展示。 Fig. 3(a), the unit reflector 31 is removed from the mounting surface 19 The separated state is shown. (b) of the same figure shows the state in which the unit reflector 31 is installed on the mounting surface 19.

固定裝置21,係具備有於中心被設置有插通孔53的筒形形狀之本體52。 The fixing device 21 is provided with a cylindrical main body 52 provided with an insertion hole 53 in the center.

在單位反射板31之中央處,係被形成有身為貫通孔之第1板側固定孔47,固定裝置21,係以使插通孔53和第1板側固定孔47相通連的方式,而被固定在單位反射板31處。於此,固定裝置21,係在使插通孔53和第1板側固定孔47相互作了通連的狀態下,而被熔接固定在單位反射板31處。 In the center of the unit reflector 31, a first plate-side fixing hole 47 is formed as a through hole, and the fixing device 21 is such that the insertion hole 53 and the first plate-side fixing hole 47 communicate with each other. It is fixed at the unit reflector 31. Here, the fixing device 21 is welded and fixed to the unit reflector 31 in a state where the insertion hole 53 and the first plate-side fixing hole 47 are in communication with each other.

各保持裝置11a~11d,係位置於單位反射板31與安裝面19之間,並具備有與單位反射板31相接觸之板側連接部62、和與安裝面19相接觸之槽側連接部63、和使其中一端被固定於板側連接部62處並使另外一端被固定在槽側連接部63處的變形部64。 Each holding device 11a-11d is located between the unit reflector 31 and the mounting surface 19, and is provided with a plate-side connection portion 62 contacting the unit reflector 31 and a groove-side connection portion contacting the mounting surface 19 63. And the deformed portion 64 in which one end is fixed to the plate-side connecting portion 62 and the other end is fixed to the groove-side connecting portion 63.

圖4(a),係為保持裝置11a~11d之平面圖,同圖之(b)係為左側面圖,同圖之(c)係為正面圖,同圖之(d)係為背面圖,同圖之(e)係為將保持裝置11a~11d以通過板側連接部62和變形部64以及槽側連接部63之平面來作了截斷的截斷剖面圖。 Figure 4(a) is a plan view of the holding devices 11a-11d, (b) of the same figure is a left side view, (c) of the same figure is a front view, and (d) of the same figure is a back view. (E) of the same figure is a cutaway cross-sectional view of the holding devices 11a-11d in a plane passing through the plate-side connecting portion 62, the deforming portion 64, and the groove-side connecting portion 63.

若是對於安裝面19和槽側連接部63與固定裝置21之間之連接作說明,則在槽側連接部63處,係被設置有第1保持側固定孔60,在單位反射板31中之與第1保持側固定孔60相對面之部分處,係被設置有餘裕孔46a~ 46d(在圖3(a)、(b)中,係並未對於以元件符號46c、46d所特定之餘裕孔和以元件符號11c、11d所特定之保持裝置和下述之以元件符號26c、26d所特定之第1螺絲鎖合裝置以及下述之以元件符號58c、58d所特定之第2槽側固定孔作展示)。 If the connection between the mounting surface 19 and the groove-side connecting portion 63 and the fixing device 21 is described, the groove-side connecting portion 63 is provided with a first holding-side fixing hole 60, which is in the unit reflector 31 The part opposite to the first holding side fixing hole 60 is provided with a margin hole 46a~ 46d (In Figure 3 (a) and (b), the margin holes specified by the reference symbols 46c and 46d and the holding device specified by the reference symbols 11c and 11d and the following reference symbols 26c, The first screw locking device specified in 26d and the second slot side fixing hole specified by the symbol 58c and 58d below are shown).

在安裝面19處,於與插通孔53相對面之位置處,係被設置有第1槽側固定孔57,又,在與第1保持側固定孔60相對面之位置處,係分別被設置有第2槽側固定孔58a~58d。 The mounting surface 19 is provided with a first groove-side fixing hole 57 at a position opposite to the insertion hole 53, and a position opposite to the first holding-side fixing hole 60 is respectively provided with The second groove side fixing holes 58a to 58d are provided.

板側連接部62,係被熔接固定於單位反射板31處,在使第1槽側固定孔57與插通孔53相互通連並且使第2槽側固定孔58a~58d與各保持裝置11a~11d之第1保持側固定孔60分別相互通連的狀態下,使固定裝置21中之朝向安裝面19側的其中一端和各保持裝置11a~11d之槽側連接部63與安裝面19相接觸,並將固定螺絲鎖合裝置27之胴體部66插通於第1板側固定孔47與插通孔53處,再使固定螺絲鎖合裝置27旋轉而使被設置在第1槽側固定孔57之內周面上的螺紋部分與被設置在胴體部66之前端之部分之外周面處的螺紋部分相螺合,而藉由該旋轉來使胴體部66之前端朝向第1槽側固定孔57之底面前進。 The plate-side connecting portion 62 is welded and fixed to the unit reflector 31, and connects the first groove-side fixing hole 57 and the insertion hole 53 to each other, and connects the second groove-side fixing holes 58a to 58d to each holding device 11a. When the first holding-side fixing holes 60 of ~11d are in communication with each other, make one end of the fixing device 21 facing the mounting surface 19 side and the groove-side connecting portion 63 of each holding device 11a-11d and the mounting surface 19 Contact, and insert the body portion 66 of the fixing screw locking device 27 into the first plate side fixing hole 47 and the insertion hole 53, and then rotating the fixing screw locking device 27 to fix it on the first groove side The threaded portion on the inner peripheral surface of the hole 57 is screwed with the threaded portion provided on the outer peripheral surface of the front end of the carcass portion 66, and by this rotation, the front end of the carcass portion 66 is fixed toward the first groove side The bottom surface of the hole 57 advances.

從各固定螺絲鎖合裝置27之胴體部66所突出的頭部67,係被形成為較第1板側固定孔47而更大,藉由固定螺絲鎖合裝置27之前進,頭部67之座面係分別與單位反射板31作接觸,藉由固定螺絲鎖合裝置27之旋轉,頭部 67係將單位反射板31和固定裝置21朝向安裝面19而作推壓。 The head 67 protruding from the carcass portion 66 of each fixing screw locking device 27 is formed to be larger than the first plate side fixing hole 47. By fixing the screw locking device 27 forward, the head 67 The seat surface is in contact with the unit reflector 31 respectively. By the rotation of the fixing screw locking device 27, the head The 67 system pushes the unit reflector 31 and the fixing device 21 toward the mounting surface 19.

另一方面,第1螺絲鎖合裝置26a~26d之胴體部37,係從被設置在胴體部37之前端處的前端部38起而被插通於餘裕孔46a~46d中,前端部38係分別被插入至各保持裝置11a~11d之第1保持側固定孔60和第2槽側固定孔58a~58d中。元件符號39係為頭部,其與單位反射板31係為非接觸。 On the other hand, the carcass portion 37 of the first screw locking device 26a to 26d is inserted from the front end 38 provided at the front end of the carcass portion 37 into the free holes 46a to 46d, and the front end 38 is It is inserted into the first holding side fixing hole 60 and the second groove side fixing hole 58a to 58d of each holding device 11a to 11d, respectively. The component symbol 39 is the head, and it is in non-contact with the unit reflector 31.

餘裕孔46a~46d,係被形成為較第1螺絲鎖合裝置26a~26d之胴體部37而更大,餘裕孔46a~46d之邊緣和被插通於餘裕孔46a~46d中之胴體部37的外周側面之間,係構成為在常溫(於此,係將20℃±15℃之溫度範圍設為常溫)或室溫(於此係為300K)之下會相互分離特定距離,並且構成為當反射器裝置110為較特定之上限溫度而更低溫的情況時亦會相互分離。上限溫度,例如係為600℃。 The margin holes 46a~46d are formed to be larger than the carcass portion 37 of the first screw locking device 26a~26d. The margins of the margin holes 46a~46d and the carcass portion 37 inserted in the margin holes 46a~46d The outer peripheral side surfaces of the are configured to be separated from each other by a certain distance at room temperature (here, the temperature range of 20℃±15℃ is set to room temperature) or room temperature (here, 300K), and are configured as When the reflector device 110 is lower than the specific upper temperature and lower temperature, it will also be separated from each other. The upper limit temperature is, for example, 600°C.

在第2槽側固定孔58a~58d之內周面與前端部38之外周面處,係分別被形成有螺紋,前端部38係被插通於第1保持側固定孔60和第2槽側固定孔58a~58d中,若是第1螺絲鎖合裝置26a~26d被旋轉,則前端部38和第2槽側固定孔58a~58d係螺合,同時,前端部38係朝向第2槽側固定孔58a~58d之底面而前進。 The inner peripheral surface of the second groove side fixing holes 58a to 58d and the outer peripheral surface of the front end portion 38 are respectively formed with threads, and the front end portion 38 is inserted into the first holding side fixing hole 60 and the second groove side In the fixing holes 58a to 58d, if the first screw locking device 26a to 26d is rotated, the front end 38 and the second groove side fixing holes 58a to 58d are screwed together, and the front end 38 is fixed toward the second groove side. The bottom surface of the holes 58a~58d advances.

於此,胴體部37之直徑係被形成為較第1保持側固定孔60之直徑和前端部38之直徑而更大,前端部38 係朝向第2槽側固定孔58a~58d之底面而前進,胴體部37中之前端部38側之端部係與槽側連接部63相抵接,若是前端部38更進一步前進,則槽側連接部63係藉由胴體部37之端部而被推壓於真空槽17之安裝面19處。 Here, the diameter of the body portion 37 is formed to be larger than the diameter of the first holding side fixing hole 60 and the diameter of the tip portion 38, and the tip portion 38 It advances toward the bottom surface of the second groove-side fixing holes 58a to 58d. The end of the carcass 37 on the front end 38 side is in contact with the groove-side connecting portion 63. If the front end 38 advances further, the groove-side connection The portion 63 is pressed against the mounting surface 19 of the vacuum groove 17 by the end of the carcass portion 37.

故而,單位反射板31,其之被設置有固定裝置21之部分係藉由固定螺絲鎖合裝置27而被固定在安裝面19處,其之被設置有保持裝置11a~11d之部分,則係藉由第1螺絲鎖合裝置26a~26d而被固定在安裝面19處。其結果,固定裝置21之被固定於安裝面19處的場所、和固定裝置21之被固定於單位反射板31處之場所,此兩者間之相對性之位置,係藉由固定裝置21而被作固定。 Therefore, the part of the unit reflector 31 provided with the fixing device 21 is fixed at the mounting surface 19 by the fixing screw locking device 27, and the part provided with the holding device 11a~11d is It is fixed to the mounting surface 19 by the first screw locking devices 26a to 26d. As a result, the position where the fixing device 21 is fixed to the mounting surface 19 and the place where the fixing device 21 is fixed to the unit reflector 31, the relative position between the two is determined by the fixing device 21 Is made fixed.

〈加熱工程〉 〈Heating Engineering〉

真空槽17之內部係藉由真空排氣裝置78而被作真空排氣,並被設為真空氛圍,在一面被作真空排氣一面將基板87配置在基板配置裝置85上之後,若是對於加熱源88通電而使其發熱並輻射出紅外線,則被輻射出的紅外線係被照射至基板87和反射器裝置110之單位反射板31處,基板87和單位反射板31係被加熱。 The inside of the vacuum chamber 17 is evacuated by a vacuum exhaust device 78, and set to a vacuum atmosphere. After the substrate 87 is placed on the substrate placement device 85 while being evacuated on one side, if it is heated The source 88 is energized to generate heat and radiate infrared rays. The radiated infrared rays are irradiated to the substrate 87 and the unit reflection plate 31 of the reflector device 110, and the substrate 87 and the unit reflection plate 31 are heated.

固定裝置21,係位置於各單位反射板31之中央處,被固定在1片的單位反射板31處之保持裝置11a~11d,係被配置在以被固定於相同的單位反射板31處之固定裝置21作為中心的圓周上。 The fixing device 21 is located at the center of each unit reflector 31, and the holding devices 11a-11d are fixed to one unit reflector 31, and are arranged to be fixed to the same unit reflector 31. The fixing device 21 is centered on the circumference.

各保持裝置11a~11d之變形部64,係身為平 板形形狀,各變形部64之面積為大之面,係被朝向固定裝置21。 The deformed part 64 of each holding device 11a~11d is flat It has a plate shape, and the area of each deformed portion 64 is a large surface, which is directed toward the fixing device 21.

在單位反射板31處,係被照射有紅外線,在真空槽17之安裝面19處,由於紅外線之照射係被遮蔽,因此就算是輻射有紅外線,真空槽17之內壁面之升溫亦為小,但是,單位反射板31之溫度係相較於真空槽17之安裝面19之溫度而作更大的升溫。 The unit reflector 31 is irradiated with infrared rays. At the installation surface 19 of the vacuum tank 17, the infrared ray is shielded. Therefore, even if infrared rays are radiated, the temperature rise of the inner wall of the vacuum tank 17 is small. However, the temperature of the unit reflector 31 is increased more than the temperature of the mounting surface 19 of the vacuum chamber 17.

故而,真空槽17之安裝面19係並不會發生熱延伸(亦稱作膨脹),相對於此,單位反射板31係會發生熱延伸。於此情況,被安裝有固定裝置21之部分由於係被固定在安裝面19處,因此,單位反射板31,係想要朝向以固定裝置21所被作固定的部分作為中心的輻射方向而進行熱延伸。 Therefore, the mounting surface 19 of the vacuum chamber 17 does not undergo thermal extension (also referred to as expansion). In contrast, the unit reflection plate 31 does not undergo thermal extension. In this case, the part where the fixing device 21 is installed is fixed to the mounting surface 19. Therefore, the unit reflector 31 is intended to be directed toward the radiation direction centered on the portion where the fixing device 21 is fixed. Thermal extension.

各保持裝置11a~11d之槽側連接部63,由於係藉由第1螺絲鎖合裝置26a~26d而被固定在安裝面19處,因此係並不會移動,但是,板側連接部62側,係會與單位反射板31之熱延伸一同地而移動。因此,在變形部64處,係從板側連接部62而被施加有朝向輻射方向之力。 The groove-side connecting portion 63 of each holding device 11a-11d is fixed to the mounting surface 19 by the first screw locking device 26a-26d, so it will not move. However, the plate-side connecting portion 62 side , Is moved together with the thermal extension of the unit reflector 31. Therefore, at the deforming portion 64, a force toward the radiation direction is applied from the plate-side connecting portion 62.

保持裝置11a~11d(以及後述之保持裝置12、13a、13b、14a~14c、15a~15d、16a~16d),係以使被施加於變形部64處之力會相對於矩形形狀之變形部64之面積為大之面而成為垂直的方式,而被作配置,伴隨著變形部64之變形,在1個的保持裝置11a~11d(以及後述之保持裝置12、13a、13b、14a~14c、15a~15d、16a~16d)之 中,板側連接部62係想要相對於槽側連接部63而作移動。 The holding devices 11a~11d (and the holding devices 12, 13a, 13b, 14a~14c, 15a~15d, 16a~16d described later) are used to make the force applied to the deforming part 64 relative to the rectangular deforming part The area of 64 is a large surface and becomes a vertical manner, and is arranged, and along with the deformation of the deforming portion 64, in one holding device 11a-11d (and the holding device 12, 13a, 13b, 14a-14c described later) , 15a~15d, 16a~16d) of Among them, the plate-side connecting portion 62 intends to move relative to the groove-side connecting portion 63.

此時,由於在餘裕孔46a~46d之邊緣與第1螺絲鎖合裝置26a~26d之胴體部37的外周側面之間,係被形成有間隙,並被設為非接觸之狀態,因此,在單位反射板31被加熱並伴隨著變形部64之變形而進行熱延伸時,若是單位反射板31之溫度係為特定溫度以下,則餘裕孔46a~46d之邊緣和胴體部37之外周側面係並不會相互接觸而成為維持於非接觸之狀態。 At this time, a gap is formed between the edges of the margin holes 46a to 46d and the outer peripheral side surface of the body portion 37 of the first screw locking device 26a to 26d, and is set in a non-contact state, therefore, When the unit reflector 31 is heated and thermally stretched along with the deformation of the deformed portion 64, if the temperature of the unit reflector 31 is below a certain temperature, the edges of the remaining holes 46a to 46d and the outer peripheral surface of the carcass 37 are in parallel They will not touch each other and will be maintained in a non-contact state.

故而,各保持裝置11a~11d之板側連接部62,起因於單位反射板31之熱延伸,保持裝置11a~11d之被固定於安裝面19處的場所和被固定於單位反射板31處之場所之間之相對性之位置關係,係藉由變形部64之變形而被作變更,其結果,係以固定裝置21之被固定於單位反射板31處的部分作為中心,而朝向輻射方向移動。 Therefore, the plate-side connecting portion 62 of each holding device 11a-11d is caused by the thermal extension of the unit reflector 31, and the holding device 11a-11d is fixed to the mounting surface 19 and fixed to the unit reflector 31. The relative positional relationship between the places is changed by the deformation of the deforming part 64. As a result, the part of the fixing device 21 fixed to the unit reflector 31 is taken as the center, and it moves toward the radiation direction. .

如此這般,伴隨著變形部64之變形,在1個的保持裝置11a~11d之中,起因於被固定在單位反射板31處的板側連接部62之相對於被固定在安裝面19處之槽側連接部63而相對性地移動一事,由於被施加在板側連接部62與槽側連接部63處的力係被紓緩,因此保持裝置11a~11d係並不會被破壞。 In this way, along with the deformation of the deforming portion 64, among the one holding device 11a-11d, the reason is that the plate-side connecting portion 62 fixed to the unit reflector 31 is fixed to the mounting surface 19 with respect to When the groove-side connecting portion 63 moves relatively, since the force applied to the plate-side connecting portion 62 and the groove-side connecting portion 63 is relieved, the holding devices 11a-11d are not broken.

當被加熱的單位反射板31之溫度作了降低時,進行了熱延伸的單位反射板31係收縮,變形部64之變形係恢復至原本之形狀,在各保持裝置11a~11d之1片的單位反射板31之中,板側連接部62係相對於槽側連接部63 而朝向單位反射板31之中心方向移動,板側連接部62與槽側連接部63之間之相對性的位置關係係恢復至加熱前之狀態。 When the temperature of the heated unit reflector 31 decreases, the thermally stretched unit reflector 31 shrinks, and the deformation of the deformed portion 64 returns to its original shape. In the unit reflector 31, the plate-side connecting portion 62 is opposite to the groove-side connecting portion 63 When moving toward the center of the unit reflector 31, the relative positional relationship between the plate-side connecting portion 62 and the groove-side connecting portion 63 is restored to the state before heating.

另外,相鄰接之單位反射板31之側面與單位反射板31之側面,係亦可構成為在常溫下係預先使其分離,並藉由熱延伸而相互接近。 In addition, the side surface of the adjacent unit reflection plate 31 and the side surface of the unit reflection plate 31 may also be configured to be separated in advance at room temperature and approach each other by thermal extension.

若是基板87被加熱至特定溫度,則基板87係從真空槽17而被移動至其他之真空處理裝置的處理室處。 If the substrate 87 is heated to a specific temperature, the substrate 87 is moved from the vacuum chamber 17 to the processing chamber of another vacuum processing apparatus.

在以上所作了說明的反射器裝置110中,雖係構成為將固定裝置21熔接固定於1片的單位反射板31之中心處,並在位置於該單位反射板31之中央處的固定裝置21之周圍之位置處配置有4個的保持裝置11a~11d,但是,如同圖7中所示一般之使固定裝置24位置在被作了行列配置的複數之單位反射裝置411~413、421~423、431~433之單位反射板34之中央處並在該固定裝置24之周圍配置有3個的保持裝置14a~14c之反射器裝置410,係亦被包含於本發明中。 In the reflector device 110 described above, although the fixing device 21 is welded and fixed to the center of one unit reflector 31, and the fixing device 21 is positioned at the center of the unit reflector 31 Four holding devices 11a~11d are arranged around the position, but, as shown in Fig. 7, the fixing device 24 is positioned at the plural unit reflecting devices 411~413, 421~423 arranged in rows and columns. The reflector device 410 with three holding devices 14a-14c arranged at the center of the unit reflector 34 of 431 to 433 and around the fixing device 24 is also included in the present invention.

又,如同圖6中所示一般之使固定裝置23位置在被作了行列配置的複數之單位反射裝置311~313、321~323、331~333之單位反射板33的長邊方向之其中一端處並在另外一端處配置有2個的保持裝置13a、13b之反射器裝置310,係亦被包含於本發明中。 In addition, as shown in FIG. 6, the fixing device 23 is positioned at one of the long side directions of the unit reflection plate 33 of the plural unit reflection devices 311 to 313, 321 to 323, and 331 to 333 arranged in rows and columns. The reflector device 310 with two holding devices 13a and 13b arranged at the other end is also included in the present invention.

又,如同圖5中所示一般之使固定裝置22位置在被作了行列配置的複數之單位反射裝置211~213、 221~223、231~233之單位反射板32的長邊方向之其中一端處並在另外一端處配置有1個的保持裝置12之反射器裝置210,係亦被包含於本發明中。 In addition, as shown in FIG. 5, the fixing device 22 is positioned at the plural unit reflection devices 211 to 213 arranged in rows and columns, The reflector device 210 in which one holding device 12 is arranged at one end of the unit reflector plate 32 in the longitudinal direction of 221 to 223 and 231 to 233 at the other end is also included in the present invention.

此些之圖5~圖7之反射器裝置210、310、410的固定裝置22、23、24之構造,係與在圖3中所作了說明的固定裝置21相同,而使其中一端被熔接固定於單位反射板32、33、34處。 The structures of the fixing devices 22, 23, and 24 of the reflector devices 210, 310, 410 in Figs. 5-7 are the same as the fixing device 21 described in Fig. 3, but one end is welded and fixed. At the unit reflectors 32, 33, and 34.

又,圖5~圖7之反射器裝置210、310、410的保持裝置12、13a、13b、14a~14c之構造,係與圖4之保持裝置11a~11d相同,而以使板側連接部62分別被熔接固定於單位反射板32、33、34處並且使矩形形狀之變形部64的面積為廣之一面與固定裝置22、23、24相對面的方式來作配置。關於在餘裕孔46a~46d之邊緣與被配置於餘裕孔46a~46d處之第1螺絲鎖合裝置26a~26d之胴體部37的外周側面之間為分離有特定距離一事,亦為相同,而構成為在單位反射板32~34被加熱並作了熱延伸時,板側連接部62能夠進行與所分離了的距離相應之量的起因於熱延伸所導致之移動。 In addition, the structure of the holding devices 12, 13a, 13b, 14a-14c of the reflector devices 210, 310, 410 of FIGS. 5-7 is the same as that of the holding devices 11a-11d of FIG. 62 are respectively welded and fixed to the unit reflectors 32, 33, and 34, and the rectangular deformed portion 64 is arranged so that the area of the deformed portion 64 is wide and the surface faces the fixing devices 22, 23, and 24. The same applies to the fact that there is a specific distance between the edges of the margin holes 46a to 46d and the outer peripheral side surface of the carcass portion 37 of the first screw locking device 26a to 26d arranged at the margin holes 46a to 46d, and When the unit reflection plates 32 to 34 are heated and thermally stretched, the plate-side connection portion 62 is configured to be able to move due to the thermal stretch by an amount corresponding to the separated distance.

另外,係確認到了:當並不設置保持裝置而僅藉由1個的固定裝置來將1片的單位反射板固定於真空槽之內壁面處時,當單位反射板被作了加熱時,單位反射板之邊緣附近係會下垂,單位反射板之邊緣與加熱源88會相互接觸,而並不理想。 In addition, it has been confirmed that when the unit reflector is fixed to the inner wall surface of the vacuum tank by only one fixing device without a holding device, when the unit reflector is heated, the unit The vicinity of the edge of the reflector will sag, and the edge of the unit reflector and the heating source 88 will contact each other, which is not ideal.

在以上的反射器裝置110、210、310、410 中,固定裝置21~24和保持裝置11a~11d、12、13a、13b、14a~14c,雖係構成為使單位反射板31~34側被作熔接固定並使真空槽17之安裝面19側被作螺絲鎖合固定,但是,本發明係並不被限定於此。 In the above reflector device 110, 210, 310, 410 Among them, the fixing devices 21 to 24 and the holding devices 11a to 11d, 12, 13a, 13b, and 14a to 14c are configured so that the unit reflector 31 to 34 side is welded and fixed and the vacuum tank 17 is mounted on the 19 side It is screwed and fixed, but the present invention is not limited to this.

在圖8(a)、(b)和圖9(a)、(b)中,係展示有與圖3(a)、(b)之單位反射裝置122相異的單位反射裝置151、152,各單位反射裝置151、152係分別被作行列配置,並被安裝於真空槽17處,而構成反射器裝置。 In Figs. 8(a), (b) and Figs. 9(a), (b), there are shown unit reflection devices 151, 152 that are different from the unit reflection device 122 of Figs. 3(a) and (b), The unit reflection devices 151 and 152 are arranged in rows and columns, and are installed in the vacuum tank 17 to form a reflector device.

圖8(a)、圖9(a),係為使單位反射裝置151、152分別從真空槽17之安裝面19而作了分離的狀態,圖8(b)、圖9(b),係身為使其之單位反射裝置151、152分別被安裝於安裝面19處之狀態。 Figures 8(a) and 9(a) are in a state where the unit reflectors 151 and 152 are separated from the mounting surface 19 of the vacuum chamber 17, respectively. Figures 8(b) and 9(b) are The unit reflection devices 151 and 152 are installed on the mounting surface 19 respectively.

在圖8(a)、(b)之單位反射裝置151中,固定裝置54之兩端和保持裝置15a~15d(保持裝置15c、15d和下述第2板側固定孔48c、48d、第2槽側固定孔58c、58d係並未圖示)之兩端,係並未被熔接固定於安裝面19和單位反射板35處。 In the unit reflection device 151 of Fig. 8 (a) and (b), both ends of the fixing device 54 and the holding devices 15a-15d (holding devices 15c, 15d and the following second plate side fixing holes 48c, 48d, second The two ends of the groove-side fixing holes 58c and 58d (not shown) are not welded and fixed to the mounting surface 19 and the unit reflector 35.

在圖8(a)、(b)中所使用的保持裝置15a~15d,係被展示於圖10(a)~(e)中。 The holding devices 15a to 15d used in Figs. 8(a) and (b) are shown in Figs. 10(a) to (e).

圖7(a)、(b)之左方的保持裝置15a,係以剖面作展示,右方之保持裝置15b,係以斜側方作展示。在後述之圖9(a)、(b)中,亦為相同。 The holding device 15a on the left side of Fig. 7(a) and (b) is shown in cross section, and the holding device 15b on the right side is shown on the oblique side. The same applies to Figs. 9(a) and (b) described later.

此保持裝置15a~15d,係位置於單位反射板35與安裝面19之間,並具備有單位反射板35側之板側連接 部62、和安裝面19側之槽側連接部63、和使其中一端被固定於板側連接部62處並使另外一端被固定在槽側連接部63處的變形部64。 The holding devices 15a-15d are located between the unit reflector 35 and the mounting surface 19, and are provided with a plate-side connection on the side of the unit reflector 35 The portion 62, the groove-side connecting portion 63 on the mounting surface 19 side, and the deformable portion 64 having one end fixed to the plate-side connecting portion 62 and the other end fixed to the groove-side connecting portion 63.

板側連接部62和單位反射板35,係並未被作熔接固定,在板側連接部62處,係被形成有第2保持側固定孔61,在單位反射板35處,係被形成有第2板側固定孔48a~48d。 The board-side connecting portion 62 and the unit reflector 35 are not welded and fixed. At the board-side connecting portion 62, a second holding-side fixing hole 61 is formed, and at the unit reflector 35, a second retaining hole 61 is formed. The second plate side fixing holes 48a~48d.

以使第1槽側固定孔57和插通孔53以及第1板側固定孔47相互通連、第2槽側固定孔58a~58d和第1保持側固定孔60以及餘裕孔46a~46d相互通連、第2保持側固定孔61和第2板側固定孔48a~48d相互通連的方式,來對於真空槽17,而配置固定裝置54和保持裝置15a~15d以及單位反射板35,並將固定螺絲鎖合裝置27從第1板側固定孔47側起來插通於第1板側固定孔47和插通孔53以及第1槽側固定孔57中,又,係將第1螺絲鎖合裝置26a~26d(被附加有元件符號c、d之裝置係並未圖示)之前端部38,從餘裕孔46a~46d側起而插入至餘裕孔46a~46d和第1保持側固定孔60以及第2槽側固定孔58a~58d中,又,係將第2螺絲鎖合裝置28a~28d(被附加有元件符號c、d之裝置係並未圖示)之胴體部77,從第2板側固定孔48a~48d側起而插通於第2板側固定孔48a~48d和第2保持側固定孔61中,藉由固定裝置54,來將單位反射板35之中央隔著固定裝置54而螺絲鎖合固定於安裝面19處,將槽側連接部63藉由第1螺絲鎖合裝置26a~26d來螺絲鎖合固定於安裝面19處,將 板側連接部62藉由第2螺絲鎖合固定裝置28a~28d來螺絲鎖合固定於單位反射板35處。固定裝置54和單位反射板35,係藉由安裝面19和頭部67而被作包夾,單位反射板35係藉由板側連接部62和頭部76而被作包夾。 The first groove side fixing hole 57, the insertion hole 53, and the first plate side fixing hole 47 are connected to each other, and the second groove side fixing holes 58a to 58d, the first holding side fixing hole 60 and the remaining holes 46a to 46d are mutually connected. The connection, the second holding-side fixing hole 61 and the second plate-side fixing hole 48a~48d are connected to each other. For the vacuum tank 17, the fixing device 54 and the holding device 15a~15d and the unit reflector 35 are arranged, and The fixing screw locking device 27 is inserted from the first plate side fixing hole 47 side into the first plate side fixing hole 47 and the insertion hole 53 and the first groove side fixing hole 57, and the first screw is locked The front end 38 of the closing device 26a~26d (devices with reference numerals c and d are not shown) is inserted from the side of the margin holes 46a~46d into the margin holes 46a~46d and the first holding side fixing hole 60 and the second groove side fixing holes 58a to 58d, and the carcass 77 of the second screw locking device 28a to 28d (devices with reference signs c and d are not shown), from the first The 2 plate side fixing holes 48a to 48d are inserted into the second plate side fixing holes 48a to 48d and the second holding side fixing hole 61. The fixing device 54 fixes the center of the unit reflector 35 through The device 54 is screwed and fixed to the mounting surface 19, and the groove side connecting portion 63 is screwed and fixed to the mounting surface 19 by the first screw locking devices 26a~26d. The board-side connecting portion 62 is screw-locked and fixed to the unit reflector 35 by the second screw-lock fixing devices 28a-28d. The fixing device 54 and the unit reflector 35 are sandwiched by the mounting surface 19 and the head 67, and the unit reflector 35 is sandwiched by the board-side connecting portion 62 and the head 76.

在圖3(a)、(b)之單位反射裝置122中,保持裝置11a~11d之板側連接部62係被熔接固定於單位反射板31處,槽側連接部63係被作螺絲鎖合固定,但是,在圖9(a)、(b)之單位反射裝置152中,保持裝置16a~16d(被附加有元件符號c、d之裝置係並未圖示)之板側連接部62係藉由第2螺絲鎖合裝置28a~28d(被附加有元件符號28c、28d之裝置係並未圖示)而被螺絲鎖合固定於單位反射板36處,槽側連接部63係被熔接固定於安裝面19處。固定裝置55,係在使固定螺絲鎖合裝置27被插通於第1板側固定孔47和插通孔53以及第1槽側固定孔57中的狀態下,使安裝面19側被固定於安裝面19處。胴體部66,係藉由第1槽側固定孔57而被作螺絲鎖合固定。將第2螺絲鎖合裝置28a~28d之胴體部77,從第2板側固定孔48a~48d(被附加有元件符號48c、48d之裝置係並未圖示)側起而插通於第2板側固定孔48a~48d和第2保持側固定孔61中,並將板側連接部62藉由第2螺絲鎖合裝置28a~28d來螺絲鎖合固定於單位反射板36處。 In the unit reflector 122 of Fig. 3(a) and (b), the plate-side connecting portion 62 of the holding device 11a-11d is welded and fixed to the unit reflector 31, and the groove-side connecting portion 63 is screw-locked Fixed, but, in the unit reflector 152 of Fig. 9 (a), (b), the plate-side connecting portion 62 of the holding device 16a-16d (devices with reference numerals c and d are not shown) The second screw-locking devices 28a-28d (devices with component symbols 28c and 28d are not shown) are screwed and fixed to the unit reflector 36, and the groove-side connecting portion 63 is welded and fixed At 19 locations on the mounting surface. The fixing device 55 is in a state where the fixing screw locking device 27 is inserted into the first plate-side fixing hole 47, the insertion hole 53 and the first groove-side fixing hole 57, and the mounting surface 19 side is fixed to 19 locations on the mounting surface. The carcass part 66 is screwed and fixed by the first groove side fixing hole 57. The carcass portion 77 of the second screw locking device 28a-28d is inserted into the second plate side fixing hole 48a-48d (devices with reference numerals 48c and 48d are not shown). In the plate-side fixing holes 48a to 48d and the second holding-side fixing hole 61, the plate-side connecting portion 62 is screwed and fixed to the unit reflector 36 by the second screw locking devices 28a to 28d.

保持裝置16a~16d,係被展示於圖11(a)~(e)中。 The holding devices 16a-16d are shown in Fig. 11(a)-(e).

在此單位反射裝置152中,係亦可與圖3(a)、(b)之固定裝置21相同的,將固定裝置55與單位反射板36 作熔接固定,並將固定裝置55和安裝面19作螺絲鎖合固定。係亦可將安裝面19和單位反射板36經由固定裝置55來作螺絲鎖合固定。 In this unit reflection device 152, it can also be the same as the fixing device 21 in FIG. 3(a) and (b), and the fixing device 55 and the unit reflection plate 36 For welding and fixing, the fixing device 55 and the mounting surface 19 are screwed and fixed. The mounting surface 19 and the unit reflector 36 can also be screwed and fixed via the fixing device 55.

另外,上述變形部64,雖係身為板彈簧,但是,不論是針對保持裝置11a~11d、12、13a、13b、14a~14c、15a~15d、16a~16d之何者,均可替代板彈簧而使用線圈彈簧等之其他形式之彈簧。 In addition, although the aforementioned deforming portion 64 is a leaf spring, it can replace the leaf spring regardless of whether it is for the holding device 11a-11d, 12, 13a, 13b, 14a-14c, 15a-15d, 16a-16d Other types of springs such as coil springs are used.

11a,11b:保持裝置 11a, 11b: holding device

17:真空槽 17: Vacuum tank

19:安裝面 19: Mounting surface

21:固定裝置 21: Fixing device

26a,26b:第1螺絲鎖合裝置 26a, 26b: The first screw locking device

27:固定螺絲鎖合裝置 27: Fixed screw locking device

31:單位反射板 31: Unit reflector

37:胴體部 37: Carcass

38:前端部 38: Front end

39:頭部 39: head

46a,46b:餘裕孔 46a, 46b: excess hole

47:第1板側固定孔 47: 1st plate side fixing hole

52:本體 52: body

53:插通孔 53: Through hole

57:第1槽側固定孔 57: 1st slot side fixing hole

58a,58b:第2槽側固定孔 58a, 58b: 2nd groove side fixing hole

62:板側連接部 62: Board side connection part

63:槽側連接部 63: Groove side connection part

64:變形部 64: Deformation

66:胴體部 66: Carcass

67:頭部 67: head

122:單位反射裝置 122: unit reflection device

Claims (16)

一種真空加熱裝置,其特徵為,係具備有:真空槽,係被作真空排氣;和加熱源,係被配置在前述真空槽之內部,並輻射出紅外線而將加熱對象物加熱;和反射器裝置,係被配置在前述真空槽之內部,並具備有將從前述加熱源而被輻射並朝向前述真空槽之內壁面之中之安裝面的紅外線作遮蔽之複數個的單位反射板,前述單位反射板,係沿著前述安裝面而被作配置,前述反射器裝置,係具備有:複數個的固定裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處;和複數個的保持裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處,前述固定裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置,係藉由前述固定裝置而被固定,前述保持裝置,係具備有可變形之變形部,前述保持裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置關係,係構成為藉由前述變形部之變形而被作變更。 A vacuum heating device, characterized in that it is provided with: a vacuum tank, which is used for vacuum exhaust; and a heating source, which is arranged inside the vacuum tank and radiates infrared rays to heat the object to be heated; and reflection The device is arranged inside the vacuum tank and is provided with a plurality of unit reflectors that shield infrared rays radiated from the heating source and directed toward the mounting surface in the inner wall surface of the vacuum tank. The unit reflector is arranged along the mounting surface, and the reflector device is equipped with a plurality of fixing devices, one end of which is fixed to the mounting surface of the vacuum tank, and the other end Are fixed at the unit reflector; and a plurality of holding devices, one end of which is fixed at the mounting surface of the vacuum tank, and the other end is fixed at the unit reflector, the fixing device is The relative position between the place fixed to the mounting surface and the place fixed to the unit reflector is fixed by the fixing device, and the holding device is provided with a deformable deforming part, The relative positional relationship between the location of the holding device fixed to the mounting surface and the location of the unit reflector is configured to be changed by the deformation of the deforming portion. 如申請專利範圍第1項所記載之真空加熱裝置,其中,當前述單位反射板被加熱而發生熱延伸時,前述變形部係變形,前述保持裝置之被固定於前述安裝面處之場所和被固定於前述單位反射板處之場所之間的相對性之位置關係係被作變更。 The vacuum heating device described in the first item of the scope of patent application, wherein when the unit reflector is heated and thermally stretched, the deformed portion is deformed, and the holding device is fixed to the place where the mounting surface is and is The relative positional relationship between the places fixed to the unit reflector is changed. 如申請專利範圍第2項所記載之真空加熱裝置,其中,前述變形部係為板彈簧,前述板彈簧,係被配置在藉由前述單位反射板之熱延伸而被施加有與前述板彈簧之表面相垂直之方向的力之方向上。 In the vacuum heating device described in claim 2, wherein the deformed portion is a leaf spring, and the leaf spring is arranged so that the heat extension of the unit reflector is applied to the plate spring. The direction of the force in the direction perpendicular to the surface. 如申請專利範圍第1項所記載之真空加熱裝置,其中,在前述單位反射板處,係被設置有餘裕孔,前述保持裝置,係藉由被插通於前述餘裕孔處之第1螺絲鎖合裝置而被螺絲鎖合固定於前述安裝面處,前述餘裕孔之邊緣和前述第1螺絲鎖合裝置,係構成為就算是前述單位反射板沿著前述安裝面而作熱延伸,在前述單位反射板為室溫以上且較上限溫度而更低溫之溫度範圍內也會成為非接觸。 The vacuum heating device described in item 1 of the scope of patent application, wherein the unit reflector is provided with a spare hole, and the holding device is locked by a first screw that is inserted into the spare hole. The device is screwed and fixed to the mounting surface by screwing. The edge of the margin hole and the first screw-locking device are constructed such that even the unit reflector is thermally extended along the mounting surface. The reflector becomes non-contact in the temperature range above room temperature and lower than the upper limit temperature. 如申請專利範圍第4項所記載之真空加熱裝置,其中,前述固定裝置和前述保持裝置,係被熔接固定於前述單位反射板處。 The vacuum heating device described in item 4 of the scope of patent application, wherein the fixing device and the holding device are welded and fixed to the unit reflector. 如申請專利範圍第4項所記載之真空加熱裝置,其中,前述固定裝置係被熔接固定於前述單位反射板處,前述保持裝置係藉由第2螺絲鎖合裝置而被螺絲鎖合固定於前述單位反射板處。 For the vacuum heating device described in item 4 of the scope of patent application, wherein the fixing device is welded and fixed to the unit reflector, and the holding device is screwed and fixed to the aforementioned unit by a second screw locking device. Unit reflector. 如申請專利範圍第1項所記載之真空加熱裝置,其中,被固定在1片的前述單位反射板處之前述固定裝置,係被配置在被固定於相同的前述單位反射板處之前述保持裝置與前述保持裝置之間。 The vacuum heating device described in the first item of the scope of patent application, wherein the fixing device fixed to one unit reflector is arranged on the holding device fixed to the same unit reflector Between and the aforementioned holding device. 如申請專利範圍第1項所記載之真空加熱裝置,其中,以被固定在1片的前述單位反射板處之前述固定裝置作為中心,而被配置有被固定於相同的前述單位反射板處之複數之前述保持裝置。 The vacuum heating device described in item 1 of the scope of patent application, wherein the fixing device fixed to one unit reflector is the center, and the unit is fixed to the same unit reflector as the center. Plural of the aforementioned holding devices. 一種反射器裝置,其特徵為,係具備有: 複數個的單位反射板,係在真空槽之內部沿著前述真空槽之內壁面之中之安裝面而被作配置,並將從加熱源而被輻射並朝向前述安裝面的紅外線作遮蔽;和複數個的固定裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處;和複數個的保持裝置,係使其中一端被固定在前述真空槽之前述安裝面處,並使另外一端被固定在前述單位反射板處,前述固定裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置,係藉由前述固定裝置而被固定,前述保持裝置,係具備有可變形之變形部,前述保持裝置之被固定於前述安裝面處的場所和被固定於前述單位反射板處的場所之間的相對性之位置關係,係構成為藉由前述變形部之變形而被作變更。 A reflector device, characterized in that it is provided with: A plurality of unit reflectors are arranged inside the vacuum tank along the mounting surface in the inner wall surface of the vacuum tank, and shield the infrared rays radiated from the heating source toward the mounting surface; and A plurality of fixing devices are such that one end is fixed to the mounting surface of the vacuum tank, and the other end is fixed to the unit reflector; and a plurality of holding devices are fixed to the aforementioned mounting surface. At the aforementioned mounting surface of the vacuum tank, the other end is fixed at the aforementioned unit reflector. The relativity between the place where the fixing device is fixed at the aforementioned mounting surface and the place fixed at the aforementioned unit reflector The position is fixed by the fixing device, the holding device is equipped with a deformable deformable part, the location of the holding device is fixed to the mounting surface and the location to be fixed to the unit reflector The relative positional relationship between them is constituted to be changed by the deformation of the aforementioned deforming part. 如申請專利範圍第9項所記載之反射器裝置,其中,當前述單位反射板被加熱而發生熱延伸時,前述變形部係變形,前述保持裝置之被固定於前述安裝面處之場所和被固定於前述單位反射板處之場所之間的相對性之位置關係係被作變更。 As for the reflector device described in item 9 of the scope of patent application, when the unit reflector is heated and thermally extended, the deformed portion is deformed, and the holding device is fixed to the place where the mounting surface is located and is The relative positional relationship between the places fixed to the unit reflector is changed. 如申請專利範圍第10項所記載之反射器裝置,其中, 前述變形部係為板彈簧,前述板彈簧,係被配置在藉由前述單位反射板之熱延伸而被施加有與前述板彈簧之表面相垂直之方向的力之方向上。 Such as the reflector device described in item 10 of the scope of patent application, in which, The deformed portion is a leaf spring, and the leaf spring is arranged in a direction in which a force perpendicular to the surface of the leaf spring is applied by the thermal extension of the unit reflector. 如申請專利範圍第9項所記載之反射器裝置,其中,在前述單位反射板處,係被設置有餘裕孔,前述保持裝置,係藉由被插通於前述餘裕孔處之第1螺絲鎖合裝置而被螺絲鎖合固定於前述安裝面處,前述餘裕孔之邊緣和前述第1螺絲鎖合裝置,係構成為就算是前述單位反射板沿著前述安裝面而作熱延伸,在前述單位反射板為室溫以上且較上限溫度而更低溫之溫度範圍內也會成為非接觸。 The reflector device described in item 9 of the scope of patent application, wherein the unit reflector is provided with a spare hole, and the holding device is locked by a first screw that is inserted into the spare hole. The device is screwed and fixed to the mounting surface. The edge of the margin hole and the first screw-locking device are configured to thermally extend along the mounting surface even if the unit reflector is thermally extended along the mounting surface. The reflector becomes non-contact in the temperature range above room temperature and lower than the upper limit temperature. 如申請專利範圍第12項所記載之反射器裝置,其中,前述固定裝置和前述保持裝置,係被熔接固定於前述單位反射板處。 The reflector device described in item 12 of the scope of patent application, wherein the fixing device and the holding device are welded and fixed to the unit reflector. 如申請專利範圍第12項所記載之反射器裝置,其中,前述固定裝置係被熔接固定於前述單位反射板處,前述保持裝置係藉由第2螺絲鎖合裝置而被螺絲鎖合固定於前述單位反射板處。 As for the reflector device described in item 12 of the scope of patent application, wherein the fixing device is welded and fixed to the unit reflector, and the holding device is screwed and fixed to the aforementioned unit by a second screw locking device. Unit reflector. 如申請專利範圍第9項所記載之反射器裝置,其中,被固定在1片的前述單位反射板處之前述固定裝置, 係被配置在被固定於相同的前述單位反射板處之前述保持裝置與前述保持裝置之間。 The reflector device described in item 9 of the scope of patent application, wherein the fixing device is fixed to one piece of the unit reflector, It is arranged between the holding device and the holding device that are fixed to the same unit reflector. 如申請專利範圍第9項所記載之反射器裝置,其中,以被固定在1片的前述單位反射板處之前述固定裝置作為中心,而被配置有被固定於相同的前述單位反射板處之複數之前述保持裝置。 The reflector device described in item 9 of the scope of patent application, in which the fixing device fixed to one unit reflector is the center, and the reflector device is fixed to the same unit reflector. Plural of the aforementioned holding devices.
TW108132424A 2018-11-14 2019-09-09 Vacuum heating device and reflector device TWI749366B (en)

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